JP2013204051A - Method for manufacturing cylindrical sputtering target material - Google Patents
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Abstract
Description
本発明は、円筒型スパッタリングターゲット材の製造方法に関するものである。 The present invention relates to a method for producing a cylindrical sputtering target material.
近年、スパッタリングにおけるスパッタリングターゲットの使用効率を向上させる方法として、円筒型スパッタリングターゲットを使用した、マグネトロン型回転スパッタリング法の使用が進んできている。この方式は、スパッタリングターゲットの表面が全面に亘ってエロージョンとなり、均一にスパッタリングされるため、従来の平板状スパッタリングターゲットを使用する方式に比べて格段に高い使用効率が得られることが知られている。
円筒型スパッタリングターゲットを使用したスパッタリング法によって製造される膜の具体例には、液晶ディスプレイ等のフラットパネルディスプレイやタッチパネル等の配線膜や保護膜、太陽電池の裏面電極や光吸収層等の薄膜などがあり、近年これらの製品への使用例が増えてきている。
In recent years, as a method for improving the efficiency of use of a sputtering target in sputtering, the use of a magnetron rotary sputtering method using a cylindrical sputtering target has been advanced. In this method, the surface of the sputtering target is eroded over the entire surface and is sputtered uniformly, so that it is known that a much higher usage efficiency can be obtained compared to a method using a conventional flat plate-like sputtering target. .
Specific examples of films produced by sputtering using a cylindrical sputtering target include wiring panels and protective films such as flat panel displays such as liquid crystal displays and touch panels, thin films such as back electrodes and light absorption layers of solar cells, etc. In recent years, the use examples of these products have increased.
円筒型スパッタリングターゲット材の製造方法として、例えば特許文献１のように、一方の円筒型成形体の接合端面をテーパー状に形成し、他方の円筒型成形体の接合端面を前記テーパー状の端面に対して補角となるすり鉢状に形成し、前記円筒型成形体を、前記接合端面同士が当接するように中空の円筒型充填空間を有する金属カプセルに挿入した後、減圧封止し、その後、熱間静水圧プレスを施し、一体型の焼結体を得る方法が提案されている。 As a manufacturing method of a cylindrical sputtering target material, for example, as in Patent Document 1, a joining end surface of one cylindrical shaped body is formed in a tapered shape, and a joining end surface of the other cylindrical shaped body is formed in the tapered end surface. It is formed in a mortar shape that forms a complementary angle with respect to the cylindrical shaped body, inserted into a metal capsule having a hollow cylindrical filling space so that the joint end faces come into contact with each other, and then sealed under reduced pressure. There has been proposed a method for obtaining an integrated sintered body by performing a hot isostatic pressing.
上述した特許文献１に開示される円筒型スパッタリングターゲット材の製造方法は、その実施例に具体的に開示されているような外径１７０ｍｍに対し高さが６００ｍｍ以上の長尺な円筒型成形体である場合には、長尺であるが故に、一個あたりの円筒型成形体自体の質量が増してしまう。また、金属カプセルに挿入する際には円筒型成形体の円周面を把持する必要がある。その結果、ハンドリングで円筒型成形体に欠け等の破損させる虞がある。また、円筒型成形体を、金型を用いたプレス成型により形成しようとすると、長手方向で均一な密度の成形体が得難い場合がある。このような不均一な密度の成形体を拡散接合すると、焼結時の収縮差によって形状精度が低下する問題が懸念される。 The manufacturing method of the cylindrical sputtering target material disclosed in Patent Document 1 described above is a long cylindrical molded body having a height of 600 mm or more with respect to an outer diameter of 170 mm as specifically disclosed in the embodiment. In such a case, since it is long, the mass of the cylindrical molded body per piece increases. Moreover, when inserting in a metal capsule, it is necessary to hold | grip the circumferential surface of a cylindrical molded object. As a result, the cylindrical molded body may be damaged due to handling. In addition, when trying to form a cylindrical molded body by press molding using a mold, it may be difficult to obtain a molded body having a uniform density in the longitudinal direction. When such a non-uniform density molded article is diffusion bonded, there is a concern that the shape accuracy is lowered due to a shrinkage difference during sintering.
本発明の目的は、上記課題に鑑み、ハンドリング性が良好で且つ均一な密度が得られ、原料歩留が高い円筒型スパッタリングターゲット材の製造方法を提供することである。 In view of the above problems, an object of the present invention is to provide a method for producing a cylindrical sputtering target material that has good handling properties, a uniform density, and a high raw material yield.
すなわち本発明は、金属粉末を加圧成形して外径ＯＤ、内径ＩＤ、厚さｈが０＜ｈ≦ＯＤ／２の関係を満たす円筒型成形体を得る工程と、
円筒型充填空間を有する金属カプセル内に前記円筒型成形体を複数個積層するように挿入して減圧封止する工程と、
前記金属カプセルに熱間静水圧プレスを施し円筒型焼結体を得る工程と、
を含む円筒型スパッタリングターゲット材の製造方法である。
That is, the present invention is a step of pressing a metal powder to obtain a cylindrical molded body satisfying the relationship of outer diameter OD, inner diameter ID, thickness h 0 <h ≦ OD / 2,
Inserting a plurality of the cylindrical shaped bodies into a metal capsule having a cylindrical filling space, and sealing under reduced pressure; and
Applying a hot isostatic pressing to the metal capsule to obtain a cylindrical sintered body;
It is a manufacturing method of the cylindrical sputtering target material containing this.
また、前記円筒型成形体を得る工程は、前記金属粉末を金型内でプレス成形することが好ましい。
また、前記円筒型成形体の相対密度を５０％以上にすることが好ましい。
また、前記円筒型成形体の厚さｈをＯＤ／２０≦ｈ≦ＯＤ／４にすることが好ましい。
Moreover, it is preferable that the process of obtaining the said cylindrical molded object press-molds the said metal powder within a metal mold | die.
The relative density of the cylindrical molded body is preferably 50% or more.
The thickness h of the cylindrical molded body is preferably OD / 20 ≦ h ≦ OD / 4.
本発明によれば、ハンドリング性が良好な円筒型成形体の密度を均一にすることができ、焼結時の収縮が均一で、原料歩留が高い円筒型スパッタリングターゲット材の製造にとって有用な技術となる。 According to the present invention, it is possible to make the density of a cylindrical molded body having good handling properties uniform, to provide a technique useful for manufacturing a cylindrical sputtering target material having uniform shrinkage during sintering and a high raw material yield. It becomes.
上述したように、本発明の重要な特徴は、円筒型成形体の高さを規定したことにあり、これにより、円筒型成形体の運搬や金属カプセルに挿入する際のハンドリング性が良好となり、且つ長手方向全長にわたって均一密度な成形体が得られ、原料歩留が高い円筒型スパッタリングターゲット材を製造できることにある。以下、本発明について詳述する。 As described above, an important feature of the present invention is that the height of the cylindrical molded body is defined, thereby improving the handling property when transporting the cylindrical molded body and inserting it into a metal capsule, In addition, it is possible to produce a cylindrical sputtering target material having a uniform raw material yield over the entire length in the longitudinal direction and a high raw material yield. Hereinafter, the present invention will be described in detail.
本発明においては、先ず、図１に示すような金属粉末を加圧成形して円筒型成形体１を得る。このとき作製する円筒型成形体１は、図１に示すように外径をＯＤ、内径をＩＤ、厚さをｈとすると、０＜ｈ≦ＯＤ／２の関係を満たす必要がある。
円筒型成形体１の厚さｈがＯＤ／２を超えて厚くなりすぎると、円筒型成形体１の積層回数を減少するためには一見有利である。しかし、一個あたりの円筒型成形体１自体の質量が増してしまう上、金属カプセルに挿入する際に円筒型成形体１の円周面を把持して運搬や積層をする必要があり、その結果、円筒型成形体１に欠け等の破損を誘発する虞が高くなり、ハンドリング性が低下する。また、円筒型成形体１の厚さｈがＯＤ／２を超えて厚くなりすぎると、長手方向の密度差が生じる懸念もある。
したがって、本発明の円筒型成形体１は、０＜ｈ≦ＯＤ／２の関係を満たす寸法とする。尚、内径ＩＤと厚さｈには、特に制限はない。
本発明で適用できる円筒型成形体１は、ＯＤが５０〜５００ｍｍの範囲のものに好適である。これにより、本発明では、わざわざ運搬装置に頼ることなく、円筒型成形体１を手で持ち運べるサイズおよび質量にすることができ、よりハンドリング性の向上が可能となる。
In the present invention, first, a metal powder as shown in FIG. As shown in FIG. 1, the cylindrical molded body 1 produced at this time needs to satisfy the relationship of 0 <h ≦ OD / 2, where the outer diameter is OD, the inner diameter is ID, and the thickness is h.
If the thickness h of the cylindrical molded body 1 exceeds OD / 2 and becomes too thick, it is advantageous at first glance to reduce the number of times the cylindrical molded body 1 is laminated. However, the mass of the cylindrical molded body 1 itself increases, and it is necessary to grip and convey and laminate the circumferential surface of the cylindrical molded body 1 when inserted into a metal capsule. In addition, there is a high possibility that the cylindrical molded body 1 will be damaged, such as chipping, and the handling property is reduced. Further, if the thickness h of the cylindrical molded body 1 exceeds OD / 2 and becomes too thick, there is a concern that a density difference in the longitudinal direction may occur.
Therefore, the cylindrical molded body 1 of the present invention has dimensions that satisfy the relationship of 0 <h ≦ OD / 2. There is no particular limitation on the inner diameter ID and the thickness h.
The cylindrical molded body 1 applicable in the present invention is suitable for those having an OD in the range of 50 to 500 mm. Thereby, in this invention, it can be set as the size and mass which can carry the cylindrical molded object 1 by hand, without depending on a conveyance apparatus botheredly, and it becomes possible to improve handling property more.
本発明では、円筒型成形体１の厚さｈをＯＤ／２０≦ｈ≦ＯＤ／４の範囲にすることが好ましい。
円筒型成形体１が厚すぎると、円筒型成形体１の端面同士での把持が困難となり、曲面である円周面を把持せざるを得なくなり、その質量が重くなると運搬時の落下を防止するためには、把持用の専用治具等でスパッタ面となる円周面を把持する必要があり、円周面に欠け等の破損の危険性が高まる。
本発明では、円筒型成形体１の厚さｈがＯＤ／４以下であれば、一個あたりの円筒型成形体１自体の質量を減少させることができ、円筒型成形体１の端面を把持して手で持ち運ぶことができるようになり、運搬時の落下の危険性が排除でき、ハンドリング性の向上が可能となる。また、本発明では、円周面を専用治具等で把持する必要がなくなるので、スパッタ面となる円周面の欠け等の破損が抑制できる。
また、円筒型成形体１の厚さｈを薄くすることにより、円筒型成形体１の長手方向の密度がより均一になるという効果も期待できる。
一方、円筒型成形体１の厚さｈがＯＤ／２０未満であれば薄くなりすぎてしまい、円筒型成形体１の強度が低下することで、把持といったハンドリング時に割れてしまう虞があるとともに、積層回数が増えすぎてしまうので生産性の観点からも好ましくない。
以上の理由から、本発明では、円筒型成形体１の厚さｈをＯＤ／２０≦ｈ≦ＯＤ／４の範囲にすることが好ましい。
In the present invention, the thickness h of the cylindrical molded body 1 is preferably in the range of OD / 20 ≦ h ≦ OD / 4.
If the cylindrical molded body 1 is too thick, it will be difficult to grip the end surfaces of the cylindrical molded body 1, and it will be necessary to grip the circumferential surface that is a curved surface. In order to achieve this, it is necessary to grip the circumferential surface that becomes the sputtering surface with a dedicated jig for gripping, and the risk of breakage such as chipping on the circumferential surface increases.
In the present invention, if the thickness h of the cylindrical molded body 1 is OD / 4 or less, the mass of the cylindrical molded body 1 itself can be reduced, and the end surface of the cylindrical molded body 1 can be gripped. Can be carried by hand, eliminating the danger of dropping during transportation and improving handling. Moreover, in this invention, since it becomes unnecessary to hold | grip a circumferential surface with a special jig etc., damage, such as a chip | tip of the circumferential surface used as a sputtering surface, can be suppressed.
Moreover, the effect that the density in the longitudinal direction of the cylindrical molded body 1 becomes more uniform can be expected by reducing the thickness h of the cylindrical molded body 1.
On the other hand, if the thickness h of the cylindrical molded body 1 is less than OD / 20, the cylindrical molded body 1 becomes too thin, and the strength of the cylindrical molded body 1 is reduced, so that it may be broken during handling such as gripping, Since the number of laminations increases too much, it is not preferable from the viewpoint of productivity.
For the reasons described above, in the present invention, the thickness h of the cylindrical molded body 1 is preferably in the range of OD / 20 ≦ h ≦ OD / 4.
本発明で円筒型成形体１を得る方法としては、金型内に金属粉末を充填して常温でプレスする方法が最も簡便であるため好ましい。このとき、スパッタリングターゲットとして使用したときにパーティクルの問題を生じさせないために、バインダ等の添加剤を用いないことが好ましい。
本発明で適用する円筒型成形体１の相対密度は、５０％以上にすることが好ましい。これは、予め円筒型成形体１の強度を増しておくことで、ハンドリングにおける円筒型成形体１の破損を防ぐためである。また、予め円筒型成形体１の密度を確保する理由は、複数の円筒型成形体１に熱間静水圧プレスを施す際に、焼結における円筒型成形体１の収縮が過度に進む場合には、圧縮による寸法変形で円筒型焼結体に曲がりや収縮等が生じる問題を抑制するためでもある。
また、円筒型成形体１のハンドリング時の破損をより防ぐために、円筒型成形体１を得る工程の後に仮焼工程を設けて、円筒型成形体１の表面を硬くして形状保持力を向上させることがより好ましい。
本発明で適用できる金属粉末は、Ｍｏ、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｗなどの高融点金属単体や合金でもよく、またはそれら複数を混合したものでもよく、特に限定されない。また、金属粉末の粒径は、特に限定はしないが、０．５〜１０００μｍのものを用いることが好ましい。
As the method for obtaining the cylindrical molded body 1 according to the present invention, a method of filling a metal powder in a mold and pressing it at room temperature is preferable because it is the simplest. At this time, it is preferable not to use an additive such as a binder in order not to cause a problem of particles when used as a sputtering target.
The relative density of the cylindrical molded body 1 applied in the present invention is preferably 50% or more. This is to prevent damage to the cylindrical molded body 1 during handling by increasing the strength of the cylindrical molded body 1 in advance. The reason why the density of the cylindrical molded body 1 is secured in advance is that when shrinkage of the cylindrical molded body 1 during sintering proceeds excessively when hot isostatic pressing is performed on the plurality of cylindrical molded bodies 1. This is also for suppressing problems such as bending and shrinkage of the cylindrical sintered body due to dimensional deformation caused by compression.
Further, in order to further prevent the cylindrical molded body 1 from being damaged during handling, a calcining step is provided after the step of obtaining the cylindrical molded body 1 to harden the surface of the cylindrical molded body 1 and improve the shape retention force. More preferably.
The metal powder that can be applied in the present invention may be a refractory metal alone or an alloy such as Mo, Ti, Zr, Hf, V, Nb, Ta, Cr, W, or a mixture thereof, and is not particularly limited. . The particle size of the metal powder is not particularly limited, but it is preferable to use a metal powder having a particle size of 0.5 to 1000 μm.
次に、上記工程で作製した複数の円筒型成形体１を、図２に示すように、金属カプセル２に積層するように挿入した後、減圧封止する。このとき、金属カプセル２を加熱しながら脱気パイプ３から脱気することが好ましい。脱気条件は、加熱温度１００〜６００℃の範囲で、１ｋＰａよりも低い減圧を行うことが望ましい。
尚、図２では、円筒型成形体１を６個積層しているが、個々の円筒型成形体１の厚さを小さくすることで、７個以上の円筒型成形体１を積層することが好ましい。これは、個々の円筒型成形体１の厚さを薄くすることで、円筒型成形体１の長手方向の密度が向上でき、強度向上が図れるとともに、運搬等のハンドリング性を良好にするためである。
Next, the plurality of cylindrical molded bodies 1 produced in the above process are inserted into the metal capsule 2 so as to be laminated as shown in FIG. At this time, it is preferable to deaerate from the deaeration pipe 3 while heating the metal capsule 2. As the degassing condition, it is desirable to perform pressure reduction lower than 1 kPa in a heating temperature range of 100 to 600 ° C.
In FIG. 2, six cylindrical molded bodies 1 are stacked. However, by reducing the thickness of each cylindrical molded body 1, seven or more cylindrical molded bodies 1 can be stacked. preferable. This is because by reducing the thickness of each cylindrical molded body 1, the density in the longitudinal direction of the cylindrical molded body 1 can be improved, the strength can be improved, and handling properties such as transportation can be improved. is there.
次に、脱気封止した金属カプセル２に熱間静水圧プレスを施して、複数の円筒型成形体１を接合した円筒型焼結体を得る。
熱間静水圧プレスの条件は、十分な接合強度と相対密度を有する円筒型スパッタリングターゲット材を得るために、温度４５０℃以上金属粉末の融点未満、圧力３０〜１５０ＭＰａ、０．５〜１０時間の範囲で行うことが望ましい。これは、４５０℃に満たない温度や３０ＭＰａに満たない圧力では、相対密度が低くなる上、円筒型成形体１同士の十分な接合強度を得ることができないためである。
一方、金属粉末の融点以上の温度では、一体成型された円筒型焼結体の組織中で結晶粒の粗大化が促進され、スパッタリングターゲットとしてスパッタリングする際に、異常放電等の不具合が発生する可能性が高くなる。本発明では、均一微細な結晶粒および十分な接合強度を有した円筒型スパッタリングターゲット材を得るために、熱間静水圧プレスの温度範囲を７００〜１２５０℃にすることが好ましい。
Next, hot isostatic pressing is performed on the degassed and sealed metal capsule 2 to obtain a cylindrical sintered body in which a plurality of cylindrical molded bodies 1 are joined.
In order to obtain a cylindrical sputtering target material having sufficient bonding strength and relative density, the condition of hot isostatic pressing is that the temperature is 450 ° C. or higher and less than the melting point of the metal powder, the pressure is 30 to 150 MPa, and the pressure is 0.5 to 10 hours. It is desirable to carry out in a range. This is because, at a temperature less than 450 ° C. or a pressure less than 30 MPa, the relative density becomes low and sufficient bonding strength between the cylindrical molded bodies 1 cannot be obtained.
On the other hand, when the temperature is higher than the melting point of the metal powder, coarsening of the crystal grains is promoted in the structure of the integrally formed cylindrical sintered body, and problems such as abnormal discharge may occur when sputtering as a sputtering target. Increases nature. In the present invention, in order to obtain a cylindrical sputtering target material having uniform fine crystal grains and sufficient bonding strength, the temperature range of the hot isostatic press is preferably set to 700 to 1250 ° C.
本発明で適用できる金属カプセル２は、中実の軸の周りに中空の円筒型充填空間を形成するものであってもよいし、図２に示すような中空の軸の周りに円筒型充填空間を形成する円筒状としたものでもよい。特に、円筒型成形体１を挿入する軸を中空とすれば、金属カプセル２に熱間静水圧プレスを施す際に、金属カプセル２の外周面と内周面から等方的に加圧され、金属カプセル２の外周面と内周面とにおける変形抵抗に大きな差が生じないため、得られる円筒型焼結体の割れの発生を防止する上で好適である。
また、本発明では、スパッタリングターゲット材のスパッタ面やバッキングプレートに接合される面を旋盤等で切削加工を施す他、研磨加工等の手入れ処理を施すことが好ましい。これにより、目的の形状および寸法を有するスパッタリングターゲット材にすることができる。
The metal capsule 2 applicable in the present invention may be one that forms a hollow cylindrical filling space around a solid axis, or a cylindrical filling space around a hollow axis as shown in FIG. It may be a cylindrical shape that forms the. In particular, if the shaft into which the cylindrical molded body 1 is inserted is hollow, when the metal capsule 2 is subjected to hot isostatic pressing, the metal capsule 2 is isotropically pressurized from the outer peripheral surface and the inner peripheral surface, Since there is no great difference in deformation resistance between the outer peripheral surface and the inner peripheral surface of the metal capsule 2, it is suitable for preventing the occurrence of cracks in the obtained cylindrical sintered body.
Further, in the present invention, it is preferable that the sputtering surface of the sputtering target material or the surface bonded to the backing plate is subjected to a cutting process with a lathe or the like, or a maintenance process such as a polishing process. Thereby, it can be set as the sputtering target material which has the target shape and dimension.
以下、本発明の実施例について説明する。
先ず、図１に示す円筒型成形体１の寸法がＯＤ＝２２０ｍｍ、ＩＤ＝１３５ｍｍ、ｈ＝４８．５ｍｍ（ｈ≒ＯＤ／４．５）となるように、市販の平均粒径６μｍのＭｏ粉末を金型内に充填し、常温で成形圧１００ＭＰａのプレスをして円筒型成形体１を３３個作製した。次に、これらの円筒型成形体１を８００℃の水素雰囲気で５時間の仮焼をして、円筒型成形体１の形状保持力を向上させた。このときの円筒型成形体１の密度をアルキメデス法により測定した結果、相対密度で６０．２３％であった。
Examples of the present invention will be described below.
First, commercially available Mo powder having an average particle size of 6 μm so that the dimensions of the cylindrical molded body 1 shown in FIG. 1 are OD = 220 mm, ID = 135 mm, h = 48.5 mm (h≈OD / 4.5). Was filled in a mold and pressed at a molding pressure of 100 MPa at room temperature to produce 33 cylindrical molded bodies 1. Next, these cylindrical molded bodies 1 were calcined in a hydrogen atmosphere at 800 ° C. for 5 hours to improve the shape retention of the cylindrical molded body 1. The density of the cylindrical molded body 1 at this time was measured by the Archimedes method, and as a result, the relative density was 60.3%.
上記で得た３３個の円筒型成形体１を、図２に示す円筒状の金属カプセル２に積層するように全数挿入して、４５０℃の温度下で加熱しながら脱気パイプ３から脱気して封止した。円筒型成形体１を運搬して金属カプセル２に挿入するときのハンドリングの際には、円筒型成形体１の欠け等の破損がなかったことを確認した。
次に、金属カプセル２を温度１２５０℃、圧力１４７ＭＰａの条件下で５時間保持する熱間静水圧プレス処理を施した後、機械加工により金属カプセル２を除去して円筒型のＭｏ焼結体を得た。
The thirty-three cylindrical shaped bodies 1 obtained as described above are all inserted so as to be laminated on the cylindrical metal capsule 2 shown in FIG. 2, and deaerated from the deaeration pipe 3 while being heated at a temperature of 450 ° C. And sealed. It was confirmed that there was no damage such as chipping of the cylindrical molded body 1 during handling when the cylindrical molded body 1 was transported and inserted into the metal capsule 2.
Next, the metal capsule 2 was subjected to hot isostatic pressing for 5 hours under conditions of a temperature of 1250 ° C. and a pressure of 147 MPa, and then the metal capsule 2 was removed by machining to obtain a cylindrical Mo sintered body. Obtained.
上記で得た円筒型のＭｏ焼結体は、円筒型成形体１の破損による変形や、局所的に異常収縮した等の外観上に異常な箇所は認められず、均一に収縮したＭｏ焼結体であることが確認できた。また、円筒型のＭｏ焼結体から機械加工により試験片を採取し、この焼結体の密度をアルキメデス法により測定した結果、相対密度で９９．２４％であった。
以上の結果から、本発明の製造方法によれば、形状精度に優れたスパッタリングターゲット材が得られることが確認できた。
In the cylindrical Mo sintered body obtained above, deformation due to breakage of the cylindrical molded body 1 and abnormal abnormalities such as local abnormal shrinkage were not recognized, and the Mo sintered body shrunk uniformly. It was confirmed to be a body. Further, a test piece was collected from the cylindrical Mo sintered body by machining, and the density of the sintered body was measured by Archimedes method. As a result, the relative density was 99.24%.
From the above result, according to the manufacturing method of this invention, it has confirmed that the sputtering target material excellent in the shape precision was obtained.
１．円筒型成形体、２．金属カプセル、３．脱気パイプ 1. 1. cylindrical molded body, Metal capsules, 3. Deaeration pipe
Claims (4)
円筒型充填空間を有する金属カプセル内に前記円筒型成形体を複数個積層するように挿入して減圧封止する工程と、
前記金属カプセルに熱間静水圧プレスを施し円筒型焼結体を得る工程と、
を含むことを特徴とする円筒型スパッタリングターゲット材の製造方法。 A step of pressing a metal powder to obtain a cylindrical molded body satisfying the relationship of outer diameter OD, inner diameter ID, and thickness h of 0 <h ≦ OD / 2;
Inserting a plurality of the cylindrical shaped bodies into a metal capsule having a cylindrical filling space, and sealing under reduced pressure; and
Applying a hot isostatic pressing to the metal capsule to obtain a cylindrical sintered body;
The manufacturing method of the cylindrical sputtering target material characterized by including.
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| JP5887625B1 (en) * | 2015-03-27 | 2016-03-16 | Ｊｘ金属株式会社 | Cylindrical sputtering target, cylindrical sintered body, cylindrical molded body, and manufacturing method thereof |
| JP5969146B1 (en) * | 2016-01-13 | 2016-08-17 | Ｊｘ金属株式会社 | Manufacturing method of cylindrical sputtering target and manufacturing method of cylindrical molded body |
| JP2016151033A (en) * | 2015-02-17 | 2016-08-22 | 日立金属株式会社 | Method of manufacturing cylindrical member |
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| JP2016151033A (en) * | 2015-02-17 | 2016-08-22 | 日立金属株式会社 | Method of manufacturing cylindrical member |
| JP5887625B1 (en) * | 2015-03-27 | 2016-03-16 | Ｊｘ金属株式会社 | Cylindrical sputtering target, cylindrical sintered body, cylindrical molded body, and manufacturing method thereof |
| US9834839B2 (en) | 2015-03-27 | 2017-12-05 | Jx Nippon Mining & Metals Corporation | Cylindrical sputtering target, cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact |
| US10865471B2 (en) | 2015-03-27 | 2020-12-15 | Jx Nippon Mining & Metals Corporation | Cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact |
| JP5969146B1 (en) * | 2016-01-13 | 2016-08-17 | Ｊｘ金属株式会社 | Manufacturing method of cylindrical sputtering target and manufacturing method of cylindrical molded body |
| CN109972100A (en) * | 2019-05-13 | 2019-07-05 | 无锡飞而康新材料科技有限公司 | A kind of preparation method of tubular chromium target |
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