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TW200500819A - Relay lens used in an illumination system of a lithography system - Google Patents

Relay lens used in an illumination system of a lithography system

Info

Publication number
TW200500819A
TW200500819A TW092118620A TW92118620A TW200500819A TW 200500819 A TW200500819 A TW 200500819A TW 092118620 A TW092118620 A TW 092118620A TW 92118620 A TW92118620 A TW 92118620A TW 200500819 A TW200500819 A TW 200500819A
Authority
TW
Taiwan
Prior art keywords
relay lens
lens
lens used
illumination system
lithography
Prior art date
Application number
TW092118620A
Other languages
Chinese (zh)
Other versions
TWI301564B (en
Inventor
Lev Ryzhikov
Stanislav Smirnov
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of TW200500819A publication Critical patent/TW200500819A/en
Application granted granted Critical
Publication of TWI301564B publication Critical patent/TWI301564B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A relay lens is provided in an illumination system for use in microlithography. The relay lens can be used to uniformly illuminate a field at a reticle by telecentric light beams with variable aperture size. The relay lens can include first, second, and third lens groups. At least one of the second and third lens groups can include a single lens. This can reduce costs and increase transmission by requiring less CaF2 because fewer optical elements are used compared to prior systems.
TW092118620A 2002-07-09 2003-07-08 Relay lens used in an illumination system of a lithography system TWI301564B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39424402P 2002-07-09 2002-07-09
US10/607,193 US7289277B2 (en) 2002-07-09 2003-06-27 Relay lens used in an illumination system of a lithography system

Publications (2)

Publication Number Publication Date
TW200500819A true TW200500819A (en) 2005-01-01
TWI301564B TWI301564B (en) 2008-10-01

Family

ID=29740281

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092118620A TWI301564B (en) 2002-07-09 2003-07-08 Relay lens used in an illumination system of a lithography system

Country Status (8)

Country Link
US (1) US7289277B2 (en)
EP (1) EP1380871B1 (en)
JP (1) JP4159936B2 (en)
KR (2) KR20040005677A (en)
CN (1) CN1328608C (en)
DE (1) DE60306042T2 (en)
SG (1) SG105008A1 (en)
TW (1) TWI301564B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100426462C (en) * 2005-02-03 2008-10-15 日立笠户机械股份有限公司 Pattern formation method
CN100388014C (en) * 2005-05-16 2008-05-14 中强光电股份有限公司 Side illumination type lens group
GB0800677D0 (en) * 2008-01-16 2008-02-20 Zeiss Carl Smt Ag Illumination system of a microlithographic projection exposure apparatus
CN103293863B (en) * 2012-02-24 2015-11-18 上海微电子装备有限公司 A kind of lithography illuminating system
CN104777609B (en) * 2015-04-03 2018-07-13 中国科学院上海光学精密机械研究所 Photo-etching machine illumination pupil measuring polarization state optical system
US11442254B2 (en) 2019-04-05 2022-09-13 Inner Ray, Inc. Augmented reality projection device
CN119717400B (en) * 2023-09-27 2025-09-16 光科芯图(北京)科技有限公司 Plane wave-based illumination system and exposure equipment

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US36832A (en) * 1862-11-04 Improvement in friction-couplings
JPH03230112A (en) * 1990-02-05 1991-10-14 Minolta Camera Co Ltd Projection lens system
US5402267A (en) 1991-02-08 1995-03-28 Carl-Zeiss-Stiftung Catadioptric reduction objective
USRE38438E1 (en) * 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
US6680803B2 (en) * 1996-12-21 2004-01-20 Carl-Zeiss Smt Ag Partial objective in an illuminating systems
DE19653983A1 (en) * 1996-12-21 1998-06-25 Zeiss Carl Fa REMA lens for microlithography projection exposure systems
US5969882A (en) 1997-04-01 1999-10-19 Nikon Corporation Catadioptric optical system
WO1999025008A1 (en) * 1997-11-07 1999-05-20 Nikon Corporation Projection exposure device, projection exposure method, and method of manufacturing projection exposure device
JP2000143278A (en) 1998-11-10 2000-05-23 Nikon Corp Projection exposure apparatus with improved durability and method of manufacturing imaging optical system
JP4432153B2 (en) * 1999-08-03 2010-03-17 株式会社ニコン Zoom lens
EP1115019A3 (en) 1999-12-29 2004-07-28 Carl Zeiss Projection exposure lens with aspheric elements
JP2002055277A (en) * 2000-08-11 2002-02-20 Nikon Corp Relay imaging optical system, illumination optical apparatus and exposure apparatus including the optical system
DE10113612A1 (en) 2001-02-23 2002-09-05 Zeiss Carl Sub-objective for illumination system has two lens groups, second lens group with at least first lens with negative refractive index and at least second lens with positive refractive index
JP3985937B2 (en) * 2001-07-10 2007-10-03 オリンパス株式会社 Microscope objective lens for fluorescence

Also Published As

Publication number Publication date
TWI301564B (en) 2008-10-01
DE60306042T2 (en) 2006-11-02
JP4159936B2 (en) 2008-10-01
KR20070093380A (en) 2007-09-18
CN1495461A (en) 2004-05-12
US20040008408A1 (en) 2004-01-15
EP1380871A3 (en) 2004-03-03
JP2004046189A (en) 2004-02-12
EP1380871B1 (en) 2006-06-14
EP1380871A2 (en) 2004-01-14
US7289277B2 (en) 2007-10-30
DE60306042D1 (en) 2006-07-27
KR20040005677A (en) 2004-01-16
CN1328608C (en) 2007-07-25
SG105008A1 (en) 2004-07-30
KR100888011B1 (en) 2009-03-09

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees