JP2006039003A - Color filter photomask and method of manufacturing color filter for LCD using the same - Google Patents

Abstract

In a method of manufacturing a color filter for LCD using a pigment-dispersed resin layer, the degree of cure of the dispersed resin layer is the same on the front and bottom surfaces of the RGB pixel portion at the time of exposure. A photomask capable of preventing a defect that the transparent electrode layer formed on the surface is disconnected by forming the RGB pixel portion with a forward taper without causing a shape defect such as a hang, and an LCD color filter using the photomask A manufacturing method is provided.
A photomask for a color filter in which a thin film shielding layer that absorbs and shields light in an ultraviolet wavelength region such as a bright line of a mercury lamp from exposure light is formed on the entire surface, and the thin film shielding layer is oxidized. A photomask for a color filter formed from a metal oxide made of indium and having a film thickness of 300 nm to 600 nm, and a method for producing an LCD color filter using the photomask.
[Selection] Figure 1

Description

  The present invention relates to a method of manufacturing a color filter for LCD used in a color liquid crystal display device (hereinafter referred to as LCD), and relates to R (red), G (green), and B (green) formed on a transparent substrate for color filters. The present invention relates to a method for manufacturing a color filter for an LCD that prevents a disconnection failure of a transparent electrode caused by a defective side cross-sectional shape of each pixel when a transparent electrode layer is formed on the surface of the blue pixel. The present invention relates to a photomask for a color filter that improves the side cross-sectional shape of each pixel formed in the above.

  Conventionally, the following manufacturing method is known as a manufacturing method of a color filter for LCD. First, a light-shielding film layer in a lattice pattern having color pixels as openings is formed on one surface of a color filter transparent substrate. Next, an R (red) pigment-dispersed photosensitive resin is uniformly applied and prebaked to form an R (red) pigment-dispersed resin layer. Next, the R (red) pigment-dispersed resin layer is subjected to pattern exposure using a color filter photomask (hereinafter referred to as R pixel color filter photomask) on which an R (red) pixel pattern is formed. The pixel pattern is selectively cured. Next, the R (red) pigment dispersed resin layer is developed to dissolve and remove the uncured R pixel, that is, the R (red) pigment dispersed resin layer other than the pattern. Next, post-baking is performed to form R (red) pixels.

  Next, a G (green) pigment-dispersed photosensitive resin is uniformly applied and pre-baked to form a G (green) pigment-dispersed resin layer. Next, using a G pixel color filter photomask, pattern exposure is performed on the G (green) pigment-dispersed resin layer to selectively cure the G pixel pattern. Next, the G (green) pigment dispersion resin layer is developed to remove the uncured pigment dispersion resin layer. Next, post-baking is performed to form G (green) pixels. Similarly, a B (blue) pigment-dispersed photosensitive resin is uniformly applied and pre-baked to form a B (blue) pigment-dispersed resin layer. Next, pattern exposure is performed on the B (blue) pigment-dispersed resin layer using a color filter photomask for the B pixel, and the pattern of the B pixel is selectively cured. Next, the B (blue) pigment-dispersed resin layer is developed to remove the uncured pigment-dispersed resin layer. Next, post-baking is performed to form B (blue) pixels.

  Next, a transparent electrode film is formed on the R (red), G (green), and B (blue) pixels (hereinafter referred to as RGB pixels) on the color filter transparent substrate by a known method, for example, vapor deposition. Then, a transparent electrode layer having a predetermined pattern shape is formed. The LCD color filter is thus completed.

  In the formation of the pixel, for example, the R pixel, the R (red) pigment dispersed resin layer is irradiated through the opening of the R pixel pattern, the irradiated pigment dispersed resin layer is insolubilized, and the pigment dispersed resin layer This is a process in which R pixels are formed. In the process, it is important that the irradiated pigment-dispersed resin layer is uniformly insolubilized from the top portion to the bottom layer portion. When the insolubilization becomes non-uniform, the dissolution rate in the developer or the like is different, and the R pixel cannot be formed into a normal shape after the development process in the subsequent process. In the above process, it is necessary to set an optimum irradiation condition for the pigment-dispersed resin. In the color filter photomask, the transmittance between the opening (mask transparent portion) and the pattern portion (mask light shielding portion) of the R pixel pattern is determined. A device for reducing the difference or a device for reducing the curing speed due to the relationship between the pigment dispersion resin and the exposure light source is required. In the process, it is necessary to form the R pixel under process conditions that reduce the transmittance of the aperture and attenuate the light intensity of the exposure light in a specific wavelength region.

  The pigment-dispersed photosensitive resin (hereinafter referred to as “pigment-dispersed resin layer”) contains a pigment having a particle diameter of 0.01 to 1 μm dispersed in the photosensitive resin. Therefore, in order to photocure the pigment-dispersed resin layer of the RGB pixel part, even if it is irradiated with visible light and ultraviolet light, it is absorbed by the pigment in the middle of the optical path, and visible light and ultraviolet light hardly reach the bottom layer part. An uncured RGB pixel portion is formed in the portion. That is, the surface layer portion of the RGB pixel portion is cured and the bottom layer portion is uncured, and the bottom layer portion is easily dissolved in the developer.

  The photosensitive resin is a known one, and is, for example, a multi-component system including a reactive monomer, a reactive oligomer, a sensitizer, a photopolymerization initiator, and the like, and its properties are visible light or ultraviolet light. The property that the solubility is changed to become insoluble by irradiating light, that is, the formation of the RGB pixel portion of the photosensitive resin, utilizes the change in solubility before and after the light irradiation. In particular, the photopolymerization initiator plays a role of initiating radical polymerization by photoexcitation by irradiation with ultraviolet light, and further increasing the rate of radical polymerization reaction, and increasing insolubility at the rate of the radical polymerization reaction. . In addition, since the photopolymerization initiator is selected and used as a material that reacts strongly with ultraviolet light in a predetermined wavelength region, the pigment of the RGB pixel portion is excited by photoexcitation by irradiation with ultraviolet light in the predetermined wavelength region. In the surface layer portion of the dispersed resin layer, the insolubility is increased. Ultraviolet light in a predetermined wavelength range is absorbed by the photopolymerization initiator in the pigment-dispersed resin layer in the middle of the optical path, increasing the rate of radical polymerization reaction, and ultraviolet light does not reach the bottom layer, so radical polymerization reaction at the bottom layer An uncured RGB pixel portion with a small ratio is formed. That is, the vicinity of the surface layer portion of the pigment-dispersed resin layer is strongly cured and becomes insoluble, whereas the vicinity of the bottom portion is an RGB pixel portion that is weakly cured and remains soluble. On the side wall of the uncured RGB pixel portion of the bottom layer portion described above, it is dissolved in the developer at the time of development processing, and excessive dissolution occurs. That is, the surface layer portion and the bottom layer portion of the pigment-dispersed resin layer have different insolubility, the surface layer portion is less uncured, the bottom layer portion is more uncured, and there is a difference in insolubility between the surface layer portion and the bottom layer portion. Expands further.

  Next, a conventional color filter photomask and an LCD color filter using the photomask will be described. FIG. 4 is a partially enlarged side sectional view for explaining the structure of a conventional color filter photomask and an LCD color filter formed using the photomask. (A) is a color filter photomask; FIG. 4 is an enlarged view of pixels of a color filter for LCD.

  The conventional color filter photomask shown in FIG. 4A has a light-shielding film pattern made of a metal thin film or a metal oxide thin film, for example, a two-layer film of Cr / CrO on one side of a transparent substrate for photomask (1). It is the photomask (10) for color filters of the layer structure which formed the layer (2).

  In FIG. 4B, an RGB pixel (12) is formed on the transparent substrate for color filter (11) at the opening of the light shielding film layer (13), and the RGB pixel ( The transparent electrode layer (14) having a predetermined shape is formed on the surface up to 12). In a conventional color filter photomask, the pattern opening is only a transparent substrate, and the exposure light transmitted through the opening is not shielded at all. The difference in insolubility between the front part and the low bottom layer part is enlarged. Such an increasing tendency of the difference in insolubility increases as the sensitivity of the pigment-dispersed resin resist increases, and becomes a problem in miniaturization of RGB pixels. As described above, when the side cross-section of the RGB pixel (12) is formed in a reverse taper shape, transparency near the contact point between the RGB pixel (12) and the light shielding film layer (13) is caused by the reverse taper. It becomes difficult to form a film of the electrode layer (14), and the part becomes a part (30) having a poor disconnection.

As described above, the pigment-dispersed resin layer is absorbed by the pigment in the resin layer even when irradiated with visible light and ultraviolet light, and is difficult for the irradiated light to reach the bottom layer part. In photopolymerization initiators that start photopolymerization and radical polymerization, ultraviolet rays do not reach the bottom layer,
The RGB pixel portion of the bottom layer portion is uncured. That is, the vicinity of the surface layer portion of the pigment-dispersed resin layer is strongly cured and becomes insoluble, whereas the vicinity of the bottom portion is an RGB pixel portion that is weakly cured and remains soluble. Therefore, at the time of development processing, in the RGB pixel portion, the vicinity of the surface layer portion has a wide dimensional width and the vicinity of the bottom portion has a narrow dimensional width, that is, an RGB pixel portion (12) having an overhang (reverse taper) side sectional shape. This is a color filter for LCD having When the transparent electrode layer (14) is formed on the LCD color filter by vapor deposition or the like, the side wall shape of the bottom layer is prevented from being formed by the overhanging side cross-sectional shape, and the film thickness is uniform. There is a problem in that a transparent electrode layer is not formed, and a disconnection defective part (30) due to non-adhesion film, insufficient film formation, or the like occurs.

  In proposals for the above problem, for example, Patent Document 1, a proposal is made to use a photomask for a color filter that reduces the amount of irradiation in the peripheral part of the pattern of the RGB pixel part.

  Moreover, in the prior art, there are many problems in the method of manufacturing a color filter for LCD using a pigment dispersion resin. In particular, when proximity exposure is performed on a negative (light-irradiation portion curable) pigment-dispersed resin layer, the vicinity of the surface of the pigment-dispersed resin layer in the RGB pixel portion and the interface between the color filter transparent substrate (in the RGB pixel portion) Since the degree of cure of the pigment dispersion resin layer is different from that in the vicinity of the bottom surface of the pigment dispersion resin layer, the solubility of the pigment dispersion resin layer is different in the development process in the next step, resulting in an overhanging shape defect. There's a problem.

The known literature is described below.
JP-A-8-5815

  An object of the present invention is to produce a color filter for LCD using a pigment-dispersed resin, in particular, when a proximity exposure is performed using a light-irradiated portion-curable pigment-dispersed resin layer, and a pigment in an RGB pixel portion In the vicinity of the surface of the dispersed resin layer and the vicinity of the bottom surface of the pigment dispersed resin layer of the RGB pixel portion, the degree of cure of the resin layer is the same, and in the development process of the next step, there is no difference in solubility of the pigment dispersed resin layer, Color filter photomask capable of preventing disconnection failure due to insufficient film formation, etc., by forming a transparent electrode layer with a uniform film thickness on the RGB pixel portion without causing shape defects such as overhang, and LCD using the same Provided is a method for manufacturing a color filter.

  The invention according to claim 1 of the present invention is a color filter photomask used in a manufacturing process of an LCD color filter used in a color liquid crystal display device, and a pattern layer comprising a light shielding film on one surface of a transparent substrate for photomask. A thin film shielding layer and / or an ultraviolet thin film shielding layer that shields light in a specific wavelength range from the exposure light of the light source to be exposed at the time of pattern exposure is formed on the front surface or the back surface of the photomask for color filter formed. The photomask for color filters characterized by the above.

  In the present invention according to claim 1, exposure light for forming the RGB pixel portion is formed by forming the thin film shielding layer and / or the ultraviolet thin film shielding layer that shields only the wavelength region specified in the color filter photomask. After the specific wavelength region is absorbed by the thin-film shielding layer, the pigment-dispersed resin layer is irradiated, so that the insolubility between the surface layer portion and the bottom layer portion of the resin layer becomes more uniform and the degree of curing is close.

According to a second aspect of the present invention, there is provided a mercury lamp through a step of forming a pigment-dispersed photocurable resist layer on one side of a color filter transparent substrate, and a color filter photomask on the resist layer. LC used in a color liquid crystal display device including a step of irradiating the exposure light of
In the method for manufacturing a color filter for D, a thin film that absorbs and shields mainly light in the ultraviolet wavelength region, such as a bright line of a mercury lamp, from the exposure light on the front surface or back surface of the photomask for color filter during pattern exposure. A method for producing a color filter for LCD, wherein the photocurable resist layer is irradiated with exposure light using a color filter photomask having a shielding layer formed thereon.

  In the invention according to claim 3 of the present invention, the thin film shielding layer is formed of a metal oxide made of oxidized oxide, and the film thickness thereof is photocured using a photomask for color filter formed at 300 nm to 600 nm. 3. The method for producing a color filter for LCD according to claim 2, wherein exposure light is irradiated to the resist layer.

  According to the second to third aspects of the present invention, an RGB pixel unit is formed by forming a thin film shielding layer having a film thickness of 300 nm to 600 nm that mainly absorbs and shields light in the ultraviolet wavelength region, which is specified as a color filter photomask. After the exposure light for forming the light is absorbed in the specific wavelength range by the thin film shielding layer, the pigment-dispersed resin layer is irradiated, the insolubility between the surface layer portion and the bottom layer portion of the resin layer becomes more uniform, and the degree of curing is close effective.

  According to a fourth aspect of the present invention, there is provided a step of forming a pigment-dispersed photocurable resist layer on one side of a transparent substrate for a color filter, and exposing the resist layer through a photomask for a color filter. In the method for producing a color filter for LCD used in a color liquid crystal display device, including a step of irradiating light, photopolymerization start added to the photocurable resist on the front surface or back surface of the color filter photomask An LCD characterized by irradiating a photo-curable resist layer with exposure light using a photomask for a color filter having an ultraviolet thin film shielding layer that absorbs and shields light in the ultraviolet wavelength region that reacts with the agent. It is a manufacturing method of the color filter for a camera.

  In the invention according to claim 5 of the present invention, the ultraviolet thin film shielding layer is formed of a thin film that shields ultraviolet rays in a wavelength range of 320 nm to 400 nm, and the film thickness is 80 nm, which is a thickness corresponding to a quarter wavelength. 5. The exposure light is irradiated to the photocurable resist layer using a color filter photomask formed to a thickness corresponding to ˜100 nm or a thickness corresponding to 3/4 wavelength, 240 nm to 300 nm. This is a method for manufacturing a color filter for LCD.

  In the present invention according to claims 4 to 5, an ultraviolet thin film shielding layer having a thickness corresponding to a quarter wavelength of 80 nm to 100 nm, which absorbs and shields light in the ultraviolet wavelength region specified for the color filter photomask. As a result, exposure light for forming the RGB pixel portion is absorbed in the specific wavelength range by the thin film shielding layer, and then irradiated to the pigment-dispersed resin layer, so that the insolubility between the surface layer portion and the bottom layer portion of the resin layer Is more uniform and has an effect of close curing.

  According to a sixth aspect of the present invention, there is provided a step of forming a pigment-dispersed photocurable resist layer on one side of a transparent substrate for a color filter, and exposing light to the resist layer through a photomask for a color filter. In the manufacturing method of the color filter for LCD used in the color liquid crystal display device, including the step of irradiating the surface of the color filter photomask or the back surface of the photomask for color filter, such as the bright line of a mercury lamp from the exposure light during pattern exposure A thin-film shielding layer that mainly absorbs and shields light in the ultraviolet wavelength region, and an ultraviolet thin film that absorbs and shields light in the ultraviolet wavelength region that reacts with the photopolymerization initiator added to the photo-curable resist. A method for producing a color filter for LCD, wherein a photocurable resist layer is irradiated with exposure light using a photomask for color filter formed with a shielding layer It is.

In the invention according to claim 7 of the present invention, the thin film shielding layer is formed of a metal oxide made of oxidized oxide, the film thickness thereof is 300 nm to 600 nm, and the ultraviolet thin film shielding layer is
7. A photocurable resist layer is irradiated with exposure light using a color filter photomask having a thickness corresponding to a quarter wavelength of 80 nm to 100 nm. It is a manufacturing method of the color filter for LCD of description.

  In the present invention according to claims 6 to 7, the color filter photomask absorbs light in a specific wavelength region and absorbs and shields a thin film shielding layer having a thickness of 300 nm to 600 nm and light in the ultraviolet wavelength region. By forming an ultraviolet thin film shielding layer having a thickness corresponding to a quarter wavelength to be shielded with a thickness of 80 nm to 100 nm, exposure light for forming an RGB pixel portion is absorbed in a specific wavelength region by the thin film shielding layer. After that, the pigment-dispersed resin layer is irradiated, so that the insolubility between the surface layer portion and the bottom layer portion of the resin layer becomes more uniform, and the degree of cure is close.

  In the manufacture of color filters for LCDs used in color liquid crystal display devices, the use of a color filter photomask in which a thin film shielding layer that shields only a specific wavelength region from the exposure light is used as the color filter photomask. The degree of cure of the resin layer is transferred by exposure light from which only a specified wavelength region is removed from the exposure light, and is near the surface of the pigment dispersion resin layer in the RGB pixel portion and near the bottom surface of the pigment dispersion resin layer in the RGB pixel portion. Thus, a positive-tapered pigment-dispersed resin layer can be formed in the development process of the next step.

  In a method for producing a color filter for LCD used in a color liquid crystal display device, a photomask for color filter in which a thin film shielding layer for absorbing and shielding the bright line of a mercury lamp is formed on the entire surface of the photomask for color filter is used. By manufacturing a color filter for LCD, the degree of cure of the resin layer becomes the same in the vicinity of the surface of the pigment dispersion resin layer in the RGB pixel portion and in the vicinity of the bottom surface of the pigment dispersion resin layer in the RGB pixel portion, and development in the next step After the treatment, a positive-tapered pigment-dispersed resin layer is formed, and when forming the transparent electrode in the next step, the transparent electrode layer is formed with a uniform thickness without any breaks, and disconnection failure can be prevented.

  The thin film shielding layer is made of a metal oxide made of oxide oxide, and a color filter photomask having a film thickness of 300 nm to 600 nm is manufactured to produce an LCD color filter. The degree of cure of the resin layer is the same in the vicinity of the surface of the pigment dispersion resin layer and in the vicinity of the bottom surface of the pigment dispersion resin layer in the RGB pixel portion, and after the development process in the next step, a positive taper pigment dispersion resin layer is formed. At the time of forming the transparent electrode in the process, the transparent electrode layer is formed with a uniform thickness without a break, and disconnection failure can be prevented.

  In a method for producing a color filter for LCD used in a color liquid crystal display device, a step of forming a photocurable resist layer on one side of a transparent substrate for color filter, and a photomask for color filter on the resist layer A process of irradiating exposure light from a mercury lamp, and a UV thin film shield that absorbs and shields UV light that reacts with a photopolymerization initiator added to the photo-curable resist on the entire surface of a photomask for a color filter. By manufacturing a color filter for LCD using a photomask for color filter in which a layer is formed, the resin in the vicinity of the surface of the pigment dispersion resin layer in the RGB pixel portion and in the vicinity of the bottom surface of the pigment dispersion resin layer in the RGB pixel portion After the development process in the next step, a positive taper pigment-dispersed resin layer is formed after the development process in the next step. Eyes without uniform film transparent electrode layer with a thickness is formed, it can be prevented disconnection.

The ultraviolet thin film shielding layer is formed of a thin film that shields ultraviolet rays in a wavelength range of 320 nm to 400 nm, and the film thickness is for LCD using a photomask for color filter formed to 80 nm to 100 nm or 240 nm to 300 nm. By manufacturing the color filter, the degree of cure of the resin layer becomes the same in the vicinity of the surface of the pigment dispersion resin layer in the RGB pixel portion and in the vicinity of the bottom surface of the pigment dispersion resin layer in the RGB pixel portion. A positive-tapered pigment-dispersed resin layer is formed, and when forming the transparent electrode in the next step, the transparent electrode layer is formed with a uniform film thickness without any breaks, and disconnection failure can be prevented.

  By using the color filter photomask of the present invention to produce an LCD color filter by the method for producing an LCD color filter of the present invention, a transparent electrode layer having a uniform film thickness is formed when forming the transparent electrode in the next step. Is formed, and there is an effect that the problem of disconnection failure can be solved. Defects are greatly reduced.

  The color filter photomask of the present invention will be described below based on one embodiment. FIG. 1 is a partially enlarged side sectional view for explaining the structure of a color filter photomask of the present invention and an LCD color filter formed using the color filter photomask. FIG. The mask (b) is an enlarged view of the pixels of the LCD color filter (20), and (c) is a diagram showing a plurality of pixels. In addition, the broken line a and the broken line A in a figure show the same coordinate position.

  The color filter photomask (10) of the present invention shown in FIG. 1 (a) comprises a metal thin film or a metal oxide thin film, for example, a two-layer film of Cr / CrO, on one side of a photomask transparent substrate (1). A color filter photomask (10) having a layer structure in which a pattern layer (2) of a light shielding film is formed and a thin film shielding layer (3) for shielding only a specific wavelength region from the exposure light is formed on the entire surface of the pattern layer. ).

  The photomask transparent substrate (1) is made of quartz glass (hereinafter referred to as QZ) or soda glass (hereinafter referred to as SG).

  The pattern layer (2) of the light-shielding film made of the metal thin film or the metal oxide thin film is for shielding exposure light, and uses a metal, for example, Cr (metal chromium), and the first layer is Cr, on which The second layer was formed from a two-layer film of CrO (metal chromium oxide). Usually, a mask blank is one in which a light shielding film of a two-layer film of Cr / CrO is formed on the entire surface of one side of a transparent substrate for a photomask, or a photoresist layer is formed on the light shielding film. The light shielding film is formed in an atmosphere in which a metal thin film layer is formed using a vacuum deposition method or the like and a minute amount of gas is mixed in a vacuum.

  The thin film shielding layer (3) has a role of absorbing light energy in the layer when exposure light is transmitted and reducing the amount of light energy of the exposure light after being transmitted. As the material, an optimum material is selected from a transparent polymer resin, a transparent photosensitive resin, a metal thin film, or the like.

  In the photomask for a color filter of the present invention, the thin film shielding layer (3) is formed from a metal oxide made of oxidized indium (ITO), and the film thickness is 300 nm to 600 nm, which is formed by vapor deposition. is there.

  The color filter photomask of the present invention may have a thin film shielding layer (3), an ultraviolet thin film shielding layer (4), or a thin film shielding layer and an ultraviolet thin film shielding layer. be able to. The ultraviolet thin film shielding layer, or the thin film shielding layer and the ultraviolet thin film shielding layer has a role of absorbing the amount of light energy in the layer when exposure light is transmitted and reducing the amount of light energy of the exposure light after being transmitted. As the material, an optimum material is selected from a transparent polymer resin, a transparent photosensitive resin, a metal thin film, or the like.

The film thickness varies depending on the specific wavelength range absorbed from the exposure light. For example, in the case of a mercury lamp, in the case of mainly absorbing the ultraviolet wavelength range of 312 nm which is the emission line wavelength and the wavelength band in the vicinity of 365 nm, 300 nm to For example, in the case of a photopolymerization initiator, the film thickness is 600 nm.
It is a wavelength band for absorbing a specific wavelength region such as 36 nm, 365 nm, and 312 nm, and has a film thickness of 100 nm to 80 nm or 300 nm to 240 nm. The thin film shielding layer (3) is formed on the entire surface of the pattern layer (2) of the light shielding film, and the formation may be formed on the entire surface of the photomask transparent substrate (1) or the entire back surface. .

  The photomask for a color filter of the present invention may be formed with an ultraviolet thin film shielding layer (4) that reflects and absorbs ultraviolet rays that react with the photopolymerization initiator added to the pigment-dispersed resin layer and shields them. The ultraviolet thin film shielding layer (4) is formed of a thin film that shields ultraviolet rays in a wavelength region of 320 nm to 400 nm, and the film thickness is a distance of an optical path length corresponding to a quarter wavelength, and is 80 nm to 100 nm, Or it is the distance of the optical path length corresponded to 3/4 wavelength, Comprising: It formed in 240 nm-300 nm. The distance of the optical path length corresponding to the quarter wavelength will be described. The optical path length corresponding to ¼ wavelength is the moving distance of light in a specific wavelength region that passes through the medium of the ultraviolet thin film shielding layer (4), and the surface of the medium (incident surface) and the transparent for the photomask. The distance at which the phase difference is 90 degrees on the substrate surface (reflection surface), that is, the thickness of the medium. Of course, the thickness varies depending on the medium.

  Next, the thin film shielding layer and the ultraviolet thin film shielding layer will be described. The thin film shielding film (3) has a thin film structure formed on a photomask transparent substrate. The photomask transparent substrate, for example, the QZ material has a refractive index of about 1.5, and the incident medium is air. Since the refractive index is in the vicinity of 1.0, the refractive index of the thin film is formed of a material between 1.0 and 1.5.

  The color filter photomask (10) of the present invention is provided with the thin film shielding layer (3) and / or the ultraviolet thin film shielding layer on the entire mask surface, so that the irradiation light transmitted through the photomask is reduced. Is slightly extended, and the exposure conditions for pattern formation are determined by a method for securing the exposure amount.

  Next, a method for manufacturing a photomask will be described. A pattern resist in which a pattern figure was formed by an electronic drawing apparatus was formed by a known manufacturing method using, for example, drawing information including mask data prepared in advance and a mask blank. After developing the pattern resist, the exposed light shielding film surface is etched using the pattern resist as a mask. After the resist stripping process, a thin film shielding layer is formed by vapor deposition on the entire surface from the pattern of the light shielding film to the transparent substrate. The color filter photomask of the present invention was completed.

  Next, a method for manufacturing an LCD color filter of the present invention will be described below based on an embodiment.

  FIG. 1B is a partial enlarged view of one pixel of the LCD color filter 20, and is a side sectional view in which a portion from a broken line a to a broken line A in FIG. In FIG. 1B, an RGB pixel (12) is formed on the transparent substrate for color filter (11) at the position of the opening of the light shielding film layer (13), and the light shielding film layer (13) and the RGB pixel ( The transparent electrode layer (14) having a predetermined thickness is formed on the entire surface of 12). An end side cross section of the RGB pixel (12) is formed in a gentle mountain shape. In addition, FIG.1 (c) is a state just before forming a transparent electrode layer, and the transparent electrode layer (14) is not formed.

Next, a method for manufacturing a color filter photomask and an LCD color filter of the present invention will be described. 2a to 2c are side sectional views for explaining the photomask for a color filter of the present invention. FIG. 2a shows a photomask (10) for a color filter according to the present invention, in which a light-shielding film pattern layer (2) and a thin-film shielding layer (3) are formed on the surface of the photomask transparent substrate (1). In addition, you may form a thin film shielding layer (3) in a back surface. FIG. 2b shows a color filter photomask (10) according to the present invention, in which a light shielding film pattern layer (2) and an ultraviolet thin film shielding layer (4) are formed on the surface of the photomask transparent substrate (1). The ultraviolet thin film shielding layer (4) may be formed on the back surface. FIG. 2c is a photomask (10) for a color filter according to the present invention. The photomask transparent substrate (1) has a light shielding film pattern layer (2), a thin film shielding layer (3), and an ultraviolet thin film shielding layer (4). ). The ultraviolet thin film shielding layer (4) may be formed on the back surface.

  In the method for producing a color filter for LCD of the present invention, a step of forming a photocurable pigment-dispersed resin layer for R pixels on one side of a transparent substrate for color filter, and a color filter photo on the pigment-dispersed resin layer. After repeating the process of irradiating exposure light such as a mercury lamp through a mask, the process of developing the pigment-dispersed resin layer, and the resin layer formation, exposure, and development process to form the G pixel and the B pixel A transparent electrode layer having a predetermined shape is formed. The color filter photomask is of the present invention, and is a color filter photomask formed of a metal oxide made of oxidized oxide and having a thin film shielding layer (3) having a thickness of 300 nm to 600 nm ( See FIG. 2a).

  In the method for producing a color filter for LCD of the present invention, a step of forming a photocurable pigment-dispersed resin layer on one side of a transparent substrate for color filter, and a photomask for color filter on the pigment-dispersed resin layer A step of irradiating exposure light from a mercury lamp, a step of developing the pigment-dispersed resin layer, and repeatedly performing this step to form R pixels, G pixels, and B pixels, and then forming a transparent electrode layer having a predetermined shape Form. The color filter photomask is of the present invention, and a color filter photomask in which an ultraviolet thin film shielding layer (4) having a thickness of 80 nm to 100 nm is formed on the entire surface of the color filter photomask (FIG. 2b).

  In the method for producing a color filter for LCD of the present invention, a step of forming a photocurable pigment-dispersed resin layer on one side of a transparent substrate for color filter, and a photomask for color filter on the pigment-dispersed resin layer A step of irradiating exposure light from a mercury lamp, a step of developing the pigment-dispersed resin layer, and repeatedly performing this step to form R pixels, G pixels, and B pixels, and then forming a transparent electrode layer having a predetermined shape Form. The color filter photomask is of the present invention, and is formed of a metal oxide made of oxidized oxide on the entire surface of the color filter photomask, and has a thickness of 300 nm to 600 nm, a thin-film shielding layer (3), and 80 nm. A photomask for color filter formed with an ultraviolet thin film shielding layer (4) having a thickness of ˜100 nm was used (see FIG. 2c).

  The exposure light is a proximity exposure method and is irradiated using scattered light. Next, a method for manufacturing an LCD color filter will be described with reference to FIGS. FIG. 3 is a process flow diagram illustrating a method for manufacturing a color filter for LCD.

  In the process flow diagram shown in FIG. 3, a-transparent substrate preparation process, b-light-shielding film layer formation process, c-R (red) pixel formation process, and d-G (green) pixel formation process. A formation process, an eB (blue) pixel formation process, and an f-transparent electrode formation process are manufactured in that order.

  In the a-transparent substrate preparation step, a lot is formed with a color filter transparent substrate for LCD, and the transparent substrate is placed on the input case. The transparent substrate for a color filter is formed with a prescribed size, and a plate thickness of 1.1 mm to 0.35 mm is prepared with 0.7 mm as the center, and is put into the process for each charging case. The color filter transparent substrate is a transparent substrate on which a light-shielding film is previously formed or is not processed. In the process, processing such as surface cleaning is mainly performed.

In the step of forming the b-light-shielding film layer, a light-shielding film layer, for example, a light-shielding film layer (13) of metal or black polymer resin is formed. In the process, the former metal light-shielding film layer (13) is subjected to a photo process method, for example, resist coating, pattern transfer via a photomask, resist development, etching of the exposed surface, resist stripping, and the latter black color. The light shielding film layer (13) of the polymer resin is subjected to a photo process method, for example, resist coating, pattern transfer via a photo mask, and resist development.

  In the c-R (red) pixel formation process, R pixels are formed. In the process, any one of a photo-process method, for example, a step of forming a pigment-dispersed resin layer by a resist coating method, a preheating treatment (pre-bake treatment) to the pigment-dispersed resin layer, and a photomask for a color filter of the present invention is performed. The R pixel is formed by pattern exposure processing for pattern transfer, development processing for the resist of the pigment dispersion resin layer, and post-heating processing (post-baking processing) for the R pixel of the pigment dispersion resin layer.

  In the d-G (green) pixel formation process, G pixels are formed. The process is the same process as the formation of the R pixel.

  In the step of forming e-B (blue) pixels, B pixels are formed. The process is the same process as the formation of the R pixel. As described above, the RGB pixel (12) is formed in the opening of the light shielding film layer (13) on the color filter transparent substrate (11).

  In the f-transparent electrode forming step, a conductive transparent electrode is formed by a vacuum deposition method through a metal mask having an opening only in a portion corresponding to the display region portion of the light shielding film layer (13) and the RGB pixel (12) and the extraction terminal portion. Specifically, a transparent electrode of metal oxide, for example, usually ITO is formed in a solid shape, and the color filter for LCD of the present invention is completed.

  Next, the present invention will be described with reference to specific examples.

  First, on a transparent substrate for a color filter having a thickness of 0.7 mm, a light shielding film layer having a metal chromium lattice pattern was formed by a photo process method after forming a metal chromium film by a known method.

Next, a transparent substrate with a light-shielding film layer is introduced from the supply unit of the in-line color filter manufacturing apparatus, formation of a pigment-dispersed resin layer of the R pixel, irradiation treatment of exposure light through a photomask for the color filter of the R pixel, After the development process of the pigment dispersed resin layer of the R pixel, after the formation of the R pixel, the formation of the pigment dispersion resin layer of the G pixel, the irradiation process of the exposure light, and the development process, after the formation of the G pixel,
After forming the B pixel through the formation of the pigment dispersed resin layer of the B pixel, the exposure light irradiation process, and the development process, the color filter substrate with the RGB pixels discharged from the discharge unit was completed.

In the color filter photomask, the photomask transparent substrate is QZ, the light shielding film is formed of a Cr / CrO two-layer film, the thin film shielding layer is formed of an ITO metal oxide, and the film thickness is 450 nm. The color filter photomask of the present invention was used. Further, under the irradiation treatment conditions of the exposure light to the pigment-dispersed resin layer, the exposure amount is 180 mJ / cm ² , the irradiation time is 15% longer than usual, and the pre-bake and post-bake times to the pigment-dispersed resin layer are set to 15 seconds. 15% longer than usual. Further, under the development processing conditions, an alkaline developer having a 1.2% concentration of sodium carbonate (Na ₂ CO ₃ ), which was 10% less than usual, was used. In all other cases, known materials and processing methods thereof were used.

  Next, after pre-treating the surface of the color filter substrate with RGB pixels, the color filter transparent substrate is lined from the supply unit of the vacuum vapor deposition apparatus, through a metal mask having a predetermined shape. After forming the transparent electrode layer, the color filter substrate with the transparent electrode discharged from the discharge portion was completed.

  In the color filter for LCD of the present invention obtained by the above method, the cross-sectional shape of the RGB pixel becomes a mountain shape, the transparent electrode layer formed on the entire surface of the image display portion is formed with a uniform film thickness, and the disconnection near the RGB pixel is caused. No transparent electrode layer is formed.

FIG. 2 is a partially enlarged side sectional view for explaining the structure of a color filter photomask of the present invention and an LCD color filter formed using the photomask, wherein (a) is a color filter photomask and (b) is an LCD. (C) is an enlarged view of the pixels of the color filter for use, and FIG. FIGS. 3A to 3C are side cross-sectional views illustrating a photomask for a color filter of the present invention. It is a process flowchart explaining the manufacturing method of the color filter for LCD. FIG. 2 is a partially enlarged side sectional view for explaining the structure of a conventional color filter photomask and an LCD color filter formed using the photomask, (a) is a color filter photomask, and (b) is an LCD It is an enlarged view of the pixel of a color filter.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Photomask transparent substrate 2 ... Light shielding film pattern layer 3 ... Thin film shielding layer 4 ... Ultraviolet thin film shielding layer 10 ... Color filter photomask 11 ... Color filter transparent substrate 12 ... RGB pixel 13 ... Light shielding film layer 14 ... Transparent electrode 20 ... LCD color filter 30 ... Broken wire

Claims (7)

  In the color filter photomask used in the manufacturing process of the LCD color filter used in the color liquid crystal display device, the surface of the color filter photomask in which a pattern layer made of a light-shielding film is formed on one surface of the photomask transparent substrate, Alternatively, a color filter photomask, wherein a thin film shielding layer and / or an ultraviolet thin film shielding layer that shields light in a wavelength region specified from exposure light of a light source to be exposed is formed on the back surface during pattern exposure.   Including a step of forming a pigment-dispersed photocurable resist layer on one side of a transparent substrate for a color filter, and a step of irradiating the resist layer with exposure light of a mercury lamp through a photomask for a color filter In a method for manufacturing a color filter for LCD used in a liquid crystal display device, light in the ultraviolet wavelength region, such as a bright line of a mercury lamp, is emitted from the exposure light to the front surface or back surface of a color filter photomask during pattern exposure. A method for producing a color filter for LCD, comprising exposing a photocurable resist layer to exposure light using a photomask for color filter on which a thin film shielding layer that absorbs and shields is formed.   The thin film shielding layer is formed of a metal oxide made of oxidized oxide, and the film thickness is irradiated with exposure light to the photocurable resist layer using a photomask for a color filter formed at 300 nm to 600 nm. The method for producing a color filter for LCD according to claim 2.   A color liquid crystal display comprising a step of forming a pigment-dispersed photocurable resist layer on one side of a transparent substrate for a color filter, and a step of irradiating the resist layer with exposure light through a photomask for a color filter In the method for producing a color filter for LCD used in the apparatus, light in the ultraviolet wavelength region that reacts with the photopolymerization initiator added to the photo-curable resist is applied to the front or back surface of the photomask for color filter. A method for producing a color filter for LCD, which comprises irradiating a photocurable resist layer with exposure light using a photomask for color filter on which an ultraviolet thin film shielding layer for absorbing and shielding is formed.   The ultraviolet thin film shielding layer is formed of a thin film that shields ultraviolet rays in a wavelength range of 320 nm to 400 nm, and the film thickness corresponds to 80 nm to 100 nm, or 3/4 wavelength, corresponding to a quarter wavelength. 5. The method for producing a color filter for LCD according to claim 4, wherein the photocurable resist layer is irradiated with exposure light using a photomask for color filter formed to a thickness of 240 nm to 300 nm.   A color liquid crystal display device comprising a step of forming a pigment-dispersed photocurable resist layer on one side of a transparent substrate for a color filter, and a step of irradiating the resist layer with exposure light through a photomask for a color filter In the method for producing a color filter for LCD used in the above, the surface of the color filter photomask or the back surface absorbs light mainly in the ultraviolet wavelength region, such as a bright line of a mercury lamp, from the exposure light during pattern exposure, Color filter photomask comprising: a thin film shielding layer for shielding; and an ultraviolet thin film shielding layer for absorbing and shielding light in an ultraviolet wavelength region that reacts with a photopolymerization initiator added to the photocurable resist. A method for producing a color filter for LCD, which comprises irradiating a photocurable resist layer with exposure light using   The thin film shielding layer is formed of a metal oxide made of oxide oxide, the film thickness is 300 nm to 600 nm, and the ultraviolet thin film shielding layer is 80 nm to a thickness corresponding to a quarter wavelength. 7. The method for producing a color filter for LCD according to claim 6, wherein the photocurable resist layer is irradiated with exposure light using a photomask for color filter formed at 100 nm.

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