KR830008406A - 무정형 합금 및 소자의 밴드갭을 조절하는 방법 - Google Patents
무정형 합금 및 소자의 밴드갭을 조절하는 방법 Download PDFInfo
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- KR830008406A KR830008406A KR1019810003328A KR810003328A KR830008406A KR 830008406 A KR830008406 A KR 830008406A KR 1019810003328 A KR1019810003328 A KR 1019810003328A KR 810003328 A KR810003328 A KR 810003328A KR 830008406 A KR830008406 A KR 830008406A
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Abstract
Description
Claims (39)
- 개선된 광감성 비정형 합금을 제조하는 방법에 있어서 그 방법은 기판상에 적어도 실리콘을 포함하는 물질을 피착하는 공정과 전술한 물질에 적어도 불소와 같은 상태밀도를 감소시키는 원소를 포함시키는 공정으로 구성되며 공감성 파장함수의 특정한 영역을 가지며 조정된 밴드갭을 갖는 합금을 제조하기 위한 밴드갭내의 상태밀도를 실질적으로 증가시키지 않고 적오도 하나의 밴드갭 조정원소를 그 양을 조절하여 그 물질내로 첨가시키는 것을 특징으로 하는 개선된 광감성 비정형합금의 제조방법.
- 청구범위 제1항에 따르는 방법에 있어서 전술한 조정원소가 게르마늄 주석카본 혹은 질소로 구성되는 그룹중 하나인 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1항 또는 2항에 있어서 전술한 합금이 적어도 SiR4,H2및 GeH4로부터 글로우방전법에 의해 피착되는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1-3항중 하나에 따르는 방법에 있어서 전술한 혼합물이 1%까지의 GeH4를 호함하는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제2항 드렸은 제4항에 따르는 방법에 있어서 전술한 SiR4및 H2의 혼합물이 4 : 1-10 : 1의 비율을 갖는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1-5항중 하나에 따르는 방법에 있어서 전술한 합금이 농동광감성 영역으로서 피착되며 적어도 그 영역에 조정원소가 첨가됨을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1-6항중 하나에 따르는 방법에 있어서 제2의 원소인 수소를 제2의 상태밀도 감소 원소로 첨가하는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제7항에 따르는 방법에 있어서 전술한 상태 밀도 감소원소를, 실질적으로 동시에 밴드갭 조정원소를 갖는, 피착되는 합금에 결합시키는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1-8항중 하나에 따르는 방법에 있어서 전술한 감소원소를 피착후에 그 합금내로 결합시키는 것을 특징으로 하는 비정정형합금의 제조방법.
- 청구범위 제1-9항중 하나에 따르는 방법에 있어서 전술한 제정원소를 실질적으로 불연속층인 합금내로 결합시키는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1항-9항중 하나에 따르는 방법에 있어서 전술한 조정원소를 양을 변화하면서 합금내로 결합시키는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1항-제11항움직이 하나에 따르는 방법에 있어서 전술한 조정원소를 합금내로 결합시키기 전에 증발시키는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1항-12항중 하나에 따르는 방법에 있어서 전술한 합금내로 결합시키기 위해 플라즈마 활성조정원소를 생성시키는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1항-13항중 하나에 따르는 방법에 있어서 전술한 활성화조종원소를 플라즈마-활성중착에 의해 활성화시키는 것을 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1항-14항중 하나에 따르는 방법에 있어서 전술한 활성화 조정원소를 플라즈마-활성증착에 의해 활성화시키는 것을 특징으로 하는 비정형 합금의 제조방법.
- 청구범위 제1항-15항중 하나에 따르는 방법에 있어서 전술한 방법이 p 혹은 n형 도전형을 생성하기 위해 하나의 p 혹은 n불순물 원소를 갖는 합금의, 적오도 한 부분을 피착하는 것을 특징으로 하는 특징으로 하는 비정형합금의 제조방법.
- 청구범위 제1항-16항중의 공정중 하나에 따라 제조하는 비정형합금의 제조방법.
- 개선된 광감성 비정형합금에 있어서 그 합금을 실리콘을 포함함과 동시에, 적오도 불소와 같은 하나의 상태밀도 감소원소를 포함하고 있으며 실질적으로 갭내의 상태밀도를 증가시키지 않고 밴드갭내에 포함된 조정원소를 갖는 그 합금(118,146,148,150,168,170,172,176,180,186,188,194,206,208,210,214,216,218,220)과 그 합금이 광응답 파장함수의 특정한 영역을 가짐과 동시에 조정된 밴드갭을 갖는 것을 특징으로 하는 개선된 광감성 비정형합금.
- 청구범위 제18항에 따르는 합금에 있어서 전술한 조정원소가 게르마늄, 주석, 카본, 그리고 질소로 구성되는 그룹중 하나인 것을 특징으로 하는 합금.
- 청구범위 제18항 혹은 제19항에 따르는 합금에 있어서 그합금(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,218,220)이 능동 광감성 영역(150,170,172,180,186,194,208,216)을 가지며 적어도 그 영역내에 조정원소가 포함하는 것을 특징으로 하는 합금.
- 청구범위 제17-19항중 하나에 따르는 합금에 있어서 합금내에 전술한 제2의 상태밀도 감소원소인 수소를 포함하는 것을 특징으로 하느 합금.
- 청구범위 제17항-20항중 하나에 따르는 합금에 있어서 전술한 합금(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)이 글로우방전 피착법에 의해 피착됨을 특징으로 하는 합금.
- 청구범위 제17항-22항중 하나에 따르는 합금에 있어서 전술한 조정원소가 실질적으로 불연속인 충에 포함되는 것을 특징으로 하는 합금.
- 청구범위 제17항-22항 중 하나에 따르는 합금에 있어서 전술한 조정원소를 양을 변화하여 첨가시키는 것을 특징으로 하는 합금.
- 청구범위 제17항-24항중 하나에 따르는 합금에 있어서 적어도 n(148,170,176,218,220)혹은 p(172,174,194,210,214)도전성 영역과 n혹은 p형 불순물원소를 함유하는 하부분을 포함하는 것을 특징으로 하는 합금.
- 개선다니 광감응성소자에 있어서 그 소자는 조사에 의해 전하캐리어가 생성될 수 있을 정도의 밴드갭을 갖는 능동광감성영역과 그러한 영역을 갖는 비정형 반도체 합금체를 포함하는 여러재료의 중첩된 층과 불소와 같은 적어도 하나의 상태밀도 감소원소를 포함하는 비정형합금으로 구성되며 광응답파 장함수의 특정항영역을 나타내도록 조정할 합금의 밴드갭과 실질적으로 밴드갭내의 상태수를 증가시키지 않고 복사광흡수를 증가시키기 위해 적어도 광감성 영역(150,170,172,180,186,194,208,216)내에 적당량의 밴드갭 조정원소가 포함되는 합금(118,146,148,150,168,170,172,176,180,186,188,194,206,208,210,214,216,218,220)을 특징으로 하는 개선된 강감응성 소자.
- 청구범위 제25항에 따르는 소자에 있어서 광감성영역(150,170,172,180,186,194,208,216)의 밴드갭이 1.6eV이하인 것을 특징으로 하는 소자.
- 청구범위 제25항 또는 제26항에 따르는 소자에 있어서 조정원소가 게르마늄, 주석, 카본, 혹은 질소로 구성되는 그룹중 하나인 것을 특징으로 하는 소자.
- 청구범위 제25항-27항중 하나에 따르는 소자에 있어서 제2의 상태밀도 감소원소인 수소원소를 그내에 포함하는 것을 특징으로 하는 소자.
- 청구범위 제25항-28항중 하나에 따르는 소자에 있어서 전술한 합금(118,146,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)이 글로구방전 피착법에 의해 피착됨을 특징으로 하는 소자.
- 청구범위 제25항-29항중 하나에 따르는 소자에 있어서 전술한 합금체(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)가 실질적으로 불연속인 층내에 있는 조정원소를 포함하는 것을 특징으로 하는 소자.
- 청구범위 제25항-30항중 하나에 따르는 소자에 있어서, 합금체(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)가 전술한 적당량의 조정원소를 포함하는 것을 특징으로 하는 소자.
- 청구범위 제25항-31항중 하나에 따르는 소자에 있어서 전술한 합금체(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)가 적어도 하나의 n(148,170,176,206,218,220)혹은 p(172,174,194,210,214)도전성 영역과 n혹은 p불순물 원소를 함유하는 영역을 포함하는 것을 특징으로 하는 소자.
- 청구범위 제25항-32항중 하나에 따르는 소자에 있어서 전술한 합금체(118,146,160,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)가 소트키 배리어형 태양전지(142)의 일부로 형성됨을 특징으로 하는 소자.
- 청구범위 제25항-32항중 하나에 따르는 소자에 있어서 전술한 합금체(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)가 MIS형 태양전지(142)의 일부로 형성됨을 특징으로 하는 소자.
- 청구범위 제25항-32항움직이 하나에 따르는 소자에 있어서 전술한 합금체(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)가 p-n접합소자(168)의 일부로 형성됨을 특징으로 하는 소자.
- 청구범위 제25항-제35항중 하나에 따르는 소자에 있어서 전술한 합금체(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)가 p-i-n형 소자(198,212)의 일부로 형성됨을 특징으로 하는 소자.
- 청구범위 제25항-36항중 하나에 따르는 소자에 있어서 전술한 합금체(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,216,218,220)가 광검출소자(178)의 일부로 형성됨을 특징으로 하는 소자.
- 청구범위 제25항-37항중 하나에 따르는 소자에 있어서 전술한 합금체(118,146,148,150,168,170,172,174,176,180,186,188,194,206,208,210,214,218,216,220)가 정전체상생성 발생소자의 일부로 형성됨을 특징으로 하는 소자.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US185520 | 1980-09-09 | ||
| US06/185,520 US4342044A (en) | 1978-03-08 | 1980-09-09 | Method for optimizing photoresponsive amorphous alloys and devices |
| US185,520 | 1980-09-09 | ||
| US20657980A | 1980-11-13 | 1980-11-13 | |
| US206579 | 1980-11-13 | ||
| US206,579 | 1980-11-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR830008406A true KR830008406A (ko) | 1983-11-18 |
| KR890000478B1 KR890000478B1 (ko) | 1989-03-18 |
Family
ID=26881211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019810003328A Expired KR890000478B1 (ko) | 1980-09-09 | 1981-09-07 | 비정질합금의 제조방법 |
Country Status (14)
| Country | Link |
|---|---|
| KR (1) | KR890000478B1 (ko) |
| AU (1) | AU547173B2 (ko) |
| BR (1) | BR8105747A (ko) |
| CA (1) | CA1192819A (ko) |
| DE (1) | DE3135411C2 (ko) |
| ES (1) | ES505268A0 (ko) |
| FR (1) | FR2490018B1 (ko) |
| GB (1) | GB2083701B (ko) |
| IE (1) | IE52207B1 (ko) |
| IL (1) | IL63754A (ko) |
| IN (1) | IN157458B (ko) |
| IT (1) | IT1138202B (ko) |
| NL (1) | NL8104140A (ko) |
| SE (1) | SE455554B (ko) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5795677A (en) * | 1980-12-03 | 1982-06-14 | Kanegafuchi Chem Ind Co Ltd | Amorphous silicon type photoelectric tranducer |
| US4523214A (en) * | 1981-07-03 | 1985-06-11 | Fuji Photo Film Co., Ltd. | Solid state image pickup device utilizing microcrystalline and amorphous silicon |
| JPS58501975A (ja) * | 1981-11-20 | 1983-11-17 | クロ−ナ−・コ−ポレイション | 非晶質半導体のバンド・ギャップ制御 |
| US4460670A (en) * | 1981-11-26 | 1984-07-17 | Canon Kabushiki Kaisha | Photoconductive member with α-Si and C, N or O and dopant |
| US4460669A (en) * | 1981-11-26 | 1984-07-17 | Canon Kabushiki Kaisha | Photoconductive member with α-Si and C, U or D and dopant |
| US4465750A (en) * | 1981-12-22 | 1984-08-14 | Canon Kabushiki Kaisha | Photoconductive member with a -Si having two layer regions |
| JPS5914679A (ja) * | 1982-07-16 | 1984-01-25 | Toshiba Corp | 光起電力装置 |
| JPS59111152A (ja) * | 1982-12-16 | 1984-06-27 | Sharp Corp | 電子写真用感光体 |
| US4547621A (en) * | 1984-06-25 | 1985-10-15 | Sovonics Solar Systems | Stable photovoltaic devices and method of producing same |
| DE8430810U1 (de) * | 1984-10-19 | 1986-05-07 | Siemens AG, 1000 Berlin und 8000 München | Solarzelle mit graduellem Energiebandabstand mit einem aus amorphem Silizium bestehenden Halbleiterkorper |
| JPS61104678A (ja) * | 1984-10-29 | 1986-05-22 | Mitsubishi Electric Corp | アモルフアス太陽電池 |
| CA1269164A (en) * | 1986-03-24 | 1990-05-15 | Metin Aktik | Photosensitive diode with hydrogenated amorphous silicon layer |
| FR2630260B1 (fr) * | 1988-04-19 | 1991-11-29 | Thomson Csf | Photodetecteur en silicium amorphe a rendement quantique ameliore |
| DE19700697A1 (de) * | 1997-01-13 | 1998-07-16 | Goeller Christian | Verfahren zur Herstellung von Solarzellen |
| US6437233B1 (en) * | 2000-07-25 | 2002-08-20 | Trw Inc. | Solar cell having multi-quantum well layers transitioning from small to large band gaps and method of manufacture therefor |
| EP1919264A1 (en) | 2006-11-02 | 2008-05-07 | Dow Corning Corporation | Device for forming a film by deposition from a plasma |
| EP1918967B1 (en) | 2006-11-02 | 2013-12-25 | Dow Corning Corporation | Method of forming a film by deposition from a plasma |
| EP1923483A1 (en) | 2006-11-02 | 2008-05-21 | Dow Corning Corporation | Deposition of amorphous silicon films by electron cyclotron resonance |
| EP1918966A1 (en) | 2006-11-02 | 2008-05-07 | Dow Corning Corporation | Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma |
| EP1918414A1 (en) | 2006-11-02 | 2008-05-07 | Dow Corning Corporation | Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance |
| EP1918965A1 (en) | 2006-11-02 | 2008-05-07 | Dow Corning Corporation | Method and apparatus for forming a film by deposition from a plasma |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1123525A (en) * | 1977-10-12 | 1982-05-11 | Stanford R. Ovshinsky | High temperature amorphous semiconductor member and method of making same |
| US4217374A (en) * | 1978-03-08 | 1980-08-12 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors |
| US4342044A (en) * | 1978-03-08 | 1982-07-27 | Energy Conversion Devices, Inc. | Method for optimizing photoresponsive amorphous alloys and devices |
| US4226898A (en) * | 1978-03-16 | 1980-10-07 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process |
| JPS5513939A (en) | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device |
| JPS5513938A (en) | 1978-07-17 | 1980-01-31 | Shunpei Yamazaki | Photoelectronic conversion semiconductor device and its manufacturing method |
| DE2950008A1 (de) * | 1979-12-12 | 1981-06-19 | Siemens AG, 1000 Berlin und 8000 München | Dauermagneterregter laeufer fuer eine synchronmaschine |
| DE3135412C2 (de) * | 1980-09-09 | 1985-11-21 | Energy Conversion Devices, Inc., Troy, Mich. | Fotoempfindlicher amorpher Halbleiter auf Siliziumbasis sowie Verfahren zu dessen Herstellung und Verwendung desselben |
-
1981
- 1981-09-07 KR KR1019810003328A patent/KR890000478B1/ko not_active Expired
- 1981-09-07 NL NL8104140A patent/NL8104140A/nl active Search and Examination
- 1981-09-07 IL IL63754A patent/IL63754A/xx unknown
- 1981-09-07 GB GB8126963A patent/GB2083701B/en not_active Expired
- 1981-09-07 ES ES505268A patent/ES505268A0/es active Granted
- 1981-09-07 IT IT23825/81A patent/IT1138202B/it active
- 1981-09-07 SE SE8105277A patent/SE455554B/sv not_active IP Right Cessation
- 1981-09-07 IE IE2063/81A patent/IE52207B1/en not_active IP Right Cessation
- 1981-09-07 DE DE3135411A patent/DE3135411C2/de not_active Expired - Lifetime
- 1981-09-07 IN IN1003/CAL/81A patent/IN157458B/en unknown
- 1981-09-07 FR FR8116956A patent/FR2490018B1/fr not_active Expired
- 1981-09-08 CA CA000385402A patent/CA1192819A/en not_active Expired
- 1981-09-08 BR BR8105747A patent/BR8105747A/pt not_active IP Right Cessation
- 1981-09-08 AU AU75019/81A patent/AU547173B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE3135411C2 (de) | 1994-07-07 |
| CA1192819A (en) | 1985-09-03 |
| IL63754A (en) | 1984-07-31 |
| GB2083701B (en) | 1985-09-04 |
| IE52207B1 (en) | 1987-08-05 |
| SE455554B (sv) | 1988-07-18 |
| DE3135411A1 (de) | 1982-09-23 |
| GB2083701A (en) | 1982-03-24 |
| ES8302361A1 (es) | 1982-12-16 |
| NL8104140A (nl) | 1982-04-01 |
| IL63754A0 (en) | 1981-12-31 |
| AU7501981A (en) | 1982-03-18 |
| FR2490018B1 (fr) | 1986-01-17 |
| FR2490018A1 (fr) | 1982-03-12 |
| IE812063L (en) | 1982-03-09 |
| BR8105747A (pt) | 1982-05-25 |
| ES505268A0 (es) | 1982-12-16 |
| IT8123825A0 (it) | 1981-09-07 |
| IT1138202B (it) | 1986-09-17 |
| SE8105277L (sv) | 1982-03-10 |
| KR890000478B1 (ko) | 1989-03-18 |
| AU547173B2 (en) | 1985-10-10 |
| IN157458B (ko) | 1986-04-05 |
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