JP2019009204A - Stage device, lithographic device, and article manufacturing method - Google Patents

Abstract

A stage apparatus advantageous in reducing foreign matters such as particles generated in the apparatus is provided. A stage apparatus includes a surface plate having a reference surface and a stage moving on the reference surface, and the stage is formed by forming an interval between the stage and the reference surface. The first hydrostatic bearing 112 to be supported and a drive mechanism 114 that moves the stage 110 in a direction perpendicular to the reference plane. The movable distance of the stage 110 by the drive mechanism 114 is such that the stage 110 and the reference plane can be moved. Longer than the interval between. [Selection] Figure 2

Description

The present invention relates to a stage apparatus, a lithographic apparatus, and an article manufacturing method.

  There is an imprint apparatus as one of lithography apparatuses for manufacturing articles such as semiconductor devices and liquid crystal display devices. The imprint apparatus forms a fine pattern by bringing a mold into contact with an imprint material on a substrate. In order to form a fine pattern, in an imprint apparatus, it is important to align the substrate and the mold with high accuracy. As an apparatus for aligning a substrate with high accuracy, there is a positioning device in which a guide means of a stage that holds the substrate is a non-contact hydrostatic bearing (Patent Document 1).

JP-A-8-229759

  In the positioning device of Patent Document 1, the stage is lifted and held with respect to the surface plate. If foreign matter such as particles enters between the stage and the surface plate, dust may be generated due to friction between the foreign material and the stage or the surface plate when the stage is moved relative to the surface plate. For example, the dust generation becomes a foreign substance such as a new particle and causes a pattern defect.

  An object of the present invention is to provide a stage device that is advantageous in that it reduces foreign matters such as particles generated in the device.

  In order to solve the above-described problems, the present invention provides a stage apparatus including a surface plate having a reference surface and a stage moving on the reference surface, wherein an interval is formed between the stage and the reference surface. The first hydrostatic bearing that supports the stage and a drive mechanism that moves the stage in a direction perpendicular to the reference plane, and the movable distance of the stage by the drive mechanism is longer than the interval. Features.

  According to the present invention, for example, it is possible to provide a stage apparatus that is advantageous in terms of reducing foreign matters such as particles generated in the apparatus.

1 is a schematic diagram showing a configuration of a lithography apparatus including a stage apparatus according to an embodiment. It is the figure which looked at the stage apparatus from the Z direction. It is AA sectional drawing of FIG. It is the figure which looked at the stage moved to + Z direction by the 1st drive mechanism from the Y direction. It is sectional drawing which cut | disconnected the stage apparatus of the state of FIG. 4 by AA of FIG. The state which moved the movable part by the 2nd drive mechanism is shown.

Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings. In addition, in each drawing, the same reference number is attached | subjected about the same member thru | or element, and the overlapping description is abbreviate | omitted.
Embodiment

  FIG. 1 is a schematic diagram illustrating a configuration of an imprint apparatus 1 including a stage apparatus 100 according to the embodiment. In this embodiment, an imprint apparatus is used as the lithography apparatus, but other lithography apparatuses such as an exposure apparatus can also be used. The imprint apparatus 1 performs an imprint process for forming a pattern of an imprint material on the substrate W using the mold M. In the imprint process, the imprint material supplied to the shot area on the substrate W and the mold M are cured, the imprint material is cured, and the mold M is peeled off from the cured imprint material. In this process, the pattern formed on M is transferred onto the substrate W.

(Lithography equipment)
In this embodiment, an imprint apparatus 1 to which an ultraviolet light curable imprint method for curing an uncured imprint material on the substrate W by irradiation with ultraviolet light is used as a lithography apparatus. However, as a method for curing the imprint material, a method using light irradiation in another wavelength region or a method using other energy (for example, heat) may be used. In the following drawings, the X axis and the Y axis are parallel to the optical axis of the ultraviolet light applied to the imprint material on the substrate W and are orthogonal to each other in a plane perpendicular to the Z axis. Is taking.

  The mold (mold) M includes, for example, a pattern portion P in which an outer peripheral portion is rectangular and a concavo-convex pattern to be transferred such as a circuit pattern is formed in a three-dimensional manner on a surface facing the substrate W. The material of the mold M is a material that can transmit ultraviolet light, and in this embodiment, quartz is used as an example.

  Further, the substrate W is, for example, a single crystal silicon substrate or an SOI (Silicon on Insulator) substrate, and an imprint formed by a pattern portion formed on the mold M, which is an ultraviolet light curable resin on the surface to be processed. The material is supplied.

  The imprint apparatus 1 includes a mold chuck 10, a mold stage 11, a mold driving unit 12, a height measurement sensor 13, a lens 14, an alignment detection system 15, a dispenser 16, an off-axis detection system 17, and a ceiling. A plate 18 and a control unit 19 are included.

  The mold chuck 10 is mounted on the mold stage 11 and holds the mold M. The mold stage 11 is connected to the mold driving unit 12. The mold driving unit 12 has a function of driving the mold stage 11 in the Z direction to bring the mold M held on the mold chuck 10 into contact with the imprint material on the substrate W or to separate it from the imprint material. The mold driving unit 12 also has a function of correcting the inclination of the mold M in accordance with the surface of the substrate W.

  Each of the mold chuck 10 and the mold stage 11 has an opening (not shown) through which ultraviolet light irradiated from the light source (not shown) through the lens 14 passes. For example, a collimator lens is used as the lens 14. A load cell for detecting a pressing force when the mold M is pressed against the substrate W via the imprint material is disposed on the mold stage 11. The mold stage 11 is provided with a height measurement sensor 13 for measuring the height (position in the Z direction) of the substrate W held on the stage apparatus 100.

  The alignment detection system 15 is a TTM (Through The Mold) detection system and is arranged on the mold stage 11. The alignment detection system 15 includes an optical system and an imaging system for detecting an alignment mark formed on the mold M, a reference mark (not shown) disposed on the stage apparatus 100, an alignment mark formed on the substrate W, and the like. . The alignment detection system 15 detects a positional shift between the substrate W held by the stage apparatus 100 and the mold M in the X-axis direction and the Y-axis direction from the detection result of the alignment mark.

  The dispenser 16 is configured by a dispense head including a nozzle that supplies an imprint material onto the substrate W. The dispenser 16 employs, for example, a piezo jet method or a micro solenoid method, and supplies a small volume of imprint material onto the substrate W. It is possible to apply the imprint material onto the substrate W by moving the stage apparatus 100 while supplying the imprint material from the dispenser 16.

  The off-axis detection system 17 is supported by the top plate 18 and includes an optical system for detecting a reference mark (not shown) disposed on the stage apparatus 100 without using the mold M, an alignment mark formed on the substrate W, and the like. It has an imaging system. The off-axis detection system 17 detects the position of the alignment mark of the substrate W on the XY plane with respect to a reference mark (not shown) of the stage apparatus 100. The alignment detection system 15 obtains the positional relationship between the mold M and the stage apparatus 100, the off-axis detection system 18 obtains the positional relation between the substrate W and the stage apparatus 100, and both the detection systems are used. Relative alignment can be performed.

  The control unit 19 includes a CPU and a memory, and controls the operation of the entire imprint apparatus 1. The control unit 19 performs mark detection on the substrate W by the off-axis detection system 18 in each of the plurality of shot areas, and adjusts the relative positional relationship between the substrate W and the mold M based on the detection result. The imprint process is controlled so that the imprint process is performed. The control unit 19 may be provided in the imprint apparatus 1 or may be installed at a location different from the imprint apparatus 1 and controlled remotely.

(Stage device)
The substrate W is held by the stage apparatus 100 and can move on the surface plate. The stage apparatus 100 includes a stage 110, a movable part 120, and a surface plate 130. The stage 110 and the movable part 120 are supported by the surface plate 130. Of the surfaces of the surface plate 130, a surface that supports the stage 110 and the movable unit 120 is referred to as a reference surface or a guide surface.

  The stage 110 has a chuck 111 that holds the substrate W on its upper surface. The stage 110 moves on the reference plane while holding the substrate W. The stage 110 includes a stage bottom air guide (first hydrostatic bearing) 112 and a drive mechanism (first drive mechanism) 114. The stage bottom air guide 112 and the first drive mechanism 114 are provided on the surface of the stage 110 facing the reference surface side. The stage bottom air guide 112 supports the stage 110 by ejecting gas to the reference surface of the surface plate 11 to form an interval between the stage 110 and the reference surface. The first drive mechanism 114 moves the stage 110 in a direction perpendicular to the reference plane (Z direction).

  The movable unit 120 moves the stage 110 in the Y direction. The movable part 120 includes an X guide part 121, a movable part bottom air guide 123, a movable part lateral air guide 124, a Y linear motor movable element 126, a Y linear motor stator 127, and a Y guide part 128. Prepare. The stage 110 moves in the X direction along the X guide part 121. The movable part bottom air guide 123 supports the movable part 120 by ejecting gas to the reference surface of the surface plate 11 to form a gap between the movable part 120 and the reference surface. The movable portion lateral air guide 124 ejects gas to the Y guide portion 128 to form an interval between the movable portion 120 and the Y guide portion 128.

  The movable part 120 is moved in the Y direction along the Y guide part 128 by the Y linear motor movable element 126 and the Y linear motor stator 127. Along with this, the stage 110 also moves in the Y direction.

  FIG. 2 is a view of the stage apparatus 100 as viewed from the Z direction. The stage 110 has a stage lateral air guide 113. The stage lateral air guide 113 ejects gas to the X guide part 121 to form an interval between the stage device 110 and the X guide part 121.

  The movable unit 120 includes an X linear motor stator 122 and a drive mechanism (second drive mechanism) 125. The second drive mechanism 125 moves the movable unit 120 in a direction (Z direction) perpendicular to the reference plane.

  FIG. 3 is a cross-sectional view taken along the line AA of FIG. The stage 110 has a cavity surrounding the guide part 121 of the movable part 120. The stage 110 has an X linear motor movable element 115. The stage 110 is moved in the X direction along the X guide portion 121 by the X linear motor movable element 115 and the X linear motor stator 122. The imprint apparatus 1 may include a position sensor (not shown) that measures the position of the stage 110 in the X-axis direction and the Y-axis direction.

  In the imprint apparatus 1, the stage apparatus 100 needs to be driven with a large stroke in the XY directions at high speed and high accuracy without friction and wear between the stage 110 and the surface plate 130. Of several μm to several tens of μm. Here, when foreign matter or the like from the outside falls on the reference surface of the surface plate 130, it can adhere to the air guide. When the stage 110 is driven in the X and Y directions, foreign matter adhering to the air guide is likely to rub against the reference surface of the surface plate 130 to generate dust (foreign matter). The stage apparatus 100 according to the present embodiment uses the first drive mechanism 114 and the second drive mechanism 125 to solve this problem.

  As shown in FIGS. 1 and 2, the first drive mechanism 114 and the second drive mechanism 125 are disposed on the bottom surface of the stage 110 or the movable unit 120, respectively, and hold the center of gravity of the stage 110 or the movable unit 120. In the present embodiment, two first drive mechanisms 114 and two second drive mechanisms 125 are arranged, respectively, but may be one if the center of gravity of the stage 110 or the movable unit 120 can be held. Further, for example, two first drive mechanisms 114 may be arranged in the X direction and two in the Y direction with the center of gravity between the stage 110. If two are arranged in the X direction and two in the Y direction across the center of gravity, the stage 110 can be supported more stably because the moment around the center of gravity can be maintained.

  In the present embodiment, the stage 110 is moved in the Z direction by the first drive mechanism 114, and the distance between the surface plate 130 and the stage 110 is set to the flying height by the stage bottom air guide 112 (the space between the surface plate 130 and the stage 110. Wider than the interval). In the present embodiment, the stage bottom air guide 112 is cleaned with the first drive mechanism 114 increasing the distance between the surface plate 130 and the stage 110. The same applies to the movable part 120 side.

(Elevation by the first drive mechanism)
1 and 3 show a state before the stage 110 is moved by the first drive mechanism 114. FIG. FIG. 4 is a view of the stage 110 moved in the + Z direction by the first drive mechanism 114 as seen from the Y direction. FIG. 5 is a cross-sectional view of the stage apparatus 100 in the state of FIG. 4 taken along line AA of FIG.

  In the present embodiment, the first drive mechanism 114 is an expansion / contraction mechanism that expands and contracts in the Z direction. As shown in FIG. 3, the first drive mechanism 114 is accommodated in the stage 110 when the stage 110 is not moved in the + Z direction. Since the first drive mechanism 114 is accommodated in the stage 110, the distance between the stage 110 and the surface plate 130 is maintained, and the movement of the stage 110 in the XY directions is not hindered. The distance between the first drive mechanism 114 accommodated in the stage 110 and the surface plate 130 is set to be equal to or greater than the air floating amount of the stage bottom air guide 112. If the interval is set, the first drive mechanism 114 and the surface plate 130 do not collide even when the stage 110 is seated on the surface plate 130 with the stage bottom air guide 112 turned off.

  As shown in FIG. 4, the first drive mechanism 114 is extended from the stage 110 and brought into contact with the surface plate 130, thereby separating the stage 110 from the surface plate 130. By increasing the interval between the stage 110 and the surface plate 130 by about 1 mm, a wiping cloth or the like for cleaning the bottom surface of the stage bottom air guide 112 can be inserted into the interval.

  The stage bottom air guide 112 can be cleaned by wiping off foreign matters attached to the bottom surface of the stage bottom air guide 112 with a wiping cloth or the like, and foreign matters such as particles generated in the imprint apparatus 1 can be reduced. After removing the foreign matter adhering to the stage bottom air guide 112, the first drive mechanism 114 is contracted and accommodated in the stage 110 as shown in FIG. Can be returned.

When the stage 110 is moved in the Z direction, the X guide part 121 of the movable part 120 and the inner surface of the hollow part of the stage 110 may collide depending on the size of the distance d ₁ shown in FIG. In order to prevent a collision, the distance d ₁ is set larger than the moving distance of the stage 110 by the first drive mechanism 114.

Further, even when the stage 110 is moved in the Z direction by the first drive mechanism 114, the length of the side surface of the X guide portion 121 is set so that the entire surface of the stage lateral air guide 113 faces the side surface of the X guide portion 121. . As described above, the stage 110 can be lifted independently by the first drive mechanism 114 by setting the distance d ₁ and the length of the side surface of the X guide portion 121.

As described above, even if the distance d ₁ and the length of the side surface of the X guide part 121 are not set, the stage is obtained by cooperatively operating a second drive mechanism 125 and a first drive mechanism 114 described later. 110 and the movable part 120 can be moved up and down simultaneously.

(Elevation by the second drive mechanism)
The movement of the movable part 120 by the second drive mechanism 125 will be described. The second drive mechanism 125 is an expansion / contraction mechanism that expands and contracts in the Z direction, like the first drive mechanism 114. FIG. 1 shows a state before the movable unit 120 is moved by the second drive mechanism 125. The movable portion 120 is levitated by a movable portion bottom air guide 123 with respect to the surface plate 130 by μm to several tens of μm. Similar to the first drive mechanism 114, the second drive mechanism 125 is accommodated in the movable part 120. Therefore, the distance between the movable part 120 and the surface plate 130 is maintained, and the movable part 120 moves in the Y direction. There is no inhibition.

  However, when there is a foreign object larger than the air flying height on the surface plate 130, the foreign material adheres to the movable part bottom air guide 123, and there is a concern that the surface plate 130 and the foreign object may be rubbed when the movable part 120 is driven. is there. FIG. 6 shows a state where the movable unit 120 is moved by the second drive mechanism 125.

  As shown in FIG. 6, the second drive mechanism 125 can be extended from the movable part 120 to separate the movable part bottom air guide 123 and the surface plate 130. By widening the distance between the movable part bottom air guide 123 and the surface plate 130 to about 1 mm, the foreign matter attached to the bottom surface of the movable part bottom air guide 123 is wiped off with a wiping cloth or the like, and the movable part bottom air guide 123 is cleaned. be able to.

  By wiping off foreign matter attached to the bottom surface of the movable part bottom air guide 123 with a wiping cloth or the like, the movable part bottom air guide 123 can be cleaned, and foreign matters such as particles generated in the imprint apparatus 1 can be reduced. After removing the foreign matter adhering to the movable part bottom air guide 123, the second drive mechanism 125 is contracted and accommodated in the movable part 120, and the movable part bottom air guide 123 moves the movable part in the same manner as the first drive mechanism 114. 120 can be returned to the air floating state.

The conditions for preventing the parts from colliding when moving the movable part 120 in the Z direction will be described. When the movable part 120 is moved in the Z direction, the X guide part 121 of the movable part 120 and the inner surface of the hollow part of the stage 110 may collide depending on the distance d ₂ shown in FIG. To prevent collisions, it is greater than the moving distance of the movable portion 120 the distance d ₂ by the second driving mechanism 125.

  Even when the movable unit 120 is moved in the Z direction by the second drive mechanism 125, the length of the side surface of the X guide portion 121 is set so that the entire surface of the stage lateral air guide 113 faces the side surface of the X guide portion 121.

Also, the gap d ₃ between the lower surface of the X linear motor movable element 115 and the upper surface of the X linear motor stator 122 shown in FIG. 5 is made larger than the ascending stroke of the second drive mechanism 125. Thereby, when the movable part 120 is raised by the second drive mechanism 125, the lower surface of the X linear motor movable element 115 and the upper surface of the X linear motor stator 122 do not collide.

  The length of the side surface of the Y guide portion 128 is set so that the entire surface of the movable portion lateral air guide 124 faces the side surface of the Y guide portion 128 even when the movable portion 120 is moved in the Z direction by the second drive mechanism 125. . Thereby, when the movable part 120 is raised by the second drive mechanism 125, the movable part lateral air guide 124 does not come off the side surface of the Y guide part 128.

  The Y linear motor movable element 126 and the Y linear motor stator 127 are configured not to interfere with each other when the movable unit 120 is moved in the Z direction by the second drive mechanism 125.

As described above, by setting the distance d _{2, the} distance d _{3, and the} like, the movable unit 120 can be lifted independently by the second drive mechanism 125. Moreover, the stage 110 and the movable part 120 can be moved up and down independently by the first drive mechanism 114 and the second drive mechanism 125.

Since the stage 110 and the movable part 120 can be moved up and down independently, the air guide bottom surface is cleaned by raising only one of the stage bottom air guide 112 and the movable part bottom air guide 123 from the surface plate 110. be able to. In addition, the stage 110 and the movable part 120 can be raised simultaneously by simultaneously extending the first drive mechanism 114 and the second drive mechanism 125 in a coordinated manner. If the stage 110 and the movable part 120 are raised simultaneously, the stage bottom air guide 112 and the movable part bottom air guide 123 can be cleaned simultaneously.
[Modification]

(Drive mechanism)
The first drive mechanism 114 and the second drive mechanism 125 may be any mechanism that raises and lowers the stage 110 and the movable unit 120 in the Z direction. For example, a cylinder mechanism using air or fluid pressure, a feed screw lifting mechanism using a ball screw and a linear guide, a cam link lifting mechanism using a cam link, or the like can be used.

  In the above-described embodiment, the case where the air guide is used to guide between the stage and the surface plate in a non-contact manner has been described. However, the space between the stage and the surface plate is not limited to the air guide. The above embodiment can also be applied to the case where the stage and the surface plate are guided in a non-contact manner using a mechanism other than the air guide. That is, by using the first drive mechanism 114 and the second drive mechanism 125 to widen the space between the stage and the surface plate, foreign matter sandwiched between the stage and the surface plate can be removed.

(Cleaning method)
As a cleaning method of the stage bottom air guide 112 and the movable part bottom air guide 123, wiping cleaning with a wiping cloth or the like is shown. In addition, as a cleaning method, for example, a method such as removal by vacuum suction with a tube or the like, removal by blowing compressed air with a tube or the like, cleaning of immersion with ethanol or the like can be used.

  In addition, the cleaning can be automatically performed. For example, a particle detection sensor (sensor) (not shown) that detects the presence or absence of foreign matter is provided in the vicinity of the stage bottom air guide 112 and the movable part bottom air guide 123. The control unit 19 controls the first drive mechanism 114 and the second drive mechanism 125 to control the stage bottom air guide 112 and the movable when the foreign matter needs to be removed from the detection result by a sensor (not shown). The bottom air guide 123 is separated from the surface plate 110.

Further, an unillustrated air blowing mechanism (air flow forming portion) for blowing compressed air to the stage bottom air guide 112 and the movable portion bottom air guide 123 is provided on the stage 110 or the surface plate 130. The airflow forming unit forms an airflow that flows in a direction crossing the Z direction.
After the stage bottom air guide 112 and the movable part bottom air guide 123 are separated from the surface plate 110, the control unit 19 controls the air flow forming part and applies compressed air to the stage bottom air guide 112 and the movable part bottom air guide 123. To blow away the trash.

  The airflow forming unit is driven out of the drive range of the stage 110 when the first drive mechanism 114 and the second drive mechanism 125 are not moved up and down, and the stage bottom air guide 112 and the movable unit are moved up and down. It can be driven in the vicinity of the bottom air guide 123.

  As described above, by providing the sensor and the airflow forming unit, it is possible to automatically perform cleaning when the amount of dust generated in the stage bottom air guide 112 and the movable unit bottom air guide 123 is large.

(Drive distance measurement)
A length measurement system (measurement unit) (not shown) that measures the position of the stage 110 and the movable unit 120 in the Z direction by the first drive mechanism 114 and the second drive mechanism 125 may be provided. Based on the measurement result of a length measurement system (not shown), it is possible to perform control to moderate the moving speed when the stage 110 and the movable unit 120 are lifted from the surface plate 110 or placed on the surface plate 110. It becomes possible. By gently controlling the moving speed, the impact of the stage 110 and the movable unit 120 on the surface plate 110 can be minimized.

  Further, when the preload of the stage bottom air guide 112 and the movable part bottom air guide 123 is performed by a magnet (not shown), when the stage 110 and the movable part 120 are lifted from the surface plate 110, the distance from the surface plate 110 is increased. Accordingly, the magnet's attractive force changes nonlinearly. Therefore, if the distance from the surface plate 110 is measured by the above-described length measurement system, the lifting force of the first drive mechanism 114 and the second drive mechanism 125 can be adjusted according to the attractive force of the magnet based on the measured value. it can. As described above, the lifting force of the first driving mechanism 114 and the second driving mechanism 125 is adjusted in accordance with the distance from the surface plate 110, so that stable lifting with less fluctuation in speed and acceleration becomes possible.

  As described above, according to the embodiment or the modified example, it is possible to provide a stage device that is advantageous in terms of reducing foreign matters such as particles generated in the device. If the stage apparatus of the above embodiment or the modification is applied to a lithography apparatus, for example, pattern defects can be suppressed.

(Embodiment related to article manufacturing method)
A method for manufacturing a device (semiconductor integrated circuit element, liquid crystal display element, etc.) as an article includes a step of forming a pattern on a substrate (wafer, glass plate, film-like substrate) by an imprint apparatus using the method described above. . Furthermore, the manufacturing method may include a step of etching the substrate on which the pattern is formed. When manufacturing other articles such as patterned media (recording media) and optical elements, the manufacturing method may include other processes for processing a substrate on which a pattern is formed instead of etching. The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

(Other embodiments)
As mentioned above, although embodiment of this invention has been described, this invention is not limited to these embodiment, A various change is possible within the range of the summary.

100 Stage device 110 Stage 111 Chuck 112 Stage bottom air guide (first hydrostatic bearing)
113 Stage side air guide 114 Drive mechanism (first drive mechanism)
120 Movable part 123 Movable part bottom air guide 124 Movable part lateral air guide 125 Second drive mechanism 130 Surface plate

Claims (13)

A stage device including a surface plate having a reference surface and a stage moving on the reference surface,
A first hydrostatic bearing that supports the stage by forming an interval between the stage and the reference surface;
A drive mechanism for moving the stage in a direction perpendicular to the reference plane,
The movable distance of the stage by the drive mechanism is longer than the interval,
A stage apparatus characterized by that.   2. The stage device according to claim 1, wherein the first hydrostatic bearing and the drive mechanism are provided on a surface of the stage that faces the reference surface side. The drive mechanism is an expansion / contraction mechanism that expands and contracts in the vertical direction,
The stage moves in a direction in which the interval widens as the telescopic mechanism extends, and moves in a direction in which the interval narrows as the telescopic mechanism contracts in the vertical direction.
The stage apparatus according to claim 1, wherein:   The stage device according to claim 3, wherein the expansion / contraction mechanism is accommodated in the stage. A measurement unit that measures the position of the stage in the vertical direction;
A control unit that controls the drive mechanism based on a measurement result of the measurement unit;
5. The stage apparatus according to claim 1, wherein the stage apparatus is provided. A sensor for detecting foreign matter between the surface plate and the stage;
A control unit for controlling the drive mechanism based on a detection result of the sensor;
The stage apparatus according to claim 1, comprising:   The stage apparatus according to any one of claims 1 to 6, further comprising an airflow forming unit that forms an airflow that flows in a direction intersecting the vertical direction between the surface plate and the stage. . Between the surface plate and the stage, it has an airflow forming part that forms an airflow that flows in a direction crossing the vertical direction,
The control unit controls the driving mechanism based on the detection result of the sensor detecting the foreign matter to move the stage in the direction in which the interval is widened, and then controls the air flow forming unit to control the air flow. The stage apparatus according to claim 6, wherein:   The stage apparatus according to claim 7, wherein the airflow forming unit is disposed on the stage.   The stage device according to claim 7 or 8, wherein the air flow forming unit is arranged on the surface plate. A movable portion that moves the stage in a second direction different from the first direction in which the stage moves;
The surface of the stage facing the movable part is provided with a second hydrostatic bearing that forms an interval between the facing surface and the movable part when the stage moves in the vertical direction.
The stage apparatus according to any one of claims 1 to 10, wherein: A lithographic apparatus for forming a pattern on a substrate,
A stage device including a stage that holds the substrate and moves on a surface plate;
The stage device includes a hydrostatic bearing that supports the stage in a non-contact manner with respect to the surface plate,
An elevating mechanism for elevating the stage in a direction perpendicular to the surface plate,
The distance in the vertical direction in which the elevating mechanism raises and lowers the stage is larger than the interval between the stage and the surface plate formed by the hydrostatic bearing,
A lithographic apparatus, comprising: Forming a pattern on a substrate using the lithographic apparatus according to claim 12;
Processing the substrate on which the pattern is formed in the step, and
An article manufacturing method, wherein an article is manufactured from the processed substrate.

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