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SG10201500825SA - Method of low temperature imprinting process with high pattern transfer yield - Google Patents

Method of low temperature imprinting process with high pattern transfer yield

Info

Publication number
SG10201500825SA
SG10201500825SA SG10201500825SA SG10201500825SA SG10201500825SA SG 10201500825S A SG10201500825S A SG 10201500825SA SG 10201500825S A SG10201500825S A SG 10201500825SA SG 10201500825S A SG10201500825S A SG 10201500825SA SG 10201500825S A SG10201500825S A SG 10201500825SA
Authority
SG
Singapore
Prior art keywords
low temperature
pattern transfer
imprinting process
high pattern
transfer yield
Prior art date
Application number
SG10201500825SA
Inventor
Xu Yongan
Yee Low Hong
Original Assignee
Agency Science Tech & Res
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency Science Tech & Res filed Critical Agency Science Tech & Res
Publication of SG10201500825SA publication Critical patent/SG10201500825SA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG10201500825SA 2005-02-17 2006-02-16 Method of low temperature imprinting process with high pattern transfer yield SG10201500825SA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65392305P 2005-02-17 2005-02-17

Publications (1)

Publication Number Publication Date
SG10201500825SA true SG10201500825SA (en) 2015-04-29

Family

ID=38116983

Family Applications (3)

Application Number Title Priority Date Filing Date
SG201000739-1A SG159515A1 (en) 2005-02-17 2006-02-16 Method of low temperature imprinting process with high pattern transfer yield
SG200601037A SG125214A1 (en) 2005-02-17 2006-02-16 Method of low temperature imprinting process with high pattern transfer yield
SG10201500825SA SG10201500825SA (en) 2005-02-17 2006-02-16 Method of low temperature imprinting process with high pattern transfer yield

Family Applications Before (2)

Application Number Title Priority Date Filing Date
SG201000739-1A SG159515A1 (en) 2005-02-17 2006-02-16 Method of low temperature imprinting process with high pattern transfer yield
SG200601037A SG125214A1 (en) 2005-02-17 2006-02-16 Method of low temperature imprinting process with high pattern transfer yield

Country Status (2)

Country Link
US (2) US7901607B2 (en)
SG (3) SG159515A1 (en)

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* Cited by examiner, † Cited by third party
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JP4393244B2 (en) * 2004-03-29 2010-01-06 キヤノン株式会社 Imprint device
JP5377857B2 (en) * 2004-11-22 2013-12-25 ウィスコンシン・アラムナイ・リサーチ・ファウンデーション Method and composition for non-periodic pattern copolymer films
US8133534B2 (en) 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
SG159515A1 (en) * 2005-02-17 2010-03-30 Agency Science Tech & Res Method of low temperature imprinting process with high pattern transfer yield
KR100758699B1 (en) * 2005-08-29 2007-09-14 재단법인서울대학교산학협력재단 High aspect ratio nanostructure formation method and fine pattern formation method using the same
US8168284B2 (en) 2005-10-06 2012-05-01 Wisconsin Alumni Research Foundation Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates
US8618221B2 (en) * 2005-10-14 2013-12-31 Wisconsin Alumni Research Foundation Directed assembly of triblock copolymers
WO2009079241A2 (en) * 2007-12-07 2009-06-25 Wisconsin Alumni Research Foundation Density multiplication and improved lithography by directed block copolymer assembly
KR101012079B1 (en) * 2008-01-29 2011-02-07 이경욱 Photochromic photonic crystal structure, manufacturing method and apparatus therefor
WO2009146086A2 (en) * 2008-04-01 2009-12-03 Wisconsin Alumni Research Foundation Molecular transfer printing using block copolymers
WO2009128135A1 (en) * 2008-04-14 2009-10-22 株式会社島津製作所 Process for manufacturing light guide and process for manufacturing radiation detector
US8312609B2 (en) * 2008-07-23 2012-11-20 Seagate Technology, Llc Method of manufacturing a patterned media stamper
DK2329319T3 (en) * 2008-08-27 2013-10-21 Amo Gmbh IMPROVED NANOIMPRINT PROCEDURE
JP2010171338A (en) * 2009-01-26 2010-08-05 Toshiba Corp Pattern generation method, and pattern formation method
JP5528774B2 (en) * 2009-11-10 2014-06-25 住友化学株式会社 Method for manufacturing organic electroluminescence element
DE102011000437A1 (en) * 2011-02-01 2012-08-02 Dr. Ing. H.C. F. Porsche Aktiengesellschaft Manufacturing method for a flexible top cloth for a convertible
US9299381B2 (en) 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
US9718250B2 (en) 2011-09-15 2017-08-01 Wisconsin Alumni Research Foundation Directed assembly of block copolymer films between a chemically patterned surface and a second surface
KR101357087B1 (en) 2011-12-16 2014-02-04 (재)한국나노기술원 Method for Manufacturing 3-dimensional Nanostructures by Imprint Lithography and 3-dimensional Nanostructures thereby
US9005709B2 (en) * 2011-12-19 2015-04-14 Gwangju Institute Of Science And Technology Method for fabricating transfer printing substrate using concave-convex structure, transfer printing substrate fabricated thereby and application thereof
US9372398B2 (en) 2012-03-02 2016-06-21 Wisconsin Alumni Research Foundation Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers
WO2014145036A1 (en) * 2013-03-15 2014-09-18 The Trustees Of Princeton University Rapid and sensitive analyte measurement assay
JP6088803B2 (en) * 2012-11-16 2017-03-01 株式会社日立ハイテクノロジーズ Image processing apparatus, pattern generation method using self-organized lithography technology, and computer program
US9082625B2 (en) 2013-12-11 2015-07-14 International Business Machines Corporation Patterning through imprinting
KR101846236B1 (en) 2015-12-23 2018-04-09 (재)한국나노기술원 Manufacturing method of double-sided pattern and Transfer tape using double-sided pattern thereby
CN109116684A (en) * 2018-07-22 2019-01-01 北京工业大学 Transferable bonding PDMS base nanostructure preparation method
CN112927862B (en) * 2021-01-26 2022-08-02 青岛理工大学 High-performance large-area flexible transparent electrode and preparation method and application thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5269997A (en) * 1992-04-30 1993-12-14 The Procter & Gamble Company Method and apparatus for stamping plastic articles such as soap bars using elastomeric sheet separators
KR970004447B1 (en) * 1993-09-08 1997-03-27 삼성전자 주식회사 A method for forming anti-reflect-film and its application to manufacturing semiconductor devices
US5976444A (en) * 1996-09-24 1999-11-02 The United States Of America As Represented By The Secretary Of The Navy Nanochannel glass replica membranes
US6949199B1 (en) * 2001-08-16 2005-09-27 Seagate Technology Llc Heat-transfer-stamp process for thermal imprint lithography
US6757116B1 (en) * 2001-08-16 2004-06-29 Seagate Technology Llc Disk biasing for manufacture of servo patterned media
AU2003205104A1 (en) * 2002-01-11 2003-07-30 The Pennsylvania State University Method of forming a removable support with a sacrificial layers and of transferring devices
US20070059497A1 (en) * 2002-05-08 2007-03-15 Xudong Huang Reversal imprint technique
US7578954B2 (en) * 2003-02-24 2009-08-25 Corium International, Inc. Method for manufacturing microstructures having multiple microelements with through-holes
WO2004080887A1 (en) * 2003-03-07 2004-09-23 Massachusetts Institute Of Technology Three dimensional mecrofabrication
US6860956B2 (en) * 2003-05-23 2005-03-01 Agency For Science, Technology & Research Methods of creating patterns on substrates and articles of manufacture resulting therefrom
US8025831B2 (en) * 2004-05-24 2011-09-27 Agency For Science, Technology And Research Imprinting of supported and free-standing 3-D micro- or nano-structures
US7351346B2 (en) * 2004-11-30 2008-04-01 Agoura Technologies, Inc. Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths
SG159515A1 (en) * 2005-02-17 2010-03-30 Agency Science Tech & Res Method of low temperature imprinting process with high pattern transfer yield

Also Published As

Publication number Publication date
US20060183395A1 (en) 2006-08-17
US8298467B2 (en) 2012-10-30
SG159515A1 (en) 2010-03-30
US20110140305A1 (en) 2011-06-16
SG125214A1 (en) 2006-09-29
US7901607B2 (en) 2011-03-08

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