JP2007245029A - Substrate cleaning device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning device which has no problem for re-contamination, facilitates wastewater disposal and saves the operation cost of the device. <P>SOLUTION: In the substrate 1 cleaning device in which a substrate 1 is continuously transferred by a plurality of rollers 2 and cleaned and dried, a cleaning means includes a mixed liquid 5 mixing a solid material, a pressurized gas and a mixed liquid spraying nozzle 3, and sprays the mixed liquid 5 toward the substrate 1 by the pressurized gas from the mixed liquid spraying nozzle 3. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a plate-type electronic member cleaning apparatus, and more particularly to a substrate cleaning apparatus for cleaning rare metals, silicon, glass for flat panel displays, and the like with a water-soluble inorganic salt or the like instead of a detergent.

  FIG. 4 is an apparatus configuration diagram showing a cleaning section of a conventional contact cleaning apparatus. The substrate 1 is driven by the driving roller 2, guided by the guide roller 7 through the transport path in the cleaning device, and stably transferred. A cleaning liquid containing a surfactant is poured onto the surface of the substrate 1 (not shown), and contact cleaning is performed by the rotary cleaning brush 6 to remove oil and fat and foreign matters, thereby completing the cleaning.

  This cleaning method must be managed so that the oil and fat and foreign matters once removed are accumulated in the rotary cleaning brush 6 and become a contamination source, and the rotary cleaning brush 6 is always in contact with the substrate 1 evenly. Therefore, there is a problem that the operation tends to be complicated. Furthermore, there has been a problem that a cleaning liquid using a cleaning agent has a high environmental load, and it takes a lot of time and money to treat the waste water of the cleaning liquid containing the cleaning agent.

In order to solve the problem of recontamination, a non-contact type cleaning device has been developed in which cleaning liquid is sprayed onto a substrate with a high-pressure pump to perform cleaning. However, an expensive high-pressure pump is required to spray the cleaning liquid at a high pressure. . Further, since it is difficult to reduce the amount of the cleaning liquid, a cleaning liquid having high cleaning power and easy wastewater treatment has been developed. Patent Document 1 describes a cleaning facility including a detergent cleaning device and a high-pressure spray cleaning device.
JP 2004-174308 A

  The present invention has been made in order to solve such a problem, and an object of the present invention is to provide a substrate cleaning apparatus that does not have the problem of recontamination, that is easy to treat waste water, and that can suppress the operation cost. It is to provide.

  The substrate cleaning apparatus of the present invention is a substrate cleaning apparatus in which a substrate is floated while being sprayed onto a plurality of rollers or a liquid or gas onto the substrate and continuously conveyed by the rollers, and the substrate is cleaned and dried by the cleaning means and the drying means. In the apparatus, the cleaning means includes a mixed liquid obtained by mixing solids, a pressurized gas, and a mixed liquid injection nozzle, and the mixed liquid injection nozzle is formed by the pressurized gas toward the substrate. It is made to inject from.

  The substrate cleaning apparatus of the present invention is a substrate cleaning apparatus in which a substrate is floated while being sprayed onto a plurality of rollers or a liquid or gas onto the substrate and continuously conveyed by the rollers, and the substrate is cleaned and dried by the cleaning means and the drying means. In the apparatus, the cleaning means has a mixed gas injection nozzle for mixing and injecting a mixed gas mixed with a solid and a liquid, and a gas in which the mixed gas and liquid mixed with a solid are pressurized toward the substrate It is made to inject from a liquid mixture injection nozzle by this.

  The substrate cleaning apparatus according to the present invention is characterized in that the solid material has a hardness equal to or lower than the hardness of the substrate.

Solids of the substrate cleaning apparatus of the present invention are sodium hydrogen carbonate (NaHCO ₃ ), sodium sesquicarbonate (NaHCO ₃ · Na ₂ CO ₃ · 2H ₂ O), Weigshaider salt ( ₃ NaHCO ₃ · Na ₂ CO ₃ ), A single grain or a plurality of mixed grains selected from water-soluble salts of sodium carbonate monohydrate (Na ₂ CO ₃ .H ₂ O) or sodium carbonate 10 water salt (NaCO ₃ .10H ₂ O) It is characterized by that.

The solid material of the substrate cleaning apparatus of the present invention is composed of water-soluble salts of ammonium bicarbonate (NH ₄ HCO ₃ ), sodium carbonate (Na ₂ CO ₃ ), calcium carbonate (CaCO ₃ ), or potassium carbonate (KCO ₃ ). It consists of a single grain selected from among or a plurality of mixed grains.

  The solid substance of the substrate cleaning apparatus of the present invention is characterized by being a single or a mixture of granular or rod-like resins.

  The solid state of the substrate cleaning apparatus of the present invention is in units of microns, and the material is polypropylene (PP), polyethylene (PE), polyethylene terephthalate (PET), or nylon.

  In the substrate cleaning apparatus of the present invention, the substrate is floated while being sprayed onto a plurality of rollers or liquid or gas onto the substrate, and is continuously transported by the rollers, and the substrate is cleaned and dried by the cleaning means and the drying means. In the substrate cleaning apparatus, the cleaning means has a mixed liquid in which solids are mixed and a mixed liquid injection nozzle that mixes and injects the gas, and the mixed liquid is directed from the mixed liquid injection nozzle by the pressurized gas toward the substrate. It is made to inject.

  The gas of the substrate cleaning apparatus of the present invention is air, water vapor, or a gas in which air and water vapor are mixed.

  The solid substance in the mixed solution of the substrate cleaning apparatus of the present invention is air, water vapor, or a gas obtained by mixing air and water vapor.

  According to the substrate cleaning apparatus of the present invention, there is no problem of re-contamination by the brush, the cleaning liquid is small and has the same cleaning effect as the conventional one, and is within the neutral range indicated by the drainage standards. Since the process is simple and an expensive high-pressure pump is not required, it is possible to provide a substrate cleaning apparatus capable of suppressing the apparatus and the operation cost.

  FIG. 1 is an apparatus configuration diagram showing a cleaning unit of a non-contact type cleaning apparatus of the present invention. In FIG. 1, the substrate 1 is sent in a state of being levitated by the levitating mechanism 4. Regardless of the jetting state of the mixed liquid jet nozzle 3, the fed substrate 1 is guided by the driving roller 2 through the transport path in the cleaning device and is stably transferred. On the surface of the substrate 1, the mixed liquid 5 mixed with the solid material is sprayed from the mixed liquid spray nozzle 3, and cleaning is performed by removing oil and fat and foreign matters. The liquid mixture 5 is injected from the liquid mixture injection nozzle 3 by compressed air pressurized by a normal pressure pump. When the cleaning is completed, the substrate 1 is transferred to a substrate drying unit (not shown).

The mixed solution 5 is an aqueous solution in which solids are mixed. The solids were sodium hydrogen carbonate (NaHCO ₃ ), sodium sesquicarbonate (NaHCO ₃ · Na ₂ CO ₃ · 2H ₂ O), Wegschider salt ( ₃ NaHCO ₃ · Na ₂ CO ₃ ), sodium carbonate monohydrate ( Na ₂ CO ₃ .H ₂ O) or sodium carbonate 10 hydrate (NaCO ₃ .10H ₂ O), each consisting of a single particle or a plurality of mixed particles selected from water-soluble salts. In addition, a single grain or a plurality selected from water-soluble salts of ammonium bicarbonate (NH ₄ HCO ₃ ), sodium carbonate (Na ₂ CO ₃ ), calcium carbonate (CaCO ₃ ), or potassium carbonate (KCO ₃ ) May be mixed grains. Furthermore, granular or rod-like polypropylene (PP), polyethylene (PE), polyethylene terephthalate (PET), or a resin made of nylon may be used alone or in combination.

Water-soluble inorganic salts mainly used are sodium hydrogen carbonate (NaHCO ₃ ), sodium sesquicarbonate (NaHCO ₃ · Na ₂ CO ₃ · 2H ₂ O), Weigshaider salt ( ₃ NaHCO ₃ · Na ₂ CO ₃ ), Sodium carbonate monohydrate (Na ₂ CO ₃ · H ₂ O) or sodium carbonate 10 hydrate (NaCO ₃ · 10H ₂ O), even if these are dissolved in water at room temperature, PH is neutral based on wastewater It is within the range of PH 5.8 to 8.6 in the water pollution prevention method, and generally shows 8.0. Therefore, since the liquid mixture which arbitrarily mixed these water-soluble salts or resin solids is neutral, it becomes possible to remarkably reduce the burden of wastewater treatment. In addition, when expecting detergency, by heating to about 35 to 80 ° C., weak alkalinity is exhibited, and the detergency for organic substances such as oil is improved. In addition, if the waste liquid is returned to room temperature after washing, the wastewater treatment burden can be remarkably reduced to a pH range of 5.8 to 8.6, which makes the washing apparatus extremely excellent in the environment.

  By making the particle size of these water-soluble salts or the shape of the resin several microns in the state of a mixed solution, a cleaning effect equivalent to the conventional one can be obtained and the cleaning time can be shortened. Moreover, since the liquid mixture 5 injected from the liquid mixture injection nozzle 3 is, for example, a mixture of water-soluble salts, water, and compressed air, the amount of wastewater to be treated is the amount of wastewater containing a cleaning agent. It can be reduced compared. Since the water-soluble salt or resin having a particle size or shape of several microns has a hardness of 5 or less, foreign matter can be removed without damaging the surface of the glass having a hardness of 5. Thereby, the injection pressure can be reduced from 10 M Pascal to 5 M Pascal and the performance of the pressurizing pump can be reduced, so that the device cost can be reduced.

  FIG. 2 is a mixed liquid injection schematic diagram showing a state in which liquid, solid and gas are mixed and injected in the mixed liquid injection nozzle. Liquid, gas or water vapor or gas + water vapor, and solid + gas or solid + liquid are injected into the mixed liquid injection nozzle 3 from three directions, mixed, and injected toward the substrate 1. Strong foreign matter adhering to the substrate 1 is also peeled off and removed by the impact of the injected solid matter.

  FIG. 3 is a configuration diagram of a cleaning device showing a configuration of a cleaning device using a plurality of mixed liquid injection nozzles. A plurality of liquid mixture injection nozzles 3 are attached to the casing 10 of the cleaning apparatus, and the substrate 1 immediately below the nozzles 1 is conveyed by a driving roller 2. The mixed liquid storage unit 11 that is integrated with the housing 10 stores the mixed liquid after washing and separates the liquid into a solid. The liquid is pressurized by the pump 9 and injected into the mixed liquid injection nozzle 3. The solid matter that is separated and leaves a small amount of liquid is mixed with the pressurized gas in the aspirator 8 and injected into the mixed liquid injection nozzle 3. In the mixed liquid injection nozzle 3, these solid matter, liquid, and gas are mixed and injected onto the surface of the substrate 1 by the pressure of the gas to perform cleaning.

  As described above, according to the substrate cleaning apparatus of the present invention, there is no problem of re-contamination by the brush, the cleaning liquid mixture is small, has a cleaning effect equivalent to the conventional one in a short time, and the drainage standard indicates Since it is in the neutral range, wastewater treatment is easy and an expensive high-pressure pump is not required, so that it is possible to reduce the apparatus and operation costs.

The apparatus block diagram which shows the washing | cleaning part of the non-contact-type washing apparatus of this invention. The liquid mixture injection schematic diagram which shows the injection state of the liquid mixture injection nozzle of this invention. The block diagram of the washing | cleaning apparatus using the some liquid mixture injection nozzle of this invention. The apparatus block diagram which shows the washing | cleaning part of the conventional contact-type washing apparatus.

Explanation of symbols

1 Substrate
2 Drive roller
3 Liquid mixture injection nozzle
4 Levitation mechanism
5 mixture
6 Rotating cleaning brush
7 Guide roller
8 Aspirator
9 Pump 10 Housing 11 Mixed liquid reservoir

Claims (10)

In a substrate cleaning apparatus that floats a substrate while continuously spraying the substrate while spraying a plurality of rollers or liquid or gas onto the substrate, and cleaning and drying the substrate by a cleaning unit and a drying unit.
The cleaning means includes a mixed liquid in which solids are mixed, a pressurized gas, and a mixed liquid injection nozzle.
The substrate cleaning apparatus, wherein the mixed liquid is sprayed from the mixed liquid spray nozzle by the pressurized gas toward the substrate. In a substrate cleaning apparatus that floats a substrate while continuously spraying the substrate while spraying a plurality of rollers or liquid or gas onto the substrate, and cleaning and drying the substrate by a cleaning unit and a drying unit.
The cleaning means includes a mixed gas jet nozzle that mixes and jets a mixed gas mixed with a solid and a liquid, and a gas obtained by pressing the mixed gas mixed with the solid and the liquid toward the substrate The substrate cleaning apparatus is characterized in that it is ejected from the mixed liquid ejection nozzle.   The substrate cleaning apparatus according to claim 1, wherein the solid material has a hardness equal to or less than the hardness of the substrate. The solids include sodium bicarbonate (NaHCO ₃ ), sodium sesquicarbonate (NaHCO ₃ · Na ₂ CO ₃ · 2H ₂ O), Wegschider salt ( ₃ NaHCO ₃ · Na ₂ CO ₃ ), sodium carbonate monohydrate ( It consists of a single grain or a plurality of mixed grains selected from water-soluble salts of Na ₂ CO ₃ .H ₂ O) or sodium carbonate 10 hydrate (NaCO ₃ .10H ₂ O). Item 3. The substrate cleaning apparatus according to Item 1 or 2. The solid is a single substance selected from water-soluble salts of ammonium bicarbonate (NH ₄ HCO ₃ ), sodium carbonate (Na ₂ CO ₃ ), calcium carbonate (CaCO ₃ ), or potassium carbonate (KCO ₃ ). The substrate cleaning apparatus according to claim 1, wherein the substrate cleaning apparatus is made of a grain or a plurality of mixed grains.   The substrate cleaning apparatus according to claim 1, wherein the solid material is a single or a mixture of granular or rod-like resins.   The substrate cleaning apparatus according to claim 6, wherein the shape of the solid is in units of microns, and the material is polypropylene (PP), polyethylene (PE), polyethylene terephthalate (PET), or nylon. In a substrate cleaning apparatus that floats a substrate while continuously spraying the substrate while spraying a plurality of rollers or liquid or gas onto the substrate, and cleaning and drying the substrate by a cleaning unit and a drying unit.
The cleaning means includes a mixed liquid jet nozzle that mixes and injects a mixed liquid mixed with a solid substance and a gas, and jets the mixed liquid from the mixed liquid jet nozzle to the substrate by a pressurized gas. A substrate cleaning apparatus, characterized by comprising:   The substrate cleaning apparatus according to claim 1, wherein the gas is air, water vapor, or a gas obtained by mixing air and water vapor.   3. The substrate cleaning apparatus according to claim 1, wherein the solid in the liquid mixture is air, water vapor, or a gas obtained by mixing air and water vapor. 4.

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