JP2007059690A - 高周波放電励起ガスレーザ発振器 - Google Patents
高周波放電励起ガスレーザ発振器 Download PDFInfo
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- JP2007059690A JP2007059690A JP2005244220A JP2005244220A JP2007059690A JP 2007059690 A JP2007059690 A JP 2007059690A JP 2005244220 A JP2005244220 A JP 2005244220A JP 2005244220 A JP2005244220 A JP 2005244220A JP 2007059690 A JP2007059690 A JP 2007059690A
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- 238000001514 detection method Methods 0.000 claims abstract description 28
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 5
- 230000005284 excitation Effects 0.000 claims description 12
- 230000015556 catabolic process Effects 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
- H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
【解決手段】 レーザ電源15と放電管3a,3bとの間に位置して、レーザ電源15から放電管3a,3bへの供給電力を検出するRF電力検出回路18と、レーザ電源15の上流側に位置し、放電管温度と供給電力との関係から求められた供給電力の許容上限値とRF電力検出回路18により検出された電力モニタ値とを比較して、電力モニタ値が許容上限値より高い場合に放電管3a,3bへのパルス指令値を停止し、許容上限値に基づいてパルス指令値を設定するパルス指令制御回路19とを備える。
【選択図】 図1
Description
2 発振器本体
3a,3b 放電管
15 レーザ電源
16 DC電源部
17 RF電源部
18 RF電力検出回路(電力検出手段)
19 パルス指令制御回路(パルス指令制御手段)
20 DC電力検出回路(電力検出手段)
Claims (2)
- パルス指令制御されるレーザ電源が放電管へ電力を供給する高周波放電励起ガスレーザ発振器において、
前記レーザ電源と前記放電管との間に位置して、前記レーザ電源から前記放電管への供給電力を検出する電力検出手段と、
前記レーザ電源の上流側に位置し、放電管温度と供給電力との関係から求められた供給電力の許容上限値と前記電力検出手段により検出された実際の前記供給電力とを比較して、該供給電力が前記許容上限値より高い場合に前記放電管へのパルス指令値を停止し、前記許容上限値に基づいてパルス指令値を設定するパルス指令制御手段と、
を備えたことを特徴とする高周波放電励起ガスレーザ発振器。 - パルス指令制御されるレーザ電源が直流電源部と高周波電源部とを有し、該高周波電源部が放電管へ電力を供給する高周波放電励起ガスレーザ発振器において、
前記直流電源部と前記高周波電源部との間に位置し、前記直流電源部から前記放電管への供給電力を検出する電力検出手段と、
前記直流電源部の上流側に位置し、放電管温度と供給電力との関係から求められた供給電力の許容上限値と前記電力検出手段により検出された実際の前記供給電力とを比較して、該供給電力が前記許容上限値より高い場合に前記放電管へのパルス指令値を停止し、前記許容上限値に基づいてパルス指令値を設定するパルス指令制御手段と、
を備えたことを特徴とする高周波放電励起ガスレーザ発振器。
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005244220A JP2007059690A (ja) | 2005-08-25 | 2005-08-25 | 高周波放電励起ガスレーザ発振器 |
| EP06017552A EP1758215A3 (en) | 2005-08-25 | 2006-08-23 | High frequency discharge excited gas laser oscillator |
| US11/467,029 US7436872B2 (en) | 2005-08-25 | 2006-08-24 | High frequency discharge excited gas laser oscillator |
| CNB2006101218381A CN100435433C (zh) | 2005-08-25 | 2006-08-24 | 高频放电激励气体激光振荡器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005244220A JP2007059690A (ja) | 2005-08-25 | 2005-08-25 | 高周波放電励起ガスレーザ発振器 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2007059690A true JP2007059690A (ja) | 2007-03-08 |
Family
ID=37459386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005244220A Pending JP2007059690A (ja) | 2005-08-25 | 2005-08-25 | 高周波放電励起ガスレーザ発振器 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7436872B2 (ja) |
| EP (1) | EP1758215A3 (ja) |
| JP (1) | JP2007059690A (ja) |
| CN (1) | CN100435433C (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013038251A (ja) * | 2011-08-09 | 2013-02-21 | Fanuc Ltd | 電力計算手段を備えたガスレーザ装置 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4137972B2 (ja) * | 2006-12-14 | 2008-08-20 | ファナック株式会社 | ガス組成異常判断方法及び放電励起ガスレーザ発振器 |
| JP4185958B1 (ja) * | 2007-06-11 | 2008-11-26 | ファナック株式会社 | ガスレーザ装置の立ち上げ方法及びガスレーザ装置 |
| JP5091287B2 (ja) | 2010-08-06 | 2012-12-05 | ファナック株式会社 | 加工点にエネルギー又は物質を供給する加工機における加工情報取得装置 |
| JP5813152B2 (ja) * | 2014-02-27 | 2015-11-17 | ファナック株式会社 | レーザ電源の調整レベルを制御するガスレーザ発振器 |
| JP6732613B2 (ja) * | 2016-09-07 | 2020-07-29 | 住友重機械工業株式会社 | レーザ光源およびそれを用いたレーザ加工装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3870086D1 (de) * | 1987-03-03 | 1992-05-21 | Fanuc Ltd | Anordnung zum nachweis der ausgangsspannung eines laser-oszillators. |
| JPS63273378A (ja) * | 1987-04-30 | 1988-11-10 | Fanuc Ltd | レ−ザ発振装置 |
| JPH0644653B2 (ja) | 1987-11-11 | 1994-06-08 | 三菱電機株式会社 | レーザ制御装置 |
| JPH0318075A (ja) * | 1989-06-14 | 1991-01-25 | Mitsubishi Electric Corp | 金属蒸気レーザ装置 |
| JPH10229233A (ja) | 1997-02-17 | 1998-08-25 | Amada Eng Center:Kk | レーザ電源供給方法およびその装置 |
| JPH10233862A (ja) | 1997-02-17 | 1998-09-02 | Fuji Xerox Co Ltd | 画像形成装置 |
| JPH11233862A (ja) | 1998-02-09 | 1999-08-27 | Amada Eng Center Co Ltd | レーザ電源制御方法およびレーザ電源 |
| JP2000126879A (ja) | 1998-10-26 | 2000-05-09 | Matsushita Electric Ind Co Ltd | レーザ加工装置およびその制御方法 |
| JP3837626B2 (ja) * | 1998-10-29 | 2006-10-25 | ミヤチテクノス株式会社 | レーザ加工装置 |
| JP2006156634A (ja) * | 2004-11-29 | 2006-06-15 | Fanuc Ltd | ガスレーザ発振器 |
-
2005
- 2005-08-25 JP JP2005244220A patent/JP2007059690A/ja active Pending
-
2006
- 2006-08-23 EP EP06017552A patent/EP1758215A3/en not_active Withdrawn
- 2006-08-24 CN CNB2006101218381A patent/CN100435433C/zh not_active Expired - Fee Related
- 2006-08-24 US US11/467,029 patent/US7436872B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013038251A (ja) * | 2011-08-09 | 2013-02-21 | Fanuc Ltd | 電力計算手段を備えたガスレーザ装置 |
| CN102957081A (zh) * | 2011-08-09 | 2013-03-06 | 发那科株式会社 | 具有功率计算单元的气体激光装置 |
| US8675707B2 (en) | 2011-08-09 | 2014-03-18 | Fanuc Corporation | Gas laser apparatus equipped with power calculation unit |
Also Published As
| Publication number | Publication date |
|---|---|
| US7436872B2 (en) | 2008-10-14 |
| EP1758215A3 (en) | 2008-06-11 |
| EP1758215A2 (en) | 2007-02-28 |
| CN100435433C (zh) | 2008-11-19 |
| CN1921241A (zh) | 2007-02-28 |
| US20070047610A1 (en) | 2007-03-01 |
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