JP2008130551A - 透明導電性フィルムの製造方法 - Google Patents
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- JP2008130551A JP2008130551A JP2007275369A JP2007275369A JP2008130551A JP 2008130551 A JP2008130551 A JP 2008130551A JP 2007275369 A JP2007275369 A JP 2007275369A JP 2007275369 A JP2007275369 A JP 2007275369A JP 2008130551 A JP2008130551 A JP 2008130551A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
- C03C17/004—Coating the inside
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/81—Electrodes
- H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
- H10K30/821—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes comprising carbon nanotubes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
【解決手段】本発明の透明導電性フィルムの製造方法は、カーボンナノチューブを含むペーストを準備する第一段階と、前記カーボンナノチューブを含むペーストを、ガラス素子の表面に塗布する第二段階と、前記カーボンナノチューブを含むペーストを乾燥させてカーボンナノチューブを含む層を形成する第三段階と、窒素ガス又は不活性ガスの雰囲気において、前記カーボンナノチューブを含む層を有する前記ガラス素子を300℃〜500℃で加熱して室温まで下げる第四段階と、を含む。
【選択図】図1
Description
Claims (8)
- カーボンナノチューブを含むペーストを準備する第一段階と、
前記カーボンナノチューブを含むペーストを、ガラス素子の表面に塗布する第二段階と、
前記カーボンナノチューブを含むペーストを乾燥させてカーボンナノチューブを含む層を形成する第三段階と、
窒素ガス又は不活性ガスの雰囲気において、前記カーボンナノチューブを含む層を有する前記ガラス素子を300℃〜500℃で加熱して室温まで下げる第四段階と、
を含むことを特徴とする透明導電性フィルムの製造方法。 - 前記第四段階では、前記加熱の温度が320℃にされ、前記加熱の時間が20分間にされることを特徴とする、請求項1に記載の透明導電性フィルムの製造方法。
- 前記ガラス素子が平板型であり、
前記第二段階は、前記カーボンナノチューブを含むペーストを容器に入れるステップと、
重ね合わせた二枚のガラス基板を垂直に前記カーボンナノチューブを含むペーストに浸漬させるステップと、一定の速度で前記二枚のガラス基板を取り出して、前記二枚のガラス基板の間に、少量のカーボンナノチューブを含むペーストを吸着させるステップと、を含むことを特徴とする、請求項1に記載の透明導電性フィルムの製造方法。 - 前記ガラス素子がチューブ状であり、
前記第二段階は、前記ガラス素子の一端を閉じて該端部を下方に向けるように該ガラスチューブを立てるステップと、前記ガラスチューブの中にカーボンナノチューブを含むペーストを注入するステップと、前記ガラスチューブの前記閉じた端部を開けて、前記カーボンナノチューブを含むペーストの大部分を重量の作用で流出させ、少量の前記カーボンナノチューブを含むペーストを前記ガラスチューブの内壁に残留させるステップと、を含むことを特徴とする、請求項1に記載の透明導電性フィルムの製造方法。 - 前記カーボンナノチューブを含むペーストの製造方法は、
有機基質を準備する段階と、
カーボンナノチューブをジクロロエタン溶液に分散させて、カーボンナノチューブを含む溶液を形成する段階と、
前記カーボンナノチューブを含む溶液を前記有機基質に混合させて、超音波処理によって均一に分散させる段階と、
前記カーボンナノチューブを含む溶液及び前記有機基質に対してウォーターバス処理を行い、ジクロロエタン溶液を完全に蒸発させる段階と、
を含むことを特徴とする、請求項3又は4に記載の透明導電性フィルムの製造方法。 - 前記カーボンナノチューブと前記有機基質との質量比を15:1に調製することを特徴とする、請求項5に記載の透明導電性フィルムの製造方法。
- 前記有機基質の製造方法は、
80℃〜110℃でのオイルバス処理及び攪拌処理によって安定剤であるエチルセルロースを溶剤であるテルピネオールに溶解させる段階と、
可塑剤であるフタル酸ジブチルを添加して、前記オイルバス処理及び攪拌処理を10〜25時間続ける段階と、
を含むことを特徴とする、請求項5に記載の透明導電性フィルムの製造方法。 - 前記有機基質において、前記テルピネオール、前記エチルセルロース及び前記フタル酸ジブチルの含有量は、90%、5%、5%にされることを特徴とする、請求項7に記載の透明導電性フィルムの製造方法。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2006101570008A CN101192492B (zh) | 2006-11-22 | 2006-11-22 | 透明导电膜的制备方法 |
| CN200610157000.8 | 2006-11-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008130551A true JP2008130551A (ja) | 2008-06-05 |
| JP4955506B2 JP4955506B2 (ja) | 2012-06-20 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007275369A Expired - Fee Related JP4955506B2 (ja) | 2006-11-22 | 2007-10-23 | 透明導電性フィルムの製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20080118634A1 (ja) |
| JP (1) | JP4955506B2 (ja) |
| CN (1) | CN101192492B (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009231029A (ja) * | 2008-03-22 | 2009-10-08 | Konica Minolta Holdings Inc | 透明導電性フィルムの製造方法及び透明導電性フィルム |
| KR100945208B1 (ko) * | 2008-11-10 | 2010-03-03 | 한국전기연구원 | 일액형 탄소나노튜브 바인더 혼합액을 이용한 투명히터의 제조방법 그리고 그 제조방법에 의한 투명히터 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101192493B (zh) * | 2006-11-22 | 2011-02-02 | 鸿富锦精密工业(深圳)有限公司 | 阳极装置及其制造方法 |
| US8435595B2 (en) | 2009-07-15 | 2013-05-07 | Empire Technology Development, Llc | Carbon nanotube transparent films |
| CN101864561B (zh) * | 2010-06-04 | 2011-11-16 | 山东力诺新材料有限公司 | 罩玻璃管内壁减反射涂层的成形工艺 |
| FR2961625A1 (fr) | 2010-06-16 | 2011-12-23 | Arkema France | Procede de preparation de films transparents conducteurs a base de nanotubes de carbone |
| CN101880035A (zh) | 2010-06-29 | 2010-11-10 | 清华大学 | 碳纳米管结构 |
| CN101950600A (zh) * | 2010-09-29 | 2011-01-19 | 彩虹集团公司 | 一种透明介质浆料 |
| CN102319661B (zh) * | 2011-07-25 | 2013-08-21 | 云梦县德邦实业有限责任公司 | 导电膜的涂布方法 |
| WO2014053250A1 (en) * | 2012-10-02 | 2014-04-10 | Siemens Aktiengesellschaft | Glass body with infrared light reflective coating with a network of nanomaterials, method for manufacturing the glass body, heat receiver tube with the glass body, parabolic trough collector with the heat receiver tube and use of the parabolic trough collector |
| TWI608986B (zh) * | 2013-07-26 | 2017-12-21 | 東海大學 | 半導體奈米層狀結構及其製作方法 |
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2006
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2007
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| JPH10221522A (ja) * | 1997-02-07 | 1998-08-21 | Dainippon Printing Co Ltd | ブラックマトリックスの形成方法 |
| JP2000063726A (ja) * | 1998-08-19 | 2000-02-29 | Ise Electronics Corp | 導電性ペースト |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009231029A (ja) * | 2008-03-22 | 2009-10-08 | Konica Minolta Holdings Inc | 透明導電性フィルムの製造方法及び透明導電性フィルム |
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Also Published As
| Publication number | Publication date |
|---|---|
| US20080118634A1 (en) | 2008-05-22 |
| JP4955506B2 (ja) | 2012-06-20 |
| CN101192492A (zh) | 2008-06-04 |
| CN101192492B (zh) | 2010-09-29 |
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