RU1816734C - Process for cleaning inert gas of hydrogen impurity - Google Patents

Abstract

The invention relates to chemical technology, in particular to methods for purifying inert gases from impurities and can be used in chemical, metallurgical, electronic and other industries. To shorten the technological cycle by eliminating the dosage of inert gas to additional compounds to remove oxygen residues and reduce oxygen consumption, the inert gas is preliminarily purified by mixing the oxygen in it by passing through an oxidized chemisorbent layer and the final purification from oxygen residues after catalytic hydrogenation is carried out by passing an inert gas through a layer of reduced chemisorbent. 1 s.p. f-ly, 1 ill.

Description

The invention relates to chemical technology, in particular, to methods for purifying inert gases from impurities and can be used in chemical, metallurgical, electronic and other industries.

An object of the invention is to shorten the production cycle and reduce oxygen consumption.

The method is illustrated by the scheme depicted in drawing (a and b), which includes adsorbers 1, 3 filled with chemisorbent, reactor 2, while the oxidized and reduced chemisorbent are alternately in the adsorbers 1 and 3 during the cleaning process. In the device 4, the purified inert gas is displaced with oxygen, and the water formed is discharged in the device 5. The adsorber 1, 3 and the reactor 2 are connected via pipelines 6, 7, 8, 9.

An inert gas mixed with hydrogen (Fig. 1 a) is passed through a layer of oxidized chemisorbent in an adsorber 1, then through a pipe 6 it is supplied to a device 4, where it is mixed with oxygen in an amount stoichiometric for the water formation reaction and then passed through a catalyst layer in the reactor 2. From the reactor 2, the inert gas is supplied via line 8 to the device 5 to remove the formed water, and then through line 9 to the adsorber 3, where it is passed through the reduced chemisorbent layer.

As the layer of reduced chemisorbent in the adsorber 3 is oxidized, when the specified threshold oxygen content in the purified inert gas is exceeded, the layers of chemisorbent in the adsorbers 1 and 3 are switched, as shown in Fig. 1 b.

00

 VI

Gj j

Now the chemisorbent in adsorber 3 is induced in an oxidized state and works, and partial purification of an inert gas from an admixture of hydrogen, the chemisorbent in adsorber 1 is in a reduced state and works to purify an inert gas from an admixture of oxygen.

Thus, the adsorber 1 and 3 operate in a cyclically switched manner.

EXAMPLE 1. A neon-helium mixture (70 vol.% Ne, 28 vol.% He) containing hydrogen in the form of an impurity in an amount of 2 vol.%, With a race of 80 l / h is passed through a layer of chemisorbent containing 30% active copper in the oxidized state at a temperature of 120 ° C and a pressure of 1.5 MPa. Then, 0.80 - 0.81 L / h of oxygen is added to the gas leaving the contact with the oxidized chemisorbent, and the mixture is passed through a catalyst bed containing the active component of palladium at a temperature of 250 ° C. After cooling the gas and separating water from it, a neon-helium mixture with an admixture of oxygen is passed through a layer of chemisorbent containing 30% active copper in the reduced state at a temperature of 90 ° C. The purified neon-helium mixture contains oxygen and hydrogen impurities with a total content of less than 7 ppm. Example 2. Argon with a hydrogen content of 1 vol.% With a flow rate of 120 l / h is passed through a layer of chemisorbent containing about 10% nickel in the oxidized state at a temperature of 125 ° C and a pressure of 1.5 MPa. Then, oxygen was added to argon in an amount of 0.60-0.61 l / h, and the resulting mixture was passed through a catalyst bed containing platinum as the active component at a temperature of 250 ° C. After cooling the gas and separating water from it, argon with an admixture of oxygen is passed through a layer of chemisorbent containing about 10% nickel in the reduced state at a temperature of 140 ° C. Purified argon contains impurities of oxygen and hydrogen with a total content of less than 7 ppm.

PRI me R 3. A neon-helium mixture containing in the form of an impurity hydrogen in an amount of 2 vol.%, With a flow rate of 80 l / h is passed through a layer of chemisorbent containing 11% ReaOz, 1% SpgOz, 12%

CuO and 3% ZnO (the rest is an inert carrier -), at a temperature of 350 ° C and a pressure of 0.3 MPa. Then, 0.80 - 0.81 L / h of oxygen was added to the gas leaving the chemisorbent and the mixture was passed through a catalyst bed containing radium and a plate as an active component at a temperature of 250 ° C. After cooling the gas and separating water from it

a neon-helium mixture with an admixture of oxygen is passed through a layer of the above chemisorbent containing the same metals in reduced form at a temperature of 120 ° C. The purified neon-helium mixture contains impurities of oxygen and hydrogen with a total content of less than 7 ppm.

Similar results were obtained when the method was carried out under the conditions of Example 3 using contacts containing tungsten, cobalt, molybdenum, silver and vanadium.

Compared with the prototype, the proposed method provides a reduction in the technological cycle by eliminating

the need for dosage of additional compounds - hydrocarbons and, as a result, the absence of additional stages of gas purification from hydrocarbon residues and its oxidation products. Also on

The oxygen consumption coefficient is reduced by 15-20% due to its complete use for the hydrogen oxidation reaction.

Formula of the invention

Claims (2)

1. A method of purifying an inert gas from an admixture of hydrogen, comprising mixing an inert gas with oxygen in an amount greater than the stoichiometric for the reaction water formation, catalytic hydrogenation of oxygen and removal of water and oxygen residues from an inert gas, characterized in that, in order to simplify the technology and reduce oxygen consumption, the gas is preliminarily passed through a layer of oxidized chemisorbent, and the removal of the core; Precise oxygen is carried out by contacting an inert gas with reduction with a chemisorbent. 2. A method according to claim 1, characterized in that T6Mj uses contacts containing at least one metal from the group of Pt, Pd, Rh, Ni, Fe, Cu, Cr as the catalyst for hydride recovery and chemisorbent. y, Co, Zn, Mo, W, Ag.