JP2014197034A - 検査装置の診断及び測定変数設定方法 - Google Patents
検査装置の診断及び測定変数設定方法 Download PDFInfo
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- JP2014197034A JP2014197034A JP2014147419A JP2014147419A JP2014197034A JP 2014197034 A JP2014197034 A JP 2014197034A JP 2014147419 A JP2014147419 A JP 2014147419A JP 2014147419 A JP2014147419 A JP 2014147419A JP 2014197034 A JP2014197034 A JP 2014197034A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/08—Testing mechanical properties
- G01M11/081—Testing mechanical properties by using a contact-less detection method, i.e. with a camera
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- H10P72/30—
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- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
【解決手段】検査装置内に検査基板を装着する段階と、前記検査装置のカメラを介して取得された撮影イメージの明るさと画素数とを軸としたヒストグラムの幅がダーク領域及びブライト領域を避けるように調整する段階と、前記ヒストグラムが明るさ軸の方向においてグラフの中央に近いように調整する過程を通じて前記検査装置の照明強度を調整する段階と、を含むことを特徴とする検査装置の照明強度の設定方法。
【選択図】図1
Description
110 第1照明部
112 光源
114 格子素子
116 格子移送器具
118 投影レンズ
120 第2照明部
130 カメラ
140 ステージ
Claims (3)
- 検査装置内に検査基板を装着する段階と、
前記検査装置のカメラを介して取得された撮影イメージの明るさ分布を示すヒストグラムの幅がダーク領域及びブライト領域を避けるように前記ヒストグラムが明るさ軸の方向においてグラフの中央に近いように前記検査装置の照明強度を調整する過程を通じて前記照明強度の第1範囲を設定する段階と、
前記照明強度の第1範囲内で検査領域の全体面積に対する有効画素の比率が所定の有効値を超えるように前記検査装置の照明強度を調整する過程を通じて前記照明強度の第2範囲を設定する段階を含み、
前記有効画素は全画素の平均輝度に対する該画素の輝度の比が所定の基準値以上の画素である
ことを特徴とする検査装置の照明強度の設定方法。 - 前記検査装置の照明は、格子パターン照明であることを特徴とする請求項1記載の検査装置の照明強度の設定方法。
- 前記検査装置のカメラを介して取得した撮影イメージのヒストグラムの明るさ軸方向の幅がダーク領域及びブライト領域を避けるように調整する段階の前に、指定されたダーク値以下の際前記ダーク領域は第1カラーに表示され、指定されたブライト値以上の際前記ブライト領域は第2カラーに表示される段階をさらに含むことを特徴とする請求項1記載の検査装置の照明強度の設定方法。
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20100034056 | 2010-04-14 | ||
| KR10-2010-0034056 | 2010-04-14 | ||
| KR1020110023171A KR101343375B1 (ko) | 2010-04-14 | 2011-03-16 | 검사 장치의 진단 및 측정변수 설정 방법 |
| KR10-2011-0023171 | 2011-03-16 | ||
| KR10-2011-0032487 | 2011-04-08 | ||
| KR1020110032487A KR101227110B1 (ko) | 2010-04-14 | 2011-04-08 | 검사 장치의 진단 및 측정변수 설정 방법 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011090382A Division JP2011227077A (ja) | 2010-04-14 | 2011-04-14 | 検査装置の診断及び測定変数設定方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2014197034A true JP2014197034A (ja) | 2014-10-16 |
Family
ID=45029849
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011090382A Pending JP2011227077A (ja) | 2010-04-14 | 2011-04-14 | 検査装置の診断及び測定変数設定方法 |
| JP2014147419A Pending JP2014197034A (ja) | 2010-04-14 | 2014-07-18 | 検査装置の診断及び測定変数設定方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011090382A Pending JP2011227077A (ja) | 2010-04-14 | 2011-04-14 | 検査装置の診断及び測定変数設定方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP2011227077A (ja) |
| KR (2) | KR101343375B1 (ja) |
| TW (1) | TWI460419B (ja) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI468640B (zh) * | 2012-09-25 | 2015-01-11 | Machvision Inc | Socket connector detection system and detection method |
| US12309916B2 (en) | 2016-02-04 | 2025-05-20 | Koh Young Technology Inc. | Method of verifying fault of inspection unit, inspection apparatus and inspection system |
| KR101810991B1 (ko) * | 2016-02-04 | 2018-01-25 | 주식회사 고영테크놀러지 | 검사대, 검사 시스템 및 검사 방법 |
| CN107024339B (zh) * | 2017-04-21 | 2023-10-20 | 小艾帮帮(杭州)科技有限公司 | 一种头戴显示设备的测试装置及方法 |
| US11599988B2 (en) * | 2020-09-11 | 2023-03-07 | Super Micro Computer, Inc. | Inspection of circuit boards for unauthorized modifications |
| KR102344054B1 (ko) * | 2021-09-07 | 2021-12-28 | 주식회사 시스템알앤디 | 레퍼런스 타겟을 이용한 다중 광학계 비전 시스템의 진단 방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02145904A (ja) * | 1988-11-28 | 1990-06-05 | Hitachi Ltd | パターン検査方法およびそれに用いるパターン検査装置 |
| JPH0719825A (ja) * | 1993-06-23 | 1995-01-20 | Sharp Corp | 基板検査装置 |
| JP2003139718A (ja) * | 2001-10-30 | 2003-05-14 | Nikon Corp | 表面検査装置および表面検査方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07181671A (ja) * | 1993-12-22 | 1995-07-21 | Toshiba Corp | マスク位置合わせ検査方法および検査装置 |
| US6606402B2 (en) * | 1998-12-18 | 2003-08-12 | Cognex Corporation | System and method for in-line inspection of stencil aperture blockage |
| US6545275B1 (en) | 1999-09-03 | 2003-04-08 | Applied Materials, Inc. | Beam evaluation |
| US7132640B2 (en) | 2002-03-05 | 2006-11-07 | Arizona Board Of Regents | Wave interrogated near field array system and method for detection of subwavelength scale anomalies |
| US7271838B2 (en) * | 2002-05-08 | 2007-09-18 | Olympus Corporation | Image pickup apparatus with brightness distribution chart display capability |
| KR20070001360A (ko) * | 2005-06-29 | 2007-01-04 | 삼성전자주식회사 | 반도체 기판의 결함 검출 방법 |
| US7512269B2 (en) * | 2005-08-04 | 2009-03-31 | Asaf Golan | Method of adaptive image contrast enhancement |
| KR100870930B1 (ko) * | 2007-05-08 | 2008-11-28 | 주식회사 고영테크놀러지 | 다방향 영사식 모아레 간섭계 및 이를 이용한 검사방법 |
-
2011
- 2011-03-16 KR KR1020110023171A patent/KR101343375B1/ko active Active
- 2011-04-08 KR KR1020110032487A patent/KR101227110B1/ko active Active
- 2011-04-13 TW TW100112796A patent/TWI460419B/zh active
- 2011-04-14 JP JP2011090382A patent/JP2011227077A/ja active Pending
-
2014
- 2014-07-18 JP JP2014147419A patent/JP2014197034A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02145904A (ja) * | 1988-11-28 | 1990-06-05 | Hitachi Ltd | パターン検査方法およびそれに用いるパターン検査装置 |
| JPH0719825A (ja) * | 1993-06-23 | 1995-01-20 | Sharp Corp | 基板検査装置 |
| JP2003139718A (ja) * | 2001-10-30 | 2003-05-14 | Nikon Corp | 表面検査装置および表面検査方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201144794A (en) | 2011-12-16 |
| KR20110115078A (ko) | 2011-10-20 |
| JP2011227077A (ja) | 2011-11-10 |
| KR101227110B1 (ko) | 2013-01-29 |
| KR20110115083A (ko) | 2011-10-20 |
| TWI460419B (zh) | 2014-11-11 |
| KR101343375B1 (ko) | 2013-12-20 |
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