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JP2008294071A - Optical semiconductor device, lighting device and display device - Google Patents

Optical semiconductor device, lighting device and display device Download PDF

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JP2008294071A
JP2008294071A JP2007135716A JP2007135716A JP2008294071A JP 2008294071 A JP2008294071 A JP 2008294071A JP 2007135716 A JP2007135716 A JP 2007135716A JP 2007135716 A JP2007135716 A JP 2007135716A JP 2008294071 A JP2008294071 A JP 2008294071A
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optical semiconductor
inner lead
semiconductor element
semiconductor device
lead portion
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Kazuo Shimokawa
一生 下川
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Toshiba Corp
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Abstract

【課題】本発明は、光半導体素子の発光効率を向上させながら、反射部材の反射開口部を確実にリフレクタとして機能させ、外形は可能な限り小型化を図った光半導体装置と、この光半導体装置を備えた照明装置および表示装置を提供する。
【解決手段】複数の光半導体素子S1を所定間隔を存してインナーリード部1に実装し、白色樹脂材からなる反射部材2をインナーリード部に設け、この反射部材は光半導体素子周囲からテーパー状に拡大形成される反射開口部3を有し、透光性を有する封止部材6が反射部材の反射開口部および光半導体素子を封止し、隣り合う反射開口部相互が重ね合わさるよう光半導体素子の配置ピッチを短縮し、反射開口部相互の重ね合わせ部分に台形部4を切欠形成する。
【選択図】 図1
The present invention relates to an optical semiconductor device in which a reflection opening of a reflecting member is reliably functioned as a reflector while improving the light emission efficiency of the optical semiconductor element, and an outer shape of the optical semiconductor device is reduced as much as possible. Provided are a lighting device and a display device including the device.
A plurality of optical semiconductor elements S1 are mounted on an inner lead portion 1 at a predetermined interval, and a reflecting member 2 made of a white resin material is provided on the inner lead portion, and the reflecting member is tapered from the periphery of the optical semiconductor element. The reflective opening 3 is formed in an enlarged shape, and the light-transmitting sealing member 6 seals the reflective opening and the optical semiconductor element of the reflective member, and the adjacent reflective openings overlap each other. The arrangement pitch of the semiconductor elements is shortened, and the trapezoidal portion 4 is cut out in the overlapping portion between the reflective openings.
[Selection] Figure 1

Description

本発明は、複数の光半導体素子を備えた光半導体装置と、この光半導体装置を光源として備える照明装置および表示装置に関する。   The present invention relates to an optical semiconductor device including a plurality of optical semiconductor elements, and an illumination device and a display device including the optical semiconductor device as a light source.

白色光を発光する光半導体素子(Light Emitting Diode)を備えた光半導体装置は、小型であり、投入電力の割に得られる輝度が高く、長寿命である。水銀などの有害物質が使用されておらず、白熱灯や蛍光灯などの代替光源として一般照明や自動車等の部分照明、あるいは表示装置などへの適用が進められている。ただし、従来から用いられるランプ等の光源と比較して、光半導体装置は輝度当たりの価格が高いという不利条件があり、低コスト化の要求が大である。   An optical semiconductor device provided with an optical semiconductor element that emits white light (Light Emitting Diode) is small in size, has high brightness obtained for input power, and has a long lifetime. No harmful substances such as mercury are used, and application to general lighting, partial lighting such as automobiles, or display devices as an alternative light source such as an incandescent lamp and a fluorescent lamp is being promoted. However, the optical semiconductor device is disadvantageous in that the price per luminance is higher than that of a light source such as a lamp that has been used in the past, and there is a great demand for cost reduction.

近時、高い輝度が得られるという特徴から、青色光を発光する光半導体素子と、青色光を黄色光に波長変換する蛍光体とを用いて、光半導体素子から青色光と黄色光を発光し、擬似白色光を得る方式が開発されている。インナーリード部には、光反射率の高い白色樹脂材でケースを形成した金属フレームが多く使用されている。   Recently, due to the feature that high luminance can be obtained, blue light and yellow light are emitted from the optical semiconductor element using an optical semiconductor element that emits blue light and a phosphor that converts the wavelength of blue light into yellow light. A method of obtaining pseudo white light has been developed. For the inner lead portion, a metal frame having a case made of a white resin material having high light reflectance is often used.

図8と、図9に従来の光半導体装置の概略構成を示す。
図8(A)(B)は第1のタイプの光半導体装置Haにおける平面図と断面図、図9(A)(B)は第2のタイプの光半導体装置における平面図と断面図である。
第1タイプの光半導体装置Haは、インナーリード部aに発光層面積の大きな光半導体素子Saを1個搭載するタイプのものである。インナーリード部aに設けられる白色樹脂材からなる反射部材bは、すり鉢状の反射開口部(リフレクタ)cを有している。この反射開口部cと半導体素子Saは樹脂材からなる封止部材dで封止される。
8 and 9 show a schematic configuration of a conventional optical semiconductor device.
8A and 8B are a plan view and a cross-sectional view of the first type optical semiconductor device Ha, and FIGS. 9A and 9B are a plan view and a cross-sectional view of the second type optical semiconductor device. .
The first type optical semiconductor device Ha is a type in which one optical semiconductor element Sa having a large light emitting layer area is mounted on the inner lead portion a. The reflection member b made of a white resin material provided in the inner lead part a has a mortar-like reflection opening (reflector) c. The reflection opening c and the semiconductor element Sa are sealed with a sealing member d made of a resin material.

上記光半導体装置Haにおいては、光半導体素子Saが1個のために構造的に簡易であるが、光半導体素子Saとして発光層面積が大面積のものを備えるので、投入電力に対する輝度が低下してしまう。より高い輝度を得るためには、より大きな投入電力が必要となり、ランニングコストの増大化が避けられない。   The optical semiconductor device Ha is simple in structure because of the single optical semiconductor element Sa. However, since the optical semiconductor element Sa has a large light emitting layer area, the luminance with respect to input power is reduced. End up. In order to obtain higher luminance, a larger input power is required, and an increase in running cost is inevitable.

第2のタイプの光半導体装置Hbは、1つの反射開口部cに、発光層面積の小さな光半導体素子Sbを複数個備えている以外は、第1のタイプのものと同一構成である。この光半導体装置Hbは、光半導体素子Sbの発光層の面積が小さいので、投入電力に対して発光効率が高い反面、1つの反射開口部cに複数の光半導体素子Sbを搭載するため、製造工程が多くなり、光半導体装置Sbとしてのサイズが大きくなってしまう。   The second type optical semiconductor device Hb has the same configuration as that of the first type except that a plurality of optical semiconductor elements Sb having a small light emitting layer area are provided in one reflection opening c. Since this optical semiconductor device Hb has a small light emitting layer area of the optical semiconductor element Sb, the light emitting efficiency is high with respect to the input power, but a plurality of optical semiconductor elements Sb are mounted in one reflective opening c. The number of processes increases and the size of the optical semiconductor device Sb increases.

なお、反射開口部を白色樹脂材で形成する構造の光半導体装置は、波長の短い青色光によって白色樹脂材が変色し、光反射特性が早期に低下する傾向にある。そのため、他の可視光の光半導体装置と比較して、信頼性寿命が短い。近年、青色光を発光する光半導体素子は、投入電力に対する発光効率が向上し、高輝度化が進んでいるので、現行の装置構造では、さらに製品寿命が短くなることが推測される。   Note that in an optical semiconductor device having a structure in which the reflective opening is formed of a white resin material, the white resin material is discolored by blue light having a short wavelength, and the light reflection characteristics tend to deteriorate early. Therefore, the lifetime of reliability is short as compared with other optical semiconductor devices for visible light. In recent years, an optical semiconductor element that emits blue light has been improved in luminous efficiency with respect to input power and increased in luminance. Therefore, it is estimated that the current device structure further shortens the product life.

この対策として、小面積の光半導体素子を多数個使用し、それぞれの光半導体素子に対して反射開口部を形成する光半導体装置の開発が進んでいくことが予想される。複数の光半導体素子の個々に反射開口部を形成する光半導体装置は、たとえば[特許文献1]や[特許文献2]に開示されている。
特開2005−223216号公報 特開2006−100565号公報
As a countermeasure, it is expected that development of an optical semiconductor device using a large number of small-sized optical semiconductor elements and forming a reflective opening for each optical semiconductor element will progress. An optical semiconductor device in which a reflective opening is formed for each of a plurality of optical semiconductor elements is disclosed in, for example, [Patent Document 1] and [Patent Document 2].
JP 2005-223216 A Japanese Patent Laid-Open No. 2006-1000056

上記白色樹脂材として、たとえば熱可塑性樹脂材が用いられるが、この素材は成形時の充填性が低いという制約がある。複数の光半導体素子の個々に反射開口部を形成する光半導体装置では、隣り合う反射開口部の端部相互が密接もしくは近接しているので、これら端部相互間に樹脂材が充填し難い。   As the white resin material, for example, a thermoplastic resin material is used, but this material has a restriction that the filling property at the time of molding is low. In the optical semiconductor device in which the reflection openings are individually formed in the plurality of optical semiconductor elements, the end portions of the adjacent reflection openings are close to each other or close to each other, so that it is difficult to fill the resin material between the ends.

なお説明すると、図7に示すように、隣り合う反射開口部3の端部相互が密接するよう、インナーリード部1に実装される光半導体素子S1の配置ピッチPと、反射部材2に形成され上記光半導体素子S1を囲む反射開口部3の上面直径φPとを同一寸法に設定したとする。   In other words, as shown in FIG. 7, the arrangement pitch P of the optical semiconductor elements S1 mounted on the inner lead portion 1 and the reflection member 2 are formed so that the ends of the adjacent reflection openings 3 are in close contact with each other. It is assumed that the upper surface diameter φP of the reflective opening 3 surrounding the optical semiconductor element S1 is set to the same dimension.

この場合、隣り合う反射開口部3の端部相互で形成される頂部gは、断面尖鋭状となってしまう。反射部材2をインジェクションモールド工法で成型すると、熱可塑性樹脂材の流動性が低いので、頂部gへ樹脂材が充填し難い。   In this case, the top g formed at the ends of the adjacent reflection openings 3 has a sharp cross section. When the reflecting member 2 is molded by the injection molding method, the fluidity of the thermoplastic resin material is low, and therefore it is difficult to fill the top g with the resin material.

そのため、頂部gにいわゆる巣の発生の虞れがあり、強度的および発光特性上の信頼性が欠ける。したがって、光半導体素子S1の配置ピッチPを反射開口部3の上面直径φPよりも大きく設定して、隣り合う反射開口部3端部相互を離間させる必要がある。このようにして複数の光半導体素子と反射開口部を備えると、装置外形が大型化してしまう。   Therefore, a so-called nest may be generated at the top g, and reliability in terms of strength and light emission characteristics is lacking. Therefore, it is necessary to set the arrangement pitch P of the optical semiconductor elements S1 to be larger than the upper surface diameter φP of the reflection openings 3 and to separate the ends of the adjacent reflection openings 3 from each other. When the plurality of optical semiconductor elements and the reflection openings are provided in this manner, the outer shape of the apparatus is increased.

本発明は上記事情にもとづきなされたものであり、その目的とするところは、発光効率の高い小面積の光半導体素子を複数個用いて、半導体素子の発光効率を向上させるとともに、反射開口部を確実にリフレクタとして機能させたうえに、装置として小型化を得る光半導体装置を提供する。
そして、この光半導体装置を備えた照明装置および表示装置を提供する。
The present invention has been made based on the above circumstances, and the object of the present invention is to improve the luminous efficiency of the semiconductor element by using a plurality of small-area optical semiconductor elements having high luminous efficiency, and to provide a reflective opening. Provided is an optical semiconductor device that can function reliably as a reflector and can be downsized as a device.
And the illuminating device and display apparatus provided with this optical semiconductor device are provided.

上記目的を満足するため本発明の光半導体装置は、複数の光半導体素子を所定間隔を存してインナーリード部に実装し、白色樹脂材からなる反射部材をインナーリード部に設け、この反射部材は光半導体素子周囲からテーパー状に拡大形成される反射開口部を有し、透光性を有する封止部材が反射部材の反射開口部および光半導体素子を封止し、隣り合う反射開口部相互が重ね合わさるよう光半導体素子の配置ピッチを短縮し、反射開口部相互の重ね合わせ部分に台形部を切欠形成する。
また、上記目的を満足するため本発明の照明装置は、光源として上記光半導体装置を備える。
また、上記目的を満足するため本発明の表示装置は、光源として上記光半導体装置を備える。
In order to satisfy the above object, an optical semiconductor device of the present invention has a plurality of optical semiconductor elements mounted on an inner lead portion at a predetermined interval, and a reflective member made of a white resin material is provided on the inner lead portion. Has a reflective opening formed in a tapered shape from the periphery of the optical semiconductor element, and a sealing member having translucency seals the reflective opening of the reflective member and the optical semiconductor element, so that adjacent reflective openings are mutually connected. The arrangement pitch of the optical semiconductor elements is shortened so that they overlap each other, and a trapezoidal portion is cut out in the overlapping portion between the reflective openings.
In order to satisfy the above object, the illumination device of the present invention includes the optical semiconductor device as a light source.
In order to satisfy the above object, the display device of the present invention includes the above optical semiconductor device as a light source.

本発明によれば、半導体素子の発光効率を向上させ、反射部材の反射開口部を確実にリフレクタとして機能させて、装置外形の小型化を得るという効果を奏する。   According to the present invention, it is possible to improve the light emission efficiency of the semiconductor element, and to ensure that the reflection opening of the reflection member functions as a reflector, thereby obtaining a reduction in the size of the device.

以下、本発明の実施の形態を図面にもとづいて説明する。
図1(A)は第1の実施の形態における光半導体装置H1の平面図、図1(B)は図1(A)のB−B線に沿う縦断面図、図1(C)は図1(A)のC−C線に沿う縦断面図である。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
1A is a plan view of the optical semiconductor device H1 according to the first embodiment, FIG. 1B is a longitudinal sectional view taken along line BB in FIG. 1A, and FIG. It is a longitudinal cross-sectional view which follows the CC line of 1 (A).

図中1は、板厚が0.2mm程度の金属フレーム(銅板)からなるインナーリード部である。このインナーリード部1は図示しない配線回路を備えた上にニッケルと銀が約1μmの厚さでメッキ(被覆)され、両側部はガルウィング状に成型される。インナーリード部1表面には、一方向(X方向)に沿い所定間隔を存して複数(3個)の光半導体素子S1が実装(ダイマウント)されている。   In the figure, reference numeral 1 denotes an inner lead portion made of a metal frame (copper plate) having a plate thickness of about 0.2 mm. The inner lead portion 1 is provided with a wiring circuit (not shown), and nickel and silver are plated (covered) with a thickness of about 1 μm, and both side portions are formed in a gull wing shape. A plurality (three) of optical semiconductor elements S1 are mounted (die mounted) on the surface of the inner lead portion 1 at a predetermined interval along one direction (X direction).

上記光半導体素子S1は、たとえば縦0.4×横0.4×厚さ0.2mm3に形成されていて、200mAの電流を流すことにより、20lmの光束が得られる高出力タイプである。基材としてAl2O3が用いられていて、その上面には青色に発光する図示しない発光層が形成されている。この発光層上には、アノード電極e1とカソード電極e2とが互いに離間対向して形成される。   The optical semiconductor element S1 is, for example, formed in a size of vertical 0.4 × horizontal 0.4 × thickness 0.2 mm 3, and is a high output type capable of obtaining a light beam of 20 lm by flowing a current of 200 mA. Al2O3 is used as a substrate, and a light emitting layer (not shown) that emits blue light is formed on the upper surface thereof. On this light emitting layer, the anode electrode e1 and the cathode electrode e2 are formed so as to be spaced apart from each other.

ここでは、アノード電極e1とカソード電極e2とが互いにY方向に離間対向している。複数の光半導体素子S1の配置方向は、それぞれの光半導体素子S1のアノード電極e1とカソード電極e2の配列方向とは直交する方向である、X方向である。   Here, the anode electrode e1 and the cathode electrode e2 are spaced apart from each other in the Y direction. The arrangement direction of the plurality of optical semiconductor elements S1 is the X direction, which is a direction orthogonal to the arrangement direction of the anode electrode e1 and the cathode electrode e2 of each optical semiconductor element S1.

上記インナーリード部1上の光半導体素子S1が実装される面には、さらに白色樹脂材からなる反射部材2が一体にモールド成型されている。この反射部材2を構成する白色樹脂材は熱可塑性樹脂材からなり、上記光半導体素子S1の取付け位置に合わせた状態で、いわゆるリフレクタである反射開口部3を有している。   On the surface on which the optical semiconductor element S1 on the inner lead portion 1 is mounted, a reflecting member 2 made of a white resin material is molded integrally. The white resin material constituting the reflection member 2 is made of a thermoplastic resin material, and has a reflection opening portion 3 which is a so-called reflector in a state matched with the mounting position of the optical semiconductor element S1.

上記反射開口部3は、インナーリード部1のX方向に沿って1.9mmのピッチで設けられていて、それぞれの反射開口部3は上面がφ2.0mm、底面がφ1.0mm、高さが0.5mmに形成される。したがって、上記反射開口部3は底面から表面に向って直径が漸次拡大形成される、略すり鉢(テーパー)状をなしている。   The reflection openings 3 are provided at a pitch of 1.9 mm along the X direction of the inner lead portion 1. Each reflection opening 3 has a top surface of φ2.0 mm, a bottom surface of φ1.0 mm, and a height of It is formed to 0.5 mm. Therefore, the reflection opening 3 has a substantially mortar (taper) shape whose diameter gradually increases from the bottom surface to the surface.

特に、図1(A)(B)に二点鎖線で示すように、複数の反射開口部3における配置ピッチと上面直径との関係から、隣り合う反射開口部3の端部相互に重なる部分fが生じる。そのまま形成すれば、隣り合う反射開口部3の頂部gは断面三角状になり、かつ頂部gの高さ位置は反射部材2の表面よりもある程度低い位置に設定される。   In particular, as indicated by a two-dot chain line in FIGS. 1A and 1B, a portion f that overlaps the ends of the adjacent reflective openings 3 due to the relationship between the arrangement pitch and the upper surface diameter in the plurality of reflective openings 3. Occurs. If formed as it is, the apex g of the adjacent reflection openings 3 has a triangular cross section, and the height of the apex g is set to a position somewhat lower than the surface of the reflection member 2.

しかしながら本実施の形態においては、隣り合う反射開口部3相互の重なる部分fの頂部gを切欠して裁頭形状となし、頂部が平坦面をなす台座部4が形成される。この台座部4は、図1(A)に示す平面視で、Y方向の両側端部は直状をなすが、両側端部相互間は反射開口部3に沿った曲線状をなしている。   However, in the present embodiment, the top portion g of the overlapping portion f between the adjacent reflection openings 3 is cut out to form a truncated shape, and the pedestal portion 4 whose top portion forms a flat surface is formed. In the plan view shown in FIG. 1A, the pedestal 4 has a straight shape at both ends in the Y direction, but has a curved shape along the reflective opening 3 between the two ends.

そして、Y方向の両側端部が最も幅が広く、反射開口部3の中心軸部分が最も幅が狭い、中央部が括れた、いわゆる双曲線状をなしている。X方向の最大寸法は0.3mmであり、Y方向の長さ寸法は1.2mm、高さ寸法は0.2mmであり、隣り合う反射開口部3相互が台座部4でつながっている。   And the both-sides edge part of a Y direction is the widest width | variety, the center axis | shaft part of the reflective opening part 3 has the narrowest width | variety, and has comprised what is called a hyperbola shape where the center part was bundled. The maximum dimension in the X direction is 0.3 mm, the length dimension in the Y direction is 1.2 mm, the height dimension is 0.2 mm, and the adjacent reflection openings 3 are connected to each other by the pedestal part 4.

上記台座部4についてなお説明すると、反射開口部3を有する反射部材2は、熱可塑性樹脂材を用いてインジェクションモールド工法で成型するが、素材自体の流動性が低く、樹脂材の肉厚の薄い部分への充填性が低いことの特性がある。   The pedestal 4 will be further described. The reflecting member 2 having the reflecting opening 3 is molded by an injection molding method using a thermoplastic resin material, but the material itself has low fluidity and the resin material is thin. There is a characteristic that the filling property to a part is low.

先に図7で示したように、光半導体素子S1の配置ピッチPと反射開口部3の上面の直径φPとを同一に設定すると、隣り合う反射開口部3の端部相互で形成される頂部gは断面尖鋭状となる。また、図1(B)で説明したように、隣り合う反射開口部3相互に重なる部分fが生じる場合も、そのままであれば隣り合う反射開口部3の端部相互で形成される頂部gは断面三角状になる。   As shown in FIG. 7 above, when the arrangement pitch P of the optical semiconductor elements S1 and the diameter φP of the upper surface of the reflection opening 3 are set to be the same, the tops formed at the ends of the adjacent reflection openings 3 mutually. g is sharp in cross section. In addition, as described with reference to FIG. 1B, even when a portion f that overlaps adjacent reflective openings 3 is generated, the top g formed at the ends of the adjacent reflective openings 3 is not changed. The cross section is triangular.

そのため、図7の構成、もしくは図1(B)の二点鎖線の構成であると、隣り合う反射開口部3の端部相互で形成される頂部gにまで熱可塑性樹脂材が充填され難い。いわゆる巣の発生の虞れがあり、強度的および発光特性上の信頼性が欠ける。これに対して上述のように、反射開口部3相互が重なる部位fの頂部gを切欠形成して台座部4とすることで、成形性を確保できる。   Therefore, in the configuration of FIG. 7 or the configuration of the chain double-dashed line in FIG. 1B, it is difficult to fill the thermoplastic resin material up to the top g formed between the ends of the adjacent reflection openings 3. There is a risk of so-called nest formation, and the reliability in terms of strength and light emission characteristics is lacking. On the other hand, as described above, formability can be ensured by forming the top portion g of the portion f where the reflective openings 3 overlap each other to form the pedestal portion 4.

各光半導体素子S1上の発光層に対向して形成されるアノード電極e1と、カソード電極e2は、それぞれ金属ワイヤ(金ワイヤ)5を介してインナーリード部1に電気的に接続される。全ての金属ワイヤ5はY方向である、アノード電極e1とカソード電極e2の配列方向に沿う方向に接続されている。   The anode electrode e1 and the cathode electrode e2 formed to face the light emitting layer on each optical semiconductor element S1 are electrically connected to the inner lead portion 1 via metal wires (gold wires) 5, respectively. All the metal wires 5 are connected in a direction along the arrangement direction of the anode electrode e1 and the cathode electrode e2 in the Y direction.

上記光半導体素子S1および上記反射部材2は、封止部材6を構成する透光性を有する樹脂材によって封止される。封止部材6は、たとえば(Sr,Ba)2Si4:Eu2+の組成であり、青色光を黄色光に波長変更する蛍光体を含有するシリコーン樹脂材からなる。   The optical semiconductor element S1 and the reflecting member 2 are sealed with a resin material having translucency constituting the sealing member 6. The sealing member 6 has a composition of (Sr, Ba) 2Si4: Eu2 +, for example, and is made of a silicone resin material containing a phosphor that changes the wavelength of blue light to yellow light.

上記封止部材6は、光半導体素子S1の底面を除く周面と、金属ワイヤ5と、反射部材2の反射開口部3と、隣り合う反射開口部3間に介在される台座部4を覆う。特に、反射部材2の高さ寸法が0.5mmであり、台座部4の高さ寸法が0.2mmであるから、台座部4上の封止部材6厚さ寸法は0.3mmである。   The sealing member 6 covers the peripheral surface excluding the bottom surface of the optical semiconductor element S1, the metal wire 5, the reflection opening 3 of the reflection member 2, and the pedestal 4 interposed between the adjacent reflection openings 3. . In particular, since the height dimension of the reflecting member 2 is 0.5 mm and the height dimension of the pedestal part 4 is 0.2 mm, the thickness dimension of the sealing member 6 on the pedestal part 4 is 0.3 mm.

このようにして構成される光半導体装置H1であり、実際には、光半導体素子S1は青色光を発光する。この青色光が封止部材6を構成する蛍光体入りシリコーン樹脂材を透過することで、青色光の一部が黄色光に波長変更される。反射部材2の反射開口部3はリフレクタとして機能し、封止部材6を透過する光を反射案内する。   In the optical semiconductor device H1 configured as described above, the optical semiconductor element S1 actually emits blue light. When the blue light passes through the phosphor-containing silicone resin material constituting the sealing member 6, a part of the blue light is changed in wavelength to yellow light. The reflection opening 3 of the reflection member 2 functions as a reflector, and reflects and guides light transmitted through the sealing member 6.

青色光と黄色光とが封止部材6から出た状態で、人間の視覚が擬似的に白色と認め、白色を発光する光半導体装置H1として適用される。複数(3個)の光半導体素子S1をインナーリード部1に備えて一斉に発光するから、投入電力に見合う、もしくは投入電力以上の高輝度が得られ、発光効率の向上を図れる。   In a state where blue light and yellow light are emitted from the sealing member 6, human vision is recognized as pseudo white and applied as an optical semiconductor device H <b> 1 that emits white. Since a plurality (three) of the optical semiconductor elements S1 are provided in the inner lead portion 1 to emit light all at once, high luminance corresponding to the input power or higher than the input power can be obtained, and the light emission efficiency can be improved.

複数の光半導体素子S1を備えたが、隣り合う光半導体素子S1の相互間隔を可能な限り短縮して、隣り合う反射開口部3相互が重なる部分fを備えた。したがって、光半導体装置H1として小型化を得られる。隣り合う反射開口部3の重なる部分fを切欠して台座部4としたから、必要最小限の肉厚部分が残り、反射開口部3がリフレクタとして機能することに何らの支障もない。   Although a plurality of optical semiconductor elements S1 are provided, the mutual interval between the adjacent optical semiconductor elements S1 is shortened as much as possible, and a portion f where the adjacent reflection openings 3 overlap each other is provided. Therefore, the optical semiconductor device H1 can be downsized. Since the overlapping portion f of the adjacent reflection openings 3 is cut out to form the pedestal portion 4, the minimum necessary thickness portion remains, and there is no problem in that the reflection opening 3 functions as a reflector.

この光半導体装置H1は、白色を発光する発光光源であるところから、それ単独で照明装置として用いるのに最適である。あるいは他の色の発光光源と併用して表示装置として用いるのにも最適である。   Since this optical semiconductor device H1 is a light emitting light source that emits white light, it is optimal for use alone as an illumination device. Alternatively, it is also optimal for use as a display device in combination with light emission sources of other colors.

図2は、図1で説明した第1の実施の形態での変形例であり、光半導体装置H2の平面図である。先に説明した構成部品と同一の構成部品においては、同番号を付して新たな説明を省略する。(以下、同じ)
図1で説明した光半導体装置H1は、1つの反射開口部3に対して光半導体素子S1を1個備えたが、この変形例の光半導体装置H2では、1つの反射開口部3に対して発光層の面積の小さな光半導体素子S2を2個ずつ備えている。この場合、光半導体素子S2の発光層の面積が小さいために、投入電極に対する発光効率が高い。
FIG. 2 is a plan view of the optical semiconductor device H2, which is a modification of the first embodiment described with reference to FIG. The same components as those described above are denoted by the same reference numerals and a new description is omitted. (same as below)
The optical semiconductor device H1 described with reference to FIG. 1 includes one optical semiconductor element S1 for one reflective opening 3. However, in the optical semiconductor device H2 of this modification, one optical opening for the reflective opening 3 is provided. Two optical semiconductor elements S2 each having a small area of the light emitting layer are provided. In this case, since the area of the light emitting layer of the optical semiconductor element S2 is small, the light emission efficiency with respect to the input electrode is high.

光半導体素子S2の全体数を増やしたが、2個ずつ隣り合う光半導体素子S2の相互間隔を可能な限り短縮する。そして、隣り合う反射開口部3相互が重なる部分を備えたから、光半導体装置H2として小型化を得る。隣り合う反射開口部3の重なり部分を切欠して台座部4を形成したから、必要最小限の肉厚部分を残してリフレクタとして機能する。   Although the total number of the optical semiconductor elements S2 is increased, the interval between the adjacent optical semiconductor elements S2 is reduced as much as possible. Since the adjacent reflection openings 3 overlap each other, the optical semiconductor device H2 can be downsized. Since the pedestal portion 4 is formed by cutting out the overlapping portion of the adjacent reflection openings 3, it functions as a reflector while leaving the minimum necessary thickness portion.

図3(A)は本発明における第2の実施の形態での光半導体装置H3の平面図、図3(B)は図3(A)のB−B線に沿う断面図、図3(C)は図3(A)のC−C線に沿う断面図である。   3A is a plan view of the optical semiconductor device H3 according to the second embodiment of the present invention, FIG. 3B is a cross-sectional view taken along line BB in FIG. 3A, and FIG. ) Is a cross-sectional view taken along the line CC in FIG.

インナーリード部1Aは第1の実施の形態と同一材料、同一板厚、同一の表面処理がなされているが、ここでは正方形に近い矩形状に形成される。インナーリード部1A上の所定部位には、先に説明したものと同一特性を有する複数(4個)の光半導体素子S1が実装されている。各光半導体素子S1の発光層上には、アノード電極e1とカソード電極e2が互いに離間対向して形成されている。   The inner lead portion 1A is made of the same material, the same plate thickness, and the same surface treatment as in the first embodiment, but here is formed in a rectangular shape close to a square. A plurality (four) of optical semiconductor elements S1 having the same characteristics as those described above are mounted on a predetermined portion on the inner lead portion 1A. An anode electrode e1 and a cathode electrode e2 are formed on the light emitting layer of each optical semiconductor element S1 so as to face each other.

上記光半導体素子S1は、X方向に沿って2個配置され、Y方向に沿って2個配置される。各光半導体素子S1のアノード電極e1とカソード電極e2はX方向に沿って対向している。換言すれば、それぞれの光半導体素子S1は互いに離間対向して2つの電極e1,e2を備えていて、複数の光半導体素子S1は電極e1,e2の配列方向と、電極e1,e2の配列方向とは直交する方向に配置される。   Two optical semiconductor elements S1 are arranged along the X direction and two are arranged along the Y direction. The anode electrode e1 and the cathode electrode e2 of each optical semiconductor element S1 face each other along the X direction. In other words, each optical semiconductor element S1 includes two electrodes e1 and e2 that are spaced apart from each other, and the plurality of optical semiconductor elements S1 includes the arrangement direction of the electrodes e1 and e2 and the arrangement direction of the electrodes e1 and e2. Are arranged in a direction orthogonal to each other.

そして、後述するようにX方向に沿って配置される光半導体素子S1相互の電極e2,e1を電気的に接続する金属ワイヤ5と、一方(図の左側)の光半導体素子S1の電極e1とインナーリード部1Aとを電気的に接続する金属ワイヤ5と、他方(図の右側)の光半導体素子S1の電極e2とを電気的に接続する金属ワイヤ5は全て、X方向に沿って接続されている。   As will be described later, the metal wire 5 that electrically connects the electrodes e2 and e1 between the optical semiconductor elements S1 arranged along the X direction, and the electrode e1 of one (left side in the figure) of the optical semiconductor element S1 The metal wire 5 that electrically connects the inner lead portion 1A and the metal wire 5 that electrically connects the other electrode e2 of the optical semiconductor element S1 (right side in the figure) are all connected along the X direction. ing.

上記光半導体素子S1の配置ピッチはXY方向とも1.9mmであって、インナーリード部1Aに設けられる白色樹脂材からなる反射部材2Aの反射開口部3は、光半導体素子S1の数(4個)と配置に合わせて、X方向とY方向に2×2の合計4個が設けられる。したがって、反射開口部3の中心ピッチはXY方向とも1.9mmである。   The arrangement pitch of the optical semiconductor elements S1 is 1.9 mm in both the X and Y directions, and the reflection openings 2 of the reflection member 2A made of a white resin material provided in the inner lead part 1A are the number of the optical semiconductor elements S1 (four). ) And the arrangement, a total of 4 pieces of 2 × 2 are provided in the X direction and the Y direction. Therefore, the center pitch of the reflective openings 3 is 1.9 mm in both the XY directions.

上記反射開口部3は、上面直径がφ2.0mm、底面直径がφ1.0mm、高さが0.5mmであり、底面から表面に向って直径が漸次拡大形成される略すり鉢状である。XY方向において、互いに隣り合う反射開口部3の端部相互は上面直径と配置ピッチとの関係から互いに重なる部分が生じていて、この重なる部分の頂部を切欠して台座部4が形成される。   The reflective opening 3 has a substantially mortar shape having a top surface diameter of 2.0 mm, a bottom surface diameter of 1.0 mm, and a height of 0.5 mm, and the diameter gradually increases from the bottom surface to the surface. In the XY directions, overlapping portions of the ends of the reflective openings 3 adjacent to each other are generated due to the relationship between the upper surface diameter and the arrangement pitch, and the pedestal portion 4 is formed by cutting out the top of the overlapping portions.

上記台座部4は、図3(A)で示す平面視で、Y方向の両側端部の幅寸法が最も広く、Y方向の中心軸部分が最も幅寸法が狭い、中央部が最も括れた、いわゆる双曲線状をなしていて、上述の寸法関係から、短手方向寸法0.3mm×長手方向寸法1.2mm×高さ寸法0.2mmとなっている。   In the plan view shown in FIG. 3 (A), the pedestal portion 4 has the widest width dimension at both end portions in the Y direction, the central axis portion in the Y direction has the narrowest width dimension, and the central portion is most narrowed. It has a so-called hyperbolic shape. From the above dimensional relationship, the lateral dimension is 0.3 mm, the longitudinal dimension is 1.2 mm, and the height dimension is 0.2 mm.

上記反射部材2Aは、熱可塑性樹脂材を用いてインジェクションモールド工法で成型するために、素材自体の流動性が低く、樹脂の肉厚の薄い部分の充填性が低い。しかしながら、すり鉢状の反射開口部3の端部相互が重なる部位に台座部4を切欠形成することにより、反射部材2Aの成形性を確保できる。   Since the reflecting member 2A is molded by an injection molding method using a thermoplastic resin material, the fluidity of the material itself is low, and the filling property of the thin resin portion is low. However, the moldability of the reflective member 2A can be ensured by forming the pedestal portion 4 in a portion where the ends of the mortar-shaped reflective opening 3 overlap each other.

つぎに、先に図1で説明した光半導体素子S1の配置構造と、図3で説明した光半導体素子S1の配置構造との相違にもとづく、アノード電極e1およびカソード電極e2と、インナーリード部1,1Aとの金属ワイヤ5による接続構造の相違について説明する。   Next, the anode electrode e1 and the cathode electrode e2, and the inner lead portion 1 based on the difference between the arrangement structure of the optical semiconductor element S1 described above with reference to FIG. 1 and the arrangement structure of the optical semiconductor element S1 described with reference to FIG. , 1A and the difference in the connection structure by the metal wire 5 will be described.

図4(A)は、図1で説明したように複数の光半導体素子S1を電極e1,e2の配列方向とは直交する方向に配置した場合の、金属ワイヤ5の接続構造と、インナーリード部1の構造を模式的に示す。ただし、図1(A)では3個の光半導体素子S1を示し、図4(A)では4個の光半導体素子S1を示している。   4A shows the connection structure of the metal wire 5 and the inner lead portion when a plurality of optical semiconductor elements S1 are arranged in a direction orthogonal to the arrangement direction of the electrodes e1 and e2, as described in FIG. The structure of 1 is shown typically. However, FIG. 1A shows three optical semiconductor elements S1, and FIG. 4A shows four optical semiconductor elements S1.

各光半導体素子S1のアノード電極e1が、光半導体素子S1を実装するインナーリード部1aに、金属ワイヤ5を介して電気的に接続される。上記金属ワイヤ5は、Y方向に沿って配線される。各光半導体素子S1のカソード電極e2は、上記インナーリード部1aとは電気的に独立した他方のインナーリード部1bに、金属ワイヤ5を介して電気的に接続される。上記金属ワイヤ5もY方向に沿って配線される。   The anode electrode e1 of each optical semiconductor element S1 is electrically connected through the metal wire 5 to the inner lead portion 1a on which the optical semiconductor element S1 is mounted. The metal wire 5 is wired along the Y direction. The cathode electrode e2 of each optical semiconductor element S1 is electrically connected via the metal wire 5 to the other inner lead portion 1b that is electrically independent from the inner lead portion 1a. The metal wire 5 is also wired along the Y direction.

したがって、互いのインナーリード部1a,1bは光半導体素子S1の配置方向(X方向)に沿って長い矩形状をなしているので、双方のインナーリード部1a,1bの成形と組立てが容易である。   Therefore, the inner lead portions 1a and 1b are formed in a long rectangular shape along the arrangement direction (X direction) of the optical semiconductor element S1, so that the inner lead portions 1a and 1b can be easily molded and assembled. .

一方のインナーリード部1aの長手方向(X方向)に沿う端縁と、他方のインナーリード部1bの長手方向(X方向)に沿う端縁は、インナーリード部1a,1b相互の電気的な絶縁のために互いに狭小の間隙を存しているが、この間隙は1ヶ所ですみ、インナーリード部1全体の小型化を促進する。
そして、全ての金属ワイヤ5はY方向に沿って接続するよう統一されているので、金属ワイヤ5の接続作業が迅速に行える。
The edge along the longitudinal direction (X direction) of one inner lead portion 1a and the edge along the longitudinal direction (X direction) of the other inner lead portion 1b are electrically insulated from each other. For this reason, there is a narrow gap between each other, but this gap is only required in one place, and the entire inner lead portion 1 can be reduced in size.
Since all the metal wires 5 are unified so as to be connected along the Y direction, the connection work of the metal wires 5 can be performed quickly.

図4(B)は、図3で説明したように各光半導体素子S1をX方向と、Y方向に2個ずつ配置した場合の、金属ワイヤ5の接続構造と、インナーリード部1の構造を模式的に示す。ただし、各光半導体素子S1におけるアノード電極e1とカソード電極e2は、図3ではX方向に離間対向しているが、ここではY方向に離間対向している。   FIG. 4B shows the connection structure of the metal wires 5 and the structure of the inner lead portion 1 when two optical semiconductor elements S1 are arranged in the X direction and the Y direction as described in FIG. This is shown schematically. However, the anode electrode e1 and the cathode electrode e2 in each optical semiconductor element S1 are spaced apart from each other in the X direction in FIG. 3, but here are separated from each other in the Y direction.

各光半導体素子S1におけるカソード電極e2は、光半導体素子S1を実装するインナーリード部1dに、金属ワイヤ5を介して電気的に接続される。この金属ワイヤ5はY方向に沿って接続される。また、各光半導体素子S1におけるアノード電極e1は、上記インナーリード部1dとは電気的に独立する他方のインナーリード部1cに、金属ワイヤ5を介して電気的に接続される。この金属ワイヤ5はX方向に沿って接続される。   The cathode electrode e <b> 2 in each optical semiconductor element S <b> 1 is electrically connected via the metal wire 5 to the inner lead portion 1 d on which the optical semiconductor element S <b> 1 is mounted. The metal wire 5 is connected along the Y direction. In addition, the anode electrode e1 in each optical semiconductor element S1 is electrically connected through the metal wire 5 to the other inner lead portion 1c that is electrically independent from the inner lead portion 1d. The metal wire 5 is connected along the X direction.

したがって、各インナーリード部1c,1dは、必然的に、それぞれのX方向の略中央部が一端縁からY方向の他端部近傍まで切欠された略凹字状をなし、互いに入れ子状態にして組み合わせた構造となってしまう。当然、各インナーリード部1c,1dが電気的に独立するよう、対向する端縁間に絶縁のための間隙を存して配置するが、この場合、絶縁用間隙部位が3ヶ所必要となる。   Accordingly, the inner lead portions 1c and 1d inevitably have a substantially concave shape in which a substantially central portion in the X direction is cut out from one end edge to the vicinity of the other end portion in the Y direction, and are nested in each other. It becomes a combined structure. Of course, the inner lead portions 1c and 1d are arranged with a gap for insulation between the opposing edges so that the inner lead portions 1c and 1d are electrically independent. In this case, three gap portions for insulation are required.

さらに、各インナーリード部1c,1dは、たとえばプレス加工により打ち抜き成形されるが、所定の打ち抜き幅を確保しなければならないという、成形上の制約もある。これらの条件が重なって、この構造を備えた光半導体装置は大型化を避けられない。また、金属ワイヤ5はX方向とY方向に沿って接続しなければならないので、全て同一方向に沿って接続する場合と比較して作業性が低下する。   Furthermore, each inner lead part 1c, 1d is stamped and formed by, for example, press working, but there is a molding restriction that a predetermined punching width must be ensured. Since these conditions overlap, an optical semiconductor device having this structure cannot be avoided in size. Moreover, since the metal wires 5 must be connected along the X direction and the Y direction, the workability is reduced as compared with the case where they are all connected along the same direction.

図4(C)は、図3で説明したように各光半導体素子S1をX方向と、Y方向に2個ずつ配置するとともに、図3と同様、各光半導体素子S1におけるアノード電極e1とカソード電極e2をX方向に沿って配置した場合の、金属ワイヤ5の接続構造と、インナーリード部1A構造を模式的に示している。   4C, two optical semiconductor elements S1 are arranged in the X direction and the Y direction, respectively, as described in FIG. 3, and the anode electrode e1 and the cathode in each optical semiconductor element S1 are arranged as in FIG. The connection structure of the metal wire 5 and the inner lead portion 1A structure when the electrode e2 is disposed along the X direction are schematically shown.

図の左側光半導体素子S1におけるアノード電極e1は、光半導体素子S1を実装するインナーリード部1eに、金属ワイヤ5を介して電気的に接続される。この金属ワイヤ5はX方向に沿って接続される。また、右側光半導体素子S1におけるカソード電極e2は、上記インナーリード部1eとは電気的に独立する他方のインナーリード部1fに、金属ワイヤ5を介して電気的に接続される。この金属ワイヤ5もX方向に沿って接続される。   The anode electrode e1 in the left side optical semiconductor element S1 in the drawing is electrically connected to the inner lead portion 1e on which the optical semiconductor element S1 is mounted via the metal wire 5. The metal wire 5 is connected along the X direction. Further, the cathode electrode e2 in the right optical semiconductor element S1 is electrically connected through the metal wire 5 to the other inner lead portion 1f that is electrically independent of the inner lead portion 1e. This metal wire 5 is also connected along the X direction.

左側光半導体素子S1のカソード電極e2と、右側光半導体素子S1のアノード電極e1とは、金属ワイヤ5で電気的に接続される。左右(X方向)に離間して配置される光半導体素子S1相互の電極e2,e1を金属ワイヤ5が接続するのであるから、当然、上記金属ワイヤ5はX方向に沿って接続される。なお、左右の光半導体素子S1相互間には上記台座部4(図では一点鎖線で示している)が介在していて、上記金属ワイヤ5は台座部4を越えて架設される。   The cathode electrode e2 of the left optical semiconductor element S1 and the anode electrode e1 of the right optical semiconductor element S1 are electrically connected by a metal wire 5. Since the metal wire 5 connects the electrodes e2 and e1 between the optical semiconductor elements S1 that are spaced apart from each other in the left and right (X direction), the metal wire 5 is naturally connected along the X direction. Note that the pedestal portion 4 (shown by an alternate long and short dash line in the figure) is interposed between the left and right optical semiconductor elements S1, and the metal wire 5 is installed over the pedestal portion 4.

したがって、各インナーリード部1e,1fは、先に図4(B)で説明したインナーリード部1c,1dのような複雑形状にならずに単純な矩形状ですみ、たとえばプレス加工による打ち抜き加工をなすにあたって、成形上の制約がない。絶縁用の間隙が1ヶ所ですみ、光半導体装置H3としての大型化を抑制できる。しかも、金属ワイヤ5は全てX方向に沿って接続されるので、この接続作業を迅速に行える。   Therefore, each inner lead portion 1e, 1f is not a complicated shape like the inner lead portions 1c, 1d described above with reference to FIG. 4B, but may be a simple rectangular shape, for example, stamping by press working. There are no restrictions on molding. Only one gap for insulation is required, and an increase in size as the optical semiconductor device H3 can be suppressed. Moreover, since all the metal wires 5 are connected along the X direction, this connection work can be performed quickly.

なお、図3(A)(B)と図4(C)で示す、X方向に並置される一対(2個)の光半導体素子S1における各電極e1,e2に対する金属ワイヤ5の接続作業は、以下に述べるようにして行われる。
図5(A)(B)(C)は、上記金属ワイヤ5の接続作業を順に説明する図である。
In addition, the connection operation | work of the metal wire 5 with respect to each electrode e1, e2 in a pair (two pieces) optical semiconductor element S1 juxtaposed in the X direction shown in FIG. This is done as described below.
5A, 5B, and 5C are diagrams for sequentially explaining the connection work of the metal wires 5. FIG.

図5(A)に示すように、白色樹脂材からなる反射部材2Aがインナーリード部1A上にモールド成形され、そのあとインナーリード部1A上に2個の光半導体素子S1が所定間隔を存して実装される。上記光半導体素子Sは反射部材2Aに形成される反射開口部3の中心に置いた状態となり、さらに反射開口部3相互間には台座部4が形成される。   As shown in FIG. 5A, a reflecting member 2A made of a white resin material is molded on the inner lead portion 1A, and then two optical semiconductor elements S1 are spaced on the inner lead portion 1A. Implemented. The optical semiconductor element S is placed in the center of the reflection opening 3 formed in the reflection member 2A, and a pedestal 4 is formed between the reflection openings 3.

図5(B)に示すように、図の右側光半導体素子S1のアノード電極e1上面に金バンプe11をバンプボンダにより形成する。予め金バンプを形成するのは、この右側光半導体素子S1のアノード電極e1に対してだけ行えばよい。   As shown in FIG. 5B, a gold bump e11 is formed on the upper surface of the anode electrode e1 of the right optical semiconductor element S1 by a bump bonder. The gold bumps are formed in advance only for the anode electrode e1 of the right optical semiconductor element S1.

図5(C)に示すように、はじめに、たとえば左側光半導体素子S1のアノード電極e1上に金バンプe11を形成し、この金バンプe11の上に金属ワイヤ5をボールボンディングし、さらにインナーリード部1e上にウエッジボンディングする工程となる。したがって、左側光半導体素子S1のアノード電極e1とインナーリード部1eが金属ワイヤ5を介して電気的に接続される。   As shown in FIG. 5C, first, for example, a gold bump e11 is formed on the anode electrode e1 of the left optical semiconductor element S1, a metal wire 5 is ball-bonded on the gold bump e11, and an inner lead portion is further formed. This is a step of wedge bonding on 1e. Therefore, the anode electrode e1 and the inner lead portion 1e of the left optical semiconductor element S1 are electrically connected via the metal wire 5.

つぎに、右側光半導体素子S1のカソード電極e2上に金バンプe12を形成し、この金バンプe12の上に金属ワイヤ5をボールボンディングし、さらにインナーリード部1f上にウエッジボンディングする工程となる。したがって、右側光半導体素子S1のカソード電極e2とインナーリード部1fが金属ワイヤ5を介して電気的に接続される。   Next, a gold bump e12 is formed on the cathode electrode e2 of the right optical semiconductor element S1, a metal wire 5 is ball-bonded on the gold bump e12, and wedge bonding is performed on the inner lead portion 1f. Therefore, the cathode electrode e2 of the right optical semiconductor element S1 and the inner lead portion 1f are electrically connected via the metal wire 5.

つぎに、左側光半導体素子S1のカソード電極e2と、右側半導体素子S2のアノード電極e1とを、ワイヤボンダにより金属ワイヤ5で接続する。このときのワイヤボンディングの第1工程として、左側光半導体素子S1のカソード電極e2上に金バンプe12を形成する。   Next, the cathode electrode e2 of the left side optical semiconductor element S1 and the anode electrode e1 of the right side semiconductor element S2 are connected by a metal wire 5 with a wire bonder. As a first step of wire bonding at this time, a gold bump e12 is formed on the cathode electrode e2 of the left optical semiconductor element S1.

そして、左側半導体素子S1のカソード電極e2上に形成された金バンプe12から金属ワイヤ5を繰り出しながら、右側半導体素子S1のアノード電極e1上までワイヤボンダのツールを移動する。   Then, the wire bonder tool is moved onto the anode electrode e1 of the right semiconductor element S1 while feeding the metal wire 5 from the gold bump e12 formed on the cathode electrode e2 of the left semiconductor element S1.

先に説明したように、上記右側半導体素子S1のアノード電極e1上には既に金バンプe11が形成されていて、この金バンプe11に金属ワイヤ5をボンディングしてから引っ張って切り離す。   As described above, the gold bump e11 has already been formed on the anode electrode e1 of the right semiconductor element S1, and the metal wire 5 is bonded to the gold bump e11 and then pulled and separated.

すなわち、このときの金属ワイヤ5の切り離し工程は、既にアノード電極e1上に形成された金バンプe11に金属ワイヤ5をボンディングしてから行うので、ツールのエッジでアノード電極e1の表面を傷付けることなく接続でき、信頼性の確保を得られる。   That is, the metal wire 5 separation step at this time is performed after the metal wire 5 is bonded to the gold bump e11 already formed on the anode electrode e1, so that the surface of the anode electrode e1 is not damaged by the edge of the tool. Connection is possible and reliability can be ensured.

図6(A)(B)(C)は第2の実施の形態における変形例を示す。   FIGS. 6A, 6B, and 6C show a modification of the second embodiment.

図6(A)は光半導体装置H4の平面図、図6(B)は図6(A)のB−B線に沿う縦断面図、図6(C)は図6(A)のC−C線に沿う縦断面図である。   6A is a plan view of the optical semiconductor device H4, FIG. 6B is a vertical cross-sectional view taken along line BB in FIG. 6A, and FIG. 6C is C- in FIG. 6A. It is a longitudinal cross-sectional view which follows a C line.

第2の実施の形態として説明した光半導体装置H3と同様、この光半導体装置H4においても、光半導体素子S1はインナーリード部1AにX方向とY方向に2×2の状態で配置される。各光半導体素子S1における金属ワイヤ5の接続構造は上述したものと同一であるので、ここでは新たな説明を省略する。   Similar to the optical semiconductor device H3 described as the second embodiment, also in the optical semiconductor device H4, the optical semiconductor element S1 is arranged in the inner lead portion 1A in a state of 2 × 2 in the X direction and the Y direction. Since the connection structure of the metal wires 5 in each optical semiconductor element S1 is the same as described above, a new description is omitted here.

この変形例は、光半導体素子S1の配置構成と、それにともなう反射部材2A構造が、先のものとは変化している。
すなわち、各光半導体素子S1はX方向とY方向に同一ピッチで配置されることは変りがないが、可能な限り光半導体素子S1の配置ピッチを短縮し、インナーリード部1A面積を縮小化して光半導体装置H4として小型化を促進する。
In this modification, the arrangement configuration of the optical semiconductor element S1 and the reflecting member 2A structure associated therewith are different from the previous one.
That is, the optical semiconductor elements S1 are arranged at the same pitch in the X direction and the Y direction, but the arrangement pitch of the optical semiconductor elements S1 is shortened as much as possible to reduce the area of the inner lead portion 1A. Miniaturization is promoted as the optical semiconductor device H4.

ただし、極端に光半導体素子S1相互の配置ピッチを短縮すると、反射部材2Aにおける反射開口部3相互間に形成される台座部4Aの高さ寸法を必要量だけ確保できなくなる。その結果、それぞれの光半導体素子S1が発光しても、反射開口部3の一部が欠けた状態となってリフレクタとしての機能を発揮できない。   However, if the arrangement pitch between the optical semiconductor elements S1 is extremely shortened, a necessary amount of the height of the pedestal portion 4A formed between the reflection openings 3 in the reflection member 2A cannot be secured. As a result, even if each of the optical semiconductor elements S1 emits light, a part of the reflection opening 3 is missing and the function as a reflector cannot be exhibited.

上述したように反射部材2Aの高さ寸法を0.5mmに設定し、反射開口部3は上面直径がφ2.0mm、底面直径がφ1.0mmであり、台座部4Aの高さ寸法を0.2mmに設定する。この台座部4Aの高さ寸法であれば、光半導体素子S1を発光させた状態で、反射開口部3は台座部4A部分においてもリフレクタとしての機能を保持する。   As described above, the height of the reflecting member 2A is set to 0.5 mm, the reflecting opening 3 has a top surface diameter of 2.0 mm and a bottom surface diameter of 1.0 mm, and the pedestal portion 4A has a height of 0. Set to 2 mm. With the height dimension of the pedestal portion 4A, the reflective opening 3 retains the function as a reflector even in the pedestal portion 4A in a state where the optical semiconductor element S1 emits light.

すなわち、光半導体素子S1の配置ピッチを可能な限り短縮し、互いに接近させても、台座部4Aの高さ寸法は0.2mmを確保しなければならない。すると、特に図6(A)に示すように、反射開口部3上面の接線jがX方向とY方向に隣り合う反射開口部3の接線jに互いに連なる。これら接線jの内側における反射開口部3を除く全てが、上述した台座部4Aとなって、同一高さとなる。   That is, even if the arrangement pitch of the optical semiconductor elements S1 is shortened as much as possible and brought close to each other, the height of the pedestal portion 4A must be 0.2 mm. Then, in particular, as shown in FIG. 6A, the tangent line j on the upper surface of the reflective opening 3 is connected to the tangent line j of the reflective opening 3 adjacent in the X direction and the Y direction. All except for the reflective opening 3 inside the tangent line j are the above-described pedestal portion 4A and have the same height.

したがって、光半導体素子S1の配置ピッチを可能な限り短縮し、互いに接近させた構成であっても、台座部4Aの必要高さ寸法を保持でき、反射開口部3はリフレクタとしての機能を確実に得られる。   Therefore, even if the arrangement pitch of the optical semiconductor elements S1 is shortened as much as possible and the configurations are close to each other, the required height of the pedestal portion 4A can be maintained, and the reflective opening 3 can reliably function as a reflector. can get.

なお、本発明は上述した実施の形態そのままに限定されるものではなく、実施段階ではその要旨を逸脱しない範囲で構成要素を変形して具体化できる。そして、上述した実施の形態に開示されている複数の構成要素の適宜な組合せにより種々の発明を形成できる。   Note that the present invention is not limited to the above-described embodiment as it is, and can be embodied by modifying the constituent elements without departing from the scope of the invention in the implementation stage. Various inventions can be formed by appropriately combining a plurality of constituent elements disclosed in the above-described embodiments.

本発明における第1の実施の形態に係る、光半導体装置の平面図と互いに異なる部位を切断した縦断面図。The longitudinal cross-sectional view which cut | disconnected the mutually different site | part from the top view of the optical semiconductor device based on 1st Embodiment in this invention. 同実施の形態の変形例に係る、光半導体装置の平面図。The top view of the optical semiconductor device based on the modification of the embodiment. 本発明における第2の実施の形態に係る、光半導体装置の平面図と互いに異なる部位を切断した縦断面図。The longitudinal cross-sectional view which cut | disconnected the mutually different site | part from the top view of the optical semiconductor device based on 2nd Embodiment in this invention. 同第1の実施の形態と、第2の実施の形態に係る、光半導体素子の配置構造の相違に応じたワイヤ接続構造と、インナーリード部構造を単純化して示す説明図。Explanatory drawing which simplifies and shows the wire connection structure and inner lead part structure according to the difference of the arrangement structure of the optical-semiconductor element based on the said 1st Embodiment and 2nd Embodiment. 同第2の実施の形態に係る、金属ワイヤの接続構造を順に説明する図。The figure explaining the connection structure of the metal wire based on the said 2nd Embodiment in order. 同実施の形態の変形例に係る、光半導体装置の平面図と互いに異なる部位で切断した縦断面図。The longitudinal cross-sectional view cut | disconnected in the mutually different site | part from the top view of the optical semiconductor device which concerns on the modification of the embodiment. 従来構造の、光半導体装置の一部断面図。The partial cross section figure of the optical semiconductor device of the conventional structure. 従来構造の、光半導体装置の平面図と縦断面図。The top view and longitudinal cross-sectional view of the optical semiconductor device of a conventional structure. さらに異なる従来構造の、光半導体装置の平面図と縦断面図。Furthermore, the top view and longitudinal cross-sectional view of an optical semiconductor device of another conventional structure.

符号の説明Explanation of symbols

1,1A…インナーリード部、S1,S2…光半導体素子、3…反射開口部、2,2A…反射部材、6…封止部材、4,4A…台形部、5…金属ワイヤ。   DESCRIPTION OF SYMBOLS 1,1A ... Inner lead part, S1, S2 ... Optical semiconductor element, 3 ... Reflective opening part, 2, 2A ... Reflective member, 6 ... Sealing member, 4, 4A ... Trapezoid part, 5 ... Metal wire.

Claims (7)

インナーリード部に所定間隔を存して実装される、表面に発光層を備えた複数の光半導体素子と、
上記インナーリード部に設けられ、光半導体素子周囲からテーパー状に拡大形成される複数の反射開口部を有する白色樹脂材からなる反射部材と、
この反射部材の上記反射開口部および上記光半導体素子を封止する、透光性を有する封止部材とを備え、
隣り合う反射開口部の端部相互が重ね合わさるよう上記光半導体素子相互の配置ピッチを短縮し、上記反射開口部相互の重ね合わせ部分は切欠形成された台形部としたことを特徴とする光半導体装置。
A plurality of optical semiconductor elements mounted on the inner lead portion with a predetermined interval and having a light emitting layer on the surface;
A reflective member made of a white resin material provided in the inner lead portion and having a plurality of reflective openings formed in a tapered shape from the periphery of the optical semiconductor element;
A translucent sealing member that seals the reflective opening of the reflective member and the optical semiconductor element;
An optical semiconductor characterized in that an arrangement pitch of the optical semiconductor elements is shortened so that ends of adjacent reflective openings overlap each other, and the overlapped portion between the reflective openings is a trapezoidal part formed with a notch. apparatus.
上記光半導体素子は、上記発光層に互いに離間して2つの電極を備えていて、
これら光半導体素子を上記電極の配列方向とは直交する方向に沿って配置した状態で、
光半導体素子の一方の電極は金属ワイヤを介して、光半導体素子が実装されるインナーリード部に電気的に接続され、他方の電極は金属ワイヤを介して上記インナーリード部とは電気的に独立した他方のインナーリード部に電気的に接続されることを特徴とする請求項1記載の光半導体装置。
The optical semiconductor element includes two electrodes spaced apart from each other in the light emitting layer,
In a state where these optical semiconductor elements are arranged along a direction orthogonal to the arrangement direction of the electrodes,
One electrode of the optical semiconductor element is electrically connected to the inner lead portion where the optical semiconductor element is mounted via a metal wire, and the other electrode is electrically independent of the inner lead portion via the metal wire. The optical semiconductor device according to claim 1, wherein the optical semiconductor device is electrically connected to the other inner lead portion.
上記複数の光半導体素子は、上記発光層に互いに離間して2つの電極を備えていて、
これら光半導体素子を電極の配列方向に沿って配置するとともに、電極の配列方向とは直交する方向に沿って配置した状態で、
上記電極の配列方向に沿う方向に隣り合う光半導体素子の電極相互は、金属ワイヤを介して電気的に接続され、
一方の光半導体素子における残りの電極は、金属ワイヤを介して光半導体素子を実装するインナーリード部に電気的に接続され、他方の光半導体素子における残りの電極は金属ワイヤを介して上記インナーリード部とは電気的に独立した他方のインナーリード部に電気的に接続されることを特徴とする請求項1記載の光半導体装置。
The plurality of optical semiconductor elements include two electrodes spaced apart from each other in the light emitting layer,
While arranging these optical semiconductor elements along the arrangement direction of the electrodes, and arranged along the direction orthogonal to the arrangement direction of the electrodes,
The electrodes of the optical semiconductor elements adjacent in the direction along the arrangement direction of the electrodes are electrically connected via a metal wire,
The remaining electrode in one optical semiconductor element is electrically connected to an inner lead portion for mounting the optical semiconductor element via a metal wire, and the remaining electrode in the other optical semiconductor element is connected to the inner lead via a metal wire. The optical semiconductor device according to claim 1, wherein the optical semiconductor device is electrically connected to the other inner lead portion that is electrically independent of the portion.
上記金属ワイヤは、全て、光半導体素子における電極の配列方向に沿う方向に接続されることを特徴とする請求項2および請求項3のいずれかに記載の光半導体装置。   4. The optical semiconductor device according to claim 2, wherein all of the metal wires are connected in a direction along an arrangement direction of the electrodes in the optical semiconductor element. 5. 上記インナーリード部の表面を第1の高さとし、上記台形部の頂部平坦面を第2の高さとし、上記反射部材の表面を第3の高さとしたとき、
上記電極の配列方向に沿う方向に隣り合う光半導体素子の電極相互を電気的に接続する上記金属ワイヤは、上記台形部の頂部平坦面を越えて、第2の高さと第3の高さとの間に架設されることを特徴とする請求項3記載の光半導体装置。
When the surface of the inner lead portion is a first height, the top flat surface of the trapezoidal portion is a second height, and the surface of the reflecting member is a third height,
The metal wire for electrically connecting the electrodes of the optical semiconductor elements adjacent to each other in the direction along the arrangement direction of the electrodes has a second height and a third height beyond the top flat surface of the trapezoidal portion. 4. The optical semiconductor device according to claim 3, wherein the optical semiconductor device is interposed between the optical semiconductor devices.
光源として、上記請求項1ないし請求項5のいずれかに記載の光半導体装置を備えたことを特徴とする照明装置。   An illumination device comprising the optical semiconductor device according to any one of claims 1 to 5 as a light source. 光源として、上記請求項1ないし請求項5のいずれかに記載の光半導体装置を備えたことを特徴とする表示装置。   A display device comprising the optical semiconductor device according to claim 1 as a light source.
JP2007135716A 2007-05-22 2007-05-22 Optical semiconductor device, lighting device and display device Pending JP2008294071A (en)

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