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SG81281A1 - Plasma thin-film deposition method - Google Patents

Plasma thin-film deposition method

Info

Publication number
SG81281A1
SG81281A1 SG9902504A SG1999002504A SG81281A1 SG 81281 A1 SG81281 A1 SG 81281A1 SG 9902504 A SG9902504 A SG 9902504A SG 1999002504 A SG1999002504 A SG 1999002504A SG 81281 A1 SG81281 A1 SG 81281A1
Authority
SG
Singapore
Prior art keywords
deposition method
film deposition
plasma thin
plasma
thin
Prior art date
Application number
SG9902504A
Inventor
Risa Nakase
Takeshi Aoki
Akira Suzuki
Yoshihiro Kato
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to SG9902504A priority Critical patent/SG81281A1/en
Publication of SG81281A1 publication Critical patent/SG81281A1/en

Links

SG9902504A 1999-05-19 1999-05-19 Plasma thin-film deposition method SG81281A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG9902504A SG81281A1 (en) 1999-05-19 1999-05-19 Plasma thin-film deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG9902504A SG81281A1 (en) 1999-05-19 1999-05-19 Plasma thin-film deposition method

Publications (1)

Publication Number Publication Date
SG81281A1 true SG81281A1 (en) 2001-06-19

Family

ID=20430365

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9902504A SG81281A1 (en) 1999-05-19 1999-05-19 Plasma thin-film deposition method

Country Status (1)

Country Link
SG (1) SG81281A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0528540A2 (en) * 1991-07-22 1993-02-24 Dow Corning Corporation Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes
EP0768388A2 (en) * 1995-10-12 1997-04-16 Nec Corporation Method and apparatus for forming amorphous carbon film
WO1999019533A1 (en) * 1997-10-10 1999-04-22 Applied Materials, Inc. Method of depositing an amorphous fluorocarbon film using hdp-cvd

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0528540A2 (en) * 1991-07-22 1993-02-24 Dow Corning Corporation Thin-film coatings made by means of plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes
EP0768388A2 (en) * 1995-10-12 1997-04-16 Nec Corporation Method and apparatus for forming amorphous carbon film
WO1999019533A1 (en) * 1997-10-10 1999-04-22 Applied Materials, Inc. Method of depositing an amorphous fluorocarbon film using hdp-cvd

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