JP2008263248A - Semiconductor light emitting element mounting member and manufacturing method thereof - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a mounting member of a semiconductor light-emitting element whose effective reflection factor of light is improved more than before in a metal film functioning as an electrode layer and/or reflective layer, and to provide a method of manufacturing the same. <P>SOLUTION: Metal films 11 and 12 are formed, which are composed of Ag, Al, or alloy containing these metals, particle sizes of whose crystal grains being 0.5 μm or less, and center line average surface roughness Ra of the surface being 0.1 μm or less, on a substrate 10 at a substrate temperature of 120°C or less with a deposition rate being 1.0 nm/s or more by physical vapor deposition. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a semiconductor light emitting element mounting member for mounting a semiconductor light emitting element and a manufacturing method thereof.

A metal film functioning as an electrode layer for element mounting and / or a reflection layer for reflecting light from the element formed on the element mounting surface, reflecting surface, etc. of the base material constituting the semiconductor light emitting element mounting member In order to increase the effective light emission efficiency of the semiconductor light emitting device, it is formed of Ag, Al or the like having excellent light reflectance as a material characteristic (see, for example, Patent Documents 1 to 3).
JP-A-9-293904 (Claims 1, 2, columns 0015 to 0017, FIGS. 1 and 2) JP 2002-217456 A (columns 0013 to 0014, FIGS. 1 and 2) JP 2002-232017 (Claim 1, columns 0016 to 0021, FIG. 1)

  However, although Ag and Al are certainly excellent in light reflectivity as material properties, the metal film actually formed on the element mounting surface on the substrate, the reflecting surface, etc. is often smooth surface. There is a problem that effective high reflectivity cannot be obtained because the light is not sufficient and the light is irregularly reflected.

  In particular, in a semiconductor light emitting device with a large output such as an output of 1 W or more, which has recently been put into practical use, in order to flow a large current, the thickness of the metal film used as the electrode layer must be increased to reduce the resistance value. However, as the metal film having a larger film thickness is more likely to have unevenness on the surface, a high reflectivity cannot be obtained at present.

  Further, this reduction in the reflectance of light is particularly remarkable in light having a short wavelength of 450 nm or less in a semiconductor light emitting device for ultraviolet light emission or a semiconductor light emitting device that emits white light in combination with a phosphor. There is a problem that the effective reflectance of such short-wavelength light is significantly reduced as the surface irregularities are larger.

  SUMMARY OF THE INVENTION An object of the present invention is to provide a semiconductor light emitting element mounting member in which the effective reflectance of light in a metal film functioning as an electrode layer and / or a reflective layer is improved as compared with the conventional methods, and a method for manufacturing the same. It is in.

  The invention according to claim 1 is at least one of a base material, an electrode layer for mounting a semiconductor light emitting element, and a reflective layer for reflecting light from the semiconductor light emitting element, formed on the surface of the base material. And a metal film made of Ag, Al, or an alloy containing these metals, and the metal film is formed by physical vapor deposition under conditions of a substrate temperature of 120 ° C. or lower and a vapor deposition rate of 1.0 nm / s or higher. By forming the crystal grain of the metal or alloy constituting the metal film, the grain size in the surface direction of the metal film is 0.5 μm or less, and the center line average roughness Ra of the surface of the metal film is 0.1 μm or less. This is a semiconductor light emitting element mounting member.

  The invention according to claim 2 is at least one of a base material, an electrode layer for mounting a semiconductor light emitting element, and a reflective layer for reflecting light from the semiconductor light emitting element, formed on the surface of the base material. And a metal film made of Ag, Al, or an alloy containing these metals, and the crystal grain size of the metal film or the alloy constituting the metal film is 0.5 μm or less in the surface direction of the metal film A method for manufacturing a semiconductor light emitting device mounting member in which the center line average roughness Ra of the surface of the metal film is 0.1 μm or less, wherein the metal film is formed at a substrate temperature of 120 ° C. or less and a deposition rate of 1.0 nm / s. It is a manufacturing method of the semiconductor light emitting element mounting member characterized by forming by a physical vapor deposition method on the above conditions.

  According to the structure of Claim 1, 2, the surface of a metal film can be smoothed more than before. That is, the surface of the metal film is based on the shape of the portion of each crystal grain exposed on the surface of the metal film as the grain size of the metal or alloy crystal grain constituting the metal film is larger. There is a tendency that the unevenness of becomes large. The surface shape of the metal film is also affected by the surface shape of the base material as a base, and the unevenness of the surface of the metal film tends to increase as the surface roughness of the base material increases. And as the irregularities on the surface of the metal film become larger, the light tends to be diffusely reflected as described above, so that the reflectance tends to decrease.

  On the other hand, as described in claims 1 and 2, the metal film is formed by physical vapor deposition under conditions of a substrate temperature of 120 ° C. or lower and a vapor deposition rate of 1.0 nm / s or higher. The grain size of each crystal grain in the plane direction of the metal film is set to 0.5 μm or less, and the unevenness of the metal film surface based on the shape of the part of the individual crystal grain exposed on the surface of the metal film is made as small as possible. At the same time, by adjusting the surface shape of the base material surface, etc., if the center line average roughness Ra of the surface of the metal film is 0.1 μm or less, the surface of the metal film is smoothed more than before, and light reflection The rate can be improved.

  Therefore, according to the first and second aspects of the invention, the effective light reflectivity, particularly the short-wavelength light reflectivity of 450 nm or less, in the metal film made of Ag, Al or an alloy containing these metals. It becomes possible to improve more than before.

  FIG. 1A is a cross-sectional view showing a submount 1 as an example of an embodiment of a semiconductor light emitting element mounting member of the present invention manufactured by the manufacturing method of the present invention. FIG. 1B is a cross-sectional view showing a semiconductor light emitting device LE2 in which the semiconductor light emitting element LE1 is mounted on the submount 1.

  As can be seen from these drawings, the submount 1 of this example has the semiconductor light emitting element LE1 in a state where the flat substrate 10 is insulated from each other by providing a narrow gap at the center in the surface direction on the upper surface side in the drawing. Two metal films 11 and 12 serving both as an electrode layer for mounting and a reflection layer for reflecting light from the semiconductor light emitting element are formed.

  The two metal films 11 and 12 correspond to the two poles LE1a and LE1b of the semiconductor light emitting device LE1, respectively, and are joined to both the poles LE1a and LE1b via Au bumps BP as shown in the figure, for example. Then, the semiconductor light emitting element LE1 is flip-chip mounted on the submount 1 to constitute the semiconductor light emitting device LE2.

Among the above, the base material 10 can be formed of various insulating materials, but as described above, it reduces the thermal stress caused by the thermal history during mounting or actual use of the semiconductor light emitting element LE1. considering that, the thermal expansion coefficient is preferably set to ^{1 × 10 -6 / K~10 × 10} -6 / K as described above.
Further, considering that the base material 10 increases heat dissipation to cope with the increase in output of the semiconductor light emitting device, the thermal conductivity is preferably 80 W / mK or more as described above.

Examples of a material that can form the base material 10 satisfying both such a suitable thermal expansion coefficient and thermal conductivity include insulating ceramics such as AlN, Al ₂ O ₃ , SiC, Si ₃ N ₄ , BeO, and BN. , And insulating Si, and composite materials of these, and Al ₂ O ₃ and insulating Si are preferable in terms of cost.

However, considering heat dissipation, the thermal conductivity of the substrate 10 is preferably 120 W / mK or higher, more preferably 160 W / mK or higher, particularly 200 W / mK or higher, even in the above range. In order to achieve this, AlN or SiC is preferred.
Also considering that to minimize the difference in thermal expansion coefficient between the semiconductor light emitting element LE1, the thermal expansion coefficient of the substrate 10, particularly also in the range of the ^{4 × 10 -6 / K~7 × 10} -6 / K is preferable, and AlN or Al ₂ O ₃ is preferable in order to achieve such a thermal expansion coefficient.

Therefore, if the heat radiation function for dealing with the increase in output of the semiconductor light emitting device is given top priority, it is particularly preferable to form the base material 10 with AlN among the above, and when the heat radiation function is not so required. It is preferable to form the base material 10 with Al ₂ O ₃ or insulating Si.

  The metal films 11 and 12 constituting the submount 1 together with the base material 10 smoothen the surface more than before and improve the effective light reflectance. The surface of the metal films 11, 12 is adjusted by limiting the surface grain size of the crystal grains of the metal or alloy constituting the surface 12 to 0.5 μm or less and adjusting the surface roughness of the surface of the substrate 10. It is necessary to set the center line average roughness Ra to 0.1 μm or less.

  When the grain size of the crystal grains exceeds 0.5 μm, based on the shape of the portion of each crystal grain exposed on the surface of the metal film, for example, as shown in FIG. The irregularities on the surfaces of the metal films 11 and 12 formed on the surface become larger, the surface centerline average roughness Ra exceeds 0.1 μm, and light is likely to be irregularly reflected as indicated by solid line arrows in the figure. For this reason, the reflectance is lowered.

  On the other hand, when the crystal grain size is in the range of 0.5 μm or less as described above, for example, as shown in FIG. The surface roughness of the metal films 11 and 12 formed on the substrate 10 is made as small as possible based on the shape of the metal film 11 and 12 to smooth the surface, that is, the center line average roughness Ra of the surfaces of the metal films 11 and 12 is 0. Since it can be suppressed to 1 μm or less, the irregular reflection of light can be suppressed and the reflectance can be improved as indicated by the solid arrow in the figure.

  The center line average roughness Ra of the surfaces of the metal films 11 and 12 is 0.05 μm or less even in the above range in consideration of further smoothing the surfaces and further improving the light reflectance. It is preferable to set it to 0.03 μm or less. For this purpose, the grain size of the crystal grains is preferably 0.3 μm or less even in the above range, and particularly preferably 0.1 μm or less.

  When the metal films 11 and 12 are formed by a physical vapor deposition method such as a vacuum vapor deposition method or a sputtering method, the crystal grain size is reduced by increasing the vapor deposition rate as much as possible and lowering the substrate temperature as much as possible. be able to.

  That is, in the physical vapor deposition method, when the metal films 11 and 12 are formed with the vapor deposition rate as high as possible, as shown in FIG. 4A, the vapor deposition rate is lower than that in FIG. In the stage, a large number of metal particles M1 are generated on the surface of the base material 10, and each of them grows separately as a film growth nucleus M2 to form the metal films 11 and 12, so that individual crystal grains M3 are formed. The particle size of can be reduced.

  Also, in the physical vapor deposition method, when the metal films 11 and 12 are formed with the substrate temperature as low as possible, as shown in FIG. 5 (a), compared to the case of FIG. At this stage, the nucleus M2 grows in a state where the movement, diffusion, and coalescence of the plurality of particles M1 associated with the metal particles M1 generated on the surface of the base material 10 are indicated by solid arrows in the figure. Since the metal films 11 and 12 are formed, the grain size of each crystal grain M3 can be reduced.

Therefore, when the metal films 11 and 12 are formed by the physical vapor deposition method, the grain size of the crystal grains is the target while taking into consideration the type and surface state of the substrate 10 and the composition of the metal films 11 and 12 to be formed. Conditions such as the vapor deposition rate and the substrate temperature may be set so as to be values.
As its specific numerical value, it is necessary that the vapor deposition rate is 1.0 nm / s or more, and it is particularly preferably 1.5 nm / s or more, particularly 2.0 nm / s or more. Further, the substrate temperature needs to be 120 ° C. or lower, preferably 90 ° C. or lower, particularly preferably 60 ° C. or lower.

The grain size of the crystal grains constituting the metal films 11 and 12 is a value measured by the following method.
That is, the surface of the formed metal films 11 and 12 is photographed using a scanning electron microscope (SEM) or the like, and then the number of crystal grains reflected within a predetermined area of the photographed photo is counted. Then, the average area per crystal grain is obtained by dividing the predetermined area by the number of crystal grains, and the grain size is calculated from the average area on the assumption that the planar shape of the crystal grains is circular.

Further, the center line average roughness Ra of the surfaces of the metal films 11 and 12 is affected by the surface roughness of the base material 10 as the base as described above, and the grain size of the crystal grains is within the above range. However, if the surface roughness of the substrate 10 is large, the center line average roughness Ra may not be 0.1 μm or less.
Therefore, in order to reduce the center line average roughness Ra of the surfaces of the metal films 11 and 12 to 0.1 μm or less, it is preferable to reduce the surface roughness as much as possible by polishing the surface of the substrate 10. .
Specifically, the surface of the base material 10 on which the metal films 11 and 12 are formed is polished so that the center line average roughness Ra is 0.1 μm or less, particularly 0.05 μm or less, particularly 0.03 μm or less. Is preferred.

The center line average roughness Ra of the surfaces of the metal films 11 and 12 and the surface of the substrate 10 is determined based on the surface shape measured by various conventionally known measuring methods, as defined in Japanese Industrial Standard JIS _B0601-1994 “Definition of surface roughness. It can be obtained by the method prescribed in “Display”.

  The metal films 11 and 12 having the above properties are formed of Ag, Al, or an alloy containing these metals. Specifically, the metal films 11 and 12 are formed of any one of Ag alone, Al alone, an alloy of Ag and another metal, an alloy of Al and another metal, or an alloy of Ag, Al and another metal. .

  As the main metal for forming the metal films 11 and 12, either one or both of Ag and Al can be used. In particular, when used in combination with a semiconductor light emitting element that emits light having a short wavelength of 400 nm or less. For this, Al which is particularly excellent in the reflectivity of such short wavelength light is preferable. Further, since Al is less expensive than Ag, there is an advantage that the production cost of the submount 1 can be reduced.

  Other metals that form an alloy with Ag and / or Al include Cu, Mg, Si, Mn, Ti, which have functions of improving the strength of the metal films 11 and 12 and preventing the migration of Ag and Al. And at least one selected from the group consisting of Cr and Cr.

The content of such other metals is preferably 0.001 to 10% by weight.
When the content ratio of other metals is less than 0.001% by weight, the above-described metal films 11 and 12 are strengthened and Ag or Al migration is prevented by including the other metals and alloying them. There is a risk that the effect of damaging will not be obtained. Further, when the content exceeds 10% by weight, the content ratio of Ag and / or Al is relatively reduced, so that there is a possibility that the reflectivity of the metal films 11 and 12, particularly light with a short wavelength of 450 nm or less, may be reduced. is there.

In addition, in order to make the above-mentioned effects due to other metals more reliable, the content ratio of the other metals is preferably 0.01% by weight or more even within the above range, and particularly 0.1% by weight. % Or more is preferable.
In order to more reliably prevent a decrease in light reflectance, the content of other metals is preferably 5% by weight or less, particularly 3% by weight or less, even within the above range.
When two or more other metals are used in combination, the composition may be set so that the total content of all other metals is within the above range.

Although the light reflectivity of the metal films 11 and 12 is not particularly limited, in consideration of further improving the light emission efficiency of the semiconductor light emitting device LE2, the reflectivity of light with a wavelength of 400 nm is 70% or more, for example. Of these, 80% or more, particularly 90% or more is preferable. Reflectance of light, Japanese Industrial Standard JIS _{Z8722 -2000} - a value measured according to "color measurement method of reflected and transmitted object color".

The film thicknesses of the metal films 11 and 12 are preferably set to 0.5 to 3 μm in consideration of lowering the resistance value to cope with the increase in output of the semiconductor light emitting device LE2.
If the film thickness is less than 0.5 μm, the resistance values of the metal films 11 and 12 cannot be sufficiently lowered, and therefore there is a possibility that a large current required for a high-power semiconductor light emitting device having an output of, for example, 1 W or more cannot be passed. On the other hand, if the thickness exceeds 3 μm, the smoothness of the surfaces of the metal films 11 and 12 cannot be maintained even if the above-described method is taken, and the light reflectance may be reduced.

In consideration of sufficiently reducing the resistance value in order to cope with the increase in output of the semiconductor light emitting device LE2, the thickness of the metal films 11 and 12 is particularly preferably 0.8 μm or more even within the above range. .
In consideration of further improving the smoothness of the surfaces of the metal films 11 and 12, the film thickness is preferably 1.5 μm or less even in the above range.

  The metal films 11 and 12 may be formed directly on the surface of the substrate 10. However, considering that the adhesion force is improved to cope with the flip chip mounting, the base material 10 is made of Ti, Cr, NiCr, Ta, Cu and a compound of these metals as described above. It is preferable to form the metal films 11 and 12 in addition to the formation of the adhesion layer having excellent adhesion strength. Further, a barrier layer made of Pt, Pd, Ni, Mo, NiCr, Cu, or the like and having a function of preventing diffusion to the adhesion layer, such as Ag or Al, is provided between the adhesion layer and the metal films 11 and 12. It may be formed.

The thickness of the adhesion layer is preferably about 0.01 to 1.0 μm, and the thickness of the barrier layer is preferably about 0.01 to 1.5 μm.
Furthermore, a solder barrier layer or a solder layer for soldering the element may be laminated on the surfaces of the metal films 11 and 12.

  In order to pattern the metal films 11 and 12 and the upper and lower layers, for example, using a metal mask or a mask by photolithography, the surface of the base material 10 exposed without being covered with the mask, What is necessary is just to selectively metallize by a physical vapor deposition method etc.

The higher the adhesion and mechanical strength of the metal films 11 and 12 to the base material 10, the better as described above. For example, the die shear strength is preferably 10 MPa or more, particularly preferably 30 MPa or more. The ball shear strength in consideration of flip chip mounting is preferably 30 MPa or more, particularly 60 MPa or more.
When the semiconductor light emitting element is mounted by flip chip mounting, a semiconductor light emitting device with high brightness and high reliability can be obtained.

  The die shear strength is a value measured according to the MIL standard MIL-STD-883C METODOD 2019.4. That is, the die shear strength is obtained when a chip is mounted on the metal films 11 and 12 and the side surface of the chip is pushed in a direction parallel to the surface direction of the metal films 11 and 12 using a tool applying a tension gauge. It is assumed that the values of the tension gauge when the films 11 and 12 are peeled off from the base material 10 are used. The ball shear strength is determined when the ball is removed when the Au wire is ball-bonded on the metal films 11 and 12 and the ball of the first bonding portion is pushed to slide from the side using a special tension gauge. Of the tension gauge. The ball shear strength is a value obtained when a 30 μm Au wire is ball-bonded and the ball crushing diameter is 90 μm.

  The submount 1 of the example shown in the figure comprising the above-described parts is a region where, for example, one surface of a ceramic plate having a size corresponding to a plurality of submounts 1 is polished to a predetermined surface roughness and then becomes a submount 1. Each of the metal films 11 and 12 and the upper and lower layers thereof can be simultaneously patterned over the entire surface of the ceramic plate, and then the ceramic plate is diced to cut out the individual submounts 1.

  In the semiconductor light emitting device LE2 in the example of FIG. 1B in which the semiconductor light emitting element LE1 is mounted on the submount 1 including the above parts by flip chip mounting, the metal films 11 and 12 have excellent light reflectivity. By forming the metal films 11 and 12 with an alloy having a predetermined blending ratio, or by laminating an adhesion layer or a barrier layer therebelow, the adhesion strength, mechanical strength, and the like of the metal films 11 and 12 In addition, since it can be excellent in reliability, as described above, it is suitable for a device having a high output of 1 W or more, especially 2 W or more, particularly 5 W or more.

  Further, since the semiconductor light emitting device LE2 uses the submount 1 having a size close to the light emitting portion of the semiconductor light emitting element LE1 as described above, an inexpensive package in which the semiconductor light emitting element has been directly mounted conventionally. Can be installed as is.

FIG. 2 is a cross-sectional view showing a state in which the semiconductor light emitting device LE2 is mounted on an example of the package 3. As shown in FIG.
That is, in the illustrated example, the semiconductor light emitting device LE2 is bonded and fixed to the mounting portion 3a provided on the bottom surface of the recess 3b of the package 3 facing the opening 3c with an adhesive or the like, and then the metal films 11 and 12 are respectively attached. The wire 3 is electrically connected to a pair of lead leads 32a and 32b provided on the package 3 through the wire bonds WB and WB, and the concave portion 3b is filled with a phosphor and / or a protective resin FR, and the opening 3c. Is closed with a sealing cap or a lens LS formed of a material that can transmit light from the semiconductor light emitting element LE1, so that the semiconductor light emitting device LE2 is mounted on the package 3.

The package 3 in the example shown in the drawing includes the mounting portion 3a on the bottom surface, and a reflecting member 30 having a concave portion 30a having a shape (mortar shape) extending outward from the mounting portion 3a side toward the opening 3c side. The cylindrical body 31 is joined and integrated so as to surround the outer periphery of the reflecting member 30, and one end thereof is the opening 3 c of the recess 3 b. And the leads 32a and 32b arranged so as to pass through. The inner surface of the recess 30a is a reflecting surface 30b.
The light from the semiconductor light emitting element LE1 is reflected by the reflecting surface 30b in the direction of the opening 3c, and can be emitted more efficiently to the outside of the package 3 through the lens LS.

  As the reflecting member 30, in order to efficiently reflect the light from the semiconductor light emitting element LE1, the whole or at least the reflecting surface 30b formed of metal is used. The frame 31 is made of a resin or ceramic frame to insulate the pair of leads 32a and 32b.

The configuration of the present invention is not limited to the example of each figure described above.
For example, in the example shown in the figure, the metal films 11 and 12 are connected to the leads 32a and 32b of the package 3 by wire bonds WB, but electrode layers are provided on the back surface of the submount 1 and the mounting portion 3a of the package 3, respectively. Thus, both electrode layers may be connected by soldering or the like. In that case, the metal films 11 and 12 of the submount 1 and the electrode layer may be electrically connected through, for example, Via.

  The example shown in the figure is a submount 1, and the metal films 11 and 12 have functions of an electrode layer and a reflective layer corresponding to flip chip mounting. However, the semiconductor light emitting element mounting member of the present invention is a submount 1. However, the present invention is not limited thereto, and a package or the like on which a semiconductor light emitting element is directly mounted may be used. In that case, the electrode layer and the reflective layer of the package may be formed of a metal film having the characteristics defined in the present invention.

  When the metal film is not required to function as an electrode layer and only needs to function as a reflective layer, the film thickness is not limited to the above. The thickness of the metal film that functions only as the reflective layer may be a value smaller than the above range in consideration of further improving the smoothness of the surface.

In addition, since a metal film that functions only as a reflective layer is not required to have a strong adhesion, the metal film may have a single layer structure.
Furthermore, since a metal film that functions only as a reflective layer is not required to have mechanical strength or reliability, the metal film may be formed of Ag and / or Al alone or an alloy containing only both, not an alloy. good.
In addition, various design changes can be made without departing from the scope of the present invention.

  Below, this invention is demonstrated based on an Example and a comparative example.

Example 1:
A substrate made of aluminum nitride (AlN) having a thermal conductivity of 230 W / mK and a thermal expansion coefficient of 4.5 × 10 ⁻⁶ / ° C. and having a length of 50.8 mm, a width of 50.8 mm, and a thickness of 0.3 mm Twenty were prepared by lapping and polishing both surfaces (main surfaces) and finishing the center line average roughness Ra to 0.02 μm.

  Next, as shown in FIG. 1 (a), two pure aluminum films are formed on one main surface of each base material 10 by a vacuum vapor deposition method in a state where a narrow gap is provided at the center in the surface direction and insulated from each other. 11 and 12 were formed, and the submount 1 as a semiconductor light emitting element mounting member was manufactured. The film formation procedure is as follows. First, a 0.1 μm-thick titanium adhesion layer having the same planar shape as the pure aluminum films 11 and 12 and a 0.2 μm-thick platinum barrier layer are formed in this order. Then, pure aluminum films 11 and 12 having a thickness of 2 μm were stacked on one main surface. The deposition conditions of the pure aluminum films 11 and 12 were a substrate temperature: 50 ° C. and a deposition rate: 2.2 nm / s.

  The average grain size in the plane direction of the aluminum crystal grains constituting the formed pure aluminum films 11 and 12 was measured by the method described above. The measurement was performed on all 20 substrates, and the average value thereof was 0.05 μm. Moreover, the surface shape of the surface of the pure aluminum films 11 and 12 was measured, and the centerline average roughness Ra was calculated | required by the said method from the result. The measurement was performed on all 20 substrates, and the average value of the obtained center line average roughness Ra was calculated to be 0.027 μm.

  The light reflectance, die shear strength, and ball shear strength of the surfaces of the pure aluminum films 11 and 12 were measured by the methods described above. The measurement was performed for all 20 substrates with respect to the reflectance of light, and the average value of the measured values was obtained. The die shear strength and ball shear strength were measured for five substrates, and the average value of the measured values was obtained. As a result, the light reflectance was 95%, the die shear strength was 42 MPa, and the ball shear strength was 50 MPa.

Example 2:
Among the film forming conditions, except that the temperature of the base material was set to 80 ° C., in the same manner as in Example 1, the adhesion of titanium having a thickness of 0.1 μm on one main surface of the base material 10 made of aluminum nitride. A layer and a barrier layer made of platinum having a thickness of 0.2 μm were laminated, and pure aluminum films 11 and 12 having a thickness of 2 μm were formed to manufacture the submount 1.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was 0.20 μm. Moreover, it was 0.042 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 88%, the die shear strength was 45 MPa, and the ball shear strength was 52 MPa.

Example 3:
Of the film forming conditions, except that the temperature of the base material was set to 100 ° C., in the same manner as in Example 1, the adhesion of titanium having a thickness of 0.1 μm on one main surface of the base material 10 made of aluminum nitride. A layer and a barrier layer made of platinum having a thickness of 0.2 μm were laminated, and pure aluminum films 11 and 12 having a thickness of 2 μm were formed to manufacture the submount 1.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was 0.40 μm. Moreover, it was 0.085 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 75%, the die shear strength was 40 MPa, and the ball shear strength was 61 MPa.

Comparative Example 1:
Of the film forming conditions, except that the temperature of the base material was set to 130 ° C., in the same manner as in Example 1, the adhesion of titanium having a thickness of 0.1 μm on one main surface of the base material 10 made of aluminum nitride. A layer and a barrier layer made of platinum having a thickness of 0.2 μm were laminated, and pure aluminum films 11 and 12 having a thickness of 2 μm were formed to manufacture the submount 1.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.70 μm. Moreover, it was 0.15 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 62%, the die shear strength was 43 MPa, and the ball shear strength was 62 MPa.

Example 4:
Of the film forming conditions, except that the vapor deposition rate was 1.2 nm / s, the same procedure as in Example 1 was performed, and one main surface of the aluminum nitride base material 10 was made of titanium having a thickness of 0.1 μm. A submount 1 was manufactured by laminating an adhesion layer and a platinum barrier layer having a thickness of 0.2 μm, and then forming pure aluminum films 11 and 12 having a thickness of 2 μm.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.10 μm. Moreover, it was 0.035 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 90%, the die shear strength was 48 MPa, and the ball shear strength was 59 MPa.

Example 5:
Of the film forming conditions, except that the vapor deposition rate was set to 1.8 nm / s, in the same manner as in Example 1, the one main surface of the aluminum nitride base material 10 made of titanium having a thickness of 0.1 μm was used. A submount 1 was manufactured by laminating an adhesion layer and a platinum barrier layer having a thickness of 0.2 μm, and then forming pure aluminum films 11 and 12 having a thickness of 2 μm.

  Then, in the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.35 μm. Moreover, it was 0.08 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 78%, the die shear strength was 41 MPa, and the ball shear strength was 50 MPa.

Comparative Example 2:
Of the film forming conditions, except that the vapor deposition rate was 0.7 nm / s, the same procedure as in Example 1 was performed, and one main surface of the aluminum nitride substrate 10 was made of titanium having a thickness of 0.1 μm. A submount 1 was manufactured by laminating an adhesion layer and a platinum barrier layer having a thickness of 0.2 μm, and then forming pure aluminum films 11 and 12 having a thickness of 2 μm.

  Then, in the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was 0.60 μm. Moreover, it was 0.12 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 66%, the die shear strength was 40 MPa, and the ball shear strength was 53 MPa.

Example 6:
In the same manner as in Example 1 except that the center line average roughness Ra of both surfaces of the aluminum nitride base material 10 is 0.04 μm, a thickness of 0. A submount 1 was manufactured by laminating and forming a 1 μm titanium adhesive layer, a 0.2 μm thick platinum barrier layer, and 2 μm thick pure aluminum films 11 and 12.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was 0.07 μm. Moreover, it was 0.05 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 87%, the die shear strength was 43 MPa, and the ball shear strength was 60 MPa.

Example 7:
In the same manner as in Example 1 except that the center line average roughness Ra of both surfaces of the aluminum nitride base material 10 is 0.08 μm, a thickness of 0. A submount 1 was manufactured by laminating and forming a 1 μm titanium adhesive layer, a 0.2 μm thick platinum barrier layer, and 2 μm thick pure aluminum films 11 and 12.

  Then, in the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.11 μm. Moreover, it was 0.09 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 75%, the die shear strength was 40 MPa, and the ball shear strength was 56 MPa.

Comparative Example 3:
In the same manner as in Example 1 except that the center line average roughness Ra of both surfaces of the aluminum nitride base material 10 is 0.15 μm, a thickness of 0. A submount 1 was manufactured by laminating and forming a 1 μm titanium adhesive layer, a 0.2 μm thick platinum barrier layer, and 2 μm thick pure aluminum films 11 and 12.

  Then, in the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.15 μm. Moreover, it was 0.17 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 59%, the die shear strength was 45 MPa, and the ball shear strength was 52 MPa.

Example 8:
The substrate 10 is made of high thermal conductivity silicon carbide (SiC) having a thermal conductivity of 250 W / mK and a thermal expansion coefficient of 3.7 × 10 ⁻⁶ / ° C., and lapping is performed on both surfaces (main surfaces). In addition, one of the substrates 10 made of the high thermal conductivity silicon carbide described above was used in the same manner as in Example 1 except that the polishing was performed and the centerline average roughness Ra was finished to 0.02 μm. A submount 1 was manufactured by laminating and forming a titanium adhesion layer having a thickness of 0.1 μm, a barrier layer made of platinum having a thickness of 0.2 μm, and pure aluminum films 11 and 12 having a thickness of 2 μm on the main surface. .

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.05 μm. Moreover, it was 0.028 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 94%, the die shear strength was 40 MPa, and the ball shear strength was 53 MPa.

Example 9:
The base material 10 is made of high thermal conductivity silicon nitride (Si ₃ N ₄ ) having a thermal conductivity of 90 W / mK and a thermal expansion coefficient of 3.0 × 10 ⁻⁶ / ° C., and both surfaces (main surfaces). In the same manner as in Example 1 except that a material having been subjected to lapping and polishing and finished with a centerline average roughness Ra of 0.02 μm was used. A submount 1 is formed by laminating and forming a titanium adhesion layer having a thickness of 0.1 μm, a barrier layer made of platinum having a thickness of 0.2 μm, and pure aluminum films 11 and 12 having a thickness of 2 μm on one main surface. Manufactured.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.05 μm. Moreover, it was 0.030 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 91%, the die shear strength was 47 MPa, and the ball shear strength was 48 MPa.

Example 10:
The substrate 10 is made of electrically insulating silicon (Si) having a thermal conductivity of 140 W / mK and a thermal expansion coefficient of 3.0 × 10 ⁻⁶ / ° C., and lapping is performed on both surfaces (main surfaces) thereof. In addition, the same as in Example 1 except that a polishing process was performed and the center line average roughness Ra was finished to 0.02 μm, and one main surface of the silicon substrate 10 was used. A submount 1 was manufactured by laminating and forming a titanium adhesion layer having a thickness of 0.1 μm, a barrier layer made of platinum having a thickness of 0.2 μm, and pure aluminum films 11 and 12 having a thickness of 2 μm.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.05 μm. Moreover, it was 0.030 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 90%, the die shear strength was 48 MPa, and the ball shear strength was 52 MPa.

Example 11:
As a base material 10, a composite material in which silicon carbide (SiC) is infiltrated with 30% by volume of silicon (Si) and has a thermal conductivity of 80 W / mK and a thermal expansion coefficient of 3.0 × 10 ⁻⁶ / ° C. Example 1 except that it was made of (Si—SiC), and its both surfaces (main surface) were lapped and polished to have a center line average roughness Ra of 0.02 μm. Similarly, a titanium adhesive layer having a thickness of 0.1 μm, a platinum barrier layer having a thickness of 0.2 μm, and a pure aluminum film having a thickness of 2 μm are formed on one main surface of the base material 10 made of the composite material. 11 and 12 were stacked and formed to manufacture the submount 1.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.05 μm. Moreover, it was 0.035 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 89%, the die shear strength was 45 MPa, and the ball shear strength was 50 MPa.

Example 12:
As the base material 10, 70% by weight of the high thermal conductive silicon carbide powder used in Example 8 and 30% by weight of an aluminum-magnesium alloy powder containing 0.3% by weight of magnesium were mixed, and then cast by melting. Made of a composite material (Al—SiC) having a thermal conductivity of 180 W / mK and a thermal expansion coefficient of 8.0 × 10 ⁻⁶ / ° C. produced on the both surfaces (main surface) and lapping and polishing. In the same manner as in Example 1 except that polishing was performed and the centerline average roughness Ra was finished to 0.02 μm, on one main surface of the composite material 10, A submount 1 was manufactured by laminating and forming a titanium adhesion layer having a thickness of 0.1 μm, a barrier layer made of platinum having a thickness of 0.2 μm, and pure aluminum films 11 and 12 having a thickness of 2 μm.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.05 μm. Moreover, it was 0.032 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 92%, the die shear strength was 40 MPa, and the ball shear strength was 58 MPa.

Example 13:
The substrate 10 is made of alumina (Al ₂ O ₃ ) having a thermal conductivity of 20 W / mK and a thermal expansion coefficient of 6.5 × 10 ⁻⁶ / ° C., and lapping and polishing on both surfaces (main surfaces). The thickness of one main surface of the substrate 10 made of alumina is the same as in Example 1 except that polishing is performed and the centerline average roughness Ra is 0.02 μm. A submount 1 was manufactured by laminating and forming a 0.1 μm titanium adhesion layer, a 0.2 μm thick platinum barrier layer, and 2 μm thick pure aluminum films 11 and 12.

  In the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.05 μm. Moreover, it was 0.026 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 80%, the die shear strength was 47 MPa, and the ball shear strength was 56 MPa.

Example 14:
A base material 10 made of aluminum nitride (AlN) having a thermal conductivity of 230 W / mK and a thermal expansion coefficient of 4.5 × 10 ⁻⁶ / ° C., having a length of 50.8 mm, a width of 50.8 mm, and a thickness of 0.3 mm. 20 were prepared by lapping and polishing the both surfaces (main surface) of the substrate to finish the center line average roughness Ra to 0.02 μm.

  Next, after thinly oxidizing the entire surface of each base material 10, the thickness is 2 μm in a state in which a narrow gap is provided at the center in the surface direction and is insulated from each other directly by a vacuum deposition method. The sub-mount 1 was manufactured by forming the two pure aluminum films 11 and 12. The deposition conditions of the pure aluminum films 11 and 12 were a substrate temperature: 50 ° C. and a deposition rate: 2.2 nm / s.

  Then, in the same manner as described above, the average value of the average grain size in the plane direction of the film of the aluminum crystal grains constituting the pure aluminum films 11 and 12 was found to be 0.15 μm. Moreover, it was 0.040 micrometer when the average value of centerline average roughness Ra was calculated. The light reflectance was 88%, the die shear strength was 22 MPa, and the ball shear strength was 32 MPa.

The above results are summarized in Tables 1 and 2.

Mounting test:
As shown in FIG. 1 (b), the pure aluminum films 11 and 12 and the two poles LE1a and LE1b of the semiconductor light emitting device LE1 of the submount 1 manufactured in the above-described examples and comparative examples are bonded to Au bumps BP. The semiconductor light emitting device LE1 is flip-chip mounted on the submount 1 to form the semiconductor light emitting device LE2.

  Then, 10 semiconductor light emitting devices LE2 were prepared for each example and comparative example, and each was mounted on the package 3 shown in FIG. 2 to measure the luminous efficiency (lm / W). When the submount 1 of Example was used, all showed high luminous efficiency of 90 to 100% of luminous efficiency in Example 1 having the highest luminous efficiency. However, when the submount 1 of each comparative example was used, only a low luminous efficiency of less than 90% of the luminous efficiency in Example 1 was obtained.

  When the above prototype and test were performed on a silver film as a metal film, a cast alloy film in which 1% by weight of copper was added to silver, and a cast alloy film in which 1% by weight of silicon was added to aluminum, the same tendency was observed. The result of was obtained.

FIG. 4A is a cross-sectional view showing the structure of a submount as an example of an embodiment of the semiconductor light emitting element mounting member of the present invention, and FIG. It is sectional drawing which shows the structure of the semiconductor light-emitting device mounted by mounting. It is sectional drawing which shows the state which mounted the said semiconductor light-emitting device in the package. Figures (a) and (b) show the relationship between the size of the surface irregularities defined based on the shape of the exposed part of each crystal grain constituting the metal film and the state of irregular reflection of light. FIG. FIGS. 7A and 7B are diagrams for explaining the relationship between the deposition rate when the metal film is formed by physical vapor deposition and the size of the formed crystal grains. FIGS. 4A and 4B are diagrams for explaining the relationship between the substrate temperature when the metal film is formed by physical vapor deposition and the size of the formed crystal grains.

Explanation of symbols

1 Submount (semiconductor light emitting element mounting member)
DESCRIPTION OF SYMBOLS 10 Base material 11, 12 Metal film LE1 Semiconductor light-emitting device LE2 Semiconductor light-emitting device

Claims (2)

  Ag, Al, which functions as at least one of a base material, an electrode layer for mounting a semiconductor light emitting element, and a reflective layer for reflecting light from the semiconductor light emitting element, formed on the surface of the base material A metal film made of an alloy containing these metals, and forming the metal film by physical vapor deposition under conditions of a substrate temperature of 120 ° C. or lower and a vapor deposition rate of 1.0 nm / s or higher. Semiconductor light emission characterized in that the crystal grains of the metal or alloy constituting the metal film have a grain size in the plane direction of the metal film of 0.5 μm or less and the center line average roughness Ra of the surface of the metal film is 0.1 μm or less. Element mounting member.   Ag, Al, which functions as at least one of a base material, an electrode layer for mounting a semiconductor light emitting element, and a reflective layer for reflecting light from the semiconductor light emitting element, formed on the surface of the base material A metal film made of an alloy containing these metals, and the crystal grains of the metal or alloy constituting the metal film have a grain size in the surface direction of the metal film of 0.5 μm or less, the center of the surface of the metal film A method for manufacturing a semiconductor light-emitting element mounting member having a line average roughness Ra of 0.1 μm or less, wherein the metal film is formed by a physical vapor deposition method under conditions of a substrate temperature of 120 ° C. or lower and a vapor deposition rate of 1.0 nm / s or higher. The manufacturing method of the semiconductor light-emitting device mounting member characterized by forming by these.

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