JP2003313294A - Optical part using fluorinated polyimide - Google Patents
Optical part using fluorinated polyimideInfo
- Publication number
- JP2003313294A JP2003313294A JP2002125791A JP2002125791A JP2003313294A JP 2003313294 A JP2003313294 A JP 2003313294A JP 2002125791 A JP2002125791 A JP 2002125791A JP 2002125791 A JP2002125791 A JP 2002125791A JP 2003313294 A JP2003313294 A JP 2003313294A
- Authority
- JP
- Japan
- Prior art keywords
- optical
- fluorinated polyimide
- polyimide
- band
- optical waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 77
- 229920001721 polyimide Polymers 0.000 title claims abstract description 44
- 239000004642 Polyimide Substances 0.000 title claims abstract description 35
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 6
- -1 alicyclic diamine Chemical class 0.000 claims abstract description 6
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims abstract description 6
- 239000011737 fluorine Substances 0.000 claims abstract description 6
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 4
- 239000000178 monomer Substances 0.000 claims abstract description 3
- 239000010410 layer Substances 0.000 claims description 24
- 239000012792 core layer Substances 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 125000002723 alicyclic group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 125000005842 heteroatom Chemical group 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 19
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract description 9
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 239000010453 quartz Substances 0.000 abstract description 3
- 238000005476 soldering Methods 0.000 abstract description 3
- 238000002834 transmittance Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 16
- 150000004985 diamines Chemical class 0.000 description 13
- 230000005540 biological transmission Effects 0.000 description 11
- 229920005575 poly(amic acid) Polymers 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 230000009477 glass transition Effects 0.000 description 8
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 5
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 239000004952 Polyamide Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 229920002647 polyamide Polymers 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 4
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000008033 biological extinction Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- CURBACXRQKTCKZ-UHFFFAOYSA-N cyclobutane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)C(C(O)=O)C1C(O)=O CURBACXRQKTCKZ-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- APXJLYIVOFARRM-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C(O)=O)C(C(O)=O)=C1 APXJLYIVOFARRM-UHFFFAOYSA-N 0.000 description 1
- FLDONXPDUZAKQB-UHFFFAOYSA-N 4-[2-(4-aminocyclohexyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1C(C(F)(F)F)(C(F)(F)F)C1CCC(N)CC1 FLDONXPDUZAKQB-UHFFFAOYSA-N 0.000 description 1
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 description 1
- AAYXZWDPJVOEEL-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)cyclohexyl]-3-(trifluoromethyl)cyclohexan-1-amine Chemical group FC(F)(F)C1CC(N)CCC1C1C(C(F)(F)F)CC(N)CC1 AAYXZWDPJVOEEL-UHFFFAOYSA-N 0.000 description 1
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical group FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 1
- ZPAKUZKMGJJMAA-UHFFFAOYSA-N Cyclohexane-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)CC1C(O)=O ZPAKUZKMGJJMAA-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- YFEDDHSVJBNABY-UHFFFAOYSA-N [N].[O].[F] Chemical compound [N].[O].[F] YFEDDHSVJBNABY-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Optical Integrated Circuits (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、屈折率が石英ガラ
スの屈折率にほぼ等しい、耐熱性のあるフッ素化ポリイ
ミドを用いた、波長0.85μm帯での光透過性が高い
光部品に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical component using a heat-resistant fluorinated polyimide having a refractive index substantially equal to that of quartz glass and having a high light transmittance in a wavelength band of 0.85 μm. Is.
【0002】[0002]
【従来の技術】情報通信システムの基盤技術として光通
信技術が浸透していくにつれて光導波路は、光ネットワ
ーク用キーデバイスとして益々その重要性が高まると同
時に、電子回路配線基板等の分野への応用に向けて開発
が進められている。2. Description of the Related Art As optical communication technology permeates as a basic technology of information communication systems, optical waveguides become more and more important as key devices for optical networks, and at the same time, applied to fields such as electronic circuit wiring boards. Is being developed for.
【0003】中でも、近年、ネットワークでのデータ量
の増大にともない、ネットワークに接続する伝送装置内
および大型電算機内での光信号処理化が必須となってお
り、光インタコネクションにおいては0.85μm帯の
面発光レーザー(VCSEL)を用いたシステムの開発
並びにこのシステムへの光導波路の適用が活発に検討さ
れている。これに対し、光導波路としては加工の容易
性、低価格化、量産化などが要望されており、樹脂製光
導波路がその有力な候補として開発されている。In particular, in recent years, along with the increase in the amount of data in the network, optical signal processing in the transmission device connected to the network and in the large computer has become essential, and the 0.85 μm band in the optical interconnection. The development of a system using the surface emitting laser (VCSEL) and the application of an optical waveguide to this system have been actively studied. On the other hand, as an optical waveguide, easiness of processing, cost reduction, mass production, and the like are demanded, and a resin optical waveguide has been developed as a promising candidate.
【0004】光導波路用の樹脂材料としては、ポリメタ
クリルレート、ポリカーボネイト、フッ素化エポキシ、
重水素化ポリシロキサン、含ベンゼン環フッ素化ポリイ
ミド等が挙げられる。上記の光インタコネクションへ適
用する樹脂材料および光導波路には、0.85μm帯で
の光透過性、PD(フォトダイオード)、ICなどのデ
バイスの接続で行うハンダ処理(金/スズ系ハンダでは
280℃)に対する耐熱性、さらには低コスト性が要求
され、これら要求特性を満足することが実用化には不可
欠である。Resin materials for optical waveguides include polymethacrylate, polycarbonate, fluorinated epoxy,
Examples thereof include deuterated polysiloxane and benzene ring-containing fluorinated polyimide. For the resin material and the optical waveguide applied to the above optical interconnection, the light transmittance in the 0.85 μm band, and the soldering process for connecting devices such as PD (photodiode) and IC (280 for gold / tin solder) Heat resistance to (.degree. C.) and further low cost are required, and it is essential for practical application to satisfy these required characteristics.
【0005】しかしながら、上記に示した従来の光導波
路用の樹脂材料の中にはこれら要求特性をすべて満足す
るものは未だなかった。ポリメタクリルレート、ポリカ
ーボネイトは波長0.85μm帯での光透過性は良好で
あるが、ガラス転移温度が100℃以下と耐熱性が低
い。また、重水素化ポリシロキサン、含ベンゼン環フッ
素化ポリイミドはガラス転移温度が300℃以上であり
耐熱性が高く、波長1.3および1.5μm帯では光透
過性は高いが、波長0.85μm帯での光透過性が低
い。一方、フッ素化エポキシは波長0.85μm帯での
光透過性が良好であるが、ガラス転移温度が200℃か
ら250℃であり、信頼性の観点から耐熱性は不十分で
あり、また原材料系のコストが高く、デバイスの実用化
が難しい。そこで、波長0.85μmでの光透過性が高
く、耐熱性があり、さらに低コストな光導波路用樹脂材
料およびこれを用いた光部品の開発が待たれていた。However, none of the above-mentioned conventional resin materials for an optical waveguide satisfy all of these required characteristics. Polymethacrylate and polycarbonate have good light transmittance in the wavelength band of 0.85 μm, but have a low glass transition temperature of 100 ° C. or less and low heat resistance. Further, deuterated polysiloxane and benzene ring-containing fluorinated polyimide have a glass transition temperature of 300 ° C. or higher and high heat resistance, and have high light transmittance in the wavelength band of 1.3 and 1.5 μm, but have a wavelength of 0.85 μm. Light transmittance in the band is low. On the other hand, fluorinated epoxy has good light transmittance in the wavelength band of 0.85 μm, but has a glass transition temperature of 200 ° C. to 250 ° C., and has insufficient heat resistance from the viewpoint of reliability. The cost is high and it is difficult to put the device to practical use. Therefore, the development of a resin material for an optical waveguide, which has high light transmittance at a wavelength of 0.85 μm, has heat resistance, and is low in cost, and an optical component using the same have been awaited.
【0006】また、光通信網では回線切り替え操作(ク
ロスコネクトシステム)が必須であり、キーデバイスと
して、屈折率の温度依存性を利用した熱光学(TO)ス
イッチが検討されている。TOスイッチにおいては高い
スイッチ特性(消光比・高スイッチ速度(数ミリ秒以
下))とともに、信頼性があり、動作電力が低いことが
実用化に向け不可欠である。スイッチ特性、信頼性の観
点からは石英系光導波路を用いることが好ましいが、石
英系では屈折率の温度変化(TO定数)が小さく動作電
力が大きいという課題がある。Further, a line switching operation (cross-connect system) is indispensable in an optical communication network, and a thermo-optical (TO) switch utilizing the temperature dependence of the refractive index is being studied as a key device. In a TO switch, high switching characteristics (extinction ratio, high switching speed (several milliseconds or less)), reliability, and low operating power are essential for practical use. From the viewpoint of switch characteristics and reliability, it is preferable to use a silica-based optical waveguide, but the silica-based optical waveguide has a problem that the temperature change of the refractive index (TO constant) is small and the operating power is large.
【0007】一方、樹脂系光導波路ではTO定数が石英
系に比べ一桁大きく低動作電力化が図れるものの、スイ
ッチ特性、信頼性では石英系に比べ劣るという課題があ
った。これに対し、光導波路の下部クラッド層およびコ
ア層を石英系、上部クラッド層を樹脂系で作製すること
により高いスイッチ特性、信頼性とともに、低動作電力
化を図る試みがなされているが、樹脂材料には高耐熱性
であるものが少なく、また一般的な樹脂材料は屈折率が
石英ガラスの屈折率よりも高く、石英系コアにたいする
上部クラッド層としては不適切であった。そこで、石英
ガラスとの屈折率整合性があり、耐熱性のある光導波路
用樹脂材料およびこれを用いたTOスイッチの開発が待
たれていた。On the other hand, although the resin-based optical waveguide has a TO constant one order of magnitude larger than that of the silica-based optical waveguide and can achieve low operating power, there is a problem that the switch characteristics and reliability are inferior to those of the silica-based optical waveguide. On the other hand, by making the lower clad layer and core layer of the optical waveguide with a quartz system and the upper clad layer with a resin system, it has been attempted to achieve high switching characteristics and reliability as well as low operating power. There are few materials that have high heat resistance, and general resin materials have a higher refractive index than that of silica glass, which is unsuitable as an upper clad layer for a silica-based core. Therefore, the development of a heat-resistant resin material for optical waveguides, which has a refractive index matching property with quartz glass, and a TO switch using the same has been awaited.
【0008】[0008]
【発明が解決しようとする課題】本発明は、光導波路用
樹脂材料における上述の問題点を解消し、耐熱性、波長
0.85μm帯での光透過性、石英ガラスとの屈折率整
合性、低コスト性を兼ね備えた光学材料を用いた光部品
を提供することを課題とする。DISCLOSURE OF THE INVENTION The present invention solves the above-mentioned problems in a resin material for an optical waveguide, heat resistance, light transmission in a wavelength band of 0.85 μm, refractive index matching with quartz glass, An object is to provide an optical component using an optical material having low cost.
【0009】[0009]
【課題を解決するための手段】本発明者らは、上記課題
を解決するため鋭意検討をすすめたところ、フッ素化ポ
リイミドであって、分子中に2つ以上のシクロヘキシル
環と、2つ以上のフルオロアルキル基を含有するジアミ
ンを、単量体の一部に使用したポリイミドが高耐熱性
と、波長0.85μm帯での光透過性を持ち、屈折率が
石英ガラスの屈折率にほぼ等しく、さらには低コストで
光導波路などの光部品を製造できることを見いだし、本
発明に到達したものである。[Means for Solving the Problems] The inventors of the present invention have made extensive studies to solve the above-mentioned problems. As a result, a fluorinated polyimide having two or more cyclohexyl rings and two or more cyclohexyl rings in the molecule. Polyimide using a diamine containing a fluoroalkyl group as a part of the monomer has high heat resistance and light transmittance in the wavelength 0.85 μm band, and its refractive index is almost equal to that of quartz glass. Furthermore, they have found that an optical component such as an optical waveguide can be manufactured at low cost, and have reached the present invention.
【0010】すなわち、光部品を構成する光導波路の下
部クラッド層、コア層、上部クラッド層の少なくともい
ずれかに、一般式(1)、(2)で表される繰り返し単
位のいずれかを含むフッ素化ポリイミドを用いるもので
ある。また、光部品が、熱光学スイッチであり、光導波
路の少なくとも上部クラッド層がフッ素化ポリイミドに
より構成されるものである。That is, fluorine containing at least one of the repeating units represented by the general formulas (1) and (2) in at least one of the lower clad layer, core layer and upper clad layer of the optical waveguide constituting the optical component. The polyimide is used. Further, the optical component is a thermo-optical switch, and at least the upper clad layer of the optical waveguide is made of fluorinated polyimide.
【0011】[0011]
【化2】 [Chemical 2]
【0012】(式中Rは直鎖、分岐、脂環、芳香環、ヘ
テロ環から選ばれた一種以上の4価の基であり、部分的
にフッ素酸素窒素を含有しても良い)(In the formula, R is one or more tetravalent groups selected from straight chain, branched chain, alicyclic ring, aromatic ring and hetero ring, and may partially contain fluorine oxygen nitrogen).
【0013】[0013]
【0014】[0014]
【発明の実施の形態】本発明者らは、ポリイミドに注目
し、種々の既存のポリイミドおよびポリイミド光学材料
について、耐熱性、波長0.85μm帯での光透過性お
よび屈折率について検討するとともに、その原因につい
て鋭意検討した。その結果、プラスチックの中で耐熱性
が高いと言われているポリイミドにおいても、構成成分
であるジアミン、および、あるいは酸無水物に非環状脂
肪族化合物を用いたポリイミド構造では十分な耐熱性は
得られないことがわかった。また、波長0.85μm帯
での光透過性の低下を引き起こす原因の第一はポリイミ
ドの構造としてC−H結合を有するベンゼン環構造を有
することであり、C−H結合を有するベンゼン環構造の
個数と光吸収にはほぼ相関があり、また、ポリイミドを
構成するジアミンおよび酸二無水物のいずれの構成成分
にもC−H結合を有するベンゼン環構造を有する場合に
はその光吸収が顕著であることが明らかになった。さら
に屈折率については、環状脂肪族構造の導入により低下
し、フッ素含有量により精密に制御できることがわかっ
た。BEST MODE FOR CARRYING OUT THE INVENTION The present inventors have paid attention to polyimide, and examined various existing polyimides and polyimide optical materials with respect to heat resistance, light transmittance in a wavelength band of 0.85 μm, and refractive index. The cause was thoroughly studied. As a result, even in polyimides that are said to have high heat resistance among plastics, sufficient heat resistance is obtained with a diamine, which is a component, and / or a polyimide structure using an acyclic aliphatic compound as an acid anhydride. I knew I couldn't. In addition, the first cause of the decrease in light transmittance in the wavelength 0.85 μm band is that it has a benzene ring structure having a C—H bond as a polyimide structure. There is almost a correlation between the number and the light absorption, and when both the diamine and the acid dianhydride constituting the polyimide have a benzene ring structure having a C—H bond, the light absorption is remarkable. It became clear. Further, it was found that the refractive index was lowered by the introduction of the cycloaliphatic structure and could be precisely controlled by the fluorine content.
【0015】本発明の光部品は光導波路に特定のフッ素
化ポリイミドを用いて製造したことに特徴がある。すな
わち、フッ素化ポリイミドの原料であるジアミン成分に
2つ以上のシクロヘキシル環と2つ以上のフルオロアル
キル基を含有するジアミンを用い、繰り返し単位内にC
−H結合を含有するベンゼン環数を低減することによっ
て、波長0.85μm帯での光透過性の低下原因である
C−H結合を含有するベンゼン環に基づく光吸収を小さ
くし、またフッ素原子を導入することにより光透過性を
向上させることができる。また脂環構造を主鎖に含有す
ることによって、ハンダ処理に対する十分な耐熱性を付
与することができる。 さらに、環状脂肪族構造の導入
により屈折率を低下させ、フッ素含有量により精密に屈
折率制御できる。The optical component of the present invention is characterized by being manufactured by using a specific fluorinated polyimide for the optical waveguide. That is, a diamine containing two or more cyclohexyl rings and two or more fluoroalkyl groups is used as a diamine component which is a raw material of a fluorinated polyimide, and C is contained in a repeating unit.
By reducing the number of benzene rings containing a -H bond, the light absorption based on the benzene ring containing a C-H bond, which is the cause of the decrease in light transmittance in the wavelength 0.85 µm band, is reduced, and the fluorine atom The light transmittance can be improved by introducing Further, by containing an alicyclic structure in the main chain, sufficient heat resistance against soldering can be imparted. Furthermore, the introduction of the cyclic aliphatic structure lowers the refractive index, and the refractive index can be precisely controlled by the fluorine content.
【0016】本発明の光部品製造に用いるフッ素化ポリ
イミドの原料であるジアミンとしては、例えば、2,2
−ビス(4−アミノシクロヘキシ)−ヘキサフルオロプ
ロパン(以下6FBACPと表す)、2,2’−ビス
(トリフルオロメチル)−4,4’−ジアミノビシクロ
ヘキシル(以下TFDBCHと表す)等が挙げられる。
これは対応する芳香族ジアミンの還元反応により合成す
ることが可能であり、ジアミンの原料コストおよび重合
して得られるポリイミドは低コストであるという利点が
ある。また、これらジアミンが含有されていれば、上記
以外の他のジアミンが含有されている共重合体であるポ
リイミドを用いても良い。本発明の光部品製造に用いる
フッ素化ポリイミドの特性を阻害しない範囲において併
用できる他のジアミンとしては、2,2’−ビス(トリ
フルオロメチル)−4,4’−ジアミノビフェニル(以
下TFDBと表す)、2,2−ビス(p−アミノフェニ
ル)ヘキサフルオロプロパン、2,2’−ジメチルベン
ジジン、3,3’−ジメチルベンジジン、4,4’−オ
キシジアニリン等が挙げられる。Examples of the diamine which is a raw material of the fluorinated polyimide used for manufacturing the optical component of the present invention include, for example, 2,2
-Bis (4-aminocyclohexyl) -hexafluoropropane (hereinafter referred to as 6FBACP), 2,2'-bis (trifluoromethyl) -4,4'-diaminobicyclohexyl (hereinafter referred to as TFDBCH) and the like. .
This can be synthesized by the reduction reaction of the corresponding aromatic diamine, and has the advantage that the raw material cost of the diamine and the polyimide obtained by polymerization are low cost. Further, as long as these diamines are contained, a polyimide which is a copolymer containing diamines other than the above may be used. Other diamines that can be used in combination within the range that does not impair the characteristics of the fluorinated polyimide used for producing the optical component of the present invention include 2,2′-bis (trifluoromethyl) -4,4′-diaminobiphenyl (hereinafter referred to as TFDB. ), 2,2-bis (p-aminophenyl) hexafluoropropane, 2,2′-dimethylbenzidine, 3,3′-dimethylbenzidine, 4,4′-oxydianiline and the like.
【0017】また、本発明の光部品製造に用いるフッ素
化ポリイミドの原料であるテトラカルボン酸およびその
誘導体成分としては特に制限はないが、具体的な例を挙
げるとすれば次のようなものがある。ここではテトラカ
ルボン酸としての例を挙げる。2,2−ビス(3,4−
ジカルボキシフェニル)ヘキサフルオロプロパン、1,
2,3,4−テトラカルボキシシクロブタン、1,2,
4,5−テトラカルボキシシクロヘキサン、3,3’,
4,4’−テトラカルボキシジフェニルエーテル、3,
3’,4,4’−ベンゾフェノンテトラカルボン酸、
3,3’,4,4’−テトラカルボキシジフェニルスル
ホン、ピロメリット酸などがあげられる。これらテトラ
カルボン酸およびその誘導体を単独で用いても良いし、
混合して用いても良い。なお、高い耐熱性と高い光透過
性を得るにはシクロブタン環あるいはシクロヘキサン環
構造を有するものを使用することが好ましい。The tetracarboxylic acid and its derivative components, which are the raw materials for the fluorinated polyimide used in the production of the optical component of the present invention, are not particularly limited, but specific examples are as follows. is there. Here, an example of tetracarboxylic acid will be given. 2,2-bis (3,4-
Dicarboxyphenyl) hexafluoropropane, 1,
2,3,4-tetracarboxycyclobutane, 1,2,
4,5-tetracarboxycyclohexane, 3,3 ',
4,4'-tetracarboxydiphenyl ether, 3,
3 ', 4,4'-benzophenone tetracarboxylic acid,
3,3 ', 4,4'-tetracarboxydiphenyl sulfone, pyromellitic acid and the like can be mentioned. These tetracarboxylic acids and their derivatives may be used alone,
You may mix and use it. In order to obtain high heat resistance and high light transmittance, it is preferable to use one having a cyclobutane ring or a cyclohexane ring structure.
【0018】フッ素化ポリイミドの製造は通常のポリイ
ミドの製造方法が適用できる。すなわち、ジアミンと酸
二無水物をN−メチル−2−ピロリドン、N,N−ジメ
チルアセトアミド、N,N−ジメチルホルムアミドなど
の極性溶媒中で重合させ、ポリアミド酸溶液を製造した
後加熱イミド化または化学的イミド化を行い、ポリイミ
ドとする。また、この際、ジシリル化ジアミンと酸二無
水物を反応させてポリアミド酸のシリルエステルを合成
する方法などを採用することもできる。本発明における
フッ素化ポリイミドの製造はジアミン成分とテトラカル
ボン酸成分の配合割合は各成分のモル数の合計が等しい
か、ほぼ等しくなるようにする。また、溶媒を用いない
真空蒸着重合法でもよい。For the production of the fluorinated polyimide, a usual method for producing a polyimide can be applied. That is, diamine and acid dianhydride are polymerized in a polar solvent such as N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide to prepare a polyamic acid solution, and then heat imidization or It is chemically imidized to obtain polyimide. At this time, a method of reacting a disilylated diamine and an acid dianhydride to synthesize a silyl ester of a polyamic acid can also be adopted. In the production of the fluorinated polyimide in the present invention, the mixing ratio of the diamine component and the tetracarboxylic acid component is such that the total number of moles of each component is equal or almost equal. Alternatively, a vacuum vapor deposition polymerization method without using a solvent may be used.
【0019】本発明の光部品製造に用いるフッ素化ポリ
イミドとしては、特に、以下の一般式(1)および
(2)で表される構造を繰り返し単位内に含有すること
が特徴であり、高い耐熱性と波長0.85μm帯での高
い光透過性、石英ガラスとの屈折率整合性を発現するの
に好適である。The fluorinated polyimide used for producing the optical component of the present invention is characterized by containing the structures represented by the following general formulas (1) and (2) in the repeating unit, and has a high heat resistance. It is suitable for exhibiting the properties, high light transmittance in the wavelength band of 0.85 μm, and refractive index matching with quartz glass.
【0020】[0020]
【化3】 [Chemical 3]
【0021】上述のポリアミド酸溶液あるいはポリイミ
ド溶液をシリコン、ポリイミド、石英、ガラスなどの光
学用基板上にスピン塗布法や印刷法により塗布し、加熱
装置により乾燥・硬化することでポリイミド膜を形成す
ることが可能である。これらの膜は必要に応じ、フォト
リソグラフィー、反応性イオンエッチングを用いた公知
の方法によりパターニングすることが可能であり、所定
の形に形成することにより光部品となる。The above-mentioned polyamic acid solution or polyimide solution is applied onto an optical substrate such as silicon, polyimide, quartz, or glass by a spin coating method or a printing method, and dried and cured by a heating device to form a polyimide film. It is possible. If necessary, these films can be patterned by a known method using photolithography and reactive ion etching, and by forming them into a predetermined shape, they become optical parts.
【0022】本発明でいう光部品の例としては、光導波
路、光スイッチング装置、光分岐器、光合波器、光フィ
ルター、光変調器、光分割器などが挙げられる。Examples of the optical component in the present invention include an optical waveguide, an optical switching device, an optical branching device, an optical multiplexer, an optical filter, an optical modulator and an optical splitter.
【0023】[0023]
【実施例】以下、実施例を用いて本発明をさらに詳しく
説明するが、本発明はこれらの実施例に限定されるもの
ではない。熱分解温度(重量が10%減少する温度)、
ガラス転移温度は窒素気流下10℃/分の昇温速度で測
定した。フィルムの屈折率および光透過損失はプリズム
カップリング式屈折率計(メトリコン社製2010型)
を用いて測定した。屈折率は22℃、波長0.83μ
m、TEモードで測定した。光透過損失はポリイミドフ
ィルムにカプラプリズムを通して波長0.83μmのレ
ーザ光を透過させ、このとき発生する散乱光の強度をフ
ィルム面に垂直な方向から測定し、透過経路に沿う散乱
光強度の変化から光透過損失を計算し求めた。また、リ
ッジ型直線光導波路の光伝搬損失はマルチモード、波長
0.85μmでカットバック法により求めた。EXAMPLES The present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples. Pyrolysis temperature (temperature at which weight is reduced by 10%),
The glass transition temperature was measured under a nitrogen stream at a temperature rising rate of 10 ° C./min. The refractive index and the light transmission loss of the film are the prism coupling type refractometer (2010 type manufactured by Metricon).
Was measured using. Refractive index 22 ° C, wavelength 0.83μ
m, measured in TE mode. The light transmission loss is measured by measuring the intensity of the scattered light generated at this time through a polyimide prism through a coupler prism with a wavelength of 0.83 μm, and measuring the intensity of the scattered light from the direction perpendicular to the film surface. The light transmission loss was calculated and determined. The optical propagation loss of the ridge-type linear optical waveguide was determined by the cutback method at multimode and wavelength of 0.85 μm.
【0024】〔実施例1〕三ツ口フラスコに6FBAC
P6.92g(0.02mol)と2,2−ビス(3,
4−ジカルボキシフェニル)ヘキサフルオロプロパン二
無水物(以下6FDAと表す)8.88g(0.02m
ol)及びN,N−ジメチルアセトアミド89、5gを
加えた。この混合物を窒素雰囲気下、室温で3日間攪拌
し、濃度約15wt%のポリアミド溶液(以下6FBA
CP/6FDAポリアミド酸溶液と表す)を得た。この
溶液をシリコンウェハにキャストし、オーブン中で70
℃1時間、160℃1時間、250℃1時間、350℃
1時間で加熱イミド化を行い、ポリイミドフィルムを得
た。このポリイミドフィルムの熱分解温度は510℃、
ガラス転移温度は290℃、屈折率は1.495、光透
過損失は0.4dB/cmであった。耐熱性があり、
0.85μm帯で光透過性の高い光学材料として好適な
ものが得られた。Example 1 6FBAC was added to a three-necked flask.
P6.92 g (0.02 mol) and 2,2-bis (3,3
4-Dicarboxyphenyl) hexafluoropropane dianhydride (hereinafter referred to as 6FDA) 8.88 g (0.02 m
ol) and N, N-dimethylacetamide 89, 5 g were added. This mixture was stirred at room temperature under a nitrogen atmosphere for 3 days to obtain a polyamide solution having a concentration of about 15 wt% (hereinafter 6FBA).
CP / 6 FDA polyamic acid solution) was obtained. This solution is cast on a silicon wafer and 70 in an oven
℃ 1 hour, 160 ℃ 1 hour, 250 ℃ 1 hour, 350 ℃
Heat imidization was performed for 1 hour to obtain a polyimide film. The thermal decomposition temperature of this polyimide film is 510 ° C,
The glass transition temperature was 290 ° C., the refractive index was 1.495, and the light transmission loss was 0.4 dB / cm. It has heat resistance,
A suitable optical material having a high light transmittance in the 0.85 μm band was obtained.
【0025】〔実施例2〕三ツ口フラスコに6FBAC
P6.92g(0.02mol)と1,2,3,4−テ
トラカルボキシシクロブタン二無水物3.92g(0.
02mol)及びN,N−ジメチルアセトアミド61、
4gを加えた。この混合物を窒素雰囲気下、室温で3日
間攪拌し、濃度約15wt%のポリアミド溶液(以下6
FBACP/CBポリアミド酸溶液と表す)を得た。こ
の溶液をシリコンウェハにキャストし、オーブン中で7
0℃1時間、160℃1時間、250℃1時間、350
℃1時間で加熱イミド化を行い、ポリイミドフィルムを
得た。このポリイミドフィルムの熱分解温度は480
℃、ガラス転移温度は300℃、屈折率は1.481、
光透過損失は0.3dB/cmであった。耐熱性があ
り、0.85μm帯で光透過性の高い光学材料として好
適なものが得られた。[Example 2] 6FBAC was added to a three-necked flask.
P 6.92 g (0.02 mol) and 1,2,3,4-tetracarboxycyclobutane dianhydride 3.92 g (0.
02 mol) and N, N-dimethylacetamide 61,
4 g was added. This mixture was stirred at room temperature for 3 days under a nitrogen atmosphere, and a polyamide solution having a concentration of about 15 wt% (hereinafter referred to as 6
FBACP / CB polyamic acid solution) was obtained. This solution is cast on a silicon wafer and placed in an oven.
0 ° C 1 hour, 160 ° C 1 hour, 250 ° C 1 hour, 350
The polyimide film was obtained by heating and imidizing at 1 ° C. for 1 hour. The thermal decomposition temperature of this polyimide film is 480.
℃, glass transition temperature 300 ℃, refractive index 1.481,
The light transmission loss was 0.3 dB / cm. A suitable optical material having heat resistance and high light transmittance in the 0.85 μm band was obtained.
【0026】〔実施例3〕三ツ口フラスコにTFDBC
H6.64g(0.02mol)と6FDA8.88g
(0.02mol)及びN,N−ジメチルアセトアミド
87、9gを加えた。この混合物を窒素雰囲気下、室温
で3日間攪拌し、濃度約15wt%のポリアミド溶液
(以下TFDBCH/6FDAポリアミド酸溶液と表
す)を得た。この溶液をシリコンウェハにキャストし、
オーブン中で70℃1時間、160℃1時間、250℃
1時間、350℃1時間で加熱イミド化を行い、ポリイ
ミドフィルムを得た。このポリイミドフィルムの熱分解
温度は520℃、ガラス転移温度は295℃、屈折率は
1.502、光透過損失は0.4dB/cmであった。
耐熱性があり、0.85μm帯で光透過性の高い光学材
料として好適なものが得られた。Example 3 TFDBC was placed in a three-necked flask.
H 6.64 g (0.02 mol) and 6FDA 8.88 g
(0.02 mol) and N, N-dimethylacetamide 87, 9 g were added. This mixture was stirred under a nitrogen atmosphere at room temperature for 3 days to obtain a polyamide solution having a concentration of about 15 wt% (hereinafter referred to as TFDBCH / 6FDA polyamic acid solution). Cast this solution on a silicon wafer,
70 ° C for 1 hour, 160 ° C for 1 hour, 250 ° C in the oven
Heat imidization was performed for 1 hour at 350 ° C. for 1 hour to obtain a polyimide film. The polyimide film had a thermal decomposition temperature of 520 ° C., a glass transition temperature of 295 ° C., a refractive index of 1.502, and a light transmission loss of 0.4 dB / cm.
A suitable optical material having heat resistance and high light transmittance in the 0.85 μm band was obtained.
【0027】〔実施例4〕リッジ型直線光導波路を作製
した。4インチシリコンウェハに6FBACP/CBポ
リアミド酸溶液をキャストし、オーブン中で70℃1時
間、160℃1時間、250℃1時間、350℃1時間
で加熱イミド化を行い、下部クラッド層を40ミクロン
成膜した。この下部クラッド層上に、6FBACP/6
FDAポリアミド酸溶液を下部クラッド層と同様に塗
布、焼成してコア層を30ミクロン成膜した。コア−ク
ラッドの比屈折率差は1.0%とした。このコア層上に
マスク層としてシリコンをマグネトロンスパッタにより
1.2ミクロンに成膜した。このマスク層上にはさらに
レジスト層を成膜し、アライナを用いて光導波路パター
ンを露光し、パターニングしたレジスト層を形成した。
次にレジスト層に保護されていないマスク層のシリコン
をRIE装置を用いて、CF4ガスを流入させながらエ
ッチングした。引き続いてO2ガスを流入させてマスク
層のシリコンに保護されていないコア層部分をエッチン
グにより除去し、長さ70mm、幅30ミクロン、高さ
30ミクロンの直線コアパターンを形成した。次に、基
板を希フッ酸に浸漬し、マスク層を除去した。さらに下
部クラッドと同様、6FBACP/CBポリアミド酸溶
液を用いて上部クラッド層を40ミクロン形成した。作
製した直線導波路に0.85μmの光を通してカットバ
ック法にて光伝搬損失を測定したところ、0.4dB/
cmであり、0.85μm帯用光導波路として低損失で
耐熱性のある好適な光導波路が得られた。Example 4 A ridge type linear optical waveguide was manufactured. 6FBACP / CB polyamic acid solution was cast on a 4-inch silicon wafer, and heat imidization was performed in an oven at 70 ° C for 1 hour, 160 ° C for 1 hour, 250 ° C for 1 hour, and 350 ° C for 1 hour, and the lower clad layer was 40 microns. A film was formed. On this lower clad layer, 6FBACP / 6
An FDA polyamic acid solution was applied and baked in the same manner as the lower clad layer to form a core layer of 30 μm. The relative refractive index difference between the core and the clad was set to 1.0%. Silicon was formed as a mask layer on the core layer to a thickness of 1.2 μm by magnetron sputtering. A resist layer was further formed on this mask layer, and the optical waveguide pattern was exposed using an aligner to form a patterned resist layer.
Next, the silicon of the mask layer not protected by the resist layer was etched by using a RIE apparatus while flowing CF 4 gas. Subsequently, O 2 gas was introduced to remove the core layer portion of the mask layer which was not protected by silicon by etching to form a linear core pattern having a length of 70 mm, a width of 30 μm and a height of 30 μm. Next, the substrate was immersed in dilute hydrofluoric acid to remove the mask layer. Further, similarly to the lower clad, an upper clad layer having a thickness of 40 μm was formed using a 6FBACP / CB polyamic acid solution. When 0.85 μm light was passed through the fabricated straight waveguide and the optical propagation loss was measured by the cutback method, it was 0.4 dB /
Thus, a suitable optical waveguide having a low loss and heat resistance was obtained as an optical waveguide for the 0.85 μm band.
【0028】〔実施例5〕マッハツェンダー型熱光学光
スイッチを作製した。SiO2−GeO2系ガラスを用
い、シリコン基板上に下部クラッド層とコア層を火炎堆
積法によりガラス微粒子を堆積した。その後、1300
℃に加熱して溶融しガラス化した(屈折率約1.50、
比屈折率差0.75%)。フォトリソグラフィ技術と反
応性イオンエッチングを用い、マッハツェンダー干渉計
のパターンを形成した(導波路幅および高さは8μm、
分岐の直線部分は7mm)。上部クラッド材料にはTF
DBCH/6FDAポリアミド酸溶液を用い、オーブン
中で加熱イミド化を行い、上部クラッド層を形成した
(屈折率は下部クラッド層と同じ1.50とした)。マ
ッハツェンダー干渉計の上部クラッドに加熱用電極とす
るCr金属膜を真空蒸着により形成した。このCr金属
膜にフォトレジストをスピンコートした後、電極のマス
クパターンをフォトリソグラフィによってレジストに転
写させた。フォトレジストをマスクとしてCrのエッチ
ングを行い電極を作製した。作製した光導波路の光入射
端から波長850nmのTEモード光を導入し、マッハ
ツェンダー型熱光学光スイッチの特性評価を行った結
果、スイッチング時間は4ミリ秒、動作電力は10m
W、消光比40dB、挿入損失0.6dBであり、低電
力、高速光スイッチとして動作することがわかった。Example 5 A Mach-Zehnder type thermo-optical switch was manufactured. Using SiO2-GeO2-based glass, glass particles were deposited on the lower clad layer and the core layer on the silicon substrate by the flame deposition method. Then 1300
It was heated to ℃ and melted into glass (refractive index of about 1.50,
Relative refractive index difference 0.75%). A Mach-Zehnder interferometer pattern was formed using photolithography technology and reactive ion etching (waveguide width and height were 8 μm,
The straight part of the branch is 7 mm). TF for the upper clad material
Using a DBCH / 6FDA polyamic acid solution, heating imidization was performed in an oven to form an upper clad layer (refractive index was 1.50, which is the same as that of the lower clad layer). A Cr metal film serving as a heating electrode was formed on the upper cladding of the Mach-Zehnder interferometer by vacuum evaporation. After spin coating a photoresist on the Cr metal film, the mask pattern of the electrode was transferred to the resist by photolithography. Cr was etched using the photoresist as a mask to prepare an electrode. TE mode light with a wavelength of 850 nm was introduced from the light incident end of the manufactured optical waveguide, and the characteristics of the Mach-Zehnder type thermo-optical switch were evaluated. As a result, the switching time was 4 milliseconds and the operating power was 10 m.
It was found that W, extinction ratio was 40 dB, insertion loss was 0.6 dB, and that the device operates as a low power, high speed optical switch.
【0029】〔比較例1〕三ツ口フラスコにTFDB
6.40g(0.02mol)と6FDA8.88g
(0.02mol)及びN,N−ジメチルアセトアミド
86、6gを加えた。この混合物を窒素雰囲気下、室温
で3日間攪拌し、濃度約15wt%のポリアミド溶液
(以下TFDB/6FDAポリアミド酸溶液と表す)を
得た。この溶液をシリコンウェハにキャストし、オーブ
ン中で70℃1時間、160℃1時間、250℃1時
間、350℃1時間で加熱イミド化を行い、含ベンゼン
環ポリイミドフィルムを得た。このポリイミドフィルム
の熱分解温度は535℃、ガラス転移温度は330℃、
屈折率は1.531、光透過損失は1.0dB/cmで
あり、光透過損失が大きく、0.85μm帯用光学材料
として不適であった。[Comparative Example 1] TFDB was added to a three-necked flask.
6.40 g (0.02 mol) and 6FDA 8.88 g
(0.02 mol) and N, N-dimethylacetamide 86, 6 g were added. This mixture was stirred at room temperature for 3 days under a nitrogen atmosphere to obtain a polyamide solution having a concentration of about 15 wt% (hereinafter referred to as TFDB / 6FDA polyamic acid solution). This solution was cast on a silicon wafer and heated and imidized in an oven at 70 ° C. for 1 hour, 160 ° C. for 1 hour, 250 ° C. for 1 hour, and 350 ° C. for 1 hour to obtain a benzene ring-containing polyimide film. The thermal decomposition temperature of this polyimide film is 535 ° C, the glass transition temperature is 330 ° C,
Since the refractive index was 1.531 and the light transmission loss was 1.0 dB / cm, the light transmission loss was large and it was unsuitable as an optical material for the 0.85 μm band.
【0030】〔比較例2〕実施例5の上部クラッド材料
をSiO2−GeO2系ガラスに変更し、同様な方法に
よりマッハツェンダー型熱光学光スイッチ作製した。作
製したマッハツェンダー型熱光学光スイッチの特性評価
を行った結果、スイッチング時間は3ミリ秒、動作電力
は400mW、消光比35dB、挿入損失0.5dBで
あり、動作電力が大きく、光スイッチとしては不適であ
った。Comparative Example 2 A Mach-Zehnder type thermo-optical switch was manufactured by the same method as in Example 5, except that the upper clad material was changed to SiO2-GeO2-based glass. The characteristics of the fabricated Mach-Zehnder type thermo-optic optical switch were evaluated. As a result, the switching time was 3 milliseconds, the operating power was 400 mW, the extinction ratio was 35 dB, and the insertion loss was 0.5 dB. It was unsuitable.
【0031】[0031]
【発明の効果】本発明の方法によれば、耐熱性、波長
0.85μm帯での光透過性、低コスト性を兼ね備えた
光部品が製造できる。According to the method of the present invention, an optical component having heat resistance, light transmission in the wavelength band of 0.85 μm, and low cost can be manufactured.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 前田 一彦 東京都千代田区神田錦町3−7−1セント ラル硝子株式会社内 (72)発明者 坂口 茂樹 東京都千代田区神田錦町3−7−1セント ラル硝子株式会社内 Fターム(参考) 2H047 NA01 PA02 QA05 RA08 4J043 PA01 PB08 PB15 QB31 RA35 SA06 SA46 SA54 SB01 SB03 TA13 TA14 TA22 TA70 TA71 TA74 TB01 UA02 UA03 UA04 UB01 UB05 UB12 XA19 YA06 ZA51 ZA52 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Kazuhiko Maeda 3-7-1 cent Kandanishikicho, Chiyoda-ku, Tokyo Inside Ral Glass Co., Ltd. (72) Inventor Shigeki Sakaguchi 3-7-1 cent Kandanishikicho, Chiyoda-ku, Tokyo Inside Ral Glass Co., Ltd. F-term (reference) 2H047 NA01 PA02 QA05 RA08 4J043 PA01 PB08 PB15 QB31 RA35 SA06 SA46 SA54 SB01 SB03 TA13 TA14 TA22 TA70 TA71 TA74 TB01 UA02 UA03 UA04 UB01 UB05 UB12 XA19 YA06 ZA51 ZA52
Claims (4)
ル環と2つのフルオロアルキル基を含有する含フッ素脂
環式ジアミンを、少なくとも単量体の一部に使用したフ
ッ素化ポリイミドを用いることを特徴とする光部品。1. A fluorinated polyimide comprising a fluorine-containing alicyclic diamine containing at least two cyclohexyl rings and two fluoroalkyl groups in a molecule, which is used as at least a part of a monomer. Optical parts to do.
層、上部クラッド層の少なくともいずれかに、一般式
(1)、(2)で表される繰り返し単位のいずれかを含
むフッ素化ポリイミドを用いることを特徴とする光部
品。 【化1】 (式中Rは直鎖、分岐、脂環、芳香環、ヘテロ環から選
ばれた一種以上の4価の有機基であり、部分的にフッ
素、酸素、窒素を含有しても良い)2. A fluorinated polyimide containing any of the repeating units represented by the general formulas (1) and (2) in at least one of a lower clad layer, a core layer and an upper clad layer constituting an optical waveguide. Optical parts characterized by being used. [Chemical 1] (In the formula, R is one or more tetravalent organic groups selected from straight chain, branched chain, alicyclic ring, aromatic ring, and hetero ring, and may partially contain fluorine, oxygen, or nitrogen.)
を特徴とする請求項1、または2記載のいずれかに光部
品。3. The optical component according to claim 1, which is used in a wavelength band of 0.85 μm.
の少なくとも上部クラッド層が請求項1または、2のい
ずれかに記載の、フッ素化ポリイミドにより構成される
ことを特徴とする光部品。4. An optical component used as a thermo-optical switch, characterized in that at least an upper clad layer of an optical waveguide is composed of the fluorinated polyimide according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002125791A JP2003313294A (en) | 2002-04-26 | 2002-04-26 | Optical part using fluorinated polyimide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002125791A JP2003313294A (en) | 2002-04-26 | 2002-04-26 | Optical part using fluorinated polyimide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003313294A true JP2003313294A (en) | 2003-11-06 |
Family
ID=29540412
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|---|---|---|---|
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006257046A (en) * | 2005-03-18 | 2006-09-28 | Arakawa Chem Ind Co Ltd | New alicyclic diamine compound and method for producing alicyclic diamine compound |
| WO2006109812A1 (en) * | 2005-04-06 | 2006-10-19 | Nippon Shokubai Co., Ltd. | Processes for producing multilayer fluorinated polyimide film |
| JP2006289194A (en) * | 2005-04-06 | 2006-10-26 | Nippon Shokubai Co Ltd | Method of forming fluorinated polyimide multilayer film |
| JP2006290955A (en) * | 2005-04-07 | 2006-10-26 | Nippon Shokubai Co Ltd | Process for manufacturing fluorinated polyimide multilayer film |
| EP1832618A4 (en) * | 2004-12-28 | 2009-01-14 | Central Glass Co Ltd | Fluorinated diamine and polymer made from the same |
| WO2011033751A1 (en) * | 2009-09-18 | 2011-03-24 | 三井化学株式会社 | Transparent thermoplastic polyimide and transparent substrate containing the same |
-
2002
- 2002-04-26 JP JP2002125791A patent/JP2003313294A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1832618A4 (en) * | 2004-12-28 | 2009-01-14 | Central Glass Co Ltd | Fluorinated diamine and polymer made from the same |
| US7550553B2 (en) | 2004-12-28 | 2009-06-23 | Central Glass Company, Limited | Fluorinated diamine and polymer made from the same |
| JP2006257046A (en) * | 2005-03-18 | 2006-09-28 | Arakawa Chem Ind Co Ltd | New alicyclic diamine compound and method for producing alicyclic diamine compound |
| WO2006109812A1 (en) * | 2005-04-06 | 2006-10-19 | Nippon Shokubai Co., Ltd. | Processes for producing multilayer fluorinated polyimide film |
| JP2006289194A (en) * | 2005-04-06 | 2006-10-26 | Nippon Shokubai Co Ltd | Method of forming fluorinated polyimide multilayer film |
| JP2006290955A (en) * | 2005-04-07 | 2006-10-26 | Nippon Shokubai Co Ltd | Process for manufacturing fluorinated polyimide multilayer film |
| WO2011033751A1 (en) * | 2009-09-18 | 2011-03-24 | 三井化学株式会社 | Transparent thermoplastic polyimide and transparent substrate containing the same |
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