JP3740002B2 - Cleaning sheet and substrate processing apparatus cleaning method using the same - Google Patents
Cleaning sheet and substrate processing apparatus cleaning method using the same Download PDFInfo
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- JP3740002B2 JP3740002B2 JP2000230339A JP2000230339A JP3740002B2 JP 3740002 B2 JP3740002 B2 JP 3740002B2 JP 2000230339 A JP2000230339 A JP 2000230339A JP 2000230339 A JP2000230339 A JP 2000230339A JP 3740002 B2 JP3740002 B2 JP 3740002B2
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Description
【0001】
【発明の属する技術分野】
本発明は、各種の基板処理装置をクリーニングするシート、及びこれを用いた基板処理装置のクリーニング方法に関し、例えば、半導体、フラットパネルディスプレイ、プリント基板などの製造装置や検査装置など、異物を嫌う基板処理装置のクリーニングシート及びクリーニング方法に関する。
【0002】
【従来の技術】
各種基板処理装置は、各搬送系と基板とを物理的に接触させながら搬送する。その際、基板や搬送系に異物が付着していると、後続の基板を次々に汚染することになり、定期的に装置を停止させ、洗浄処理をする必要があった。このため、稼働率低下や多大な労力が必要になるという問題があった。これらの問題を解決するため、粘着性の物質を固着した基板を搬送することにより基板処理装置内の付着した異物をクリーニング除去する方法が提案されている(例えば特開平10−154686号)。
【0003】
【発明が解決しようとする課題】
粘着性の物質を固着した基板を搬送することにより基板処理装置内の付着した異物をクリーニング除去する方法は、前述の課題を克服する有効な方法である。しかしこの方法では粘着性物質と装置接触部とが強く接着しすぎて剥れない恐れがあり、基板を確実に搬送できなくなる恐れがあった。
本発明は、このような事情に照らし、基板処理装置内に基板を確実に搬送できると共に、装置内に付着している異物を簡便に低減できるクリーニングシートを提供することを目的としている。
【0004】
【課題を解決するための手段】
本発明者らは、上記の目的を達成するために、鋭意検討した結果、クリーニングシートあるいはクリーニングシートを設けた基板等の搬送部材を搬送することにより、基板処理装置内の付着した異物をクリーニング除去するにあたり、該クリーニング層の表面自由エネルギーと水の接触角を特定範囲に設定することにより、基板処理装置内を確実に搬送でき、さらに異物も簡便に低減できることを見出し、本発明を完成するに至つた。
【0005】
即ち、本発明は、搬送部材に設けられて基板処理装置内に搬送することで異物を除去するためのクリーニングシートであって、表面自由エネルギーが15〜25mJ/m2 、水の接触角が90度を超える物質からなるクリーニング層を有することを特徴とするクリーニングシート(請求項1)、搬送部材に設けられて基板処理装置内に搬送することで異物を除去するためのクリーニングシートであって、支持体の少なくとも片面に、表面自由エネルギーが15〜25mJ/m2 、水の接触角が90度を超えるクリーニング層が設けられてなるクリーニングシート(請求項2)、搬送部材に設けられて基板処理装置内に搬送することで異物を除去するためのクリーニングシートであって、支持体の片面に表面自由エネルギーが15〜25mJ/m2 、水の接触角が90度を超えるクリーニング層が設けられ、他面に通常の粘着剤層が設けられてなるクリーニングシート(請求項3)、クリーニング層が、実質的に粘着性を有さず、引張り強さが2000MPa以下であることを特徴とする請求項1〜3いずれか記載のクリーニングシート(請求項4)、クリーニング層が、活性エネルギーにより硬化されてなる粘着剤層であることを特徴とする請求項1〜4いずれか記載のクリーニングシート(請求項5)に係るものである。
また、本発明は、請求項3記載のクリーニングシートが、粘着剤層を介して搬送部材に設けられてなるクリーニング機能付き搬送部材(請求項6)に係るものである。さらに、本発明は、請求項1または2記載のクリーニングシート又は請求項6記載の搬送部材を、基板処理装置内に搬送することを特徴とする基板処理装置のクリーニング方法(請求項7)に係るものである。
【0006】
【発明の実施の形態】
本発明のクリーニングシートのクリーニング層は、その表面自由エネルギーが15〜25mJ/m2 であることが必要である。
本発明においてクリーニング層(固体)の表面自由エネルギーとは、クリーニング層表面に対して水およびヨウ化メチレンを用いてそれぞれ接触角を測定し、この測定値と接触角測定液体の表面自由エネルギー値(文献より既知)を、Young の式および拡張Fowkesの式から導かれる下記の式1に代入し、得られる二つの式を連立一次方程式として解くことにより、求められる固体の表面自由エネルギー値を意味するものである。
【0007】
<式1>
(1+cosθ)γL=2・■ルート(γs dγL d)+2・■ルート(γs pγL p)
ただし、式中の各記号は、それぞれ以下の通りである。
θ:接触角
γL:接触角測定液体の表面自由エネルギー
γL d:γLにおける分散力成分
γL p:γLにおける極性力成分
γs d:固体の表面自由エネルギーにおける分散力成分
γs p:固体の表面自由エネルギーにおける極性力成分
【0008】
また、クリーニング層表面の水の接触角は90度を超える、好ましくは100度以上となるようにするのが望ましい。 本発明においては、クリーニング層の表面自由エネルギーや水の接触角をこのような特定の範囲に設定することにより、クリーニングシートなどの搬送時にクリーニング層が被クリーニング部位と強く接着することがなく、確実に搬送できるという効果が得られる。
また、クリーニング層の引張り強さ(試験法JIS K7127に準ずる)が、2000MPa以下、好ましくは1MPaより大きいことが望ましく、かかる範囲内に設計することにより、クリーニング層が実質的に粘着性を有さず、搬送トラブルを発生することなく、異物を除去することができる。
【0009】
かかるクリーニング層は、その表面自由エネルギーおよび水の接触角が前記特定範囲内であればその材質などは特に限定されないが、紫外線や熱などの活性エネルギー源により硬化、架橋して、その分子構造が三次元網状化して粘着力が低下もしくは消失した粘着剤層が好ましい。かかる粘着剤層を用いると、搬送時にクリーニング層が被クリーニング部と強く接着することがなく、確実に搬送できる。またクリーニング層の厚さは特に限定されないが、通常5〜100μm程度である。
【0010】
かかるクリーニング層の具体例としては、例えば感圧接着性ポリマーに分子内に不飽和二重結合を1個以上有する化合物と重合開始剤を少なくとも含有させたものを、活性エネルギーにより重合硬化反応させて粘着性が実質的に消失されてなるものが挙げられる。 かかる感圧接着性ポリマーとしては、例えばアクリル酸、アクリル酸エステル、メタクリル酸、メタクリル酸エステルから選ばれる(メタ)アクリル酸及び/又は(メタ)アクリル酸エステルを主モノマーとしたアクリル系ポリマーが挙げられる。このアクリル系ポリマーの合成にあたり、共重合モノマーとして分子内に不飽和二重結合を2個以上有する化合物を用いるか、あるいは合成後のアクリル系ポリマーに分子内に不飽和二重結合を有する化合物を官能基間の反応で化学結合させるなどして、アクリル系ポリマーの分子内に不飽和二重結合を導入しておくことにより、このポリマー自体も活性エネルギーにより重合硬化反応に関与させるようにすることもできる。
【0011】
ここで、分子内に不飽和二重結合を1個以上有する化合物(以下、重合性不飽和化合物という)としては、不揮発性でかつ重量平均分子量が10000以下の低分子量体であるのがよく、特に硬化時の接着剤層の三次元網状化が効率よくなされるように、5000以下の分子量を有しているのが好ましい。
また、クリーニング層に添加される重合開始剤は、特に限定されず公知のものを使用でき、例えば活性エネルギー源に熱を用いる場合は、ベンゾイルパーオキサイド、アゾビスイソブチロニトリルなどの熱重合開始剤、また光を用いる場合は、ベンゾイル、ベンゾインエチルエーテル、シベンジル、イソプロピルベンゾインエーテル、ベンゾフェノン、ミヒラーズケトンクロロチオキサントン、ドデシルチオキサントン、ジメチルチオキサントン、アセトフェノンジエチルケタール、ベンジルジメチルケタール、α−ヒドルキシシクロヒキシルフェニルケトン、2−ヒドロキシジメチルフェニルプロパン、2,2−ジメトキシ−2−フェニルアセトフェノンなどの光重合開始剤が挙げられる。
【0012】
またかかるクリーニング層が支持体に設けられる場合(請求項2)の支持体としては特に限定されないが、例えばポリエチレン、ポリエチレンテレフタレート、アセチルセルロース、ポリカーボネート、ポリプロピレン、ポリアミド、ポリイミド、ポリカルボジイミドなどのプラスチックフィルムなどが挙げられる。 その厚みは通常10〜100μm程度である。
【0013】
本発明はさらに、支持体の片面にクリーニング層が設けられ、他面に通常の粘着剤層が設けられてなるクリーニングシート(請求項3)も提供する。 この通常の粘着剤層は、粘着機能を満たす限りその材質などは特に限定されず、通常の粘着剤(例えばアクリル系、ゴム系など)を用いることができる。
かかる構成とすることにより、クリーニングシートを通常の粘着剤層により各種基板や他のテープ・シートなどの搬送部材に貼り付けて、クリーニング機能付き搬送部材として装置内に搬送して、被洗浄部位に接触させてクリーニングすることができる。 また、上記の基板などの搬送部材を再利用するために、クリーニング後に基板をかかる粘着剤層から剥がす場合は、かかる通常の粘着剤層の粘着力は再剥離できる範囲であれば特に限定されないが、シリコンウエハ(ミラー面)に対する180°引き剥がし粘着力が0.20〜0.98N/10mm、特に0.40〜0.98N/10mm程度であれば、搬送中に剥離することなく、かつクリーニング後に容易に再剥離できるので好ましい。
【0014】
クリーニングシートが貼り付けられる搬送部材としては特に限定されないが、例えば半導体ウエハ、LCD、PDPなどのフラットパネルディスプレイ用基板、その他コンパクトディスク、MRヘッドなどの基板などが挙げられる。
【0015】
【実施例】
以下、本発明を実施例に基づいて説明するが、本発明はこれらに限定されるものではない。 なお、以下、部とあるのは重量部を意味するものとする。
実施例
アクリル酸−2−エチルヘキシル30部、アクリル酸メチル70部、及びアクリル酸10部からなるモノマ―混合液から得たアクリルポリマー(重量平均分子量280万)100部に対して、ジペンタエリストロールヘキサアクリレート(日本合成化学社製:商品名:UV 1700B)150部、ポリイソシアネート化合物(日本ポリウレタン工業製:商品名:コロネートL)3部、および光重合開始剤としてベンジルジメチルケタール(チバ・スペシャリティケミカルズ製:商品名:イルガキュアー651)10部を均一に混合して、紫外線硬化型粘着剤溶液Aを調整した。 このクリーニング層用粘着剤に中心波長365nmの紫外線を積算光量1000mJ/cm2照射して硬化させたところ、クリーニング層の表面は実質的に粘着性は有しておらず、クリーニング層の紫外線硬化後の引張り強さは1440MPaであった。 ここで引張り強さは、試験法JIS K7127に準じて測定した。
一方、アクリル酸−2−エチルヘキシル75部、アクリル酸メチル20部、及びアクリル酸5部からなるモノマ―混合液から得たアクリルポリマー(重量平均分子量70万)100部に対して、ポリエチレングリコ―ル200ジメタクリレ―ト(新中村化学製:商品名:NKエステル4G)50部、ウレタンアクリレ―ト(新中村化学製:商品名:U−N−01)50部、およびポリイソシアネート化合物(日本ポリウレタン工業製:商品名:コロネートL)3部を均一に混合して、感圧性粘着剤溶液Bを調整した。
この感圧性粘着剤溶液Bを、幅250mm、厚み25μmのポリエステル製支持体フィルムの片面に、乾燥後の厚みが10μmになるように塗布して通常の粘着剤層を設け、その表面に厚み38μmのポリエステル系剥離フィルムを貼った。 次に支持体フィルムのもう一方の側に、前記の紫外線硬化型粘着剤溶液Aを乾燥後の厚みが10μmになるように塗布してクリーニング層を設け、その表面に同様の剥離フィルムを貼った。
このシートに中心波長365nmの紫外線を積算光量1000mJ/cm2照射して、本発明のクリーニングシートを得た。 このクリーニングシートのクリーニング層側の剥離フィルムを剥がし、このクリーニング層の表面自由エネルギーを測定したところ、18.4mJ/m2、水の接触角は105.1度であった。
【0016】
このクリーニングシートの通常の粘着剤層側の剥離フィルムを剥がし、8inchのシリコンウエハの裏面(ミラー面)にハンドローラで貼り付け、クリーニング機能付き搬送用クリーニングウエハを作製した。
【0017】
一方、基板処理装置のウエハステージを取り外し、レーザー式異物測定装置で、0.3μm以上の異物を測定したところ、8inchウエハサイズのエリア内で21000個であった。
【0018】
ついで、このクリーニングウエハのクリーニング層側の剥離フィルムを剥がし、基板処理装置内に搬送させたところ、100枚連続搬送させても、クリーニング層が被クリーニング部位と強く接着することはまったく起こらず、問題なくクリーニング搬送できた。
また、その後にウエハステージを取り外し、レーザー式異物測定装置で0.3μm以上の異物を測定したところ、8inchウエハサイズのエリア内で20000個となっており、クリーニング前に付着していた異物数を低減することができた。
【0019】
比較例
クリーニング層用粘着剤として、アクリル酸−2−エチルヘキシル30部、アクリル酸メチル70部、及びアクリル酸10部からなるモノマ―混合液から得たアクリルポリマー(重量平均分子量280万)100部に対して、ポリエチレングリコ―ル200ジメタクリレ―ト(新中村化学製:商品名:NKエステル4G)100部、ポリエチレングリコ―ル600ジアクリレ―ト(新中村化学製:商品名:NKエステルA−600)100部、ポリイソシアネート化合物(日本ポリウレタン工業製:商品名:コロネートL)3部を均一に混合して調整した粘着剤溶液Cを用いた。 このクリーニング層の引張り強さを実施例と同様にして測定したところ、0.1MPaであった。
実施例と同様にしてクリーニングシートを作製し、このクリーニング層の表面自由エネルギーを測定したところ、57.3mJ/m2、水の接触角は49.4度であった。
【0020】
このクリーニングシートから実施例と同じ方法で作製した搬送用クリーニングウエハを、基板処理装置内に搬送させたところ、1枚目でウエハステージに固着し、搬送できなくなった。
【0021】
【発明の効果】
以上のように本発明のクリーニングシートによれば、基板処理装置内を確実に搬送できると共に、装置内に付着している異物を簡便に低減することができる。[0001]
BACKGROUND OF THE INVENTION
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sheet for cleaning various substrate processing apparatuses and a substrate processing apparatus cleaning method using the same, and, for example, a substrate that dislikes foreign matters, such as a manufacturing apparatus or an inspection apparatus such as a semiconductor, a flat panel display, and a printed board. The present invention relates to a cleaning sheet and a cleaning method for a processing apparatus.
[0002]
[Prior art]
Various substrate processing apparatuses transport each transport system and the substrate in physical contact with each other. At this time, if foreign substances adhere to the substrate or the transport system, subsequent substrates are contaminated one after another, and it is necessary to periodically stop the apparatus and perform a cleaning process. For this reason, there existed a problem that an operation rate fall and a lot of labor were needed. In order to solve these problems, there has been proposed a method of cleaning and removing adhered foreign substances in the substrate processing apparatus by transporting a substrate to which an adhesive substance is fixed (for example, Japanese Patent Laid-Open No. 10-154686).
[0003]
[Problems to be solved by the invention]
The method of cleaning and removing the adhered foreign matter in the substrate processing apparatus by transporting the substrate to which the adhesive substance is fixed is an effective method for overcoming the above-described problems. However, in this method, the adhesive substance and the apparatus contact portion are too strongly bonded and may not be peeled off, and there is a possibility that the substrate cannot be reliably conveyed.
In view of such circumstances, an object of the present invention is to provide a cleaning sheet that can reliably transport a substrate into a substrate processing apparatus and can easily reduce foreign substances adhering to the apparatus.
[0004]
[Means for Solving the Problems]
As a result of intensive investigations to achieve the above object, the present inventors have carried out a cleaning member or a conveying member such as a substrate provided with a cleaning sheet to remove and remove the adhered foreign matter in the substrate processing apparatus. In order to accomplish the present invention, the surface free energy of the cleaning layer and the contact angle of water are set to a specific range, whereby the substrate processing apparatus can be reliably transported and foreign matters can be easily reduced. I arrived.
[0005]
That is, the present invention is a cleaning sheet that is provided on a conveying member and removes foreign matters by being conveyed into a substrate processing apparatus, and has a surface free energy of 15 to 25 mJ / m 2 and a water contact angle of 90. A cleaning sheet comprising a cleaning layer made of a substance exceeding the degree (Claim 1), a cleaning sheet provided on a transport member for removing foreign matter by transporting it into a substrate processing apparatus, on at least one side of the support, the surface free energy 15~25mJ / m 2, the cleaning sheet (claim 2) the contact angle of water is in the cleaning layer is provided in excess of 90 degrees, provided the transport member substrate processing a cleaning sheet for removing foreign matter by conveying into the apparatus, the surface free energy on one surface of a support 15~25MJ / 2, the cleaning layer is provided a contact angle of water exceeds 90 degrees, a cleaning sheet (claim 3) comprising normal adhesive layer is provided on the other surface, the cleaning layer is substantially free of adhesive The tensile strength is 2000 MPa or less, the cleaning sheet according to any one of claims 1 to 3 (claim 4), and the cleaning layer is a pressure-sensitive adhesive layer cured by active energy. The cleaning sheet according to any one of claims 1 to 4 (claim 5).
The present invention also relates to a transport member with a cleaning function (claim 6), wherein the cleaning sheet according to claim 3 is provided on the transport member via an adhesive layer. Furthermore, the present invention relates to a substrate processing apparatus cleaning method (Claim 7), wherein the cleaning sheet according to Claim 1 or 2 or the transport member according to Claim 6 is transported into the substrate processing apparatus. Is.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
The cleaning layer of the cleaning sheet of the present invention needs to have a surface free energy of 15 to 25 mJ / m 2 .
In the present invention, the surface free energy of the cleaning layer (solid) means that the contact angle is measured with respect to the surface of the cleaning layer using water and methylene iodide, and the measured value and the surface free energy value of the contact angle measurement liquid ( Substituting (known from the literature) into Young's formula and extended Fowkes' formula 1 below, and solving the two formulas as simultaneous linear equations means the surface free energy value of the solid Is.
[0007]
<Formula 1>
(1 + cos θ) γ L = 2 · ■ route (γ s d γ L d ) + 2 · ■ route (γ s p γ L p )
However, each symbol in the formula is as follows.
theta: contact angle gamma L: the surface of the contact angle measurement liquid free energy γ L d: γ dispersion force component in L γ L p: polar force component gamma s d in gamma L: dispersion force component in the surface free energy of the solid gamma s p : Polar force component in the surface free energy of a solid
Further, it is desirable that the contact angle of water on the cleaning layer surface exceeds 90 degrees, preferably 100 degrees or more. In the present invention, by setting the surface free energy of the cleaning layer and the contact angle of water within such specific ranges, the cleaning layer does not strongly adhere to the portion to be cleaned during transport of the cleaning sheet, etc. The effect that it can be conveyed is obtained.
Further, the tensile strength of the cleaning layer (according to the test method JIS K7127) is desirably 2000 MPa or less, preferably greater than 1 MPa. By designing within this range, the cleaning layer is substantially tacky. Therefore, foreign matters can be removed without causing a conveyance trouble.
[0009]
The material of the cleaning layer is not particularly limited as long as the surface free energy and the contact angle of water are within the specific range , but the molecular structure of the cleaning layer is cured and crosslinked by an active energy source such as ultraviolet light or heat. A pressure-sensitive adhesive layer in which the adhesive strength is reduced or disappears by forming a three-dimensional network is preferred. When such an adhesive layer is used, the cleaning layer does not strongly adhere to the portion to be cleaned at the time of conveyance, and can be reliably conveyed. The thickness of the cleaning layer is not particularly limited, but is usually about 5 to 100 μm.
[0010]
As a specific example of such a cleaning layer, for example, a pressure-sensitive adhesive polymer containing at least a compound having at least one unsaturated double bond in the molecule and a polymerization initiator is polymerized and cured by active energy. Examples include those in which adhesiveness is substantially lost. Examples of the pressure-sensitive adhesive polymer include acrylic polymers having (meth) acrylic acid and / or (meth) acrylic acid ester selected from acrylic acid, acrylic acid ester, methacrylic acid, and methacrylic acid ester as main monomers. It is done. In synthesizing this acrylic polymer, a compound having two or more unsaturated double bonds in the molecule is used as a copolymerization monomer, or a compound having an unsaturated double bond in the molecule is used in the synthesized acrylic polymer. By introducing an unsaturated double bond into the molecule of the acrylic polymer, for example, by chemically bonding it with a reaction between functional groups, this polymer itself is also involved in the polymerization curing reaction by active energy. You can also.
[0011]
Here, the compound having one or more unsaturated double bonds in the molecule (hereinafter referred to as a polymerizable unsaturated compound) is preferably a low molecular weight substance that is nonvolatile and has a weight average molecular weight of 10,000 or less. In particular, it is preferable to have a molecular weight of 5000 or less so that the three-dimensional network of the adhesive layer at the time of curing can be made efficiently.
The polymerization initiator added to the cleaning layer is not particularly limited, and known ones can be used. For example, when heat is used as an active energy source, thermal polymerization initiation of benzoyl peroxide, azobisisobutyronitrile, etc. Benzoyl, benzoin ethyl ether, cibenzyl, isopropyl benzoin ether, benzophenone, Michler's ketone chlorothioxanthone, dodecyl thioxanthone, dimethylthioxanthone, acetophenone diethyl ketal, benzyl dimethyl ketal, α-hydroxycyclohexyl Examples include photopolymerization initiators such as silphenyl ketone, 2-hydroxydimethylphenylpropane, and 2,2-dimethoxy-2-phenylacetophenone.
[0012]
Further, when the cleaning layer is provided on the support (Claim 2), the support is not particularly limited. For example, a plastic film such as polyethylene, polyethylene terephthalate, acetylcellulose, polycarbonate, polypropylene, polyamide, polyimide, polycarbodiimide, or the like. Is mentioned. The thickness is usually about 10 to 100 μm.
[0013]
The present invention further provides a cleaning sheet (Claim 3) in which a cleaning layer is provided on one side of a support and a normal pressure-sensitive adhesive layer is provided on the other side. The material of the normal pressure-sensitive adhesive layer is not particularly limited as long as it satisfies the pressure-sensitive adhesive function, and a normal pressure-sensitive adhesive (for example, acrylic or rubber) can be used.
By adopting such a configuration, the cleaning sheet is attached to a transport member such as various substrates and other tapes and sheets by a normal adhesive layer, and transported into the apparatus as a transport member with a cleaning function, to be cleaned. It can be cleaned by contact. Further, when the substrate is peeled off from the pressure-sensitive adhesive layer after cleaning in order to reuse the conveying member such as the above-mentioned substrate, the adhesive force of the normal pressure-sensitive adhesive layer is not particularly limited as long as it can be re-peeled. If the 180 degree peeling adhesive strength to the silicon wafer (mirror surface) is 0.20 to 0.98 N / 10 mm, especially about 0.40 to 0.98 N / 10 mm, cleaning does not occur during transportation. This is preferable because it can be easily re-peeled later.
[0014]
The transport member to which the cleaning sheet is attached is not particularly limited, and examples thereof include semiconductor wafers, substrates for flat panel displays such as LCDs and PDPs, and other substrates such as compact disks and MR heads.
[0015]
【Example】
Hereinafter, although the present invention is explained based on an example, the present invention is not limited to these. Hereinafter, “parts” means parts by weight.
EXAMPLE Dipentaerythrol with respect to 100 parts of an acrylic polymer (weight average molecular weight of 2.8 million) obtained from a monomer mixture consisting of 30 parts of 2-ethylhexyl acrylate, 70 parts of methyl acrylate, and 10 parts of acrylic acid 150 parts of hexaacrylate (manufactured by Nippon Synthetic Chemical Co., Ltd .: trade name: UV 1700B), 3 parts of a polyisocyanate compound (manufactured by Nippon Polyurethane Industry: trade name: Coronate L), and benzyldimethyl ketal (Ciba Specialty Chemicals) as a photopolymerization initiator Product: Trade name: Irgacure 651) 10 parts were mixed uniformly to prepare an ultraviolet curable adhesive solution A. When this cleaning layer pressure-sensitive adhesive was cured by irradiating ultraviolet light having a central wavelength of 365 nm with an integrated light quantity of 1000 mJ / cm 2 , the surface of the cleaning layer had substantially no adhesiveness, and after the cleaning layer was cured by ultraviolet light. The tensile strength of was 1440 MPa. Here, the tensile strength was measured according to the test method JIS K7127.
On the other hand, for 100 parts of an acrylic polymer (weight average molecular weight 700,000) obtained from a monomer mixture consisting of 75 parts of 2-ethylhexyl acrylate, 20 parts of methyl acrylate, and 5 parts of acrylic acid, polyethylene glycol is used. 200 dimethacrylate (made by Shin-Nakamura Chemical: trade name: NK ester 4G), 50 parts of urethane acrylate (made by Shin-Nakamura Chemical: trade name: UN-01), and polyisocyanate compound (Nippon Polyurethane) Kogyo Co., Ltd .: Trade name: Coronate L) 3 parts was mixed uniformly to prepare a pressure-sensitive adhesive solution B.
The pressure-sensitive adhesive solution B was applied to one side of a polyester support film having a width of 250 mm and a thickness of 25 μm so that the thickness after drying was 10 μm, and a normal pressure-sensitive adhesive layer was provided, and the thickness was 38 μm on the surface. A polyester release film was affixed. Next, on the other side of the support film, the UV curable pressure-sensitive adhesive solution A was applied so that the thickness after drying was 10 μm, a cleaning layer was provided, and a similar release film was pasted on the surface. .
The cleaning sheet of the present invention was obtained by irradiating the sheet with ultraviolet light having a central wavelength of 365 nm and an integrated light quantity of 1000 mJ / cm 2 . When the release film on the cleaning layer side of this cleaning sheet was peeled off and the surface free energy of this cleaning layer was measured, it was 18.4 mJ / m 2 and the contact angle of water was 105.1 degrees.
[0016]
The release film on the normal pressure-sensitive adhesive layer side of the cleaning sheet was peeled off and attached to the back surface (mirror surface) of an 8-inch silicon wafer with a hand roller to prepare a transport cleaning wafer with a cleaning function.
[0017]
On the other hand, when the wafer stage of the substrate processing apparatus was removed and foreign matters having a size of 0.3 μm or more were measured with a laser type foreign matter measuring apparatus, the number was 21,000 in an area of 8 inch wafer size.
[0018]
Then, when the peeling film on the cleaning layer side of the cleaning wafer is peeled off and transported into the substrate processing apparatus, even if 100 sheets are transported continuously, the cleaning layer does not adhere strongly to the portion to be cleaned. It was possible to carry it without cleaning.
Also, after that, the wafer stage was removed, and a foreign substance measuring 0.3 μm or more was measured with a laser type foreign substance measuring device. As a result, the number of foreign substances adhered before cleaning became 20000 within an 8-inch wafer size area. It was possible to reduce.
[0019]
Comparative Example As an adhesive for the cleaning layer, 100 parts of an acrylic polymer (weight average molecular weight of 2.8 million) obtained from a monomer mixture composed of 30 parts of 2-ethylhexyl acrylate, 70 parts of methyl acrylate, and 10 parts of acrylic acid In contrast, 100 parts of polyethylene glycol 200 dimethacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd .: trade name: NK ester 4G), polyethylene glycol 600 diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd .: trade name: NK ester A-600) A pressure-sensitive adhesive solution C prepared by uniformly mixing 100 parts and 3 parts of a polyisocyanate compound (manufactured by Nippon Polyurethane Industry: trade name: Coronate L) was used. The tensile strength of the cleaning layer was measured in the same manner as in the example and found to be 0.1 MPa.
A cleaning sheet was prepared in the same manner as in the Example, and the surface free energy of this cleaning layer was measured. As a result, the contact angle of water was 59.4 mJ / m 2 and 49.4 degrees.
[0020]
When a transfer cleaning wafer produced from this cleaning sheet by the same method as in the example was transferred into the substrate processing apparatus, the first wafer adhered to the wafer stage and could not be transferred.
[0021]
【The invention's effect】
As described above, according to the cleaning sheet of the present invention, the inside of the substrate processing apparatus can be reliably conveyed, and foreign substances adhering to the inside of the apparatus can be easily reduced.
Claims (7)
Priority Applications (14)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000230339A JP3740002B2 (en) | 2000-07-31 | 2000-07-31 | Cleaning sheet and substrate processing apparatus cleaning method using the same |
| EP07004040.7A EP1782894A3 (en) | 2000-06-06 | 2001-05-08 | Process for preparing a conveying member with a cleaning function and cleaning sheet for use in the process |
| EP01926156A EP1286792B1 (en) | 2000-06-06 | 2001-05-08 | Cleaning member |
| KR1020027016584A KR100786437B1 (en) | 2000-06-06 | 2001-05-08 | Cleaning sheet, conveying member using same, and cleaning method of substrate processing apparatus using these |
| CNB018106811A CN100400185C (en) | 2000-06-06 | 2001-05-08 | Cleaning sheet, transport member using the cleaning sheet, and method of cleaning substrate processing apparatus using the cleaning sheet and the transport member |
| US10/297,173 US7713356B2 (en) | 2000-06-06 | 2001-05-08 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
| EP20100011696 EP2266717A2 (en) | 2000-06-06 | 2001-05-08 | Cleaning member |
| PCT/JP2001/003848 WO2001094036A1 (en) | 2000-06-06 | 2001-05-08 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
| DE2001629687 DE60129687T2 (en) | 2000-06-06 | 2001-05-08 | CLEANING ELEMENT |
| EP20100011695 EP2266716A2 (en) | 2000-06-06 | 2001-05-08 | Cleaning member |
| MYPI20012130A MY135752A (en) | 2000-06-06 | 2001-05-08 | Cleaning member |
| US11/014,779 US7793668B2 (en) | 2000-06-06 | 2004-12-20 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
| US11/229,586 US20060105164A1 (en) | 2000-06-06 | 2005-09-20 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
| US12/851,797 US20100319151A1 (en) | 2000-06-06 | 2010-08-06 | Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000230339A JP3740002B2 (en) | 2000-07-31 | 2000-07-31 | Cleaning sheet and substrate processing apparatus cleaning method using the same |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005242841A Division JP4163705B2 (en) | 2005-08-24 | 2005-08-24 | Conveying member with cleaning function and method for cleaning substrate processing apparatus using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002307029A JP2002307029A (en) | 2002-10-22 |
| JP3740002B2 true JP3740002B2 (en) | 2006-01-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000230339A Expired - Fee Related JP3740002B2 (en) | 2000-06-06 | 2000-07-31 | Cleaning sheet and substrate processing apparatus cleaning method using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3740002B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI709634B (en) * | 2015-09-01 | 2020-11-11 | 日商琳得科股份有限公司 | Adhesive sheet |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3394625B2 (en) * | 1995-01-30 | 2003-04-07 | 日東電工株式会社 | Adhesive tape for removing foreign matter adhering to semiconductor wafer |
| JPH10154686A (en) * | 1996-11-22 | 1998-06-09 | Toshiba Corp | Cleaning method for semiconductor substrate processing apparatus |
-
2000
- 2000-07-31 JP JP2000230339A patent/JP3740002B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI709634B (en) * | 2015-09-01 | 2020-11-11 | 日商琳得科股份有限公司 | Adhesive sheet |
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| Publication number | Publication date |
|---|---|
| JP2002307029A (en) | 2002-10-22 |
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