JP2014086678A - Liquid immersion member, exposure device, exposure method, device manufacturing method, program, and storage medium - Google Patents

Abstract

A liquid immersion member capable of suppressing the occurrence of exposure failure is provided.
A liquid immersion member is disposed on at least a part of the periphery of the optical member, and includes a first member having a first lower surface and a recovery unit disposed outside the first lower surface with respect to the optical path of the exposure light. A second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and opposed to the first lower surface through a gap; and a second lower surface capable of facing the object; A second member movable relative to the member. The first lower surface is such that the liquid from at least one of the first space facing the second upper surface faces the object and the second member facing the recovery portion and the second space facing the second lower surface is recovered from the recovery portion. The first dimension of the gap between the second upper surface and the second dimension of the gap between the second lower surface and the upper surface of the object, and the distance between the inner edge of the recovery portion and the outer edge of the second member in the radiation direction with respect to the optical path of the exposure light At least one of the shape of the outer edge of the second member and the contact angle of the outer edge of the second member with respect to the liquid.
[Selection] Figure 4

Description

  The present invention relates to a liquid immersion member, an exposure apparatus, an exposure method, a device manufacturing method, a program, and a recording medium.

 As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

US Pat. No. 7,864,292

 In the immersion exposure apparatus, if the liquid is not recovered well, exposure failure may occur. As a result, a defective device may occur.

   An object of an aspect of the present invention is to provide a liquid immersion member, an exposure apparatus, and an exposure method that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method, a program, and a recording medium that can suppress the occurrence of defective devices.

  According to the first aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the optical member, the liquid immersion member disposed on at least a part of the periphery of the optical member, and a first lower surface and a recovery unit disposed outside the first lower surface with respect to the optical path of the exposure light; A first member having: a second lower surface disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface through a gap; and a second lower surface capable of facing an object. And a second member that is movable with respect to the first member, wherein the object and the second member face the recovery portion, and the first space that the second upper surface faces and the second surface that the second lower surface faces. A gap between the first lower surface and the second upper surface is collected so that liquid from at least one of the spaces is recovered from the recovery unit. A first dimension, a second dimension of a gap between the second lower surface and the upper surface of the object, a third dimension between the second upper surface and the second lower surface, and an inner edge of the recovery unit with respect to the radiation direction with respect to the optical path of the exposure light An immersion member is provided in which at least one of the distance from the outer edge of the two members, the shape of the outer edge of the second member, and the contact angle of the outer edge of the second member with respect to the liquid is defined.

 According to the second aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the optical member, the liquid immersion member disposed on at least a part of the periphery of the optical member, and a first lower surface and a recovery unit disposed outside the first lower surface with respect to the optical path of the exposure light; A first member having: a second lower surface disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface through a gap; and a second lower surface capable of facing an object. And a second member movable relative to the first member. The second upper surface is disposed outside the first region with respect to the first region in the radial direction, and the first lower surface than the first region. A liquid immersion member including a second region close to the first region.

 According to the third aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the optical member, the liquid immersion member disposed on at least a part of the periphery of the optical member, and a first lower surface and a recovery unit disposed outside the first lower surface with respect to the optical path of the exposure light; A first member having: a second lower surface disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface through a gap; and a second lower surface capable of facing an object. A second member movable relative to the first member, the second upper surface being disposed outside the third region and the third region with respect to the radial direction, and having a contact angle with respect to the liquid of the third region And a fourth region higher than the liquid immersion member.

 According to the fourth aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the optical member, the liquid immersion member disposed on at least a part of the periphery of the optical member, and a first lower surface and a recovery unit disposed outside the first lower surface with respect to the optical path of the exposure light; A first member having: a second lower surface disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface through a gap; and a second lower surface capable of facing an object. And a second member movable relative to the first member, wherein the second lower surface has a fifth region substantially perpendicular to the optical axis of the optical member, and a fifth region with respect to the radial direction. A liquid immersion portion including an outer region and a sixth region inclined upward toward the outer side in the radial direction. There is provided.

 According to the fifth aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the optical member, the liquid immersion member disposed on at least a part of the periphery of the optical member, and a first lower surface and a recovery unit disposed outside the first lower surface with respect to the optical path of the exposure light; A first member having: a second lower surface disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface through a gap; and a second lower surface capable of facing an object. And a second member that is movable relative to the first member, and the recovery unit includes a first part into which the liquid from the second space flows and a liquid in which the inflow of the liquid from the second space is suppressed. An immersion member having two parts is provided.

 According to a sixth aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light through a liquid, the exposure apparatus including the liquid immersion member according to any one of the first to fifth aspects. The

 According to a seventh aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the sixth aspect and developing the exposed substrate.

  According to an eighth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and the exposure method is disposed on at least a part of the periphery of the optical member. A first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light, and disposed at least partly around the optical path of the exposure light below the first member. And a second member having a second upper surface opposite to the first lower surface through a gap and a second lower surface capable of facing the object, the second member being movable relative to the first member. The first lower surface and the second upper surface are arranged so that liquid from at least one of the first space facing the second member and the second space facing the second upper surface and the second space facing the second lower surface is recovered from the recovery unit. The first dimension of the gap, the second dimension of the gap between the second lower surface and the upper surface of the object, the second upper surface and the second lower surface The distance between the inner edge of the recovery part and the outer edge of the second member with respect to the radiation direction with respect to the optical path of the exposure light, the shape of the outer edge of the second member, and the outer edge of the second member with respect to the liquid Forming a liquid immersion space on a substrate movable under the optical member by using an immersion member in which at least one of the contact angles is determined; and from the exit surface via the liquid in the immersion space Exposing the substrate with the emitted exposure light; moving the second member relative to the first member in at least part of the exposure of the substrate; and a first space facing the second upper surface from the recovery unit. And a liquid from at least one of the second spaces facing the second lower surface is provided.

 According to a ninth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and the exposure method is disposed on at least a part of the periphery of the optical member. A first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light, and disposed at least partly around the optical path of the exposure light below the first member. A second upper surface facing the first lower surface through a gap and a second lower surface capable of facing the object, and a second member movable with respect to the first member, wherein the second upper surface is On a substrate movable below the optical member using an immersion member including one region and a second region disposed outside the first region with respect to the radiation direction and closer to the first lower surface than the first region Forming a liquid immersion space in the liquid crystal and exposing light emitted from the exit surface through the liquid in the immersion space. Exposure of the plate, movement of the second member relative to the first member in at least part of the exposure of the substrate, and the first space facing the second upper surface and the second lower surface from the recovery unit. Recovering the liquid from at least one of the second spaces to be exposed.

 According to a tenth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, the exposure method being disposed at least at a part around the optical member. A first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light, and disposed at least partly around the optical path of the exposure light below the first member. A second upper surface facing the first lower surface through a gap and a second lower surface capable of facing the object, and a second member movable with respect to the first member, wherein the second upper surface is A substrate that is movable under the optical member by using an immersion member that includes three regions and a fourth region that is disposed outside the third region with respect to the radiation direction and has a contact angle with respect to the liquid that is higher than the third region. A liquid immersion space is formed on the top, and the liquid is injected from the injection surface through the liquid in the immersion space. Exposing the substrate with the exposure light, moving the second member relative to the first member, and at least part of the exposure of the substrate, the first space facing the second upper surface from the recovery unit, and the first And 2 recovering the liquid from at least one of the second spaces facing the lower surface.

 According to an eleventh aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and the exposure method is disposed on at least a part of the periphery of the optical member. A first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light, and disposed at least partly around the optical path of the exposure light below the first member. A second upper surface facing the first lower surface through a gap and a second lower surface capable of facing the object, and a second member movable with respect to the first member, wherein the second lower surface is optical An immersion member including a fifth region substantially perpendicular to the optical axis of the member, and a sixth region disposed outside the fifth region with respect to the radial direction and inclined upward toward the outer side with respect to the radial direction To form a liquid immersion space on a substrate movable under the optical member , Exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, moving the second member relative to the first member, and collecting at least part of the exposure of the substrate Recovering liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface from the section.

 According to a twelfth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and the exposure method is disposed on at least a part of the periphery of the optical member. A first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light, and disposed at least partly around the optical path of the exposure light below the first member. A second member that has a second upper surface that opposes the first lower surface through a gap and a second lower surface that can face the object, and that is movable with respect to the first member. Using a liquid immersion member having a first portion into which liquid from the space flows in and a second portion in which flow of the liquid from the second space is suppressed, the liquid liquid is placed on the substrate movable below the optical member. Forming an immersion space and exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space. And at least part of the exposure of the substrate, the second member is moved relative to the first member, and the first space where the second upper surface faces and the second surface where the second lower surface faces from the recovery unit. Recovering liquid from at least one of the spaces.

 According to a thirteenth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure method according to any one of the eighth to twelfth aspects; and developing the exposed substrate. Is provided.

 According to a fourteenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A first member having at least a part of the periphery of the optical member, the first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light; and exposure light below the first member. A second member that is disposed at least part of the periphery of the optical path, has a second upper surface that opposes the first lower surface via a gap, and a second lower surface that can face the object, and is movable with respect to the first member So that the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface is recovered from the recovery portion. The first dimension of the gap between the first lower surface and the second upper surface, the second lower surface and the object A second dimension of a gap with a surface, a third dimension between the second upper surface and the second lower surface, a distance between an inner edge of the recovery unit and an outer edge of the second member with respect to a radiation direction with respect to an optical path of exposure light, Using a liquid immersion member in which at least one of the shape of the outer edge of the second member and the contact angle of the outer edge of the second member with respect to the liquid is defined, the liquid liquid is placed on the substrate movable below the optical member. Forming the immersion space; exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space; and at least part of the exposure of the substrate, the second member relative to the first member And a recovery unit for recovering liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface.

 According to a fifteenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A first member having at least a part of the periphery of the optical member, the first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light; and exposure light below the first member. A second member that is disposed at least part of the periphery of the optical path, has a second upper surface that opposes the first lower surface via a gap, and a second lower surface that can face the object, and is movable with respect to the first member And a second upper surface is disposed outside the first region with respect to the radial direction and includes a second region closer to the first lower surface than the first region. Forming a liquid immersion space on a substrate movable under the optical member; Exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, moving the second member relative to the first member in at least part of the exposure of the substrate, and from the recovery unit And a program for executing recovery of the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface.

 According to a sixteenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A first member having at least a part of the periphery of the optical member, the first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light; and exposure light below the first member. A second member that is disposed at least part of the periphery of the optical path, has a second upper surface that opposes the first lower surface via a gap, and a second lower surface that can face the object, and is movable with respect to the first member A liquid immersion member including a third region, and a fourth region disposed outside the third region in the radial direction and having a contact angle with respect to the liquid higher than that of the third region. Forming a liquid immersion space on a substrate movable under the optical member. And exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and moving the second member relative to the first member in at least a portion of the substrate exposure. And a program for recovering the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface from the recovery unit.

 According to a seventeenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A first member having at least a part of the periphery of the optical member, the first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light; and exposure light below the first member. A second member that is disposed at least part of the periphery of the optical path, has a second upper surface that opposes the first lower surface via a gap, and a second lower surface that can face the object, and is movable with respect to the first member And the second lower surface is disposed outside the fifth region with respect to the radial direction and inclined upwardly toward the outer side with respect to the radial direction. A sixth region, and a liquid immersion member including a lower portion of the optical member In at least part of the exposure of the substrate, forming a liquid immersion space on the movable substrate, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, Moving the second member relative to the first member; recovering liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface from the recovery portion; A program for executing is provided.

 According to an eighteenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A first member having at least a part of the periphery of the optical member, the first member having a first lower surface and a recovery portion disposed outside the first lower surface with respect to the optical path of the exposure light; and exposure light below the first member. A second member that is disposed at least part of the periphery of the optical path, has a second upper surface that opposes the first lower surface via a gap, and a second lower surface that can face the object, and is movable with respect to the first member And the recovery unit uses a liquid immersion member having a first part into which liquid from the second space flows and a second part in which liquid inflow from the second space is suppressed. Forming a liquid immersion space on a substrate movable downward; Exposing the substrate with exposure light emitted from the exit surface through the body, moving the second member relative to the first member in at least part of the exposure of the substrate; There is provided a program for executing recovery of liquid from at least one of the first space facing the upper surface and the second space facing the second lower surface.

 According to a nineteenth aspect of the present invention, there is provided a computer-readable recording medium on which a program according to any one of the fourteenth to eighteenth aspects is recorded.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on this embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on this embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on this embodiment. FIG. 5 is a side sectional view showing a part of the liquid immersion member according to the present embodiment. It is the figure which looked at the liquid immersion member concerning this embodiment from the lower part. It is a perspective view which shows an example of the liquid immersion member which concerns on this embodiment. It is a figure for demonstrating an example of operation | movement of the liquid immersion member which concerns on this embodiment. It is a figure for demonstrating an example of operation | movement of the exposure apparatus which concerns on this embodiment. It is a schematic diagram for demonstrating an example of operation | movement of the exposure apparatus which concerns on this embodiment. FIG. 6 is a schematic diagram for explaining an example of the operation of the liquid immersion member according to the present embodiment. It is a figure which shows an example of the relationship between the liquid collection | recovery part which concerns on this embodiment, and a 2nd member. It is a figure which shows an example of the relationship between the liquid collection | recovery part which concerns on this embodiment, and a 2nd member. It is a figure which shows an example of the relationship between the liquid collection | recovery part which concerns on this embodiment, and a 2nd member. It is a figure which shows an example of the relationship between the liquid collection | recovery part which concerns on this embodiment, and a 2nd member. It is a figure which shows an example of the relationship between the liquid collection | recovery part which concerns on this embodiment, and a 2nd member. It is a figure which shows an example of the relationship between the liquid collection | recovery part which concerns on this embodiment, and a 2nd member. It is a figure which shows an example of the relationship between the liquid collection | recovery part which concerns on this embodiment, and a 2nd member. It is a figure which shows an example of the liquid immersion member which concerns on this embodiment. It is a figure which shows an example of a substrate stage. It is a flowchart for demonstrating an example of the manufacturing method of a device.

 Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

 FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the present embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS. In the present embodiment, water (pure water) is used as the liquid LQ.

   The exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

   In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a measuring system 4 for measuring the position of the substrate stage 2 and the measuring stage 3, and an illumination system IL for illuminating the mask M with the exposure light EL The projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, the liquid immersion member 5 that forms the liquid immersion space LS of the liquid LQ, and the overall operation of the exposure apparatus EX are controlled. And a storage device 7 that is connected to the control device 6 and stores various types of information related to exposure.

   The exposure apparatus EX includes a reference frame 8A that supports various measurement systems including the projection optical system PL and the measurement system 4, an apparatus frame 8B that supports the reference frame 8A, and a reference frame 8A and an apparatus frame 8B. And an anti-vibration device 10 that is disposed between the device frame 8B and suppresses transmission of vibration from the device frame 8B to the reference frame 8A. The vibration isolator 10 includes a spring device and the like. In the present embodiment, the vibration isolator 10 includes a gas spring (for example, an air mount). One or both of a detection system that detects the alignment mark of the substrate P and a detection system that detects the position of the surface of an object such as the substrate P may be supported by the reference frame 8A.

 In addition, the exposure apparatus EX includes a chamber apparatus 9 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

   The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

   The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

   The mask stage 1 can move while holding the mask M. The mask stage 1 is moved by the operation of a drive system 11 including a flat motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can be moved in six directions of the X-axis, Y-axis, Z-axis, θX, θY, and θZ directions by the operation of the drive system 11. The drive system 11 may not include a planar motor. The drive system 11 may include a linear motor.

   The projection optical system PL irradiates the projection area PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL is ¼. The projection magnification of the projection optical system PL may be 1/5 or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. Projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes a reflective optical element and a refractive optical element. The projection optical system PL may form either an inverted image or an erect image.

   The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exposure light EL emitted from the emission surface 12 travels in the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. The exit surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis.

 With respect to the direction parallel to the optical axis of the last optical element 13, the exit surface 12 side is the -Z side, and the entrance surface side is the + Z side. Regarding the direction parallel to the optical axis of the projection optical system PL, the image plane side of the projection optical system PL is the −Z side, and the object plane side of the projection optical system PL is the + Z side.

   The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 14G of the base member 14. The guide surface 14G and the XY plane are substantially parallel.

  The substrate stage 2 includes, for example, a first holding unit that releasably holds the substrate P as disclosed in US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. It has a 2nd holding part which is arranged around a holding part and holds cover member T so that release is possible. The first holding unit holds the substrate P so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel to each other. The upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit are arranged substantially in the same plane. Regarding the Z-axis direction, the distance between the emission surface 12 and the upper surface of the substrate P held by the first holding portion is substantially the same as the distance between the emission surface 12 and the upper surface of the cover member T held by the second holding portion. equal. Note that the distance between the emission surface 12 and the upper surface of the substrate P is substantially equal to the distance between the emission surface 12 and the upper surface of the cover member T with respect to the Z-axis direction. And the distance between the emission surface 12 and the upper surface of the cover member T is, for example, within 10% of the distance (so-called working distance) between the emission surface 12 and the upper surface of the substrate P when the substrate P is exposed. Including. Note that the upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit may not be arranged in the same plane. For example, the position of the upper surface of the substrate P and the position of the upper surface of the cover member T may be different with respect to the Z-axis direction. For example, there may be a step between the upper surface of the substrate P and the upper surface of the cover member T. Note that the upper surface of the cover member T may be inclined with respect to the upper surface of the substrate P, or the upper surface of the cover member T may include a curved surface.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of a drive system 15 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 15 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 14 </ b> M disposed on the base member 14. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 14G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 15. Note that the drive system 15 may not include a planar motor. The drive system 15 may include a linear motor.

 The measurement system 4 includes an interferometer system. The interferometer system includes a unit that irradiates the measurement mirror of the substrate stage 2 and the measurement mirror of the measurement stage 3 with measurement light and measures the positions of the substrate stage 2 and the measurement stage 3. Note that the measurement system may include an encoder system as disclosed in, for example, US Patent Application Publication No. 2007/0288121. Note that the measurement system 4 may include only one of the interferometer system and the encoder system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the substrate stage 2 (substrate P) and the measurement stage 3 (measurement member) based on the measurement result of the measurement system 4. The position control of C) is executed.

  Next, the liquid immersion member 5 according to this embodiment will be described. The liquid immersion member may be referred to as a nozzle member. 2 is a cross-sectional view of the liquid immersion member 5 parallel to the YZ plane, FIG. 3 is a cross-sectional view of the liquid immersion member 5 parallel to the XZ plane, and FIG. 4 is an enlarged view of a part of FIG. FIG. 6 is a view of the liquid immersion member 5 as viewed from the lower side (−Z side), and FIG. 6 is a perspective view of the liquid immersion member 5.

  The immersion member 5 forms an immersion space LS for the liquid LQ on an object that can move below the last optical element 13.

 An object that can move below the last optical element 13 can move in the XY plane including the position facing the exit surface 12. The object can face the emission surface 12 and can be arranged in the projection region PR. The object is movable below the liquid immersion member 5 and can be opposed to the liquid immersion member 5. In the present embodiment, the object is at least one of the substrate stage 2 (for example, the cover member T of the substrate stage 2), the substrate P held on the substrate stage 2 (first holding unit), and the measurement stage 3. Including one. In the exposure of the substrate P, the immersion space LS is formed so that the optical path K of the exposure light EL between the exit surface 12 of the last optical element 13 and the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

   In the following description, it is assumed that the object is the substrate P. As described above, the object may be at least one of the substrate stage 2 and the measurement stage 3, or may be an object different from the substrate P, the substrate stage 2, and the measurement stage 3.

 The immersion space LS may be formed so as to straddle two objects. For example, the immersion space LS may be formed so as to straddle the cover member T and the substrate P of the substrate stage 2. The immersion space LS may be formed so as to straddle the substrate stage 2 and the measurement stage 3.

  The immersion space LS is formed so that the optical path K of the exposure light EL emitted from the exit surface 12 of the last optical element 13 is filled with the liquid LQ. At least a part of the immersion space LS is formed in a space between the last optical element 13 and the substrate P (object). At least a part of the immersion space LS is formed in a space between the immersion member 5 and the substrate P (object).

  The liquid immersion member 5 includes a first member 21 disposed on at least a part of the periphery of the terminal optical element 13, and a second member 22 disposed on at least a part of the periphery of the optical path K below the first member 21. Is provided. The first member 21 is disposed so as not to contact the terminal optical element 13 and the second member 22. The second member 22 is disposed so as not to contact the terminal optical element 13 and the first member 21. The second member 22 is movable with respect to the first member 21.

 The liquid immersion member 5 includes a liquid supply part 33 that can supply the liquid LQ for forming the liquid immersion space LS, and a liquid recovery part 23 that can recover the liquid LQ.

 The last optical element 13 has an exit surface 12 facing the −Z direction, and an outer surface 29 disposed around the exit surface 12. The outer side surface 29 is a non-emission surface that does not emit the exposure light EL. The exposure light EL passes through the emission surface 12 and does not pass through the outer surface 29.

 The first member 21 is disposed at a position farther from the substrate P (object) than the second member 22. At least a part of the second member 22 is disposed between the first member 21 and the substrate P (object). At least a part of the second member 22 is disposed between the terminal optical element 13 and the substrate P (object). The second member 22 may not be disposed between the terminal optical element 13 and the substrate P (object).

 The first member 21 is connected to the lower surface 24 facing the -Z direction, the inner surface 30 facing the outer surface 29 of the last optical element 13, the upper surface 31 connected to the upper end of the inner surface 30, and facing the + Z direction, and the inner surface An upper surface 36 that is connected to the lower end of 30 and faces the + Z direction, connects an inner edge of the lower surface 24 and an inner edge of the upper surface 36, and an inner surface 43 at least partially facing the outer surface 29 of the terminal optical element 13. Have. The inner side surface 30 is opposed to the outer side surface 29 via a gap. The inner side surface 43 is opposed to the outer side surface 29 via a gap.

 The second member 22 includes an upper surface 25 facing the + Z direction, a lower surface 26 facing the −Z direction, an inner surface 41 facing the optical path K, and an outer surface 42 facing the opposite side of the inner surface 41. The inner side surface 41 connects the inner edge of the upper surface 25 and the inner edge of the lower surface 26. The outer side surface 42 connects the outer edge of the upper surface 25 and the outer edge of the lower surface 26. The second member 22 can face the lower surface 24. At least a part of the upper surface 25 of the second member 22 faces the lower surface 24 with a gap therebetween. At least a part of the upper surface 25 faces the emission surface 12 with a gap. Note that the upper surface 25 may not face the emission surface 12.

  In the present embodiment, the inner edges of the lower surfaces 24 and 26 (upper surfaces 25 and 36) are edges of the lower surfaces 24 and 26 (upper surfaces 25 and 36) facing the optical path K (optical axis AX). The outer edges of the lower surfaces 24 and 26 (upper surfaces 25 and 36) are edges of the lower surfaces 24 and 26 (upper surfaces 25 and 36) outside the inner edge with respect to the radial direction with respect to the optical path K (optical axis AX). The inner edge is closer to the optical path K than the outer edge.

 The substrate P (object) can face the lower surface 26. At least a part of the upper surface of the substrate P faces the lower surface 26 with a gap. At least a part of the upper surface of the substrate P faces the emission surface 12 with a gap.

  The first member 21 is disposed around the last optical element 13. The first member 21 is an annular member. A gap is formed between the first member 21 and the last optical element 13. The first member 21 does not face the emission surface 12. A part of the first member 21 may face the emission surface 12. That is, a part of the first member 21 may be disposed between the emission surface 12 and the upper surface of the substrate P (object).

  The second member 22 is disposed around the optical path K of the exposure light EL. The second member 22 is an annular member. A gap is formed between the second member 22 and the first member 21.

  The lower surface 24 of the first member 21 is disposed so as to surround the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The lower surface 24 is disposed at a position where it can come into contact with the liquid LQ. The lower surface 24 does not collect the liquid LQ. The lower surface 24 is a non-recovery part and cannot recover the liquid LQ. The lower surface 24 of the first member 21 can hold the liquid LQ with the second member 22.

  The upper surface 25 of the second member 22 is disposed so as to surround the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The upper surface 25 is disposed at a position where it can come into contact with the liquid LQ. The upper surface 25 does not collect the liquid LQ. The upper surface 25 is a non-recovery part and cannot recover the liquid LQ. The upper surface 25 of the second member 22 can hold the liquid LQ with the first member 21.

  The lower surface 26 of the second member 22 is disposed so as to surround the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The lower surface 26 is disposed at a position where it can come into contact with the liquid LQ. The lower surface 26 does not collect the liquid LQ. The lower surface 26 is a non-recovery part and cannot recover the liquid LQ. The lower surface 26 of the second member 22 can hold the liquid LQ with the substrate P (object).

  The exit surface 12 and the outer surface 29 of the last optical element 13 disposed at a position that can come into contact with the liquid LQ do not collect the liquid LQ. The ejection surface 12 and the outer surface 29 are non-recovery parts and cannot recover the liquid LQ. The exit surface 12 of the last optical element 13 can hold the liquid LQ with the substrate P (object).

 The inner side surface 30, the upper surface 36, and the inner side surface 43 of the first member 21 that are disposed at positions that can contact the liquid LQ do not collect the liquid LQ. The inner side surface 30, the upper surface 36, and the inner side surface 43 are non-recovery parts and cannot recover the liquid LQ.

 The inner side surface 41 and the outer side surface 42 of the second member 22 arranged at a position that can come into contact with the liquid LQ do not collect the liquid LQ. The inner side surface 41 and the outer side surface 42 are non-recovery parts and cannot recover the liquid LQ.

 In the present embodiment, the lower surface 24 is substantially parallel to the XY plane. The upper surface 25 is also substantially parallel to the XY plane. The lower surface 26 is also substantially parallel to the XY plane. That is, the lower surface 24 and the upper surface 25 are substantially parallel. The upper surface 25 and the lower surface 26 are substantially parallel.

  Note that the lower surface 24 may be non-parallel to the XY plane. The lower surface 24 may be inclined with respect to the XY plane and may include a curved surface.

 Note that the upper surface 25 may be non-parallel to the XY plane. The upper surface 25 may be inclined with respect to the XY plane or may include a curved surface.

 Note that the lower surface 26 may be non-parallel to the XY plane. The lower surface 26 may be inclined with respect to the XY plane and may include a curved surface.

  The lower surface 24 and the upper surface 25 may be parallel or non-parallel. The upper surface 25 and the lower surface 26 may be parallel or non-parallel. The lower surface 24 and the lower surface 26 may be parallel or non-parallel.

 In the present embodiment, the inner surface 30 of the first member 21 is inclined with respect to the Z axis (the optical axis AX of the terminal optical element 13). The inner side surface 30 is inclined upward toward the outside with respect to the radiation direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The inner surface 30 and the outer surface 29 are substantially parallel. The inner side surface 30 and the outer side surface 29 may be non-parallel.

 In the present embodiment, the inner side surface 43 of the first member 21 is inclined with respect to the Z axis (the optical axis AX of the terminal optical element 13). The inner side surface 43 is inclined upward toward the outside with respect to the radiation direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The inner side surface 43 and the outer side surface 29 are substantially parallel. The size of the gap between the inner side surface 43 and the outer side surface 29 is smaller than the size of the gap between the inner side surface 30 and the outer side surface 29. The inner side surface 43 and the outer side surface 29 may be non-parallel.

 In the present embodiment, the inner surface 41 of the second member 22 is substantially parallel to the Z axis (the optical axis AX of the terminal optical element 13). The angle formed by the inner side surface 41 and the upper surface 25 is substantially 90 degrees. The angle formed by the inner side surface 41 and the lower surface 26 is substantially 90 degrees.

  The inner side surface 41 may be inclined with respect to the Z axis. For example, the inner side surface 41 may be inclined upward toward the outer side with respect to the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The inner side surface 41 may be inclined downward toward the outer side with respect to the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13).

 In the present embodiment, the outer surface 42 of the second member 22 is substantially parallel to the Z axis (the optical axis AX of the terminal optical element 13). The angle formed by the outer side surface 42 and the upper surface 25 is substantially 90 degrees. The angle formed by the outer side surface 42 and the lower surface 26 is substantially 90 degrees.

  The outer surface 42 may be inclined with respect to the Z axis. For example, the outer surface 42 may be inclined upward toward the outer side with respect to the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The outer side surface 42 may be inclined downward toward the outside with respect to the radiation direction with respect to the optical path K (the optical axis AX of the terminal optical element 13).

  A first space SP1 is formed on the upper surface 25 side. The first space SP1 includes a space that the upper surface 25 faces. The first space SP1 includes a space between the lower surface 24 and the upper surface 25.

 A second space SP2 is formed on the lower surface 26 side. The second space SP2 includes a space that the lower surface 26 faces. The second space SP2 includes a space between the lower surface 26 and the upper surface of the substrate P (object).

 A third space SP3 is formed on the inner surface 30 side. The third space SP3 includes a space that the inner side surface 30 and the inner side surface 43 face. The third space SP3 includes a space between the outer side surface 29 and the inner side surface 30 and the inner side surface 43.

  A fourth space SP4 is formed on the exit surface 12 side. The fourth space SP4 includes a space that the emission surface 12 faces. The fourth space SP4 includes a space between the emission surface 12 and the substrate P (object). The fourth space SP4 includes an optical path K of the exposure light EL between the emission surface 12 and the substrate P (object). The fourth space SP4 includes a space between the emission surface 12 and the substrate P (object) and a space between the emission surface 12 and the upper surface 25.

 In the present embodiment, an opening 40 is formed between the inner edge of the lower surface 24 and the upper surface 25. The opening 40 is disposed so as to face the optical path K. The opening 40 may be disposed so as to face the third space SP3.

  The first member 21 has an opening 34 through which the exposure light EL emitted from the emission surface 12 can pass. The second member 22 has an opening 35 through which the exposure light EL emitted from the emission surface 12 can pass. At least a part of the last optical element 13 is disposed inside the opening 34. An upper surface 36 is disposed around the upper end of the opening 34. A lower surface 24 is disposed around the lower end of the opening 34. An upper surface 25 is disposed around the upper end of the opening 35. A lower surface 26 is disposed around the lower end of the opening 35.

 The dimension of the opening 34 in the XY plane is larger than the dimension of the opening 35. The dimension of the opening 34 is larger than the dimension of the opening 35 with respect to the X-axis direction. The dimension of the opening 34 is larger than the dimension of the opening 35 with respect to the Y-axis direction. In the present embodiment, the first member 21 is not disposed directly below the emission surface 12. The opening 34 of the first member 21 is disposed around the emission surface 12. The opening 34 is larger than the exit surface 12. An opening 44 at the lower end of the gap formed between the outer surface 29 of the last optical element 13 and the first member 21 faces the upper surface 25 of the second member 22. The opening 35 of the second member 22 is disposed so as to face the emission surface 12. In the present embodiment, the shape of the opening 35 in the XY plane is a rectangular shape. The opening 35 is long in the X-axis direction. The shape of the opening 35 may be an ellipse that is long in the X-axis direction or a polygon that is long in the X-axis direction.

 The dimension of the opening 34 may be smaller than the dimension of the opening 35. The dimension of the opening 34 may be substantially equal to the dimension of the opening 35.

 In the present embodiment, the first member 21 may not be annular. For example, the first member 21 may be disposed in a part of the periphery of the terminal optical element 13 (optical path K). For example, a plurality of the first members 21 may be arranged around the last optical element 13 (optical path K).

 In the present embodiment, the first space SP1 and the fourth space SP4 are connected via the opening 40. The third space SP3 and the fourth space SP4 are connected via the opening 44. The first space SP1 and the third space SP3 are connected via the opening 40 and the opening 44. In other words, the first space SP1 and the third space SP3 are connected via the fourth space SP4. The second space SP2 and the fourth space SP4 are connected via an opening 46 between the inner edge of the second member 22 (lower surface 26) and the substrate P (object). The second space SP2 and the third space SP3 are connected via an opening 44, an opening 45 between the inner edge of the second member 22 (upper surface 25) and the emission surface 12, and an opening 46. In other words, the second space SP2 and the third space SP3 are connected via the fourth space SP4.

  The first space SP1 and the second space SP2 are connected through the opening 40, the opening 45, and the opening 46. In other words, the first space SP1 and the second space SP2 are connected via a space (fourth space SP4) that the inner edge of the second member 22 faces. The space that the inner edge of the second member 22 faces includes the space that the inner surface 41 of the second member 22 faces.

 The first space SP1 and the second space SP2 are the opening 47 between the outer edge of the second member 22 (upper surface 25) and the first member 21, and the outer edge of the second member 22 (lower surface 26). It is connected via an opening 48 between the substrate P (object). In other words, the first space SP1 and the second space SP2 are connected via a space (a space between the liquid recovery part 23 and the substrate P) facing the outer edge of the second member 22. The space that the outer edge of the second member 22 faces includes the space that the outer surface 42 of the second member 22 faces.

  The liquid LQ can flow through each of the first space SP1, the second space SP2, the third space SP3, and the fourth space SP4.

 The second member 22 is movable with respect to the first member 21. The second member 22 is movable with respect to the last optical element 13. The relative position between the second member 22 and the first member 21 changes. The relative position between the second member 22 and the last optical element 13 changes.

  The second member 22 is movable in the XY plane perpendicular to the optical axis of the last optical element 13. The second member 22 is movable substantially parallel to the XY plane. In the present embodiment, the second member 22 is movable at least in the X-axis direction.

 Note that the second member 22 may be movable in at least one direction of the Y axis, the Z axis, θX, θY, and θZ in addition to the X axis direction.

  In the present embodiment, the terminal optical element 13 does not move substantially. The first member 21 also does not move substantially.

 The second member 22 is movable below at least a part of the first member 21. The second member 22 is movable between the first member 21 and the substrate P (object).

  In the present embodiment, the second member 22 is moved by the driving device 27. The drive device 27 can move the second member 22 relative to the first member 21. The drive device 27 includes, for example, a motor, and can move the second member 22 using Lorentz force. The drive device 27 is controlled by the control device 6.

 In the present embodiment, the support member 28 is connected to a part of the upper surface 25. The drive device 27 moves the support member 28. The support member 28 can be moved by the operation of the driving device 27. When the support member 28 is moved by the driving device 27, the second member 22 moves.

 In the present embodiment, a plurality of support members 28 are arranged. In the present embodiment, the support member 28 is disposed on each of the + Y side and the −Y side with respect to the optical path K (the optical axis AX of the terminal optical element 13).

  In the present embodiment, at least a part of the support member 28 is disposed in the hole 32 formed in the first member 21. The support member 28 is movable inside the hole 32.

 The hole 32 is formed in the first member 21 so as to connect the upper space and the lower space of the first member 21 with respect to the Z-axis direction. The hole 32 is formed in the first member 21 so as to be connected to the first space SP1. In the present embodiment, the hole 32 is formed in the first member 21 so as to connect the first space SP1 and the third space SP3. The hole 32 is formed so as to connect the lower surface 24 of the first member 21 and the inner surface 30. The lower end of the hole 32 faces the first space SP1. The upper end of the hole 32 faces the third space SP3. In the present embodiment, the hole 32 is a through hole that penetrates the first member 21 so as to connect the first space SP1 and the third space SP3.

 The hole 32 may be formed in the first member 21 so as to connect the first space SP1 and the space where the upper surface 31 faces. That is, the hole 32 may be formed so as to connect the upper surface 31 and the lower surface 24.

  In the present embodiment, a plurality of holes 32 are formed. The holes 32 are arranged on each of the + Y side and the −Y side with respect to the optical path K (the optical axis AX of the terminal optical element 13). The plurality of support members 28 are movably disposed in the plurality of holes 32 provided in the first member 21.

 As shown in FIG. 6, each of the holes 32 is long in the X-axis direction. The support member 28 can move in the X-axis direction inside the hole 32. When the support member 28 is moved in the X-axis direction by the driving device 27, the second member 22 is moved in the X-axis direction.

 In the present embodiment, the driving device 27 is connected to the support member 28 on the inner surface 30 side. That is, in the present embodiment, the driving device 27 is connected to the support member 28 in the space above the first member 21. The driving device 27 may be directly connected to the support member 28 or indirectly connected to the support member 28. For example, the mover of the driving device 27 may be directly connected to the support member 28. The mover of the driving device 27 and the support member 28 may be connected via a member different from the support member 28.

  In the present embodiment, the first member 21 and the second member 22 do not contact each other. The first member 21 (the inner surface of the hole 32) and the support member 28 do not contact each other. A gap is formed between the first member 21 and the second member 22. A gap is formed between the first member 21 and the support member 28. The second member 22 is movable on the lower surface 24 side of the first member 21 so as not to contact the first member 21. The support member 28 is movable inside the hole 32 so as not to contact the first member 21. The drive device 27 can move the second member 22 and the support member 28 so that the second member 22 and the support member 28 do not contact the first member 21. Note that the first member 21 may be in contact with at least one of the second member 22 and the support member 28.

 The support member 28 may be disposed on each of the + X side and the −X side with respect to the optical path K (the optical axis AX of the terminal optical element 13), or on the + Y side, the −Y side, the + X side, and −. It may be arranged on each of the X sides. Similarly, the holes 32 may be arranged on each of the + X side and the −X side with respect to the optical path K (the optical axis AX of the terminal optical element 13), or on the + Y side, the −Y side, the + X side, and −. It may be arranged on each of the X sides. The second member 22 may be supported by one support member.

 A plurality of driving devices 27 may be provided. The driving device 27 may be connected to each of the plurality of support members 27. For example, when a plurality of support members 28 are arranged, at least one drive device 27 may be connected to one support member 28. A plurality of drive devices 27 may be connected to one support member 28, and the plurality of drive devices 27 may move one support member 28. A plurality of support members 28 may be connected by a connecting member. The drive device 28 may move the support member 28 (second member 22) by moving the connecting member.

  The driving device 27 may be connected to the support member 28 between one or both of the inner surface 30 and the upper surface 31 and the lower surface 24. The driving device 27 may be connected to the support member 28 on the lower surface 24 side.

  Note that the hole 32 may not be formed in the first member 21. For example, the support member 28 may be disposed in the gap between the plurality of members constituting the first member 21.

 In the present embodiment, the first member 21 is supported by the device frame 8B. The first member 21 is supported by the device frame 8B via a support member (not shown). Note that the first member 21 may be supported by the reference frame 8A via a support member (not shown).

 In the present embodiment, the second member 22 is supported by the device frame 8B. In the present embodiment, the drive device 27 is supported by the device frame 8B. The driving device 27 may be supported by the device frame 8B via a support mechanism (not shown). The second member 22 is supported by the device frame 8 </ b> B via the support member 28 and the drive device 27. Thereby, even if vibration is generated by the movement of the second member 22, the vibration isolator 10 suppresses the vibration from being transmitted to the reference frame 8A. The second member 22 may be supported by the reference frame 8A via the support member 28.

 The liquid supply unit 33 is disposed inside the liquid recovery unit 23 with respect to the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The liquid supply unit 33 includes an opening (liquid supply port) disposed in the liquid immersion member 5. In the present embodiment, the liquid supply unit 33 is disposed on the first member 21. In the present embodiment, the liquid supply unit 33 is disposed on the inner side surface 30 of the first member 21.

 The liquid supply part 33 is arrange | positioned so that 3rd space SP3 may be faced. The liquid supply part 33 is disposed so as to face the outer surface 29. The liquid supply part 33 supplies the liquid LQ to the third space SP3.

 In the present embodiment, the liquid supply unit 33 is disposed on each of the + X side and the −X side with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid supply unit 33 may be disposed in the Y-axis direction with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13), or the exposure light EL including the X-axis direction and the Y-axis direction. A plurality of optical paths K may be arranged around the optical path K (the optical axis AX of the terminal optical element 13). One liquid supply unit 33 may be provided.

 In the present embodiment, the liquid supply unit 33 is connected to the liquid supply device 33 </ b> S via a supply flow path 33 </ b> R formed inside the first member 21. The liquid supply device 33S can supply the liquid supply unit 33 with the clean and temperature-adjusted liquid LQ. The liquid supply unit 33 supplies the liquid LQ from the liquid supply device 33S in order to form the immersion space LS.

  In the present embodiment, the liquid LQ supplied from the liquid supply unit 33 flows through the upper surface 36 and then is supplied to the upper surface 25 through the opening 34 (opening 44). At least a part of the liquid LQ supplied to the upper surface 25 is supplied (inflows) to the first space SP1 through the opening 40. Further, at least a part of the liquid LQ supplied to the upper surface 25 is supplied to the substrate P (object) facing the emission surface 12 through the opening 35 (opening 45). Thereby, the optical path K is filled with the liquid LQ. Further, at least a part of the liquid LQ supplied onto the substrate P (object) is supplied (inflows) into the second space SP2 through the opening 46.

  In addition, the liquid supply part 33 may be arrange | positioned so that 1st space SP1 may be faced. The liquid supply unit 33 may be disposed on the lower surface 24 of the first member 21. In addition, the liquid supply part 33 may be arrange | positioned so that both 1st space SP1 and 3rd space SP3 may be faced. For example, the liquid supply unit 33 may be disposed on both the inner side surface 30 and the lower surface 24. The liquid supply unit 33 may be disposed on the second member 22. The liquid supply unit 33 may be disposed on the upper surface 25 of the second member 22. The liquid supply unit 33 may be disposed on a part of the upper surface 25 facing the emission surface 12. The liquid supply unit 33 may be disposed on the lower surface 26 of the second member 22. The liquid supply unit 33 may be disposed on the inner surface 41 of the second member 22 so as to face the optical path K. The liquid supply unit 33 may be disposed on both the first member 21 and the second member 22. The liquid supply unit 33 is disposed on the second member 22 and may not be disposed on the first member 21. The liquid supply unit 33 is disposed on the first member 21 and may not be disposed on the second member 22. The liquid supply unit 33 may be arranged on a member different from the first member 21 and the second member 22.

 The liquid recovery unit 23 is disposed on the first member 21. The liquid recovery unit 23 is disposed outside the lower surface 24 with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 23 includes an opening (liquid recovery port) disposed in the liquid immersion member 5.

  The liquid recovery unit 23 is disposed outside the lower surface 24 in the radiation direction with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 23 is disposed outside the liquid supply unit 33 with respect to the radiation direction with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13).

 The liquid recovery unit 23 is disposed at least partly around the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 23 is disposed at least at a part around the lower surface 24. As shown in FIG. 5, in the present embodiment, the liquid recovery unit 23 is disposed around the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 23 is disposed around the lower surface 24.

  In a state where the second member 22 is disposed at the origin, the second member 22 faces the entire lower surface 24. In a state where the second member 22 is disposed at the origin, at least a part of the liquid recovery unit 23 is disposed outside the second member 22. In a state where the second member 22 is disposed at the origin, a part of the liquid recovery unit 23 is disposed around the second member 22. In the present embodiment, the state where the second member 22 is disposed at the origin refers to a state where the center of the opening 35 of the second member 22 and the optical axis AX of the last optical element 13 coincide.

 The liquid recovery unit 23 may be disposed in a part of the periphery of the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). For example, a plurality of liquid recovery units 23 may be arranged around the optical path K (the optical axis AX of the terminal optical element 13).

  At least a part of the liquid recovery unit 23 is arranged so that the substrate P (object) faces each other. Further, at least a part of the liquid recovery unit 23 is disposed so that the second member 22 faces the liquid recovery unit 23. In the present embodiment, the substrate P (object) can face at least a part of the liquid recovery unit 23. The second member 22 can face at least a part of the liquid recovery unit 23. That is, in the present embodiment, the substrate P (object) and the second member 22 can face the liquid recovery unit 23. The liquid recovery part 23 can face at least a part of the substrate P (object) and at least a part of the second member 22 simultaneously. In the present embodiment, the substrate P (object) and the second member 22 face each other simultaneously with the liquid recovery unit 23 in a state where the second member 22 is disposed at the origin.

 As shown in FIG. 4, the liquid recovery part 23 includes an inner part 231 and an outer part 232. The outer portion 232 is a portion outside the inner portion 231 in the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The inner portion 231 is a portion closer to the optical path K (the optical axis AX of the terminal optical element 13) than the outer portion 232 is. The inner portion 231 is a portion that can face the second member 22. The outer portion 232 is a portion that can face the substrate P (object). In the present embodiment, the inner portion 231 is disposed so as to surround the optical path K (the optical axis AX of the terminal optical element 13) and the lower surface 24. The outer portion 232 is disposed so as to surround the inner portion 231.

  In the present embodiment, the inner portion 231 faces the second member 22 and the outer portion 232 does not face the second member 22 in a state where the second member 22 is disposed at the origin. In a state where the second member 22 is disposed at the origin, the outer portion 232 faces the substrate P (object).

  In the present embodiment, the liquid recovery unit 23 is disposed on the first member 21. Due to the movement of the second member 22 relative to the first member 21, the second member 22 moves relative to the liquid recovery part 23 and the lower surface 24. That is, the movement of the second member 22 changes the position of the second member 22 relative to the liquid recovery unit 23 and the lower surface 24.

  For example, the movement of the second member 22 may cause a state in which the second member 22 does not face the liquid recovery unit 23 in a state where the second member 22 is not disposed at the origin. For example, in a state where the second member 22 is not disposed at the origin, the second member 22 does not face the liquid recovery unit 23 and the substrate P (object) faces the entire liquid recovery unit 23. Good.

  For example, the movement of the second member 22 may cause a state where the substrate P (object) does not face the liquid recovery unit 23 in a state where the second member 22 is not disposed at the origin. For example, in a state where the second member 22 is not disposed at the origin, even if the substrate P (object) does not face the liquid recovery unit 23 and the second member 22 faces the entire liquid recovery unit 23, Good.

  For example, the movement of the second member 22 may cause a state in which at least a part of the lower surface 24 does not face the second member 22 in a state where the second member 22 is not disposed at the origin.

 The liquid recovery part 23 can recover the liquid LQ from at least one of the first space SP1 and the second space SP2. That is, the liquid recovery unit 23 can recover at least a part of the liquid LQ from the first space SP1. The liquid recovery part 23 can recover at least a part of the liquid LQ from the second space SP2. The liquid LQ in the first space SP1 can flow into the liquid recovery part 23 through the opening 47. The liquid LQ in the second space SP2 can flow into the liquid recovery unit 23 through the opening 48.

 As described above, the first space SP1 and the second space SP2 are connected. The liquid LQ can move from one of the first space SP1 and the second space SP2 to the other. The liquid LQ in the first space SP1 can move to the second space SP2 through a space (a space between the liquid recovery unit 23 and the substrate P) that the outer edge of the second member 22 faces. The liquid LQ in the second space SP2 can move to the first space SP1 through a space (a space between the liquid recovery unit 23 and the substrate P) that the outer edge of the second member 22 faces.

  Further, the liquid LQ in the first space SP1 can move to the second space SP2 through the space (the fourth space SP4) that the inner edge of the second member 22 faces. The liquid LQ in the second space SP2 can move to the first space SP1 through the space (the fourth space SP4) that the inner edge of the second member 22 faces.

  The liquid recovery unit 23 is connected to the liquid recovery device 37C via a recovery flow path (space) 37R formed inside the first member 21. The liquid recovery device 37C can connect the liquid recovery unit 23 and the vacuum system. At least a part of the liquid LQ from the first space SP1 can flow into the recovery channel 37R via the liquid recovery unit 23. In addition, at least part of the liquid LQ from the second space SP2 can flow into the recovery flow path 37R via the liquid recovery unit 23.

 In the present embodiment, the liquid recovery part 23 includes a porous member 38. The liquid recovery port includes a hole 37 of the porous member 38. In the present embodiment, the porous member 38 includes a mesh plate. The porous member 38 includes a lower surface 39 to which at least one of the upper surface 25 and the substrate P (object) can face, an upper surface facing the recovery flow path 37R, and a plurality of holes 37 connecting the lower surface and the upper surface. The liquid recovery unit 23 recovers the liquid LQ through the hole 37 of the porous member 38. At least a part of the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 recovered from the liquid recovery part 23 (the hole 37 of the porous member 38) flows into the recovery flow path 37R, and the recovery flow It flows through the path 37R and is recovered by the liquid recovery device 37C.

  In the present embodiment, substantially only the liquid LQ is recovered via the liquid recovery unit 23, and the recovery of gas is limited. The control device 6 controls the pressure on the lower surface side of the porous member 38 (first and second) so that the liquid LQ in the first space SP1 passes through the hole 37 of the porous member 38 and flows into the recovery flow path 37R and does not pass the gas. The difference between the pressure on the second space SP1, SP2 side) and the pressure on the upper surface side (pressure on the recovery flow path 37R) is adjusted. An example of a technique for recovering only the liquid through the porous member is disclosed in, for example, US Pat. No. 7,292,313.

  Note that both the liquid LQ and the gas may be collected (sucked) through the porous member 38. Note that the porous member 38 may not be provided in the first member 21. That is, the fluid (one or both of the liquid LQ and the gas) from at least one of the first space SP1 and the second space SP2 may be recovered without passing through the porous member.

 In the present embodiment, the lower surface of the liquid recovery part 23 includes the lower surface of the porous member 38. The lower surface of the liquid recovery unit 23 is disposed around the lower surface 24. In the present embodiment, the lower surface of the liquid recovery unit 23 is substantially parallel to the XY plane. In the present embodiment, the lower surface and the lower surface 24 of the liquid recovery unit 23 are disposed in the same plane (they are flush).

  Note that the lower surface of the liquid recovery unit 23 may be disposed on the + Z side with respect to the lower surface 24, or may be disposed on the −Z side. The lower surface of the liquid recovery unit 23 may be inclined with respect to the lower surface 24, or may include a curved surface.

  In the present embodiment, the recovery operation of the liquid LQ from the liquid recovery unit 23 is executed in parallel with the supply operation of the liquid LQ from the liquid supply unit 33, so that the terminal optical element 13 on one side and the liquid immersion unit are immersed. An immersion space LS is formed with the liquid LQ between the member 5 and the substrate P (object) on the other side.

  A part of the interface LG of the liquid LQ in the liquid immersion space LS is formed between the liquid immersion member 5 and the substrate P (object). In the example shown in FIGS. 2, 3, and 4, the interface LG is formed between the first member 21 and the substrate P (object).

 Further, a part of the interface LG of the liquid LQ in the liquid immersion space LS is formed between the liquid immersion member 5 and the last optical element 13. In the example shown in FIGS. 2, 3, and 4, the interface LG is formed between the first member 21 and the last optical element 13.

  In the following description, the interface LG of the liquid LQ formed between the first member 21 and the substrate P (object) is appropriately referred to as a first interface LG1, and is defined between the first member 21 and the last optical element 13. The interface LG of the liquid LQ formed in the above is appropriately referred to as a second interface LG2.

 As will be described later, in the state where the immersion space LS is formed, an interface LG of the liquid LQ may be formed between the first member 21 and the second member 22, or the second member 22 may be formed. In some cases, an interface LG of the liquid LQ is formed between the substrate and the substrate P (object).

  Next, an example of the operation of the second member 22 will be described. The second member 22 is movable independently of the substrate P (object).

 The second member 22 may be moved in a state where the immersion space LS is formed. The second member 22 may be moved in a state where the liquid LQ in the immersion space LS is in contact. The second member 22 may be moved in a state where the liquid LQ exists in the first space SP1 and the second space SP2. The second member 22 may be moved in a state where a part of the second member 22 is disposed in the immersion space LS (a state where the second member 22 is immersed in the liquid LQ of the immersion space LS). The second member 22 may be moved in a state where the entire second member 22 is disposed in the immersion space LS (a state where the second member 22 is used for the liquid LQ in the immersion space LS).

 The second member 22 may be moved in a state where the second member 22 and the substrate P (object) do not face each other. The second member 22 may be moved in a state where no object exists below the second member 22.

 The second member 22 may be moved in a state where the liquid LQ does not exist in the space between the second member 22 and the substrate P (object). The second member 22 may be moved in a state where the immersion space LS is not formed.

  The second member 22 may be moved in parallel with at least a part of the period in which the exposure light EL is emitted from the emission surface 12. The second member 22 may be moved in parallel with at least a part of the period in which the exposure light EL is emitted from the emission surface 12 in a state where the immersion space LS is formed.

 The second member 22 may be moved in cooperation with the movement of the substrate P (object). The second member 22 may be moved in parallel with at least a part of the movement of the substrate P (object). The second member 22 may be moved in at least a part of the period during which the substrate P (object) moves. The second member 22 may be moved in parallel with at least a part of the period during which the substrate P (object) moves in the state where the immersion space LS is formed.

  The second member 22 may be moved based on the movement condition of the substrate P (object). The control device 6 may move the second member 22 in parallel with at least a part of the movement of the substrate P (object) based on the movement condition of the substrate P (object). The control device 6 moves the second member 22 while supplying the liquid LQ from the liquid supply unit 33 and recovering the liquid LQ from the liquid recovery unit 23 so that the immersion space LS is continuously formed. Also good.

 The 2nd member 22 may be moved so that relative movement with substrate P (object) may become small. The second member 22 may be moved so that the relative movement between the second member 22 and the substrate P (object) is smaller than the relative movement between the first member 21 and the substrate P (object). For example, the second member 22 may be moved in synchronization with the substrate P (object).

 The relative movement includes at least one of relative velocity and relative acceleration. For example, the second member 22 may be moved so that the relative speed with respect to the substrate P (object) is reduced in a state where the immersion space LS is formed. The second member 22 may be moved so that the relative acceleration with respect to the substrate P (object) becomes small in a state where the immersion space LS is formed. The second member 22 moves so that the relative speed between the substrate P (object) and the relative speed between the first member 21 and the substrate P (object) is smaller in a state where the immersion space LS is formed. May be. The second member 22 moves so that the relative acceleration between the substrate P (object) and the first member 21 and the substrate P (object) is smaller than that in the state where the immersion space LS is formed. May be.

  The second member 22 may be moved in the moving direction of the substrate P (object), for example. For example, the second member 22 may be moved in the moving direction of the substrate P during at least a part of the period in which the substrate P moves. For example, when the substrate P (object) moves in one direction (for example, + X direction or −X direction) in the XY plane, the second member 22 moves in the movement direction (+ X direction or −X direction) of the substrate P (object). It may be moved. For example, when the substrate P moves in one direction (for example, + X direction) in the XY plane, the second member 22 is moved in one direction (+ X direction) in the XY plane in synchronization with the movement of the substrate P. May be.

 Further, when the substrate P (object) moves in the + Y direction (or -Y direction) while moving in the + X direction, the second member 22 may be moved in the + X direction. Further, when the substrate P (object) moves in the + Y direction (or -Y direction) while moving in the −X direction, the second member 22 may be moved in the −X direction. That is, when the substrate P (object) moves in a certain direction including a component in the X-axis direction, the second member 22 may be moved in the X-axis direction. For example, the second member 22 may be moved in the X-axis direction in parallel with at least part of the movement of the substrate P (object) in a certain direction including the component in the X-axis direction.

 Note that the second member 22 may be moved in the Y-axis direction. When the substrate P (object) moves in a certain direction including a component in the Y-axis direction, the second member 22 may be moved in the Y-axis direction. For example, the second member 22 is set so that the relative speed with respect to the substrate P (object) decreases in parallel with at least a part of the movement of the substrate P (object) in a certain direction including the component in the Y-axis direction. It may move in the axial direction.

 FIG. 7 is a diagram illustrating an example of a state in which the second member 22 moves. FIG. 7 is a view of the liquid immersion member 5 as viewed from the lower side (−Z side).

 In the following description, the second member 22 is moved in the X-axis direction. As described above, the second member 22 may move in the Y-axis direction, or may move in any direction within the XY plane including the component in the X-axis direction (or Y-axis direction). .

 When the substrate P (object) moves in the X-axis direction (or a predetermined direction in the XY plane including the component in the X-axis direction), the second member 22 is as shown in FIGS. 7A to 7C. Next, it moves in the X-axis direction.

  In the present embodiment, the second member 22 is movable within a movable range (movable range) defined with respect to the X-axis direction. FIG. 7A shows a state in which the second member 22 is disposed at the most −X side end of the movable range. FIG. 7B shows a state in which the second member 22 is arranged at the center of the movable range. FIG. 7C shows a state in which the second member 22 is disposed at the end on the most + X side of the movable range.

  In the following description, the position of the second member 22 shown in FIG. 7A is appropriately referred to as a first end position, and the position of the second member 22 shown in FIG. The position of the second member 22 shown in FIG. 7C is appropriately referred to as a second end portion position. The state in which the second member 22 is disposed at the center position includes a state in which the second member 22 is disposed at the origin.

 In the present embodiment, the dimension of the opening 35 is determined based on the dimension of the movable range of the second member 22 so that the exposure light EL from the emission surface 12 passes through the opening 35. The dimension of the movable range of the second member 22 includes the distance between the first end position and the second end position in the X-axis direction. Even if the second member 22 moves in the X-axis direction, the dimension of the opening 35 in the X-axis direction is determined so that the exposure light EL from the emission surface 12 is not irradiated onto the second member 22.

  In FIG. 7, the dimension W35 of the opening 35 in the X-axis direction is larger than the sum of the dimension Wpr of the exposure light EL (projection region PR) and the dimension (Wa + Wb) of the movable range of the second member 22. The dimension W35 is set to a size that does not block the exposure light EL from the exit surface 12 even when the second member 22 moves between the first end position and the second end position. Thereby, even if the second member 22 moves, the exposure light EL from the emission surface 12 can be irradiated to the substrate P (object) without being blocked by the second member 22.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  At a substrate exchange position away from the liquid immersion member 5, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. The measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5 at least during a period in which the substrate stage 2 is separated from the liquid immersion member 5. The control device 6 supplies the liquid LQ from the liquid supply unit 33 and recovers the liquid LQ from the liquid recovery unit 23 to form the immersion space LS on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 causes the last optical element 13 and the liquid immersion member 5 to face the substrate stage 2 (substrate P). Then, the substrate stage 2 is moved. In the state where the last optical element 13 and the liquid immersion member 5 and the substrate stage 2 (substrate P) face each other, the liquid LQ is recovered from the liquid recovery unit 23 in parallel with the supply of the liquid LQ from the liquid supply unit 33. As a result, an immersion space LS is formed between the last optical element 13 and the immersion member 5 and the substrate stage 2 (substrate P) so that the optical path K is filled with the liquid LQ.

 The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS is formed on the substrate P. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P via the projection optical system PL and the liquid LQ in the immersion space LS between the emission surface 12 and the substrate P. Accordingly, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS between the emission surface 12 of the last optical element 13 and the substrate P, and the pattern of the mask M Are projected onto the substrate P.

   The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction.

  FIG. 8 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S that are exposure target areas are arranged in a matrix on the substrate P. The control device 6 moves the substrate P held by the first holding unit in the Y-axis direction (scanning direction) with respect to the exposure light EL emitted from the exit surface 12 of the last optical element 13, and then exits the exit surface. Each of the plurality of shot regions S of the substrate P is sequentially exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS between the substrate 12 and the substrate P.

 For example, in order to expose one shot region S of the substrate P, the control device 6 performs exposure light EL (projection region of the projection optical system PL) emitted from the emission surface 12 in a state where the immersion space LS is formed. (PR), the substrate P is moved in the Y-axis direction, and the mask M is moved in the Y-axis direction with respect to the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. Meanwhile, the exposure light EL is irradiated onto the shot region S via the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P. Thereby, an image of the pattern of the mask M is projected onto the shot area S, and the shot area S is exposed with the exposure light EL emitted from the emission surface 12.

 After the exposure of the shot area S is completed, the control device 6 moves the substrate P to the Y axis in the XY plane in the state where the immersion space LS is formed in order to start the exposure of the next shot area S. In a direction intersecting with (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) and the next shot area S is moved to the exposure start position. Thereafter, the control device 6 starts exposure of the shot area S.

   In the state where the immersion space LS is formed on the substrate P (substrate stage 2), the control device 6 sets the shot region with respect to the position (projection region PR) irradiated with the exposure light EL from the emission surface 12. An operation of exposing the shot area while moving in the Y-axis direction, and after the exposure of the shot area, the next shot area is exposed in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The substrate P is moved in a direction intersecting the Y-axis direction in the XY plane (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) so as to be arranged at the start position. Each of the plurality of shot areas of the substrate P is sequentially exposed while repeating the operation.

   In the following description, in order to expose the shot area, a position (projection area) where the exposure light EL from the emission surface 12 is irradiated in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The operation of moving the substrate P (shot region) in the Y-axis direction with respect to (PR) is appropriately referred to as a scan movement operation. In addition, after the exposure of a certain shot area, in the state where the immersion space LS is formed on the substrate P (substrate stage 2) and before the exposure of the next shot area is started, in the XY plane The operation of moving the substrate P is appropriately referred to as a step movement operation.

  In the present embodiment, the scan movement operation includes an operation in which the substrate P moves in the Y-axis direction from a state in which a certain shot region S is arranged at the exposure start position to a state in which the shot area S is arranged at the exposure end position. In the step movement operation, the substrate P intersects with the Y-axis direction in the XY plane from a state where a certain shot area S is arranged at the exposure end position to a state where the next shot area S is arranged at the exposure start position. Includes movement in the direction.

  The exposure start position includes the position of the substrate P when one end of the shot area S in the Y-axis direction passes through the projection area PR for exposure of the shot area S. The exposure end position includes the position of the substrate P when the other end portion in the Y-axis direction of the shot area S irradiated with the exposure light EL passes through the projection area PR.

 The exposure start position of the shot area S includes a scan movement operation start position for exposing the shot area S. The exposure start position of the shot area S includes a step movement operation end position for arranging the shot area S at the exposure start position.

 The exposure end position of the shot area S includes a scan movement operation end position for exposing the shot area S. The exposure end position of the shot area S includes a step movement operation start position for placing the next shot area S at the exposure start position after the exposure of the shot area S is completed.

  In the following description, a period during which the scan movement operation is performed for exposure of a certain shot area S is appropriately referred to as a scan movement period. In the following description, a period during which the step movement operation is performed for the start of exposure of the next shot area S from the end of exposure of a certain shot area S is appropriately referred to as a step movement period.

  The scan movement period includes an exposure period from the start of exposure of a certain shot area S to the end of exposure. The step movement period includes a movement period of the substrate P from the end of exposure of a certain shot area S to the start of exposure of the next shot area S.

  In the scan movement operation, the exposure light EL is emitted from the emission surface 12. In the scan movement operation, the exposure light EL is irradiated to the substrate P (object). In the step movement operation, the exposure light EL is not emitted from the emission surface 12. In the step movement operation, the exposure light EL is not irradiated onto the substrate P (object).

 The control device 6 sequentially exposes each of the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation. The scan movement operation is a constant speed movement mainly in the Y-axis direction. The step movement operation includes acceleration / deceleration movement. For example, the step movement operation from the end of exposure of a certain shot area S to the start of exposure of the next shot area S includes one or both of acceleration / deceleration movement in the Y-axis direction and acceleration / deceleration movement in the X-axis direction.

 In at least a part of the scan movement operation and the step movement operation, at least a part of the immersion space LS may be formed on the substrate stage 2 (cover member T). In at least part of the scan movement operation and the step movement operation, the immersion space LS may be formed so as to straddle the substrate P and the substrate stage 2 (cover member T). When the substrate P is exposed with the substrate stage 2 and the measurement stage 3 approaching or in contact with each other, the immersion space LS is formed in the substrate stage 2 (cover member T) in at least a part of the scan movement operation and the step movement operation. And the measurement stage 3 may be formed.

  The control device 6 moves the substrate P (substrate stage 2) by controlling the drive system 15 based on the exposure conditions of the plurality of shot regions S on the substrate P. The exposure conditions for the plurality of shot areas S are defined by, for example, exposure control information called an exposure recipe. The exposure control information is stored in the storage device 7.

  The exposure conditions (exposure control information) include arrangement information of the plurality of shot areas S (positions of the plurality of shot areas S on the substrate P). The exposure condition (exposure control information) includes dimension information (dimension information about the Y-axis direction) of each of the plurality of shot regions S.

 Based on the exposure conditions (exposure control information) stored in the storage device 7, the control device 6 sequentially exposes each of the plurality of shot regions S while moving the substrate P under a predetermined movement condition. The movement condition of the substrate P (object) includes at least one of movement speed, acceleration, movement distance, movement direction, and movement locus in the XY plane.

  As an example, in the present embodiment, the control device 6 uses the substrate stage so that the projection region PR of the projection optical system PL and the substrate P relatively move along the movement locus indicated by the arrow Sr in FIG. The projection region PR is irradiated with the exposure light EL while moving 2, and each of the plurality of shot regions S is sequentially exposed with the exposure light EL via the liquid LQ. The control device 6 sequentially exposes each of the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation.

  After each of the plurality of shot areas S of the substrate P is sequentially exposed, the substrate stage 2 is moved to the substrate exchange position, and the exposed substrate P is unloaded from the substrate stage 2 (first holding unit). Processing is performed.

  Thereafter, the above processing is repeated, and a plurality of substrates P are sequentially exposed.

  In the present embodiment, the second member 22 moves in at least a part of the exposure processing of the substrate P. For example, the second member 22 moves in parallel with at least a part of the step movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS is formed. For example, the second member 22 moves in parallel with at least a part of the scanning movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS is formed. In parallel with the movement of the second member 22, the exposure light EL is emitted from the emission surface 12. Note that the second member 22 does not have to move during the scan movement operation. That is, the second member 22 may not move in parallel with the emission of the exposure light EL from the emission surface 12. For example, when the substrate P (substrate stage 2) performs a step movement operation, the second member 22 moves so that the relative movement (relative speed, relative acceleration) with the substrate P (substrate stage 2) is small. Good. Further, when the substrate P (substrate stage 2) performs the scanning movement operation, the second member 22 moves so that the relative movement (relative speed, relative acceleration) with the substrate P (substrate stage 2) becomes small. Also good.

  FIG. 9 schematically illustrates an example of the movement trajectory of the substrate P when the shot area Sa, the shot area Sb, and the shot area Sc are sequentially exposed while performing step movement on the substrate P including a component in the + X direction. FIG. The shot areas Sa, Sb, and Sc are arranged in the X-axis direction.

  As shown in FIG. 9, when the shot areas Sa, Sb, and Sc are exposed, the substrate P is located under the last optical element 13 from the position d1 to the position d2 adjacent to the position d1 on the + Y side. Path Tp1, path Tp2 from position d2 to position d3 adjacent to + X side with respect to position d2, path Tp3 from position d3 to position d4 adjacent to −Y side with respect to position d3, and from position d4 to The path Tp4 from the position d4 to the position d5 adjacent to the + X side and the path Tp5 from the position d5 to the position d6 adjacent to the position +5 on the + Y side are sequentially moved. The positions d1, d2, d3, d4, d5, and d6 are positions in the XY plane.

  At least a part of the path Tp1 is a straight line parallel to the Y axis. At least a part of the path Tp3 is a straight line parallel to the Y axis. At least a part of the path Tp5 includes a straight line parallel to the Y axis. The path Tp2 includes a curve passing through the position d2.5. The path Tp4 includes a curve passing through the position d4.5. The position d1 includes the start point of the path Tp1, and the position d2 includes the end point of the path Tp1. The position d2 includes the start point of the path Tp2, and the position d3 includes the end point of the path Tp2. The position d3 includes the start point of the path Tp3, and the position d4 includes the end point of the path Tp3. The position d4 includes the start point of the path Tp4, and the position d5 includes the end point of the path Tp4. The position d5 includes the start point of the path Tp5, and the position d6 includes the end point of the path Tp5. The path Tp1 is a path along which the substrate P moves in the + Y direction. The path Tp3 is a path along which the substrate P moves in the −Y direction. The path Tp5 is a path along which the substrate P moves in the + Y direction. The path Tp2 and the path Tp4 are paths along which the substrate P moves in a direction whose main component is the + direction.

  When the substrate P moves along the path Tp1 in the state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sa through the liquid LQ. When the substrate P moves along the path Tp3 in a state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sb through the liquid LQ. When the substrate P moves along the path Tp5 in a state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sc through the liquid LQ. When the substrate P moves along the path Tp2 and the path Tp4, the exposure light EL is not irradiated.

 Each of the movement of the substrate P along the path Tp1, the movement along the path Tp3, and the movement along the path Tp5 includes a scanning movement operation. Each of the operation of moving the substrate P along the path Tp2 and the operation of moving along the path Tp4 includes a step movement operation.

  That is, the period during which the substrate P moves along the path Tp1, the period during which the path Tp3 moves, and the period during which the substrate P moves along the path Tp5 are scan movement periods (exposure periods). Each of the period during which the substrate P moves along the path Tp2 and the period during which the substrate P moves along the path Tp4 is a step movement period.

 FIG. 10 is a schematic diagram illustrating an example of the operation of the second member 22. FIG. 10 is a view of the second member 22 as viewed from the upper surface 25 side. When the substrate P is at the position d1, the second member 22 is disposed at the position shown in FIG. 10A with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d2, the second member 22 is disposed at the position shown in FIG. 10B with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scan movement operation from the position d1 to the position d2 of the substrate P, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P. When the substrate P is at the position d2.5, the second member 22 is disposed at the position shown in FIG. 10C with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d3, the second member 22 is disposed at the position shown in FIG. 10D with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the step movement operation from the position d2 to the position d3 of the substrate P, the second member 22 moves in the + X direction that is the same as the step movement direction (+ X direction) of the substrate P. When the substrate P is at the position d4, the second member 22 is disposed at the position shown in FIG. 10E with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scanning movement operation from the position d3 to the position d4 of the substrate P, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P. When the substrate P is at the position d4.5, the second member 22 is disposed at the position shown in FIG. 10F with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d5, the second member 22 is disposed at the position shown in FIG. 10G with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the step movement operation from the position d4 to the position d5 of the substrate P, the second member 22 moves in the same + X direction as the step movement direction (+ X direction) of the substrate P. When the substrate P is at the position d6, the second member 22 is disposed at the position shown in FIG. 10H with respect to the projection region PR (the optical path K of the exposure light EL). In other words, during the scanning movement of the substrate P from the position d5 to the position d6, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P.

 In the present embodiment, the position of the second member 22 shown in FIGS. 10 (A), 10 (D), and 10 (G) includes the second end position. The position of the second member 22 shown in FIGS. 10B, 10E, and 10H includes the first end position. The position of the second member 22 shown in FIGS. 10C and 10F includes the center position.

 In the following description, the position of the second member 22 shown in FIGS. 10 (A), 10 (D), and 10 (G) is the second end position, and FIGS. The position of the second member 22 shown in FIGS. 10 (E) and 10 (H) is the first end position, and the position of the second member 22 shown in FIGS. 10 (C) and 10 (F) is The center position.

  When the substrate P moves along the path Tp1, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 10A to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position. When the substrate P moves along the path Tp2, the second member 22 changes from the state shown in FIG. 10 (B) to the state shown in FIG. 10 (D) through the state shown in FIG. 10 (C). Move in the direction. That is, the second member 22 moves from the first end position to the second end position through the center position. When the substrate P moves along the path Tp3, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 10D to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position. When the substrate P moves along the path Tp4, the second member 22 changes from the state shown in FIG. 10 (E) to the state shown in FIG. 10 (G) through the state shown in FIG. 10 (F). Move in the direction. That is, the second member 22 moves from the first end position to the second end position through the center position. When the substrate P moves along the path Tp5, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 10G to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position.

  That is, in the present embodiment, the second member 22 moves in the + X direction so that the relative movement with the substrate P becomes small in at least a part of the period in which the substrate P moves along the path Tp2. In other words, the second member 22 moves in the + X direction so that the relative speed with respect to the substrate P in the X-axis direction becomes small during at least a part of the period during which the substrate P includes a + X direction component. To do. Similarly, the second member 22 moves in the + X direction so that the relative speed with respect to the substrate P in the X-axis direction becomes small in at least part of the period in which the substrate P moves along the path Tp4.

  In the present embodiment, the second member 22 moves in the −X direction during at least a part of the period in which the substrate P moves along the path Tp3. Thereby, after the movement of the path Tp3 of the substrate P, in the movement of the path Tp4, the exposure light EL can pass through the opening 35 even if the second member 22 moves in the + X direction. The same applies when the substrate P moves along the paths Tp1 and Tp5.

 That is, when the substrate P repeats the scan movement operation and the step movement operation including the component in the + X direction, the second member 22 is positioned at the first end position so that the relative speed with respect to the substrate P is reduced during the step movement operation. The second member 22 moves from the second end position so that the second member 22 can move again in the + X direction during the next step movement operation during the scan movement operation. Return to the first end position. In other words, since the second member 22 moves in the −X direction during at least a part of the period during which the substrate P performs the transscan movement operation, the size of the opening 35 is minimized.

 In the example described with reference to FIGS. 9 and 10, the second member 22 is disposed at the second end position when the substrate P is at the positions d1, d3, and d5. When the board | substrate P exists in position d1, d3, d5, the 2nd member 22 may be arrange | positioned between a 2nd edge part position and a center position, and may be arrange | positioned in a center position.

 In the example described with reference to FIGS. 9 and 10, the second member 22 is disposed at the first end position when the substrate P is at the positions d2, d4, and d6. When the board | substrate P exists in position d2, d4, d6, the 2nd member 22 may be arrange | positioned between a 1st edge part position and a center position, and may be arrange | positioned in a center position.

  In the present embodiment, when the substrate P is at the positions d2.5 and d4.5, the second member 22 may be disposed at a position different from the center position. That is, when the substrate P is at the positions d2.5 and d4.5, the second member 22 may be disposed, for example, between the first end position and the center position, or the second end position. You may arrange | position between center positions.

 According to the present embodiment, since the second member 22 moves below the first member 21, even if the substrate P (object) moves in the XY plane with the immersion space LS formed, for example, The liquid LQ is prevented from flowing out of the space between the liquid immersion member 5 and the object, or the liquid LQ remaining on the object.

 As described above, in the present embodiment, the second member 22 is determined in advance so that the exposure light EL from the emission surface 12 is irradiated to the substrate P (object) without being blocked by the second member 22. Move the movable range. The liquid recovery unit 23 is disposed on the first member 21, and the position of the second member 22 relative to the liquid recovery unit 23 is changed by the movement of the second member 22.

  The present inventor has found that the liquid recovery condition of the liquid recovery unit 23 varies depending on the relative position between the liquid recovery unit 23 and the second member 22. The liquid recovery conditions of the liquid recovery unit 23 are the difficulty (ease) of liquid recovery by the liquid recovery unit 23, the inflow condition of the liquid LQ from the first space SP1 to the liquid recovery unit 23, and the liquid recovery from the second space SP2. It includes at least one of the inflow conditions of the liquid LQ to the part 23.

 That is, the present inventor has found that the difficulty (easyness) of liquid recovery by the liquid recovery unit 23 varies depending on the relative position between the liquid recovery unit 23 and the second member 22. Further, the present inventor determines the inflow condition of the liquid LQ from the first space SP1 to the liquid recovery unit 23 and the liquid from the second space SP2 to the liquid recovery unit 23 depending on the relative position between the liquid recovery unit 23 and the second member 22. The knowledge that at least one of the inflow conditions of LQ changes was obtained.

  Further, the present inventor has obtained the knowledge that the liquid recovery condition of the liquid recovery unit 23 varies depending on the structure of the second member 22. That is, the present inventor has obtained the knowledge that the difficulty of liquid recovery by the liquid recovery unit 23 varies depending on the structure of the second member 22. Further, the inventor has at least one of the inflow condition of the liquid LQ from the first space SP1 to the liquid recovery part 23 and the inflow condition of the liquid LQ from the second space SP2 to the liquid recovery part 23 by the structure of the second member 22. The knowledge that changes.

 FIG. 11 is a diagram for explaining the relationship between the liquid recovery unit 23 and the second member 22. In FIG. 11, the second member 22 and the substrate P (object) face the liquid recovery unit 23. The lower surface 24 and the lower surface of the liquid recovery part 23 (the lower surface 39 of the porous member 38) are disposed in the same plane (they are flush). The upper surface 25 and the lower surface 26 are substantially parallel. The lower surface 24 and the lower surface 39 and the upper surface 25 and the lower surface 26 are substantially parallel. The lower surface 24, the lower surface 39, the upper surface 25, and the lower surface 26 are substantially parallel to the XY plane. The outer surface 42 of the second member 22 is substantially parallel to the Z axis (the optical axis AX of the terminal optical element 13). The angle formed by the outer side surface 42 and the upper surface 25 is substantially 90 degrees. The angle formed by the outer side surface 42 and the lower surface 26 is substantially 90 degrees.

 The inventor has measured the dimension Zu of the gap between the lower surface 24 (lower surface 39) of the first member 21 and the upper surface 25 of the second member 22, and the gap between the lower surface 26 of the second member 22 and the upper surface of the substrate P (object). The dimension Zd, the dimension Zt between the upper surface 25 and the lower surface 26 of the second member 22, and the inner edge of the liquid recovery part 23 and the first edge in the radiation direction with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). It has been found that the liquid recovery conditions of the liquid recovery unit 23 change depending on at least one of the distances U from the outer edges of the two members 22.

 The dimension Zt is a distance between the upper surface 25 and the lower surface 26 of the second member 22. In other words, the dimension Zt is the thickness of the second member 22. The dimension Zt is a value obtained by subtracting the dimension Zu and the dimension Zd from the dimension Za of the gap between the lower surface 24 of the first member 21 and the upper surface of the substrate P (object). The dimension Za is the dimension of the gap between the emission surface 12 and the upper surface of the substrate P (object) (working distance), and the liquid recovery capability (suction) of the liquid recovery unit 23 for recovering the liquid LQ on the substrate P (object). Force).

  The inner edge of the liquid recovery part 23 is the optical path K (lower surface 24) with respect to the radiation direction with respect to the optical path K among the plurality of holes 37 (liquid recovery ports) through which the liquid LQ on the lower surface 39 side can flow into the recovery channel 37R. And the portion where the hole 37 (liquid recovery port) closest to is disposed. The outer edge of the second member 22 includes a portion of the second member 22 that is farthest from the optical path K (the inner edge of the liquid recovery unit 23) in the radiation direction with respect to the optical path K. The outer edge of the second member 22 includes at least a part of the outer edge (peripheral region) of the upper surface 25, the outer surface 42, and the outer edge (peripheral region) of the lower surface 26.

 In addition, the inventor has determined that the liquid recovery condition of the liquid recovery unit 23 changes according to at least one of the shape of the outer edge of the second member 22 and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ. I found it. The shape of the outer edge of the second member 22 includes one or both of an angle θu formed by the upper surface 25 and the outer surface 42 and an angle θd formed by the lower surface 26 and the outer surface 42. The contact angle of the outer edge of the second member 22 to the liquid LQ is the contact angle of the outer surface 42 to the liquid LQ, the contact angle of the outer edge (peripheral region) of the upper surface 25 to the liquid LQ, and the outer edge of the lower surface 26 to the liquid LQ. It includes at least one of the contact angles of (peripheral region).

  The inventor has found that the difficulty of liquid recovery by the liquid recovery unit 23 varies depending on the dimension Zd. For example, when the substrate P (object) moves in the XY plane in a state where the immersion space LS is formed, the possibility that the liquid LQ is thinned on the substrate P increases as the dimension Zd decreases. It is difficult for the thinned liquid LQ on the substrate P to come into contact with the liquid recovery unit 23. As a result, it becomes difficult for the liquid recovery unit 23 to recover the liquid LQ on the substrate P.

  The inventor has also found that the difficulty of liquid recovery by the liquid recovery unit 23 varies depending on the dimension Zu. For example, the larger the dimension Zu, the more difficult it is for the liquid LQ (liquid LQ on the substrate P) from the second space SP2 to come into contact with the liquid recovery unit 23. As a result, it is difficult for the liquid recovery unit 23 to recover the liquid LQ (liquid LQ on the substrate P) from the second space SP2.

  The inventor has also found that the difficulty of liquid recovery by the liquid recovery unit 23 varies depending on the dimension Zt. For example, the larger the dimension Zt, the more difficult it is for the liquid LQ from the second space SP2 (the liquid LQ on the substrate P) to come into contact with the liquid recovery unit 23. As a result, it is difficult for the liquid recovery unit 23 to recover the liquid LQ (liquid LQ on the substrate P) from the second space SP2.

  In addition, the present inventor has found that the difficulty of liquid recovery by the liquid recovery unit 23 varies with the distance U. For example, the larger the distance U, the more difficult it is for the liquid LQ (liquid LQ on the substrate P) from the second space SP2 to come into contact with the liquid recovery unit 23. Further, as the distance U increases, the liquid LQ in the second space SP2 flows into the first space SP1 (the liquid LQ in the second space SP2 and the liquid LQ in the first space SP1 merge), and the second It becomes difficult for the liquid LQ in the space SP2 to flow into the liquid recovery unit 23. As a result, it becomes difficult for the liquid recovery unit 23 to recover the liquid LQ from the second space SP2.

  Further, the present inventor says that the difficulty of liquid recovery by the liquid recovery unit 23 varies depending on one or both of the angle θu formed by the upper surface 25 and the outer surface 42 and the angle θd formed by the lower surface 26 and the outer surface 42. Obtained knowledge. For example, as at least one of the angle θu and the angle θd is smaller (a sharper angle), the liquid LQ from the second space SP2 (the liquid LQ on the substrate P) becomes more difficult to contact the liquid recovery unit 23. Further, as at least one of the angle θu and the angle θd is smaller (a sharper angle), the liquid LQ in the second space SP2 flows into the first space SP1 (the liquid LQ in the second space SP2 and the liquid in the first space SP1). It becomes difficult for the liquid LQ in the second space SP2 to flow into the liquid recovery part 23. As a result, it becomes difficult for the liquid recovery unit 23 to recover the liquid LQ from the second space SP2.

  The inventor has also found that the difficulty of liquid recovery by the liquid recovery unit 23 varies depending on the contact angle of the outer edge of the second member 22 with respect to the liquid LQ. For example, the larger the contact angle of the outer edge of the second member 22 with respect to the liquid LQ (the more liquid repellent), the more the liquid LQ from the second space SP2 (the liquid LQ on the substrate P) contacts the liquid recovery unit 23. It becomes difficult. Further, as at least one of the angle θu and the angle θd is smaller (a sharper angle), the liquid LQ in the second space SP2 flows into the first space SP1 (the liquid LQ in the second space SP2 and the liquid in the first space SP1). It becomes difficult for the liquid LQ in the second space SP2 to flow into the liquid recovery part 23. As a result, it becomes difficult for the liquid recovery unit 23 to recover the liquid LQ from the second space SP2.

 In addition, the inventor determines at least one of the distance U, the shape of the outer edge of the second member 22 (one or both of the angle θu and the angle θd), and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ. The inventor obtained that the inflow condition of the liquid LQ from one or the other of the first space SP1 and the second space SP2 to the liquid recovery unit 23 changes. As described above, at least one of the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ causes the liquid LQ in the second space SP2 to be in the first space SP1. It becomes difficult for the liquid LQ in the second space SP2 and the liquid LQ in the first space SP1 to merge. In other words, due to at least one of the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ, the liquid LQ in the second space SP2 is the first space SP1. Without flowing through (without flowing into the first space SP1). That is, the liquid LQ in the second space SP2 flows into the first space SP1 by at least one of the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ. It is suppressed. Therefore, for example, the liquid LQ existing in the second space SP <b> 2 is prevented from coming into contact with the lower surface 24 of the first member 21 or the upper surface 25 of the second member 22. The liquid LQ in the second space SP2 is highly likely to be the liquid LQ in contact with the substrate P. Due to the substrate P, the liquid LQ in the second space SP2 may be contaminated. For example, foreign matter may be released (eluted) from the substrate P to the liquid LQ. By suppressing the liquid LQ in the second space SP2 from flowing into the first space SP1, it is possible to prevent the lower surface 24 of the first member 21 from being contaminated or the upper surface 25 of the second member 22 from being contaminated. Is done.

 As described above, at least one of the dimension Zu, the dimension Zd, the dimension Zt, the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ, 23 liquid recovery conditions change. Therefore, in the present embodiment, in the liquid immersion member 5, the dimension Zu, the dimension Zd, and the like so that the liquid LQ from at least one of the first space SP1 and the second space SP2 can be recovered well from the liquid recovery unit 23. At least one of the dimension Zt, the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined.

  FIG. 12 shows an example of the liquid immersion member 5. FIG. 12 shows the dimension Zu, dimension Zd, dimension Zt, distance U, and the shape of the outer edge of the second member 22 so that the inflow of the liquid LQ from the second space SP2 to the first space SP1 occurs. , And at least one of the contact angles of the outer edge of the second member 22 with respect to the liquid LQ is determined. FIG. 12 also shows the dimensions Zu and Zd so that the liquid LQ from the second space SP2 to the first space SP1 is suppressed and the liquid LQ from the first space SP1 is recovered from the liquid recovery unit 23. , Dimension Zt, distance U, shape of outer edge of second member 22, and at least one of contact angle of outer edge of second member 22 with liquid LQ are shown.

 In the example shown in FIG. 12, the dimension Zu is not less than 0.5 mm and not more than 1.0 mm, the dimension Zd is not less than 0.2 mm and not more than 0.5 mm, and the distance U is not less than 5.0 mm and not more than 10.0 mm. is there. The dimension Zt is a value obtained by subtracting the dimension Zu and the dimension Zd from the dimension Za of the gap between the lower surface 24 of the first member 21 and the upper surface of the substrate P (object).

 The angle θu is substantially 90 degrees, and the angle θd is substantially 90 degrees.

 The contact angle of the upper surface 25, the contact angle of the outer surface 42, and the contact angle of the lower surface 26 with respect to the liquid LQ are smaller than 90 degrees. That is, the upper surface 25, the outer surface 42, and the lower surface 26 are lyophilic with respect to the liquid LQ. The contact angle of the upper surface 25, the contact angle of the outer surface 42, and the contact angle of the lower surface 26 with respect to the liquid LQ may be smaller than 80 degrees or smaller than 70 degrees.

  The contact angle of the lower surface 24 with respect to the liquid LQ and the contact angle of the lower surface 39 are smaller than 90 degrees. That is, the lower surface 24 and the lower surface 39 are lyophilic with respect to the liquid LQ. The contact angle of the lower surface 24 and the contact angle of the lower surface 39 with respect to the liquid LQ may be smaller than 80 degrees or smaller than 70 degrees.

 In the example shown in FIG. 12, the interface LG11 of the liquid LQ is highly likely to be formed between the lower surface 39 and the upper surface 25. The interface LG12 of the liquid LQ is highly likely to be formed between the lower surface 26 and the upper surface of the substrate P (object).

 In the example shown in FIG. 12, it is difficult for the liquid LQ in the second space SP2 to flow into the first space SP1. That is, the inflow of the liquid LQ from the second space SP2 to the first space SP1 is suppressed. In addition, it is difficult for the liquid LQ in the second space SP2 to flow into the liquid recovery unit 23. That is, the inflow of the liquid LQ from the second space SP2 to the liquid recovery unit 23 is suppressed. The liquid recovery part 23 can recover the liquid LQ from the first space SP1. It is difficult for the liquid recovery unit 23 to recover the liquid LQ from the second space SP2.

  In the example shown in FIG. 12, the dimension Zu is larger than the dimension Zd, the distance U is large, and the angle θu and the angle θd are substantially 90 degrees. Therefore, it is difficult for the liquid recovery unit 23 to recover the liquid LQ from the second space SP2.

  In the example shown in FIG. 12, the upper surface 25, the outer surface 42, and the lower surface 26 are lyophilic with respect to the liquid LQ. Thereby, the liquid LQ flows smoothly in the first space SP1 and the second space SP2. Further, bubbles are suppressed from being generated in the liquid LQ in the first space SP1 and the second space SP2.

  In the example shown in FIG. 12, the liquid LQ in the second space SP2 is suppressed from flowing into the first space SP1. Therefore, even if the liquid LQ is contaminated in the second space SP2, the contaminated liquid LQ is suppressed from flowing into the first space SP1. Therefore, for example, contact of one or both of the lower surface 24 and the upper surface 25 with the contaminated liquid LQ is suppressed.

  FIG. 13 shows an example of the liquid immersion member 5. FIG. 13 shows the dimensions Zu, Zd, and dimensions so that the liquid LQ from the first space SP1 is recovered from the liquid recovery part 23 and the liquid LQ from the second space SP2 is recovered from the liquid recovery part 23. An example is shown in which at least one of Zt, distance U, the shape of the outer edge of the second member 22 and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. FIG. 13 shows the dimension Zu, dimension Zd, dimension Zt, distance U, the shape of the outer edge of the second member 22, and the shape of the liquid LQ so that the liquid LQ flows from the second space SP2 into the first space SP1. An example in which at least one contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined will be shown. FIG. 13 also shows the dimensions Zu, Zd, Zt, distance U, and the second member 22 so that the liquid LQ from the second space SP2 is recovered from the liquid recovery unit 23 via the first space SP1. An example is shown in which at least one of the shape of the outer edge and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined.

 In the example shown in FIG. 13, the dimension Zu is not less than 0.5 mm and not more than 1.0 mm, the dimension Zd is not less than 0.2 mm and not more than 0.5 mm, and the distance U is not less than 0.5 mm and not more than 1.0 mm. is there. The dimension Zt is a value obtained by subtracting the dimension Zu and the dimension Zd from the dimension Za of the gap between the lower surface 24 of the first member 21 and the upper surface of the substrate P (object).

 The angle θu is substantially 90 degrees, and the angle θd is substantially 90 degrees.

 The contact angle of the upper surface 25, the contact angle of the outer surface 42, and the contact angle of the lower surface 26 with respect to the liquid LQ are smaller than 90 degrees. That is, the upper surface 25, the outer surface 42, and the lower surface 26 are lyophilic with respect to the liquid LQ. The contact angle of the upper surface 25, the contact angle of the outer surface 42, and the contact angle of the lower surface 26 with respect to the liquid LQ may be smaller than 80 degrees or smaller than 70 degrees.

 The contact angle of the lower surface 24 with respect to the liquid LQ and the contact angle of the lower surface 39 are smaller than 90 degrees. That is, the lower surface 24 and the lower surface 39 are lyophilic with respect to the liquid LQ. The contact angle of the lower surface 24 and the contact angle of the lower surface 39 with respect to the liquid LQ may be smaller than 80 degrees or smaller than 70 degrees.

 In the example shown in FIG. 13, the interface LG11 of the liquid LQ is highly likely to be formed between the lower surface 39 and the outer edge of the upper surface 25. The interface LG12 of the liquid LQ is likely to be formed between the outer edge of the lower surface 26 and the upper surface of the substrate P (object). In the example shown in FIG. 13, the liquid LQ in the first space SP1 and the liquid LQ in the second space SP2 are connected, and the interface LG1 can be formed between the lower surface 39 and the upper surface of the substrate P (object). There is also sex.

 In the example shown in FIG. 13, the liquid LQ in the second space SP2 may flow into the first space SP1. Further, there is a possibility that the liquid LQ in the first space SP1 and the liquid LQ in the second space SP2 merge. In addition, the liquid LQ in the second space SP2 can flow into the liquid recovery unit 23. For example, the liquid LQ in the second space SP2 may merge with the liquid LQ in the first space SP1 and flow into the liquid recovery unit 23 together with at least a part of the liquid LQ in the first space SP1. The liquid recovery part 23 can recover the liquid LQ from the first space SP1. The liquid recovery part 23 can recover the liquid LQ from the second space SP2.

  In the example shown in FIG. 13, the dimension Zu is larger than the dimension Zd, and the angle θu and the angle θd are substantially 90 degrees. On the other hand, the distance U is small. Therefore, the liquid recovery unit 23 can recover the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2.

  In the example shown in FIG. 13, the upper surface 25, the outer surface 42, and the lower surface 26 are lyophilic with respect to the liquid LQ. Thereby, the liquid LQ flows smoothly in the first space SP1 and the second space SP2. Further, bubbles are suppressed from being generated in the liquid LQ in the first space SP1 and the second space SP2.

  FIG. 14 shows an example of the liquid immersion member 5. FIG. 14 shows the dimensions Zu, Zd, and dimensions so that the liquid LQ from the first space SP1 is recovered from the liquid recovery unit 23 and the liquid LQ from the second space SP2 is recovered from the liquid recovery unit 23. An example is shown in which at least one of Zt, distance U, the shape of the outer edge of the second member 22 and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. Further, FIG. 14 shows the dimension Zu, the dimension Zd, the dimension Zt, the distance U, and the outer edge of the second member 22 so that the inflow of the liquid LQ from the second space SP2 to the first space SP1 occurs. And an example in which at least one of the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. Further, FIG. 14 shows the dimension Zu, dimension Zd, dimension Zt, distance U, and the second member 22 so that the liquid LQ from the second space SP2 is recovered from the liquid recovery part 23 without passing through the first space SP1. An example in which at least one of the shape of the outer edge and the contact angle of the outer edge of the second member 22 to the liquid LQ is determined.

 In the example shown in FIG. 14, the dimension Zu is 0.2 mm or more and 0.5 mm or less, the dimension Zd is 0.2 mm or more and 0.5 mm or less, and the distance U is 5.0 mm or more and 10.0 mm or less. is there. The dimension Zt is a value obtained by subtracting the dimension Zu and the dimension Zd from the dimension Za of the gap between the lower surface 24 of the first member 21 and the upper surface of the substrate P (object).

  The lower surface 26 of the second member 22 includes a region 261 substantially perpendicular to the optical axis AX (Z axis) of the last optical element 13 and a region 261 with respect to the radiation direction with respect to the optical path K (optical axis AX) of the exposure light EL. And a region 262 that is inclined upward toward the outside with respect to the radial direction. The region 261 is substantially parallel to the XY plane. The angle θn formed by the region 261 and the region 262 is greater than 90 degrees (obtuse angle). In the following description, the region 262 is appropriately referred to as a slope 262.

  In the present embodiment, the dimension of the inclined surface 262 in the Z-axis direction is larger than the dimension of the outer surface 42. The outer side surface 42 is substantially parallel to the Z axis. The angle θm formed by the slope 262 and the outer surface 42 is greater than 90 degrees (obtuse angle).

 The outer surface 42 parallel to the Z axis may not be provided. The slope 262 and the upper surface 25 may be connected. In that case, the angle formed by the inclined surface 262 and the upper surface 25 is smaller than 90 degrees (a sharp angle).

 The contact angle of the upper surface 25 with respect to the liquid LQ, the contact angle of the outer surface 42, the contact angle of the inclined surface 262, and the contact angle of the region 261 are smaller than 90 degrees. That is, the upper surface 25, the outer surface 42, the inclined surface 262, and the region 261 are lyophilic with respect to the liquid LQ. In addition, the contact angle of the upper surface 25, the contact angle of the outer surface 42, the contact angle of the inclined surface 262, and the contact angle of the region 261 with respect to the liquid LQ may be smaller than 80 degrees or smaller than 70 degrees. .

 The contact angle of the lower surface 24 with respect to the liquid LQ and the contact angle of the lower surface 39 are smaller than 90 degrees. That is, the lower surface 24 and the lower surface 39 are lyophilic with respect to the liquid LQ. The contact angle of the lower surface 24 and the contact angle of the lower surface 39 with respect to the liquid LQ may be smaller than 80 degrees or smaller than 70 degrees.

 In the example shown in FIG. 14, the interface LG11 of the liquid LQ is highly likely to be formed between the lower surface 39 and the upper surface 25. The interface LG12 of the liquid LQ is highly likely to be formed between the lower surface 39 and the upper surface of the substrate P (object).

 In the example shown in FIG. 14, the liquid LQ in the second space SP2 is suppressed from flowing into the first space SP1. Further, the liquid LQ in the first space SP1 and the liquid LQ in the second space SP2 are prevented from joining. The liquid LQ from the second space SP2 can flow into the liquid recovery part 23 without passing through the first space SP1. The liquid LQ in the second space SP2 can flow into the liquid recovery part 23 without joining the liquid LQ in the first space SP1. The liquid recovery part 23 can recover the liquid LQ from the first space SP1. The liquid recovery part 23 can recover the liquid LQ from the second space SP2 without going through the first space SP1.

  In the example shown in FIG. 14, the dimension Zu and the dimension Zd are substantially equal, and the dimension Zu and the dimension Zd are small. Further, the distance U is large. In the present embodiment, a slope 262 is provided on the outer edge of the second member 22. Therefore, the liquid recovery unit 23 can recover the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2.

  In the example shown in FIG. 14, the upper surface 25, the outer surface 42, the inclined surface 262, and the region 261 are lyophilic with respect to the liquid LQ. Thereby, the liquid LQ flows smoothly in the first space SP1 and the second space SP2. Further, bubbles are suppressed from being generated in the liquid LQ in the first space SP1 and the second space SP2.

  FIG. 15 is a modification of FIG. The example shown in FIG. 15 is different from the example shown in FIG. 14 in that the upper surface 25 and the outer surface 42 are connected by a curved surface 42R. As shown in FIG. 15, part of the liquid LQ in the second space SP <b> 2 may enter between the upper surface 25 and the lower surface 39. By providing the curved surface 42R, the occurrence of the phenomenon that the liquid LQ stays between the upper surface 25 and the lower surface 39 (so-called pinning phenomenon) is suppressed.

  FIG. 16 shows an example of the liquid immersion member 5. FIG. 16 shows the dimensions Zu, Zd, and dimensions so that the liquid LQ from the first space SP1 is recovered from the liquid recovery part 23 and the liquid LQ from the second space SP2 is recovered from the liquid recovery part 23. An example is shown in which at least one of Zt, distance U, the shape of the outer edge of the second member 22 and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. Further, FIG. 16 shows the dimension Zu, the dimension Zd, the dimension Zt, the distance U, and the outer edge of the second member 22 so that the inflow of the liquid LQ from the second space SP2 to the first space SP1 occurs. And an example in which at least one of the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. In addition, FIG. 16 shows the dimension Zu, dimension Zd, dimension Zt, distance U, and the second member 22 so that the liquid LQ from the second space SP2 is recovered from the liquid recovery unit 23 without passing through the first space SP1. An example in which at least one of the shape of the outer edge and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined.

 In the example shown in FIG. 16, the dimension Zu is 0.2 mm or more and 0.5 mm or less, the dimension Zd is 0.2 mm or more and 0.5 mm or less, and the distance U is 5.0 mm or more and 10.0 mm or less. is there. The dimension Zt is a value obtained by subtracting the dimension Zu and the dimension Zd from the dimension Za of the gap between the lower surface 24 of the first member 21 and the upper surface of the substrate P (object).

  The lower surface 26 of the second member 22 includes a region 261 substantially perpendicular to the optical axis AX (Z axis) of the last optical element 13 and a region 261 with respect to the radiation direction with respect to the optical path K (optical axis AX) of the exposure light EL. And a region (slope) 262 that is inclined outwardly with respect to the radial direction. The region 261 is substantially parallel to the XY plane. The angle θn formed by the region 261 and the region 262 is greater than 90 degrees (obtuse angle). The dimension of the slope 262 in the Z-axis direction is larger than the dimension of the outer surface 42. The outer side surface 42 is substantially parallel to the Z axis. The angle θm formed by the slope 262 and the outer surface 42 is greater than 90 degrees (obtuse angle).

 The outer surface 42 parallel to the Z axis may not be provided. The slope 262 and the upper surface 25 may be connected. In that case, the angle formed by the inclined surface 262 and the upper surface 25 is smaller than 90 degrees (a sharp angle).

  The upper surface 25 of the second member 22 is disposed outside the region 251 with respect to the region 251 and the radiation direction with respect to the optical path K (optical axis AX) of the exposure light EL, and the lower surface 24 (lower surface 39) of the first member 21 relative to the region 251. ) Near the region 252. The region 252 is arranged on the + Z side with respect to the region 251. In other words, the region 252 is disposed at a higher position than the region 251. In the present embodiment, the dimension Zu is the dimension of the gap between the region 252 and the lower surface 39 (lower surface 24).

  Due to the upper surface 25 having the region 251 and the region 252, the first space SP1 has a portion SP1a in which the gap between the first member 21 and the second member 22 has the first dimension SP1a and the optical path K of the exposure light EL. And a portion SP1b having a second dimension in which the gap between the first member 21 and the second member 22 is smaller than the first dimension. The portion SP1a includes a space between the region 251 and the lower surface 24 (lower surface 39). The portion SP1b includes a space between the region 252 and the lower surface 24 (lower surface 39).

  In the present embodiment, at least a part of the liquid recovery unit 23 is disposed outside the part SP1b with respect to the optical path K of the exposure light EL.

  In the present embodiment, the region 252 is substantially parallel to the XY plane. The angle θu formed by the region 252 and the outer surface 42 is substantially 90 degrees. The region 252 and the outer surface 42 may be connected by a curved surface.

  In the present embodiment, the upper surface 25 includes an inner side surface 253 connected to the inner edge of the region 252, and a slope 254 connecting the lower end of the inner side surface 253 and the region 251.

  A corner is formed between the region 252 and the inner surface 253. The angle θp formed by the region 252 and the inner surface 253 is substantially 90 degrees. Note that the angle θp may be smaller than 90 degrees (may be an acute angle).

 The contact angle of the upper surface 25, the contact angle of the outer surface 42, and the contact angle of the lower surface 26 with respect to the liquid LQ are smaller than 90 degrees. That is, the upper surface 25, the outer surface 42, and the lower surface 26 are lyophilic with respect to the liquid LQ. The contact angle of the upper surface 25, the contact angle of the outer surface 42, and the contact angle of the lower surface 26 with respect to the liquid LQ may be smaller than 80 degrees or smaller than 70 degrees.

 The contact angle of the lower surface 24 with respect to the liquid LQ and the contact angle of the lower surface 39 are smaller than 90 degrees. That is, the lower surface 24 and the lower surface 39 are lyophilic with respect to the liquid LQ. The contact angle of the lower surface 24 and the contact angle of the lower surface 39 with respect to the liquid LQ may be smaller than 80 degrees or smaller than 70 degrees.

 In the example shown in FIG. 16, the interface LG11 of the liquid LQ is highly likely to be formed between the lower surface 39 and the upper surface 25. The interface LG12 of the liquid LQ is highly likely to be formed between the lower surface 39 and the upper surface of the substrate P (object).

  In the present embodiment, the interface LG11 is likely to be formed between the inner surface 253 and the lower surface 39. The interface LG11 is likely to be formed between the corner formed by the region 252 and the inner side surface 253 and the lower surface 39. In the present embodiment, since the inner side surface 253 (corner portion) facing the optical path K (first space SP1) is provided, the liquid LQ (interface LG11) in the first space SP1 is outside the inner side surface 253 (with respect to the optical path K). Movement to the outside in the radial direction is suppressed. That is, a phenomenon (so-called pinning phenomenon) occurs in which the liquid LQ (interface LG11) in the first space SP1 continues to remain on the inner side surface 253 (corner portion) due to the inner side surface 253 (corner portion).

 In the example shown in FIG. 16, the liquid LQ in the second space SP2 is suppressed from flowing into the first space SP1. Further, the liquid LQ in the first space SP1 and the liquid LQ in the second space SP2 are prevented from joining. In the present embodiment, the liquid LQ (interface LG11) in the first space SP1 is restrained from moving outside the inner side surface 253 due to the pinning phenomenon, and therefore from the liquid LQ and the second space SP2 in the first space SP1. The merging (connection, coalescence) with the liquid LQ is suppressed.

 The liquid LQ from the second space SP2 can flow into the liquid recovery part 23 without passing through the first space SP1. The liquid LQ in the second space SP2 can flow into the liquid recovery part 23 without joining the liquid LQ in the first space SP1. The liquid recovery part 23 can recover the liquid LQ from the first space SP1. The liquid recovery part 23 can recover the liquid LQ from the second space SP2 without going through the first space SP1.

  In the example shown in FIG. 16, the dimension Zu and the dimension Zd are substantially equal, and the dimension Zu and the dimension Zd are small. Further, the distance U is large. In the present embodiment, the pinning phenomenon occurs due to the corner formed between the region 252 and the inner surface 253. Therefore, the liquid recovery part 23 can recover the liquid LQ from the second space SP2 without going through the first space SP1. The liquid recovery unit 23 can recover the liquid LQ from the first space SP1.

  In the example shown in FIG. 16, the upper surface 25, the outer surface 42, and the lower surface 26 are lyophilic with respect to the liquid LQ. Thereby, the liquid LQ flows smoothly in the first space SP1 and the second space SP2. Further, bubbles are suppressed from being generated in the liquid LQ in the first space SP1 and the second space SP2.

  FIG. 17 is a modification of FIG. The example shown in FIG. 17 is different from the example shown in FIG. 16 in that the region 252 is liquid repellent with respect to the liquid LQ. As shown in FIG. 16, the region 252 is formed on the surface (upper surface) of the liquid repellent film 50 that is liquid repellent with respect to the liquid LQ. The liquid repellent film 50 is a resin film containing fluorine. The liquid repellent film 50 may be a film containing PFA (Tetrafluoroethylene-perfluoroalkylvinylether copolymer). The liquid repellent film 50 may be a film containing PTFE (Poly tetrafluoroethylene). The contact angle of the region 252 with the liquid LQ is larger than 90 degrees. Note that the contact angle of the region 252 with the liquid LQ may be greater than 100 degrees, greater than 110 degrees, or greater than 120 degrees.

  Since the region 252 is liquid repellent with respect to the liquid LQ, the merging (linking and merging) of the liquid LQ in the first space SP1 and the liquid LQ from the second space SP2 is further suppressed.

  In the example shown in FIGS. 16 and 17, the slope 262 may not be provided.

  A liquid repellent film 50 may be provided on at least a part of the upper surface 25 of the second member 22 shown in FIG. For example, the liquid repellent film 50 may not be provided in the inner edge region of the upper surface 25 surrounding the optical path K, and the liquid repellent film 50 may be provided in the outer edge region of the upper surface 25 disposed outside the inner edge region in the radiation direction with respect to the optical path K. . That is, the outer edge region of the upper surface 25 may be more liquid repellent with respect to the liquid LQ than the inner edge region. In the example shown in FIG. 14, when the liquid repellent film 50 is provided, the slope 262 may not be provided.

  In the example of the relative position between the liquid recovery unit 23 and the second member 22 shown in FIGS. 12 and 13, the liquid recovery unit 23 is also provided with the first space SP1 by providing the second member 22 with the inclined surface 262. At least one of the liquid LQ from the second space SP2 and the liquid LQ from the second space SP2.

  In the example of the relative position between the liquid recovery part 23 and the second member 22 shown in FIGS. 12 and 13, the liquid recovery part 23 is also provided in the first space SP <b> 1 by providing the region 252 in the second member 22. At least one of the liquid LQ from the second space SP2 and the liquid LQ from the second space SP2.

  In the example of the relative position between the liquid recovery unit 23 and the second member 22 shown in FIGS. 12 and 13, the liquid recovery film 50 is provided in the outer edge region of the upper surface 25 of the second member 22 to recover the liquid. The unit 23 can collect at least one of the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2.

 12 to 17, the contact angle of the upper surface 25 with respect to the liquid LQ may be larger than the contact angle of the upper surface of the substrate P with respect to the liquid LQ. The contact angle of the upper surface 25 with respect to the liquid LQ may be smaller than the contact angle of the upper surface of the substrate P with respect to the liquid LQ. The contact angle of the upper surface 25 with respect to the liquid LQ may be substantially equal to the contact angle of the upper surface of the substrate P with respect to the liquid LQ.

  The lower surface 24 may be liquid repellent with respect to the liquid LQ. For example, both the lower surface 24 and the upper surface 25 may be liquid repellent with respect to the liquid LQ. The contact angle of the lower surface 24 with respect to the liquid LQ may be greater than 90 degrees, greater than 100 degrees, greater than 110 degrees, or greater than 120 degrees.

 The lower surface 24 may be liquid repellent with respect to the liquid LQ, and the upper surface 25 may be lyophilic with respect to the liquid LQ. The contact angle of the lower surface 24 with respect to the liquid LQ may be larger than the contact angle of the upper surface 25 with respect to the liquid LQ.

 The lower surface 24 may be lyophilic with respect to the liquid LQ, and the upper surface 25 may be lyophobic with respect to the liquid LQ. The contact angle of the lower surface 24 with respect to the liquid LQ may be smaller than the contact angle of the upper surface 25 with respect to the liquid LQ.

 The contact angle of the lower surface 26 with respect to the liquid LQ may be smaller than the contact angle of the upper surface of the substrate P with respect to the liquid LQ. The contact angle of the lower surface 26 with respect to the liquid LQ may be larger than or substantially equal to the contact angle of the upper surface of the substrate P with respect to the liquid LQ.

  The positional relationship between the first member 21 (liquid recovery unit 23) and the second member 22 shown in FIGS. 12 to 17 is the first in a state where the second member 22 is disposed at the origin (center position). The positional relationship between the member 21 and the second member 22 may be used.

  When the second member 22 moves within the movable range described with reference to FIG. 7 and the like, the first member 21 (liquid recovery unit 23) shown in FIGS. The relative position between the second member 22 and the second member 22 may be maintained. For example, in the entire movable range of the second member 22, the X axis is set so that the relative position between the first member 21 (liquid recovery unit 23) and the second member 22 shown in FIGS. 12 to 17 is maintained. One or both of the size (dimension) of the second member with respect to the direction and the movable range of the second member 22 may be determined.

 For example, in the entire movable range, the merging of the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 (inflow of the liquid LQ from the second space SP2 to the first space SP1) is suppressed. When it is desired to recover both the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 from the liquid recovery unit 23, the liquid recovery described with reference to FIGS. The relative position between the portion 23 and the second member 22 may be maintained. That is, when the second member 22 is arranged at the first end position, the distance U between the inner edge of the liquid recovery unit 23 on the + X side with respect to the optical path K and the outer edge of the second member 22 is 5.0 mm or more. X so that the distance U between the inner edge of the liquid recovery part 23 on the −X side with respect to the optical path K and the outer edge of the second member 22 is 5.0 mm or more and 10.0 mm or less. One or both of the size (dimension) of the second member in the axial direction and the movable range of the second member 22 are determined. Further, when the second member 22 is disposed at the second end position, the distance U between the inner edge of the liquid recovery portion 23 on the + X side with respect to the optical path K and the outer edge of the second member 22 is 5.0 mm or more. X so that the distance U between the inner edge of the liquid recovery part 23 on the −X side with respect to the optical path K and the outer edge of the second member 22 is 5.0 mm or more and 10.0 mm or less. One or both of the size (dimension) of the second member in the axial direction and the movable range of the second member 22 are determined. The second member 22 is between the first end position and the second end position (center position, between the first end position and the center position, between the second end position and the center position, etc.). The same applies to the arrangement state.

  Further, in all the movable range, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 are merged (while the liquid LQ flows from the second space SP2 to the first space SP1). When it is desired to recover both the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 from the liquid recovery unit 23, the liquid recovery unit 23 described with reference to FIG. The relative position with respect to the two members 22 may be maintained. That is, when the second member 22 is arranged at the first end position, the distance U between the inner edge of the liquid recovery unit 23 on the + X side with respect to the optical path K and the outer edge of the second member 22 is 0.5 mm or more. X so that the distance U between the inner edge of the liquid recovery part 23 on the −X side with respect to the optical path K and the outer edge of the second member 22 is 0.5 mm or more and 1.0 mm or less. One or both of the size (dimension) of the second member in the axial direction and the movable range of the second member 22 are determined. When the second member 22 is disposed at the second end position, the distance U between the inner edge of the liquid recovery unit 23 on the + X side with respect to the optical path K and the outer edge of the second member 22 is 0.5 mm or more. X so that the distance U between the inner edge of the liquid recovery part 23 on the −X side with respect to the optical path K and the outer edge of the second member 22 is 0.5 mm or more and 1.0 mm or less. One or both of the size (dimension) of the second member in the axial direction and the movable range of the second member 22 are determined. The second member 22 is between the first end position and the second end position (center position, between the first end position and the center position, between the second end position and the center position, etc.). The same applies to the arrangement state.

  When the second member 22 moves within the movable range described with reference to FIG. 7 and the like, the first member 21 (the liquid recovery unit 23 shown in FIGS. 12 to 17 is partially included in the movable range. ) And the second member 22, one or both of the size (dimension) of the second member in the X-axis direction and the movable range of the second member 22 may be determined.

 For example, in a part of the movable range, the merging of the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 (inflow of the liquid LQ from the second space SP2 to the first space SP1) is suppressed. However, when it is desired to recover both the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 from the liquid recovery unit 23, a part of the movable range has been described with reference to FIGS. Even if one or both of the size (dimension) of the second member in the X-axis direction and the movable range of the second member 22 are determined so that the liquid recovery unit 23 and the second member 22 are in relative positions. Good. For example, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 with respect to the liquid recovery unit 23 on the −X side with respect to the optical path K when the second member 22 is disposed at the first end position. In the case where it is desired to recover both the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 from the −X side liquid recovery portion 23 while the second member 22 is the first end portion. The distance U between the inner edge of the liquid recovery unit 23 on the −X side and the outer edge of the second member 22 at least with respect to the optical path K is 5.0 mm or more and 10.0 mm or less in the state of being disposed at the position. In addition, one or both of the size (dimension) of the second member in the X-axis direction and the movable range of the second member 22 are determined. In this case, the distance U between the inner edge of the liquid recovery unit 23 on the + X side with respect to the optical path K and the outer edge of the second member 22 may be 5.0 mm or greater and 10.0 mm or less, or less than 5.0 mm. Alternatively, it may be larger than 10.0 mm. Further, for example, when the second member 22 is disposed at the first end position, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 with respect to the liquid recovery unit 23 on the + X side with respect to the optical path K. In the case where it is desired to recover both the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 from the + X side liquid recovery portion 23, the second member 22 has the first end portion. The distance U between the inner edge of the liquid recovery unit 23 on the + X side and the outer edge of the second member 22 at least with respect to the optical path K is 5.0 mm or more and 10.0 mm or less in the state of being disposed at the position. One or both of the size (dimension) of the second member in the X-axis direction and the movable range of the second member 22 are determined. In this case, the distance U between the inner edge of the liquid recovery unit 23 on the −X side with respect to the optical path K and the outer edge of the second member 22 may be 5.0 mm or greater and 10.0 mm or less, or less than 5.0 mm. It may be larger than 10.0 mm. The state in which the second member 22 is disposed at the second end position, and the second member 22 between the first end position and the second end position (the center position, the first end position and the center position, This is the same in the state of being disposed between the second end portion position and the center position.

 Further, in a part of the movable range, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 are merged (while the liquid LQ flows from the second space SP2 to the first space SP1). When it is desired to recover both the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 from the liquid recovery unit 23, the liquid recovery unit 23 described with reference to FIG. 13 in a part of the movable range. One or both of the size (dimension) of the second member in the X-axis direction and the movable range of the second member 22 may be determined so as to be in a relative position between the second member 22 and the second member 22. For example, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 with respect to the liquid recovery unit 23 on the −X side with respect to the optical path K when the second member 22 is disposed at the first end position. When the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 are to be recovered from the -X side liquid recovery part 23, the second member 22 is at the first end position. In the disposed state, at least with respect to the optical path K, the distance U between the inner edge of the liquid recovery unit 23 on the −X side and the outer edge of the second member 22 is 0.5 mm or more and 1.0 mm or less. One or both of the size (dimension) of the second member in the X-axis direction and the movable range of the second member 22 are determined. In this case, the distance U between the inner edge of the liquid recovery unit 23 on the + X side with respect to the optical path K and the outer edge of the second member 22 may be 0.5 mm or more and 1.0 mm or less, and may be smaller than 0.5 mm. Alternatively, it may be larger than 1.0 mm. Further, for example, when the second member 22 is disposed at the first end position, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 with respect to the liquid recovery unit 23 on the + X side with respect to the optical path K. When the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 are to be recovered from the + X side liquid recovery portion 23, the second member 22 is at the first end position. In the arranged state, at least the distance U between the inner edge of the liquid recovery part 23 on the + X side with respect to the optical path K and the outer edge of the second member 22 is 0.5 mm or more and 1.0 mm or less. One or both of the size (dimension) of the second member in the axial direction and the movable range of the second member 22 are determined. In this case, the distance U between the inner edge of the liquid recovery unit 23 on the −X side with respect to the optical path K and the outer edge of the second member 22 may be 0.5 mm or greater and 1.0 mm or less, or less than 0.5 mm. It may be larger than 1.0 mm. The state in which the second member 22 is disposed at the second end position, and the second member 22 between the first end position and the second end position (the center position, the first end position and the center position, This is the same in the state of being disposed between the second end portion position and the center position.

  As described above, according to the present embodiment, since the second member 22 that is movable below the first member 21 is provided, an object such as the substrate P is in an XY state while the immersion space LS is formed. Even if it moves in the plane, for example, the liquid LQ is prevented from flowing out of the space between the liquid immersion member 5 and the object, or the liquid LQ remaining on the object. In addition, generation of bubbles (gas portion) in the liquid LQ in the immersion space LS is also suppressed.

 Further, according to the present embodiment, at least one of the dimension Zu, the dimension Zd, the dimension Zt, the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. By determining, the liquid recovery condition by the liquid recovery unit 23 can be determined. As described above, after the liquid LQ in the first space SP1 and the liquid LQ in the second space SP2 are merged, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 are collected into the liquid recovery unit 23. The liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 can be liquid without joining the liquid LQ in the first space SP1 and the liquid LQ in the second space SP2. It can be recovered from the recovery unit 23. For example, when it is desired to sufficiently recover the liquid LQ from the liquid recovery unit 23, the dimension Zu, the dimension Zd, the dimension Zt, the distance U, so that the liquid LQ in the first space SP1 and the liquid LQ in the second space SP2 merge. At least one of the shape of the outer edge of the second member 22 and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ may be determined. When it is desired to recover the liquid LQ from the liquid recovery unit 23 while suppressing contamination of the lower surface 24 and the upper surface 25, the liquid LQ in the first space SP1 and the liquid LQ in the second space SP2 do not merge (from the first space SP1). The dimension Zu, the dimension Zd, the dimension Zt, the distance U, the shape of the outer edge of the second member 22, and the outer side of the second member 22 with respect to the liquid LQ) (so that the inflow of the liquid LQ into the second space SP2 is suppressed) At least one of the contact angles of the edges may be determined. That is, based on the target liquid recovery conditions, at least the dimension Zu, the dimension Zd, the dimension Zt, the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ. One may be defined.

  Thus, according to this embodiment, the optimal liquid recovery conditions can be obtained. Therefore, the liquid LQ in the immersion space LS flows out of the space between the immersion member 5 and the substrate P (object), the liquid LQ remains on the substrate P (object), or at least the immersion member 5 It is suppressed that a part is contaminated. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, the liquid immersion space LS is formed by moving the second member 22 so that the relative movement (relative speed, relative acceleration) with respect to the substrate P (object) becomes small. Even when the object moves at a high speed, the liquid LQ is prevented from flowing out, the liquid LQ is left on the substrate P (object), or bubbles are generated in the liquid LQ.

  In the present embodiment, since the first member 21 is disposed at least at a part of the periphery of the terminal optical element 13, the substrate P (object) moves while the immersion space LS is formed. Even when the second member 22 moves, it is possible to prevent the pressure from fluctuating between the last optical element 13 and the first member 21 and the shape of the interface LG2 of the liquid LQ from greatly fluctuating. The Therefore, for example, the generation of bubbles in the liquid LQ and the excessive force acting on the last optical element 13 are suppressed. In the present embodiment, since the first member 21 does not substantially move, the pressure varies greatly between the last optical element 13 and the first member 21, or the shape of the interface LG1 of the liquid LQ varies greatly. It is suppressed.

  In the present embodiment, the liquid recovery unit 23 may recover the liquid LQ under the same liquid recovery conditions in all parts.

  For example, in all parts of the liquid recovery unit 23, as described with reference to FIGS. 14 to 17, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 merge (second space). Both the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 may be recovered from the liquid recovery unit 23 while suppressing the inflow of the liquid LQ from the SP2 into the first space SP1. As described with reference to FIG. 13, the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 are merged in all parts of the liquid recovery unit 23 (from the second space SP2 to the second space SP2). While the liquid LQ flows into the first space SP1, both the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 may be recovered from the liquid recovery unit 23.

  In the present embodiment, the liquid recovery unit 23 has a part for recovering the liquid LQ under the first liquid recovery condition and a part for recovering the liquid LQ under the second liquid recovery condition different from the first liquid recovery condition. May be. These portions are different portions with respect to the circumferential direction of the optical path K of the exposure light EL.

  For example, the liquid recovery part 23 may have a first portion into which the liquid LQ from the second space SP2 flows and a second portion in which the flow of the liquid LQ from the second space SP2 is suppressed. The first part and the second part are different parts in the circumferential direction of the optical path K of the exposure light EL. That is, in the liquid recovery part 23, the first portion in which the liquid LQ from the second space SP2 flows and the second portion in which the flow of the liquid LQ from the second space SP2 is suppressed are provided. In each of the portion and the second portion, at least one of the dimension Zu, the dimension Zd, the dimension Zt, the distance U, the shape of the outer edge of the second member 22 and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. May be. For example, the dimension Zu and the dimension of the first portion are set so that the relative position between the liquid recovery unit 23 and the second member 22 and the structure of the outer edge of the second member 22 described with reference to FIGS. At least one of Zd, the dimension Zt, the distance U, the shape of the outer edge of the second member 22 and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. Regarding the second portion, the dimensions Zu, Zd, Zt, and the relative position between the liquid recovery unit 23 and the second member 22 described with reference to FIG. 12 and the structure of the outer edge of the second member 22 are provided. At least one of the distance U, the shape of the outer edge of the second member 22 and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined.

 For example, the first part of the liquid recovery unit 23 into which the liquid LQ from the second space SP2 flows is arranged on the + Y side and the −Y side with respect to the optical path K (optical axis AX), and the optical path K (optical axis AX). With respect to the respective portions related to the circumferential direction of the optical path K, the second portion of the liquid recovery unit 23 in which the inflow of the liquid LQ from the second space SP2 is suppressed is disposed on the + X side and the −X side. , Dimension Zu, dimension Zd, dimension Zt, distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ may be determined.

  When the liquid LQ in the second space SP2 that may have come into contact with the substrate P and the liquid recovery unit 23 come into contact with each other, the liquid recovery unit 23 may be contaminated. By providing the second portion in the liquid recovery unit 23, at least contamination of the second portion is suppressed. In addition, if the liquid recovery unit 23 is repeatedly in contact with the liquid LQ from the second space SP2 and not in contact with the liquid recovery unit 23, foreign matter may be generated from the liquid recovery unit 23. By providing the second portion in the liquid recovery unit 23, at least the generation of foreign matters from the second portion is suppressed. Further, by providing the second portion in the liquid recovery unit 23, the liquid LQ continues to be filled in the space on the lower surface 26 side of the second member 22 corresponding to the second portion (a part of the second space SP2). When the second portion is provided on the + X side and the −X side with respect to the optical path K, the liquid LQ is thinned on the substrate P (object) even if the second member 22 moves in the X-axis direction. Is suppressed.

 A first portion of the liquid recovery unit 23 into which the liquid LQ from the second space SP2 flows is disposed on the + X side and the −X side with respect to the optical path K (optical axis AX), and the optical path K (optical axis AX). With respect to the respective portions related to the circumferential direction of the optical path K, the second portion of the liquid recovery unit 23 in which the inflow of the liquid LQ from the second space SP2 is suppressed is disposed on the + Y side and the −Y side. , Dimension Zu, dimension Zd, dimension Zt, distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ may be determined.

  Note that the liquid recovery unit 23 does not merge the liquid LQ from the first space SP1 and the third portion into which the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 flow in. And a fourth portion into which the liquid LQ from the two spaces SP2 flows. The third part and the fourth part are different parts in the circumferential direction of the optical path K of the exposure light EL. That is, in the liquid recovery part 23, the liquid LQ from the first space SP1 and the third part into which the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 that have joined flow in and the third part into which the liquid LQ from the second space SP2 flows in. 2, the dimension Zu, the dimension Zd, the dimension Zt, the distance U, and the outer edge of the second member 22 in each of the third part and the fourth part so that the fourth part into which the liquid LQ from the space SP2 flows is provided. And at least one of the contact angle of the outer edge of the second member 22 with respect to the liquid LQ may be determined. For example, for the third portion, the dimensions Zu, Zd, and dimensions are set so that the relative position between the liquid recovery unit 23 and the second member 22 and the outer edge of the second member 22 described with reference to FIG. At least one of Zt, the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined. For the fourth part, the dimensions Zu, Zd, and the structure of the relative position between the liquid recovery unit 23 and the second member 22 and the outer edge of the second member 22 described with reference to FIGS. At least one of the dimension Zt, the distance U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ is determined.

 For example, the third part of the liquid recovery unit 23 into which the merged liquid LQ flows is arranged on the + Y side and the −Y side with respect to the optical path K (optical axis AX), and + X with respect to the optical path K (optical axis AX). Dimension Zu, dimension Zd, dimension Zt, distance with respect to the respective portions in the circumferential direction of the optical path K so that the fourth portion of the liquid recovery unit 23 into which the liquid LQ that does not merge flows in is arranged on the side and the −X side. At least one of U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ may be determined.

 A third portion of the liquid recovery unit 23 into which the merged liquid LQ flows is arranged on the + X side and the −X side with respect to the optical path K (optical axis AX), and + Y with respect to the optical path K (optical axis AX). The dimension Zu, the dimension Zd, the dimension Zt, and the distance with respect to the respective parts in the circumferential direction of the optical path K so that the fourth part of the liquid recovery unit 23 into which the liquid LQ that does not merge flows in is disposed on the side and the −Y side. At least one of U, the shape of the outer edge of the second member 22, and the contact angle of the outer edge of the second member 22 with respect to the liquid LQ may be determined.

 In the present embodiment, the first member 21 may be movable. The first member 21 may move with respect to the last optical element 13. The first member 21 may move in at least one of the six directions of X axis, Y axis, Z axis, θX, θY, and θZ. For example, even if the first member 21 is moved in order to adjust the positional relationship between the terminal optical element 13 and the first member 21 or to adjust the positional relationship between the first member 21 and the second member 22. Good. Further, the first member 21 may be moved in parallel with at least a part of the movement of the substrate P (object). For example, the distance may be shorter than the second member 22 in the XY plane. Further, the first member 21 may move at a lower speed than the second member 22. The first member 21 may move at a lower acceleration than the second member 22.

 In addition, the 1st temperature adjustment apparatus which adjusts the temperature of the 1st member 21 may be arrange | positioned. The first temperature adjusting device may include, for example, a Peltier element disposed on the outer surface of the first member 21. The first temperature adjustment device may include a supply device that supplies a temperature adjustment fluid (one or both of a liquid and a gas) to a flow path formed inside the first member 21. A second temperature adjusting device that adjusts the temperature of the second member 22 may be arranged. The second temperature adjustment device may include a Peltier element disposed on the outer surface of the second member 22, or may include a supply device that supplies a temperature adjustment fluid to a flow path formed inside the second member 22. But you can.

 In the present embodiment, the liquid supply amount from the liquid supply unit 33 may be adjusted based on the movement condition of the second member 22. Further, the liquid supply amount from the liquid supply unit 33 may be adjusted based on the position of the second member 22. For example, when the second member 22 is arranged at at least one of the first end position and the second end position, the liquid supply amount from the liquid supply unit 33 is arranged at the center position. The liquid supply amount from the liquid supply unit 33 may be adjusted to be larger. Further, when the second member 22 moves from the second end position to the first end position, the liquid supply amount from the liquid supply section 33 arranged on the + X side with respect to the optical path K is set to the −X side. You may increase more than the liquid supply amount from the liquid supply part 33 arrange | positioned. When the second member 22 moves from the first end position to the second end position, the liquid supply amount from the liquid supply section 33 arranged on the −X side with respect to the optical path K is increased to the + X side. You may increase more than the liquid supply amount from the liquid supply part 33 arrange | positioned. By doing so, generation of bubbles in the liquid LQ is suppressed.

  In the present embodiment, the second member 22 is moved in the step direction (X-axis direction) in the step movement operation of the substrate P in order to suppress the liquid LQ remaining or flowing out due to the step movement operation of the substrate P. However, the relative speed (relative speed difference) with the substrate P (object) in the scan direction (Y-axis direction) is reduced in at least one of the scan movement operation and the step movement operation of the substrate P. The second member 22 may be moved in the scanning direction (Y-axis direction).

 In the present embodiment, at least a part of the inner surface 41 of the second member 22 may be inclined upward toward the outside with respect to the radial direction with respect to the optical path K. Thereby, the 2nd member 22 can move smoothly in the state where the inner surface 41 of the 2nd member 22 is arranged in immersion space LS. Further, even if the second member 22 moves while the inner surface 41 of the second member 22 is disposed in the immersion space LS, the pressure of the liquid LQ in the immersion space LS is suppressed from fluctuating.

  In the above-described embodiment, the lower surface 24 of the first member 21 may be disposed on the + Z side with respect to the emission surface 12. In addition, the position (height) of the lower surface 24 in the Z-axis direction and the position (height) of the emission surface 12 may be substantially equal. The lower surface 24 of the first member 21 may be disposed on the −Z side with respect to the emission surface 12.

  In the above-described embodiment, as shown in FIG. 18, at least a part of the first member 210 may face the exit surface 12 of the last optical element 13. In the example illustrated in FIG. 18, the first member 210 has an upper surface 211 disposed around the opening 340. An upper surface 211 is disposed around the upper end of the opening 340. A lower surface 241 is disposed around the lower end of the opening 340. A part of the upper surface 211 faces the emission surface 12. In the example shown in FIG. 18, a part of the upper surface 25 of the second member 22 is also opposed to the emission surface 12.

  In each of the above-described embodiments, the first member 21 may be provided with a suction port that sucks at least one of the liquid LQ and the gas from the space between the first member 21 and the last optical element 13.

  In each of the above-described embodiments, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, liquid immersion exposure is performed in which the control device 6 exposes the substrate with the exposure light through the liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the apparatus is recorded.

  The program recorded in the storage device 7 is arranged on the control device 6 in at least a part of the periphery of the optical member according to the above-described embodiment, and is outside the first lower surface with respect to the first lower surface and the optical path of the exposure light. A first member having a recovery portion disposed on the first member; and a second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and facing the first lower surface with a gap between the first member and the object A second member having a second lower surface that can be opposed to the first member, and a second member that is movable with respect to the first member. 2 The first dimension of the gap between the first lower surface and the second upper surface and the gap between the second lower surface and the upper surface of the object so that the liquid from at least one of the second spaces facing the lower surface is recovered from the recovery unit. Second dimension, third dimension between the second upper surface and the second lower surface, release to the optical path of the exposure light A liquid immersion member in which at least one of the distance between the inner edge of the collecting portion and the outer edge of the second member, the shape of the outer edge of the second member, and the contact angle of the outer edge of the second member with respect to the liquid is determined. Forming a liquid immersion space on a substrate movable under the optical member, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and In at least part of the exposure of the substrate, the second member is moved relative to the first member, and at least one of the first space facing the second upper surface and the second space facing the second lower surface from the recovery unit. Recovering the liquid from

 In addition, the program recorded in the storage device 7 is arranged on the control device 6 in at least a part of the periphery of the optical member according to the above-described embodiment, and the first lower surface with respect to the first lower surface and the optical path of the exposure light. A first member having a recovery portion disposed outside the first member, and a second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and facing the first lower surface through a gap And a second member movable relative to the first member. The second upper surface is disposed outside the first region with respect to the radial direction. Forming a liquid immersion space on a substrate movable under the optical member using a liquid immersion member including a second region closer to the first lower surface than the first region; Exposing the substrate with exposure light emitted from the exit surface through the liquid of In at least a part of the exposure, the second member is moved with respect to the first member, and from the recovery unit, from at least one of the first space facing the second upper surface and the second space facing the second lower surface Recovering the liquid may be performed.

 In addition, the program recorded in the storage device 7 is arranged on the control device 6 in at least a part of the periphery of the optical member according to the above-described embodiment, and the first lower surface with respect to the first lower surface and the optical path of the exposure light. A first member having a recovery portion disposed outside the first member, and a second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and facing the first lower surface through a gap And a second member movable relative to the first member, wherein the second upper surface is disposed outside the third region with respect to the radial direction. Forming a liquid immersion space on a substrate movable below the optical member using a liquid immersion member including a fourth region having a contact angle with respect to the liquid higher than that of the third region; Exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space And at least part of the exposure of the substrate, the second member is moved with respect to the first member, and the first space where the second upper surface faces and the second space where the second lower surface faces from the recovery unit. Recovering the liquid from at least one of the above.

 In addition, the program recorded in the storage device 7 is arranged on the control device 6 in at least a part of the periphery of the optical member according to the above-described embodiment, and the first lower surface with respect to the first lower surface and the optical path of the exposure light. A first member having a recovery portion disposed outside the first member, and a second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and facing the first lower surface through a gap And a second member that is movable with respect to the first member. The fifth region is substantially perpendicular to the optical axis of the optical member. And a sixth region disposed outside the fifth region with respect to the radial direction and inclined upward toward the outer side with respect to the radial direction, on a substrate movable under the optical member using a liquid immersion member Forming a liquid immersion space and projecting through the liquid in the immersion space. Exposing the substrate with exposure light emitted from the surface, moving the second member relative to the first member and exposing the second upper surface from the recovery portion in at least a part of the substrate exposure. Collecting the liquid from at least one of the first space and the second space facing the second lower surface may be performed.

 In addition, the program recorded in the storage device 7 is arranged on the control device 6 in at least a part of the periphery of the optical member according to the above-described embodiment, and the first lower surface with respect to the first lower surface and the optical path of the exposure light. A first member having a recovery portion disposed so as to surround the optical path of the exposure light on the outer side of the first light source, and at least a part of the periphery of the optical path of the exposure light below the first member, with a gap from the first lower surface. And a second member that is movable with respect to the first member, and the recovery part flows in liquid from the second space. Forming a liquid immersion space on a substrate movable below the optical member using a liquid immersion member having a first portion and a second portion in which inflow of liquid from the second space is suppressed; The exposure light emitted from the exit surface through the liquid in the immersion space. Illuminating, moving at least part of the exposure of the substrate, moving the second member relative to the first member, and a first space facing the second upper surface and a second lower surface facing from the recovery unit. The liquid from at least one of the two spaces may be collected.

  When the program stored in the storage device 7 is read into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate to form a liquid immersion space. Various processes such as immersion exposure of the substrate P are performed in a state where the LS is formed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. The projection optical system in which the optical path on the incident side (object surface side) of the last optical element 13 is also filled with the liquid LQ, as disclosed in Japanese Patent Publication No. 2004/019128.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the embodiments described above, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796 and the like. The exposure apparatus may be used. For example, as shown in FIG. 19, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, or a reticle or mask may be used.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line-and-space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, WO 2001/035168. (Lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 20, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 5 ... Liquid immersion member, 6 ... Control apparatus, 7 ... Memory | storage device, 12 ... Ejection surface, 13 ... Terminal optical element, 21 ... 1st member, 22 ... 2nd member, 23 DESCRIPTION OF SYMBOLS ... Liquid recovery part, 24 ... Lower surface, 25 ... Upper surface, 26 ... Lower surface, 28 ... Support member, 32 ... Hole, 33 ... Liquid supply part, 34 ... Opening, 35 ... Opening, EL ... Exposure light, EX ... Exposure apparatus, IL: illumination system, K: optical path, LQ: liquid, LS: immersion space, P: substrate.

Claims (46)

A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member, and having a first lower surface and a recovery unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light;
A second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and opposed to the first lower surface through a gap, and a second lower surface capable of facing the object. A second member movable with respect to the first member,
The object and the second member are opposed to the recovery unit, and liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface is recovered from the recovery unit. Thus, the first dimension of the gap between the first lower surface and the second upper surface, the second dimension of the gap between the second lower surface and the upper surface of the object, and between the second upper surface and the second lower surface The third dimension, the distance between the inner edge of the recovery part and the outer edge of the second member with respect to the radiation direction with respect to the optical path of the exposure light, the shape of the outer edge of the second member, and the outer side of the second member with respect to the liquid A liquid immersion member in which at least one of the contact angles of the edge is determined.  2. The liquid immersion member according to claim 1, wherein at least one of the liquids from the first space is recovered from the recovery part and the liquid from the second space is recovered from the recovery part. .   The liquid immersion member according to claim 2, wherein the at least one liquid is collected so that the liquid from the second space is collected from the collection unit without passing through the first space.  2. The liquid immersion member according to claim 1, wherein at least one of the liquid immersion members is determined so that a first state in which inflow of liquid from the second space to the first space is suppressed occurs. The first dimension is 0.2 mm or more and 0.5 mm or less,
The second dimension is 0.2 mm or more and 0.5 mm or less;
The liquid immersion member according to claim 3 or 4, wherein the distance is 5.0 mm or greater and 10.0 mm or less.   The said 2nd upper surface contains a 1st area | region and the 2nd area | region which is arrange | positioned on the outer side of the said 1st area | region regarding the said radiation direction, and is closer to the said 1st lower surface than the said 1st area | region. The liquid immersion member according to any one of claims.   The second upper surface includes a third region, and a fourth region that is disposed outside the third region with respect to the radiation direction and has a contact angle with respect to the liquid that is larger than the third region. The liquid immersion member according to any one of the above.   The liquid immersion member according to claim 7, wherein the fourth region is closer to the first lower surface than the third region.   The second lower surface is disposed outside a fifth region substantially perpendicular to the optical axis of the optical member and outside the fifth region with respect to the radiation direction, and is inclined upward toward the outside with respect to the radiation direction. The liquid immersion member according to any one of claims 1 to 8, comprising a sixth region.   The liquid immersion member according to claim 2, wherein the at least one is determined so that the liquid from the second space is recovered from the recovery unit via the first space.  2. The liquid immersion member according to claim 1, wherein the at least one is defined so that a second state in which liquid flows from the second space into the first space is generated. The first dimension is 0.5 mm or greater and 1.0 mm or less;
The second dimension is 0.2 mm or more and 0.5 mm or less;
The liquid immersion member according to claim 10 or 11, wherein the distance is 0.5 mm or greater and 1.0 mm or less.  2. The liquid immersion according to claim 1, wherein the at least one is determined such that inflow of liquid from the second space to the first space is suppressed and liquid from the first space is recovered from the recovery unit. Element. The first dimension is 0.5 mm or greater and 1.0 mm or less;
The second dimension is 0.2 mm or more and 0.5 mm or less;
The liquid immersion member according to claim 13, wherein the distance is 5.0 mm or greater and 10.0 mm or less. The collection unit is disposed at least at a part of the periphery of the optical path,
In the recovery unit, the first and second portions are provided such that a first portion into which the liquid from the second space flows and a second portion in which the inflow of the liquid from the second space is suppressed are provided. 15. The liquid immersion member according to any one of claims 1 to 14, wherein at least one of each is defined. A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member, and having a first lower surface and a recovery unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light;
A second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and opposed to the first lower surface through a gap, and a second lower surface capable of facing the object. A second member movable with respect to the first member,
The liquid immersion member, wherein the second upper surface includes a first region and a second region that is disposed outside the first region with respect to the radiation direction and is closer to the first lower surface than the first region. A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member, and having a first lower surface and a recovery unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light;
A second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and opposed to the first lower surface through a gap, and a second lower surface capable of facing the object. A second member movable with respect to the first member,
The liquid immersion member, wherein the second upper surface includes a third region and a fourth region that is disposed outside the third region with respect to the radiation direction and has a contact angle with respect to the liquid higher than that of the third region.   The liquid immersion member according to claim 17, wherein the fourth region is closer to the first lower surface than the third region.   The second lower surface is disposed outside a fifth region substantially perpendicular to the optical axis of the optical member and outside the fifth region with respect to the radiation direction, and is inclined upward toward the outside with respect to the radiation direction. The liquid immersion member according to any one of claims 16 to 18, comprising a sixth region. A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member, and having a first lower surface and a recovery unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light;
A second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and opposed to the first lower surface through a gap, and a second lower surface capable of facing the object. A second member movable with respect to the first member,
The second lower surface is disposed outside a fifth region substantially perpendicular to the optical axis of the optical member and outside the fifth region with respect to the radiation direction, and is inclined upward toward the outside with respect to the radiation direction. A liquid immersion member comprising: a sixth region; A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member, and having a first lower surface and a recovery unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light;
A second upper surface disposed at least part of the periphery of the optical path of the exposure light below the first member and opposed to the first lower surface through a gap, and a second lower surface capable of facing the object. A second member movable with respect to the first member,
The said recovery part is a liquid immersion member which has the 1st part into which the liquid from the said 2nd space flows in, and the 2nd part by which the inflow of the liquid from the said 2nd space is suppressed. A support member connected to a part of the second upper surface and moved by operation of a driving device;
A through-hole formed in the first member so as to be connected to a first space facing the second upper surface, in which at least a part of the support member is disposed. The liquid immersion member according to 1.   The liquid immersion member according to any one of claims 1 to 22, wherein the second member moves in a plane perpendicular to the optical axis of the optical member.   The liquid immersion member according to any one of claims 1 to 23, further comprising a supply unit that supplies a liquid for forming the liquid immersion space.   25. The liquid immersion member according to claim 24, wherein the supply unit is disposed on the first member.   The liquid recovery member according to any one of claims 1 to 25, wherein the recovery unit includes a porous member. The first member has a first opening through which the exposure light can pass,
The liquid immersion member according to any one of claims 1 to 26, wherein the second member has a second opening through which the exposure light can pass.   The liquid immersion member according to any one of claims 1 to 27, wherein the second member is movable in at least a part of a period in which the exposure light is emitted from the emission surface. An exposure apparatus that exposes a substrate with exposure light through a liquid,
An exposure apparatus comprising the liquid immersion member according to any one of claims 1 to 28. The object includes the substrate;
In a state where the immersion space is formed, the substrate moves in the plane substantially perpendicular to the optical axis of the optical member and then moves in the second path,
In the first path, the movement of the substrate includes movement in a second direction substantially parallel to the second axis in the plane;
In the second path, the movement of the substrate includes movement in a third direction substantially parallel to a third axis perpendicular to the second axis in the plane,
30. The exposure apparatus according to claim 29, wherein the second member moves in the third direction during at least a part of a period during which the substrate moves in the second path.   The exposure light is irradiated to the shot region of the substrate through the liquid in the immersion space when the substrate moves along the first path, and the exposure light is not irradiated when moved along the second path. Item 30. The exposure apparatus according to Item 30. The substrate moves along the third path after moving along the second path,
In the third path, the movement of the substrate includes movement in a third direction opposite to the first direction;
32. The exposure apparatus according to claim 30, wherein the second member moves in a fourth direction opposite to the second direction during at least a part of a period during which the substrate moves in the third path.   The exposure apparatus according to any one of claims 29 to 32, wherein the object includes a substrate stage that moves while holding the substrate. Exposing the substrate using the exposure apparatus according to any one of claims 29 to 33;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member that is movable with respect to the recovery unit, wherein the object and the second member face the recovery unit, and a first space that faces the second upper surface and a second space that faces the second lower surface A first dimension of a gap between the first lower surface and the second upper surface, a second dimension of a gap between the second lower surface and the upper surface of the object, so that at least one liquid is collected from the collecting unit; The third dimension between the second upper surface and the second lower surface, and the optical path of the exposure light At least one of a distance between the inner edge of the recovery part and the outer edge of the second member with respect to the radial direction, the shape of the outer edge of the second member, and the contact angle of the outer edge of the second member with respect to the liquid is determined. Forming a liquid immersion space on the substrate that is movable below the optical member using a liquid immersion member formed;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Recovering the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface from the recovery section. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member movable relative to the first region, and the second upper surface is disposed outside the first region with respect to the first region and the radial direction, and is closer to the first lower surface than the first region. Forming a liquid immersion space on the substrate movable below the optical member using a liquid immersion member including a second region;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Recovering the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface from the recovery section. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member movable relative to the third region, wherein the second upper surface is disposed outside the third region with respect to the third region and the radial direction, and a contact angle with respect to the liquid is larger than that of the third region. Forming a liquid immersion space on the substrate that is movable below the optical member using a liquid immersion member that includes a high fourth region;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Recovering the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface from the recovery section. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member movable relative to the optical member, wherein the second lower surface is disposed outside the fifth region with respect to the radial direction and a fifth region substantially perpendicular to the optical axis of the optical member. Forming a liquid immersion space on the substrate movable below the optical member using a liquid immersion member including a sixth region inclined upward toward the outside in the radial direction. When,
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Recovering the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface from the recovery section. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member that is movable with respect to the first portion, wherein the recovery portion includes a first portion into which the liquid from the second space flows and a second portion in which the inflow of the liquid from the second space is suppressed. Forming a liquid immersion space on the substrate movable under the optical member using a liquid immersion member having;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
Recovering the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface from the recovery section. Exposing the substrate using the exposure method according to any one of claims 35 to 39;
Developing the exposed substrate. A device manufacturing method. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member that is movable with respect to the recovery unit, wherein the object and the second member face the recovery unit, and a first space that faces the second upper surface and a second space that faces the second lower surface A first dimension of a gap between the first lower surface and the second upper surface, a second dimension of a gap between the second lower surface and the upper surface of the object, so that at least one liquid is collected from the collecting unit; The third dimension between the second upper surface and the second lower surface, and the optical path of the exposure light At least one of a distance between the inner edge of the recovery part and the outer edge of the second member with respect to the radial direction, the shape of the outer edge of the second member, and the contact angle of the outer edge of the second member with respect to the liquid is determined. Forming a liquid immersion space on the substrate that is movable below the optical member using a liquid immersion member formed;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
A program for executing, from the recovery unit, recovering a liquid from at least one of a first space facing the second upper surface and a second space facing the second lower surface. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member movable relative to the first region, and the second upper surface is disposed outside the first region with respect to the first region and the radial direction, and is closer to the first lower surface than the first region. Forming a liquid immersion space on the substrate movable below the optical member using a liquid immersion member including a second region;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
A program for executing, from the recovery unit, recovering a liquid from at least one of a first space facing the second upper surface and a second space facing the second lower surface. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member movable relative to the third region, wherein the second upper surface is disposed outside the third region with respect to the third region and the radial direction, and a contact angle with respect to the liquid is larger than that of the third region. Forming a liquid immersion space on the substrate that is movable below the optical member using a liquid immersion member that includes a high fourth region;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
A program for executing, from the recovery unit, recovering a liquid from at least one of a first space facing the second upper surface and a second space facing the second lower surface. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member movable relative to the optical member, wherein the second lower surface is disposed outside the fifth region with respect to the radial direction and a fifth region substantially perpendicular to the optical axis of the optical member. Forming a liquid immersion space on the substrate movable below the optical member using a liquid immersion member including a sixth region inclined upward toward the outside in the radial direction. When,
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
A program for executing, from the recovery unit, recovering a liquid from at least one of a first space facing the second upper surface and a second space facing the second lower surface. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member, the first member having a first lower surface and a collection unit disposed on the outer side of the first lower surface with respect to the optical path of the exposure light; and A first upper member disposed on at least a part of the periphery of the optical path of the exposure light and having a second upper surface opposed to the first lower surface through a gap; and a second lower surface capable of facing the object. A second member that is movable with respect to the first portion, wherein the recovery portion includes a first portion into which the liquid from the second space flows and a second portion in which the inflow of the liquid from the second space is suppressed. Forming a liquid immersion space on the substrate movable under the optical member using a liquid immersion member having;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least a portion of the exposure of the substrate;
A program for executing, from the recovery unit, recovering a liquid from at least one of a first space facing the second upper surface and a second space facing the second lower surface.   The computer-readable recording medium which recorded the program as described in any one of Claims 41-45.

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