JP2010274363A - 被加工物保持材 - Google Patents
被加工物保持材 Download PDFInfo
- Publication number
- JP2010274363A JP2010274363A JP2009128783A JP2009128783A JP2010274363A JP 2010274363 A JP2010274363 A JP 2010274363A JP 2009128783 A JP2009128783 A JP 2009128783A JP 2009128783 A JP2009128783 A JP 2009128783A JP 2010274363 A JP2010274363 A JP 2010274363A
- Authority
- JP
- Japan
- Prior art keywords
- foam layer
- wet
- workpiece
- layer
- holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 51
- 239000010410 layer Substances 0.000 claims abstract description 124
- 239000006260 foam Substances 0.000 claims abstract description 116
- 239000012790 adhesive layer Substances 0.000 claims abstract description 16
- 230000006835 compression Effects 0.000 claims abstract description 13
- 238000007906 compression Methods 0.000 claims abstract description 13
- 238000005187 foaming Methods 0.000 claims abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 6
- 238000005498 polishing Methods 0.000 abstract description 18
- 239000007788 liquid Substances 0.000 abstract description 11
- 238000005345 coagulation Methods 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 9
- 230000035515 penetration Effects 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 238000001179 sorption measurement Methods 0.000 description 5
- 229920002799 BoPET Polymers 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000015271 coagulation Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- BSYQEPMUPCBSBK-UHFFFAOYSA-N [F].[SiH4] Chemical compound [F].[SiH4] BSYQEPMUPCBSBK-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 230000001112 coagulating effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010097 foam moulding Methods 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 150000004812 organic fluorine compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
【解決手段】基材7上に、湿式凝固法によって第2発泡層としての湿式発泡層4を形成し、乾式発泡によって第1発泡層としての乾式発泡層2を形成し、乾式発泡層2上に、接着層3を介して湿式発泡層4を、その発泡層4の表面4aを下にして積層し、湿式発泡層4の裏面4b側の基材7を剥離することにより、該裏面4bを、被加工物保持材を保持する保持面とする。
【選択図】図2
Description
3 接着層 4 湿式発泡層
7 基材
Claims (6)
- 球状の気泡を有する独立発泡の第1発泡層と涙滴状の気泡を有する第2発泡層とが、接着層を介して積層され、前記第2発泡層は、前記涙滴状の気泡が多く存在する表面側が前記接着層に接着され、裏面側が被加工物を保持する保持面とされることを特徴とする被加工物保持材。
- 乾式発泡させた乾式発泡層と湿式発泡させた湿式発泡層とが、接着層を介して積層され、前記湿式発泡層は、基材上に樹脂溶液を塗工して湿式発泡させたものであって、その表面側が前記接着層に接着され、裏面側の前記基材が剥離されて被加工物を保持する保持面とされることを特徴とする被加工物保持材。
- 圧縮率が、20%以上50%以下である請求項1または2に記載の被加工物保持材。
- 前記第1発泡層または前記乾式発泡層の圧縮率が、前記第2発泡層または前記湿式発泡層の圧縮率に比べて高い請求項1ないし3のいずれか一項に記載の被加工物保持材。
- 前記第1発泡層または前記乾式発泡層の厚みが、前記第2発泡層または前記湿式発泡層の厚みに比べて厚い請求項1ないし4のいずれか一項に記載の被加工物保持材。
- 前記第2発泡層または前記湿式発泡層が、撥水性を有する請求項1ないし5のいずれか一項に記載の被加工物保持材。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009128783A JP5478943B2 (ja) | 2009-05-28 | 2009-05-28 | 被加工物保持材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009128783A JP5478943B2 (ja) | 2009-05-28 | 2009-05-28 | 被加工物保持材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010274363A true JP2010274363A (ja) | 2010-12-09 |
| JP5478943B2 JP5478943B2 (ja) | 2014-04-23 |
Family
ID=43421798
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009128783A Active JP5478943B2 (ja) | 2009-05-28 | 2009-05-28 | 被加工物保持材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5478943B2 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111925739B (zh) * | 2020-08-20 | 2021-03-19 | 太仓迪科力科技有限公司 | 晶圆研磨用保护胶带及其制备方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008030146A (ja) * | 2006-07-28 | 2008-02-14 | Fujibo Holdings Inc | 保持パッド |
| JP2008036798A (ja) * | 2006-08-09 | 2008-02-21 | Nitta Haas Inc | 被加工物保持材およびその製造方法 |
| JP2008168380A (ja) * | 2007-01-11 | 2008-07-24 | Fujibo Holdings Inc | 保持パッド |
-
2009
- 2009-05-28 JP JP2009128783A patent/JP5478943B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008030146A (ja) * | 2006-07-28 | 2008-02-14 | Fujibo Holdings Inc | 保持パッド |
| JP2008036798A (ja) * | 2006-08-09 | 2008-02-21 | Nitta Haas Inc | 被加工物保持材およびその製造方法 |
| JP2008168380A (ja) * | 2007-01-11 | 2008-07-24 | Fujibo Holdings Inc | 保持パッド |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5478943B2 (ja) | 2014-04-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10201886B2 (en) | Polishing pad and method for manufacturing the same | |
| TW201628785A (zh) | 硏磨墊 | |
| JP2005011972A (ja) | 被研磨加工物の保持材およびこの保持材の製造方法 | |
| TW201521958A (zh) | 保持墊 | |
| JP4943766B2 (ja) | 被加工物保持材およびその製造方法 | |
| JP5478943B2 (ja) | 被加工物保持材 | |
| JP2009148876A (ja) | 研磨パッド、およびそれを用いた研磨方法 | |
| TW200842962A (en) | Composite sheet for mounting a workpiece and the method for making the same | |
| JP2002059357A (ja) | 研磨パッドおよび研磨装置ならびに研磨方法 | |
| JP2011020189A (ja) | 被加工物保持材の製造方法および被加工物保持材 | |
| JP7139125B2 (ja) | 保持具及びその製造方法 | |
| JP2001315056A (ja) | 研磨用パッドおよびそれを用いた研磨装置及び研磨方法 | |
| JP5502542B2 (ja) | 研磨パッド | |
| JP5631955B2 (ja) | 研磨パッド | |
| JP5315678B2 (ja) | 研磨パッドの製造方法 | |
| WO2016098501A1 (ja) | 研磨パッド | |
| JP6268432B2 (ja) | 研磨パッド及び研磨パッドの製造方法 | |
| JP5457897B2 (ja) | 保持材 | |
| JP7139126B2 (ja) | 保持具及びその製造方法 | |
| JP5145683B2 (ja) | 研磨方法、研磨パッド、研磨パッドの製造方法 | |
| JP2009095945A (ja) | 研磨パッド | |
| JP5976623B2 (ja) | 被加工物保持材 | |
| JP5254883B2 (ja) | 発泡体の製造方法 | |
| JP2015013345A (ja) | 研磨パッド | |
| JP2002009025A (ja) | 研磨パッド |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20111125 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130228 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130702 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140204 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140212 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5478943 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |