JPH049807A - Polyimide optical waveguide - Google Patents
Polyimide optical waveguideInfo
- Publication number
- JPH049807A JPH049807A JP11050090A JP11050090A JPH049807A JP H049807 A JPH049807 A JP H049807A JP 11050090 A JP11050090 A JP 11050090A JP 11050090 A JP11050090 A JP 11050090A JP H049807 A JPH049807 A JP H049807A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide
- optical waveguide
- optical
- layer
- cladding layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Optical Integrated Circuits (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光導波路に関し、特に耐熱性に優れたプラスチ
ック系光導波路に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an optical waveguide, and particularly to a plastic optical waveguide with excellent heat resistance.
低損失光ファイバの開発による光通信システムの実用化
に伴い、種々の光通信用部品の開発が望まれている。ま
たこれら光部品を高密度に実装する光配線技術、特に光
導波路技術の確立が望まれている。BACKGROUND OF THE INVENTION With the development of low-loss optical fibers and the practical use of optical communication systems, the development of various optical communication components is desired. Furthermore, it is desired to establish optical wiring technology, especially optical waveguide technology, for mounting these optical components at high density.
一般に、光導波路には、■光損失が小さい、■製造が容
易、■コアとクラッドの屈折率差を制御できる、■耐熱
性に優れている、等の条件が要求される。Generally, optical waveguides are required to meet the following conditions: (1) low optical loss, (2) easy manufacturing, (2) controllable refractive index difference between the core and cladding, and (2) excellent heat resistance.
低損失な光導波路としては石英系が主に検討されている
。光ファイバで実証済みのように石英は光透過性が極め
て良好であるた約導波路とした場合も波長1.3μmに
おいて0.16B/cm以下の低損失化が達成されてい
る。しかしその光導波路作製に長時間を必要とする、作
製時に高温が必要である、大面積化が困難であるなど製
造上の問題点がある。これに対してポリメチルメタクリ
レート(PMMA)などのプラスチック系光導波路は低
い温度で成形が可能であり、低価格が期待できるが耐熱
性に劣る、長波長で十分な低損失化が達成されていない
、などの欠点がある。Quartz-based optical waveguides are mainly being considered as low-loss optical waveguides. As has already been demonstrated in optical fibers, quartz has extremely good optical transparency, and even when used as a waveguide, a loss of 0.16 B/cm or less has been achieved at a wavelength of 1.3 μm. However, there are manufacturing problems, such as the long time it takes to fabricate the optical waveguide, the need for high temperatures during fabrication, and the difficulty in increasing the area. On the other hand, plastic optical waveguides such as polymethyl methacrylate (PMMA) can be molded at low temperatures and can be expected to be inexpensive, but they have poor heat resistance and have not achieved sufficiently low loss at long wavelengths. There are drawbacks such as.
従来の技術で示したように石英系光導波路、プラスチッ
ク系光導波路とも問題点があり、現在のところ光導波路
に要求される上記4点の条件を満足する光導波路は得ら
れていない。As shown in the prior art, both quartz-based optical waveguides and plastic-based optical waveguides have problems, and at present no optical waveguide has been obtained that satisfies the above four conditions required for an optical waveguide.
本発明は、屈折率差を自由にコントロールでき、製造が
容易でしかも耐熱性が良好な低損失光導波路を提供する
ことを目的とする。An object of the present invention is to provide a low-loss optical waveguide that can freely control the refractive index difference, is easy to manufacture, and has good heat resistance.
本発明を概説すれば、本発明はポリイミド系光導波路に
関する発明であって、テトラカルボン酸二無水物とジア
ミンから得られるポリイミドを構成要素とするポリイミ
ド系光導波路において、該ポリイミドが、下記の構造式
■:F、じ
で表されるジアミン若しくはそれを含むジアミンからの
ポリイミド、又はその混合物であることを特徴とする。To summarize the present invention, the present invention relates to a polyimide optical waveguide having a polyimide obtained from a tetracarboxylic dianhydride and a diamine as a constituent element, wherein the polyimide has the following structure. It is characterized by being a polyimide made from a diamine represented by the formula (2): F, or a diamine containing the same, or a mixture thereof.
本発明においてはプラスチック中でも最も高い耐熱性を
有するポリイミドを先導波路のコア層、クラッド層のい
ずれか又は両方に用いることを特徴とする。ポリイミド
の耐熱温度は300℃以上であり、電子材料として重要
な特性であるハンダ耐熱性は十分に保持している。更に
スピンコード法により、容易に大面積導波路が作製でき
るという利点を持ち、導波路の低価格化が可能である。The present invention is characterized in that polyimide, which has the highest heat resistance among plastics, is used for either or both of the core layer and cladding layer of the leading waveguide. The heat resistance temperature of polyimide is 300° C. or higher, and it sufficiently maintains solder heat resistance, which is an important property for electronic materials. Furthermore, the spin code method has the advantage that a large-area waveguide can be easily produced, and the cost of the waveguide can be reduced.
またポリイミド導波路の作製温度は通常400℃以下で
あるため、石英、シリコーン以外にポリイミドなど既に
電気配線基板として使用されている汎用の基板上にも作
製できるという利点を有している。−刃数に上布されて
いるポリイミドは吸湿性が高く、使用時に屈折率が変化
すること、材料吸収による光損失が大きいことなどの欠
点がある。本発明者らは光導波路の適用を目指して種々
のポリイミドを合成して適用性を検討した結果、以下に
示すフッ素化ポリイミド群において良好な光導波路が形
成できることを見出した。すなわち、テトラカルボン酸
二無水物とジアミンから得られるポリイミドにおいて、
前記の構造式Iで表されるジアミン若しくはそれを含む
ジアミンからのポリイミド又はその混合物を光導波路の
構成要素とすることが必要である。Furthermore, since the manufacturing temperature of polyimide waveguides is usually 400° C. or lower, they have the advantage that they can be manufactured on general-purpose substrates that are already used as electrical wiring boards, such as polyimide in addition to quartz and silicone. - The polyimide coated on the blade has high hygroscopicity, which has drawbacks such as a change in refractive index during use and large light loss due to material absorption. The present inventors synthesized various polyimides and examined their applicability with the aim of applying them to optical waveguides, and as a result, they found that a good optical waveguide could be formed using the fluorinated polyimide group shown below. That is, in polyimide obtained from tetracarboxylic dianhydride and diamine,
It is necessary to use the diamine represented by the above structural formula I or a polyimide made from a diamine containing the same, or a mixture thereof as a constituent element of the optical waveguide.
本発明に用いるテトラカルボン酸二無水物としては、例
えばピロメリット酸二無水物、3゜3’、4.4’
−ベンゾフェノンテトラカルボン酸二無水物、3.3’
、4.4’ −ビフェニルテトラカルボン酸二無水物
、2.2−ビス(3,4−ジカルボキシフェニル)−ヘ
キサフルオロブロバンニ無水物、トリフルオロメチルピ
ロメリット酸二無水物、1.4−ジ(トリフルオロメチ
ル)ピロメリット酸二無水物、1゜4−ジ(ペンタフル
オロエチル)ピロメリット酸二無水物、ヘプタフルオロ
プロピルピロメリット酸二無水物等が挙げられる。この
中でピロメリット酸のベンゼン環にフルオロアルキル基
を導入した含フツ素酸二無水物であるトリフルオロメチ
ルピロメリット酸二無水物、1.4−ジ(トリフルオロ
メチル)ピロメリット酸二無水物、l、4−ジ(ペンタ
フルオロエチル)ピロメリット酸二無水物、ヘプタフル
オロプロピルピロメリット酸二無水物等の製造方法は特
願昭63−165056号明細書に記載されている。Examples of the tetracarboxylic dianhydride used in the present invention include pyromellitic dianhydride, 3°3', 4.4'
-benzophenone tetracarboxylic dianhydride, 3.3'
, 4.4'-biphenyltetracarboxylic dianhydride, 2.2-bis(3,4-dicarboxyphenyl)-hexafluorobrovannianhydride, trifluoromethylpyromellitic dianhydride, 1.4- Examples include di(trifluoromethyl)pyromellitic dianhydride, 1°4-di(pentafluoroethyl)pyromellitic dianhydride, heptafluoropropylpyromellitic dianhydride, and the like. Among them, trifluoromethylpyromellitic dianhydride, which is a fluorine-containing dianhydride with a fluoroalkyl group introduced into the benzene ring of pyromellitic acid, and 1,4-di(trifluoromethyl)pyromellitic dianhydride. Methods for producing 1,4-di(pentafluoroethyl)pyromellitic dianhydride, heptafluoropropylpyromellitic dianhydride, etc. are described in Japanese Patent Application No. 165056/1983.
また式Iで表されるジアミン以外のジアミンとしては、
3.3′−ジメチル−4,4′ −ジアミノビフェニル
、4.4’ −ジアミノ−p−テルフェニル等が挙げ
られる。式■で表される2、2’ −(ビストリフル
オロメチル)−4゜4′ −ジアミノビフェニルの製造
方法は、例えば日本化学会誌、第1972巻、第3号、
第675〜676頁(1972)に記載されている。Further, as diamines other than the diamine represented by formula I,
Examples thereof include 3.3'-dimethyl-4,4'-diaminobiphenyl and 4.4'-diamino-p-terphenyl. The method for producing 2,2'-(bistrifluoromethyl)-4°4'-diaminobiphenyl represented by the formula (■) is described, for example, in Journal of the Chemical Society of Japan, Vol. 1972, No. 3,
No. 675-676 (1972).
本発明に使用するポリイミドの前駆体であるポリアミッ
ク酸の製造方法は、通常のポリアミツク酸の製造条件と
同じでよく、−船釣にはN−メチル−2−ピロリドン、
N、N−ジメチルアセトアミド、N、N−ジメチルホル
ムアミドなどの極性有機溶媒中で反応させる。本発明に
おいてはジアミンまたテトラカルボン酸二無水物共単一
化合物で用いるばかりではなく、複数のジアミン、テト
ラカルボン酸二無水物を混合して用いる場合がある。そ
の場合は、複数又は単一のジアミンのモル数の合計と複
数又は単一のテトラカルボン酸二無水物のモル数の合計
が等しいかほぼ等しくなるようにする。The method for producing polyamic acid, which is a precursor of polyimide used in the present invention, may be the same as the production conditions for ordinary polyamic acid. - N-methyl-2-pyrrolidone for boat fishing;
The reaction is carried out in a polar organic solvent such as N,N-dimethylacetamide or N,N-dimethylformamide. In the present invention, not only a single compound of diamine and tetracarboxylic dianhydride is used, but also a mixture of a plurality of diamines and tetracarboxylic dianhydride may be used. In that case, the total number of moles of multiple or single diamines and the total number of moles of multiple or single tetracarboxylic dianhydride are made to be equal or approximately equal.
次に得られたポリアミック酸のイミド化によるポリイミ
ドの合成であるが、通常のポリイミドの合成法が使用で
きる。本発明においては、単一のポリアミック酸のイミ
ド化のほか、複数のポリアミック酸を混合した状態での
イミド化を行い、ポリイミドの混合体も得ている。Next, polyimide is synthesized by imidizing the obtained polyamic acid, and a conventional polyimide synthesis method can be used. In the present invention, in addition to imidization of a single polyamic acid, a mixture of a plurality of polyamic acids is imidized to obtain a polyimide mixture.
本発明の光導波路の構造は、一般に製造されているすべ
ての光導波路と同様でよく、例えばファイバ型、平面型
、リッジ型、レンズ型、埋約込み型等がある。光導波路
のコア材とクラツド材の選択は、光の波長、使用用途に
適した屈折率の差になるようにすればよい。The structure of the optical waveguide of the present invention may be the same as all commonly manufactured optical waveguides, such as fiber type, planar type, ridge type, lens type, and buried type. The core material and cladding material of the optical waveguide may be selected so that the difference in refractive index is appropriate for the wavelength of light and the intended use.
リッジ型の製造方法について第1図を参照しつつ説明す
る。すなわち第1図は本発明によるリッジ型光導波路の
作製方法の一例を示す工程図であって、符号1は基板、
2は下部クラッド層、3はコア層、4はアルミニウム層
、5はレジスト層を意味する。シリコン等の基板1の上
に本発明の構成要素であるポリイミドが形成可能なポリ
アミック酸を所定の厚さに塗布し、加熱することにより
下部クラッド層2を得る。次いで下部クラッド層2の上
に下部クラッド層よりも屈折率の大きい本発明の構成要
素であるポリイミドが形成可能なポリアミック酸を所定
の厚さに塗布し、加熱することによりコア層3を得る。A method for manufacturing the ridge type will be explained with reference to FIG. That is, FIG. 1 is a process diagram showing an example of a method for manufacturing a ridge type optical waveguide according to the present invention, in which reference numeral 1 indicates a substrate;
2 means a lower cladding layer, 3 means a core layer, 4 means an aluminum layer, and 5 means a resist layer. A lower cladding layer 2 is obtained by coating a polyamic acid capable of forming polyimide, which is a component of the present invention, to a predetermined thickness on a substrate 1 made of silicon or the like and heating it. Next, a polyamic acid capable of forming polyimide, which is a component of the present invention having a higher refractive index than the lower cladding layer, is coated on the lower cladding layer 2 to a predetermined thickness and heated to obtain the core layer 3.
次に蒸着によりアルミニウム層4をつけた後レジスト塗
布、プリベータ、露光、現像、アフターベータを行い、
バターニングされたレジスト層5を得る。アルミニウム
をウェットエツチングにより除去した後、ポリイミドを
ドライエツチングにより除去する。最後に残ったアルミ
ニウム層4をウェットエツチングで除去し、光導波路を
得る。このようにして下部クラッド層、コア層が本発明
の構成要素であるポリイミド、上部クラッド層が空気層
のリッジ型先導波路が得られる。Next, after applying an aluminum layer 4 by vapor deposition, resist coating, pre-beta, exposure, development, and after-beta are performed.
A patterned resist layer 5 is obtained. After the aluminum is removed by wet etching, the polyimide is removed by dry etching. Finally, the remaining aluminum layer 4 is removed by wet etching to obtain an optical waveguide. In this way, a ridge-type guided waveguide is obtained in which the lower cladding layer and the core layer are made of polyimide, which is a component of the present invention, and the upper cladding layer is an air layer.
また第2図に示したように第]rI!Jのリッジ型光導
波路にコア層よりも屈折率の小さい本発明の構成要素で
あるポリイミドで構成される上部クラッド層6を形成す
ることにより、下部クラッド層、コア層、上部クラッド
層とも本発明の構成要素であるポリイミドの埋約込み型
光導波路が得られる。すなわち第2図は、埋め込み型光
導波路の一例の断面図であり、符号1〜3は第1図と同
義、6は上部クラッド層を意味する。Also, as shown in FIG. By forming the upper cladding layer 6 made of polyimide, which is a component of the present invention and has a lower refractive index than the core layer, on the ridge-type optical waveguide of J, the lower cladding layer, the core layer, and the upper cladding layer can be combined with the present invention. A buried optical waveguide made of polyimide is obtained. That is, FIG. 2 is a cross-sectional view of an example of a buried optical waveguide, where symbols 1 to 3 have the same meanings as in FIG. 1, and 6 means an upper cladding layer.
以下、いくつかの実施例を用いて本発明を更に詳しく説
明する。なお種々のポリイミドの組合せにより、また先
導波路構造により数限りない本発明のポリイミド系光導
波路が得られることは明らかであり、本発明はこれらの
実施例のみに限定されるものではない。The present invention will be explained in more detail below using some examples. Note that it is clear that an infinite number of polyimide optical waveguides of the present invention can be obtained by combining various polyimides and by changing the guiding waveguide structure, and the present invention is not limited to these examples.
本実施例に用いたポリイミド及びその混合物の熱分解温
度、屈折率を表1に示す。なお熱分解温度は窒素気流下
10℃/分の速度で昇温した時の10wt%重量減生重
量温度で示した。屈折率はアツベ型屈折率計を用いて、
20℃における波長589nmでの屈折率で示した。な
お表1において番号1〜6はポリイミド単体、番号7〜
15はポリイミド共重合体、番号16〜20はポリイミ
ド混合物である。Table 1 shows the thermal decomposition temperature and refractive index of the polyimide and its mixture used in this example. The thermal decomposition temperature was expressed as the 10 wt% weight loss temperature when the temperature was raised at a rate of 10° C./min under a nitrogen stream. The refractive index was measured using an Atsube refractometer.
It is shown as a refractive index at a wavelength of 589 nm at 20°C. In Table 1, numbers 1 to 6 are polyimide alone, and numbers 7 to 6 are polyimide alone.
15 is a polyimide copolymer, and numbers 16 to 20 are polyimide mixtures.
表1−1 本実施例で使用したポリイミドの特性3!
l−2本実施例で使用したポリイミドの混合物の特性こ
のように本実施例で用いたポリイミド及びその組成物は
屈折率が1.49から1.65の間に細かく存在するた
め、これらを用いたコアとクラッドの屈折率差を自由に
制御できる。また熱分解温度はすべて500℃以上と高
く、ハンダにも十分に耐えるだけの耐熱性を有している
。Table 1-1 Characteristics 3 of polyimide used in this example!
l-2 Characteristics of the polyimide mixture used in this example As described above, the polyimide and its composition used in this example have a fine refractive index between 1.49 and 1.65. The refractive index difference between the core and cladding can be freely controlled. In addition, the thermal decomposition temperature is as high as 500°C or higher for all of them, and they have sufficient heat resistance to withstand solder.
表1に示したポリイミド及びその混合物を用いて作製し
た光導波路の実施例を示す。なお光伝搬損失は作製した
先導波路に波長0.63μm、0.85μm及び1.3
μmの光を通してストリーク光散乱法又はカットバック
法で測定した。Examples of optical waveguides fabricated using polyimides and mixtures thereof shown in Table 1 are shown below. Note that the optical propagation loss was measured at wavelengths of 0.63 μm, 0.85 μm, and 1.3 μm in the fabricated leading waveguide.
It was measured by streak light scattering method or cutback method through μm light.
実施例1
表面が酸化シリコン層である直径3インチのシリコンウ
ェファに表1の番号1のポリイミドの前駆体であるポリ
アミック酸のジメチルアセトアミド10wt%溶液を加
熱後の膜厚が10μmになるようにスピンコード法によ
り塗布した後最高温度350℃で熱処理をした。このよ
うにして下部クラッド層が酸化シリコン層、コア層が表
1の番号1のポリイミド、上部クラッド層が空気層の最
も単純な平面型光導波路が得られた。この光導波路に波
長0.63μmの光を通してストリーク光散乱法で光伝
搬損失を測定した結果、0.85 dB/cmであった
。Example 1 A 10 wt % dimethylacetamide solution of polyamic acid, which is a precursor of polyimide No. 1 in Table 1, was spun on a silicon wafer with a diameter of 3 inches with a silicon oxide layer on the surface so that the film thickness after heating was 10 μm. After coating by the cord method, it was heat-treated at a maximum temperature of 350°C. In this way, the simplest planar optical waveguide was obtained, in which the lower cladding layer was a silicon oxide layer, the core layer was made of polyimide number 1 in Table 1, and the upper cladding layer was an air layer. When light with a wavelength of 0.63 μm was passed through this optical waveguide and the optical propagation loss was measured by a streak light scattering method, it was found to be 0.85 dB/cm.
実施例2〜20
実施例1において使用した表1の番号1のポリイミドの
前駆体であるポリアミック酸のジメチルアセトアミド1
0wt%溶液の代りに表1の番号2〜20から選ばれた
ポリイミド及びその混合物の前駆体であるポリアミック
酸のジメチルアセトアミド10wt%溶液を用いて実施
例1と同様の方法で、下部クラッド層が酸化シリコン層
、コア層が表1の番号2〜20から選ばれたポリイミド
、上部クラッド層が空気層の最も単純な平面型光導波路
を得た。この光導波路に波長0.63μmの光を通して
ス) IJ−り光散乱法で光伝搬損失を測定した。結果
を表2に示す。Examples 2 to 20 Dimethylacetamide 1 of polyamic acid, which is a precursor of polyimide number 1 in Table 1 used in Example 1
The lower cladding layer was formed in the same manner as in Example 1 using a 10 wt % dimethylacetamide solution of polyamic acid, which is a precursor of a polyimide selected from numbers 2 to 20 in Table 1 and a mixture thereof, instead of the 0 wt % solution. The simplest planar optical waveguide was obtained, in which the silicon oxide layer, the core layer was made of polyimide selected from numbers 2 to 20 in Table 1, and the upper cladding layer was an air layer. Light with a wavelength of 0.63 μm was passed through this optical waveguide, and the optical propagation loss was measured by IJ-reflection light scattering method. The results are shown in Table 2.
表2 平面型光導波路の光伝搬損失(波長 0.63μ
l)実施例21
表面が酸化シリコン層である直径3インチのシリコンウ
ェファに表1の番号15のポリイミドの前駆体であるポ
リアミック酸のジメチルアセトアミド10wt%溶液を
加熱後の膜厚が30μmになるようにスピンコード法に
より塗布した。この塗膜を最高温度350℃で熱処理を
して下部クラッド層を形成した。引続いてこの下部クラ
ッド層上に表1の番号1のポリイミドの前駆体であるポ
リアミック酸のジメチルアセトアミド10wt%溶液を
加熱後の膜厚が10μmになるようにスピンコード法に
より塗布した。Table 2 Optical propagation loss of planar optical waveguide (wavelength 0.63μ
l) Example 21 A 10 wt % dimethylacetamide solution of polyamic acid, which is a precursor of polyimide No. 15 in Table 1, was heated on a silicon wafer with a diameter of 3 inches and whose surface was a silicon oxide layer so that the film thickness after heating was 30 μm. It was applied using the spin code method. This coating film was heat-treated at a maximum temperature of 350°C to form a lower cladding layer. Subsequently, on this lower cladding layer, a 10 wt % solution of polyamic acid, which is a precursor of polyimide No. 1 in Table 1, in dimethylacetamide was applied by a spin cord method so that the film thickness after heating was 10 μm.
この塗膜を最高温度350t:で熱処理をしてコア層を
形成した。次に電子ビーム蒸着機により、アルミニウム
を0.3μmつけた後レジスト加工を行った。まず通常
のポジ型レジストをスピンコード法により塗布した後約
95℃でプリベークを行った。次に線幅10μm1長さ
60mmのパターン形成用マスクを通して超高圧水銀ラ
ンプを用いて紫外線を照射した後ポジ型レジスト用の現
像液を用いて現像した。その後135℃でアフターベー
クをした。次にレジストでコートされていないアルミニ
ウムのウェットエツチングを行った。洗浄乾燥後ドライ
エツチング装置を用いポリイミドのRIE加工を行った
。最後にポリイミドの上層にあるアルミニウムを上記し
たエツチング液で除去し、下部クラッド層が表1の番号
15のポリイミド、コア層が表1の番号1のポリイミド
、上部クラッド層が空気層のりッジ型先導波路が得られ
た。この先導波路に波長0.85μmの光を通してカッ
トバック法で光伝搬損失を測定した結果、0.706B
/cmであった。また波長1.3μmでの光伝搬損失は
0、36B/cmであった。This coating film was heat-treated at a maximum temperature of 350 t to form a core layer. Next, aluminum was deposited to a thickness of 0.3 μm using an electron beam evaporator, and then resist processing was performed. First, a normal positive resist was applied by a spin code method, and then prebaked at about 95°C. Next, ultraviolet rays were irradiated using an ultra-high pressure mercury lamp through a pattern forming mask with a line width of 10 μm and a length of 60 mm, followed by development using a developer for positive resist. Thereafter, after-baking was performed at 135°C. Next, wet etching was performed on the aluminum that was not coated with resist. After washing and drying, polyimide was subjected to RIE processing using a dry etching device. Finally, the aluminum on the upper layer of polyimide is removed using the etching solution described above, and the lower cladding layer is made of polyimide number 15 in Table 1, the core layer is made of polyimide number 1 in Table 1, and the upper cladding layer is an air layer ridge type. A leading wavepath was obtained. The optical propagation loss was measured using the cutback method by passing light with a wavelength of 0.85 μm through this leading wavepath, and the result was 0.706B.
/cm. Further, the optical propagation loss at a wavelength of 1.3 μm was 0.36 B/cm.
実施例22〜40
実施例21にふいて下部クラッド層として使用した表1
の番号15のポリイミドの前駆体であるポリアミック酸
のジメチルアセトアミド1.0wt%溶液の代りに表1
の番号8〜14から選ばれたポリイミドの前駆体である
ポリアミック酸のジメチルアセトアミド10wt%溶液
を用い、またコア層として使用した表1の番号1のポリ
イミドの前駆体であるポリアミック酸のジメチルアセト
アミド10wt%溶液の代りに表1の番号l及び12〜
14から選ばれた下部クラッド層よりも屈折率の大きい
ポリイミドの前駆体であるポリアミック酸のジメチルア
セトアミド1.0wt%溶液を用いて実施例21と同様
の方法で下部クラッド層、コア層共表1の番号1及び8
〜14から選ばれたポリイミド、上部クラッド層が空気
層のりッジ型先導波路を得た。この光導波路に波長0.
85μmの光を通してカットバック法で光伝搬損失を測
定した。結果を表3に示す。Examples 22-40 Table 1 used as the lower cladding layer in Example 21
In place of the dimethylacetamide 1.0 wt% solution of polyamic acid, which is the precursor of polyimide number 15, Table 1
A 10 wt % solution of dimethylacetamide of polyamic acid, which is a precursor of polyimide selected from numbers 8 to 14 of Table 1, was used as a core layer. % solution instead of numbers l and 12~ in Table 1
Both the lower cladding layer and the core layer were prepared in the same manner as in Example 21 using a dimethylacetamide 1.0 wt% solution of polyamic acid, which is a precursor of polyimide having a higher refractive index than the lower cladding layer selected from Table 1. numbers 1 and 8
A ridge-type leading waveguide with an air layer in the upper cladding layer was obtained using polyimide selected from ~14. This optical waveguide has a wavelength of 0.
Light propagation loss was measured using a cutback method through light of 85 μm. The results are shown in Table 3.
リッジ型光導波路の光伝搬損失(波長
0.85μ■)
埋め込み型光導波路の光伝搬損失(波長0.85μs+
)
実施例41〜60
実施例21〜40において作製したりッジ型光導波路の
上に下部クラッド層と同様のポリイミドの前駆体である
ポリアミック酸のジメチルアセトアミド10wt%溶液
を加熱後の膜厚が30μmになるようにスピンコード法
により塗布した。この塗膜を最高温度350℃で熱処理
して上部クラッド層を形成した。このようにして下部ク
ラッド層、コア層、上部クラッド層共本発明の構成要素
であるポリイミドを用いた埋め込み型先導波路が得られ
た。この光導波路に波長0.85μmの光を通してカッ
トバック法で光伝搬損失を測定した。結果を表4に示す
。また実施例41の先導波路の波長1.3μmでの光伝
搬損失は0.1 dB/cmであった。Optical propagation loss of ridge type optical waveguide (wavelength 0.85 μs) Optical propagation loss of buried type optical waveguide (wavelength 0.85 μs +
) Examples 41 to 60 A 10 wt % dimethylacetamide solution of polyamic acid, which is a precursor of polyimide similar to that of the lower cladding layer, was heated on top of the edge-type optical waveguides produced in Examples 21 to 40, and the film thickness was as follows. Coating was performed by a spin code method to a thickness of 30 μm. This coating film was heat-treated at a maximum temperature of 350°C to form an upper cladding layer. In this way, a buried guide waveguide was obtained in which the lower cladding layer, the core layer, and the upper cladding layer were all made of polyimide, which is a component of the present invention. Light with a wavelength of 0.85 μm was passed through this optical waveguide and the optical propagation loss was measured using the cutback method. The results are shown in Table 4. Further, the optical propagation loss of the leading waveguide of Example 41 at a wavelength of 1.3 μm was 0.1 dB/cm.
本発明によれば従来の石英系光導波路、プラスチック系
光導波路で得られていない屈折率差を自由にコントロー
ルでき、製造が容易でしかも耐熱性が良好な低損失光導
波路を提供することができる。According to the present invention, it is possible to freely control the refractive index difference that cannot be obtained with conventional silica-based optical waveguides and plastic-based optical waveguides, and it is possible to provide a low-loss optical waveguide that is easy to manufacture and has good heat resistance. .
第1図は本発明によるリッジ型光導波路の作製方法の一
例を示す工程図、第2図は埋約込み型光導波路の一例の
断面図である。
1:基板、2:下部クラッド層、3:コア層、4ニアル
ミニウム層、5ニレジスト層、6:上部クラッド層
特許出願人 日本電信電話株式会社FIG. 1 is a process diagram showing an example of a method for manufacturing a ridge-type optical waveguide according to the present invention, and FIG. 2 is a sectional view of an example of a buried-type optical waveguide. 1: Substrate, 2: Lower cladding layer, 3: Core layer, 4 Ni aluminum layer, 5 Ni resist layer, 6: Upper cladding layer Patent applicant Nippon Telegraph and Telephone Corporation
Claims (1)
ポリイミドを構成要素とするポリイミド系光導波路にお
いて、該ポリイミドが、下記の構造式 I : ▲数式、化学式、表等があります▼・・・〔 I 〕 で表されるジアミン若しくはそれを含むジアミンからの
ポリイミド、又はその混合物であることを特徴とするポ
リイミド系光導波路。[Claims] 1. In a polyimide optical waveguide whose constituent elements are polyimide obtained from tetracarboxylic dianhydride and diamine, the polyimide has the following structural formula I: ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼... A polyimide-based optical waveguide characterized by being a polyimide made from a diamine represented by [I] or a diamine containing the same, or a mixture thereof.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11050090A JP2813713B2 (en) | 1990-04-27 | 1990-04-27 | Polyimide optical waveguide |
| CA002041133A CA2041133C (en) | 1990-04-27 | 1991-04-24 | Polymide optical waveguide |
| EP91401120A EP0454590B1 (en) | 1990-04-27 | 1991-04-26 | Polyimide optical waveguide |
| DE69120464T DE69120464T2 (en) | 1990-04-27 | 1991-04-26 | Opal polyimide waveguide |
| US07/692,249 US5108201A (en) | 1990-04-27 | 1991-04-26 | Polyimide optical waveguide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11050090A JP2813713B2 (en) | 1990-04-27 | 1990-04-27 | Polyimide optical waveguide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH049807A true JPH049807A (en) | 1992-01-14 |
| JP2813713B2 JP2813713B2 (en) | 1998-10-22 |
Family
ID=14537340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11050090A Expired - Lifetime JP2813713B2 (en) | 1990-04-27 | 1990-04-27 | Polyimide optical waveguide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2813713B2 (en) |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62273225A (en) * | 1986-05-21 | 1987-11-27 | Asahi Denka Kogyo Kk | Curable casting resin composition having impact resistance |
| US5497445A (en) * | 1993-09-27 | 1996-03-05 | Hitachi Cable, Inc. | Polymer core optical wave-guide and fabrication method thereof |
| EP0720030A1 (en) | 1994-12-28 | 1996-07-03 | Hoechst Aktiengesellschaft | Waveguide device and method for production thereof |
| US5572619A (en) * | 1993-03-18 | 1996-11-05 | Nippon Telegraph And Telephone Corporation | Polimide optical waveguide |
| US6160945A (en) * | 1997-09-12 | 2000-12-12 | Samsung Electronics Co., Ltd. | Optical waveguide device for loss absorption and fabrication method thereof |
| US6229949B1 (en) | 1997-02-19 | 2001-05-08 | Hitachi, Ltd. | Polymer optical waveguide, optical integrated circuit, optical module and optical communication apparatus |
| KR100330595B1 (en) * | 1999-04-19 | 2002-03-29 | 윤종용 | Optical waveguide |
| JP2002356615A (en) * | 2001-05-31 | 2002-12-13 | Nitto Denko Corp | Photosensitive polyimide precursor composition, its photosensitive polyimide and optical waveguide using the same |
| US6500603B1 (en) | 1999-11-11 | 2002-12-31 | Mitsui Chemicals, Inc. | Method for manufacturing polymer optical waveguide |
| US6618543B1 (en) | 1999-03-31 | 2003-09-09 | Sharp Kabushiki Kaisha | Optical devices made with vacuum-baked films |
| US6731856B1 (en) | 1998-11-27 | 2004-05-04 | Sharp Kabushiki Kaisha | Organic waveguide and manufacturing method thereof and optical part using the same |
| US6750320B2 (en) | 2001-02-20 | 2004-06-15 | Central Glass Company, Limited | Process for producing polyimide platy object |
| US6842576B2 (en) | 2003-05-19 | 2005-01-11 | Nitto Denko Corporation | Polymer lightguide |
| EP1847861A2 (en) | 2003-10-06 | 2007-10-24 | Mitsui Chemicals, Inc. | Optical waveguide having specular surface formed by laser beam machining |
| WO2008059577A1 (en) | 2006-11-16 | 2008-05-22 | Sumitomo Bakelite Company Limited | Light guide and light guide structure |
| US7738755B2 (en) | 2005-06-30 | 2010-06-15 | Mitsui Chemicals, Inc. | Optical waveguide film and photoelectric film |
| WO2015020002A1 (en) | 2013-08-07 | 2015-02-12 | 旭硝子株式会社 | Fluorine-containing aromatic compound, method for producing same, curable material, cured product thereof, and optical member |
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| US7844143B2 (en) | 2006-05-12 | 2010-11-30 | Mitsui Chemicals, Inc. | Electrical and optical hybrid film, and electronic apparatus receiving the same |
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1990
- 1990-04-27 JP JP11050090A patent/JP2813713B2/en not_active Expired - Lifetime
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62273225A (en) * | 1986-05-21 | 1987-11-27 | Asahi Denka Kogyo Kk | Curable casting resin composition having impact resistance |
| US5572619A (en) * | 1993-03-18 | 1996-11-05 | Nippon Telegraph And Telephone Corporation | Polimide optical waveguide |
| US5497445A (en) * | 1993-09-27 | 1996-03-05 | Hitachi Cable, Inc. | Polymer core optical wave-guide and fabrication method thereof |
| EP0720030A1 (en) | 1994-12-28 | 1996-07-03 | Hoechst Aktiengesellschaft | Waveguide device and method for production thereof |
| US5694513A (en) * | 1994-12-28 | 1997-12-02 | Hoechst Aktiengesellschaft | Waveguide device and method for production thereof |
| US6229949B1 (en) | 1997-02-19 | 2001-05-08 | Hitachi, Ltd. | Polymer optical waveguide, optical integrated circuit, optical module and optical communication apparatus |
| US6160945A (en) * | 1997-09-12 | 2000-12-12 | Samsung Electronics Co., Ltd. | Optical waveguide device for loss absorption and fabrication method thereof |
| US6731856B1 (en) | 1998-11-27 | 2004-05-04 | Sharp Kabushiki Kaisha | Organic waveguide and manufacturing method thereof and optical part using the same |
| US6618543B1 (en) | 1999-03-31 | 2003-09-09 | Sharp Kabushiki Kaisha | Optical devices made with vacuum-baked films |
| KR100330595B1 (en) * | 1999-04-19 | 2002-03-29 | 윤종용 | Optical waveguide |
| US6500603B1 (en) | 1999-11-11 | 2002-12-31 | Mitsui Chemicals, Inc. | Method for manufacturing polymer optical waveguide |
| US6750320B2 (en) | 2001-02-20 | 2004-06-15 | Central Glass Company, Limited | Process for producing polyimide platy object |
| JP2002356615A (en) * | 2001-05-31 | 2002-12-13 | Nitto Denko Corp | Photosensitive polyimide precursor composition, its photosensitive polyimide and optical waveguide using the same |
| US6842576B2 (en) | 2003-05-19 | 2005-01-11 | Nitto Denko Corporation | Polymer lightguide |
| US7324723B2 (en) | 2003-10-06 | 2008-01-29 | Mitsui Chemicals, Inc. | Optical waveguide having specular surface formed by laser beam machining |
| EP1847861A2 (en) | 2003-10-06 | 2007-10-24 | Mitsui Chemicals, Inc. | Optical waveguide having specular surface formed by laser beam machining |
| US7738755B2 (en) | 2005-06-30 | 2010-06-15 | Mitsui Chemicals, Inc. | Optical waveguide film and photoelectric film |
| WO2008059577A1 (en) | 2006-11-16 | 2008-05-22 | Sumitomo Bakelite Company Limited | Light guide and light guide structure |
| US8200058B2 (en) | 2006-11-16 | 2012-06-12 | Sumitomo Bakelite Company, Ltd. | Light guide and light guide structure |
| WO2015020002A1 (en) | 2013-08-07 | 2015-02-12 | 旭硝子株式会社 | Fluorine-containing aromatic compound, method for producing same, curable material, cured product thereof, and optical member |
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