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JP2016188160A - Corrosion-resistant member and electrostatic chuck member - Google Patents

Corrosion-resistant member and electrostatic chuck member Download PDF

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JP2016188160A
JP2016188160A JP2015069508A JP2015069508A JP2016188160A JP 2016188160 A JP2016188160 A JP 2016188160A JP 2015069508 A JP2015069508 A JP 2015069508A JP 2015069508 A JP2015069508 A JP 2015069508A JP 2016188160 A JP2016188160 A JP 2016188160A
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corrosion
resistant member
electrostatic chuck
powder
samarium
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恵 大友
Megumi Otomo
恵 大友
弘訓 釘本
Hirokuni Kugimoto
弘訓 釘本
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Sumitomo Osaka Cement Co Ltd
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Sumitomo Osaka Cement Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide: a corrosion-resistant member capable of increasing the adsorption force of an electrostatic chuck when an electric field is applied and reducing the residual adsorption force of the electrostatic chuck when the application of the electric field is stopped, when used for an electrostatic chuck member; and the electrostatic chuck member.SOLUTION: There are provided a corrosion-resistant member substantially formed of a composite oxide containing samarium, aluminum and oxygen and including a perovskite crystal, in which a segregated part derived from the samarium, existing on at least a main surface of the corrosion-resistant member and having the maximum length of 0.1 mm or more, is 10 or less pieces; and an electrostatic chuck member including the corrosion-resistant member.SELECTED DRAWING: None

Description

本発明は、耐食性部材及びこれを含む静電チャック用部材に関する。   The present invention relates to a corrosion-resistant member and a member for an electrostatic chuck including the same.

半導体製造工程において使用されるCVD装置、スパッタリング装置等の成膜装置、あるいは微細加工を施すためのエッチング装置等においては、ウェハを保持するためにチャック装置が用いられる。   A chuck apparatus is used to hold a wafer in a film forming apparatus such as a CVD apparatus or a sputtering apparatus used in a semiconductor manufacturing process or an etching apparatus for performing fine processing.

このチャック装置としては、従来真空チャック方式やメカニカルクランプ方式が採用されてきたが、近年の半導体製造プロセスの高度化に伴い、半導体ウェハを静電引力により吸着する静電チャック方式が用いられるようになってきている。この静電チャック方式は、ウェハ平面度の矯正や均熱等の面において、従来の真空チャック方式やメカニカルクランプ方式に比べ優れた特性を発揮する。静電チャックの動作特性としては、電圧を印加している間は大きな吸着力を発生して被吸着物の落下等を防止し、電圧印加を解除したならば直ちに吸着力を小さくして被吸着物を容易に取り外し得ることが望ましい。   Conventionally, a vacuum chuck method or a mechanical clamp method has been adopted as the chuck device. However, as the semiconductor manufacturing process has been advanced in recent years, an electrostatic chuck method that attracts a semiconductor wafer by electrostatic attraction is used. It has become to. This electrostatic chuck method exhibits superior characteristics compared to the conventional vacuum chuck method and mechanical clamp method in terms of wafer flatness correction and soaking. The operation characteristics of the electrostatic chuck are to generate a large attracting force while applying a voltage to prevent the object to be attracted from dropping, etc. It is desirable that objects can be easily removed.

また、IC、LSI、VLSI等の半導体装置の製造ラインには、フッ素系腐食性ガス、塩素系腐食性ガス等のハロゲン系腐食性ガス、及びこれらのプラズマを用いる工程がある。これらの工程では、静電チャックにより固定された半導体ウエハに対して、例えば、ドライエッチング、プラズマエッチング、クリーニング等の処理が実施される。これらの処理には、CF、SF、HF、NF、F等のフッ素系ガスや、Cl、SiCl、BCl、HCl等の塩素系ガス、これらのガスのプラズマ等が使用される。これらの腐食性ガスやプラズマは腐食性が高いため、これらの腐食性ガスやプラズマによる静電チャックを構成する静電チャック用部材の腐食が問題となっている。 In addition, a production line for semiconductor devices such as IC, LSI, VLSI, and the like includes a process using a halogen-based corrosive gas such as a fluorine-based corrosive gas or a chlorine-based corrosive gas, and a plasma thereof. In these steps, for example, dry etching, plasma etching, cleaning, and the like are performed on the semiconductor wafer fixed by the electrostatic chuck. For these treatments, fluorine-based gases such as CF 4 , SF 6 , HF, NF 3 , and F 2 , chlorine-based gases such as Cl 2 , SiCl 4 , BCl 3 , and HCl, and plasmas of these gases are used. Is done. Since these corrosive gases and plasmas are highly corrosive, corrosion of the electrostatic chuck members constituting the electrostatic chuck by these corrosive gases and plasmas has become a problem.

従来は、静電チャック用部材に用いる耐食性材料として、イットリウム・アルミニウム・ガーネット(YAl12、以下、YAGと略す)や、酸化イットリウム以外の希土類酸化物をYAGに添加したもの等が使用されている(例えば、特許文献1〜3参照)。 Conventionally, as corrosion-resistant materials used for electrostatic chuck members, there are yttrium aluminum garnet (Y 3 Al 5 O 12 , hereinafter abbreviated as YAG), and rare earth oxides other than yttrium oxide added to YAG. It is used (for example, see Patent Documents 1 to 3).

特開2004−315308号公報JP 2004-315308 A 特開2011−151336号公報JP 2011-151336 A 特開2012−94826号公報JP 2012-94826 A

特許文献1〜3に記載されている耐食性部材は、フッ素系腐食性ガス、塩素系腐食性ガス等のハロゲン系腐食性ガス及びこれらのプラズマに対して高い耐腐食性を有する。
しかし、今後の半導体製造工程におけるチャック装置としては、電界を印加したときの静電チャックのウェハに対する吸着力が強く、電界の印加を停止したときの静電チャックの残留吸着力が弱いことがより重要となる。
The corrosion-resistant members described in Patent Documents 1 to 3 have high corrosion resistance against halogen-based corrosive gases such as fluorine-based corrosive gases and chlorine-based corrosive gases and their plasmas.
However, as a chuck device in the future semiconductor manufacturing process, the electrostatic chuck is strongly attracted to the wafer when an electric field is applied, and the electrostatic chuck's residual attracting force is weak when the application of the electric field is stopped. It becomes important.

そこで、本発明は、静電チャック用部材に使用した場合、電界を印加したときの静電チャックの吸着力を従来よりもさらに強くし、電界の印加を停止したときの静電チャックの残留吸着力を従来よりもさらに弱くすることができる耐食性部材、及びこれを含む静電チャック用部材を提供することを目的とする。   Therefore, when the present invention is used for a member for an electrostatic chuck, the electrostatic chuck attracting force when applying an electric field is made stronger than before, and the residual chucking of the electrostatic chuck when applying the electric field is stopped. An object of the present invention is to provide a corrosion-resistant member capable of making the force even weaker than before, and an electrostatic chuck member including the same.

上記課題に鑑み鋭意検討の結果、本発明者らは、誘電率がさらに高い材料として、サマリウムとアルミニウムとを含む複合酸化物で、特にペロブスカイト型結晶を含む耐食性材料に着目し、かつ、少なくとも一主面に存在するサマリウムに由来する所定の大きさの偏析部を少なくすることで、当該課題を解決できることを見い出し、本発明に想到した。
すなわち、本発明は下記のとおりである。
As a result of intensive studies in view of the above problems, the present inventors focused on a corrosion-resistant material containing a perovskite crystal, particularly a composite oxide containing samarium and aluminum, as a material having a higher dielectric constant. The inventors have found that the problem can be solved by reducing the segregation portion having a predetermined size derived from samarium existing on the main surface, and have arrived at the present invention.
That is, the present invention is as follows.

[1] サマリウムとアルミニウムとを含む複合酸化物から実質的に構成される耐食性部材であって、前記複合酸化物がペロブスカイト型結晶を含み、前記耐食性部材の少なくとも一主面に存在する、最大長さが0.1mm以上である前記サマリウム由来の偏析部が10個以下である耐食性部材。
[2] 前記耐食性部材の相対密度が97%以上である[1]に記載の耐食性部材。
[3] 上記[1]又は[2]に記載の耐食性部材を含む静電チャック用部材。
[1] A corrosion resistant member substantially composed of a composite oxide containing samarium and aluminum, wherein the composite oxide includes a perovskite crystal and is present on at least one main surface of the corrosion resistant member. A corrosion-resistant member having a segregation part derived from the samarium having a length of 0.1 mm or more and 10 or less.
[2] The corrosion-resistant member according to [1], wherein the relative density of the corrosion-resistant member is 97% or more.
[3] An electrostatic chuck member comprising the corrosion-resistant member according to [1] or [2].

本発明によれば、静電チャック用部材に使用した場合、電界を印加したときの静電チャックの吸着力を強くし、電界の印加を停止したときの静電チャックの残留吸着力を弱くすることができる耐食性部材、及びこれを含む静電チャック用部材を提供することができる。   According to the present invention, when used for an electrostatic chuck member, the electrostatic chuck attracting force when an electric field is applied is increased, and the residual chucking force of the electrostatic chuck is decreased when the application of the electric field is stopped. It is possible to provide a corrosion-resistant member that can be used, and an electrostatic chuck member including the same.

実施例1の耐食性部材の表面を示す写真である。2 is a photograph showing the surface of a corrosion-resistant member of Example 1. 比較例1の耐食性部材の表面を示す写真である。2 is a photograph showing the surface of a corrosion-resistant member of Comparative Example 1.

[耐食性部材]
本発明の耐食性部材は、サマリウムとアルミニウムとを含む複合酸化物(以下、「本発明に係る複合酸化物」ということがある)から実質的に構成される。サマリウムとアルミニウムとを含む複合酸化物で実質的に構成されることで、種々の腐食性ガスに対する耐食性を発揮することができる。
[Corrosion resistant material]
The corrosion-resistant member of the present invention is substantially composed of a complex oxide containing samarium and aluminum (hereinafter sometimes referred to as “the complex oxide according to the present invention”). By being substantially composed of a composite oxide containing samarium and aluminum, corrosion resistance against various corrosive gases can be exhibited.

ここで、「実質的に構成される」とは、本発明の効果が阻害されない程度に、本発明に係る複合酸化物以外にもその他の元素や化合物(特に酸化物)の含有が許容されることを意味する。耐食性部材中の、本発明に係る複合酸化物の割合は、例えば、80体積%以上であることが好ましく、90体積%以上であることがより好ましく、95体積%以上であることがさらに好ましい。本発明に係る複合酸化物の割合は、蛍光X線分析法による元素分析及び粉末X線回折法による定量分析により確認することができる。   Here, “substantially constituted” allows the inclusion of other elements and compounds (particularly oxides) in addition to the composite oxide according to the present invention to such an extent that the effects of the present invention are not inhibited. Means that. The ratio of the composite oxide according to the present invention in the corrosion-resistant member is, for example, preferably 80% by volume or more, more preferably 90% by volume or more, and further preferably 95% by volume or more. The ratio of the complex oxide according to the present invention can be confirmed by elemental analysis by fluorescent X-ray analysis and quantitative analysis by powder X-ray diffraction.

本発明に係る複合酸化物はペロブスカイト型結晶を含む。ペロブスカイト型結晶は、例えば、SmAlOである。ペロブスカイト型化合物の多くは、正方晶、斜方晶、三方晶等の立方格子から歪んだ構造を有しているため、強誘電性を示し、強い電界が印加される静電チャック用部材の用途には不適当であると考えられていた。しかし、本発明者らは、SmAlOが、斜方晶ペロブスカイト型構造(LaAlO型構造)であるにも関わらず、静電チャック用部材としての用途に好適であることを見出した。
すなわち、ペロブスカイト型結晶を含むことで耐食性部材の誘電率を高くすることができるとともに、本発明の耐食性部材を静電チャック用部材に使用した場合、電界を印加したときの静電チャックの吸着力をより強くし、電界の印加を停止したときの静電チャックの残留吸着力をより弱くすることができる。
The composite oxide according to the present invention includes a perovskite crystal. The perovskite crystal is, for example, SmAlO 3 . Most perovskite type compounds have a structure distorted from cubic lattices such as tetragonal, orthorhombic, and trigonal crystals, so they exhibit ferroelectricity and are used for electrostatic chuck members to which a strong electric field is applied. Was considered inappropriate. However, the present inventors have found that although SmAlO 3 has an orthorhombic perovskite structure (LaAlO 3 structure), it is suitable for use as a member for an electrostatic chuck.
That is, by including a perovskite crystal, the dielectric constant of the corrosion-resistant member can be increased, and when the corrosion-resistant member of the present invention is used for an electrostatic chuck member, the adsorption force of the electrostatic chuck when an electric field is applied And the residual chucking force of the electrostatic chuck when the application of the electric field is stopped can be made weaker.

また、本発明に係る複合酸化物中のペロブスカイト型結晶は、50体積%以上であることが好ましく、80体積%以上であることがより好ましい。ペロブスカイト型結晶の割合は、粉末X線回折法による定量分析により確認することができる。   Further, the perovskite type crystal in the composite oxide according to the present invention is preferably 50% by volume or more, and more preferably 80% by volume or more. The ratio of perovskite crystals can be confirmed by quantitative analysis by powder X-ray diffraction.

耐食性部材となる焼結体の製造段階で、サマリウムが均一に分散していないと、すなわち、サマリウムが表面において偏析していると、焼結体表面に黒点が発生し得る。この黒点はSmの偏析が原因であり、真空中あるいは不活性雰囲気下で焼結した場合、還元により金属サマリウムとなりやすく、静電チャックとした場合に残留吸着及び誘電損失が大きくなると推察される。また、誘電率や吸着力等の特性が安定化しないことがある。 If the samarium is not uniformly dispersed at the stage of manufacturing the sintered body to be the corrosion resistant member, that is, if the samarium is segregated on the surface, black spots may be generated on the surface of the sintered body. This black spot is caused by segregation of Sm 2 O 3 , and when sintered in a vacuum or in an inert atmosphere, it is presumed that metal samarium is likely to be reduced by reduction, and residual adsorption and dielectric loss increase when an electrostatic chuck is used. Is done. In addition, characteristics such as dielectric constant and adsorption force may not be stabilized.

上記黒点は目視で確認できる程度以上のものが表面に存在することで、特に吸着力、残留吸着及び誘電損失等に影響を与えることが多い。そこで、本発明の耐食性部材では、少なくとも一主面に存在する、最大長さが0.1mm以上であるサマリウム由来の偏析部が10個以下とする。当該サマリウム由来の偏析部は、5個以下であることが好ましく、0であることがさらに好ましい。サマリウム由来の偏析部が10個を超えると静電チャックとした場合に残留吸着及び誘電損失が大きくなると推測される。
なお、最大長さが0.1mm未満のサマリウム由来の偏析部が存在していても本発明の効果に大きな影響を与えることはない。
The above-mentioned black spots are present on the surface more than can be visually confirmed, and in particular often affect the adsorption force, residual adsorption and dielectric loss. Therefore, in the corrosion-resistant member of the present invention, the number of segregated portions derived from samarium having a maximum length of 0.1 mm or more that is present on at least one main surface is 10 or less. The number of segregation parts derived from the samarium is preferably 5 or less, and more preferably 0. When the number of segregation parts derived from samarium exceeds 10, it is estimated that residual adsorption and dielectric loss increase when an electrostatic chuck is used.
In addition, even if the segregation part derived from samarium having a maximum length of less than 0.1 mm is present, the effect of the present invention is not greatly affected.

最大長さが0.1mm以上であるサマリウム由来の偏析部は、光学顕微鏡等により測定することができる。
なお、上記の「少なくとも一主面」とは、例えば、本発明の耐食性部材が円盤状のような板状である場合は、少なくとも一方の平坦面をいう。言い換えるならば、耐食性部材を種々の用途に適用した場合にその機能を主に発揮する面、例えば、静電チャックとして使用する場合はそのチャック面をいう。
A samarium-derived segregation part having a maximum length of 0.1 mm or more can be measured with an optical microscope or the like.
The above “at least one main surface” means, for example, at least one flat surface when the corrosion-resistant member of the present invention has a plate shape such as a disk shape. In other words, it refers to a surface that mainly exerts its function when the corrosion-resistant member is applied to various uses, for example, a chuck surface when used as an electrostatic chuck.

上記複合酸化物におけるサマリウム:アルミニウム(モル比)の範囲は、73:27〜35:65であることが好ましく、65:35〜40:60であることがより好ましく、60:40〜45:55であることがさらに好ましい。複合酸化物におけるサマリウム:アルミニウム(モル比)の範囲が73:27〜35:65であると、複合酸化物の主要な構造をペロブスカイト型結晶にすることができる。   The range of samarium: aluminum (molar ratio) in the composite oxide is preferably 73:27 to 35:65, more preferably 65:35 to 40:60, and 60:40 to 45:55. More preferably. When the range of samarium: aluminum (molar ratio) in the composite oxide is 73:27 to 35:65, the main structure of the composite oxide can be a perovskite crystal.

本発明の耐食性部材の40Hzの周波数における比誘電率(温度:25℃)は、20以上であることが好ましく、23以上であることがより好ましく、25以上であることがさらに好ましい。本発明の耐食性部材における比誘電率が20以上であると、耐食性部材を静電チャック用部材に使用した場合、電界を印加したときの静電チャックの吸着力を強くすることができる。   The relative dielectric constant (temperature: 25 ° C.) at a frequency of 40 Hz of the corrosion-resistant member of the present invention is preferably 20 or more, more preferably 23 or more, and further preferably 25 or more. When the relative dielectric constant of the corrosion-resistant member of the present invention is 20 or more, when the corrosion-resistant member is used for the electrostatic chuck member, the adsorption force of the electrostatic chuck when an electric field is applied can be increased.

本発明の耐食性部材における相対密度は、97%以上であることが好ましく、97.5%以上であることがより好ましく、98%以上であることがさらに好ましい。耐食性部材における相対密度が97%以上であると、耐食性部材の強度を高くし、耐食性部材の比誘電率を高くすることができる。また、耐食性部材中の気孔は誘電損失増大の原因となるので、耐食性部材における相対密度が97%以上であると、耐食性部材の誘電損失を低減することができる。   The relative density in the corrosion-resistant member of the present invention is preferably 97% or more, more preferably 97.5% or more, and further preferably 98% or more. When the relative density of the corrosion-resistant member is 97% or more, the strength of the corrosion-resistant member can be increased and the relative dielectric constant of the corrosion-resistant member can be increased. Further, since pores in the corrosion-resistant member cause an increase in dielectric loss, the dielectric loss of the corrosion-resistant member can be reduced when the relative density in the corrosion-resistant member is 97% or more.

本発明の耐食性部材を厚さ1mmに加工し、アルミナセラミックス/電極/焼結体の構成で接着し、試料載置面温度25℃にて2.0kvの電圧を印加した際の静電吸着力は12kPa以上であることが好ましく、13kPa以上であることがより好ましく、15kPaであることがさらに好ましい。静電吸着力が12kPa以上であることで、静電チャック用部材に使用することにより、シリコンウエハ等の基板を静電チャックに確実に固定させることができる。   Electrostatic adsorption force when the corrosion-resistant member of the present invention is processed to a thickness of 1 mm, bonded with an alumina ceramic / electrode / sintered structure, and a voltage of 2.0 kv is applied at a sample mounting surface temperature of 25 ° C. Is preferably 12 kPa or more, more preferably 13 kPa or more, and even more preferably 15 kPa. When the electrostatic attraction force is 12 kPa or more, a substrate such as a silicon wafer can be reliably fixed to the electrostatic chuck by using the electrostatic chucking force as a member for electrostatic chuck.

また本発明の耐食性部材を厚さ1mmに加工し、アルミナセラミックス/電極/焼結体の構成で接着し、試料載置面温度25℃にて2.0kvの印加電圧を60秒間付与した後、電圧の印加を解除してその直後に測定した残留吸着力は1kPa以下であることが好ましく、0.9kPa以下であることより好ましく、0.8kPa以下であることがさらに好ましい。残留吸着力が1kPa以上であると、本発明の耐食性部材を静電チャック用部材に使用することにより、シリコンウエハ等の基板への所定の処理が終わった後、基板を静電チャックから容易に取り外すことができる。   Moreover, after processing the corrosion-resistant member of the present invention to a thickness of 1 mm, bonding with a configuration of alumina ceramic / electrode / sintered body, and applying an applied voltage of 2.0 kv at a sample mounting surface temperature of 25 ° C. for 60 seconds, The residual adsorptive force measured immediately after the voltage application is released is preferably 1 kPa or less, more preferably 0.9 kPa or less, and even more preferably 0.8 kPa or less. When the residual adsorption force is 1 kPa or more, the substrate can be easily removed from the electrostatic chuck after predetermined processing on the substrate such as a silicon wafer is completed by using the corrosion-resistant member of the present invention for the electrostatic chuck member. Can be removed.

本発明の耐食性部材の40Hzの周波数における誘電損失は0.1以下であることが好ましく、0.05以下であることがより好ましい。誘電損失が0.1以下であることで、残留吸着が減少して、静電チャック用途に良好に用いることができる。   The dielectric loss of the corrosion-resistant member of the present invention at a frequency of 40 Hz is preferably 0.1 or less, and more preferably 0.05 or less. When the dielectric loss is 0.1 or less, the residual adsorption is reduced and the dielectric loss can be favorably used.

また、本発明の耐食性部材の曲げ強度は、150MPa以上であることが好ましく、160MPa以上あることがより好ましく、170MPa以上であることがさらに好ましい。ここで、曲げ強度は、JIS R1601に準拠して、4点曲げ試験により測定する。耐食性部材の曲げ強度が150MPa以上であると、耐食性部材を静電チャック用部材として使用した場合、強度に関して実用上の問題が生じない。   Further, the bending strength of the corrosion-resistant member of the present invention is preferably 150 MPa or more, more preferably 160 MPa or more, and further preferably 170 MPa or more. Here, the bending strength is measured by a four-point bending test in accordance with JIS R1601. When the corrosion-resistant member has a bending strength of 150 MPa or more, when the corrosion-resistant member is used as an electrostatic chuck member, there is no practical problem with respect to strength.

[耐食性部材の製造方法]
本発明の耐食性部材は、例えば、下記のような工程を経て製造される。
すなわち、(A)原料粉末の粒度分布d50が0.5μm以下、d90が0.9μm以下である原料粉末分散液を調製する原料粉末分散液調製工程と、(B)先の工程から得られた原料粉末分散液をスプレードライにより原料混合粉末を得た後、その原料混合粉末を成形し脱脂する成型工程と、(C)脱脂後の成形体を焼結する焼成工程と、(D)この工程で得られた焼結体をアニール処理するアニール処理工程と、を経て製造される。
以下、各工程を説明する。
[Method of manufacturing corrosion-resistant member]
The corrosion-resistant member of the present invention is manufactured through the following steps, for example.
That is, (A) a raw material powder dispersion liquid preparation step for preparing a raw material powder dispersion liquid in which the particle size distribution d50 of the raw material powder is 0.5 μm or less and d90 is 0.9 μm or less, and (B) obtained from the previous step. After obtaining the raw material mixed powder by spray-drying the raw material powder dispersion, the molding step of molding and degreasing the raw material mixed powder, (C) the firing step of sintering the compact after degreasing, and (D) this step And an annealing treatment step of annealing the sintered body obtained in (1).
Hereinafter, each process will be described.

(A)原料粉末分散液調製工程:
サマリウムとアルミニウムとを含み、かつペロブスカイト型結晶を含む複合酸化物(サマリウム・アルミニウム・ペロブスカイト:SAP)は、Sm粉末とAl粉末を混合し、高温で反応焼結を行うことで、焼結体が得られる。しかし、単に混合しただけでは焼結体の残留吸着が大きくなったり、誘電損失が大きくなったりすることがある。すなわち、水中にAl粉末とSm粉末を分散させて混合し、分散スラリーをスプレードライにより乾燥させて原料混合粉末を得る方法では、SmはAlよりも比重が大きいため、分散スラリー中で沈澱してしまう。その結果、焼結体中で黒点の発生原因となるとともに、導電性の付与によりSmの偏析が起こり、真空中あるいは不活性雰囲気下で焼結した場合還元により金属サマリウムとなりやすく、残留吸着及び誘電損失が大きくなると推察される。
(A) Raw material powder dispersion preparation step:
A composite oxide containing samarium and aluminum and containing a perovskite crystal (samarium / aluminum / perovskite: SAP) is a mixture of Sm 2 O 3 powder and Al 2 O 3 powder and subjected to reactive sintering at high temperature. Thus, a sintered body is obtained. However, simply mixing may increase the residual adsorption of the sintered body and increase the dielectric loss. That is, in a method in which Al 2 O 3 powder and Sm 2 O 3 powder are dispersed and mixed in water and the dispersion slurry is dried by spray drying to obtain a raw material mixed powder, Sm 2 O 3 is more than Al 2 O 3. Since the specific gravity is large, it precipitates in the dispersed slurry. As a result, black spots are caused in the sintered body, segregation of Sm 2 O 3 occurs due to the addition of conductivity, and when sintered in a vacuum or in an inert atmosphere, metal samarium is easily reduced due to reduction. It is presumed that adsorption and dielectric loss will increase.

本発明の耐食性部材に係る製造方法では、この原料粉末分散液調製工程において、原料粉末分散液の分散性を向上させることでSm粉末とAl粉末とが均一に混合され、反応焼結が均一に起こるため、Smの偏析を防ぐことができる。 In the production method according to the corrosion-resistant member of the present invention, in this raw material powder dispersion preparation step, the Sm 2 O 3 powder and the Al 2 O 3 powder are uniformly mixed by improving the dispersibility of the raw material powder dispersion, Since reaction sintering occurs uniformly, segregation of Sm 2 O 3 can be prevented.

原料粉末分散液調製工程について、より具体的に説明する。
まず、本工程では、各結晶相の原料となる粉体を溶媒中に混合、分散させて、スラリー(原料粉末分散液)を調製する。
The raw material powder dispersion preparation step will be described more specifically.
First, in this step, a powder (raw material powder dispersion) is prepared by mixing and dispersing a powder as a raw material of each crystal phase in a solvent.

原料粉末であるAl粉末及びSm粉末のそれぞれの粒子径は0.01〜1μm程度であることが好ましい。粒子径が1μm程度以下であると、焼結に必要な表面自由エネルギーが不足せず、緻密な焼結体が得られやすい。また、0.01μm程度以上であれば、商業上高価となることはなく、コスト増加を防ぐことができる。 The particle diameters of the Al 2 O 3 powder and the Sm 2 O 3 powder that are raw material powders are preferably about 0.01 to 1 μm. When the particle size is about 1 μm or less, the surface free energy necessary for sintering is not insufficient, and a dense sintered body is easily obtained. Moreover, if it is about 0.01 micrometer or more, it will not become expensive commercially but can prevent an increase in cost.

混合して原料粉末のスラリーとするためには溶媒を用いるが、使用する溶媒に制限はなく、水やアルコール等が挙げられる。   A solvent is used to mix and make a slurry of the raw material powder, but the solvent to be used is not limited, and examples thereof include water and alcohol.

分散方法としてはまず、比重の重いSm粉末に分散剤を添加して、撹拌と超音波処理を行い、予備分散を行って、Sm分散液を調製する。分散剤としてはポリメタクリル酸系分散剤、アクリルコポリマー、アルキルアンモニウム塩等が挙げられる。また、分散剤はSm粉末に対して5〜10質量%程度とすることが好ましい。
得られた分散液は超高圧を利用した湿式微粒化装置で分散・粉砕処理を行う。
As a dispersion method, first, a dispersant is added to Sm 2 O 3 powder having a high specific gravity, stirring and ultrasonic treatment are performed, and preliminary dispersion is performed to prepare an Sm 2 O 3 dispersion. Examples of the dispersant include a polymethacrylic acid dispersant, an acrylic copolymer, and an alkyl ammonium salt. Further, the dispersant is preferably about 5 to 10 wt% relative to Sm 2 O 3 powder.
The obtained dispersion is dispersed and pulverized by a wet atomizer using ultra-high pressure.

Sm粉末とは別に、Al粉末を溶媒中に添加し、撹拌と超音波処理を行ってAl分散液を作製する。Al粉末には分散剤を使用してもよく、使用しなくてもよい。分散液として、ポリカルボン酸系分散剤を使用することが好ましい。また、分散剤はAl粉末に対して5〜10質量%程度とすることが好ましい。
その後、Al分散液とSm分散液とを混合して撹拌と超音波処理を行い、得られた混合分散液を湿式微粒化装置で分散・粉砕処理を行い、粒度分布の細かいスラリー(原料粉末分散液)を得る。
Apart from Sm 2 O 3 powder, Al 2 O 3 powder is added to the solvent, and stirring and ultrasonic treatment are performed to prepare an Al 2 O 3 dispersion. A dispersant may or may not be used for the Al 2 O 3 powder. It is preferable to use a polycarboxylic acid-based dispersant as the dispersion. Further, the dispersant is preferably about 5 to 10 wt% with respect to Al 2 O 3 powder.
Thereafter, the Al 2 O 3 dispersion and the Sm 2 O 3 dispersion are mixed and stirred and sonicated, and the obtained mixed dispersion is dispersed and pulverized with a wet atomizer to obtain a particle size distribution. A fine slurry (raw powder dispersion) is obtained.

得られるスラリー中の原料粉末の粒度分布の特性としては、レーザー回折・散乱法により測定した体積基準のd50(50%累積径)が0.5μm以下、d90(90%累積径)が0.9μm以下であることが好ましい。d50が0.5μm以下、d90が0.9μm以下であると酸化サマリウムの偏析が起こりにくくなり、黒点の発生を抑える、もしくは無くすことができる。   As the characteristics of the particle size distribution of the raw material powder in the obtained slurry, the volume-based d50 (50% cumulative diameter) measured by laser diffraction / scattering method is 0.5 μm or less, and d90 (90% cumulative diameter) is 0.9 μm. The following is preferable. When d50 is 0.5 μm or less and d90 is 0.9 μm or less, segregation of samarium oxide is difficult to occur, and the generation of black spots can be suppressed or eliminated.

(B)成型工程:
本工程では、(A)工程で得られたスラリーを造粒して顆粒とし、さらにこの顆粒を所望の成型体に成型する。スラリーから顆粒形状に造粒する方法としてはスプレードライヤー等が好適に用いられる。こうして得られた顆粒を周知の成型手段により成型した後、大気中、50〜600℃程度にて脱脂を行う。
(B) Molding process:
In this step, the slurry obtained in step (A) is granulated into granules, and the granules are further molded into a desired molded body. A spray dryer or the like is preferably used as a method for granulating the slurry into a granular shape. The granules thus obtained are molded by a known molding means, and then degreased at about 50 to 600 ° C. in the atmosphere.

(C)焼成工程:
本工程では、(B)工程で得られた成型体を焼成する。大気中あるいは不活性ガス雰囲気中、1300℃〜1800℃にて1〜3時間程度焼成することにより、97%以上の相対密度を有する緻密な焼結体を作製することができる。温度が1300℃以上であると焼結が良好に進み、得られる焼結体の密度を向上させることができる。また、1800℃以下とすることで溶解を防ぐことができる。
(C) Firing step:
In this step, the molded body obtained in step (B) is fired. A dense sintered body having a relative density of 97% or more can be produced by firing at 1300 ° C. to 1800 ° C. for about 1 to 3 hours in the air or in an inert gas atmosphere. When the temperature is 1300 ° C. or higher, sintering proceeds well, and the density of the obtained sintered body can be improved. Moreover, melt | dissolution can be prevented by setting it as 1800 degrees C or less.

焼成方法としては、常圧焼成でもよいが、緻密な焼結体を得るためには、ホットプレス、熱間静水圧プレス(HIP)等の加圧焼成法が好ましい。加圧焼成時の加圧力は特に制限はないが、通常、10〜40MPa程度である。   As a firing method, normal pressure firing may be used, but in order to obtain a dense sintered body, a pressure firing method such as hot pressing or hot isostatic pressing (HIP) is preferable. The pressure applied during pressure firing is not particularly limited, but is usually about 10 to 40 MPa.

(D)アニール処理工程:
本工程では、(C)工程で得られた焼結体に大気中で加熱処理を行う。アニール処理温度は1280℃〜1600℃が好ましく、処理時間は2〜12時間が好ましい。アニール処理温度を1280℃以上とすることで酸素欠陥をなくすことができる。また、1600℃以下とすることで良好な吸着力を維持させることができる。また、処理時間が2時間以上であれば酸素欠陥をなくすことができ、12時間以下であれば良好な吸着力を維持させることができる。
(D) Annealing process:
In this step, the sintered body obtained in step (C) is heat-treated in the atmosphere. The annealing treatment temperature is preferably 1280 ° C to 1600 ° C, and the treatment time is preferably 2 to 12 hours. By setting the annealing temperature to 1280 ° C. or higher, oxygen defects can be eliminated. Moreover, favorable adsorption power can be maintained by setting it as 1600 degrees C or less. Moreover, if the treatment time is 2 hours or longer, oxygen defects can be eliminated, and if the treatment time is 12 hours or shorter, a good adsorption force can be maintained.

以上の工程を経て、適宜公知の処理が施されて本発明の耐食性部材が製造される。   Through the above steps, a known treatment is appropriately performed to produce the corrosion-resistant member of the present invention.

既述のとおり、上記本発明の耐食性部材に係る製造方法では、原料分散液調製工程において特定の分散処理が施されるため、Sm粉末とAl粉末の分布が均一な焼結体を得られる。
これは、Sm粉末をはじめに高圧分散機で処理を行って十分粒径を細かくしてSm分散液を調製しておき、Al分散液と混合することでSm粉末とAl粉末とが均一に混ざりあったスラリーが得られることに起因する。そして、このスラリーを乾燥させることで均一な原料混合粉末が得られる。この均一な原料混合粉末を用いることで焼結体中でのSmの偏析を防ぐことができ、耐食性部材表面の黒点の生成が抑えられ、大きな吸着力が得られ、かつ誘電損失の増加や残留吸着力の増加を抑えることができる。
As described above, in the manufacturing method according to the corrosion-resistant member of the present invention, since specific dispersion treatment is performed in the raw material dispersion preparation step, the Sm 2 O 3 powder and the Al 2 O 3 powder are uniformly distributed. A ligation can be obtained.
This, Sm 2 by mixing with Sm 2 O 3 powder by performing the process at high pressure disperser to fine enough grain size at the beginning of the advance to prepare a Sm 2 O 3 dispersion, Al 2 O 3 dispersion This is because a slurry in which O 3 powder and Al 2 O 3 powder are uniformly mixed is obtained. And a uniform raw material mixed powder is obtained by drying this slurry. By using this uniform raw material mixed powder, segregation of Sm in the sintered body can be prevented, generation of black spots on the surface of the corrosion-resistant member can be suppressed, a large adsorption force can be obtained, and an increase in dielectric loss or residual can be obtained. An increase in adsorption force can be suppressed.

[静電チャック用部材]
本発明の静電チャック用部材は本発明の耐食性部材を含む。静電チャック用部材は、例えば、試料を静電吸着するための試料載置面を有する板状体と、その背面に設けられた静電吸着用内部電極層と、静電吸着用内部電極層を埋設する接着剤層と、接着剤層における板状体と反対側に設けられた絶縁性材料層とを有する。静電チャック部材における板状体の少なくとも試料載置面に、本発明の耐食性部材が使用される。
[Electrostatic chuck members]
The electrostatic chuck member of the present invention includes the corrosion-resistant member of the present invention. The electrostatic chuck member includes, for example, a plate-like body having a sample mounting surface for electrostatically adsorbing a sample, an internal electrode layer for electrostatic adsorption provided on the back surface, and an internal electrode layer for electrostatic adsorption And an insulating material layer provided on the opposite side of the adhesive layer from the plate-like body. The corrosion-resistant member of the present invention is used on at least the sample mounting surface of the plate-like body in the electrostatic chuck member.

本発明の静電チャック用部材は、本発明の耐食性部材を含むため、電界を印加したときの静電チャックの吸着力を従来よりもさらに強くし、電界の印加を停止したときの静電チャックの残留吸着力を従来よりもさらに弱くすることができる。   Since the electrostatic chuck member of the present invention includes the corrosion-resistant member of the present invention, the electrostatic chuck when the electric field is applied is made stronger than before and the application of the electric field is stopped. The residual adsorbing power can be made even weaker than before.

次に、本発明を実施例により、さらに詳細に説明するが、本発明は、これらの実施例によってなんら限定されるものではない。   EXAMPLES Next, although an Example demonstrates this invention further in detail, this invention is not limited at all by these Examples.

後述の実施例及び参考例における測定及び評価は下記のようにして行った。
(1)耐食性部材の相対密度
アルキメデス法により、実施例及び参考例で得られた耐食性部材の密度を測定し、下記式により求めた理論密度で、測定した密度を割り算して相対密度を算出した。
単位胞重量(g)=酸化サマリウムアルミニウム結晶相の各単位胞重量×各結晶相のmol%
単位胞体積(cm)=酸化サマリウムアルミニウム結晶相の各単位胞体積×各結晶相のmol%
理論密度(g/cm)=単位胞重量/単位胞体積
なお、酸化サマリウムアルミニウムの各結晶相%のmol%は、原料粉体の仕込み量から算出した。
Measurements and evaluations in Examples and Reference Examples described below were performed as follows.
(1) Relative density of corrosion resistant member The density of the corrosion resistant member obtained in Examples and Reference Examples was measured by the Archimedes method, and the relative density was calculated by dividing the measured density by the theoretical density obtained by the following formula. .
Unit cell weight (g) = unit cell weight of samarium aluminum oxide crystal phase × mol% of each crystal phase
Unit cell volume (cm 3 ) = unit cell volume of samarium aluminum oxide crystal phase × mol% of each crystal phase
Theoretical density (g / cm 3 ) = unit cell weight / unit cell volume The mol% of each crystal phase% of samarium aluminum oxide was calculated from the charged amount of raw material powder.

(2)耐食性部材の結晶相の同定
粉末X線回折法により、実施例及び参考例で得られた耐食性部材の結晶相の同定を行った。粉末X線回折には、X線回折装置(PANalytical社製、X’Pert PRO MPD)を使用した。
(2) Identification of crystal phase of corrosion-resistant member The crystal phase of the corrosion-resistant member obtained in Examples and Reference Examples was identified by a powder X-ray diffraction method. For powder X-ray diffraction, an X-ray diffractometer (manufactured by PANalytical, X'Pert PRO MPD) was used.

(3)スラリーの粒度分布
スラリー中の原料粉末の粒度分布は測定機器として、島津製作所製、機種名「SALD−2000J」を用いて測定を行い、d50及びd90を求めた。
(3) Particle Size Distribution of Slurry The particle size distribution of the raw material powder in the slurry was measured using Shimadzu Corporation model name “SALD-2000J” as a measuring device to obtain d50 and d90.

(4)焼結体の比誘電率、誘電損失
実施例及び参考例で得られた耐食性部材をφ48×1mmに加工した後、40MHzから1MHzの周波数領域における耐食性部材の比誘電率を、充放電評価装置(東洋システム(株)製、TOSCAT−3000)を使用して測定した。
(4) Relative permittivity and dielectric loss of sintered body After processing the corrosion resistant member obtained in Examples and Reference Examples to φ48 × 1 mm, the relative permittivity of the corrosion resistant member in the frequency range from 40 MHz to 1 MHz is charged / discharged. It measured using the evaluation apparatus (Toyo System Co., Ltd. product, TOSCAT-3000).

(5)焼結体の吸着力と残留吸着力
・吸着力
実施例及び参考例で得られた耐食性部材を厚さ1.0mmに加工し、加工した耐食性部材とアルミナセラミックスとの間に電極を埋設した接着層を形成して静電チャックを作製した。静電チャックの試料載置面温度を25℃にし、2.0kVの電圧を電極に60秒間印加して、1インチのシリコンウエハを静電チャックに真空中(<0.5Pa)で吸着させた。そして、1インチのシリコンウエハに対する吸着力を測定した。測定はロードセルを用いた引き剥がしにより行い、そのとき発生した最大引き剥がし応力を吸着力とした。
(5) Adsorption power and residual adsorption power / adsorption power of the sintered body The corrosion-resistant member obtained in Examples and Reference Examples was processed to a thickness of 1.0 mm, and an electrode was placed between the processed corrosion-resistant member and alumina ceramics. An embedded adhesive layer was formed to produce an electrostatic chuck. The sample mounting surface temperature of the electrostatic chuck was set to 25 ° C., and a voltage of 2.0 kV was applied to the electrodes for 60 seconds to adsorb the 1 inch silicon wafer to the electrostatic chuck in vacuum (<0.5 Pa). . And the adsorption power with respect to a 1-inch silicon wafer was measured. The measurement was performed by peeling using a load cell, and the maximum peeling stress generated at that time was taken as the adsorption force.

・残留吸着力
実施例及び参考例で得られた耐食性部材を厚さ1.0mmに加工し、加工した耐食性部材とアルミナセラミックスとの間に電極を埋設した接着層を形成して静電チャックを作製した。静電チャックの試料載置面温度を25℃にし、2.0kVの電圧を電極に60秒間印加して、1インチのシリコンウエハを静電チャックに真空中(<0.5Pa)で吸着させた。その後、電圧の印加を停止し、電圧の印加を停止した直後の1インチのシリコンウエハに対する残留吸着力を測定した。測定はロードセルを用いた引き剥がしにより行い、そのとき発生した最大引き剥がし応力を残留吸着力とした。
-Residual adsorption force Corrosion resistant members obtained in the examples and reference examples were processed to a thickness of 1.0 mm, and an adhesive layer was formed by embedding electrodes between the processed corrosion resistant members and alumina ceramics. Produced. The sample mounting surface temperature of the electrostatic chuck was set to 25 ° C., and a voltage of 2.0 kV was applied to the electrodes for 60 seconds to adsorb the 1 inch silicon wafer to the electrostatic chuck in vacuum (<0.5 Pa). . Thereafter, the application of voltage was stopped, and the residual adsorption force with respect to the 1-inch silicon wafer immediately after the application of voltage was stopped was measured. The measurement was performed by peeling using a load cell, and the maximum peeling stress generated at that time was defined as the residual adsorption force.

(6)耐食性部材表面の黒点の評価
最大長さが0.1mm以上の黒点の数を光学顕微鏡によりカウントした。
(6) Evaluation of black spot on corrosion-resistant member surface The number of black spots having a maximum length of 0.1 mm or more was counted with an optical microscope.

(7)耐食性評価
実施例および参考例で得られた耐食性部材に、(i)CF/O/Ar(2/2/16mL/分)及び(ii)SF(10mL/分)のガス種を照射し、プラズマ暴露試験を行った。条件は真空度:1mTorr、電極周波数:2.5GHz、バイアス周波数:13.56MHz、電圧:3400V、電流:1.8A、プラズマパワー:420W(CF) 及び400W(SF)であった。
暴露していない部分と暴露後の部分の表面粗さを測定し、その差からエッチングレートを算出した。
(7) Corrosion resistance evaluation Gases of (i) CF 4 / O 2 / Ar (2/2/16 mL / min) and (ii) SF 6 (10 mL / min) were applied to the corrosion resistant members obtained in the examples and reference examples. The seed was irradiated and a plasma exposure test was performed. The conditions were vacuum degree: 1 mTorr, electrode frequency: 2.5 GHz, bias frequency: 13.56 MHz, voltage: 3400 V, current: 1.8 A, plasma power: 420 W (CF 4 ) and 400 W (SF 6 ).
The surface roughness of the unexposed part and the exposed part was measured, and the etching rate was calculated from the difference.

(実施例1)
(A)原料粉末分散液調製工程:
市販(大明化学工業(株)製、型番:TM−5D)の酸化アルミニウム(Al)粉末と、市販(日本イットリウム(株)製、型番:N−SM3CP)の酸化サマリウム(Sm)粉末とを表1の原料組成となるようにそれぞれ秤量した。
次に、Sm粉末に対して5質量%の分散剤をSm粉末に添加し、水を溶媒として加え、30質量%の水溶液になるように調整した。撹拌と超音波処理を行い、予備分散を行ってSm分散液を調製した。
Example 1
(A) Raw material powder dispersion preparation step:
Commercially available (Daimei Chemical Co., Ltd., model number: TM-5D) aluminum oxide (Al 2 O 3 ) powder and commercially available (Yttrium Japan, model number: N-SM3CP) samarium oxide (Sm 2 O) 3 ) Each powder was weighed so as to have the raw material composition shown in Table 1.
Then, was added 5 wt% of the dispersing agent to Sm 2 O 3 powder in Sm 2 O 3 powder, adding water as a solvent, was adjusted to an aqueous solution of 30 wt%. Stirring and ultrasonic treatment were performed, and preliminary dispersion was performed to prepare an Sm 2 O 3 dispersion.

分散剤としてはポリメタクリル酸系分散剤を用いた。Sm分散液を、超高圧を利用した湿式微粒化装置(装置名:スターバースト、スギノマシン社製)で分散・粉砕処理を行った。
Sm粉末とは別に、Al粉末を水溶媒中に添加し、撹拌と超音波処理を行ってAl分散液(Al:30質量%)を作製した。その後、Al分散液とSm分散液とを混合して撹拌と超音波処理を行い、得られた混合分散液を湿式微粒化装置で分散・粉砕処理を行ってスラリーを得た。
分散後のスラリーの一部を取り、原料粉末の粒度分布(d50及びd90)の測定を行った。結果を表1に示す。
A polymethacrylic acid type dispersant was used as the dispersant. The Sm 2 O 3 dispersion was dispersed and pulverized by a wet atomization apparatus (apparatus name: Starburst, manufactured by Sugino Machine Co., Ltd.) using ultra high pressure.
Apart from Sm 2 O 3 powder, Al 2 O 3 powder was added to an aqueous solvent, and stirring and ultrasonic treatment were performed to prepare an Al 2 O 3 dispersion (Al 2 O 3 : 30% by mass). Thereafter, the Al 2 O 3 dispersion and the Sm 2 O 3 dispersion are mixed and stirred and sonicated, and the obtained mixed dispersion is dispersed and pulverized by a wet atomizer to obtain a slurry. It was.
A part of the slurry after dispersion was taken, and the particle size distribution (d50 and d90) of the raw material powder was measured. The results are shown in Table 1.

(B)成型工程、及び(C)焼成工程:
このスラリーをスプレードライヤーにて造粒し顆粒とした。次いでこの顆粒を所定形状に成型した。次いで、この成型体を500℃、大気中で4時間加熱して脱脂処理を行った。ホットプレスを用いてアルゴン中で1500℃、2時間加圧焼成し、焼結体を得た。この際の加圧力は20MPaとした。
(B) Molding step, and (C) Firing step:
This slurry was granulated with a spray dryer to form granules. Next, this granule was molded into a predetermined shape. Subsequently, this molded body was heated in the atmosphere at 500 ° C. for 4 hours to perform a degreasing treatment. Using a hot press, it was subjected to pressure firing at 1500 ° C. for 2 hours in argon to obtain a sintered body. The pressing force at this time was 20 MPa.

(D)アニール処理工程:
得られた焼結体を大気中で1480℃、10時間の加熱処理(アニール処理)を行い、耐食性部材を作製した。
得られた耐食性部材はX線回折測定や比誘電率測定、吸着力測定により評価を行った。得られた耐食性部材の特性を表1に示す。また、作製した耐食性部材の一主面の写真を図1に示す。
(D) Annealing process:
The obtained sintered body was subjected to heat treatment (annealing treatment) at 1480 ° C. for 10 hours in the atmosphere to produce a corrosion-resistant member.
The obtained corrosion-resistant member was evaluated by X-ray diffraction measurement, relative dielectric constant measurement, and adsorption force measurement. Table 1 shows the properties of the obtained corrosion-resistant member. Moreover, the photograph of the one main surface of the produced corrosion-resistant member is shown in FIG.

(実施例2)
市販の酸化アルミニウム(Al)粉末と、市販の酸化サマリウム(Sm)粉末を表1の原料組成となるように秤量し、Sm粉末に対して1質量%の分散剤をSm粉末に添加した以外は実施例1と同様に行い、耐食性部材を作製し、得られた焼結体の評価を行った。結果を表1に示す。
(Example 2)
A commercially available aluminum oxide (Al 2 O 3 ) powder and a commercially available samarium oxide (Sm 2 O 3 ) powder are weighed so as to have the raw material composition shown in Table 1, and 1% by weight of the Sm 2 O 3 powder is dispersed. Except that the agent was added to the Sm 2 O 3 powder, the same procedure as in Example 1 was performed to prepare a corrosion-resistant member, and the obtained sintered body was evaluated. The results are shown in Table 1.

(実施例3)
市販の酸化アルミニウム(Al)粉末と、市販の酸化サマリウム(Sm)粉末を表1の原料に示す組成となるように秤量し、Sm粉末に対して使用した分散剤をアクリルコポリマー系分散剤とした以外は、実施例1と同様に行い、耐食性部材を作製し、得られた焼結体の評価を行った。結果を表1に示す。
Example 3
A commercially available aluminum oxide (Al 2 O 3 ) powder and a commercially available samarium oxide (Sm 2 O 3 ) powder were weighed so as to have the composition shown in the raw materials of Table 1, and used for the Sm 2 O 3 powder. A corrosion-resistant member was produced in the same manner as in Example 1 except that the agent was an acrylic copolymer dispersant, and the obtained sintered body was evaluated. The results are shown in Table 1.

(参考例1)
(A)原料粉末分散液調製工程:
市販の酸化アルミニウム(Al)粉末と、市販の酸化サマリウム(Sm)粉末を表1の原料組成となるように秤量した。Al粉末に対して1質量%の分散剤を添加し、水を溶媒として超音波処理を行い、分散を行った。Sm粉末に対して5質量%の分散剤を添加し、水を溶媒として超音波処理を行い、分散を行った。各分散液を混合後、高圧分散機で分散を行い、スラリーを得た。分散後のスラリーの一部を取り、粒度分布の測定を行った。
(B)〜(D)の工程は実施例1と同様とし、得られた耐食性部材の評価を行った。結果を表1に示す。また、作製した耐食性部材の一主面の写真を図2に示す。
(Reference Example 1)
(A) Raw material powder dispersion preparation step:
Commercially available aluminum oxide (Al 2 O 3 ) powder and commercially available samarium oxide (Sm 2 O 3 ) powder were weighed so as to have the raw material compositions shown in Table 1. 1% by mass of a dispersant was added to the Al 2 O 3 powder, and ultrasonic treatment was performed using water as a solvent to perform dispersion. Dispersion was performed by adding 5% by mass of a dispersant to the Sm 2 O 3 powder and performing ultrasonic treatment using water as a solvent. Each dispersion was mixed and then dispersed with a high-pressure disperser to obtain a slurry. A part of the slurry after dispersion was taken and the particle size distribution was measured.
The steps (B) to (D) were the same as in Example 1, and the obtained corrosion-resistant member was evaluated. The results are shown in Table 1. Moreover, the photograph of the one main surface of the produced corrosion-resistant member is shown in FIG.

(参考例2)
市販の酸化アルミニウム(Al)粉末と市販の酸化サマリウム(Sm)粉末を表1の原料組成となるように秤量した。分散剤は添加せず、水を溶媒としてAl粉末とSm粉末の撹拌を行い、分散液を得た。あとの工程は実施例1と同様に行い、得られた耐食性部材の評価を行った。結果を表1に示す。
(Reference Example 2)
Commercially available aluminum oxide (Al 2 O 3 ) powder and commercially available samarium oxide (Sm 2 O 3 ) powder were weighed so as to have the raw material compositions shown in Table 1. A dispersant was not added, and water was used as a solvent to stir the Al 2 O 3 powder and the Sm 2 O 3 powder to obtain a dispersion. The subsequent steps were performed in the same manner as in Example 1, and the obtained corrosion-resistant member was evaluated. The results are shown in Table 1.

なお、耐食性の評価では、すべての実施例及び参考例で、(i)の「(CF/O)Ar」で0.01〜0.1μm/hrの範囲内にあり、(ii)の「SF/Ar」で0.1〜0.5μm/hrの範囲内にあり、良好な耐食性が確認できた。 In the evaluation of corrosion resistance, in all the examples and reference examples, “(CF 4 / O 2 ) Ar” in (i) is within a range of 0.01 to 0.1 μm / hr, and (ii) “SF 6 / Ar” was in the range of 0.1 to 0.5 μm / hr, and good corrosion resistance could be confirmed.

実施例ではいずれも、原料粉末分散液調製工程において所定の分散処理を施したため、SmとAlの分布が均一となり、表面への黒点の発生が抑えられた耐食性部材が得られた(図1参照)。その結果、参考例に比べて、大きな吸着力が発揮され、かつ、低誘電損失及び低残留吸着力が得られる結果となった。なお、参考例では、図2に示すような黒点の発生が確認された。 In each of the examples, since the predetermined dispersion treatment was performed in the raw material powder dispersion preparation step, the distribution of Sm 2 O 3 and Al 2 O 3 became uniform, and a corrosion-resistant member in which the generation of black spots on the surface was suppressed was obtained. (See FIG. 1). As a result, compared with the reference example, a large attractive force was exhibited, and a low dielectric loss and a low residual attractive force were obtained. In the reference example, the occurrence of black spots as shown in FIG. 2 was confirmed.

Claims (3)

サマリウムとアルミニウムとを含む複合酸化物から実質的に構成される耐食性部材であって、
前記複合酸化物がペロブスカイト型結晶を含み、
前記耐食性部材の少なくとも一主面に存在する、最大長さが0.1mm以上である前記サマリウム由来の偏析部が10個以下である耐食性部材。
A corrosion-resistant member substantially composed of a composite oxide containing samarium and aluminum,
The composite oxide includes a perovskite crystal;
A corrosion-resistant member having 10 or less segregation parts derived from the samarium having a maximum length of 0.1 mm or more, which is present on at least one main surface of the corrosion-resistant member.
前記耐食性部材の相対密度が97%以上である請求項1に記載の耐食性部材。   The corrosion-resistant member according to claim 1, wherein the relative density of the corrosion-resistant member is 97% or more. 請求項1又は2に記載の耐食性部材を含む静電チャック用部材。   An electrostatic chuck member comprising the corrosion-resistant member according to claim 1.
JP2015069508A 2015-03-30 2015-03-30 Corrosion-resistant member and electrostatic chuck member Pending JP2016188160A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019054617A1 (en) * 2017-09-14 2019-03-21 (주)코미코 Plasma etching apparatus member having improved plasma-resistant properties and manufacturing method therefor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019054617A1 (en) * 2017-09-14 2019-03-21 (주)코미코 Plasma etching apparatus member having improved plasma-resistant properties and manufacturing method therefor
US11827975B2 (en) 2017-09-14 2023-11-28 Komico Ltd. Photoplasma etching apparatus having improved plasma-resistant and manufacturing method therefor using a thermal diffusion phenomenon of a rare-earth metal thin film

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