JP2010212488A - Substrate treatment device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate treatment device suppressing degradation of treatment efficiency even when executing maintenance. <P>SOLUTION: Both ends of first circulation piping CP1, those of second circulation piping CP2, those of third circulation piping CP3 and those of fourth circulation piping CP4 are connected to a chemical supply source 14. A first chemical valve 21 is interposed in an upstream part in a distribution direction of a first treatment part P1 in the first circulation piping CP1. A tip of first pure water piping 22 is branched and connected to a part between the first chemical valve 21 and the first treatment part P1 in the first circulation piping CP1. First liquid waste piping 24 is branched and connected to a downstream-side part in a distribution direction of the first treatment part P1 in the first circulation piping CP1. A first three-way valve 25 is interposed in a liquid waste branch part DW1 of the first liquid waste piping 24 in the first circulation piping CP1. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a substrate processing apparatus for processing a substrate with a processing liquid in a plurality of processing units. Examples of substrates to be processed include semiconductor wafers, liquid crystal display substrates, glass substrates for plasma displays, FED (Field Emission Display) substrates, optical disk substrates, magnetic disk substrates, magneto-optical disk substrates, photo Substrates such as mask substrates are included.

In the manufacturing process of a semiconductor device or a liquid crystal display device, a process using a processing liquid is performed on a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display panel. For such processing, a single-wafer type substrate processing apparatus that processes substrates one by one may be used.
FIG. 6 is a schematic cross-sectional view of a conventional substrate processing apparatus 100.
The substrate processing apparatus 100 includes a plurality of processing chambers 101 for processing a substrate with a processing liquid, and a processing liquid cabinet 102 for supplying the processing liquid to these processing chambers 101.

  The processing liquid cabinet 102 is provided with a tank 103 for storing the processing liquid. A circulation pipe 104 is connected to the tank 103. The circulation pipe 104 extends from the processing liquid cabinet 102 toward the plurality of processing chambers 101, and returns to the processing liquid cabinet 102 via the proximity position of the partition wall of each processing chamber 101. A pump 105, a filter 106, and a first circulation valve 107 are interposed in the middle of the circulation pipe 104 in this order from the tank 103 side.

  A plurality of distribution pipes 108 are branched and connected to a portion of the circulation pipe 104 on the downstream side of the first circulation valve 107 in the treatment liquid flow direction. The tip of each distribution pipe 108 is connected to each processing chamber 101. A distribution valve 109 for opening and closing the distribution pipe 108 is interposed in the middle of each distribution pipe 108. In addition, a flow meter (not shown) for measuring the flow rate of the processing liquid flowing through the distribution pipe 108 is provided in the middle of the distribution pipe 108 (for example, the upstream portion of the distribution pipe 108 in the flow direction of the distribution valve 109). It is intervened. The pump 105 is always driven during operation of the apparatus. Therefore, the processing liquid is circulated through the circulation pipe 104.

When supplying the processing liquid to the substrate accommodated in the processing chamber 101, the distribution valve 109 corresponding to the processing chamber 101 is opened. As a result, the processing liquid flowing through the circulation pipe 104 is introduced from the branch connection portion (hereinafter referred to as “distribution branch portion”) DS of the distribution pipe 108 in the circulation pipe 104 to the distribution pipe 108 and passes through the distribution pipe 108. 101.
A pure water pipe 110 for supplying pure water from a pure water supply source to the circulation pipe 104 is branched and connected to a portion of the circulation pipe 104 between the first circulation valve 107 and the plurality of distribution branch portions DS. Yes. A pure water valve 111 for opening and closing the pure water pipe 110 is interposed in the middle of the pure water pipe 110.

  A waste liquid pipe 112 is branched and connected to a downstream portion of the plurality of distribution branch portions DS in the circulation pipe 104 in the processing liquid flow direction. A waste liquid valve 113 for opening and closing the waste liquid pipe 112 is interposed in the middle of the waste liquid pipe 112. Further, a second circulation valve 114 for opening and closing the circulation pipe 104 is interposed on the downstream side of the branch connection portion of the waste liquid pipe 112 in the circulation pipe 104.

By the way, a failure may occur in piping equipment (distribution valve 109, flow meter, etc.) interposed in the distribution pipe. In this case, it is necessary to remove the processing liquid from the distribution pipe 108 and the circulation pipe 104 in order to perform maintenance such as repair and replacement of the piping equipment.
For this reason, during maintenance of the piping equipment, the first circulation valve 107 and the second circulation valve 114 are closed, and the waste liquid valve 113 and the pure water valve 111 are opened. Thereby, the supply of the processing liquid into the circulation pipe 104 is stopped, and the pure water from the pure water pipe 110 is supplied into the circulation pipe 104, and the first circulation valve 107 and the waste liquid valve in the circulation pipe 104 are supplied by the pure water. The processing liquid is removed from the portion between the first and second layers.

JP 11-135472 A

However, since the distribution pipes 108 corresponding to all the processing chambers 101 are connected to the circulation pipe 104, even if maintenance is performed only on the piping equipment of the distribution pipes 108 corresponding to one processing chamber 101, all The supply of the processing liquid to the processing chamber 101 must be stopped, and the processing efficiency of the apparatus is deteriorated.
After the maintenance is completed, it is necessary to replace all the pure water in the circulation pipe 104 with the processing liquid, and it takes a long time to restart the apparatus.

  Accordingly, an object of the present invention is to provide a substrate processing apparatus capable of suppressing a decrease in processing efficiency even when maintenance is performed.

  The invention described in claim 1 for achieving the above object includes a processing liquid supply source (14) and a plurality of processing sections (P1, P2, P3, P4) for processing the substrate with the processing liquid. And a base end (20A, 30A, 40A, 50A) is connected to the processing liquid supply source to supply the processing liquid from the processing liquid supply source to each processing section. Treatment liquid pipes (CP1, CP2, CP3, CP4), and treatment liquid valves (21, 31, 41, 51) interposed in the middle of each treatment liquid pipe for opening and closing the treatment liquid pipes, Is a substrate processing apparatus.

In addition, the alphanumeric characters in parentheses represent corresponding components in the embodiments described later. The same applies hereinafter.
According to this configuration, each processing unit and the processing liquid supply source are connected via the individual processing liquid piping. And the process liquid pipe | tube corresponding to each process part can be opened and closed separately by the process liquid valve interposed in the middle part of each process liquid pipe. As a result, only the desired processing unit can be the target for stopping the supply of the processing liquid.

  Therefore, when performing maintenance such as repair / replacement on the processing unit, it is possible to stop supplying the processing liquid only to the processing unit that is the object of the maintenance and continue supplying the processing liquid to other processing units. For this reason, the processing using the processing liquid can be performed on the substrate in a processing unit other than the processing unit to be maintained, thereby suppressing a reduction in processing efficiency of the apparatus.

According to the second aspect of the present invention, there is provided a processing liquid extraction means (22, 24, 25, 32, 34, 35, etc.) for extracting a processing liquid from a portion of each processing liquid pipe downstream of the processing liquid valve in the processing liquid flow direction. 42, 44, 45, 52, 54, 55). The substrate processing apparatus according to claim 1, further comprising:
According to this configuration, in each processing liquid pipe, the processing liquid can be extracted from the downstream portion of the processing liquid flow direction with respect to the processing liquid valve. For this reason, the processing liquid pipe corresponding to the desired processing section is closed by the processing liquid valve, and the processing liquid is extracted from the downstream portion of the processing liquid piping in the processing liquid flow direction with respect to the processing liquid valve. Maintenance of the processing unit can be performed in a state where there is no processing liquid in the pipe.

According to a third aspect of the present invention, the processing liquid extraction means is connected to a portion of the processing liquid piping between the processing liquid valve and the processing section and supplies pure water to the processing liquid piping. The substrate processing apparatus according to claim 2, comprising (22, 32, 42, 52).
According to this configuration, pure water is supplied from the pure water pipe to the processing liquid pipe. With this pure water, the processing liquid can be pushed out from the processing liquid piping.

  In the invention according to claim 4, each processing liquid pipe has both ends (20A, 20B, 30A, 30B, 40A, 40B, 50A, 50B) connected to the processing liquid supply source, and an intermediate portion passes through the processing section. The processing liquid extraction means is a waste liquid pipe (24) that is branched and connected to a portion of the processing liquid piping that is downstream of the processing section in the processing liquid flow direction. , 34, 44, 54) and a three-way valve (25, 35, 45, 55) interposed in a branch connection portion of the waste liquid pipe in each processing liquid pipe. It is a substrate processing apparatus of description.

  According to this configuration, the waste liquid piping is branched and connected to a portion of the processing liquid piping downstream of the processing section in the processing liquid flow direction. A three-way valve is interposed in a branch connection portion of the waste liquid pipe in each processing liquid pipe (hereinafter referred to as “waste liquid branch portion” in this section). By this three-way valve, a portion upstream of the waste liquid branching portion in the circulation pipe in the processing liquid flow direction (hereinafter simply referred to as “upstream portion” in this section) is downstream of the waste liquid branching portion in the circulation pipe. (Hereinafter, simply referred to as “downstream portion” in this section) and a state in which the upstream portion communicates with the waste liquid pipe. When the upstream portion communicates with the downstream portion, the processing liquid circulates through the circulation pipe, and the processing liquid is not supplied to the waste liquid pipe. On the other hand, when the upstream part communicates with the waste liquid pipe, the processing liquid flowing through the upstream part is introduced into the waste liquid pipe and discarded through the waste liquid pipe. Thereby, the processing liquid can be extracted from the processing liquid piping by communicating the upstream portion with the waste liquid piping.

  The invention described in claim 5 includes a processing liquid supply source (14), a plurality of processing units (P1, P2, P3, P4) for processing the substrate (W) with the processing liquid, and each processing unit. And both ends (20A, 20B, 30A, 30B, 40A, 40B, 50A, 50B) are connected to the processing liquid supply source, and a middle portion is a circulation pipe (CP1, CP2) that passes through the processing unit. , CP3, CP4) and processing liquid valves (21, 31, 41, 51) that are interposed in the upstream of the processing section in each circulation pipe in the processing liquid flow direction to open and close the circulation pipe. ), Pure water pipes (22, 32, 42, 52) for supplying pure water to the processing liquid pipes, connected to portions between the processing liquid valves and the processing units in the circulation pipes, Interspersed with water piping to open and close the pure water piping Pure water valves (23, 33, 43, 53) and waste liquid pipes (24, 34, 44, 54) branched and connected to a portion of each circulation pipe that is downstream of the treatment section in the direction of treatment liquid flow. And a three-way valve (25, 35, 45, 55) interposed in a branch connection portion of the waste liquid pipe in each circulation pipe, and an operation for designating the processing unit to be stopped from supplying the processing liquid The operation unit (61, 62, 63, 64) to be operated, and the processing liquid valve on the circulation pipe corresponding to the processing unit designated by the operation of the operation unit is closed, and the processing unit connected to the circulation pipe The substrate processing apparatus includes valve control means (60) for opening the pure water valve on the pure water pipe and switching the three-way valve so that the circulation pipe and the waste liquid pipe communicate with each other.

According to this configuration, the processing unit that is the target for stopping the supply of the processing liquid is designated by the operation of the operation unit. Then, the processing liquid valve corresponding to the designated processing section (hereinafter simply referred to as “designated processing section” in this section) is closed, and the flow direction of the processing liquid valve of the processing liquid piping corresponding to the designated processing section is determined. The supply of the processing liquid to the downstream portion is stopped.
In addition, the pure water valve corresponding to the designated processing unit is opened, and the three-way valve corresponding to the designated processing unit is switched so that the upstream portion and the waste liquid pipe communicate with each other. Thereby, pure water from the pure water pipe corresponding to the designated processing section is supplied to the processing liquid pipe from a branch connection portion of the pure water pipe in the processing liquid pipe (hereinafter referred to as “pure water branching portion” in this section). The Then, the pure water flows through the processing liquid piping, and then is introduced into the waste liquid piping from the waste liquid branching portion in the processing liquid piping and is discharged. Therefore, the processing liquid in the portion between the pure water branching portion and the waste liquid branching portion in the processing liquid piping is pushed out by pure water and extracted from the portion. Thus, the processing liquid can be removed from the designated processing unit by a simple operation.

  According to a sixth aspect of the present invention, each processing unit includes a plurality of processing chambers (5A to 5L) capable of storing one substrate to be processed (W) one by one, and is provided corresponding to each processing chamber. (77A) is branched and connected to the processing liquid pipe, the tip (77B) is connected to the processing chamber, and further includes a distribution pipe (77) for distributing the processing liquid flowing through the processing liquid pipe to the processing chamber. The substrate processing apparatus according to claim 1.

  According to this configuration, the processing liquid flowing through each processing liquid pipe is distributed to the plurality of processing chambers through the distribution pipe. Therefore, the configuration of the piping can be simplified as compared with the case where the processing liquid piping is provided corresponding to each processing chamber.

1 is a perspective view schematically showing a configuration of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a plan view schematically showing the configuration of the substrate processing apparatus shown in FIG. 1. It is a piping structure figure of the substrate processing apparatus shown in FIG. It is sectional drawing which shows the internal structure of the process chamber shown in FIG. 1 schematically. It is a flowchart which shows the process liquid supply stop operation | movement to a process chamber. It is sectional drawing which shows the conventional substrate processing apparatus schematically.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic perspective view of a substrate processing apparatus according to an embodiment of the present invention, and FIG. 2 is a plan view thereof. This substrate processing apparatus is a single-wafer type apparatus that supplies a chemical liquid (processing liquid) to a wafer (substrate) W (see FIG. 4) such as a semiconductor wafer and processes the wafers one by one.
The substrate processing apparatus shown in FIG. 1 includes a substrate processing unit 3 in which a transfer chamber 2 extending in a predetermined horizontal direction is formed in a frame 1 and the longitudinal direction of the transfer chamber 2 in plan view with respect to the substrate processing unit 3. And an indexer section 4 coupled to one side of the.

  In the substrate processing unit 3, the first processing unit P <b> 1 and the third processing unit P <b> 3 are arranged along the transfer chamber 2 in order from the indexer unit 4 side on one side in a direction orthogonal to the longitudinal direction of the transfer chamber 2. . In addition, a second processing unit P2 and a fourth processing unit P4 are arranged at positions facing the first and third processing units P1 and P3, respectively, with the transfer chamber 2 interposed therebetween. A chemical liquid cabinet 6 is arranged on the opposite side of the fourth processing unit P4 from the second processing unit P2.

Each processing unit P1 to P3 includes three processing chambers 5A to 5C, 5D to 5F, 5G to 5I, and 5J to L stacked in three stages. That is, the substrate processing unit 3 includes twelve processing chambers 5A to 5L.
In the first processing unit P1, three processing chambers 5A, a processing chamber 5B, and a processing chamber 5C are stacked in order from the bottom. The first processing unit P1 includes three distribution pipes 77 (described later, see FIG. 4). A distribution pipe 77 is provided corresponding to each of the processing chambers 5A to 5C.

In the second processing unit P2, the processing chamber 5D, the processing chamber 5E, and the processing chamber 5F are stacked in order from the bottom. The second processing unit P2 includes three distribution pipes 77 (described later, see FIG. 4). The distribution pipe 77 is provided corresponding to each processing chamber 5D to 5F.
In the third processing unit P3, the processing chamber 5G, the processing chamber 5H, and the processing chamber 5I are stacked in order from the bottom. The third processing unit P3 includes three distribution pipes 77 (described later, see FIG. 4). The distribution pipe 77 is provided corresponding to each of the processing chambers 5G to 5I.

In the fourth processing unit P4, a processing chamber 5J, a processing chamber 5K, and a processing chamber 5L are stacked in order from the bottom. The fourth processing unit P4 includes three distribution pipes 77 (described later, see FIG. 4). The distribution pipe 77 is provided corresponding to each processing chamber 5J to 5L.
In the transfer chamber 2, as shown in FIG. 2, a substrate transfer robot 7 (see FIG. 2) is arranged. The substrate transfer robot 7 can access the processing chambers 5A to 5L with a hand and carry the wafer W (see FIG. 4) into and out of the processing chambers 5A to 5L.

  In the indexer unit 4, an indexer robot 8 is disposed as shown in FIG. On the opposite side of the indexer unit 4 from the substrate processing unit 3, there is provided a cassette mounting unit (not shown) in which a plurality of cassettes (not shown) for storing a plurality of wafers W stacked in layers are arranged. Yes. The indexer robot 8 can access the cassette placed on the cassette placement unit with a hand, take out the wafer W from the cassette, and store the wafer W in the cassette. Further, the indexer robot 8 can transfer the wafer W to and from the substrate transfer robot 7.

FIG. 3 is a piping structure diagram of the substrate processing apparatus shown in FIG.
The chemical solution cabinet 6 is partitioned by a partition, and a chemical solution tank 10 for storing a chemical solution to be supplied to the processing chambers 5A to 5L is accommodated therein. As chemical solutions stored in the chemical solution tank 10, SC1 (ammonia hydrogen peroxide solution mixture), SC2 (hydrochloric acid hydrogen peroxide solution mixture), SPM (sulfuric acid / hydrogen peroxide mixture), Examples thereof include hydrofluoric acid and buffered hydrofluoric acid (Buffered HF: a mixed liquid of hydrofluoric acid and ammonium fluoride). The chemical solution tank 10 is connected to the distal end and the proximal end of a collective circulation pipe 11 through which the chemical solution circulates.

The middle part of the collective circulation pipe 11 is contained in the chemical liquid flowing through the collective circulation pipe 11 and the pump 12 for pumping out the chemical liquid stored in the chemical liquid tank 10 in order from the chemical liquid tank 10 side. A filter 13 for capturing and removing relatively small foreign matter is interposed.
The collective circulation pipe 11 includes a first circulation pipe CP1 for supplying a chemical solution to the first processing unit P1, a second circulation pipe CP2 for supplying a chemical solution to the second processing unit P2, and a chemical solution to the third processing unit P3. Is connected to the third circulation pipe CP3 for supplying the chemical solution and the fourth circulation pipe CP4 for supplying the chemical solution to the fourth processing part P4. In this embodiment, the chemical liquid tank 10 and the collective circulation pipe 11 are accommodated in the chemical liquid cabinet 6, and the chemical liquid tank 10 and the collective circulation pipe 11 allow the chemical liquid to be supplied to the plurality of circulation pipes CP1, CP2, CP3, CP4. A chemical supply source 14 (treatment liquid supply source) to be supplied is configured.

  The proximal end 20 </ b> A and the distal end 20 </ b> B of the first circulation pipe CP <b> 1 are connected to a downstream portion of the filter 13 in the collective circulation pipe 11 in the chemical solution flow direction (hereinafter referred to as “flow direction”). The first circulation pipe CP1 extends from the chemical solution cabinet 6 toward the first processing unit P1, and returns to the chemical solution cabinet 6 via the first processing unit P1. Specifically, the first circulation pipe CP1 passes through adjacent positions of the partition walls of the processing chambers 5A to 5C stacked in three stages. Three distribution pipes 77 (see FIG. 4) for distributing the chemical solution flowing through the first circulation pipe CP1 to the processing chambers 5A to 5C are connected to the first circulation pipe CP1. The distribution pipe 77 is provided corresponding to each of the processing chambers 5A to 5C.

  A first chemical valve (processing liquid valve) 21 for opening and closing the first circulation pipe CP1 is interposed in a portion of the first circulation pipe CP1 on the upstream side in the flow direction of the first processing part P1. A tip of a first pure water pipe 22 for supplying pure water to the first circulation pipe CP1 is branched and connected to a portion between the first chemical valve 21 and the first processing unit P1 in the first circulation pipe CP1. Yes. A base end of the first pure water pipe 22 is branched and connected to a collective pure water pipe 16 connected to a pure water supply source. A first pure water valve 23 for opening and closing the first pure water pipe 22 is connected to a middle portion of the first pure water pipe 22. By opening the first pure water valve 23, pure water is supplied to the first circulation pipe CP1 from the pure water branch portion DD1 of the first pure water pipe 22 in the first circulation pipe CP1.

  A first waste liquid pipe 24 for draining the chemical solution and pure water from the first circulation pipe CP1 is branched and connected to the downstream side of the first circulation pipe CP1 in the flow direction of the first processing unit P1. A first three-way valve 25 is interposed in the waste liquid branching portion DW1 of the first waste liquid pipe 24 in the first circulation pipe CP1. In the first three-way valve 25, the upstream portion (hereinafter referred to as “first upstream portion”) 26 in the flow direction from the waste liquid branching portion DW1 of the first waste liquid piping 24 in the first circulation piping CP1 is waste liquid. A state in which the downstream portion (hereinafter referred to as “first downstream portion”) 27 in the flow direction from the branch portion DW1 communicates with a state in which the first upstream portion 26 communicates with the first waste liquid pipe 24. It is for switching. When the first upstream portion 26 communicates with the first downstream portion 27, the chemical liquid circulates through the first circulation pipe CP1, and the chemical liquid is not supplied to the first waste liquid pipe 24. On the other hand, when the first upstream portion 26 communicates with the first waste liquid pipe 24, the chemical solution and / or pure water is supplied to the first waste liquid pipe 24 and discarded through the first waste liquid pipe 24.

  The proximal end 30A and the distal end 30B of the second circulation pipe CP2 are connected to the downstream portion of the collective circulation pipe 11 in the flow direction of the filter 13. The second circulation pipe CP2 extends from the collective circulation pipe 11 toward the second processing unit P2, and returns to the collective circulation pipe 11 via the second processing unit P2. Specifically, the second circulation pipe CP2 passes through adjacent positions of the partition walls of the processing chambers 5D to 5F stacked in three stages. Three distribution pipes 77 (see FIG. 4) for distributing the chemical solution flowing through the second circulation pipe CP2 to the processing chambers 5D to 5F are connected to the second circulation pipe CP2. The distribution pipe 77 is provided corresponding to each processing chamber 5D to 5F.

  A second chemical liquid valve (processing liquid valve) 31 for opening and closing the second circulation pipe CP2 is interposed in a portion of the second circulation pipe CP2 on the upstream side in the flow direction of the second processing portion P2. A tip of a second pure water pipe 32 for supplying pure water to the second circulation pipe CP2 is branched and connected to a portion between the second chemical valve 31 and the second processing part P2 in the second circulation pipe CP2. Yes. The base end of the second pure water pipe 32 is branched and connected to the collective pure water pipe 16 connected to the pure water supply source. A second pure water valve 33 for opening and closing the second pure water pipe 32 is connected to a middle portion of the second pure water pipe 32. By opening the second pure water valve 33, pure water is supplied to the second circulation pipe CP2 from the pure water branch portion DD2 of the second pure water pipe 32 in the second circulation pipe CP2.

  A second waste liquid pipe 34 for draining the chemical solution and the pure water from the second circulation pipe CP2 is branched and connected to a portion of the second circulation pipe CP2 on the downstream side in the flow direction of the second processing unit P2. A second three-way valve 35 is interposed in the waste liquid branch portion DW2 of the second waste liquid pipe 34 in the second circulation pipe CP2. In the second three-way valve 35, the upstream portion (hereinafter referred to as “second upstream portion”) 36 in the flow direction from the waste liquid branching portion DW2 of the second waste liquid piping 34 in the second circulation piping CP2 is waste liquid. In a state where it communicates with a downstream portion (hereinafter referred to as “second downstream portion”) 37 in the flow direction with respect to the branch portion DW2, and a state where the second upstream portion 36 communicates with the second waste liquid pipe 34. It is for switching. When the second upstream portion 36 communicates with the second downstream portion 37, the chemical liquid circulates through the second circulation pipe CP2, and the chemical liquid is not supplied to the second waste liquid pipe 34. On the other hand, when the second upstream portion 36 communicates with the second waste liquid pipe 34, the chemical solution and / or pure water is supplied to the second waste liquid pipe 34 and discarded through the second waste liquid pipe 34.

  The base end 40 </ b> A and the tip end 40 </ b> B of the third circulation pipe CP <b> 3 are connected to the downstream portion of the collective circulation pipe 11 in the flow direction of the filter 13. The third circulation pipe CP3 extends from the collective circulation pipe 11 toward the third processing unit P3, and returns to the collective circulation pipe 11 via the third processing unit P3. Specifically, the third circulation pipe CP3 passes through adjacent positions of the partition walls of the processing chambers 5G to 5I that are stacked in three stages. Three distribution pipes 77 (see FIG. 4) for distributing the chemical solution flowing through the third circulation pipe CP3 to the processing chambers 5G to 5I are connected to the third circulation pipe CP3. This distribution pipe 77 is provided corresponding to each processing chamber 5G-5I.

  A third chemical valve (processing liquid valve) 41 for opening and closing the third circulation pipe CP3 is interposed in a portion of the third circulation pipe CP3 on the upstream side in the flow direction of the third processing portion P3. A tip of a third pure water pipe 42 for supplying pure water to the third circulation pipe CP3 is branched and connected to a portion between the third chemical valve 41 and the third processing unit P3 in the third circulation pipe CP3. Yes. The base end of the third pure water pipe 42 is branched and connected to the collective pure water pipe 16 connected to the pure water supply source. A third pure water valve 43 for opening and closing the third pure water pipe 42 is connected to a middle portion of the third pure water pipe 42. By opening the third pure water valve 43, pure water is supplied to the third circulation pipe CP3 from the pure water branch portion DD3 of the third pure water pipe 42 in the third circulation pipe CP3.

  A third waste liquid pipe 44 for draining the chemical solution and pure water from the third circulation pipe CP3 is branched and connected to the downstream side of the third processing pipe P3 in the flow direction of the third processing section P3. A third three-way valve 45 is interposed in the waste liquid branch portion DW3 of the third waste liquid pipe 44 in the third circulation pipe CP3. In the third three-way valve 45, the upstream portion (hereinafter referred to as “third upstream portion”) 46 in the flow direction from the waste liquid branching portion DW3 of the third waste liquid piping 44 in the third circulation piping CP3 is waste liquid. A state in which the downstream portion (hereinafter referred to as a “third downstream portion”) 47 in the flow direction from the branch portion DW3 communicates with a state 47 and a state in which the third upstream portion 46 communicates with the third waste liquid pipe 44. It is for switching. When the third upstream portion 46 communicates with the third downstream portion 47, the chemical liquid circulates through the third circulation pipe CP3, and the chemical liquid is not supplied to the third waste liquid pipe 44. On the other hand, when the third upstream portion 46 communicates with the third waste liquid pipe 44, the chemical solution and / or pure water is supplied to the third waste liquid pipe 44 and discarded through the third waste liquid pipe 44.

  The base end 50 </ b> A and the tip end 50 </ b> B of the fourth circulation pipe CP <b> 4 are connected to the downstream portion of the collective circulation pipe 11 in the flow direction of the filter 13. The fourth circulation pipe CP4 extends from the collective circulation pipe 11 toward the fourth processing part P4, and returns to the collective circulation pipe 11 via the fourth processing part P4. Specifically, the fourth circulation pipe CP4 passes through adjacent positions of the partition walls of the processing chambers 5J to 5L stacked in three stages. Three distribution pipes 77 (see FIG. 4) for distributing the chemical solution flowing through the fourth circulation pipe CP4 to the processing chambers 5J to 5L are connected to the fourth circulation pipe CP4. The distribution pipe 77 is provided corresponding to each processing chamber 5J to 5L.

  A fourth chemical liquid valve (processing liquid valve) 51 for opening and closing the fourth circulation pipe CP4 is interposed in a portion of the fourth circulation pipe CP4 on the upstream side in the flow direction of the fourth processing portion P4. A tip of a fourth pure water pipe 52 for supplying pure water to the fourth circulation pipe CP4 is branched and connected to a portion between the fourth chemical valve 51 and the fourth processing unit P4 in the fourth circulation pipe CP4. Yes. The base end of the fourth pure water pipe 52 is branched and connected to the collective pure water pipe 16 connected to the pure water supply source. A fourth pure water valve 53 for opening and closing the fourth pure water pipe 52 is connected to a middle portion of the fourth pure water pipe 52. By opening the fourth pure water valve 53, pure water is supplied to the fourth circulation pipe CP4 from the pure water branch portion DD4 of the fourth pure water pipe 52 in the fourth circulation pipe CP4.

  A fourth waste liquid pipe 54 for draining the chemical solution and pure water from the fourth circulation pipe CP4 is branched and connected to the downstream side of the fourth circulation pipe CP4 in the flow direction of the fourth processing part P4. A fourth three-way valve 55 is interposed in the waste liquid branch portion DW4 of the fourth waste liquid pipe 54 in the fourth circulation pipe CP4. In the fourth three-way valve 55, a portion (hereinafter referred to as “fourth upstream portion”) 56 on the upstream side in the flow direction from the waste liquid branching portion DW4 of the fourth waste liquid piping 54 in the fourth circulation piping CP4 is waste liquid. A state in which the downstream portion (hereinafter referred to as a “fourth downstream portion”) 57 in the flow direction from the branch portion DW4 communicates with a state 57 and a state in which the fourth upstream portion 56 communicates with the fourth waste liquid pipe 54. It is for switching. When the fourth upstream portion 56 communicates with the fourth downstream portion 57, the chemical liquid circulates through the fourth circulation pipe CP4, and the chemical liquid is not supplied to the fourth waste liquid pipe 54. On the other hand, when the fourth upstream portion 56 communicates with the fourth waste liquid pipe 54, the chemical solution and / or pure water is supplied to the fourth waste liquid pipe 54 and discarded through the fourth waste liquid pipe 54.

  During the operation of the apparatus, the pump 12 is always driven. In addition, the first to fourth chemical liquid valves 21, 31, 41, 51 are opened, and the first to fourth three-way valves 25, 35, 45, 55 are connected to the first to fourth upstream portions 26, 36, 46, 56 and the first to fourth downstream portions 27, 37, 47, 57 are set to communicate with each other. Further, the first to fourth pure water valves 23, 33, 43, 53 are always closed. For this reason, the chemicals circulate through the first circulation pipe CP1, the second circulation pipe CP2, the third circulation pipe CP3, and the fourth circulation pipe CP4, respectively. By circulating the chemical solution through the first to fourth circulation pipes CP1, CP2, CP3, and CP4, the chemical solution is quickly transferred to the processing chambers 5A to 5L after the distribution valve 78 (described later, see FIG. 4) is opened. Can be supplied.

  The substrate processing apparatus of FIG. 1 includes a control unit 60 configured by, for example, a microcomputer. The controller 60 includes a first chemical valve 21, a first pure water valve 23, a first three-way valve 25, a second chemical liquid valve 31, a second pure water valve 33, a second three-way valve 35, a third A chemical liquid valve 41, a third pure water valve 43, a third three-way valve 45, a fourth chemical liquid valve 51, a fourth pure water valve 53, and a fourth three-way valve 55 are connected as control targets.

  Further, an operation panel 65 disposed on the outer surface of the substrate processing apparatus is connected to the control unit 60. The operation panel 65 includes a first supply stop switch 61 that is operated to stop the supply of the chemical solution to the first processing unit P1, and a second supply stop that is operated to stop the supply of the chemical solution to the second processing unit P2. The switch 62, the third supply stop switch 63 operated to stop the supply of the chemical solution to the third processing unit P3, and the fourth supply stop switch 64 operated to stop the supply of the chemical solution to the fourth processing unit P4. It has. When each of the supply stop switches 61, 62, 63, 64 is pushed, a stop signal for stopping the supply of the chemical solution is input to the control unit 60.

FIG. 4 is a cross-sectional view schematically showing the internal configuration of the processing chambers 5A to 5L. The plurality of processing chambers 5A to 5L have a common configuration. The internal configuration of the processing chambers 5A to 5L will be described by taking the processing chamber 5A of the first processing unit P1 as an example.
In the processing chamber 5A, a spin chuck 70 for rotating the wafer W while holding the wafer W substantially horizontally, and a chemical nozzle 71 for supplying a chemical liquid to the center of the surface of the wafer W held by the spin chuck 70 are provided. A pure water nozzle 72 for supplying pure water (deionized water) as a rinsing liquid to the central portion of the surface of the wafer W held by the spin chuck 70, and the periphery of the spin chuck 70, A container-like cup 73 for receiving a chemical solution or pure water that flows down or scatters from W is accommodated.

  The spin chucks 70 are provided at substantially equal intervals at a plurality of locations around the motor 74, a disk-shaped spin base 75 that is rotated around the vertical axis by the rotational driving force of the motor 74, and the periphery of the spin base 75. And a plurality of clamping members 76 for clamping W in a substantially horizontal posture. As a result, the spin chuck 70 rotates the spin base 75 by the rotational driving force of the motor 74 while the wafer W is held by the plurality of holding members 76, thereby maintaining the wafer W in a substantially horizontal posture. In this state, it can be rotated around the vertical axis together with the spin base 75.

The spin chuck 70 is not limited to such a configuration. For example, the back surface (non-device forming surface) of the wafer W is vacuum-sucked to hold the wafer W in a horizontal posture, and the state Further, a vacuum chucking vacuum chuck that can rotate the held wafer W by rotating around a vertical axis may be employed.
The chemical nozzle 71 is disposed above the spin chuck 70 with the discharge port directed toward the vicinity of the rotation center of the wafer W. A tip 77B of a distribution pipe 77 is connected to the chemical nozzle 71. The proximal end 77A of the distribution pipe 77 is branched and connected to the first circulation pipe CP1 passing through the proximity position of the partition wall of the processing chamber 5A. A distribution valve 78 for opening and closing the distribution pipe 77 is interposed in the middle of the distribution pipe 77. In addition, a flow meter (not shown) for measuring the flow rate of the chemical liquid flowing through the distribution pipe 77 is interposed in the middle part of the distribution pipe 77 (for example, the upstream portion in the distribution direction of the distribution valve 78 in the distribution pipe 77). It is disguised. When the distribution valve 78 is opened, the chemical liquid flowing through the first circulation pipe CP1 is supplied from the branch connection portion DS of the distribution pipe 77 in the first circulation pipe CP1 to the chemical liquid nozzle 71 through the distribution pipe 77. Then, the chemical liquid is discharged from the discharge port of the chemical liquid nozzle 71.

The pure water nozzle 72 is arranged above the spin chuck 70 with the discharge port facing the vicinity of the rotation center of the wafer W. The pure water nozzle 72 is connected to a fifth pure water pipe 79 for supplying pure water from a pure water supply source. A fifth pure water valve 80 for opening and closing the fifth pure water pipe 79 is interposed in the middle of the fifth pure water pipe 79.
The chemical nozzle 71 does not need to be fixedly disposed with respect to the spin chuck 70. For example, the chemical nozzle 71 is attached to an arm that can swing in a horizontal plane above the spin chuck 70, and the arm swings. Thus, a so-called scan nozzle form in which the position of the chemical solution on the surface of the wafer W is scanned may be employed. Further, the pure water nozzle 72 does not need to be fixedly arranged with respect to the spin chuck 70, and a so-called scan nozzle form may be employed.

Next, a processing example executed in the processing chamber 5A will be described.
When processing the wafer W, an unprocessed wafer W is loaded into the substrate processing apparatus by a transfer robot (not shown), and is held by the spin chuck 70 with its surface facing upward. After the wafer W is held by the spin chuck 70, the motor 74 is driven to rotate the spin chuck 70 (spin base 75) at a predetermined liquid processing rotation speed.

  In addition, the distribution valve 78 is opened, and the chemical solution is supplied from the chemical solution nozzle 71 to the center of the surface of the wafer W. The chemical solution supplied to the surface of the wafer W receives centrifugal force due to the rotation of the wafer W, flows toward the periphery of the wafer W, spreads over the entire surface of the wafer W, particles existing on the surface of the wafer W, etc. Pollutants are removed (chemical treatment). The chemical solution scattered from the peripheral edge of the wafer W toward the side is received by the cup 73.

  When a predetermined time elapses from the start of the chemical treatment, the distribution valve 78 is closed and the chemical supply is stopped. Thereafter, the fifth pure water valve 80 is opened, and pure water is discharged from the pure water nozzle 72 toward the center of the surface of the wafer W. The pure water supplied to the surface of the wafer W receives a centrifugal force due to the rotation of the wafer W, flows from the center to the periphery of the surface of the wafer W, and the chemical solution adhering to the surface of the wafer W is pure water. (Rinse treatment). The pure water scattered from the periphery of the wafer W toward the side is received by the cup 73.

  When a predetermined time has elapsed from the start of the rinsing process, the fifth pure water valve 80 is closed and the supply of pure water is stopped. Thereafter, the motor 74 is driven, the rotation speed of the wafer W is increased to a predetermined high rotation speed (for example, 2500 rpm), and spin dry processing is performed in which pure water adhering to the wafer W is shaken off and dried. Is called. The pure water adhering to the wafer W is removed by this spin dry process. When the spin dry process is performed for a predetermined time, the rotation of the spin chuck 70 is stopped, and then the processed wafer W is carried out of the processing chamber 5A by the substrate transfer robot.

  By the way, when a failure occurs in the piping equipment (distribution valve 78, flow meter, etc.) interposed in the distribution pipe 77, the distribution pipe 77 or the circulation pipe CP1 is used to perform maintenance such as repair or replacement on the piping equipment. , CP2, CP3, and CP4, it is necessary to remove the chemical solution from the portion around the branch connection portion DS of the distribution pipe 77. In this substrate processing apparatus, when any one of the first to fourth supply stop switches 61, 62, 63, 64 disposed on the operation panel (not shown) is pressed, The supply of the chemical solution to the processing units P1, P2, P3, and P4 corresponding to 62, 63, and 64 is stopped.

FIG. 5 is a flowchart showing a flow of a process for stopping the supply of chemicals to the processing units P1, P2, P3, and P4.
The operator pushes the supply stop switches 61, 62, 63, and 64 corresponding to the processing units P1, P2, P3, and P4 that should stop the chemical supply. When any one of the supply stop switches P1, P2, P3, and P4 is pressed (step S1), the processing units P1, P2, P3, and P4 to stop the chemical supply are designated. And the chemical | medical solution valve | bulb 21, 31, 41, 51 corresponding to the designated process part (henceforth a term "designated process part" hereafter) is closed (step S2), and the circulation corresponding to a designated process part is carried out. The supply of the chemical liquid to the downstream portion in the flow direction of the chemical liquid valves 21, 31, 41, 51 of the pipes CP1, CP2, CP3, CP4 is stopped.

  Further, the pure water valves 23, 33, 43, 53 corresponding to the designated processing unit are opened (step S3), and the three-way valves 25, 35, 45, 55 corresponding to the designated processing unit are arranged on the upstream side portions 26, 36. , 46, 56 and the waste liquid pipes 24, 34, 44, 54 are switched to communicate with each other (step S4). Thereby, the pure water from the pure water piping 22, 32, 42, 52 corresponding to the designated processing section is supplied from the pure water branch portions DD1 to DD4 to the circulation piping CP1, CP2, CP3, CP4. The pure water flows through the circulation pipes CP1, CP2, CP3, and CP4, and is then introduced into the waste liquid pipes 24, 34, 44, and 54 from the waste liquid branch portions DW1 to DW4, and is drained. Therefore, the chemical solution in the portion between the pure water branch portions DD1 to DD4 and the waste liquid branch portions DW1 to DW4 in the circulation pipes CP1, CP2, CP3, and CP4 is pushed out by pure water and extracted from the portions.

Thereby, a chemical | medical solution can be removed from designation | designated process part (part around the branch connection part DS of the distribution pipe 77 in circulation piping CP1, CP2, CP3, CP4) by simple operation.
When a predetermined chemical extraction time elapses, the pure water valves 23, 33, 43, 53 corresponding to the designated processing section are closed (step S6), and the three-way valves 25, 35, 45 corresponding to the designated processing section are closed. , 55 are switched so that the upstream side portions 26, 36, 46, 56 and the downstream side portions 27, 37, 47, 57 communicate with each other (step S7), and the chemical supply stop processing is completed. Thereafter, maintenance such as repair and replacement can be performed on the designated processing unit from which the chemical solution has been removed.

  The case where the first processing unit P1 is the designated processing unit will be described as an example. When the first supply stop switch 61 is pushed by the operator, the first chemical valve 21 is closed and the first circulation pipe CP1 is closed. The supply of the chemical solution to the downstream portion of the first chemical solution valve 21 in the flow direction is stopped. Further, the first pure water valve 23 is opened, and the first three-way valve 25 is switched so that the first upstream portion 26 and the first waste liquid pipe 24 communicate with each other. Thereby, the pure water from the 1st pure water piping 22 is supplied from the 1st pure water branch part DD1 to 1st circulation piping CP1. Then, the pure water flows through the first circulation pipe CP1, and then is introduced from the first waste liquid branch portion DW1 to the first waste liquid pipe 24 to be drained. Accordingly, the chemical solution in the portion between the first pure water branch portion DD1 and the first waste liquid branch portion DW1 in the first circulation pipe CP1 is pushed out by pure water and extracted from the portion.

When a predetermined chemical extraction time has elapsed, the first pure water valve 23 is closed (step S6), and the first three-way valve 25 is connected to the first upstream portion 26 and the first downstream portion 27. The communication is switched to communicate (step S7).
As described above, according to this embodiment, the processing units P1, P2, P3, P4 and the chemical liquid supply source 14 are connected via the individual circulation pipes CP1, CP2, CP3, CP4. And by the chemical | medical solution valve | bulb 21, 31, 41, 51 interposed in the middle part of each circulation piping CP1, CP2, CP3, CP4, circulation piping CP1, CP2, corresponding to each process part P1, P2, P3, P4. CP3 and CP4 can be opened and closed individually. Thereby, only the desired processing units P1, P2, P3, and P4 can be targeted for stopping the supply of the chemical solution.

  Further, in each of the circulation pipes CP1, CP2, CP3, CP4, the chemical solution can be extracted from the downstream portion in the flow direction with respect to the chemical solution valves 21, 31, 41, 51. Therefore, in the circulation pipes CP1, CP2, CP3, CP4 corresponding to the desired processing units P1, P2, P3, P4, the chemical liquid valves 21, 31, 41, 51 are closed and the chemical liquid valves 21, 31, 41, By extracting the chemical solution from the downstream portion in the flow direction with respect to 51, maintenance of the processing units P1, P2, P3, and P4 can be performed without the chemical solution in the circulation pipes CP1, CP2, CP3, and CP4.

  Therefore, when performing maintenance such as repair / replacement on the designated processing unit (first processing unit P1), the other processing units P2, P3, and P4 are in the state where the chemical solution supply to only the first processing unit P1 is stopped. The chemical solution supply can be continued. For this reason, the processing units P2, P3, and P4 other than the designated processing unit (first processing unit P1) can perform processing using a chemical solution on the wafer W, thereby suppressing a decrease in processing efficiency of the apparatus. be able to.

As mentioned above, although one Embodiment of this invention was described, this invention can also be implemented with another form.
In the above-described embodiment, the configuration in which the chemical solution in the circulation pipes CP1, CP2, CP3, and CP4 is extracted with pure water supplied to the circulation pipes CP1, CP2, CP3, and CP4 has been described. A configuration may be employed in which an inert gas such as nitrogen gas is supplied to the circulation pipes CP1, CP2, CP3, and CP4 to extract the chemical solution in the circulation pipes CP1, CP2, CP3, and CP4.

In addition, a temperature adjustment unit that heats CP1, CP2, CP3, CP4 flowing through the circulation pipe in the middle of the first to fourth circulation pipes CP1, CP2, CP3, CP4 to adjust the temperature to a predetermined temperature. May be interposed.
Further, the plurality of processing chambers 5A to 5L included in each of the processing units P1, P2, P3, and P4 is not limited to the configuration in which the processing chambers 5A to 5L are stacked in three stages, and may be configured in two stages. The structure which is stacked may be sufficient.

Further, the plurality of processing chambers 5A to 5C, 5D to 5F, 5G to 5H, and 5I to 5J included in each of the processing units P1, P2, P3, and P4 are not limited to a stacked configuration (so-called stacked structure). When the apparatus is of a so-called flat stack type in which a plurality of processing chambers are arranged in the horizontal direction, each processing unit may be configured by a plurality of adjacent processing chambers.
Further, each processing unit P1, P2, P3, P4 includes only one processing chamber, that is, a plurality of circulation pipes CP1, CP2, CP3, CP4 are provided corresponding to each processing chamber, and a chemical solution supply source 14 is provided. May be configured to supply or stop the chemical solution from each of the processing chambers.

Further, the chemical solution from the chemical solution supply source 14 may be supplied to only some of the processing chambers without supplying the chemical solution from the chemical solution supply source 14 to all the processing chambers 5A to 5L.
Furthermore, the pipe for supplying the chemical solution to the processing chambers 5A to 5L may not be a circulation pipe and may have a configuration in which a return path from the processing chambers 5A to 5L to the chemical solution supply source 14 is not provided.
In addition, various design changes can be made within the scope of matters described in the claims.

14 Chemical liquid supply source (Processing liquid supply source)
20A, 30A, 40A, 50A Base end 20B, 30B, 40B, 50B Tip 21 First chemical valve (treatment liquid valve)
22 1st pure water piping 23 1st pure water valve 24 1st waste liquid piping 25 1st 3 way valve 31 2nd chemical | medical solution valve (processing liquid valve)
32 Second pure water pipe 33 Second pure water valve 34 Second waste liquid pipe 35 Second three-way valve 41 Third chemical liquid valve (treatment liquid valve)
42 3rd pure water piping 43 3rd pure water valve 44 3rd waste liquid piping 45 3rd 3 way valve 51 4th chemical | medical solution valve (processing liquid valve)
52 4th pure water piping 53 4th pure water valve 54 4th waste liquid piping 55 4th 3 way valve 60 Control part (valve control means)
61 First supply stop switch (operation unit)
62 Second supply stop switch (operation unit)
63 Third supply stop switch (operation unit)
64 Fourth supply stop switch (operation unit)
CP1 1st circulation piping CP2 2nd circulation piping CP3 3rd circulation piping CP4 4th circulation piping P1 1st process part P2 2nd process part P3 3rd process part P4 4th process part W Wafer (substrate)

Claims (6)

A treatment liquid supply source;
A plurality of processing units for processing the substrate with the processing liquid;
Provided corresponding to each processing unit, a base end is connected to the processing liquid supply source, processing liquid piping for supplying the processing liquid from the processing liquid supply source to each processing unit,
A substrate processing apparatus including a processing liquid valve interposed in the middle of each processing liquid pipe for opening and closing the processing liquid pipe.   The substrate processing apparatus according to claim 1, further comprising a processing liquid extraction unit that extracts the processing liquid from a portion of each processing liquid pipe that is downstream of the processing liquid flow direction with respect to the processing liquid valve.   The said process liquid extraction means is connected to the part between the said process liquid valve | bulb in the said process liquid piping and the said process part, and is equipped with the pure water piping which supplies a pure water to the said process liquid pipe. 2. The substrate processing apparatus according to 1. Each treatment liquid pipe is a circulation pipe whose both ends are connected to the treatment liquid supply source, and a middle part passes through the treatment part,
The processing liquid extraction means includes
Waste liquid piping that is branched and connected to the downstream portion of the processing liquid flow direction from the processing section in each processing liquid piping;
The substrate processing apparatus of Claim 2 or 3 provided with the three-way valve interposed by the branch connection part of the said waste liquid piping in each processing liquid piping. A treatment liquid supply source;
A plurality of processing units for processing the substrate with the processing liquid;
Provided corresponding to each processing unit, both ends are connected to the processing liquid supply source, the middle part is a circulation pipe passing through the processing unit,
A treatment liquid valve for opening and closing the circulation pipe, which is interposed in an upstream portion of the treatment liquid flow direction with respect to the treatment section in each circulation pipe;
A pure water pipe connected to a portion between the processing liquid valve and the processing section in each circulation pipe and supplying pure water to the processing liquid pipe;
A pure water valve interposed in each pure water pipe to open and close the pure water pipe;
Waste liquid piping branched and connected to the downstream portion of the processing liquid flow direction from the processing section in each circulation piping,
A three-way valve interposed in a branch connection portion of the waste liquid pipe in each circulation pipe;
An operation unit operated to specify the processing unit to be stopped from supplying the processing liquid;
The processing liquid valve on the circulation pipe corresponding to the processing section specified by the operation of the operation section is closed, the pure water valve on the pure water pipe connected to the circulation pipe is opened, and the circulation pipe And a valve control means for switching the three-way valve so that the waste liquid piping communicates with the substrate processing apparatus. Each processing unit includes a plurality of processing chambers that can accommodate substrates to be processed one by one,
A distribution pipe provided corresponding to each processing chamber, having a proximal end branched and connected to a processing liquid pipe, a distal end connected to the processing chamber, and distributing the processing liquid flowing through the processing liquid pipe to the processing chamber The substrate processing apparatus according to claim 1, further comprising:

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