RU2002122008A - A source with a cathode cone of high-frequency pulses of hydrogen ions - Google Patents
A source with a cathode cone of high-frequency pulses of hydrogen ionsInfo
- Publication number
- RU2002122008A RU2002122008A RU2002122008/09A RU2002122008A RU2002122008A RU 2002122008 A RU2002122008 A RU 2002122008A RU 2002122008/09 A RU2002122008/09 A RU 2002122008/09A RU 2002122008 A RU2002122008 A RU 2002122008A RU 2002122008 A RU2002122008 A RU 2002122008A
- Authority
- RU
- Russia
- Prior art keywords
- cathode
- source
- hydrogen ions
- frequency pulses
- cone
- Prior art date
Links
- 229910052739 hydrogen Inorganic materials 0.000 title claims 2
- 239000001257 hydrogen Substances 0.000 title claims 2
- -1 hydrogen ions Chemical class 0.000 title claims 2
- 239000000696 magnetic material Substances 0.000 claims 1
- 239000003870 refractory metal Substances 0.000 claims 1
- 229910001220 stainless steel Inorganic materials 0.000 claims 1
- 239000010935 stainless steel Substances 0.000 claims 1
Landscapes
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2002122008/09A RU2231162C2 (en) | 2002-08-12 | 2002-08-12 | Source with cathode cone of high-frequency pulses of ions of hydrogen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2002122008/09A RU2231162C2 (en) | 2002-08-12 | 2002-08-12 | Source with cathode cone of high-frequency pulses of ions of hydrogen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2002122008A true RU2002122008A (en) | 2004-02-27 |
| RU2231162C2 RU2231162C2 (en) | 2004-06-20 |
Family
ID=32845969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2002122008/09A RU2231162C2 (en) | 2002-08-12 | 2002-08-12 | Source with cathode cone of high-frequency pulses of ions of hydrogen |
Country Status (1)
| Country | Link |
|---|---|
| RU (1) | RU2231162C2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108717927A (en) * | 2018-05-23 | 2018-10-30 | 宁波盘福生物科技有限公司 | Multichannel glow discharge Penning ion source device |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2642921C1 (en) * | 2017-03-28 | 2018-01-30 | Федеральное государственное бюджетное учреждение "Институт теоретической и экспериментальной физики имени А.И. Алиханова Национального исследовательского центра "Курчатовский институт" (НИЦ "Курчатовский институт" - ИТЭФ) | Impulsive source of helium ions |
| RU2671960C1 (en) * | 2018-02-01 | 2018-11-08 | Федеральное государственное бюджетное учреждение "Институт теоретической и экспериментальной физики имени А.И. Алиханова Национального исследовательского центра "Курчатовский институт" | Pulse source of hydrogen ions with electron oscillation in a inhomogeneous longitudinal magnetic field |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2098883C1 (en) * | 1993-05-28 | 1997-12-10 | Институт теоретической и экспериментальной физики | Proton pulse source with cathode cone |
| AU7092396A (en) * | 1996-09-27 | 1998-04-17 | Arpad Barna | Ion source for generating ions of a gas or vapour |
| DE10010706C2 (en) * | 2000-03-04 | 2002-07-25 | Schwerionenforsch Gmbh | Hollow cathode sputter ion source for generating high intensity ion beams |
-
2002
- 2002-08-12 RU RU2002122008/09A patent/RU2231162C2/en not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108717927A (en) * | 2018-05-23 | 2018-10-30 | 宁波盘福生物科技有限公司 | Multichannel glow discharge Penning ion source device |
| CN108717927B (en) * | 2018-05-23 | 2024-03-19 | 宁波盘福生物科技有限公司 | Multichannel glow discharge penning ion source device |
Also Published As
| Publication number | Publication date |
|---|---|
| RU2231162C2 (en) | 2004-06-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW486718B (en) | High-density plasma source for ionized metal deposition | |
| US6497803B2 (en) | Unbalanced plasma generating apparatus having cylindrical symmetry | |
| TW442851B (en) | Improved magnet design for a sputtering chamber | |
| CN102725435B (en) | Magnetic field generator, magnetron cathode, and sputtering device | |
| JP5461264B2 (en) | Magnetron sputtering apparatus and sputtering method | |
| JPS61271810A (en) | Target assembly for sputtering magnetic material | |
| ATE293283T1 (en) | MAGNETRON SPUTTING SOURCE | |
| WO2003015257A3 (en) | Auxiliary vertical magnet outside a nested unbalanced magnetron | |
| CN107794496A (en) | Magnetic-controlled sputtering coating equipment and magnetron sputtering coating method | |
| CN101824600B (en) | Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic device | |
| RU2002122008A (en) | A source with a cathode cone of high-frequency pulses of hydrogen ions | |
| JP5717444B2 (en) | Cathode unit and sputtering apparatus provided with the cathode unit | |
| WO2003015474A3 (en) | Auxiliary in-plane magnet inside a nested unbalanced magnetron | |
| US20080110882A1 (en) | Structure of Cup for Magnetized Active Water | |
| TW539757B (en) | High target utilization magnetic arrangement for a truncated conical sputtering target | |
| JP4992038B2 (en) | Sputtering apparatus and sputtering method | |
| CN218932274U (en) | Circular ring target material for arc ion plating | |
| JPH0525625A (en) | Magnetron sputtering cathode | |
| RU2003116203A (en) | ION SOURCE WITH COLD CATHODE | |
| CN104532202B (en) | A kind of magnetron sputtering target cathode for middle low vacuum | |
| RU2209483C2 (en) | Electron-and-ion source | |
| JPS57194255A (en) | Sputtering device | |
| WO2001092595A1 (en) | Unbalanced plasma generating apparatus having cylindrical symmetry | |
| RU2002101703A (en) | Magnetron | |
| JP4270669B2 (en) | Method and apparatus for magnetron sputtering of ferromagnetic material |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | The patent is invalid due to non-payment of fees |
Effective date: 20080813 |