JP2016009047A - Electro-optical device and electronic apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an electro-optic device and electronic equipment having excellent display qualities and capable of giving bright display.SOLUTION: A liquid crystal display device 100 as an electro-optic device includes a device substrate 20 as a first substrate and a counter substrate 30 as a second substrate disposed opposing to each other, and a liquid crystal layer 40 as an electro-optic layer held between the device substrate 20 and the counter substrate 30. The device substrate 20 includes a light-shielding part (light-shielding regions 22, 26) that defines a pixel opening by a portion extending in a first direction and a portion extending in a second direction intersecting the first direction, and a TFT 24 as a pixel switching element disposed at a position overlapping the intersection of the portion extending in the first direction and the portion extending in the second direction of the light-shielding part. The counter substrate 30 includes a microlens ML1 as a first light-diffusing element disposed in an island-like pattern while facing the intersection of the light-shielding part of the device substrate 20.

Description

  The present invention relates to an electro-optical device and an electronic apparatus including a pixel on which illumination light is incident.

  As an electro-optical device, for example, an active drive type liquid crystal device used for light modulation means (light valve) of a projection display device such as a projector is known. The liquid crystal device is much smaller than a direct-view display device and has a small pixel size. Therefore, in order to efficiently use illumination light from a light source and realize a bright projection image, each liquid crystal device is For example, a configuration including a microlens for condensing incident light is proposed (Patent Document 1).

JP 2001-188107 A

However, according to the above-mentioned patent document 1, although incident light can be condensed on the center side of the opening of the pixel by the microlens, if it is refracted to light that does not need to be refracted to the center side, There is a problem in that the ratio of light that is obliquely incident on the liquid crystal layer in the opening portion may increase, leading to a decrease in contrast.
There is also a problem that there is a demand for more efficient use of illumination light.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 An electro-optical device according to this application example includes an electric optical layer including a first substrate and a second substrate arranged to face each other, and an electro-optical layer sandwiched between the first substrate and the second substrate. In the optical device, the first substrate includes a light shielding portion that defines a pixel opening portion by a portion extending in a first direction and a portion extending in a second direction intersecting the first direction. And a pixel switching element provided at a position overlapping an intersection of a portion extending in the first direction and a portion extending in the second direction of the light shielding portion, and the second substrate Includes a first light diverging element disposed in an island shape so as to face the intersecting portion of the light shielding portion of the first substrate.

  According to this application example, out of the light incident from the second substrate side, the light incident toward the intersection of the light shielding portions of the first substrate is diverged by the first light diverging element, and one of the diverged light is emitted. The portion can be guided to the pixel opening side defined by the light shielding portion. In addition, since the first light diverging elements are arranged in an island shape as compared with the case where the pixel has a microlens, the ratio of light incident obliquely on the pixel opening can be suppressed. Accordingly, it is possible to provide an electro-optical device that can suppress a decrease in contrast due to oblique light and can perform bright display by guiding more incident light to the pixel opening as compared with the case without the first light diverging element.

In the electro-optical device according to the application example described above, the size of the first light diverging element in a plan view in the direction from the second substrate toward the first substrate is the same as the size of the virtual circumscribed circle of the intersecting portion. Or it is preferable that it is larger than the size of the virtual circumscribed circle.
According to this configuration, light incident on the intersection of the light shielding portions can be efficiently guided to the pixel opening.

In the electro-optical device according to the application example, the second substrate faces a portion extending in the first direction or a portion extending in the second direction of the light shielding portion of the first substrate. It is preferable that the size of the second light diverging element in the plan view is smaller than the size of the first light diverging element.
According to this configuration, since the island-shaped second light diverging element is provided not only at the intersection of the light shielding portion but also in the portion extending in the first direction or the second direction, the light is incident on the light shielding portion. Can be efficiently guided to the pixel opening. In addition, since the second light diverging element is smaller than the first light diverging element, even if the width of the portion extending in the first direction or the second direction of the light shielding portion is narrower than the intersection, the second light diverging element. Can be arranged.

In the electro-optical device according to the application example, the first light diverging element includes a first material of the same type as the base material of the second substrate, and the second substrate includes the base material and the first light divergence. A transparent layer having a refractive index larger than that of the first material may be included between the device and the element.
According to this structure, the light which entered from the base material side and permeate | transmitted the transparent layer can be diverged by the 1st light diverging element.

In the electro-optical device according to the application example, the transparent layer has a concave portion that is recessed in a direction from the first substrate toward the second substrate, and the first light diverging element is made of the transparent material by the first material. The concave portion of the layer may be filled.
According to this configuration, it is possible to realize a first light diverging element having a concave portion in the transparent layer as a lens surface.

In the electro-optical device according to the application example, the first light diverging element may be made of a first material of the same type as the base material of the second substrate and may be porous.
According to this configuration, even if the base material and the first light diverging element are the same type of first material, the first light diverging element is more porous than the base material. The rate is smaller than the substrate. That is, the light incident on the first light diverging element that has passed through the substrate is refracted and diverged.

In the electro-optical device according to the application example, the base material of the second substrate has a concave portion that is recessed in a direction from the first substrate toward the second substrate, and the first light diverging element is porous. The concave portion of the base material may be filled with the first material.
According to this configuration, it is possible to realize the first light diverging element having the concave portion in the base material as the lens surface.

In the electro-optical device according to the application example, it is preferable that the second substrate further includes a microlens that collects incident light toward the pixel opening.
According to this configuration, the light incident on the pixel can be condensed and utilized toward the pixel opening more efficiently.

In the electro-optical device according to the application example, the second substrate includes a transparent layer made of a first material of the same type as the base material between the base material of the second substrate and the microlens. The layer may have a recess that is recessed in the direction from the first substrate toward the second substrate, and the microlens may be formed by filling the recess with a second material having a refractive index higher than that of the base material.
According to this configuration, since the base material and the microlens are integrated, an electro-optical device having a simple condensing structure can be provided.

[Application Example] An electronic apparatus according to this application example includes the electro-optical device according to the application example described above.
According to this application example, it is possible to provide an electronic device capable of bright display by efficiently using light incident on a pixel.

1 is a schematic plan view showing a configuration of a liquid crystal device according to a first embodiment. FIG. 3 is an equivalent circuit diagram illustrating an electrical configuration of the liquid crystal device according to the first embodiment. FIG. 2 is a schematic plan view illustrating a configuration of a pixel. 3A is a schematic cross-sectional view showing the structure of the pixel in the liquid crystal device along the line AA ′ in FIG. 3, and FIG. 3B is the structure of the pixel in the liquid crystal device along the line BB ′ in FIG. FIG. (A)-(f) is a schematic sectional drawing which shows the manufacturing method of a counter substrate. FIG. 6 is a schematic cross-sectional view illustrating a pixel structure in a liquid crystal device as an electro-optical device according to a second embodiment. (A)-(e) is a schematic sectional drawing which shows the manufacturing method of the opposing board | substrate in the liquid crystal device as an electro-optical apparatus of 2nd Embodiment. FIG. 10 is a schematic plan view illustrating a configuration of pixels in a liquid crystal device as an electro-optical device according to a third embodiment. FIG. 9 is a schematic cross-sectional view showing a pixel structure along the line C-C ′ in FIG. 8. (A)-(d) is a schematic sectional drawing which shows the manufacturing method of the opposing board | substrate in the liquid crystal device of 3rd Embodiment. (E)-(g) is a schematic sectional drawing which shows the manufacturing method of the opposing board | substrate in the liquid crystal device of 3rd Embodiment. Schematic which shows the structure of the projection type display apparatus as an electronic device. (A) And (b) is a schematic plan view which shows arrangement | positioning of the micro lens as a 1st light-diffusion element of a modification.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings. Note that the drawings to be used are appropriately enlarged or reduced so that the part to be described can be recognized.

  In the following embodiments, for example, when “on the substrate” is described, the substrate is disposed so as to be in contact with the substrate, or is disposed on the substrate via another component, or the substrate. It is assumed that a part is arranged so as to be in contact with each other and a part is arranged via another component.

(First embodiment)
<Electro-optical device>
As an electro-optical device of this embodiment, an active matrix type liquid crystal device including a thin film transistor (TFT) as a pixel switching element will be described as an example. This liquid crystal device can be suitably used, for example, as a light modulation element (liquid crystal light valve) of a projection display device (liquid crystal projector) described later.

  A basic configuration and structure of the liquid crystal device of the present embodiment will be described with reference to FIGS. 1 is a schematic plan view showing the configuration of the liquid crystal device according to the first embodiment, FIG. 2 is an equivalent circuit diagram showing the electrical configuration of the liquid crystal device according to the first embodiment, and FIG. 3 is a schematic diagram showing the configuration of the pixel. 4A is a schematic cross-sectional view showing the structure of a pixel in the liquid crystal device along the line AA ′ in FIG. 3, and FIG. 4B is a liquid crystal along the line BB ′ in FIG. It is a schematic sectional drawing which shows the structure of the pixel in an apparatus.

  As shown in FIG. 1, a liquid crystal device 100 as an electro-optical device according to the present embodiment includes an element substrate 20 as a first substrate and a counter substrate 30 as a second substrate, and an element substrate 20 and a counter substrate. And a liquid crystal layer 40 (see FIG. 4) as an electro-optical layer disposed between the two. The element substrate 20 is slightly larger than the counter substrate 30, and the two substrates are bonded to each other via a sealing material 42 arranged in a frame shape along the outer edge of the counter substrate 30.

  The liquid crystal layer 40 is composed of liquid crystal having positive or negative dielectric anisotropy enclosed in a space surrounded by the element substrate 20, the counter substrate 30, and the sealing material 42. The sealing material 42 is made of an adhesive such as a thermosetting or ultraviolet curable epoxy resin. Spacers (not shown) are mixed in the sealing material 42 to keep the distance between the element substrate 20 and the counter substrate 30 constant.

  A display region E including a plurality of pixels P arranged in a matrix is provided inside the sealing material 42 arranged in a frame shape. Further, a parting part is provided between the sealing material 42 and the display area E so as to surround the display area E. The parting portion is defined by a light shielding film 33 made of a light shielding metal or metal compound. Note that the display area E may include dummy pixels arranged so as to surround the plurality of pixels P in addition to the plurality of pixels P contributing to display. Further, as will be described in detail later, the counter substrate 30 includes a lens substrate 10 including a microlens ML1 as a first light diverging element disposed corresponding to each of the plurality of pixels P in the display region E ( (See FIG. 4).

  The element substrate 20 is provided with a terminal portion in which a plurality of external connection terminals 54 are arranged. A data line driving circuit 51 is provided between the first side portion along the terminal portion of the element substrate 20 and the sealing material 42. In addition, an inspection circuit 53 is provided between the sealing material 42 and the display area E along the second side facing the first side. Further, a scanning line driving circuit 52 is provided between the seal material 42 and the display area E along the third and fourth sides that are orthogonal to the first side and face each other. A plurality of wirings 55 that connect the two scanning line driving circuits 52 are provided between the sealing material 42 on the second side and the inspection circuit 53. The arrangement of the inspection circuit 53 is not limited to this, and the inspection circuit 53 may be provided at a position along the inner side of the seal material 42 between the data line driving circuit 51 and the display area E.

  Wirings connected to the data line driving circuit 51 and the scanning line driving circuit 52 are connected to a plurality of external connection terminals 54 arranged along the first side. In the following description, the direction along the first side is defined as the X direction, and the direction along the third side is defined as the Y direction. A direction orthogonal to the X direction and the Y direction and going from the element substrate 20 toward the counter substrate 30 is defined as a Z direction. In this specification, viewing from the counter substrate 30 side along the Z direction is referred to as “plan view”. The X direction is an example of the first direction in the present invention, and the Y direction is an example of the second direction of the present invention. Further, the first direction may be the Y direction and the second direction may be the X direction.

  Next, the electrical configuration of the liquid crystal device 100 will be described with reference to FIG. The liquid crystal device 100 includes a plurality of scanning lines 2 and a plurality of data lines 3 as signal wirings that are insulated and orthogonal to each other at least in the display region E, and capacitance lines 4 arranged in parallel along the scanning lines 2. . The direction in which the scanning line 2 extends is the X direction, and the direction in which the data line 3 extends is the Y direction.

  A pixel electrode 28, a TFT 24 as a pixel switching element, and a storage capacitor 5 are provided in a region divided by the scanning line 2, the data line 3, the capacitor line 4, and these signal lines. The pixel circuit is configured.

  The scanning line 2 is electrically connected to the gate of the TFT 24, and the data line 3 is electrically connected to the source of the TFT 24. The pixel electrode 28 is electrically connected to the drain of the TFT 24.

  The data line 3 is connected to a data line driving circuit 51 (see FIG. 1), and supplies image signals D1, D2,..., Dn supplied from the data line driving circuit 51 to the pixels P. The scanning lines 2 are connected to a scanning line driving circuit 52 (see FIG. 1), and supply scanning signals G1, G2,..., Gm supplied from the scanning line driving circuit 52 to the pixels P.

  The image signals D1 to Dn supplied from the data line driving circuit 51 to the data lines 3 may be supplied line-sequentially in this order, or may be supplied for each of a plurality of adjacent data lines 3 for each group. Good. The scanning line driving circuit 52 supplies the scanning signals G1 to Gm to the scanning line 2 in a pulse-sequential manner at a predetermined timing.

  In the liquid crystal device 100, the TFT 24, which is a pixel switching element, is turned on for a certain period by the input of scanning signals G1 to Gm, so that the image signals D1 to Dn supplied from the data line 3 are pixel electrodes at a predetermined timing. 28 is written. A predetermined level of the image signals D1 to Dn written to the liquid crystal layer 40 through the pixel electrode 28 is between the pixel electrode 28 and the common electrode 35 (see FIG. 4) disposed opposite to the liquid crystal layer 40. Is held for a certain period. The frequency of the image signals D1 to Dn is 60 Hz, for example.

  In order to prevent the held image signals D1 to Dn from leaking, the storage capacitor 5 is connected in parallel with the liquid crystal capacitor formed between the pixel electrode 28 and the common electrode 35. The storage capacitor 5 is provided between the drain of the TFT 24 and the capacitor line 4.

  The data line 3 is connected to the inspection circuit 53 shown in FIG. 1, and the operation defect of the liquid crystal device 100 can be confirmed by detecting the image signal in the manufacturing process of the liquid crystal device 100. Although not shown in the equivalent circuit of FIG.

  The peripheral circuit for driving and controlling the pixel circuit in the present embodiment includes a data line driving circuit 51, a scanning line driving circuit 52, and an inspection circuit 53. The peripheral circuit includes a sampling circuit that samples the image signal and supplies it to the data line 3, and a precharge circuit that supplies a precharge signal of a predetermined voltage level to the data line 3 prior to the image signal. Also good.

Next, a planar configuration of the pixel P will be described with reference to FIG. As shown in FIG. 3, the display region E is provided with a light shielding region as a light shielding portion having a portion extending in the X direction and a portion extending in the Y direction. As will be described later, the light shielding region is configured by the first light shielding layer 22 and the second light shielding layer 26 in the element substrate 20 (see FIG. 4A). These are referred to as light shielding regions 22 and 26.
A plurality of portions extending in the X direction and a plurality of portions extending in the Y direction intersect with each other to form lattice-shaped light shielding regions 22 and 26. Opening regions 22a and 26a through which light incident on the display region E passes for each pixel P, that is, pixel openings are defined by the lattice-shaped light shielding regions 22 and 26.

  The portions extending in the X direction of the light shielding regions 22 and 26 and the portions extending in the Y direction have the same width. The intersections 22c and 26c where the portion extending in the X direction and the portion extending in the Y direction intersect have a wider width than the other portions. Therefore, when only the intersecting portions 22c and 26c are taken out, the planar shape is a square (quadrangle).

Although a detailed structure of the pixel P of the liquid crystal device 100 will be described later, the TFT 24 as a pixel switching element is disposed on the element substrate 20 side at a position overlapping the intersecting portions 22c and 26c of the light shielding regions 22 and 26. Similarly, the microlens ML1 as the first light diverging element is disposed on the counter substrate 30 side at a position overlapping the intersecting portions 22c and 26c of the light shielding regions 22 and 26. The microlens ML1 has a circular shape in plan view, and is arranged so that an outer edge thereof is in contact with corner portions of square (quadrangle) intersecting portions 22c and 26c.
That is, the size (diameter) of the microlens ML1 in plan view when the element substrate 20 is viewed from the counter substrate 30 is the same as the size (diameter) of the virtual circumscribed circle of the intersecting portions 22c and 26c.

  Further, an intermediate position of the portion extending in the X direction of the light shielding regions 22, 26, that is, a portion extending in the Y direction between the intersecting portions 22c, 26c and the intersecting portions 22c, 26c adjacent in the X direction. , That is, between the intersections 22c and 26c and the intersections 22c and 26c adjacent to each other in the Y direction, the microlens ML2 as the second light diverging element is separated from the microlens ML1 by the counter substrate 30. Arranged on the side. The size (diameter) of the circular microlens ML2 is the same as the width of the light shielding regions 22 and 26 in the X direction and the Y direction. That is, the size (diameter) of the microlens ML2 in plan view is smaller than the size (diameter) of the microlens ML1. In other words, the length in the Y direction of the microlens ML2 provided at an intermediate position between the portions extending in the X direction of the light shielding regions 22 and 26 is smaller than the length in the Y direction of the microlens ML1. The length in the X direction of the microlens ML2 provided at an intermediate position between the portions extending in the Y direction of the light shielding regions 22 and 26 is smaller than the length in the X direction of the microlens ML1.

  As described above, the element substrate 20 and the counter substrate 30 are bonded together with the sealing material 42 via the liquid crystal layer 40. Therefore, in consideration of the positional accuracy at the time of bonding (for example, approximately ± 0.1 mm), the size (diameter) of the microlens ML1 should be slightly larger than the size of the virtual circumscribed circle of the intersecting portions 22c and 26c. In addition, it is preferable that the size (diameter) of the microlens ML2 is slightly larger than the widths of the light shielding regions 22 and 26 in the X direction and the Y direction from the viewpoint of light use efficiency described later.

  Next, the structure of the pixel P of the liquid crystal device 100 (liquid crystal panel 110) will be described with reference to FIGS. 4 (a) and 4 (b). 4A is a cross-sectional view taken along the line A-A ′ in FIG. 3, and therefore shows the structure of the pixel P in the diagonal direction. On the other hand, FIG. 4B is a cross-sectional view taken along the line BB ′ of FIG. 3, and therefore the structure of the pixel P that crosses the portions extending in the Y direction of the light shielding regions 22 and 26 in the X direction. It is shown.

  As shown in FIG. 4A, the element substrate 20 includes a translucent base material 21, a first light shielding layer 22 provided on the base material 21, an insulating film 23, a TFT 24, An interlayer insulating film 25, a second light shielding layer 26, a second interlayer insulating film 27, a pixel electrode 28, and an alignment film 29 are provided. The base material 21 is made of a light-transmitting material such as glass or quartz. Note that “translucency” in the present embodiment means that light in the visible light wavelength region is transmitted approximately 80% or more, preferably 90% or more.

The first light shielding layer 22 and the second light shielding layer 26 are made of, for example, metals such as Al (aluminum), Ti (titanium), Cr (chromium), W (tungsten), Ta (tantalum), and Mo (molybdenum). A metal simple substance including at least one, an alloy, a metal silicide, a polysilicide, a nitride, or a laminate thereof can be used, and has both light shielding properties and conductivity.
The first light shielding layer 22 is arranged so as to form the lattice-shaped light shielding regions 22, 26 overlapping the upper second light shielding layer 26 in plan view, and in the thickness direction (Z direction) of the element substrate 20. The TFTs 24 are disposed so as to be sandwiched therebetween. Incidence of light to the TFT 24 is suppressed by the first light shielding layer 22 and the second light shielding layer 26. Regions surrounded by the first light shielding layer 22 and the second light shielding layer 26 become opening regions 22 a and 26 a (pixel opening portions) through which light passes through the element substrate 20.

The insulating film 23 is provided so as to cover the base material 21 and the first light shielding layer 22. The insulating film 23 is made of an inorganic material such as SiO ₂ . The TFT 24 is provided on the insulating film 23. Although not shown, the TFT 24 has a semiconductor layer, a gate electrode, a source electrode, and a drain electrode.

The gate electrode is disposed opposite to a region overlapping the channel region of the semiconductor layer in plan view on the element substrate 20 via a part (gate insulating film) of the first interlayer insulating film 25.
The first light shielding layer 22 is patterned so that a part thereof functions as the scanning line 2 (see FIG. 2). The gate electrode is electrically connected to the scanning line 2 disposed on the lower layer side through a contact hole that penetrates the gate insulating film and the insulating film 23.

The first interlayer insulating film 25 is provided so as to cover the insulating film 23 and the TFT 24. The first interlayer insulating film 25 is made of an inorganic material such as SiO ₂ , for example. The first interlayer insulating film 25 includes a gate insulating film that insulates between the semiconductor layer of the TFT 24 and the gate electrode. The first interlayer insulating film 25 alleviates surface irregularities caused by the TFT 24.
A second light shielding layer 26 is provided on the first interlayer insulating film 25. The second light shielding layer 26 is patterned so as to function as any of the electrodes of the data line 3, the capacitor line 4, or the storage capacitor 5 that is electrically connected to the TFT 24. A second interlayer insulating film 27 made of an inorganic material is provided so as to cover the first interlayer insulating film 25 and the second light shielding layer 26.

  The pixel electrode 28 is made of a transparent conductive film such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide), and is provided on the second interlayer insulating film 27 corresponding to the pixel P. The pixel electrode 28 is disposed in a region overlapping the opening 22a of the first light shielding layer 22 and the opening 26a of the second light shielding layer 26 in plan view (see FIG. 3). The outer edge of the pixel electrode 28 is disposed so as to overlap the second light shielding layer 26 (the light shielding regions 22 and 26) in plan view (see FIG. 3).

  The alignment film 29 covering the pixel electrode 28 is, for example, an organic resin material such as polyimide capable of substantially horizontally aligning liquid crystal (liquid crystal molecules) having positive dielectric anisotropy, or liquid crystal having negative dielectric anisotropy. For example, an inorganic material such as silicon oxide that can substantially align (liquid crystal molecules) can be used.

  The liquid crystal constituting the liquid crystal layer 40 modulates the light incident on the liquid crystal layer 40 by changing the alignment state of the liquid crystal molecules according to the voltage level applied between the pixel electrode 28 and the common electrode 35, and the gradation Enable display. For example, in the normally white mode, the transmittance for incident light decreases according to the voltage applied in units of each pixel P. In the normally black mode, the transmittance for incident light increases according to the voltage applied in units of each pixel P, and light having a contrast corresponding to an image signal is emitted from the liquid crystal device 100 as a whole. In the present embodiment, the liquid crystal device 100 is configured on the assumption that light enters from the counter substrate 30 side, passes through the liquid crystal layer 40, and is emitted from the element substrate 20 side.

The counter substrate 30 includes a lens substrate 10, an optical path length adjustment layer 31, a common electrode 35, and an alignment film 36. Although not shown in FIG. 4A, a light shielding film 33 (see FIG. 1) as a parting portion is provided outside the display area E and between the lens substrate 10 and the optical path length adjusting layer 31. It has been.
The lens substrate 10 includes a translucent base material 11, a transparent layer 12, and a lens layer 13 including a microlens ML1. The lens substrate 10 may include the light shielding film 33 and the optical path length adjustment layer 31 described above. Further, the light shielding film 33 may be disposed between the transparent layer 12 and the lens layer 13 or between the optical path length adjusting layer 31 and the common electrode 35.

The base material 11 is made of a light-transmitting material such as glass or quartz. The transparent layer 12 is provided on the liquid crystal layer 40 side of the substrate 11. If the base material 11 is, for example, a quartz substrate mainly composed of SiO2 as a first material having a refractive index n of about 1.46, the transparent layer 12 has a refractive index n higher than that of the first material. For example, SiON (refractive index n is 1.50 to 1.70), Al ₂ O ₃ (refractive index n is approximately 1.76), etc., are used as the two materials.
On the surface of the transparent layer 12 on the liquid crystal layer 40 side, a plurality of recesses 12 a that are recessed toward the base material 11 are formed. Each recess 12 a is provided at a position facing the first light shielding layer 22 and the second light shielding layer 26 on the element substrate 20 side, that is, the intersecting portions 22 c and 26 c of the light shielding regions 22 and 26. The recess 12a constitutes a lens surface in the microlens ML1. Hereinafter, the recess 12a is referred to as a lens surface 12a.

The lens layer 13 includes a plurality of microlenses ML1 formed by filling a plurality of lens surfaces 12a of the transparent layer 12. The lens layer 13 is translucent and is made of a first material having substantially the same refractive index n as that of the substrate 11. For example, if the base material 11 is a quartz substrate having a refractive index n of approximately 1.46, the first material constituting the lens layer 13 may be SiO ₂ (refractive index n is approximately 1.46). . That is, the lens layer 13 has a refractive index n smaller than that of the transparent layer 12. The refractive index n depends on the wavelength of light that passes through the substrate 11, the transparent layer 12, and the lens layer 13.

  Although a detailed method of forming the lens layer 13 will be described later, the lens surface 12a is formed by etching one surface of the transparent layer 12, and the lens surface 12a is filled with the above-described material, whereby the curved lens surface 12a is formed. The microlens ML1 is formed.

  The surface of the lens layer 13 on the liquid crystal layer 40 side is flattened, and an optical path length adjusting layer 31 is provided so as to cover the surface. The optical path length adjustment layer 31 has translucency and is made of, for example, an inorganic material having substantially the same refractive index n as that of the substrate 11. The optical path length adjusting layer 31 flattens the surface of the lens substrate 10 facing the liquid crystal layer 40 and has a layer thickness so that more light emitted by the microlens ML1 passes through the opening regions 22a and 26a. It is provided by adjusting.

  A common electrode 35 is provided so as to cover the optical path length adjustment layer 31. The common electrode 35 is a counter electrode that is formed across a plurality of pixels P and faces the pixel electrode 28 with the liquid crystal layer 40 interposed therebetween. As the common electrode 35, for example, a transparent conductive film such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide) is used. Since the common electrode 35 is disposed so as to face the plurality of pixel electrodes 28 with the liquid crystal layer 40 interposed therebetween, the surface of the common electrode 35 is flat in order to realize desired optical characteristics for each pixel P. Is preferred. The common electrode 35 is electrically connected to the wiring connected to the external connection terminal 54 of the element substrate 20 through the vertical conduction portion 56 provided at the corner of the counter substrate 30 (see FIG. 1).

  An alignment film 36 is provided so as to cover the common electrode 35. Similar to the alignment film 29 on the element substrate 20 side, the alignment film 36 is formed using an organic resin material such as polyimide, or an inorganic material such as silicon oxide. As described above, the material selection and alignment processing methods of the alignment films 29 and 36 depend on the selection of liquid crystal and the display mode based on the optical design of the liquid crystal device 100.

  On the other hand, as shown in FIG. 4B, in the cross section obtained by cutting the central portion of the pixel P along the X direction, the lens substrate 10 has the microlens ML2 at a position overlapping the second light shielding layer 26 in plan view. Have. The microlens ML <b> 2 is configured by filling a recess 12 b (hereinafter referred to as a lens surface 12 b) provided at a position overlapping the second light shielding layer 26 of the transparent layer 12 with the lens layer 13. Although not shown, the lens substrate 10 has a microlens ML2 at a position overlapping the first light shielding layer 22 in a cross section obtained by cutting the central portion of the pixel P along the Y direction. As described above, the size (diameter) of the microlens ML2 in plan view is smaller than the size (diameter) of the microlens ML1. In the present embodiment, the size (diameter) of the microlens ML2 provided at a position overlapping the second light shielding layer 26 extending in the Y direction and the position overlapping the first light shielding layer 22 extending in the X direction. The size (diameter) of the microlens ML2 provided in the same is the same, but the size (diameter) may be different.

  Next, with reference to FIGS. 4A and 4B, the light incident on the opening regions 22a and 26a, that is, the pixel openings will be described. As shown in FIGS. 4A and 4B, the incident light L1 incident from the counter substrate 30 side to the central portion of the pixel P along the normal line direction of the counter substrate 30 travels straight as it is, and the counter substrate 30. Then, the light passes through the liquid crystal layer 40 and is emitted from the opening regions 22 a and 26 a of the element substrate 20. Incident light L3 that is parallel to the incident light L1 and passes through the center of the microlens ML1 passes through the microlens ML1 and the liquid crystal layer 40 and reaches the second light shielding layer 26 to be shielded from light. Similarly, the incident light L5 that is parallel to the incident light L1 and passes through the center of the microlens ML2 passes through the microlens ML2 and the liquid crystal layer 40 and reaches the second light shielding layer 26 to be shielded.

  On the other hand, the incident light L2 that is parallel to the incident light L1 and is incident on a portion off the center of the microlens ML1 is a lens surface 12a that is a boundary between the transparent layer 12 and the microlens ML1 having different refractive indexes n. Refracts and diverges, passes through the liquid crystal layer 40, reaches the opening regions 22a and 26a, and is emitted from the element substrate 20 side. Similarly, the incident light L6 that is parallel to the incident light L1 and is incident on a portion off the center of the microlens ML2 is a lens surface 12b that is a boundary between the transparent layer 12 and the microlens ML2 having different refractive indexes n. Refracts and diverges, passes through the liquid crystal layer 40, reaches the opening region 26a, and is emitted from the element substrate 20 side.

  In FIG. 4, the incident lights L1, L2, L3, L5, and L6 incident from the counter substrate 30 side are described as parallel lights along the Z direction. There may also be incident light that is incident obliquely on one surface. In this way, the incident light diverging effect described above can also be obtained when the obliquely incident light is incident on the microlenses ML1 and ML2.

<Manufacturing method of counter substrate 30>
Next, a method for manufacturing the counter substrate 30 will be described with reference to FIG. 5A to 5F are schematic cross-sectional views showing a method for manufacturing the counter substrate. Specifically, it is a schematic sectional view corresponding to FIG.

  In the manufacturing method of the counter substrate 30 of the present embodiment, first, as shown in FIG. 5A, for example, SiON having a refractive index n larger than that of the base material 11 is formed on one surface of the base material 11 using a quartz substrate. (Silicon oxynitride) is formed to form the transparent layer 12. Examples of the method for forming the transparent layer 12 include vapor deposition, sputtering, and CVD. In this embodiment, the transparent layer 12 having a film thickness of about 2 μm to 3 μm is formed by plasma CVD. The film thickness of the transparent layer 12 must be at least larger than the radius of the microlens ML1 in FIG. In addition, the upper limit value of the film thickness may be set to a preferable value in terms of manufacturing in consideration of the film thickness tolerance in the film forming process of the transparent layer 12, the depth tolerance of the lens surface 12a described later, the production capacity, and the like.

  Next, as shown in FIG. 5B, a mask 71 for forming the lens surface 12a on the transparent layer 12 is formed. The mask 71 has a circular opening 72 in a plan view at the center of the lens surface 12a in a plan view. As a method for forming such a mask 71, for example, a polysilicon film is formed on one surface of the transparent layer 12, and the formed polysilicon film is patterned by photolithography to form the opening 72. Can be mentioned. Note that an amorphous silicon film may be used for the mask 71.

  Next, the transparent layer 12 is isotropically etched through a mask 71 as shown in FIG. Examples of the isotropic etching include wet etching using an etchant containing phosphoric acid. The transparent layer 12 is etched by contact of the etching solution through the opening 72. By controlling the etching time, the lens surface 12 a having a desired size corresponding to the size of the intersecting portions 22 c and 26 c of the light shielding regions 22 and 26 is formed by etching in the transparent layer 12. Thereafter, the mask 71 is removed by, for example, dry etching.

  Although not shown in FIGS. 5B and 5C, as an example of a method of forming the lens surface 12b in addition to the lens surface 12a on the transparent layer 12, the mask 71 is smaller than the opening 72. There is a method in which an opening having a diameter is formed at the same time and the transparent layer 12 is etched through the mask 71. Further, the lens surface 12a and the lens surface 12b may be formed by different processes. In that case, it is preferable to form the lens surface 12b having a smaller diameter first because it is necessary to cover the lens surface 12b when the mask 71 for forming the lens surface 12a is formed.

Next, as illustrated in FIG. 5D, a lens layer precursor 13 </ b> P is formed so as to fill the concave (hemispherical) lens surface 12 a formed in the transparent layer 12. As a method of forming the lens layer precursor 13P, a SiO ₂ (silicon oxide) film is formed by using, for example, a plasma CVD method capable of sufficiently covering and filling the unevenness on the surface of the transparent layer 12. The thickness of the SiO ₂ film is, for example, about 3 μm to 6 μm. The film thickness of the lens layer precursor 13P must be at least larger than the radius of the microlens ML1 in FIG. On the other hand, the upper limit value of the film thickness should be set to a preferable value for manufacturing in consideration of the depth tolerance of the lens surface 12a, the film thickness tolerance of the lens layer precursor 13P, the processing tolerance of the flattening process, the production capacity, and the like. Good.
The surface of the lens layer precursor 13P after film formation has irregularities affected by the lens surface 12a. Therefore, in order to eliminate the unevenness, the lens layer precursor 13P is subjected to a flattening process. An example of the planarization method is CMP (Chemical Mechanical Polishing). As a result, as shown in FIG. 5E, the lens surface 12a is filled to form the microlens ML1, and the lens layer 13 having one flat surface 13a is formed. That is, the lens substrate 10 having the microlens ML1 is completed. Note that planarization may be performed by combining CMP processing and etching processing in order to realize a flatter surface 13a. Although not shown in FIG. 5D, the lens layer precursor 13P is formed so as to fill not only the lens surface 12a but also the lens surface 12b, and the microlens ML2 and the microlens ML1 are formed by planarization. Formed simultaneously.

  Next, as shown in FIG. 5 (f), the optical path length adjusting layer 31 and the common electrode 35 are sequentially stacked on the surface 13 a of the lens layer 13. Examples of the method for forming the optical path length adjusting layer 31 include a method of forming a film by vapor deposition, sputtering, or CVD using the same material (silicon oxide) as the lens layer 13. Examples of the method for forming the common electrode 35 include a method of forming an ITO film or an IZO film by sputtering. Thereby, the counter substrate 30 including the lens substrate 10 having the microlens ML1 (and the microlens ML2) is completed. Thereafter, an alignment film 36 is formed on the common electrode 35 of the counter substrate 30 based on the optical design of the liquid crystal device 100.

According to the first embodiment, the following effects can be obtained.
(1) The liquid crystal device 100 (liquid crystal panel 110) is arranged in an island shape on the counter substrate 30 side at a position overlapping the intersecting portions 22c and 26c of the light shielding regions 22 and 26 defining the pixel opening of the pixel P. A microlens ML1 is provided as a single light diverging element. In addition, a microlens ML2 serving as a second light diverging element is disposed on the counter substrate 30 side in an intermediate position between portions extending in the X direction and the Y direction of the light shielding regions 22 and 26.
Therefore, compared with a case where a microlens that collects light incident on the pixel P is condensed on the pixel opening, light that does not need to be refracted is incident on the pixel opening as it is and is blocked by the light shielding regions 22 and 26. Incident light L2 and L6 can be diverged by the microlenses ML1 and ML2 and guided to the pixel opening. In addition, since light that does not need to be refracted originally enters the pixel opening as it is, light that passes through the liquid crystal layer 40 obliquely with respect to the Z direction is reduced, and a reduction in contrast due to alignment of liquid crystal molecules is suppressed. be able to. That is, it is possible to provide the liquid crystal device 100 (liquid crystal panel 110) having improved display efficiency and improved display efficiency of incident light incident from the counter substrate 30 side and having excellent display quality.
(2) Since the size of the microlens ML1 in plan view is the same size as or slightly larger than the virtual circumscribed circle of the intersecting portions 22c and 26c of the light shielding regions 22 and 26, it is smaller than the case of being smaller than the virtual circumscribed circle. The light that may be incident on the intersections 22c and 26c can be efficiently guided to the pixel opening. As for the microlens ML2, part of the light that may be incident on the portions extending in the X direction and the portion extending in the Y direction of the light shielding regions 22 and 26 can be efficiently guided to the pixel opening.
(3) The microlens ML1 is disposed on the counter substrate 30 side at a position facing the intersecting portions 22c and 26c of the light shielding regions 22 and 26. Therefore, since the light incident on the intersecting portions 22c and 26c is diverged by the micro lens ML1, the TFT 24 arranged so as to overlap the intersecting portions 22c and 26c can be prevented more reliably from causing an optical malfunction (such as light leakage). it can.

(Second Embodiment)
<Electro-optical device>
Next, an electro-optical device according to a second embodiment will be described with reference to FIG. FIG. 6 is a schematic cross-sectional view illustrating a pixel structure in a liquid crystal device as an electro-optical device according to the second embodiment. The liquid crystal device as the electro-optical device according to the second embodiment is different from the liquid crystal device 100 according to the first embodiment in the configuration of the counter substrate 30. Accordingly, the same components as those of the liquid crystal device 100 are denoted by the same reference numerals, and detailed description thereof is omitted. FIG. 6 is a schematic cross-sectional view corresponding to FIG. 4A of the first embodiment.

As shown in FIG. 6, the liquid crystal device 200 (liquid crystal panel 210) of this embodiment includes an element substrate 20, a counter substrate 30B, and a liquid crystal layer 40 sandwiched between the substrates.
The counter substrate 30B includes a lens substrate 10B, an optical path length adjustment layer 31, a common electrode 35, and an alignment film 36. The lens substrate 10B includes a base material 11 and a lens layer 13B. A hemispherical concave portion 11a (hereinafter referred to as a lens surface 11a) is formed on the surface of the substrate 11 on the lens layer 13B side, and the microlens ML1 is formed by filling the lens surface 11a with the lens layer 13B. ing. The lens surface 11a is formed on the base material 11 at a position overlapping the intersecting portions 22c and 26c (see FIG. 3) of the light shielding regions 22 and 26 on the element substrate 20 side. The size (diameter) of the lens surface 11a in plan view is the same as or slightly larger than the size of the virtual circumscribed circle of the intersecting portions 22c and 26c.

  The base material 11 is a translucent quartz substrate, for example, and the lens layer 13 </ b> B is formed to be porous using the same type of first material as the base material 11. Therefore, even if the base material 11 and the lens layer 13B are made of the same kind of first material, the refractive index n of the lens layer 13B is smaller than that of the base material 11. Therefore, as shown in FIG. 6, the incident light L1 incident from the counter substrate 30B side to the center of the pixel P along the normal direction of the counter substrate 30B travels straight as it is, and causes the counter substrate 30B and the liquid crystal layer 40 to pass through. It passes through and is emitted from the opening regions 22 a and 26 a of the element substrate 20. Incident light L3 that is parallel to the incident light L1 and passes through the center of the microlens ML1 passes through the microlens ML1 and the liquid crystal layer 40 and reaches the second light shielding layer 26 to be shielded from light.

  On the other hand, the incident light L2 that is parallel to the incident light L1 and is incident on a portion that is off the center of the microlens ML1 is a lens surface 11a that is a boundary between the substrate 11 and the microlens ML1 having different refractive indexes n. Refracts and diverges, passes through the liquid crystal layer 40, reaches the opening regions 22a and 26a, and is emitted from the element substrate 20 side.

  As in the first embodiment, the lens substrate 10B includes the microlens ML2 arranged in an island shape at an intermediate position between the light shielding regions 22 and 26 extending in the X direction and the Y direction. You may have. The microlens ML2 in this case is formed by filling the lens surface provided on the base material 11 with the lens layer 13B.

<Method for Manufacturing Opposing Substrate 30B>
Next, a manufacturing method of the counter substrate 30B of this embodiment will be described with reference to FIG. 7A to 7E are schematic cross-sectional views illustrating a method for manufacturing the counter substrate in the liquid crystal device as the electro-optical device according to the second embodiment. The same components as those of the counter substrate 30 of the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.

  In the manufacturing method of the counter substrate 30 </ b> B of the present embodiment, first, as shown in FIG. 7A, a mask 71 having an opening 72 is formed on one surface of the base material 11. The opening 72 is circularly opened in a plan view at a position that is the center of the lens surface 11 a formed on the substrate 11. In this case, a polysilicon film is used as a material constituting the mask 71.

  Next, as shown in FIG. 7B, isotropic etching is performed on the base material 11 through a mask 71, whereby the base material 11 is partially etched to form a lens surface 11a. Thereafter, the mask 71 is removed from the base material 11. In this case, a solution containing hydrofluoric acid is used as the etching solution for the substrate 11.

Next, as shown in FIG. 7C, a porous lens layer precursor 13BP is formed on the base material 11 so as to fill the lens surface 11a. As a method of forming the porous lens layer precursor 13BP, for example, an organic silane solution containing organic silane, water, alcohol, acid or alkali is applied to the substrate 11 by spin coating to form a coating film. And a method of forming a porous SiO ₂ film (SOG film; Spin On Glass film) by subjecting the coating film to heat hydrolysis or alkali hydrolysis (Japanese Patent Application Laid-Open No. 2001-351911). reference).
Since the surface of the formed lens layer precursor 13BP is uneven due to the influence of the lens surface 11a, a flattening process is performed as in the first embodiment. Thereby, as shown in FIG. 7D, one surface is flattened, and the lens layer 13B including the microlens ML1 formed by filling the lens surface 11a is formed. That is, a lens substrate 10B is formed in which the base material 11 and the lens layer 13B are formed in contact with each other. The refractive index n of the base material 11 is approximately 1.46, and the refractive index n of the porous lens layer 13B is approximately 1.38.

  Next, as shown in FIG. 7E, the optical path length adjustment layer 31 and the common electrode 35 are laminated and formed on the flattened surface of the lens layer 13B. Thereby, the counter substrate 30B including the lens substrate 10B is completed.

  As described above, in addition to the microlens ML1, a lens surface is formed on the substrate 11 at an intermediate position between the light shielding regions 22 and 26 extending in the X direction and the Y direction. The microlens ML <b> 2 may be formed by filling the surface with the lens layer precursor 13 </ b> BP and then performing a planarization process.

According to the second embodiment, in addition to the effects (2) and (3) of the first embodiment, the following effects can be obtained.
(4) The liquid crystal device 200 (liquid crystal panel 210) is formed in an island shape on the base material 11 on the counter substrate 30B side at a position overlapping the intersecting portions 22c and 26c of the light shielding regions 22 and 26 defining the pixel opening of the pixel P. The microlens ML1 is disposed as the first light diverging element.
Therefore, compared with a case where a microlens that collects light incident on the pixel P is condensed on the pixel opening, light that does not need to be refracted is incident on the pixel opening as it is and is blocked by the light shielding regions 22 and 26. The incident light L2 can be diverged by the microlens ML1, and a part thereof can be guided to the pixel opening. In addition, since light that does not need to be refracted originally enters the pixel opening as it is, light that passes through the liquid crystal layer 40 obliquely with respect to the Z direction is reduced, and a reduction in contrast due to alignment of liquid crystal molecules is suppressed. be able to. That is, it is possible to provide the liquid crystal device 200 (liquid crystal panel 210) having improved display efficiency while improving the utilization efficiency of incident light incident from the counter substrate 30B side and enabling bright display.
(5) The lens layer 13 </ b> B of the lens substrate 10 </ b> B is formed to be porous using the same type of first material as the base material 11. Therefore, since the transparent layer 12 is not required as compared with the lens substrate 10 of the first embodiment, the manufacturing process can be simplified. In addition, since the boundary surface of the layers having different refractive indexes n is reduced as compared with the first embodiment, it is possible to suppress the incident light from being reflected by the boundary surface and reducing the use efficiency of the incident light.

(Third embodiment)
<Electro-optical device>
Next, an electro-optical device according to a third embodiment will be described with reference to FIGS. FIG. 8 is a schematic plan view showing the configuration of the pixel in the liquid crystal device as the electro-optical device of the third embodiment, and FIG. 9 is a schematic cross-sectional view showing the structure of the pixel along the line CC ′ of FIG. The liquid crystal device as the electro-optical device according to the third embodiment is different from the liquid crystal device 100 according to the first embodiment in the configuration of the counter substrate 30. Accordingly, the same components as those of the liquid crystal device 100 are denoted by the same reference numerals, and detailed description thereof is omitted.

As shown in FIG. 8, the liquid crystal device 300 (see FIG. 9) of the present embodiment is a first light diverging element arranged in an island shape at a position facing the intersecting portions 22 c and 26 c of the light shielding regions 22 and 26. A microlens ML1 is provided. Further, a microlens ML3 that collects light incident on the pixel P is provided at a position facing the opening regions 22a and 26a (pixel opening portions) of the pixel P.
The microlens ML3 is disposed so that the center thereof substantially coincides with the area center of gravity of the pixel opening (in this case, since the shape of the pixel opening is substantially square, the center of the pixel opening). The design outer shape of the microlens ML3 is circular (indicated by an imaginary line), and the microlenses ML3 adjacent to each other in the X direction and the Y direction are arranged so as to partially overlap each other. The overlapping portions of the microlens ML3 are arranged so as to be within the range of the portions extending in the X direction or the Y direction of the light shielding regions 22 and 26. Therefore, the boundary between the microlenses ML3 adjacent in the X direction and the Y direction is linear, and the outer shape portion adjacent in the diagonal direction of the microlens ML3 is arcuate.
In plan view, a part of the microlens ML1 and a part of the microlens ML3 are arranged to overlap each other in the diagonal direction.

As shown in FIG. 9, the liquid crystal device 300 (liquid crystal panel 310) of this embodiment includes an element substrate 20, a counter substrate 30C, and a liquid crystal layer 40 sandwiched between both substrates. The counter substrate 30 </ b> C includes a lens substrate 10 </ b> C, an optical path length adjustment layer 31, a common electrode 35, and an alignment film 36.
The lens substrate 10 </ b> C includes a translucent base material 11, a lens layer 13 </ b> B, a transparent layer 14, and a lens layer 15. The base material 11 is, for example, a quartz substrate. As described in the second embodiment, the lens layer 13 </ b> B is formed using a first material of the same type as the base material 11 and is porous. The lens layer 13 </ b> B includes a microlens ML <b> 1 as a first light diverging element formed by filling a lens surface 11 a formed on the substrate 11.
The transparent layer 14 laminated on the lens layer 13B is made of the same first material as that of the substrate 11. The refractive index n of the transparent layer 14 is preferably the same as that of the lens layer 13B. That is, the transparent layer 14 is preferably made of a porous first material in order to reduce light reflection at the interface with the lens layer 13B.
The lens layer 15 is made of a second material having a refractive index n larger than that of the first material, and fills a hemispherical concave portion 14a (hereinafter referred to as a lens surface 14a) formed in the transparent layer 14. ML3 is included. In the present embodiment, the first material is, for example, SiO ₂ (silicon oxide, refractive index n is approximately 1.46), and the second material is SiON (silicon oxynitride, refractive index n is 1.50-1. 70).

  The light incident on the pixel P will be described with reference to FIG. Incident light L1 incident on the central portion of the pixel P from the counter substrate 30C side along the Z direction travels straight through the counter substrate 30C and the liquid crystal layer 40, and is emitted from the opening regions 22a and 26a of the element substrate 20. The The incident light L3 that is parallel to the incident light L1 and is incident on the center of the microlens ML1 travels straight through the counter substrate 30C and enters the liquid crystal layer 40, but is blocked by the second light blocking layer 26. On the other hand, the incident light L2 incident on the position parallel to the incident light L1 and deviating from the center of the microlens ML1 is diverged by the microlens ML1 and then passes through the transparent layer 14 and enters the microlens ML3. Incident light L2 incident on the microlens ML3 is collected in the opening regions 22a and 26a. Therefore, it is possible to more efficiently guide the light diverged by the microlens ML1 to the opening regions 22a and 26a (pixel opening portions) than when the microlens ML3 is not provided. Furthermore, the amount of light incident on the TFT 24 can be reduced by the micro lenses ML1 and ML3, and the OFF leakage current of the TFT 24 can be suppressed.

<Method for Manufacturing Opposing Substrate 30C>
Next, a method for manufacturing the counter substrate 30C will be described with reference to FIGS. FIGS. 10A to 10D and FIGS. 11E to 11G are schematic cross-sectional views illustrating a method for manufacturing a counter substrate in the liquid crystal device according to the third embodiment. 10 and 11 are schematic cross-sectional views corresponding to FIG. The same components as those of the counter substrate 30B of the second embodiment are denoted by the same reference numerals, and detailed description thereof is omitted. The steps up to the step of forming the lens layer 13B including the microlens ML1 on the base material 11 are as described in the second embodiment, and the subsequent steps will be described.

First, as shown in FIG. 10A, the transparent layer 14 is formed by being laminated on the lens layer 13B. Examples of the method for forming the transparent layer 14 include a method for forming an SOG film disclosed in Japanese Patent Application Laid-Open No. 2001-351911, similarly to the lens layer 13B. However, the present invention is not limited to this, and a method of forming a SiO ₂ film by vapor deposition, sputtering, CVD, or the like may be employed. The layer thickness of the transparent layer 14 is set in consideration of the size of the lens surface 14a to be formed later.

  Next, as shown in FIG. 10B, a mask 71 is formed on the transparent layer 14 for etching the lens surface 14a. In this case, for example, a polysilicon film is used as the mask 71 in consideration of the etching formation of the lens surface 14a. A mask 71 is formed by patterning the polysilicon film so as to have an opening 72 at a portion corresponding to the center of the lens surface 14a.

  Next, as shown in FIG. 10C, the transparent layer 14 is isotropically etched through the opening 72 of the mask 71. For example, a solution containing hydrofluoric acid is used as the etching solution. The lens surface 14a having a desired size is formed by controlling the etching time. After the etching, the mask 71 is removed by, for example, dry etching.

  Next, as shown in FIG. 10D, a lens layer precursor 15P is formed on the transparent layer 14 so as to fill the lens surface 14a. As a method of forming the lens layer precursor 15P, a SiON film is formed by a plasma CVD method that can sufficiently fill the lens surface 14a. The layer thickness of the lens layer precursor 15P is set in consideration of the size of the lens surface 14a.

  Next, as shown in FIG. 11E, the surface of the formed lens layer precursor 15P has irregularities affected by the lens surface 14a. Therefore, the lens layer precursor 15P has the irregularities to eliminate the irregularities. A flattening process is performed. Examples of the planarization method include a CMP process, a process in which the CMP process and etching are combined, and the like. Thereby, one surface 15a is flattened, and the lens layer 15 including the microlens ML3 formed by filling the lens surface 14a is formed. That is, the lens substrate 10C is completed.

  Next, the optical path length adjusting layer 31 and the common electrode 35 are sequentially stacked on the flat surface 15 a of the lens layer 15. Thereby, the counter substrate 30C is completed.

According to the third embodiment, the following effects can be obtained.
The liquid crystal device 300 (liquid crystal panel 310) includes a first light divergence arranged in an island shape on the counter substrate 30C side at a position overlapping the intersecting portions 22c and 26c of the light shielding regions 22 and 26 defining the pixel opening of the pixel P. It has a microlens ML1 as an element. In addition, the microlens ML3 that condenses the light incident on the counter substrate 30C toward the pixel opening at a position facing the pixel opening. Incident light L2 incident on a position off the center of the microlens ML1 is diverged by the microlens ML1 and then enters the microlens ML3. Incident light L2 incident on the microlens ML3 is condensed in the pixel opening. Therefore, compared to the case without the microlens ML3, the light emitted by the microlens ML1 can be more efficiently guided to the pixel opening, so that the liquid crystal device 300 (liquid crystal panel 310) capable of brighter display can be obtained. ) Can be provided.

(Fourth embodiment)
<Electronic equipment>
Next, as an electronic apparatus according to the fourth embodiment, a projection display device will be described as an example with reference to FIG. FIG. 12 is a schematic diagram illustrating a configuration of a projection display device as an electronic apparatus.

  As shown in FIG. 12, a projection display apparatus 1000 as an electronic apparatus according to this embodiment includes a polarization illumination apparatus 1100 arranged along the system optical axis L0, and two dichroic mirrors 1104 and 1105 as light separation elements. Three reflection mirrors 1106, 1107, 1108, five relay lenses 1201, 1202, 1203, 1204, 1205, three transmissive liquid crystal light valves 1210, 1220, 1230 as light modulation elements, and a light combining element As a cross dichroic prism 1206 and a projection lens 1207.

  The polarized light illumination device 1100 is generally configured by a lamp unit 1101 as a light source composed of a white light source such as an ultra-high pressure mercury lamp or a halogen lamp, an integrator lens 1102, and a polarization conversion element 1103.

  The dichroic mirror 1104 reflects red light (R) and transmits green light (G) and blue light (B) among the polarized light beams emitted from the polarization illumination device 1100. Another dichroic mirror 1105 reflects the green light (G) transmitted through the dichroic mirror 1104 and transmits the blue light (B).

The red light (R) reflected by the dichroic mirror 1104 is reflected by the reflection mirror 1106 and then enters the liquid crystal light valve 1210 via the relay lens 1205.
Green light (G) reflected by the dichroic mirror 1105 enters the liquid crystal light valve 1220 via the relay lens 1204.
The blue light (B) transmitted through the dichroic mirror 1105 enters the liquid crystal light valve 1230 via a light guide system including three relay lenses 1201, 1202, 1203 and two reflection mirrors 1107, 1108.

The liquid crystal light valves 1210, 1220, and 1230 are disposed to face the incident surfaces of the cross dichroic prism 1206 for each color light.
The color light incident on the liquid crystal light valves 1210, 1220, and 1230 is modulated based on video information (video signal) and emitted toward the cross dichroic prism 1206. In this prism, four right-angle prisms are bonded together, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface thereof. The three color lights are synthesized by these dielectric multilayer films, and the light representing the color image is synthesized. The synthesized light is projected onto the screen 1300 by the projection lens 1207, which is a projection optical system, and the image is enlarged and displayed.

  The liquid crystal light valve 1210 is the one to which the liquid crystal device 100 of the first embodiment described above is applied. A pair of polarizing elements arranged in crossed Nicols are arranged with a gap between the colored light incident side and the emitting side of the liquid crystal device 100. The same applies to the other liquid crystal light valves 1220 and 1230.

  According to such a projection display apparatus 1000, since the liquid crystal apparatus 100 is used as the liquid crystal light valves 1210, 1220, and 1230, light incident on the pixels P can be efficiently used to project a bright image. In addition, the projection display apparatus 1000 having excellent display quality can be provided.

  As the liquid crystal light valves 1210, 1220, and 1230, the liquid crystal device 200 of the second embodiment and the liquid crystal device 300 of the third embodiment may be used. Further, the electronic apparatus to which the liquid crystal device 100 of the first embodiment, the liquid crystal device 200 of the second embodiment, or the liquid crystal device 300 of the third embodiment can be applied is not limited to the projection display device 1000. For example, projection-type HUD (head-up display) and HMD (head-mounted display), electronic book, personal computer, digital still camera, liquid crystal television, viewfinder type or monitor direct-view type video recorder, car navigation system, electronic notebook It can be suitably used as a display unit of information terminal equipment such as POS.

  The present invention is not limited to the above-described embodiment, and can be appropriately changed without departing from the gist or concept of the invention that can be read from the claims and the entire specification. A liquid crystal device) and an electronic apparatus to which the electro-optical device (liquid crystal device) is applied are also included in the technical scope of the present invention. Various modifications other than the above embodiment are conceivable. Hereinafter, a modification will be described.

(Modification 1) FIGS. 13 (a) and 13 (b) are schematic plan views showing the arrangement of microlenses as first light diverging elements of a modification. For example, as shown in FIG. 13A, the intersection of the light shielding regions 22 and 26 includes first projecting portions 22d and 26d projecting toward the opening regions 22a and 26a, and second projecting portions 22e and 26e. Contains. The size of the second projecting portions 22e and 26e is smaller than the size of the first projecting portions 22d and 26d. Therefore, the shape of the intersection is not point-symmetric. In this case, the size of the micro lens ML1 may be the same as or slightly larger than the size of the virtual circumscribed circle of the first projecting portions 22d and 26d.
Or as shown in FIG.13 (b), it is good also considering the planar shape of microlens ML1 in planar view as the ellipse which circumscribes the 1st overhang | projection parts 22d and 26d and the 2nd overhang | projection parts 22e and 26e. In addition, it is preferable that the microlens ML1 has an elliptical shape slightly larger than the size of a virtual ellipse circumscribing the first projecting portions 22d and 26d and the second projecting portions 22e and 26e in plan view. And the alignment accuracy are preferable. As a method of forming the microlens ML1 having an elliptical shape in plan view, if the shape of the opening 72 of the mask 71 in plan view is the same elliptical shape, an elliptical shape similar to the opening 72 is obtained by isotropic etching. It is done.
The cross-sectional shape of the microlenses ML1, ML2, and ML3 is not limited to a hemispherical shape. By adjusting the shape and size of the opening 72 in the mask 71, the center portion of the lens surface on the substrate 11 side is The microlenses ML1, ML2, and ML3 that are flat may be used.

  (Modification 2) The liquid crystal device 100 of the first embodiment and the liquid crystal device 200 of the second embodiment may not include the microlens ML2 on the counter substrate side.

  (Modification 3) In the counter substrates 30, 30B, and 30C, a light shielding portion (black matrix; BM) that defines the pixel opening of the pixel P may be provided. The light shielding part (BM) is preferably arranged on the side of the counter substrate 30, 30 </ b> B, 30 </ b> C close to the liquid crystal layer 40, for example, between the optical path length adjusting layer 31 and the common electrode 35. According to this, a part of the light divergently incident on the liquid crystal layer 40 out of the light diverged by the microlens ML1 can be shielded by the light shielding part (BM), and a more contrasted image is displayed. be able to. Further, the amount of light incident on the TFT 24 can be further reduced by the light shielding portion (BM), and the OFF leakage current of the TFT 24 can be suppressed.

  DESCRIPTION OF SYMBOLS 10, 10B, 10C ... Lens substrate, 11 ... Base material, 11a ... Lens surface as a recessed part, 12 ... Transparent layer, 12a, 12b ... Lens surface as a recessed part, 13, 13B ... Lens layer, 13BP, 13P ... Lens layer Precursor, 14 ... transparent layer, 14a ... lens surface as concave portion, 15 ... lens layer, 22,26 ... light shielding region as light shielding portion, 100, 200,300 ... liquid crystal device, 110,210,310 ... liquid crystal panel, 1000: a projection display device as an electronic device, ML1: a microlens as a first light diverging element, ML2: a microlens as a second light diverging element, ML3: a microlens, P: a pixel.

Claims (10)

An electro-optical device including a first substrate and a second substrate disposed to face each other, and an electro-optical layer sandwiched between the first substrate and the second substrate,
The first substrate includes a light shielding portion that defines a pixel opening portion by a portion extending in a first direction and a portion extending in a second direction intersecting the first direction;
A pixel switching element provided at a position overlapping an intersection of a portion extending in the first direction and a portion extending in the second direction of the light shielding portion, and the second substrate includes: An electro-optical device comprising: a first light diverging element arranged in an island shape so as to face the intersecting portion of the light shielding portion of the first substrate.   The size of the first light diverging element in plan view in the direction from the second substrate to the first substrate is the same as the size of the virtual circumscribed circle of the intersection or larger than the size of the virtual circumscribed circle The electro-optical device according to claim 1. The second substrate further includes a second light diverging element disposed to face a portion extending in the first direction or a portion extending in the second direction of the light shielding portion of the first substrate. Including
The electro-optical device according to claim 2, wherein a size of the second light diverging element in the plan view is smaller than a size of the first light diverging element. The first light diverging element is made of a first material of the same type as the base material of the second substrate,
The said 2nd board | substrate is a transparent layer which has a refractive index larger than the refractive index of a said 1st material between the said base material and the said 1st light-diffusion element, The Claim 1 thru | or 3 characterized by the above-mentioned. The electro-optical device according to any one of the above. The transparent layer has a recess recessed in a direction from the first substrate toward the second substrate,
The electro-optical device according to claim 4, wherein the first light diverging element is formed by filling the concave portion of the transparent layer with the first material.   4. The electro-optical device according to claim 1, wherein the first light diverging element is made of a first material of the same type as the base material of the second substrate and is porous. 5. The base material of the second substrate has a recess recessed in a direction from the first substrate toward the second substrate,
The electro-optical device according to claim 6, wherein the first light diverging element is formed by filling the concave portion of the base material with the porous first material.   The electro-optical device according to claim 1, wherein the second substrate further includes a microlens that collects incident light toward the pixel opening. The second substrate includes a transparent layer made of a first material of the same type as the base material between the base material of the second substrate and the microlens,
The transparent layer has a recess recessed in a direction from the first substrate toward the second substrate;
The electro-optical device according to claim 8, wherein the microlens is formed by filling the concave portion with a second material having a refractive index larger than that of the base material.   An electronic apparatus comprising the electro-optical device according to claim 1.

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