JP2016062879A - Anisotropic conductive material - Google Patents
Anisotropic conductive material Download PDFInfo
- Publication number
- JP2016062879A JP2016062879A JP2014192647A JP2014192647A JP2016062879A JP 2016062879 A JP2016062879 A JP 2016062879A JP 2014192647 A JP2014192647 A JP 2014192647A JP 2014192647 A JP2014192647 A JP 2014192647A JP 2016062879 A JP2016062879 A JP 2016062879A
- Authority
- JP
- Japan
- Prior art keywords
- conductive particles
- connection structure
- anisotropic conductive
- electronic component
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Manufacturing Of Electrical Connectors (AREA)
- Conductive Materials (AREA)
Abstract
Description
本発明は、電子部品を接続させるために用いられる異方性導電材料、接続構造体、タッチパネル装置、及び接続構造体の製造方法に関する。 The present invention relates to an anisotropic conductive material used for connecting electronic components, a connection structure, a touch panel device, and a method for manufacturing the connection structure.
近年、タッチパネルセンサー等の基板に、ポリエチレンテレフタレート(PET)やポリシクロオレフィン等のようなプラスチック基板が使用されている。これらのプラスチック基板に施されるITO等の配線は、非視認性やコストダウンの目的で、1μm以下の薄い配線が使用される傾向にある。 In recent years, plastic substrates such as polyethylene terephthalate (PET) and polycycloolefin have been used for substrates such as touch panel sensors. As the wiring made of ITO or the like applied to these plastic substrates, a thin wiring of 1 μm or less tends to be used for the purpose of invisibility and cost reduction.
このような配線基板に対し、通常のACF(Anisotropic Conductive Film)を用いて電気的接続部位を設けると、ACF中に分散して含まれている導電性粒子が、圧着圧力によって端子および端子下部のプラスチック基板を変形させ、端子部にクラックを生じることがある。端子部にクラックが生じると、所定の温度及び湿度などのストレス条件下に曝す信頼性試験の後において導通抵抗が上昇することがあった。 When an electrical connection portion is provided on such a wiring board using a normal ACF (Anisotropic Conductive Film), the conductive particles dispersed and contained in the ACF are caused to adhere to the terminal and the lower part of the terminal by the pressure applied by pressure bonding. The plastic substrate may be deformed and a crack may be generated in the terminal portion. When a crack occurs in the terminal portion, the conduction resistance may increase after a reliability test exposed to a stress condition such as a predetermined temperature and humidity.
図3に、従来の接続構造体の一例を示す。図3に示す接続構造体は、第1の支持基板112とその主面に設けられた端子111を備える第1の電子部品110と、第2の支持基板121とその主面に設けられた端子122とを備える第2の電子部品120とが、ACF130を介して圧着して接合されたものである。ACF130は、バインダー樹脂131とバインダー樹脂131中に分散して含まれる導電性粒子133を含む。導電性粒子133は、コア粒子136の表面に金属層137が施されている。
FIG. 3 shows an example of a conventional connection structure. The connection structure shown in FIG. 3 includes a first
導電性粒子133として、圧力に対して変形しにくい高弾性タイプのものを用いた場合、電子部品同士の導通性を確保するためには好適であるが、コア粒子136が硬すぎると、第1の支持基板112がプラスチック基板である場合、圧着時の圧力を吸収しきれず、端子111の一部にクラックを生じてしまう場合がある。このため、導電性粒子の弾性率を所定の条件に規定し、クラックを防止することが試みられている(例えば、特許文献1など)。
When a highly elastic type that is difficult to be deformed with respect to pressure is used as the
端子部のクラックを回避するためには、ACF中の導電性粒子を、圧力に対して十分に変形しやすい低弾性タイプにして、導電性粒子の変形によって端子部上の圧着圧力を低減することが考えられる。しかしながら、導電性粒子を低弾性にしすぎると、導電性粒子と端子間の接触が十分でなく、初期導通抵抗が上昇してしまうことがあり、単に低弾性化すれば良いというものではない。 In order to avoid cracks in the terminal part, the conductive particles in the ACF should be made of a low elastic type that is sufficiently deformable against pressure, and the pressure on the terminal part is reduced by deformation of the conductive particles. Can be considered. However, if the conductive particles are made too low in elasticity, the contact between the conductive particles and the terminals may not be sufficient, and the initial conduction resistance may increase, and it is not necessary to simply reduce the elasticity.
図4に、低弾性の導電性粒子を用いた接続構造体の一例を示す。図4に示す接続構造体において、図3と同じ構成については説明を省略する。図4に示す例では、コア粒子136として柔らかい材料を用いているが、柔らかすぎるため圧着時に変形しすぎてしまい、端子111、122間の十分な導通が得られない。
FIG. 4 shows an example of a connection structure using low-elasticity conductive particles. In the connection structure shown in FIG. 4, the description of the same configuration as that in FIG. 3 is omitted. In the example shown in FIG. 4, a soft material is used as the
以上のような状況に鑑み、本発明は、初期及び信頼性試験後において優れた導通性が得られる異方性導電材料、接続構造体、タッチパネル装置、及び接続構造体の製造方法を提供する。 In view of the circumstances as described above, the present invention provides an anisotropic conductive material, a connection structure, a touch panel device, and a method for manufacturing the connection structure that provide excellent electrical conductivity after the initial and reliability tests.
前述した課題を解決するために、本発明に係る異方性導電材料は、バインダー樹脂と、前記バインダー樹脂中に含まれ、30%変形時の圧縮弾性率が30MPa以上120MPa以下である導電性粒子とを含有し、前記導電性粒子が、表面に突起部を有することを特徴とする。 In order to solve the above-described problems, an anisotropic conductive material according to the present invention includes a binder resin and conductive particles that are contained in the binder resin and have a compressive elastic modulus at 30% deformation of 30 MPa to 120 MPa. And the conductive particles have protrusions on the surface.
また、本発明に係る接続構造体は、第1の支持基板上に端子が形成された第1の電子部品と、第2の支持基板上に端子が形成された第2の電子部品と、前記第1の電子部品の端子と前記第2の電子部品の端子とを接続する導電性粒子を含有する異方性導電材料の硬化物からなる異方性導電膜とを備え、前記異方性導電材料が、バインダー樹脂と、前記バインダー樹脂中に含まれ、30%変形時の圧縮弾性率が30MPa以上120MPa以下である導電性粒子とを含有し、前記導電性粒子が、表面に突起部を有することを特徴とする。 In addition, a connection structure according to the present invention includes a first electronic component having a terminal formed on a first support substrate, a second electronic component having a terminal formed on a second support substrate, An anisotropic conductive film made of a cured product of an anisotropic conductive material containing conductive particles that connect the terminal of the first electronic component and the terminal of the second electronic component; The material contains a binder resin and conductive particles that are contained in the binder resin and have a compression elastic modulus of 30 MPa or more and 120 MPa or less at 30% deformation, and the conductive particles have protrusions on the surface. It is characterized by that.
また、本発明に係るタッチパネル装置は、前述した接続構造体を備えることを特徴とする。 In addition, a touch panel device according to the present invention includes the above-described connection structure.
また、本発明に係る接続構造体の製造方法は、第1の支持基板上に端子が形成された第1の電子部品と、第2の支持基板上に端子が形成された第2の電子部品とを、バインダー樹脂と、前記バインダー樹脂中に含まれ、30%変形時の圧縮弾性率が30MPa以上120MPa以下である導電性粒子とを含有し、前記導電性粒子が、表面に突起部を有する異方性導電接着フィルムを介在させて圧着し、前記異方性接着フィルムを硬化させ、接続構造体を得ることを特徴とする。 The connection structure manufacturing method according to the present invention includes a first electronic component having a terminal formed on a first support substrate and a second electronic component having a terminal formed on a second support substrate. A binder resin and conductive particles that are contained in the binder resin and have a compression elastic modulus at 30% deformation of 30 MPa or more and 120 MPa or less, and the conductive particles have protrusions on the surface. A bonded structure is obtained by pressure bonding with an anisotropic conductive adhesive film interposed therebetween, and curing the anisotropic adhesive film.
本発明によれば、30%変形時の圧縮弾性率が30MPa以上120MPa以下であり、且つ表面に突起部を有する導電性粒子を用いるため、変形しやすいプラスチック基板を使用した場合でも、初期及び信頼性試験後において、優れた導通性を得ることができる。 According to the present invention, the compressive elastic modulus at 30% deformation is 30 MPa or more and 120 MPa or less, and conductive particles having protrusions on the surface are used. After the property test, excellent conductivity can be obtained.
以下、本発明の実施の形態について、図面を参照しながら下記順序にて詳細に説明する。
1.異方性導電材料、及び接続構造体
2.実施例
Hereinafter, embodiments of the present invention will be described in detail in the following order with reference to the drawings.
1. 1. An anisotropic conductive material and connection structure Example
<1.異方性導電材料、及び接続構造体>
図1は、異方性導電材料を用いた接続構造体の一部断面を模式的に示す図である。図1に示すように、接続構造体は、第1の支持基板12上に端子11が形成された第1の電子部品10と、第2の支持基板21上に端子22が形成された第2の電子部品20と、第1の電子部品10の端子11と第2の電子部品20の端子22とを接続する導電性粒子33を含有する異方性導電材料の硬化物からなる異方性導電膜30とを備える。
<1. Anisotropic Conductive Material and Connection Structure>
FIG. 1 is a diagram schematically showing a partial cross section of a connection structure using an anisotropic conductive material. As shown in FIG. 1, the connection structure includes a first
図1において、導電性粒子33は、コア粒子36の表面全体を覆うように金属層37が被膜されて構成され、圧着時の圧力により若干変形した状態となっている。圧着等の条件によるが、通常、タッチパネルなどにおける接続構造体では、圧着された結果、導電性粒子が約30%程度変形するケースが多く見られる。このため、導電性粒子の硬さを特定するにあたり、30%変形時の圧縮弾性率という特定条件下での圧縮弾性率を指標とすることは、異方性導電材料を用いて電子部品を電気的に良好に接続させた状態の導電性粒子を示すのに、優れた指標である。
In FIG. 1, the
すなわち、本実施の形態に係る異方性導電材料は、バインダー樹脂と、前記バインダー樹脂中に含まれ、30%変形時の圧縮弾性率が30MPa以上120MPa以下である導電性粒子33とを含有し、導電性粒子33が、表面に突起部Pを有する。これにより、例えば第1の支持基板12として、変形しやすいプラスチック基板を使用した場合でも、端子12、22にクラックを生じることを抑制することができ、初期及び信頼性試験後において、優れた導通性を得ることができる。ここで、プラスチップ基板とは、透明性、電気特性を兼ね備えた熱可塑性のフレキシブル基板をいう。
That is, the anisotropic conductive material according to the present embodiment contains a binder resin and
導電性粒子の30%変形時の圧縮弾性率の下限値は、好ましくは30MPa以上、より好ましくは45MPa以上である。圧縮弾性率をこのような下限値以上とすることにより、導電性粒子が柔らかすぎることが原因となって、抵抗値が大きくなることを抑制することが可能となる。また、導電性粒子の30%変形時の圧縮弾性率の上限値は、好ましくは120MPa以下、より好ましくは110MPa以下である。圧縮弾性率をこのような上限値以下とすることにより、電子部品等の異方性導電接続において、端子部のクラック発生を抑制することが可能となる。 The lower limit value of the compression elastic modulus at the time of 30% deformation of the conductive particles is preferably 30 MPa or more, more preferably 45 MPa or more. By setting the compression elastic modulus to be equal to or higher than such a lower limit value, it is possible to prevent the resistance value from increasing due to the conductive particles being too soft. Moreover, the upper limit of the compression elastic modulus at the time of 30% deformation of the conductive particles is preferably 120 MPa or less, more preferably 110 MPa or less. By setting the compression elastic modulus to be equal to or lower than such an upper limit value, it is possible to suppress occurrence of cracks in the terminal portion in anisotropic conductive connection such as electronic parts.
導電性粒子の30%変形時の圧縮弾性率は、例えば、次のようにして求めることができる。微小圧縮試験機を用い、導電性粒子を直径の比率で30%圧縮し、その際の荷重値(圧縮変形荷重値)を求める。圧縮変形荷重値P(単位:mN)と粒子直径d(単位:μm)から下記式1により圧縮弾性率St(単位:MPa)を算出することができる。
St=2.8P/(π・d2) (式1)
The compression elastic modulus at the time of 30% deformation of the conductive particles can be determined, for example, as follows. Using a micro-compression tester, the conductive particles are compressed by 30% in diameter ratio, and the load value (compression deformation load value) at that time is obtained. The compression elastic modulus St (unit: MPa) can be calculated from the compressive deformation load value P (unit: mN) and the particle diameter d (unit: μm) by the following formula 1.
St = 2.8P / (π · d 2 ) (Formula 1)
導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合の下限値は、好ましくは5%以上、より好ましくは20%以上である。突起部の面積割合をこのような下限値とすることにより、突起部と端子との接触が十分に行われ、良好な初期導通性を得ることができる。また、導電性粒子の突起部が無い場合の表面積に占める突起部の面積の上限値は、好ましくは110%以下、より好ましくは95%以下である。突起部の面積をこのような範囲内とすることにより、各突起部に掛かる圧力が適度であるため、初期及び信頼性試験後において優れた導通性を得ることができる。すなわち、導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は、20%以上95%以下であることが好ましい。 The lower limit of the area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions is preferably 5% or more, more preferably 20% or more. By setting the area ratio of the protrusions to such a lower limit, contact between the protrusions and the terminals is sufficiently performed, and good initial conductivity can be obtained. In addition, the upper limit of the area of the protruding portion in the surface area when there is no protruding portion of conductive particles is preferably 110% or less, more preferably 95% or less. By setting the area of the protrusion within such a range, the pressure applied to each protrusion is appropriate, and therefore excellent electrical conductivity can be obtained after the initial and reliability tests. That is, the area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions is preferably 20% or more and 95% or less.
なお、突起部の面積が100%を上回る場合があるのは、突起部の上に重ねて突起部が形成されているような粒子も実在するため、重ねて形成されている突起部も加算して計算したためである。また、導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は、SEM観察によって得られた画像の解析により行うことができる。 Note that the area of the protrusions may exceed 100% because there are also particles that are formed on the protrusions so that the protrusions are formed. This is because of the calculation. Moreover, the area ratio of the protrusion part which occupies the surface area when there is no protrusion part of the conductive particles can be performed by analysis of an image obtained by SEM observation.
導電性粒子の突起部は、ニッケル、パラジウム、及びチタンからなる群から選択される1種以上から構成されることが好ましい。突起部が、比較的硬度の高い金属で構成されていることにより、導電性粒子の圧縮弾性率が比較的低くても、突起部が端子に食い込むため、良好な導通性を得ることができる。また、これらの比較的硬度の高い金属の表面に金メッキを施し、導通性を向上させてもよい。ここで、硬度とは、JIS Z 2244に規定されるビッカース硬度をいう。 It is preferable that the protrusion part of electroconductive particle is comprised from 1 or more types selected from the group which consists of nickel, palladium, and titanium. Since the protrusion is made of a metal having a relatively high hardness, even if the compressive elastic modulus of the conductive particles is relatively low, the protrusion bites into the terminal, so that good conductivity can be obtained. Further, the surface of these relatively hard metals may be plated with gold to improve conductivity. Here, the hardness means a Vickers hardness defined in JIS Z 2244.
図2は、突起部を有する導電性粒子の一例を示す断面図である。図2に示すように、導電性粒子30は、コア粒子36と、コア粒子36を被覆する第1の金属層38と、第1の金属層に付着させた微粒子40と、第1の金属層38と微粒子40とを被覆する第2の金属層39とを有する。
FIG. 2 is a cross-sectional view showing an example of conductive particles having protrusions. As shown in FIG. 2, the
コア粒子36としては、導電性粒子の圧縮弾性率を前述の範囲のものとするために、樹脂粒子が好適に用いられる。コア粒子を形成するための樹脂としては、例えば、エポキシ樹脂、フェノール樹脂、アクリル樹脂、アクリロニトリル・スチレン(AS)樹脂、ベンゾグアナミン樹脂、ジビニルベンゼン系樹脂、スチレン系樹脂、及びこれらの共重合樹脂などが挙げられる。
As the
第1の金属層38は、ニッケルを含むことが好ましく、第2の金属層39は、金を含むことが好ましい。また、突起となる微粒子40は、ニッケル、パラジウム、チタン、及び金属酸化物からなる群から選択される1種以上から構成されることが好ましい。比較的硬度の高い金属や金属酸化物で構成されていることにより、導電性粒子の圧縮弾性率が比較的低くても、突起部が端子に食い込むため、良好な導通性を得ることができる。
The
なお、図2に示す導電性粒子において、コア粒子36は、単体として描かれているが、複数の材料で構成されていてもよく、また、コア粒子自体を多層構造としてもよい。また、金属層37も、層の数に特に制限はなく、図2に示す以外の多層構造としてもよい。
In the conductive particles shown in FIG. 2, the
導電性粒子の平均粒径(D50)は、2μm以上30μm以下であることが好ましく、4μm以上20μm以下であることがより好ましい。導電性粒子の平均粒径が小さ過ぎると、異方性接続が困難となり、導電性粒子の平均粒径が大き過ぎると、導電性粒子の圧痕の写り込みが目立つ場合がある。 The average particle diameter (D50) of the conductive particles is preferably 2 μm or more and 30 μm or less, and more preferably 4 μm or more and 20 μm or less. If the average particle size of the conductive particles is too small, anisotropic connection becomes difficult, and if the average particle size of the conductive particles is too large, the imprint of the conductive particles may be noticeable.
バインダー樹脂は、特に限定されるものではないが、低温硬化が可能なラジカル硬化型が好適に用いられる。ラジカル硬化型のバインダー樹脂は、膜形成樹脂と、ラジカル硬化性樹脂と、ラジカル重合開始剤とを含有する。 The binder resin is not particularly limited, but a radical curable type capable of low temperature curing is preferably used. The radical curable binder resin contains a film-forming resin, a radical curable resin, and a radical polymerization initiator.
膜形成樹脂としては、例えば、フェノキシ樹脂、ウレタン樹脂、ポリエステル樹脂、スチレンイソプレン樹脂、ニトリルブタジエン樹脂などが挙げられる。 Examples of the film forming resin include phenoxy resin, urethane resin, polyester resin, styrene isoprene resin, and nitrile butadiene resin.
ラジカル硬化性樹脂としては、例えば、エポキシ(メタ)アクリレート類、ウレタン(メタ)アクリレート類、(メタ)アクリレートオリゴマーなどが挙げられ、これらは、1種単独で使用してもよいし、2種以上を併用してもよい。 Examples of the radical curable resin include epoxy (meth) acrylates, urethane (meth) acrylates, (meth) acrylate oligomers, and the like. These may be used alone or in combination of two or more. May be used in combination.
熱ラジカル重合開始剤としては、過酸化物、アゾ化合物などが挙げられる。過酸化物としては、ジアシルパーオキサイド化合物、パーオキシエステル化合物、ハイドロパーオキサイド化合物、パーオキシジカーボネート化合物、パーオキシケタール化合物、ジアルキルパーオキサイド化合物、及びケトンパーオキサイド化合物などが挙げられる。光ラジカル重合開始剤としては、例えば、アルキルフェノン系光重合開始剤、アシルフォスフィンオキサイド系光重合開始剤、チタノセン系重合開始剤、オシムエステル系光重合開始剤などが挙げられる。 Examples of the thermal radical polymerization initiator include peroxides and azo compounds. Examples of peroxides include diacyl peroxide compounds, peroxy ester compounds, hydroperoxide compounds, peroxydicarbonate compounds, peroxyketal compounds, dialkyl peroxide compounds, and ketone peroxide compounds. Examples of the radical photopolymerization initiator include alkylphenone photopolymerization initiators, acylphosphine oxide photopolymerization initiators, titanocene polymerization initiators, and oxime ester photopolymerization initiators.
さらに、バインダー樹脂には、その他の成分として、シランカップリング剤、無機フィラー、アクリルゴムなどのエラストマー、カーボンブラックなどの顔料を、目的に応じて適宜配合してもよい。 Further, the binder resin may be appropriately mixed with other components such as a silane coupling agent, an inorganic filler, an elastomer such as acrylic rubber, and a pigment such as carbon black depending on the purpose.
また、異方性導電材料の形状は、特に限定されないが、フィルム状に成形して異方性導電フィルムとすることが好適な形態として挙げられる。 In addition, the shape of the anisotropic conductive material is not particularly limited, but it is preferable to form an anisotropic conductive film by forming it into a film shape.
次に、前述の異方性導電材料を用いた接続構造体の製造方法について、図1を参照して説明する。本実施の形態に係る接続構造体の製造方法は、第1の支持基板12上に端子11が形成された第1の電子部品10と、第2の支持基板21上に端子22が形成された第2の電子部品とを、バインダー樹脂31と、バインダー樹脂31中に含まれ、30%変形時の圧縮弾性率が30MPa以上120MPa以下である導電性粒子33とを含有し、導電性粒子33が、表面に突起部Pを有する異方性導電接着フィルムを介在させて圧着し、異方性接着フィルムを硬化させ、接続構造体を得る。
Next, the manufacturing method of the connection structure using the above-mentioned anisotropic conductive material will be described with reference to FIG. In the manufacturing method of the connection structure according to the present embodiment, the first
第1の電子部品10及び第2の電子部品22は、目的に応じて適宜選択することができるが、第1の支持基板12及び第2の支持基板22の少なくとも一方の弾性率が5.5GPa以下である電子部品が好適に用いられる。弾性率が5.5GPa以下である支持基板としては、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリカーボネート(PC)、ポリシクロオレフィン等のプラスチップ基板が挙げられる。プラスチック基板としては、透明性、低誘電率、低誘電正接などの観点から、ポリシクロオレフィンが好適に用いられ、性能に照らした価格的な優位性からは、PETが好適に用いられる。
The first
第1の電子部品としては、例えば、タッチパネル用途、LCD(Liquid Crystal Display)パネル用途などのプラスチック基板等を挙げることができる。また、第2の回路部材としては、例えば、COF(Chip On Film)などのフレキシブル基板(FPC:Flexible Printed Circuits)、テープキャリアパッケージ(TCP)基板、IC(Integrated Circuit)等を挙げることができる。また、タッチパネルの形態において、例えば、第1の支持基板12として、可視光に対して80%以上の透過率を有するものを用いることができ、好ましくは95%以上の透過率を有するものを用いることができる。
Examples of the first electronic component include a plastic substrate for touch panel use, LCD (Liquid Crystal Display) panel use, and the like. In addition, examples of the second circuit member include a flexible printed circuit (FPC) such as COF (Chip On Film), a tape carrier package (TCP) substrate, and an integrated circuit (IC). In the form of the touch panel, for example, as the
<2.実施例>
以下、本発明の実施例について説明する。本実施例では、所望の圧縮弾性率を有する導電性粒子を作製し、これをバインダー樹脂に添加して異方性導電フィルムを作製した。そして、異方性導電フィルムを用いて基材とFPC(Flexible Printed Circuits)とを接続し、初期及び信頼性試験後の抵抗値を測定した。なお、本発明は、これらの実施例に限定されるものではない。
<2. Example>
Examples of the present invention will be described below. In this example, conductive particles having a desired compressive elastic modulus were prepared and added to a binder resin to prepare an anisotropic conductive film. And the base material and FPC (Flexible Printed Circuits) were connected using the anisotropic conductive film, and the resistance value after an initial stage and a reliability test was measured. The present invention is not limited to these examples.
[導電性粒子の作成]
導電性粒子は、コア粒子と、コア粒子を被覆する第1の金属層と、第1の金属層に付着させた微粒子と、第1の金属層と微粒子とを被覆する第2の金属層とを有するものを作製した。先ず、ジビニルベンゼンとアクリル酸の共重合体からなる平均粒子径10μmのプラスチック核体粒子をコア粒子として用意した。プラスチック核体粒子は、架橋度を調整し、所定の圧縮弾性率となるものを調製した。
[Creation of conductive particles]
The conductive particles include a core particle, a first metal layer covering the core particle, fine particles attached to the first metal layer, and a second metal layer covering the first metal layer and the fine particles. The thing which has was produced. First, plastic core particles having an average particle diameter of 10 μm made of a copolymer of divinylbenzene and acrylic acid were prepared as core particles. The plastic core particles were prepared so that the degree of cross-linking was adjusted and a predetermined compression modulus was obtained.
次に、プラスチック核体粒子の表面に、第1の金属層としてニッケルメッキを無電解めっきにより処理した後、突起となる微粒子を付着させ、その後さらに第2の金属層として無電解金メッキにより処理し、突起部を有する導電性粒子を作製した。突起部のサイズは、SEM(Scanning Electron Microscope)によって得られた画像を解析して求めたところ、約0.1μm〜1.0μmであり、平均0.5μmであった。 Next, after the nickel plating as the first metal layer is processed by electroless plating on the surface of the plastic core particles, the fine particles to be projections are attached, and then the second metal layer is further processed by electroless gold plating. The electroconductive particle which has a projection part was produced. The size of the protrusion was determined by analyzing an image obtained by SEM (Scanning Electron Microscope), and was about 0.1 μm to 1.0 μm, with an average of 0.5 μm.
なお、表面に突起部を有しない導電性粒子は、上記から突起部を形成するための微粒子を付着させる工程を除いて作製した。 In addition, the electroconductive particle which does not have a projection part on the surface was produced except the process of attaching the microparticles | fine-particles for forming a projection part from the above.
[導電性粒子の突起部の占有面積割合の測定]
導電性粒子の表面に設けられた突起部の占有面積は、SEMによって得られた画像の解析により行った。突起部の占有面積割合は、突起部の表面積の積算値を、表面に突起部を設けていない同粒径の表面積の値で除し、百分率(%)にて求めた。なお、下記試験結果において、突起部の占有面積割合が100%を上回るものがあるが、これは突起部の上に重ねて突起部が形成されているような粒子も実在し、重ねてできている突起部についても加算して計算したためである。
[Measurement of occupation area ratio of protrusions of conductive particles]
The area occupied by the protrusions provided on the surface of the conductive particles was determined by analyzing an image obtained by SEM. The ratio of the area occupied by the protrusions was obtained as a percentage (%) by dividing the integrated value of the surface area of the protrusions by the value of the surface area of the same particle diameter without the protrusions on the surface. In addition, in the following test results, there are cases in which the proportion of the area occupied by the protrusions exceeds 100%. However, this is because particles that are formed on the protrusions so that the protrusions are formed exist and overlap. This is because the calculation is also performed for the protrusions that are present.
[導電性粒子の圧縮弾性率の測定]
導電性粒子の30%変形時の圧縮弾性率は、微小圧縮試験機(MCT−W201、島津製作所製)を用い、次のようにして求めた。直径50μmのダイヤモンド製円柱の平滑端面で、圧縮速度0.331mN/秒間にて、導電性粒子を30%圧縮し、その際の荷重値(圧縮変形荷重値)を求めた。圧縮変形荷重値P(単位:mN)と粒子直径d(単位:μm)から下記式1により圧縮弾性率St(単位:MPa)を算出した。
St=2.8P/(π・d2) (式1)
[Measurement of compression modulus of conductive particles]
The compression elastic modulus at 30% deformation of the conductive particles was determined as follows using a micro compression tester (MCT-W201, manufactured by Shimadzu Corporation). The conductive particles were compressed 30% with a smooth end face of a diamond cylinder having a diameter of 50 μm at a compression speed of 0.331 mN / sec, and the load value (compression deformation load value) at that time was determined. The compression elastic modulus St (unit: MPa) was calculated from the compression deformation load value P (unit: mN) and the particle diameter d (unit: μm) by the following formula 1.
St = 2.8P / (π · d 2 ) (Formula 1)
[ACFの作製]
下記組成のバインダー樹脂を調製した。
[Production of ACF]
A binder resin having the following composition was prepared.
母材となるバインダー樹脂に、導電性粒子を2質量部添加して攪拌し、導電性粒子をバインダー樹脂母材中に十分に分散させ、その後フィルム状に成形して厚さ25μm、幅2.0mmのACFを得た。 2 parts by mass of conductive particles are added to the binder resin as a base material and stirred to sufficiently disperse the conductive particles in the binder resin base material, and then formed into a film shape to have a thickness of 25 μm and a width of 2. A 0 mm ACF was obtained.
[接続構造体の作製]
基材フィルムとして、PETフィルム(弾性率:5.3GPa、製品名:PET−01−BU、三井化学東セロ株式会社製)、シクロオレフィンコポリマーフィルム(弾性率:2.6GPa、製品名:ARTON D4540、JSR社製)、及びポリイミドフィルム(弾性率:6.9GPa、製品名:ユーピレックス75S、宇部興産社製)を用意した。厚み125μmの各基材フィルムの表面にITO配線パターンを形成して、第1の電子部品を用意した。
[Production of connection structure]
As a base film, PET film (elastic modulus: 5.3 GPa, product name: PET-01-BU, manufactured by Mitsui Chemicals, Inc.), cycloolefin copolymer film (elastic modulus: 2.6 GPa, product name: ARTON D4540, JSR) and a polyimide film (elastic modulus: 6.9 GPa, product name: Upilex 75S, Ube Industries, Ltd.) were prepared. An ITO wiring pattern was formed on the surface of each substrate film having a thickness of 125 μm to prepare a first electronic component.
ポリイミドフィルム表面に、Ni/Auめっきを施した銅線で配線パターンが形成された第2の電子部品(FPC)を用意した。第2の電子部品の配線高は25μm、ピッチは400μm(L/S=200/200)とした。 A second electronic component (FPC) having a wiring pattern formed on a polyimide film surface with a copper wire plated with Ni / Au was prepared. The wiring height of the second electronic component was 25 μm, and the pitch was 400 μm (L / S = 200/200).
第1の電子部品と第2の電子部品を、それぞれの端子が対向するように配置し、ACFを両電子部品の間に挟んで圧着し、電気的接続部を形成し、接合構造体を得た。圧着は、150℃、1MPa/5秒の条件で行った。 The first electronic component and the second electronic component are arranged so that the respective terminals face each other, and the ACF is sandwiched between the two electronic components and crimped to form an electrical connection portion, whereby a bonded structure is obtained. It was. The pressure bonding was performed under the conditions of 150 ° C. and 1 MPa / 5 seconds.
[抵抗値の測定、評価]
デジタルマルチメーター(商品名:デジタルマルチメーター7561、横河電機社製)を用いて、接合構造体の初期抵抗値(R1)を測定した。初期抵抗の評価は、次の基準により行った。
◎:0.3Ω以下
○:0.3Ωより大きく、0.5Ω以下
×:0.5より大きい
[Measurement and evaluation of resistance value]
The initial resistance value (R1) of the bonded structure was measured using a digital multimeter (trade name: Digital Multimeter 7561, manufactured by Yokogawa Electric Corporation). The initial resistance was evaluated according to the following criteria.
◎: 0.3Ω or less ○: Greater than 0.3Ω, 0.5Ω or less ×: Greater than 0.5
また、接合構造体を85℃、85%RHの条件下に500時間放置した後、抵抗値を測定し、信頼性試験後抵抗値(R2)とした。信頼性の評価は、信頼性試験後抵抗値(R2)から初期抵抗値(R1)を引いた値(ΔR)を求め、ΔRを以下の基準に照らして行った。
◎:0.5Ω以下
○:0.5Ωより大きく、1.0Ω以下
×:1.0Ωより大きい
Further, the bonded structure was allowed to stand for 500 hours under the conditions of 85 ° C. and 85% RH, and then the resistance value was measured to obtain the resistance value (R2) after the reliability test. The reliability was evaluated by obtaining a value (ΔR) obtained by subtracting the initial resistance value (R1) from the resistance value (R2) after the reliability test and comparing ΔR with the following criteria.
◎: 0.5Ω or less ○: Greater than 0.5Ω, 1.0Ω or less ×: Greater than 1.0Ω
また、総合判定は、初期抵抗の評価又は信頼性の評価の悪い方の評価とした。 In addition, the comprehensive judgment was made by evaluating the initial resistance or the poorer reliability.
<比較例1>
表2に示すように、弾性率が5.3GPaのPETフィルムを基材フィルムとした第1の電子部品を用いた。導電性粒子は、表面に突起部を有しないものを使用した。導電性粒子の30%変形時の圧縮弾性率は、32MPaであった。この導電性粒子を添加した異方性導電フィルムを用いて第1の電子部品と第2の電子部品とを接続させ、接続構造体を得た。接続構造体の初期抵抗値(R1)は0.55Ωであり、初期抵抗の評価は×であった。信頼性試験後抵抗値(R2)は1.21Ω、ΔRは0.66Ωであり、信頼性の評価は○であった。よって、総合判定は×であった。
<Comparative Example 1>
As shown in Table 2, the first electronic component having a base film made of a PET film having an elastic modulus of 5.3 GPa was used. The electroconductive particle used what does not have a projection part on the surface. The compression elastic modulus at the time of 30% deformation of the conductive particles was 32 MPa. Using the anisotropic conductive film to which the conductive particles were added, the first electronic component and the second electronic component were connected to obtain a connection structure. The initial resistance value (R1) of the connection structure was 0.55Ω, and the evaluation of the initial resistance was x. The resistance value (R2) after the reliability test was 1.21Ω, ΔR was 0.66Ω, and the reliability was evaluated as ◯. Therefore, the comprehensive judgment was x.
<比較例2>
表2に示すように、30%変形時の圧縮弾性率が197MPaの導電性粒子を用いたこと以外は、比較例1と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.97Ωであり、初期抵抗の評価は×であった。信頼性試験後抵抗値(R2)は2.53Ω、ΔRは1.56Ωであり、信頼性の評価は×であった。よって、総合判定は×であった。
<Comparative Example 2>
As shown in Table 2, a connection structure was obtained in the same manner as in Comparative Example 1 except that conductive particles having a compression elastic modulus at 30% deformation of 197 MPa were used. The initial resistance value (R1) of the connection structure was 0.97Ω, and the evaluation of the initial resistance was x. The resistance value (R2) after the reliability test was 2.53Ω, ΔR was 1.56Ω, and the reliability was evaluated as x. Therefore, the comprehensive judgment was x.
<従来例>
表2に示すように、弾性率が6.9GPaのポリイミドフィルムを基材フィルムとした第1の電子部品を用いたこと以外は、比較例2と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.25Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.6Ω、ΔRは0.35Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Conventional example>
As shown in Table 2, a connection structure was obtained in the same manner as in Comparative Example 2 except that the first electronic component using a polyimide film having an elastic modulus of 6.9 GPa as a base film was used. The initial resistance value (R1) of the connection structure was 0.25Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.6Ω, ΔR was 0.35Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was ◎.
<比較例3>
表2に示すように、弾性率が2.6GPaのシクロオレフィンコポリマーフィルムを基材フィルムとした第1の電子部品を用いた。導電性粒子は、微粒子としてニッケルを付着させ、表面に突起部を有するものを使用した。導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は55%であった。また、導電性粒子の30%変形時の圧縮弾性率は、28MPaであった。この導電性粒子を添加した異方性導電フィルムを用いて第1の電子部品と第2の電子部品とを接続させ、接続構造体を得た。接続構造体の初期抵抗値(R1)は0.52Ωであり、初期抵抗の評価は×であった。信頼性試験後抵抗値(R2)は2.72Ω、ΔRは2.2Ωであり、信頼性の評価は×であった。よって、総合判定は×であった。
<Comparative Example 3>
As shown in Table 2, the first electronic component using a cycloolefin copolymer film having an elastic modulus of 2.6 GPa as a base film was used. As the conductive particles, particles having nickel as fine particles and having protrusions on the surface were used. The area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions was 55%. Further, the compression elastic modulus at 30% deformation of the conductive particles was 28 MPa. Using the anisotropic conductive film to which the conductive particles were added, the first electronic component and the second electronic component were connected to obtain a connection structure. The initial resistance value (R1) of the connection structure was 0.52Ω, and the evaluation of the initial resistance was x. The resistance value (R2) after the reliability test was 2.72Ω, ΔR was 2.2Ω, and the evaluation of reliability was x. Therefore, the comprehensive judgment was x.
<実施例1>
表2に示すように、弾性率が2.6GPaのシクロオレフィンコポリマーフィルムを基材フィルムとした第1の電子部品を用いた。導電性粒子は、微粒子としてニッケルを付着させ、表面に突起部を有するものを使用した。導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は55%であった。また、導電性粒子の30%変形時の圧縮弾性率は、32MPaであった。この導電性粒子を添加した異方性導電フィルムを用いて第1の電子部品と第2の電子部品とを接続させ、接続構造体を得た。接続構造体の初期抵抗値(R1)は0.28Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.69Ω、ΔRは0.51Ωであり、信頼性の評価は○であった。よって、総合判定は○であった。
<Example 1>
As shown in Table 2, the first electronic component using a cycloolefin copolymer film having an elastic modulus of 2.6 GPa as a base film was used. As the conductive particles, particles having nickel as fine particles and having protrusions on the surface were used. The area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions was 55%. Moreover, the compression elastic modulus at the time of 30% deformation of the conductive particles was 32 MPa. Using the anisotropic conductive film to which the conductive particles were added, the first electronic component and the second electronic component were connected to obtain a connection structure. The initial resistance value (R1) of the connection structure was 0.28Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.69Ω, ΔR was 0.51Ω, and the reliability was evaluated as ◯. Therefore, the overall judgment was “good”.
<実施例2>
表2に示すように、30%変形時の圧縮弾性率が49MPaの導電性粒子を用いたこと以外は、実施例1と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.25Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.59Ω、ΔRは0.34Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 2>
As shown in Table 2, a connection structure was obtained in the same manner as in Example 1, except that conductive particles having a compression elastic modulus at 30% deformation of 49 MPa were used. The initial resistance value (R1) of the connection structure was 0.25Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.59Ω, ΔR was 0.34Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was ◎.
<実施例3>
表2に示すように、30%変形時の圧縮弾性率が101MPaの導電性粒子を用いたこと以外は、実施例1と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.29Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.62Ω、ΔRは0.33Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 3>
As shown in Table 2, a connection structure was obtained in the same manner as in Example 1 except that conductive particles having a compression elastic modulus at 30% deformation of 101 MPa were used. The initial resistance value (R1) of the connection structure was 0.29Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.62Ω, ΔR was 0.33Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was ◎.
<比較例4>
表2に示すように、30%変形時の圧縮弾性率が197MPaの導電性粒子を用いたこと以外は、実施例1と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.91Ωであり、初期抵抗の評価は×であった。信頼性試験後抵抗値(R2)は3.31Ω、ΔRは2.40Ωであり、信頼性の評価は×であった。よって、総合判定は×であった。
<Comparative Example 4>
As shown in Table 2, a connection structure was obtained in the same manner as in Example 1 except that conductive particles having a compressive elastic modulus at 30% deformation of 197 MPa were used. The initial resistance value (R1) of the connection structure was 0.91Ω, and the evaluation of the initial resistance was x. The resistance value (R2) after the reliability test was 3.31Ω, ΔR was 2.40Ω, and the evaluation of reliability was x. Therefore, the comprehensive judgment was x.
<比較例5>
表2に示すように、弾性率が5.3GPaのPETフィルムを基材フィルムとした第1の電子部品を用いた。導電性粒子は、微粒子としてニッケルを付着させ、表面に突起部を有するものを使用した。導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は55%であった。また、導電性粒子の30%変形時の圧縮弾性率は、28MPaであった。この導電性粒子を添加した異方性導電フィルムを用いて第1の電子部品と第2の電子部品とを接続させ、接続構造体を得た。接続構造体の初期抵抗値(R1)は0.51Ωであり、初期抵抗の評価は×であった。信頼性試験後抵抗値(R2)は2.63Ω、ΔRは2.12Ωであり、信頼性の評価は×であった。よって、総合判定は×であった。
<Comparative Example 5>
As shown in Table 2, the first electronic component having a base film made of a PET film having an elastic modulus of 5.3 GPa was used. As the conductive particles, particles having nickel as fine particles and having protrusions on the surface were used. The area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions was 55%. Further, the compression elastic modulus at 30% deformation of the conductive particles was 28 MPa. Using the anisotropic conductive film to which the conductive particles were added, the first electronic component and the second electronic component were connected to obtain a connection structure. The initial resistance value (R1) of the connection structure was 0.51Ω, and the evaluation of the initial resistance was x. The resistance value (R2) after the reliability test was 2.63Ω, ΔR was 2.12Ω, and the evaluation of reliability was x. Therefore, the comprehensive judgment was x.
<実施例4>
表2に示すように、弾性率が5.3GPaのPETフィルムを基材フィルムとした第1の電子部品を用いた。導電性粒子は、微粒子としてニッケルを付着させ、表面に突起部を有するものを使用した。導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は55%であった。また、導電性粒子の30%変形時の圧縮弾性率は、32MPaであった。この導電性粒子を添加した異方性導電フィルムを用いて第1の電子部品と第2の電子部品とを接続させ、接続構造体を得た。接続構造体の初期抵抗値(R1)は0.29Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.64Ω、ΔRは0.35Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 4>
As shown in Table 2, the first electronic component having a base film made of a PET film having an elastic modulus of 5.3 GPa was used. As the conductive particles, particles having nickel as fine particles and having protrusions on the surface were used. The area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions was 55%. Moreover, the compression elastic modulus at the time of 30% deformation of the conductive particles was 32 MPa. Using the anisotropic conductive film to which the conductive particles were added, the first electronic component and the second electronic component were connected to obtain a connection structure. The initial resistance value (R1) of the connection structure was 0.29Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.64Ω, ΔR was 0.35Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was ◎.
<実施例5>
表2に示すように、30%変形時の圧縮弾性率が49MPaの導電性粒子を用いたこと以外は、実施例4と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.24Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.56Ω、ΔRは0.32Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 5>
As shown in Table 2, a connection structure was obtained in the same manner as in Example 4 except that conductive particles having a compression elastic modulus at 30% deformation of 49 MPa were used. The initial resistance value (R1) of the connection structure was 0.24Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.56Ω, ΔR was 0.32Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was ◎.
<実施例6>
表2に示すように、30%変形時の圧縮弾性率が101MPaの導電性粒子を用いたこと以外は、実施例4と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.25Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.55Ω、ΔRは0.30Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 6>
As shown in Table 2, a connection structure was obtained in the same manner as in Example 4 except that conductive particles having a compression elastic modulus at 30% deformation of 101 MPa were used. The initial resistance value (R1) of the connection structure was 0.25Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.55Ω, ΔR was 0.30Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was ◎.
<比較例6>
表2に示すように、30%変形時の圧縮弾性率が197MPaの導電性粒子を用いたこと以外は、実施例4と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.81Ωであり、初期抵抗の評価は×であった。信頼性試験後抵抗値(R2)は2.51Ω、ΔRは1.70Ωであり、信頼性の評価は×であった。よって、総合判定は×であった。
<Comparative Example 6>
As shown in Table 2, a connection structure was obtained in the same manner as in Example 4 except that conductive particles having a compressive elastic modulus at 30% deformation of 197 MPa were used. The initial resistance value (R1) of the connection structure was 0.81Ω, and the evaluation of the initial resistance was x. The resistance value (R2) after the reliability test was 2.51Ω, ΔR was 1.70Ω, and the evaluation of reliability was x. Therefore, the comprehensive judgment was x.
<実施例7>
表3に示すように、弾性率が5.3GPaのPETフィルムを基材フィルムとした第1の電子部品を用いた。導電性粒子は、微粒子としてニッケルを付着させ、表面に突起部を有するものを使用した。導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は9%であった。また、導電性粒子の30%変形時の圧縮弾性率は、49MPaであった。この導電性粒子を添加した異方性導電フィルムを用いて第1の電子部品と第2の電子部品とを接続させ、接続構造体を得た。接続構造体の初期抵抗値(R1)は0.33Ωであり、初期抵抗の評価は○であった。信頼性試験後抵抗値(R2)は0.79Ω、ΔRは0.46Ωであり、信頼性の評価は◎であった。よって、総合判定は○であった。
<Example 7>
As shown in Table 3, the first electronic component using a PET film having an elastic modulus of 5.3 GPa as a base film was used. As the conductive particles, particles having nickel as fine particles and having protrusions on the surface were used. The area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions was 9%. Moreover, the compression elastic modulus at the time of 30% deformation of the conductive particles was 49 MPa. Using the anisotropic conductive film to which the conductive particles were added, the first electronic component and the second electronic component were connected to obtain a connection structure. The initial resistance value (R1) of the connection structure was 0.33Ω, and the initial resistance was evaluated as ◯. The resistance value (R2) after the reliability test was 0.79Ω, ΔR was 0.46Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was “good”.
<実施例8>
表3に示すように、突起部が無い場合の表面積に占める突起部の面積割合が29%である導電性粒子を用いたこと以外は、実施例7と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.26Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.62Ω、ΔRは0.36Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 8>
As shown in Table 3, a connection structure was obtained in the same manner as in Example 7 except that conductive particles having an area ratio of protrusions to the surface area of 29% when no protrusions were used were used. The initial resistance value (R1) of the connection structure was 0.26Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.62Ω, ΔR was 0.36Ω, and the evaluation of reliability was ◎. Therefore, the overall judgment was ◎.
<実施例9>
表3に示すように、突起部が無い場合の表面積に占める突起部の面積割合が81%である導電性粒子を用いたこと以外は、実施例7と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.23Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.55Ω、ΔRは0.32Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 9>
As shown in Table 3, a connection structure was obtained in the same manner as in Example 7 except that conductive particles having an area ratio of protrusions to a surface area of 81% when no protrusions were used were used. The initial resistance value (R1) of the connection structure was 0.23Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.55Ω, ΔR was 0.32Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was ◎.
<実施例10>
表3に示すように、突起部が無い場合の表面積に占める突起部の面積割合が91%である導電性粒子を用いたこと以外は、実施例7と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.28Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.75Ω、ΔRは0.47Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 10>
As shown in Table 3, a connection structure was obtained in the same manner as in Example 7, except that conductive particles having an area ratio of protrusions of 91% in the surface area when no protrusions were used were used. The initial resistance value (R1) of the connection structure was 0.28Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.75Ω, ΔR was 0.47Ω, and the reliability was evaluated as ◎. Therefore, the overall judgment was ◎.
<実施例11>
表3に示すように、突起部が無い場合の表面積に占める突起部の面積割合が98%である導電性粒子を用いたこと以外は、実施例7と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.35Ωであり、初期抵抗の評価は○であった。信頼性試験後抵抗値(R2)は0.91Ω、ΔRは0.56Ωであり、信頼性の評価は○であった。よって、総合判定は○であった。
<Example 11>
As shown in Table 3, a connection structure was obtained in the same manner as in Example 7 except that conductive particles in which the area ratio of the protrusions to the surface area in the absence of the protrusions was 98% were used. The initial resistance value (R1) of the connection structure was 0.35Ω, and the initial resistance was evaluated as ◯. The resistance value (R2) after the reliability test was 0.91Ω, ΔR was 0.56Ω, and the reliability was evaluated as ◯. Therefore, the overall judgment was “good”.
<実施例12>
表3に示すように、突起部が無い場合の表面積に占める突起部の面積割合が110%である導電性粒子を用いたこと以外は、実施例7と同様に接続構造体を得た。接続構造体の初期抵抗値(R1)は0.38Ωであり、初期抵抗の評価は○であった。信頼性試験後抵抗値(R2)は0.98Ω、ΔRは0.60Ωであり、信頼性の評価は○であった。よって、総合判定は○であった。
<Example 12>
As shown in Table 3, a connection structure was obtained in the same manner as in Example 7 except that conductive particles having an area ratio of protrusions to a surface area of 110% when no protrusions were used were used. The initial resistance value (R1) of the connection structure was 0.38Ω, and the initial resistance was evaluated as ◯. The resistance value (R2) after the reliability test was 0.98Ω, ΔR was 0.60Ω, and the reliability was evaluated as ◯. Therefore, the overall judgment was “good”.
<実施例13>
表3に示すように、弾性率が5.3GPaのPETフィルムを基材フィルムとした第1の電子部品を用いた。導電性粒子は、微粒子としてパラジウムを付着させ、表面に突起部を有するものを使用した。導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は55%であった。また、導電性粒子の30%変形時の圧縮弾性率は、52MPaであった。この導電性粒子を添加した異方性導電フィルムを用いて第1の電子部品と第2の電子部品とを接続させ、接続構造体を得た。接続構造体の初期抵抗値(R1)は0.23Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.53Ω、ΔRは0.30Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 13>
As shown in Table 3, the first electronic component using a PET film having an elastic modulus of 5.3 GPa as a base film was used. As the conductive particles, particles having palladium as fine particles and having protrusions on the surface were used. The area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions was 55%. Moreover, the compression elastic modulus at the time of 30% deformation of the conductive particles was 52 MPa. Using the anisotropic conductive film to which the conductive particles were added, the first electronic component and the second electronic component were connected to obtain a connection structure. The initial resistance value (R1) of the connection structure was 0.23Ω, and the initial resistance was evaluated as ◎. The resistance value (R2) after the reliability test was 0.53Ω, ΔR was 0.30Ω, and the evaluation of reliability was ◎. Therefore, the overall judgment was ◎.
<実施例14>
表3に示すように、弾性率が5.3GPaのPETフィルムを基材フィルムとした第1の電子部品を用いた。導電性粒子は、微粒子として酸化アルミニウムを付着させ、表面に突起部を有するものを使用した。導電性粒子の突起部が無い場合の表面積に占める突起部の面積割合は55%であった。また、導電性粒子の30%変形時の圧縮弾性率は、51MPaであった。この導電性粒子を添加した異方性導電フィルムを用いて第1の電子部品と第2の電子部品とを接続させ、接続構造体を得た。接続構造体の初期抵抗値(R1)は0.22Ωであり、初期抵抗の評価は◎であった。信頼性試験後抵抗値(R2)は0.51Ω、ΔRは0.29Ωであり、信頼性の評価は◎であった。よって、総合判定は◎であった。
<Example 14>
As shown in Table 3, the first electronic component using a PET film having an elastic modulus of 5.3 GPa as a base film was used. As the conductive particles, those having aluminum oxide attached as fine particles and having protrusions on the surface were used. The area ratio of the protrusions to the surface area in the absence of the conductive particle protrusions was 55%. Moreover, the compression elastic modulus at the time of 30% deformation of the conductive particles was 51 MPa. Using the anisotropic conductive film to which the conductive particles were added, the first electronic component and the second electronic component were connected to obtain a connection structure. The initial resistance value (R1) of the connection structure was 0.22Ω, and the evaluation of the initial resistance was ◎. The resistance value (R2) after the reliability test was 0.51Ω, ΔR was 0.29Ω, and the evaluation of reliability was ◎. Therefore, the overall judgment was ◎.
比較例1,2、及び従来例のように導電性粒子が突起部を有さない場合において、弾性率が5GPa以下の基材フィルムを有する電子部品を接続させた場合、接続構造体の初期抵抗値が大きかった。従来例のように弾性率が5.3GPaを超える基材フィルムを有する電子部品を接続させた場合、接続構造体の初期抵抗値は低かった。 In the case where the conductive particles do not have a protrusion as in Comparative Examples 1 and 2 and the conventional example, when an electronic component having a base film with an elastic modulus of 5 GPa or less is connected, the initial resistance of the connection structure The value was great. When an electronic component having a base film with an elastic modulus exceeding 5.3 GPa was connected as in the conventional example, the initial resistance value of the connection structure was low.
また、比較例3,5のように突起部を有する導電性粒子が柔らかい場合、配線クラックは生じなかったものの、初期抵抗値が高い傾向があった。また、比較例4,6のように、突起部を有する導電性粒子が硬い場合、配線クラックの発生が確認された。 In addition, when the conductive particles having protrusions were soft as in Comparative Examples 3 and 5, although there were no wiring cracks, the initial resistance value tended to be high. Moreover, when the conductive particles having the protrusions were hard as in Comparative Examples 4 and 6, the occurrence of wiring cracks was confirmed.
一方、実施例1〜14のように、導電性粒子の30%変形時の圧縮弾性率が30〜120MPaの範囲内にあり、且つ、表面に突起部を有する導電性粒子を用いることにより、初期抵抗値及び信頼性試験後の抵抗値が良好な範囲内に収まり、しかも信頼性試験後の抵抗値の上昇を抑制することが確認された。 On the other hand, as in Examples 1 to 14, by using conductive particles having a compression elastic modulus at 30% deformation of the conductive particles in the range of 30 to 120 MPa and having protrusions on the surface, It was confirmed that the resistance value and the resistance value after the reliability test were within a favorable range, and that the increase in the resistance value after the reliability test was suppressed.
また、実施例8〜10のように、突起部が無い場合の表面積に占める突起部の面積割合が20%以上95%以下である導電性粒子を用いることにより、初期及び信頼性試験後において優れた導通性が得られることが確認された。 In addition, as in Examples 8 to 10, by using conductive particles in which the area ratio of the protrusions occupying the surface area when there is no protrusion is 20% or more and 95% or less, excellent after the initial and reliability tests. It was confirmed that the electrical conductivity was obtained.
10 第1の電子部品、11 端子、12 第1の支持基板、20 第2の電子部品、21 第2の支持基板、22 端子、30 異方性導電膜、31 バインダー樹脂、33 導電性粒子、36 コア粒子、 37 金属層、38 第1の金属層、39 第2の金属層、40 微粒子、 P 突起部
DESCRIPTION OF
Claims (11)
前記バインダー樹脂中に含まれ、30%変形時の圧縮弾性率が30MPa以上120MPa以下である導電性粒子とを含有し、
前記導電性粒子が、表面に突起部を有する異方性導電材料。 A binder resin,
Containing conductive particles contained in the binder resin and having a compression elastic modulus at 30% deformation of 30 MPa or more and 120 MPa or less;
An anisotropic conductive material in which the conductive particles have protrusions on the surface.
前記第2の金属層が、金を含む請求項4又は5に記載の異方性導電材料。 The first metal layer comprises nickel;
The anisotropic conductive material according to claim 4, wherein the second metal layer contains gold.
第2の支持基板上に端子が形成された第2の電子部品と、
前記第1の電子部品の端子と前記第2の電子部品の端子とを接続する導電性粒子を含有する異方性導電材料の硬化物からなる異方性導電膜とを備え、
前記異方性導電材料が、バインダー樹脂と、前記バインダー樹脂中に含まれ、30%変形時の圧縮弾性率が30MPa以上120MPa以下である導電性粒子とを含有し、前記導電性粒子が、表面に突起部を有する接続構造体。 A first electronic component having terminals formed on the first support substrate;
A second electronic component having terminals formed on the second support substrate;
An anisotropic conductive film comprising a cured product of an anisotropic conductive material containing conductive particles that connect the terminal of the first electronic component and the terminal of the second electronic component;
The anisotropic conductive material contains a binder resin and conductive particles that are contained in the binder resin and have a compression elastic modulus at 30% deformation of 30 MPa or more and 120 MPa or less. The connection structure which has a projection part in.
A first electronic component having a terminal formed on the first support substrate and a second electronic component having a terminal formed on the second support substrate are included in the binder resin and the binder resin. , Containing conductive particles having a compressive elastic modulus at 30% deformation of 30 MPa or more and 120 MPa or less, and the conductive particles are bonded by interposing an anisotropic conductive adhesive film having a protrusion on the surface, A method for producing a connection structure, wherein an anisotropic adhesive film is cured to obtain a connection structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014192647A JP6639079B2 (en) | 2014-09-22 | 2014-09-22 | Anisotropic conductive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014192647A JP6639079B2 (en) | 2014-09-22 | 2014-09-22 | Anisotropic conductive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016062879A true JP2016062879A (en) | 2016-04-25 |
| JP6639079B2 JP6639079B2 (en) | 2020-02-05 |
Family
ID=55798135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014192647A Active JP6639079B2 (en) | 2014-09-22 | 2014-09-22 | Anisotropic conductive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6639079B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170124323A (en) * | 2016-05-02 | 2017-11-10 | 동우 화인켐 주식회사 | Touch panel module |
| KR20170124326A (en) * | 2016-05-02 | 2017-11-10 | 동우 화인켐 주식회사 | Touch panel module |
| WO2018199329A1 (en) * | 2017-04-28 | 2018-11-01 | 日立化成株式会社 | Adhesive composition and method for producing connected object |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0651337A (en) * | 1992-08-03 | 1994-02-25 | Smk Corp | Connecting structure for electric circuit |
| JPH11134934A (en) * | 1997-10-30 | 1999-05-21 | Shin Etsu Polymer Co Ltd | Anisotropic conductive adhesive |
| JP2003020464A (en) * | 2001-07-05 | 2003-01-24 | Bridgestone Corp | Anisotropic electroconductive film |
| JP2006228474A (en) * | 2005-02-15 | 2006-08-31 | Sekisui Chem Co Ltd | Conductive fine particles and anisotropic conductive materials |
| JP2007035572A (en) * | 2005-07-29 | 2007-02-08 | Sekisui Chem Co Ltd | Conductive fine particles and anisotropic conductive material |
| WO2010013668A1 (en) * | 2008-07-31 | 2010-02-04 | 積水化学工業株式会社 | Polymer particle, conductive particle, anisotropic conductive material and connection structure |
| JP2012064559A (en) * | 2010-08-16 | 2012-03-29 | Nippon Shokubai Co Ltd | Conductive fine particulate and anisotropic conductive material |
| JP2014081928A (en) * | 2012-09-25 | 2014-05-08 | Sekisui Chem Co Ltd | Conductive particle for touch panel, conductive material for touch panel, and connection structure for touch panel |
| JP2014096532A (en) * | 2012-11-12 | 2014-05-22 | Dexerials Corp | Conductive adhesive, solar cell module, and method of manufacturing solar cell module |
| WO2014112475A1 (en) * | 2013-01-21 | 2014-07-24 | 東レ株式会社 | Conductive fine particles |
-
2014
- 2014-09-22 JP JP2014192647A patent/JP6639079B2/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0651337A (en) * | 1992-08-03 | 1994-02-25 | Smk Corp | Connecting structure for electric circuit |
| JPH11134934A (en) * | 1997-10-30 | 1999-05-21 | Shin Etsu Polymer Co Ltd | Anisotropic conductive adhesive |
| JP2003020464A (en) * | 2001-07-05 | 2003-01-24 | Bridgestone Corp | Anisotropic electroconductive film |
| JP2006228474A (en) * | 2005-02-15 | 2006-08-31 | Sekisui Chem Co Ltd | Conductive fine particles and anisotropic conductive materials |
| JP2007035572A (en) * | 2005-07-29 | 2007-02-08 | Sekisui Chem Co Ltd | Conductive fine particles and anisotropic conductive material |
| WO2010013668A1 (en) * | 2008-07-31 | 2010-02-04 | 積水化学工業株式会社 | Polymer particle, conductive particle, anisotropic conductive material and connection structure |
| JP2012064559A (en) * | 2010-08-16 | 2012-03-29 | Nippon Shokubai Co Ltd | Conductive fine particulate and anisotropic conductive material |
| JP2014081928A (en) * | 2012-09-25 | 2014-05-08 | Sekisui Chem Co Ltd | Conductive particle for touch panel, conductive material for touch panel, and connection structure for touch panel |
| JP2014096532A (en) * | 2012-11-12 | 2014-05-22 | Dexerials Corp | Conductive adhesive, solar cell module, and method of manufacturing solar cell module |
| WO2014112475A1 (en) * | 2013-01-21 | 2014-07-24 | 東レ株式会社 | Conductive fine particles |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170124323A (en) * | 2016-05-02 | 2017-11-10 | 동우 화인켐 주식회사 | Touch panel module |
| KR20170124326A (en) * | 2016-05-02 | 2017-11-10 | 동우 화인켐 주식회사 | Touch panel module |
| KR102519263B1 (en) * | 2016-05-02 | 2023-04-06 | 동우 화인켐 주식회사 | Touch panel module |
| KR102520180B1 (en) * | 2016-05-02 | 2023-04-07 | 동우 화인켐 주식회사 | Touch panel module |
| WO2018199329A1 (en) * | 2017-04-28 | 2018-11-01 | 日立化成株式会社 | Adhesive composition and method for producing connected object |
| JPWO2018199329A1 (en) * | 2017-04-28 | 2020-05-14 | 日立化成株式会社 | Adhesive composition and method for producing connected body |
| JP7287275B2 (en) | 2017-04-28 | 2023-06-06 | 株式会社レゾナック | ADHESIVE COMPOSITION AND METHOD FOR MANUFACTURING CONNECTED BODY |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6639079B2 (en) | 2020-02-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102120920B (en) | Anisotropic conductive adhesive composite and film, and circuit connecting structure including the same | |
| JP7100088B2 (en) | Conductive material | |
| JP7420883B2 (en) | Conductive film, connection body manufacturing method, and connection body | |
| JP5690637B2 (en) | Anisotropic conductive film, connection method and connection structure | |
| JP6212366B2 (en) | Conductive particles, conductive materials, and connection structures | |
| JP5899031B2 (en) | Conductive adhesive sheet, method for producing the same, and printed wiring board | |
| CN104584707A (en) | EM-shielding film and method for covering electronic component | |
| JP6639079B2 (en) | Anisotropic conductive material | |
| US9019714B2 (en) | Circuit component and method of making the same | |
| CN104145329B (en) | Connection method using anisotropic conductive material and anisotropic conductive connected structure | |
| KR102336897B1 (en) | Mounting body manufacturing method and anisotropic conductive film | |
| JP2010251336A (en) | Anisotropic conductive film and method for manufacturing connection structure using the same | |
| JP2017182709A (en) | Anisotropic conductive connection structure | |
| WO2018150897A1 (en) | Anisotropic conductive connection structure body, production method for anisotropic conductive connection structure body, anisotropic conductive film, and anisotropic conductive paste | |
| JP2016173982A (en) | Anisotropic conductive film | |
| CN110938382B (en) | Conductive adhesive film, display module and electronic equipment | |
| JP2001214149A (en) | Anisotropic electrically conductive adhesive | |
| KR101227795B1 (en) | Connection structure | |
| CN112863732B (en) | Method for manufacturing connection structure, and conductive material | |
| JP2017183239A (en) | Anisotropic conductive connection structure | |
| HK40045320B (en) | Method for preparing connection structure, connection structure and conductive material | |
| JP2014207223A (en) | Conductive film and connection structure | |
| JP2018093055A (en) | Temporarily crimping method of anisotropic conductive film, temporarily crimping device of anisotropic conductive film, and anisotropic conductive connection structure | |
| JP2017182708A (en) | Anisotropic conductive connection structure | |
| JP2008153207A (en) | Repairability providing method and connecting member |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170907 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180620 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180710 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180907 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20181106 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20181226 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190528 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190729 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20191210 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191224 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6639079 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |