JP2008534775A - コーティング材料を蒸発若しくは昇華させるための加熱装置とコーティング装置と方法 - Google Patents
コーティング材料を蒸発若しくは昇華させるための加熱装置とコーティング装置と方法 Download PDFInfo
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 212
- 239000000463 material Substances 0.000 title claims abstract description 109
- 238000000576 coating method Methods 0.000 title claims abstract description 99
- 239000011248 coating agent Substances 0.000 title claims abstract description 96
- 238000000034 method Methods 0.000 title claims abstract description 29
- 238000001704 evaporation Methods 0.000 title description 48
- 239000011796 hollow space material Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 24
- 239000000919 ceramic Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000011368 organic material Substances 0.000 claims description 7
- 239000011148 porous material Substances 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 5
- 238000011068 loading method Methods 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 230000005855 radiation Effects 0.000 claims description 4
- 229910010293 ceramic material Inorganic materials 0.000 claims description 3
- 239000006260 foam Substances 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 2
- 238000011017 operating method Methods 0.000 claims description 2
- 230000008859 change Effects 0.000 abstract description 7
- 230000008020 evaporation Effects 0.000 description 43
- 239000012071 phase Substances 0.000 description 13
- 239000007789 gas Substances 0.000 description 11
- 239000010410 layer Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 230000004044 response Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000009826 distribution Methods 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000000859 sublimation Methods 0.000 description 4
- 230000008022 sublimation Effects 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000003795 desorption Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 238000002207 thermal evaporation Methods 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ODGBPCPHYFTWIN-UHFFFAOYSA-G [Ti+4].N(=O)[O-].[B+3].N(=O)[O-].N(=O)[O-].N(=O)[O-].N(=O)[O-].N(=O)[O-].N(=O)[O-] Chemical compound [Ti+4].N(=O)[O-].[B+3].N(=O)[O-].N(=O)[O-].N(=O)[O-].N(=O)[O-].N(=O)[O-].N(=O)[O-] ODGBPCPHYFTWIN-UHFFFAOYSA-G 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005288 electromagnetic effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000012254 powdered material Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
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- Organic Chemistry (AREA)
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Abstract
Description
Claims (25)
- 特にコーティング装置(100)での使用のために、コーティング材料を気相に変えることが可能な加熱装置(10)において、
中空のスペースと内面とを有し、これら中空のスペースには、前記コーティング材料が装填可能である少なくとも1つの加熱ユニット(11)と、
前記加熱ユニット(11)中に分散状態で位置された複数の加熱素子(12)とを具備していることを特徴とする加熱装置。 - 前記複数の加熱素子(12)は、前記加熱ユニット(11)中に埋設されている請求項1の加熱装置。
- 前記複数の加熱素子(12)は、前記加熱ユニット(11)の複数の内壁により形成されている請求項1又は2の加熱装置。
- 前記複数の加熱素子(12)は、少なくとも2W/mKの熱伝導性を有している前記全ての請求項のいずれか1の加熱装置。
- 前記複数の加熱素子(12)は、電気エネルギーを熱エネルギーに迅速に変換するように設定されている前記全ての請求項のいずれか1の加熱装置。
- 前記加熱素子(12)は、少なくとも1つの熱源(40)に接続されている前記全ての請求項のいずれか1の加熱装置。
- 前記加熱ユニット(11)は、孔構造、薄層構造、蜂の巣状の構造、発泡構造、並びに繊維構造のグループから選択された少なくとも1つの内部構造を有している前記全ての請求項のいずれか1の加熱装置。
- 前記加熱ユニット(11)は、金属、セラミック材料、若しくは、金属とセラミックとの合成材で形成されている前記全ての請求項のいずれか1の加熱装置。
- 加熱素子(12)がそれぞれ設けられ、コーティング材料が装填可能な幾つかの加熱ユニット(11.1、11.2、11.3)を有している前記全ての請求項のいずれか1の加熱装置。
- 前記加熱ユニット(11.1、11.2、11.3)の少なくとも1つの加熱素子は、いずれの場合においても、他の加熱ユニットの加熱素子から選択的に動作されることが可能である請求項9の加熱装置。
- 気相に変えられる前記コーティング材料のビーム特性を果たすようにガイド装置(15)を有している前記全ての請求項のいずれか1の加熱装置。
- 前記加熱ユニット(11)の少なくとも1つ若しくは前記ガイド装置(15)の放出面(13)は、気相に変えられる前記コーティング材料のビーム特性を果たすように形成されている前記全ての請求項のいずれか1の加熱装置。
- 前記中空のスペースは、少なくとも1つのディメンションにおいて、1mmないし5cmの範囲の特徴的なサイズを有している前記全ての請求項のいずれか1の加熱装置。
- 前記中空のスペースは、少なくとも1つのディメンションにおいて、1μmないし1mmの範囲の特徴的なサイズを有している請求項1ないし12のいずれか1の加熱装置。
- 前記全ての請求項のいずれか1つに従った少なくとも1つの加熱装置(10)が装備されているコーティング装置(100)。
- コーティングされる基板(31)を所定の参照面に沿って位置付けるための基板ホルダ(30)を具備している請求項15のコーティング装置。
- 前記加熱装置(10)は、気相に変えられるコーティング材料のビーム特性を果たすように、少なくとも1つの加熱ユニット(11)若しくはガイド装置(15)の所定の放出面を有し、前記放出面は、前記基板ホルダ(30)の参照面に沿って延びている請求項16のコーティング装置。
- 特にコーティング装置(100)でコーティング材料を気相に変えるための方法であって、
請求項1ないし15のいずれか1つに従った加熱装置(10)の少なくとも1つの加熱ユニット(1)にコーティング材料を装填する工程と、
前記少なくとも1つの加熱ユニットの加熱素子(12)を動作させる工程とを具備する方法。 - 前記加熱素子(12)を動作させる工程は、前記加熱素子(12)に電流若しくは熱流を供給することを含む請求項18の方法。
- 前記加熱素子(12)は、少なくとも2W/mKの熱伝導性を有し、前記加熱素子を動作させることは、前記加熱素子に熱流を供給することを含む請求項19の方法。
- 前記加熱装置(10)は、加熱素子が設けられた幾つかの加熱ユニット(11.1、11.2、11.3)を有し、これら加熱素子を動作させることは、所定の動作方法に従って果たされる請求項18ないし20のいずれか1の方法。
- 前記幾つかの加熱ユニット(11.1、11.2、11.3)の加熱素子の各々を、別々にシーケンスで動作させる請求項21の方法。
- 気相に変えられるコーティング材料の放射特性の形成が与えられる請求項18ないし22のいずれか1の方法。
- 前記気相に変えられるコーティング材料の蒸着は、基板に与えられる請求項18ないし23の少なくとも1つの方法。
- 有機材料から層を形成するための請求項1ないし17のいずれか1つに従った加熱装置若しくはコーティング装置の使用。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005013875.6 | 2005-03-24 | ||
| DE102005013875A DE102005013875A1 (de) | 2005-03-24 | 2005-03-24 | Heizeinrichtung, Beschichtungsanlage und Verfahren zur Verdampfung oder Sublimation von Beschichtungsmaterialien |
| PCT/EP2006/002632 WO2006100058A2 (de) | 2005-03-24 | 2006-03-22 | Heizeinrichtung, beschichtungsanlage und verfahren zur verdampfung oder sublimation von beschichtungsmaterialien |
Publications (2)
| Publication Number | Publication Date |
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| JP2008534775A true JP2008534775A (ja) | 2008-08-28 |
| JP5362346B2 JP5362346B2 (ja) | 2013-12-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2008502318A Expired - Fee Related JP5362346B2 (ja) | 2005-03-24 | 2006-03-22 | コーティング材料を蒸発若しくは昇華させるための加熱装置とコーティング装置と方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8082877B2 (ja) |
| EP (1) | EP1874976B1 (ja) |
| JP (1) | JP5362346B2 (ja) |
| KR (1) | KR101256101B1 (ja) |
| DE (1) | DE102005013875A1 (ja) |
| TW (1) | TWI335940B (ja) |
| WO (1) | WO2006100058A2 (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140041793A (ko) * | 2011-06-22 | 2014-04-04 | 아익스트론 에스이 | 기상 증착 재료 소스 및 이를 제조하기 위한 방법 |
| JP2014522909A (ja) * | 2011-06-22 | 2014-09-08 | アイクストロン、エスイー | 気相蒸着方法及び気相蒸着装置 |
| JP2014523486A (ja) * | 2011-06-22 | 2014-09-11 | アイクストロン、エスイー | Oledの堆積方法および装置 |
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| US8027574B2 (en) * | 2007-08-06 | 2011-09-27 | Global Oled Technology Llc | Vaporization of thermally sensitive materials |
| DE102008024486B4 (de) * | 2008-05-21 | 2011-12-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Plasmastempel, Plasmabehandlungsvorrichtung, Verfahren zur Plasmabehandlung und Herstellungsverfahren für einen Plasmastempel |
| US8961768B2 (en) | 2008-12-29 | 2015-02-24 | Basf Corporation | Metal containing integrated electrocoat for better corrosion resistance |
| WO2011026971A1 (de) | 2009-09-04 | 2011-03-10 | Von Ardenne Anlagentechnik Gmbh | Verfahren und vorrichtung zur beschichtung von substraten aus der dampfphase |
| DE102009007587B4 (de) | 2009-02-05 | 2011-06-01 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Beschichtung von Substraten aus der Dampfphase |
| WO2011015550A1 (de) | 2009-08-03 | 2011-02-10 | Heliatek Gmbh | Verdampfer system für organische schichten und bauelemente |
| DE102010007111B4 (de) | 2010-02-05 | 2012-02-16 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Pulvermischung zur Beschichtung von Substraten aus der Dampfphase |
| KR101711504B1 (ko) | 2011-06-22 | 2017-03-02 | 아익스트론 에스이 | 기상 증착 시스템 및 공급 헤드 |
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| DE102011107894A1 (de) | 2011-07-18 | 2013-01-24 | Creaphys Gmbh | Beschichtungseinrichtung, insbesondere für die Innenbeschichtung von Hohlkörpern, und Beschichtungsverfahren |
| DE102012107824B3 (de) * | 2012-08-24 | 2014-02-06 | Technische Universität Braunschweig Carolo-Wilhelmina | Verfahren zur Beschichtung eines Substrats mit mehreren Materialschichten und Mehrmaterialienabgabeeinrichtung dafür |
| KR20160123438A (ko) * | 2015-04-15 | 2016-10-26 | 삼성디스플레이 주식회사 | 유기 발광 디스플레이 장치용 증착원 |
| JP6407479B2 (ja) * | 2016-03-23 | 2018-10-17 | 鴻海精密工業股▲ふん▼有限公司 | 蒸着装置、蒸着方法及び有機el表示装置の製造方法 |
| US10464364B1 (en) | 2016-07-11 | 2019-11-05 | Spectrajet | Sublimation transfer paper with coating, and method for making same |
| DE102016121791A1 (de) | 2016-11-14 | 2018-05-17 | Thomas Emde | Beschichtungsverfahren, Beschichtungseinrichtung und Bauteil |
| DE102016121786A1 (de) | 2016-11-14 | 2018-05-17 | Thomas Emde | Beschichtungsverfahren, Beschichtungseinrichtung und Bauteil |
| RU179865U1 (ru) * | 2017-12-21 | 2018-05-28 | Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" | Резистивный испарительный блок для эпитаксиального выращивания в вакууме слоёв кремния, легированных эрбием |
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- 2006-03-22 JP JP2008502318A patent/JP5362346B2/ja not_active Expired - Fee Related
- 2006-03-22 US US11/909,180 patent/US8082877B2/en not_active Expired - Fee Related
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR20140041793A (ko) * | 2011-06-22 | 2014-04-04 | 아익스트론 에스이 | 기상 증착 재료 소스 및 이를 제조하기 위한 방법 |
| CN103930589A (zh) * | 2011-06-22 | 2014-07-16 | 艾克斯特朗欧洲公司 | 气相沉积材料源及其制造方法 |
| JP2014522909A (ja) * | 2011-06-22 | 2014-09-08 | アイクストロン、エスイー | 気相蒸着方法及び気相蒸着装置 |
| JP2014523486A (ja) * | 2011-06-22 | 2014-09-11 | アイクストロン、エスイー | Oledの堆積方法および装置 |
| JP2014523484A (ja) * | 2011-06-22 | 2014-09-11 | アイクストロン、エスイー | 気相蒸着材料ソース及びその作製方法 |
| CN103930589B (zh) * | 2011-06-22 | 2016-03-30 | 艾克斯特朗欧洲公司 | 气相沉积材料源及其制造方法 |
| KR101709921B1 (ko) | 2011-06-22 | 2017-02-24 | 아익스트론 에스이 | 기상 증착 재료 소스 및 이를 제조하기 위한 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20080193644A1 (en) | 2008-08-14 |
| KR20080006562A (ko) | 2008-01-16 |
| KR101256101B1 (ko) | 2013-04-23 |
| EP1874976B1 (de) | 2013-03-13 |
| TW200639264A (en) | 2006-11-16 |
| TWI335940B (en) | 2011-01-11 |
| DE102005013875A1 (de) | 2006-11-02 |
| JP5362346B2 (ja) | 2013-12-11 |
| WO2006100058A2 (de) | 2006-09-28 |
| US8082877B2 (en) | 2011-12-27 |
| EP1874976A2 (de) | 2008-01-09 |
| WO2006100058A3 (de) | 2006-12-07 |
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