KR20040097063A - Process for preparing foamed polyurethane polishing pad for fine polishing - Google Patents
Process for preparing foamed polyurethane polishing pad for fine polishing Download PDFInfo
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- KR20040097063A KR20040097063A KR1020040084850A KR20040084850A KR20040097063A KR 20040097063 A KR20040097063 A KR 20040097063A KR 1020040084850 A KR1020040084850 A KR 1020040084850A KR 20040084850 A KR20040084850 A KR 20040084850A KR 20040097063 A KR20040097063 A KR 20040097063A
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- South Korea
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- polyurethane
- abrasive
- polishing
- polishing pad
- foam
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- 238000005498 polishing Methods 0.000 title claims abstract description 92
- 229920002635 polyurethane Polymers 0.000 title claims abstract description 26
- 239000004814 polyurethane Substances 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000006260 foam Substances 0.000 claims abstract description 37
- 229920005830 Polyurethane Foam Polymers 0.000 claims abstract description 22
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 22
- 239000001257 hydrogen Substances 0.000 claims abstract description 22
- 239000011496 polyurethane foam Substances 0.000 claims abstract description 22
- 150000001875 compounds Chemical class 0.000 claims abstract description 21
- 229920005749 polyurethane resin Polymers 0.000 claims abstract description 21
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229920001730 Moisture cure polyurethane Polymers 0.000 claims abstract description 19
- 229920001451 polypropylene glycol Polymers 0.000 claims abstract description 16
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000002156 mixing Methods 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 9
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000003756 stirring Methods 0.000 claims abstract description 8
- 239000003082 abrasive agent Substances 0.000 claims abstract description 7
- 239000000203 mixture Substances 0.000 claims abstract description 7
- 239000000853 adhesive Substances 0.000 claims abstract description 6
- 230000001070 adhesive effect Effects 0.000 claims abstract description 6
- 238000000465 moulding Methods 0.000 claims abstract description 6
- 229910000420 cerium oxide Inorganic materials 0.000 claims abstract description 4
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 4
- 239000010432 diamond Substances 0.000 claims abstract description 4
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims abstract description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 3
- 239000007788 liquid Substances 0.000 claims description 17
- 238000003786 synthesis reaction Methods 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 229920001223 polyethylene glycol Polymers 0.000 claims description 10
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 238000005187 foaming Methods 0.000 claims description 6
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 claims description 4
- 239000002518 antifoaming agent Substances 0.000 claims description 4
- 229920001296 polysiloxane Polymers 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 3
- 238000004898 kneading Methods 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 229960004418 trolamine Drugs 0.000 claims description 3
- 239000002202 Polyethylene glycol Substances 0.000 claims description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 claims description 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims description 2
- 125000005442 diisocyanate group Chemical group 0.000 claims description 2
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 2
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 abstract description 11
- 230000000694 effects Effects 0.000 abstract description 10
- 239000007787 solid Substances 0.000 abstract description 10
- 239000011521 glass Substances 0.000 abstract description 9
- 230000003287 optical effect Effects 0.000 abstract description 5
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 abstract description 2
- 229910000423 chromium oxide Inorganic materials 0.000 abstract description 2
- 239000004744 fabric Substances 0.000 abstract description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 22
- 239000004094 surface-active agent Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229920000538 Poly[(phenyl isocyanate)-co-formaldehyde] Polymers 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000006748 scratching Methods 0.000 description 3
- 230000002393 scratching effect Effects 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920013716 polyethylene resin Polymers 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 230000003254 anti-foaming effect Effects 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000004005 microsphere Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
- B24D11/001—Manufacture of flexible abrasive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
기존의 연마포용 기재(1)위에 기포(2)가 형성된 폴리우레탄 발포층(3)을 형성하고 상기 발포층위에 연마제와 접착제의 혼합물층(4)을 도포한 것으로 구성되는 다수개의 기포를 갖는 정밀연마용 연마패드에 있어서, 상기에서 연마제는 직경이 10~30㎛크기의 직경을 갖는 것으로 하고, 상기에서 폴리우레탄 발포층(3)은 통상의 폴리우레탄수지에 대하여 통상의 연마제인 산화셀륨, 산화알루미늄, 실리콘 카바이드, 산화철, 산화크롬, 다이어몬드, 산화규소 또는 지르코니아중에서 선택된 어느한가지의 연마제를 10~50wt% 첨가한 것을 발포체로 하거나, 4,4'-디페닐메탄디이소시아네이트(MDI), 폴리머릭 MDI, 저분자량의 폴리프로필렌그리콜로된 폴리우레탄 프리폴리머와 상기한 통상의 각종 연마제중 어느하나가 10~50wt% 함유된 활성수소함유 화합물을 혼합하여 예열된 성형기에서 공기를 주입하면서 교반을 계속하여 내부에 기포가 발생된 폴리우레탄 고형물을 얻은 다음 그렇게 얻어진 폴리우레탄 발포체를 일정크기와 두께로 슬라이싱하여 시트로한 발포체로하여 정밀연마용 폴리우레탄 연마패드로 한 것으로서, 이상과 같이 제조되는 연마패드는 정밀하고 세밀한 LCD, PDP, OLED등과같은 FPD 생산시의 유리면이나 광학렌즈등을 정밀하고 미세하게 연마할 수 있는 효과가 있다.Precision having a plurality of bubbles consisting of forming a polyurethane foam layer (3) having a bubble (2) formed on an existing substrate (1) for polishing cloth and applying a mixture layer (4) of abrasive and adhesive on the foam layer In the polishing pad for polishing, the abrasive is a diameter of 10 ~ 30㎛ size, wherein the polyurethane foam layer (3) is a cerium oxide, oxide, which is a conventional abrasive against conventional polyurethane resin 10 to 50 wt% of an abrasive selected from aluminum, silicon carbide, iron oxide, chromium oxide, diamond, silicon oxide or zirconia is used as a foam, or 4,4'-diphenylmethane diisocyanate (MDI), polymer Rick MDI, pre-heated by mixing a polyurethane prepolymer of low molecular weight polypropylene glycol with an active hydrogen-containing compound containing 10 to 50wt% of any one of the above-described conventional abrasives Injecting air from the molding machine, stirring was continued to obtain a polyurethane solid having bubbles generated therein, and the polyurethane foam thus obtained was sliced to a certain size and thickness into a foam made of sheet. In one embodiment, the polishing pad manufactured as described above has an effect of precisely and finely polishing a glass surface or an optical lens in the production of FPD such as LCD, PDP, OLED and so on.
Description
본 발명은 LCD, PDP, OLED등과 같은 FPD의 유리나 광학렌즈등 정밀하고 미세한 면을 정밀 연마할 수 있는 정밀연마용 발포(發泡) 폴리우레탄 연마패드의 제조방법에 관한 것으로서, 특히 연마패드의 표면에는 연마제가 도포되고 폴리우레탄 발포층은 크고 작은 다양한 기포가 형성되어 있으면서 각종 연마제가 선택적으로 내포되어 있어서 쿳션성이 좋고 표면 연마제에 의한 연마에 의해 평활성과 연마성이 양호하면서 기포내에 노출된 연마제에 의해서는 피연마면의 고형이물질을 미세하고 정밀하게 연마를 할 수 있는 정밀연마용 폴리우레탄 연마패드를 제조하는 방법을 제공코저하는 것이다.The present invention relates to a method of manufacturing a foamed polyurethane polishing pad for precision polishing that can precisely polish fine and fine surfaces such as glass or optical lenses of FPD such as LCD, PDP, OLED, etc., in particular the surface of the polishing pad The abrasive is applied to the polyurethane foam layer, and various foams are selectively contained while various bubbles are formed in the polyurethane foam layer, which has good cushioning properties and good smoothness and abrasiveness by polishing by the surface abrasive and exposed to the foam. The present invention provides a method of manufacturing a polyurethane polishing pad for fine polishing, which can finely and precisely polish a solid foreign material on a to-be-polished surface.
종래에는 LCD(Liquid Crystal Display), PDP(Plasma Display Panel), OLED(Organic Light Emitting Diode)와 같은 FPD(Flat Panel Display)의 유리면이나, 광학렌즈와 같은 정밀하고 미세한 연마면을 연마하기위한 정밀 연마패드로는 도1에 도시된 바와같이, 연마패드(포)용 기재(1)위에 다수의 기포(2)가 형성된 폴리우레탄 발포층(3)을 형성하고 그 발포층위에 연마제와 접착제를 혼합한 연마제층(4)을 적층한 연마패드(연마포)가 대한민국 특허 제10-0391109호로 게시되어 있으나 이 경우는 상기한 바와같은 정밀한 연마를 필요로하는 유리면이나 광학렌즈의 정밀 연마가 어렵고, 상기 예와는 또다른 연마패드의 예로는 연마패드용 우레탄 성형물 및 그 제조방법이 대한민국 공개특허번호 제2001-0005435(2001.01.15일 공개)호로 공개된 바 있으나, 그 제조방법을 살펴보면, 이소시아네이트기 말단 우레탄프리폴리머와 활성수소 함유 화합물을 혼합, 합성시켜 폴리우레탄을 제조할 때 가열 팽창성 미발포 미소중공체(微小中空體)와 물을 그 반응 혼합물에 미리 혼합한 다음 중합 반응시키므로서 그 자체 반응열 및 외부로부터의 가열열에 의해 기포(氣泡)가 형성되게하여 내부에 기포(cell)가 형성된 연마패드용 폴리우레탄 성형물을 제조하게되는 것이나 이 경우는 폴리우레탄 성형물을 제조하는 공정중에 미리 가열 팽창성 미발포 미소중공체와 물을 혼합한 다음, 폴리우레탄 성형물을 제조하여 그 제조공정중에 내부반응열과 외부반응열에 의해서 미소중공체와 물에의해 기포가 발생되게 해야하므로 제조공정이 복잡하고 그러면서도 기포(cell)를 형성하는 미소중공체의 크기가 다양하지 못하여 다양한 크기의 기포를 형성할 수 없고 그렇다고 다양한 크기의 미소중공체를 설사 첨가한다고 하더라도 그 공정이 복잡하고 까다로워 원가상승 및 양산이 어려운 결점이 있게되며 따라서 셀의 크기가 다양한 폴리우레탄 성형물(폴리우레탄 발포체)을 제조할 수 없는 결점이 있게되며, 이로인해 그 폴리우레탄 발포체로 연마패드를 만들었을 때 평활성과 동시에 연마성이 우수한 연마효과를 내는 연마패드를 제조하기는 어려운 실정이다.Conventionally, precision polishing for polishing a glass surface of a flat panel display (FPD) such as a liquid crystal display (LCD), a plasma display panel (PDP), an organic light emitting diode (OLED), or an accurate and fine polishing surface such as an optical lens As the pad, as shown in FIG. 1, a polyurethane foam layer 3 having a plurality of bubbles 2 formed on a substrate 1 for a polishing pad (foam) is formed, and an abrasive and an adhesive are mixed on the foam layer. A polishing pad (abrasive cloth) in which an abrasive layer 4 is laminated is disclosed in Korean Patent No. 10-0391109, but in this case, it is difficult to precisely polish a glass surface or an optical lens that requires precise polishing as described above. Another example of the polishing pad is a urethane molding for a polishing pad and a method of manufacturing the same have been disclosed in the Republic of Korea Patent Publication No. 2001-0005435 (published on Jan. 15, 2001). When preparing a polyurethane by mixing and synthesizing a letan prepolymer and an active hydrogen-containing compound, the heat-expandable non-foamed microporous body and water are premixed with the reaction mixture and then polymerized to react with each other. The foam is formed by heat from heating, thereby producing a polyurethane molded article for polishing pad having a cell formed therein, but in this case, the heat-expandable non-foamed micro-hollow in the process of manufacturing the polyurethane molded product in advance. After mixing the sieve and water, the polyurethane molding is manufactured and bubbles are generated by the micro-hollow body and the water by the heat of internal reaction and the heat of external reaction during the manufacturing process, which makes the manufacturing process complicated and forms a cell. The size of the micro-hollow body is not diverse, so it is impossible to form bubbles of various sizes. Even if the size of the micro-hollow body is added, the process is complicated and difficult, which leads to a difficulty in cost increase and mass production, and thus there is a drawback in that it is impossible to manufacture a polyurethane molding (polyurethane foam) having various cell sizes. As a result, when the polishing pad is made of the polyurethane foam, it is difficult to produce a polishing pad having smoothness and excellent polishing effect.
또한 상기 두가지 예의 경우에는 연마패드의 연마면이 취약하여 피연마체(유리나 렌스)의 가공시에 그 피연마체의 연마면에 고착된 비교적 크고 단단한 고형물, 예컨데 합성수지 고형물이나 유리절단시의 열에의해 유리분말이 용해된 고형물을 완벽하게 연마제거하기에는 미약한 결점이 있었다.In the above two cases, the polishing surface of the polishing pad is fragile, and relatively large and solid solids adhered to the polishing surface of the polished body (for example, glass or lens), for example, the glass powder due to heat of the synthetic resin solids or glass cutting. There was a minor flaw in the complete removal of this dissolved solid.
이는 연마패드에 다수개의 기포가 형성되어 있어서 너무 연약하기 때문에 단단하게 부착된 고형물을 연마하지 못하고 지나치기 때문이다.This is because a large number of bubbles are formed on the polishing pad, which is so fragile that the solid material adhered hardly cannot be polished.
본 발명은 상기한 바와같은 LCD를 비롯한 FDP의 유리면이나 광학유리(렌즈)와 같은 미세하고 정밀한 표면 연마를 위해 종래의 폴리우레탄 발포체로된 연마패드의 결함을 개선하여 표면 평활성이 우수하고 적절한 강도를 가지면서도 연마면을 미세하고 정밀하게 연마할 수 있고 크고 단단한 고형물도 발포체내에 함유된 연마제의 마찰에의해 쉽게 연마가 가능하면서 광택효과도 동시에 얻을 수 있는 발포 폴리우레탄 연마패드의 제조방법을 제공코저하는 것으로서 이를 실예를 들어 상세히 설명하면 다음과 같다.The present invention improves the defects of the polishing pad made of a conventional polyurethane foam for fine and precise surface polishing, such as the glass surface or optical glass (lens) of the FDP, including the LCD as described above, excellent surface smoothness and appropriate strength Provides a method of manufacturing a foamed polyurethane polishing pad which can polish the polishing surface finely and precisely, and can easily polish large and hard solids by friction of the abrasive contained in the foam and at the same time obtain a gloss effect. If this is described in detail as an example as follows.
도 1 은 종래의 연마패드 단면도.1 is a cross-sectional view of a conventional polishing pad.
도 2 는 본 발명에 따른 연마패드의 단면도.2 is a cross-sectional view of the polishing pad according to the present invention.
*도면중 주요부분에 대한 부호의 설명** Description of the symbols for the main parts of the drawings *
1 : 기재 2 : 기포1: Base material 2: Bubble
3 : 발포층 4 : 연마제층3: foam layer 4: abrasive layer
5 : 연마제 6 : 고형이물질5: abrasive 6: solid foreign matter
7 : 피연마체 8 : 연마패드7: Polished object 8: Polishing pad
도1에 도시된 바와 같이, 기존의 연마패드용 기재(1)위에 폴리우레탄수지를 도포한 후 발포시켜 다수의 기포(2)가 형성된 폴리우레탄수지 발포층(3)이 상기 기재(1)위에 형성되도록 하거나, 먼저 폴리우레탄수지 시트를 필요한 두께로 발포시킨 시트형 발포체나 괴상의 폴리우레탄수지를 발포시킨 괴상의 폴리우레탄수지 발포체를 필요한 두께로 얇게 슬라이싱한 시트형 발포체를 상기 기재(1)위에 접착제로 접착하여 폴리우레탄수지 발포층(3)을 형성한 후, 상기 발포층(3)위에 접착제와 연마제를 혼합한 연마제층(4)을 도포한 것을 연마패드로 하거나, 두꺼운 폴리우레탄수지 시트를 발포시킨 폴리우레탄수지 발포체 자체를 연마패드로 하는 정밀연마용 연마패드에 있어서, 상기 발포층(3)위에 도포하는 연마제층(4)의 연마제는 10~40㎛크기의 직경을 갖는 것을 사용하고, 상기 폴리우레탄수지 발포층(3)은, 도2에 도시된 바와같이, 통상의 폴리우레탄수지에, 그 수지에 대하여 공지의 연마제 중에서 선택된 어느한가지의 연마제(5)를 10~50wt% 첨가하여 발포시키는 것으로 구성하거나, 액상의 폴리우레탄 프리폴리머와 상기 공지의 연마제가 내포된 활성수소함유 화합물을 혼합한 것을 발포시키는 것으로 구성함을 특징으로하는 다수의 기포(2)를 갖는 정밀연마용 발포 폴리우레탄 연마패드이다.As shown in Fig. 1, a polyurethane resin foam layer 3 having a plurality of bubbles 2 formed thereon by applying a polyurethane resin on a substrate 1 for a conventional polishing pad and foaming is formed on the substrate 1. A sheet-like foam in which a polyurethane resin sheet is foamed to a required thickness, or a sheet-like foam in which a bulky polyurethane resin foam in which a bulky polyurethane resin is foamed to a required thickness is sliced thinly with an adhesive on the substrate (1). After adhering to form the polyurethane resin foam layer (3), to apply a polishing pad (4) mixed with an adhesive and an abrasive on the foam layer (3) as a polishing pad or to foam a thick polyurethane resin sheet In the polishing pad for precision polishing, wherein the polyurethane resin foam itself is used as the polishing pad, the abrasive of the abrasive layer 4 applied on the foam layer 3 has a diameter of 10 to 40 µm. 2, the polyurethane resin foam layer 3, as shown in Figure 2, 10 to 50wt of any one abrasive (5) selected from known abrasives for the resin in a conventional polyurethane resin For fine grinding with a plurality of bubbles (2), characterized in that the foaming by adding a foamed%, or foaming a mixture of a liquid polyurethane prepolymer and an active hydrogen-containing compound containing the known abrasive. Foam polyurethane polishing pads.
상기에서 공지의 연마제로는 산화셀륨(CeO2), 산화알루미늄(AL2O3), 실리콘 카바이드(Sic), 산화철(Fe2O3), 산화크롬(Cr2O3), 다이어몬드, 산화규소 또는 지르코니아(산화 지르코늄)등이 사용될 수 있다.Known abrasives include cerium oxide (CeO 2 ), aluminum oxide (AL 2 O 3 ), silicon carbide (Sic), iron oxide (Fe 2 O 3 ), chromium oxide (Cr 2 O 3 ), diamond, and oxidation Silicon or zirconia (zirconium oxide) and the like can be used.
상기에서 액상의 폴리우레탄 프리폴리머의 합성과 연마제가 내포된 활성수소함유 화합물의 제조방법 및 그것들에의한 연마패드용 폴리우레탄 발포체의 제조방법은 다음과 같다.Synthesis of a liquid polyurethane prepolymer in the above and a method for producing an active hydrogen-containing compound containing an abrasive and a method for producing a polyurethane foam for a polishing pad by them are as follows.
1) 폴리우레탄 프리폴리머(polyurethane prepolymer)합성1) Polyurethane prepolymer synthesis
4.4'-디페닐메탄디이소시아네이트(4.4'-dephenylmethane diisocyanate) (이하 MDI라 함)60∼70wt%와, 폴리머릭(polymeric) MDI(이하 PMDI라 함)3∼6wt% 및 3000이하 저분자량의 폴리프로필렌그리콜 (polypropylene glycol)(이하 PPG라 함) 20∼30wt%를 반응기에 넣고 75∼85℃의 온도로 1.5∼2.5시간동안 질소분위기 하에서 합성하여 25℃에서 점도가 3000∼4000cps인 액상의 폴리우레탄의 프리폴리머를합성한다.4.4'-dephenylmethane diisocyanate (hereinafter referred to as MDI) 60 to 70 wt%, polymeric MDI (hereinafter referred to as PMDI) 3 to 6 wt% and below 3000 molecular weight poly 20-30 wt% of polypropylene glycol (hereinafter referred to as PPG) was added to the reactor and synthesized under nitrogen atmosphere for 1.5-2.5 hours at a temperature of 75-85 ° C. A liquid poly with a viscosity of 3000-4000 cps at 25 ° C. A prepolymer of urethane is synthesized.
2) 연마제가 내포된 활성수소함유 화합물 제조2) Preparation of Active Hydrogen-Containing Compound Containing Abrasive
폴리에틸렌그리콜(polyethylene glycol)(이하 PEG라고 함)30∼35wt%와, 3000이상 고분자량의 폴리프로필렌그리콜(polypropylene glycol)(이하 PPG라고 함) 30∼35wt%와, 트리에타놀아민(triethanol amine)(이하 TEA라 함) 35∼40wt%와, 물 0.01∼ 0.3wt%와, 실리콘소포제(상품명 SAG-1000)0.01∼2.0wt% 및, 디브틸주석디라우레이트 (dibutyltindilaurate)(이하 DBTDL라 함)0.1∼0.3wt%의 혼합물에, 상기 혼합물에 대하여 산화셀륨(CeO2), 산화알루미늄(AL2O3), 실리콘 카바이드(Sic), 산화철(Fe2O3), 산화크롬(Cr2O3), 다이어몬드, 산화규소, 지르코니아(산화 지르코늄)중에서 선택된 어느 하나의 연마제(5) 10∼50wt%를 혼합하여 반응기에 넣고 1.5∼2.5시간동안 혼련 교반하여 활성수소함유 화합물을 얻는다.30 to 35 wt% of polyethylene glycol (hereinafter referred to as PEG), 30 to 35 wt% of high molecular weight polypropylene glycol (hereinafter referred to as PPG) and triethanol amine 35-40 wt% (hereinafter referred to as TEA), 0.01-0.3 wt% of water, 0.01-2.0 wt% of silicone antifoaming agent (trade name SAG-1000), and dibutyltindilaurate (hereinafter referred to as DBTDL) In a mixture of 0.1 to 0.3 wt%, cerium oxide (CeO 2 ), aluminum oxide (AL 2 O 3 ), silicon carbide (Sic), iron oxide (Fe 2 O 3 ), and chromium oxide (Cr 2 O) 3 ), 10 to 50 wt% of any one of the abrasives (5) selected from diamond, silicon oxide and zirconia (zirconium oxide) are mixed and mixed in a reactor for 1.5 to 2.5 hours to obtain an active hydrogen-containing compound.
3) 연마 패드용 폴리우레탄 발포체의 제조.3) Preparation of Polyurethane Foam for Polishing Pads.
상기에서 얻어진 25℃에서 점도가 3000∼4000cps인 액상의 폴리우레탄 프리폴리머와 상기에서 얻어진 연마제가 내포된 활성수소함유 화합물을 1:1의 비율로 혼련 교반하되, 여과 및 건조된 에어를 공기주입장치를 통하여 투입하여 기포를 발생시키면서 0.5∼3.0분간 혼련 교반한후 30∼40℃로 예열된 성형틀에 주입하여 경화가 될 때까지 유지시키므로서 내부에 기포(2)가 발생되게하여 폴리우레탄 발포체를 얻는다.At 25 DEG C obtained above, the liquid polyurethane prepolymer having a viscosity of 3000 to 4000 cps and the active hydrogen-containing compound containing the abrasive obtained in the above are kneaded and stirred in a ratio of 1: 1, and the filtered and dried air is Mixing and stirring for 0.5 to 3.0 minutes while generating bubbles by injecting into a mold preheated to 30 to 40 ° C. and maintaining it until hardening is carried out so that bubbles 2 are generated inside to obtain a polyurethane foam. .
4) 이상과 같이 얻어진 폴리우레탄 발포체를 일정한 두께와 크기로 슬라이싱하여(얇게 베내어) 얻은 시트(2)로된 발포체를 통상의 연마패드용 기재(1)위에 적층하여 다수의 기포(2)를 갖는 정밀연마용 폴리우레탄 연마패드를 얻는다.4) A foam made of the sheet 2 obtained by slicing (cutting) the polyurethane foam obtained as described above in a constant thickness and size is laminated on a substrate 1 for a conventional polishing pad to form a plurality of bubbles 2. A polyurethane polishing pad for fine polishing having is obtained.
상기에서 통상의 연마패드용 기재(1)로는 폴리에스텔수지(P.E.T), 폴리프로필렌수지(P.P), 폴리에틸렌수지(P.E)로된 플라스틱 필름중에서 선택된 어느한가지나, 직포 또는 부직포중에서 선택된 어느한가지로 한다.The substrate 1 for a conventional polishing pad may be any one selected from a plastic film made of polyester resin (PET), polypropylene resin (PP), and polyethylene resin (PE), or any one selected from woven and nonwoven fabrics. .
이상과 같이 구성되는 다수의 기포(2)를 갖는 정밀 연마용 폴리우레탄 연마패드는 폴리우레탄 발포층(3)에 공히 통상의 각종 연마제(5)가 함유되어 있어서 연마시에 연마패드의 표면에 도포된 연마제층(4)에 의해 피연마면(도3의 (7))을 1차적으로 애벌연마하되, 도3에 도시된 바와같이, 연마시에 피연마체(7)와 연마패드(8)의 압착에의하여 연마패드(8)와 피연마체(7)가 밀착되므로서 연마패드(8)의 표면에 도포된 연마제층(4)은 물론 발포층(3)에 형성된 기포(2)의 내면도 피연마체(7)의 연마면에 닿게되어 그 기포의 내면에 노출된 연마제(5)에 의해서도 피연마체(7)의 표면에 고착된 고형 이물질(6)까지 정밀하게 연삭하게되어 표면 연마제층(4)과 함께 연마를 하면서 광택효과도 내게되는 이중효과가 있게되는 것이다.The polyurethane polishing pad for precision polishing having a plurality of bubbles 2 constituted as described above contains all kinds of ordinary abrasives 5 in the polyurethane foam layer 3 and is applied to the surface of the polishing pad during polishing. The polishing surface (Fig. 3 (7)) is primarily polished by the polished abrasive layer 4, and as shown in Fig. 3, the polishing object 7 and the polishing pad 8 are polished at the time of polishing. As the polishing pad 8 and the abrasive body 7 are brought into close contact by pressing, the inner surface of the foam 2 formed on the foam layer 3 as well as the abrasive layer 4 coated on the surface of the polishing pad 8 are also coated. The abrasive layer 5 which contacts the polishing surface of the horse body 7 and is exposed to the inner surface of the bubble is precisely ground up to the solid foreign matter 6 adhered to the surface of the abrasive body 7 so that the surface abrasive layer 4 With the polishing, there is a dual effect that gives a gloss effect.
상기에서 발포층(3)위에 도포되는 연마제(4)의 크기를 10~40㎛로하는 것은 그 이하에서는 연마성이 미약하고 그 이상에서는 피연마체(7)의 연마면에 스크래치(긁힘현상)를 발생시킬 위험이 있기 때문에, 스크래치없이 피연마면을 연마 및 광택을 내게하기위한 것이며, 상기에서 발포층(3)에 내포되는 공지의 연마제를 10~50wt% 첨가하는 것은 상기한 바와같이 연마패드(8)와 피연마체(7)와의 압착에의해 밀착시에 기포(2)내면에 노출된 연마제(5)에의해 피연마체(7)의 표면에 고착된돌출 고형이물질(6)(chip)까지도 연마하기위한 것이고 그 첨가량을 10~50wt%로 하는 것은 폴리우레탄 수지와의 혼화성이 좋고 그러면서 연마성이 우수하게 하기위한 것이며 그 이하에서는 연마성이 미약하고 그 이상에서는 스크래치의 발생우려가 있기 때문이다.In the above, the size of the abrasive 4 applied on the foam layer 3 to 10 to 40 μm is less than that of the polishing property, and more than that scratches (scratching phenomenon) on the polishing surface of the abrasive body 7 It is intended to polish and polish the to-be-polished surface without scratching because of the risk of occurrence, and the addition of 10 to 50 wt% of the known abrasive contained in the foam layer 3 above may be performed by the polishing pad ( 8) Abrasion of even the protruding solid foreign matter 6 (chip) adhered to the surface of the to-be-polished body 7 by the abrasive 5 exposed to the inner surface of the bubble 2 at the time of close contact by the crimping of the to-be-polished body 7). The addition amount is set to 10 to 50 wt% because of good miscibility with the polyurethane resin and excellent polishing, and less than that, the polishing is weak and there is a possibility of scratching. .
상기 폴리우레탄 프리폴리머의 합성 공정에서, MDI는 저분자량의 PPG와 반응하여 액상의 폴리우레탄을 합성하기 위한 것이고 PMDI는 MDI를 변성시킨 변성 MDI로서 반응의 안정성을 부여하여 상기 폴리우레탄 합성과정에서 쉽게 경화되어 합성 반응이 중단되지 않고 액상으로 유지되면서 합성반응이 완료된 후에도 경화되지 않고 액체상태로 유지되게 하여 다음 공정에서 제조되는 활성수소 함유 화합물과 쉽게 혼련 융합되어 기포가 발생된 폴리우레탄 발포체를 얻기 위한 것이다.In the process of synthesizing the polyurethane prepolymer, MDI is for synthesizing a liquid polyurethane by reacting with low molecular weight PPG, and PMDI is a modified MDI modified with MDI to impart stability of the reaction to easily cure in the polyurethane synthesis process. This is to obtain a polyurethane foam in which bubbles are generated by being easily kneaded and fused with an active hydrogen-containing compound produced in the next step, so that the synthesis reaction is maintained in a liquid state without stopping the synthesis reaction. .
상기에서 폴리우레탄 제조시의 주재료인 MDI를 60∼70wt%로 첨가하고 3000이하 저분자량의 PPG를 20∼30wt%첨가하는 것은 그 첨가량을 벗어나는 양으로 첨가하게 되면 두반응 물질의 반응당량의 불균형으로 어느 한가지 물질은 미반응량이 발생하게 되고 다른 한가지 물질은 부족한 현상이 일어나기 때문에 상기 첨가량이 가장 바람직하며, PMDI의 첨가량 3∼6wt%는 상기 프리폴리머형 폴리우레탄을 액체상태로 유지하기 위한 것으로서 상기 량 이하의 양으로는 양이 너무 적어서 합성 반응이 쉽게 이루어지지 않으며 상기량 이상의 양으로는 이 반응에 의해 생성되는 프리폴리머의 점도가 너무 높아져서 후공정에서 얻어지는 활성수소 화합물과의 혼합교반시, 교반을 원활히 할 수가 없고, 또한 그렇게 하여 얻어진 연마패드의 가교밀도가 너무 높아져서 연마패드가 너무 단단해지기 때문에 정밀하고 미세한 연마효과를 기대하기 어렵게 된다.When MDI, which is the main material for polyurethane production, is added in an amount of 60 to 70 wt% and 20 to 30 wt% of low molecular weight PPG of less than 3000 is added in an amount that is out of the amount, the reaction equilibrium of the two reactants is imbalanced. Since the amount of unreacted material is one of the substances and the amount of the other material is insufficient, the amount of addition is most preferable, and the amount of PMDI added is 3 to 6 wt% to keep the prepolymer polyurethane in a liquid state. The amount of is so small that the synthesis reaction is not easy. The amount of the prepolymer produced by this reaction becomes too high in an amount greater than the amount so that the stirring can be smoothed when mixing with the active hydrogen compound obtained in the subsequent step. And the crosslinking density of the thus obtained polishing pad is too high, It becomes difficult to expect a precise and fine grinding effect, since too hardened.
더욱이 상기 폴리우레탄 프리폴리머 합성에 첨가된 물질의 첨가량은 이 합성에 의해 제조된 25℃에서 점도가 3000∼4000cps인 액상의 폴리우레탄 프리폴리머를 후공정에 의해 제조되는 활성수소 함유 화합물과 혼합시에 양물질을 1:1로 혼합하기에 가장 알맞은 당량에 해당하기 때문이다.Furthermore, the amount of the substance added to the polyurethane prepolymer synthesis was good at the time of mixing the liquid polyurethane prepolymer having a viscosity of 3000 to 4000 cps at 25 ° C. prepared by this synthesis with the active hydrogen-containing compound produced by the post process. This is because it corresponds to the most suitable equivalent for mixing 1: 1.
상기 폴리우레탄 프로폴리머 합성시의 반응온도는 75℃이하에서는 반응속도가 느리거나 합성반응이 일어나지 않게되고 85℃이상에서는 과열되어 경화되거나 타버리기 쉬우므로 75∼85℃범위의 온도가 합성반응 온도로서 가장 적합하다.The reaction temperature in the synthesis of the polyurethane copolymer is 75 ° C or less, the reaction rate is slow or the synthesis reaction does not occur, and over 85 ° C or more it is easy to cure or burn, so the temperature range of 75 to 85 ° C as the synthesis reaction temperature Most suitable.
이때의 반응시간은 상기 온도와 첨가량이 적절히 유지되었을 때는 반응온도 조절에 따라 1.5∼2.5시간 사이에서 합성반응이 종료되게 되어 액상 폴리우레탄 프리폴리머를 얻게된다.At this time, when the temperature and the amount of addition are properly maintained, the synthesis reaction is terminated between 1.5 and 2.5 hours according to the reaction temperature control to obtain a liquid polyurethane prepolymer.
상기 활성수소 함유 화합물 제조공정에서, PEG에 PPG를 혼합하므로서 후공정의 폴리우레탄 제조공정에서 가열에 의하여 블럭 공중합을 일으켜 계면활성제가 되게 되고 이와같이 생성된 계면 활성제는 폴리우레탄 프리폴리머와 활성수소 함유 화합물이 반응시에 반응물내에서 기포가 발생되게 하며 여기에서 PEG와 PPG의 첨가량은 모두 30∼35wt%씩 등량으로 첨가하므로써 여분의 미반응 물질이 없이 가장 완벽한 계면 활성제가 생성되게 한 것이며, 또한 이 공정에서 첨가되는 TEA는 공중합 촉진제겸 가교제로서 사용된 것으로서 상기 폴리우레탄 프리폴리머 제조용 반응물질들의 증합과 PEG와 PPG의 중합을 가교 결합에 의해 촉진하기 위한 것이고 그 첨가량은 35wt%이하에서는 가교반응이 더디면서 최종생성물인 연마패드의 경도가 너무 낮아 연마효과가 저하되며 40wt%이상에서는 너무 빨리 중합반응이 일어나면서 가교밀도가 너무 높아져서 그 결과 얻어진 최종생성물인 연마패드의 경도가 너무 높아 미세하고 정밀한 연마가 어렵게 되며 따라서 35∼40wt%로 첨가하는 것이 가장 바람직하다. 또 상기 반응에서 물을 첨가하는 것은 상기 PEG와 PPG에 의해 생긴 계면 활성제에 의해서도 기포가 발생되지만 기포의 크기를 다양화하기 위하여 물을 첨가하므로서 물과 이소시아네이트와의 반응에 의하여 탄산가스가 발생하게 되므로 계면 활성제에 의해 발생되는 기포외에 물에 의해 발생되는 탄산가스에 의한 기포가 혼합되어 크기가 상이한 다양한 기포를 발생시키기 위한 것이고 그 첨가량은 0.01wt%이하에서는 기포의 발생이 현저히 저하되고 0.3wt%이상에서는 PEG와 PPG로된 계면 활성제에 의한 기포발생을 방해하게 되고 따라서 연마패드의 밀도를 저하시키게 되므로 연마패드가 너무 유연하게 되어 목적하는 연마효과를 얻을 수 없다. 따라서 0.01wt%∼0.3wt%의 첨가가 가장 바람직하다.In the manufacturing process of the active hydrogen-containing compound, the PPG is mixed with PEG to form a block copolymer by heating in a polyurethane manufacturing process in a later step, and thus the surfactant is a polyurethane prepolymer and the active hydrogen-containing compound In the reaction, bubbles are generated in the reactants, and the addition amount of PEG and PPG in the same amount of 30 to 35wt% is added to produce the most perfect surfactant without extra unreacted material. TEA to be added is used as a copolymerization accelerator and a crosslinking agent to promote the polymerization of the polyurethane prepolymer preparation and the polymerization of PEG and PPG by crosslinking, and the addition amount is less than 35wt%, resulting in slow crosslinking reaction and final product. Phosphorus Polishing Pad is too low and the polishing effect is lowered In said 40wt% or more so fast and the polymerization reaction occurs while the cross-link density so high that the result is the hardness of the polishing pad is too high the resulting final product, the fine, precise grinding difficult therefore it is most preferable to add a 35~40wt%. In addition, the addition of water in the reaction is bubble generated by the surfactant produced by the PEG and PPG, but carbon dioxide gas is generated by the reaction of water and isocyanate by adding water to diversify the bubble size In addition to the bubbles generated by the surfactant, bubbles generated by carbon dioxide generated by water are mixed to generate various bubbles having different sizes. When the amount is less than 0.01 wt%, bubbles are significantly reduced and 0.3 wt% or more. In this case, the bubble is prevented by the surfactant made of PEG and PPG, and thus, the density of the polishing pad is lowered, so that the polishing pad becomes too flexible and thus the desired polishing effect cannot be obtained. Therefore, the addition of 0.01wt%-0.3wt% is most preferred.
상기에서 실리콘 소포제는 상기 계면 활성제와 물에 의해 발생되는 기포의 량의 조절과 기포의 크기를 다양화하기 위한 것으로서 0.01wt%이하 첨가에서는 소포작용 효과가 미미하고 2.0wt%이상 첨가에서는 과잉 소포작용을 하므로 0.01∼2.0wt%로 첨가하는 것이 가장 바람직하다.The silicone antifoaming agent is to control the amount of bubbles generated by the surfactant and water and to diversify the size of the bubbles. The defoaming effect is insignificant in the addition of 0.01 wt% or less, and the excessive antifoaming in the addition of 2.0 wt% or more. It is most preferable to add it at 0.01 to 2.0wt%.
DBTDL은 반응촉진제겸 안정된 중합반응이 일어나도록 하기 위한 안정제로서 이는 PEG와 PPG 및 TEA의 반응시에 부반응없이 안정한 중합반응이 일어나게 하면서 반응을 촉진시키기 위한 것으로서 0.1∼0.3wt%가 가장 바람직하고 그 이하에서는 안정성이 미약하여 반응이 지연되거나 변성된 반응이 일어나게 되고 그 이상에서는오히려 반응을 저해 및 지연시키게 된다.DBTDL is a reaction accelerator and a stabilizer for the stable polymerization reaction, which promotes the reaction with a stable polymerization reaction without side reactions during the reaction of PEG, PPG and TEA, with 0.1 to 0.3 wt% being most preferred. In the case of low stability, the reaction is delayed or a denatured reaction occurs. Above that, the reaction is inhibited and delayed.
상기 연마패드용 폴리우레탄 발포체 제조공정에 있어서, 액상의 폴리우레탄 프리폴리머의 점도가 3000~4000cps인 것을 사용하는 것은 활성수소함유 화합물과 혼화성이 가장 좋은 점도이기 때문이며 액상의 폴리우레탄 프리폴리머와 활성수소 함유 화합물을 30∼40℃의 예열된 몰드내에서 혼련 교반하므로서 액상의 프리폴리머가 활성수소 화합물내의 TEA에 의해 반응이 촉진되어 폴리우레탄 발포체로 고화되면서 상기 활성수소 함유 화합물도 가열되면서 그 활성수소 함유 화합물내의 TEA에 의하여 반응이 촉진되어 PEG와 PPG에 의한 계면 활성제와 물에 의해 기포가 발생되면서 실리콘 소포제에 의해 기포(cell)의 발생양이 조절되게 되는데 이때 공기주입장치를 통하여 공기를 주입하면서 교반하게 되면 상기 계면 활성제와 물 및 공기에 의하여 다양한 기포가 발생되게 되고 그 기포 발생과 혼련 교반에 의해 연마제가 균일하게 분산되어 폴리우레탄 발포체내에 분산 존재하게 된다.In the polyurethane foam manufacturing process for the polishing pad, the liquid polyurethane prepolymer having a viscosity of 3000 to 4000 cps is used because it has the best compatibility with the active hydrogen-containing compound and contains the liquid polyurethane prepolymer and active hydrogen. As the compound is kneaded and agitated in a preheated mold at 30 to 40 ° C., the liquid prepolymer is promoted by TEA in the active hydrogen compound to solidify into a polyurethane foam, and the active hydrogen-containing compound is also heated while being in the active hydrogen-containing compound. The reaction is accelerated by TEA and bubbles are generated by surfactant and water by PEG and PPG, and the amount of generation of cells is controlled by silicone antifoaming agent. Various air bubbles by the surfactant and water and air Be generated and the slurry is uniformly dispersed by the bubbling stirring and kneading it is present dispersed in the polyurethane foam.
이 연마패드용 폴리우레탄 발포체 제조공정에서 폴리우레탄 프리폴리머와 활성수소 함유 화합물을 1:1등량으로 혼합하는 것은 양물질이 균일하게 혼합되어 반응후 미반응물이 발생하지 않도록 하기 위한 것으로서 만약 어느 한쪽이 과량으로 첨가되게 되면 미반응 양의 물질이 남아서 반응을 저해 또는 지연시키게 된다.In the manufacturing process of polyurethane foam for polishing pads, the mixing of the polyurethane prepolymer and the active hydrogen-containing compound in a 1: 1 equivalent amount is performed so that both substances are uniformly mixed so that unreacted substances do not occur after the reaction. When added as, unreacted amounts of material remain, which inhibits or delays the reaction.
또한 이 반응에서 0.5∼3.0분간 교반하면서 성형하는 것은 30℃∼40℃의 예열된 모울드하에는 그 시간 범위에서 폴리우레탄 발포체가 형성 및 경화되기 때문이다.Molding with stirring for 0.5 to 3.0 minutes in this reaction is also because the polyurethane foam is formed and cured in the time range under a preheated mold of 30 ° C to 40 ° C.
이상과 같은 본 발명 제조방법으로 정밀 폴리우레탄 연마패드를 제조하게 되면 폴리우레탄 발포체내에 기포를 발생시키기 위하여 물과 함께 미소중공구체를 내포시킬 필요가 없게되므로 제조공정이 간편용이하게되고 뿐만 아니라 폴리우레탄 발포체로된 시트내에는 다양한 크기의 기포(cell)가 알맞은 양으로 발생하여 내재하므로 이 우레탄 발포체로된 시트로 연마패드를 제작하였을때 패드가 강인하면서도 쿳션성이 우수하고 패드 표면의 평활성도 우수하여 LCD를 비롯한 FPD의 유리나 광학렌즈와 같은 정밀하고 미세한 면을 연마하기에 아주 편리하고 연마성이 극히 양호한 효과가 있고 또한 본 발명에 의하여 제조된 다수의 기포를 갖는 정밀 연마용 폴리우레탄 연마패드는 그 cell의 직경이 100㎛∼1000㎛인 것이 5∼30%이고 1∼100㎛인 것이 70∼95%에 달하여 다양한 cell이 형성되어 있어서 연마패드의 평활성, 연마성 및 쿳션성이 우수한 효과가 있다.When the precision polyurethane polishing pad is manufactured by the method of the present invention as described above, it is not necessary to enclose the microspheres with water in order to generate air bubbles in the polyurethane foam, thus simplifying the manufacturing process as well as polyurethane. In the sheet made of foam, various sizes of cells are generated and inherent. Therefore, when the polishing pad is made of this urethane foam sheet, the pad is strong and has excellent cushioning properties and excellent surface smoothness. It is very convenient to polish precision and fine surface such as glass or optical lens of FPD including LCD, and the polishing effect is extremely good, and the precision polishing polyurethane polishing pad having many bubbles produced by the present invention is 5 ~ 30% of the cell diameter is 100 ~ 1000㎛, and 70 ~ 95% of 1 ~ 100㎛ W a is formed in a variety of cell having excellent smoothness, abrasion and cushion effect of the polishing pad.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100754282B1 (en) * | 2006-02-08 | 2007-09-03 | 엠.씨.케이 (주) | Porous abrasive paper and its manufacturing method |
| KR101103146B1 (en) * | 2011-09-05 | 2012-01-04 | 이화다이아몬드공업 주식회사 | Multi grinding wheel for OLD substrate with excellent grinding quality and OLD substrate grinding method using same |
| KR101309175B1 (en) * | 2012-07-30 | 2013-09-23 | 엠.씨.케이 (주) | Method of manufacturing a polishing sheet having protruded polishing cells covered with a reenforcing layer |
| KR20180066015A (en) | 2018-06-07 | 2018-06-18 | 김명묵 | A polishing cloth using polyurethane foaming resin and method for manufacturing it |
| CN113183008A (en) * | 2021-03-31 | 2021-07-30 | 安徽禾臣新材料有限公司 | Porous polyurethane polishing pad and polishing pad concave part forming method thereof |
| KR20220165911A (en) | 2021-06-09 | 2022-12-16 | (주)대명연마 | Abrasive polishing pad and manufacturing method thereof |
| CN115958542A (en) * | 2022-10-09 | 2023-04-14 | 宁波赢伟泰科新材料有限公司 | Preparation method and application of chemical mechanical polishing pad |
-
2004
- 2004-10-22 KR KR1020040084850A patent/KR20040097063A/en not_active Ceased
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100754282B1 (en) * | 2006-02-08 | 2007-09-03 | 엠.씨.케이 (주) | Porous abrasive paper and its manufacturing method |
| KR101103146B1 (en) * | 2011-09-05 | 2012-01-04 | 이화다이아몬드공업 주식회사 | Multi grinding wheel for OLD substrate with excellent grinding quality and OLD substrate grinding method using same |
| KR101309175B1 (en) * | 2012-07-30 | 2013-09-23 | 엠.씨.케이 (주) | Method of manufacturing a polishing sheet having protruded polishing cells covered with a reenforcing layer |
| KR20180066015A (en) | 2018-06-07 | 2018-06-18 | 김명묵 | A polishing cloth using polyurethane foaming resin and method for manufacturing it |
| CN113183008A (en) * | 2021-03-31 | 2021-07-30 | 安徽禾臣新材料有限公司 | Porous polyurethane polishing pad and polishing pad concave part forming method thereof |
| KR20220165911A (en) | 2021-06-09 | 2022-12-16 | (주)대명연마 | Abrasive polishing pad and manufacturing method thereof |
| CN115958542A (en) * | 2022-10-09 | 2023-04-14 | 宁波赢伟泰科新材料有限公司 | Preparation method and application of chemical mechanical polishing pad |
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