JP2011191338A - Transparent coloring article - Google Patents
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- JP2011191338A JP2011191338A JP2010055028A JP2010055028A JP2011191338A JP 2011191338 A JP2011191338 A JP 2011191338A JP 2010055028 A JP2010055028 A JP 2010055028A JP 2010055028 A JP2010055028 A JP 2010055028A JP 2011191338 A JP2011191338 A JP 2011191338A
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- 238000004040 coloring Methods 0.000 title claims abstract description 12
- 239000010408 film Substances 0.000 claims abstract description 73
- 239000010409 thin film Substances 0.000 claims abstract description 48
- 238000002834 transmittance Methods 0.000 claims abstract description 14
- 239000003989 dielectric material Substances 0.000 claims abstract description 9
- 239000007769 metal material Substances 0.000 claims abstract description 8
- 238000010030 laminating Methods 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 21
- 230000001681 protective effect Effects 0.000 claims description 13
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 4
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 4
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 3
- 239000004417 polycarbonate Substances 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 238000001771 vacuum deposition Methods 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 238000005566 electron beam evaporation Methods 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 125000005395 methacrylic acid group Chemical group 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 239000002356 single layer Substances 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 10
- 230000031700 light absorption Effects 0.000 abstract description 7
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 230000001413 cellular effect Effects 0.000 abstract 3
- 230000002265 prevention Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 13
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000002745 absorbent Effects 0.000 description 4
- 239000002250 absorbent Substances 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- -1 Polyethylene terephthalate Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000011145 styrene acrylonitrile resin Substances 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
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Abstract
Description
本発明は、携帯電話における透視窓等に好適な透明着色品に関する。ここでは、透明着色品として、携帯電話における透視窓を例に採り説明する。 The present invention relates to a transparent colored product suitable for a transparent window or the like in a mobile phone. Here, a transparent window in a mobile phone will be described as an example of the transparent colored product.
蓋付き携帯電話は、蓋閉の状態で、蓋に形成された透視窓を介して、日付・電波・電池状態さらには着信情報等の基本情報を、ディスプレー画面（通常、ＥＬ画面）の点灯時に確認することができるタイプが普及しつつある。 With the lid closed, the basic information such as date, radio wave, battery status, and incoming call information is displayed on the display screen (usually EL screen) through the transparent window formed on the lid. A type that can be confirmed is becoming widespread.
そして、そのような透視窓には、従来、透明基材の裏面に金属薄膜を蒸着して、光透過率を設定値に調節したグレー系のものが殆どであった。 And most of such see-through windows have conventionally been gray type in which a metal thin film is deposited on the back surface of a transparent substrate and the light transmittance is adjusted to a set value.
他方、携帯電話の外装はカラフルなものになってきている。 On the other hand, the exterior of mobile phones is becoming colorful.
このため、透視窓の色と、携帯電話の本体色（外装色）との調和（ハーモニー）を採ることが困難で、意匠性に制限があった。 For this reason, it is difficult to achieve harmony between the color of the see-through window and the main body color (exterior color) of the mobile phone, and the design is limited.
本発明の特許性に影響を与えるものではないが、特許文献１において、下記構成の色シフト性多層干渉膜（干渉多層膜）が提案されている（特許請求の範囲）。なお、当該色シフト性多層干渉膜は、薄片として塗料やインクのような液体媒体中に分散され、次いで対象物や紙に適用されて、入射光の角度のシフトや見る角度のシフトによる色の変動を達成することができる（要約）。 Although it does not affect the patentability of the present invention, Patent Document 1 proposes a color-shifting multilayer interference film (interference multilayer film) having the following configuration (claims). The color-shifting multilayer interference film is dispersed as a flake in a liquid medium such as paint or ink, and then applied to an object or paper to change the color of the incident light by changing the angle of incident light or viewing angle. Variation can be achieved (summary).
「色シフト性多層干渉膜であって、
第一吸収層；
第一吸収層上の第１誘電層；
第一誘電層上の反射層；
反射層上の、前記第１誘電層と同一の材料からなる第２誘電層；及び
第２誘電層上の、前記第１吸収層と同一の材料からなる第２吸収層：
を含んでおり、
前記第１及び第２誘電層が、約１．６５以上の屈折率、及び入射光又は見ることの角度の変化としての色シフトを提供する設計波長での光学的厚さを有していることを特徴とする色シフト性多層干渉膜。」
"A color-shifting multilayer interference film,
First absorbent layer;
A first dielectric layer on the first absorbent layer;
A reflective layer on the first dielectric layer;
A second dielectric layer made of the same material as the first dielectric layer on the reflective layer; and a second absorbent layer made of the same material as the first absorbent layer on the second dielectric layer:
Contains
The first and second dielectric layers have a refractive index greater than about 1.65 and an optical thickness at a design wavelength that provides a color shift as a change in incident light or viewing angle. A color-shifting multilayer interference film characterized by "
本発明は、上記にかんがみて、携帯電話の透視窓等において、携帯電話の外装色との調和のある色付けが可能で、しかも、色シフト性を有して携帯電話等の意匠性を向上させることができる透明着色品を提供することを目的とする。 In view of the above, the present invention enables coloration that is in harmony with the exterior color of a mobile phone in a see-through window of a mobile phone, etc., and has a color shift to improve the design of a mobile phone or the like. An object is to provide a transparent colored product.
本発明者は、上記課題（問題点）を解決するために、鋭意開発に努力をした結果、下記構成の透明着色品に想到した。 As a result of diligent development in order to solve the above problems (problems), the present inventor has conceived a transparent colored product having the following constitution.
透明基材の裏面に、
２種類以上の誘電体材料で形成された組薄膜を積層させて色シフト性の着色機能を有する干渉多層膜、及び、
光吸収性を有する金属材料により形成され、光透過率調節機能を有する光吸収薄膜、
が順次接して形成されてなることを特徴とする。
On the back of the transparent substrate,
An interference multilayer film having a color-shifting coloring function by laminating a pair of thin films formed of two or more kinds of dielectric materials; and
A light-absorbing thin film having a light transmittance adjusting function, formed of a light-absorbing metal material;
Are formed in contact with each other.
上記構成により、透明着色品には、干渉多層膜で色シフト（玉虫色）機能が付与され、さらに、光吸収薄膜で光透過率調節機能が付与される。これにより、意匠性に富む着色が可能となり、本発明の透明着色品は、携帯電話の透視窓等に適用して、意匠性を向上させることができる。 With the above configuration, the transparent colored product is provided with a color shift (iridescent) function by the interference multilayer film, and further has a light transmittance adjusting function by the light absorption thin film. Thereby, the coloring which is rich in design property is attained, and the transparent coloring product of this invention can be applied to the see-through window of a mobile phone, etc., and can improve design property.
なお、上記組薄膜は、３〜４種類の組み合わせでもよいが、通常、高屈折率膜と低屈折率膜との２種類からなるものとする。干渉多層膜の膜設計・成膜が容易となる。 In addition, although the said assembled thin film may be 3-4 types of combinations, it shall normally consist of two types, a high refractive index film | membrane and a low refractive index film | membrane. Interference multilayer film design and film formation are facilitated.
上記構成の透明着色品において、光吸収薄膜の外側面に接して透明な保護薄膜を形成することが望ましい。金属材料で形成されている光吸収薄膜の酸化防止および耐擦傷性付与のためである。保護薄膜は、シリコーン樹脂系のものとしてもよいが、生産性の見地から、干渉多層膜の組薄膜を形成するのと同一装置で成膜可能な蒸着膜で形成することが望ましい。 In the transparent colored product having the above structure, it is desirable to form a transparent protective thin film in contact with the outer surface of the light absorbing thin film. This is for preventing oxidation and imparting scratch resistance to the light-absorbing thin film formed of the metal material. The protective thin film may be of a silicone resin type, but from the viewpoint of productivity, it is desirable to form the protective thin film by a vapor deposition film that can be formed by the same apparatus as that for forming the interference thin film.
上記各構成の透明着色品において、前記透明基材が光透過率80％以上で、前記高屈折率膜の屈折率（ｎ）が1.8以上、前記低屈折率膜のｎが1.6以下とすることが望ましい。 In the transparent colored product having each configuration described above, the transparent substrate has a light transmittance of 80% or more, the refractive index (n) of the high refractive index film is 1.8 or more, and n of the low refractive index film is 1.6 or less. Is desirable.
上記構成の透明着色品において、前記透明基材を有機ガラスで形成し、前記高屈折率膜をＺｒＯ２、Ａｌ２Ｏ３、ＴｉＯ２、Ｔａ２Ｏ５、Ｃｒ２Ｏ３及びＩＴＯ（Indium Tin oxide）のいずれか1種又は２種で形成し、前記低屈折率膜及び前記保護薄膜をＳｉＯ２、ＳｉＯ又はそれらの複合酸化物で形成し、また、前記光吸収薄膜をＣｒ、Ｉｎ、Ｎｉ、Ｆｅ、Ｔｉ、ＳｎおよびＡｌのいずれかで形成する構成とすることが望ましい。 In the transparent colored product having the above structure, the transparent substrate is formed of organic glass, and the high refractive index film is formed of ZrO 2 , Al 2 O 3 , TiO 2 , Ta 2 O 5 , Cr 2 O 3 and ITO (Indium Tin oxide), the low refractive index film and the protective thin film are formed of SiO 2 , SiO or a composite oxide thereof, and the light absorbing thin film is formed of Cr, In, Ni , Fe, Ti, Sn and Al are desirable.
さらに、干渉多層膜において、高屈折率膜をＺｒＯ２で、前記低屈折率膜をＳｉＯ２でそれぞれ形成した繰返し多層膜とすることが望ましい。当該干渉多層膜は、可視光域（３８０〜７８０ｎｍ）で透明膜となる。 Further, in the interference multilayer film, it is desirable to form a repeated multilayer film in which the high refractive index film is made of ZrO 2 and the low refractive index film is made of SiO 2 . The interference multilayer film becomes a transparent film in the visible light region (380 to 780 nm).
また、透明基材は、ポリアクリル（メタクリル）樹脂、ポリカーボネート、ＰＥＴ、又はそれらの積層体で形成することが望ましい。 The transparent substrate is preferably formed of a polyacrylic (methacrylic) resin, polycarbonate, PET, or a laminate thereof.
以下、本発明の実施の形態について説明する。 Embodiments of the present invention will be described below.
各構成について詳細に説明する。 Each configuration will be described in detail.
本実施形態の基本構成は、透明基材１２の裏面に、干渉多層膜１４、光吸収薄膜１６及び保護薄膜１８を、順次接して形成したものである。以下、各構成要素について、説明する。
In the basic configuration of the present embodiment, an
（１）透明基材１２：
透明基材は、１）有機透明基材でも、２）無機透明基材でもよい。通常、軽量化、成形性、加工性等の見地から下記有機透明基材を使用する。透明基材は、光透過率（可視平均）が80％以上、望ましくは85％以上、さらに望ましくは90％以上のものを使用する。なお、有機透明基材の材料名の後の数値は、光透過率および屈折率（20℃）である。また、透明基材の形態は、板材や成形品に限らず、可撓性を有するフィルムやシートであってもよい。透明基材の肉厚は、５０μｍ〜１０ｍｍとする。
(1) Transparent substrate 12:
The transparent substrate may be 1) an organic transparent substrate or 2) an inorganic transparent substrate. Usually, the following organic transparent substrate is used from the viewpoint of weight reduction, moldability, workability, and the like. A transparent substrate having a light transmittance (visible average) of 80% or more, desirably 85% or more, and more desirably 90% or more is used. In addition, the numerical value after the material name of an organic transparent base material is a light transmittance and a refractive index (20 degreeC). The form of the transparent substrate is not limited to a plate material or a molded product, and may be a flexible film or sheet. The thickness of the transparent substrate is 50 μm to 10 mm.
＜有機透明基材＞
ポリメチルメタクリレート（ＰＭＭＡ）：92％、1.49、
スチレンアクリロニトリル（ＳＡＮ）：90％、1.57、
ポリカーボネート（ＰＣ）：89％、1.58、
ポリスチレン（ＰＳ）：88％、1.59
ポリエチレンテレフタレート（ＰＥＴ）：90％、1.52
<Organic transparent substrate>
Polymethyl methacrylate (PMMA): 92%, 1.49,
Styrene acrylonitrile (SAN): 90%, 1.57,
Polycarbonate (PC): 89%, 1.58,
Polystyrene (PS): 88%, 1.59
Polyethylene terephthalate (PET): 90%, 1.52
（２）干渉多層膜１４：
干渉多層膜は、２種類以上の誘電体材料で形成された組薄膜を積層させて色シフト性の着色機能を有するものである。
(2) Interference multilayer film 14:
The interference multilayer film has a color-shifting coloring function by laminating assembled thin films formed of two or more kinds of dielectric materials.
通常、高屈折率膜１４ａと低屈折率膜１４ｂの組薄膜として、該組薄膜を積層させて、干渉多層膜が、色シフト性の着色機能を有するように光学膜厚設計したものとする。そして、図例の如く、高屈折率膜１４ａを透明基材１２に接するように形成するが、低屈折率膜１４ｂを透明基材１２に接するように形成してもよい。
In general, as a combined thin film of the high
上記組薄膜の繰り返し数は、１でもよいが、２〜４が望ましい。組薄膜の繰り返し数が４を超えると、干渉多層膜（蒸着膜）が割れ易くなる。 The number of repetitions of the assembled thin film may be 1, but 2 to 4 is desirable. If the number of repetitions of the assembled thin film exceeds 4, the interference multilayer film (deposited film) tends to break.
繰り返し数が１では色シフト性を出し難く、逆に、繰り返し数が多いと、干渉多層膜１４の膜厚が厚くなり、所要の光透過率を確保し難くなる。
When the number of repetitions is 1, it is difficult to achieve color shift, and conversely, when the number of repetitions is large, the thickness of the
また、各膜厚は、干渉多層膜に要求される色調により異なり、50〜150ｎｍの範囲から適宜設定する。通常、光学膜厚：λ／４になるように設定する。適宜、λ／２、λ／８とすることもできる。 Each film thickness varies depending on the color tone required for the interference multilayer film, and is appropriately set from a range of 50 to 150 nm. Usually, the optical film thickness is set to be λ / 4. It can also be set to λ / 2 and λ / 8 as appropriate.
例えば、高屈折率膜／低屈折率膜＝ＺｒＯ２（ｎ：1.96）／ＳｉＯ２（ｎ：1.46）、の組み合わせとする場合において、色調をλ（中心波長）＝450ｎｍのブルー系とするとき、λ／４＝112.5ｎｍとなる。すると、ＺｒＯ２の膜厚：112.5ｎｍ／1.96＝57.398、ＳｉＯ２の膜厚：112.5ｎｍ／1.46＝77.0548ｎｍとなる。 For example, in the case of a combination of high refractive index film / low refractive index film = ZrO 2 (n: 1.96) / SiO 2 (n: 1.46), when the color tone is blue based on λ (center wavelength) = 450 nm Λ / 4 = 112.5 nm. Then, the film thickness of ZrO 2 is 112.5 nm / 1.96 = 57.398, and the film thickness of SiO 2 is 112.5 nm / 1.46 = 77.0548 nm.
上記高・低屈折率膜を形成する誘電体材料としては、下記のものを好適に使用可能である。表１に各誘電体材料の成膜真空度、加熱温度及び屈折率を示す。 As the dielectric material for forming the high / low refractive index film, the following materials can be preferably used. Table 1 shows the film formation vacuum degree, the heating temperature, and the refractive index of each dielectric material.
１）高屈折率膜誘電体材料
ジルコニア（ＺｒＯ２）、アルミナ（Ａｌ２Ｏ３）、チタニア（ＴｉＯ２）、五酸化二タンタル（Ｔａ２Ｏ５）、三酸化二クロム（Ｃｒ２Ｏ３）又はＩＴＯ（Indium Tin oxide）
1) High refractive index film dielectric material Zirconia (ZrO 2 ), alumina (Al 2 O 3 ), titania (TiO 2 ), tantalum pentoxide (Ta 2 O 5 ), dichromium trioxide (Cr 2 O 3 ) Or ITO (Indium Tin oxide)
２）低屈折率膜誘電体材料
二酸化ケイ素（ＳｉＯ２）、一酸化ケイ素（ＳｉＯ）又はそれらの複合酸化物
なお、高屈折率膜誘電体材料の内で、高屈折率のもの（例えばＺｒＯ２）と低屈折率のもの（Ａｌ２Ｏ３）とを組合わせて組薄膜とすることも可能である。
2) Low-refractive-index film dielectric material Silicon dioxide (SiO 2 ), silicon monoxide (SiO), or a composite oxide thereof Note that among the high-refractive-index film dielectric materials, those having a high refractive index (for example, ZrO 2 ) And those having a low refractive index (Al 2 O 3 ) can be combined to form a combined thin film.
この干渉多層膜は、通常、低温成膜可能な真空蒸着で形成するが、透明基材が耐熱性を有する場合、スパッタリング、イオンプレーティングでもよい。 This interference multilayer film is usually formed by vacuum vapor deposition capable of forming a film at a low temperature. However, when the transparent substrate has heat resistance, sputtering or ion plating may be used.
真空蒸着の場合、例えば、成膜開始真空度：0.9ｍＰａ、電子ビーム蒸発、成膜時基材温度：60±30℃で行なう。 In the case of vacuum deposition, for example, the film formation start vacuum degree is 0.9 mPa, electron beam evaporation, and the substrate temperature during film formation is 60 ± 30 ° C.
（３）光吸収薄膜１６：
光吸収薄膜１６は、光吸収性を有する金属材料により形成され、光透過率調節機能を有するものである。
(3) Light absorbing thin film 16:
The light absorbing
光吸収性を有する金属材料としては、表２に示すものを好適に使用できる。表２に、各金属材料の成膜真空度、加熱温度および屈折率を示す。 As the metal material having light absorptivity, those shown in Table 2 can be suitably used. Table 2 shows the degree of film formation vacuum, heating temperature, and refractive index of each metal material.
そして、この光吸収薄膜の厚さは、金属材料および設計の光透過率により異なる。例えば、光吸収薄膜をＣｒで形成する場合、透明着色品の設計光透過率10％の場合、10ｎｍとする。表３にＣｒの各波長における屈折率および吸収係数を示す。 And the thickness of this light absorption thin film changes with metal materials and the light transmittance of a design. For example, when the light-absorbing thin film is formed of Cr, the thickness is set to 10 nm when the design light transmittance of the transparent colored product is 10%. Table 3 shows the refractive index and absorption coefficient at each wavelength of Cr.
この光吸収薄膜の成膜も、上記干渉多層膜と同様にして行なう。 The light absorbing thin film is also formed in the same manner as the interference multilayer film.
（４）保護薄膜１８：
光吸収薄膜１６を形成する光吸収性金属が、硬度が高くて耐擦傷性が十分であり、酸化され難い場合は必然的ではない。しかし、耐擦傷性が不十分であったり、耐酸化性が不十分であったりする場合（設計光透過率が変わる。）は、必然的である。
(4) Protective thin film 18:
It is not inevitable that the light-absorbing metal forming the light-absorbing
保護薄膜１８の膜厚は、保護作用を奏する範囲で可及的に薄い方が望ましく、ＳｉＯ２膜の場合、５〜15ｎｍとする。
The film thickness of the protective
以上、携帯電話の透視窓用の成形品を例に採り説明したが、本発明の透明着色品は、携帯電話と同様、ＥＬ点灯ディスプレー画面を有する各種電子製品や、さらには、店舗のショウウィンド等への適用も期待できる。 As described above, the molded product for the see-through window of the mobile phone has been described as an example. However, the transparent colored product of the present invention is similar to the mobile phone, and various electronic products having an EL lighting display screen, and also a show window of a store. It can be expected to be applied to the above.
以下、本発明を実施例に基づいて、さらに具体的に説明する。 Hereinafter, the present invention will be described more specifically based on examples.
携帯電話の透視窓用のＰＭＭＡ成形品（22ｍｍ×46ｍｍ×１ｍｍｔ）（プラスチック基材）の裏面に、表４に示す膜厚設計仕様で、干渉多層膜（４層）、光吸収薄膜（単層）および保護薄膜を、前記表１・２の条件で真空蒸着を行なって、順次形成した。 On the back of a PMMA molded product (22mm x 46mm x 1mmt) (plastic base material) for a transparent window of a mobile phone, with a film thickness design specification shown in Table 4, an interference multilayer film (4 layers), a light absorption thin film (single layer) ) And a protective thin film were sequentially formed by vacuum deposition under the conditions shown in Tables 1 and 2 above.
こうして製造した成形品（透明着色品）は、色シフト性を有するブルー系色調が付与され、ブルー系着色の携帯電話に組み込んだところ、全体がブルー系色調で統一された意匠性の高い製品が得られた。 The molded product thus produced (transparent colored product) is given a blue color tone having color shiftability, and when incorporated into a mobile phone colored blue, a product with a high design that is unified in the blue color tone as a whole. Obtained.
そして、携帯電話のディスプレー画面（ＥＬパネル）が点灯時には、文字が透視窓を介して透視できるが、消灯時（常態時）には、透視窓はブルー系着色が観察できるのみで内部は透視不可であった。 When the display screen (EL panel) of the mobile phone is turned on, characters can be seen through the see-through window, but when the light is turned off (normal state), the see-through window can only observe blue coloration and the inside cannot be seen through. Met.
１２ 透明基材
１４ 干渉多層膜
１６ 光吸収薄膜
１８ 保護薄膜
12
Claims (8)
２種類以上の誘電体材料で形成された組薄膜を積層させて色シフト性の着色機能を有する干渉多層膜、及び、
光吸収性を有する金属材料により形成され、光透過率調節機能を有する光吸収薄膜、
が順次接して形成されてなることを特徴とする透明着色品。 On the back of the transparent substrate,
An interference multilayer film having a color-shifting coloring function by laminating a pair of thin films formed of two or more kinds of dielectric materials; and
A light-absorbing thin film having a light transmittance adjusting function, formed of a light-absorbing metal material;
A transparent colored product characterized by being formed in contact with each other.
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| JP2010055028A JP2011191338A (en) | 2010-03-11 | 2010-03-11 | Transparent coloring article |
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| WO2018164464A1 (en) * | 2017-03-06 | 2018-09-13 | 주식회사 엘지화학 | Decoration member and manufacturing method therefor |
| EP3593991A4 (en) * | 2017-03-06 | 2020-03-18 | LG Chem, Ltd. | DECORATIVE ELEMENT AND MANUFACTURING METHOD THEREOF |
| US10618838B2 (en) | 2015-05-11 | 2020-04-14 | AGC Inc. | Heat insulating glass unit for vehicle |
| CN113562330A (en) * | 2021-07-05 | 2021-10-29 | 北京工业大学 | A kind of colorful packaging film with adjustable saturation and preparation method thereof |
| CN119101885A (en) * | 2024-08-01 | 2024-12-10 | 深圳市原速光电科技有限公司 | Coated part and preparation method thereof |
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| CN119101885A (en) * | 2024-08-01 | 2024-12-10 | 深圳市原速光电科技有限公司 | Coated part and preparation method thereof |
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