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JP2007031350A - Silane derivative and organic thin film-forming article - Google Patents

Silane derivative and organic thin film-forming article Download PDF

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JP2007031350A
JP2007031350A JP2005217543A JP2005217543A JP2007031350A JP 2007031350 A JP2007031350 A JP 2007031350A JP 2005217543 A JP2005217543 A JP 2005217543A JP 2005217543 A JP2005217543 A JP 2005217543A JP 2007031350 A JP2007031350 A JP 2007031350A
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Satoshi Imahashi
聰 今橋
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Toyobo Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a silane derivative for forming organic thin films which can selectively convert the surfaces of substrates from a hydrophobic property into a hydrophilic property by the irradiation of low energy ultraviolet rays obtained from a low cost general purpose ultraviolet ray source, and to provide an organic thin film-forming article containing the silane derivative on the surface of a substrate. <P>SOLUTION: This silane derivative comprises a β-nitrocinnamyl group, and a halogen atom and/or an alkoxy group. An organic thin film obtained from the silane derivative is hydrophobic, but can be changed into a hydrophilic property by irradiating the organic thin film with ultraviolet rays having wavelengths of ≥250 nm radiated from low cost mercury lamp light sources to photo-decompose the β-nitrocinnamyl group. The organic thin film is highly sensitive. Hence, the difference between the hydrophilic property and the hydrophobic property can be utilized to form various patterns on the surfaces of substrates. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、゚レクトロニクス補品においお、安䟡な汎甚玫倖線光源から埗られる䜎゚ネルギヌ量の玫倖線照射によっお遞択的に基䜓衚面を疎氎性から芪氎性に倉換するこずができる有機薄膜を圢成するシラン誘導䜓、䞊びに基䜓衚面に該シラン誘導䜓を含有する有機薄膜圢成䜓に関する。   The present invention relates to a silane derivative that forms an organic thin film capable of selectively converting the surface of a substrate from hydrophobic to hydrophilic by irradiation with low-energy ultraviolet rays obtained from an inexpensive general-purpose ultraviolet light source in an electronic product, and the substrate The present invention relates to an organic thin film forming body containing the silane derivative on the surface.

゚レクトロニクス補品においお、光リ゜グラフィヌ法などを甚いおパタヌン圢成する工皋は煩雑で、倧量のフォトレゞスト材料や珟像液などの廃棄物が排出され、環境負荷の面から改善が求められる。そこで、感光局の厚みが単分子レベルである、数の感光性の有機薄膜を甚いたパタヌン圢成法の開発が行われおいる。   In an electronic product, the process of forming a pattern using a photolithographic method or the like is complicated, and a large amount of waste materials such as a photoresist material and a developer are discharged, and improvement is required in terms of environmental load. Therefore, development of a pattern forming method using a photosensitive organic thin film having a thickness of several nanometers and a photosensitive layer thickness of a single molecule has been performed.

フェニルトリクロロシランやベンゞルトリクロロシランなどのアリヌルシラン化合物やアルキルシラン化合物より基板䞊に圢成した疎氎性の自己組織化単分子膜にの波長の遠玫倖線を照射するず、珪玠―炭玠結合の開裂に䌎い基板衚面が芪氎化されるこずが蚘茉されおいる。非特蚱文献たた、パヌフルオロ炭化氎玠を含有するシラン誘導䜓から圢成された疎氎性単分子膜をの波長の遠玫倖線を照射するず、芪氎性に倉換できるこずが開瀺されおいる。特蚱文献   When a hydrophobic self-assembled monolayer formed on an arylsilane compound or alkylsilane compound such as phenyltrichlorosilane or benzyltrichlorosilane is irradiated with far-ultraviolet light having a wavelength of 193 nm, the silicon-carbon bond is broken. It is described that the substrate surface is hydrophilized. (Non-patent document 1) Further, it is disclosed that a hydrophobic monomolecular film formed from a silane derivative containing perfluorohydrocarbon can be converted to hydrophilic when irradiated with far-ultraviolet rays having a wavelength of 172 nm. (Patent Document 1)

䞊蚘した自己組織化単分子膜は遠玫倖線を照射するこずにより、疎氎性から芪氎性に倉換するこずができるが、光源ずしお遠玫倖線照射が必芁である。しかし、遠玫倖線光源は高䟡であり、安䟡な光源が望たれる。氎銀灯は䞀般に光源ずしお広く䜿甚され、安䟡である。したがっお安䟡な氎銀灯から攟射される玫倖線に察しお、高感床な感光性シラン誘導䜓が望たれおいる。   The above-described self-assembled monolayer can be converted from hydrophobic to hydrophilic by irradiating with far-ultraviolet rays, but irradiating with far-ultraviolet rays as a light source is necessary. However, the far ultraviolet light source is expensive, and an inexpensive light source is desired. Mercury lamps are generally widely used as light sources and are inexpensive. Therefore, a highly sensitive photosensitive silane derivative is desired for ultraviolet rays emitted from an inexpensive mercury lamp.

そこで、−ニトロベンゞル゚ステル含有シラン誘導䜓特蚱文献、、ベンゞルフェニルスルフィド基含有シラン誘導䜓特蚱文献、−ニトロアニリド基含有シラン誘導䜓特蚱文献などが開瀺されおいる。これらは、いずれも氎銀灯照射により芪氎性に倉化するが、ただ実甚䞊感床などの問題がある、さらに改善を芁する。   Therefore, o-nitrobenzyl ester-containing silane derivatives (Patent Documents 2 and 3), benzylphenyl sulfide group-containing silane derivatives (Patent Document 4), o-nitroanilide group-containing silane derivatives (Patent Document 5), and the like are disclosed. . All of these change to hydrophilicity by irradiation with a mercury lamp, but still have problems such as sensitivity in practical use, and further improvement is required.

Science、幎、巻、〜頁Science, 1991, 252, 551-554 特開−号公報JP 2000-282240 A 特開−号公報Japanese Patent Laid-Open No. 2002-80481 特開−号公報JP 2003-321479 A 特開−号公報Japanese Patent Laid-Open No. 2003-301059 特開−号公報JP 2004-231590 A

本発明の目的は、安䟡な汎甚玫倖線光源から埗られる䜎゚ネルギヌの玫倖線照射のよっお、基板衚面の疎氎性の有機薄膜を芪氎性に倉換するシラン誘導䜓を提䟛するこずである。   An object of the present invention is to provide a silane derivative that converts a hydrophobic organic thin film on a substrate surface into hydrophilicity by low-energy ultraviolet irradiation obtained from an inexpensive general-purpose ultraviolet light source.

本発明者らは、䞊蚘課題を解決すべく鋭意怜蚎した結果、β―ニトロシンナミル基を含有するシラン誘導䜓が基䜓衚面に有機薄膜を圢成でき、以䞊の玫倖線照射により比范的䜎゚ネルギヌでβ―ニトロシンナミル基が光脱離しお芪氎性ぞ倉換するこずを芋出し、本発明を完成するに至った。   As a result of intensive studies to solve the above problems, the present inventors have found that a silane derivative containing a β-nitrocinnamyl group can form an organic thin film on the surface of the substrate. -The inventors have found that the nitrocinnamyl group is photodetached and converted into hydrophilicity, and have completed the present invention.

すなわち、本発明は、β―ニトロシンナミル基、及びハロゲン原子及び又はアルコキシ基を含有するこずを特城ずするシラン誘導䜓であり、䞋蚘䞀般匏で衚されるこずを特城ずするシラン誘導䜓を提䟛するものである。

Figure 2007031350
匏䞭、は又はであり、は〜の敎数を衚す。R1〜R5は、それぞれ独立しお氎玠原子、ハロゲン原子、炭玠数〜のアルキル基、炭玠数〜のフルオロアルキル基、眮換基を有しおも良いアルコキシ基、眮換基を有しおも良いフェニル基、眮換基を有しおも良いベンゞル基、ニトロ基、シアノ基、アミノ基、アリヌル基を衚し、又、隣接しお倚栞芳銙族環又は倚栞耇玠環を圢成しおも良い。X1〜X3は、それぞれ独立しお炭玠数〜のアルコキシ基を衚す。R6は氎玠原子、炭玠数〜のアルキル基、炭玠数〜のフルオロアルキル基を衚し、Yは、䞀般匏又はで衚される結合を瀺す。
Figure 2007031350
Figure 2007031350
That is, the present invention is a silane derivative characterized by containing a β-nitrocinnamyl group, a halogen atom and / or an alkoxy group, and represented by the following general formula [1] Is to provide.
Figure 2007031350
(In the formula, m is 0 or 1, and n represents an integer of 1 to 20. Each of R 1 to R 5 independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, or a carbon number. 1 to 20 fluoroalkyl groups, optionally substituted alkoxy groups, optionally substituted phenyl groups, optionally substituted benzyl groups, nitro groups, cyano groups, amino groups, Represents an aryl group, and may be adjacent to form a polynuclear aromatic ring or polynuclear heterocycle, X 1 to X 3 each independently represents an alkoxy group having 1 to 5 carbon atoms, R 6 is A hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a fluoroalkyl group having 1 to 20 carbon atoms, and Y represents a bond represented by the general formula [2] or [3].
Figure 2007031350
Figure 2007031350

たた、本発明は、基䜓衚面に、本発明のシラン誘導䜓を含有する有機薄膜が圢成されおなる有機薄膜圢成䜓を提䟛する。 The present invention also provides an organic thin film forming body in which an organic thin film containing the silane derivative of the present invention is formed on a substrate surface.

本発明のシラン誘導䜓は疎氎性であるが、安䟡な氎銀灯光源から攟射される波長以䞊の玫倖線を照射するこずにより、光分解しお芪氎性に倉化するこずができる。したがっお、本発明のシラン誘導䜓で基䜓衚面を薄膜を圢成するず、玫倖線照射により、基䜓衚面を疎氎性から芪氎性ぞ倉換するこずができるため、芪氎性ず疎氎性の差を利甚しお、基䜓衚面に皮々の物質のパタヌニング圢成が可胜ずなる。   Although the silane derivative of the present invention is hydrophobic, it can be photodecomposed and changed to hydrophilicity by irradiation with ultraviolet rays having a wavelength of 250 nm or more emitted from an inexpensive mercury lamp light source. Therefore, when a thin film is formed on the substrate surface with the silane derivative of the present invention, the substrate surface can be converted from hydrophobic to hydrophilic by ultraviolet irradiation. In addition, various materials can be patterned.

本発明のシラン誘導䜓及び有機薄膜圢成䜓を詳现に説明する。
本発明のシラン誘導䜓は、前蚘䞀般匏で衚される化合物である。匏䞭、は又はであり、は〜の敎数を衚す。R6は氎玠原子、炭玠数〜のアルキル基、炭玠数〜のフルオロアルキル基を衚し、具䜓的には、メチル基、゚チル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基、トリフルオロメチル基、パヌフルオロオクチル基などが挙げられる。
The silane derivative and organic thin film forming body of the present invention will be described in detail.
The silane derivative of the present invention is a compound represented by the general formula [1]. In the formula, m is 0 or 1, and n represents an integer of 1 to 20. R 6 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a fluoroalkyl group having 1 to 20 carbon atoms, specifically, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, Examples include heptyl group, octyl group, nonyl group, decyl group, dodecyl group, trifluoromethyl group, perfluorooctyl group and the like.

R1〜R5は、それぞれ独立しお氎玠原子フッ玠原子、塩玠原子、臭玠原子などのハロゲン原子メチル基、゚チル基、プロピル基、ブチル基、−ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基など炭玠数〜のアルキル基フルオロメチル基、トリフルオロメチル基、、−トリフルオロ゚チル基、ヘプタフルオロプロピル基、ノナフルオロブチル基、パヌフルオロペンチル基、パヌフルオロヘキシル基、パヌフルオロオクチル基、パヌフルオロノニル基、パヌフルオロデシル基などの炭玠数〜のフルオロアルキル基メトキシ基、゚トキシ基、プロポキシ基、む゜プロポキシ基、ブトキシ基、−ブトキシ基、トリフルオロメトキシ基などの眮換基を有しおも良いアルコキシ基フェニル基、−フルオロフェニル基、−クロロフェニル基、−ニトロフェニル基、−メチルフェニル基、−ゞメトキシフェニル基、ペンタフルオロフェニル基などの眮換基を有しおも良いフェニル基ベンゞル基、−クロロベンゞル基、−メチルベンゞル基、−ゞフルオロベンゞル基、ペンタフルオロベンゞル基などの眮換基を有しおも良いベンゞル基ニトロ基、シアノ基、アミノ基、アリヌル基を衚し、又、隣接しお−ナフチル基、−ナフチル基、−アンスリル基、−アンスリル基、−アンスリル基などの倚栞芳銙族環キノリニル基、む゜キノリニル基、アクリゞニル基、アンスロニル基などの倚栞耇玠環を圢成しおも良い。 R 1 to R 5 are each independently a hydrogen atom; a halogen atom such as a fluorine atom, a chlorine atom, or a bromine atom; a methyl group, an ethyl group, a propyl group, a butyl group, a t-butyl group, a pentyl group, a hexyl group, C1-C20 alkyl groups such as heptyl, octyl, nonyl, decyl, dodecyl; fluoromethyl, trifluoromethyl, 2,2,2, -trifluoroethyl, heptafluoropropyl, C1-C20 fluoroalkyl group such as nonafluorobutyl group, perfluoropentyl group, perfluorohexyl group, perfluorooctyl group, perfluorononyl group, perfluorodecyl group; methoxy group, ethoxy group, propoxy group, A substituent that may have a substituent such as isopropoxy group, butoxy group, t-butoxy group, trifluoromethoxy group, etc. Lucoxy group; may have a substituent such as phenyl group, 4-fluorophenyl group, 2-chlorophenyl group, 2-nitrophenyl group, 3-methylphenyl group, 2,4-dimethoxyphenyl group, pentafluorophenyl group Good phenyl group; benzyl group, 4-chlorobenzyl group, 2-methylbenzyl group, 2,4-difluorobenzyl group, benzyl group which may have a substituent such as pentafluorobenzyl group; nitro group, cyano group, Represents an amino group, an aryl group, and is adjacent to a polynuclear aromatic ring such as 1-naphthyl group, 2-naphthyl group, 1-anthryl group, 2-anthryl group, 9-anthryl group; quinolinyl group, isoquinolinyl group, A polynuclear heterocyclic ring such as an acridinyl group or anthronyl group may be formed.

β―ニトロシンナミル基の具䜓䟋ずしお、β―ニトロシンナミル基、−メトキシ−β―ニトロシンナミル基、−ドデシル−β―ニトロシンナミル基、−パヌフルオロオクチル−β―ニトロシンナミル基などが挙げられる。 Specific examples of the β-nitrocinnamyl group include β-nitrocinnamyl group, 4-methoxy-β-nitrocinnamyl group, 4-dodecyl-β-nitrocinnamyl group, 4-perfluorooctyl-β-nitrocinna Examples include a mill group.

X1〜X3は、それぞれ独立しおメトキシ基、゚トキシ基、プロポキシ基などの炭玠数〜のアルコキシ基を衚す。 X 1 to X 3 each independently represents an alkoxy group having 1 to 5 carbon atoms such as a methoxy group, an ethoxy group, or a propoxy group.

Yは、䞀般匏又はで衚される結合を瀺す。

Figure 2007031350
Figure 2007031350
Y represents a bond represented by the general formula [2] or [3].
Figure 2007031350
Figure 2007031350

本発明にシラン誘導䜓は、既知の方法により合成できる。が䞀般匏で衚されるオキシアミド基の堎合、䟋えば、β−ニトロシンナミルアルコヌル誘導䜓を−Ž−ゞスクシンむミゞルカヌボネヌトず第アミンの存圚䞋に反応させお、生成したカヌボネヌトずアミノ基含有シラン化合物ず反応させお補造できる。β−ニトロシンナミルアルコヌル誘導䜓ずしおは、β―ニトロシンナミルアルコヌル、−メトキシ−β―ニトロシンナミルアルコヌル、−ドデシル−β―ニトロシンナミルアルコヌル、−パヌフルオロオクチル−β―ニトロシンナミルアルコヌルなどが挙げられる。アミノ基含有シラン化合物ずしおは、−アミノプロピルトリ゚トキシシラン、−アミノプロピルトリメトキシシラン、−アミノブチルトリ゚トキシシラン、−アミノフェニルトリメトキシシラン、−アミノフェニルトリメトキシシラン、−アミノフェニルトリメトキシシランなどが挙げられる。 In the present invention, the silane derivative can be synthesized by a known method. When Y is an oxyamide group represented by the general formula [2], for example, it is produced by reacting a β-nitrocinnamyl alcohol derivative in the presence of NN′-disuccinimidyl carbonate and a tertiary amine. It can be produced by reacting a carbonate with an amino group-containing silane compound. β-nitrocinnamyl alcohol derivatives include β-nitrocinnamyl alcohol, 4-methoxy-β-nitrocinnamyl alcohol, 4-dodecyl-β-nitrocinnamyl alcohol, 4-perfluorooctyl-β-nitrocinnamyl Examples include alcohol. Examples of the amino group-containing silane compound include 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 4-aminobutyltriethoxysilane, m-aminophenyltrimethoxysilane, p-aminophenyltrimethoxysilane, p- Examples include aminophenyltrimethoxysilane.

が䞀般匏で衚されるオキシスルホニル基の堎合、−−クロロスルホニルフェニル゚チルトリメトキシシランのようなスルホニルクロリド基含有シラン化合物ず、第アミンの存圚䞋にβ−ニトロシンナミルアルコヌル誘導䜓を反応させるこずにより補造できる。 When Y is an oxysulfonyl group represented by the general formula [3], a sulfonyl chloride group-containing silane compound such as 2- (4-chlorosulfonylphenyl) ethyltrimethoxysilane, and β- It can be produced by reacting a nitrocinnamyl alcohol derivative.

本発明の有機薄膜圢成䜓は、基䜓衚面に、本発明のシラン誘導䜓を含有する有機薄膜が圢成されおなるこずを特城ずする。基䜓ずしおは、本発明のシラン誘導䜓を含有する有機薄膜を圢成できるものであれば特に制限はない。䟋えば、゜ヌダガラス板などのガラス基板、ガラスなどの衚面に電極が圢成された基板、衚面に絶瞁局が圢成された基板、シリコンり゚ヌハ基板などのシリコン基板、セラミック基板などが挙げられる。たた、有機薄膜を圢成する前に、オゟン超音波蒞留氎、むオン亀換氎、アルコヌルなどの掗浄剀などにより掗浄した埌に䜿甚するこずが望たしい。 The organic thin film forming body of the present invention is characterized in that an organic thin film containing the silane derivative of the present invention is formed on the surface of a substrate. The substrate is not particularly limited as long as it can form an organic thin film containing the silane derivative of the present invention. Examples thereof include a glass substrate such as a soda glass plate, a substrate such as ITO glass on which an electrode is formed, a substrate on which an insulating layer is formed on a surface, a silicon substrate such as a silicon wafer substrate, and a ceramic substrate. Further, before forming the organic thin film, it is desirable to use after cleaning with ozone; ultrasonic; cleaning agents such as distilled water, ion-exchanged water and alcohol.

基䜓衚面に、シラン誘導䜓を含有する有機薄膜を圢成する方法は特に制限されない。䟋えば、シラン誘導䜓の溶液を基䜓に公知の方法で塗垃し、塗膜を加熱也燥する方法が挙げられる。塗工方法ずしおは、䟋えば、ディッピング法、スピンコヌタ、ダむコヌタなどの公知の塗工装眮を䜿甚する塗工方法が挙げられる。たた、シラン誘導䜓の蒞気䞋の配眮しお化孊蒞着させる方法を利甚するこずもできる。 The method for forming an organic thin film containing a silane derivative on the substrate surface is not particularly limited. For example, the method of apply | coating the solution of a silane derivative to a base | substrate by a well-known method, and heat-drying a coating film is mentioned. Examples of the coating method include a coating method using a known coating apparatus such as a dipping method, a spin coater, or a die coater. Moreover, the method of arrange | positioning under the vapor | steam of a silane derivative, and carrying out chemical vapor deposition can also be utilized.

シラン誘導䜓を溶解する溶媒ずしおは、シラン誘導䜓に䞍掻性であり、シラン誘導䜓を溶解するものであれば特に制限されない。䟋えば、ベンれン、トル゚ン、キシレンなどの芳銙族炭化氎玠類、ペンタン、ヘキサンなどの脂肪族炭化氎玠類、酢酞メチル、酢酞゚チルなどの゚ステル類、ゞ゚チル゚ヌテル、テトラヒドロフラン、−ゞオキサンなどの゚ヌテル類、アセトン、メチル゚チルケトン、メチルむ゜ブチルケトン、シクロヘキサノンなどのケトン類、メタノヌルなどのアルコヌル類、クロロホルム、ゞクロロメタンなどの塩玠溶剀類が挙げられる。 The solvent for dissolving the silane derivative is not particularly limited as long as it is inert to the silane derivative and dissolves the silane derivative. For example, aromatic hydrocarbons such as benzene, toluene and xylene, aliphatic hydrocarbons such as pentane and hexane, esters such as methyl acetate and ethyl acetate, ethers such as diethyl ether, tetrahydrofuran and 1,4-dioxane , Acetone, methyl ethyl ketone, methyl isobutyl ketone, ketones such as cyclohexanone, alcohols such as methanol, and chlorine solvents such as chloroform and dichloromethane.

シラン誘導䜓の塗膜を圢成した埌、溶媒を陀去しお成膜を完了するために、〜℃皋床の加熱をするこずが望たしい。たた、倚局に重なった有機分子局を陀去するために溶媒掗浄するこずが望たしい。埗られる有機薄膜局の厚みは特に制限されないが、通垞、〜皋床である。 After forming the coating film of the silane derivative, it is desirable to heat at about 100 to 200 ° C. in order to remove the solvent and complete the film formation. In addition, it is desirable to perform solvent washing in order to remove the organic molecular layer that is stacked in multiple layers. The thickness of the obtained organic thin film layer is not particularly limited, but is usually about 1 to 100 nm.

埗られる有機薄膜は、玫倖線照射により衚面の疎氎性が倱われお、芪氎性に倉化する性質を持぀。この倉化は、衚面の氎接觊角を枬定するこずにより確認できる。したがっお、本シラン誘導䜓を含有する有機薄膜局を圢成した埌、マスクを甚いおパタヌン状に玫倖線を照射するこずにより、疎氎性衚面がパタヌン状に芪氎性に倉化させるこずができる。 The resulting organic thin film has the property that the hydrophobicity of the surface is lost by irradiation with ultraviolet rays and the surface becomes hydrophilic. This change can be confirmed by measuring the water contact angle of the surface. Therefore, after forming the organic thin film layer containing the silane derivative, the hydrophobic surface can be changed to hydrophilic in a pattern by irradiating ultraviolet rays in a pattern using a mask.

圢成された基板䞊の芪氎性―疎氎性の差を利甚しお、金属觊媒の衚面ぞの遞択吞着によりさせお金属配線基板を補造できる。たた、版胎衚面の芪むンキ性の差を利甚しおオフセット印刷版を補造できる。さらに、スクリヌン印刷やむンクゞェット印刷においお、むンキ受容基板䞊に本発明のシラン誘導䜓で有機薄膜を圢成するこずにより、印字ドットの暪方向ぞの拡散を制埡するこずができる。たた、玫倖線照射により生成した有機酞基を化孊凊理により掻性化し、次いで求栞性官胜基を含む倚䟡官胜基含有化合物を有機酞ず反応させるこずにより高分子グラフト基板も補造するこずができる。甚いられる基板ずしおは、金属配線などの電子・電気玠子、チップ、バむオチップなどの医療蚺断甚玠子、神経回路などの生物玠子を䜜補するために甚いられるものを䜿甚するこずができる。 The metal wiring board can be manufactured by selectively adsorbing the metal catalyst on the surface using the difference between hydrophilicity and hydrophobicity on the formed board. Further, an offset printing plate can be produced by utilizing the difference in ink affinity on the surface of the plate cylinder. Furthermore, in screen printing or ink jet printing, by forming an organic thin film with the silane derivative of the present invention on an ink-receiving substrate, it is possible to control the lateral diffusion of printed dots. Moreover, a polymer graft substrate can also be produced by activating an organic acid group generated by ultraviolet irradiation by chemical treatment and then reacting a polyvalent functional group-containing compound containing a nucleophilic functional group with an organic acid. As the substrate to be used, those used for producing electronic / electrical elements such as metal wiring, medical diagnostic elements such as DNA chips and biochips, and biological elements such as neural circuits can be used.

照射装眮に甚いる光源ずしおは、氎銀の蒞気圧が点灯䞭で〜であるような、いわゆる䜎圧氎銀灯、あるいはそれ以䞊の圧力を有する高圧氎銀灯、さらに高い圧力の超高圧氎銀灯、蛍光䜓が塗垃された氎銀灯、レヌザヌ、蛍光管、冷陰極管、その他の攟電管等を甚いるこずができ、特に氎銀灯が実甚䞊奜たしい。氎銀灯の発光スペクトルは〜の範囲であり、本発明のシラン誘導䜓を含有する有機薄膜を効率的に光反応させるのに適しおいる。氎銀灯には、メタルハラむドランプ、高圧氎銀灯、超高圧氎銀灯、クセノンフラッシュランプ、ディヌプランプ、レヌザヌなどが実甚化されおおり、発光波長領域ずしおは䞊蚘範囲を含むので、電源サむズ、入力匷床、ランプ圢状などに応じお適宜遞択しお甚いるこずができる。 As a light source used for the irradiation device, a so-called low-pressure mercury lamp whose mercury vapor pressure is 1 to 10 Pa during lighting, or a high-pressure mercury lamp having a pressure higher than that, an ultra-high-pressure mercury lamp with higher pressure, or a phosphor is applied. Mercury lamps, lasers, fluorescent tubes, cold cathode tubes, other discharge tubes, etc. can be used, and mercury lamps are particularly preferred in practice. The emission spectrum of the mercury lamp is in the range of 184 to 450 nm, which is suitable for efficiently photoreacting the organic thin film containing the silane derivative of the present invention. As mercury lamps, metal halide lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, xenon flash lamps, deep UV lamps, UV lasers, etc. have been put into practical use. It can be appropriately selected depending on the shape and the like.

䜜甚
本発明のシラン誘導䜓は、β―ニトロシンナミリ基及びハロゲン原子及び又はアルコキシ基を含有するシラン誘導䜓であり、基䜓䞊に本発明のシラン誘導䜓を含有する有機薄膜を圢成しおなる有機薄膜圢成䜓は衚面が疎氎性であるが、以䞊の玫倖線照射により比范的高感床で有機薄膜䞭のβ―ニトロシンナミリ基が光脱離しお芪氎性ぞ倉化する。マスクなどを甚いおパタヌン状に玫倖線照射するこずにより、芪氎性のパタヌニング圢成が可胜ずなる。
(Function)
The silane derivative of the present invention is a silane derivative containing a β-nitrocinnamyl group and a halogen atom and / or an alkoxy group, and an organic thin film forming body formed by forming an organic thin film containing the silane derivative of the present invention on a substrate Although the surface is hydrophobic, the β-nitrocinnamyl group in the organic thin film is photodetached and changed to hydrophilicity with relatively high sensitivity when irradiated with ultraviolet rays of 250 nm or more. By irradiating the pattern with ultraviolet rays using a mask or the like, hydrophilic patterning can be formed.

以䞋、実斜䟋により本発明を曎に詳现に説明する。 Hereinafter, the present invention will be described in more detail with reference to examples.

合成䟋
シラン誘導䜓の合成
ミリモルの−メトキシ−β―ニトロシンナミルアルコヌル、
ミリモルの−ゞスクシンむミゞルカヌボネヌト、ミリモルのトリ゚チルアミン、の−ゞメチルホルムアミドを窒玠眮換したのナスフラスコの䞭に入れ、宀枩で時間攪拌した。その埌、−ゞメチルホルムアミドを留去し、埗られた粗補物をカラムクロマトグラフィヌで粟補しおの−メトキシ−β―ニトロシンナミル−―ヒドロキシスクシンむミゞルカヌボネヌトを埗た。次にこの化合物をミリモルず、ミリモルの−トリ゚トキシシリルプロピルアミン、の也燥テトラヒドロフランを窒玠眮換したのナスフラスコの䞭ぞいれ、宀枩で時間攪拌した。反応埌、溶媒を留去し、埗られる粗補物をカラムクロマトグラフィヌで粟補しお、シラン誘導䜓を埗た。
Synthesis example 1
Synthesis of silane derivative 1 1.89 g (8.97 mmol) of 3-methoxy-β-nitrocinnamyl alcohol,
2.31 g (9.02 mmol) of N, N-disuccinimidyl carbonate, 2.02 ml (27.0 mmol) of triethylamine, 20 ml of N, N-dimethylformamide in a 50 ml eggplant flask purged with nitrogen And stirred at room temperature for 5 hours. Thereafter, N, N-dimethylformamide was distilled off, and the resulting crude product was purified by column chromatography to obtain 2.48 g of 3-methoxy-β-nitrocinnamyl-N-hydroxysuccinimidyl carbonate. It was. Next, 1.08 g (3.24 mmol) of this compound, 0.72 g (3.25 mmol) of 3- (triethoxysilyl) propylamine and 50 ml of dry tetrahydrofuran in a 100 ml eggplant-type flask purged with nitrogen. The mixture was stirred and stirred at room temperature for 3 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 1.

合成䟋
シラン誘導䜓の合成
ミリモルの−メトキシ−β―ニトロシンナミルアルコヌル、
ミリモルの−ゞスクシンむミゞルカヌボネヌト、ミリモルのトリ゚チルアミン、の−ゞメチルホルムアミドを窒玠眮換したのナスフラスコの䞭に入れ、宀枩で時間攪拌した。その埌、−ゞメチルホルムアミドを留去し、埗られた粗補物をカラムクロマトグラフィヌで粟補しおの−メトキシ−β―ニトロシンナミル−―ヒドロキシスクシンむミゞルカヌボネヌトを埗た。次にこの化合物をミリモルず、ミリモルの−トリ゚トキシシリルブチルアミン、の也燥テトラヒドロフランを窒玠眮換したのナスフラスコの䞭ぞいれ、宀枩で時間攪拌した。反応埌、溶媒を留去し、埗られる粗補物をカラムクロマトグラフィヌで粟補しおシラン誘導䜓を埗た。
Synthesis example 2
Synthesis of silane derivative 2 1.89 g (8.97 mmol) of 3-methoxy-β-nitrocinnamyl alcohol,
2.31 g (9.02 mmol) of N, N-disuccinimidyl carbonate, 2.02 ml (27.0 mmol) of triethylamine, 20 ml of N, N-dimethylformamide in a 50 ml eggplant flask purged with nitrogen And stirred at room temperature for 5 hours. Thereafter, N, N-dimethylformamide was distilled off, and the resulting crude product was purified by column chromatography to obtain 2.48 g of 3-methoxy-β-nitrocinnamyl-N-hydroxysuccinimidyl carbonate. It was. Next, 1.08 g (3.24 mmol) of this compound, 0.77 g (3.25 mmol) of 4- (triethoxysilyl) butylamine, and 50 ml of dry tetrahydrofuran into a 100 ml eggplant-type flask purged with nitrogen. The mixture was stirred at room temperature for 3 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 2.

合成䟋
シラン誘導䜓の合成
ミリモルの−メトキシ−β―ニトロシンナミルアルコヌル、
ミリモルの−ゞスクシンむミゞルカヌボネヌト、ミリモルのトリ゚チルアミン、の−ゞメチルホルムアミドを窒玠眮換したのナスフラスコの䞭に入れ、宀枩で時間攪拌した。その埌、−ゞメチルホルムアミドを留去し、埗られた粗補物をカラムクロマトグラフィヌで粟補しおの−メトキシ−β―ニトロシンナミル−―ヒドロキシスクシンむミゞルカヌボネヌトを埗た。次にこの化合物をミリモルず、ミリモルの−−アニリノ−プロピルトリメトキシシラン、の也燥テトラヒドロフランを窒玠眮換したのナスフラスコの䞭ぞいれ、宀枩で時間攪拌した。反応埌、溶媒を留去し、埗られる粗補物をカラムクロマトグラフィヌで粟補しおシラン誘導䜓を埗た。
Synthesis example 3
Synthesis of silane derivative 3 1.89 g (8.97 mmol) of 3-methoxy-β-nitrocinnamyl alcohol,
2.31 g (9.02 mmol) of N, N-disuccinimidyl carbonate, 2.02 ml (27.0 mmol) of triethylamine, 20 ml of N, N-dimethylformamide in a 50 ml eggplant flask purged with nitrogen And stirred at room temperature for 5 hours. Thereafter, N, N-dimethylformamide was distilled off, and the resulting crude product was purified by column chromatography to obtain 2.48 g of 3-methoxy-β-nitrocinnamyl-N-hydroxysuccinimidyl carbonate. It was. Next, 1.08 g (3.24 mmol) of this compound, 0.83 g (3.25 mmol) of 1- (4-anilino) -propyltrimethoxysilane, 100 ml of eggplant with 50 ml of dry tetrahydrofuran substituted with nitrogen. The flask was placed in and stirred at room temperature for 3 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 3.

合成䟋
シラン誘導䜓の合成
のベンれンにミリモルのトリ゚チルアミン、ミリモルの−メトキシ−β―ニトロシンナミルアルコヌルを加えお溶解した攪拌溶液䞭に、ミリモルの−−クロロスルホニルフェニル゚チルトリメトキシシランを加えた。混合物をさらに時間攪拌した。反応埌、溶媒を留去し、埗られる粗補物をカラムクロマトグラフィヌで粟補しおシラン誘導䜓を埗た。
Synthesis example 4
Synthesis of Silane Derivative 4 In a stirred solution of 5.05 g (50 mmol) of triethylamine, 10.51 g (50 mmol) of 3-methoxy-β-nitrocinnamyl alcohol dissolved in 75 ml of benzene, 16.24 g (50 mmol) of 2- (4-chlorosulfonylphenyl) ethyltrimethoxysilane was added. The mixture was stirred for an additional 4 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 4.

合成䟋
のベンれンにミリモルのトリ゚チルアミン、ミリモルの−−オクチル−β―ニトロシンナミルアルコヌルを加えお溶解した攪拌溶液䞭に、ミリモルの−−クロロスルホニルフェニル゚チルトリメトキシシランを加えた。混合物をさらに時間攪拌した。反応埌、溶媒を留去し、埗られる粗補物をカラムクロマトグラフィヌで粟補しおシラン誘導䜓を埗た。
Synthesis example 5
In a stirred solution of 5.05 g (50 mmol) triethylamine, 14.56 g (50 mmol) 4-n-octyl-β-nitrocinnamyl alcohol dissolved in 75 ml benzene, 16.24 g (50 mmol) was dissolved. 2- (4-chlorosulfonylphenyl) ethyltrimethoxysilane was added. The mixture was stirred for an additional 4 hours. After the reaction, the solvent was distilled off, and the resulting crude product was purified by column chromatography to obtain silane derivative 5.

実斜䟋
合成䟋で埗たシラン誘導䜓を無氎トル゚ンに溶解しお、濃床重量の溶液を埗た。掗剀ず共に超音波掗浄し、次いでむオン亀換氎、゚タノヌルで順次掗浄した埌に℃で也燥し、オゟン発生装眮䞭で掗浄した゜ヌダラむムガラスをこの溶液に浞挬した埌、基板を匕き出し、℃で分間加熱熟成し、続いお、トル゚ン䞭、超音波掗浄により、倚局の吞着分を陀去し、シラン誘導䜓の有機薄膜を成膜した。
埗られた有機薄膜を圢成した基板衚面に、氎Όをマむクロシリンゞを甚いお滎䞋しお、秒埌に、接觊角枬定噚協和界面科孊瀟補−型を甚いお枬定した。この基板衚面にの玫倖線殺菌灯、 /2を照射し、䞀定時間経過毎に接觊角を枬定した。その結果を衚に瀺す。
Example 1
The silane derivative obtained in Synthesis Example 1 was dissolved in anhydrous toluene to obtain a solution having a concentration of 0.5% by weight. After ultrasonic cleaning with a detergent, followed by sequential cleaning with ion exchange water and ethanol, drying at 60 ° C. and immersing soda lime glass cleaned in an ozone generator in this solution, the substrate was pulled out and 10 ° C. at 150 ° C. Then, the multilayer adsorbed component was removed by ultrasonic cleaning in toluene, and an organic thin film of the silane derivative 1 was formed.
5 microliters of water was dripped using the micro syringe at the substrate surface in which the obtained organic thin film was formed, and it measured using the contact angle measuring device (Kyowa Interface Science company make CA-Z type) 60 seconds later. The surface of the substrate was irradiated with ultraviolet rays of 254 nm (sterile lamp, mW / cm 2 ), and the contact angle was measured every certain time. The results are shown in Table 1.

実斜䟋〜
シラン誘導䜓の代わりにシラン誘導䜓〜を甚いる他は、実斜䟋ず同様の操䜜を行い有機薄膜を埗た。埗られた有機薄膜それぞれの氎接觊角枬定および玫倖線照射による氎接觊角枬定の倉化を枬定した。それらの結果を衚に䜵蚘する。

Figure 2007031350
Examples 2-5
An organic thin film was obtained in the same manner as in Example 1 except that silane derivatives 2 to 5 were used instead of silane derivative 1. The change of the water contact angle measurement of each obtained organic thin film and the water contact angle measurement by ultraviolet irradiation was measured. The results are also shown in Table 1.
Figure 2007031350

衚より明らかなように、本発明のシラン誘導䜓〜から埗られる有機薄膜は、玫倖線照射により氎に察する接觊角が時間ずずもに枛少し、疎氎性から芪氎性に倉化するこずが分かる。 As is clear from Table 1, the organic thin film obtained from the silane derivatives 1 to 5 of the present invention has a contact angle with water that decreases with time due to ultraviolet irradiation, and changes from hydrophobic to hydrophilic.

本発明のシラン誘導䜓は疎氎性であるが、安䟡な氎銀灯光源から攟射される波長以䞊の玫倖線を照射するこずにより、光分解しお芪氎性に倉化するこずができ、しかも高感床である。たた、本発明のシラン誘導䜓で基䜓衚面を薄膜を圢成するず、玫倖線照射により、基䜓衚面を疎氎性から芪氎性ぞ倉換するこずができるため、芪氎性ず疎氎性の差を利甚しお、基䜓衚面に皮々の物質のパタヌニング圢成が可胜ずなる。この性質を利甚しお、印刷版、金属配線などの電子・電気玠子、DNAチップ、バむオチップなどの医療蚺断甚玠子、神経回路などの生物玠子などを䜜補するために甚いるこずができる。 Although the silane derivative of the present invention is hydrophobic, it can be photodecomposed and changed to hydrophilicity by irradiation with ultraviolet rays having a wavelength of 250 nm or more emitted from an inexpensive mercury lamp light source, and has high sensitivity. Further, when a thin film is formed on the substrate surface with the silane derivative of the present invention, the substrate surface can be converted from hydrophobic to hydrophilic by ultraviolet irradiation. In addition, various materials can be patterned. Utilizing this property, it can be used to produce electronic / electric elements such as printing plates and metal wirings, medical diagnostic elements such as DNA chips and biochips, biological elements such as neural circuits, and the like.

Claims (3)

β―ニトロシンナミル基、及びハロゲン原子又はアルコキシ基を含有するこずを特城ずするシラン誘導䜓。 A silane derivative containing a β-nitrocinnamyl group and a halogen atom or an alkoxy group. 䞋蚘䞀般匏で衚されるこずを特城ずするシラン誘導䜓。
Figure 2007031350
匏䞭、は又はであり、は〜の敎数を衚す。R1〜R5は、それぞれ独立しお氎玠原子、ハロゲン原子、炭玠数〜のアルキル基、炭玠数〜のフルオロアルキル基、眮換基を有しおも良いアルコキシ基、眮換基を有しおも良いフェニル基、眮換基を有しおも良いベンゞル基、ニトロ基、シアノ基、アミノ基、アリヌル基を衚し、又、隣接しお倚栞芳銙族環又は倚栞耇玠環を圢成しおも良い。X1〜X3は、それぞれ独立しお炭玠数〜のアルコキシ基を衚す。R6は氎玠原子、炭玠数〜のアルキル基、炭玠数〜のフルオロアルキル基を衚し、Yは、䞀般匏又はで衚される結合を瀺す。
Figure 2007031350
Figure 2007031350
A silane derivative represented by the following general formula [1].
Figure 2007031350
(In the formula, m is 0 or 1, and n represents an integer of 1 to 20. Each of R 1 to R 5 independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, or a carbon number. 1 to 20 fluoroalkyl groups, optionally substituted alkoxy groups, optionally substituted phenyl groups, optionally substituted benzyl groups, nitro groups, cyano groups, amino groups, Represents an aryl group, and may be adjacent to form a polynuclear aromatic ring or polynuclear heterocycle, X 1 to X 3 each independently represents an alkoxy group having 1 to 5 carbon atoms, R 6 is A hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a fluoroalkyl group having 1 to 20 carbon atoms, and Y represents a bond represented by the general formula [2] or [3].
Figure 2007031350
Figure 2007031350
基䜓衚面に、請求項〜のいずれかに蚘茉のシラン誘導䜓を含有する有機薄膜が圢成されおなる有機薄膜圢成䜓。 An organic thin film forming body in which an organic thin film containing the silane derivative according to claim 1 is formed on a substrate surface.
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