JPH06162817A - Conductive particulate and its manufacture - Google Patents
Conductive particulate and its manufactureInfo
- Publication number
- JPH06162817A JPH06162817A JP30725492A JP30725492A JPH06162817A JP H06162817 A JPH06162817 A JP H06162817A JP 30725492 A JP30725492 A JP 30725492A JP 30725492 A JP30725492 A JP 30725492A JP H06162817 A JPH06162817 A JP H06162817A
- Authority
- JP
- Japan
- Prior art keywords
- oxide
- fine particles
- coating layer
- titanium
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 63
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 30
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 21
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000005121 nitriding Methods 0.000 claims abstract description 14
- 239000002904 solvent Substances 0.000 claims abstract description 13
- 150000003609 titanium compounds Chemical class 0.000 claims abstract description 10
- 239000007864 aqueous solution Substances 0.000 claims abstract description 7
- 239000010419 fine particle Substances 0.000 claims description 73
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 57
- 239000011247 coating layer Substances 0.000 claims description 53
- 239000012798 spherical particle Substances 0.000 claims description 41
- 150000004706 metal oxides Chemical class 0.000 claims description 28
- 239000006185 dispersion Substances 0.000 claims description 22
- 239000007788 liquid Substances 0.000 claims description 16
- 238000011282 treatment Methods 0.000 claims description 13
- 230000004913 activation Effects 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 84
- 239000000377 silicon dioxide Substances 0.000 abstract description 35
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 9
- 239000000243 solution Substances 0.000 abstract description 9
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 abstract description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 6
- 229910001873 dinitrogen Inorganic materials 0.000 abstract description 6
- 230000007547 defect Effects 0.000 abstract description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 3
- 230000008569 process Effects 0.000 abstract description 3
- 230000001476 alcoholic effect Effects 0.000 abstract description 2
- 239000003513 alkali Substances 0.000 abstract description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 40
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 7
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 7
- 229910021529 ammonia Inorganic materials 0.000 description 7
- 235000011114 ammonium hydroxide Nutrition 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000010908 decantation Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000012508 resin bead Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000002776 aggregation Effects 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 238000005336 cracking Methods 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000004220 aggregation Methods 0.000 description 4
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- -1 silicon alkoxide Chemical class 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 4
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000003213 activating effect Effects 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000004108 freeze drying Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 125000005372 silanol group Chemical group 0.000 description 3
- 238000004611 spectroscopical analysis Methods 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- BBMCTIGTTCKYKF-UHFFFAOYSA-N 1-heptanol Chemical compound CCCCCCCO BBMCTIGTTCKYKF-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910000428 cobalt oxide Inorganic materials 0.000 description 2
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910001935 vanadium oxide Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
Landscapes
- Glanulating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Conductive Materials (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、異方導電膜等に利用可
能な導電性微粒子及びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to conductive fine particles which can be used for anisotropic conductive films and the like, and a method for producing the same.
【0002】[0002]
【従来の技術と発明が解決しようとする課題】従来導電
性微粒子としては樹脂ビーズの表面にニッケルや金など
の金属をメッキ処理したものがあったが、これらは次の
ような問題点を抱えていた。すなわち、 導電性微粒子の粒径精度はその母粒子である樹脂ビー
ズの粒径精度に大きく影響されるが、一般に樹脂ビーズ
の粒径精度は悪く、結果的に得られた導電性微粒子の粒
径精度も悪い。 メッキ工程中に母粒子である樹脂ビーズの凝集が多く
発生し、そのためメッキ後に得られた導電性微粒子を使
用する際に、その凝集部分が解砕されると、凝集部分が
メッキ不完全であるため導通不良を生じることがある。 樹脂ビーズの硬度及び強度が不足しているため、より
高強度・高硬度を求められる用途には樹脂ビーズを母粒
子とする導電性微粒子は使用できない。2. Description of the Related Art Conventionally, as conductive fine particles, there have been resin beads whose surface is plated with a metal such as nickel or gold. However, these have the following problems. Was there. That is, the particle size accuracy of the conductive fine particles is greatly affected by the particle size accuracy of the resin beads that are the mother particles, but the particle size accuracy of the resin beads is generally poor, and the particle size of the resulting conductive particles is Precision is also poor. Agglomeration of resin beads, which are the mother particles, often occurs during the plating process, so that when the conductive particles obtained after plating are used and the agglomerated parts are crushed, the agglomerated parts are incompletely plated. Therefore, conduction failure may occur. Since the hardness and strength of the resin beads are insufficient, conductive fine particles having resin beads as the mother particles cannot be used for applications requiring higher strength and hardness.
【0003】また、導電性微粒子としてニッケル等の金
属微粒子それ自体が用いられることもあるが、これらは
凝集しやすく、端子間の絶縁性を維持できないことが多
い。さらに、金属酸化物の微粒子にニッケル及び/又は
金等をメッキ処理した導電性微粒子も提案されている
が、これらも凝集しやすく、また母粒子と被覆金属との
接着性が悪いため、解砕や混練工程中に被覆金属部分が
脱落し、導電性が著しく低下することがある。Although fine particles of metal such as nickel itself may be used as the conductive fine particles, they are easily aggregated and the insulation between terminals cannot be maintained in many cases. Further, conductive fine particles obtained by plating fine particles of metal oxide with nickel and / or gold have also been proposed, but these are also easily aggregated, and the adhesion between the mother particles and the coating metal is poor, so crushing In some cases, the coated metal part may fall off during the kneading process and the conductivity may be significantly reduced.
【0004】従って本発明の目的は、上記従来の導電性
微粒子及びその製造方法の欠点を解消し、(a)粒径精
度に優れている、(b)電気欠損がない、(c)高強
度、高硬度である、(d)凝集がないなどの利点を有す
る新規な導電性微粒子及びその製造方法を提供すること
にある。Therefore, an object of the present invention is to solve the above-mentioned drawbacks of the conventional conductive fine particles and the method for producing the same, (a) excellent particle size accuracy, (b) no electrical defects, and (c) high strength. It is to provide a novel conductive fine particle having advantages such as high hardness, (d) no aggregation, and a method for producing the same.
【0005】[0005]
【課題を解決するための手段】上記目的を達成するため
に、本発明の導電性微粒子は、金属酸化物からなる球形
粒子と、この球形粒子表面に形成された、部分還元酸化
チタン及び/又は窒化チタンを含む被覆層とを有するこ
とを特徴とする。In order to achieve the above object, the conductive fine particles of the present invention are spherical particles composed of a metal oxide and partially reduced titanium oxide and / or spherical particles formed on the surface of the spherical particles. And a coating layer containing titanium nitride.
【0006】また上記目的を達成するために、本発明の
導電性微粒子の製造方法は、 (1)金属酸化物からなる球形粒子を中級アルコールを
主体とするアルコール系溶媒に分散して球形粒子の分散
液を得る工程; (2)前記分散液にアルカリ水溶液を添加して金属酸化
物球形粒子の表面を活性化処理する工程; (3)前記活性化処理後の分散液に、酸化チタンを形成
し得るチタン化合物を添加し、加水分解して、前記球形
粒子の表面に酸化チタン被覆層を形成する工程;および (4)前記酸化チタン被覆層を還元性及び/又は窒化雰
囲気下で焼成して、還元及び/又は窒化し、導電性を有
する部分還元酸化チタン及び/又は窒化チタンを含む被
覆層を形成する工程を含むことを特徴とする。In order to achieve the above object, the method for producing conductive fine particles of the present invention is as follows: (1) Spherical particles made of a metal oxide are dispersed in an alcohol solvent mainly containing an intermediate alcohol to obtain spherical particles. A step of obtaining a dispersion liquid; (2) a step of activating the surface of the metal oxide spherical particles by adding an alkaline aqueous solution to the dispersion liquid; (3) forming titanium oxide in the dispersion liquid after the activation treatment A titanium compound capable of being added and hydrolyzed to form a titanium oxide coating layer on the surface of the spherical particles; and (4) firing the titanium oxide coating layer in a reducing and / or nitriding atmosphere. , And reduction and / or nitriding to form a coating layer containing partially reduced titanium oxide and / or titanium nitride having conductivity.
【0007】先ず本発明の導電性微粒子について説明す
る。本発明の導電性微粒子は、金属酸化物からなる球形
粒子と、この球形粒子表面に形成された、部分還元酸化
チタン及び/又は窒化チタンを含む被覆層とを有するも
のである。本発明の導電性微粒子において、母粒子であ
る球形粒子を構成する材料は金属酸化物である。金属酸
化物としては、シリカ、アルミナ、チタニア、ジルコニ
ア、酸化バリウム、酸化鉄、酸化コバルト、酸化クロ
ム、酸化バナジウム、酸化ハフニウム、酸化マグネシウ
ム、酸化ストロンチウムなど種々のものが挙げられる
が、特にシリカが好ましい。その理由は、シリカ微粒子
はシリコンアルコキシドをアンモニア水溶液中で加水分
解することにより得られ、粒径分布がシャープであり、
かつ強度、硬度が高いなどの特長を有しているからであ
る。金属酸化物からなる球形粒子の粒径は、導電性微粒
子の用途によって異なるが、一般に0.5〜30μmの
範囲である。First, the conductive fine particles of the present invention will be described. The conductive fine particles of the present invention have spherical particles made of a metal oxide, and a coating layer formed on the surface of the spherical particles and containing partially reduced titanium oxide and / or titanium nitride. In the conductive fine particles of the present invention, the material forming the spherical particles that are the mother particles is a metal oxide. Examples of the metal oxide include silica, alumina, titania, zirconia, barium oxide, iron oxide, cobalt oxide, chromium oxide, vanadium oxide, hafnium oxide, magnesium oxide, and various ones such as strontium oxide, but silica is particularly preferable. . The reason is that silica fine particles are obtained by hydrolyzing silicon alkoxide in an aqueous ammonia solution and have a sharp particle size distribution.
In addition, it has characteristics such as high strength and hardness. The particle size of the spherical particles made of a metal oxide varies depending on the use of the conductive fine particles, but is generally in the range of 0.5 to 30 μm.
【0008】本発明の導電性粒子においては、上記の金
属酸化物からなる球形粒子の表面に部分還元酸化チタン
及び/又は窒化チタンを含む被覆層が形成されている。
被覆層を構成する酸化チタンは、二酸化チタン(TiO
2 )が部分的に還元された酸化チタンであり、TiOn
(1.5<n<2)によって示される。TiOn におけ
るnの値は、被覆層を導電性にする上からは小さい方が
良いが、後述するように、予め形成されたTiO2 層を
還元して化学量論的に酸素が不足しているTiOn 層を
形成する場合には、還元時間などの還元条件の関係でn
の値は、通常1.6〜1.9程度である。本発明者は、
nの数が1.6〜1.9でもTiOn 層は十分な導電性
を有することを確認している。In the conductive particles of the present invention, a coating layer containing partially reduced titanium oxide and / or titanium nitride is formed on the surface of the spherical particles made of the above metal oxide.
The titanium oxide forming the coating layer is titanium dioxide (TiO 2
2 ) is titanium oxide partially reduced, and TiO n
(1.5 <n <2). The value of n in TiO n is preferably as small as possible in order to make the coating layer conductive, but as will be described later, a previously formed TiO 2 layer is reduced and oxygen is stoichiometrically insufficient. In the case of forming a TiO n layer having
The value of is usually about 1.6 to 1.9. The inventor
It has been confirmed that the TiO n layer has sufficient conductivity even when the number of n is 1.6 to 1.9.
【0009】本発明の導電性微粒子において、被覆層を
部分還元酸化チタンの代りに窒化チタンによって構成し
ても良く、また前記部分還元酸化チタンと窒化チタンと
によって構成しても良い。被覆層の膜厚は、導電性微粒
子に求められる導電性の程度、母粒子の金属酸化物球形
粒子との密着性、強度などを考慮して適宜決定される
が、通常は0.01〜1μmである。In the conductive fine particles of the present invention, the coating layer may be made of titanium nitride instead of partially reduced titanium oxide, or may be made of the partially reduced titanium oxide and titanium nitride. The film thickness of the coating layer is appropriately determined in consideration of the degree of conductivity required for the conductive fine particles, the adhesion of the mother particles to the spherical metal oxide particles, the strength, etc., but is usually 0.01 to 1 μm. Is.
【0010】本発明の導電性微粒子は、上記のように金
属酸化物からなる球形粒子と、部分還元酸化チタン及び
/又は窒化チタンを含む被覆層とによって構成されてい
るため、後述の実施例によっても実証されるように、
(a)粒径精度に優れている、(b)電気欠損がない、
(c)高強度、高硬度である、(d)凝集がないなどの
利点を有する。The conductive fine particles of the present invention are composed of spherical particles made of a metal oxide as described above and a coating layer containing partially reduced titanium oxide and / or titanium nitride. As also demonstrated,
(A) excellent particle size accuracy, (b) no electrical defects,
It has advantages such as (c) high strength and high hardness, and (d) no aggregation.
【0011】上記の本発明の導電性微粒子は、種々の方
法で製造することが可能であるが、特に下記の工程を含
む本発明の導電性微粒子の製造方法によって製造するの
が好ましい。 (1)金属酸化物からなる球形粒子を中級アルコールを
主体とするアルコール系溶媒に分散して球形粒子の分散
液を得る工程; (2)前記分散液にアルカリ水溶液を添加して金属酸化
物球形粒子の表面を活性化処理する工程; (3)前記活性化処理後の分散液に、酸化チタンを形成
し得るチタン化合物を添加し、加水分解して、前記球形
粒子の表面に酸化チタン被覆層を形成する工程;および (4)前記酸化チタン被覆層を還元性及び/又は窒化雰
囲気下で焼成して、還元及び/又は窒化し、導電性を有
する部分還元酸化チタン及び/又は窒化チタンを含む被
覆層を形成する工程。The above-mentioned conductive fine particles of the present invention can be manufactured by various methods, but it is particularly preferable that the conductive fine particles of the present invention are manufactured by the method including the following steps. (1) A step of dispersing spherical particles made of a metal oxide in an alcoholic solvent mainly containing an intermediate alcohol to obtain a dispersion liquid of spherical particles; (2) An alkaline aqueous solution is added to the dispersion liquid to form spherical metal oxide particles. A step of activating the surface of the particles; (3) a titanium compound capable of forming titanium oxide is added to the dispersion liquid after the activation treatment and hydrolyzed to form a titanium oxide coating layer on the surface of the spherical particles. And (4) firing the titanium oxide coating layer in a reducing and / or nitriding atmosphere to reduce and / or nitride, thereby containing a partially reduced titanium oxide and / or titanium nitride having conductivity. A step of forming a coating layer.
【0012】工程(1)は金属酸化物からなる球形粒子
を中級アルコールを主体とするアルコール系溶媒に分散
して球形粒子の分散液を得る工程である。この工程
(1)において用いられる球形粒子は、一般に0.5〜
30μmの範囲の粒径を有するものが好ましい。また球
形粒子を構成する金属酸化物微粒子としては、シリカ、
チタニア、ジルコニア、酸化バリウム、酸化鉄、酸化コ
バルト、酸化クロム、酸化バナジウム、酸化ハフニウ
ム、酸化マグネシウム、酸化ストロンチウムなどの微粒
子が挙げられるが、粒径精度、強度、硬度の点でシリカ
微粒子を用いるのが特に好ましい。シリカ微粒子は、シ
リコンアルコキシドを水、アンモニアおよびアルコール
からなる反応液中において加水分解および重縮合させる
ことにより製造される。この段階の未焼成シリカ粒子
は、シラノール基が多く、かつ有機物、水、アンモニア
もかなり残存しており、強度、硬度も低い。この未焼成
シリカ粒子を500〜1200℃で焼成するとシラノー
ル基、有機物、水、アンモニアが殆んど残存しない焼成
シリカ粒子となり、強度、硬度が増加する。本発明の方
法においては、これら2種のシリカ微粒子のいずれも使
用できるが、異方導電膜の用途等に用いる場合には、強
度、硬度が未焼成シリカ粒子よりも高いなどの点から焼
成シリカ粒子を用いるのが特に好ましい。Step (1) is a step in which spherical particles made of a metal oxide are dispersed in an alcohol solvent mainly containing an intermediate alcohol to obtain a dispersion liquid of spherical particles. The spherical particles used in this step (1) are generally 0.5 to
Those having a particle size in the range of 30 μm are preferred. Further, as the metal oxide fine particles constituting the spherical particles, silica,
Fine particles such as titania, zirconia, barium oxide, iron oxide, cobalt oxide, chromium oxide, vanadium oxide, hafnium oxide, magnesium oxide, and strontium oxide can be mentioned, but silica fine particles are used in terms of particle size accuracy, strength, and hardness. Is particularly preferable. Silica fine particles are produced by hydrolyzing and polycondensing a silicon alkoxide in a reaction liquid containing water, ammonia and alcohol. The uncalcined silica particles at this stage have many silanol groups, and organic substances, water, and ammonia are considerably left, and strength and hardness are low. When these unsintered silica particles are calcined at 500 to 1200 ° C, silanol groups, organic substances, water, and ammonia become almost no remaining silica particles, and the strength and hardness increase. In the method of the present invention, any of these two types of silica fine particles can be used, but when used for applications such as anisotropic conductive films, calcined silica is preferred because it has higher strength and hardness than uncalcined silica particles. Particular preference is given to using particles.
【0013】工程(1)においては、上記球形粒子をア
ルコール系溶媒に分散させて球形粒子の分散液を得る
が、用いられるアルコール系溶媒は、ブタノール、ペン
タノール、ヘキサノール、ヘプタノール、オクタノー
ル、ノナノール、デカノールなどの炭素数4〜10の中
級アルコールに限定される。その理由は、これらの中級
アルコールを用いると、後記工程(3)において形成さ
れる酸化チタン被覆層の膜厚が厚くなることが明らかと
なっているからである。これらの中級アルコールは直鎖
のもの及び分岐のもののいずれでもよい。しかし、上記
の中級アルコールとともに、メタノール、エタノール、
プロパノールなどの低級アルコールもしくは親水性の有
機溶媒、例えばアセトニトリル、THF、DMF、DM
SO等を全アルコールに対して少量(例えば20vol
%未満)添加することもできる。In the step (1), the spherical particles are dispersed in an alcohol solvent to obtain a dispersion of spherical particles. The alcohol solvent used is butanol, pentanol, hexanol, heptanol, octanol, nonanol, Limited to medium-grade alcohols having 4 to 10 carbon atoms such as decanol. The reason is that it has been clarified that the use of these intermediate alcohols increases the thickness of the titanium oxide coating layer formed in the step (3) described later. These middle alcohols may be linear or branched. However, with the above-mentioned intermediate alcohol, methanol, ethanol,
Lower alcohols such as propanol or hydrophilic organic solvents such as acetonitrile, THF, DMF, DM
A small amount of SO, etc. for all alcohols (eg 20 vol)
%)).
【0014】次に、工程(2)は、前記工程(1)で得
られた球形粒子の分散液にアルカリ水溶液を添加して金
属酸化物球形粒子の表面を活性化処理する工程である。
この活性化処理は、アルカリが金属酸化物球状粒子の表
面に作用することにより、同表面のシラノール基からの
プロトン脱離を促進するための処理であり、この活性化
処理を行なうことにより、後記の工程(3)において形
成される酸化チタン被覆層と金属酸化物球状粒子との密
着性、ひいては後記の工程(4)において形成される部
分還元酸化チタン及び/又は窒化チタンを含む被覆層と
金属酸化物球状粒子との密着性が向上し、被覆層の剥離
や割れが防止される。特に球状粒子としてシリカを用い
た場合、シリカ球状粒子と、その表面に形成される酸化
チタン層とは、シリカと酸化チタンとの収縮率の差が大
きいため、焼成処理により、被覆層の剥離や割れの問題
が懸念されたが、本発明の方法において活性化処理によ
り、これらの問題を解決したことは特筆すべきことであ
る。Next, step (2) is a step of activating the surface of the metal oxide spherical particles by adding an alkaline aqueous solution to the dispersion of the spherical particles obtained in step (1).
This activation treatment is a treatment for promoting the proton desorption from the silanol groups on the surface of the metal oxide spherical particles by the action of alkali, and the activation treatment will be described later. Adhesion between the titanium oxide coating layer formed in step (3) and the spherical metal oxide particles, and thus the coating layer and metal containing partially reduced titanium oxide and / or titanium nitride formed in step (4) described later Adhesion with spherical oxide particles is improved, and peeling or cracking of the coating layer is prevented. In particular, when silica is used as the spherical particles, the silica spherical particles and the titanium oxide layer formed on the surface have a large difference in shrinkage between silica and titanium oxide. Although there were concerns about cracking, it is noteworthy that these problems were solved by the activation treatment in the method of the present invention.
【0015】この活性化処理に用いられるアルカリ水溶
液としては、アンモニア、アルカリ金属水酸化物、アル
カリ土類金属水酸化物、アルカリ金属塩、アルカリ土類
金属塩などのアルカリの水溶液が用いられるが、特にア
ンモニア水溶液を用いるのが好ましい。As the alkaline aqueous solution used for this activation treatment, an alkaline aqueous solution such as ammonia, alkali metal hydroxide, alkaline earth metal hydroxide, alkali metal salt or alkaline earth metal salt is used. It is particularly preferable to use an aqueous ammonia solution.
【0016】次に、工程(3)は、前記工程(2)を経
た分散液に酸化チタンを形成し得るチタン化合物を添加
し、加水分解して、前記球形粒子の表面に式TiO2 で
示される酸化チタン(化学量論量のチタンと酸素からな
る酸化チタン)の被覆層を形成する工程である。この工
程(3)で用いられる、酸化チタンを形成し得るチタン
化合物としては、一般式 Ti(OR)4 又はTi(R′)n (OR)4-n (式中、RおよびR′はアルキル基、特に炭素数1〜5
のアルキル基であり、nは1〜3の整数である)で示さ
れるチタンアルコキシド、又はこれらの部分加水分解物
が挙げられる。RおよびR′の具体例は、メチル基、エ
チル基、直鎖又は分岐プロピル基、直鎖又は分岐ブチル
基、直鎖又は分岐ペンチル基である。分散液中に添加さ
れたこれらのチタン化合物は、いわゆるゾルゲル法によ
り加水分解され、球形粒子の表面に酸化チタン層が形成
される。形成される酸化チタン層の膜厚は、目的物の導
電性粒子において要求される導電性被覆層の膜厚に応じ
て適宜決定されるが、通常は0.01〜1μmである。
本発明の方法によれば、前述したように工程(1)にお
いてアルコール溶媒として、炭素数4〜10の中級アル
コールを用いることにより、酸化チタン層の膜厚を厚く
することができるという利点がある。Next, in the step (3), a titanium compound capable of forming titanium oxide is added to the dispersion liquid obtained in the step (2), and the mixture is hydrolyzed so that the surface of the spherical particles is represented by the formula TiO 2 . Is a step of forming a coating layer of titanium oxide (titanium oxide composed of stoichiometric amount of titanium and oxygen). The titanium compound capable of forming titanium oxide used in this step (3) is represented by the general formula Ti (OR) 4 or Ti (R ′) n (OR) 4-n (wherein R and R ′ are alkyl groups). Group, especially 1 to 5 carbon atoms
Is an alkyl group, and n is an integer of 1 to 3), or a partial hydrolyzate thereof. Specific examples of R and R'are a methyl group, an ethyl group, a linear or branched propyl group, a linear or branched butyl group, and a linear or branched pentyl group. These titanium compounds added to the dispersion are hydrolyzed by the so-called sol-gel method to form a titanium oxide layer on the surface of the spherical particles. The film thickness of the formed titanium oxide layer is appropriately determined according to the film thickness of the conductive coating layer required for the conductive particles of the target, but is usually 0.01 to 1 μm.
According to the method of the present invention, as described above, by using a medium alcohol having 4 to 10 carbon atoms as the alcohol solvent in the step (1), it is possible to increase the thickness of the titanium oxide layer. .
【0017】次に、工程(4)は前記工程(3)で形成
された酸化チタン被覆層を還元性及び/又は窒化雰囲気
で焼成して、還元及び/又は窒化し、部分還元酸化チタ
ン及び/又は窒化チタンを含む被覆層を形成する工程で
ある。この工程(4)において、還元性雰囲気は水素ガ
スなどの還元性ガスを用いることにより、また窒化雰囲
気は窒素ガスなどの窒化ガスを用いることにより達成さ
れる。また還元性及び窒化雰囲気は還元性ガスでもあ
り、窒化ガスでもあるアンモニアガスを用いることによ
り、又は水素ガスと窒素ガスとを併用することにより達
成される。焼成は、通常高温炉中で行なわれ、その温度
は通常800〜1,000℃の範囲である。この還元性
及び/又は窒化雰囲気での焼成処理により、酸化チタン
被覆層は、式TiOn (1.5<n<2)で示される部
分還元酸化チタン及び/又は窒化チタンとに転化され、
金属酸化物球状粒子の表面に導電性被覆層を有する導電
性微粒子が得られる。好ましいnの値は前述のように
1.6〜1.9である。Next, in the step (4), the titanium oxide coating layer formed in the step (3) is fired in a reducing and / or nitriding atmosphere to reduce and / or nitride, thereby partially reducing titanium oxide and / or Alternatively, it is a step of forming a coating layer containing titanium nitride. In this step (4), the reducing atmosphere is achieved by using a reducing gas such as hydrogen gas, and the nitriding atmosphere is achieved by using a nitriding gas such as nitrogen gas. The reducing and nitriding atmosphere is also a reducing gas and can be achieved by using ammonia gas which is also a nitriding gas or by using hydrogen gas and nitrogen gas in combination. Firing is usually performed in a high temperature furnace, and the temperature is usually in the range of 800 to 1,000 ° C. By this firing treatment in a reducing and / or nitriding atmosphere, the titanium oxide coating layer is converted into partially reduced titanium oxide and / or titanium nitride represented by the formula TiO n (1.5 <n <2),
Conductive fine particles having a conductive coating layer on the surface of the metal oxide spherical particles can be obtained. The preferable value of n is 1.6 to 1.9 as described above.
【0018】本発明の方法により得られた導電性微粒子
は、(i)粒径分布のシャープな金属酸化物微粒子を母
粒子として用い、その上に均一な導電性被覆層が設けら
れているので粒径精度に優れている、(ii)被覆層が導
電性に優れた部分還元酸化チタンと窒化チタンを含むの
で、導電性微粒子も導電性に優れ、電気欠損がない、(i
ii)金属酸化物球状粒子及び部分還元酸化チタン及び/
又は窒化チタンとを含む被覆層はいずれも高強度、高硬
度であるので、導電性微粒子も高強度、高硬度である、
(iv)単分散性に優れた金属酸化物球形粒子の表面に、
凝集を起すことなく導電性被覆層を形成することができ
るので、得られた導電性微粒子も凝集していない、
(v)金属酸化物球状粒子と被覆層との密着性に優れ、
被覆層の剥離や割れなどの問題がない等の顕著な利点を
有する。The conductive fine particles obtained by the method of the present invention have (i) metal oxide fine particles having a sharp particle size distribution as mother particles, on which a uniform conductive coating layer is provided. Excellent particle size accuracy, (ii) Since the coating layer contains partially reduced titanium oxide and titanium nitride, which have excellent conductivity, the conductive fine particles are also excellent in conductivity and have no electrical defects.
ii) Metal oxide spherical particles and partially reduced titanium oxide and / or
Alternatively, since the coating layer containing titanium nitride has high strength and high hardness, the conductive fine particles also have high strength and high hardness.
(Iv) on the surface of the metal oxide spherical particles having excellent monodispersity,
Since the conductive coating layer can be formed without causing aggregation, the obtained conductive fine particles are not aggregated,
(V) Excellent adhesion between the metal oxide spherical particles and the coating layer,
It has remarkable advantages such as no peeling or cracking of the coating layer.
【0019】[0019]
【実施例】以下実施例により本発明を更に説明する。The present invention will be further described with reference to the following examples.
【0020】実施例1工程(1) 金属酸化物からなる球状粒子として、平均粒子径が6.
07μmの単分散シリカ微粒子を用い、アルコール系溶
媒としてn−ブタノールを用いて、シリカ微粒子11.
46gをn−ブタノール140mlに添加し、30分間
超音波照射を行なってシリカ微粒子の分散液を得た。Example 1 Step (1) The spherical particles made of a metal oxide have an average particle size of 6.
Silica fine particles using monodispersed silica fine particles of 07 μm and n-butanol as an alcohol solvent.
46 g was added to 140 ml of n-butanol, and ultrasonic irradiation was performed for 30 minutes to obtain a dispersion liquid of silica fine particles.
【0021】工程(2) 得られたシリカ微粒子の分散液に25%アンモニア水
0.5gを滴下混合し30℃で30分間撹拌することに
よりシリカ微粒子の表面を活性化処理した。 Step (2) 0.5 g of 25% ammonia water was added dropwise to the obtained dispersion liquid of silica fine particles, and the surface of the silica fine particles was activated by stirring at 30 ° C. for 30 minutes.
【0022】工程(3) 酸化チタンを形成し得るチタン化合物として、チタンテ
トラブトキシドを用い、このチタンテトラブトキシド
5.45gをn−ブタノール20mlに溶解した溶液を
前記工程(2)を経た分散液に10分かけて滴下混合
し、30℃で1時間撹拌した。その後、0.5%アンモ
ニア水8.14gを2−プロパノール20mlに溶解し
た溶液を30分かけて加えた後、反応系を60℃に昇温
して12時間撹拌して、チタンテトラブトキシドの加水
分解反応を終了させた。反応終了後、反応液を静置して
粒子を沈降させた後、デカンテーションにより上澄み液
を取り除いた。さらにメタノール、水の順でデカンテー
ションを繰り返した後、凍結乾燥を行なって、酸化チタ
ン(TiO2 )の被覆層を有するシリカ微粒子を得た。 Step (3) Titanium tetrabutoxide is used as a titanium compound capable of forming titanium oxide, and a solution prepared by dissolving 5.45 g of this titanium tetrabutoxide in 20 ml of n-butanol is added to the dispersion liquid obtained through the above step (2). The mixture was added dropwise over 10 minutes and stirred at 30 ° C. for 1 hour. Then, after adding a solution prepared by dissolving 8.14 g of 0.5% aqueous ammonia in 20 ml of 2-propanol over 30 minutes, the reaction system was heated to 60 ° C. and stirred for 12 hours to dissolve titanium tetrabutoxide. The decomposition reaction was terminated. After the completion of the reaction, the reaction solution was allowed to stand and the particles were allowed to settle, and then the supernatant was removed by decantation. Further, decantation was repeated in the order of methanol and water, followed by freeze-drying to obtain silica fine particles having a titanium oxide (TiO 2 ) coating layer.
【0023】工程(4) 凍結乾燥された酸化チタン被覆層付きシリカ微粒子を石
英ガラス製のボートに入れ、これを石英チューブからな
る炉芯管内に設置し、窒素ガスによって炉芯管内の酸素
をパージした。次いで200℃/hrの昇温速度で昇温
し、500℃に達した時点で液化アンモニアボンベから
アンモニアガスを250ml/minの流速で導入しな
がら850℃まで昇温し、この温度で6時間保持し、還
元及び窒化処理を終了させ、部分還元酸化チタンと窒化
チタンからなる被覆層を形成し、かくして目的とする導
電性微粒子を得た。 Step (4) The freeze-dried silica fine particles with a titanium oxide coating layer are put into a boat made of quartz glass and placed in a furnace core tube consisting of a quartz tube, and oxygen in the furnace core tube is purged with nitrogen gas. did. Then, the temperature was raised at a heating rate of 200 ° C./hr, and when it reached 500 ° C., the temperature was raised to 850 ° C. while introducing ammonia gas from the liquefied ammonia cylinder at a flow rate of 250 ml / min, and kept at this temperature for 6 hours. Then, the reduction and nitriding treatments were completed, and a coating layer made of partially reduced titanium oxide and titanium nitride was formed to obtain the target conductive fine particles.
【0024】得られた導電性微粒子は母粒子であるシリ
カ微粒子の単分散性を維持していた。得られた導電性微
粒子について電導度を測定したところ、50.0S/c
mと殆んど金属と同様の導電性を示し、この導電性微粒
子を用いて異方導電膜を作製したところ、優れた異方導
電性を示した。The obtained conductive fine particles maintained the monodispersity of the silica fine particles as the mother particles. The conductivity of the obtained conductive fine particles was measured and found to be 50.0 S / c.
m shows almost the same conductivity as that of metal. When an anisotropic conductive film was prepared using the conductive fine particles, excellent anisotropic conductivity was exhibited.
【0025】またX線光電分光法(XPS又はESC
A)により、被覆層の組成を求めた。X線光電分光分析
の条件は以下のとおりである。 機種名 :アルバック・ファイ(株)製 ESCA−
5400 真空度 :3〜5×10-9Pa X線源 :MgKα(1253.6eV) 分析面積 :1.1mmφ 光電子取込み時間 :1.0〜10.0min/element スパッタリング処理 :なし パスエネルギー :178.95eV その結果、部分還元酸化チタンTiOn におけるnの平
均値は1.75であり、TiO1.75とTiNとが約70
%と約30%の割合で存在することが明らかとなった。
また被覆層の膜厚は、電子顕微鏡により被覆前後の粒径
を測定した結果0.05μmであることが明らかとなっ
た。X-ray photoelectric spectroscopy (XPS or ESC
The composition of the coating layer was determined according to A). The conditions of the X-ray photoelectric spectroscopic analysis are as follows. Model name: ESCA- manufactured by ULVAC-PHI, Inc.
5400 Degree of vacuum: 3 to 5 × 10 −9 Pa X-ray source: MgKα (1253.6 eV) Analysis area: 1.1 mmφ Photoelectron uptake time: 1.0 to 10.0 min / element Sputtering treatment: None Path energy: 178. As a result, the average value of n in partially reduced titanium oxide TiO n was 1.75, and TiO 1.75 and TiN were about 70.
% And about 30%.
The film thickness of the coating layer was found to be 0.05 μm as a result of measuring the particle size before and after coating with an electron microscope.
【0026】さらに、本実施例で得られた導電性微粒子
を顕微鏡(2500倍)観察した結果、被覆層の剥離や
割れは認められなかった。Further, as a result of observing the conductive fine particles obtained in this example with a microscope (2500 times), no peeling or cracking of the coating layer was observed.
【0027】実施例2 本実施例は、中級アルコール系溶媒として、実施例1で
用いたn−ブタノールの代りにt−アミルアルコール
(2−メチル−2−ブタノール)を用いた実施例であ
り、以下にその詳細を示す。Example 2 This example is an example in which t-amyl alcohol (2-methyl-2-butanol) was used as a medium alcohol solvent instead of n-butanol used in Example 1, The details are shown below.
【0028】工程(1) 金属酸化物からなる球状粒子として、平均粒子径が6.
77μmの単分散シリカ微粒子を用い、中級アルコール
系溶媒としてt−アミルアルコールを用いて、シリカ微
粒子6.31gをt−アミルアルコール140mlに添
加し、30分間超音波照射を行なってシリカ微粒子の分
散液を得た。 Step (1) The spherical particles made of a metal oxide have an average particle size of 6.
Using 77 μm of monodisperse silica fine particles and t-amyl alcohol as a medium alcohol solvent, 6.31 g of silica fine particles was added to 140 ml of t-amyl alcohol, and ultrasonic irradiation was performed for 30 minutes to obtain a dispersion liquid of silica fine particles. Got
【0029】工程(2) 得られたシリカ微粒子の分散液に25%アンモニア水
0.30gを滴下混合し30℃で30分間撹拌すること
によりシリカ微粒子の表面を活性化処理した。 Step (2) 0.30 g of 25% aqueous ammonia was added dropwise to the obtained dispersion liquid of silica fine particles, and the surface of the silica fine particles was activated by stirring at 30 ° C. for 30 minutes.
【0030】工程(3) 酸化チタンを形成し得るチタン化合物として、チタンテ
トラブトキシドを用い、このチタンテトラブトキシド
5.45gをt−アミルアルコール20mlに溶解した
溶液を前記工程(2)を経た分散液に10分かけて滴下
混合し、30℃で1時間撹拌した。その後、0.5%ア
ンモニア水8.34gを2−プロピルアルコール20m
lに溶解した溶液を30分かけて加えた後、反応系を6
0℃に昇温して12時間撹拌して、チタンテトラブトキ
シドの加水分解反応を終了させた。反応終了後、反応液
を静置して粒子を沈降させた後、デカンテーションによ
り上澄み液を取り除いた。さらにメタノール、水の順で
デカンテーションを繰り返した後、凍結乾燥を行なっ
て、酸化チタン(TiO2 )の被覆層を有するシリカ微
粒子を得た。 Step (3) As a titanium compound capable of forming titanium oxide, titanium tetrabutoxide is used, and a solution prepared by dissolving 5.45 g of this titanium tetrabutoxide in 20 ml of t-amyl alcohol is subjected to the above step (2). The mixture was added dropwise over 10 minutes and stirred at 30 ° C. for 1 hour. Thereafter, 8.34 g of 0.5% aqueous ammonia was added to 20 m of 2-propyl alcohol.
After adding the solution dissolved in 1 over 30 minutes, the reaction system was added to 6
The temperature was raised to 0 ° C. and the mixture was stirred for 12 hours to complete the hydrolysis reaction of titanium tetrabutoxide. After the completion of the reaction, the reaction solution was allowed to stand and the particles were allowed to settle, and then the supernatant was removed by decantation. Further, decantation was repeated in the order of methanol and water, followed by freeze-drying to obtain silica fine particles having a titanium oxide (TiO 2 ) coating layer.
【0031】工程(4) 凍結乾燥された酸化チタン被覆層付きシリカ微粒子を石
英ガラス製のボートに入れ、これを石英チューブからな
る炉芯管内に設置し、窒素ガスによって炉芯管内の酸素
をパージした。次いで200℃/hrの昇温速度で昇温
し、500℃に達した時点で液化アンモニアボンベから
アンモニアガスを250ml/minの流速で導入しな
がら850℃まで昇温し、この温度で4時間保持し、還
元及び窒化処理を終了させ、部分還元酸化チタンと窒化
チタンからなる被覆層を形成し、かくして目的とする導
電性微粒子を得た。 Step (4) The freeze-dried silica fine particles with a titanium oxide coating layer are put in a boat made of quartz glass and placed in a furnace core tube made of a quartz tube, and oxygen in the furnace core tube is purged with nitrogen gas. did. Next, the temperature is raised at a heating rate of 200 ° C./hr, and when it reaches 500 ° C., the temperature is raised to 850 ° C. while introducing ammonia gas from the liquefied ammonia cylinder at a flow rate of 250 ml / min, and this temperature is maintained for 4 hours. Then, the reduction and nitriding treatments were completed, and a coating layer made of partially reduced titanium oxide and titanium nitride was formed to obtain the target conductive fine particles.
【0032】得られた導電性微粒子は母粒子であるシリ
カ微粒子の単分散性を維持していた。得られた導電性微
粒子について電導度を測定したところ、50.0S/c
mと殆んど金属と同様の導電性を示し、この導電性微粒
子を用いて異方導電膜を作製したところ、優れた異方導
電性を示した。The obtained conductive fine particles maintained the monodispersity of silica fine particles as the mother particles. The conductivity of the obtained conductive fine particles was measured and found to be 50.0 S / c.
m shows almost the same conductivity as that of metal. When an anisotropic conductive film was prepared using the conductive fine particles, excellent anisotropic conductivity was exhibited.
【0033】またX線光電分光法(XPS又はESC
A)により、被覆層の組成を求めたところ、実施例1と
ほぼ同様の結果が得られた。また被覆層の膜厚は、0.
05μmであった。さらに、本実施例で得られた導電性
微粒子を顕微鏡(2500倍)観察した結果、被覆層の
剥離や割れは認められなかった。X-ray photoelectric spectroscopy (XPS or ESC
When the composition of the coating layer was determined according to A), almost the same results as in Example 1 were obtained. The film thickness of the coating layer is 0.
It was 05 μm. Furthermore, as a result of observing the conductive fine particles obtained in this example with a microscope (2500 times), no peeling or cracking of the coating layer was observed.
【0034】比較例1 本比較例はアルコール系溶媒として、本発明に規定され
た中級アルコールに含まれないメタノールを用いた比較
例であり、以下にその詳細を示す。金属酸化物からなる
球状粒子として、平均粒子径が3.04μmの単分散シ
リカ微粒子を用い、アルコール系溶媒としてメタノール
を用いて、シリカ微粒子10.0gをメタノール100
gに添加し、10分間超音波照射を行なってシリカ微粒
子の分散液を得た。得られたシリカ微粒子の分散液に2
8%アンモニア水20gを添加混合した。Comparative Example 1 This comparative example is a comparative example in which methanol, which is not contained in the intermediate alcohol specified in the present invention, is used as the alcohol solvent, and the details will be described below. As spherical particles made of a metal oxide, monodispersed silica fine particles having an average particle diameter of 3.04 μm were used, and methanol was used as an alcohol-based solvent.
It was added to g and was irradiated with ultrasonic waves for 10 minutes to obtain a dispersion liquid of silica fine particles. 2 in the resulting dispersion of silica particles
20 g of 8% ammonia water was added and mixed.
【0035】酸化チタンを形成し得るチタン化合物とし
て、チタンテトライソプロポキシドを用い、このチタン
テトライソプロポキシド2.4gをメタノール70gに
溶解した溶液を、30℃に保った前記の分散液に添加混
合し、撹拌した。数時間撹拌後、反応液を静置して粒子
を沈降させた後、デカンテーションにより上澄み液を取
り除いた。さらにメタノール、水の順でデカンテーショ
ンを繰り返した後、凍結乾燥を行なって、酸化チタン
(TiO2 )の被覆層を有するシリカ微粒子を得た。Titanium tetraisopropoxide was used as a titanium compound capable of forming titanium oxide, and a solution prepared by dissolving 2.4 g of this titanium tetraisopropoxide in 70 g of methanol was added to the above dispersion liquid kept at 30 ° C. Mix and stir. After stirring for several hours, the reaction solution was allowed to stand to settle the particles, and the supernatant was removed by decantation. Further, decantation was repeated in the order of methanol and water, followed by freeze-drying to obtain silica fine particles having a titanium oxide (TiO 2 ) coating layer.
【0036】凍結乾燥された酸化チタン被覆層付きシリ
カ微粒子を石英ガラス製のボートに入れ、これを石英チ
ューブからなる炉芯管内に設置し、窒素ガスによって炉
芯管内の酸素をパージした。次いで200℃/hrの昇
温速度で昇温し、500℃に達した時点で液化アンモニ
アボンベからアンモニアガスを250ml/minの流
速で導入しながら850℃まで昇温し、この温度で6時
間保持し、還元及び窒化処理を終了させ、部分還元酸化
チタンと窒化チタンからなる被覆層を形成し、導電性微
粒子を得た。The freeze-dried silica fine particles with a titanium oxide coating layer were put in a boat made of quartz glass, placed in a furnace core tube made of a quartz tube, and oxygen in the furnace core tube was purged with nitrogen gas. Then, the temperature was raised at a heating rate of 200 ° C./hr, and when it reached 500 ° C., the temperature was raised to 850 ° C. while introducing ammonia gas from the liquefied ammonia cylinder at a flow rate of 250 ml / min, and kept at this temperature for 6 hours. Then, the reduction and nitriding treatments were completed, a coating layer made of partially reduced titanium oxide and titanium nitride was formed, and conductive fine particles were obtained.
【0037】得られた導電性微粒子は母粒子であるシリ
カ微粒子の単分散性を維持していた。得られた導電性微
粒子について電導度を測定したところ、0.12S/c
mと低い値を示し、この導電性微粒子を用いて異方導電
膜を作製したところ、異方導電性を示したが不十分な性
能であった。また被覆層の膜厚は、0.0018μmと
極めて薄かった。The obtained conductive fine particles maintained the monodispersity of silica fine particles as the mother particles. The conductivity of the obtained conductive fine particles was measured and found to be 0.12 S / c.
When the anisotropic conductive film was produced using this conductive fine particle, it showed anisotropic conductivity, but the performance was insufficient. The thickness of the coating layer was 0.0018 μm, which was extremely thin.
【0038】比較例2 実施例1の工程(1),(2)および(3)を経て得ら
れた、酸化チタン(TiO2 )被覆層付き乾燥シリカ微
粒子を酸素雰囲気で焼成した。すなわち、酸化チタン被
覆層付きシリカ微粒子を石英ガラス製のボートに入れ、
これを石英チューブからなる炉芯管内に設置し、酸素雰
囲気で毎時200℃の昇温速度で800℃まで昇温して
この温度で4時間保持し、焼成を行った。得られた被覆
層付きシリカ微粒子の電導度を測定したところ、5.6
9×10-12 S/cmと絶縁性を示し異方導電膜を作製
することは不可能であった。Comparative Example 2 Dried silica fine particles with a titanium oxide (TiO 2 ) coating layer obtained through the steps (1), (2) and (3) of Example 1 were fired in an oxygen atmosphere. That is, put the silica particles with a titanium oxide coating layer in a boat made of quartz glass,
This was placed in a furnace core tube made of a quartz tube, heated to 800 ° C. at a temperature rising rate of 200 ° C./hour in an oxygen atmosphere, held at this temperature for 4 hours, and fired. The conductivity of the obtained silica fine particles with a coating layer was measured to be 5.6.
It was impossible to produce an anisotropic conductive film which showed an insulating property of 9 × 10 −12 S / cm.
【0039】[0039]
【発明の効果】本発明によれば、(a)粒径精度に優れ
ている、(b)電気欠損がない、(c)高強度、高硬度
である、(d)凝集がないなどの利点を有する新規な導
電性微粒子及びその製造方法が提供された。According to the present invention, there are advantages such as (a) excellent particle size accuracy, (b) no electrical defects, (c) high strength and hardness, and (d) no aggregation. There is provided a novel conductive fine particle having the above and a method for producing the same.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 阪井 和彦 岐阜県岐阜市薮田西2丁目1番1号 宇部 日東化成株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kazuhiko Sakai 2-1-1 Yabuta Nishi, Gifu City, Gifu Ube Nitto Kasei Co., Ltd.
Claims (2)
形粒子表面に形成された、部分還元酸化チタン及び/又
は窒化チタンを含む被覆層とを有することを特徴とする
導電性微粒子。1. Conductive fine particles comprising spherical particles made of a metal oxide, and a coating layer formed on the surface of the spherical particles and containing partially reduced titanium oxide and / or titanium nitride.
級アルコールを主体とするアルコール系溶媒に分散して
球形粒子の分散液を得る工程; (2)前記分散液にアルカリ水溶液を添加して金属酸化
物球形粒子の表面を活性化処理する工程; (3)前記活性化処理後の分散液に、酸化チタンを形成
し得るチタン化合物を添加し、加水分解して、前記球形
粒子の表面に酸化チタン被覆層を形成する工程;および (4)前記酸化チタン被覆層を還元性及び/又は窒化雰
囲気下で焼成して、還元及び/又は窒化し、導電性を有
する部分還元酸化チタン及び/又は窒化チタンを含む被
覆層を形成する工程を含むことを特徴とする導電性微粒
子の製造方法。2. A step of (1) dispersing spherical particles made of a metal oxide in an alcohol solvent mainly containing an intermediate alcohol to obtain a dispersion of spherical particles; (2) adding an alkaline aqueous solution to the dispersion. And (3) a titanium compound capable of forming titanium oxide is added to the dispersion liquid after the activation treatment and hydrolyzed to the surface of the spherical particles. And (4) firing the titanium oxide coating layer in a reducing and / or nitriding atmosphere to reduce and / or nitride the titanium oxide coating layer, and to provide partially reduced titanium oxide having conductivity and / or Alternatively, the method for producing conductive fine particles comprises a step of forming a coating layer containing titanium nitride.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30725492A JP3350116B2 (en) | 1992-11-17 | 1992-11-17 | Method for producing conductive fine particles |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30725492A JP3350116B2 (en) | 1992-11-17 | 1992-11-17 | Method for producing conductive fine particles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06162817A true JPH06162817A (en) | 1994-06-10 |
| JP3350116B2 JP3350116B2 (en) | 2002-11-25 |
Family
ID=17966893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30725492A Expired - Fee Related JP3350116B2 (en) | 1992-11-17 | 1992-11-17 | Method for producing conductive fine particles |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3350116B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6013369A (en) * | 1994-11-21 | 2000-01-11 | Ube Nitto Kasei Co., Ltd. | Process for the production of titanium oxide coated particles |
| WO2002073632A1 (en) * | 2001-03-08 | 2002-09-19 | Naoi, Kenzo | Inorganic/organic complex nano-beads and method for manufacturing the same |
| JP2014172771A (en) * | 2013-03-07 | 2014-09-22 | Ube Exsymo Co Ltd | Composite particle and production method thereof |
-
1992
- 1992-11-17 JP JP30725492A patent/JP3350116B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6013369A (en) * | 1994-11-21 | 2000-01-11 | Ube Nitto Kasei Co., Ltd. | Process for the production of titanium oxide coated particles |
| US6194069B1 (en) | 1994-11-21 | 2001-02-27 | Ube Nitto Kasei Co., Ltd. | Process for the production of coated particles |
| WO2002073632A1 (en) * | 2001-03-08 | 2002-09-19 | Naoi, Kenzo | Inorganic/organic complex nano-beads and method for manufacturing the same |
| US7291392B2 (en) | 2001-03-08 | 2007-11-06 | Aoi Electronics Co., Ltd. | Inorganic/organic complex nano-beads and method for manufacturing the same |
| JP2014172771A (en) * | 2013-03-07 | 2014-09-22 | Ube Exsymo Co Ltd | Composite particle and production method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3350116B2 (en) | 2002-11-25 |
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