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SG81992A1 - Plasma thin-film deposition method - Google Patents

Plasma thin-film deposition method

Info

Publication number
SG81992A1
SG81992A1 SG9902570A SG1999002570A SG81992A1 SG 81992 A1 SG81992 A1 SG 81992A1 SG 9902570 A SG9902570 A SG 9902570A SG 1999002570 A SG1999002570 A SG 1999002570A SG 81992 A1 SG81992 A1 SG 81992A1
Authority
SG
Singapore
Prior art keywords
deposition method
film deposition
plasma thin
plasma
thin
Prior art date
Application number
SG9902570A
Inventor
Risa Nakase
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to SG9902570A priority Critical patent/SG81992A1/en
Publication of SG81992A1 publication Critical patent/SG81992A1/en

Links

SG9902570A 1999-05-25 1999-05-25 Plasma thin-film deposition method SG81992A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG9902570A SG81992A1 (en) 1999-05-25 1999-05-25 Plasma thin-film deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG9902570A SG81992A1 (en) 1999-05-25 1999-05-25 Plasma thin-film deposition method

Publications (1)

Publication Number Publication Date
SG81992A1 true SG81992A1 (en) 2001-07-24

Family

ID=20430368

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9902570A SG81992A1 (en) 1999-05-25 1999-05-25 Plasma thin-film deposition method

Country Status (1)

Country Link
SG (1) SG81992A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63235463A (en) * 1987-03-23 1988-09-30 Mitsubishi Heavy Ind Ltd Metallic laminated coating film
EP0794569A2 (en) * 1996-03-07 1997-09-10 Nec Corporation Amorphous carbon film, formation process thereof, and semiconductor device making use of the film
US5698901A (en) * 1994-09-12 1997-12-16 Nec Corporation Semiconductor device with amorphous carbon layer for reducing wiring delay

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63235463A (en) * 1987-03-23 1988-09-30 Mitsubishi Heavy Ind Ltd Metallic laminated coating film
US5698901A (en) * 1994-09-12 1997-12-16 Nec Corporation Semiconductor device with amorphous carbon layer for reducing wiring delay
EP0794569A2 (en) * 1996-03-07 1997-09-10 Nec Corporation Amorphous carbon film, formation process thereof, and semiconductor device making use of the film

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