JP2007007770A - Polishing machine - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a polishing machine in which an outer peripheral portion is not excessively polished, and thus the entire surface of a member to be polished can be used as a product.
A polishing platen (1) on which a flat member to be polished w is placed on a polishing pad (10) provided on the surface, and a pressure plate arranged opposite to the polishing platen. The press platen is provided with a main body (3) having a recess (S2) formed on the surface facing the polishing pad, and is provided in the main body and pressurizing the recess. A pressurizing means (35) for supplying a fluid, a flexible sealing material (5) covering the opening on the polishing pad side of the recess, and the main body or the sealing material, A template (7) that restricts relative displacement between the member to be polished w and the main body from the side is provided, and the side wall (37) of the recess is provided outside the position facing the member to be polished w. A polishing machine was used.
[Selection] Figure 1

Description

  The present invention relates to a polishing machine for polishing a flat thin plate such as a glass panel for a flat panel display.

  As a conventional polishing machine for polishing the thin plate, as shown in FIG. 2, a polishing platen 1 on which a member to be polished w is placed on a polishing pad 10 provided on the surface, and the polishing platen 1 An apparatus comprising a pressure platen 9 arranged to face each other is known.

  The pressurizing platen 9 includes pressurizing means for supplying compressed air to a member w to be polished such as a glass substrate, and has a cavity S1 at the center and a projecting wall 97 projecting downward at the lower outer periphery. And a disc body 99 in which a recess S2 surrounded by the protruding wall 97 is formed.

  Further, an elastic body 91 provided so as to cover the opening of the recess S2 is provided on a surface of the disk body 99 facing the polishing surface plate 1, and a lower peripheral portion of the elastic body 91 is provided on the bottom surface. A template 92 disposed so as to contact the peripheral edge of the polishing member w, and a backing material 93 provided integrally with the inside of the template 92 to prevent direct contact between the elastic body 91 and the member to be polished w Is provided. The template 92 is provided to be thinner than the thickness of the backing material 93 and the member to be polished w.

On the other hand, a rotating shaft 94 that rotatably supports the disc body 99 is provided on the upper portion of the disc body 99. The pressurizing means includes an air supply pipe 95 that supplies compressed air to the cavity S1 and an air supply pipe 96 that supplies and sucks compressed air onto the elastic body 91.
In the pressure platen 9 described above, the protruding wall 97 has an inner peripheral portion extending above the member to be polished w, and the outer peripheral portion of the member to be polished w is reliably brought into contact with the polishing pad 10. It is like that.

  According to this polishing machine, the compressed air is supplied to the cavity S1 by the compressed air supply pipe 95 as a pressurizing means, whereby the inner peripheral portion of the protruding wall 97 supports the member to be polished w on the polishing pad 10. The member to be polished w can be pressed against the polishing surface plate 1 by supplying compressed air to the concave portion S <b> 2 by the compressed air supply pipe 96. For this reason, the member to be polished w can be brought into contact with the polishing pad 10 and polished by relatively moving the polishing platen 1 and the pressure platen 9 in the plane.

However, in this polishing machine, since the inner peripheral portion of the protruding wall 97 is disposed on the outer peripheral portion of the member to be polished w, the supporting force of the member to be polished w on the polishing pad 10 by the protruding wall 97 is high. There is a problem that it tends to concentrate on the outer periphery. Furthermore, since the backing material 93 and the member to be polished w have a thickness equivalent to that of the template 92, there is a problem that the outer peripheral portion of the member to be polished w is overpolished.
As a result, for example, when performing multi-chamfering such as a color filter, the product cannot be cut out from the outer peripheral portion of the over-polished member w, so that the number of products obtained from a single member to be polished w is There was a problem that it was less and inferior in economic efficiency.
Note that the applicant has previously filed a polishing machine related to the present invention (for example, Patent Document 1).

JP 2004-105817 A

  Therefore, an object of the present invention is to provide a polishing machine in which the outer peripheral portion is not overpolished, and thus the entire surface of the member to be polished can be used as a product.

  The invention according to claim 1 is a polishing platen on which a flat plate-like member to be placed is placed on a polishing pad provided on the surface, and a pressure platen disposed opposite to the polishing platen. And the pressurizing platen includes a main body having a recess formed on the surface facing the polishing pad, a pressurizing means provided in the main body and supplying pressurized fluid to the recess, and the recess A flexible sealing material that covers the opening on the polishing pad side, and a template that is fixed to the main body or the sealing material and restricts relative displacement between the polished member and the main body from the side of the polished member. The side wall of the recess is provided outside the position facing the member to be polished, and pressurized fluid is supplied to the recess by the pressurizing means, and the While pressing the member to be polished, the polishing platen and the pressure platen The by-plane movement, a grinding machine, characterized by polishing the polishing target member by the polishing pad.

According to the first aspect of the present invention, when the pressurized fluid is supplied to the recess formed on the polishing pad facing surface of the main body of the pressurizing surface plate by the pressurizing means, the opening on the polishing pad side of the recess is formed. Since the sealing material provided on the surface is flexible, it expands toward the member to be polished, and the member to be polished can be supported on the polishing pad. At this time, since the side wall of the recess is provided outside the position facing the member to be polished, the pressurized fluid supplied to the recess can evenly press the entire surface of the member to be polished toward the polishing pad. it can.
As a result, the entire surface of the member to be polished can be uniformly polished when the pressure platen and the surface plate to be polished are relatively moved in-plane and the member to be polished is polished by the polishing pad. Thereby, the entire surface of the member to be polished can be used as a product, and the manufacturing yield can be improved. In particular, the yield can be drastically improved in products such as color filters that perform multi-planar processing.

  Hereinafter, an embodiment of a polishing machine according to the present invention will be described with reference to FIG.

  The polishing machine according to the present embodiment includes a polishing surface plate 1 on which a member to be polished w is placed on a polishing pad 10 provided on the surface, and a pressure surface plate 2 disposed opposite to the polishing surface plate 1. It is roughly composed of Here, as the member to be polished w, a lithographic material such as a rectangular glass substrate is polished by a polishing machine.

The polishing surface plate 1 is a thick disk-shaped member whose surface is processed to a high flatness, and a rotating shaft (not shown) that rotatably supports the polishing surface plate 1 is provided on the lower surface of the center portion thereof. The polishing pad 10 is provided on the entire upper surface of the polishing pad 10.
As this polishing pad 10, hard foamed urethane, soft foamed urethane, synthetic resin fiber, nonwoven fabric, or the like is used.

The pressurizing surface plate 2 covers the disk body 3 (main body) in which the cavity S1 and the recess S2 are formed on the surface facing the polishing pad 10 at the center, and the opening of the recess S2 so as to cover the disk body 3 And an elastic body (seal material) 5 provided on substantially the entire surface.
A rotating shaft 4 that supports the disk body 3 so as to be rotatable in the same direction as the polishing surface plate 1 is provided at the upper center of the disk body 3.
On the other hand, on the lower surface of the elastic body 5, a backing material 6 provided at a position corresponding to substantially the entire surface of the rectangular member to be polished w and a gap (1 mm to 5 mm) between the peripheral portion of the member to be polished w. And the template 7 disposed in an integrated manner.

  The disk body 3 includes a shaft body 31a supported by the rotating shaft 4 and a shaft body 31b that is provided integrally with the shaft disk 31a so as to be suspended from the peripheral end portion thereof. And are provided. Also, the outer disk 32a has a larger outer method than the shaft disk 31a, and is disposed in parallel with the opposing polishing pad 10, and the counter disk 32a is erected at the peripheral end thereof and integrated with the counter disk 32a. There is provided a pressurizing body 32 having an opposing wall portion 32b provided oppositely and disposed opposite to the outer peripheral side of the shaft wall portion 31b. The bearing body 31 and the pressurizing body 32 form the cavity S1 in the central portion, and have a resilient connecting member in which both end portions are embedded in the lower portion of the shaft wall portion 31b and the upper portion of the opposing wall portion 32b. 33 is integrated.

The recess S2 has an opening at the center lower portion of the counter disk 32a toward the polishing pad 10, and is disposed outside the position where the side wall 37 faces the member to be polished w. The opening area is the same as or slightly larger than the surface area of the member to be polished w.
In addition, the disc body 3 has a seal member 36 embedded in the counter disk 32a outside the side of the recess S2 so as to surround the recess S2, and the lower portion of the seal member 36 is the elastic body 5. It comes to adhere to.

The elastic body 5 is made of, for example, rubber, and is integrated with the disk body 3 by the seal member 36.
The backing material 6 is made of polyurethane foam, and the elastic body 5 and the backing material 6 provided on substantially the entire upper surface of the member to be polished w have flexibility and compressed air flow.
On the other hand, the template provided outside the member to be polished w is thinned in consideration of the amount removed by polishing from the thickness of the backing material 6 and the member to be polished w on the lower surface of the elastic body 5. Is provided.

  On the other hand, in the recess S2, a supply port for a compressed air supply pipe (pressurizing means) 35 is formed on the upstream side through the shaft disk 31a, the cavity S1, and the counter disk 32a. On the other hand, a supply port for a compressed air supply pipe 34 penetrating the shaft disc 31a is formed in the cavity S1.

The compressed air supply pipe 34 is configured to supply compressed air to the cavity S1, and the compressed air supplied into the cavity S1 is integrated with a bearing body 31 and an elastic connecting member 33, and By pushing the opposing disk 32a outward, the member to be polished w is rotated together with the disk body 3 while pressing the member to be polished w onto the polishing pad 10 via the elastic body 5 and the backing material 6. It has become.
On the other hand, the compressed air supply pipe 35 supplies compressed air to the concave portion S2, and the compressed air supplied to the concave portion S2 makes the surface of the member to be polished w uniformly contact the polishing pad 10. .
Further, the compressed air supply pipe 35 can suck air in the recess S2.

Hereinafter, the operation of the above-described polishing machine will be described.
In the polishing machine according to the present embodiment, the member to be polished w is placed on the polishing pad 10 on the polishing platen 1, compressed air is supplied from the compressed air supply pipe 34 to the cavity S 1, and the direction of the member to be polished w While supporting the member to be polished w on the polishing pad 10 by the elastic body 5 and the backing material 6 that have expanded in parallel, compressed air is supplied from the compressed air supply pipe 35 to the recess S2, and the entire surface of the member w to be polished is evenly distributed. Press toward the polishing pad 10 side. At the same time, the polishing surface plate 1 and the pressure surface plate 2 are rotated in the same direction, and the member to be polished w is rotated together with the pressure surface plate 2, thereby bringing the surface to be polished into contact with the polishing pad 10 uniformly. .

  At this time, since the member to be polished w is provided outside the position where the side wall of the recess S2 faces the member to be polished w, it is not directly pressed by the counter disk 32a, and the compressed air in the recess S2 Is uniformly supplied to the entire surface of the member to be polished w, so that a part of the member to be polished w can be prevented from being overpolished.

Next, air is sucked by the compressed air supply pipe 35, the member to be polished w is adsorbed to the disk body 3, and is conveyed to the next step.
The polishing machine of the present invention is not limited to the above-described embodiment. For example, the suction means may not be provided.

It is a secondary section schematic diagram showing one embodiment of a polisher of the present invention. It is the longitudinal cross-sectional schematic diagram which showed the conventional grinder.

Explanation of symbols

w: Member to be polished S2: Concave part 1 ... Polishing surface plate 2 ... Pressure surface plate 3 ... Disc body (main body)
5 ... Elastic body (sealing material)
7 ... Template 10 ... Polishing pad 35 ... Compressed air supply pipe (pressurizing means)

Claims (1)

A polishing platen on which a flat plate-shaped member is placed on a polishing pad provided on the surface, and a pressure platen disposed opposite to the polishing platen, and the pressurization The surface plate includes a main body having a recess formed on the surface facing the polishing pad, a pressurizing means provided in the main body, for supplying pressurized fluid to the recess, and an opening on the polishing pad side of the recess. A flexible sealing material, and a template that is fixed to the main body or the sealing material and restricts relative displacement between the polished member and the main body from the side of the polished member;
The side wall of the recess is provided outside the position facing the member to be polished, the pressurized fluid is supplied to the recess by the pressurizing means, and the member to be polished is pressed through the sealing material. A polishing machine for polishing the member to be polished by the polishing pad by relatively moving the polishing platen and the pressure platen in-plane.

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