JPH0910714A - Method of ultrasonic cleaning of development residue - Google Patents

Abstract

(57) [Abstract] [Purpose] In developing a photosensitive material applied to the surface of a substrate such as a glass plate or a metal plate, to easily remove the residue remaining on the surface of the substrate after the processing. [Structure] An ultrasonic oscillating horn tip 11 is brought close to three residues attached to a substrate surface such as a glass substrate 1 through a mediating liquid 21 using water or an appropriate solvent, and the attached residues 3 are ultrasonically vibrated. Method for ultrasonic cleaning of development residue removed by.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to photofabrication such as photoetching and pattern etching. When a photosensitive film coated on a substrate such as a glass plate or a metal plate is exposed and developed, the substrate surface is developed and removed. The present invention relates to a method for ultrasonically cleaning a development residue for ultrasonically cleaning and removing unnecessary residues such as a photosensitive film that cannot be left.

[0002]

2. Description of the Related Art Conventionally, for example, as a pattern formation of a colored pattern of a color filter by photofabrication, a spin coating method such as a spin coating method (a spin coating method using a high speed spinner), a dipping coating method (a pull coating). Method, etc., and then a photosensitive colorant is applied and dried, and then a dried filter film of the colorant is exposed to a predetermined filter pattern and developed to form a colored pattern. There is.

[0003]

When a photosensitive colorant is applied onto the above glass substrate by a spin coating method or a dipping coating method, the glass substrate and the liquid surface of the photosensitive colorant (color photoresist solution). Due to tension and the like, the colorant film tends to be thick especially at the edges of the glass substrate.

After subjecting this to pattern exposure as appropriate, development processing (including water washing processing) with a developing solution is performed, and as shown in FIG.
In addition, the colorant having a large film thickness may not be completely removed by development and may remain as a residue 3 on the peripheral edge portion 2 of the glass substrate 1.

Therefore, conventionally, it is the actual situation that the residue is manually scraped off with a polishing sheet or a razor or a cutter knife, or is removed by polishing with a rotary polishing tool such as a small drill, but the residue is completely removed. However, there are inconveniences such as not being completely removed, the shavings being powdered and scattered, and reattaching to the substrate side.

It is an object of the present invention to easily remove the residue remaining on the surface of the substrate after the processing, such as in the development processing of the photosensitive material applied to the surface of the substrate such as a glass plate or a metal plate.

[0007]

According to the present invention, a tip of an ultrasonic oscillating horn is brought close to a place where residue is attached to a substrate such as a glass substrate through water or an intermediary liquid using an appropriate solvent. An ultrasonic cleaning method for developing residue is characterized in that the adhering residue is removed by ultrasonic vibration.

[0008]

EXAMPLE The method for ultrasonically cleaning the development residue of the present invention will be described in detail below. FIG. 1 (a) is a side view for explaining an example of the method of the present invention.

A required predetermined image pattern 4 is formed on the upper surface of the glass substrate 1 which has been appropriately developed, and the edge portion 2 and the like of the substrate 1 cannot be completely developed and removed by the developing process. Residue 3 is attached.

Where the residue 3 is generated, for example,
In FIG. 1 (a), first, water or an appropriate inorganic solvent, or an intermediary liquid such as an organic solvent is supplied from a liquid supply means B such as a liquid supply nozzle to the place where the residue 3 is generated at the ends 2 and 2 of the glass substrate 1. 21 is supplied, and the residue 3 is immersed in the intermediary liquid 21.

Then, while the intermediary liquid 21 is being supplied, the ultrasonic oscillating horn 12 is brought close to the end 2 of the glass substrate 1 by using the ultrasonic oscillating means A, and the ultrasonic horn 12 is brought to the tip. An intermediary liquid 21 in which the tip portion 11 of an ultrasonic oscillating horn that oscillates a certain ultrasonic wave is immersed in the residue 3 of the end portion 2.
Insert it into the inside of the remnant 3 and place it at a position right above the residue 3, for example, 0.
Positioning is set with a gap (gap) of about 3 mm to 2.0 mm (or the extent that the ultrasonic oscillation horn tip 11 is not separated from the liquid surface of the intermediary liquid 21). The ultrasonic oscillation horn tip portion 11 is positioned and set with a sufficient distance from the image pattern 4 as much as possible.

The ultrasonic wave oscillating means A used in the method of the present invention is, as shown in FIG.
2, an oscillation booster 13 for amplifying and adjusting the oscillation output of the ultrasonic oscillating horn 12, a converter 14 for converting an electric signal for oscillation into a sound wave, and an oscillation circuit section for outputting an electric signal for oscillation to the converter 14. It can be performed by using a known oscillating means provided with 15.

Subsequently, ultrasonic vibrations s are oscillated from the inserted ultrasonic oscillating horn tip 11, and the oscillating ultrasonic vibrations s pass through the intermediary liquid 21 and remain in the residue 3 of the end 2.
And ultrasonically vibrates the solid residue 3 and
Due to the vibration s, the residue 3 is peeled off from the surface of the glass substrate 1 or is crushed into fine particles to be destroyed,
The glass substrate 1 is released further, and the glass substrate 1 is washed and removed. In addition,
A suitable oscillation time is about 3 seconds to 10 seconds, but is not limited to this.

The set conditions for cleaning and removing the residue of the ultrasonic vibrating means A in one embodiment of the method of the present invention will be described below. Conditions: Oscillation booster output 1: 1 or 1: 2 Ultrasonic oscillation horn output Sound wave frequency 20 kHz, 40 kHz Gap 0.5-1.5 mm Oscillation required time 5 seconds

The residue 3 released from the glass substrate 1 is dispersed or dissolved in the intermediary liquid 21, and is appropriately discharged together with the intermediary liquid 21 as a cleaning waste liquid.

Since the ultrasonic oscillating horn tip portion 11 is set at a position separated from the image pattern 4 portion,
The image pattern 4 portion is not affected by the vibration s of the ultrasonic waves and peeling does not occur. FIG. 1B is a side cross-section of the glass substrate 1 after cleaning and removing the residue 3 remaining on the end portion 2.

In the method of the present invention, it is necessary to control the immersion area of the intermediary liquid 21 so that the required image pattern 4 is not affected by the vibration s of the ultrasonic oscillation horn tip 11. The immersion area is preferably set and supplied so as not to overlap the image pattern 4 as much as possible.

The intermediary solution 21 used in the method of the present invention
Can be an aqueous inorganic solvent such as a water solvent, an alkaline solvent, or an acidic solvent, or an aqueous or oily organic solvent, and is preferably a solvent capable of dissolving the residue 3.

FIG. 2A shows an embodiment of setting the supply area of the intermediary liquid 21 by the liquid supply means B in the method of the present invention, which is attached to the end portion 2 of one side of the rectangular glass substrate 1. Only the residue 3 is soaked by the intermediary liquid 21,
Arranged so that the corner portion 1a of the rectangular glass substrate 1 is inclined lower than the other corner portions with respect to the horizontal plane (XY plane) (inclination angle θ _x with respect to X direction, θ _{y with} respect to Y direction). Then, the liquid supply means B is set above the other corner portion 1b of the glass substrate 1, and the intermediary liquid 21 is made to flow from the corner portion 1b toward the corner portion 1a so that the image pattern 4 intervenes. Liquid 21
It shows a case where the liquid supply region is set so as not to be immersed by.

In FIG. 2B, with respect to the horizontal plane (XY plane), only the residue 3 attached to the end 2 on one side of the rectangular glass substrate 1 is soaked by the intermediary liquid 21. Both corners 1a and 1b sandwiching one side of the glass substrate 1 are set in parallel, the glass substrate 1 is arranged so as to be inclined lower than the other corners, and the intermediary liquid 21 is placed on one side sandwiched between the corners 1a and 1b. It is designed to let the water flow down.

The supply of the intermediary liquid 21 in the method of the present invention can be carried out by a washing tank system in addition to the above-mentioned supply by the liquid supply nozzle or the like, and the cleaning tank system can be stored in the tank. Alternatively, after immersing the residue 3 part attached to the end portion 2 of the glass substrate 1 in the intermediary solution 21 which is circulated and supplied, the ultrasonic oscillation horn tip 11 is inserted into the intermediary solution 21 so as to be washed and removed. May be.

Next, another embodiment of the present invention will be described.
FIG. 3A, the ultrasonic oscillating horn 12 of the ultrasonic oscillating means A.
The side surface 11a of the vibrating horn tip 11 of FIG.
(B) The residue 3 attached to the side surface of the end 2 of the glass substrate 1 is applied through the intermediary liquid 21 and brought into contact therewith to remove the residue 3 attached to the side surface of the glass substrate 1. . The residue 3 attached to the side surface of the end 2 of the glass substrate 1 is brought into contact with the region 11b of the side surface 11a of the horn tip 11 as shown in FIG. 3 (a).

[0023]

The ultrasonic cleaning method for developing residue according to the present invention is applied to the substrate 1
Since the ultrasonic oscillating horn tip 11 is made to come close to and wash away only the place where the residue 3 adheres via the intermediary liquid 21 using water or an appropriate solvent, solids that cannot be completely removed by development are adhered. The image pattern 4 required by the substrate 1 is not damaged by ultrasonic vibration because only the portion of the residue 3 is removed by cleaning, and cleaning can be performed accurately and efficiently in a short time without residual cleaning removal.

Further, since the removed residue in the method of the present invention is taken into the intermediary liquid, it does not become a powder and scatter or adhere to the substrate side again as in the conventional case.

[0025]

The method for ultrasonically cleaning the development residue of the present invention comprises:
After the photosensitive material such as glass, metal, or plastic coated on the surface of the substrate is developed, the development residue remaining on the surface of the substrate can be efficiently removed in a short time without leaving any residue.

[Brief description of the drawings]

FIG. 1A is a schematic perspective view illustrating an ultrasonic cleaning method of a development residue of the present invention, and FIG. 1B is a side view of a substrate after cleaning.

FIG. 2A is a schematic perspective view illustrating an example of an ultrasonic cleaning method for developing residue of the present invention, and FIG. 2B is a schematic perspective view illustrating another example.

FIG. 3A is a schematic perspective view for explaining another embodiment of the ultrasonic cleaning method for developing residue of the present invention, and FIG.
[Fig. 6] is a schematic side view.

FIG. 4 is a plan view of a general glass substrate to which a development residue adheres after a development process.

[Description of sign]

A ... Ultrasonic wave oscillating means B ... Mediating liquid supply means s ... Ultrasonic vibration 1 ... Substrate 1a, 1b ... Corner 2 ... End 3 ... Remains
4 ... Image pattern 11 ... Ultrasonic oscillation horn tip part 11a ... Side surface 11b
... Contact area 12 ... Ultrasonic oscillation horn 13 ... Oscillation booster 14
… Converter 15… Oscillation circuit 21… Intermediate liquid

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Jun Sui 3-5-16 Konan, Minato-ku, Tokyo Lapmaster SFT Co., Ltd.

Claims (1)

[Claims] 1. An ultrasonic oscillating horn tip is brought close to a residue adhering portion adhering to a substrate such as a glass substrate via water or an intermediary liquid using an appropriate solvent, and the adhering residue is ultrasonically vibrated. A method for ultrasonically cleaning a development residue, which comprises removing the development residue.