JPH0625961Y2 - Wafer transfer device - Google Patents
Wafer transfer deviceInfo
- Publication number
- JPH0625961Y2 JPH0625961Y2 JP4695088U JP4695088U JPH0625961Y2 JP H0625961 Y2 JPH0625961 Y2 JP H0625961Y2 JP 4695088 U JP4695088 U JP 4695088U JP 4695088 U JP4695088 U JP 4695088U JP H0625961 Y2 JPH0625961 Y2 JP H0625961Y2
- Authority
- JP
- Japan
- Prior art keywords
- motor
- vacuum container
- vacuum
- main shaft
- swivel base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical group [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims description 13
- 238000007789 sealing Methods 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000000428 dust Substances 0.000 description 6
- 239000011553 magnetic fluid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
Landscapes
- Sheets, Magazines, And Separation Thereof (AREA)
- Warehouses Or Storage Devices (AREA)
Description
【考案の詳細な説明】 〔産業上の利用分野〕 この考案は、例えばイオン注入装置等に用いられるもの
であって、直進および旋回のいわゆる2自由度を有する
ウエハ搬送装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a wafer transfer apparatus used in, for example, an ion implantation apparatus or the like and having so-called two degrees of freedom of straight movement and rotation.
この種のウエハ搬送装置の従来例を第2図に示す。 A conventional example of this type of wafer transfer apparatus is shown in FIG.
即ち、真空容器2に真空シール機能を有する軸受部4が
取り付けられており、この軸受部4を通して主軸6が真
空容器2を貫通している。That is, the bearing portion 4 having a vacuum sealing function is attached to the vacuum container 2, and the main shaft 6 penetrates the vacuum container 2 through the bearing portion 4.
主軸6は、真空容器2外に取り付けられた第1のモータ
(例えばサーボモータ)8によって、タイミングベルト
10およびホイール12、14を介して、正逆両方向に
回転駆動される。The main shaft 6 is rotationally driven in both forward and reverse directions by a first motor (for example, a servo motor) 8 mounted outside the vacuum container 2 via a timing belt 10 and wheels 12 and 14.
主軸6の真空容器2内側端部には旋回台16が取り付け
られており、それに、移動台22と螺合してそれを前後
に直進させる直進機構を構成するボールねじ24が回転
自在に取り付けられている。そしてこの移動台22に、
ウエハ18を支持する例えばフォーク状をしたウエハ支
持板20が取り付けられている。A swivel base 16 is attached to the inner end of the vacuum shaft 2 of the main shaft 6, and a ball screw 24, which constitutes a rectilinear mechanism that is screwed into a movable base 22 to move the shaft 22 forward and backward, is rotatably attached thereto. ing. And on this moving stand 22,
A wafer support plate 20 having, for example, a fork shape that supports the wafer 18 is attached.
一方、真空容器2外に第2のモータ(例えばサーボモー
タ)26が取り付けられており、その正逆両方向の回転
運動は、主軸6内を真空シールされた状態で貫通する回
転軸28、1組の傘歯車30、旋回台16に回転自在に
支持された回転軸32および1組の平歯車34を介して
ボールねじ24に伝達される。On the other hand, a second motor (for example, a servomotor) 26 is attached to the outside of the vacuum container 2, and the rotational movements in both the forward and reverse directions are rotated by a rotary shaft 28 that penetrates the main shaft 6 in a vacuum sealed state. Is transmitted to the ball screw 24 via a bevel gear 30, a rotary shaft 32 rotatably supported by the swivel 16, and a set of spur gears 34.
上記構成によれば、モータ8によって旋回台16ひいて
はそれに支持されたウエハ支持板20を正逆両方向に旋
回させることができ、モータ26によって移動台22ひ
いてはそれに取り付けられたウエハ支持板20を前後に
直進させることができ、それによってウエハ18の所望
の搬送を行うことができる。According to the above configuration, the swivel base 16 and thus the wafer support plate 20 supported thereby can be swung in both forward and backward directions by the motor 8, and the motor 26 moves the movable base 22 and thus the wafer support plate 20 attached thereto back and forth. The wafer 18 can be moved straight, and the desired transfer of the wafer 18 can be performed.
しかもこの装置には、旋回台16に、移動台22の位置
を検出する幾つかの検出器が、例えば移動台22の原点
検出用の検出器36および移動台22のオーバーラン防
止用の検出器37、38が取り付けられている。検出器
36〜38は、例えばリミットスイッチや光電スイッチ
等から成る。そしてこれらの検出器36〜38につなが
るリード線40〜42は、真空容器2の適当な個所に取
り付けられた電流導入端子(フィードスルーとも呼ばれ
る)44を介して真空容器2外側へ引き出されている。In addition, in this device, several detectors for detecting the position of the movable base 22 are provided on the swivel base 16, for example, a detector 36 for detecting the origin of the movable base 22 and a detector for preventing overrun of the movable base 22. 37 and 38 are attached. The detectors 36 to 38 are, for example, limit switches and photoelectric switches. The lead wires 40 to 42 connected to the detectors 36 to 38 are drawn out to the outside of the vacuum container 2 via a current introducing terminal (also referred to as a feedthrough) 44 attached to an appropriate portion of the vacuum container 2. .
尚、真空容器2外の例えば主軸6の周囲にも、旋回台1
6の旋回方向の位置検出用の検出器が幾つか設けられて
いるが、ここではその図示等を省略する。It should be noted that the swivel base 1 is also provided outside the vacuum container 2, for example, around the main shaft 6.
Although several detectors for position detection in the turning direction of 6 are provided, their illustration and the like are omitted here.
上記のようなウエハ搬送装置においては、旋回台16を
旋回させる際に、真空容器2内にあるリード線40〜4
2を引きずったり曲げたりするようになるため、それら
に無理な力が加わってそれらが断線する恐れがあるとい
う問題があった。In the wafer transfer device as described above, when the swivel base 16 is swung, the lead wires 40 to 4 in the vacuum container 2 are rotated.
Since the two will be dragged and bent, an unreasonable force will be applied to them and there is a risk that they may be broken.
また、上記のようにして真空容器2内にあるリード線4
0〜42が引きずられることによってそれらから発塵
し、これがウエハ18の汚染の原因等になるという問題
もあった。In addition, as described above, the lead wire 4 in the vacuum container 2
There is also a problem in that 0 to 42 are dragged to generate dust from them, which may cause contamination of the wafer 18.
ちなみにこれに対しては、リード線40〜42の保護用
の線樋等を設ける考えもあるが、そのようにすると、こ
の線樋等は真空中という特殊な環境で使用するため、そ
れに使用できる材質が脱ガスの少ない高価なものに限定
され、そのため大きなコストアップが強いられる。By the way, it is possible to provide a gutter or the like for protecting the lead wires 40 to 42, but if this is done, this gutter or the like can be used because it is used in a special environment such as in a vacuum. The material is limited to expensive materials with little degassing, which requires a large increase in cost.
そこでこの考案は、これらの点を改善したウエハ搬送装
置を提供することを目的とする。Then, this invention aims at providing the wafer transfer apparatus which improved these points.
この考案のウエハ搬送装置は、前記主軸を中空にし、こ
の主軸と旋回台間に前者内に連通するようにかつ後者で
蓋をするようにモータ収納箱を設けると共にそれぞれの
接続部間に真空シール部を設け、このモータ収納箱内に
前記第2のモータを収納すると共にそれにつながる回転
軸を真空シール部を通して箱外に出してそれと前記直進
機構とを連結し、そして前記旋回台に電流導入端子を取
り付け、前記検出器につながるリード線をこの電流導入
端子を介してかつ主軸内を通して真空容器外に引き出し
たことを特徴とする。In the wafer transfer apparatus of the present invention, the main shaft is hollow, and a motor storage box is provided between the main shaft and the swivel so as to communicate with the inside of the former and to cover the latter with a vacuum seal between the respective connecting portions. A part is provided, the second motor is housed in the motor housing box, and a rotary shaft connected to the second motor is brought out of the box through a vacuum seal part to connect the same to the rectilinear mechanism, and a current introduction terminal is connected to the swivel base. And a lead wire connected to the detector is drawn out of the vacuum container through the current introducing terminal and through the main shaft.
上記構成によれば、電流導入端子を検出器と同じく旋回
台に取り付けているので、旋回台を旋回させても、検出
器とこの電流導入端子間のリード線に何の外力も加わら
ない。従ってこのリード線の断線や発塵の恐れは全く無
くなる。According to the above configuration, since the current introducing terminal is attached to the swivel base in the same manner as the detector, even if the swivel base is swung, no external force is applied to the lead wire between the detector and the current introducing terminal. Therefore, there is no fear of disconnection of this lead wire or dust generation.
また、電流導入端子から外部へのリード線は主軸内を通
して真空容器外へ引き出しているので、旋回台を旋回さ
せても、このリード線に外力は殆ど加わらない。従って
このリード線の断線の恐れも無くなる。またモータ収納
箱内および主軸内は大気圧側なので、このリード線から
の発塵を特に考慮する必要も無い。Further, since the lead wire from the current introducing terminal to the outside is drawn out of the vacuum vessel through the inside of the main shaft, even if the swivel base is swung, almost no external force is applied to this lead wire. Therefore, there is no fear of disconnection of the lead wire. Further, since the inside of the motor storage box and the inside of the main shaft are on the atmospheric pressure side, it is not necessary to particularly consider the dust generation from the lead wires.
また以上の結果から、リード線引回しの特別な保護処理
を施す必要も無くなるので、それに伴うコストアップの
問題も避けられる。Further, from the above results, it is not necessary to perform a special protection process for the lead wire, so that the problem of increased cost can be avoided.
第1図は、この考案の一実施例に係るウエハ搬送装置を
示す断面図である。第2図の例と同一または相当する部
分には同一符号を付し、以下においては従来例との相違
点を主に説明する。FIG. 1 is a sectional view showing a wafer transfer apparatus according to an embodiment of the present invention. The same or corresponding parts as those in the example of FIG. 2 are designated by the same reference numerals, and the differences from the conventional example will be mainly described below.
この実施例においては、前述した主軸6に相当する主軸
6aを中空にし、これを前述したような軸受部4を通し
て真空容器2を貫通させている。In this embodiment, the main shaft 6a corresponding to the above-mentioned main shaft 6 is hollow, and the vacuum container 2 is penetrated through the bearing portion 4 as described above.
図示例の軸受部4は、軸受401および主軸6aとの間
を真空シールする真空シール部402を有し、この真空
シール部402は例えばOリングあるいは磁性流体シー
ルユニットから成る。The bearing unit 4 in the illustrated example has a vacuum seal unit 402 for vacuum-sealing between the bearing 401 and the main shaft 6a. The vacuum seal unit 402 is composed of, for example, an O-ring or a magnetic fluid seal unit.
そして、この中空の主軸6aと前述した旋回台16間
に、穴461で主軸6a内に通じるように、かつ旋回台
16で蓋をするように、モータ収納箱46を設けると共
にそれぞれの接続部間に例えばOリングから成る真空シ
ール部56、57を設けてそこを真空シールしている。
従って、モータ収納箱46は真空容器2内にあるけれど
も、その内部は主軸6a内を通して大気圧側に通じてい
る。A motor storage box 46 is provided between the hollow main shaft 6a and the above-described swivel base 16 so that the hole 461 communicates with the inside of the main shaft 6a and the swivel base 16 covers the motor. Are provided with vacuum seal portions 56 and 57 made of, for example, O-rings and vacuum-sealed there.
Therefore, although the motor storage box 46 is inside the vacuum container 2, the inside thereof communicates with the atmospheric pressure side through the main shaft 6a.
そしてこのモータ収納箱46内に、前述したような第2
のモータ26を収納すると共に、それにつながる回転軸
48を、例えばOリングあるいは磁性流体シールユニッ
トから成る真空シール部58を通して箱外に出し、タイ
ミングベルト50およびホイール52、54を介して前
述したボールねじ24と連結している。ちなみにモータ
26は、モータ収納箱46内が大気圧側に通じているた
め、真空用モータにする必要は無い。Then, in the motor storage box 46, the second
The motor 26 is housed, and the rotary shaft 48 connected to the motor 26 is taken out of the box through a vacuum seal portion 58 formed of, for example, an O-ring or a magnetic fluid seal unit, and the ball screw described above is passed through the timing belt 50 and the wheels 52 and 54. It is connected to 24. Incidentally, the motor 26 does not need to be a vacuum motor because the inside of the motor housing box 46 communicates with the atmospheric pressure side.
そして、この例では旋回台16の旋回中心付近に、前述
したような電流導入端子44を取り付け、旋回台16上
の検出器36〜38につながるリード線40〜42を、
この電流導入端子44を介して、かつ中空の主軸6a内
を通して真空容器2外へ引き出している。Then, in this example, the current introducing terminal 44 as described above is attached near the turning center of the swivel 16, and the lead wires 40 to 42 connected to the detectors 36 to 38 on the swivel 16 are connected.
The current is introduced to the outside of the vacuum container 2 through the current introducing terminal 44 and through the hollow main shaft 6a.
またこの例では、モータ26につながるリード線43
も、主軸6a内を通して真空容器2外へ引き出してい
る。Further, in this example, the lead wire 43 connected to the motor 26
Is also drawn out of the vacuum container 2 through the inside of the main shaft 6a.
上記構成によれば、従来例と同様に、モータ8によって
旋回台16ひいてはそれに支持されたウエハ支持板20
を正逆両方向に旋回させることができ、モータ26によ
って移動台22ひいてはそれに取り付けられたウエハ支
持板20を前後に直進させることができ、それによって
ウエハ18の所望の搬送を行うことができる。According to the above-mentioned structure, as in the conventional example, the motor 8 supports the swivel base 16 and thus the wafer support plate 20 supported by the swivel base 16.
Can be rotated in both forward and reverse directions, and the motor 26 can move the movable table 22 and thus the wafer support plate 20 attached thereto forward and backward straightly, whereby the desired transfer of the wafer 18 can be performed.
しかもこの実施例では、電流導入端子44を検出器36
〜38と同じく旋回台16に取り付けているので、旋回
台16を旋回させても、検出器36〜38とこの電流導
入端子44間のリード線40〜42に何の力も加わらな
い。従ってこのリード線40〜42の断線や発塵の恐れ
は全く無くなる。Moreover, in this embodiment, the current introducing terminal 44 is connected to the detector 36.
Since they are attached to the swivel base 16 as in Nos. 38 to 38, no force is applied to the lead wires 40 to 42 between the detectors 36 to 38 and the current introducing terminals 44 even when the swivel base 16 is swung. Therefore, there is no fear of disconnection of the lead wires 40 to 42 or dust generation.
また、電流導入端子44から外部へのリード線40〜4
2は主軸6a内を通して真空容器2外へ引き出している
ので、しかもこの例では電流導入端子44を旋回台16
の旋回中心付近に取り付けていることもあって、旋回台
16を旋回させても、このリード線40〜42に外力は
殆ど加わらない。従ってこのリード線40〜42の断線
の恐れも無くなる。また、モータ収納箱46内および主
軸6a内は大気圧側なので、このリード線40〜42か
らの発塵を特に考慮する必要も無い。In addition, lead wires 40 to 4 from the current introduction terminal 44 to the outside
2 is pulled out to the outside of the vacuum container 2 through the inside of the main shaft 6a.
Even when the swivel base 16 is swung, an external force is hardly applied to the lead wires 40 to 42 because the swivel base 16 is mounted near the swivel center. Therefore, there is no fear of disconnection of the lead wires 40 to 42. Further, since the inside of the motor housing box 46 and the inside of the main shaft 6a are on the atmospheric pressure side, it is not necessary to particularly consider the dust generation from the lead wires 40 to 42.
また以上の結果から、リード線40〜42の引回しの線
樋等の特別な保護処理を施す必要も無くなるので、それ
に伴うコストアップも避けられる。尚、電流導入端子4
4から引出す部分のリード線40〜42は大気圧側にあ
るので、仮にそれに保護処理を施すとしても安価に行う
ことができる。Further, from the above results, there is no need to perform a special protection treatment such as a wire gutter for arranging the lead wires 40 to 42, so that the cost increase associated therewith can be avoided. In addition, the current introduction terminal 4
Since the lead wires 40 to 42 of the portion pulled out from No. 4 are on the atmospheric pressure side, even if the lead wires 40 to 42 are protected, they can be inexpensively manufactured.
また、リード線40〜42がモータ収納箱46および主
軸6aによって保護された格好になるので、装置の取扱
い時にリード線40〜42を誤って断線させることを防
止できるという効果も得られる。In addition, since the lead wires 40 to 42 are protected by the motor housing box 46 and the main shaft 6a, it is possible to prevent the lead wires 40 to 42 from being accidentally disconnected during handling of the device.
尚、モータ26から引出すリード線43についても、電
流導入端子44から引き出すリード線40〜42と同様
のことが言える。The same applies to the lead wire 43 drawn from the motor 26 as the lead wires 40 to 42 drawn from the current introducing terminal 44.
以上のようにこの考案によれば、旋回台に取り付けた検
出器から真空容器外へ引き出すリード線の断線および発
塵の問題を無くすることができる。しかも当該リード線
引回しの特別な保護処理が不要になるので、それに伴う
コストアップの問題も避けられる。As described above, according to the present invention, it is possible to eliminate the problems of disconnection of lead wires drawn out of the vacuum container from the detector attached to the swivel and dust generation. Moreover, since no special protection process for the lead wire is required, the problem of increased cost can be avoided.
第1図は、この考案の一実施例に係るウエハ搬送装置を
示す断面図である。第2図は、従来のウエハ搬送装置の
一例を示す断面図である。 2……真空容器、4……軸受部、6,6a……主軸、8
……第1のモータ、16……旋回台、20……ウエハ支
持板、22……移動台、24……ボールねじ、26……
第2のモータ、36〜38……検出器、40〜43……
リード線、44……電流導入端子、46……モータ収納
箱、56〜58……真空シール部。FIG. 1 is a sectional view showing a wafer transfer apparatus according to an embodiment of the present invention. FIG. 2 is a sectional view showing an example of a conventional wafer transfer device. 2 ... Vacuum container, 4 ... Bearing part, 6, 6a ... Spindle, 8
...... First motor, 16 ...... Swivel base, 20 ...... Wafer support plate, 22 ...... Movement base, 24 ...... Ball screw, 26 ......
Second motor, 36-38 ... Detector, 40-43 ...
Lead wire, 44 ... current introduction terminal, 46 ... motor storage box, 56 to 58 ... vacuum seal section.
Claims (1)
を有する軸受部と、この軸受部を通して真空容器を貫通
する主軸と、この主軸を真空容器外側から回転駆動する
第1のモータと、真空容器内にあって主軸に支持された
旋回台と、ウエハを支持するウエハ支持板と、このウエ
ハ支持板が取り付けられた移動台と、旋回台上に設けら
れていてこの移動台を前後に直進させる直進機構と、こ
の直進機構を駆動する第2のモータと、旋回台に取り付
けられていて移動台の位置を検出する検出器とを備える
ウエハ搬送装置において、前記主軸を中空にし、この主
軸と旋回台間に前者内に連通するようにかつ後者で蓋を
するようにモータ収納箱を設けると共にそれぞれの接続
部間に真空シール部を設け、このモータ収納箱内に前記
第2のモータを収納すると共にそれにつながる回転軸を
真空シール部を通して箱外に出してそれと前記直進機構
とを連結し、そして前記旋回台に電流導入端子を取り付
け、前記検出器につながるリード線をこの電流導入端子
を介してかつ主軸内を通して真空容器外に引き出したこ
とを特徴とするウエハ搬送装置。1. A bearing unit attached to a vacuum container, having a vacuum sealing function, a main shaft penetrating the vacuum container through the bearing unit, a first motor for rotationally driving the main shaft from the outside of the vacuum container, and a vacuum container. A swivel base in which the main shaft is supported, a wafer support plate that supports the wafer, a moving base to which the wafer support plate is attached, and a moving base that is provided on the swivel base and moves forward and backward. In a wafer transfer device comprising a rectilinear mechanism, a second motor for driving the rectilinear mechanism, and a detector mounted on the swivel base for detecting the position of the movable base, the spindle is hollowed and swiveled with the spindle. A motor storage box is provided between the stands so as to communicate with the inside of the former and a lid is covered by the latter, and a vacuum seal portion is provided between the respective connection portions, and the second motor is stored in the motor storage box. In addition, the rotary shaft connected to it is taken out of the box through the vacuum seal part, and it is connected to the rectilinear mechanism, and a current introduction terminal is attached to the swivel base, and a lead wire connected to the detector is connected via this current introduction terminal. The wafer transfer device is characterized in that it is pulled out from the vacuum container through the inside of the spindle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4695088U JPH0625961Y2 (en) | 1988-04-06 | 1988-04-06 | Wafer transfer device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4695088U JPH0625961Y2 (en) | 1988-04-06 | 1988-04-06 | Wafer transfer device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01157429U JPH01157429U (en) | 1989-10-30 |
| JPH0625961Y2 true JPH0625961Y2 (en) | 1994-07-06 |
Family
ID=31273184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4695088U Expired - Lifetime JPH0625961Y2 (en) | 1988-04-06 | 1988-04-06 | Wafer transfer device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0625961Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006518917A (en) * | 2003-02-21 | 2006-08-17 | アクセリス テクノロジーズ インコーポレーテッド | Workpiece support structure for an ion beam implanter that allows adjustment of the implant angle using a linear scanning motor |
| WO2010081009A3 (en) * | 2009-01-11 | 2010-10-14 | Applied Materials, Inc. | Systems, apparatus and methods for making an electrical connection to a robot and electrical end effector thereof |
-
1988
- 1988-04-06 JP JP4695088U patent/JPH0625961Y2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006518917A (en) * | 2003-02-21 | 2006-08-17 | アクセリス テクノロジーズ インコーポレーテッド | Workpiece support structure for an ion beam implanter that allows adjustment of the implant angle using a linear scanning motor |
| WO2010081009A3 (en) * | 2009-01-11 | 2010-10-14 | Applied Materials, Inc. | Systems, apparatus and methods for making an electrical connection to a robot and electrical end effector thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01157429U (en) | 1989-10-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0600851B1 (en) | Robot apparatus | |
| US6155768A (en) | Multiple link robot arm system implemented with offset end effectors to provide extended reach and enhanced throughput | |
| US5794487A (en) | Drive system for a robotic arm | |
| US5765444A (en) | Dual end effector, multiple link robot arm system with corner reacharound and extended reach capabilities | |
| US6428266B1 (en) | Direct driven robot | |
| JP3341060B2 (en) | End station for parallel ion beam ion implanter | |
| TWI640057B (en) | Robotic arm equipment for handling wafers | |
| US5746565A (en) | Robotic wafer handler | |
| US4586868A (en) | Wrist mechanism of an industrial robot | |
| JP5472283B2 (en) | Robot arm structure and robot | |
| US6098484A (en) | High torque, low hysteresis, multiple link robot arm mechanism | |
| EP0367425A3 (en) | Wafer handling apparatus | |
| WO2006088757A1 (en) | Multi-axis vacuum motor assembly | |
| JPH0625961Y2 (en) | Wafer transfer device | |
| US6057662A (en) | Single motor control for substrate handler in processing system | |
| US4566845A (en) | Measured-force gripper device of articulated structure having several degrees of freedom | |
| EP0108569B1 (en) | Robot wrist and arm | |
| US6265803B1 (en) | Unlimited rotation vacuum isolation wire feedthrough | |
| CN107914283B (en) | Explosion-proof special type manipulator | |
| JPH08141974A (en) | Industrial robot | |
| JPH01224572A (en) | Rotary rectilinear movement introducing machine | |
| EP4656332A1 (en) | Advanced autonomous mobile robot | |
| JPS63229289A (en) | robot mechanism | |
| JPH08139160A (en) | Wafer transfer equipment for semiconductor manufacturing equipment | |
| USH869H (en) | Contact insertion turret end effector |