JP2006038177A - Vacuum gate valve - Google Patents

Abstract

Provided is a vacuum gate valve capable of processing a workpiece such as a semiconductor substrate at the same time using another room even when some room is maintained by withstanding reverse pressure.
A vacuum gate valve 10 that opens or closes openings 74 and 76 formed in a wall portion 64 that partitions a plurality of rooms, and moves inside the wall portion 64, and opens the opening portion 74 and 76. A gate valve body 12 that presses the wall portion 64 located at or near the outer edge of 76 and closes the openings 74 and 76 from the inside of the wall portion 64; and moving means 56 and 58 that move the gate valve body 12 It was set as the structure which has.
[Selection] Figure 3

Description

  The present invention relates to a vacuum gate valve that opens and closes various openings, and more particularly to a vacuum gate valve that opens or closes an opening of a vacuum processing chamber used in a manufacturing process of a semiconductor manufacturing apparatus.

As shown in FIG. 6, a conventional semiconductor manufacturing apparatus 100 having a load lock chamber 102, a transfer chamber 104, and a plurality of process chambers 106, 108, 110 is known. Openings 112, 114, 116, and 118 are formed in the four wall portions 104A, 104B, 104C, and 104D of the transfer chamber 104, respectively. Each of the wall portions 104A, 104B, 104C, and 104D is provided with gate valves 122, 124, 126, and 128 that open and close the openings 112, 114, 116, and 118, respectively. Also, inside the transfer chamber 104, there is a robot arm (not shown) that transfers a semiconductor substrate that is placed on a transfer member (not shown) and moved from the load lock chamber 102 to another transfer member (not shown). Has been placed. In this semiconductor manufacturing apparatus 100, the openings 112, 114, 116, 118 are closed by the gate valves 122, 124, 126, 128, so that the transfer chamber 104 and the process chambers 106, 108, 110 are hermetically partitioned. In addition, the transfer chamber 104 and the load lock chamber 102 can be hermetically partitioned.
Similarly, an opening 120 is formed in each wall 102A of the load lock chamber 102, and a gate valve 130 for opening and closing the opening 120 is provided inside the wall 102A. ing.

According to the semiconductor manufacturing apparatus 100, an unprocessed semiconductor substrate is put into the load lock chamber 102 through the opening 120 while the gate valve 130 is driven to open the opening 120. After an unprocessed semiconductor substrate is placed in the load lock chamber 102, the gate valve 130 is driven to close the opening 120. Next, the gate valve 122 is driven to open the opening 112, and the robot arm disposed inside the transfer chamber 104 takes out the semiconductor substrate inside the load lock chamber 102 and moves it to the inside of the transfer chamber 104. After the semiconductor substrate is moved into the transfer chamber 104, the gate valve 122 is driven to close the opening 112. In this state, all the other openings 114, 116, and 118 are closed. Next, one of the gate valves 124, 126, and 128 is driven to open the opening 114, and the semiconductor substrate inside the transfer chamber 104 is moved to the process chamber 106 by the robot arm. The semiconductor substrate moved to the process chamber 106 is subjected to predetermined processing inside the process chamber 106.
JP 2004-044683 A

By the way, when performing maintenance on some of the plurality of process chambers, outside air enters the inside of the process chamber to be maintained. At this time, the internal pressure of the process chamber in which the external air has entered becomes equal to the external atmospheric pressure.
Here, in the maintenance of the process chamber, it is necessary to perform the processing of the semiconductor substrate in the remaining other process chambers from the viewpoint of preventing a reduction in the processing efficiency of the semiconductor substrate as much as possible. When processing a semiconductor substrate, since the inside of the transfer chamber is in a vacuum state, the gate valve provided on the wall section that divides the process chamber to be maintained is transferred to the transfer chamber side by its internal pressure (reverse pressure). At this time, the outside air inside the process chamber to be maintained enters the inside of the transfer chamber. When outside air enters the inside of the transfer chamber, the semiconductor substrate inside is exposed to the outside air, and there is a problem that the quality of the semiconductor substrate is deteriorated. As described above, in the conventional semiconductor manufacturing apparatus, when some process chambers are maintained, the semiconductor substrate cannot be processed using the other process chambers.

  Therefore, in consideration of the above circumstances, the present invention can process an object to be processed such as a semiconductor substrate at the same time using another room even when some room is maintained by withstanding reverse pressure. An object is to provide a vacuum gate valve.

  The invention according to claim 1 is a vacuum gate valve that opens or closes an opening formed in a wall section that divides a plurality of rooms, and moves inside the wall section. A gate valve main body that presses the wall portion located at or near an outer edge to close the opening from the inside of the wall portion, and a moving means that moves the gate valve main body.

  According to the first aspect of the present invention, when the gate valve main body is moved to a position facing the opening by the moving means, the gate valve main body presses the wall portion located at or near the outer edge of the opening. The opening is closed from the inside of the wall. As a result, when a predetermined pressure is applied from one room to the other of the rooms partitioned by the wall, or when pressure is applied from the other room to one room (so-called reverse to the gate valve body). Even when pressure is applied), the gate valve body always presses the wall part located at or near the outer edge of the opening, so the gate valve body moves along the thickness of the wall part. It is possible to prevent the closed state of the opening from collapsing. As a result, even when a so-called reverse pressure is applied to the gate valve body, it can withstand the reverse pressure, and the airtightness of each room can be maintained.

  According to a second aspect of the present invention, in the vacuum gate valve according to the first aspect, the thickness along the thickness direction of the wall portion of the gate valve body is configured to be variable, and the thickness is increased. The opening is closed.

  According to the second aspect of the present invention, since the thickness along the thickness direction of the wall portion of the gate valve body is configured to be variable, the opening can be easily closed by increasing the thickness. . Further, by reducing the thickness of the gate valve body, the gate valve body can move inside the wall portion and open the opening. As described above, by configuring the thickness of the wall portion of the gate valve body along the thickness direction to be variable, the opening can be easily opened or closed.

  According to a third aspect of the present invention, in the vacuum gate valve according to the first or second aspect, the gate valve main body includes a pair of lid members that close the opening, and the lid member is displaced to displace the lid member. And a separation distance adjusting means for adjusting the separation distance.

According to the third aspect of the present invention, when the gate valve body is moved inside the wall portion by the moving means and comes to a position facing the opening, the pair of lid members are mutually connected by the separation distance adjusting means. It is displaced in the direction of separation, and the separation distance of each lid member is widened. In each lid member whose separation distance is widened, the gate valve body presses the wall portion located at or near the outer edge of the opening portion to close the opening portion from the inside of the wall portion. As a result, when a predetermined pressure is applied from one room to the other of the rooms partitioned by the wall, or when pressure is applied from the other room to one room (so-called reverse to the gate valve body). Even when pressure is applied), the gate valve body always presses the wall part located at or near the outer edge of the opening, so the gate valve body moves along the thickness of the wall part. It is possible to prevent the closed state of the opening from collapsing. As a result, the airtightness of each room can be maintained even when a back pressure is applied to the gate valve body.
On the other hand, when opening the opening, the separation distance of each lid member is narrowed by the separation distance adjusting means, and the gate valve body is moved inside the wall by the moving means. Thereby, an opening part can be open | released easily.

  According to a fourth aspect of the present invention, in the vacuum gate valve according to the third aspect, the separation distance adjusting means includes: an elastic member that urges the lid member in a direction that narrows the separation distance of the lid member; When the lid member is connected to the lid member and the lid member moves to a predetermined position, the first pressure acting in the moving direction of the gate valve body is converted into the second pressure acting in the thickness direction of the gate valve body. And a link mechanism that increases the separation distance of the lid member against pressure of the elastic member.

According to the fourth aspect of the present invention, when the lid member is moved to a predetermined position, the first pressure acting in the moving direction of the gate valve body by the link mechanism acts in the thickness direction of the gate valve body. The pressure is converted into pressure, and the second pressure increases the separation distance of the lid member against the biasing force of the elastic member. As a result, the lid member can press the wall portion located at or near the outer edge of the opening portion to close the opening portion from the inside of the wall portion, and maintain the airtightness of each room even when a reverse pressure is applied. can do.
On the other hand, when the lid member is moved to a position other than the predetermined position, the biasing force of the elastic member acts on each lid member, and the separation distance of each lid member is narrowed. In this state, the gate valve main body is moved inside the wall portion by the moving means to open the opening. Thus, by narrowing the separation distance of the lid member, the gate valve body can be moved more smoothly, and the wall portion can be made as thin as possible.

  According to a fifth aspect of the present invention, in the vacuum gate valve according to the third or fourth aspect, the lid member is located at or near an outer edge of the opening in a state where the lid member closes the opening. It has the sealing member which contacts the said wall part to do.

  According to the invention described in claim 5, since the lid member is provided with the seal member that contacts the outer edge of the opening or the wall located in the vicinity thereof in the state where the lid closes the opening. The airtightness of each room can be significantly increased.

  According to a sixth aspect of the present invention, in the vacuum gate valve according to the fifth aspect, the seal member is provided at or near a connection portion of the link mechanism to the lid member. .

  According to invention of Claim 6, since the sealing member is provided in the connection part to the cover member of a link mechanism, or its vicinity, the site | part in which the sealing member was provided with the 2nd pressure which the 1st pressure converted Can act on. Thereby, the pressure from a cover member can be efficiently transmitted to a sealing member, and sealing performance can be improved markedly.

  According to the present invention, it is possible to process an object to be processed such as a semiconductor substrate at the same time using another room even when some room is maintained by withstanding the reverse pressure.

  Next, a vacuum gate valve according to an embodiment of the present invention will be described with reference to the drawings.

  As shown in FIGS. 1 to 4, the vacuum gate valve 10 includes a gate valve body 12. The gate valve body 12 includes a pair of lid members 14 and 16. The lid members 14 and 16 are each formed in a flat plate shape, and a predetermined separation distance is provided between the lid members 14 and 16.

  A connection member 18 is attached to the inner side surface of one lid member 14. The connecting member 18 is attached to the upper side (arrow A direction side in FIG. 3) and the lower side (arrow B direction side in FIG. 3) of the lid member 14, and the width direction of the lid member 14 (FIG. 1). A plurality are provided over the middle arrow C direction side). Each connection member 18 is integrally formed with a protruding piece 22 provided with a concentric through hole 20. Further, an arm member 24 is attached to each connecting member 18. The arm member 24 includes a flat plate member 24A and a plurality of claw portions 24B and 24C that are integrally formed with the flat plate member 24A and protrude outward from both side surfaces of the flat plate member 24A. Two of the claw portions 24B are formed on one side surface of the flat plate member 24A, and the claw portions 24B are separated from each other. Similarly, two claw portions 24C spaced apart from each other are formed on the other side surface of the flat plate member 24A. In addition, concentric through holes (not shown) are formed in the claw portions 24B and 24C, respectively. By inserting the rotation shaft 26 into the through hole of each claw portion 24B and the through hole 20 of each protrusion piece 22, each claw portion 24B and each protrusion piece 22 can rotate around each rotation shaft 26.

  Similarly, the connecting member 30 is attached to the inner side surface of the other lid member 16. The connecting member 18 attached to the inner side surface of one lid member 14 and the connecting member 30 attached to the inner side surface of the other lid member 16 are set to be located at the same height. The connecting members 30 are respectively attached to the upper side (arrow A direction side in FIG. 3) and the lower side (arrow B direction side in FIG. 3) of the lid member 16, and the width direction of the lid member 16 (FIG. 1). A plurality are provided over the middle arrow C direction side). Each connection member 30 is integrally formed with a projecting piece 32 having a concentric through hole (not shown). In addition, an arm member 34 is attached to each connection member 30. The arm member 34 includes a flat plate member 34A and a plurality of claw portions 34B and 34C that are integrally formed with the flat plate member 34A and protrude outward from both side surfaces of the flat plate member 34A. Two claw portions 34B are formed on one side surface of the flat plate member 34A, and the respective claw portions 34B are in a separated state. Similarly, two claw portions 34C spaced apart from each other are formed on the other side surface of the flat plate member 34A. Further, concentric through holes 36 and 38 are formed in the claw portions 34B and 34C, respectively. By inserting the rotating shaft 40 into the through hole 36 of each claw portion 34B and the through hole of each protruding piece 32, each claw portion 34B and each protruding piece 32 can rotate about each rotating shaft 40.

  Further, the arm members 24 and 34 are connected to each other by inserting the rotary shaft 28 into the through holes 38 of the claw portions 24C and 34C (the through holes of the claw portions 24C are not shown). Thereby, the one arm member 24 and the other arm member 34 can rotate around the rotation shaft 28, and the one arm member 24 and the other arm member 34 can move relative to each other. . The rotating shaft 28 is attached to an intermediate plate member 42 described later so as to be rotatable.

  As described above, one lid member 14 and the other lid member 16 are partially connected by the link mechanism including the connecting members 18 and 30 and the arm members 24 and 34. That is, one lid member 14 and the other lid member 16 are provided on the upper side (arrow A direction side in FIG. 3) and the lower side (arrow B direction side in FIG. 3), and each lid member 14, 16 is provided. Are connected by a plurality of link mechanisms provided across the width direction (arrow C direction side in FIG. 1).

  A plurality of bearing members 44 and 46 are attached to the upper portions of the lid members 14 and 16 over the width direction of the lid members 14 and 16. Rotating rollers 48 and 50 are respectively attached to the bearing members 44 and 46 so as to be rotatable. A bearing member 44 attached to one lid member 14 and a bearing member 46 attached to a position facing the bearing portion 44 of the other lid member 16 are constituted by a plurality of coil springs (elastic members) 52. It is connected. A plurality of coil springs (elastic members) 54 are connected between the side surface of one lid member 14 and the side surface of the other lid member 16. In addition, a tensile force is always applied to each of the lid members 14 and 16 in a direction in which a separation distance provided between the coil springs 52 and 54 is reduced (shrinked).

The gate valve body 12 includes an intermediate plate member 42 that is disposed between the lid members 14 and 16 and extends across the width direction of the lid members 14 and 16. A rotating shaft 28 that connects the arm members 24 and 34 attached to the lid members 14 and 16 is attached to the intermediate plate member 42 so as to be rotatable.
A piston member (moving means) 56 is connected to the intermediate plate member 42. The piston member 56 is connected to a cylinder member (moving means) 58, and is configured such that the piston member 56 moves inside the cylinder member 58 by hydraulic pressure or the like and expands and contracts in the vertical direction. The piston member 56 is disposed inside the wall portion 64, and the cylinder member 58 is disposed outside the wall portion 64.
Further, guide members 60 extending in the vertical direction are arranged inside the wall portion 64 and in the vicinity of both ends in the width direction of the gate valve main body 12. Attachment members 62 are attached to both ends of the intermediate plate member 42 in the width direction. Further, the attachment members 62 are attached to the guide member 60 so as to be movable along the extending direction (vertical direction) of the guide member 60. It is attached. As described above, the gate valve main body 12 is connected to the guide member 60 to prevent the position deviation when the gate valve main body 12 moves in the vertical direction.

  In addition, grooves 66 and 68 are formed in the width direction of each lid member 14 and 16 on the outer side surface located opposite to the inner side surface of each lid member 14 and 16 to which the connection members 18 and 30 are attached. Is formed. The ends in the width direction of the grooves 66 and 68 are also connected to each other and formed in a rectangular shape as a whole. O-rings (seal members) 70 and 72 made of a rubber member are disposed in the grooves 66 and 68, respectively. For this reason, the site | part in which the O-rings 70 and 72 are arrange | positioned is located on the extension line of the site | part to which the connection members 18 and 30 connected with each arm member 24 and 34 were attached. In other words, the O-rings 70 and 72 have a configuration in which the link mechanism is provided at or near the connection site where the lid members 14 and 16 are connected.

  The vacuum gate valve 10 described above is provided inside a wall portion 64 that partitions a plurality of chambers such as a transfer chamber, a process chamber, and a load lock chamber, and is formed with openings 74 and 76, respectively. The inside of the wall portion 64 is hollow, and the gate valve body 12 is moved up and down in the wall portion 64 by the piston member 56 and the cylinder member 58 as will be described later.

  Next, the operation of the vacuum gate valve 10 according to this embodiment will be described.

  As shown in FIGS. 1, 4, and 5 (B), the gate valve body 12 is moved upward by the piston member 56 extending upward from the cylinder member 58. The gate valve body 12 moves to a position other than the position facing the openings 74 and 76 (that is, the position in which the rotating rollers 48 and 50 do not contact the upper wall 64A constituting the wall 64 in this embodiment). In this case, since only the tensile force of the coil springs 52 and 54 acts on the lid members 14 and 16, the distance between the lid members 14 and 16 is reduced (shrinked). Yes. In this state, one end side (rotary shaft 28 side) of each arm member 24, 34 connected to the upper side of each lid member 14, 16 is located below, and the other end of each arm member 24, 34 is located on the other side. The end side (rotating shafts 26 and 40 side) is located above, and the arm members 24 and 34 are V-shaped. Similarly, one end side (rotary shaft 28 side) of each arm member 24, 34 connected to the lower side of each lid member 14, 16 is positioned below and the other end side (rotation) The shafts 26 and 36 side) are located above, and the arm members 24 and 34 are V-shaped. As described above, the arm members 24 and 34 are V-shaped, so that the distance between the lid members 14 and 16 can be reduced, and the gate valve body 12 can smoothly move inside the wall portion 64. it can.

When the gate valve main body 12 is pushed up by the piston member 56, the rotating rollers 48 and 50 provided on the upper portion of the gate valve main body 12 come into contact with the upper wall 64 </ b> A constituting the wall portion 64. Further, when the gate valve body 12 is pushed up by the piston member 56, the rotary shaft 28 that connects the arm members 24, 34 connected to the upper side of the lid members 14, 16 moves upward via the intermediate plate member 42. It is pressed at a predetermined pressure (first pressure). As a result, as shown in FIGS. 3 and 5A, only one end side (rotary shaft 28 side) of each arm member 24, 34 is pushed upward, so that each arm member 24, 34 is horizontal. It becomes.
Similarly, the rotary shaft 28 that connects the arm members 24 and 34 connected to the lower side of the lid members 14 and 16 also has a predetermined pressure (first pressure) upward via the intermediate plate member 42. Pressed with. As a result, only one end side (rotary shaft 28 side) of each arm member 24, 34 is pushed upward, and each arm member 24, 34 becomes horizontal.
When the arm members 24 and 34 are horizontal, the pressure is applied to the lid members 14 and 16 by the arm members 24 and 34 toward the outer side in the thickness direction of the gate valve body 12 (the direction of arrow D in FIG. 3). Pressure). This pressure (second pressure) overcomes the elastic force (tensile force) of the coil springs 52 and 54, and the lid members 14 and 16 have the elastic force (tensile force) of the coil springs 52 and 54 by the pressure (second pressure). Force) and pushed outward in the thickness direction (openings 74 and 76 side). Thereby, each lid member 14 and 16 is displaced in the direction in which the distance between them is increased. Eventually, the lid members 14 and 16 are pressed against the wall portions 64 located at or near the outer edges of the openings 74 and 76 by a predetermined pressure from the arm members 24 and 34. At this time, O-rings 70, 72 provided on the outer side surfaces of the lid members 14, 16 are pressed against the wall portions 64 located at or near the outer edges of the openings 74, 76. As described above, when the lid members 14 and 16 are moved to predetermined positions, the lid members 14 and 16 are configured so that the pressure (first pressure) from the piston member 56 acting upward is gated by the link mechanism. The pressure is converted into a pressure (second pressure) acting in the thickness direction of the valve body 12 (arrow D direction in FIG. 3), and this second pressure counters the elastic force (tensile force) of the coil springs 52 and 54. By widening the separation distance between the members 14 and 16, the openings 74 and 76 can be easily closed.

  As described above, when each of the lid members 14 and 16 is pressed against the wall portion 64 with a predetermined pressure, pressure acts from one room partitioned by the wall portion 64 to the other room, or the other chamber. Even when a reverse pressure is applied to one of the chambers, the lid members 14 and 16 always press the wall 64 located at or near the outer edges of the openings 74 and 76, so that the gate valve body 12 is The inside of the part 64 does not move along the thickness direction of the wall part 64 (in the direction of arrow D in FIG. 3), and the closed state of the openings 74 and 76 can be prevented from collapsing. As a result, the airtightness of each room can be maintained when a so-called back pressure is applied to each lid member 14, 16. Even in a state in which air enters the inside, it is possible to prevent outside air from entering the transfer chamber, and it is possible to continuously perform a predetermined process on the semiconductor substrate in another room (process chamber).

  In particular, by providing O-rings 70 and 72 on the outer side surfaces of the lid members 14 and 16, the airtightness of each room can be improved. Further, the O-rings 70 and 72 are connected to the lid members 14 and 16 of the link mechanism. Therefore, the second pressure can be applied to the lid members 14 and 16 at the sites where the O-rings 70 and 72 are provided. Thereby, the pressure from the cover members 14 and 16 can be efficiently transmitted to the O-rings 70 and 72, and the amount of elastic deformation of the O-rings 70 and 72 is increased, so that the airtightness of each room is remarkably improved. be able to.

On the other hand, as shown in FIGS. 1, 4, and 5 (B), the gate valve body 12 is moved downward via the intermediate plate member 42 by contracting the piston member 56 and accommodating it in the cylinder member 58. . At this time, the contact between the rotary rollers 48 and 50 and the upper wall 64A is released, and the lid members 14 and 16 are displaced in the direction in which the distance between them is reduced by the tensile force of the coil springs 52 and 54. The rotating shaft 28 that connects the arm members 24 and 34 connected to the upper side of the lid members 14 and 16 is pulled downward with a predetermined pressure (first pressure) through the intermediate plate member 42. As a result, only one end side (rotary shaft 28 side) of each arm member 24, 34 is pulled downward, and each arm member 24, 34 becomes V-shaped again.
The same applies to the arm members 24 and 34 connected to the lower side of the lid members 14 and 16, and when the contact between the rotary rollers 48 and 50 and the upper wall 64A is released, the lid members 14 are released. , 16 are displaced in the direction in which the distance between them is reduced by the tensile force of the coil springs 52, 54, and the rotary shaft 28 connecting the arm members 24, 34 is also connected via the intermediate plate member 42 in the same manner. It is pulled downward at a predetermined pressure (first pressure). As a result, only one end side (rotary shaft 28 side) of each arm member 24, 34 is pulled downward, and each arm member 24, 34 becomes V-shaped again.
Thus, each lid member 14, 16 is made to have a V-shape by applying a tensile force from the coil springs 52, 54 to the lid members 14, 16 and rotating the arm members 24, 34 around the rotation shaft 28. , 16 can be reduced. As a result, the gate valve main body 12 can smoothly move inside the wall portion 64, and the openings 74 and 76 can be opened.

In the above embodiment, the rotation rollers 48 and 50 are attached to the upper parts of the lid members 14 and 16 constituting the gate valve body 12, and the piston member 56 and the cylinder member 58 are disposed below the gate valve body 12. However, the present invention is not limited to this configuration.
For example, the piston member 56 and the cylinder member 58 are disposed above the gate valve main body 12, and the bearing members 44 and 46 are provided below the lid members 14 and 16, and the bearing members 44 and 46 are provided with a rotating roller. You may comprise so that 48 and 50 may be attached rotatably. According to this configuration, the piston valve 56 extends from the cylinder member 58 to move the gate valve body 12 downward, and the rotating rollers 48 and 50 come into contact with the lower wall (not shown) constituting the wall portion 64. By extending the cylinder member 56, the distance between the lid members 14 and 16 can be increased in the same manner, and the openings 74 and 76 can be closed.
In particular, since the rotating rollers 48 and 50 come into contact with the lower wall constituting the wall portion 64, dust attached to the lower wall can be prevented from flying during the contact, so that each room can be kept clean.

It is a perspective view of the gate valve for vacuum concerning one embodiment of the present invention. It is a perspective view showing a part of gate valve for vacuum concerning one embodiment of the present invention. It is a fragmentary perspective view of the state where the separation distance of each lid member which constitutes the vacuum gate valve concerning one embodiment of the present invention was expanded. It is a partial perspective view of the state where the separation distance of each cover member which constitutes the gate valve for vacuum concerning one embodiment of the present invention was narrowed. (A) is a conceptual diagram which shows the state which the separation distance of each cover member which comprises the gate valve for vacuum concerning one Embodiment of this invention was expanded, (B) is the vacuum concerning one Embodiment of this invention. It is a conceptual diagram which shows the state by which the separation distance of each cover member which comprises the gate valve for operation was narrowed. It is a top view which shows the structure of each room where the gate valve for vacuum which is a prior art is used.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Gate valve for vacuum 12 Gate valve main body 14 Lid member 16 Lid member 18 Connection member (link mechanism, separation distance adjustment means)
24 Arm member (link mechanism, separation distance adjusting means)
26 Rotating shaft (link mechanism, separation distance adjusting means)
28 Rotating shaft (link mechanism, separation distance adjusting means)
30 connecting member (link mechanism, separation distance adjusting means)
34 Arm member (link mechanism, separation distance adjusting means)
40 Rotating shaft (link mechanism, separation distance adjusting means)
52 Coil spring (elastic member, separation distance adjusting means)
54 Coil spring (elastic member, separation distance adjusting means)
56 Piston member (moving means)
58 Cylinder member (moving means)
64 Wall 70 O-ring (seal member)
72 O-ring (seal member)
74 Opening 76 Opening

Claims (6)

A vacuum gate valve that opens or closes an opening formed in a wall section that divides a plurality of rooms,
A gate valve body that moves inside the wall and presses the wall located at or near an outer edge of the opening to close the opening from the inside of the wall;
Moving means for moving the gate valve body;
A vacuum gate valve characterized by comprising:   2. The vacuum gate valve according to claim 1, wherein a thickness along the thickness direction of the wall portion of the gate valve body is configured to be variable, and the opening portion is closed by increasing the thickness. .   The gate valve body includes a pair of lid members that close the opening, and a separation distance adjusting unit that displaces the lid member and adjusts a separation distance of the lid member. 3. A vacuum gate valve according to 1 or 2.   The separation distance adjusting means includes an elastic member that urges the lid member in a direction to narrow the separation distance of the lid member, and the gate valve body when connected to the lid member and the lid member moves to a predetermined position. The first pressure acting in the moving direction of the gate valve is converted into the second pressure acting in the thickness direction of the gate valve body, and the second pressure resists the urging force of the elastic member and widens the separation distance of the lid member The vacuum gate valve according to claim 3, further comprising: a mechanism.   The said cover member has a seal member which contacts the said wall part located in the outer edge of the said opening part or its vicinity in the state which the said cover member obstruct | occluded the said opening part, or Claim 3 characterized by the above-mentioned. 4. A vacuum gate valve according to 4.   The vacuum gate valve according to claim 5, wherein the seal member is provided at or near a connection portion of the link mechanism to the lid member.

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