JP2012192470A - Plate-like body polishing apparatus - Google Patents

Abstract

The present invention provides an apparatus for polishing a plate-like body, which can increase the productivity of the plate-like body.
In the present invention, a glass plate G is attached to an adsorption sheet 39 attached to a back plate 38 of a canvas 14 at a stage 16. Next, the canvas 14 is conveyed to the stage 18 and held horizontally by the carrier 52. Next, the canvas 14 and the polishing pads 58 and 60 are brought relatively close to each other, the glass plate G is pressed against the polishing pads 58 and 60 by the pressure of compressed air, and the canvas 14 and the polishing pads 58 and 60 are pressed against the glass plate G. The polishing surface of the glass plate G is polished by relatively moving along the polishing surface. In the present invention, the glass plate G is polished using the canvas 14 without using the film body. Therefore, the film body replacement step can be omitted from the glass plate G production step.
[Selection] Figure 4

Description

  The present invention relates to a plate-like body polishing apparatus.

  A glass plate used for a liquid crystal display causes minute irregularities and undulations on the surface to cause distortion of the image, and therefore the minute irregularities and undulations are removed by a polishing apparatus. As such a polishing apparatus, there is a polishing apparatus that presses a glass plate held by a carrier against a polishing pad provided on a polishing surface plate and polishes the glass plate by relatively rotating the polishing surface plate and the carrier. Generally known.

  In the polishing apparatus disclosed in Patent Document 1, an adsorption sheet that adsorbs and holds a glass plate is attached to a film body, and the film body is stretched around a carrier. Further, a pressurized fluid is supplied between the film body and the carrier, and the glass plate held by the adsorption sheet is pressed against the polishing pad by the pressure of the pressurized fluid. Thus, according to the polishing apparatus of Patent Document 1, since the pressure applied to each part of the glass plate by the pressurized fluid becomes a uniform pressure, the fine unevenness on the surface of the glass plate is polished while polishing the glass plate flatly. There is an advantage that it can be removed.

  The adsorbing sheet is made of polyurethane foam, and is adhered to the film body via an intermediate sheet such as polycarbonate, and the rigidity in the pulling direction of the intermediate sheet is set higher than the rigidity in the pulling direction of the adsorbing sheet. . As a result, the polishing apparatus of Patent Document 1 has an advantage that the adsorbing sheet can be prevented from peeling off and rising because the adsorbing sheet is not peeled off from the intermediate sheet. Moreover, the film body is comprised by the two-layer structure which consists of a resin layer and a fiber layer.

WO2007 / 020858 Publication

  By the way, the film body of Patent Document 1 receives a pressurized fluid directly and transmits a polishing pressure to the glass plate, and between the glass plate rotating relatively during polishing of the glass plate and the polishing pad. And a function of receiving the generated polishing resistance. That is, the film body receives a force in a direction in which it is expanded by the pressurized fluid and a force that is repeatedly expanded and contracted in the pulling direction by the polishing resistance. For this reason, since the lifetime of the film body is short and it is necessary to frequently replace the film body, there is a problem that the productivity of the glass plate cannot be increased.

  This invention is made | formed in view of such a situation, and it aims at providing the grinding | polishing apparatus of the plate-shaped object which can improve the productivity of a glass plate.

  In order to achieve the above object, the present invention provides a plate-like body adhering portion for adhering a plate-like body, a plate-like body holding portion for holding the plate-like body adhering portion, and the plate-like body adhering. And a polishing tool for polishing a polishing surface of the plate-like body that is disposed opposite to the plate and is stuck by the plate-like body sticking portion. The portion has a flat portion on the opposing surface of the polishing tool, and the flat portion includes a plate-like sticking portion, and the flat portion is constituted by a plate-like member held by the plate-like holding portion. There is provided a plate-like body polishing apparatus comprising pressurized fluid supply means for supplying a pressurized fluid to a space between the plate-like member and the plate-like body holding part.

  According to the present invention, first, the plate-like body is attached to the attachment portion provided in the flat portion of the plate-like body attachment portion, and then this plate-like body attachment portion is used as the plate-like body holding portion. Hold. Then, the plate-like body holding part and the polishing tool are relatively brought close to each other to press the plate-like body against the polishing tool, and the plate-like body holding part and the polishing tool are relatively moved along the polishing surface of the plate-like body. The polishing surface of the plate-like body is polished by moving.

  In the present invention, since the plate-like body is polished without using the film body, the productivity of the plate-like body can be increased. Since the planar portion of the plate-like body attaching portion receives a force repeatedly expanded and contracted in the pulling direction by the polishing resistance, it is preferably made of a highly rigid metal. Further, the rigidity can be increased by using a metal having a large elastic modulus such as Young's modulus or by increasing the plate thickness.

  Further, according to the present invention, when pressurized fluid is supplied from the pressurized fluid supply means to the space between the plate-like member and the plate-like body holding portion, the plate-like shape stuck to the sticking portion. The body is pressed against the polishing tool by the pressure of the pressurized fluid. As a result, according to the present invention, the pressure applied to each part of the plate-like body by the pressurized fluid becomes a uniform pressure, so that the fine irregularities on the surface of the plate-like body are removed while polishing the plate-like body flatly. it can.

  The flat surface portion of the present invention is configured by a plate-like member held by the plate-like body holding portion, and in the space between the plate-like member and the plate-like body holding portion, the plate-like body holding portion is provided. It is preferable that the attached film body is disposed and has a pressurized fluid supply means for supplying a pressurized fluid to a space between the film body and the plate-like body holding portion.

  According to the present invention, when the pressurized fluid is supplied from the pressurized fluid supply means to the space between the membrane body and the plate-like body holding portion, the membrane body expands, and the adhesive body is affixed to the pasting portion. The attached plate-like body is pressed against the polishing tool by the pressure of the pressurized fluid. As a result, according to the present invention, the pressure applied to each part of the plate-like body by the pressurized fluid becomes a uniform pressure, so that the fine irregularities on the surface of the plate-like body are removed while polishing the plate-like body flatly. it can.

  The plate-like body polishing apparatus of the present invention has a film body as in the conventional polishing apparatus, but the film body of the present invention has only a function of pressing the plate-like body against the polishing tool. That is, the polishing resistance generated during polishing is received by the flat portion (plate member) of the plate-like body attaching portion. That is, according to the present invention, the member (film body) that presses the plate-like body against the polishing tool and the member that receives the polishing resistance (plane portion: plate-like member) are separate parts, so that the life of the film body is extended. be able to.

  In the present invention, it is preferable that a sealing portion is provided at a place where the plate-like body holding portion and the plate-like member are in contact with each other.

  According to the present invention, since leakage of the pressurized fluid supplied from the pressurized fluid supply means can be prevented by the sealing portion, the pressure of the pressurized fluid can be efficiently transmitted to the plate-like body.

  The planar portion of the present invention is preferably composed of a planar portion of a box-shaped body having an opening surface, and the box-shaped body is preferably held by the plate-shaped body holding portion via the opening surface.

  According to the present invention, first, the plate-like body is stuck to the sticking portion provided in the flat portion of the box-like body constituting the plate-like body sticking portion, and then this box-like body is put into the plate-like body. The holding portion is held through the opening surface. Then, the plate-like body holding part and the polishing tool are relatively brought close to each other to press the plate-like body against the polishing tool, and the plate-like body holding part and the polishing tool are relatively moved along the polishing surface of the plate-like body. The polishing surface of the plate-like body is polished by moving. Also in the present invention, since the plate-like body is polished without using the film body, the productivity of the plate-like body can be increased.

  The present invention preferably includes a pressurized fluid supply means for supplying a pressurized fluid to a space between the box-shaped body and the plate-shaped body holding portion.

  According to the present invention, when the pressurized fluid is supplied from the pressurized fluid supply means to the space between the box-shaped body and the plate-shaped body holding portion, the box-shaped body is moved toward the polishing tool. Thus, the plate-like body stuck to the sticking part is pressed against the polishing tool by the pressure of the pressurized fluid. As a result, according to the present invention, the pressure applied to each part of the plate-like body by the pressurized fluid becomes a uniform pressure, so that the fine irregularities on the surface of the plate-like body are removed while polishing the plate-like body flatly. it can.

  In the present invention, a film body attached to the plate-like body holding part is arranged in a space between the box-like body and the plate-like body holding part, and the film body and the plate-like body holding part It is preferable to have a pressurized fluid supply means for supplying pressurized fluid to the space between them.

  According to the present invention, when the pressurized fluid is supplied from the pressurized fluid supply means to the space between the membrane body and the plate-like body holding portion, the membrane body expands, and the adhesive body is affixed to the pasting portion. The attached plate-like body is pressed against the polishing tool by the pressure of the pressurized fluid. As a result, according to the present invention, the pressure applied to each part of the plate-like body by the pressurized fluid becomes a uniform pressure, so that the fine irregularities on the surface of the plate-like body are removed while polishing the plate-like body flatly. it can.

  Further, the present invention has a film body as in a conventional polishing apparatus, and this film body has a function of simply pressurizing a plate-like body against a polishing tool. In other words, the polishing resistance generated during polishing is received by the flat portion of the box-shaped body. That is, according to the present invention, since the member (film body) that presses the plate-like body against the polishing tool and the member that receives the polishing resistance (plane portion) are separate parts, the life of the film body can be extended.

  In the present invention, it is preferable that the plate-like body holding portion and the box-like body have a sealing portion at a place where they contact each other.

  According to the present invention, since leakage of the pressurized fluid supplied from the pressurized fluid supply means can be prevented by the sealing portion, the pressure of the pressurized fluid can be efficiently transmitted to the plate-like body.

  It is preferable that the planar portion of the present invention is disposed horizontally, and the polishing tool is disposed above the planar portion.

  According to the present invention, the polishing apparatus may be a polishing apparatus in which the polishing tool is disposed above the plane portion, that is, the polishing apparatus in which the polishing tool is disclosed above the plate-shaped body holding portion. In this polishing apparatus, in the case where the box-shaped body is held by the plate-shaped body holding portion via the opening surface, the plate-shaped body holding portion (male) is fitted to the opening surface (female) of the box-shaped body. It becomes a structure provided with the fitting type of the nest type to be united. In this case, since the polishing liquid used for polishing the plate-like body falls as it is, it is possible to prevent the polishing liquid from entering the inside of the plate-like body holding portion from the nested fitting portion.

  The planar portion of the present invention is preferably disposed horizontally, and the polishing tool is disposed below the planar portion.

  According to the present invention, the polishing apparatus may be a polishing apparatus in which the polishing tool is disposed below the plane portion, that is, the polishing apparatus in which the polishing tool is disclosed below the plate-like body holding portion.

  According to the plate-like body polishing apparatus of the present invention, the productivity of the plate-like body can be increased.

The top view which shows the whole structure of the grinding | polishing apparatus of embodiment Assembly perspective view of carrier and canvas Side view showing an embodiment of a polishing stage Expanded cross-sectional view of the main part showing the canvas mounting structure to the carrier A perspective view including a partially broken portion showing the configuration of the polishing surface plate The principal part expanded sectional view which showed the other structure of the grinding | polishing part using a film body Schematic showing another configuration of the polishing section using a box-shaped body

  Hereinafter, preferred embodiments of a polishing apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

  FIG. 1 is a plan view showing an overall structure of a polishing apparatus 10 according to an embodiment. FIG. 2 is an assembled perspective view of the carrier 52 and the canvas 14. FIG. 3 is a side view showing an embodiment of a polishing stage.

  The polishing apparatus 10 of the embodiment shown in FIG. 1 has a flatness necessary for a glass plate for a liquid crystal display, for example, with a polishing surface of a large glass plate G having a side exceeding 1000 mm and a thickness of 0.2 mm to 0.7 mm. A polishing apparatus for polishing. As for the size of the glass plate G to be polished, the length of one side is preferably more than 1000 mm, more preferably 2000 mm or more (2200 mm × 2500 mm or more), and further preferably 2800 mm or more (2800 mm × 3000 mm or more).

  The polishing apparatus 10 includes a glass plate carrying conveyor 12 for carrying a glass plate G before polishing, a glass plate sticking stage 16 for sticking the glass plate G to a canvas (plate-like body sticking portion) 14, and a first polishing. A stage 18, a second polishing stage 20, a glass plate removal stage 22 for removing the polished glass plate G from the canvas 14, a glass plate carry-out conveyor 24, a canvas cleaning stage 26, a canvas drying stage 28, and a canvas return conveyor 30. Mainly prepared.

  Hereinafter, in order to simplify the description, the glass plate attaching stage 16, the first polishing stage 18, the second polishing stage 20, the glass plate removing stage 22, the canvas cleaning stage 26, and the canvas drying stage 28 are simply described. It is described as stages 16, 18, 20, 22, 26, 28.

  The polishing apparatus 10 includes a transport device 150 that transports the canvas 14 from the stage 16 to the stage 18, a transport device 152 that transports the canvas 14 from the stage 18 to the stage 20, and a transport device that transports the canvas 14 from the stage 20 to the stage 22. 154 is provided. These transfer devices 150, 152, and 154 have the same configuration, and their operations are controlled by a control unit 200 that controls the polishing apparatus 10 in an integrated manner, and are reciprocated synchronously in the left-right direction in FIG.

  The unpolished glass plate G carried in by the glass plate carrying-in conveyor 12 is sucked and held by a suction pad 34 provided on the arm 33 of the robot 32. Then, it is transferred from the glass plate carry-in conveyor 12 to the conveyor 36 by the rotation operation of the arm 33, and is conveyed to the stage 16 by the conveyor 36.

  In the stage 16, the glass plate G before polishing is attached to the canvas 14. The sticking method will be described. The canvas 14 is held by a lifting device (not shown) on the stage 16, and when the glass plate G is positioned below the canvas 14, the canvas 14 is moved downward by the lifting device. A foamed polyurethane adsorbing sheet (sticking portion) 39 attached to the back plate (planar portion: plate-like member) 38 of the canvas 14 shown in FIG. 2 is pressed against the non-polished surface of the glass plate G. With this pressing force, the non-polished surface of the glass plate G is detachably attached to the back plate 38 via the suction sheet 39. Thereafter, the canvas 14 is held by the transfer device 150 of FIG. 1 and transferred to the stage 18 of FIG. 3 where it is held by the carrier (plate-shaped body holding portion) 52 of the polishing head 50.

  As shown in FIG. 2, the canvas 14 has a rectangular back plate 38 stretched between a rectangular upper frame 40 and a lower frame 42, and then the upper frame 40 and the lower frame 42 are not shown. It is constituted by fastening with bolts. The back plate 38, the upper frame 40, and the lower frame 42 are made of a material that can sufficiently withstand the polishing pressure during polishing and the polishing resistance of the glass plate G, for example, a metal such as aluminum. The thickness of the back plate 38 is preferably about 2 to 4 mm. If the thickness of the back plate 38 is 2 mm or more, it can sufficiently withstand the polishing pressure and the polishing resistance. If the thickness of the back plate 38 is within 4 mm, it becomes easy to transmit the polishing pressure by compressed air (pressurized fluid) described later to the glass plate G.

  Next, the polishing head 50 shown in FIG. 3 will be described. Since the polishing head 50 of the stage 18 and the polishing head 50 of the stage 20 have the same structure, the same reference numerals are used for explanation.

  The polishing head 50 includes a main body casing 51, and a revolving drive mechanism (not shown) is built in the main body casing 51. The revolution drive mechanism is composed of a planetary gear mechanism and a motor, and the output shaft of the planetary gear mechanism driven by the motor is connected to a spindle 56 that is suspended in the vertical direction. A carrier 52 is connected to the spindle 56. Therefore, when the planetary gear mechanism is driven, the carrier 52 and the canvas 14 are revolved around a predetermined revolution center.

  Further, the main casing 51 is connected to the lifting mechanism 156 via the slider 158. The main body casing 51 is moved up and down with respect to the slider 158 by the lifting mechanism 156, whereby the carrier 52 is moved to the circular polishing pad (polishing tool) 58 of the stage 18 and the circular polishing pad (polishing tool) 60 of the stage 20. While moving forward and backward, the polishing surface of the glass plate G adhered to the suction sheet 39 of the back plate 38 as shown in FIG. 4 is pressed against the polishing pads 58 and 60 of FIG. 3 with a predetermined polishing pressure.

  The slider 158 may be removed from the polishing apparatus 10 and the main body casing 51 may be directly connected to the lifting mechanism 156.

  The polishing pad 58 is affixed to the upper surface of the polishing surface plate 62 as shown in FIG. The polishing surface plate 62 is rotatably supported by a polishing table 64 via a bearing 65, and the center of rotation is set coaxially with the central axis of the polishing pad 58. A gear portion 66 is provided on the side surface of the polishing surface plate 62, and a gear 67 rotated by a motor 68 is engaged with the gear portion 66. Further, the gear portion 66 is formed in an arc shape centering on the central axis of the polishing pad 58. Accordingly, by driving the motor 68, the polishing pad 58 is rotated (spinned) around its central axis.

  The polishing table 64 is slidably supported by a pair of guide rails 69 and 69 arranged in parallel. By providing a drive unit (not shown) for reciprocating the polishing table 64 along the guide rails 69, 69, the polishing pad 58 is swung horizontally when necessary. The swinging direction of the polishing pad 58 may be a direction orthogonal to the transport direction by the transport device 150 of FIG. 1 or may be a direction parallel to the transport direction. That is, any direction that swings the polishing pad 58 in the horizontal direction may be used.

  Note that a number of hoses (not shown) for supplying slurry to the back side of the polishing pad 58 are connected to the polishing surface plate 62 of FIG. In order to prevent the hoses from being entangled, the rotation of the polishing pad 58 is regulated so as to turn within a predetermined angle range from a predetermined reference position. The slurry supplied from the hose to the back side of the polishing pad 58 is supplied to the surface of the polishing pad 58 through a slurry supply hole penetrating the inside of the polishing pad 58.

  Further, the range of the turning angle of the polishing pad 58, the turning operation such as the turning speed, and the revolution operation such as the revolution speed per unit time are independently controlled by the control unit 200 of FIG.

  Since the configuration of each part of the polishing pad 60 is the same as the configuration of the polishing pad 58 described above, description thereof is omitted here.

  On the other hand, linear motion guides 70 are attached to the slider 158 of the stage 18 as shown in FIG. The linear motion guides 70, 70 are fitted to the guide rails 72, 72. The guide rails 72 and 72 are disposed toward a maintenance stage 74 for maintaining the spindle 56 of the stage 18 and the carrier 52 as indicated by broken lines in FIG.

  Further, as shown in FIG. 3, linear motion guides 70, 70 are similarly attached to the slider 158 of the stage 20, and the linear motion guides 70, 70 are fitted to the guide rails 160, 160. The guide rails 160 and 160 are arranged toward a maintenance stage 76 for maintaining the spindle 56 and the carrier 52 of the stage 20 as indicated by broken lines in FIG.

  Note that the slider 158 may be removed from the polishing apparatus 10, and the linear motion guides 70 and 70 may be directly attached to the lifting device 156.

  Next, the carrier 52 shown in FIGS. 2 and 4 will be described. FIG. 4 is an enlarged cross-sectional view of a main part showing a structure for attaching the canvas 14 to the carrier 52.

  A plurality of holding portions 80, 80... For holding the canvas 14 on the carrier 52 are provided on the four sides of the carrier 52. As shown in FIG. 4, the holding unit 80 includes a disc 82 that presses the end portions 52 </ b> A of the four sides of the carrier 52, a disc 84 that presses the end portions 40 </ b> A of the four sides of the upper frame 40 of the canvas 14, The pin 86 is connected to the disk 84. The pressing means for pressing the disk 82 and the disk 84 as described above is provided in the carrier 52. For example, the piston of the cylinder is connected to the pin 86, and the piston 82 is contracted to draw the disk 82 and the disk 84 together. The disc 82 is pressed against the end 52A, and the disc 84 is pressed against the end 40A. The pressing means is not limited to the cylinder, and the shape of the holding portion 80 is not limited to this example. That is, any configuration may be used as long as the canvas 14 can be detachably held on the carrier 52.

  On the other hand, a mount 88 is formed along the periphery of the lower surface of the carrier 52, and a seal member (sealing part) 90 is attached to the lower surface of the mount 88. When the canvas 14 is held by the holding portion 80 and the glass plate G is pressed against the polishing pads 58 and 60 by the carrier 52, the upper surface of the back plate 38 is pressed against the seal member 90. Thereby, an air chamber (space) 54 with good airtightness is formed between the carrier 52 and the canvas 14. When the air chamber 54 having good airtightness is formed, the pressure applied to each part of the glass plate G becomes a uniform pressure, so that the fine irregularities on the surface of the glass plate G can be removed while the glass plate G is polished flat. .

  In the carrier 52, jet ports 98, 98... For jetting compressed air (pressurized fluid) into the air chamber 54 are opened. These injection ports 98, 98... Communicate with an air supply path 102 indicated by a broken line in FIG. 3 through an air chamber 100 provided on the upper surface of the carrier 52. The air supply path 102 extends outside the polishing head 50 via a rotary joint (not shown) attached to the polishing head 50, and is connected to an air pump (pressurized fluid supply means) 106 via a valve 104. Yes. Therefore, when the valve 104 is opened, the compressed air from the air pump 106 is supplied to the air chamber 54 via the air supply path 102, the air chamber 100 of FIG. Thus, the pressure of the compressed air is transmitted to the glass plate G through the back plate 38, and the polishing surface of the glass plate G is pressed against the polishing pads 58 and 60 of FIG. Further, since the compressed air supplied to the air chamber 54 is sealed by the seal member 90, leakage from the air chamber 54 is suppressed. Thereby, the pressure of compressed air is efficiently transmitted to the glass plate G.

  When the polishing of the glass plate G is completed at the stage 20 shown in FIG. 1, the canvas 14 is removed from the carrier 52 and conveyed to the stage 22 by the conveying device 154. At the stage 22, the glass plate G that has been polished is removed from the canvas 14. The removed glass plate G is conveyed by the conveyor 138, and is adsorbed by the adsorption head 144 attached to the arm 142 of the robot 140, and is transferred to the glass plate carry-out conveyor 24 by the operation of the robot 140. 10 to the outside.

  In addition, the canvas 14 from which the glass plate G has been removed is conveyed to the stage 26 by the conveyor 146 where it is washed with water. The washed canvas 14 is conveyed to the stage 28 by the conveyor 148, where it is heated and dried. Then, the dried canvas 14 is transported to the stage 16 by the canvas return conveyor 30 and reused for attaching the glass plate G. The above is the overall configuration of the polishing apparatus 10.

  The polishing stage may be one or two or more depending on the application. In consideration of efficiency and cost, it is preferable to provide two stages of a rough polishing stage and a finish polishing stage, but a finish polishing stage may be added for high quality purposes in some cases.

  Next, the operation of the polishing apparatus 10 configured as described above will be described.

  First, on the stage 16, the glass plate G is attached to the suction sheet 39 attached to the back plate 38 of the canvas 14. Next, the canvas 14 is conveyed to the stage 18 and held horizontally by the carrier 52. Next, the canvas 14 and the polishing pads 58 and 60 are brought relatively close to each other, the glass plate G is pressed against the polishing pads 58 and 60 by the pressure of compressed air, and the canvas 14 and the polishing pads 58 and 60 are pressed against the glass plate G. The polishing surface of the glass plate G is polished by relatively moving along the polishing surface.

  FIG. 4 is a partial cross-sectional view showing the configuration of the polishing section installed on the stages 18 and 20. The polishing unit transmits the pressure of the compressed air supplied to the air chamber 54 of the carrier 52 to the glass plate G through the back plate 38 and the suction sheet 39 of the canvas 14, and the polishing surface of the glass plate G is used as a polishing pad. Polish by 58, 60.

  In the polishing apparatus 10 according to the embodiment, since the glass plate G is polished using the canvas 14 without using the film body, the film body replacement step can be omitted from the production process of the glass plate G. Thereby, the productivity of the glass plate G is improved.

  In the embodiment, the example in which the glass plate G is polished by the pressure of the compressed air has been described. However, the present invention is not limited to this, and the glass plate G is polished by the advance of the carrier 52 with respect to the polishing pads 58 and 60. The present invention can also be applied to a polishing apparatus that applies pressure.

  FIG. 6 shows a form of another polishing unit using a film body 92 as a member for transmitting the polishing pressure to the glass plate G.

  The polishing unit expands the film body 92 by the pressure of the compressed air supplied to the air chamber 54 of the carrier 52, and applies the pressing force of the expanded film body 92 via the back plate 38 and the suction sheet 39 of the canvas 14. This is transmitted to the glass plate G, and the polishing surface of the glass plate G is polished by the polishing pads 58 and 60. Also in this polishing part, the pressure applied to each part of the glass plate G by the pressure of the compressed air becomes a uniform pressure, so that the fine irregularities on the surface of the glass plate G can be removed while polishing the glass plate G flatly.

  In this example, the film body 92 is provided, but the film body 92 of this example is attached to the carrier 52 and has only a function of pressing the glass plate G against the polishing pads 58 and 60. In other words, the polishing resistance generated during the polishing of the glass plate G is received by the back plate 38 of the canvas 14. That is, in this example, the member (film body 92) that presses the glass plate G against the polishing pads 58 and 60 and the member that receives the polishing resistance (back plate 38) are separate parts. Can extend its life.

  Also in the form shown in FIG. 6, the seal member 90 shown in FIG. 4 may be provided on the mount 88 of the carrier 52. Thereby, the airtightness of the air chamber 54 is improved.

  1 to 6 exemplify the polishing apparatus 10 in which the polishing pads 58 and 60 are disposed below the horizontally disposed back plate 38, the polishing pad 58 is disposed above the back plate 38. , 60 can be applied to the polishing apparatus.

  FIG. 7 is a schematic diagram showing another configuration of a polishing unit using a box (box-like body) 94.

  In the polishing unit shown in the figure, polishing pads 58 and 60 are arranged above a horizontally arranged back plate 38.

  The back plate 38 is attached to the upper surface (planar portion) of the box 94 having an opening surface on the lower surface. The suction sheet 39 is adhered to the upper surface of the back plate 38, and the non-polished surface of the glass plate G is adhered to the upper surface of the suction sheet 39.

  The carrier 52 is telescoped from the opening surface of the box 94 into the internal space of the box 94. A seal member 90 is attached to the upper surface edge of the carrier 52, and the seal member 90 is in contact with the inner side surface of the upper wall of the box 94. Thereby, an air chamber 54 is formed between the carrier 52 and the box 94. When compressed air is supplied to the air chamber 54, the box 94 rises toward the polishing pads 58 and 60, and the glass plate G adhered to the adsorption sheet 39 is pressed against the polishing pads 58 and 60 by the pressure of the compressed air. It is done. Thereby, also in this grinding | polishing part, since the pressure concerning each part of the glass plate G by compressed air becomes a uniform pressure, the fine unevenness | corrugation on the surface of the glass plate G can be removed, grind | polishing the glass plate G flatly.

  Note that a film body 92 indicated by a two-dot chain line may be attached to the carrier 52, and compressed air may be supplied to the air chamber 54 between the film body 92 and the carrier 52. Further, the polishing pressure may be obtained by the ascending force of the carrier 52 without using compressed air.

  7 has a structure including a nested fitting portion in which the upper portion (male) of the carrier 52 is fitted to the opening surface (female) of the box 94. In this case, since the slurry (polishing liquid) used for polishing the glass plate G falls as it is, it is possible to prevent the slurry from entering the air chamber 54 inside the carrier 52 from the nested fitting portion.

  In the polishing unit of this example, the polishing pads 58 and 60 are disposed above the horizontally arranged back plate 38. However, the present embodiment is also applied to a polishing apparatus in which the polishing pads 58 and 60 are disposed below the back plate 38. An example can be applied.

  An example of the specifications of the stages 18 and 20 is shown below.

Polishing pressure: 2 kPa to 25 kPa
Polishing slurry: Polishing slurry in which cerium oxide is dispersed in water is supplied from the slurry supply hole of the polishing platen. Polishing pad 58: Made of polyurethane foam, with grooves that allow slurry to flow on the surface (groove pitch 4.5mm, groove width 1.5mm) , Groove depth 1-5mm)
Polishing pad 60: Suede made of soft urethane, with grooves for flowing slurry on the surface (groove pitch 4.5mm, groove width 1.5mm, groove depth 1-5mm)
Thickness of glass plate G: 0.2 mm to 0.7 mm
Shape of glass plate G: Rectangular glass plate with a side exceeding 1000 mm Non-polished surface of glass plate G: Adherently held by polyurethane adsorption pad attached to back plate 38 of canvas 14 Back plate 38 of canvas 14 In the experiment, it was confirmed that there was no deterioration or damage even after long-term use, and that the replacement work of the canvas 14 could be drastically reduced. Thereby, it has also been grasped that the productivity of the glass plate is improved.

  G ... Glass plate, 10 ... Polishing device, 12 ... Conveyor for carrying glass plate, 14 ... Canvas, 16 ... Glass plate sticking stage, 18 ... First polishing stage, 20 ... Second polishing stage, 22 ... Glass plate Removal stage, 24 ... Conveyor for carrying out glass plate, 26 ... Canvas washing stage, 28 ... Canvas drying stage, 30 ... Canvas return conveyor, 32 ... Robot, 33 ... Arm, 34 ... Suction pad, 36 ... Conveyor, 38 ... Back plate 39 ... Adsorption sheet, 40 ... Upper frame, 42 ... Lower frame, 50 ... Polishing head, 51 ... Main body casing, 52 ... Carrier, 54 ... Air chamber, 56 ... Spindle, 58 ... Polishing pad, 60 ... Polishing pad, 62 ... Polishing surface plate, 70 ... Linear motion guide, 72 ... Guide rail, 74 ... Maintenance stage, 76 ... Maintenance step G, 80 ... holding part, 82, 84 ... disk, 86 ... pin, 88 ... mount, 90 ... sealing member, 92 ... film body, 94 ... box, 98 ... injection port, 100 ... air chamber, 102 ... air supply Road 104: Valve 106 Air pump 138 Conveyor 140 Robot 142 Arm 144 Adsorption head 146 148 Conveyor 150 152 154 Conveyor 160 160 Guide rail 200 Control unit

Claims (9)

A plate-like body attaching part for attaching the plate-like body;
A plate-like body holding part for holding the plate-like body attaching part;
A polishing tool that is disposed to face the plate-like body attaching part and polishes the polishing surface of the plate-like body that is attached by the plate-like body attaching part,
In a plate-shaped polishing apparatus having
The plate-like body adhering portion has a flat portion on the facing surface of the polishing tool, and the flat portion includes an adhering portion of the plate-like body,
The plane portion is composed of a plate-like member held by the plate-like body holding portion,
An apparatus for polishing a plate-like body, comprising pressurized fluid supply means for supplying a pressurized fluid to a space between the plate-like member and the plate-like body holding portion. The plane portion is composed of a plate-like member held by the plate-like body holding portion,
In the space between the plate-like member and the plate-like body holding part, a film body attached to the plate-like body holding part is arranged,
The plate-shaped body polishing apparatus according to claim 1, further comprising a pressurized fluid supply unit configured to supply a pressurized fluid to a space between the film body and the plate-shaped body holding portion.   The polishing apparatus for a plate-like body according to claim 1, wherein the plate-like body holding portion and the plate-like member are in contact with each other and have a sealing portion. The plane portion is composed of a plane portion of a box-shaped body having an opening surface,
The plate-shaped polishing apparatus according to claim 1, wherein the box-shaped body is held by the plate-shaped body holding portion through the opening surface.   The plate-shaped body polishing apparatus according to claim 4, further comprising a pressurized fluid supply unit configured to supply a pressurized fluid to a space between the box-shaped body and the plate-shaped body holding portion. In the space between the box-shaped body and the plate-shaped body holding portion, a film body attached to the plate-shaped body holding portion is disposed,
The plate-shaped body polishing apparatus according to claim 4, further comprising a pressurized fluid supply unit configured to supply a pressurized fluid to a space between the film body and the plate-shaped body holding portion.   The polishing apparatus for a plate-shaped body according to claim 5 or 6, wherein the plate-shaped body holding section and the box-shaped body are in contact with each other.   The said planar part is arrange | positioned horizontally, The said grinding | polishing tool is arrange | positioned above this planar part, The polishing apparatus of the plate-shaped body as described in any one of Claims 1-6.   The said plane part is arrange | positioned horizontally, The said polishing tool is arrange | positioned under this plane part, The polishing apparatus of the plate-shaped object as described in any one of Claims 1-6.

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