JP2014011205A - Exposure device, exposure method, and device manufacturing method - Google Patents

Abstract

An exposure apparatus capable of suppressing the occurrence of defective exposure is provided.
An exposure apparatus exposes a substrate with exposure light through a first liquid in a first immersion space. An exposure apparatus includes an optical member having an exit surface from which exposure light is emitted, a first member that is disposed on at least a part of the periphery of the optical path of the exposure light, and that forms a first immersion space for the first liquid, and an optical path And a second member that is disposed outside the first member and can form a second immersion space for the second liquid away from the first immersion space.
[Selection] Figure 3

Description

  The present invention relates to an exposure apparatus, an exposure method, and a device manufacturing method.

  As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

US Patent Application Publication No. 2009/0046261

  In the immersion exposure apparatus, if the liquid flows into an undesired space, an exposure failure may occur. As a result, a defective device may occur.

  An object of an aspect of the present invention is to provide an exposure apparatus and an exposure method that can suppress the occurrence of exposure failure. Moreover, the aspect of this invention aims at providing the device manufacturing method which can suppress generation | occurrence | production of a defective device.

  According to the first aspect of the present invention, an exposure apparatus that exposes a substrate with exposure light through the first liquid in the first immersion space, the optical member having an exit surface from which the exposure light is emitted; A first member disposed at least part of the periphery of the optical path of the exposure light and forming a first liquid immersion space for the first liquid; and disposed outside the first member with respect to the optical path, from the first liquid immersion space. An exposure apparatus is provided that includes a second member that can form a second immersion space for the second liquid.

  According to a second aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the first aspect and developing the exposed substrate.

  According to a third aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, wherein the exposure light path exits from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, An object having a predetermined region below the second member in a state where the second immersion space of the second liquid is formed apart from the space and the second immersion space is formed is an optical axis of the optical member. And changing the distance between the lower surface of the second member and the upper surface of the object during at least a part of the period of movement in the direction intersecting with the object.

  According to a fourth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, the optical path of exposure light being emitted from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, A direction in which the object intersects the optical axis of the optical member below the second member in a state where the second immersion space of the second liquid is formed apart from the space and the second immersion space is formed. An exposure method is provided that includes changing the distance between the lower surface of the second member and the upper surface of the object based on the moving condition of the object in at least a part of the period during which the object moves.

  According to a fifth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, wherein the exposure light path exits from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, Forming a second immersion space for the second liquid away from the space, and the second immersion space from one side to the other on the first object and on the second object adjacent to the first object via a gap. Moving the second member and the first and second objects relative to each other in a predetermined plane substantially perpendicular to the optical axis of the optical member so that the second immersion space moves on the first object and the second object. A second member in a direction substantially parallel to the optical axis in at least a part of a period of movement from one to the other on the two objects The lower surface and the distance between the upper surface of the first object, and an exposure method that includes the lower surface of the second member and changing one or both of the distance between the upper surface of the second object, there is provided.

  According to a sixth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, the optical path of exposure light being emitted from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, A direction in which the object intersects the optical axis of the optical member below the second member in a state where the second immersion space of the second liquid is formed apart from the space and the second immersion space is formed. Changing one or both of the amount of movement of the second member and the amount of movement of the object in a direction substantially parallel to the optical axis of the optical member between the period of constant speed movement and the period of non-constant speed movement. An exposure method is provided.

  According to a seventh aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, wherein the exposure light path exits from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, The second immersion space for the second liquid is formed away from the space, and the plurality of shot regions of the substrate are moved to the first liquid in the first immersion space in the state where the second immersion space is formed. The first shot of the plurality of shot areas, and one or both of the amount of movement of the second member and the amount of movement of the object in a direction substantially parallel to the optical axis of the optical member. An exposure period in which the exposure of the area is performed, and a second exposure that is performed next after the exposure of the first shot area is completed. And changing in a non-exposure period until exposure-shot region is started, the exposure method comprising is provided.

  According to an eighth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space, the optical path of exposure light being emitted from an exit surface of an optical member. Forming a first immersion space for the first liquid with a first member disposed at least at a part of the periphery, and a second member disposed outside the first member with respect to the optical path, Forming a second immersion space for the second liquid away from the space, and in a state in which the second immersion space is formed, an object having a predetermined region below the second member is placed on the optical axis of the optical member. An exposure method is provided that includes moving the object within a predetermined plane intersecting the surface and changing the moving condition of the object within the predetermined plane during at least a part of a period during which the object moves.

  According to a tenth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure method according to any one of the third to ninth aspects; and developing the exposed substrate. Is provided.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the substrate stage and measurement stage which concern on 1st Embodiment. It is a figure for demonstrating an example of the exposure method which concerns on 1st Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 1st Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 2nd Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 3rd Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 4th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 5th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 6th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 7th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 7th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member and object which concern on 8th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member and object which concern on 8th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member and object which concern on 8th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 9th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 9th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 9th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 10th Embodiment. It is a figure which shows an example of operation | movement of the 2nd member which concerns on 11th Embodiment. It is a figure which shows an example of a substrate stage. It is a flowchart which shows an example of a device manufacturing method.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the present embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS1 is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS1. In the present embodiment, water (pure water) is used as the liquid LQ.

  Further, the exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

  In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a mask stage 1, a substrate stage 2, a measuring system 4 for measuring positions of the measuring stage 3, and a mask M illuminated with exposure light EL An illumination system IL, a projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, a liquid immersion member 5 that forms liquid immersion spaces LS1 and LS2, and the entire exposure apparatus EX And a storage device 7 connected to the control device 6 and storing various information relating to exposure.

  The exposure apparatus EX includes a chamber apparatus 11 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. The chamber apparatus 11 includes a gas supply unit 11S that supplies a gas Fr whose temperature and humidity are adjusted to the space CS. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

  The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). The substrate P may include a photosensitive film and a film different from the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the predetermined illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

  The mask stage 1 is movable on the guide surface 8G of the base member 8 including the illumination region IR while holding the mask M. In the present embodiment, the guide surface 8G and the XY plane are substantially parallel. The mask stage 1 is moved by the operation of a drive system including a planar motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can move in six directions on the guide surface 8G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system.

  The projection optical system PL irradiates the predetermined projection region PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL may be, for example, 1/4, 1/5, or 1/8. The projection optical system PL may be a unity magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes both a reflective optical element and a refractive optical element. The projection optical system PL may form an inverted image or an erect image.

  The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. In addition, the emission surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis. In the present embodiment, the exposure light EL emitted from the emission surface 12 travels in the −Z direction.

  The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 9G of the base member 9. In the present embodiment, the guide surface 9G and the XY plane are substantially parallel.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of the drive system 10 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 10 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 9 </ b> M disposed on the base member 9. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 9G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 10.

  The substrate stage 2 can release the substrate P as disclosed in, for example, US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and US Patent Application Publication No. 2007/0288121. And a second holding part 15 which is disposed around the first holding part 14 and holds the cover member T1 and the scale member (measurement member) T2 in a releasable manner. In the present embodiment, the upper surface of the substrate stage 2 disposed around the substrate P includes the upper surface of the cover member T1. Further, the upper surface of the substrate stage 2 includes the upper surface of the scale member T2.

  The measurement system 4 includes an encoder system that measures the position of the substrate stage 2 using a scale member T2 of the substrate stage 2 as disclosed in, for example, US Patent Application Publication No. 2007/0288121. The measurement system 4 includes an interferometer system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the mask stage 1 (mask M) and the substrate stage 2 (substrate P) based on the measurement result of the measurement system 4. And position control of the measurement stage 3 (measurement member C).

  Next, the liquid immersion member 5 according to this embodiment will be described. FIG. 2 is a side view showing an example of the liquid immersion member 5 according to the present embodiment, and FIG. 3 is a view of the liquid immersion member 5 as viewed from the lower side (−Z side).

  The liquid immersion member 5 is in relation to the first member 21 disposed at least at a part of the periphery of the terminal optical element 13 and the optical path K of the exposure light EL emitted from the emission surface 12 (the optical axis of the terminal optical element 13). And a second member 22 disposed outside the first member 21. The first member 21 forms an immersion space LS1 for the liquid LQ. The second member 22 can be separated from the immersion space LS1 to form an immersion space LS2 for the liquid LQ. The immersion space LS1 is formed in at least a part of the first space SP1 below the first member 21. The immersion space LS2 is formed in at least a part of the second space SP2 below the second member 22.

  The first member 21 has a lower surface 23. The second member 22 has a lower surface 24. The lower surface 23 and the lower surface 24 can be opposed to an object that can move below the last optical element 13. An object that can move below the last optical element 13 can face the exit surface 12. The object can be arranged in the projection region PR. The object can move in the XY plane including the projection region PR. The object is movable below the first member 21. The object is movable below the second member 22.

  In the present embodiment, the object is at least the substrate stage 2 (cover member T1, scale member T2), the substrate P held on the substrate stage 2 (first holding unit 14), and the measurement stage 3 (measurement member C). Including one.

  In the following description, the object that can move below the last optical element 13 is the substrate P. As described above, the object movable below the last optical element 13 may be at least one of the substrate stage 2 and the measurement stage 3, or an object different from the substrate P, the substrate stage 2, and the measurement stage 3. But you can.

  The first member 21 forms an immersion space LS1 for the liquid LQ so that the optical path K of the exposure light EL on the emission surface 12 side is filled with the liquid LQ. The immersion space LS1 is formed so that the optical path K between the emission surface 12 and the upper surface of the substrate P (object) is filled with the liquid LQ.

  The first member 21 forms an immersion space LS1 for the liquid LQ in at least a part of the optical path space SPK including the optical path K on the emission surface 12 side and the first space SP1 on the lower surface 23 side. The last optical element 13 and the first member 21 can hold the liquid LQ between the substrate P (object). The immersion space LS1 is formed by the liquid LQ held between the terminal optical element 13 and the first member 21 and the substrate P. The optical path of the exposure light EL between the last optical element 13 and the substrate P is maintained by holding the liquid LQ between the emission surface 12 and the lower surface 23 on the one side and the upper surface of the substrate P (object) on the other side. The immersion space LS1 is formed so that K is filled with the liquid LQ.

  In the exposure of the substrate P, the immersion space LS1 is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS1 is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

  In the present embodiment, at least a part of the interface (meniscus, edge) LG1 of the liquid LQ in the immersion space LS1 is formed between the lower surface 23 and the upper surface of the substrate P. That is, the exposure apparatus EX of the present embodiment employs a local liquid immersion method. The outside of the immersion space LS1 (the outside of the interface LG1) is a gas space.

  In the present embodiment, the first member 21 is an annular member. In the present embodiment, a part of the first member 21 is disposed around the last optical element 13. In addition, a part of the first member 21 is disposed around the optical path K of the exposure light EL between the terminal optical element 13 and the substrate P.

  The first member 21 may not be an annular member. For example, the first member 21 may be disposed in a part of the periphery of the terminal optical element 13 and the optical path K. The first member 21 may not be disposed at least at a part of the periphery of the last optical element 13. For example, the first member 21 may be disposed at least part of the periphery of the optical path K between the exit surface 12 and the substrate P and may not be disposed around the terminal optical element 13. The first member 21 may not be disposed at least at a part of the periphery of the optical path K between the emission surface 12 and the substrate P. For example, the first member 21 may be disposed at least at a part of the periphery of the terminal optical element 13 and may not be disposed around the optical path K between the exit surface 12 and the object.

  The first member 21 includes a supply port 31 for supplying the liquid LQ for forming the immersion space LS1, and a recovery port 32 for recovering at least a part of the liquid LQ in the immersion space LS1.

  FIG. 4 is a cross-sectional view of the first member 21 showing the vicinity of the supply port 31. The supply port 31 is disposed so as to face the optical path space SPK (optical path K). The supply port 31 is connected to a liquid supply device 34 that can supply the liquid LQ via a supply flow path 33 formed inside the first member 21. The supply port 31 supplies the liquid LQ from the liquid supply device 34 to the optical path space SPK (optical path K) on the exit surface 12 side.

  The first member 21 has a hole (opening) 20 that the injection surface 12 faces. The exposure light EL emitted from the emission surface 12 can pass through the opening 20 and irradiate the substrate P. At least a part of the liquid LQ supplied from the supply port 31 to the optical path space SPK is supplied onto the substrate P (on the object) through the opening 20. Further, at least a part of the liquid LQ supplied from the supply port 31 to the optical path space SPK is supplied to the first space SP1 through the opening 20. In the present embodiment, the liquid LQ is supplied from the opening 20 to the first space SP1 below the first member 21.

  The liquid supply device 34 includes a liquid adjustment system. The liquid supply device 34 includes, for example, a supply amount adjusting unit 34A that can adjust the supply amount (liquid supply amount per unit time) of the liquid LQ supplied from the supply port 31, and a temperature that adjusts the temperature of the supplied liquid LQ. It has the adjustment part 34B and the temperature sensor 34C which detects the temperature of the liquid LQ to supply. The supply amount adjustment unit 34A includes a mass flow controller. The temperature adjustment unit 34B includes a heating device that can heat the liquid LQ and a cooling device that can cool the liquid LQ.

  A plurality of supply ports 31 may be arranged around the optical path K. As shown in FIG. 2, in the present embodiment, the supply port 31 is arranged on one side (+ X side) and the other side (−X side) with respect to the optical path K. As shown in FIG. 2, in this embodiment, a liquid supply device 34 is connected to each of the supply port 31 on one side and the supply port 31 on the other side. The temperature of the liquid LQ supplied from the supply port 31 on one side and the temperature of the liquid LQ supplied from the supply port 31 on the other side may be substantially equal or different. The supply amount of the liquid LQ supplied from the supply port 31 on one side and the supply amount of the liquid LQ supplied from the supply port 31 on the other side may be substantially equal or different.

  FIG. 5 is a cross-sectional view of the first member 21 showing the vicinity of the recovery port 32. The collection port 32 is disposed so as to face the first space SP1. The substrate P (object) can face the recovery port 32. The recovery port 32 is connected to a liquid recovery device 36 that can recover (suction) the liquid LQ via a recovery flow path 35 formed inside the first member 21. The recovery port 32 can recover (suction) at least part of the liquid LQ in the first space SP1 between the first member 21 and the substrate P. The liquid LQ that has flowed into the recovery channel 35 from the recovery port 32 is recovered by the liquid recovery device 36.

  The liquid recovery device 36 can connect the recovery port 32 to the vacuum system BS. The liquid recovery device 36 includes a storage portion 36A that stores the liquid LQ recovered from the recovery port 32, and a pressure adjustment unit 36B that can adjust the suction force of the recovery port 32. The accommodating portion 36A includes a tank. The pressure adjustment unit 36B includes a pressure adjustment valve and the like.

  In the present embodiment, the first member 21 includes a porous member 37. The porous member 37 has a plurality of holes (openings or pores) through which the liquid LQ can flow. The porous member 37 includes, for example, a mesh filter. The mesh filter is a porous member in which a large number of small holes are formed in a mesh shape.

  In the present embodiment, the porous member 37 is a plate-like member. The porous member 37 has a plurality of holes formed so as to connect the lower surface 37B to which the substrate P can face, the upper surface 37A facing the recovery flow path 35 formed in the first member 21, and the upper surface 37A and the lower surface 37B. And have. In the present embodiment, the recovery port 32 includes a hole of the porous member 37. The liquid LQ recovered through the hole (recovery port 32) of the porous member 37 flows through the recovery channel 35.

  In the present embodiment, both the liquid LQ and the gas in the first space SP1 are recovered (sucked) from the porous member 37 (recovery port 32). Note that only the liquid LQ may be substantially recovered through the porous member 37, and the recovery of the gas may be limited. For example, the pressure (first space SP1) on the lower surface 37B side of the porous member 37 so that the liquid LQ on the substrate P (object) passes through the hole of the porous member 37 and flows into the recovery flow path 35 and does not pass the gas. ) And the pressure on the upper surface 37A side (pressure of the recovery flow path 35) may be adjusted. An example of a technique for recovering only the liquid through the porous member is disclosed in, for example, US Pat. No. 7,292,313.

  The porous member 37 may not be provided.

  In the present embodiment, the liquid LQ is recovered from the recovery port 32 in parallel with the supply of the liquid LQ from the supply port 31, so that the terminal optical element 13 and the first member 21 on one side and the other An immersion space LS1 for the liquid LQ is formed between the substrate P on the side. The immersion space LS1 is formed by the liquid LQ supplied from the supply port 31.

  The lower surface 23 is disposed around the opening 20. In the present embodiment, at least a part of the lower surface 23 is substantially parallel to the XY plane. Note that at least a part of the lower surface 23 may be inclined with respect to the XY plane, or may include a curved surface.

  The lower surface 23 includes a lower surface 23B that is disposed around the opening 20 and cannot collect the liquid LQ, and a lower surface 37B of the porous member 37 that is disposed around the lower surface 23B and can collect the liquid LQ. The liquid LQ cannot pass through the lower surface 23B. The lower surface 23B can hold the liquid LQ with the substrate P.

  In the present embodiment, the lower surface 37 </ b> B capable of collecting the liquid LQ is disposed at the peripheral edge of the lower surface 23. In the XY plane parallel to the lower surface 23 (the upper surface of the substrate P), the lower surface 37B is annular. The lower surface 23B that cannot recover the liquid LQ is disposed inside the lower surface 37B. In the present embodiment, the interface LG1 is disposed between the lower surface 37B and the upper surface of the substrate P.

  A plurality of lower surfaces 37B (collection ports 32) that can collect the liquid LQ may be arranged around the optical path K (opening 20).

  The second member 22 is a member different from the first member 21. The second member 22 is separated from the first member 21. The second member 22 is disposed at a part of the periphery of the first member 21.

  The second member 22 can form an immersion space LS2 for the liquid LQ in at least a part of the second space SP2 below the second member 22. The second space SP2 is a space on the lower surface 24 side. The immersion space LS2 is formed apart from the immersion space LS1. The immersion space LS2 is formed between the lower surface 24 and the upper surface of the substrate P (object). The second member 22 can hold the liquid LQ with the substrate P (object). The immersion space LS2 is formed by the liquid LQ that is held between the second member 22 and the substrate P. Liquid immersion space LS2 is formed by holding liquid LQ between lower surface 24 on one side and the upper surface of substrate P (object) on the other side.

  In the present embodiment, at least a part of the interface (meniscus, edge) LG2 of the liquid LQ in the immersion space LS2 is formed between the lower surface 24 and the upper surface of the substrate P. The outside of the immersion space LS2 (the outside of the interface LG2) is a gas space.

  The immersion space LS2 is smaller than the immersion space LS1. The size of the immersion space includes the volume of the liquid that forms the immersion space. The size of the immersion space includes the weight of the liquid that forms the immersion space. The size of the immersion space includes, for example, the area of the immersion space in a plane parallel to the surface (upper surface) of the substrate P (in the XY plane). The size of the immersion space includes, for example, the dimension of the immersion space in a predetermined direction (for example, the X-axis direction or the Y-axis direction) in a plane (in the XY plane) parallel to the surface (upper surface) of the substrate P. .

  That is, in the plane parallel to the surface (upper surface) of the substrate P (in the XY plane), the immersion space LS2 is smaller than the immersion space LS1. The volume (weight) of the liquid LQ that forms the immersion space LS2 is smaller than the volume (weight) of the liquid LQ that forms the immersion space LS1. The dimension of the immersion space LS2 in the XY plane is smaller than the dimension of the immersion space LS1.

  In the present embodiment, two second members 22 are arranged in the space around the first member 21. In the present embodiment, the second member 22 is disposed on one side (+ X side) and the other side (−X side) of the first member 21 with respect to the X-axis direction. The immersion space LS2 is formed on one side (+ X side) and the other side (−X side) of the immersion space LS1 with respect to the X-axis direction.

  In the following description, the second member 22 disposed on the + X side of the first member 21 is appropriately referred to as a second member 221, and the second member 22 disposed on the −X side of the first member 21 is appropriately included. , Referred to as a second member 222.

  The second member 22 may be disposed only on one side (+ X side) of the first member 21 or may be disposed only on the other side (−X side). The immersion space LS2 may be disposed only on one side (+ X side) of the immersion space LS1, or may be disposed only on the other side (−X side).

  In the present embodiment, at least a part of the lower surface 24 is substantially parallel to the XY plane. Note that at least a part of the lower surface 24 may be inclined with respect to the XY plane, or may include a curved surface.

  In the present embodiment, the position (height) of the lower surface 23 and the position (height) of the lower surface 24 in the Z-axis direction are substantially equal. That is, the distance between the lower surface 23 and the upper surface of the substrate P (object) and the distance between the lower surface 24 and the upper surface of the substrate P (object) are substantially equal.

  Note that the lower surface 24 may be disposed at a position lower than the lower surface 23. That is, the distance between the lower surface 24 and the upper surface of the substrate P (object) may be smaller than the distance between the lower surface 23 and the upper surface of the substrate P (object). Note that the lower surface 24 may be disposed at a position higher than the lower surface 23. That is, the distance between the lower surface 25 and the upper surface of the substrate P (object) may be larger than the distance between the lower surface 24 and the upper surface of the substrate P (object).

  FIG. 6 is a partial cross-sectional view showing an example of the second member 22. The second member 22 includes a supply port 41 for supplying the liquid LQ for forming the immersion space LS2, and a recovery port 42 for recovering at least a part of the liquid LQ in the immersion space LS2.

    In the present embodiment, the supply port 41 is disposed so as to face the second space SP <b> 2 below the second member 22. The substrate P (object) can face the supply port 41. The supply port 41 is disposed on at least a part of the lower surface 24 of the second member 22. The supply port 41 can supply the liquid LQ to the second space SP2.

    In the present embodiment, the recovery port 42 is disposed so as to face the second space SP <b> 2 below the second member 22. The substrate P (object) can face the recovery port 42. The collection port 42 is disposed on at least a part of the lower surface 24 of the second member 22. The recovery port 42 can recover at least a part of the liquid LQ in the second space SP2. The recovery port 42 can recover the gas in the second space SP2. In the present embodiment, the recovery port 42 recovers the liquid LQ together with the gas. At least a portion of the fluid (one or both of the liquid LQ and gas) in the second space SP2 is recovered from the recovery port 42.

  In the present embodiment, at least a part of the recovery port 42 is disposed between the first member 21 and the supply port 41. In addition, at least a part of the recovery port 42 is disposed outside the supply port 41 with respect to the optical path K (first member 21). In the present embodiment, the collection port 42 is disposed so as to surround the supply port 41. In a plane parallel to the lower surface 24 (in the XY plane), the recovery port 42 is annular.

  A plurality of recovery ports 42 may be arranged around the supply port 41. That is, the plurality of recovery ports 42 may be discretely arranged around the supply port 41.

  The supply port 41 is connected to a liquid supply device 44 that can supply the liquid LQ via a supply flow path 43 formed inside the second member 22. The supply port 41 supplies the liquid LQ from the liquid supply device 44 to the second space SP2.

  The liquid supply device 44 includes a liquid adjustment system. The liquid supply device 44 includes, for example, a supply amount adjusting unit 44A that can adjust the supply amount (liquid supply amount per unit time) of the liquid LQ supplied from the supply port 41, and a temperature that adjusts the temperature of the supplied liquid LQ. It has the adjustment part 44B and the temperature sensor 44C which detects the temperature of the liquid LQ to supply. The supply amount adjusting unit 44A includes a mass flow controller. The temperature adjustment unit 44B includes a heating device that can heat the liquid LQ and a cooling device that can cool the liquid LQ.

  As shown in FIG. 2, in the present embodiment, the liquid supply device 44 is connected to each of the second member 221 on one side and the second member 222 on the other side. In the present embodiment, the temperature of the liquid LQ supplied from the supply port 41 of the second member 221 on one side and the temperature of the liquid LQ supplied from the supply port 41 of the second member 222 on the other side are substantially equal. May be equal to or different from each other. The supply amount of the liquid LQ supplied from the supply port 41 of the second member 221 on one side is substantially equal to the supply amount of the liquid LQ supplied from the supply port 41 of the second member 22 on the other side. It may be different or different.

  The recovery port 42 is connected to a liquid recovery device 46 capable of recovering (suctioning) the liquid LQ (gas) via a recovery channel 45 formed inside the second member 22. The recovery port 42 can recover (suck) at least a part of the liquid LQ in the second space SP2 between the second member 22 and the substrate P. The liquid LQ recovered from the second space SP2 below the second member 22 flows through the recovery channel 45. The liquid LQ that has flowed into the recovery channel 45 from the recovery port 42 is recovered by the liquid recovery device 46.

  The liquid recovery device 46 can connect the recovery port 42 to the vacuum system BS. The liquid recovery device 46 includes a storage portion 46A that stores the liquid LQ recovered from the recovery port 42, and a pressure adjustment unit 46B that can adjust the suction force of the recovery port 42. The accommodating portion 46A includes a tank. The pressure adjustment unit 46B includes a pressure adjustment valve and the like.

  The suction force of the recovery port 42 depends on the difference between the pressure of the recovery channel 45 and the pressure of the second space SP2. The suction force of the recovery port 42 is determined by the pressure difference between the recovery flow path 45 and the second space SP2. In the present embodiment, the pressure adjusting unit 46B can adjust the pressure of the recovery flow path 45. The chamber device 11 can adjust the pressure in the second space SP2.

  As shown in FIG. 2, in the present embodiment, a liquid recovery device 46 is connected to each of the second member 221 on one side and the second member 222 on the other side. In the present embodiment, the recovery force (suction force) of the recovery port 41 of the second member 221 on one side and the recovery force (suction force) of the recovery port 42 of the second member 222 on the other side are substantially equal. It may be different or different.

  In the present embodiment, the liquid LQ is recovered from the recovery port 42 in parallel with the supply of the liquid LQ from the supply port 41, whereby the second member 22 on one side and the substrate P on the other side In the meantime, an immersion space LS2 is formed with the liquid LQ. The immersion space LS2 is formed by the liquid LQ supplied from the supply port 41.

  FIG. 7 is a plan view showing an example of the substrate stage 2 and the measurement stage 3. The substrate P is held by the first holding unit 14 so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel. The cover member T1 and the scale member T2 are held by the second holding unit 15 so that the upper surface of the cover member T1 and the upper surface of the scale member T2 are substantially parallel to the XY plane. In the present embodiment, the upper surface of the substrate P held by the first holding unit 14, the upper surface of the cover member T1 and the upper surface of the scale member T2 held by the second holding unit 15 are substantially in the same plane. Be placed. Note that the upper surface of the substrate P held by the first holding unit 14 and one or both of the upper surface of the cover member T1 and the scale member T2 held by the second holding unit 15 are not arranged in the same plane. Also good. One or both of the upper surface of the cover member T1 and the upper surface of the scale member T2 may be inclined with respect to the upper surface of the substrate P, or one or both of the upper surface of the cover member T1 and the upper surface of the scale member T2 have a curved surface. May be included.

  The cover member T1 is disposed around the substrate P. The cover member T1 is adjacent to the substrate P through the gap Ga. A gap Ga is provided between the substrate P and the cover member T1.

  The scale member T2 is disposed around the cover member T1. The scale member T2 is adjacent to the cover member T1 through the gap Gb. A gap Gb is formed between the cover member T1 and the scale member T2.

  In the present embodiment, as disclosed in, for example, U.S. Patent Application Publication No. 2006/0023186 and U.S. Patent Application Publication No. 2007/0127006, it is formed below the terminal optical element 13 and the first member 21. The upper surface of the substrate stage 2 (the upper surface of the scale member T2) and the upper surface of the measurement stage 3 are brought close to or in contact with each other so that the immersion space LS1 moves from one to the other on the substrate stage 2 and the measurement stage 3. In this state, the substrate stage 2 and the measurement stage 3 are movable in the XY plane with respect to the terminal optical element 13 and the first member 21.

  In the following description, the substrate stage 2 and the measurement stage 3 are placed on the XY plane with respect to the last optical element 13 and the first member 21 in a state where the upper surface of the substrate stage 2 and the upper surface of the measurement stage 3 are close to or in contact with each other. The operation of moving in a synchronized manner is appropriately referred to as a scrum moving operation.

  In the present embodiment, as shown in FIG. 7, in the scram moving operation, the + Y side edge of the upper surface of the substrate stage 2 and the + Y side edge of the upper surface of the measurement stage 3 approach or come into contact with each other.

  By the scram moving operation, the immersion space LS1 formed below the last optical element 13 and the first member 21 moves from one side to the other on the substrate stage 2 and the measurement stage 3. The immersion space LS2 formed below the second member 22 moves from one to the other on the substrate stage 2 and the measurement stage 3.

  In the scram moving operation, the substrate stage 2 is adjacent to the measurement stage 3 through the gap Gc. In the scram moving operation, a gap Gc is provided between the substrate stage 2 and the measurement stage 3.

  The upper surface of the measurement stage 3 is arranged around the measurement member C. The upper surface of the measurement stage 3 is adjacent to the measurement member C through the gap Gd. A gap Gd is formed between the measurement stage 3 and the measurement member C.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  At a substrate exchange position away from the liquid immersion member 5, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. In addition, the measurement stage 3 is disposed so as to face the last optical element 13 and the liquid immersion member 5 in at least a part of the period in which the substrate stage 2 is separated from the liquid immersion member 5.

  The supply port 31 (opening 20) of the first member 21 can supply the liquid LQ to the first space SP1 below the first member 21. The recovery port 32 of the first member 21 can suck the fluid (one or both of the liquid LQ and the gas) in the first space SP1. In parallel with at least a part of the supply of the liquid LQ from the supply port 31, the liquid LQ is recovered from the recovery port 32, whereby an immersion space LS1 of the liquid LQ is formed in the first space SP1.

  The supply port 41 of the second member 22 can supply the liquid LQ to the second space SP <b> 2 below the second member 22. The recovery port 42 of the second member 22 can suck the fluid (one or both of the liquid LQ and the gas) in the second space SP2. In parallel with at least part of the supply of the liquid LQ from the supply port 41, the liquid LQ is recovered from the recovery port 42, whereby an immersion space LS2 of the liquid LQ is formed in the second space SP2.

  In a state where the measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5, the first and second liquid immersion spaces LS1 and LS2 are formed on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 causes the last optical element 13 and the liquid immersion member 5 to face the substrate stage 2 (substrate P). Then, the substrate stage 2 is moved. The scram movement operation is executed so that the terminal optical element 13 and the liquid immersion member 5 and the measurement stage 3 are changed from the facing state to the state in which the terminal optical element 13 and the liquid immersion member 5 and the substrate stage 2 are facing each other. The The recovery of the liquid LQ from the recovery port 32 is performed in parallel with the supply of the liquid LQ from the supply port 31 with the last optical element 13 and the liquid immersion member 5 facing the substrate stage 2 (substrate P). Thus, an immersion space LS1 is formed between the last optical element 13 and the first member 21 and the substrate stage 2 (substrate P) so that the optical path K of the exposure light EL on the exit surface 12 side is filled with the liquid LQ. The Further, by collecting the liquid LQ from the collection port 42 in parallel with the supply of the liquid LQ from the supply port 41, the immersion space LS2 between the second member 22 and the substrate stage 2 (substrate P). Is formed.

  The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS1 is formed on the substrate P and the immersion space LS2 is formed on at least one of the substrate P and the substrate stage 2. To do. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P through the projection optical system PL and the liquid LQ in the immersion space LS1 between the emission surface 12 and the substrate P. Accordingly, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS1, and the pattern image of the mask M is projected onto the substrate P.

    The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS1 on the substrate P while moving the mask M in the Y-axis direction.

  In a state where the immersion space LS1 is formed, the substrate P (object) moves in the XY plane, whereby a part of the liquid LQ in the immersion space LS1 is separated from the immersion space LS1, and the first space. There is a possibility of movement (outflow) to the outside of SP1. In the present embodiment, the immersion space LS2 is formed in a part of the periphery of the first space SP1. Therefore, the liquid LQ that has moved to the outside of the first space SP1 is captured in the immersion space LS2. The liquid LQ captured in the immersion space LS2 is recovered from the recovery port 42 together with the liquid LQ in the immersion space LS2.

  In the present embodiment, the immersion space LS2 is smaller than the immersion space LS1. Therefore, when the substrate P (object) moves in a state where the immersion spaces LS1 and LS2 are formed, a part of the liquid LQ in the immersion space LS2 is separated from the immersion space LS2 and outside the second space SP2. (Moving out) is suppressed. In other words, since the immersion space LS2 is smaller than the immersion space LS1, a part of the liquid LQ in the immersion space LS2 flows out from the second space SP2, and a part of the liquid LQ in the immersion space LS1 It is suppressed from flowing out of the first space SP1.

  FIG. 8 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S, which are exposure target areas, are arranged in a matrix on the substrate P. The control device 6 sequentially exposes the plurality of shot regions S of the substrate P held on the substrate stage 2 (first holding unit 14) with the exposure light EL through the liquid LQ in the immersion space LS1. Each of the plurality of shot areas S is exposed while moving the substrate P in the Y-axis direction with respect to the exposure light EL (projection area PR).

  For example, in order to expose the first shot region S of the substrate P, the control device 6 causes the substrate P (first shot region S) to be projected onto the projection optical system PL in the state where the immersion spaces LS1 and LS2 are formed. While moving in the Y-axis direction with respect to the projection region PR, in synchronization with the movement of the substrate P in the Y-axis direction, while moving the mask M in the Y-axis direction with respect to the illumination region IR of the illumination system IL, The first shot region S is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS1 on the substrate P. As a result, an image of the pattern of the mask M is projected onto the first shot area S of the substrate P, and the first shot area S is exposed with the exposure light EL emitted from the emission surface 12. After the exposure of the first shot region S is completed, the control device 6 starts the exposure of the next second shot region S, and the substrate P in a state where the immersion spaces LS1 and LS2 are formed. Is moved in a direction intersecting the X axis in the XY plane (for example, the X axis direction or a direction inclined with respect to the X axis and Y axis directions in the XY plane), and the second shot area S is moved to the exposure start position. Move to. Thereafter, the control device 6 starts exposure of the second shot region S.

  The control device 6 performs shots on the position (projection region PR) irradiated with the exposure light EL from the emission surface 12 in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2). The operation of exposing the shot area while moving the area in the Y-axis direction, and the next shot in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2) after the exposure of the shot area The substrate P is placed in a direction crossing the Y-axis direction in the XY plane (X-axis direction, a direction inclined with respect to the X-axis and Y-axis directions in the XY plane, etc.) so that the region is arranged at the exposure start position. The plurality of shot areas of the substrate P are sequentially exposed by repeating the moving operation.

  In the following description, in order to expose the shot area, the position (in which the exposure light EL from the emission surface 12 is irradiated) in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2) ( The operation of moving the substrate P (shot region) in the Y-axis direction with respect to the projection region PR) is appropriately referred to as a scan movement operation. In addition, after the exposure of a certain shot area, in order to expose the next shot area, the next shot area is at the exposure start position in the state where the immersion spaces LS1 and LS2 are formed on the substrate P (substrate stage 2). The operation of moving the substrate P in the direction crossing the Y-axis direction in the XY plane as appropriate is referred to as a step movement operation as appropriate.

  The plurality of shot regions S of the substrate P are sequentially exposed by repeating the scan movement operation and the step movement operation.

  The scan movement operation is a constant speed movement exclusively in the Y-axis direction. The step movement operation includes non-constant speed movement (acceleration / deceleration movement). For example, the step movement operation between two shot areas adjacent in the X-axis direction includes non-constant speed movement (acceleration / deceleration movement) in the Y-axis direction and non-constant speed movement (acceleration / deceleration movement) in the X-axis direction.

  In the present embodiment, the control device 6 moves the substrate stage 2 so that the projection region PR of the projection optical system PL and the substrate P relatively move along a movement locus indicated by an arrow Sr in FIG. The projection area PR is irradiated with the exposure light EL while moving, and the plurality of shot areas S of the substrate P are sequentially exposed with the exposure light EL via the liquid LQ.

  After the exposure of the plurality of shot regions S of the substrate P is completed, the substrate stage 2 holding the substrate P after the exposure moves to the substrate exchange position. The measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5. The scram moving operation is executed so that the terminal optical element 13 and the liquid immersion member 5 and the substrate stage 2 are changed from the facing state to the state in which the terminal optical element 13 and the liquid immersion member 5 and the measurement stage 3 are facing each other. The

  Thereafter, the same processing is repeated to sequentially expose the plurality of substrates P.

  In at least a part of the exposure time (including the scan movement operation and the step movement operation), the scram movement operation, and the measurement process, the immersion spaces LS1 and LS2 are on the upper surface of the substrate P (only the upper surface of the substrate P). In some cases). The immersion spaces LS1 and LS2 may be formed on the gap Ga between the substrate P and the cover member T1 (so as to straddle the substrate P and the cover member T1). Further, the immersion spaces LS1 and LS2 may be formed on the upper surface of the cover member T1 (only on the upper surface of the cover member T1). Moreover, the immersion spaces LS1 and LS2 may be formed on the gap Gb between the cover member T1 and the scale member T2 (so as to straddle the cover member T1 and the scale member T2). Further, the immersion spaces LS1 and LS2 may be formed on the upper surface of the scale member T2 (only on the upper surface of the scale member T2). Further, the immersion spaces LS1 and LS2 may be formed on the gap Gc between the substrate stage 2 and the measurement stage 3 (so as to straddle the substrate stage 2 and the measurement stage 3). The immersion spaces LS1 and LS2 may be formed on the upper surface of the measurement stage 3 (only on the upper surface of the measurement stage 3). The immersion spaces LS1 and LS2 may be formed on the upper surface of the measurement member C (only on the upper surface of the measurement member C). Moreover, the immersion spaces LS1 and LS2 may be formed on the gap Gd between the measurement stage 3 and the measurement member C (so as to straddle the measurement stage 3 and the measurement member C).

  In the following description, the gaps Ga, Gb, Gc, and Gd are collectively referred to as a gap G as appropriate. An object such as the substrate P is appropriately referred to as an object B. Of the two objects forming the gap G, one object B is appropriately referred to as a first object B1, and the other object B is appropriately referred to as a second object B2. The second object B2 is adjacent to the first object B1 through the gap G. The gap G is formed between the first object B1 and the second object B2.

  In the present embodiment, when the first object B1 is the substrate P, the second object B2 is the cover member T1 disposed around the substrate P. When the first object B1 is the cover member T1, the second object B2 is the substrate P. When the first object B1 is the cover member T1 (or scale member T2), the second object B2 is the scale member T2 (or cover member T1). When the first object B1 is the substrate stage 2 (or measurement stage 3), the second object B2 is the measurement stage 3 (or substrate stage 2). When the first object B1 is the measurement member C (or measurement stage 3), the second object B2 is the measurement stage 3 (or measurement member C).

  The gap G may be a gap formed between the first object B1 and the second object B2, or may be a gap (slit, opening, etc.) of one object B.

  In the present embodiment, XY in which the object B having the predetermined area PA intersects the optical axis (Z axis) of the last optical element 13 below the second member 22 in the state where the immersion space LS2 is formed. Move in the plane.

  The control device 6 changes the distance W between the lower surface 24 of the second member 22 and the upper surface of the object B during at least a part of the period during which the object B having the predetermined area PA moves.

  The predetermined area PA is an area where the liquid LQ is more likely to remain after passing through the immersion space LS2 than the area outside the predetermined area PA. The predetermined area PA is an area where the liquid LQ is more likely to remain after passing through the immersion space LS1 than the area outside the predetermined area PA.

  The predetermined area PA is an area where the liquid LQ tends to flow out from the second space SP2 between the second area 22 and the second area 22. That is, there is a possibility that the liquid LQ may flow out from the second space SP2 between the second member 22 and the predetermined area PA, and the second space between the second member 22 and the area outside the predetermined area PA. It is higher than the possibility that the liquid LQ flows out from SP2.

  The predetermined area PA is a partial area of the object B (first and second objects B1, B2). The area outside the predetermined area PA is a partial area of the object B (first and second objects B1, B2).

  In the present embodiment, the predetermined area PA includes the gap G of the object B.

  FIG. 9 shows an example of the operation of the second member 22. FIG. 9 shows that the second member 22 and the first and second objects B1 and B2 are connected to the optical axis of the last optical element 13 so that the immersion space LS2 moves from the first object B1 to the second object B2. An example of a state of relative movement in an XY plane substantially perpendicular to the (Z axis) is shown. A gap (gap part) G is provided between the first object B1 and the second object B2.

  FIG. 9A shows a state in which the immersion space LS2 is formed on the upper surface of the first object B1. FIG. 9B shows a state in which the immersion space LS2 is formed on the gap G. In the example illustrated in FIG. 9, the state changes from the state in which the immersion space LS <b> 2 is formed on the upper surface of the first object B <b> 1 to the state in which the liquid immersion space LS <b> 2 is formed on the upper surface of the second object B <b> 2. As described above, the first and second objects B <b> 1 and B <b> 2 move in the −Y direction with respect to the second member 22.

  The control device 6 performs the second operation on the direction parallel to the optical axis of the last optical element 13 (Z-axis direction) in at least a part of the period during which the immersion space LS2 moves from the first object B1 to the second object B2. One or both of the distance between the lower surface 24 of the member 22 and the upper surface of the first object B1 and the distance between the lower surface 24 of the second member 22 and the upper surface of the second object B2 are changed.

  In the present embodiment, a driving device 60 that can adjust the position of the second member 22 in the Z-axis direction is provided. The driving device 60 can move the second member 22 in the Z-axis direction. Note that the driving device 60 may move the second member 22 in six directions of the X axis, the Y axis, the Z axis, θX, θY, and θZ. The control device 6 controls the driving device 60 so that the distance between the lower surface 24 of the second member 22 and the upper surface of the first object B1 in the Z-axis direction, and the lower surface 24 and the second of the second member 22 in the Z-axis direction. One or both of the distances from the upper surface of the object B2 can be adjusted.

  Note that the control device 6 may move the object B (first and second objects B1 and B2) in the Z-axis direction. When the object B is at least one of the substrate P, the substrate stage 2 (cover member T1, scale member T2), and the measurement stage 3 (measurement member C) held by the first holding unit 14, the object B is It can be moved by the drive system 10.

  The control device 6 moves both the second member 22 and the object B (first and second objects B1 and B2), and the lower surface 24 of the second member 22 and the object B (first and second objects B1). , B2) may be adjusted with respect to the upper surface.

  In the present embodiment, the control device 6 includes the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first object B1, and the second member 22 and the second object B2. One or both of the second member 22 and the object B (first and second objects B1, B2) are moved so that the difference from the pressure of the liquid LQ in the formed immersion space LS2 becomes small, and the distance W change. Further, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the first object B1, and the time when the immersion space LS2 is formed on the gap G. The distance W is changed by moving one or both of the second member 22 and the object B (first and second objects B1, B2) so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small. Further, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the second object B2, and the time when the immersion space LS2 is formed on the gap G. The distance W is changed by moving one or both of the second member 22 and the object B (first and second objects B1, B2) so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small.

  In the present embodiment, the distance between the lower surface 24 of the second member 22 and the object B (first and second objects B1, B2) in a state where the second member 22 and the predetermined area PA (gap G) face each other, The lower surface 24 of the second member 22 in a state where the lower surface 24 of the second member 22 and the region outside the predetermined region PA (gap G) (at least one of the upper surface of the first object B1 and the upper surface of the second object B2) face each other. The distance from the object B (first and second objects B1, B2) is different. In the present embodiment, the liquid immersion space LS2 is entirely formed on the first object B1 or the second object B2, and the liquid immersion space LS2 is formed on the gap G in the second state. The distance between the lower surface 24 of the member 22 and the upper surface of the first object B1 is different. The lower surface 24 of the second member 22 is in a state where the entire immersion space LS2 is formed on the first object B1 or the second object B2, and in a state where the immersion space LS2 is formed on the gap G. And the upper surface of the second object B2 are different.

  For example, the control device 6 sets the distance Wb between the second member 22 and the predetermined area PA (gap G) to the area outside the second member 22 and the predetermined area PA (gap G) (the upper surface and the first surface of the first object B1). It is shorter than the distance Wa from at least one of the upper surfaces of the two objects B2. That is, the control device 6 determines the distance Wb between the second member 22 and the object B (first and second objects B1, B2) in the state where the immersion space LS2 is formed on the gap G as the immersion space LS2. Is made shorter than the distance Wa between the second member 22 and the object B (first and second objects B1 and B2) in a state where all of these are formed on the first object B1 or the second object B2.

  Thereby, for example, the liquid LQ in the immersion space LS2 flows into the gap G, the liquid LQ in the immersion space LS2 flows out of the second space SP2, or the liquid LQ is in the first and second objects B1, B2. It is suppressed that it remains on top.

  When the immersion space LS2 changes from the state formed on the upper surface of the first object B1 to the state formed on the upper surface of the second object B2 through the state formed on the gap G, the immersion space LS2 Are all formed on the first object B1, the second member 22 and the first object B1 are separated by a distance Wa. In a state where the immersion space LS2 is formed on the gap G, the second member 22 and the first and second objects B1, B2 are separated by a distance Wb shorter than the distance Wa. In a state where the entire immersion space LS2 is formed on the second object B2, the second member 22 and the second object B2 are separated by a distance Wc longer than the distance Wb. In the present embodiment, the distance Wc is substantially equal to the distance Wa. The distance Wc may be different from the distance Wa. The distance Wc may be longer or shorter than the distance Wa. The control device 6 reduces the difference between the distance Wa between the lower surface 24 of the second member 22 and the upper surface of the first object B1 and the distance Wc between the lower surface 24 of the second member 22 and the upper surface of the second object B2. In addition, at least one of the second member 22, the first object B1, and the second object B2 can be moved in the Z-axis direction.

  The control device 6 may make the distance between the second member 22 and the predetermined area PA (gap G) longer than the distance between the second member 22 and the area outside the predetermined area PA (gap G). .

  A pressure sensor 50 that detects the pressure of the liquid LQ in the immersion space LS2 may be provided. The control device 6 may move at least one of the second member 22, the first object B1, and the second object B2 based on the detection result of the pressure sensor 50. The control device 6 uses the pressure of the liquid LQ in the liquid immersion space LS2 formed between the second member 22 and the first object B1, and the liquid immersion formed between the second member 22 and the second object B2. Even if at least one of the second member 22, the first object B1, and the second object B2 is moved based on the detection result of the pressure sensor 50 so that the difference from the pressure of the liquid LQ in the space LS2 becomes small. Good.

  Further, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the first object B1, and the time when the immersion space LS2 is formed on the gap G. Based on the detection result of the pressure sensor 50, at least one of the second member 22, the first object B1, and the second object B2 is moved so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small. May be.

  Further, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the second object B2, and the time when the immersion space LS2 is formed on the gap G. Based on the detection result of the pressure sensor 50, at least one of the second member 22, the first object B1, and the second object B2 is moved so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small. May be.

  Note that the control device 6 may move at least one of the second member 22, the first object B1, and the second object B2 without using the detection result of the pressure sensor 50. Note that the pressure sensor 50 may not be provided.

  The control device 6 moves at least one of the second member 22, the first object B1, and the second object B2 based on the position of the object B (first, second object B1, B2) in the XY plane. May be. For example, when the first object B1 is the substrate P and the second object B2 is the cover member T1 disposed around the substrate P, at least one of the substrate P, the cover member T1, and the gap Ga in the XY plane. Based on the position, the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on the substrate P or the cover member T1, and the time when the immersion space LS2 is formed on the gap G At least one of the second member 22, the substrate P, and the cover member T1 may be moved so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small.

  In the present embodiment, the measurement system 4 can measure the position of the substrate stage 2 in the XY plane. By measuring the position of the substrate stage 2, at least one position of the substrate P, the cover member T1, and the gap Ga in the XY plane is obtained. For example, information regarding the position of the gap Ga on the substrate stage 2 is stored in the storage device 7. For example, when the measurement system 4 is an interferometer system, the positional relationship between the measurement mirror of the substrate stage 2 irradiated with the measurement light of the interferometer system and the gap Ga on the substrate stage 2 is stored in the storage device 7. . The positional relationship is known from, for example, design values. Based on the storage information of the storage device 7 and the measurement result of the measurement system 4, the position of the gap Ga in the XY plane can be obtained. The control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed on at least one of the substrate P and the cover member T1 based on the obtained position of the gap Ga, At least one of the second member 22, the first object B1, and the second object B2 so that the difference from the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the gap Ga is reduced. Can move one.

  When the measurement system 4 includes a mark detection device that detects the alignment mark of the substrate P, the control device 6 uses the measurement result of the interferometer system that measures the position of the substrate stage 2 and the detection result of the mark detection device. Based on this, the position of the substrate P in the coordinate system defined by the interferometer system can be obtained. By obtaining the position of the substrate P, the position of the gap Ga formed around the substrate P (the position of the gap Ga in the coordinate system defined by the interferometer system) is obtained. Further, by obtaining the position of the substrate P, the position of the cover member T1 formed around the substrate P (the position of the cover member T1 in the coordinate system defined by the interferometer system) is obtained. Based on the measurement result of the interferometer system and the detection result of the mark detection device, the control device 6 uses the immersion space LS2 when the entire immersion space LS2 is formed on at least one of the substrate P and the cover member T1. The second member 22, the first object B1, and the second member 22, so that the difference between the pressure of the liquid LQ and the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the gap Ga is reduced. At least one of the second objects B2 can be moved.

  When an alignment mark is provided on an object B (first and second objects B1, B2) different from the substrate P, such as the substrate stage 2 or the measurement stage 3, the mark detection apparatus detects the object B (first object). 1, the alignment mark of the second object B1, B2) can be detected. The control device 6 aligns the measurement result of the interferometer system that measures the position of the object B (first and second objects B1 and B2) in the XY plane and the object B (first and second objects B1 and B2). Based on the detection result of the mark detection device that detects the mark, the pressure of the liquid LQ in the immersion space LS2 when the entire immersion space LS2 is formed in the object B (first and second objects B1, B2). And the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the gap G, the second member 22, the first object B1, and the second object B2 At least one can be moved.

  The second member 22 and the first and second objects B1 and B2 are arranged such that the immersion space LS2 moves from the second object B2 to the first object B1. The same applies to the case of relative movement in the XY plane substantially perpendicular to ().

  As described above, according to the present embodiment, the object B (first and second objects B1, B2) having the predetermined area PA (gap G) is the second in the state where the immersion space LS2 is formed. Since the distance in the Z-axis direction between the second member 22 and the object B (first and second objects B1, B2) is changed in at least a part of the period of movement below the member 22, the outflow of the liquid LQ Etc. are suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, the predetermined area PA is the gap G formed between the first object B1 and the second object B2. The predetermined area PA may be a gap (slit, opening, etc.) provided in one object B.

Second Embodiment
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 10 shows an example of the operation of the second member 22 according to the present embodiment. The object B having the predetermined area PA is moved below the second member 22 in the XY plane.

  In the present embodiment, the predetermined area PA includes a step (step portion) D of the object B. In the present embodiment, a step (step portion) D is provided between the first portion Bp1 and the second portion Bp2 of the object B. In the example shown in FIG. 10, the upper surface of the second portion Bp2 is arranged on the + Z side (upper side) than the upper surface of the first portion Bp1. The first part Bp1 is disposed on the −Y side of the second part Bp2.

  FIG. 10 shows that the second member 22 and the object B are substantially the optical axis (Z axis) of the last optical element 13 so that the immersion space LS2 moves from the first part Bp1 to the second part Bp2. An example of a state of relative movement in a vertical XY plane is shown.

  FIG. 10A shows a state in which the immersion space LS2 is formed on the upper surface of the first portion Bp1. FIG. 10B shows a state where the immersion space LS2 is formed on the upper surface of the second portion Bp2. In this embodiment, the liquid immersion space LS2 changes from the state formed on the upper surface of the first portion Bp1 to the state formed on the upper surface of the second portion Bp2 through the state formed on the step D. As described above, the object B moves in the −Y direction with respect to the second member 22.

  In the present embodiment, the control device 6 moves one or both of the second member 22 and the object B in the Z axis during at least a part of the period during which the immersion space LS2 moves from the first part Bp1 to the second part Bp2. Move in the direction.

  The control device 6 is configured such that the pressure of the liquid LQ in the liquid immersion space LS2 formed between the second member 22 and the first part Bp1 and the liquid immersion formed between the second member 22 and the second part Bp2. One or both of the second member 22 and the object B are moved in the Z-axis direction so that the difference from the pressure of the liquid LQ in the space LS2 becomes small. For example, when the distance Wc between the lower surface 24 of the second member 22 and the upper surface of the second portion Bp2 is shorter than the distance Wa between the lower surface 24 of the second member 22 and the upper surface of the first portion Bp1, the control device 6 The pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first part Bp1, and the liquid in the immersion space LS2 formed between the second member 22 and the second part Bp2. One or both of the second member 22 and the object B (first and second portions Bp1, Bp2) may be moved so that the difference from the LQ pressure becomes small. For example, the control device 6 has a small difference between the distance Wa between the lower surface 24 of the second member 22 and the upper surface of the first portion Bp1 and the distance Wc between the lower surface 24 of the second member 22 and the upper surface of the second portion Bp2. As described above, one or both of the second member 22 and the object B (first and second portions Bp1, Bp2) may be moved in the Z-axis direction.

  In the present embodiment, the distance Wc is substantially equal to the distance Wa. The distance Wc may be different from the distance Wa. The distance Wc may be longer or shorter than the distance Wa.

  As a result, the liquid LQ in the immersion space LS2 of the second member 22 is prevented from flowing out of the second space SP2 or the liquid LQ remaining on the object B.

  A pressure sensor 50 that detects the pressure of the liquid LQ in the immersion space LS2 may be provided. The control device 6 may move one or both of the second member 22 and the object B based on the detection result of the pressure sensor 50.

  The control device 6 is configured such that the pressure of the liquid LQ in the liquid immersion space LS2 formed between the second member 22 and the first part Bp1 and the liquid immersion formed between the second member 22 and the second part Bp2. One or both of the second member 22 and the object B may be moved based on the detection result of the pressure sensor 50 so that the difference from the pressure of the liquid LQ in the space LS2 becomes small.

  Note that the control device 6 may move one or both of the second member 22 and the object B without using the detection result of the pressure sensor 50. Note that the pressure sensor 50 may not be provided.

  Note that the control device 6 may move one or both of the second member 22 and the object B based on the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2. Based on the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2, the control device 6 determines the amount of movement of one or both of the second member 22 and the object B in the Z-axis direction. Also good.

  The difference between the height of the upper surface of the first part Bp1 and the height of the upper surface of the second part Bp2 can be detected by a so-called autofocus detection system that can detect the position of the upper surface of the substrate P, for example. Note that the predetermined detection system may detect the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2 before the exposure of the substrate P is started. The controller 6 forms liquid between the second member 22 and the first part Bp1 based on the detection result of the difference between the height of the upper surface of the first part Bp1 and the height of the upper surface of the second part Bp2. The second member 22 and the object so that the difference between the pressure of the liquid LQ in the immersion space LS2 and the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the second portion Bp2 is reduced. You may define the movement amount regarding the Z-axis direction of one or both of B.

  Further, information regarding the difference between the height of the upper surface of the first part Bp1 and the height of the upper surface of the second part Bp2 may be stored in the storage device 7. Based on the storage information of the storage device 7, the control device 6 determines the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first portion Bp1, the second member 22, and the second The amount of movement in the Z-axis direction of one or both of the second member 22 and the object B may be determined so that the difference from the pressure of the liquid LQ in the immersion space LS2 formed between the part Bp2 is small. .

  Further, the control device 6 may move one or both of the second member 22 and the object B based on the position of the object B (first and second portions Bp1, Bp2) in the XY plane. The position of the object B in the XY plane includes the position of the step portion D. The position of the object B in the XY plane can be measured by the measurement system 4.

  For example, when the object B is the substrate stage 2, the measurement system 4 can measure the position of the substrate stage 2 in the XY plane. By measuring the position of the substrate stage 2, at least one position of the first portion Bp1, the second portion Bp2, and the step portion D in the XY plane is obtained. For example, at least one position of the first portion Bp1, the second portion Bp2, and the step portion D on the substrate stage 2 is stored in the storage device 7. For example, when the measurement system 4 is an interferometer system, the storage device 7 stores the positional relationship between the measurement mirror of the substrate stage 2 irradiated with the measurement light of the interferometer system and the step portion D on the substrate stage 2. To do. The positional relationship is known from, for example, design values. Based on the storage information of the storage device 7 and the measurement result of the measurement system 4, at least one position of the first portion Bp1, the second portion Bp2, and the step portion D in the XY plane can be obtained. Further, the storage device 7 stores information related to the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2. The control device 6 determines the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the first portion Bp1 and the immersion space LS2 based on the obtained position of the stepped portion D. One or both of the second member 22 and the object B can be moved so that the difference from the pressure of the liquid LQ in the immersion space LS2 when formed on the portion Bp2 is reduced. That is, the control device 6 stores the information on the position of the stepped portion D, the storage information of the storage device 7 that stores information about the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2, and the object B ( Based on the measurement result of the measurement system 4 that measures the position of the substrate stage 2 or the like), the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first portion Bp1, and the second One or both of the second member 22 and the object B can be moved so that the difference between the pressure of the liquid LQ in the immersion space LS2 formed between the member 22 and the second portion Bp2 is reduced.

  When the measurement system 4 includes a mark detection device that detects an alignment mark provided on the object B (substrate stage 2 or the like), the control device 6 measures an interferometer that measures the position of the object B in the XY plane. Based on the measurement result of the system (or the encoder system) and the detection result of the mark detection device, the position of the object B in the coordinate system defined by the interferometer system can be obtained. By obtaining the position of the object B, the positions of the first part Bp1, the second part Bp2 and the predetermined area PA (stepped part D) of the object B (positions in the coordinate system defined by the interferometer system) are obtained. . The control device 6 stores the information on the measurement result of the interferometer system, the detection result of the mark detection device, and the difference between the height of the upper surface of the first portion Bp1 and the height of the upper surface of the second portion Bp2. Based on the stored information, the pressure of the liquid LQ in the immersion space LS2 when the immersion space LS2 is formed on the first portion Bp1, and the time when the immersion space LS2 is formed on the second portion Bp2 One or both of the second member 22 and the object B may be moved so that the difference from the pressure of the liquid LQ in the immersion space LS2 becomes small.

  The second member 22 and the object B are substantially perpendicular to the optical axis (Z axis) of the last optical element 13 so that the immersion space LS2 moves from the second part Bp2 to the first part Bp1. The same applies to the case of relative movement in the XY plane.

  As described above, according to the present embodiment, at least the period during which the object B having the predetermined area PA (stepped portion D) moves below the second member 22 in the state where the immersion space LS2 is formed. In some cases, the position of one or both of the second member 22 and the object B in the Z-axis direction is changed, so that the outflow of the liquid LQ or the like is suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, the first part Bp1 and the second part Bp2 are arranged on one object B. The first part Bp1 may be arranged on the first object B1, and the second part Bp2 may be arranged on the second object B2 adjacent to the first object B1.

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 11 is a diagram illustrating an example of the operation of the second member 22 according to the present embodiment. In the present embodiment, the predetermined area PA includes a step portion D provided between the first object B1 and the second object B2. The step portion D is provided between the first object B1 and the second object B2 adjacent to the first object B1 through the gap G.

  The control device 6 uses the pressure of the liquid LQ in the liquid immersion space LS2 formed between the second member 22 and the first object B1, and the liquid immersion formed between the second member 22 and the second object B2. You may move at least one of the 2nd member 22, 1st object B1, and 2nd object B2 so that the difference with the pressure of the liquid LQ of space LS2 may become small. For example, when the distance Wc between the lower surface 24 of the second member 22 and the upper surface of the second object B2 is shorter than the distance Wa between the lower surface 24 of the second member 22 and the upper surface of the first object B1, the control device 6 The pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the first object B1, and the liquid in the immersion space LS2 formed between the second member 22 and the second object B2. You may move at least one of the 2nd member 22, 1st object B1, and 2nd object B2 so that the difference with the pressure of LQ may become small. For example, the control device 6 has a small difference between the distance Wa between the lower surface 24 of the second member 22 and the upper surface of the first object B1, and the distance Wc between the lower surface 24 of the second member 22 and the upper surface of the second object B2. As described above, at least one of the second member 22, the first object B1, and the second object B2 may be moved in the Z-axis direction.

  In the present embodiment, the distance Wc is substantially equal to the distance Wa. The distance Wc may be different from the distance Wa. The distance Wc may be longer or shorter than the distance Wa.

  Further, the control device 6 may move at least one of the second member 22, the first object B1, and the second object B2 based on the positions of the first and second objects B1 and B2 in the XY plane. Good. The position of the object B in the XY plane includes the position of the step portion D (gap portion G). The positions of the first and second objects B1 and B2 in the XY plane can be measured by the measurement system 4. For example, when the first object B1 is the substrate P and the second object B2 is the cover member T1 disposed around the substrate P, by measuring the position of the substrate stage 2 in the XY plane, The position of the step portion D (gap portion G) in the XY plane is obtained. For example, the storage device 7 stores the position of the stepped portion D (gap portion G) on the substrate stage 2, and based on the measurement result of the measurement system 4 that measured the position of the substrate stage 2, it is in the XY plane. The position of the step portion D (gap portion G) is obtained. Further, the storage device 7 can store information relating to the difference between the height of the upper surface of the substrate P and the height of the upper surface of the cover member T1 disposed around the upper surface of the substrate P. In the present embodiment, the height of the upper surface of the cover member T1 (the height of the upper surface of the substrate stage 2) does not substantially change. Therefore, by acquiring information related to the thickness of the substrate P, information related to the difference between the height of the upper surface of the substrate P and the height of the upper surface of the cover member T1 (the upper surface of the substrate stage 2) is obtained. The control device 6 stores information on the position of the stepped portion D (gap portion G) and the difference between the height of the upper surface of the first object B1 (substrate P) and the height of the upper surface of the second object B2 (cover member T1). On the basis of the storage information of the storage device 7 and the measurement result of the measurement system 4 that measures the positions of the first and second objects B1 and B2 (substrate stage 2) in the XY plane. The difference between the pressure of the liquid LQ in the immersion space LS2 formed between the object B1 and the pressure of the liquid LQ in the immersion space LS2 formed between the second member 22 and the second object B2 is small. As such, at least one of the second member 22, the first object B1, and the second object B2 may be moved.

  The contents of the first embodiment, the second embodiment, and the third embodiment described above can be combined as appropriate.

<Fourth embodiment>
Next, a fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 12 shows an example of the operation of the second member 22 according to this embodiment. The object B having the predetermined area PA is moved below the second member 22 in the XY plane.

  In the present embodiment, the predetermined area PA includes a lyophilic area SA that is more lyophilic with respect to the liquid LQ than the area outside the predetermined area PA. In the object B, the area outside the predetermined area PA includes a liquid repellent area HA that is liquid repellent with respect to the liquid LQ. The contact angle of the lyophilic area SA with the liquid LQ is larger than 90 degrees. The contact angle of the lyophilic area SA with the liquid LQ may be 100 degrees or more, or 110 degrees or more. The contact angle of the liquid repellent area HA with respect to the liquid LQ is smaller than 90 degrees. The contact angle of the liquid repellent area HA with the liquid LQ may be 80 degrees or less, or 70 degrees or less.

  FIG. 12 shows that the second member 22 and the object B are substantially aligned with the optical axis (Z axis) of the last optical element 13 so that the immersion space LS2 moves from the liquid repellent area HA to the lyophilic area SA. An example of a state of relative movement in a vertical XY plane is shown.

  FIG. 12A shows a state in which the immersion space LS2 is formed on the upper surface of the liquid repellent area HA. FIG. 12B shows a state in which the immersion space LS2 is formed on the upper surface of the lyophilic area SA. In the present embodiment, the immersion space LS2 is formed on the upper surface of the lyophilic region SA from the state where the immersion space LS2 is formed on the upper surface of the lyophobic region HA through the boundary between the lyophobic region HA and the lyophilic region SA. The object B moves in the −Y direction with respect to the second member 22 so as to change to the state.

  In the present embodiment, the control device 6 moves one or both of the second member 22 and the object B in the Z axis during at least a part of the period during which the immersion space LS2 moves from the liquid repellent area HA to the lyophilic area SA. The distance W between the lower surface 24 of the second member 22 and the upper surface of the object B is changed by moving in the direction.

  For example, the control device 6 determines the distance We between the lower surface 24 of the second member 22 and the upper surface of the object B in the state where the second member 22 and the predetermined area PA (lyophilic area SA) face each other. The distance Wd is smaller than the distance Wd between the lower surface 24 of the second member 22 and the upper surface of the object B in a state where the region (liquid repellent region HA) outside the predetermined region PA (lyophilic region SA) faces.

  As a result, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  The control device 6 determines the distance We between the lower surface 24 of the second member 22 and the upper surface of the object B in the state where the second member 22 and the predetermined area PA (lyophilic area SA) face each other. The distance Wd between the lower surface 24 of the second member 22 and the upper surface of the object B in a state where the region outside the predetermined region PA (lyophilic region SA) faces may be larger.

  The control device 6 may move one or both of the second member 22 and the object B using the detection result of the pressure sensor 50, or the second member without using the detection result of the pressure sensor 50. One or both of the object 22 and the object B may be moved. Note that the pressure sensor 50 may not be provided.

  The second member 22 and the object B are substantially perpendicular to the optical axis (Z axis) of the last optical element 13 so that the immersion space LS2 moves from the lyophilic area SA to the liquid repellent area HA. The same applies to the case of relative movement in the XY plane.

  As described above, according to the present embodiment, the period during which the object B having the predetermined area PA (lyophilic area SA) moves below the second member 22 in the state where the immersion space LS2 is formed. Since at least a part of the distance between the lower surface 24 of the second member 22 and the upper surface of the object B is changed, the outflow of the liquid LQ and the like are suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  The contents of the first embodiment, the second embodiment, the third embodiment, and the fourth embodiment described above can be combined as appropriate.

<Fifth Embodiment>
Next, a fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 13 shows an example of the operation of the second member 22 according to this embodiment. The object B is moved in the XY plane below the second member 22.

  In the present embodiment, the control device 6 changes the distance W between the lower surface 24 of the second member 22 and the upper surface of the object B based on the moving condition of the object B.

  In the present embodiment, the movement condition includes the speed of the object B.

  FIG. 13A shows a state where the object B moves at the first speed V1 in a state where the immersion space LS2 is formed. In a state where the object B moves at the first speed V1, the lower surface 24 of the second member 22 and the upper surface of the object B are adjusted to the distance Wf.

  FIG. 13B shows a state in which the object B moves at a second speed V2 higher than the first speed V1 in a state where the immersion space LS2 is formed. In the state where the object B moves at the second speed V2, the lower surface 24 of the second member 22 and the upper surface of the object B are adjusted to Wg shorter than the distance Wf.

  As a result, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  In the state where the immersion space LS2 is formed and the object B moves at the first speed V1, the lower surface 24 of the second member 22 and the upper surface of the object B are adjusted to the distance Wg, and the immersion space In a state where LS2 is formed and the object B moves at a second speed V2 higher than the first speed V1, the distance Wf between the lower surface 24 of the second member 22 and the upper surface of the object B is longer than the distance Wg. May be adjusted.

  In the present embodiment, the movement condition may include the acceleration of the object B.

  In a state where the immersion space LS2 is formed and the object B moves at the first acceleration Ac1, the lower surface 24 of the second member 22 and the upper surface of the object B are adjusted to the distance Wf, and the object B is In the state of moving at the second acceleration Ac2 higher than the acceleration Ac1, the lower surface 24 of the second member 22 and the upper surface of the object B may be adjusted to a distance Wg shorter than the distance Wf.

  In a state where the immersion space LS2 is formed and the object B moves at the first acceleration Ac1, the lower surface 24 of the second member 22 and the upper surface of the object B are adjusted to the distance Wg, and the object B is In a state of moving at the second acceleration Ac2 higher than the acceleration Ac1, the lower surface 24 of the second member 22 and the upper surface of the object B may be adjusted to a distance Wf longer than the distance Wg.

  As a result, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  The contents of the first embodiment, the second embodiment, the third embodiment, the fourth embodiment, and the fifth embodiment described above can be combined as appropriate.

<Sixth Embodiment>
Next, a sixth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 14 shows an example of the operation of the second member 22 according to this embodiment. The object B is moved in the XY plane below the second member 22.

  In the present embodiment, the control device 6 changes the distance W between the lower surface 24 of the second member 22 and the upper surface of the object B based on the moving condition of the object B.

  In the present embodiment, the movement condition includes a movement locus of the object B in the XY plane.

  For example, in FIG. 14, when the object B moves relative to the second member 22 so as to move relatively along the movement locus indicated by the arrow Sb, the control device 6 changes the movement locus Sb of the object B to the movement locus Sb. Based on this, one or both of the second member 22 and the object B are moved to change the distance W between the lower surface 24 of the second member 22 and the upper surface of the object B.

  For example, when the movement locus Sb includes the first movement locus Sb1 and the second movement locus Sb2 in which the liquid LQ is likely to flow out of the second space SP2 due to the movement of the object B, the control device 6 The distance Wj between the lower surface 24 of the second member 22 and the upper surface of the object B in the movement locus Sb2 is made shorter than the distance Wh between the lower surface 24 of the second member 22 and the upper surface of the object B in the first movement locus Sb1.

  The first movement locus Sb1 is, for example, a straight movement locus. The second movement locus Sb2 is a movement locus including a curve, for example. For example, when the object B changes its traveling direction in the XY plane, there is a high possibility that the liquid LQ will flow out from the second space SP2.

  For example, in the exposure of the substrate P, the first movement locus Sb1 is the movement locus of the substrate stage 2 when the scan movement operation is performed. The second movement locus Sb2 is a movement locus when the step movement operation is performed.

  Also in the present embodiment, the liquid LQ in the immersion space LS2 is prevented from flowing out of the second space SP2 and the liquid LQ remaining on the object B.

  The distance between the lower surface 24 of the second member 22 and the upper surface of the object B in the second movement locus Sb2 is longer than the distance between the lower surface 24 of the second member 22 and the upper surface of the object B in the first movement locus Sb1. Also good.

<Seventh embodiment>
Next, a seventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  15 and 16 show an example of the operation of the second member 22 according to the present embodiment. Under the second member 22, the object B (first and second objects B1, B2) is moved in the XY plane. In the state where the immersion space LS2 is formed, the object B (first and second objects B1, B2) moves at a constant speed in the XY plane below the second member 22. Further, the object B (first and second objects B1, B2) moves at a non-constant speed in the XY plane below the second member 22.

  The non-constant speed movement includes a state in which the object B moves so as to accelerate. The non-constant speed movement includes a state in which the object B moves so as to decelerate. The non-constant speed movement includes a state in which the object B moves so as to decelerate after being accelerated. The non-constant speed movement includes a state in which the object B moves so as to accelerate after decelerating. Non-constant speed movement includes a state in which the object B moves while repeating acceleration and deceleration.

  FIG. 15 shows an example of a state in which the object B (first and second objects B1, B2) moves at a constant speed in the -Y direction. FIG. 16 shows an example of a state in which the object B (first and second objects B1, B2) moves at a non-constant speed in the −Y direction. In FIG.15 and FIG.16, the level | step-difference part D is provided between 1st object B1 and 2nd object B2. For example, the upper surface of the first object B1 is the upper surface of the substrate P held by the first holding unit 14, and the upper surface of the second object B2 is the upper surface of the cover member T1 disposed around the upper surface of the substrate P (substrate stage). 2 may be provided between the substrate P and the cover member T1.

  FIG. 15A shows a state in which the immersion space LS2 is formed on the first object B1. FIG. 15B shows a state in which the immersion space LS2 is formed on the second object B2. The second member so that the difference between the distance W1 between the lower surface 24 of the second member 22 and the upper surface of the first object B1 and the distance W2 between the lower surface 24 of the second member 22 and the upper surface of the second object B2 is reduced. 22 moves in the Z-axis direction. The second member 22 moves from the state shown in FIG. 15A by the first movement amount U1 in the + Z direction and changes to the state shown in FIG. 15B.

  FIG. 16A shows a state in which the immersion space LS2 is formed on the first object B1. FIG. 16B shows a state in which the immersion space LS2 is formed on the second object B2. The second member so that the difference between the distance W1 between the lower surface 24 of the second member 22 and the upper surface of the first object B1 and the distance W3 between the lower surface 24 of the second member 22 and the upper surface of the second object B2 is reduced. 22 moves in the Z-axis direction. The second member 22 moves from the state shown in FIG. 16A by the second movement amount U2 in the + Z direction and changes to the state shown in FIG.

  In the present embodiment, the first movement amount U1 and the second movement amount U2 are different. That is, in the present embodiment, the control device 6 changes the amount of movement of the second member 22 in the Z-axis direction between a period during which the object B moves at a constant speed and a period during which the object B moves at a non-constant speed.

  In the present embodiment, the first movement amount U1 of the second member 22 during the period in which the object B moves at a constant speed is smaller than the second movement amount U2 of the second member 22 in a period in which the object B moves at a non-constant speed.

  For example, in the exposure of the substrate P, the constant speed movement operation of the object B is the scan movement operation of the substrate P (substrate stage 2). The non-constant speed moving operation of the object B is a step moving operation of the substrate P (substrate stage 2). That is, the period during which the object B moves at a constant speed is an exposure period during which the shot area S of the substrate P is exposed. The period during which the object B moves at a non-constant speed is a non-exposure period until the exposure of the shot area S to be exposed next starts after the exposure of the shot area S on the substrate P ends. In the exposure period, the object B is moved at a constant speed (scanning movement). In the non-exposure period, the object B is moved at a non-constant speed (step movement).

  In the present embodiment, in the exposure of the substrate P, the control device 6 determines the movement amount of the second member 22 in the Z-axis direction based on the exposure period (period in which the scan movement operation is performed) and the non-exposure period (step movement operation is performed). And the period during which it is performed.

  In the present embodiment, the first movement amount U1 of the second member 22 during the period during which the object B moves at a constant speed (exposure period) is equal to the first movement amount U1 of the second member 22 during the period during which the object B moves at a non-constant speed (non-exposure period). It is smaller than the second movement amount U2.

  The control device 6 may make the position of the second member 22 in the Z-axis direction constant during the period during which the object B moves at a constant speed (exposure period). Note that the position of the second member 22 in the Z-axis direction may not be constant during the period in which the object B moves at a constant speed (exposure period). The control device 6 may change the position of the second member 22 in the Z-axis direction from the first position to the second position higher than the first position in the period during which the object B moves at a non-constant speed (non-exposure period). Good. Further, the control device 6 changes the position of the second member 22 in the Z-axis direction from the first position to a third position lower than the first position during the period in which the object B moves at a non-constant speed (non-exposure period). May be.

  As the movement amount of the second member 22 increases, for example, vibration may occur. According to the present embodiment, during the period during which the object B moves at a constant speed (exposure period), the amount of movement of the second member 22 in the Z-axis direction is small, so that the occurrence of vibration is suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  Further, during the period in which the object B moves at a non-constant speed (non-exposure period), the distance between the lower surface 24 of the second member 22 and the upper surface of the object B can be set to a desired distance.

  Note that the control device 6 determines the amount of movement of the second member 22 in the Z-axis direction during the period during which the object B moves at constant speed (exposure period) as the second amount during the period during which the object B moves at non-constant speed (non-exposure period). The amount of movement of the member 22 in the Z-axis direction may be larger.

  The moving speed of the second member 22 in the Z-axis direction during the period during which the object B moves at a constant speed (exposure period) and the Z axis of the second member 22 during the period during which the object B moves at a non-constant speed (non-exposure period). The moving speed with respect to the direction may be different. The control device 6 determines the moving speed in the Z-axis direction of the second member 22 during the period in which the object B moves at a constant speed (exposure period), and the second member 22 in the period in which the object B moves at a non-constant speed (non-exposure period). The moving speed in the Z-axis direction may be lower. Note that the control device 6 sets the moving speed of the second member 22 in the Z-axis direction during the period during which the object B moves at a constant speed (exposure period) to the second speed during the period during which the object B moves at a non-constant speed (non-exposure period). The moving speed of the member 22 in the Z-axis direction may be higher.

  The acceleration in the Z-axis direction of the second member 22 during the period during which the object B moves at a constant speed (exposure period) and the Z-axis direction of the second member 22 during the period during which the object B moves at a non-constant speed (non-exposure period). Acceleration may be different. The control device 6 determines the acceleration of the second member 22 in the Z-axis direction during the period during which the object B moves at a constant speed (exposure period), and the acceleration of the second member 22 during the period during which the object B moves at a non-constant speed (non-exposure period). You may make it lower than the acceleration regarding a Z-axis direction. Note that the control device 6 uses the second member 22 acceleration during the period in which the object B moves at a constant speed (exposure period) as the second member 22 in the period in which the object B moves at a non-constant speed (non-exposure period). You may make it higher than the acceleration regarding 22 Z-axis directions.

<Eighth Embodiment>
Next, an eighth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 17 shows an example of the operation of the object B (first and second objects B1, B2) according to the present embodiment. In the state where the immersion space LS2 is formed, the object B having the predetermined area PA moves in the XY plane below the second member 22. In the example illustrated in FIG. 17, the object B includes a first object B1 and a second object B2 that is adjacent to the first object B1 through the gap G. The predetermined area PA includes a gap G.

  In the present embodiment, the control device 6 performs the first and second operations in the XY plane in at least part of the period during which the object B (the first and second objects B1 and B2) having the predetermined area PA (gap G) moves. The moving conditions of the second objects B1 and B2 are changed.

  In the control device 6, the liquid immersion space LS2 is entirely formed on the first object B1 or the second object B2, and the liquid immersion space LS2 is formed on the predetermined area PA (gap G). The moving conditions of the first and second objects B1 and B2 are changed.

  FIG. 17 shows an example in which the first and second objects B1 and B2 move in the −Y direction with respect to the second member 22 so that the immersion space LS2 moves from the first object B1 to the second object B2. Indicates. FIG. 17A shows a state where the entire immersion space LS2 is formed on the first object B1. FIG. 17B shows a state in which the immersion space G is formed on the predetermined area PA (gap G). In the present embodiment, a state in which the entire immersion space LS2 is formed on the first object B1 (or the second object B2) and a second state in which the immersion space LS2 is formed on the gap G. The movement conditions of the object B (first and second objects B1, B2) in the XY plane are different.

  The moving condition of the object B includes the moving speed of the object B in the XY plane. In the present embodiment, the control device 6 is configured so that the immersion space LS2 is positioned on the area outside the predetermined area PA (gap G) (the upper surface of the first object B1 or the upper surface of the second object B2). B (first and second objects B1 and B2) is moved at a velocity Va, and the object B (first and second objects B1 and B2) is in a state where the immersion space LS2 is positioned on the predetermined area PA (gap G). ) At a speed Vb lower than the speed Va. That is, in the state where the immersion space LS2 is formed on the predetermined area PA (gap G), the moving speed Vb of the object B is that the entire immersion space LS2 is on the first object B1 (or on the second object B2). It is lower than the moving speed Va of the object B in the state where it is formed.

  The moving condition of the object B may include the acceleration of the object B in the XY plane. In the state in which the immersion space LS2 is located on the region outside the predetermined region PA (gap G) (the upper surface of the first object B1 or the upper surface of the second object B2), the control device 6 2 objects B1 and B2) are moved at the acceleration Ca, and the object B (first and second objects B1 and B2) is moved more than the acceleration Ca in the state where the immersion space LS2 is positioned on the predetermined area PA (gap G). You may move with a low acceleration Cb. That is, the acceleration Cb of the object B in a state where the immersion space LS2 is formed on the predetermined area PA (gap G) is such that the entire immersion space LS2 is on the first object B1 (or on the second object B2). It may be lower than the acceleration Ca of the object B in the formed state.

  Thereby, for example, the liquid LQ in the immersion space LS2 flows into the gap G, the liquid LQ in the immersion space LS2 flows out of the second space SP2, or the liquid LQ is in the first and second objects B1, B2. It is suppressed that it remains on top.

  The moving speed of the object B in a state where the immersion space LS2 is formed on the predetermined area PA (gap G) is such that the entire immersion space LS2 is on the first object B1 (or on the second object B2). It may be higher than the moving speed of the object B in the formed state.

  The acceleration of the object B in a state where the immersion space LS2 is formed on the predetermined area PA (gap G) is formed so that the entire immersion space LS2 is formed on the first object B1 (or on the second object B2). It may be higher than the acceleration of the object B in the state where it is applied.

  As shown in FIG. 18, the predetermined area PA may be a lyophilic area SA that is more lyophilic with respect to the liquid LQ than the area outside the predetermined area PA.

  As shown in FIG. 19, the predetermined area PA may include a stepped portion D of the object B.

  Information on the area PA of the object B where residual liquid is generated on the object B when the second member 22 and the object B move under the first relative movement condition in the state where the immersion space LS2 is formed, and the residual Information related to the region PB of the object B where generation of liquid is suppressed may be stored in the storage device 7. The area PA includes a gap G that the object B has. Further, the area PA includes a step portion D included in the object B. The area PA includes a lyophilic area SA that the object B has.

  Based on the stored information in the storage device 7, the control device 6 sets the second member 22 and the object B as the first relative movement condition in at least a part of the period during which the area PA passes below the second member 22. May be moved under different second relative movement conditions.

  The first movement condition includes a condition for moving the object B at the speed Va. The second movement condition includes a condition in which the object B moves at a speed Vb that is lower than the speed Va.

  That is, when it is determined that the residual liquid is generated when the area PA passes below the second member 22 at the speed Va based on the storage information of the storage device 7, the control device 6 determines that the speed Va The object B is moved at a lower speed Vb. As a result, the occurrence of residual liquid on the object B is suppressed.

  The same applies to the immersion space LS1. That is, in the state where the immersion space LS1 is formed, information on the area PA of the object B where the residual liquid is generated on the object B when the first member 21 and the object B move under the first relative movement condition; Further, the storage device 7 may store information related to the region PB of the object B in which the generation of the residual liquid is suppressed. Based on the stored information in the storage device 7, the control device 6 sets the first member 21 and the object B to the first relative movement condition in at least part of the period during which the area PA passes below the first member 21. May be moved under different second relative movement conditions.

  Information on the first relative movement condition between the second member 22 where the residual liquid is generated on the object B and the object B, and the second relative movement condition between the second member 22 where the generation of the residual liquid is suppressed. Information may be stored in the storage device 7. Based on the storage information of the storage device 7, the control device 6 determines the lower surface 24 of the second member 22 and the object during at least a part of the period during which the second member 22 and the object B are moved under the first relative movement condition. One or both of the second member 22 and the object B may be moved so that the distance W from the upper surface of B becomes shorter.

  The same applies to the first member 21. That is, information on the first relative movement condition between the first member 21 where the residual liquid is generated on the object B and the object B and the second relative movement between the first member 21 and the object B where the generation of the residual liquid is suppressed. Information related to conditions may be stored in the storage device 7. Based on the storage information of the storage device 7, the control device 6 determines the lower surface 23 of the first member 21 and the object during at least a part of the period during which the first member 21 and the object B are moved under the first relative movement condition. One or both of the first member 21 and the object B may be moved so that the distance from the upper surface of B becomes shorter.

  Information on the area PA of the object B where residual liquid is generated on the object B when the second member 22 and the object B move under the first relative movement condition in the state where the immersion space LS2 is formed, and the residual Information related to the region PB of the object B where generation of liquid is suppressed may be stored in the storage device 7. Based on the storage information of the storage device 7, the control device 6 has a short distance between the lower surface 24 of the second member 22 and the region PA in at least a part of the period during which the region PA passes below the second member 22. As such, one or both of the second member 22 and the object B may be moved.

  The same applies to the first member 21. That is, in the state where the immersion space LS1 is formed, information on the area PA of the object B where the residual liquid is generated on the object B when the first member 21 and the object B move under the first relative movement condition; Further, the storage device 7 may store information related to the region PB of the object B in which the generation of the residual liquid is suppressed. Based on the storage information of the storage device 7, the control device 6 has a short distance between the lower surface 23 of the first member 21 and the region PA in at least a part of the period during which the region PA passes below the first member 21. As such, one or both of the first member 21 and the object B may be moved.

  It should be noted that the residual liquid is generated on the substrate P (object) outside the first space SP1, or the relative movement condition between the first member 21 and the substrate P (object) from which the liquid LQ flows out of the first space SP1, and the residual Information relating to the relative movement conditions in which the generation of liquid or the outflow of liquid LQ is suppressed may be stored in the storage device 7. The control device 6 may adjust the relative movement condition between the first member 21 and the substrate P (object) in the exposure of the substrate P based on the stored information in the storage device 7. When the first member 21 is movable by the driving device, the control device 6 controls one or both of the driving device and the driving system 10 to set the relative movement condition between the first member 21 and the substrate P (object). Can be adjusted. When the 1st member 21 does not move substantially, the control apparatus 6 can control the drive system 10, and can adjust the movement conditions of the board | substrate P (object) with respect to the 1st member 21. FIG.

  Note that, after the exposure of the substrate P, the liquid remaining on the substrate P (object) outside the first space SP1 or the liquid LQ flowing out from the first space SP1 may be detected by a detection device. The detection apparatus is capable of acquiring an optical image (image) of the liquid remaining on the substrate P (object) outside the first space SP1 or the liquid LQ flowing out of the first space SP1 from above the substrate P (object). It may be a device (camera). Based on the detection result of the detection device, the storage information of the storage device 7 may be updated.

  Similarly, a relative movement condition between the second member 22 where the residual liquid is generated on the substrate P (object) outside the second space SP2 or the liquid LQ flows out of the second space SP2 and the substrate P (object); Information related to the relative movement condition in which the generation of the residual liquid or the outflow of the liquid LQ is suppressed may be stored in the storage device 7. The control device 6 may adjust the relative movement condition between the second member 22 and the substrate P (object) in the exposure of the substrate P based on the stored information in the storage device 7. When the second member 22 is movable by the drive device, the control device 6 controls one or both of the drive device and the drive system 10 to set the relative movement condition between the second member 22 and the substrate P (object). Can be adjusted. When the second member 22 does not substantially move, the control device 6 can control the drive system 10 to adjust the movement condition of the substrate P (object) with respect to the second member 22.

  Note that after the exposure of the substrate P, the liquid remaining on the substrate P (object) outside the second space SP2 or the liquid LQ flowing out from the second space SP2 may be detected by a detection device. The detection device is capable of acquiring an optical image (image) of the liquid remaining on the substrate P (object) outside the second space SP2 or the liquid LQ flowing out from the second space SP2 from above the substrate P (object). It may be a device (camera). Based on the detection result of the detection device, the storage information of the storage device 7 may be updated.

  The above-mentioned relative movement condition is a concept including one or both of the relative movement speed and acceleration between the first member 21 (second member 22) and the substrate P (object). The relative movement condition includes a relative movement distance in one direction within the XY plane. The relative movement condition includes a relative movement locus between the first member 21 (second member 22) and the substrate P (object). When the plurality of shot areas S of the substrate P are sequentially exposed while the substrate P is repeatedly moved in the scan direction and in the step direction intersecting the scan direction, the above-described relative movement condition is as follows: The concept may include a combined speed of the moving speed in the direction and the moving speed in the step direction.

  In addition, this embodiment and the above-mentioned 1st-7th embodiment can be combined suitably. For example, by moving one or both of the second member 22 and the object B in the Z-axis direction and changing the distance in the Z-axis direction between the second member 22 and the object B, the moving condition of the object B in the XY plane is changed. You may change it.

<Ninth Embodiment>
Next, a ninth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 20 shows an example of the operation of the second member 22 and the object B according to the present embodiment. In the present embodiment, the control device 6 relatively moves the second member 22 and the object B in the XY plane so that the liquid LQd on the object B outside the second space SP2 passes through the immersion space LS2. To do. The control device 6 causes the second member 22 and the object B to move relative to each other in the XY plane so that a part of the liquid LQ in the immersion space LS2 does not separate from the immersion space LS2 and protrudes outside the second space SP2. Moving. The control device 6 can move the object B in the XY plane by controlling the drive system 10. Further, the control device 6 can move the second member 22 in the XY plane by controlling the driving device 60.

  Thereby, even if the liquid LQd does not move to the second space SP2, the liquid LQd is captured in the immersion space LS2. The liquid LQd captured in the immersion space LS2 is recovered from the recovery port 42 of the second member 22 together with the liquid LQ in the immersion space LS2. Accordingly, the liquid LQd is suppressed from remaining on the object B.

  Further, the control device 6 can control the timing at which the liquid LQ flows out of the second space SP2 by controlling the moving condition of the object B. The moving condition of the object B includes the moving speed of the object B in the XY plane. The moving condition of the object B may include the acceleration of the object B in the XY plane. Note that the control device 6 may control the moving condition of the second member 22 to control the timing at which the liquid LQ flows out of the second space SP2. The moving condition of the second member 22 includes the moving speed of the second member 22 in the XY plane. The moving condition of the second member 22 may include the acceleration of the second member 22 in the XY plane.

  The same applies to the first member 21. That is, the control device 6 may move the first member 21 and the object B relative to each other in the XY plane so that the liquid LQd on the object B outside the first space SP1 passes through the immersion space LS1. Good. The control device 6 makes the first member 21 and the object B relative to each other in the XY plane so that a part of the liquid LQ in the immersion space LS1 does not separate from the immersion space LS1 and protrudes outside the first space SP1. You may move. Thereby, even if the liquid LQd does not move to the first space SP1, the liquid LQd is captured in the immersion space LS1. The liquid LQd captured in the immersion space LS1 is recovered from the recovery port 32 of the first member 21 together with the liquid LQ in the immersion space LS1.

  Further, as shown in FIG. 21, the control device 6 moves the first member 21 in the direction opposite to the moving direction of the object B in the XY plane, thereby determining the position where the liquid LQ flows out from the first space SP1. Can be controlled.

  In addition, when the object B is moved in the + Y direction after the object B is moved in the −Y direction, for example, the period when the first member 21 changes from the movement in the −Y direction to the movement in the + Y direction. The position where the liquid LQ flows out of the first space SP1 can be controlled by moving in at least a part of the first space SP1.

  By controlling the position where the liquid LQ flows out from the first space SP1, the liquid LQ that flows out can be captured in the immersion space LS2. As shown in FIG. 22, the second member 22 (immersion space LS2) may move to a position where the liquid LQ flows out from the first space SP1.

<Tenth Embodiment>
Next, a tenth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 23 shows an example of a state in which the substrate P and the cover member T1 move in the XY plane with respect to the second member 22 so that the immersion space LS2 moves from one to the other on the substrate P and the cover member T1. Indicates. FIG. 23A shows a state in which the substrate P and the cover member T1 move in the −Y direction so that the immersion space LS2 moves from the cover member T1 to the substrate P. FIG. 23B shows a state where the substrate P and the cover member T1 move in the + Y direction so that the immersion space LS2 moves from above the substrate P onto the cover member T1.

  In the present embodiment, the moving speed Vt when the substrate P and the cover member T1 move so that the immersion space LS2 moves from the cover member T1 to the substrate P is such that the immersion space LS2 moves from the substrate P to the cover member. It is lower than the moving speed Vp when the substrate P and the cover member T1 move so as to move on T1.

  According to the present embodiment, the liquid LQ in the immersion space LS2 flows into the gap Ga, the liquid LQ in the immersion space LS2 flows out of the second space SP2, or the liquid LQ is on the substrate P and the cover member. Remaining on T1 is suppressed.

<Eleventh embodiment>
Next, an eleventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 24 schematically illustrates an example of the lower surface 241 of the second member 22. The substrate P and the cover member T1 move in the XY plane with respect to the second member 22 so that the immersion space LS2 moves from one to the other on the substrate P and the cover member T1.

  In the present embodiment, the lower surface 241 includes a first side Ha, a second side Hb, and a corner Hk provided between the first side Ha and the second side Hb.

  The center 241C of the lower surface 241 and the corner portion Hk are connected in at least a part of the period in which the substrate P and the cover member T1 move so that the immersion space LS2 moves from one side to the other on the substrate P and the cover member T1. The position of the second member 22 is adjusted so that the virtual line is substantially parallel to the radial direction with respect to the center PC of the substrate P. Accordingly, when the substrate P and the cover member T1 move in the XY plane with respect to the second member 22 so that the immersion space LS2 moves from one to the other on the substrate P and the cover member T1, the liquid The LQ is prevented from flowing out or remaining.

  The same applies to the first member 21. That is, when the lower surface of the first member 21 has a first side, a second side, and a corner provided between the first side and the second side, the immersion space LS1 is on the substrate P and the cover. An imaginary line connecting the center and the corner of the lower surface of the first member 21 is at the center of the substrate P during at least a part of the period in which the substrate P and the cover member T1 move so as to move from one to the other on the member T1. By adjusting the position of the first member 21 so as to be substantially parallel to the radial direction of the liquid, the outflow, the remaining, and the like of the liquid LQ are suppressed.

  The operation of the second member 22 and the object B in each of the above-described embodiments and the operation of changing one or both of the supply amount of the liquid LQ from the supply port 41 of the second member 22 and the suction force of the recovery port 42 are performed. Can be combined. For example, in the state where the immersion space LS2 is formed, the control device 6 performs the first operation at least during a period in which the object B (first and second objects B1, B2) moves below the second member 22. While changing the distance between the two members 22 and the object B, one or both of the supply amount of the liquid LQ from the supply port 41 of the second member 22 and the suction force of the recovery port 42 may be changed.

  Further, the distance W between the second member 22 and the object B in the Z-axis direction may be adjusted based on one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42. For example, when the supply amount of the liquid LQ from the supply port 41 is large, the distance W may be adjusted to be short. When the supply amount of the liquid LQ from the supply port 41 is large, the distance W may be adjusted to be long. When the supply amount of the liquid LQ from the supply port 41 is small, the distance W may be adjusted to be short. When the supply amount of the liquid LQ from the supply port 41 is small, the distance W may be adjusted to be long. In addition, when the suction | attraction force of the collection port 42 is strong, you may adjust so that the distance W may become short. When the suction force of the collection port 42 is strong, the distance W may be adjusted to be long. When the suction force of the collection port 42 is weak, the distance W may be adjusted to be short. When the suction force of the recovery port 42 is weak, the distance W may be adjusted to be long.

  Further, the moving condition of the object B in the XY plane may be adjusted based on one or both of the supply amount of the liquid LQ from the supply port 41 and the suction force of the recovery port 42. For example, when the supply amount of the liquid LQ from the supply port 41 is large, the moving speed of the object B may be increased or decreased. When the supply amount of the liquid LQ from the supply port 41 is small, the moving speed of the object B may be increased or decreased. When the supply amount of the liquid LQ from the supply port 41 is large, the acceleration of the object B may be increased or decreased. When the supply amount of the liquid LQ from the supply port 41 is small, the acceleration of the object B may be increased or decreased. Note that when the suction force of the collection port 42 is strong, the moving speed of the object B may be increased or decreased. When the suction force of the collection port 42 is weak, the moving speed of the object B may be increased or decreased. When the suction force of the collection port 42 is strong, the acceleration of the object B may be increased or decreased. When the suction force of the collection port 42 is weak, the acceleration of the object B may be increased or decreased.

  In each of the above-described embodiments, the liquid LQ for forming the immersion space LS1 and the liquid LQ for forming the immersion space LS2 may be the same type (physical properties) or different types (physical properties). But you can.

  In the present embodiment, the liquid LQ for forming the immersion space LS1 and the liquid LQ for forming the immersion space LS2 may have the same or different cleanliness.

  As described above, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, a liquid that exposes the substrate with the exposure light to the control device 6 through the first liquid filled in the optical path of the exposure light between the emission surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the immersion exposure apparatus is recorded.

  The program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member according to the above-described embodiment. Forming a first liquid immersion space of one liquid and a second member disposed outside the first member with respect to the optical path, away from the first liquid immersion space, and a second liquid immersion space of the second liquid And at least part of a period in which an object having a predetermined region moves below the second member in a direction intersecting the optical axis of the optical member in a state where the second immersion space is formed, Changing the distance between the lower surface of the second member and the upper surface of the object may be executed.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. The movement of the object in at least part of the period in which the object moves in the direction intersecting the optical axis of the optical member below the second member in the state in which the immersion space is formed and the second immersion space is formed. The distance between the lower surface of the second member and the upper surface of the object may be changed based on the condition.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. Forming the immersion space; and moving the second member and the first member so that the second immersion space moves from one to the other on the first object and on the second object adjacent to the first object via the gap. A relative movement of the second object in a predetermined plane substantially perpendicular to the optical axis of the optical member, and a period in which the second immersion space moves from one to the other on the first object and the second object. At least in part, the lower surface of the second member and the first object in a direction substantially parallel to the optical axis Distance between the upper surface of, and the lower surface of the second member and changing one or both of the distance between the upper surface of the second object may be allowed to run.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. In the state where the immersion space is formed and the second immersion space is formed, the object moves at a constant speed in the direction of crossing the optical axis of the optical member below the second member and at a non-constant speed. The period may change one or both of the movement amount of the second member and the movement amount of the object in a direction substantially parallel to the optical axis of the optical member.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. Forming an immersion space, sequentially exposing a plurality of shot regions of the substrate with exposure light through the first liquid in the first immersion space in a state where the second immersion space is formed, One or both of the movement amount of the second member and the movement amount of the object in a direction substantially parallel to the optical axis of the material is defined as an exposure period in which exposure of the first shot area is performed among the plurality of shot areas, After the exposure of the shot area, the exposure of the second shot area to be exposed next There a changing in the non-exposure period until the start, may be executed.

  In addition, the program recorded in the storage device 7 is a first member arranged in at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical member in the control device 6 according to the above-described embodiment. Forming a first immersion space for the first liquid, and a second member disposed outside the first member with respect to the optical path, and away from the first immersion space to separate the second liquid of the second liquid. Forming an immersion space, and moving an object having a predetermined region below the second member in a predetermined plane intersecting the optical axis of the optical member in a state where the second immersion space is formed; Changing the moving condition of the object in the predetermined plane may be executed in at least a part of the period during which the object moves.

  When the program stored in the storage device 7 is read into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate to form a liquid immersion space. In the state where is formed, various processes such as immersion exposure of the substrate P are executed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. As disclosed in Japanese Patent Publication No. 2004/019128, the optical path on the incident side (object surface side) of the last optical element 13 may be a projection optical system filled with the liquid LQ.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the embodiments described above, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796 and the like. The exposure apparatus may be used. For example, as shown in FIG. 25, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an imaging element ( CCD), micromachine, MEMS, DNA chip, or an exposure apparatus for manufacturing a reticle or mask.

In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line and space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, International Publication No. 2001/035168. A lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 26, a microdevice such as a semiconductor device includes a step 201 for performing a function / performance design of the microdevice, a step 202 for manufacturing a mask (reticle) based on the design step, and a substrate as a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 5 ... Liquid immersion member, 6 ... Control apparatus, 7 ... Memory | storage device, 12 ... Ejection surface, 13 ... Terminal optical element, 21 ... 1st member, 22 ... 2nd member, EL ... exposure light, EX ... exposure device, IL ... illumination system, K ... optical path, LQ ... liquid, LS1 ... immersion space, LS2 ... immersion space, P ... substrate, S ... shot region, SP1 ... first space, SP2 ... second space.

Claims (85)

An exposure apparatus that exposes a substrate with exposure light through a first liquid in a first immersion space,
An optical member having an exit surface from which the exposure light is emitted;
A first member that is disposed at least in part around the optical path of the exposure light and that forms the first immersion space of the first liquid;
An exposure apparatus comprising: a second member that is disposed outside the first member with respect to the optical path, and is capable of forming a second immersion space for the second liquid away from the first immersion space. In a state where the second immersion space is formed, an object having a predetermined region below the second member is moved in a direction intersecting the optical axis of the optical member,
The exposure apparatus according to claim 1, further comprising an adjustment device that changes a distance between a lower surface of the second member and an upper surface of the object during at least a part of a period during which the object moves.   The exposure apparatus according to claim 2, wherein the predetermined area includes a gap of the object.   The exposure apparatus according to claim 2, wherein the predetermined area is more lyophilic with respect to the liquid than an area outside the predetermined area.   The exposure apparatus according to claim 2, wherein the predetermined area includes a step portion.   The said predetermined area | region is an area | region where possibility that a liquid will remain after passing the said 1st, 2nd immersion space is higher than the area | region outside the said predetermined area | region. The exposure apparatus described.   There is a possibility that the outflow of liquid from the second space between the second member and the predetermined region may occur from the second space between the second member and a region outside the predetermined region. The exposure apparatus according to any one of claims 2 to 6, wherein the exposure apparatus is higher than the possibility of occurrence of liquid outflow.   8. The adjustment device according to claim 2, wherein a distance between the second member and the predetermined region is shorter than a distance between the second member and a region outside the predetermined region. Exposure device. In a state where the second immersion space is formed, an object is moved below the second member in a direction intersecting the optical axis of the optical member,
The exposure apparatus according to claim 1, further comprising: an adjustment device that changes a distance between a lower surface of the second member and an upper surface of the object based on a moving condition of the object.   The exposure apparatus according to claim 9, wherein the movement condition includes a speed of the object. In a state where the object moves at a first speed, the lower surface of the second member and the upper surface of the object are adjusted to a first distance,
The state according to claim 10, wherein the lower surface of the second member and the upper surface of the object are adjusted to a second distance shorter than the first distance in a state where the object moves at a second speed higher than the first speed. Exposure device.   The exposure apparatus according to claim 9, wherein the movement condition includes an acceleration of the object. In a state where the object moves at a first acceleration, the lower surface of the second member and the upper surface of the object are adjusted to a first distance,
The state according to claim 12, wherein the lower surface of the second member and the upper surface of the object are adjusted to a second distance shorter than the first distance in a state where the object moves at a second acceleration higher than the first acceleration. Exposure device.   The exposure apparatus according to claim 9, wherein the movement condition includes a movement locus of the object in a plane intersecting with an optical axis of the optical member. The movement locus includes a linear first movement locus and a second movement locus including a curve,
The distance between the lower surface of the second member and the upper surface of the object in the second movement locus is shorter than the distance between the lower surface of the second member and the upper surface of the object in the first movement locus. Exposure equipment. The movement trajectory includes a first movement trajectory and a second movement trajectory that is likely to cause liquid to flow out of the second space due to the movement of the object.
The distance between the lower surface of the second member and the upper surface of the object in the second movement locus is shorter than the distance between the lower surface of the second member and the upper surface of the object in the first movement locus. The exposure apparatus described in 1. The object includes a first object and a second object adjacent to the first object through a gap;
The second member and the first and second objects are substantially aligned with the optical axis of the optical member so that the second immersion space moves from one side to the other on the first object and the second object. Relative movement within a predetermined vertical plane,
A lower surface of the second member in a direction substantially parallel to the optical axis in at least a part of a period in which the second immersion space moves from one to the other on the first object and the second object; The exposure apparatus according to claim 1, further comprising: an adjustment device that changes one or both of a distance between the upper surface of the first object and a distance between the lower surface of the second member and the upper surface of the second object.   A first state in which the entire second immersion space is formed on the first object or the second object, and a second state in which the second immersion space is formed on the gap. The exposure apparatus according to claim 17, wherein a distance between a lower surface of the second member and an upper surface of the first object is different.   A first state in which the entire second immersion space is formed on the first object or the second object, and a second state in which the second immersion space is formed on the gap. The exposure apparatus according to claim 17 or 18, wherein a distance between a lower surface of the second member and an upper surface of the second object is different.   The exposure apparatus according to any one of claims 17 to 19, further comprising a step portion between the first object and the second object.   21. The exposure apparatus according to any one of claims 17 to 20, wherein the first object includes the substrate, and the second object includes a member disposed around the substrate.   The adjusting device includes: a second member in a direction substantially parallel to the optical axis based on a difference between a height of the upper surface of the first object and a height of the upper surface of the second object; The exposure apparatus according to any one of claims 17 to 21, wherein at least one movement amount of the second object is determined.   The adjusting device is configured to reduce the difference between the distance between the lower surface of the second member and the upper surface of the first object and the distance between the lower surface of the second member and the upper surface of the second object. The exposure apparatus according to any one of claims 17 to 22, wherein at least one of the second member, the first object, and the second object is moved in a direction substantially parallel to an axis.   The adjustment device moves at least one of the second member, the first object, and the second object based on a position of the object in the predetermined plane. The exposure apparatus described in 1.   The exposure apparatus according to claim 24, wherein the position of the object in the predetermined plane includes a position of a step portion between the first object and the second object. A storage device that stores information regarding a position of the stepped portion and a difference between a height of the upper surface of the first object and a height of the upper surface of the second object;
A measuring device for measuring the position of the object,
The adjustment device moves at least one of the second member, the first object, and the second object based on information stored in the storage device and a measurement result of the measurement device. The exposure apparatus according to any one of the above. Comprising a substrate stage movable while holding the substrate;
The upper surface of the first object includes the upper surface of the substrate held on the substrate stage,
The upper surface of the second object includes the upper surface of the substrate stage disposed around the upper surface of the substrate,
27. The exposure apparatus according to claim 26, wherein the information related to the difference between the height of the upper surface of the first object and the height of the upper surface of the second object includes information related to the thickness of the substrate. A pressure sensor for detecting the pressure of the second liquid in the second immersion space;
28. The adjustment device according to claim 2, wherein the adjustment device moves at least one of the second member, the first object, and the second object based on a detection result of the pressure sensor. Exposure device. In a state where the second immersion space is formed, the object is moved at a constant speed and a non-constant speed in a direction crossing the optical axis of the optical member below the second member,
In the period in which the object moves at a constant speed and the period in which the object moves at a non-constant speed, the second member and the object are movable in a direction substantially parallel to the optical axis of the optical member,
A period during which the object moves at the constant speed and a period during which the object moves at a non-constant speed, according to one or both of the movement amount of the second member and the movement amount of the object in a direction substantially parallel to the optical axis of the optical member. The exposure apparatus according to claim 1, further comprising an adjusting device that changes between the two. The adjusting device is capable of moving one or both of the second member and the object in a direction substantially parallel to the optical axis of the optical member during a period in which the object moves at a constant speed and a period in which the object moves at a non-constant speed. And
29. The exposure apparatus according to claim 28, wherein speeds of the second member and the object during the period of the constant speed movement are lower than the speeds during the period of the non-constant speed movement. The adjusting device is capable of moving one or both of the second member and the object in a direction substantially parallel to the optical axis of the optical member during a period in which the object moves at a constant speed and a period in which the object moves at a non-constant speed. And
31. The exposure apparatus according to claim 29, wherein accelerations of the second member and the object during the period of constant speed movement are lower than the accelerations during the period of non-constant speed movement. With the second immersion space formed, a plurality of shot regions of the substrate are sequentially exposed with the exposure light through the first liquid in the first immersion space,
An exposure period in which exposure of the first shot area is performed among the plurality of shot areas, and a non-exposure period from the end of exposure of the first shot area to the start of exposure of the second shot area to be exposed next The second member and the object are movable in a direction substantially parallel to the optical axis of the optical member;
An adjustment device is provided that changes one or both of the movement amount of the second member and the movement amount of the object in a direction substantially parallel to the optical axis of the optical member between the exposure period and the non-exposure period. Item 4. The exposure apparatus according to Item 1. The adjusting device is capable of moving one or both of the second member and the object in a direction substantially parallel to the optical axis of the optical member during the exposure period and the non-exposure period,
The exposure apparatus according to claim 32, wherein speeds of the second member and the object in the exposure period are lower than the speeds in the non-exposure period. The adjusting device is capable of moving one or both of the second member and the object in a direction substantially parallel to the optical axis of the optical member during the exposure period and the non-exposure period,
The exposure apparatus according to claim 32 or 33, wherein accelerations of the second member and the object in the exposure period are lower than the accelerations in the non-exposure period. In a state where the second immersion space is formed, an object having a predetermined region below the second member is moved in a predetermined plane intersecting the optical axis of the optical member,
The exposure apparatus according to claim 1, further comprising an adjusting device that changes a moving condition of the object in the predetermined plane during at least a part of a period during which the object moves.   36. The exposure apparatus according to claim 35, wherein the predetermined area includes a gap of the object.   37. The exposure apparatus according to claim 35 or 36, wherein the predetermined area is more lyophilic with respect to the liquid than an area outside the predetermined area.   The exposure apparatus according to any one of claims 35 to 37, wherein the predetermined area includes a stepped portion.   The predetermined region is a region where there is a high possibility that the liquid will remain after passing through the first and second immersion spaces, compared to a region outside the predetermined region. The exposure apparatus described.   There is a possibility that the outflow of liquid from the second space between the second member and the predetermined region may occur from the second space between the second member and a region outside the predetermined region. 40. The exposure apparatus according to any one of claims 35 to 39, wherein the exposure apparatus is higher than the possibility of occurrence of liquid outflow.   41. The exposure apparatus according to any one of claims 35 to 40, wherein the moving condition of the object includes a speed of the object in the predetermined plane.   The adjustment device moves the object at a first speed in a state where the second immersion space is located on an area outside the predetermined area, and the second immersion space is located on the predetermined area. The exposure apparatus according to any one of claims 35 to 41, wherein the object is moved at a second speed lower than the first speed.   43. The exposure apparatus according to any one of claims 35 to 42, wherein the moving condition of the object includes an acceleration of the object in the predetermined plane.   The adjusting device moves the object at a first acceleration in a state where the second immersion space is located on an area outside the predetermined area, and the second immersion space is located on the predetermined area. 44. The exposure apparatus according to any one of claims 35 to 43, wherein the object is moved at a second acceleration lower than the first acceleration. The object includes a first object and a second object adjacent to the first object through a gap;
The second member and the first and second objects are substantially aligned with the optical axis of the optical member so that the second immersion space moves from one side to the other on the first object and the second object. Relative movement within a predetermined vertical plane,
The adjustment apparatus which changes the movement condition of the said object in the said predetermined surface in at least one part of the period when the said 2nd immersion space moves from one side on the said 1st object and the said 2nd object to the other. 2. The exposure apparatus according to 1.   A first state in which the entire second immersion space is formed on the first object or the second object, and a second state in which the second immersion space is formed on the gap. The exposure apparatus according to claim 45, wherein the movement conditions are different.   47. The exposure apparatus according to claim 45 or 46, wherein the moving condition of the object includes a speed of the object in the predetermined plane.   48. The exposure apparatus according to claim 45, wherein a moving speed of the object in the second state is lower than a moving speed of the object in the first state.   49. The exposure apparatus according to any one of claims 45 to 48, wherein the moving condition of the object includes an acceleration of the object in the predetermined plane.   The exposure apparatus according to any one of claims 45 to 49, wherein an acceleration of the object in the second state is lower than an acceleration of the object in the first state. In a state where the first immersion space is formed, a first region of the object in which residual liquid is generated on the object when the first member and the object move under a first relative movement condition; and A storage device for storing information on the second region of the object in which the generation of residual liquid is suppressed;
Based on the storage information of the storage device, the first member and the object differ from the first relative movement condition in at least a part of a period during which the second region passes below the first member. The exposure apparatus according to claim 1, wherein the exposure apparatus is moved under two relative movement conditions. The first relative movement condition includes a condition in which the object moves at a first speed,
52. The exposure apparatus according to claim 51, wherein the second relative movement condition includes a condition in which the object moves at a second speed lower than the first speed. In a state where the second immersion space is formed, a first region of the object in which residual liquid is generated on the object when the second member and the object move under a first relative movement condition; and A storage device for storing information on the second region of the object in which the generation of residual liquid is suppressed;
Based on the storage information of the storage device, the second member and the object differ from the first relative movement condition in at least part of a period during which the first region passes below the second member. The exposure apparatus according to claim 1, wherein the exposure apparatus is moved under two relative movement conditions. The first movement condition includes a condition that the object moves at a first speed,
54. The exposure apparatus according to claim 53, wherein the second movement condition includes a condition in which the object moves at a second speed lower than the first speed.   The exposure apparatus according to any one of claims 51 to 54, wherein the first region includes a gap included in the object.   56. The exposure apparatus according to any one of claims 51 to 55, wherein the first region includes a step portion included in the object. A storage device that stores information on a first relative movement condition between the first member that generates residual liquid on the object and the object and a second relative movement condition that suppresses generation of the residual liquid;
The distance between the lower surface of the first member and the upper surface of the object is shortened in at least a part of the period of movement under the first relative movement condition based on stored information of the storage device. Exposure device. A storage device for storing information on a first relative movement condition between the second member where the residual liquid is generated on the object and the object and a second relative movement condition where the generation of the residual liquid is suppressed;
The distance between the lower surface of the second member and the upper surface of the object is shortened in at least a part of the period of movement under the first relative movement condition based on the storage information of the storage device. Exposure device. In a state where the first immersion space is formed, a first region of the object in which residual liquid is generated on the object when the first member and the object move under a first relative movement condition; and A storage device for storing information on the second region of the object in which the generation of residual liquid is suppressed;
The distance between the lower surface of the first member and the first region is shortened in at least a part of a period during which the first region passes below the first member based on stored information of the storage device. 2. The exposure apparatus according to 1. In a state where the second immersion space is formed, a first region of the object in which residual liquid is generated on the object when the second member and the object move under a first relative movement condition; and A storage device for storing information on the second region of the object in which the generation of residual liquid is suppressed;
The distance between the lower surface of the second member and the first region is shortened in at least part of a period during which the first region passes below the second member based on stored information of the storage device. 2. The exposure apparatus according to 1. In a state where the first immersion space is formed, an object is moved below the first member in a direction intersecting the optical axis of the optical member,
The residual liquid is generated on the object outside the first space below the first member, or the relative movement condition between the first member and the object from which the first liquid flows out of the first space, and the residual liquid A storage device for storing information on relative movement conditions in which generation or outflow of the first liquid is suppressed;
The exposure apparatus according to claim 1, wherein the relative movement condition in exposure of the substrate is adjusted based on information stored in the storage apparatus. A detection device for detecting residual liquid on the object or first liquid that has flowed out after the exposure of the substrate;
62. The exposure apparatus according to claim 61, wherein storage information of the storage device is updated based on a detection result of the detection device. In a state where the second immersion space is formed, an object is moved below the second member in a direction intersecting the optical axis of the optical member,
The residual liquid is generated on the object outside the second space below the second member, or the relative movement condition between the second member and the object from which the second liquid flows out of the second space, and the residual liquid A storage device for storing information on relative movement conditions in which generation or outflow of the second liquid is suppressed;
The exposure apparatus according to claim 61 or 62, wherein the relative movement condition in exposure of the substrate is adjusted based on information stored in the storage apparatus. A detection device for detecting residual liquid on the object or second liquid that has flowed out after the exposure of the substrate;
64. The exposure apparatus according to claim 63, wherein storage information of the storage device is updated based on a detection result of the detection device. A plurality of shot areas of the substrate are sequentially exposed while repeating the movement in the scanning direction and the movement in the step direction intersecting the scanning direction,
The exposure apparatus according to any one of claims 61 to 64, wherein the relative movement condition includes a combined speed of a moving speed in the scanning direction and a moving speed in the step direction.   2. The exposure apparatus according to claim 1, further comprising a moving device that relatively moves the first member and the object so that liquid on the object outside the first space passes through the first immersion space. .   The exposure apparatus according to claim 66, wherein the moving device is capable of controlling a timing at which the first liquid flows out of the first space by controlling a moving condition of the object.   68. The exposure apparatus according to claim 67, wherein the moving condition of the object includes one or both of a moving speed and an acceleration of the object in a plane substantially perpendicular to the optical axis of the optical member.   The exposure apparatus according to claim 66, wherein the moving device is capable of controlling a position at which the first liquid flows out of the first space by moving the first member in a direction opposite to a moving direction of the object. . The object is moved in a first direction in a plane substantially perpendicular to the optical axis of the optical member, and then moved in a second direction different from the first direction,
The exposure apparatus according to claim 69, wherein the first member moves in the reverse direction during at least a part of a period during which the object changes from movement in the first direction to movement in the second direction. The object includes the substrate and a cover member disposed around the substrate via a gap,
The substrate and the cover member intersect the optical axis of the optical member with respect to the second member so that the second immersion space moves from one side to the other on the substrate and the cover member. Moved,
The movement speed when the substrate and the cover member move so that the second immersion space moves from the cover member to the substrate is such that the second immersion space moves from the substrate to the cover member. The exposure apparatus according to claim 1, wherein the exposure speed is lower than a moving speed when the substrate and the cover member move so as to move to each other. The object includes the substrate and a cover member disposed around the substrate via a gap,
The substrate and the cover member intersect the optical axis of the optical member with respect to the second member so that the second immersion space moves from one side to the other on the substrate and the cover member. Moved,
The second lower surface includes a first side, a second side, and a corner provided between the first side and the second side,
The center of the second lower surface and the corner portion in at least a part of a period in which the substrate and the cover member move so that the second immersion space moves from one to the other on the substrate and the cover member. 2. The exposure apparatus according to claim 1, wherein the position of the second member is adjusted such that a virtual line connecting the two is substantially parallel to a radial direction with respect to a center of the substrate. The object includes the substrate and a cover member disposed around the substrate via a gap,
The substrate and the cover member intersect the optical axis of the optical member with respect to the first member so that the first immersion space moves from one to the other on the substrate and the cover member. Moved,
The first lower surface includes a first side, a second side, and a corner provided between the first side and the second side,
The center of the first lower surface and the corner portion in at least a part of a period in which the substrate and the cover member move so that the first immersion space moves from one to the other on the substrate and the cover member. 2. The exposure apparatus according to claim 1, wherein the position of the first member is adjusted such that a virtual line connecting the first and second lines is substantially parallel to a radial direction with respect to a center of the substrate. A second liquid supply unit capable of supplying the second liquid to the second space below the second member;
A fluid suction part capable of sucking the fluid in the second space;
74. A liquid adjusting device that changes one or both of a supply amount of the second liquid supply unit and a suction force of the fluid suction unit in at least a part of a period during which the object moves. The exposure apparatus according to one item.   75. The exposure according to claim 74, wherein a distance between the second member and the object in a direction substantially parallel to the optical axis of the optical member is adjusted based on one or both of the supply amount and the suction force. apparatus.   The exposure apparatus according to claim 74 or 75, wherein a moving condition of the object in a plane substantially perpendicular to the optical axis of the optical member is adjusted based on one or both of the supply amount and the suction amount. A first liquid supply section capable of supplying the first liquid to the first space below the first member;
An exposure apparatus according to any one of claims 1 to 76, further comprising a first liquid recovery unit that recovers the first liquid in the first space. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 77;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
In the state in which the second immersion space is formed, at least part of a period in which an object having a predetermined region below the second member moves in a direction intersecting the optical axis of the optical member, the second Changing the distance between the lower surface of the member and the upper surface of the object. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
Based on a moving condition of the object in at least a part of a period in which the object moves in a direction intersecting the optical axis of the optical member below the second member in a state where the second immersion space is formed. Changing the distance between the lower surface of the second member and the upper surface of the object. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
The second member and the first and second objects such that the second immersion space moves from one to the other on the first object and on the second object adjacent to the first object via a gap. Relative movement in a predetermined plane substantially perpendicular to the optical axis of the optical member;
A lower surface of the second member in a direction substantially parallel to the optical axis in at least a part of a period in which the second immersion space moves from one to the other on the first object and the second object; Changing one or both of the distance between the upper surface of the first object and the distance between the lower surface of the second member and the upper surface of the second object. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
In a state in which the second immersion space is formed, the object moves at a constant speed in a direction intersecting the optical axis of the optical member below the second member, and a period at which the object moves at a non-constant speed, Changing one or both of the amount of movement of the second member and the amount of movement of the object with respect to a direction substantially parallel to the optical axis of the optical member. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
Sequentially exposing the plurality of shot regions of the substrate with the exposure light through the first liquid in the first immersion space in a state where the second immersion space is formed;
One or both of the movement amount of the second member and the movement amount of the object with respect to a direction substantially parallel to the optical axis of the optical member is an exposure in which the first shot region of the plurality of shot regions is exposed. An exposure method comprising: changing a period between a period after the exposure of the first shot area and a non-exposure period until the exposure of the second shot area to be exposed next is started. An exposure method for exposing a substrate with exposure light through a first liquid in a first immersion space,
Forming the first liquid immersion space of the first liquid with a first member arranged at least part of the periphery of the optical path of the exposure light emitted from the emission surface of the optical member;
Forming a second immersion space for the second liquid away from the first immersion space with a second member arranged outside the first member with respect to the optical path;
Moving an object having a predetermined area below the second member in a predetermined plane intersecting the optical axis of the optical member in a state where the second immersion space is formed;
Changing the moving condition of the object in the predetermined plane during at least a part of a period during which the object moves. Exposing the substrate using the exposure apparatus according to any one of claims 79 to 84;
Developing the exposed substrate. A device manufacturing method.

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