JP2008069032A - Lead-free low melting point glass - Google Patents
Lead-free low melting point glass Download PDFInfo
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- JP2008069032A JP2008069032A JP2006248094A JP2006248094A JP2008069032A JP 2008069032 A JP2008069032 A JP 2008069032A JP 2006248094 A JP2006248094 A JP 2006248094A JP 2006248094 A JP2006248094 A JP 2006248094A JP 2008069032 A JP2008069032 A JP 2008069032A
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- 239000011521 glass Substances 0.000 title claims abstract description 84
- 238000002844 melting Methods 0.000 title claims abstract description 38
- 230000008018 melting Effects 0.000 title claims abstract description 19
- 239000000463 material Substances 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 15
- 238000000576 coating method Methods 0.000 claims description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 12
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 20
- 229910052709 silver Inorganic materials 0.000 abstract description 20
- 239000004332 silver Substances 0.000 abstract description 20
- 238000004383 yellowing Methods 0.000 abstract description 19
- 239000000758 substrate Substances 0.000 abstract description 14
- 239000012776 electronic material Substances 0.000 abstract description 5
- 238000002834 transmittance Methods 0.000 abstract description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 16
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 16
- 230000000694 effects Effects 0.000 description 10
- 239000010410 layer Substances 0.000 description 10
- 239000011787 zinc oxide Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 5
- 239000000084 colloidal system Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000007496 glass forming Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000000116 mitigating effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- -1 B 2 O 3 Inorganic materials 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 1
- 229940088601 alpha-terpineol Drugs 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- GHLITDDQOMIBFS-UHFFFAOYSA-H cerium(3+);tricarbonate Chemical compound [Ce+3].[Ce+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O GHLITDDQOMIBFS-UHFFFAOYSA-H 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- BDAGIHXWWSANSR-NJFSPNSNSA-N hydroxyformaldehyde Chemical compound O[14CH]=O BDAGIHXWWSANSR-NJFSPNSNSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2329/00—Electron emission display panels, e.g. field emission display panels
- H01J2329/86—Vessels
- H01J2329/8605—Front or back plates
- H01J2329/8615—Front or back plates characterised by the material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Glass Compositions (AREA)
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
本発明は、プラズマディスプレイパネル、液晶表示パネル、エレクトロルミネッセンスパネル、蛍光表示パネル、エレクトロクロミック表示パネル、発光ダイオード表示パネル、ガス放電式表示パネル等に代表される電子材料基板用の絶縁性被膜材料として用いられる低融点ガラスに関する。 The present invention is an insulating coating material for an electronic material substrate represented by a plasma display panel, a liquid crystal display panel, an electroluminescence panel, a fluorescent display panel, an electrochromic display panel, a light emitting diode display panel, a gas discharge display panel, and the like. The present invention relates to a low-melting glass used.
近年の電子部品の発達に伴い、プラズマディスプレイパネル、液晶表示パネル、エレクトロルミネッセンスパネル、蛍光表示パネル、エレクトロクロミック表示パネル、発光ダイオード表示パネル、ガス放電式表示パネル等、多くの種類の表示パネルが開発されている。その中でも、プラズマディスプレイパネル(以下、PDPと略す)が薄型かつ大型の平板型カラー表示装置として注目を集めている。PDPにおいては、表示面として使用される前面基板と背面基板の間に多くのセルを有し、そのセル中でプラズマ放電させることにより画像が形成される。このセルは、隔壁で区画形成されており、画像を形成する各画素での表示状態を制御するため、各画素単位に電極が形成されている。 With the recent development of electronic components, many types of display panels such as plasma display panels, liquid crystal display panels, electroluminescence panels, fluorescent display panels, electrochromic display panels, light emitting diode display panels, and gas discharge display panels have been developed. Has been. Among them, a plasma display panel (hereinafter abbreviated as PDP) is attracting attention as a thin and large flat color display device. In a PDP, a large number of cells are provided between a front substrate and a rear substrate used as a display surface, and an image is formed by performing plasma discharge in the cells. This cell is partitioned by partition walls, and an electrode is formed for each pixel unit in order to control the display state of each pixel forming an image.
このプラズマディスプレイパネルの前面ガラス板には、プラズマを放電させるための電極が形成され、電極として細い線状の銀が多く使われている。その電極の周りには、透明度の高い絶縁性被膜材料が配されている。この絶縁性被膜材料は、プラズマ耐久性に優れており、かつ透明であることが好ましい。このため、絶縁性被膜材料としては誘電体ガラスが使われていることが多い。またこの誘電体ガラスには、工程上、当然基体となるガラス板より低い融点が求められるため、低融点ガラスが使用される。 An electrode for discharging plasma is formed on the front glass plate of the plasma display panel, and thin linear silver is often used as the electrode. Around the electrode, an insulating coating material having high transparency is disposed. This insulating coating material is excellent in plasma durability and is preferably transparent. For this reason, dielectric glass is often used as the insulating coating material. The dielectric glass is naturally required to have a melting point lower than that of the glass plate serving as the substrate in the process, and therefore low-melting glass is used.
しかしながら、従来の低融点誘電体ガラスでは、450〜600℃といった低温焼成では、誘電体ガラスとバス電極の銀が反応して誘電体ガラスが黄色に着色(黄変)する現象が生じ、高透過率が得られないという大きな問題があった。 However, with conventional low melting point dielectric glass, firing at a low temperature of 450 to 600 ° C. causes a phenomenon that the dielectric glass reacts with the silver of the bus electrode and the dielectric glass is colored yellow (yellowing), resulting in high transmission. There was a big problem that the rate could not be obtained.
この黄変に関しては、ガラス成分を調整することにより解決しようとする種々の公知技術が存在する。SiO2、Al2O3等を必須成分とし、例えば、PbOとCuOの含有量を限定し、Cuによって銀の拡散を防ごうとしたプラズマディスプレイ用材料(例えば、特許文献1参照)、またCuOの他にさらにSrOを加えることで同様の効果を得、BaO+SrO+MgOの含有量を限定したプラズマディスプレイ用材料(例えば、特許文献2参照)、BaO+CaO+Bi2O3の含有量を限定したプラズマディスプレイ用材料(例えば、特許文献3参照)、SiO2、B2O3、ZnO、Bi2O3、BaO、Al2O3の含有量を限定したプラズマディスプレイ用材料(例えば、特許文献4参照)、が開示されている。
従来の絶縁性被膜材料である低融点誘電体ガラスでは、ガラスと銀電極が反応して誘電体層(ガラス)が黄色に着色(黄変)する現象が生じ、可視光透過率が低下するという問題がある。この黄変現象に対する対応は難しく、まだ市場が望むレベルまでは対応できていない。 In conventional low-melting-point dielectric glass, which is an insulating coating material, a phenomenon occurs in which the dielectric layer (glass) is colored yellow (yellowing) due to the reaction between the glass and the silver electrode, and the visible light transmittance is reduced. There's a problem. It is difficult to respond to this yellowing phenomenon, and it has not yet been able to respond to the level desired by the market.
また従来、低融点ガラスには鉛系のガラスが採用されてきた。鉛成分はガラスを低融点とするうえで重要な成分ではあるものの、人体や環境に与える弊害が大きく、近年その採用を避ける趨勢にあり、PDPを始めとする電子材料では無鉛化が検討されている。 Conventionally, lead glass has been adopted as the low melting point glass. Although the lead component is an important component for making the glass have a low melting point, it has a great detrimental effect on the human body and the environment. In recent years, there is a tendency to avoid its use. Yes.
すなわち、特開2001−52621号公報、特開2001−80934号公報、及び特開2001−48577号公報は、黄変に対してはかなりの改良が認められるが、鉛を含んでいるという基本的な問題がある。さらに、特開2003−226549号公報は、鉛を含んでおらず、黄変に対してかなりの改良が認められるが、鉛と同様に環境の見地から採用を避けられる趨勢のあるビスマスを含んでいる。 That is, Japanese Patent Application Laid-Open Nos. 2001-52621, 2001-80934, and 2001-48577 show a considerable improvement against yellowing, but basically contain lead. There is a problem. Furthermore, JP 2003-226549 A does not contain lead, and a considerable improvement against yellowing is recognized, but as well as lead, it contains bismuth which has a tendency to be avoided from an environmental standpoint. Yes.
本発明は、透明絶縁性の無鉛低融点ガラスにおいて、重量%でSiO2を5〜11、B2O3を45〜65、ZnOを20〜30、R2O(Li2O+Na2O+K2O)を10〜18、BaOを0.1〜3、ZrO2を0.1〜7、CeO2を0〜2、CoOを0〜2、CuOを0〜2含むことを特徴とするSiO2−B2O3−ZnO−R2O−BaO−ZrO2系無鉛低融点ガラスである。 The present invention is a transparent insulating lead-free low-melting glass, in which SiO 2 is 5 to 11, B 2 O 3 is 45 to 65, ZnO is 20 to 30, and R 2 O (Li 2 O + Na 2 O + K 2 O). ) from 10 to 18, 0.1 to 3 and BaO, ZrO 2 and 0.1 to 7, CeO 2 0 to 2, 0-2 and CoO, SiO 2, characterized in that it comprises a CuO 0-2 - B is a 2 O 3 -ZnO-R 2 O -BaO-ZrO 2 system lead-free low-melting-point glass.
また、B2O3/ZnOの重量比が1.5以上、3以下であることを特徴とする上記の無鉛低融点ガラスである。 The lead-free low-melting glass as described above, wherein the weight ratio of B 2 O 3 / ZnO is 1.5 or more and 3 or less.
また、重量%で、MnO2を0〜2含むことを特徴とする上記の無鉛低融点ガラスである。 Further, in weight%, which is above the lead-free low-melting glass, characterized in that it comprises a MnO 2 0 to 2.
また、重量%で、RO(MgO+CaO+SrO)を0〜10含むことを特徴とする上記の無鉛低融点ガラスである。 Moreover, it is said lead-free low melting glass characterized by containing 0-10 RO (MgO + CaO + SrO) by weight%.
また、30℃〜300℃における熱膨張係数が(65〜95)×10−7/℃、軟化点が500℃以上630℃以下である上記の無鉛低融点ガラスである。 Moreover, it is said lead-free low melting glass whose thermal expansion coefficient in 30 to 300 degreeC is (65-95) * 10 < -7 > / degreeC, and whose softening point is 500 degreeC or more and 630 degrees C or less.
さらに、上記の無鉛低融点ガラスを絶縁性被膜材料として使用している電子材料用基板である。 Furthermore, it is an electronic material substrate using the above lead-free low-melting glass as an insulating coating material.
さらにまた、上記の無鉛低融点ガラスを絶縁性被膜材料として使用しているPDP用パネルである。 Furthermore, the PDP panel uses the above lead-free low-melting glass as an insulating coating material.
従来の絶縁性被膜材料である低融点誘電体ガラスで問題となっていた、ガラスと銀電極が反応してガラスが黄色に着色(黄変)する現象を低減したガラスを得ることができる。 It is possible to obtain a glass in which a phenomenon in which the glass and the silver electrode are reacted and the glass is colored yellow (yellowing), which has been a problem with the low melting point dielectric glass which is a conventional insulating coating material, is reduced.
本発明は、透明絶縁性の無鉛低融点ガラスにおいて、重量%でSiO2を5〜11、B2O3を45〜65、ZnOを20〜30、R2O(Li2O+Na2O+K2O)を10〜18、BaOを0.1〜3、ZrO2を0.1〜7、CeO2を0〜2、CoOを0〜2、CuOを0〜2含むことを特徴とするSiO2−B2O3−ZnO−R2O−BaO−ZrO2系無鉛低融点ガラスである。 The present invention is a transparent insulating lead-free low-melting glass, in which SiO 2 is 5 to 11, B 2 O 3 is 45 to 65, ZnO is 20 to 30, and R 2 O (Li 2 O + Na 2 O + K 2 O). ) from 10 to 18, 0.1 to 3 and BaO, ZrO 2 and 0.1 to 7, CeO 2 0 to 2, 0-2 and CoO, SiO 2, characterized in that it comprises a CuO 0-2 - B is a 2 O 3 -ZnO-R 2 O -BaO-ZrO 2 system lead-free low-melting-point glass.
SiO2はガラス形成成分であり、別のガラス形成成分であるB2O3と共存させることにより、安定したガラスを形成することができるもので、5%(重量%、以下においても同様である)以上で含有させる。11%を越えると、ガラスの軟化点が上昇し、成形性、作業性が困難となる。より好ましくは、6〜10%の範囲である。 SiO 2 is a glass-forming component, and can form a stable glass by coexisting with another glass-forming component, B 2 O 3. ) The above is contained. If it exceeds 11%, the softening point of the glass will rise, making the formability and workability difficult. More preferably, it is 6 to 10% of range.
B2O3はSiO2同様のガラス形成成分であり、ガラス溶融を容易とし、ガラスの熱膨張係数において過度の上昇を抑え、かつ、焼付け時にガラスに適度の流動性を与え、SiO2とともにガラスの誘電率を低下させるものである。ガラス中に45〜65%で含有させるのが好ましい。45%未満ではガラスの流動性が不充分となり、焼結性が損なわれる。他方65%を越えるとガラスの安定性を低下させる。より好ましくは48〜60%の範囲である。 B 2 O 3 is a glass-forming component similar to SiO 2 , facilitates glass melting, suppresses an excessive increase in the thermal expansion coefficient of the glass, and imparts moderate fluidity to the glass during baking, together with SiO 2 It decreases the dielectric constant. It is preferable to make it contain in glass at 45 to 65%. If it is less than 45%, the fluidity of the glass becomes insufficient and the sinterability is impaired. On the other hand, if it exceeds 65%, the stability of the glass is lowered. More preferably, it is 48 to 60% of range.
ZnOはガラスの軟化点を下げ、熱膨張係数を適宜範囲に調整するもので、ガラス中に20〜30%の範囲で含有させるのが好ましい。20%未満では上記作用を発揮し得ず、他方30%を越えるとガラスが不安定となり失透を生じ易い。より好ましくは22〜29%の範囲である。 ZnO lowers the softening point of the glass and adjusts the thermal expansion coefficient to an appropriate range, and is preferably contained in the glass in a range of 20 to 30%. If it is less than 20%, the above-mentioned action cannot be exhibited. On the other hand, if it exceeds 30%, the glass becomes unstable and devitrification tends to occur. More preferably, it is 22 to 29% of range.
R2O(Li2O、Na2O、K2O)はガラスの軟化点を下げ、適度に流動性を与え、熱膨張係数を適宜範囲に調整するものであり、10〜18%の範囲で含有させることが好ましい。10%未満では上記作用を発揮し得ず、他方18%を越えると熱膨張係数を過度に上昇させる。より好ましくは11〜17%の範囲である。 R 2 O (Li 2 O, Na 2 O, K 2 O) lowers the softening point of glass, imparts moderate fluidity, and adjusts the thermal expansion coefficient to an appropriate range, and is in the range of 10 to 18%. It is preferable to contain. If it is less than 10%, the above-mentioned action cannot be exhibited. On the other hand, if it exceeds 18%, the thermal expansion coefficient is excessively increased. More preferably, it is 11 to 17% of range.
BaOは、はガラスに適度に流動性を与え、透明性を上げる効果があり、0.1〜3%の範囲で含有させる。3%を越えると上記作用を発揮し得ない。より好ましくは、1〜2%の範囲である。 BaO has the effect of imparting moderate fluidity to the glass and increasing the transparency, and is contained in the range of 0.1 to 3%. If it exceeds 3%, the above effect cannot be exhibited. More preferably, it is 1 to 2% of range.
ZrO2は、ガラスの耐水性を上げる効果があり、0.1〜7%の範囲で含有させる。より好ましくは、1%〜6%の範囲である。 ZrO 2 has the effect of increasing the water resistance of the glass, and is contained in the range of 0.1 to 7%. More preferably, it is in the range of 1% to 6%.
CeO2はバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、0〜2%の範囲で含有させることが好ましい。2%を越えるとガラスが着色し、透明性が低下する。より好ましくは0.1〜1%の範囲である。 CeO 2 has an effect of mitigating the reaction between the silver electrode used as the bus electrode wire and the dielectric layer, and the diffusion of silver into the dielectric layer to cause silver colloid coloration (yellowing). It is preferable to make it contain in the range of%. If it exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is 0.1 to 1% of range.
CoOはバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、0〜2%の範囲で含有させることが好ましい。2%を越えるとガラスが着色し、透明性が低下する。より好ましくは0.1〜1%の範囲である。 CoO has the effect of relaxing the silver electrode used as the bus electrode wire and the dielectric layer reacting to diffuse silver in the dielectric layer and causing silver colloid coloration (yellowing). 0-2% It is preferable to contain in the range. If it exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is 0.1 to 1% of range.
CuOはバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、0〜2%の範囲で含有させることが好ましい。2%を越えるとガラスが着色し、透明性が低下する。より好ましくは0.1〜1%の範囲である。 CuO has the effect of alleviating the silver colloid coloration (yellowing) caused by the reaction between the silver electrode used as the bus electrode wire and the dielectric layer, and the diffusion of silver into the dielectric layer, resulting in 0-2% It is preferable to contain in the range. If it exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is 0.1 to 1% of range.
MnO2はバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、0〜2%の範囲で含有させることが好ましい。2%を越えるとガラスが着色し、透明性が低下する。より好ましくは0.1〜1%の範囲である。 MnO 2 has the effect of mitigating the reaction between the silver electrode used as the bus electrode wire and the dielectric layer, and the diffusion of silver into the dielectric layer to cause the color of silver colloid (yellowing). It is preferable to make it contain in the range of%. If it exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is 0.1 to 1% of range.
CeO2、CoO、CuO、MnO2は上に述べたように同様の効果を持つため、その合計にも望ましい範囲があり、それは3%以下である。3%を越えるとガラスが着色し、透明性が低下する。より好ましくは0.3〜2%の範囲である。 Since CeO 2 , CoO, CuO, and MnO 2 have the same effect as described above, there is a desirable range in the total, which is 3% or less. If it exceeds 3%, the glass is colored and the transparency is lowered. More preferably, it is 0.3 to 2% of range.
RO(MgO+CaO+SrO)はガラスに適度に流動性を与え、熱膨張係数を適宜範囲に調整するもので、0〜10%の範囲で含有させる。10%を越えると熱膨張係数が過度に上昇する。より好ましくは、0〜6%の範囲である。 RO (MgO + CaO + SrO) imparts moderate fluidity to glass and adjusts the thermal expansion coefficient to an appropriate range, and is contained in the range of 0 to 10%. If it exceeds 10%, the thermal expansion coefficient excessively increases. More preferably, it is 0 to 6% of range.
B2O3/ZnOの重量比が1.5以上3以下である上記の無鉛低融点ガラスである。1.5未満であると黄変の発現が顕著になり、3を越えると安定性が劣化する。より好ましくは、1.8〜2.5の範囲である。 The lead-free low-melting glass having a weight ratio of B 2 O 3 / ZnO of 1.5 or more and 3 or less. If the ratio is less than 1.5, yellowing becomes remarkable, and if it exceeds 3, the stability deteriorates. More preferably, it is in the range of 1.8 to 2.5.
この他にも、一般的な酸化物で表すIn2O3、TiO2、SnO2、TeO2などを加えてもよい。 In addition, In 2 O 3 , TiO 2 , SnO 2 , TeO 2 or the like represented by a general oxide may be added.
実質的にPbOを含まないことにより、人体や環境に与える影響を皆無とすることができる。ここで、実質的にPbOを含まないとは、PbOがガラス原料中に不純物として混入する程度の量を意味する。例えば、低融点ガラス中における0.3wt%以下の範囲であれば、先述した弊害、すなわち人体、環境に対する影響、絶縁特性等に与える影響は殆どなく、実質的にPbOの影響を受けないことになる。 By substantially not containing PbO, it is possible to eliminate the influence on the human body and the environment. Here, “substantially free of PbO” means an amount of PbO mixed as an impurity in the glass raw material. For example, if it is in the range of 0.3 wt% or less in the low-melting glass, there is almost no influence on the adverse effects described above, that is, the influence on the human body and the environment, the insulation characteristics, etc., and it is not substantially affected by PbO. Become.
30℃〜300℃における熱膨張係数が(65〜95)×10−7/℃、軟化点が500℃以上630℃以下である上記の無鉛低融点ガラスである。熱膨張係数が(65〜95)×10−7/℃を外れると厚膜形成時に被膜の剥離、基板の反り等の問題が発生する。好ましくは、(75〜85)×10−7/℃の範囲である。また、軟化点が630℃を越えると基板の軟化変形などの問題が発生する。好ましくは、500℃以上590℃以下である。 The above lead-free low melting point glass having a thermal expansion coefficient of (65 to 95) × 10 −7 / ° C. at 30 ° C. to 300 ° C. and a softening point of 500 ° C. or more and 630 ° C. or less. When the thermal expansion coefficient is outside (65 to 95) × 10 −7 / ° C., problems such as peeling of the coating film and warping of the substrate occur when the thick film is formed. Preferably, it is in the range of (75 to 85) × 10 −7 / ° C. If the softening point exceeds 630 ° C., problems such as softening deformation of the substrate occur. Preferably, it is 500 degreeC or more and 590 degrees C or less.
さらにまた、上記の低融点ガラスを絶縁性被膜材料として使用している電子材料用基板である。上述の低融点ガラスを使うことにより、黄変が抑制された電子材料用基板とすることができる。 Furthermore, the present invention is an electronic material substrate using the above-described low-melting glass as an insulating coating material. By using the low-melting glass described above, a substrate for electronic material in which yellowing is suppressed can be obtained.
さらにまた、上記の低融点ガラスを絶縁性被膜材料として使用しているPDP用パネルである。上述の低融点ガラスを使うことにより、黄変が抑制されたPDP用パネルとすることができる。 Furthermore, the present invention is a PDP panel using the low melting point glass as an insulating coating material. By using the low melting point glass described above, a PDP panel in which yellowing is suppressed can be obtained.
本発明は銀との反応による黄変現象に対応する低融点ガラスの開示であり、その対象を銀電極に限定しているわけではない。 The present invention is a disclosure of a low-melting glass corresponding to the yellowing phenomenon caused by reaction with silver, and the object is not limited to a silver electrode.
ガラス基板としては透明なガラス基板、特にソーダ石灰シリカ系ガラス、または、それに類似するガラス(高歪点ガラス)、あるいは、アルカリ分の少ない(又は殆ど無い)アルミノ石灰ホウ珪酸系ガラスが多用されている。 As the glass substrate, a transparent glass substrate, particularly soda-lime-silica glass, glass similar to the glass (high strain point glass), or alumino-lime borosilicate glass with little (or almost no) alkali is often used. Yes.
以下、実施例に基づき、説明する。 Hereinafter, a description will be given based on examples.
(低融点ガラス混合ペーストの作製)
SiO2源として微粉珪砂を、B2O3源としてほう酸を、ZnO源として亜鉛華を、Li2O源として炭酸リチウムを、Na2O源として炭酸ナトリウムを、K2O源として炭酸カリウムを、CeO2として炭酸セリウムを、CoOとして酸化コバルトを、CuO源として酸化第二銅を、MnO2源として二酸化マンガンを、MgO源として炭酸マグネシウムを、CaO源として炭酸カルシウムを、SrO源として炭酸ストロンチウムを、BaO源として炭酸バリウムを要した。これらを所望の低融点ガラス組成となるべく調合したうえで、白金ルツボに投入し、電気加熱炉内で1000〜1300℃、1〜2時間で加熱溶融して表1の実施例1〜4、表2の比較例1〜4に示す組成のガラスを得た。
(Production of low melting point glass mixed paste)
The fine silica sand as a SiO 2 source, a boric acid as a B 2 O 3 source, a zinc oxide as a ZnO source, lithium carbonate as Li 2 O source, sodium carbonate as Na 2 O source, potassium carbonate as K 2 O source , strontium carbonate and cerium carbonate as CeO 2, the cobalt oxide as CoO, cupric oxide as a CuO source, manganese dioxide as 2 source MnO, a magnesium carbonate as MgO source, the calcium carbonate as a CaO source, as SrO source Required barium carbonate as a BaO source. After preparing these as a desired low melting-point glass composition, it puts into a platinum crucible, heat-melts in 1000-1300 degreeC for 1-2 hours in an electric heating furnace, Examples 1-4 of Table 1, Table 1 The glass of the composition shown in 2 comparative examples 1-4 was obtained.
次いで、αテルピネオールとブチルカルビトールアセテートからなるペーストオイルにバインダーとしてのエチルセルロースと上記ガラス粉を混合し、粘度、300±50ポイズ程度のペーストを調製した。 Next, paste oil composed of α-terpineol and butyl carbitol acetate was mixed with ethyl cellulose as a binder and the above glass powder to prepare a paste having a viscosity of about 300 ± 50 poise.
(絶縁性被膜の形成)
厚み2〜3mm、サイズ100mm角のソーダ石灰系ガラス基板に、焼付け後の膜厚が約30μmとなるべく勘案して、アプリケーターを用いて前記ペーストを塗布し、塗布層を形成した。 次いで、乾燥後、630℃以下で10〜60分間焼成することにより、クリアな誘電体層を形成させた。
(Formation of insulating coating)
The paste was applied using an applicator to a soda-lime glass substrate having a thickness of 2 to 3 mm and a size of 100 mm square so that the film thickness after baking was about 30 μm to form a coating layer. Next, after drying, a clear dielectric layer was formed by firing at 630 ° C. or lower for 10 to 60 minutes.
得られた試料について、肉眼および顕微鏡により観察し、従来よりも黄変現象が格段に抑制されたと判断できたものについては○を、それ以外については×とした。 The obtained sample was observed with the naked eye and a microscope, and it was judged that the yellowing phenomenon was markedly suppressed as compared with the conventional sample, and the others were marked with x.
なお、軟化点は、リトルトン粘度計を用い、粘度係数η=107.6 に達したときの温度とした。また、熱膨張係数は、熱膨張計を用い、5℃/分で昇温したときの30〜300℃での伸び量から求めた。 The softening point was the temperature when the viscosity coefficient η = 10 7.6 was reached using a Littleton viscometer. Moreover, the thermal expansion coefficient was calculated | required from the amount of elongation at 30-300 degreeC when it heated up at 5 degree-C / min using the thermal dilatometer.
(結果)
低融点ガラス組成および、各種試験結果を表に示す。
(result)
The low melting point glass composition and various test results are shown in the table.
表1における実施例1〜4に示すように、本発明の組成範囲内においては、黄変の発現が従来と比べて格段に抑制されていた。 As shown in Examples 1 to 4 in Table 1, within the composition range of the present invention, the occurrence of yellowing was significantly suppressed as compared with the conventional one.
他方、本発明の組成範囲を外れる表2における比較例1〜4は、従来と同様、黄変の発現が顕著である、或いは、好ましい物性値を示さず、PDP等の基板被覆用低融点ガラスとして適用し得ない。 On the other hand, Comparative Examples 1 to 4 in Table 2 outside the composition range of the present invention, as in the prior art, show significant yellowing, or do not exhibit desirable physical properties, and have a low melting point glass for substrate coating such as PDP. As inapplicable.
Claims (7)
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| JP2006248094A JP2008069032A (en) | 2006-09-13 | 2006-09-13 | Lead-free low melting point glass |
| PCT/JP2007/067296 WO2008032622A1 (en) | 2006-09-13 | 2007-09-05 | Lead-free low-melting-point glass |
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| JP2995728B2 (en) * | 1996-04-12 | 1999-12-27 | 日本電気硝子株式会社 | Low dielectric constant glass composition |
| JPH10297937A (en) * | 1997-04-25 | 1998-11-10 | Kyocera Corp | Composition for partition wall of plasma display panel and partition wall for plasma display panel using the same |
| JP4324965B2 (en) * | 2003-03-24 | 2009-09-02 | 日本電気硝子株式会社 | Insulation material for display tube |
| JP2004002199A (en) * | 2003-07-16 | 2004-01-08 | Asahi Glass Co Ltd | Electrode coating glass and plasma display panel |
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