JP2007031350A - Silane derivative and organic thin film-forming article - Google Patents
Silane derivative and organic thin film-forming article Download PDFInfo
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- JP2007031350A JP2007031350A JP2005217543A JP2005217543A JP2007031350A JP 2007031350 A JP2007031350 A JP 2007031350A JP 2005217543 A JP2005217543 A JP 2005217543A JP 2005217543 A JP2005217543 A JP 2005217543A JP 2007031350 A JP2007031350 A JP 2007031350A
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- silane derivative
- organic thin
- thin film
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- 150000004756 silanes Chemical class 0.000 title claims abstract description 55
- -1 β-nitrocinnamyl group Chemical group 0.000 claims abstract description 37
- 239000010409 thin film Substances 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 7
- 125000005843 halogen group Chemical group 0.000 claims abstract description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 5
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000005415 substituted alkoxy group Chemical group 0.000 claims description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract description 16
- 229910052753 mercury Inorganic materials 0.000 abstract description 15
- 230000002209 hydrophobic effect Effects 0.000 abstract description 14
- 230000001678 irradiating effect Effects 0.000 abstract description 5
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 238000004440 column chromatography Methods 0.000 description 8
- 239000012043 crude product Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 4
- 238000000018 DNA microarray Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 235000002597 Solanum melongena Nutrition 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NYIDSUMRGUILGR-UHFFFAOYSA-N 4-(2-trimethoxysilylethyl)benzenesulfonyl chloride Chemical compound CO[Si](OC)(OC)CCC1=CC=C(S(Cl)(=O)=O)C=C1 NYIDSUMRGUILGR-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- PFYXSUNOLOJMDX-UHFFFAOYSA-N bis(2,5-dioxopyrrolidin-1-yl) carbonate Chemical compound O=C1CCC(=O)N1OC(=O)ON1C(=O)CCC1=O PFYXSUNOLOJMDX-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- SWDDLRSGGCWDPH-UHFFFAOYSA-N 4-triethoxysilylbutan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCCN SWDDLRSGGCWDPH-UHFFFAOYSA-N 0.000 description 2
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 230000001537 neural effect Effects 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000007524 organic acids Chemical group 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000005007 perfluorooctyl group Chemical group FC(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)* 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000002094 self assembled monolayer Substances 0.000 description 2
- 239000013545 self-assembled monolayer Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000006507 2,4-difluorobenzyl group Chemical group [H]C1=C(F)C([H])=C(F)C(=C1[H])C([H])([H])* 0.000 description 1
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 1
- 125000006179 2-methyl benzyl group Chemical group [H]C1=C([H])C(=C(C([H])=C1[H])C([H])([H])*)C([H])([H])[H] 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 229940082584 3-(triethoxysilyl)propylamine Drugs 0.000 description 1
- YMTRNELCZAZKRB-UHFFFAOYSA-N 3-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=CC(N)=C1 YMTRNELCZAZKRB-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 244000061458 Solanum melongena Species 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000002078 anthracen-1-yl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C([*])=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 125000000748 anthracen-2-yl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C([H])=C([*])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- GONOPSZTUGRENK-UHFFFAOYSA-N benzyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CC1=CC=CC=C1 GONOPSZTUGRENK-UHFFFAOYSA-N 0.000 description 1
- LKMCJXXOBRCATQ-UHFFFAOYSA-N benzylsulfanylbenzene Chemical group C=1C=CC=CC=1CSC1=CC=CC=C1 LKMCJXXOBRCATQ-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 125000006343 heptafluoro propyl group Chemical group 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000005246 nonafluorobutyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 1
- 125000005005 perfluorohexyl group Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)* 0.000 description 1
- 125000005008 perfluoropentyl group Chemical group FC(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)* 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical group ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
Abstract
Description
æ¬çºæã¯ããšã¬ã¯ãããã¯ã¹è£œåã«ãããŠãå®äŸ¡ãªæ±çšçŽ«å€ç·å æºããåŸãããäœãšãã«ã®ãŒéã®çŽ«å€ç·ç §å°ã«ãã£ãŠéžæçã«åºäœè¡šé¢ãçæ°Žæ§ãã芪氎æ§ã«å€æããããšãã§ããææ©èèã圢æããã·ã©ã³èªå°äœã䞊ã³ã«åºäœè¡šé¢ã«è©²ã·ã©ã³èªå°äœã嫿ããææ©èè圢æäœã«é¢ããã   The present invention relates to a silane derivative that forms an organic thin film capable of selectively converting the surface of a substrate from hydrophobic to hydrophilic by irradiation with low-energy ultraviolet rays obtained from an inexpensive general-purpose ultraviolet light source in an electronic product, and the substrate The present invention relates to an organic thin film forming body containing the silane derivative on the surface.
ãšã¬ã¯ãããã¯ã¹è£œåã«ãããŠãå ãªãœã°ã©ãã£ãŒæ³ãªã©ãçšããŠãã¿ãŒã³åœ¢æããå·¥çšã¯ç ©éã§ã倧éã®ãã©ãã¬ãžã¹ãææãçŸåæ¶²ãªã©ã®å»æ£ç©ãæåºãããç°å¢è² è·ã®é¢ããæ¹åãæ±ãããããããã§ãæå å±€ã®åã¿ãåååã¬ãã«ã§ãããæ°ïœïœã®æå æ§ã®ææ©èèãçšãããã¿ãŒã³åœ¢ææ³ã®éçºãè¡ãããŠããã   In an electronic product, the process of forming a pattern using a photolithographic method or the like is complicated, and a large amount of waste materials such as a photoresist material and a developer are discharged, and improvement is required in terms of environmental load. Therefore, development of a pattern forming method using a photosensitive organic thin film having a thickness of several nanometers and a photosensitive layer thickness of a single molecule has been performed.
ãã§ãã«ããªã¯ããã·ã©ã³ããã³ãžã«ããªã¯ããã·ã©ã³ãªã©ã®ã¢ãªãŒã«ã·ã©ã³ååç©ãã¢ã«ãã«ã·ã©ã³ååç©ããåºæ¿äžã«åœ¢æããçæ°Žæ§ã®èªå·±çµç¹ååååèã«ïŒïŒïŒïœïœã®æ³¢é·ã®é 玫å€ç·ãç §å°ãããšãçªçŽ âççŽ çµåã®éè£ã«äŒŽãåºæ¿è¡šé¢ã芪氎åãããããšãèšèŒãããŠãããïŒéç¹èš±æç®ïŒïŒãŸããããŒãã«ãªãçåæ°ŽçŽ ã嫿ããã·ã©ã³èªå°äœãã圢æãããçæ°Žæ§åååèãïŒïŒïŒïœïœã®æ³¢é·ã®é 玫å€ç·ãç §å°ãããšã芪氎æ§ã«å€æã§ããããšãé瀺ãããŠãããïŒç¹èš±æç®ïŒïŒ   When a hydrophobic self-assembled monolayer formed on an arylsilane compound or alkylsilane compound such as phenyltrichlorosilane or benzyltrichlorosilane is irradiated with far-ultraviolet light having a wavelength of 193 nm, the silicon-carbon bond is broken. It is described that the substrate surface is hydrophilized. (Non-patent document 1) Further, it is disclosed that a hydrophobic monomolecular film formed from a silane derivative containing perfluorohydrocarbon can be converted to hydrophilic when irradiated with far-ultraviolet rays having a wavelength of 172 nm. (Patent Document 1)
äžèšããèªå·±çµç¹ååååèã¯é 玫å€ç·ãç §å°ããããšã«ãããçæ°Žæ§ãã芪氎æ§ã«å€æããããšãã§ããããå æºãšããŠé 玫å€ç·ç §å°ãå¿ èŠã§ãããããããé 玫å€ç·å æºã¯é«äŸ¡ã§ãããå®äŸ¡ãªå æºãæãŸãããæ°Žéç¯ã¯äžè¬ã«å æºãšããŠåºã䜿çšãããå®äŸ¡ã§ããããããã£ãŠå®äŸ¡ãªæ°Žéç¯ããæŸå°ããã玫å€ç·ã«å¯ŸããŠãé«æåºŠãªæå æ§ã·ã©ã³èªå°äœãæãŸããŠããã   The above-described self-assembled monolayer can be converted from hydrophobic to hydrophilic by irradiating with far-ultraviolet rays, but irradiating with far-ultraviolet rays as a light source is necessary. However, the far ultraviolet light source is expensive, and an inexpensive light source is desired. Mercury lamps are generally widely used as light sources and are inexpensive. Therefore, a highly sensitive photosensitive silane derivative is desired for ultraviolet rays emitted from an inexpensive mercury lamp.
ããã§ãïœâããããã³ãžã«ãšã¹ãã«å«æã·ã©ã³èªå°äœïŒç¹èš±æç®ïŒãïŒïŒããã³ãžã«ãã§ãã«ã¹ã«ãã£ãåºå«æã·ã©ã³èªå°äœïŒç¹èš±æç®ïŒïŒãïœâãããã¢ããªãåºå«æã·ã©ã³èªå°äœïŒç¹èš±æç®ïŒïŒãªã©ãé瀺ãããŠããããããã¯ãããããæ°Žéç¯ç §å°ã«ãã芪氎æ§ã«å€åãããããŸã å®çšäžæåºŠãªã©ã®åé¡ããããããã«æ¹åãèŠããã   Therefore, o-nitrobenzyl ester-containing silane derivatives (Patent Documents 2 and 3), benzylphenyl sulfide group-containing silane derivatives (Patent Document 4), o-nitroanilide group-containing silane derivatives (Patent Document 5), and the like are disclosed. . All of these change to hydrophilicity by irradiation with a mercury lamp, but still have problems such as sensitivity in practical use, and further improvement is required.
æ¬çºæã®ç®çã¯ãå®äŸ¡ãªæ±çšçŽ«å€ç·å æºããåŸãããäœãšãã«ã®ãŒã®çŽ«å€ç·ç §å°ã®ãã£ãŠãåºæ¿è¡šé¢ã®çæ°Žæ§ã®ææ©èèã芪氎æ§ã«å€æããã·ã©ã³èªå°äœãæäŸããããšã§ããã   An object of the present invention is to provide a silane derivative that converts a hydrophobic organic thin film on a substrate surface into hydrophilicity by low-energy ultraviolet irradiation obtained from an inexpensive general-purpose ultraviolet light source.
æ¬çºæè ãã¯ãäžèšèª²é¡ã解決ãã¹ãéææ€èšããçµæãβâãããã·ã³ããã«åºã嫿ããã·ã©ã³èªå°äœãåºäœè¡šé¢ã«ææ©èèã圢æã§ããïŒïŒïŒïœïœä»¥äžã®çŽ«å€ç·ç §å°ã«ããæ¯èŒçäœãšãã«ã®ãŒã§Î²âãããã·ã³ããã«åºãå è±é¢ããŠèŠªæ°Žæ§ãžå€æããããšãèŠåºããæ¬çºæã宿ããã«è³ã£ãã   As a result of intensive studies to solve the above problems, the present inventors have found that a silane derivative containing a β-nitrocinnamyl group can form an organic thin film on the surface of the substrate. -The inventors have found that the nitrocinnamyl group is photodetached and converted into hydrophilicity, and have completed the present invention.
ããªãã¡ãæ¬çºæã¯ãβâãããã·ã³ããã«åºãåã³ããã²ã³åååã³åã¯ã¢ã«ã³ãã·åºã嫿ããããšãç¹åŸŽãšããã·ã©ã³èªå°äœã§ãããäžèšäžè¬åŒïŒ»ïŒïŒœã§è¡šãããããšãç¹åŸŽãšããã·ã©ã³èªå°äœãæäŸãããã®ã§ããã
ãŸããæ¬çºæã¯ãåºäœè¡šé¢ã«ãæ¬çºæã®ã·ã©ã³èªå°äœã嫿ããææ©èèã圢æãããŠãªãææ©èè圢æäœãæäŸããã The present invention also provides an organic thin film forming body in which an organic thin film containing the silane derivative of the present invention is formed on a substrate surface.
æ¬çºæã®ã·ã©ã³èªå°äœã¯çæ°Žæ§ã§ããããå®äŸ¡ãªæ°Žéç¯å æºããæŸå°ãããæ³¢é·ïŒïŒïŒïœïœä»¥äžã®çŽ«å€ç·ãç §å°ããããšã«ãããå åè§£ããŠèŠªæ°Žæ§ã«å€åããããšãã§ããããããã£ãŠãæ¬çºæã®ã·ã©ã³èªå°äœã§åºäœè¡šé¢ãèèã圢æãããšã玫å€ç·ç §å°ã«ãããåºäœè¡šé¢ãçæ°Žæ§ãã芪氎æ§ãžå€æããããšãã§ããããã芪氎æ§ãšçæ°Žæ§ã®å·®ãå©çšããŠãåºäœè¡šé¢ã«çš®ã ã®ç©è³ªã®ãã¿ãŒãã³ã°åœ¢æãå¯èœãšãªãã   Although the silane derivative of the present invention is hydrophobic, it can be photodecomposed and changed to hydrophilicity by irradiation with ultraviolet rays having a wavelength of 250 nm or more emitted from an inexpensive mercury lamp light source. Therefore, when a thin film is formed on the substrate surface with the silane derivative of the present invention, the substrate surface can be converted from hydrophobic to hydrophilic by ultraviolet irradiation. In addition, various materials can be patterned.
æ¬çºæã®ã·ã©ã³èªå°äœåã³ææ©èè圢æäœã詳现ã«èª¬æããã
æ¬çºæã®ã·ã©ã³èªå°äœã¯ãåèšäžè¬åŒïŒ»ïŒïŒœã§è¡šãããååç©ã§ãããåŒäžãïœã¯ïŒåã¯ïŒã§ãããïœã¯ïŒãïŒïŒã®æŽæ°ã衚ããR6ã¯æ°ŽçŽ ååãççŽ æ°ïŒãïŒïŒã®ã¢ã«ãã«åºãççŽ æ°ïŒãïŒïŒã®ãã«ãªãã¢ã«ãã«åºã衚ããå
·äœçã«ã¯ãã¡ãã«åºããšãã«åºããããã«åºãããã«åºããã³ãã«åºãããã·ã«åºããããã«åºããªã¯ãã«åºãããã«åºããã·ã«åºãããã·ã«åºãããªãã«ãªãã¡ãã«åºãããŒãã«ãªããªã¯ãã«åºãªã©ãæããããã
The silane derivative and organic thin film forming body of the present invention will be described in detail.
The silane derivative of the present invention is a compound represented by the general formula [1]. In the formula, m is 0 or 1, and n represents an integer of 1 to 20. R 6 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a fluoroalkyl group having 1 to 20 carbon atoms, specifically, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, Examples include heptyl group, octyl group, nonyl group, decyl group, dodecyl group, trifluoromethyl group, perfluorooctyl group and the like.
R1ãR5ã¯ãããããç¬ç«ããŠæ°ŽçŽ ååïŒããçŽ ååãå¡©çŽ ååãèçŽ ååãªã©ã®ããã²ã³ååïŒã¡ãã«åºããšãã«åºããããã«åºãããã«åºãïœâããã«åºããã³ãã«åºãããã·ã«åºããããã«åºããªã¯ãã«åºãããã«åºããã·ã«åºãããã·ã«åºãªã©ççŽ æ°ïŒãïŒïŒã®ã¢ã«ãã«åºïŒãã«ãªãã¡ãã«åºãããªãã«ãªãã¡ãã«åºãïŒïŒïŒïŒïŒãâããªãã«ãªããšãã«åºãããã¿ãã«ãªããããã«åºããããã«ãªãããã«åºãããŒãã«ãªããã³ãã«åºãããŒãã«ãªãããã·ã«åºãããŒãã«ãªããªã¯ãã«åºãããŒãã«ãªãããã«åºãããŒãã«ãªããã·ã«åºãªã©ã®ççŽ æ°ïŒãïŒïŒã®ãã«ãªãã¢ã«ãã«åºïŒã¡ããã·åºããšããã·åºãããããã·åºãã€ãœããããã·åºããããã·åºãïœâãããã·åºãããªãã«ãªãã¡ããã·åºãªã©ã®çœ®æåºãæããŠãè¯ãã¢ã«ã³ãã·åºïŒãã§ãã«åºãïŒâãã«ãªããã§ãã«åºãïŒâã¯ãããã§ãã«åºãïŒâããããã§ãã«åºãïŒâã¡ãã«ãã§ãã«åºãïŒïŒïŒâãžã¡ããã·ãã§ãã«åºããã³ã¿ãã«ãªããã§ãã«åºãªã©ã®çœ®æåºãæããŠãè¯ããã§ãã«åºïŒãã³ãžã«åºãïŒâã¯ãããã³ãžã«åºãïŒâã¡ãã«ãã³ãžã«åºãïŒïŒïŒâãžãã«ãªããã³ãžã«åºããã³ã¿ãã«ãªããã³ãžã«åºãªã©ã®çœ®æåºãæããŠãè¯ããã³ãžã«åºïŒãããåºãã·ã¢ãåºãã¢ããåºãã¢ãªãŒã«åºã衚ããåã飿¥ããŠïŒâãããã«åºãïŒâãããã«åºãïŒâã¢ã³ã¹ãªã«åºãïŒâã¢ã³ã¹ãªã«åºãïŒâã¢ã³ã¹ãªã«åºãªã©ã®å€æ žè³éŠæç°ïŒãããªãã«åºãã€ãœãããªãã«åºãã¢ã¯ãªãžãã«åºãã¢ã³ã¹ããã«åºãªã©ã®å€æ žè€çŽ ç°ã圢æããŠãè¯ãã R 1 to R 5 are each independently a hydrogen atom; a halogen atom such as a fluorine atom, a chlorine atom, or a bromine atom; a methyl group, an ethyl group, a propyl group, a butyl group, a t-butyl group, a pentyl group, a hexyl group, C1-C20 alkyl groups such as heptyl, octyl, nonyl, decyl, dodecyl; fluoromethyl, trifluoromethyl, 2,2,2, -trifluoroethyl, heptafluoropropyl, C1-C20 fluoroalkyl group such as nonafluorobutyl group, perfluoropentyl group, perfluorohexyl group, perfluorooctyl group, perfluorononyl group, perfluorodecyl group; methoxy group, ethoxy group, propoxy group, A substituent that may have a substituent such as isopropoxy group, butoxy group, t-butoxy group, trifluoromethoxy group, etc. Lucoxy group; may have a substituent such as phenyl group, 4-fluorophenyl group, 2-chlorophenyl group, 2-nitrophenyl group, 3-methylphenyl group, 2,4-dimethoxyphenyl group, pentafluorophenyl group Good phenyl group; benzyl group, 4-chlorobenzyl group, 2-methylbenzyl group, 2,4-difluorobenzyl group, benzyl group which may have a substituent such as pentafluorobenzyl group; nitro group, cyano group, Represents an amino group, an aryl group, and is adjacent to a polynuclear aromatic ring such as 1-naphthyl group, 2-naphthyl group, 1-anthryl group, 2-anthryl group, 9-anthryl group; quinolinyl group, isoquinolinyl group, A polynuclear heterocyclic ring such as an acridinyl group or anthronyl group may be formed.
βâãããã·ã³ããã«åºã®å ·äœäŸãšããŠãβâãããã·ã³ããã«åºãïŒâã¡ããã·âβâãããã·ã³ããã«åºãïŒâããã·ã«âβâãããã·ã³ããã«åºãïŒâããŒãã«ãªããªã¯ãã«âβâãããã·ã³ããã«åºãªã©ãæããããã Specific examples of the β-nitrocinnamyl group include β-nitrocinnamyl group, 4-methoxy-β-nitrocinnamyl group, 4-dodecyl-β-nitrocinnamyl group, 4-perfluorooctyl-β-nitrocinna Examples include a mill group.
X1ãX3ã¯ãããããç¬ç«ããŠã¡ããã·åºããšããã·åºãããããã·åºãªã©ã®ççŽ æ°ïŒãïŒã®ã¢ã«ã³ãã·åºã衚ãã X 1 to X 3 each independently represents an alkoxy group having 1 to 5 carbon atoms such as a methoxy group, an ethoxy group, or a propoxy group.
Yã¯ãäžè¬åŒïŒ»ïŒïŒœåã¯ïŒ»ïŒïŒœã§è¡šãããçµåã瀺ãã
æ¬çºæã«ã·ã©ã³èªå°äœã¯ãæ¢ç¥ã®æ¹æ³ã«ããåæã§ããããäžè¬åŒïŒ»ïŒïŒœã§è¡šããããªãã·ã¢ããåºã®å ŽåãäŸãã°ãβâãããã·ã³ããã«ã¢ã«ã³ãŒã«èªå°äœãâŽâãžã¹ã¯ã·ã³ã€ããžã«ã«ãŒãããŒããšç¬¬ïŒã¢ãã³ã®ååšäžã«åå¿ãããŠãçæããã«ãŒãããŒããšã¢ããåºå«æã·ã©ã³ååç©ãšåå¿ãããŠè£œé ã§ãããβâãããã·ã³ããã«ã¢ã«ã³ãŒã«èªå°äœãšããŠã¯ãβâãããã·ã³ããã«ã¢ã«ã³ãŒã«ãïŒâã¡ããã·âβâãããã·ã³ããã«ã¢ã«ã³ãŒã«ãïŒâããã·ã«âβâãããã·ã³ããã«ã¢ã«ã³ãŒã«ãïŒâããŒãã«ãªããªã¯ãã«âβâãããã·ã³ããã«ã¢ã«ã³ãŒã«ãªã©ãæãããããã¢ããåºå«æã·ã©ã³ååç©ãšããŠã¯ãïŒâã¢ãããããã«ããªãšããã·ã·ã©ã³ãïŒâã¢ãããããã«ããªã¡ããã·ã·ã©ã³ãïŒâã¢ããããã«ããªãšããã·ã·ã©ã³ãïœâã¢ãããã§ãã«ããªã¡ããã·ã·ã©ã³ãïœâã¢ãããã§ãã«ããªã¡ããã·ã·ã©ã³ãïœâã¢ãããã§ãã«ããªã¡ããã·ã·ã©ã³ãªã©ãæããããã In the present invention, the silane derivative can be synthesized by a known method. When Y is an oxyamide group represented by the general formula [2], for example, it is produced by reacting a β-nitrocinnamyl alcohol derivative in the presence of NNâ²-disuccinimidyl carbonate and a tertiary amine. It can be produced by reacting a carbonate with an amino group-containing silane compound. β-nitrocinnamyl alcohol derivatives include β-nitrocinnamyl alcohol, 4-methoxy-β-nitrocinnamyl alcohol, 4-dodecyl-β-nitrocinnamyl alcohol, 4-perfluorooctyl-β-nitrocinnamyl Examples include alcohol. Examples of the amino group-containing silane compound include 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 4-aminobutyltriethoxysilane, m-aminophenyltrimethoxysilane, p-aminophenyltrimethoxysilane, p- Examples include aminophenyltrimethoxysilane.
ãäžè¬åŒïŒ»ïŒïŒœã§è¡šããããªãã·ã¹ã«ããã«åºã®å ŽåãïŒâïŒïŒâã¯ããã¹ã«ããã«ãã§ãã«ïŒãšãã«ããªã¡ããã·ã·ã©ã³ã®ãããªã¹ã«ããã«ã¯ããªãåºå«æã·ã©ã³ååç©ãšã第ïŒã¢ãã³ã®ååšäžã«Î²âãããã·ã³ããã«ã¢ã«ã³ãŒã«èªå°äœãåå¿ãããããšã«ãã補é ã§ããã When Y is an oxysulfonyl group represented by the general formula [3], a sulfonyl chloride group-containing silane compound such as 2- (4-chlorosulfonylphenyl) ethyltrimethoxysilane, and β- It can be produced by reacting a nitrocinnamyl alcohol derivative.
æ¬çºæã®ææ©èè圢æäœã¯ãåºäœè¡šé¢ã«ãæ¬çºæã®ã·ã©ã³èªå°äœã嫿ããææ©èèã圢æãããŠãªãããšãç¹åŸŽãšãããåºäœãšããŠã¯ãæ¬çºæã®ã·ã©ã³èªå°äœã嫿ããææ©èèã圢æã§ãããã®ã§ããã°ç¹ã«å¶éã¯ãªããäŸãã°ããœãŒãã¬ã©ã¹æ¿ãªã©ã®ã¬ã©ã¹åºæ¿ãã¬ã©ã¹ãªã©ã®è¡šé¢ã«é»æ¥µã圢æãããåºæ¿ã衚é¢ã«çµ¶çžå±€ã圢æãããåºæ¿ãã·ãªã³ã³ãŠãšãŒãåºæ¿ãªã©ã®ã·ãªã³ã³åºæ¿ãã»ã©ããã¯åºæ¿ãªã©ãæããããããŸããææ©èèã圢æããåã«ããªãŸã³ïŒè¶ 鳿³¢ïŒèžçæ°Žãã€ãªã³äº€ææ°Žãã¢ã«ã³ãŒã«ãªã©ã®æŽæµå€ãªã©ã«ããæŽæµããåŸã«äœ¿çšããããšãæãŸããã The organic thin film forming body of the present invention is characterized in that an organic thin film containing the silane derivative of the present invention is formed on the surface of a substrate. The substrate is not particularly limited as long as it can form an organic thin film containing the silane derivative of the present invention. Examples thereof include a glass substrate such as a soda glass plate, a substrate such as ITO glass on which an electrode is formed, a substrate on which an insulating layer is formed on a surface, a silicon substrate such as a silicon wafer substrate, and a ceramic substrate. Further, before forming the organic thin film, it is desirable to use after cleaning with ozone; ultrasonic; cleaning agents such as distilled water, ion-exchanged water and alcohol.
åºäœè¡šé¢ã«ãã·ã©ã³èªå°äœã嫿ããææ©èèã圢æããæ¹æ³ã¯ç¹ã«å¶éãããªããäŸãã°ãã·ã©ã³èªå°äœã®æº¶æ¶²ãåºäœã«å ¬ç¥ã®æ¹æ³ã§å¡åžããå¡èãå ç±ä¹Ÿç¥ããæ¹æ³ãæãããããå¡å·¥æ¹æ³ãšããŠã¯ãäŸãã°ããã£ããã³ã°æ³ãã¹ãã³ã³ãŒã¿ããã€ã³ãŒã¿ãªã©ã®å ¬ç¥ã®å¡å·¥è£ 眮ã䜿çšããå¡å·¥æ¹æ³ãæããããããŸããã·ã©ã³èªå°äœã®èžæ°äžã®é 眮ããŠååŠèžçãããæ¹æ³ãå©çšããããšãã§ããã The method for forming an organic thin film containing a silane derivative on the substrate surface is not particularly limited. For example, the method of apply | coating the solution of a silane derivative to a base | substrate by a well-known method, and heat-drying a coating film is mentioned. Examples of the coating method include a coating method using a known coating apparatus such as a dipping method, a spin coater, or a die coater. Moreover, the method of arrange | positioning under the vapor | steam of a silane derivative, and carrying out chemical vapor deposition can also be utilized.
ã·ã©ã³èªå°äœã溶解ããæº¶åªãšããŠã¯ãã·ã©ã³èªå°äœã«äžæŽ»æ§ã§ãããã·ã©ã³èªå°äœã溶解ãããã®ã§ããã°ç¹ã«å¶éãããªããäŸãã°ããã³ãŒã³ããã«ãšã³ããã·ã¬ã³ãªã©ã®è³éŠæçåæ°ŽçŽ é¡ããã³ã¿ã³ããããµã³ãªã©ã®èèªæçåæ°ŽçŽ é¡ãé ¢é žã¡ãã«ãé ¢é žãšãã«ãªã©ã®ãšã¹ãã«é¡ããžãšãã«ãšãŒãã«ãããã©ããããã©ã³ãïŒïŒïŒâãžãªããµã³ãªã©ã®ãšãŒãã«é¡ãã¢ã»ãã³ãã¡ãã«ãšãã«ã±ãã³ãã¡ãã«ã€ãœããã«ã±ãã³ãã·ã¯ããããµãã³ãªã©ã®ã±ãã³é¡ãã¡ã¿ããŒã«ãªã©ã®ã¢ã«ã³ãŒã«é¡ãã¯ãããã«ã ããžã¯ããã¡ã¿ã³ãªã©ã®å¡©çŽ æº¶å€é¡ãæããããã The solvent for dissolving the silane derivative is not particularly limited as long as it is inert to the silane derivative and dissolves the silane derivative. For example, aromatic hydrocarbons such as benzene, toluene and xylene, aliphatic hydrocarbons such as pentane and hexane, esters such as methyl acetate and ethyl acetate, ethers such as diethyl ether, tetrahydrofuran and 1,4-dioxane , Acetone, methyl ethyl ketone, methyl isobutyl ketone, ketones such as cyclohexanone, alcohols such as methanol, and chlorine solvents such as chloroform and dichloromethane.
ã·ã©ã³èªå°äœã®å¡èã圢æããåŸã溶åªãé€å»ããŠæèãå®äºããããã«ãïŒïŒïŒãïŒïŒïŒâçšåºŠã®å ç±ãããããšãæãŸããããŸããå€å±€ã«éãªã£ãææ©ååå±€ãé€å»ããããã«æº¶åªæŽæµããããšãæãŸãããåŸãããææ©èèå±€ã®åã¿ã¯ç¹ã«å¶éãããªãããéåžžãïŒãïŒïŒïŒïœïœçšåºŠã§ããã After forming the coating film of the silane derivative, it is desirable to heat at about 100 to 200 ° C. in order to remove the solvent and complete the film formation. In addition, it is desirable to perform solvent washing in order to remove the organic molecular layer that is stacked in multiple layers. The thickness of the obtained organic thin film layer is not particularly limited, but is usually about 1 to 100 nm.
åŸãããææ©èèã¯ã玫å€ç·ç §å°ã«ãã衚é¢ã®çæ°Žæ§ã倱ãããŠã芪氎æ§ã«å€åããæ§è³ªãæã€ããã®å€åã¯ã衚é¢ã®æ°Žæ¥è§Šè§ã枬å®ããããšã«ãã確èªã§ããããããã£ãŠãæ¬ã·ã©ã³èªå°äœã嫿ããææ©èèå±€ã圢æããåŸããã¹ã¯ãçšããŠãã¿ãŒã³ç¶ã«çŽ«å€ç·ãç §å°ããããšã«ãããçæ°Žæ§è¡šé¢ããã¿ãŒã³ç¶ã«èŠªæ°Žæ§ã«å€åãããããšãã§ããã The resulting organic thin film has the property that the hydrophobicity of the surface is lost by irradiation with ultraviolet rays and the surface becomes hydrophilic. This change can be confirmed by measuring the water contact angle of the surface. Therefore, after forming the organic thin film layer containing the silane derivative, the hydrophobic surface can be changed to hydrophilic in a pattern by irradiating ultraviolet rays in a pattern using a mask.
圢æãããåºæ¿äžã®èŠªæ°Žæ§âçæ°Žæ§ã®å·®ãå©çšããŠãéå±è§Šåªã®è¡šé¢ãžã®éžæåžçã«ãããããŠéå±é ç·åºæ¿ã補é ã§ããããŸããçèŽè¡šé¢ã®èŠªã€ã³ãæ§ã®å·®ãå©çšããŠãªãã»ããå°å·çã補é ã§ãããããã«ãã¹ã¯ãªãŒã³å°å·ãã€ã³ã¯ãžã§ããå°å·ã«ãããŠãã€ã³ãåå®¹åºæ¿äžã«æ¬çºæã®ã·ã©ã³èªå°äœã§ææ©èèã圢æããããšã«ãããå°åãããã®æšªæ¹åãžã®æ¡æ£ãå¶åŸ¡ããããšãã§ããããŸãã玫å€ç·ç §å°ã«ããçæããææ©é žåºãååŠåŠçã«ããæŽ»æ§åããæ¬¡ãã§æ±æ žæ§å®èœåºãå«ãå€äŸ¡å®èœåºå«æååç©ãææ©é žãšåå¿ãããããšã«ããé«ååã°ã©ããåºæ¿ã補é ããããšãã§ãããçšããããåºæ¿ãšããŠã¯ãéå±é ç·ãªã©ã®é»åã»é»æ°çŽ åããããããã€ãªããããªã©ã®å»ç蚺æçšçŽ åãç¥çµåè·¯ãªã©ã®çç©çŽ åãäœè£œããããã«çšãããããã®ã䜿çšããããšãã§ããã The metal wiring board can be manufactured by selectively adsorbing the metal catalyst on the surface using the difference between hydrophilicity and hydrophobicity on the formed board. Further, an offset printing plate can be produced by utilizing the difference in ink affinity on the surface of the plate cylinder. Furthermore, in screen printing or ink jet printing, by forming an organic thin film with the silane derivative of the present invention on an ink-receiving substrate, it is possible to control the lateral diffusion of printed dots. Moreover, a polymer graft substrate can also be produced by activating an organic acid group generated by ultraviolet irradiation by chemical treatment and then reacting a polyvalent functional group-containing compound containing a nucleophilic functional group with an organic acid. As the substrate to be used, those used for producing electronic / electrical elements such as metal wiring, medical diagnostic elements such as DNA chips and biochips, and biological elements such as neural circuits can be used.
ç §å°è£ 眮ã«çšããå æºãšããŠã¯ãæ°Žéã®èžæ°å§ãç¹ç¯äžã§ïŒãïŒïŒïŒ°ïœã§ãããããªãããããäœå§æ°Žéç¯ããããã¯ãã以äžã®å§åãæããé«å§æ°Žéç¯ãããã«é«ãå§åã®è¶ é«å§æ°Žéç¯ãèå äœãå¡åžãããæ°Žéç¯ãã¬ãŒã¶ãŒãèå 管ãå·é°æ¥µç®¡ããã®ä»ã®æŸé»ç®¡çãçšããããšãã§ããç¹ã«æ°Žéç¯ãå®çšäžå¥œãŸãããæ°Žéç¯ã®çºå ã¹ãã¯ãã«ã¯ïŒïŒïŒãïŒïŒïŒïœïœã®ç¯å²ã§ãããæ¬çºæã®ã·ã©ã³èªå°äœã嫿ããææ©èèãå¹ççã«å åå¿ãããã®ã«é©ããŠãããæ°Žéç¯ã«ã¯ãã¡ã¿ã«ãã©ã€ãã©ã³ããé«å§æ°Žéç¯ãè¶ é«å§æ°Žéç¯ãã¯ã»ãã³ãã©ãã·ã¥ã©ã³ãããã£ãŒãã©ã³ããã¬ãŒã¶ãŒãªã©ãå®çšåãããŠãããçºå æ³¢é·é åãšããŠã¯äžèšç¯å²ãå«ãã®ã§ã黿ºãµã€ãºãå ¥å匷床ãã©ã³ã圢ç¶ãªã©ã«å¿ããŠé©å®éžæããŠçšããããšãã§ããã As a light source used for the irradiation device, a so-called low-pressure mercury lamp whose mercury vapor pressure is 1 to 10 Pa during lighting, or a high-pressure mercury lamp having a pressure higher than that, an ultra-high-pressure mercury lamp with higher pressure, or a phosphor is applied. Mercury lamps, lasers, fluorescent tubes, cold cathode tubes, other discharge tubes, etc. can be used, and mercury lamps are particularly preferred in practice. The emission spectrum of the mercury lamp is in the range of 184 to 450 nm, which is suitable for efficiently photoreacting the organic thin film containing the silane derivative of the present invention. As mercury lamps, metal halide lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, xenon flash lamps, deep UV lamps, UV lasers, etc. have been put into practical use. It can be appropriately selected depending on the shape and the like.
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(Function)
The silane derivative of the present invention is a silane derivative containing a β-nitrocinnamyl group and a halogen atom and / or an alkoxy group, and an organic thin film forming body formed by forming an organic thin film containing the silane derivative of the present invention on a substrate Although the surface is hydrophobic, the β-nitrocinnamyl group in the organic thin film is photodetached and changed to hydrophilicity with relatively high sensitivity when irradiated with ultraviolet rays of 250 nm or more. By irradiating the pattern with ultraviolet rays using a mask or the like, hydrophilic patterning can be formed.
以äžã宿œäŸã«ããæ¬çºæãæŽã«è©³çްã«èª¬æããã Hereinafter, the present invention will be described in more detail with reference to examples.
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Synthesis example 1
Synthesis of silane derivative 1 1.89 g (8.97 mmol) of 3-methoxy-β-nitrocinnamyl alcohol,
2.31 g (9.02 mmol) of N, N-disuccinimidyl carbonate, 2.02 ml (27.0 mmol) of triethylamine, 20 ml of N, N-dimethylformamide in a 50 ml eggplant flask purged with nitrogen And stirred at room temperature for 5 hours. Thereafter, N, N-dimethylformamide was distilled off, and the resulting crude product was purified by column chromatography to obtain 2.48 g of 3-methoxy-β-nitrocinnamyl-N-hydroxysuccinimidyl carbonate. It was. Next, 1.08 g (3.24 mmol) of this compound, 0.72 g (3.25 mmol) of 3- (triethoxysilyl) propylamine and 50 ml of dry tetrahydrofuran in a 100 ml eggplant-type flask purged with nitrogen. The mixture was stirred and stirred at room temperature for 3 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 1.
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Synthesis example 2
Synthesis of silane derivative 2 1.89 g (8.97 mmol) of 3-methoxy-β-nitrocinnamyl alcohol,
2.31 g (9.02 mmol) of N, N-disuccinimidyl carbonate, 2.02 ml (27.0 mmol) of triethylamine, 20 ml of N, N-dimethylformamide in a 50 ml eggplant flask purged with nitrogen And stirred at room temperature for 5 hours. Thereafter, N, N-dimethylformamide was distilled off, and the resulting crude product was purified by column chromatography to obtain 2.48 g of 3-methoxy-β-nitrocinnamyl-N-hydroxysuccinimidyl carbonate. It was. Next, 1.08 g (3.24 mmol) of this compound, 0.77 g (3.25 mmol) of 4- (triethoxysilyl) butylamine, and 50 ml of dry tetrahydrofuran into a 100 ml eggplant-type flask purged with nitrogen. The mixture was stirred at room temperature for 3 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 2.
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Synthesis example 3
Synthesis of silane derivative 3 1.89 g (8.97 mmol) of 3-methoxy-β-nitrocinnamyl alcohol,
2.31 g (9.02 mmol) of N, N-disuccinimidyl carbonate, 2.02 ml (27.0 mmol) of triethylamine, 20 ml of N, N-dimethylformamide in a 50 ml eggplant flask purged with nitrogen And stirred at room temperature for 5 hours. Thereafter, N, N-dimethylformamide was distilled off, and the resulting crude product was purified by column chromatography to obtain 2.48 g of 3-methoxy-β-nitrocinnamyl-N-hydroxysuccinimidyl carbonate. It was. Next, 1.08 g (3.24 mmol) of this compound, 0.83 g (3.25 mmol) of 1- (4-anilino) -propyltrimethoxysilane, 100 ml of eggplant with 50 ml of dry tetrahydrofuran substituted with nitrogen. The flask was placed in and stirred at room temperature for 3 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 3.
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Synthesis example 4
Synthesis of Silane Derivative 4 In a stirred solution of 5.05 g (50 mmol) of triethylamine, 10.51 g (50 mmol) of 3-methoxy-β-nitrocinnamyl alcohol dissolved in 75 ml of benzene, 16.24 g (50 mmol) of 2- (4-chlorosulfonylphenyl) ethyltrimethoxysilane was added. The mixture was stirred for an additional 4 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 4.
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Synthesis example 5
In a stirred solution of 5.05 g (50 mmol) triethylamine, 14.56 g (50 mmol) 4-n-octyl-β-nitrocinnamyl alcohol dissolved in 75 ml benzene, 16.24 g (50 mmol) was dissolved. 2- (4-chlorosulfonylphenyl) ethyltrimethoxysilane was added. The mixture was stirred for an additional 4 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 5.
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Example 1
The silane derivative obtained in Synthesis Example 1 was dissolved in anhydrous toluene to obtain a solution having a concentration of 0.5% by weight. After ultrasonic cleaning with a detergent, followed by sequential cleaning with ion exchange water and ethanol, drying at 60 ° C. and immersing soda lime glass cleaned in an ozone generator in this solution, the substrate was pulled out and 10 ° C. at 150 ° C. Then, the multilayer adsorbed component was removed by ultrasonic cleaning in toluene, and an organic thin film of the silane derivative 1 was formed.
5 microliters of water was dripped using the micro syringe at the substrate surface in which the obtained organic thin film was formed, and it measured using the contact angle measuring device (Kyowa Interface Science company make CA-Z type) 60 seconds later. The surface of the substrate was irradiated with ultraviolet rays of 254 nm (sterile lamp, mW / cm 2 ), and the contact angle was measured every certain time. The results are shown in Table 1.
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An organic thin film was obtained in the same manner as in Example 1 except that silane derivatives 2 to 5 were used instead of silane derivative 1. The change of the water contact angle measurement of each obtained organic thin film and the water contact angle measurement by ultraviolet irradiation was measured. The results are also shown in Table 1.
衚ïŒããæãããªããã«ãæ¬çºæã®ã·ã©ã³èªå°äœïŒãïŒããåŸãããææ©èèã¯ã玫å€ç·ç §å°ã«ããæ°Žã«å¯Ÿããæ¥è§Šè§ãæéãšãšãã«æžå°ããçæ°Žæ§ãã芪氎æ§ã«å€åããããšãåããã As is clear from Table 1, the organic thin film obtained from the silane derivatives 1 to 5 of the present invention has a contact angle with water that decreases with time due to ultraviolet irradiation, and changes from hydrophobic to hydrophilic.
æ¬çºæã®ã·ã©ã³èªå°äœã¯çæ°Žæ§ã§ããããå®äŸ¡ãªæ°Žéç¯å æºããæŸå°ãããæ³¢é·ïŒïŒïŒïœïœä»¥äžã®çŽ«å€ç·ãç §å°ããããšã«ãããå åè§£ããŠèŠªæ°Žæ§ã«å€åããããšãã§ãããããé«æåºŠã§ããããŸããæ¬çºæã®ã·ã©ã³èªå°äœã§åºäœè¡šé¢ãèèã圢æãããšã玫å€ç·ç §å°ã«ãããåºäœè¡šé¢ãçæ°Žæ§ãã芪氎æ§ãžå€æããããšãã§ããããã芪氎æ§ãšçæ°Žæ§ã®å·®ãå©çšããŠãåºäœè¡šé¢ã«çš®ã ã®ç©è³ªã®ãã¿ãŒãã³ã°åœ¢æãå¯èœãšãªãããã®æ§è³ªãå©çšããŠãå°å·çãéå±é ç·ãªã©ã®é»åã»é»æ°çŽ åãDNAãããããã€ãªããããªã©ã®å»ç蚺æçšçŽ åãç¥çµåè·¯ãªã©ã®çç©çŽ åãªã©ãäœè£œããããã«çšããããšãã§ããã Although the silane derivative of the present invention is hydrophobic, it can be photodecomposed and changed to hydrophilicity by irradiation with ultraviolet rays having a wavelength of 250 nm or more emitted from an inexpensive mercury lamp light source, and has high sensitivity. Further, when a thin film is formed on the substrate surface with the silane derivative of the present invention, the substrate surface can be converted from hydrophobic to hydrophilic by ultraviolet irradiation. In addition, various materials can be patterned. Utilizing this property, it can be used to produce electronic / electric elements such as printing plates and metal wirings, medical diagnostic elements such as DNA chips and biochips, biological elements such as neural circuits, and the like.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005217543A JP2007031350A (en) | 2005-07-27 | 2005-07-27 | Silane derivative and organic thin film-forming article |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005217543A JP2007031350A (en) | 2005-07-27 | 2005-07-27 | Silane derivative and organic thin film-forming article |
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| Publication Number | Publication Date |
|---|---|
| JP2007031350A true JP2007031350A (en) | 2007-02-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2005217543A Pending JP2007031350A (en) | 2005-07-27 | 2005-07-27 | Silane derivative and organic thin film-forming article |
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| JP (1) | JP2007031350A (en) |
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2005
- 2005-07-27 JP JP2005217543A patent/JP2007031350A/en active Pending
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