JP2021508378A - p偏光成分を有するヘッドアップディスプレイ(HUD)用投影設備 - Google Patents
p偏光成分を有するヘッドアップディスプレイ(HUD)用投影設備 Download PDFInfo
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- JP2021508378A JP2021508378A JP2020533205A JP2020533205A JP2021508378A JP 2021508378 A JP2021508378 A JP 2021508378A JP 2020533205 A JP2020533205 A JP 2020533205A JP 2020533205 A JP2020533205 A JP 2020533205A JP 2021508378 A JP2021508378 A JP 2021508378A
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- layer
- thickness
- pane
- polarized light
- electrically conductive
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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- G02B27/0101—Head-up displays characterised by optical features
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- B32B17/10165—Functional features of the laminated safety glass or glazing
- B32B17/10174—Coatings of a metallic or dielectric material on a constituent layer of glass or polymer
- B32B17/1022—Metallic coatings
- B32B17/10229—Metallic layers sandwiched by dielectric layers
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- B32B17/10431—Specific parts for the modulation of light incorporated into the laminated safety glass or glazing
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- C03C2217/00—Coatings on glass
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- G02B27/0101—Head-up displays characterised by optical features
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- G02B27/01—Head-up displays
- G02B27/0101—Head-up displays characterised by optical features
- G02B2027/013—Head-up displays characterised by optical features comprising a combiner of particular shape, e.g. curvature
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
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Abstract
Description
− ケイ素窒化物に基づいており20nm〜23nmの厚みを有する反射防止層、
− 亜鉛酸化物に基づいており8nm〜12nmの厚みを有する第1適合層、
− 銀に基づいており8nm〜11nmの厚みを有する電気伝導層、
− 随意の、NiCrに基づいており0.1nm〜0.5nmの厚みを有する、ブロッキング層、
− 亜鉛酸化物に基づいており8nm〜12nmの厚みを有する第2適合層、
− 28nm〜32nmの厚みを有する反射防止層、この反射防止層は、好ましくは、ケイ素窒化物に基づいており14nm〜17nmの厚みを有する誘電体層、及び、混合ケイ素/金属窒化物例えばケイ素−ジルコニウム窒化物又はケイ素−ハフニウム窒化物に基づいており14nm〜17nmの厚みを有する光学的高屈折層に、さらに分割されている、
− 混合スズ−亜鉛酸化物に基づいており5nm〜9nmの厚みを有する平滑層、
− 亜鉛酸化物に基づいており8nm〜12nmの厚みを有する第1適合層、
− 銀に基づいており11nm〜14nmの厚みを有する電気伝導層、
− 随意の、NiCrに基づいており0.1nm〜0.5nmの厚みを有するブロッキング層、
− 亜鉛酸化物に基づいており8nm〜12nmの厚みを有する第2適合層、
− 48nm〜52nmの厚みを有する反射防止層、この反射防止層は、好ましくは、ケイ素窒化物に基づいており33nm〜37nmの厚みを有する誘電体層、及び、混合ケイ素/金属窒化物例えばケイ素−ジルコニウム窒化物又はケイ素−ハフニウム窒化物に基づいており14nm〜17nmの厚みを有する光学的高屈折層に、さらに分割されている、
− 混合スズ−亜鉛酸化物に基づいており、5nm〜9nmの厚みを有する、平滑層、
− 亜鉛酸化物に基づいており8nm〜12nmの厚みを有する第1適合層、
− 銀に基づいており8nm〜11nmの厚みを有する電気伝導層、
− 随意の、NiCrに基づいており0.1nm〜0.5nmの厚みを有するブロッキング層、
− 亜鉛酸化物に基づいており8nm〜12nmの厚みを有する第2適合層、
− 18nm〜22nmの厚みを有する反射防止層、この反射防止層は、好ましくは、ケイ素窒化物に基づいており4nm〜7nmの厚みを有する誘電体層、及び、混合ケイ素/金属窒化物例えばケイ素−ジルコニウム窒化物又はケイ素−ハフニウム窒化物に基づいており14nm〜17nmの厚みを有する光学的高屈折層に、さらに分割されている、
− 混合スズ−亜鉛酸化物に基づいており5nm〜9nmの厚みを有する平滑層、
− 亜鉛酸化物に基づいており8nm〜12nmの厚みを有する第1適合層、
− 銀に基づいており4nm〜7nmの厚みを有する電気伝導層、
− 随意の、NiCrに基づいており0.1nm〜0.5nmの厚みを有するブロッキング層、
− 亜鉛酸化物に基づいており8nm〜12nmの厚みを有する第2適合層、
− 混合ケイ素/金属窒化物例えばケイ素−ジルコニウム窒化物又はケイ素−ハフニウム窒化物に基づいており11nm〜15nmの厚みを有する反射防止層。
− ケイ素窒化物、スズ−亜鉛酸化物、ケイ素−ジルコニウム窒化物、又はチタン酸化物、好ましくはケイ素窒化物、に基づいており、15nm〜25nm、好ましくは18nm〜22nmの厚みを有する、層(高屈折層)、
− 二酸化ケイ素に基づいており、15nm〜25nm、好ましくは18nm〜22nmの厚みを有する、層(低屈折層)、
− ケイ素窒化物、スズ−亜鉛酸化物、ケイ素−ジルコニウム窒化物、又はチタン酸化物、好ましくはケイ素窒化物、に基づいており、90nm〜110nm、好ましくは95nm〜105nmの厚みを有する、層(高屈折層)、
− 二酸化ケイ素に基づいており、80nm〜100nm、好ましくは85nm〜95nmの厚みを有する、層(低屈折層)。
(1) 外側ペイン
(2) 内側ペイン
(3)熱可塑性中間層
(4) 投影器
(5) 観察者/乗り物運転者
(20) 電気伝導性コーティング
(21) 電気伝導層
(21.1)、(21.2)、(21.3)、(21.4) 1.、2.、3.、4.電気伝導層
(22) 反射防止層
(22.1)、(22.2)、(22.3)、(22.4)、(22.5) 1.、2.、3.、4.、5.反射防止層
(22a)反射防止層4の誘電体層
(22a.2)、(22a.3)、(22a.4) 1.、2.、3.誘電体層
(22b)反射防止層4の光学的高屈折層
(22b.2)、(22b.3)、(22b.4) 1.、2.、3.光学的高屈折層
(23) 平滑層
(23.2)、(23.3)、(23.4) 1.、2.、3.平滑層
(24) 第1適合層
(24.1)、(24.2)、(24.3)、(24.4) 1.、2.、3.、4.第1適合層
(25) 第2適合層
(25.2)、(25.3)、(25.4)、(25.5) 1.、2.、3.、4.第2適合層
(26) ブロッキング層
(26.1)、(26.2)、(26.3)、(26.4) 1.、2.、3.、4.ブロッキング層
(30) 反射防止コーティング
(31) 反射防止コーティング30の高屈折層
(31.1)、(31.2) 1.、2.高屈折層
(32) 反射防止層30の低屈折層
(32.1)、(32.2) 1.、2.低屈折層
(O) 複合ペイン10の上方端部
(U) 複合ペイン10の下方端部
(B) 複合ペイン10のHUD領域
(E) アイボックス
(I) 中間層3から離れて面している、外側ペイン1の外部側表面
(II) 中間層3に面している、外側ペイン1の内部側表面
(III) 中間層3に面している、内側ペイン2の外部側表面
(IV) 中間層3から離れて面している、内側ペイン2の内部側表面
α くさび角度
Claims (15)
- 少なくとも下記を有する、ヘッドアップディスプレイ(HUD)用の投影設備:
− 熱可塑性中間層(3)を介して互いに結合している外側ペイン(1)及び内側ペイン(2)を含み、上方端部(O)及び下方端部(U)並びにHUD領域(B)を有している、複合ペイン(10);
− 前記外側ペイン(1)若しくは前記内側ペインの、前記中間層(3)に面している表面(II、III)の上の、又は、前記中間層(3)の中の、電気伝導性コーティング(20);
並びに
− 前記HUD領域(B)に向けられている、投影器(4);
ここで、前記投影器(4)の光が、少なくとも1つのp偏光成分を有しており、前記投影器(4)の合計の光におけるp偏光の割合が、20%〜80%であり、
かつ、
ここで、前記電気伝導性コーティング(20)が、400nm〜650nmのスペクトル範囲において、p偏光に関して、単一の局所的な反射極大のみを有しており、この極大が、510nm〜550nmの範囲に位置している。 - 400nm〜650nmのスペクトル範囲において、p偏光に関して、局所的な反射極大の反射率と、極小で起こる反射率との間の差異が、最大で10%、好ましくは最大で8%である、請求項1に記載の投影設備。
- 450nm〜600nmのスペクトル範囲におけるs偏光に関する反射率が、実質的に一定であり、それにより、極大で起こる反射率と平均との間の差異、及び、極小で起こる反射率と平均との間の差異が、最大で5%、好ましくは最大で3%、特に好ましくは最大で1%である、請求項1又は2に記載の投影設備。
- 前記投影器(4)の合計の光におけるp偏光の割合が、50%〜80%である、請求項1〜3のいずれか一項に記載の投影設備。
- 前記電気伝導性コーティング(20)が、少なくとも4つの電気伝導層(21)を有しており、これらが、それぞれ、2つの誘電体層又は誘電体層配列の間に配置されている、請求項1〜4のいずれか一項に記載の投影設備。
- 前記電気伝導層(21)が、銀に基づいており、かつ、それぞれ、5nm〜15nmの層厚を有しており、すべての前記電気伝導層(21)の合計の層厚が、20nm〜50nmである、請求項5に記載の投影設備。
- それぞれの誘電体層配列が、反射防止層(22)を有しており、下記である、請求項5又は6に記載の投影設備:
− 第1電気伝導層(21.1)の下方の反射防止層(22.1)が、15nm〜25nmの厚みを有し、
− 第1と第2電気伝導層(21.1、21.2)の間の反射防止層(22.2)が、25nm〜35nmの厚みを有し、
− 第2と第3電気伝導層(21.2、21.3)の間の反射防止層(22.3)が、45nm〜55nmの厚みを有し、
− 第3と第4電気伝導層(21.3、21.4)の間の反射防止層(22.4)が、15nm〜25nmの厚みを有し、かつ、
− 第4電気伝導層(21.4)の上方の反射防止層(22.5)が、8nm〜18nmの厚みを有する。 - 2つの前記電気伝導層(21)の間に配置されているすべての前記反射防止層(22.2、22.3、22.4)が、好ましくはケイ素窒化物に基づいている、2.1未満の屈折率を有する誘電体層(22a)、及び、好ましくは混合ケイ素/金属窒化物、例えばケイ素−ジルコニウム窒化物又はケイ素−ハフニウム窒化物に基づいている、2.1以上の屈折率を有する光学的高屈折層(22b)に、分割されている、請求項5〜7のいずれか一項に記載の投影設備。
- 前記中間層(3)の厚みが、少なくとも前記HUD領域(B)において、前記上方端部(O)と前記下方端部(U)との間のその垂直経路において、くさび角度(α)を有して、種々の値であり、前記くさび角度が、好ましくは、前記内側ペイン(2)の内部側表面(IV)における反射と前記外側ペイン(1)の外部側表面(I)における反射とを重ね合わせるために、又は、これらの間の距離を少なくとも低減するために、適切に選択されている、請求項1〜8のいずれか一項に記載の投影設備。
- 反射防止コーティング(30)が、前記内側ペイン(2)の、前記中間層(3)から離れて面している表面(IV)に適用されている、請求項1〜8のいずれか一項に記載の投影設備。
- 前記中間層(3)の厚みが、前記上方端部(O)と前記下方端部(U)との間の垂直経路において、実質的に一定である、請求項10に記載の投影設備。
- 前記中間層(3)の厚みが、少なくとも前記HUD領域(B)において、前記上方端部(O)と前記下方端部(U)との間のその垂直経路において、くさび角度(α)を有して、種々の値であり、前記くさび角度が、好ましくは、前記電気伝導性コーティング(20)における反射と前記外側ペイン(1)の外部側表面(I)における反射とを重ね合わせるために、又は、これらの間の距離を少なくとも低減するために、適切に選択されている、請求項10に記載の投影設備。
- 前記反射防止コーティング(30)が、前記内側ペイン(2)から出発して、下記の層を有する、請求項10〜12のいずれか一項に記載の投影設備:
− ケイ素窒化物に基づいており、15nm〜25nm、好ましくは18nm〜22nmの厚みを有する、高屈折層(31.1)、
− 二酸化ケイ素に基づいており、15nm〜25nm、好ましくは18nm〜22nmの厚みを有する、低屈折層(32.1)、
− ケイ素窒化物に基づいており、90nm〜110nm、好ましくは95nm〜105nmの厚みを有する、高屈折層(31.2)、
− 二酸化ケイ素に基づいており、80nm〜100nm、好ましくは85nm〜95nmの厚みを有する、低屈折層(32.2)。 - 前記投影器(4)の光が、60°〜70°の入射角度で、前記複合ペイン(10)に当たる、請求項1〜13のいずれか一項に記載の投影設備。
- 熱可塑性中間層(3)を介して互いに結合している外側ペイン(1)及び内側ペイン(2)を含み、
上方端部(O)及び下方端部(U)並びにHUD領域(B)を有しており、かつ、
前記外側ペイン(1)若しくは前記内側ペイン(2)の、前記中間層(3)に面している表面(II、III)上にある、又は、前記中間層(3)の中に提供されている、電気伝導性コーティング(20)を有している、
複合ペイン(10)の、ヘッドアップディスプレイ(HUD)用の投影設備の投影表面としての使用であって、
ここで、
投影器(4)が、前記HUD領域(B)に向けられており、その光が、少なくとも1つのp偏光成分を有しており、かつ、
前記電気伝導性コーティング(20)が、400nm〜650nmのスペクトル範囲において、p偏光に関して、単一の局所的な反射極大のみを有しており、この極大が、510nm〜550nmの範囲に位置している、
使用。
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Also Published As
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|---|---|
| RU2748645C1 (ru) | 2021-05-28 |
| EP3769143B1 (de) | 2023-06-07 |
| BR112020007393A2 (pt) | 2020-09-29 |
| PE20200980A1 (es) | 2020-10-01 |
| MX2020009808A (es) | 2020-10-14 |
| CN110520782A (zh) | 2019-11-29 |
| US20200400945A1 (en) | 2020-12-24 |
| KR20200121866A (ko) | 2020-10-26 |
| US11526009B2 (en) | 2022-12-13 |
| EP3769143A1 (de) | 2021-01-27 |
| CN110520782B (zh) | 2022-04-29 |
| JP7104788B2 (ja) | 2022-07-21 |
| MA52064A (fr) | 2021-01-27 |
| KR102464962B1 (ko) | 2022-11-08 |
| WO2019179683A1 (de) | 2019-09-26 |
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