[go: up one dir, main page]

WO2003067334A3 - Polarisation-optimised illumination system - Google Patents

Polarisation-optimised illumination system Download PDF

Info

Publication number
WO2003067334A3
WO2003067334A3 PCT/EP2003/001146 EP0301146W WO03067334A3 WO 2003067334 A3 WO2003067334 A3 WO 2003067334A3 EP 0301146 W EP0301146 W EP 0301146W WO 03067334 A3 WO03067334 A3 WO 03067334A3
Authority
WO
WIPO (PCT)
Prior art keywords
polarisation
light
integrator rod
emergent light
illumination system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2003/001146
Other languages
German (de)
French (fr)
Other versions
WO2003067334A2 (en
Inventor
Karl-Heinz Schuster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to AU2003210213A priority Critical patent/AU2003210213A1/en
Priority to EP03737317A priority patent/EP1474726A2/en
Publication of WO2003067334A2 publication Critical patent/WO2003067334A2/en
Anticipated expiration legal-status Critical
Priority to US10/913,575 priority patent/US20050134825A1/en
Publication of WO2003067334A3 publication Critical patent/WO2003067334A3/en
Priority to US11/434,904 priority patent/US20060203341A1/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

An illumination system for a projector unit for microlithography working with ultra-violet light, has an angle-retaining light mixer with at least one integrator rod comprising an inlet surface for receiving light from a light source and an output surface for output of emergent light mixed by means of the integrator rod. At least one prism arrangement for receiving emergent light and for changing the polarisation state of the emergent light is arranged in series after the integrator rod. A preferred prism arrangement has a polarisation distribution surface arranged perpendicular to the propagation direction of the emergent light which permits the unhindered transmission of light components with p polarisation and reflects components with s polarisation. The separated beams with orthogonal polarisation are brought parallel by means of a mirror surface arranged parallel to the polarisation distribution surface and the same polarisation state for both partial beams is achieved by means of a suitable retarder.
PCT/EP2003/001146 2002-02-08 2003-02-05 Polarisation-optimised illumination system Ceased WO2003067334A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2003210213A AU2003210213A1 (en) 2002-02-08 2003-02-05 Polarisation-optimised illumination system
EP03737317A EP1474726A2 (en) 2002-02-08 2003-02-05 Polarisation-optimised illumination system
US10/913,575 US20050134825A1 (en) 2002-02-08 2004-08-09 Polarization-optimized illumination system
US11/434,904 US20060203341A1 (en) 2002-02-08 2006-05-17 Polarization-optimized illumination system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2002106061 DE10206061A1 (en) 2002-02-08 2002-02-08 Polarization-optimized lighting system
DE10206061.4 2002-02-08

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/913,575 Continuation US20050134825A1 (en) 2002-02-08 2004-08-09 Polarization-optimized illumination system

Publications (2)

Publication Number Publication Date
WO2003067334A2 WO2003067334A2 (en) 2003-08-14
WO2003067334A3 true WO2003067334A3 (en) 2004-09-16

Family

ID=27674625

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/001146 Ceased WO2003067334A2 (en) 2002-02-08 2003-02-05 Polarisation-optimised illumination system

Country Status (4)

Country Link
EP (1) EP1474726A2 (en)
AU (1) AU2003210213A1 (en)
DE (1) DE10206061A1 (en)
WO (1) WO2003067334A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7408622B2 (en) 2003-08-14 2008-08-05 Carl Zeiss Smt Ag Illumination system and polarizer for a microlithographic projection exposure apparatus

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101124179B1 (en) 2003-04-09 2012-03-27 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
WO2005050325A1 (en) * 2003-11-05 2005-06-02 Carl Zeiss Smt Ag Polarization-optimizing illumination system
TWI385414B (en) 2003-11-20 2013-02-11 尼康股份有限公司 Optical illuminating apparatus, illuminating method, exposure apparatus, exposure method and device fabricating method
CN1910522B (en) 2004-01-16 2010-05-26 卡尔蔡司Smt股份公司 Polarization modulation optical element
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
TWI360837B (en) 2004-02-06 2012-03-21 Nikon Corp Polarization changing device, optical illumination
DE102004010569A1 (en) * 2004-02-26 2005-09-15 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure apparatus
DE102004023030B4 (en) * 2004-05-06 2012-12-27 SIOS Meßtechnik GmbH Multiple beam splitter
CN101718913B (en) * 2009-12-08 2011-07-27 福建华科光电有限公司 Polarization conversion color-combination prism combination
DE102010049751B4 (en) * 2010-10-29 2020-11-05 "Stiftung Caesar" (Center Of Advanced European Studies And Research) Optical beam splitter for the simultaneous recording of a Z-stack on a semiconductor chip, kit for the construction of an optical beam splitter and light microscope
DE102010061786A1 (en) * 2010-11-23 2012-05-24 Siemens Aktiengesellschaft Microscope illumination and microscope
CN202793315U (en) 2011-03-30 2013-03-13 迈普尔平版印刷Ip有限公司 Difference interferometer module and lithographic system having the difference interferometer module
WO2013013947A2 (en) 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure method
DE102011079837A1 (en) * 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Optical system for microlithographic projection exposure system for manufacturing e.g. LCDs, has beam-splitting optic element arranged such that degree of polarization of incident light beam is lesser than specified value
NL2011504C2 (en) 2012-09-27 2015-01-05 Mapper Lithography Ip Bv Multi-axis differential interferometer.
DE102012217769A1 (en) 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
CN112987323B (en) * 2019-12-13 2022-03-22 中国科学院大连化学物理研究所 High-energy solid pulse laser polarization beam combining device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6028660A (en) * 1996-02-23 2000-02-22 Asm Lithography B.V. Illumination unit for an optical apparatus
US6097474A (en) * 1997-03-31 2000-08-01 Svg Lithography Systems, Inc. Dynamically adjustable high resolution adjustable slit
US6139157A (en) * 1997-02-19 2000-10-31 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
DE10020458A1 (en) * 1999-04-26 2001-03-29 Samsung Electronics Co Ltd Reflection projector
JP2001343611A (en) * 2000-03-31 2001-12-14 Nikon Corp Polarized illumination device and projection display device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0588937B1 (en) * 1991-06-13 1996-08-28 Minnesota Mining And Manufacturing Company Retroreflecting polarizer
KR0153796B1 (en) * 1993-09-24 1998-11-16 사토 후미오 Exposure apparatus and exposure method
KR0166612B1 (en) * 1993-10-29 1999-02-01 가나이 쓰토무 Method and apparatus for exposing pattern, mask used therefor and semiconductor integrated circuit formed by using the same
DE19535392A1 (en) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarization-rotating optical arrangement and microlithography projection exposure system with it
US6257726B1 (en) * 1997-02-13 2001-07-10 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
DE19921795A1 (en) * 1999-05-11 2000-11-23 Zeiss Carl Fa Projection exposure system and exposure method of microlithography
JP3600076B2 (en) * 1999-08-04 2004-12-08 三洋電機株式会社 Lighting optical system
JP2001311912A (en) * 2000-04-28 2001-11-09 Minolta Co Ltd Lighting optical system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6028660A (en) * 1996-02-23 2000-02-22 Asm Lithography B.V. Illumination unit for an optical apparatus
US6139157A (en) * 1997-02-19 2000-10-31 Canon Kabushiki Kaisha Illuminating apparatus and projecting apparatus
US6097474A (en) * 1997-03-31 2000-08-01 Svg Lithography Systems, Inc. Dynamically adjustable high resolution adjustable slit
DE10020458A1 (en) * 1999-04-26 2001-03-29 Samsung Electronics Co Ltd Reflection projector
JP2001343611A (en) * 2000-03-31 2001-12-14 Nikon Corp Polarized illumination device and projection display device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2002, no. 04 4 August 2002 (2002-08-04) *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7408622B2 (en) 2003-08-14 2008-08-05 Carl Zeiss Smt Ag Illumination system and polarizer for a microlithographic projection exposure apparatus

Also Published As

Publication number Publication date
AU2003210213A8 (en) 2003-09-02
AU2003210213A1 (en) 2003-09-02
DE10206061A1 (en) 2003-09-04
EP1474726A2 (en) 2004-11-10
WO2003067334A2 (en) 2003-08-14

Similar Documents

Publication Publication Date Title
WO2003067334A3 (en) Polarisation-optimised illumination system
WO2004031741A3 (en) Illumination system for optical inspection
WO2005017620A3 (en) Illumination device and polariser for a microlithographic projection exposure installation
WO2002017000A3 (en) Polarization recovery system for projection displays
WO2005083512A3 (en) Illumination system for a microlithography projection exposure installation
DE69634241D1 (en) DEVICE FOR CHECKING THE OUTPUT POWER, PROJECTION DISPLAY DEVICE
EP0841685A3 (en) High efficiency lamp apparatus for producing a beam of polarized light
EP0740178A3 (en) Improvements relating to illumination optics for light modulator
TW200503553A (en) An image projecting device and method
NO973542L (en) Contrast media for in vivo imaging based on light transmission by reflection
TW200641401A (en) Illumination system and projection system using same
WO2005015314A3 (en) An illumination system for microlithography
WO2005026822A3 (en) Fly's eye condenser and illumination system therewith
EP1167868A3 (en) Light projector, particularly for projecting light beams with variable dimensions and coloring
WO2004012013A3 (en) Optical imaging using a pupil filter and coordinated illumination polarisation
EP1319988A3 (en) High luminosity source for EUV lithography
TW358875B (en) Multi-pass spectrometer
AU2002216344A1 (en) Optical device for unifying light beams emitted by several light sources
EP1191796A3 (en) Optical apparatus and projection type display apparatus
WO2004102273A3 (en) Lighting system comprising an axicon module
WO2002080578A3 (en) System for adjusting the color of a light source
GB2436263A (en) Offset projection system
WO2007076184A3 (en) Method and apparatus for intensity control of multiple light sources
TW200625949A (en) Projection display apparatus
EP1359453A3 (en) Device and method for polarisation interference contrast

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 10913575

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 2003737317

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 2003737317

Country of ref document: EP

WWW Wipo information: withdrawn in national office

Ref document number: 2003737317

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: JP

WWW Wipo information: withdrawn in national office

Country of ref document: JP