JP2014520390A - 太陽電池用保護フィルム及びこれを含む太陽電池 - Google Patents
太陽電池用保護フィルム及びこれを含む太陽電池 Download PDFInfo
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- JP2014520390A JP2014520390A JP2014511297A JP2014511297A JP2014520390A JP 2014520390 A JP2014520390 A JP 2014520390A JP 2014511297 A JP2014511297 A JP 2014511297A JP 2014511297 A JP2014511297 A JP 2014511297A JP 2014520390 A JP2014520390 A JP 2014520390A
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- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- CIQDYIQMZXESRD-UHFFFAOYSA-N dimethoxy(phenyl)silane Chemical compound CO[SiH](OC)C1=CC=CC=C1 CIQDYIQMZXESRD-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- FJKCDSVHCNEOOS-UHFFFAOYSA-N ethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](OCC)C1=CC=CC=C1 FJKCDSVHCNEOOS-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- ZVJXKUWNRVOUTI-UHFFFAOYSA-N ethoxy(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OCC)C1=CC=CC=C1 ZVJXKUWNRVOUTI-UHFFFAOYSA-N 0.000 description 1
- IADPEWNXRCIVFH-UHFFFAOYSA-N ethoxy-[3-(oxiran-2-ylmethoxy)propyl]-di(propan-2-yl)silane Chemical compound CCO[Si](C(C)C)(C(C)C)CCCOCC1CO1 IADPEWNXRCIVFH-UHFFFAOYSA-N 0.000 description 1
- FIHCECZPYHVEJO-UHFFFAOYSA-N ethoxy-dimethyl-phenylsilane Chemical compound CCO[Si](C)(C)C1=CC=CC=C1 FIHCECZPYHVEJO-UHFFFAOYSA-N 0.000 description 1
- ADLWTVQIBZEAGJ-UHFFFAOYSA-N ethoxy-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C)(OCC)C1=CC=CC=C1 ADLWTVQIBZEAGJ-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 229920001002 functional polymer Polymers 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 229910000271 hectorite Inorganic materials 0.000 description 1
- KWLMIXQRALPRBC-UHFFFAOYSA-L hectorite Chemical compound [Li+].[OH-].[OH-].[Na+].[Mg+2].O1[Si]2([O-])O[Si]1([O-])O[Si]([O-])(O1)O[Si]1([O-])O2 KWLMIXQRALPRBC-UHFFFAOYSA-L 0.000 description 1
- 238000009396 hybridization Methods 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- 229910052900 illite Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229940094522 laponite Drugs 0.000 description 1
- 239000011254 layer-forming composition Substances 0.000 description 1
- XCOBTUNSZUJCDH-UHFFFAOYSA-B lithium magnesium sodium silicate Chemical compound [Li+].[Li+].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Na+].[Na+].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3 XCOBTUNSZUJCDH-UHFFFAOYSA-B 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- BKXVGDZNDSIUAI-UHFFFAOYSA-N methoxy(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OC)C1=CC=CC=C1 BKXVGDZNDSIUAI-UHFFFAOYSA-N 0.000 description 1
- REQXNMOSXYEQLM-UHFFFAOYSA-N methoxy-dimethyl-phenylsilane Chemical compound CO[Si](C)(C)C1=CC=CC=C1 REQXNMOSXYEQLM-UHFFFAOYSA-N 0.000 description 1
- ALPYWOWTSPQXHR-UHFFFAOYSA-N methoxy-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C)(OC)C1=CC=CC=C1 ALPYWOWTSPQXHR-UHFFFAOYSA-N 0.000 description 1
- 229940104873 methyl perfluorobutyl ether Drugs 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- PYLWMHQQBFSUBP-UHFFFAOYSA-N monofluorobenzene Chemical compound FC1=CC=CC=C1 PYLWMHQQBFSUBP-UHFFFAOYSA-N 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- VGIBGUSAECPPNB-UHFFFAOYSA-L nonaaluminum;magnesium;tripotassium;1,3-dioxido-2,4,5-trioxa-1,3-disilabicyclo[1.1.1]pentane;iron(2+);oxygen(2-);fluoride;hydroxide Chemical compound [OH-].[O-2].[O-2].[O-2].[O-2].[O-2].[F-].[Mg+2].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[K+].[K+].[K+].[Fe+2].O1[Si]2([O-])O[Si]1([O-])O2.O1[Si]2([O-])O[Si]1([O-])O2.O1[Si]2([O-])O[Si]1([O-])O2.O1[Si]2([O-])O[Si]1([O-])O2.O1[Si]2([O-])O[Si]1([O-])O2.O1[Si]2([O-])O[Si]1([O-])O2.O1[Si]2([O-])O[Si]1([O-])O2 VGIBGUSAECPPNB-UHFFFAOYSA-L 0.000 description 1
- 229910000273 nontronite Inorganic materials 0.000 description 1
- 102000039446 nucleic acids Human genes 0.000 description 1
- 108020004707 nucleic acids Proteins 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229960004692 perflenapent Drugs 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- NJCBUSHGCBERSK-UHFFFAOYSA-N perfluoropentane Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F NJCBUSHGCBERSK-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000007539 photo-oxidation reaction Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920013655 poly(bisphenol-A sulfone) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000002987 primer (paints) Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910000275 saponite Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
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Abstract
Description
(R9)m−Si−X(4−m)
(R9)m−O−Si−X(4−m)
(R9)m−HR10−Si−X(4−m)
R9は、炭素数1〜12のアルキル、アルケニル、アルキニル、アリール、アリルアルキル、アルキルアリール、アリールアルケニル、アルケニルアリール、アリールアルキニル、アルキニルアリール、ハロゲン、アミノ、アミド、アルデヒド、ケトン、アルキルカルボニル、カルボキシ、メルカプト、シアノ、ヒドロキシ、炭素数1〜12のアルコキシ、炭素数1〜12のアルコキシカルボニル、スルホン酸、リン酸、アクリルオキシ、メタクリルオキシ、エポキシまたはビニル基であり、
R10は、水素または炭素数1〜12のアルキルであり、
Xは、水素、ハロゲン、炭素数1〜12のアルコキシ、アシルオキシ、アルキルカルボニル、アルコキシカルボニルまたは−N(R11)2であり、
R11は、水素または炭素数1〜12のアルキルであり、
mは、1〜3の整数である。
M−(R12)z
Mは、アルミニウム、ジルコニウム及びチタンのうち1種以上であり、
R12は、ハロゲン、炭素数1〜12のアルキル、アルコキシ、アシルオキシまたはヒドロキシ基であり、
zは、3または4の整数である。
R1は、CH2であり、
nは、1〜16であり、
R2は、水素;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルキル基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリール基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルコキシ基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリールオキシ基である。
R3及びR6は、独立して、水素;ヒドロキシ基;ハロゲン;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルキル基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリール基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルコキシ基;またはハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリールオキシ基であり、
上記化学式3で、
Zは、水素または塩素置換体であり、
R7及びR8は、独立して、水素;ハロゲン;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルキル基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリール基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルコキシ基;またはハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリールオキシ基である。
バリアフィルム、粘着層、及びフッ素系ポリマー層を含む太陽電池用保護フィルムを製造した。
(R9)2−Si−X2
Al−(R12)3
バリアフィルム、粘着層、及びフッ素系ポリマー層を含む太陽電池用保護フィルムを製造した。
実施例1及び実施例2で製造された保護フィルムが付着した太陽電池素子を120℃の水に96時間接触させた。その後、太陽電池素子と保護フィルムの接着状態を観察した。
実施例1及び実施例2で製造された保護フィルムが付着した太陽電池素子を120℃の水で96時間処理した後、保護フィルムだけを剥離し、光透過特性をシマツ社のUV3600分光器を用いて比較した。その結果を図5に示す。図5を参照すれば、実施例1及び2の保護フィルムは、450〜800nm波長領域で60%以上の優れた光透過度を示した。
ポリエステルフィルムとフッ素系ポリマー層の耐光性を比較評価した。上記フッ素系ポリマー層は、テトラフルオルエチレン−ヘキサフルオルプロピレン共重合体(FEP、Flourinated Ethylene Propylene copolymer)フィルムを使用した。
上記実施例1と同一の方法で太陽電池用保護フィルムを製造し、且つ有機−無機ハイブリッド層に含まれた有機シラン化合物にTinuvin 1577、Tinuvin 326及びTinuvin 328をそれぞれ1:1:1の重量比で混合して添加した。添加された紫外線吸収剤の全体含量は、0.0、1.2、2.4、4.8及び12.0重量部で異ならしめた。
上記実施例1と同一の方法で太陽電池用保護フィルムを同じ構造で製造し、且つ粘着層は、下記表2の組成で製造した。
実施例4及び5と同一の方法で製造された保護フィルムに光度が0.6W/m2、温度60℃で100時間紫外線処理を行った後、製造された各フィルムに対してシマツ社のUV3600分光器を用いて光透過度を測定した。測定結果は、図8に示す。
20 有機−無機ヒイブリドツング
30 無機遮断層
40 粘着層
50 フッ素系ポリマー層
60 バリアフィルム
100、200、300 太陽電池用保護フィルム
Claims (17)
- 基材層と;上記基材層の一面または両面に有機−無機ハイブリッド層及び無機遮断層のうち1種以上が積層された構造のバリアフィルムと;フッ素系ポリマー層と;を含み、
上記基材層、有機−無機ハイブリッド層、無機遮断層、及びフッ素系ポリマー層のうち1つ以上は、紫外線安定剤及び紫外線吸収剤のうち1つ以上を含む太陽電池用保護フィルム。 - バリアフィルムは、基材層の一面または両面に形成された有機−無機ハイブリッド層、無機遮断層及び有機−無機ハイブリッド層が順次積層された対称構造を含む、請求項1に記載の太陽電池用保護フィルム。
- バリアフィルムとフッ素系ポリマー層との間に形成された粘着層をさらに含む、請求項1に記載の太陽電池用保護フィルム。
- 上記粘着層は、紫外線安定剤及び紫外線吸収剤のうち1つ以上を含む、請求項3に記載の太陽電池用保護フィルム。
- 基材層は、単一ポリマー、2種以上のポリマーブレンド、及び有機または無機添加物が含有されたポリマー複合材料のうち1種以上を含む、請求項1に記載の太陽電池用保護フィルム。
- 基材層は、クレイナノ物質がポリマーマトリックスに分散したポリマー−クレイナノ複合剤である、請求項1に記載の太陽電池用保護フィルム。
- 有機−無機ハイブリッド層は、有機シランと金属アルコキシドとを含む組成物の部分加水分解物である、請求項1に記載の太陽電池用保護フィルム。
- 有機−無機ハイブリッド層は、有機−無機ハイブリッド層を製造するための組成物全体重量部を基準として、有機シラン化合物20〜99.99重量部と、金属アルコキシド化合物0.01〜80重量部とを含む組成物の部分加水分解物である、請求項7に記載の太陽電池用保護フィルム。
- バリアフィルムは、2層で形成された基材層を含み、
2層で形成された基材層の上部及び下部面には、それぞれ有機−無機ハイブリッド層及び無機遮断層のうち1種以上が積層された対称構造を含む、請求項1に記載の太陽電池用保護フィルム。 - フッ素系ポリマー層は、フッ素含有共重合体を含み、
上記フッ素含有共重合体は、
フッ素原子を含有する単量体と、水酸基またはエポキシ基を含有する単量体との共重合物である、請求項1に記載の太陽電池用保護フィルム。 - フッ素原子を含有する単量体は、テトラフルオルエチレン、ヘキサフルオルプロピレン、フッ化ビニリデン、クロロトリフルオルエチレン、トリフルオルエチレン、テトラフルオルエチレン、フッ化アルキルビニルエーテル、フッ化アルコキシアルキルビニルエーテル、過フッ素含有アルキルビニルエーテル、過フッ素含有アルコキシビニルエーテル、フッ素含有(メタ)アクリル酸エステルのうち1種以上を含む、請求項10に記載の太陽電池用保護フィルム。
- 水酸基またはエポキシ基を含有する単量体は、ヒドロキシエチルビニルエーテル、ヒドロキシプロピルビニルエーテル、ヒドロキシブチルビニルエーテル、ヒドロキシペンチルビニルエーテル、ヒドロキシヘキシルビニルエーテル、ヒドロキシエチルアリールエーテル、ヒドロキシブチルアリールエーテル、グリセロールモノアリルエーテル、アリルアルコール、ヒドロキシメタ(エチル)アクリル酸エステルのうち1種以上を含む、請求項10に記載の太陽電池用保護フィルム。
- フッ素含有共重合体の含量は、フッ素系ポリマー層形成用組成物100重量部を基準として、0.5〜10重量部である、請求項10に記載の太陽電池用保護フィルム。
- 紫外線安定剤は、ラジカルスカベンジャー化合物を含む、請求項1または4に記載の太陽電池用保護フィルム。
- ラジカルスカベンジャー化合物は、下記化学式1で表示される、請求項14に記載の太陽電池用保護フィルム:
上記化学式1で、
R1は、CH2であり、
nは、1〜16であり、
R2は、水素;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルキル基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリール基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルコキシ基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリールオキシ基である。 - 紫外線吸収剤は、下記化学式2及び3の構造を有する化合物のうち1種以上を含む、請求項1または4 に記載の太陽電池用保護フィルム:
上記化学式2で、
R3及びR6は、独立して、水素;ヒドロキシ基;ハロゲン;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルキル基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリール基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルコキシ基;またはハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリールオキシ基であり、
上記化学式3で、
Zは、水素または塩素置換体であり、
R7及びR8は、独立して、水素;ハロゲン;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルキル基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリール基;ハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数1〜16のアルコキシ基;またはハロゲン、シアノ基またはニトロ基が置換または非置換された炭素数6〜20のアリールオキシ基である。 - 請求項1に記載の太陽電池用保護フィルムを含む太陽電池。
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| WO2012157962A2 (ko) | 2012-11-22 |
| EP2711179B1 (en) | 2018-07-04 |
| EP2711179A2 (en) | 2014-03-26 |
| KR101384885B1 (ko) | 2014-04-30 |
| KR20120128112A (ko) | 2012-11-26 |
| WO2012157962A8 (ko) | 2014-01-03 |
| US10020406B2 (en) | 2018-07-10 |
| WO2012157962A3 (ko) | 2013-01-10 |
| CN103619584A (zh) | 2014-03-05 |
| US20140069497A1 (en) | 2014-03-13 |
| EP2711179A4 (en) | 2014-12-03 |
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