JPH088320A - Airflow carrier and foreign matter removing method therefor - Google Patents

Abstract

(57) [Summary] [Purpose] To provide an air flow carrier and a method for removing foreign matter thereof, which improve the operation rate and reliability. [Structure] Airflow carrier main body 1 which is the body of the airflow carrier, and a nozzle 2 for jetting a gas such as nitrogen (N ₂ ) gas.
A transport path 3 through which a plate-like object such as a wafer moves, a light source 5 for irradiating an insulator 4 having substantially the same shape as the plate-like object with ultraviolet rays 5a, and an atmosphere inside the airflow carrier main body 1. Foreign matter detection means 6 for detecting the foreign matter 9 of the suction means 6b for sucking the atmosphere from the inside of the airflow carrier body 1 via the pipe 6a.
And a dust monitor 6c for optically detecting the foreign matter 9. After charging the insulator 4 and carrying the charged insulator 4 in the airflow carrier, the insulator 4 is carried by the airflow carrier. Carry out.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for transferring a plate-like material (for example, a semiconductor wafer, a liquid crystal substrate, a magnetic disk, etc.) in a non-contact manner, and more particularly to an air flow transfer technique used in the manufacturing process of semiconductor wafers. It is a thing.

[0002]

2. Description of the Related Art The techniques described below are for studying the present invention,
The present invention was studied by the present inventors upon completion, and its outline is as follows.

In a manufacturing line for semiconductor wafers (hereinafter simply referred to as "wafers") which are plate-shaped objects, a wafer transfer method is mainly a robot system inside a semiconductor manufacturing apparatus, and also between apparatuses of the semiconductor manufacturing apparatus. In, the worker puts it in a special box and does it.

However, when the wafer is exposed to the outside air, problems such as adhesion of foreign matter to the wafer and formation of a natural oxide film occur. In particular, in recent years, the degree of integration and miniaturization of semiconductor devices has been remarkably advanced, and therefore adhesion of foreign matter and formation of a natural oxide film must be avoided as much as possible.

Therefore, as one of the means for carrying the wafer in a non-contact manner, there is an airflow carrying method for carrying the wafer using a gas which is a gas in a highly clean inert gas atmosphere.

Regarding air flow transfer technology, for example,
JP-A-52-44177 or JP-A-53-
No. 82273 is disclosed, and in addition, “C for semiconductor manufacturing
“Losed Manufacturing System”, published on November 19, 1990, Masayuki Miyakoda, and 4 others (author), pages 317-341.

[0007]

However, in the above-mentioned technique, since the air flow transfer is a non-contact transfer method, foreign matter is hardly adhered to the wafer by transfer from another object. There is a problem that foreign matter floats in the atmosphere and adheres to the wafer.

This is because when evacuating the vacuum to replace the atmosphere inside the air flow carrier, a sudden pressure fluctuation occurs,
The foreign matter deposited on the floor or the like in the air flow carrier is rolled up and adheres to the wafer.

In addition, in the above-mentioned air flow transfer device, there is no particular means for removing foreign matter in the atmosphere while a vacuum is being maintained when transferring a wafer or the like.

Therefore, an object of the present invention is to provide an air flow carrying device and a foreign matter removing method therefor which improve the operating rate and reliability.

The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

[0012]

Of the inventions disclosed in the present application, a representative one will be briefly described below.
It is as follows.

That is, the air flow carrier according to the present invention is
It is composed of a nozzle that jets a gas, a transport path that is a passage for a plate-shaped object, in which the nozzle is installed, and a light source that irradiates light to an insulator having a shape substantially the same as that of the plate-shaped object. It is a thing.

Further, the airflow carrier is a nozzle for jetting a gas and a passage of a plate-like object, and a carrier path in which the nozzle is installed and an insulator having substantially the same shape as the plate-like object. It is composed of a direct current power source for applying an electric current and a charging mechanism section for holding the insulating material or the plate-shaped material.

Further, the air flow carrying device is provided with foreign matter detecting means including a suction device for sucking the atmosphere inside the main body of the air flow carrying device and a dust monitor for optically detecting a foreign matter.

According to the foreign matter removing method of the air flow carrying device of the present invention, an insulator having substantially the same shape as the plate-like object is charged by a charging means, and the charged insulator is carried in the air flow carrying device. After that, the insulator is carried out of the air flow carrier.

[0017]

According to the above-mentioned means, the insulator is charged by irradiating light or applying a current to the insulator having substantially the same shape as the plate-like object such as the wafer. Furthermore, by transporting the charged insulator inside the airflow carrier, charged foreign matter floating in the atmosphere is attracted to and adheres to the insulator by Coulomb force, and is carried out of the airstream carrier. As a result, foreign matter in the atmosphere can be removed. Therefore, the foreign matter can be removed in a short time without opening the airflow transport device.

In addition, since the air flow carrier is provided with foreign matter detection means including a suction device for sucking the atmosphere inside the main body of the air flow carrier and a dust monitor that optically detects foreign matter, The foreign matter can be removed only when the foreign matter is detected therein. That is, it becomes possible to remove the foreign matter only when necessary, and the work efficiency can be improved.

[0019]

Embodiments of the present invention will now be described in detail with reference to the drawings.

(Embodiment 1) FIG. 1 is a partial cross-sectional view showing an embodiment of the structure of an air flow carrier of the present invention.

First, the structure of the air flow carrier according to the first embodiment will be described. The air flow carrier body 1 which is the body of the air carrier and the nozzle 2 for jetting a gas such as nitrogen (N ₂ ) gas. , A transport path 3 along which a plate-like object (not shown) such as a wafer moves, a light source 5 for irradiating an insulator 4 having substantially the same shape as the plate-like object with light, and an inside of the air flow carrier main body 1 And a foreign matter detecting means 6 for detecting the foreign matter 9 in the atmosphere.

Here, the insulator 4 has substantially the same shape as a plate-like object such as a wafer carried in the air flow carrier, and is a material that is easily charged and is unlikely to become a contaminant. It is made of fluororesin or quartz.

The foreign matter detecting means 6 is composed of a suction device 6b for sucking the atmosphere from the inside of the airflow carrier body 1 through a pipe 6a, and a dust monitor 6c for optically detecting the foreign matter 9. Further, the light source 5 according to the first embodiment emits ultraviolet rays 5a.

The suction device 6b is for regularly taking in the atmosphere into the dust monitor 6c through the pipe 6a when the inside of the main body 1 of the airflow conveying device is in a vacuum state.
The dust monitor 6c irradiates the captured atmosphere with light and detects the presence or absence of the foreign matter 9 depending on whether or not the light is scattered.

The nozzles 2 are installed in the conveying path 3 so as to be oriented in various directions such as a vertical direction and an oblique direction with respect to the conveying path 3. That is, since the direction of the jetted gas can be changed depending on the installation direction of the nozzle 2, the plate-like object or the insulator 4 can be stationary or rotated.

Next, a method of removing foreign matter in the air flow carrier of the first embodiment will be described.

First, the air flow carrier according to the first embodiment is
Since the foreign matter detection means 6 is installed, when the foreign matter 9 is detected by the dust monitor 6c, which is a constituent member of the foreign matter detection means 6, the insulator 4 is transported inside the airflow transport device body 1.

At this time, before transporting, the insulator 4 is irradiated with ultraviolet rays 5a by the light source 5 so that the insulator 4 is charged (charged). As a result, the insulator 4 in the charged state (state charged with static electricity) is floated by the fluid force ejected from the nozzle 2 and conveyed, as in the case of conveying a plate-like object such as a wafer.

Here, when the charged insulator 4 is transported, the foreign matter 9 floating in the atmosphere inside the airflow carrier body 1 is also charged, so that the foreign matter 9 is an insulator by Coulomb force. 4 is sucked and adheres.

Then, similarly to the case where a plate-like object such as a wafer is carried out to the outside of the airflow carrier body 1, the insulator 4 with foreign matter 9 attached thereto is carried out to the outside through a gate valve or the like (not shown). . Thereby, the air flow carrier body 1
It is possible to remove the foreign matter 9 in the atmosphere inside.

Next, the following effects can be obtained by the airflow carrying device and the foreign matter removing method thereof according to the first embodiment.

That is, the insulator 4 having the same shape as that of a plate-like object such as a wafer is irradiated with ultraviolet rays 5a to charge the insulator 4, and the insulator 4 in the charged state is carried in the air flow carrier. By doing so, the charged foreign matter 9 floating in the atmosphere is attracted to and adheres to the insulator 4. Furthermore, the insulator 4 with the foreign matter 9 attached thereto is attached to the air flow carrier body 1
The foreign matter 9 in the atmosphere can be removed by carrying it out to the outside.

Therefore, the foreign matter 9 can be removed in a short time without opening the air flow carrier, and as a result, the operating rate and reliability of the air flow carrier can be improved.

Furthermore, since the operating rate and reliability of the air flow carrier can be improved, the wafer (plate-like object) can be automatically transferred by the air flow carrier in the semiconductor manufacturing line.

Further, since the foreign matter detecting means 6 for detecting the foreign matter 9 in the atmosphere is provided in the air flow carrying device, the foreign matter can be removed only when the foreign matter 9 is detected in the atmosphere. That is, it becomes possible to remove the foreign matter only when necessary, and the work efficiency can be further improved.

(Embodiment 2) FIG. 2 is a partial cross-sectional view showing an example of the structure of an air flow carrier which is another embodiment of the present invention.

First, the structure of the airflow carrier according to the second embodiment will be described. The airflow carrier body 1 which is the body of the air carrier and the nozzle 2 for jetting a gas such as nitrogen (N ₂ ) gas. , A transport path 3 along which a plate-like object (not shown) such as a wafer moves, a DC power source 8 for applying a current to an insulator 4 having substantially the same shape as the plate-like object, the insulator 4 or the plate-like object Pin member 7 which is a charging mechanism portion for holding an object
And a foreign matter detecting means 6 for detecting a foreign matter 9 in the atmosphere inside the air flow carrier body 1.

Here, the insulator 4 has substantially the same shape as a plate-like object such as a wafer carried in the air flow carrier, and is made of a material that is easily charged and does not easily become a pollutant. It is made of some fluororesin or quartz.

The pin member 7 which is the charging mechanism section
Is for holding the plate-like object or the insulator 4 and moving it up and down when loading and unloading the plate-like object or the insulator 4, and at least when the insulator 4 is moved up and down.
A region from a portion (tip portion) contacting with to the portion to which the wiring 8a is connected is formed of a conductive material such as aluminum which is unlikely to become a contaminant.

Further, when the plate-like material or the insulator 4 is carried in, the plate-like material or the insulator 4 held by an arm member or the like (not shown) is moved above the pin member 7, and then the pin member 7 is once moved. And the pin member 7 is lowered after receiving the plate-like material or the insulator 4, and the plate-like material or the insulator 4 is levitated by the fluid force ejected from the nozzle 2.

When the plate-shaped material or the insulating material 4 is carried out, the plate-shaped material or the insulating material 4 conveyed by air flow is once stopped above the pin member 7 and the pin member 7 is raised there. The pin member 7 holds the plate-like material or the insulator 4.

After that, the arm member or the like is inserted into the back side of the plate-like object or the insulator 4, the plate-like object or the insulator 4 is moved from above the pin member 7, and the above-mentioned is performed through a gate valve or the like not shown. Carry it out of the air flow carrier.

When not in use, the pin member 7 stands by at the same height as the surface of the conveying path 3.

The foreign matter detecting means 6 is composed of a suction device 6b for sucking the atmosphere from the inside of the airflow carrier body 1 through the pipe 6a, and a dust monitor 6c for optically detecting the foreign matter 9. It is a thing.

Further, the suction device 6b periodically takes in the atmosphere into the dust monitor 6c through the pipe 6a when the inside of the air flow carrier body 1 is in a vacuum state, and the dust monitor 6c is taken in. Further, the presence or absence of the foreign matter 9 is detected by irradiating the atmosphere with light and determining whether or not the light is scattered.

Further, the nozzle 2 is installed in the conveying path 3 so as to be oriented in various directions such as a vertical direction or an oblique direction with respect to the conveying path 3. That is, since the direction of the jetted gas can be changed depending on the installation direction of the nozzle 2, the plate-like object or the insulator 4 can be stationary or rotated.

Next, a method of removing foreign matter in the air flow carrying device of the second embodiment will be described.

First, the air flow carrier according to the second embodiment is
As in the first embodiment, since the foreign matter detection means 6 is installed, when the foreign matter 9 is detected by the dust monitor 6c, which is a component of the foreign matter detection means 6, the insulator 4 is removed from the main body 1 of the air flow carrier device. Transport inside.

At this time, the insulator 4 is placed on the pin member 7 before being conveyed, and a current is applied to the insulator 4 by using the DC power supply 8 to accumulate (charge) the charge in the insulator 4. . this is,
When loading and unloading a plate-like object such as a wafer, a pin member 7 for raising and lowering the plate-like object is used, and a region from a tip end portion to a portion to which the wiring 8a is connected is made of aluminum or the like. Since it is formed of a conductive material, a current can be applied to the insulator 4 by the DC power supply 8 via the pin member 7 and the wiring 8a.

Further, by using the DC power source 8, the insulator 4 can be applied to the plus or minus side. As a result, the charged state (state charged with static electricity)
The transferred insulator 4 is floated and carried by the fluid force ejected from the nozzle 2, as in the case of carrying a plate-like object such as a wafer.

When the charged insulator 4 is transported, the foreign matter 9 floating in the atmosphere inside the airflow carrier body 1 is also charged, so that the foreign matter 9 is insulated by the Coulomb force. 4 is sucked and adheres.

After that, in the same way as a plate-like object such as a wafer is carried out to the outside of the airflow carrier body 1, the insulator 4 with foreign matter 9 attached thereto is carried out to the outside via a gate valve or the like (not shown). . Thereby, the air flow carrier body 1
It is possible to remove the foreign matter 9 in the atmosphere inside.

Next, the following effects can be obtained by the airflow carrying device and the foreign matter removing method therefor according to the second embodiment.

That is, a current is applied to the insulator 4 having substantially the same shape as a plate-like object such as a wafer using the DC power source 8 through the pin member 7 and the wiring 8a, and the insulator 4
After being charged, the charged foreign matter 9 floating in the atmosphere is attracted to and adheres to the insulator 4 by carrying the charged insulator 4 in the air flow carrier. Further, the foreign material 9 in the atmosphere can be removed by carrying out the insulator 4 to which the foreign material 9 adheres to the outside of the airflow carrier body 1. Therefore, the foreign matter 9 can be removed in a short time without opening the airflow transport device.

Further, by using the DC power supply 8, the insulator 4 can be applied to the plus or minus side. Thus, for example, a positively applied insulator 4
When the foreign substance 9 is further detected by the dust monitor 6c after being conveyed, the negative force is applied to convey again. As a result, the foreign matter 9 in the atmosphere can be reliably removed.

Since the effects other than the above obtained by the airflow carrying device and the foreign matter removing method thereof of the second embodiment are the same as those described in the first embodiment,
The duplicate description will be omitted.

Although the invention made by the present inventor has been specifically described based on the embodiments, the present invention is not limited to the embodiments and various modifications can be made without departing from the scope of the invention. Needless to say.

For example, the air flow carrier according to the present invention has both the means for irradiating the light of Example 1 and the means for applying a current by the DC power source of Example 2 as means for charging the insulator. It may be one.

Further, although the foreign matter detecting means is installed in the air flow carrying device described in the first and second embodiments, the foreign matter detecting means may not necessarily be installed. In other words, in the air flow carrying device in which the foreign matter detecting means is not installed, it is possible to remove the foreign matter inside the main body of the air flow carrying device by periodically carrying the charged insulator.

The foreign matter removing method of the air flow carrier according to the present invention can be applied to a method of transferring a plate-like object such as a wafer by a robot. Therefore, it can be used for a foreign matter removing method for all semiconductor manufacturing apparatuses.

Further, although the airflow carrying device according to the present invention has been described as the airflow carrying device for carrying a wafer in the first and second embodiments, the airflow carrying device for carrying a plate-like object such as a liquid crystal substrate or a magnetic disk. May be Further, although the gas jetted from the nozzle has been described as nitrogen gas, it may be argon gas or the like.

[0062]

Advantageous effects obtained by typical ones of the inventions disclosed in the present application will be briefly described.
It is as follows.

(1). To irradiate ultraviolet rays to an insulator having substantially the same shape as a plate-like object such as a wafer or to apply a current to charge the insulator and transfer the charged insulator in the airflow transfer device. As a result, the charged foreign matter floating in the atmosphere is attracted to and adheres to the insulator. Further, the foreign matter in the atmosphere can be removed by carrying out the insulator to which the foreign matter adheres to the outside of the airflow carrier body.

Therefore, the foreign matter can be removed in a short time without opening the air flow carrier, and as a result,
It is possible to improve the operating rate and the reliability of the airflow carrier.

(2). Since the operating rate and reliability of the airflow carrier can be improved, it is possible to realize automatic carrier of a plate-like object such as a wafer by the airflow carrier in a semiconductor manufacturing line.

(3). By the foreign matter detection means for detecting foreign matter in the atmosphere provided in the air flow carrier,
The foreign matter can be removed only when the foreign matter is detected in the atmosphere. That is, it becomes possible to remove the foreign matter only when necessary, and the work efficiency can be further improved.

[Brief description of drawings]

FIG. 1 is a partial cross-sectional view showing an embodiment of the structure of an air flow carrier according to the present invention.

FIG. 2 is a partial cross-sectional view showing an example of the structure of an airflow carrying device which is another embodiment of the present invention.

[Explanation of symbols]

 1 Airflow Conveying Device Main Body 2 Nozzle 3 Conveying Path 4 Insulator 5 Light Source 5a Ultraviolet 6 Foreign Material Detection Means 6a Piping 6b Suction Device 6c Dust Monitor 7 Pin Member (Charging Mechanism) 8 DC Power Supply 8a Wiring 9 Foreign Material

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Katsuhiko Ishikawa 2326 Imai, Ome City, Tokyo, Hitachi Device Development Center (72) Inventor Yoshio Saito 2326 Imai, Ome City, Tokyo Hitachi Device Development Center Within

Claims (7)

[Claims] 1. An air flow carrying device for carrying a plate-like object in a non-contact state by a fluid force of gas, comprising a nozzle for jetting the gas and a passage for the plate-like object, wherein the nozzle is installed. And a light source that irradiates light to an insulator having substantially the same shape as the plate-like object, and the insulator charged by the light emitted from the light source is conveyed in the transport path. Air flow carrier. 2. An air flow carrying device for carrying a plate-like object in a non-contact state by a fluid force of gas, comprising a nozzle for jetting the gas and a passage for the plate-like object, wherein the nozzle is installed. A conveying path, a direct current power source for applying a current to an insulator having substantially the same shape as the plate-like object, and a charging mechanism section for holding the insulator or the plate-like object. An air flow carrier, wherein the insulator charged by a current from a DC power source is carried. 3. The airflow carrying device according to claim 2, wherein:
The air flow carrier device, wherein the charging mechanism unit is a pin member that moves up and down the plate-like object or the insulator. 4. The airflow carrying device according to claim 1, 2 or 3, wherein the foreign matter comprises a suction device for sucking the atmosphere inside the airflow carrying device body, and a dust monitor for optically detecting the foreign matter. An airflow carrying device, characterized in that a detection means is provided. 5. A foreign matter removing method for an air flow carrier for carrying a plate-like object in a non-contact state by a fluid force of gas, wherein an insulator having substantially the same shape as the plate-like object is charged by a charging means. A foreign matter removing method for an air flow carrier, comprising: transporting the charged insulator in the air flow carrier and then carrying out the insulator to the outside of the air flow carrier. 6. The method for removing foreign matter in an air flow carrying device according to claim 5, wherein a light source is used as the charging means, and light emitted from the light source is applied to the insulator. Foreign material removal method for equipment. 7. The foreign matter removing method for an air current carrying device according to claim 5, wherein a direct current power supply is used as the charging means to apply a current to the insulator. Removal method.