JP2008132401A - ノズルおよび液体回収方法 - Google Patents
ノズルおよび液体回収方法 Download PDFInfo
- Publication number
- JP2008132401A JP2008132401A JP2006318491A JP2006318491A JP2008132401A JP 2008132401 A JP2008132401 A JP 2008132401A JP 2006318491 A JP2006318491 A JP 2006318491A JP 2006318491 A JP2006318491 A JP 2006318491A JP 2008132401 A JP2008132401 A JP 2008132401A
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- liquid
- outer edge
- sample
- sweeping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 58
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000011084 recovery Methods 0.000 title claims abstract description 15
- 238000010408 sweeping Methods 0.000 claims abstract description 14
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Images
Landscapes
- Coating Apparatus (AREA)
- Nozzles (AREA)
- Sampling And Sample Adjustment (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
【解決手段】ノズルの先端から押出した液体で試料表面を掃引し、掃引後の液体をノズルで吸引して回収するにあたり、前記ノズル(100)として、外縁(312)が先端方向に突き出た端面(310)と、前記端面において外縁近くまで偏心した開口(322)を有するノズルを用いる。掃引後の液体の吸引は、前記ノズルを前記開口の偏心方向とは反対方向に試料表面に沿って相対的に移動させながら行う。
【選択図】図1
Description
200 : 筒部
300 : 底部
310 : 端面
312 : 外縁
320 : 貫通孔
322 : 開口
400 : 試料
500 : 液体
Claims (3)
- 先端から押出した液体で試料表面を掃引し、掃引後の液体を吸引して回収するためのノズルであって、
外縁が先端方向に突き出た端面と、
前記端面において外縁近くまで偏心した開口
を有することを特徴とするノズル。 - ノズルの先端から押出した液体で試料表面を掃引し、掃引後の液体をノズルで吸引して回収する方法であって、
前記ノズルとして、外縁が先端方向に突き出た端面と、前記端面において外縁近くまで偏心した開口を有するノズルを用いる
ことを特徴とする液体回収方法。 - 掃引後の液体の吸引を、前記ノズルを前記開口の偏心方向とは反対方向に試料表面に沿って相対的に移動させながら行う
ことを特徴とする請求項2に記載の液体回収方法。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006318491A JP4496202B2 (ja) | 2006-11-27 | 2006-11-27 | ノズルおよび液体回収方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006318491A JP4496202B2 (ja) | 2006-11-27 | 2006-11-27 | ノズルおよび液体回収方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008132401A true JP2008132401A (ja) | 2008-06-12 |
| JP4496202B2 JP4496202B2 (ja) | 2010-07-07 |
Family
ID=39557622
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006318491A Active JP4496202B2 (ja) | 2006-11-27 | 2006-11-27 | ノズルおよび液体回収方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4496202B2 (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103008179A (zh) * | 2011-09-22 | 2013-04-03 | 富士胶片株式会社 | 涂敷装置及涂敷方法 |
| KR20170028403A (ko) | 2014-08-20 | 2017-03-13 | 가부시키가이샤 이아스 | 기판 국소의 자동 분석장치 및 분석방법 |
| JP2021522505A (ja) * | 2018-05-04 | 2021-08-30 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 処理チャンバのためのナノ粒子測定 |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02229428A (ja) * | 1988-07-11 | 1990-09-12 | Toshiba Corp | 半導体処理装置 |
| JPH05283498A (ja) * | 1991-11-12 | 1993-10-29 | Matsushita Electric Ind Co Ltd | 半導体基板表面不純物回収装置およびその使用方法 |
| JPH091024A (ja) * | 1995-06-20 | 1997-01-07 | Nec Corp | ディスペンサ装置 |
| JPH09148212A (ja) * | 1995-11-28 | 1997-06-06 | Dainippon Screen Mfg Co Ltd | 薬液吐出ノズル |
| JP2000019084A (ja) * | 1998-07-01 | 2000-01-21 | Toshiba Ceramics Co Ltd | シリコンウェーハ表面分析用液滴供給・回収装置 |
| JP2000061378A (ja) * | 1998-08-24 | 2000-02-29 | Matsushita Electric Ind Co Ltd | 溶剤吐出ノズルユニット |
| JP2001196432A (ja) * | 2000-01-07 | 2001-07-19 | Tama Kagaku Kogyo Kk | 半導体ウエハ表面の不純物測定方法及びそのための不純物回収装置 |
| US20020134406A1 (en) * | 2001-03-21 | 2002-09-26 | Samsung Electronics Co., Ltd. | Apparatus and method for collecting metallic impurity on a semiconductor wafer |
| JP2003344243A (ja) * | 2002-05-30 | 2003-12-03 | Nisso Engineering Co Ltd | ウエハ検査前処理方法及び処理装置 |
| JP2004170222A (ja) * | 2002-11-20 | 2004-06-17 | Technos:Kk | スキャン・回収兼用ノズル |
| JP2005326365A (ja) * | 2004-05-17 | 2005-11-24 | Sigma Meltec Ltd | 試験液量計測装置 |
| JP2006013234A (ja) * | 2004-06-28 | 2006-01-12 | Komatsu Electronic Metals Co Ltd | 半導体ウェーハの薬液回収方法および装置 |
| JP2007311408A (ja) * | 2006-05-16 | 2007-11-29 | Toshiba Corp | 基板処理装置及び基板処理方法 |
-
2006
- 2006-11-27 JP JP2006318491A patent/JP4496202B2/ja active Active
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02229428A (ja) * | 1988-07-11 | 1990-09-12 | Toshiba Corp | 半導体処理装置 |
| JPH05283498A (ja) * | 1991-11-12 | 1993-10-29 | Matsushita Electric Ind Co Ltd | 半導体基板表面不純物回収装置およびその使用方法 |
| JPH091024A (ja) * | 1995-06-20 | 1997-01-07 | Nec Corp | ディスペンサ装置 |
| JPH09148212A (ja) * | 1995-11-28 | 1997-06-06 | Dainippon Screen Mfg Co Ltd | 薬液吐出ノズル |
| JP2000019084A (ja) * | 1998-07-01 | 2000-01-21 | Toshiba Ceramics Co Ltd | シリコンウェーハ表面分析用液滴供給・回収装置 |
| JP2000061378A (ja) * | 1998-08-24 | 2000-02-29 | Matsushita Electric Ind Co Ltd | 溶剤吐出ノズルユニット |
| JP2001196432A (ja) * | 2000-01-07 | 2001-07-19 | Tama Kagaku Kogyo Kk | 半導体ウエハ表面の不純物測定方法及びそのための不純物回収装置 |
| US20020134406A1 (en) * | 2001-03-21 | 2002-09-26 | Samsung Electronics Co., Ltd. | Apparatus and method for collecting metallic impurity on a semiconductor wafer |
| JP2003344243A (ja) * | 2002-05-30 | 2003-12-03 | Nisso Engineering Co Ltd | ウエハ検査前処理方法及び処理装置 |
| JP2004170222A (ja) * | 2002-11-20 | 2004-06-17 | Technos:Kk | スキャン・回収兼用ノズル |
| JP2005326365A (ja) * | 2004-05-17 | 2005-11-24 | Sigma Meltec Ltd | 試験液量計測装置 |
| JP2006013234A (ja) * | 2004-06-28 | 2006-01-12 | Komatsu Electronic Metals Co Ltd | 半導体ウェーハの薬液回収方法および装置 |
| JP2007311408A (ja) * | 2006-05-16 | 2007-11-29 | Toshiba Corp | 基板処理装置及び基板処理方法 |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103008179A (zh) * | 2011-09-22 | 2013-04-03 | 富士胶片株式会社 | 涂敷装置及涂敷方法 |
| JP2013066851A (ja) * | 2011-09-22 | 2013-04-18 | Fujifilm Corp | 塗布装置及び塗布方法 |
| CN103008179B (zh) * | 2011-09-22 | 2016-08-17 | 富士胶片株式会社 | 涂敷装置及涂敷方法 |
| KR20170028403A (ko) | 2014-08-20 | 2017-03-13 | 가부시키가이샤 이아스 | 기판 국소의 자동 분석장치 및 분석방법 |
| US10151727B2 (en) | 2014-08-20 | 2018-12-11 | Ias, Inc. | Automatic localized substrate analysis device and analysis method |
| JP2021522505A (ja) * | 2018-05-04 | 2021-08-30 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 処理チャンバのためのナノ粒子測定 |
| JP7228600B2 (ja) | 2018-05-04 | 2023-02-24 | アプライド マテリアルズ インコーポレイテッド | 処理チャンバのためのナノ粒子測定 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4496202B2 (ja) | 2010-07-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5881166B2 (ja) | 基板分析用ノズル | |
| TWI529833B (zh) | 基板分析裝置及基板分析方法 | |
| CN102019248B (zh) | 摆动喷嘴单元以及具有摆动喷嘴单元的基板处理装置 | |
| EP1919626B1 (fr) | Dispositif d' extraction air/eau par collection electrostatique semi-humide et procede utilisant ce dispositif | |
| JP4897870B2 (ja) | 基板分析用ノズル及び基板分析方法 | |
| WO2004081555A1 (ja) | 質量分析システムおよび分析方法 | |
| JP4496202B2 (ja) | ノズルおよび液体回収方法 | |
| JP6418586B1 (ja) | 基板分析用ノズル及び基板分析方法 | |
| TW201813726A (zh) | 基板處理裝置 | |
| KR100930579B1 (ko) | 세정용 노즐 | |
| JP4135796B2 (ja) | スキャン・回収兼用ノズル | |
| EP2307151B1 (fr) | Procédé de décontamination particulaire de surface par extraction améliorée | |
| CN110062667B (zh) | 接触式毛刷清洁器 | |
| CN108871900A (zh) | Vpd机台中亲水性硅片表面液滴的收集装置 | |
| JP4462577B2 (ja) | ノズルシステム | |
| JP5111999B2 (ja) | 基板処理装置 | |
| CN100346736C (zh) | 用于平地面的吸尘嘴 | |
| JP2008036566A (ja) | ノズル及び塵埃物質除去装置 | |
| JP5281331B2 (ja) | 基板処理方法と基板処理装置と液滴保持治具 | |
| CN217288857U (zh) | 一种旋风分离装置 | |
| JP3156508U (ja) | ナノ粒子径測定装置 | |
| JP3019772B2 (ja) | パーティクルサンプラ用ノズル | |
| FR2983093A1 (fr) | Dispositif de collecte electrostatique de particules en suspension dans un milieu gazeux | |
| RU2379131C2 (ru) | Устройство для очистки отверстия под анкерный болт | |
| US20040023781A1 (en) | Centrifugal separator and its scraping device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20090709 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20090710 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20091111 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20091117 |
|
| RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20091117 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100222 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20100222 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100316 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20100315 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100318 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100406 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100412 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4496202 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130416 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160416 Year of fee payment: 6 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |