JP2008069033A - Lead-free low melting point glass - Google Patents
Lead-free low melting point glass Download PDFInfo
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- JP2008069033A JP2008069033A JP2006248095A JP2006248095A JP2008069033A JP 2008069033 A JP2008069033 A JP 2008069033A JP 2006248095 A JP2006248095 A JP 2006248095A JP 2006248095 A JP2006248095 A JP 2006248095A JP 2008069033 A JP2008069033 A JP 2008069033A
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- 239000011521 glass Substances 0.000 title claims abstract description 83
- 238000002844 melting Methods 0.000 title claims abstract description 33
- 230000008018 melting Effects 0.000 title claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 239000012776 electronic material Substances 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims description 15
- 238000000576 coating method Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 7
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 5
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 5
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 26
- 229910052709 silver Inorganic materials 0.000 abstract description 26
- 239000004332 silver Substances 0.000 abstract description 26
- 238000004383 yellowing Methods 0.000 abstract description 19
- 230000000694 effects Effects 0.000 description 10
- 239000000084 colloidal system Substances 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000007496 glass forming Methods 0.000 description 3
- 230000000116 mitigating effect Effects 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000002040 relaxant effect Effects 0.000 description 2
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 1
- 229940088601 alpha-terpineol Drugs 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/122—Silica-free oxide glass compositions containing oxides of As, Sb, Bi, Mo, W, V, Te as glass formers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
- C03C3/15—Silica-free oxide glass compositions containing boron containing rare earths
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Glass Compositions (AREA)
Abstract
Description
本発明は、プラズマディスプレイパネル、液晶表示パネル、エレクトロルミネッセンスパネル、蛍光表示パネル、エレクトロクロミック表示パネル、発光ダイオード表示パネル、ガス放電式表示パネル等に代表される電子材料基板用の絶縁性被膜材料として用いられる低融点ガラスに関する。 The present invention is an insulating coating material for an electronic material substrate typified by a plasma display panel, a liquid crystal display panel, an electroluminescence panel, a fluorescent display panel, an electrochromic display panel, a light emitting diode display panel, a gas discharge display panel, etc. The present invention relates to a low-melting glass used.
近年の電子部品の発達に伴い、プラズマディスプレイパネル、液晶表示パネル、エレクトロルミネッセンスパネル、蛍光表示パネル、エレクトロクロミック表示パネル、発光ダイオード表示パネル、ガス放電式表示パネル等、多くの種類の表示パネルが開発されている。その中でも、プラズマディスプレイパネル(以下、PDPと略す)が薄型かつ大型の平板型カラー表示装置として注目を集めている。PDPにおいては、表示面として使用される前面基板と背面基板の間に多くのセルを有し、そのセル中でプラズマ放電させることにより画像が形成される。このセルは、隔壁で区画形成されており、画像を形成する各画素での表示状態を制御するため、各画素単位に電極が形成されている。 With the recent development of electronic components, many types of display panels such as plasma display panels, liquid crystal display panels, electroluminescence panels, fluorescent display panels, electrochromic display panels, light emitting diode display panels, and gas discharge display panels have been developed. Has been. Among them, a plasma display panel (hereinafter abbreviated as PDP) is attracting attention as a thin and large flat color display device. In a PDP, a large number of cells are provided between a front substrate and a rear substrate used as a display surface, and an image is formed by performing plasma discharge in the cells. This cell is partitioned by partition walls, and an electrode is formed for each pixel unit in order to control the display state of each pixel forming an image.
このプラズマディスプレイパネルの前面ガラス板には、プラズマを放電させるための電極が形成され、電極として細い線状の銀が多く使われている。その電極の周りには、透明度の高い絶縁性被膜材料が配されている。この絶縁性被膜材料は、プラズマ耐久性に優れており、かつ透明であることが好ましい。このため、絶縁性被膜材料としては誘電体ガラスが使われていることが多い。またこの誘電体ガラスには、工程上、当然基体となるガラス板より低い融点が求められるため、低融点ガラスが使用される。 An electrode for discharging plasma is formed on the front glass plate of the plasma display panel, and thin linear silver is often used as the electrode. Around the electrode, an insulating coating material having high transparency is disposed. This insulating coating material is excellent in plasma durability and is preferably transparent. For this reason, dielectric glass is often used as the insulating coating material. The dielectric glass is naturally required to have a melting point lower than that of the glass plate serving as the substrate in the process, and therefore low-melting glass is used.
しかしながら、従来の低融点誘電体ガラスでは、450〜600℃といった低温焼成では、誘電体ガラスとバス電極の銀が反応して誘電体ガラスが黄色に着色(黄変)する現象が生じ、高透過率が得られないという大きな問題があった。 However, with conventional low melting point dielectric glass, firing at a low temperature of 450 to 600 ° C. causes a phenomenon that the dielectric glass reacts with the silver of the bus electrode and the dielectric glass is colored yellow (yellowing), resulting in high transmission. There was a big problem that the rate could not be obtained.
この黄変に関しては、ガラス成分を調整することにより解決しようとする種々の公知技術が存在する。SiO2、Al2O3等を必須成分とし、例えば、PbOとCuOの含有量を限定し、Cuによって銀の拡散を防ごうとしたプラズマディスプレイ用材料(例えば、特許文献1参照)、またCuOの他にさらにSrOを加えることで同様の効果を得、BaO+SrO+MgOの含有量を限定したプラズマディスプレイ用材料(例えば、特許文献2参照)、BaO+CaO+Bi2O3の含有量を限定したプラズマディスプレイ用材料(例えば、特許文献3参照)が開示されている。
従来の絶縁性被膜材料である低融点誘電体ガラスでは、ガラスと銀電極が反応して誘電体層(ガラス)が黄色に着色(黄変)する現象が生じ、可視光透過率が低下するという問題がある。この黄変現象に対する対応は難しく、まだ市場が望むレベルまでは対応できていない。 In conventional low-melting-point dielectric glass, which is an insulating coating material, a phenomenon occurs in which the dielectric layer (glass) is colored yellow (yellowing) due to the reaction between the glass and the silver electrode, and the visible light transmittance is reduced. There's a problem. It is difficult to respond to this yellowing phenomenon, and it has not yet been able to respond to the level desired by the market.
また従来、低融点ガラスには鉛系のガラスが採用されてきた。鉛成分はガラスを低融点とするうえで重要な成分ではあるものの、人体や環境に与える弊害が大きく、近年その採用を避ける趨勢にあり、PDPを始めとする電子材料では無鉛化が検討されている。 Conventionally, lead glass has been adopted as the low melting point glass. Although the lead component is an important component for making the glass have a low melting point, it has a great detrimental effect on the human body and the environment. In recent years, there is a tendency to avoid its use. Yes.
すなわち、特開2001−52621号公報、特開2001−80934号公報、及び特開2001−48577号公報は、黄変に対してはかなりの改良が認められるが、鉛を含んでいるという基本的な問題がある。 That is, Japanese Patent Application Laid-Open Nos. 2001-52621, 2001-80934, and 2001-48577 show a considerable improvement against yellowing, but basically contain lead. There is a problem.
本発明は、透明絶縁性の無鉛低融点ガラスにおいて、重量%でSiO2を0〜7、B2O3を10〜20、ZnOを7〜20、Bi2O3を60〜78、BaOを0〜10、R2O(Li2O+Na2O+K2O)を0〜10、RO(MgO+CaO+SrO)を0〜10、Al2O3を0〜8、CuOを0〜2、La2O3を0〜3、CeO2を0〜2、CoOを0〜1、MnO2を0〜1、TiO2を0〜5含むことを特徴とするB2O3−ZnO−Bi2O3系無鉛低融点ガラスである。 The present invention is a transparent insulating lead-free low-melting glass, in which the SiO 2 is 0 to 7, the B 2 O 3 is 10 to 20, the ZnO is 7 to 20, the Bi 2 O 3 is 60 to 78, and the BaO is by weight%. 0~10, R 2 O (Li 2 O + Na 2 O + K 2 O) of 0~10, RO (MgO + CaO + SrO) of 0, Al 2 O 3 0-8, 0-2 and CuO, the La 2 O 3 0 to 3, CeO 2 0 to 2, CoO 0 to 1, MnO 2 0 to 1, TiO 2 0 to 5 B 2 O 3 —ZnO—Bi 2 O 3 based lead-free low It is a melting point glass.
また、30℃〜300℃における熱膨張係数が(65〜100)×10−7/℃、軟化点が450℃以上550℃以下である上記の無鉛低融点ガラスである。 Moreover, it is said lead-free low melting glass whose thermal expansion coefficient in 30 degreeC-300 degreeC is (65-100) x10 < -7 > / degreeC, and a softening point is 450 degreeC or more and 550 degrees C or less.
さらに、上記の無鉛低融点ガラスを絶縁性被膜材料として使用している電子材料用基板である。 Furthermore, it is an electronic material substrate using the above lead-free low-melting glass as an insulating coating material.
さらにまた、上記の無鉛低融点ガラスを絶縁性被膜材料として使用しているPDP用パネルである。 Furthermore, the PDP panel uses the above lead-free low-melting glass as an insulating coating material.
従来の絶縁性被膜材料である低融点誘電体ガラスで問題となっていた、ガラスと銀電極が反応してガラスが黄色に着色(黄変)する現象を低減したガラスを得ることができる。 It is possible to obtain a glass in which a phenomenon in which the glass and the silver electrode are reacted and the glass is colored yellow (yellowing), which has been a problem with the low melting point dielectric glass which is a conventional insulating coating material, is reduced.
本発明は、透明絶縁性の無鉛低融点ガラスにおいて、重量%でSiO2を0〜7、B2O3を10〜20、ZnOを7〜20、Bi2O3を60〜78、BaOを0〜10、R2O(Li2O+Na2O+K2O)を0〜10、RO(MgO+CaO+SrO)を0〜10、Al2O3を0〜8、CuOを0〜2、La2O3を0〜3、CeO2を0〜2、CoOを0〜1、MnO2を0〜1、TiO2を0〜5含むことを特徴とするB2O3−ZnO−Bi2O3系無鉛低融点ガラスである。 The present invention is a transparent insulating lead-free low-melting glass, in which the SiO 2 is 0 to 7, the B 2 O 3 is 10 to 20, the ZnO is 7 to 20, the Bi 2 O 3 is 60 to 78, and the BaO is by weight%. 0~10, R 2 O (Li 2 O + Na 2 O + K 2 O) of 0~10, RO (MgO + CaO + SrO) of 0, Al 2 O 3 0-8, 0-2 and CuO, the La 2 O 3 0 to 3, CeO 2 0 to 2, CoO 0 to 1, MnO 2 0 to 1, TiO 2 0 to 5 B 2 O 3 —ZnO—Bi 2 O 3 based lead-free low It is a melting point glass.
SiO2はガラス形成成分であり、安定したガラスを形成することができるもので、0〜7%(重量%、以下においても同様である)で含有させる。7%を越えると、ガラスの軟化点が上昇し、成形性、作業性が困難となる。より好ましくは、2〜5%の範囲である。 SiO 2 is a glass forming component and can form a stable glass, and is contained in an amount of 0 to 7% (% by weight, the same applies hereinafter). If it exceeds 7%, the softening point of the glass will increase, making the formability and workability difficult. More preferably, it is 2 to 5% of range.
B2O3はSiO2同様のガラス形成成分であり、ガラス溶融を容易とし、ガラスの熱膨張係数において過度の上昇を抑え、かつ、焼付け時にガラスに適度の流動性を与え、SiO2とともにガラスの誘電率を低下させるものである。ガラス中に10〜20%で含有させるのが好ましい。10%未満ではガラスの流動性が不充分となり、焼結性が損なわれる。他方20%を越えるとガラスの軟化点が上昇する。より好ましくは10〜18%の範囲である。 B 2 O 3 is a glass-forming component similar to SiO 2 , facilitates glass melting, suppresses an excessive increase in the thermal expansion coefficient of the glass, and imparts moderate fluidity to the glass during baking, together with SiO 2 It decreases the dielectric constant. It is preferable to contain 10 to 20% in glass. If it is less than 10%, the fluidity of the glass becomes insufficient and the sinterability is impaired. On the other hand, if it exceeds 20%, the softening point of the glass increases. More preferably, it is 10 to 18% of range.
ZnOはガラスの軟化点を下げ、熱膨張係数を適宜範囲に調整するが、安定性を劣化させる成分で、ガラス中に7〜20%の範囲で含有させるのが好ましい。7%未満ではその作用を発揮し得ず、20%を超えると安定性が劣化する。より好ましくは9〜18%の範囲である。 ZnO lowers the softening point of the glass and adjusts the thermal expansion coefficient to an appropriate range. However, ZnO is a component that deteriorates the stability, and is preferably contained in the glass in a range of 7 to 20%. If it is less than 7%, the effect cannot be exhibited, and if it exceeds 20%, the stability deteriorates. More preferably, it is 9 to 18% of range.
Bi2O3はガラス形成成分であり、ガラス溶融を容易とし、ガラスの軟化点を下げる。ガラス中に60〜78%で含有させるのが好ましい。60%未満ではガラスの軟化点の低下が不十分で、焼結性が損なわれる。他方78%を越えるとガラスの熱膨張係数が高くなりすぎる。より好ましくは62〜75%の範囲である。 Bi 2 O 3 is a glass forming component, facilitates glass melting, and lowers the softening point of glass. It is preferable to make it contain in glass at 60 to 78%. If it is less than 60%, the glass softening point is not sufficiently lowered, and the sinterability is impaired. On the other hand, if it exceeds 78%, the thermal expansion coefficient of the glass becomes too high. More preferably, it is 62 to 75% of range.
R2O(Li2O、Na2O、K2O)はガラスの軟化点を下げ、適度に流動性を与え、熱膨張係数を適宜範囲に調整するものであり、0〜10%の範囲で含有させることが好ましい。10%を越えると熱膨張係数を過度に上昇させる。より好ましくは0〜7%の範囲である。 R 2 O (Li 2 O, Na 2 O, K 2 O) lowers the softening point of glass, imparts moderate fluidity, and adjusts the thermal expansion coefficient to an appropriate range, and is in the range of 0 to 10%. It is preferable to contain. If it exceeds 10%, the thermal expansion coefficient is excessively increased. More preferably, it is 0 to 7% of range.
BaOはガラスの軟化点を下げ、焼結性を向上させる。ガラス中に0〜10%で含有させるのが好ましい。10%を越えるとガラスの熱膨張係数が高くなりすぎる。より好ましくは0〜7%の範囲である。 BaO lowers the softening point of the glass and improves the sinterability. It is preferable to make it contain in glass at 0 to 10%. If it exceeds 10%, the thermal expansion coefficient of the glass becomes too high. More preferably, it is 0 to 7% of range.
Al2O3はガラスの安定性を向上させる成分で、0〜8%の範囲で含有させることが好ましい。8%を越えると軟化点が高くなりすぎる。より好ましくは0〜6%の範囲である。 Al 2 O 3 is a component that improves the stability of the glass and is preferably contained in the range of 0 to 8%. If it exceeds 8%, the softening point becomes too high. More preferably, it is 0 to 6% of range.
CuOはバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、2%以下の範囲で含有させることが好ましい。2%を越えるとガラスが着色し、透明性が低下する。より好ましくは0〜1%の範囲である。 CuO has the effect of relaxing the silver electrode used as the bus electrode wire and the dielectric layer reacting to diffuse silver in the dielectric layer and causing silver colloid coloration (yellowing). It is preferable to make it contain in the range. If it exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is 0 to 1% of range.
La2O3はバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、3%以下の範囲で含有させることが好ましい。3%を越えるとガラスが不安定になる。より好ましくは0〜1%の範囲である。 La 2 O 3 has the effect of mitigating silver colloid coloration (yellowing) caused by the reaction between the silver electrode used as the bus electrode line and the dielectric layer, and the diffusion of silver into the dielectric layer. It is preferable to make it contain in the range of% or less. If it exceeds 3%, the glass becomes unstable. More preferably, it is 0 to 1% of range.
CeO2はバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、2%以下の範囲で含有させることが好ましい。2%を越えるとガラスが着色し、透明性が低下する。より好ましくは0〜1%の範囲である。 CeO 2 has the effect of mitigating silver colloid coloration (yellowing) due to the reaction between the silver electrode used as the bus electrode wire and the dielectric layer, and the diffusion of silver into the dielectric layer, which is less than 2% It is preferable to contain in the range. If it exceeds 2%, the glass is colored and the transparency is lowered. More preferably, it is 0 to 1% of range.
CoOはバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、1%以下の範囲で含有させることが好ましい。1%を越えるとガラスが着色し、透明性が低下する。より好ましくは0〜0.7%の範囲である。 CoO has the effect of relaxing the silver electrode used as the bus electrode wire and the dielectric layer reacting to diffuse silver into the dielectric layer and causing silver colloid coloration (yellowing), and is less than 1%. It is preferable to make it contain in the range. If it exceeds 1%, the glass is colored and the transparency is lowered. More preferably, it is 0 to 0.7% of range.
MnO2はバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、1%以下の範囲で含有させることが好ましい。1%を越えるとガラスが着色し、透明性が低下する。より好ましくは0〜0.8%の範囲である。 MnO 2 has the effect of mitigating silver colloid coloration (yellowing) due to the reaction between the silver electrode used as the bus electrode wire and the dielectric layer, and the diffusion of silver into the dielectric layer. It is preferable to contain in the range. If it exceeds 1%, the glass is colored and the transparency is lowered. More preferably, it is 0 to 0.8% of range.
TiO2はバス電極線として使われる銀電極と誘電体層とが反応し、誘電体層中に銀が拡散して、銀コロイド発色(黄変)するのを緩和させる効果があり、5%以下の範囲で含有させることが好ましい。5%を越えると結晶が析出し、透明性が低下する。より好ましくは0〜4%の範囲である。 TiO 2 has the effect of reducing the silver colloid coloration (yellowing) caused by the reaction between the silver electrode used as the bus electrode wire and the dielectric layer, and the diffusion of silver into the dielectric layer, resulting in 5% or less. It is preferable to contain in the range. If it exceeds 5%, crystals are precipitated and the transparency is lowered. More preferably, it is 0 to 4% of range.
CuO、La2O3、CeO2、CoO、MnO2、TiO2これらは同様の効果をもつので、合計にも適正な範囲があり、それは0.2〜4.0である CuO, La 2 O 3, CeO 2, CoO, MnO 2 , TiO 2 These have the same effect, so there is also a reasonable range for the sum, which is 0.2-4.0
RO(MgO+CaO+SrO)はガラスに適度に流動性を与え、熱膨張係数を適宜範囲に調整するもので、0〜10%の範囲で含有させる。10%を越えると熱膨張係数が過度に上昇する。より好ましくは、0〜7%の範囲である。 RO (MgO + CaO + SrO) imparts moderate fluidity to glass and adjusts the thermal expansion coefficient to an appropriate range, and is contained in the range of 0 to 10%. If it exceeds 10%, the thermal expansion coefficient excessively increases. More preferably, it is 0 to 7% of range.
この他にも、一般的な酸化物で表すIn2O3、SnO2、TeO2、Fe2O3、ZrO2などを加えてもよい。 In addition, In 2 O 3 , SnO 2 , TeO 2 , Fe 2 O 3 , ZrO 2 or the like represented by a general oxide may be added.
実質的にPbOを含まないことにより、人体や環境に与える影響を皆無とすることができる。ここで、実質的にPbOを含まないとは、PbOがガラス原料中に不純物として混入する程度の量を意味する。例えば、低融点ガラス中における0.3wt%以下の範囲であれば、先述した弊害、すなわち人体、環境に対する影響、絶縁特性等に与える影響は殆どなく、実質的にPbOの影響を受けないことになる。 By substantially not containing PbO, it is possible to eliminate the influence on the human body and the environment. Here, “substantially free of PbO” means an amount of PbO mixed as an impurity in the glass raw material. For example, if it is in the range of 0.3 wt% or less in the low-melting glass, there is almost no influence on the adverse effects described above, that is, the influence on the human body and the environment, the insulation characteristics, etc., and it is not substantially affected by PbO. Become.
30℃〜300℃における熱膨張係数が(65〜100)×10−7/℃、軟化点が450℃以上550℃以下である上記の無鉛低融点ガラスである。熱膨張係数が(65〜100)×10−7/℃を外れると厚膜形成時に被膜の剥離、基板の反り等の問題が発生する。好ましくは、(70〜85)×10−7/℃の範囲である。また、軟化点を550℃以下にすることにより、従来PDPで使用されている高歪点ガラスだけでなく、歪点が600℃以下のソーダライムガラスを使用することができる。好ましくは、450℃以上540℃以下である。 The above lead-free low melting point glass having a thermal expansion coefficient of (65 to 100) × 10 −7 / ° C. at 30 ° C. to 300 ° C. and a softening point of 450 ° C. or higher and 550 ° C. or lower. When the thermal expansion coefficient is outside (65 to 100) × 10 −7 / ° C., problems such as peeling of the coating film and warping of the substrate occur when the thick film is formed. Preferably, it is in the range of (70 to 85) × 10 −7 / ° C. Further, by setting the softening point to 550 ° C. or less, not only high strain point glass conventionally used in PDP but also soda lime glass having a strain point of 600 ° C. or less can be used. Preferably, it is 450 degreeC or more and 540 degrees C or less.
さらにまた、上記の低融点ガラスを絶縁性被膜材料として使用している電子材料用基板である。上述の低融点ガラスを使うことにより、黄変が抑制された電子材料用基板とすることができる。 Furthermore, the present invention is an electronic material substrate using the above-described low-melting glass as an insulating coating material. By using the low-melting glass described above, a substrate for electronic material in which yellowing is suppressed can be obtained.
さらにまた、上記の低融点ガラスを絶縁性被膜材料として使用しているPDP用パネルである。上述の低融点ガラスを使うことにより、黄変が抑制されたPDP用パネルとすることができる。 Furthermore, the present invention is a PDP panel using the low melting point glass as an insulating coating material. By using the low melting point glass described above, a PDP panel in which yellowing is suppressed can be obtained.
本発明は銀との反応による黄変現象に対応する低融点ガラスの開示であり、その対象を銀電極に限定しているわけではない。 The present invention is a disclosure of a low-melting glass corresponding to the yellowing phenomenon caused by reaction with silver, and the object is not limited to a silver electrode.
ガラス基板としては透明なガラス基板、特にソーダ石灰シリカ系ガラス、または、それに類似するガラス(高歪点ガラス)、あるいは、アルカリ分の少ない(又は殆ど無い)アルミノ石灰ホウ珪酸系ガラスが多用されている。 As the glass substrate, a transparent glass substrate, particularly soda-lime-silica glass, glass similar to the glass (high strain point glass), or alumino-lime borosilicate glass with little (or almost no) alkali is often used. Yes.
以下、実施例に基づき、説明する。 Hereinafter, a description will be given based on examples.
(低融点ガラス混合ペーストの作製)
表に示すように、各成分について所望の低融点ガラス組成となるべく調合したうえで、白金ルツボに投入し、電気加熱炉内で1000〜1300℃、1〜2時間で加熱溶融して表1の実施例1〜5、表2の比較例1〜3に示す組成のガラスを得た。
(Production of low melting point glass mixed paste)
As shown in the table, after preparing each component to have a desired low melting point glass composition, it is put into a platinum crucible and heated and melted in an electric heating furnace at 1000 to 1300 ° C. for 1 to 2 hours. The glass of the composition shown in Examples 1-5 and Comparative Examples 1-3 of Table 2 was obtained.
次いで、αテルピネオールとブチルカルビトールアセテートからなるペーストオイルにバインダーとしてのエチルセルロースと上記ガラス粉を混合し、粘度、300±50ポイズ程度のペーストを調製した。 Next, paste oil composed of α-terpineol and butyl carbitol acetate was mixed with ethyl cellulose as a binder and the above glass powder to prepare a paste having a viscosity of about 300 ± 50 poise.
(絶縁性被膜の形成)
厚み2〜3mm、サイズ100mm角のソーダ石灰系ガラス基板に、焼付け後の膜厚が約20μmとなるべく勘案して、アプリケーターを用いて前記ペーストを塗布し、塗布層を形成した。 次いで、乾燥後、550℃以下で10〜60分間焼成することにより、クリアな誘電体層を形成させた。
(Formation of insulating coating)
The paste was applied using an applicator to a soda-lime glass substrate having a thickness of 2 to 3 mm and a size of 100 mm square so that the film thickness after baking was about 20 μm, thereby forming an application layer. Next, after drying, a clear dielectric layer was formed by firing at 550 ° C. or lower for 10 to 60 minutes.
得られた試料について、肉眼および顕微鏡により観察し、従来よりも黄変現象が格段に抑制されたと判断できたものについては○を、それ以外については×とした。 The obtained sample was observed with the naked eye and a microscope, and it was judged that the yellowing phenomenon was markedly suppressed as compared with the conventional sample, and the others were marked with x.
なお、軟化点は、リトルトン粘度計を用い、粘度係数η=107.6 に達したときの温度とした。また、熱膨張係数は、熱膨張計を用い、5℃/分で昇温したときの30〜300℃での伸び量から求めた。 The softening point was the temperature when the viscosity coefficient η = 10 7.6 was reached using a Littleton viscometer. Moreover, the thermal expansion coefficient was calculated | required from the amount of elongation at 30-300 degreeC when it heated up at 5 degree-C / min using the thermal dilatometer.
(結果)
低融点ガラス組成および、各種試験結果を表に示す。
(result)
The low melting point glass composition and various test results are shown in the table.
表1における実施例1〜5に示すように、本発明の組成範囲内においては、黄変の発現が従来と比べて格段に抑制されていた。 As shown in Examples 1 to 5 in Table 1, within the composition range of the present invention, the occurrence of yellowing was significantly suppressed as compared with the conventional one.
他方、本発明の組成範囲を外れる表2における比較例1〜3は、従来と同様、黄変の発現が顕著である、或いは、好ましい物性値を示さず、PDP等の基板被覆用低融点ガラスとして適用し得ない。 On the other hand, Comparative Examples 1 to 3 in Table 2 outside the composition range of the present invention, as in the prior art, show significant yellowing, or do not show preferred physical properties, and have a low melting point glass for substrate coating such as PDP. As inapplicable.
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