JP2016018069A - Exposure method and exposure apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure method and an exposure apparatus which can remove foreign matter attached to the surface of a cylindrical photomask without stopping operation of the exposure apparatus, and in which a defect is hardly generated in a latent image pattern formed on a photosensitive layer due to the foreign matter attached to the surface of the cylindrical photomask.SOLUTION: While moving a workpiece 100 to a direction orthogonal to an axial direction of a cylindrical photomask 10, the cylindrical photomask 10 is rotated on the surface of a photosensitive layer 104 by contacting the photosensitive layer 104 with the cylindrical photomask 10. While irradiating radiation from radiation irradiating means 12 arranged inside the cylindrical photomask 10 to the photosensitive layer 104, an adhesive roll 16 which contacts with a surface of the cylindrical photomask 10 and rotates following rotation of the cylindrical photomask 10, cleans the surface of the cylindrical photomask 10.SELECTED DRAWING: Figure 1

Description

  In the present invention, a photosensitive layer of a workpiece having a photosensitive layer formed on the surface of a substrate is exposed through a cylindrical photomask in contact with the photosensitive layer, and a latent image pattern corresponding to the pattern of the cylindrical photomask is exposed. The present invention relates to an exposure method and an exposure apparatus for forming a layer.

  A cylindrical photomask that contacts the photosensitive layer is rotated on the surface of the photosensitive layer while moving the workpiece having the photosensitive layer formed on the surface of the substrate in a predetermined direction, and at the same time, the cylindrical photomask is arranged inside the cylindrical photomask. By irradiating the photosensitive layer with radiation from the radiation irradiation means, the photosensitive layer is exposed through a cylindrical photomask in contact with the photosensitive layer, and a latent image pattern corresponding to the pattern of the cylindrical photomask is formed on the photosensitive layer. An exposure method has been proposed (Patent Document 1).

  In order to accurately transfer the cylindrical photomask pattern to the photosensitive layer as a corresponding latent image pattern, (i) the contact portion between the photosensitive layer and the cylindrical photomask is orthogonal to the axial direction of the cylindrical photomask. (Ii) the photosensitive layer and the cylindrical photomask are in close contact with each other without a gap, and (iii) the cylindrical photomask does not slip on the surface of the photosensitive layer. Therefore, the material of the surface of the cylindrical photomask is a flexible elastomer.

  However, when the material of the surface of the cylindrical photomask is an elastomer, when a workpiece having foreign matter attached to the surface of the photosensitive layer is carried in, the photosensitive layer is exposed to light when the photosensitive layer is brought into contact with the cylindrical photomask. Foreign matter on the surface of the layer moves to and adheres to the surface of the cylindrical photomask with high adhesion. If foreign matter adheres to the surface of the cylindrical photomask, the foreign matter blocks the radiation from the radiation irradiating means, and the shadow of the foreign matter is transferred to the photosensitive layer, resulting in a defect in the latent image pattern formed on the photosensitive layer. . Therefore, when the photosensitive layer on which the latent image pattern is formed is developed to obtain a product having a desired pattern, a defect occurs in the product pattern, resulting in a poor product yield.

  Therefore, every time foreign matter adheres to the surface of the cylindrical photomask, it is necessary to stop the operation of the exposure apparatus and clean the surface of the cylindrical photomask. However, if the operation of the exposure apparatus is frequently stopped, product productivity decreases.

Special table 2011-526069 gazette

  The present invention can remove the foreign matter adhering to the surface of the cylindrical photomask without stopping the operation of the exposure apparatus, and the latent image pattern formed on the photosensitive layer by the foreign matter attached to the surface of the cylindrical photomask is defective. An exposure method and an exposure apparatus that are unlikely to occur are provided.

The present invention has the following configuration.
[1] A photosensitive layer of a workpiece having a photosensitive layer formed on the surface of a substrate is exposed through a cylindrical photomask in contact with the photosensitive layer, and a latent image pattern corresponding to the cylindrical photomask pattern is exposed to the photosensitive layer. An exposure method to be formed
The photosensitive layer and the cylindrical photomask are brought into contact with each other while the workpiece and the cylindrical photomask are moved relative to each other in a direction orthogonal to the axial direction of the cylindrical photomask and in opposite directions. While rotating the cylindrical photomask on the surface and simultaneously irradiating the photosensitive layer with radiation from the radiation irradiation means arranged inside the cylindrical photomask,
An exposure method in which the surface of a cylindrical photomask is cleaned by an adhesive roll that contacts the surface of the cylindrical photomask and rotates following the rotation of the cylindrical photomask.
[2] When viewed from the axial direction of the cylindrical photomask, the rotation axis of the adhesive roll is an extension of a line connecting the center of the contact portion between the photosensitive layer and the cylindrical photomask and the rotation axis of the cylindrical photomask. The exposure method according to [1].
[3] The exposure method according to [1] or [2], wherein the contact pressure between the cylindrical photomask and the adhesive roll is adjusted.
[4] The exposure method according to any one of [1] to [3], wherein the contact pressure between the photosensitive layer and the cylindrical photomask is adjusted.
[5] The width of the contact portion between the photosensitive layer and the cylindrical photomask in a direction perpendicular to the axial direction of the cylindrical photomask is disposed so as to cover the radiation irradiation means, and radiation is emitted toward the contact portion. Adjusting the contact pressure between the photosensitive layer and the cylindrical photomask so that the width of the slit in the light shielding member formed with the slit is larger than the width in the direction perpendicular to the axial direction of the cylindrical photomask. 4] The exposure method.
[6] The exposure method according to any one of [1] to [5], wherein the distance between the rotation axis of the cylindrical photomask and the rotation axis of the adhesive roll is kept constant.
[7] The exposure method according to any one of [1] to [6], wherein the distance between the surface of the photosensitive layer and the rotation axis of the cylindrical photomask is kept constant.
[8] The surface of the pressure-sensitive adhesive roll is cleaned with a strong pressure-sensitive adhesive roll that comes into contact with the surface of the pressure-sensitive adhesive roll and rotates following the rotation of the pressure-sensitive adhesive roll. Either exposure method.
[9] When viewed from the axial direction of the cylindrical photomask, the rotation axis of the strong adhesive roll extends the line connecting the center of the contact portion between the photosensitive layer and the cylindrical photomask and the rotational axis of the cylindrical photomask. The exposure method according to [8], which is on a line.
[10] The exposure method according to any one of [1] to [9], wherein the material of the surface of the cylindrical photomask is an elastomer.
[11] The exposure method according to any one of [1] to [10], wherein the surface of the cylindrical photomask after contact with the adhesive roll and before contact with the photosensitive layer is neutralized.

[12] The photosensitive layer of the workpiece having the photosensitive layer formed on the surface of the substrate is exposed through a cylindrical photomask in contact with the photosensitive layer, and a latent image pattern corresponding to the cylindrical photomask pattern is exposed to the photosensitive layer. An exposure apparatus for forming
A cylindrical photomask that is rotatable about a central axis as a rotation axis;
Radiation irradiating means arranged inside a cylindrical photomask;
An adhesive roll that is disposed so as to contact the surface of the cylindrical photomask and is rotatable about the central axis;
Moving means for relatively moving the cylindrical photomask and the workpiece in directions orthogonal to the axial direction of the cylindrical photomask and in opposite directions to each other;
An exposure apparatus comprising:
[13] The exposure apparatus according to [12], wherein the cylindrical photomask and the adhesive roll are free rolls.
[14] When viewed from the axial direction of the cylindrical photomask, the rotation axis of the adhesive roll is an extension of the line connecting the center of the contact portion between the photosensitive layer and the cylindrical photomask and the rotation axis of the cylindrical photomask. The exposure apparatus according to [12] or [13].
[15] The exposure apparatus according to any one of [12] to [14], further comprising pressure adjusting means for adjusting a contact pressure between the cylindrical photomask and the adhesive roll.
[16] The exposure apparatus according to any one of [12] to [15], further comprising pressure adjusting means for adjusting a contact pressure between the photosensitive layer and the cylindrical photomask.
[17] The exposure according to any one of [12] to [14], further comprising pressure adjusting means for adjusting a contact pressure between the cylindrical photomask and the adhesive roll and a contact pressure between the photosensitive layer and the cylindrical photomask. apparatus.
[18] A light-shielding member that is disposed so as to cover the radiation irradiating means and has a slit formed so that radiation is emitted toward the contact portion between the photosensitive layer and the cylindrical photomask,
The pressure adjusting means is arranged so that the width of the contact portion in the direction perpendicular to the axial direction of the cylindrical photomask is larger than the width of the slit in the direction perpendicular to the axial direction of the cylindrical photomask. The exposure apparatus according to [16] or [17], wherein the contact pressure with the cylindrical photomask is adjusted.
[19] The exposure apparatus according to any one of [12] to [18], further comprising a position adjustment unit that adjusts a distance between the rotation axis of the cylindrical photomask and the rotation axis of the adhesive roll.
[20] The exposure apparatus according to any one of [12] to [19], further comprising position adjusting means for adjusting a distance between the surface of the photosensitive layer and the rotation axis of the cylindrical photomask.
[21] A [12] to [20], further comprising a strong adhesive roll which is disposed so as to contact the surface of the adhesive roll and is rotatable about the central axis as a rotation axis and which has higher adhesive strength than the adhesive roll. Any of the exposure equipment.
[22] Extension of a line connecting the center of the contact portion between the photosensitive layer and the cylindrical photomask and the rotational axis of the cylindrical photomask when the rotational axis of the strong adhesive roll is viewed from the axial direction of the cylindrical photomask The exposure apparatus according to [21], which is on a line.
[23] The exposure apparatus according to any one of [12] to [22], wherein the material of the surface of the cylindrical photomask is an elastomer.
[24] The exposure apparatus according to any one of [12] to [23], further comprising a static eliminating unit that neutralizes the surface of the cylindrical photomask after contacting the adhesive roll and before contacting the photosensitive layer.

  According to the exposure method and the exposure apparatus of the present invention, the foreign matter adhering to the surface of the cylindrical photomask can be removed without stopping the operation of the exposure apparatus, and formed on the photosensitive layer by the foreign matter attached to the surface of the cylindrical photomask. Defects are less likely to occur in the latent image pattern.

1 is a schematic cross-sectional view showing an exposure apparatus according to a first embodiment of the present invention. It is the schematic which shows the other example of arrangement | positioning of a cylindrical photomask and each roll. It is the schematic which shows the exposure apparatus which concerns on the 2nd Embodiment of this invention. It is the schematic which shows the exposure apparatus which concerns on the 3rd Embodiment of this invention. It is the schematic which shows the exposure apparatus which concerns on the 4th Embodiment of this invention. It is the schematic which shows the exposure apparatus which concerns on the 5th Embodiment of this invention. It is the schematic which shows the exposure apparatus which concerns on the 6th Embodiment of this invention. It is the schematic which shows the exposure apparatus which concerns on the 7th Embodiment of this invention. It is the schematic which shows the motion of the workpiece | work, cylindrical photomask, and each roll in the exposure apparatus which concerns on the 8th Embodiment of this invention. It is the schematic which shows the motion of the workpiece | work, cylindrical photomask, and each roll in the exposure apparatus which concerns on the 8th Embodiment of this invention. It is the schematic which shows the motion of the workpiece | work, cylindrical photomask, and each roll in the exposure apparatus which concerns on the 8th Embodiment of this invention.

The following definitions of terms apply throughout this specification and the claims.
The “photomask” means a pattern original plate in photolithography, that is, one that can expose the photosensitive layer in a pattern when the photosensitive layer is irradiated with radiation.
“Work” means an object to be exposed in photolithography.
The “latent image pattern” is a pattern composed of an exposed portion and an unexposed portion in the photosensitive layer. A desired pattern is formed by removing one of the exposed portion and the unexposed portion by the development process.
“Radiation” and “light” are generic terms for ultraviolet rays, γ-rays, X-rays, electron beams, and the like.
“Free roll” means a roll that does not have a rotational drive source such as a motor that rotates following the movement of a workpiece, the rotation of another roll, and the like.
The “drive roll” means a roll that can be rotationally driven by a driving force from a rotational drive source such as a motor.
An object does not exist, exists, or reaches below the cylindrical photomask or each roll means that an object does not exist, exists, or reaches below the rotation axis of the cylindrical photomask or each roll. Means.
The distance between the cylindrical photomask and each roll or the distance between each roll means the distance between the rotation axes.

[First Embodiment]
<Exposure device>
FIG. 1 is a schematic sectional view showing an exposure apparatus according to the first embodiment of the present invention.
The exposure apparatus 1 exposes the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 through the cylindrical photomask 10 in contact with the photosensitive layer 104, and the pattern of the cylindrical photomask 10. A latent image pattern corresponding to the above is formed on the photosensitive layer 104.

  The exposure apparatus 1 includes a cylindrical photomask 10 that is rotatable about a central axis as a rotational axis; and a rotational axis of the cylindrical photomask 10 that is rotatable so that the central axis of the cylindrical photomask 10 is in a horizontal direction. A first supporting means (not shown) for supporting; a radiation irradiating means 12 disposed inside the cylindrical photomask 10; and a photosensitive means disposed inside the cylindrical photomask 10 so as to cover the radiation irradiating means 12. A light shielding member 14 in which a slit 14a is formed so that radiation is emitted toward a contact portion between the layer 104 and the cylindrical photomask 10; and a central axis disposed so as to contact the surface of the cylindrical photomask 10; And the rotation axis of the adhesive roll 16 so that the central axis of the adhesive roll 16 is parallel to the central axis of the cylindrical photomask 10. A second support means (not shown) for freely supporting; a strong adhesive roll 18 disposed so as to be in contact with the surface of the adhesive roll 16 and being rotatable about a central axis; Third support means (not shown) for rotatably supporting the rotational axis of the strong adhesive roll 18 so that the central axis is parallel to the central axis of the adhesive roll 16; orthogonal to the axial direction of the cylindrical photomask 10. A stage 20 (moving means) that moves the single-wafer workpiece 100 in the direction; and a static eliminating means 22 that neutralizes the surface of the cylindrical photomask 10 after contacting the adhesive roll 16 and before contacting the photosensitive layer 104. Prepare.

In the exposure apparatus 1, when viewed from the axial direction of the cylindrical photomask 10, the rotation axes of the adhesive roll 16 and the strong adhesive roll 18 are the center of the contact portion between the photosensitive layer 104 and the cylindrical photomask 10 and the cylindrical shape. It is on the extension of the line connecting the rotation axis of the photomask 10.
By arranging each roll in this way, the pressing force of each roll is transmitted to the photosensitive layer 104 via the cylindrical photomask 10, thereby applying a pressure higher than the weight of the cylindrical photomask 10 to the photosensitive layer 104. You can hang it. As a result, a sufficient contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 can be secured.

  On the other hand, as shown in FIG. 2, when the rotation axes of the adhesive roll 16 and the strong adhesive roll 18 deviate from the extension line, the component force b of the pressing force a of each roll is the axial direction of the cylindrical photomask 10. The cylindrical photomask 10 is easily displaced in the direction orthogonal to the axial direction. Therefore, it is necessary to separately provide a restricting means for preventing the cylindrical photomask 10 from shifting in a direction orthogonal to the axial direction. If the rotation axes of the adhesive roll 16 and the strong adhesive roll 18 are on the extension line, it is not necessary to separately provide a regulating means, and the configuration of the exposure apparatus 1 can be simplified.

(Cylindrical photomask)
The cylindrical photomask 10 may be one in which a mask pattern is directly formed on the surface of a cylindrical substrate, and a film on which a mask pattern is formed is attached to the surface of a cylindrical substrate. Also good.

The cylindrical substrate is made of a light transmissive material. Examples of the material of the cylindrical substrate include transparent resin, glass, and synthetic quartz.
The cylindrical photomask 10 is preferably made of an elastomer at least on its surface. If the material of the surface of the cylindrical photomask 10 is an elastomer, (i) the contact portion between the photosensitive layer 104 and the cylindrical photomask 10 has a certain width in a direction perpendicular to the axial direction of the cylindrical photomask 10. (Ii) The photosensitive layer 104 and the cylindrical photomask 10 can be in close contact with each other without any gap. (Iii) The cylindrical photomask 10 does not slip on the surface of the photosensitive layer 104. Therefore, the pattern of the cylindrical photomask 10 can be accurately transferred to the photosensitive layer 104 as a corresponding latent image pattern.
Examples of elastomers include elastomers that transmit ultraviolet rays, such as silicone rubber (polydimethylsiloxane, etc.), fluorine-based transparent elastomers (Afras (registered trademark) manufactured by Asahi Glass Co., Ltd., Kalrez (registered trademark) # 8002 manufactured by DuPont), and the like. It is done.

  The type of the photomask may be any known photomask (for example, the photomask described in Patent Document 1), and is not particularly limited. The type of photomask is a two-tone binary mask consisting of a light-shielding part and a light-transmitting part; a photomask in which a part that changes the phase of light (phase shifter) is formed in a pattern, and passes through the phase shifter Phase shift mask that forms an interference pattern in the photosensitive layer by utilizing the interference phenomenon between the light whose phase has changed and the light that has not changed its phase without passing through the phase shifter; metal nano-particles that generate surface plasmon resonance Examples include a photomask made of a structure.

  The cylindrical photomask 10 may be a free roll or a drive roll. In the case of a driving roll, a rotational drive source such as a motor is separately required, and a speed adjusting means for synchronizing the moving speed of the workpiece 100 and the rotational speed of the cylindrical photomask 10 is additionally required. From the viewpoint of simplifying the configuration of the exposure apparatus 1, the cylindrical photomask 10 is preferably a free roll that rotates following the movement of the workpiece 100.

(Radiation irradiation means)
The radiation irradiation means 12 may be any known radiation irradiation means that can irradiate the photosensitive layer 104 with radiation (for example, a radiation source described in Patent Document 1), and is not particularly limited. For example, radiation supplied from an external radiation source can be emitted from the inside of the cylindrical photomask 10 to the outside by using a lens, a mirror, an optical waveguide, a diffraction grating, and a combination thereof. The radiation source may be disposed inside the cylindrical photomask 10.
The radiation irradiating means 12 is preferably a linear radiation irradiating means from the viewpoint that it can irradiate radiation in a direction (width direction) orthogonal to the moving direction of the workpiece 100.

(Adhesive roll)
The adhesive roll 16 is a roll having adhesiveness on the surface, and removes foreign matters (dust, dust, etc.) adhering to the surface of the cylindrical photomask 10 by contacting the surface of the cylindrical photomask 10. is there.

  The adhesive roll 16 only needs to have a surface adhesive force higher than the surface adhesive force of the cylindrical photomask 10. When the adhesive force of the adhesive roll 16 is smaller than the adhesive force of the cylindrical photomask 10, foreign matter cannot be removed sufficiently. On the other hand, when the adhesive force of the adhesive roll 16 is extremely high, the adhesive roll 16 strongly adheres to the surface of the cylindrical photomask 10, so that the rotation of the cylindrical photomask 10 is obstructed or the cylindrical photomask 10. There is a risk that the surface of the film may peel off. The adhesive force of the adhesive roll 16 is preferably 30 to 90 hPa when the material of the surface of the cylindrical photomask 10 is polydimethylsiloxane.

Examples of the adhesive roll 16 include those having at least a surface material of an elastomer. Examples of the elastomer include silicone rubber, butyl rubber, urethane rubber, nitrile rubber, chloroprene rubber, natural rubber, and ethylene-propylene rubber.
Commercially available adhesive rolls 16 include TEKNEK's cleaners XCH, CM, and SLn; Osada Corporation's FC film cleaner and SC sheet cleaner; Technoroll's clean dash E roll; Miyagawa Roller's mimosa roll Series etc. are mentioned.

  The length of the adhesive roll 16 in the axial direction is preferably equal to or greater than the axial width of the cylindrical photomask 10 in the area (pattern area) where the pattern on the surface of the cylindrical photomask 10 is formed. When the length of the adhesive roll 16 in the axial direction is shorter than the width of the pattern area, the entire area of the pattern area cannot be cleaned, and the area that can be used as a product in the workpiece 100 becomes small.

  The adhesive roll 16 may be a free roll or a drive roll. In the case of the driving roll, a rotational driving source such as a motor is separately required, and a speed adjusting means for synchronizing the rotational speed of the cylindrical photomask 10 and the rotational speed of the adhesive roll 16 is separately required. In view of simplifying the configuration of the exposure apparatus 1, the adhesive roll 16 is preferably a free roll that rotates following the rotation of the cylindrical photomask 10.

(Strong adhesive roll)
The strong adhesive roll 18 is a roll having adhesiveness on the surface, and removes foreign matters (dust, dust, etc.) adhering to the surface of the adhesive roll 16 by contacting the surface of the adhesive roll 16. By having the strong adhesive roll 18, the cylindrical photomask 10 can be cleaned with the adhesive roll 16 for a long time, so that the exposure apparatus 1 can be operated for a long time, and the productivity of the product is improved.

  The strong adhesive roll 18 only needs to have a surface adhesive force equal to or higher than that of the adhesive roll 16 surface. When the adhesive strength of the strong adhesive roll 18 is smaller than the adhesive strength of the adhesive roll 16, foreign matter cannot be removed sufficiently. On the other hand, when the adhesive force of the strong adhesive roll 18 is extremely high, the strong adhesive roll 18 is strongly adhered to the surface of the adhesive roll 16, so that the rotation of the adhesive roll 16 is inhibited or the surface of the adhesive roll 16 is peeled off. There is a risk of doing so. When the material of the surface of the adhesive roll 16 is polydimethylsiloxane, the adhesive strength of the strong adhesive roll 18 is preferably 100 to 300 hPa.

  Examples of the strong adhesive roll 18 include an adhesive film roll in which an adhesive film is wound around a core. When the adhesive force on the surface of the strong adhesive roll 18 is lowered, the surface of the new adhesive film can be exposed by peeling off the outermost adhesive film.

  The axial length of the strong adhesive roll 18 is preferably equal to or greater than the axial length of the adhesive roll 16. When the length of the strong adhesive roll 18 in the axial direction is shorter than the length of the adhesive roll 16 in the axial direction, the entire surface of the adhesive roll 16 cannot be cleaned.

  The strong adhesion roll 18 may be a free roll or a drive roll. In the case of the drive roll, a rotational drive source such as a motor is separately required, and a speed adjusting means for synchronizing the rotational speed of the adhesive roll 16 and the rotational speed of the strong adhesive roll 18 is additionally required. In view of simplifying the configuration of the exposure apparatus 1, the strong adhesive roll 18 is preferably a free roll that rotates following the rotation of the adhesive roll 16.

(Static removal means)
The neutralizing means 22 is for removing charges charged on the surface of the cylindrical photomask 10 that are generated when the adhesive roll 16 and the cylindrical photomask 10 that have been in close contact with each other due to the adhesive force are separated. When the surface of the cylindrical photomask 10 is in a charged state, foreign matter on the surface of the workpiece 100 is more likely to adhere to the surface of the cylindrical photomask 10.
Examples of the static elimination means 22 include a corona static elimination device that blows ions generated by corona discharge onto the surface of the cylindrical photomask 10, and a light irradiation type static elimination device that uses soft X-rays or vacuum ultraviolet rays. In the corona static eliminator, it is preferable to efficiently transport the generated ions to a charged site by using a gas flow such as nitrogen or dry air.

<Exposure method>
In the exposure method using the exposure apparatus 1 according to the first embodiment of the present invention, the cylindrical photo that contacts the photosensitive layer 104 with the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102. In this method, exposure is performed through the mask 10 and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.

(work)
The workpiece 100 includes a single-wafer base material 102 and a photosensitive layer 104 on the surface of the base material 102.
The base material 102 may be appropriately selected according to the type of the target product, and is not particularly limited. Examples of the material of the base material 102 include glass, resin, metal, silicon, and semiconductor device.
The photosensitive layer 104 is not particularly limited as long as it can form a latent image pattern by irradiation with radiation in photolithography. Examples of the material for forming the photosensitive layer 104 include known radiation-sensitive materials such as a photoresist.
The workpiece 100 preferably has a chamfered ridge angle in order to suppress damage to the surface of the cylindrical photomask 10 when it collides with the cylindrical photomask 10.

(exposure)
While moving the stage 20 on which the workpiece 100 is placed in a direction orthogonal to the axial direction of the cylindrical photomask 10, the photosensitive layer 104 and the cylindrical photomask 10 are brought into contact with each other to follow the movement of the workpiece 100. Then, the cylindrical photomask 10 is rotated on the surface of the photosensitive layer 104.
At this time, radiation is emitted from the radiation irradiating means 12 disposed inside the cylindrical photomask 10. Most of the radiation emitted from the radiation irradiating means 12 is shielded by the light shielding member 14, and the radiation is directed only from the slit 14 a formed in the light shielding member 14 toward the contact portion between the photosensitive layer 104 and the cylindrical photomask 10. Emitted. The radiation emitted from the slit 14 a passes through the cylindrical photomask 10 and is irradiated onto the photosensitive layer 104.
In this way, the photosensitive layer 104 is exposed through the cylindrical photomask 10, and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.

(cleaning)
At least while the photosensitive layer 104 and the cylindrical photomask 10 are in contact, the adhesive roll 16 is brought into contact with the surface of the cylindrical photomask 10 to rotate following the rotation of the cylindrical photomask 10, The surface of the cylindrical photomask 10 is cleaned.
At this time, the strong adhesive roll 18 is brought into contact with the surface of the adhesive roll 16 to rotate following the rotation of the adhesive roll 16 to further clean the surface of the adhesive roll 16.

(Static elimination)
When the pressure-sensitive adhesive roll 16 and the cylindrical photomask 10 that are in close contact with each other due to the adhesive force are separated from each other, an electric charge is generated on the surface of the cylindrical photomask 10 and is charged.
Therefore, the surface of the cylindrical photomask 10 is sprayed onto the surface of the cylindrical photomask 10 after being in contact with the adhesive roll 16 and before being in contact with the photosensitive layer 104, by blowing a gas containing ions from the nozzle of the static eliminating means 22. Remove the charge.

<Action mechanism>
In the first embodiment of the present invention described above, the cylindrical photomask 10 is moved on the surface of the photosensitive layer 104 by bringing the photosensitive layer 104 into contact with the cylindrical photomask 10 while moving the workpiece 100. At the same time, the surface of the cylindrical photomask 10 is cleaned by the adhesive roll 16 that rotates while contacting the surface of the cylindrical photomask 10 while irradiating the photosensitive layer 104 with radiation from the radiation irradiation means 12. Yes. Therefore, the foreign matter adhering to the surface of the cylindrical photomask 10 can be removed without stopping the operation of the exposure apparatus 1. Further, since the foreign matter attached to the surface of the cylindrical photomask 10 is always removed, the latent image pattern formed on the photosensitive layer 104 has a defect derived from the foreign matter attached to the surface of the cylindrical photomask 10. Is unlikely to occur.

  In the first embodiment of the present invention described above, the surface of the adhesive roll 16 is cleaned by the strong adhesive roll 18 that rotates in contact with the surface of the adhesive roll 16. The cylindrical photomask 10 can be cleaned for a long time. Therefore, the exposure apparatus 1 can be operated for a long time, and the productivity of the product is improved.

  Further, in the first embodiment of the present invention described above, when viewed from the axial direction of the cylindrical photomask 10, the rotation axes of the adhesive roll 16 and the strong adhesive roll 18 are the photosensitive layer 104 and the cylindrical photomask. Since it is on the extension line of the line connecting the center of the contact portion with the mask 10 and the rotation axis of the cylindrical photomask 10, the pressing force of each roll is also transmitted to the photosensitive layer 104 through the cylindrical photomask 10. Therefore, a pressure higher than the weight of the cylindrical photomask 10 can be applied to the photosensitive layer 104. As a result, a sufficient contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 can be secured. Further, it is not necessary to separately provide a restricting means for preventing the cylindrical photomask 10 from shifting in a direction orthogonal to the axial direction, and the configuration of the exposure apparatus 1 can be simplified.

  Further, in the first embodiment of the present invention described above, the surface of the cylindrical photomask 10 after contact with the adhesive roll 16 and before contact with the photosensitive layer 104 is neutralized by the neutralization means 22. Therefore, the foreign matter on the surface of the workpiece 100 becomes more difficult to adhere to the surface of the cylindrical photomask 10.

[Second Embodiment]
<Exposure device>
FIG. 3 is a schematic view showing an exposure apparatus according to the second embodiment of the present invention.
The exposure apparatus 2 exposes the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 through the cylindrical photomask 10 in contact with the photosensitive layer 104, and the pattern of the cylindrical photomask 10. A latent image pattern corresponding to the above is formed on the photosensitive layer 104.

The exposure apparatus 2 includes a cylindrical photomask 10 that is rotatable about a central axis as a rotational axis; and a rotational axis of the cylindrical photomask 10 that is rotatable so that the central axis of the cylindrical photomask 10 is in a horizontal direction. First supporting means (not shown) for supporting; radiation irradiating means (not shown) arranged inside the cylindrical photomask 10; and arranged inside the cylindrical photomask 10 so as to cover the radiation irradiating means. A light-shielding member (not shown) in which a slit is formed so that radiation is emitted toward the contact portion between the photosensitive layer 104 and the cylindrical photomask 10; and a contact with the surface of the cylindrical photomask 10. An adhesive roll 16 that is rotatable about the central axis as a rotation axis; and the rotation axis of the adhesive roll 16 is set so that the central axis of the adhesive roll 16 is parallel to the central axis of the cylindrical photomask 10. A second support means (not shown) that supports the roll; a first pressure adjustment means 30 that adjusts the contact pressure between the cylindrical photomask 10 and the adhesive roll 16; and an axial direction of the cylindrical photomask 10. And a stage 20 (moving means) that moves the single-wafer workpiece 100 in a direction orthogonal to each other.
Hereinafter, components having the same configuration as the exposure apparatus according to the first embodiment are denoted by the same reference numerals when illustrated. Detailed description of the same configuration as that of the exposure apparatus according to the first embodiment is omitted.

(First pressure adjusting means)
The first pressure adjusting means 30 includes a pressure adjusting unit 32; an arm unit 34 that connects the pressure adjusting unit 32 and the rotating shaft of the cylindrical photomask 10; and a pressure adjusting unit 32 and the rotating shaft of the adhesive roll 16. And an arm portion 36 to be connected.
The pressure adjusting unit 32 senses the pressure between the arm unit 34 and the arm unit 36 and adjusts the pressure between the arm unit 34 and the arm unit 36 to a predetermined pressure. Examples of the mechanism for adjusting the pressure in the pressure adjusting unit 32 include a spring mechanism, a gas pressure mechanism, and a hydraulic mechanism.

<Exposure method>
In the exposure method using the exposure apparatus 2 according to the second embodiment of the present invention, the cylindrical photo that contacts the photosensitive layer 104 with the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 is used. In this method, exposure is performed through the mask 10 and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.
Hereinafter, detailed description of the same operation as the exposure method according to the first embodiment will be omitted.

(Pressure adjustment)
While the cylindrical photomask 10 and the adhesive roll 16 are in contact, the first pressure adjusting means 30 senses the pressure between the arm portion 34 and the arm portion 36, and the arm portion 34 and the arm portion 36 are detected. Is adjusted to a predetermined pressure. As a result, the contact pressure between the cylindrical photomask 10 connected to each arm and the adhesive roll 16 is adjusted.

<Action mechanism>
The second embodiment of the present invention described above has the same configuration as the first embodiment, and when the same operation as the first embodiment is performed, the same action as the first embodiment. Demonstrate the mechanism.
In the second embodiment of the present invention described above, since the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 is adjusted by the first pressure adjusting means 30, the cylindrical photomask. The cylindrical photomask 10 can be cleaned by the adhesive roll 16 with a predetermined pressing force by buffering the thickness deviation and rotation deviation of 10 at all times. In addition, since the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 can be set arbitrarily, the pressure can be adjusted within a range where a sufficient cleaning effect can be maintained and deformation of the cylindrical photomask 10 due to pressure contact can be reduced. it can.

[Third Embodiment]
<Exposure device>
FIG. 4 is a schematic view showing an exposure apparatus according to the third embodiment of the present invention.
The exposure apparatus 3 exposes the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 through the cylindrical photomask 10 in contact with the photosensitive layer 104, and the pattern of the cylindrical photomask 10. A latent image pattern corresponding to the above is formed on the photosensitive layer 104.

The exposure apparatus 3 includes a cylindrical photomask 10 that is rotatable about a central axis as a rotational axis; and a rotational axis of the cylindrical photomask 10 that is rotatable so that the central axis of the cylindrical photomask 10 is in a horizontal direction. First supporting means (not shown) for supporting; radiation irradiating means (not shown) arranged inside the cylindrical photomask 10; and arranged inside the cylindrical photomask 10 so as to cover the radiation irradiating means. A light-shielding member (not shown) in which a slit is formed so that radiation is emitted toward the contact portion between the photosensitive layer 104 and the cylindrical photomask 10; and a contact with the surface of the cylindrical photomask 10. An adhesive roll 16 that is rotatable about the central axis as a rotation axis; and the rotation axis of the adhesive roll 16 is set so that the central axis of the adhesive roll 16 is parallel to the central axis of the cylindrical photomask 10. A second supporting means (not shown) for supporting the roll; second pressure for adjusting the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 and the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10; A pressure adjusting means 40; and a stage 20 (moving means) for moving the single-wafer workpiece 100 in a direction orthogonal to the axial direction of the cylindrical photomask 10.
Hereinafter, components having the same configuration as the exposure apparatus according to the first embodiment are denoted by the same reference numerals when illustrated. Detailed description of the same configuration as that of the exposure apparatus according to the first embodiment is omitted.

(Second pressure adjusting means)
The second pressure adjusting means 40 includes a pressure adjusting unit 42; an arm unit 44 that connects the pressure adjusting unit 42 and the apparatus main body 24; and an arm unit 46 that connects the pressure adjusting unit 42 and the rotation shaft of the adhesive roll 16. And have.
The pressure adjusting unit 42 senses the pressure between the arm unit 44 and the arm unit 46 and adjusts the pressure between the arm unit 44 and the arm unit 46 to a predetermined pressure. Examples of the mechanism for adjusting the pressure in the pressure adjusting unit 42 include a spring mechanism, a gas pressure mechanism, and a hydraulic mechanism.

  In the second pressure adjusting means 40, the width of the contact portion between the photosensitive layer 104 and the cylindrical photomask 10 in the direction perpendicular to the axial direction of the cylindrical photomask 10 is a slit (not shown, FIG. 1). The contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 is preferably adjusted to be larger than the width in the direction orthogonal to the axial direction of the cylindrical photomask 10 of reference numeral 14a).

<Exposure method>
In the exposure method using the exposure apparatus 3 according to the third embodiment of the present invention, the cylindrical photo that contacts the photosensitive layer 104 with the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 is used. In this method, exposure is performed through the mask 10 and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.
Hereinafter, detailed description of the same operation as the exposure method according to the first embodiment will be omitted.

(Pressure adjustment)
While the cylindrical photomask 10 and the adhesive roll 16 are in contact with each other, and the photosensitive layer 104 and the cylindrical photomask 10 are in contact with each other, the second pressure adjusting means 40 causes the arm portion 44 and the arm portion 46 to move. The pressure between the arm portion 44 and the arm portion 46 is adjusted to a predetermined pressure. Accordingly, the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 and the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 between the apparatus main body 24 and the adhesive roll 16 to which each arm unit is connected. Adjust.

  Specifically, the width of the contact portion between the photosensitive layer 104 and the cylindrical photomask 10 in the direction perpendicular to the axial direction of the cylindrical photomask 10 is adjusted by the second pressure adjusting means 40 to the slit ( It is possible to adjust the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 so as to be larger than the width in the direction orthogonal to the axial direction of the cylindrical photomask 10 (not shown, reference numeral 14a in FIG. 1). preferable.

<Action mechanism>
The third embodiment of the present invention described above has the same configuration as that of the first embodiment, and when the same operation as that of the first embodiment is performed, the same action as that of the first embodiment. Demonstrate the mechanism.
In the third embodiment of the present invention described above, the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 and the photosensitive layer 104 and the cylindrical photomask 10 are adjusted by the second pressure adjusting means 40. The contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 can be adjusted at the same time while cleaning the cylindrical photomask 10 with the adhesive roll 16. Further, the thickness deviation and rotation deviation of the workpiece 100 and the cylindrical photomask 10 are buffered, the contact pressure between the cylindrical photomask 10 and the adhesive roll 16, and the photosensitive layer 104 and the cylindrical photomask 10. Can be maintained at a predetermined pressure. In addition, since the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 can be set arbitrarily, the pressure can be adjusted within a range that can maintain a sufficient cleaning effect and can reduce deformation of the cylindrical photomask 10 due to pressure contact. it can.

  In the third embodiment of the present invention described above, the axial direction of the cylindrical photomask 10 at the contact portion between the photosensitive layer 104 and the cylindrical photomask 10 by the second pressure adjusting means 40. The photosensitive layer 104 and the cylinder are arranged such that the width in the direction perpendicular to the slit is larger than the width in the direction perpendicular to the axial direction of the cylindrical photomask 10 of the slit (not shown, reference numeral 14a in FIG. 1) of the light shielding member. Since the contact pressure with the photomask 10 is adjusted, the pattern of the cylindrical photomask 10 can be accurately transferred to the photosensitive layer 104 as a corresponding latent image pattern.

[Fourth Embodiment]
<Exposure device>
FIG. 5 is a schematic view showing an exposure apparatus according to the fourth embodiment of the present invention.
The exposure apparatus 4 exposes the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 through the cylindrical photomask 10 in contact with the photosensitive layer 104, and the pattern of the cylindrical photomask 10. A latent image pattern corresponding to the above is formed on the photosensitive layer 104.

The exposure apparatus 4 includes a cylindrical photomask 10 that is rotatable about a central axis as a rotational axis; and a rotational axis of the cylindrical photomask 10 that is rotatable so that the central axis of the cylindrical photomask 10 is in a horizontal direction. First supporting means (not shown) for supporting; radiation irradiating means (not shown) arranged inside the cylindrical photomask 10; and arranged inside the cylindrical photomask 10 so as to cover the radiation irradiating means. A light-shielding member (not shown) in which a slit is formed so that radiation is emitted toward the contact portion between the photosensitive layer 104 and the cylindrical photomask 10; and a contact with the surface of the cylindrical photomask 10. An adhesive roll 16 that is rotatable about the central axis as a rotation axis; and the rotation axis of the adhesive roll 16 is set so that the central axis of the adhesive roll 16 is parallel to the central axis of the cylindrical photomask 10. A second supporting means (not shown) for supporting the roll; a first pressure adjusting means 30 for adjusting a contact pressure between the cylindrical photomask 10 and the adhesive roll 16; a photosensitive layer 104 and the cylindrical photomask 10; And a stage 20 (moving means) that moves the single-wafer workpiece 100 in a direction orthogonal to the axial direction of the cylindrical photomask 10.
Hereinafter, components having the same configuration as the exposure apparatus according to the first and second embodiments are denoted by the same reference numerals when illustrated. Detailed descriptions of the same configuration as the exposure apparatus according to the first and second embodiments are omitted.

(Third pressure adjusting means)
The third pressure adjusting means 50 includes a pressure adjusting unit 52; an arm unit 54 that connects the pressure adjusting unit 52 and the apparatus main body 24; and an arm unit 56 that connects the pressure adjusting unit 52 and the rotating shaft of the adhesive roll 16. And have.
The pressure adjusting unit 52 senses the pressure between the arm unit 54 and the arm unit 56 and adjusts the pressure between the arm unit 54 and the arm unit 56 to a predetermined pressure. Examples of the mechanism for adjusting the pressure in the pressure adjusting unit 52 include a spring mechanism, a gas pressure mechanism, and a hydraulic mechanism.

  In the third pressure adjusting means 50, the width of the contact portion between the photosensitive layer 104 and the cylindrical photomask 10 in the direction perpendicular to the axial direction of the cylindrical photomask 10 is a slit (not shown, FIG. 1). The contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 is preferably adjusted to be larger than the width in the direction orthogonal to the axial direction of the cylindrical photomask 10 of reference numeral 14a).

<Exposure method>
In the exposure method using the exposure apparatus 4 according to the fourth embodiment of the present invention, a cylindrical photo that contacts the photosensitive layer 104 with the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the base material 102. In this method, exposure is performed through the mask 10 and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.
Hereinafter, detailed description of the same operation as the exposure method according to the first and second embodiments is omitted.

(Pressure adjustment)
While the photosensitive layer 104 and the cylindrical photomask 10 are in contact with each other, the pressure between the arm portion 54 and the arm portion 56 is sensed by the third pressure adjusting means 50, and the arm portion 54 and the arm portion 56 are detected. Is adjusted to a predetermined pressure. As a result, the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 between the apparatus main body 24 to which each arm unit is connected and the cylindrical photomask 10 is adjusted.

  Specifically, the width of the contact portion between the photosensitive layer 104 and the cylindrical photomask 10 in the direction perpendicular to the axial direction of the cylindrical photomask 10 is adjusted by the third pressure adjusting unit 50 to the slit ( It is possible to adjust the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 so as to be larger than the width in the direction orthogonal to the axial direction of the cylindrical photomask 10 (not shown, reference numeral 14a in FIG. 1). preferable.

<Action mechanism>
The fourth embodiment of the present invention described above has the same configuration as that of the first and second embodiments, and when the same operation as that of the first and second embodiments is performed, The same mechanism of action is exhibited.
In the fourth embodiment of the present invention described above, since the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 is adjusted by the third pressure adjusting means 50, the thickness of the workpiece 100 is increased. The deviation and the thickness deviation or rotation deviation of the cylindrical photomask 10 can be buffered to maintain the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 at a predetermined pressure.
In the fourth embodiment of the present invention described above, the first pressure adjusting means 30 adjusts the contact pressure between the cylindrical photomask 10 and the adhesive roll 16, and the third pressure adjusting means 50. Since the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 is adjusted by the above, the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 and the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 are adjusted. Each can be adjusted independently.

  Further, in the fourth embodiment of the present invention described above, the axial direction of the cylindrical photomask 10 at the contact portion between the photosensitive layer 104 and the cylindrical photomask 10 by the third pressure adjusting means 50. The photosensitive layer 104 and the cylinder are arranged such that the width in the direction perpendicular to the slit is larger than the width in the direction perpendicular to the axial direction of the cylindrical photomask 10 of the slit (not shown, reference numeral 14a in FIG. 1) of the light shielding member. Since the contact pressure with the photomask 10 is adjusted, the pattern of the cylindrical photomask 10 can be accurately transferred to the photosensitive layer 104 as a corresponding latent image pattern.

[Fifth Embodiment]
<Exposure device>
FIG. 6 is a schematic view showing an exposure apparatus according to the fifth embodiment of the present invention.
The exposure apparatus 5 exposes the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 through the cylindrical photomask 10 in contact with the photosensitive layer 104, and the pattern of the cylindrical photomask 10. A latent image pattern corresponding to the above is formed on the photosensitive layer 104.

The exposure apparatus 5 includes a cylindrical photomask 10 that is rotatable about a central axis as a rotational axis; and a rotational axis of the cylindrical photomask 10 that is rotatable so that the central axis of the cylindrical photomask 10 is in a horizontal direction. First supporting means (not shown) for supporting; radiation irradiating means (not shown) arranged inside the cylindrical photomask 10; and arranged inside the cylindrical photomask 10 so as to cover the radiation irradiating means. A light-shielding member (not shown) in which a slit is formed so that radiation is emitted toward the contact portion between the photosensitive layer 104 and the cylindrical photomask 10; and a contact with the surface of the cylindrical photomask 10. An adhesive roll 16 that is rotatable about the central axis as a rotation axis; and the rotation axis of the adhesive roll 16 is set so that the central axis of the adhesive roll 16 is parallel to the central axis of the cylindrical photomask 10. A second supporting means (not shown) for supporting the roll; a first position adjusting means 60 for adjusting the distance between the rotating shaft of the cylindrical photomask 10 and the rotating shaft of the adhesive roll 16; and the cylindrical photomask. And a stage 20 (moving means) for moving the single-wafer workpiece 100 in a direction orthogonal to the ten axial directions.
Hereinafter, components having the same configuration as the exposure apparatus according to the first embodiment are denoted by the same reference numerals when illustrated. Detailed description of the same configuration as that of the exposure apparatus according to the first embodiment is omitted.

(First position adjusting means)
The first position adjusting means 60 includes: a position adjusting unit 62; an arm unit 64 that connects the position adjusting unit 62 and the rotating shaft of the cylindrical photomask 10; and a position adjusting unit 62 and the rotating shaft of the adhesive roll 16. And an arm portion 66 to be connected.
The position adjusting unit 62 senses the distance between the arm unit 64 and the arm unit 66, and keeps the distance between the arm unit 64 and the arm unit 66 constant. Examples of the mechanism for adjusting the distance in the position adjusting unit 62 include a micro gauge.

<Exposure method>
In the exposure method using the exposure apparatus 5 according to the fifth embodiment of the present invention, a cylindrical photo that contacts the photosensitive layer 104 with the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102. In this method, exposure is performed through the mask 10 and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.
Hereinafter, detailed description of the same operation as the exposure method according to the first embodiment will be omitted.

(Positioning)
While the cylindrical photomask 10 and the adhesive roll 16 are in contact, the first position adjusting means 60 senses the distance between the arm part 64 and the arm part 66, and the arm part 64 and the arm part 66 are detected. The distance between the two is kept constant. As a result, the distance between the rotation axis of the cylindrical photomask 10 connected to each arm and the rotation axis of the adhesive roll 16 is kept constant.

<Action mechanism>
The fifth embodiment of the present invention described above has the same configuration as that of the first embodiment, and when the same operation as that of the first embodiment is performed, the same action as that of the first embodiment. Demonstrate the mechanism.
In the fifth embodiment of the present invention described above, the distance between the rotating shaft of the cylindrical photomask 10 and the rotating shaft of the adhesive roll 16 is kept constant by the first position adjusting means 60. Therefore, the cylindrical photomask 10 can always be cleaned by the adhesive roll 16 with a predetermined pressing force. In addition, since the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 can be set arbitrarily, the pressure can be adjusted within a range where a sufficient cleaning effect can be maintained and deformation of the cylindrical photomask 10 due to pressure contact can be reduced. it can.

[Sixth Embodiment]
<Exposure device>
FIG. 7 is a schematic view showing an exposure apparatus according to the sixth embodiment of the present invention.
The exposure apparatus 6 exposes the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 through the cylindrical photomask 10 in contact with the photosensitive layer 104, and the pattern of the cylindrical photomask 10. A latent image pattern corresponding to the above is formed on the photosensitive layer 104.

The exposure apparatus 6 includes a cylindrical photomask 10 that is rotatable about a central axis as a rotation axis; and a rotational axis of the cylindrical photomask 10 that is rotatable so that the central axis of the cylindrical photomask 10 is in a horizontal direction. First supporting means (not shown) for supporting; radiation irradiating means (not shown) arranged inside the cylindrical photomask 10; and arranged inside the cylindrical photomask 10 so as to cover the radiation irradiating means. A light-shielding member (not shown) in which a slit is formed so that radiation is emitted toward the contact portion between the photosensitive layer 104 and the cylindrical photomask 10; and a contact with the surface of the cylindrical photomask 10. An adhesive roll 16 that is rotatable about the central axis as a rotation axis; and the rotation axis of the adhesive roll 16 is set so that the central axis of the adhesive roll 16 is parallel to the central axis of the cylindrical photomask 10. A second support means (not shown) that supports the roll; the distance between the rotation axis of the cylindrical photomask 10 and the rotation axis of the adhesive roll 16; and the surface of the photosensitive layer 104 and the rotation axis of the cylindrical photomask 10; And a stage 20 (moving means) for moving the single-wafer workpiece 100 in a direction orthogonal to the axial direction of the cylindrical photomask 10.
Hereinafter, components having the same configuration as the exposure apparatus according to the first embodiment are denoted by the same reference numerals when illustrated. Detailed description of the same configuration as that of the exposure apparatus according to the first embodiment is omitted.

(Second position adjusting means)
The second position adjusting means 70 includes: a position adjusting unit 72; an arm unit 74 that connects the position adjusting unit 72 and the apparatus main body 24; an arm unit 76 that connects the position adjusting unit 72 and the rotating shaft of the adhesive roll 16. And have.
The position adjusting unit 72 senses the distance between the arm unit 74 and the arm unit 76 and keeps the distance between the arm unit 74 and the arm unit 76 constant. Examples of the mechanism for adjusting the position in the position adjustment unit 72 include a micro gauge.

<Exposure method>
In the exposure method using the exposure apparatus 6 according to the sixth embodiment of the present invention, a cylindrical photo that contacts the photosensitive layer 104 with the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102. In this method, exposure is performed through the mask 10 and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.
Hereinafter, detailed description of the same operation as the exposure method according to the first embodiment will be omitted.

(Positioning)
While the cylindrical photomask 10 and the adhesive roll 16 are in contact with each other, and the photosensitive layer 104 and the cylindrical photomask 10 are in contact with each other, the second position adjusting means 70 causes the arm portion 74 and the arm portion 76 to move. The distance between the arm portion 74 and the arm portion 76 is kept constant. As a result, the distance between the rotation axis of the cylindrical photomask 10 and the rotation axis of the adhesive roll 16, and the surface of the photosensitive layer 104 and the cylindrical shape, between the apparatus main body 24 to which each arm portion is connected and the adhesive roll 16. The distance from the rotation axis of the photomask 10 is kept constant.

<Action mechanism>
In the sixth embodiment of the present invention described above, when it has the same configuration as the first embodiment and performs the same operation as the first embodiment, the same action as the first embodiment. Demonstrate the mechanism.
In the sixth embodiment of the present invention described above, the distance between the rotation axis of the cylindrical photomask 10 and the rotation axis of the adhesive roll 16 and the photosensitive layer 104 are adjusted by the second position adjusting means 70. Since the distance between the surface and the rotation axis of the cylindrical photomask 10 is kept constant, the surface of the photosensitive layer 104 and the rotation of the cylindrical photomask 10 are simultaneously rotated while cleaning the cylindrical photomask 10 by the adhesive roll 16. The distance from the shaft can be kept constant. Further, the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 and the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 can be maintained at predetermined pressures. In addition, since the contact pressure between the cylindrical photomask 10 and the adhesive roll 16 can be set arbitrarily, the pressure can be adjusted within a range where a sufficient cleaning effect can be maintained and deformation of the cylindrical photomask 10 due to pressure contact can be reduced. it can.

[Seventh Embodiment]
<Exposure device>
FIG. 8 is a schematic view showing an exposure apparatus according to the seventh embodiment of the present invention.
The exposure apparatus 7 exposes the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 through the cylindrical photomask 10 in contact with the photosensitive layer 104, and the pattern of the cylindrical photomask 10. A latent image pattern corresponding to the above is formed on the photosensitive layer 104.

The exposure apparatus 7 includes a cylindrical photomask 10 that is rotatable about a central axis as a rotation axis; and a rotation axis of the cylindrical photomask 10 that is rotatable so that the central axis of the cylindrical photomask 10 is in a horizontal direction. First supporting means (not shown) for supporting; radiation irradiating means (not shown) arranged inside the cylindrical photomask 10; and arranged inside the cylindrical photomask 10 so as to cover the radiation irradiating means. A light-shielding member (not shown) in which a slit is formed so that radiation is emitted toward the contact portion between the photosensitive layer 104 and the cylindrical photomask 10; and a contact with the surface of the cylindrical photomask 10. An adhesive roll 16 that is rotatable about the central axis as a rotation axis; and the rotation axis of the adhesive roll 16 is set so that the central axis of the adhesive roll 16 is parallel to the central axis of the cylindrical photomask 10. A second support means (not shown) that supports the roll; a first position adjustment means 60 that adjusts the distance between the rotation axis of the cylindrical photomask 10 and the rotation axis of the adhesive roll 16; A third position adjusting means 80 for adjusting the distance between the surface and the rotational axis of the cylindrical photomask 10; a stage 20 for moving the single-wafer workpiece 100 in a direction perpendicular to the axial direction of the cylindrical photomask 10 (movement) Means).
Hereinafter, components having the same configuration as the exposure apparatus according to the first and fifth embodiments are denoted by the same reference numerals when illustrated. Further, detailed description of the same configuration as the exposure apparatus according to the first and fifth embodiments is omitted.

(Third position adjusting means)
The third position adjusting means 80 includes: a position adjusting unit 82; an arm unit 84 that connects the position adjusting unit 82 and the apparatus main body 24; an arm unit 86 that connects the position adjusting unit 82 and the rotation shaft of the adhesive roll 16. And have.
The position adjusting unit 82 senses the distance between the arm unit 84 and the arm unit 86, and keeps the distance between the arm unit 84 and the arm unit 86 constant. Examples of the mechanism for adjusting the distance in the position adjusting unit 82 include a micro gauge.

<Exposure method>
In the exposure method using the exposure apparatus 7 according to the seventh embodiment of the present invention, a cylindrical photo that contacts the photosensitive layer 104 with the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the base material 102. In this method, exposure is performed through the mask 10 and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.
Hereinafter, detailed description of the same operation as the exposure method according to the first and fifth embodiments is omitted.

(Positioning)
While the photosensitive layer 104 and the cylindrical photomask 10 are in contact with each other, the distance between the arm portion 84 and the arm portion 86 is sensed by the third position adjusting means 80, and the arm portion 84 and the arm portion 86 are detected. The distance between the two is kept constant. As a result, the distance between the surface of the photosensitive layer 104 and the rotational axis of the cylindrical photomask 10 between the apparatus main body 24 to which each arm unit is connected and the cylindrical photomask 10 is kept constant.

<Action mechanism>
In the seventh embodiment of the present invention described above, the first and fifth embodiments have the same configuration as the first and fifth embodiments and perform the same operation as the first and fifth embodiments. The same mechanism of action is exhibited.
In the seventh embodiment of the present invention described above, the distance between the surface of the photosensitive layer 104 and the rotation axis of the cylindrical photomask 10 is kept constant by the third position adjusting means 80. Therefore, the contact pressure between the photosensitive layer 104 and the cylindrical photomask 10 can be maintained at a predetermined pressure.
Further, in the seventh embodiment of the present invention described above, the first position adjusting means 60 adjusts the distance between the rotation axis of the cylindrical photomask 10 and the rotation axis of the adhesive roll 16, and Since the distance between the surface of the photosensitive layer 104 and the rotation axis of the cylindrical photomask 10 is adjusted by the position adjusting means 80, the contact pressure between the cylindrical photomask 10 and the adhesive roll 16, and the photosensitive layer 104 and the cylinder are adjusted. The contact pressure with the photomask 10 can be adjusted independently.

[Eighth Embodiment]
<Exposure device>
FIG. 9 is a schematic view showing an exposure apparatus according to the eighth embodiment of the present invention.
The exposure apparatus 8 exposes the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102 through the cylindrical photomask 10 in contact with the photosensitive layer 104, and the pattern of the cylindrical photomask 10. A latent image pattern corresponding to the above is formed on the photosensitive layer 104.
In the exposure apparatus 8, the single-wafer first dummy base material 106 is disposed adjacent to the front of the single-wafer workpiece 100 on the side that first contacts the cylindrical photomask 10. A second dummy substrate 108 of a single wafer is disposed adjacent to the rear side of the side that comes into contact with the cylindrical photomask 10 last.

  The exposure apparatus 8 includes a work chamber 90 for placing the work 100 on the stage 20 (moving means) and removing the work 100 from the stage 20 (moving means); and the cylindrical photomask 10 for the photosensitive layer 104 of the work 100. An exposure chamber 92 that exposes the work chamber 90; a partition plate 94 that divides the work chamber 90 and the exposure chamber 92; a clean air supply device 96 that is attached to an air supply port of the exposure chamber 92; and a work 100 to the work chamber 90 A work door 98 for carrying in and taking out the work from the work chamber 90; and in a direction orthogonal to the axial direction of the cylindrical photomask 10 and the work adhesive roll 26, and between the work chamber 90 and the exposure chamber 92. A stage 20 (moving means) that moves the single-wafer workpiece 100;

The exposure chamber 92 of the exposure apparatus 8 includes a cylindrical photomask 10 that is rotatable about a central axis as a rotation axis; and the cylindrical photomask 10 is rotated so that the central axis of the cylindrical photomask 10 is in a horizontal direction. A first support means (not shown) for rotatably supporting the shaft; a radiation irradiation means (not shown) disposed inside the cylindrical photomask 10; and the cylindrical photomask 10 so as to cover the radiation irradiation means A light-shielding member (not shown) having a slit so that radiation is emitted toward the contact portion between the photosensitive layer 104 and the cylindrical photomask 10; and on the surface of the cylindrical photomask 10. An adhesive roll 16 disposed so as to be in contact with and rotatable about a central axis as a rotation axis; an adhesive roll so that the central axis of the adhesive roll 16 is parallel to the central axis of the cylindrical photomask 10 A second support means (not shown) for rotatably supporting the rotation shaft 6; a strong adhesive roll 18 disposed so as to contact the surface of the adhesive roll 16 and rotatable about the central axis as a rotation axis; A third support means (not shown) for rotatably supporting the rotational axis of the strong adhesive roll 18 so that the central axis of the strong adhesive roll 18 is parallel to the central axis of the adhesive roll 16; So that the surface of the photosensitive layer 104 can be contacted before contact with the cylindrical photomask 10 and the distance from the cylindrical photomask 10 is shorter than the length of the workpiece 100 and the length of the first dummy substrate 106. A work adhesive roll 26 disposed and rotatable about the central axis as a rotation axis; and the rotation axis of the work adhesive roll 26 is rotatably supported so that the center axis of the work adhesive roll 26 is in a horizontal direction. Four support means (not shown); a work strong adhesive roll 28 disposed so as to be in contact with the surface of the work adhesive roll 26 and rotatable about the central axis; and a work strong adhesive roll 28 A fifth support means (not shown) for rotatably supporting the rotational axis of the strong adhesive roll 28 for work so that the central axis of the adhesive is parallel to the central axis of the adhesive roll 26 for work; First elevating means (not shown) for elevating and lowering the adhesive roll 16 and the strong adhesive roll 18; second elevating means (not shown) for elevating and lowering the work adhesive roll 26 and the work strong adhesive roll 28; Control means (not shown) for controlling the lifting means and the second lifting means.
Hereinafter, components having the same configuration as the exposure apparatus according to the first embodiment are denoted by the same reference numerals when illustrated. Detailed description of the same configuration as that of the exposure apparatus according to the first embodiment is omitted.

(Work room, exposure room)
The exposure apparatus 8 is divided into a work chamber 90 and an exposure chamber 92 by a partition plate 94. Providing the partition plate 94 prevents foreign matter from adhering to the cylindrical photomask 10 when placing the workpiece 100 on the stage 20 and removing the workpiece 100 from the stage 20.
By attaching a clean air supply device 96 (hepa filter air cleaner or the like) to the air supply port of the exposure chamber 92, the exposure chamber 92 is made into a clean booth. Further, by setting the exposure chamber 92 to a positive pressure, it is difficult for air containing foreign matter to flow into the exposure chamber 92 from the work chamber 90.

(Work pressure-sensitive adhesive roll, Work pressure-sensitive adhesive roll)
What is necessary is just to use the thing similar to the adhesive roll 16 as the adhesive roll 26 for workpiece | work.
As the work strong adhesive roll 28, the same one as the strong adhesive roll 18 may be used.

(Control means)
The control means controls the first lifting means and the second lifting means, and causes each lifting means to perform the following operation.
(I) When the workpiece 100, the first dummy base material 106, and the second dummy base material 108 do not exist below the cylindrical photomask 10, the cylindrical photomask 10, the adhesive roll 16, the strong adhesive roll 18, and The work pressure-sensitive adhesive roll 26 and the work pressure-sensitive adhesive roll 28 are raised, and the cylindrical photomask 10 and the work pressure-sensitive adhesive roll 26 are retracted to a position higher than the surface of the photosensitive layer 104.
(II) When the first dummy substrate 106 exists below the cylindrical photomask 10, the cylindrical photomask 10, the adhesive roll 16 and the strong adhesive roll 18, and the workpiece adhesive roll 26 and the workpiece strong adhesive The roll 28 is lowered to bring the cylindrical photomask 10 and the work adhesive roll 26 into contact with the surface of the first dummy base 106.
(III) After the cylindrical photomask 10 and the work adhesive roll 26 are brought into contact with the surface of the first dummy base 106, the photosensitive layer 104 of the work 100, the cylindrical photomask 10 and the work adhesive roll 26 Contact.
(IV) When the second dummy base material 108 exists below the cylindrical photomask 10, the cylindrical photomask 10, the adhesive roll 16 and the strong adhesive roll 18, and the workpiece adhesive roll 26 and the workpiece strong adhesive The roll 28 is raised to separate the cylindrical photomask 10 and the work adhesive roll 26 from the surface of the second dummy base material 108.

The control means includes a processing unit (not shown), an interface unit (not shown), and a storage unit (not shown).
The interface unit electrically connects the first elevating unit, the second elevating unit, the stage 20 and the like to the processing unit.
The processing unit controls each lifting means based on the settings (size, thickness, installation position, size of each dummy base material, etc.) of the work 100, the position of the stage 20, etc. stored in the storage unit. is there.

The processing unit may be realized by dedicated hardware, and the processing unit is configured by a memory and a central processing unit (CPU), and a program for realizing the function of the processing unit is provided. The function may be realized by loading it into a memory and executing it.
In addition, an input device, a display device, and the like are connected to the control means as peripheral devices. Here, the input device refers to an input device such as a display touch panel, a switch panel, or a keyboard, and the display device refers to a CRT, a liquid crystal display device, or the like.

<Exposure method>
In the exposure method using the exposure apparatus 8 according to the eighth embodiment of the present invention, a cylindrical photo that contacts the photosensitive layer 104 with the photosensitive layer 104 of the workpiece 100 having the photosensitive layer 104 formed on the surface of the substrate 102. In this method, exposure is performed through the mask 10 and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.
In the exposure method using the exposure apparatus 8, the first dummy substrate 106 of the single wafer is disposed adjacent to the front of the side of the single-piece workpiece 100 that first contacts the cylindrical photomask 10, A second dummy substrate 108 of a single wafer is disposed adjacently behind the side of the single-piece workpiece 100 that comes into contact with the cylindrical photomask 10 last.
Hereinafter, detailed description of the same operation as the exposure method according to the first embodiment will be omitted.

(Dummy base material)
The thicknesses of the first dummy base material 106 and the second dummy base material 108 are the same as the thickness of the workpiece 100.
The material of the first dummy base material 106 and the second dummy base material 108 is preferably the same as that of the base material 102.

(Cleaning, exposure)
The workpiece 100, the first dummy substrate 106, and the second dummy substrate 108 in a direction orthogonal to the axial direction of the cylindrical photomask 10 and the workpiece adhesive roll 26 and from the work chamber 90 toward the exposure chamber 92. The stage 20 on which is mounted is moved.
(I) As shown in FIG. 9, when the workpiece 100, the first dummy base material 106, and the second dummy base material 108 do not exist below the cylindrical photomask 10, the cylindrical photomask 10 and the adhesive roll 16 Then, the pressure-sensitive adhesive roll 18, the work pressure-sensitive adhesive roll 26 and the work pressure-sensitive adhesive roll 28 are raised, and the cylindrical photomask 10 and the work pressure-sensitive adhesive roll 26 are retracted to a position higher than the surface of the photosensitive layer 104.

(II) As shown in FIG. 10, when the top of the first dummy base material 106 reaches below the cylindrical photomask 10, the cylindrical photomask 10, the adhesive roll 16, the strong adhesive roll 18, and the workpiece The adhesive roll 26 for work and the strong adhesive roll 28 for work are lowered, and the cylindrical photomask 10 and the adhesive roll 26 for work 26 are brought into contact with the surface of the first dummy substrate 106.
While moving the workpiece 100, the surface of the first dummy base 106 and the workpiece adhesive roll 26 are brought into contact with each other, whereby the workpiece adhesive roll 16 is rotated on the surface of the first dummy base 106 and the workpiece 100 is rotated. The surface of the first dummy substrate 106 is cleaned with the adhesive roll 16.

(III) Subsequently, the workpiece adhesive roll 16 is rotated on the surface of the photosensitive layer 104 by bringing the surface of the photosensitive layer 104 into contact with the workpiece adhesive roll 26 while moving the workpiece 100. To clean the surface of the photosensitive layer 104.
Further, while moving the workpiece 100, the photosensitive layer 104 whose surface is cleaned and the cylindrical photomask 10 are brought into contact with each other, whereby the cylindrical photomask 10 is rotated on the surface of the photosensitive layer 104 and at the same time, the cylindrical photomask 10 is rotated. The photosensitive layer 104 is irradiated with radiation from radiation irradiating means disposed inside the mask 10.
In this manner, the photosensitive layer 104 whose surface has been cleaned is exposed through the cylindrical photomask 10, and a latent image pattern corresponding to the pattern of the cylindrical photomask 10 is formed on the photosensitive layer 104.

At least while the photosensitive layer 104 and the cylindrical photomask 10 are in contact, the adhesive roll 16 is brought into contact with the surface of the cylindrical photomask 10 to rotate following the rotation of the cylindrical photomask 10, The surface of the cylindrical photomask 10 is cleaned.
At this time, the strong adhesive roll 18 is brought into contact with the surface of the adhesive roll 16 to rotate following the rotation of the adhesive roll 16 to further clean the surface of the adhesive roll 16.

(IV) As shown in FIG. 11, when the top of the second dummy base material 108 reaches below the cylindrical photomask 10, the cylindrical photomask 10, the adhesive roll 16, the strong adhesive roll 18, and the workpiece The pressure-sensitive adhesive roll 26 and the work pressure-sensitive adhesive roll 28 are raised, and the cylindrical photomask 10 and the work pressure-sensitive adhesive roll 26 are separated from the surface of the second dummy base material 108.
Thereafter, the stage 20 on which the workpiece 100 is placed is moved from the exposure chamber 92 toward the working chamber 90 in a direction orthogonal to the axial direction of the cylindrical photomask 10 and the workpiece adhesive roll 26. At this time, the cylindrical photomask 10 and the work adhesive roll 26 are kept retracted to a position higher than the surface of the photosensitive layer 104.

<Action mechanism>
The eighth embodiment of the present invention described above has the same configuration as that of the first embodiment, and when the same operation as that of the first embodiment is performed, the same action as that of the first embodiment. Demonstrate the mechanism.
In the eighth embodiment of the present invention described above, the workpiece adhesive is brought into contact with the surface of the photosensitive layer 104 by bringing the photosensitive layer 104 into contact with the workpiece adhesive roll 26 while moving the workpiece 100. Since the roll 26 is rotated and the surface of the photosensitive layer 104 is cleaned with the work adhesive roll 26, adhesion of foreign matters to the surface of the cylindrical photomask 10 can be suppressed. Therefore, defects derived from foreign matters attached to the surface of the cylindrical photomask 10 are more unlikely to occur in the latent image pattern formed on the photosensitive layer 104.

  In the eighth embodiment of the present invention described above, the surface of the work adhesive roll 26 is cleaned by the work strong adhesive roll 28 that rotates in contact with the surface of the work adhesive roll 26. Therefore, the photosensitive layer 104 can be cleaned with the work adhesive roll 26 for a long time. Therefore, the exposure apparatus 8 can be operated for a long time, and the productivity of the product is improved.

  In the eighth embodiment of the present invention described above, when the single-wafer workpiece 100 is not present below the cylindrical photomask 10, the cylindrical photomask 10 is higher than the surface of the photosensitive layer 104. When the single-wafer workpiece 100 exists below the cylindrical photomask 10, the top of the single-wafer workpiece 100 is cylindrical because the cylindrical photomask 10 is in contact with the surface of the photosensitive layer 104. There is no collision with the photomask 10 from the side. Therefore, the surface of the cylindrical photomask 10 is not damaged by the collision of the workpiece 100.

  In the eighth embodiment of the present invention described above, when the single-wafer workpiece 100 is not present below the workpiece adhesive roll 26, the workpiece adhesive roll 26 is higher than the surface of the photosensitive layer 104. When the single-wafer workpiece 100 exists below the workpiece adhesive roll 26, the workpiece adhesive roll 26 is in contact with the surface of the photosensitive layer 104, so that the top of the single-wafer workpiece 100 is the workpiece. It does not collide with the pressure-sensitive adhesive roll 26 from the side. Therefore, the surface of the workpiece adhesive roll 26 is not damaged by the collision of the workpiece 100.

  In the eighth embodiment of the present invention described above, the first dummy base material 106 of the single wafer is provided in front of the side of the single-piece workpiece 100 that first contacts the cylindrical photomask 10. Are disposed adjacent to each other, and the second dummy base material 108 is disposed adjacently behind the side of the sheet workpiece 100 that comes into contact with the cylindrical photomask 10 last. The work pressure-sensitive adhesive roll 26 can reliably come into contact with the head and the tail of 100. Therefore, the entire surface of the photosensitive layer 104 can be reliably cleaned. When the cylindrical photomask 10 is lowered, the cylindrical photomask 10 collides with the surface of the first dummy base material 106 from above. Therefore, the cylindrical photomask 10 does not collide with the surface of the photosensitive layer 104 from above, and deformation of the photosensitive layer 104 can be prevented. Further, since it is not necessary to stop the workpiece 100 and raise and lower the cylindrical photomask 10 and the workpiece adhesive roll 26, the entire surface of the photosensitive layer 104 can be uniformly cleaned and exposed.

  In the eighth embodiment of the present invention described above, since the cylindrical photomask 10 and the work adhesive roll 26 are moved up and down at the same time, the first lifting means and the second lifting means are set to 1. Can be grouped into two lifting means. Therefore, the configuration of the exposure apparatus 8 can be simplified.

  In the eighth embodiment of the present invention described above, since the distance between the first adhesive roll 16 and the cylindrical photomask 10 is shorter than the length of the workpiece 100, the photosensitive layer. 104 cleaning and exposure can be performed continuously with a short moving distance, and the time of the exposure process can be shortened.

  In the eighth embodiment of the present invention, a part of the first dummy base 106 comes into contact with the cylindrical photomask 10 without being cleaned by the work adhesive roll 26. Therefore, when the workpiece 100 is installed or removed, the degree of cleanness is locally increased by surrounding the uncleaned portion of the first dummy base material 106, so that foreign matter adheres to the first dummy base material 106 even when the operator approaches. The foreign matter is transferred from the first dummy base material 106 to the cylindrical photomask 10 by using the first dummy base material 106 having a surface having higher adhesiveness than the cylindrical photomask 10. Is preferably suppressed.

[Other Embodiments]
An exposure method and an exposure apparatus according to the present invention include an exposure method and an exposure apparatus for cleaning a surface of a cylindrical photomask with an adhesive roll that contacts the surface of the cylindrical photomask and rotates following the rotation of the cylindrical photomask. What is necessary is not limited to the first to eighth embodiments.
For example, two or more embodiments may be combined among the first to eighth embodiments.
In addition, the strong adhesive roll, the static eliminating unit, the pressure adjusting unit, the position adjusting unit, and each lifting unit are not necessarily provided.
Further, the moving means is not limited to a movable stage as in the illustrated example. The moving means may be a moving means for moving the cylindrical photomask when the workpiece is not moved. When the work is a roll-to-roll web-like film, it may be a rotational drive source such as a motor that rotationally drives the take-up roll. Further, when the workpiece is a single wafer, a belt conveyor may be used.

EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited to these examples.
Example 1 is an example and Example 2 is a comparative example.

(Example 1)
An exposure apparatus 1 shown in FIG. 1 was prepared.
As an apparatus main body excluding the cylindrical photomask 10, the adhesive roll 16, the strong adhesive roll 18, and the static elimination means 22, RUS-2 manufactured by SSUS Co. was prepared.
As the cylindrical photomask 10, a film-like phase shift mask (material: polydimethylsiloxane) is a cylindrical substrate (material: synthetic quartz, length: 30 cm, outer diameter: 16 cm, inner diameter 13 cm, weight: 3 kg). What was affixed on the surface was prepared.
As the adhesive roll 16 and the strong adhesive roll 18, a commercially available adhesive roll (manufactured by TEKNEK, SL300, adhesive strength: 40 hPa) was prepared.
As the static elimination means 22, a corona static elimination device with an air nozzle (manufactured by Keyence, ultra-high speed sheath sensing ionizer SJ-H036, corona discharge method, pulse AC: 7000 V, air supply: 0.4 MPa) was prepared.
As the workpiece 100, a photoresist (AZ Electronics, AZ7904) is applied to the surface of a base material (material: soda lime glass, length: 30 cm, width: 30 cm, thickness: 2 mm), and dried to be a photosensitive layer. What formed 104 (thickness: 450 nm) was prepared.

While placing the workpiece 100 on the stage 20 and moving it at a moving speed of 9 cm / min, the photosensitive layer 104 is irradiated with ultraviolet rays through the cylindrical photomask 10 in contact with the surface of the photosensitive layer 104 to perform an exposure process. went. Then, the development process was performed and the resist pattern was formed in the surface of a base material.
When exposure processing and development processing were performed on 50 workpieces 100 and the presence or absence of defects in the resist pattern was confirmed, no defects were found in all the workpieces 100.

(Example 2)
Except for not providing the adhesive roll 16, the strong adhesive roll 18, and the charge removal means 22, exposure processing and development processing were performed on 50 workpieces 100 in the same manner as in Example 1. When the presence or absence of defects in the resist pattern was confirmed, defects were found in 35 workpieces 100.

  In the exposure method and the exposure apparatus of the present invention, a photosensitive layer of a workpiece having a photosensitive layer formed on the surface of a substrate is exposed through a photomask contacting the photosensitive layer, and a latent image pattern corresponding to the photomask pattern It is useful as an exposure method and exposure apparatus for forming a film on a photosensitive layer.

DESCRIPTION OF SYMBOLS 1-8 Exposure apparatus 10 Cylindrical photomask 12 Radiation irradiation means 14 Light-shielding member 14a Slit 16 Adhesive roll 18 Strong adhesive roll 20 Stage 22 Static elimination means 24 Apparatus main body 26 Adhesive roll for workpieces 28 Strong adhesive roll for workpieces 30 First pressure Adjustment means 32 Pressure adjustment part 34, 36 Arm part 40 Second pressure adjustment means 42 Pressure adjustment part 44, 46 Arm part 50 Third pressure adjustment means 52 Pressure adjustment part 54, 56 Arm part 60 First position adjustment means 62 Position adjusting unit 64, 66 Arm unit 70 Second position adjusting unit 72 Position adjusting unit 74, 76 Arm unit 80 Third position adjusting unit 82 Position adjusting unit 84, 86 Arm unit 90 Working chamber 92 Exposure chamber 94 Partition plate 96 Clean Air Supply Device 98 Work Door 100 Work 102 Base Material 104 Photosensitive Layer 106 First dummy base material 108 Second dummy base material

Claims (24)

The photosensitive layer of the workpiece having the photosensitive layer formed on the surface of the substrate is exposed through a cylindrical photomask in contact with the photosensitive layer, and a latent image pattern corresponding to the cylindrical photomask pattern is formed on the photosensitive layer. An exposure method comprising:
The photosensitive layer and the cylindrical photomask are brought into contact with each other while the workpiece and the cylindrical photomask are moved relative to each other in a direction orthogonal to the axial direction of the cylindrical photomask and in opposite directions. While rotating the cylindrical photomask on the surface and simultaneously irradiating the photosensitive layer with radiation from the radiation irradiation means arranged inside the cylindrical photomask,
An exposure method in which the surface of a cylindrical photomask is cleaned by an adhesive roll that contacts the surface of the cylindrical photomask and rotates following the rotation of the cylindrical photomask.   When viewed from the axial direction of the cylindrical photomask, the rotational axis of the adhesive roll is on the extension of the line connecting the center of the contact portion between the photosensitive layer and the cylindrical photomask and the rotational axis of the cylindrical photomask. The exposure method according to claim 1.   The exposure method according to claim 1, wherein the contact pressure between the cylindrical photomask and the adhesive roll is adjusted.   The exposure method according to claim 1, wherein a contact pressure between the photosensitive layer and the cylindrical photomask is adjusted.   The width of the contact portion between the photosensitive layer and the cylindrical photomask in the direction perpendicular to the axial direction of the cylindrical photomask is arranged so as to cover the radiation irradiation means, and radiation is emitted toward the contact portion. The contact pressure between the photosensitive layer and the cylindrical photomask is adjusted so that the width of the slit in the light shielding member in which the slit is formed is larger than the width in the direction orthogonal to the axial direction of the cylindrical photomask. The exposure method as described.   The exposure method according to claim 1, wherein a distance between the rotation axis of the cylindrical photomask and the rotation axis of the adhesive roll is kept constant.   The exposure method according to any one of claims 1 to 6, wherein the distance between the surface of the photosensitive layer and the rotation axis of the cylindrical photomask is kept constant.   The surface of the pressure-sensitive adhesive roll is cleaned with a strong pressure-sensitive adhesive roll that is in contact with the surface of the pressure-sensitive adhesive roll and rotates following the rotation of the pressure-sensitive adhesive roll and has a higher adhesive force than the pressure-sensitive adhesive roll. An exposure method according to 1.   When viewed from the axial direction of the cylindrical photomask, the rotation axis of the strong adhesive roll is on the extension of the line connecting the center of the contact portion between the photosensitive layer and the cylindrical photomask and the rotation axis of the cylindrical photomask. The exposure method according to claim 8.   The exposure method according to claim 1, wherein the material of the surface of the cylindrical photomask is an elastomer.   The exposure method according to claim 1, wherein the surface of the cylindrical photomask after contact with the adhesive roll and before contact with the photosensitive layer is neutralized. The photosensitive layer of the workpiece having the photosensitive layer formed on the surface of the substrate is exposed through a cylindrical photomask in contact with the photosensitive layer, and a latent image pattern corresponding to the cylindrical photomask pattern is formed on the photosensitive layer. An exposure apparatus,
A cylindrical photomask that is rotatable about a central axis as a rotation axis;
Radiation irradiating means arranged inside a cylindrical photomask;
An adhesive roll that is disposed so as to contact the surface of the cylindrical photomask and is rotatable about the central axis;
Moving means for relatively moving the cylindrical photomask and the workpiece in directions orthogonal to the axial direction of the cylindrical photomask and in opposite directions to each other;
An exposure apparatus comprising:   The exposure apparatus according to claim 12, wherein the cylindrical photomask and the adhesive roll are free rolls.   When viewed from the axial direction of the cylindrical photomask, the rotational axis of the adhesive roll is on the extension of the line connecting the center of the contact portion between the photosensitive layer and the cylindrical photomask and the rotational axis of the cylindrical photomask. The exposure apparatus according to claim 12 or 13.   The exposure apparatus according to any one of claims 12 to 14, further comprising pressure adjusting means for adjusting a contact pressure between the cylindrical photomask and the adhesive roll.   The exposure apparatus according to any one of claims 12 to 15, further comprising pressure adjusting means for adjusting a contact pressure between the photosensitive layer and the cylindrical photomask.   The exposure apparatus according to any one of claims 12 to 14, further comprising pressure adjusting means for adjusting a contact pressure between the cylindrical photomask and the adhesive roll and a contact pressure between the photosensitive layer and the cylindrical photomask. . A light-shielding member that is disposed in between so as to cover the radiation irradiating means and has a slit formed so that radiation is emitted toward the contact portion between the photosensitive layer and the cylindrical photomask;
The pressure adjusting means is arranged so that the width of the contact portion in the direction perpendicular to the axial direction of the cylindrical photomask is larger than the width of the slit in the direction perpendicular to the axial direction of the cylindrical photomask. The exposure apparatus according to claim 16, wherein the contact pressure with the cylindrical photomask is adjusted.   The exposure apparatus according to any one of claims 12 to 18, further comprising a position adjusting unit that adjusts a distance between a rotating shaft of the cylindrical photomask and a rotating shaft of the adhesive roll.   The exposure apparatus according to any one of claims 12 to 19, further comprising position adjusting means for adjusting a distance between the surface of the photosensitive layer and a rotation axis of the cylindrical photomask.   21. The method according to any one of claims 12 to 20, further comprising a strong adhesive roll that is disposed so as to be in contact with the surface of the adhesive roll and is rotatable about the central axis as a rotation axis and having higher adhesive force than the adhesive roll. The exposure apparatus described in 1.   When viewed from the axial direction of the cylindrical photomask, the rotation axis of the strong adhesive roll is on the extension of the line connecting the center of the contact portion between the photosensitive layer and the cylindrical photomask and the rotation axis of the cylindrical photomask. The exposure apparatus according to claim 21.   The exposure apparatus according to any one of claims 12 to 22, wherein the material of the surface of the cylindrical photomask is an elastomer.   The exposure apparatus according to any one of claims 12 to 23, further comprising a charge eliminating unit that removes the surface of the cylindrical photomask after contacting the adhesive roll and before contacting the photosensitive layer.

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