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TW200416984A - Substrate with embedded passive components and method for fabricating the same - Google Patents

Substrate with embedded passive components and method for fabricating the same Download PDF

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Publication number
TW200416984A
TW200416984A TW092103185A TW92103185A TW200416984A TW 200416984 A TW200416984 A TW 200416984A TW 092103185 A TW092103185 A TW 092103185A TW 92103185 A TW92103185 A TW 92103185A TW 200416984 A TW200416984 A TW 200416984A
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TW
Taiwan
Prior art keywords
circuit board
film
unit circuit
semiconductor package
package substrate
Prior art date
Application number
TW092103185A
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Chinese (zh)
Other versions
TWI231020B (en
Inventor
Jiun-Shian Yu
Shih-Ping Hsu
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Phoenix Prec Technology Corp
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Priority to TW092103185A priority Critical patent/TWI231020B/en
Publication of TW200416984A publication Critical patent/TW200416984A/en
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Publication of TWI231020B publication Critical patent/TWI231020B/en

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    • H10W72/884

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  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

A substrate with embedded passive components and a method for fabricating the substrate are proposed. At least a first unit circuit board is formed with circuit layers on upper and lower surfaces thereof. Conductive metal layers with a capacitor film and a resistor film separated from the first united circuit board by an insulating layer are mounted on the circuit layers of the first unit circuit board. After patterning the conductive metal layer and resistor film formed thereon, at least an opening is formed to penetrate the first unit circuit board. At least a second unit circuit board is formed with circuit layers separated from one to another by an insulating layer and electrically connected to each other via a plurality of conductive vias and blind vias formed in the second unit circuit board. The first and second unit circuit boards are integrated to form at least an indentation via the opening of the first unit circuit board which was covered by the second unit circuit board. A plurality of PTH was formed to penetrate the unit circuit boards in order to electrically connect at least one of the circuit layers formed on the surface of the capacitor film and the resistor film.

Description

---—.— 五、發明說明(1) 【發明所屬之技術領域】 本七明係有關於_綠主墓Μ 壯# 尤指一種在掸犀+玖 + v ^衣基板及其製作方法 曰曰 片等+ + :層电路板結構中内嵌有被動元件與半導體 r I二I凡之半導體封裝基板及其製法。 • L先w技術】 能、ϊ Ξ::產業的蓬勃發展’冑子產品亦逐漸邁入多功 (丨此、研發方向。為滿足半導體封裝件高積集度 需求,ΓΓ^Γ)以及微型化(Miniaturizati〇n)的封裝 / β、夕數線路載接之印刷電路板(Printed 〇ard)亦逐漸由單層板演變成多層板 連接Ί—^ΓΓ Board),俾於有限的空間下,藉由層間 έΤ + nte^ayei· Connection)擴大印刷電路板上 用々私路面積而配合高電子密度之積體電路 件上tCU 土七)需*。同日寺,亦需在半導體封裝 件上正6有例如電阻器(Resist〇rs)、電容界 (Capacitors)及電碲哭 nd+ 、 口口 - # 次 σσ Unductors)寺破動元件(PasSlVe corap:r⑽精,相對提昇或穩定電 , 第圖斤不,多數之被動元件1 2係安置於美板丨 |面’該f板可為一般印刷電路板或半導體晶片之土 义 ,然為避免該等被動元件i 2 ,、土 L _ing flngers)間之電性^體曰曰片购 被動元件Μ安置於基板i之角】傳統上多將該等 區域外之純額” 接置-----.-- V. Description of the invention (1) [Technical field to which the invention belongs] The Qiming system is related to _ 绿 主 墓 M 壮 #, especially a kind of base plate and its manufacturing method Said chip and other + +: a semiconductor package substrate with passive components and semiconductors embedded in the layered circuit board structure and a manufacturing method thereof. • L-first technology] Energy, ϊ Ξ :: the booming development of the industry, 胄 products are gradually moving into multi-function (丨 this, research and development direction. To meet the needs of semiconductor packaging high accumulation degree, ΓΓ ^ Γ) and micro Miniaturization package / printed circuit board (Printed ard) for β and Xi number lines has also gradually evolved from a single-layer board to a multi-layer board connection (^ ΓΓ Board), in a limited space, By interlayer layer + nte ^ ayei · Connection) to expand the area of the private circuit on the printed circuit board to match the high-density integrated circuit components on the tCU (seven) required *. On the same day, the semiconductor package also needs to have resistors (Resistors), capacitors (Capacitors), and tellurium nd +, 口 口-# 次 σσ Unductors (PasSlVe corap: r⑽) Refined, relatively lifted or stabilized. No. Most passive components 12 are placed on the US board. | The 'f' board can be the meaning of ordinary printed circuit boards or semiconductor wafers, but to avoid such passive The component i 2 is electrically connected to the ground plane, and the passive component M is placed at the corner of the substrate i. Traditionally, the pure amount outside these areas is often connected.

17098. ptd 第8頁 200416984 五、發明說明(2) 時需考量銲接墊位置,導致該等被動元件1 2佈設數量受到 偈限’不利半導體t置南度集積化之發展趨勢;甚者’被 動元件1 2佈設數量隨著半導體封裝件高性能之要求而相對 地遽增,如採習知方法該基板1表面必須同時容納多數半 導體晶片1 1以及大量被動元件1 2,而迫使裝件體積增大, 亦不符合半導體封裝件輕薄短小之發展潮流。 如第2圖所示,基於上述問題,遂有構想將該多數被 動元件整合至基板2上之半導體晶片2 1與銲接區域間之區 域。然而,隨著半導體裝置内單位面積上輸出/輸入連接 端數量的增加,銲線2 3數量亦隨之提昇;再者,一般被動 元件22高度(約0· 8毫米)係高於半導體晶片2 1高度(約0· 55 毫米),如欲避免銲線2 3觸及被動元件2 2造成短路,使該 銲線2 3需拉高並橫越該被動元件2 2之正上方,提昇銲接困 難度,亦使得線弧(W i r e 1 〇 〇 p )長度增加。況且,銲線2 3 本身具有重量,接高之銲線2 3若缺乏支撐,易因本身重力 崩塌觸及被動元件而產生短路,且銲線2 3本身係金、鋁材 質製成’增加線弧長度將明顯提昇銲線2 3成本。 / 再者’利用習知表面黏接技術(S u r f a c e - m 〇 u n t i n g t e c h η o 1 o g y,S Μ T )將該被動元件2 2藉由銲黏劑(S ο 1 d e r p a s t e )固接至該基板2預設銲接位置後,實施半導體裝置 膠體封裝製程時’係於高溫環境下注入熔融封裝樹脂2 4, 此時作業溫度(1 7 5°C )與該被動元件2 2固接使用之銲黏劑 融化溫度(183t:)接近,該銲結劑呈現半熔融軟化狀態, 谷易導致該等被動元件22於注膠後遭受該熔融封裝樹脂2417098. ptd Page 8 200416984 V. Description of the invention (2) We need to consider the position of the solder pads, which leads to the limitation of the number of these passive components 12. The development trend of the integration of semiconductors southward is not favorable; The number of component 12 layouts has increased relatively with the high performance requirements of semiconductor packages. For example, the surface of substrate 1 must accommodate most semiconductor wafers 11 and a large number of passive components 12 at the same time, forcing the volume of the package to increase. Large, does not meet the development trend of thin and light semiconductor packages. As shown in FIG. 2, based on the above-mentioned problems, it is conceived to integrate the majority of the passive elements into a region between the semiconductor wafer 21 and the soldering region on the substrate 2. However, as the number of output / input connections per unit area in a semiconductor device increases, the number of bonding wires 2 3 also increases; further, the height of the passive component 22 (about 0.8 mm) is generally higher than that of the semiconductor wafer 2 1 height (approximately 0.55 mm), if you want to prevent the welding wire 2 3 from touching the passive component 2 2 to cause a short circuit, make the welding wire 23 need to be pulled up and cross the passive component 22 directly above it to increase the welding difficulty , Which also increases the length of the line arc (Wire 1 00p). Moreover, the welding wire 2 3 itself has weight. If the high welding wire 2 3 lacks support, it is easy to cause a short circuit due to its own gravity collapse to touch the passive components, and the welding wire 2 3 itself is made of gold and aluminum. The length will significantly increase the cost of the welding wire. / Furthermore, the passive component 2 2 is fixed to the substrate 2 with a soldering adhesive (S ο 1 derpaste) using a conventional surface bonding technology (Surface-m ountingtech η o 1 ogy, S M T). After the preset soldering position, when the colloidal packaging process of the semiconductor device is performed, the molten packaging resin 2 4 is injected under a high temperature environment. At this time, the operating temperature (175 ° C) and the soldering adhesive used for the passive component 2 2 are fixedly connected. The melting temperature (183t :) is close, the solder is in a semi-melted softened state, and Gu Yi causes the passive components 22 to be subjected to the molten encapsulating resin 24 after the injection.

17098.ptd 第9頁 200416984 五、發明說明(3) 模麁(Mo 1 d f 1 ow )應力衝擊,造成該等被動元件2 2偏移該 預設銲接位置,降低導電品質甚而引發短路。 此外,在現今電子產品要求輕薄短小與多功能及高電 性之趨勢下,相對地,安置其内之各半導體封裝單元勢必 跟著要求輕薄短小化,因此,如何在提供有效數量之被動 元件與半導體晶片等電子元件於半導體封裝基板中,以提 昇電子產品之電性功能,而又不致影響半導體封裝基板之 線路佈局性與半導體封裝件整體厚度之增加,實為目前亟 待解決之課題。 _發明内容】 胃 鑒於以上所述習知技術之缺點,本發明之主要目的在 於提供一種内嵌被動元件之半導體封裝基板及其製作方 法,俾提昇半導體裝置内被動元件之佈設數量,並增加基 板線路佈局靈活性。 本發明之另一目的在於提供一種内嵌被動元件之半導 體封裝基板及其製作方法,俾縮減基板表面使用面積與半 導體封裝件厚度,以達半導體裝置輕薄短小之目標。 ~ , 本發明之再一目的在於提供一種内嵌被動元件之半導 體封裝基板及其製作方法,以避免被動元件受高溫與模流 φ響而偏位,同時降低銲接困難度,避免銲線直接觸及被 動元件引發短路,亦得以縮短銲線線孤長度,節省銲接成 本0 為達成上揭及其他目的,本發明之内嵌被動元件之半 導體封裝基板及其製作方法係包括:17098.ptd Page 9 200416984 V. Description of the invention (3) Mo 1 d f 1 ow stress impact, which causes the passive components 22 to deviate from the preset welding position, lowering the conductive quality and even causing a short circuit. In addition, in the current trend of electronic products requiring thinness, shortness, versatility, and high electrical properties, relatively speaking, the semiconductor packaging units placed within them are bound to follow the requirements of lightness, shortness, and miniaturization. Therefore, how to provide an effective number of passive components and semiconductors Electronic components such as wafers are used in semiconductor packaging substrates to improve the electrical functions of electronic products without affecting the layout of the semiconductor packaging substrate and the increase in the overall thickness of the semiconductor package. This is a problem that needs to be solved at present. _Summary of the Invention In view of the shortcomings of the conventional technologies described above, the main purpose of the present invention is to provide a semiconductor package substrate with embedded passive components and a method for manufacturing the same, to increase the number of passive components in a semiconductor device and increase the substrate. Line layout flexibility. Another object of the present invention is to provide a semiconductor package substrate with embedded passive components and a method for manufacturing the same, which can reduce the surface area of the substrate and the thickness of the semiconductor package to achieve the goal of lightness, thinness and shortness of the semiconductor device. ~, Another object of the present invention is to provide a semiconductor package substrate with embedded passive components and a manufacturing method thereof, so as to avoid the passive components from being biased due to the high temperature and the mold flow φ, and at the same time reduce the welding difficulty, avoid direct contact with the welding wire and The short circuit caused by the passive component can also shorten the solitary length of the bonding wire and save the welding cost. In order to achieve the disclosure and other purposes, the semiconductor package substrate with the passive component embedded in the present invention and the manufacturing method thereof include:

第10頁 17098. ptd 五、發明說明Page 10 17098. ptd 5. Description of the invention

捉t、複數個單—+ :板兩側表面之電::路板;接著’ ☆至少—第 ΐ金以及-間隔i上Ϊ別壓合有—載有電容膜之-ί 電4::;:之ί有電阻膜之導電金屬 表面:門"極,並於該第二ί:導電金屬層以形成電阻 間…:;同時,另“早7"笔路板中形成至少-貫穿 第 間隔絕緣層疊^:二另於至少一第二單 形成於内部之之设數電路層,彳第:’路板中形成有 之後,站入是數個導電$ ^亡早兀電路板係藉由 、i元;::卜元接各電路層; 接f形成於該電二板之電鍍導通孔(ΡΤΗ),可供帝性 作方前述本發明之3:::至者—者表面之電路層。 、膜狀:得之封裝基板,η?件之半導體封裝基板製 ϊτ於基板r面電習知技術中需將被: 動元件受性甚另: %元件而弓以降低鮮接困難度,物:=而發 成本。再者"^路,亦得以縮短銲線線孤長产…及被 格板m?由結合該第-單元電路板K第”鲜; 閘D之〜κ弟—早元電路板得以封閉住第_早儿电 丨” 側,以形成一肉山亡+咖π & ; 果兀電路板 m及表兩至少呈有成内肷有电阻肤與電容膜等被動元件 ”有—凹部之多層電路板,俾供如半導體2Catch t, plural singles— +: electricity on both sides of the board :: road board; then '☆ at least—the first gold and-on the interval i, do n’t press together—carrying a capacitor film—ί electricity 4 :: ;: A conductive metal surface with a resistive film: gate " pole, and the second ί: conductive metal layer to form a resistance space ...:; At the same time, another "early 7" pen circuit board is formed at least-throughout the first Spaced insulation stacking ^: two circuit layers with at least one second formed in the interior, 彳 the first: after the circuit board is formed, standing in is a number of conductive , I yuan; :: Bu yuan connected to each circuit layer; f is formed on the electrical two plated plated through holes (PTT), which can be used by the imperial maker of the aforementioned 3 ::: 至 者 — the circuit on the surface of the present invention The film-like: the obtained packaging substrate, η? Semiconductor packaging substrates made of 于 τ in the substrate r-plane electrical conventional technology needs to be: the dynamic components are very different:% components and bow to reduce the difficulty of fresh connection Property: = and the cost. In addition, the "^" route can also reduce the length of the welding wire solitary production ... and the grid plate m? By combining the first unit circuit board Kth; the gate D ~ Κ 弟 —Early yuan circuit board can be closed to the side of _early electricity 丨 ”to form a meat mountain + coffee π &; Fruit circuit board m and the table at least have a resistance skin inside Passive components such as capacitor films have multilayer circuit boards with recesses, such as semiconductors 2

200416984 五、發明說明(5) 片專電子元件收納並電性連接至該多層電路才反 藉以縮短半導體封裝件整體厚度,達到讀半導 薄短小同時兼具高電性之目的。 以下列舉實施例以進一步詳細說明本發明 、並不受此等實施例所限制。又本發明之圖式僅 明,並非依實際尺寸描繪,亦即未反應出一多 中各層次之實際尺寸,先予敘明。 【實施方式】 清參閱第3 A至苐31圖’為本發明之内嵌被 暴體封裝基板製作方法示意圖。 如第3A圖所示,首先,提供至少一第一單 (Unit circuit board)3a,該第一單元電路板 銅箔基板(Copper Coated Laminate, CCL) (Resin Coated Copper, RCC)、或於 FR-4樹 脂、環氧樹脂(Epoxy)、矽(sili.con)、聚 (Polyesters)、玻璃纖維等絕緣性材料表面 (Copper Foi 1)之銅ϋ樹脂.層等,而於本實方 用雙層銅箔基板作為單元電路板材料,亦即, 樹脂層30之上表面30a及下表面3〇b各接附一如 馨導電金屬層3 1與第二導電金屬層32。 如第3B圖所示,於該第一罝分 次乐 早兀電路板3 a之 屬層3 1與第二導電金屬層3 2卜& ,3以上鈿以形成線路之 (Development) - u U + ^ 蚀到L Etching)等習用製 _圖案化電路(Pattern Clrcuit)之第一電路^ 之凹部内, 體封裝件輕 ,但本發明 為簡單說 層基板結構 動元件之半 元電路板 3 a係可選自 •背膠銅箱 脂、FR-5樹 酯樹脂 鍍覆銅箔層 已例中係使~ 可在一絕緣 銅箔層之第 第一導電金 微影 程,而形成 卜3 1 a與第二200416984 V. Description of the invention (5) Only the dedicated electronic components are housed and electrically connected to the multilayer circuit, so as to shorten the overall thickness of the semiconductor package and achieve the purpose of thin and short read semiconductors and high electrical properties. The following examples are provided to further illustrate the present invention in detail, and are not limited by these examples. Moreover, the drawings of the present invention are only illustrative, and are not drawn according to actual dimensions, that is, the actual dimensions of each layer in a plurality are not reflected, and are described in advance. [Embodiment] Refer to Figs. 3A to 31, which are schematic diagrams of a method for manufacturing an embedded package package of the present invention. As shown in FIG. 3A, first, at least one first circuit board (Unit circuit board) 3a is provided, and the first unit circuit board copper foil substrate (Copper Coated Laminate (CCL) (Resin Coated Copper, RCC)) or FR- 4Resin, epoxy, silicon (sili.con), poly (polyesters), glass fiber and other insulating materials on the surface (Copper Foi 1) of copper resin on the surface. The copper foil substrate is used as a unit circuit board material, that is, the upper surface 30a and the lower surface 30b of the resin layer 30 are each attached with a conductive metal layer 31 and a second conductive metal layer 32. As shown in FIG. 3B, the sublayer 31 and the second conductive metal layer 3 2 of the first divided circuit board 3 a and the second conductive metal layer 3 2 are more than 3 to form a circuit (Development)-u U + ^ is etched into the recess of the first circuit ^ of the conventional circuit _ pattern circuit (Pattern Clrcuit), and the body package is light, but the present invention is simply a half-element circuit board with a multilayer substrate structure. 3 The a series can be selected from the group of self-adhesive copper box grease and FR-5 resin resin-coated copper foil layer. The first conductive gold lithography process of an insulating copper foil layer can be used to form the 3 1 a and second

17098. ptd17098. ptd

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ZUU41by84 五、發明說明(6) --- 電路層3 2 a,以;|:甚+ 右芒+綠狄 構成一雙層電路板,其中該第一+狄 有右干線路區域係可 弟 %路層31 3 1b。當然,該第 _為》成如下述電容兀件之-平行 路之多層電路板且3 a亦可為一疊層有多層? 所周知之製程技彳fi J關線路圖案化技術繁多,惟乃輩χ 如第Si 非本案技術特徵,&未再予 路層31a壓合有一截右;;亥弟一早凡電路板3a表面之第—帝 斤 載有電容膜41之第三導電今凰思π ^ 於該弟二電路芦— 至屬層33,並 μ 曰32間隔一絕緣層40以壓合一 #古+ 朕4 2之弟四導電金屬居 _ _ ^ 戟有電阻 >八+ 蜀層34。该電容膜41係選自介命a本 之咼介電層,豆係由如古八2』丄,丨 书吊數大 填充之咼分子及其相似物等,i 1文粉末 ,Ό . . 初寺具材枓可例如為鈦酸鋇 (Barium-titanate)、欽酸錯錯 、 (Lead-Zirconate-tltanate)、無定形氫化碳(Am〇rph hydropnated carbon),或其粉末散佈於黏結劑(Bi s 中,如樹脂、玻璃粉末等,亦可利用濺鍍、印刷 er) (Printing)或滾輪旋塗(Roller coating)等方式成形。^ 絕緣層40之材質係可為絕緣有機材料或陶瓷材料,如^袠y 樹脂(Epoxy resin)、聚乙醯胺(polyimide)、雙順丁^氧 酸驢亞胺 /三氮胖(Bismaleimide triazme-based^^^ 或其玻璃纖維(G 1 a s s f i b e i·)之複合材料等組成,當然, 該絕緣層4 0並不限於僅由單一有機材料所形成,亦可由不 同絕緣材料層所疊合而成。而該電阻膜4 2包含有厚膜 (Thick fi lm)及薄膜(Thin Π lm)電阻材料,該厚膜電阻 材料係如銀粉(Silver powder)或碳顆粒(CarboI1ZUU41by84 V. Description of the invention (6) --- circuit layer 3 2 a, with: |: even + right mang + green di constitutes a double-layer circuit board, where the first + di has the right trunk line area is a brother% Road layer 31 3 1b. Of course, the "_" is a multilayer circuit board with parallel circuits such as the following capacitor element and 3a can also be a multilayer with multiple layers? There are many well-known process technologies, such as fiJ circuit patterning technology, but it is not the same as the technical characteristics of this case, & the road layer 31a is no longer pressed together; there is a section of the surface of the circuit board 3a The first—the third conductive layer carrying the capacitor film 41—the second conductive circuit π ^ In the second circuit Lu—to the layer 33, and the interval 32 is separated by an insulating layer 40 to press together # 古 + 朕 4 2 The younger brother of the four conductive metal _ _ ^ halberd has resistance > eight + Shu layer 34. The capacitive film 41 is selected from the 咼 dielectric layer of 介 a 本, the bean system is composed of 古 molecules and their analogs filled with a large number of 吊 丄, 八 1 powder, Ό.. The early temples can be, for example, barium titanate (Barium-titanate), cinnamic acid (Lead-Zirconate-tltanate), amorphous hydrogenated carbon (AmOrph hydropnated carbon), or powder dispersed in the binder (Bi In s, such as resin, glass powder, etc., it can also be formed by sputtering, printing, or roller coating. ^ The material of the insulating layer 40 may be an insulating organic material or a ceramic material, such as ^ 袠 y resin (Epoxy resin), polyimide, biscis butyric acid imide / triazine (Bismaleimide triazme) -based ^^^ or a composite material of glass fiber (G 1 assfibei ·), of course, the insulating layer 40 is not limited to being formed of only a single organic material, but may also be formed by stacking different insulating material layers The resistive film 42 includes a thick film (Thick fi lm) and a thin film (Thin Π lm) resistive material. The thick film resistive material is, for example, silver powder or carbon particles (CarboI1).

17098. ptd 第13頁 200416984 五、發明說明(7) _--一 partlcie)散布於樹脂中,及氧化舒(Ru〇2)與玻璃粉末散 布在一黏結劑(Binder)塗佈再固化而形成;該薄膜電阻材 料係如鎳鉻(Nl-Ci·)、鎳磷(Nl-P)、鎳錫(Nl_Sn)、、鉻鋁 (Cr-Al)、及氮化鈦(TaN)合金等,其可藉由濺史 -(Sputtering)、電鍍 (Electr〇less plating)等方式形成。 又 如第3D圖所示,圖案化該載有電阻膜42及農 四導電金屬層34以形成第四電路層34a與電電、表H 在該基板結構中完成鑲埋有電阻元件42a,並: 耆=3a中形成至少一貫穿表面之開口 5〇,'二弟 *置電子元件之收納空間。 乍為後、,、貝 如第3E圖所示,同時另於至少一笛一 σο 一 形成有至少一導電孔43以電性連接形成;:y !板3b中 第一 5五&與第六電路層36a。卷妙,哆 弟-早=路板亦可因應實際設計需;:遠 ^與第六電路層^上,分別間隔===五電路^ 二:】37a與第八電路層3δ"該第七電二成有第七 :路層38a係藉由形成於絕緣層4〇之導電曰碘第八 ‘4以電,生連接至該第五電路層35a與第六電路層;:n“ia) 如第3G圖所示,結合該第—單元 a a。 ?!路板3b,俾使該第-單元電路板開口 50之3二:第二單 ^早以路板綱封閉,而形成—收納凹=側為該第 第-早元電路板仏之第八電路層…上間隔一絕緣17098. ptd Page 13 200416984 V. Description of the invention (7) _-- a partlcie) is dispersed in the resin, and oxide (Ru〇2) and glass powder are dispersed in a binder (Binder) and then cured to form ; The thin film resistance material is such as nickel chromium (Nl-Ci ·), nickel phosphorus (Nl-P), nickel tin (Nl_Sn), chromium aluminum (Cr-Al), and titanium nitride (TaN) alloy, etc., which It can be formed by sputtering, electroless plating, or the like. As shown in FIG. 3D, the resistive film 42 and the Nongsi conductive metal layer 34 are patterned to form a fourth circuit layer 34a and electricity and electricity. The resistive element 42a is embedded in the substrate structure, and:耆 = 3a forms at least one opening 50 penetrating the surface, and the second electronic device storage space is provided. At first glance, as shown in FIG. 3E, at least one conductive hole 43 is formed at the same time as at least one flute and one σο, and is formed by electrical connection; y! The first five five of the plate 3b & Six circuit layers 36a. Wonderful, younger brother-early = circuit board can also meet the actual design needs ;: distance ^ and the sixth circuit layer ^, the interval === five circuits ^ two:] 37a and the eighth circuit layer 3δ " the seventh Electricity is twenty-seventh: the circuit layer 38a is electrically connected to the fifth circuit layer 35a and the sixth circuit layer through the conductive iodine eighth '4 formed on the insulating layer 40;: n "ia) As shown in FIG. 3G, the first unit aa is combined.?! The circuit board 3b, so that the first unit circuit board opening 50-2: The second unit ^ is closed with the road board outline as soon as possible to form an accommodation recess. = The eighth circuit layer of the first-early circuit board 仏 on the side is separated by an insulation

200416984 五、發明說明(8) 成有第九導電金屬層3 9。當缺,該第一 5〇亦可形成於該第二單元電路板3b中,:=電路板之開口 單元電路板3a與具開口之第二單元電路 ^於接合該第一 第二單元電路板3b之開口—側為該第—Μ時,得以使該 閉,以形成一收納空間。該凹部5〇a可供凡結電路板3a所封 連接有如半導體晶片等電子元件至該基板、'只接置並電性 半導體裝置之整體厚度。 ’俾有效降低 如第3H圖所示,於基板預定處形成有多數舟* 基板表面之電鍍導通孔(PTH)45,該等電鍍 貝牙^ ί衣 供電性連接至形成於該電容膜4丨與電阻膜4 2^1 一糸σ 路層。該電鑛導通孔45係可利用機械或雷:鑽孔、面 mlng)以形成通孔45a,並對該封裝基板外側及通 孔45a表面形成一如鍍鎳層或鍍銅層等金屬導声 =填充材料45c’例如環氧樹脂(Epoxy)等絕緣3材質或錫200416984 V. Description of the invention (8) A ninth conductive metal layer 39 is formed. When it is absent, the first 50 may also be formed in the second unit circuit board 3b: == the opening unit circuit board 3a of the circuit board and the second unit circuit having the opening ^ to join the first second unit circuit board When the opening-side of 3b is the -M, the opening can be closed to form a storage space. The recessed portion 50a can be used to seal the junction circuit board 3a and connect electronic components such as semiconductor wafers to the substrate, and the thickness of the semiconductor device is only connected and electrically connected. '俾 Effectively reduce as shown in Figure 3H, a plurality of boats are formed at predetermined locations on the substrate * The plated-through holes (PTH) 45 on the substrate surface are provided, and these electroplated shells are electrically connected to the capacitor film 4 丨糸 σ circuit layer with the resistance film 4 2 ^ 1. The electrical mine vias 45 can be mechanically or mechanically (drilled, millimeter) to form the vias 45a, and form a metal conductive sound such as a nickel-plated layer or a copper-plated layer on the outside of the package substrate and the surface of the vias 45a. = Filling material 45c ', such as epoxy 3 (Epoxy), insulation 3 material or tin

Paste)等導電材質填滿通孔45a,以形成一 电鍍導通孔4 5。 如第31圖所示,圖案化該基板表面之第九導電金屬i 3 9與載有電容膜4丨之第三導電金屬層33,以形成有第九^ 路層39 a以及第三電路層33 a與至少一電容元件之一平行板 3 3b,配合先前圖案化第一電路層3丨8中之另一平行板 3 1 b ’俾完成該電容元件4 1 a鑲埋於該封裝基板1 〇 〇中,並 使該第九電路層3 9 a可藉由盲孔4 4以電性連接至封裝基板 内部之電路層。而該基板][0 0可應用於覆晶式(F丨i p Ch丨p ) 封衣基板’亦或一般之打線式(W i r e b ο n d i n g )封裝基板。A conductive material such as Paste) is used to fill the through hole 45a to form a plated through hole 45. As shown in FIG. 31, the ninth conductive metal i 3 9 and the third conductive metal layer 33 carrying the capacitor film 4 are patterned on the surface of the substrate to form a ninth circuit layer 39 a and a third circuit layer. 33 a and one parallel plate 3 3b of at least one capacitor element, cooperate with another parallel plate 3 1 b in the first patterned first circuit layer 3 丨 8 to complete the capacitor element 4 1 a embedded in the package substrate 1 And the ninth circuit layer 39a can be electrically connected to the circuit layer inside the package substrate through the blind hole 44. And the substrate] [0 0 can be applied to a flip-chip type (F 丨 i pCh 丨 p) coating substrate 'or a general wire-type (W i r e b ο n d i n g) packaging substrate.

第15頁 17098·Ptd 2UU416984 五、發明說明(9) 藉由上述本發明之内嵌被動元件 ;-^ ^ . , 〇 〇,^ ^ ^" 電路板3a與第二單元電路板3b,且該 括有:弟一早兀 有至少一貫穿表面之開ϋ該第t早:電路板3接 ,住該第-單S電路板_ σ 5()之_側,ς G —收納凹部5 a ;複數之圖案化電路層 夕 y 43L^2^3* Γ3, 35a,36" 3?a> 383> 39^ ^ ^ ^ 4〇以§又置於豐合之二單元電路板内部;至少一兩六 至少一電阻膜42係形成於該第一單元電 电,^ 41二 _性連接第二單元電路板3b電路層之導電盲孔a44夕】z i ,個貫穿該封裝基板1〇〇之電鍍導通孔(ρτΗ),可供電性連 層至形成於该電容膜41與電阻膜42至少一者表面之電路 笮其弟此:Γ電路板3a或第二單元電路板3b係可選自銅Page 15 17098 · Ptd 2UU416984 V. Description of the invention (9) With the above-mentioned embedded passive component of the present invention;-^ ^., 〇〇, ^ ^ ^ " Circuit board 3a and second unit circuit board 3b, and The brackets include: the younger one has at least one opening through the surface, the first t: the circuit board 3 is connected, and the first-single S circuit board _ σ 5 () side, ς G-receiving recess 5 a; Plural patterned circuit layers y 43L ^ 2 ^ 3 * Γ3, 35a, 36 " 3? A > 383 > 39 ^ ^ ^ ^ 4〇 It is placed inside the full-fledged second unit circuit board; at least one or two Six at least one resistive film 42 are formed in the first unit, and are electrically conductive blind holes a44 connected to the circuit layer of the second unit circuit board 3b] zi, a plated through through the package substrate 100 Hole (ρτΗ), which can be electrically connected to the circuit formed on at least one of the capacitor film 41 and the resistor film 42. The younger brother: Γ circuit board 3a or the second unit circuit board 3b may be selected from copper

St '或於FR — 4樹脂、FR — 5樹脂、環氧樹 ^ β η ~二二3 ^、玻璃纖維等絕緣性材料表面鑛覆銅猪 層之銅箔樹脂層辇M + 、, 匕 - 等導電金屬層,加以線路圖案化其表面之銅遠 複數電路層之多層電::雙層電路板,亦可形成-堆疊有 ,么 層 Μ3,32、338,343,358,368,373,383,3·1 爲1 ;由^之鋼層’以形成於該絕緣層4 0上,而該絕緣 材質箄電性0络纖維強化有機材質或顆料強化有機 何貝寺迅I巴緣材料所構成。 ΰ亥導目孔4 4係形成於絕緣層4 0中,其可藉由機械鑽St 'or copper foil resin layer 辇 M + on the surface of FR-4 resin, FR-5 resin, epoxy resin ^ β η ~ 22 3 ^, glass fiber and other insulating materials, copper-clad pig layer And other conductive metal layers, and pattern the circuit with copper on the surface and multiple circuit layers of multiple layers of electricity :: a double-layer circuit board, which can also be formed-stacked, with the layer M3,32,338,343,358,368,373,383,3 · 1 being 1; The steel layer 'is formed on the insulating layer 40, and the insulating material is made of an electric 0-fiber reinforced organic material or a particle reinforced organic Hobesixun I bayan material. The eye-opening holes 44 are formed in the insulating layer 40, which can be drilled with a mechanical drill.

17098.ptd 第16頁 200416984 五、發明說明(ίο) 孔或雷射鑽孔等方式形成,且於該絕緣層4 0上藉由電鍍、 無電鍍或濺鍍等方式形成至少一導電金屬層,並使該導電 金屬層可全部或部分覆蓋至該導電盲孔4 4,俾藉由該導電 盲孔4 4及導電孔4 3以電性連接該絕緣層兩側之電路層。 該電容膜4 1係選自介電常數大之高介電層,其係由如 高分子材料、陶瓷材料、陶瓷粉末填充之高分子及其相似 物所製成,通常介電常數大於5即可適用,當然,介電常 數值越高越好,其材料可例如為鈦酸鋇、鈦酸鍅鉛、無定 形氫化碳,或其粉末散佈於黏結劑中,如樹脂、玻璃粉末 等,亦可利用濺鍍、印刷或滾輪旋塗等方式成形。且該半 導體封裝基板所需電容值之大小,可依所使用之電容膜4 1 材質及形成於該電容膜4 1相對表面之平行板3 1 b,3 3 b間所 夾合之電容元件4 1 a尺寸加決定。 該電阻膜42包含有厚膜(Thick fi lm)及薄膜(Thin f i 1 m)電阻被動元件,而該厚膜電阻材料係如銀粉或碳顆 粒散布於樹脂中,及氧化釕與玻璃粉末散布在一黏結劑塗 佈再固化而形成;相對該薄膜電阻材料係如錄絡、錄碟、 錄錫、鉻銘、及氮化鈦合金等,藉由錢鍍、電鍍或無電鍍 等方式形成。而選擇使用厚膜電阻器或使用薄膜電阻器, 則是以製作多層電路板之製作成本與所製作被動元件之電 性精確度來決定。且該半導體封裝基板所需電阻值之大 小,可依所使用之電阻膜4 2材質及形成於該電阻膜4 2上之 電極34b間相距之電阻元件42a尺寸加決定。 透過本發明之内嵌被動元件之半導體封裝基板製作方17098.ptd Page 16 200416984 V. Description of the invention (ίο) Holes or laser drilling are formed, and at least one conductive metal layer is formed on the insulating layer 40 by electroplating, electroless plating or sputtering, etc. The conductive metal layer can be wholly or partially covered to the conductive blind hole 44, and the conductive blind layer 44 and the conductive hole 43 can be electrically connected to the circuit layers on both sides of the insulating layer. The capacitor film 41 is selected from a high-dielectric layer having a large dielectric constant, and is made of a polymer material such as a polymer material, a ceramic material, a ceramic powder, and the like. Generally, the dielectric constant is greater than 5; Applicable. Of course, the higher the dielectric constant value, the better. The material can be, for example, barium titanate, lead hafnium titanate, amorphous hydrogenated carbon, or a powder thereof dispersed in a binder such as resin, glass powder, etc. Can be formed by sputtering, printing or roller spin coating. And the capacitance value required for the semiconductor package substrate can be based on the material of the capacitor film 4 1 used and the capacitor element 4 sandwiched between the parallel plates 3 1 b and 3 3 b formed on the opposite surface of the capacitor film 41. 1 a size plus decision. The resistive film 42 includes thick film (Thick fi lm) and thin film (Thin fi 1 m) resistive passive elements, and the thick film resistive material is such as silver powder or carbon particles dispersed in resin, and ruthenium oxide and glass powder are dispersed in An adhesive is formed by coating and then curing. In contrast, the thin film resistance material is formed by means of coin plating, electroplating, or electroless plating, such as recording, recording, tin recording, chromium inscription, and titanium nitride alloy. The choice of using a thick film resistor or a thin film resistor is determined by the manufacturing cost of the multilayer circuit board and the electrical accuracy of the passive components. And the magnitude of the required resistance value of the semiconductor package substrate can be determined by the size of the resistance element 42a of the used resistance film 42 and the distance between the electrodes 34b formed on the resistance film 42. Passive component-embedded semiconductor package substrate manufacturing method of the present invention

17098. ptd 第17頁 200416984 五、發明說明(11) - 法-所得之=板’係將i少一膜 件鑲埋於基板中’以提昇半導體^件與至少一電容元 量與電性功能’ @時增加基板線路件之佈設數 <避免被動元件受高邊與模流影::活:’另外,亦 之現象,以降低銲接_難产,、g向偏位,甚而發生短路 引發短路,亦得以縮起锃避免銲線直接觸及被動元件 再者’藉由結合該第〜單:二孤長度,以節省銲接成本。 益使該第二單元電路杈 =板與该第二單元電路板, 側,以形成一内嵌有帝蹬,住第一單元電路板開口之 _至少具有一凹部之多】電容膜等被動元件以及表 軍元件收納並電性連二:,俾供如半導體晶 —·… ΐ ::電路板之凹部内,藉以縮 短半導體封裝件整體^ 该夕層電路板之凹 裝件輕薄短 同時具高電性之目的:度’達到該半導體封 先前圖式中僅以 電阻膜、:容膜以及電電容膜表示,實際上該 際製程所需而加以設 二=數目以及相對位置,係依 單元電路板之開口 ^ ^基板之疊層間,且二 於接合該第-單元Π 第二單元電路板中二ί 得以,該第二單元電路板^開二二二單元電路板時, • μ’以形成—故納空間:^亥第一單元電路板 僅係用以例釋本發明之特點及上所述之具體實施例, 之<實施料,在未脫離本發明定本發明 下m用本發明所揭示内c神與技術範嘴 ,飾’均仍應為下述之t請專利等效改變及修17098. ptd Page 17 200416984 V. Description of the invention (11)-Method-Result = board 'Built i less one film piece in the substrate' to enhance the semiconductor element and at least one capacitor element and electrical function '@ 时 Increase the number of printed circuit board components < Avoid passive components from high sides and mold flow shadow :: Live:' In addition, the phenomenon to reduce welding _ difficult to produce, g-direction deviation, and even short circuit caused The short circuit can also be retracted, avoiding the direct contact of the welding wire and the passive components, and then 'saving the welding cost by combining the first to the second single length. To make the second unit circuit board = the board and the second unit circuit board, to form a built-in imperial pedal, to hold the opening of the first unit circuit board _ at least one recessed part] capacitors and other passive components And the military component storage and electrical connection two :, such as semiconductor crystal -... ΐ :: in the recessed part of the circuit board, thereby shortening the overall semiconductor package ^ The recessed parts of the circuit board are thin, short and high The purpose of electrical properties: to achieve the degree of the semiconductor package. In the previous drawings, only the resistance film, the capacitive film, and the capacitive film are used. In fact, it is necessary to set two = number and relative position in the current process, which is based on the unit circuit. The opening of the board ^ ^ between the laminates of the substrate, and the second unit circuit board is connected to the second unit circuit board. When the second unit circuit board is opened, the two unit circuit boards are formed. —Introduction space: The first unit circuit board is only used to illustrate the features of the present invention and the specific embodiments described above, and < implementation materials, without deviating from the present invention and using the present invention. Reveal the inner c god and technology fan mouth, decorated ' Please t should remain below the equivalent patent change and repair

200416984 圖式簡單說明 【圖式簡單說明】: 第1圖係為習知將被動元件安置於半導體晶片接置區 域外 之 基 板 額 外 佈 局 面 積上 之示意圖 , 第 2圖係為習知將被動元件整合至 半 導 體 晶 片 與 銲接 區域 間 之 剖 面 示 意 圖 以及 第 3A圖 至 3 : I圖 係 本 發明 之内嵌被動元件之半導體封裝 基板 製 作 方 法 示 意 圖 〇 1,2, 100 基 板 11,21 半 導 體 晶 片 12,22 被 動 元 件 23 銲 線 24 封 裝 樹 脂 3a 第 — 單 元 電 路 板 3b 第 - 早 元 路 板 30 絕 緣 樹 脂 層 3 0a 上 表 面 30b 下 表 面 31 第 一 導 電 金 屬 層 32 第 二 導 電 金 屬 層 33 第 -—- 導 電 金 屬 層 34 第 四 導 電 金 屬 層 39 第 九 導 電 金 屬 層 31a 第 一 電 路 層 32a 第 二 電 路 層 33a 第 二 電 路 層 34a 第 四 電 路 層 3 5a 第 五 電 路 層 36a 第 電 路 層 37a 第 七 電 路 層 3 8a 第 八 電 路 層 3 9a 第 九 電 路 層 31b, 33b 平 行 板 34b 阻 電 極 40 絕 緣 層 41 電 容 膜 42 電 阻 膜 41a 電 容 元 件 42a 電 阻 元 件 43 導 孔200416984 Brief description of the drawings [Simplified description of the drawings]: Figure 1 is a schematic diagram of the conventional layout of passive components placed outside the semiconductor wafer receiving area on the additional layout area of the substrate, and Figure 2 is a conventional method of integrating passive components The schematic cross-sections between the semiconductor wafer and the soldering area and Figures 3A to 3: I are schematic diagrams of the method for manufacturing a semiconductor package substrate with embedded passive components of the present invention. 1,2, 100 substrates 11, 21 semiconductor wafers 12, 22 passive Component 23 Welding wire 24 Encapsulation resin 3a First-Unit circuit board 3b First-Early circuit board 30 Insulating resin layer 3 0a Upper surface 30b Lower surface 31 First conductive metal layer 32 Second conductive metal layer 33 First-conductive metal Layer 34 fourth conductive metal layer 39 ninth conductive metal layer 31a first circuit layer 32a second circuit layer 33a second circuit layer 34a fourth circuit layer 3 5a fifth circuit Layer 36a, circuit layer 37a, seventh circuit layer 3 8a, eighth circuit layer 3 9a, ninth circuit layer 31b, 33b parallel plate 34b, resistive electrode 40, insulating layer 41, capacitive film 42, resistive film 41a, capacitive element 42a, resistive element 43, via hole

17098.ptd 第19頁 200416984 圖式簡單說明 4 4* 盲 子L 45 電 鍍 導 通 子L 45a 通 子L 45b 金 屬 導 電 層 45c 填 充材料 50 開 V 5 0a 凹 部17098.ptd Page 19 200416984 Brief description of the diagram 4 4 * Blind L 45 Electroplated Conductor L 45a Passive L 45b Metallic Conductive Layer 45c Filling Material 50 Open V 5 0a Recess

17098.ptd 第20頁17098.ptd Page 20

Claims (1)

200416984 六、申請專利範圍 1 . 一種内嵌被動元件之半導體封裝基板製作方法,係包 括: 提供至少一第一單元電路板,並於其表面之電路 層上分別壓合有一載有電容膜之導電金屬層以及一藉 由絕緣層與該單元電路板間隔而載有電阻膜之導電金 屬層; 圖案化第一單元電路板之電阻膜及其表面之導電 金屬層; 提供至少一第二單元電路板,係形成有間隔絕緣 層疊置之複數電路層,藉由形成於内部之複數個導電 孔與盲孔以電性連接各電路層,並於該第一單元電路 板及第二單元電路板之任一者中形成有至少一貫穿電 路板之開口;以及 結合該第一單元電路板與第二單元電路板,俾使 該一單元電路板開口之一側為另一單元電路板所封閉 凹 一 第 少圍 至範 有利 成專 形請 以申 ,如 2 β, 立口 :復 法 方 作 製 板 基 裝 封 體 導 半 之 項 行平 進之 ,件 後元 板容 路電 電成 元形 單以 二層 第屬 與金 板電 路導 電之 元面 單表 一 膜 第容 該電 合化 結案 於圖 半後 板 項4 h平 第之 圍件 範元 利容 專電 。請成 板申形 行如於 3 法 方 作 製 板 基 裝 封 體 導 復 之 板 基 亥 =° 穿 貫 數 多 成 形 阻 電 與 膜 容 電 該 於 成 形 至 接。 連層 性路 電電 供之 可面 ,表 孔者 通一 導少 M至 電膜200416984 VI. Application for Patent Scope 1. A method for manufacturing a semiconductor package substrate with embedded passive components, comprising: providing at least a first unit circuit board, and respectively laminating a conductive film carrying a capacitor film on a circuit layer on the surface thereof; A metal layer and a conductive metal layer carrying a resistance film through an insulation layer spaced from the unit circuit board; patterning the resistance film of the first unit circuit board and a conductive metal layer on the surface thereof; providing at least one second unit circuit board Is formed by a plurality of circuit layers with spaced insulation and stacking, and the circuit layers are electrically connected by a plurality of conductive holes and blind holes formed in the interior, and are placed on any one of the first unit circuit board and the second unit circuit board. One is formed with at least one opening penetrating the circuit board; and the first unit circuit board and the second unit circuit board are combined so that one side of the opening of the one unit circuit board is closed and recessed by the other unit circuit board. Shao Wei to Fan Licheng become a special form, please apply, such as 2 β, Likou: the compound method to make the plate base package guide half of the line, Houyuan Banrong Road is a two-layer electric element with a single-layer sheet that is conductive to the gold plate circuit. It has a membrane that allows the battery to be closed. The case is shown in Figure 4 at the rear panel item. Dedicated electricity. Please make a plate application like the three methods to make the plate base package package guide. The plate base = = ° has a large number of penetrations. Forming resistance and film capacitance should be formed to the ground. The layered circuit can be supplied with electricity, and the surface of the hole can be connected to the membrane by M. 17098.ptd 第21頁 200416984 六、申請專利範圍 4如申請專利範圍第3項之半導體封裝基板製作方法,其 中,該圖案化電阻膜表面之導電金屬層係可形成為電 阻元件之電極。 5 .如申請專利範圍第4項之半導體封裝基板製作方法,復 - 於完成圖案化電阻膜表面之導電金屬層後,可形成至 少一絕緣層與導電盲孔,該導電盲孔可與電阻元件之 電極導通。 6 .如申請專利範圍第1項之半導體封裝基板製作方法,其 中,該單元電路板係為一雙層電路板及多層電路板之 f 任一者。 .如申請專利範圍第1項之半導體封裝基板製作方法,其 中,該電阻膜為厚膜(Thick f 1 lm)及薄膜(Thin f i lm) 電阻材料之任一者。 8 .如申請專利範圍第7項之半導體封裝基板製作方法,其 中,該厚膜電阻材料係為銀粉(S i 1 v e r ρ 〇 w d e r )、碳顆 粒(Carbon particle )散布於樹脂中,及氧化釕(R u〇2 ) 與玻璃粉末散布在一黏結劑(B i n d e r )之任一者塗佈固 气 化而形成。 9.如申請專利範圍第7項之半導體封裝基板製作方法,其 φ 中,該薄膜電阻材料係為鎳鉻(N i - C r )、鎳磷(N i - P )、 錄錫(Ni-Sn)、鉻is (Cr-Al)、及氮化鈦(TaN)合金所組 群組之任一者。 1 〇 .如申請專利範圍第1項之半導體封裝基板製作方法,其 - 中,該電容膜係由高分子材料、陶瓷材料、陶瓷粉末17098.ptd Page 21 200416984 6. Scope of patent application 4 The method for manufacturing a semiconductor package substrate according to item 3 of the patent application scope, wherein the conductive metal layer on the surface of the patterned resistive film can be formed as an electrode of a resistive element. 5. If the method for manufacturing a semiconductor package substrate according to item 4 of the patent application scope, after the conductive metal layer on the surface of the patterned resistive film is completed, at least one insulating layer and a conductive blind hole can be formed, and the conductive blind hole can be connected with the resistive element. The electrodes are turned on. 6. The method for manufacturing a semiconductor package substrate according to item 1 of the scope of patent application, wherein the unit circuit board is any one of a double-layer circuit board and a multilayer circuit board. The method for manufacturing a semiconductor package substrate according to item 1 of the application, wherein the resistive film is any of a thick film (Thick f 1 lm) and a thin film (Thin f i lm) resistive material. 8. The method for manufacturing a semiconductor package substrate according to item 7 of the scope of patent application, wherein the thick film resistor material is silver powder (S i 1 ver ρ ωwder), carbon particles (Carbon particles) are dispersed in the resin, and ruthenium oxide (R u〇 2) and glass powder are dispersed in a binder (B inder) and coated with solid gasification. 9. The method for manufacturing a semiconductor package substrate according to item 7 of the scope of patent application, wherein in φ, the thin film resistance material is nickel chromium (N i-C r), nickel phosphorus (N i-P), and tin (Ni- Sn), chromium is (Cr-Al), and a titanium nitride (TaN) alloy. 10. The method for manufacturing a semiconductor package substrate according to item 1 of the scope of patent application, wherein the capacitor film is made of a polymer material, a ceramic material, and a ceramic powder. 17098.ptd 第22頁 200416984 六、申請專利範圍 填充之高分子及其相似物之混合物所構成。 1 1.如申請專利範圍第1項之半導體封裝基板製作方法,其 中,該電容膜係為鈦酸鋇(B a r i u m - t i t a n a t e )、鈦酸錯 金口匕(Lead — zirconate — titanate)、無定形氮 4 匕石炭 (Amorphous hydrogenated carbon ) ?及其粉末之任一 者散佈於黏結劑(B i n d e r )中所構成。 1 2 . —種内嵌被動元件之半導體封裝基板,至少包括: 至少一第一單元電路板與一第二單元電路板,於 該二單元電路板之任一者中形成有至少一貫穿電路板 之開口 ,俾使該一單元電路板開口之一側為另一單元 電路板所封閉,以形成有至少一凹部; 複數層圖案化導電金屬層形成電路層,彼此藉絕 緣層相間隔以堆疊於各單元電路板; ,至少一圖案化電阻膜與至少一電容膜,係形成於 該第一單元電路板;以及 複數個電鍍導通孔,係形成於該基板中,可供電 性導接相關圖案化之導電金屬層、電阻膜與電容膜。~ 1 3 .如申請專利範圍第1 2項之半導體封裝基板,其中,該 圖案化之電阻膜表面具有圖案化之導電金屬層,係可 為電阻元件之電極。 1 4 .如申請專利範圍第1 2項之半導體封裝基板,其中,該 電容膜表面具有圖案化之導電金屬層,係可為電容元 件之平行板。 1 5 .如申請專利範圍第1 3項之半導體封裝基板,其中,電17098.ptd Page 22 200416984 6. Scope of patent application Composed of a mixture of filled polymers and their analogs. 1 1. The method for manufacturing a semiconductor package substrate according to item 1 of the scope of patent application, wherein the capacitor film is barium titanate, lead — zirconate — titanate, amorphous Nitrogen 4 Amorphous hydrogenated carbon (Amorphous hydrogenated carbon)? And its powder is dispersed in the binder (B inder). 1 2. A semiconductor package substrate with embedded passive components, at least including: at least a first unit circuit board and a second unit circuit board, and at least one through circuit board is formed in any one of the two unit circuit boards. The opening is such that one side of the opening of the unit circuit board is closed by another unit circuit board to form at least one recess; a plurality of layers of patterned conductive metal layers form a circuit layer, which are spaced apart from each other by an insulating layer to be stacked on Each unit circuit board; at least one patterned resistance film and at least one capacitor film are formed on the first unit circuit board; and a plurality of plated through-holes are formed in the substrate to provide power-supply conductive patterning. Conductive metal layer, resistance film and capacitor film. ~ 1 3. The semiconductor package substrate according to item 12 of the patent application scope, wherein the surface of the patterned resistive film has a patterned conductive metal layer, which can be an electrode of a resistive element. 14. The semiconductor package substrate according to item 12 of the scope of patent application, wherein the surface of the capacitor film has a patterned conductive metal layer, which can be a parallel plate of a capacitor element. 15. The semiconductor package substrate according to item 13 of the scope of patent application, wherein 17098.ptd 第23頁 200416984 六、申請專利範圍 '阻膜表面圖案化之導電金屬層之表面,可形成至少一 絕緣層與導電盲孔,該導電盲孔可與電阻元件之電極 導通。 1 6 .如申請專利範圍第1 4項之半導體封裝基板,其中,電 ^ 容膜表面圖案化之導電金屬層之表面,可形成至少一 絕緣層與導電盲孔,該導電盲孔可與電容元件之平行 板導通。 1 7 .如申請專利範圍第1 2項之半導體封裝基板,其中,該 基板表面可增層至少一導電金屬層。 g .如申請專利範圍第1 2項之半導體封裝基板,其中,該 ’單元電路板係為一雙層電路板及多層電路板之任一者 〇 1 9 .如申請專利範圍第1 2或1 3項之半導體封裝基板,其中 ,該電阻膜為厚膜(Thick film)及薄膜(Thin film)電 阻材料之任一者。 2 〇 .如申請專利範圍第1 9項之半導體封裝基板,其中,該 * ^ 厚膜電阻材料係為銀粉(S i 1 v e r ρ 〇 w d e r )、碳顆粒 , (Carbon particle )散布於樹脂中,及氧化釕(R u〇2 )與 玻璃粉末散布在一黏結劑(B i n d e r )之任一者塗佈固化 _ 而形成。 2 1 .如申請專利範圍第1 9項之半導體封裝基板,其中,該 薄膜電阻材料係為鎳鉻(Ni-Cr)、鎳磷(Νι-Ρ)、鎳錫 (Ni-Sn)、鉻鋁(Cr-A1 )、及氮化鈦(TaN)合金所組群組 ' 之任一者。17098.ptd Page 23 200416984 6. Scope of patent application 'The surface of the conductive metal layer patterned on the surface of the resist film can form at least an insulating layer and a conductive blind hole, and the conductive blind hole can be connected to the electrode of the resistive element. 16. The semiconductor package substrate according to item 14 of the scope of patent application, wherein at least one insulating layer and a conductive blind hole can be formed on the surface of the conductive metal layer patterned on the surface of the capacitor film, and the conductive blind hole can be used with a capacitor. The parallel plates of the components are turned on. 17. The semiconductor package substrate according to item 12 of the patent application scope, wherein at least one conductive metal layer can be added on the surface of the substrate. g. The semiconductor package substrate of item 12 in the scope of patent application, wherein the 'unit circuit board is any one of a double-layer circuit board and a multilayer circuit board. 0 1 9 The semiconductor package substrate according to item 3, wherein the resistive film is any one of a thick film and a thin film resistive material. 2 〇. The semiconductor package substrate according to item 19 of the scope of patent application, wherein the * ^ thick film resistor material is silver powder (S i 1 ver ρ ωwder), carbon particles, (Carbon particle) dispersed in the resin, And ruthenium oxide (Ru 2) and glass powder are dispersed and spread on a binder (B inder) to form a coating. 2 1. The semiconductor package substrate according to item 19 of the patent application scope, wherein the thin film resistor material is nickel-chromium (Ni-Cr), nickel-phosphorus (Ni-P), nickel-tin (Ni-Sn), chromium-aluminum (Cr-A1), and titanium nitride (TaN) alloys. 17098.ptd 第24頁 20041698417098.ptd p. 24 200416984 17098.ptd 第25頁17098.ptd Page 25
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112261743A (en) * 2020-10-21 2021-01-22 云南中烟工业有限责任公司 Ni-based thick film heating element with in-situ formation of alumina insulating layer and preparation method thereof
TWI820545B (en) * 2020-12-25 2023-11-01 國立大學法人東京工業大學 Semiconductor device and manufacturing method thereof
TWI896207B (en) * 2024-01-23 2025-09-01 欣興電子股份有限公司 Substrate structure and manufacturing method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112261743A (en) * 2020-10-21 2021-01-22 云南中烟工业有限责任公司 Ni-based thick film heating element with in-situ formation of alumina insulating layer and preparation method thereof
CN112261743B (en) * 2020-10-21 2022-08-12 云南中烟工业有限责任公司 Ni-based thick film heating element with in-situ formation of alumina insulating layer and preparation method thereof
TWI820545B (en) * 2020-12-25 2023-11-01 國立大學法人東京工業大學 Semiconductor device and manufacturing method thereof
TWI896207B (en) * 2024-01-23 2025-09-01 欣興電子股份有限公司 Substrate structure and manufacturing method thereof

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