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PL2038353T3 - Utwardzalna za pomocą światła ultrafioletowego, przeciwodblaskowa kompozycja powlekająca, zastosowanie przeciwodblaskowej błony powlekającej i sposób jej wytwarzania - Google Patents

Utwardzalna za pomocą światła ultrafioletowego, przeciwodblaskowa kompozycja powlekająca, zastosowanie przeciwodblaskowej błony powlekającej i sposób jej wytwarzania

Info

Publication number
PL2038353T3
PL2038353T3 PL07768631T PL07768631T PL2038353T3 PL 2038353 T3 PL2038353 T3 PL 2038353T3 PL 07768631 T PL07768631 T PL 07768631T PL 07768631 T PL07768631 T PL 07768631T PL 2038353 T3 PL2038353 T3 PL 2038353T3
Authority
PL
Poland
Prior art keywords
antireflective coating
cf3coo
good
coating film
coating composition
Prior art date
Application number
PL07768631T
Other languages
English (en)
Polish (pl)
Inventor
Joon-Koo Kang
Mi-Young Han
Young-Eun Lee
Young-Jun Hong
Yeong-Rae Chang
Original Assignee
Lg Chemical Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Chemical Ltd filed Critical Lg Chemical Ltd
Publication of PL2038353T3 publication Critical patent/PL2038353T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
PL07768631T 2006-07-10 2007-07-06 Utwardzalna za pomocą światła ultrafioletowego, przeciwodblaskowa kompozycja powlekająca, zastosowanie przeciwodblaskowej błony powlekającej i sposób jej wytwarzania PL2038353T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020060064408A KR100981018B1 (ko) 2006-07-10 2006-07-10 Ｕｖ 경화형의 디스플레이 반사 방지용 코팅 조성물
PCT/KR2007/003286 WO2008007874A1 (fr) 2006-07-10 2007-07-06 Composition de revêtement antireflet séchable sous uv, couche de revêtement antireflet formée au moyen de cette composition, et procédé de production correspondant
EP07768631A EP2038353B1 (fr) 2006-07-10 2007-07-06 Composition de revêtement antireflet séchable sous uv, couche de revêtement antireflet formée au moyen de cette composition, et procédé de production correspondant

Publications (1)

Publication Number Publication Date
PL2038353T3 true PL2038353T3 (pl) 2010-09-30

Family

ID=38923404

Family Applications (1)

Application Number Title Priority Date Filing Date
PL07768631T PL2038353T3 (pl) 2006-07-10 2007-07-06 Utwardzalna za pomocą światła ultrafioletowego, przeciwodblaskowa kompozycja powlekająca, zastosowanie przeciwodblaskowej błony powlekającej i sposób jej wytwarzania

Country Status (10)

Country Link
US (1) US8110249B2 (fr)
EP (1) EP2038353B1 (fr)
JP (1) JP5054769B2 (fr)
KR (1) KR100981018B1 (fr)
CN (1) CN101484541B (fr)
AT (1) ATE462770T1 (fr)
DE (1) DE602007005646D1 (fr)
PL (1) PL2038353T3 (fr)
TW (1) TWI355405B (fr)
WO (1) WO2008007874A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2644766C (fr) * 2008-11-21 2016-01-12 Honda Motor Co., Ltd. Procede et dispositif de sechage de peinture photoactivable
CN102333831B (zh) * 2009-02-27 2015-05-06 Lg化学株式会社 突出的耐磨性和抗污染性的涂料组合物和涂膜
CA2672413C (fr) * 2009-06-30 2012-11-20 Honda Motor Co., Ltd. Formulation de peinture durcissable et photoactivable aux ultraviolets et revetements durcis connexes
JP5412357B2 (ja) 2010-04-01 2014-02-12 株式会社フジクラ メンブレン配線板
KR101256552B1 (ko) * 2010-07-08 2013-04-19 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
WO2012053427A1 (fr) * 2010-10-18 2012-04-26 株式会社ニコン Film optique mince, film optique mince multicouche, élément optique, procédé de fabrication d'élément optique et liquide de revêtement pour formation de film optique mince
KR101226230B1 (ko) 2011-08-26 2013-01-28 주식회사 엘지화학 반사 방지 필름
EP2749607B1 (fr) 2011-08-26 2019-04-17 LG Chem, Ltd. Composition pour revêtement antireflet et couche mince antireflet fabriquée au moyen de la composition
KR101369381B1 (ko) 2011-11-04 2014-03-06 에스케이이노베이션 주식회사 함불소 화합물을 포함하는 저굴절 코팅 조성물, 이를 이용한 반사방지 필름, 이를 포함하는 편광판 및 표시장치
TWI521030B (zh) 2011-12-21 2016-02-11 Ｌｇ化學股份有限公司 壓感性黏著劑組成物
CN104640951B (zh) 2013-06-19 2017-07-21 株式会社Lg化学 压敏粘合剂组合物
KR101550143B1 (ko) 2013-06-19 2015-09-03 주식회사 엘지화학 점착제 조성물
CN104629615B (zh) * 2015-02-26 2017-03-01 河南科技大学 一种木板制品表面涂覆用uv光油及其涂覆方法
WO2022249730A1 (fr) * 2021-05-26 2022-12-01 ステラケミファ株式会社 Dispersion liquide de particules de fluorure, composition permettant de former un film optique, et film optique
US20250101225A1 (en) 2021-12-02 2025-03-27 Lg Chem, Ltd. Curable composition, protective film, optical element, and liquid crystal display device
KR102645273B1 (ko) * 2023-04-10 2024-03-12 주식회사 두성코리아 내오염성이 우수한 자외선 경화형 무광 도료 조성물, 이를 이용한 무광 시트 및 그 제조방법

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0819313B2 (ja) * 1986-04-24 1996-02-28 大日本インキ化学工業株式会社 フツ素系樹脂組成物
CA1296458C (fr) * 1986-02-27 1992-02-25 Yutaka Hashimoto Composition de resine fluoree a faible indice de refraction
JPH01210433A (ja) * 1988-02-18 1989-08-24 Seiko Epson Corp コーティング用組成物
JPH05105424A (ja) 1991-10-14 1993-04-27 Toshiba Corp 反射防止膜の製造方法
JPH07126552A (ja) * 1993-10-29 1995-05-16 Nippon Oil & Fats Co Ltd 含フッ素硬化性塗液及び含フッ素硬化被膜
JP3635692B2 (ja) 1994-10-20 2005-04-06 日産化学工業株式会社 低屈折率反射防止膜
JP2951240B2 (ja) 1995-06-26 1999-09-20 筒中プラスチック工業株式会社 単板のマスキングフィルムの切断装置
US5912061A (en) * 1995-08-03 1999-06-15 Matsushita Electric Industrial Co., Ltd. UV-ray setting resin and a method for manufacturing a magneto-optical disk by the use of the UV-ray setting resin
JP3193600B2 (ja) * 1995-10-17 2001-07-30 株式会社トクヤマ コーティング組成物
JPH09145903A (ja) * 1995-11-27 1997-06-06 Dainippon Printing Co Ltd 反射防止フィルム
JP4032185B2 (ja) 1995-12-01 2008-01-16 日産化学工業株式会社 低屈折率及び撥水性を有する被膜
US6383559B1 (en) * 1995-12-07 2002-05-07 Fuji Photo Film Co., Ltd. Anti-reflection film and display device having the same
JP3391972B2 (ja) * 1996-02-27 2003-03-31 セントラル硝子株式会社 成膜法
US6087010A (en) * 1996-06-10 2000-07-11 Nof Corporation Fluorine-containing polyfunctional (meth) acrylate composition low refractivity material and reflection reducing film
TW363976B (en) 1996-06-10 1999-07-11 Nof Corp Fluoride-containing polyfunctional (meth)acrylates, compositions comprising the same, materials with low refractivity and reflection-reduction film
JPH10279531A (ja) * 1997-03-31 1998-10-20 Toray Ind Inc 含フッ素化合物、光学薄膜およびそれを用いた反射防止性物品
JPH112702A (ja) 1997-06-12 1999-01-06 Toray Ind Inc 低屈折率膜、反射防止方法および反射防止性物品
JPH1152103A (ja) * 1997-07-30 1999-02-26 Fuji Photo Film Co Ltd 反射防止膜およびそれを配置した表示装置
JPH11140188A (ja) * 1997-11-07 1999-05-25 Asahi Chiba Kk 速硬化性樹脂組成物
EP0962789B1 (fr) * 1998-06-05 2008-02-06 FUJIFILM Corporation Couche antiréfléchissante et dispositif d'affichage avec cette couche
JP4081862B2 (ja) * 1998-07-06 2008-04-30 東レ株式会社 薄膜及びそれを利用した反射防止膜
CN1235985C (zh) 1998-12-09 2006-01-11 日本化药株式会社 硬涂覆材料以及用该材料获得的膜
JP2002003550A (ja) * 2000-06-27 2002-01-09 Nippon Kayaku Co Ltd フッ素含有ウレタン（メタ）アクリレート化合物を含有する低屈折率樹脂組成物およびその硬化物
JP2002097250A (ja) * 2000-09-26 2002-04-02 Asahi Kasei Epoxy Kk エポキシ樹脂とその反応生成物及びそれらを用いた硬化性樹脂組成物
JP2002372601A (ja) 2001-04-13 2002-12-26 Fuji Photo Film Co Ltd 反射防止フィルムおよび画像表示装置と含フッ素共重合体
WO2003027189A1 (fr) 2001-09-04 2003-04-03 Dai Nippon Printing Co., Ltd. Composition de revetement, revetement forme a partir de celle-ci, revetement antireflet, film antireflet et dispositif d'affichage d'image
JP4187487B2 (ja) 2001-09-04 2008-11-26 大日本印刷株式会社 コーティング組成物、その塗膜、反射防止膜、反射防止フィルム、及び、画像表示装置
KR20070011650A (ko) * 2001-10-25 2007-01-24 마츠시다 덴코 가부시키가이샤 코팅재 조성물 및 그것에 의해 형성된 피막을 가지는 물품
JP4174344B2 (ja) * 2002-03-15 2008-10-29 日東電工株式会社 反射防止フィルム、その製造方法、光学素子および画像表示装置
JP4265734B2 (ja) * 2002-07-08 2009-05-20 富士フイルム株式会社 反射防止膜、反射防止フィルムおよび画像表示装置
JP4758647B2 (ja) 2002-10-31 2011-08-31 共栄社化学株式会社 樹脂組成物、転写材及び成型品の製造方法
JP2005122147A (ja) * 2003-09-24 2005-05-12 Fuji Photo Film Co Ltd 反射防止フィルム、その製造方法、偏光板および画像表示装置
JP4544952B2 (ja) * 2004-03-31 2010-09-15 大日本印刷株式会社 反射防止積層体
KR100538528B1 (ko) * 2004-06-15 2005-12-22 제일모직주식회사 반사방지 필름의 제조방법 및 이를 이용하여 제조된반사방지 필름
JP4691406B2 (ja) * 2004-07-09 2011-06-01 富士フイルム株式会社 中空導電性微粒子、光学機能フィルム、反射防止フィルム、その製造方法、偏光板、及び画像表示装置
JP4484612B2 (ja) 2004-07-20 2010-06-16 富士フイルム株式会社 組成物、コーティング組成物、反射防止フィルム、偏光板、画像表示装置
US20080113165A1 (en) * 2004-07-20 2008-05-15 Fujifilm Corporation Antireflection Film, Polarizing Plate and Image Display Utilizing the Same
US7502088B2 (en) * 2005-03-17 2009-03-10 Fujifilm Corporation Liquid crystal display device having an antiglare layer
KR100981575B1 (ko) * 2006-07-10 2010-09-10 주식회사 엘지화학 오염 제거가 용이한 디스플레이 반사 방지용 코팅 조성물

Also Published As

Publication number Publication date
TW200813172A (en) 2008-03-16
CN101484541A (zh) 2009-07-15
KR20080005722A (ko) 2008-01-15
US8110249B2 (en) 2012-02-07
WO2008007874A1 (fr) 2008-01-17
TWI355405B (en) 2012-01-01
JP5054769B2 (ja) 2012-10-24
JP2009543156A (ja) 2009-12-03
EP2038353A1 (fr) 2009-03-25
DE602007005646D1 (de) 2010-05-12
CN101484541B (zh) 2012-07-04
KR100981018B1 (ko) 2010-09-07
EP2038353B1 (fr) 2010-03-31
EP2038353A4 (fr) 2009-07-29
ATE462770T1 (de) 2010-04-15
US20100076109A1 (en) 2010-03-25

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