JP2006072175A - Liquid crystal display device, method for manufacturing liquid crystal display device, and electronic apparatus - Google Patents

Abstract

【Task】
Liquid crystal display device capable of preventing deterioration in display quality such as color unevenness caused by a difference in optical path length between a reflective display and a transmissive display with a simple structure, and reducing the number of manufacturing processes, and the liquid crystal display device Manufacturing method and electronic equipment using the liquid crystal display device.
[Solution]
The formed photosensitive resin 35 for forming a colored layer, which is the first photosensitive material, is projected to the liquid crystal side in the transmission region C, so that the thickness in the transmission region C is thicker than the thickness in the reflection region D. As described above, since the first halftone mask 36 is used for exposure, for example, the photosensitive resin 35 in the transmission region C may be irradiated with more light than the photosensitive resin 35 in the reflection region D. On the other hand, the photosensitive resin 35 in the reflective region D can be irradiated with a necessary amount of light.
[Selection] Figure 3

Description

  The present invention relates to a liquid crystal display device used for a personal computer or a cellular phone, a method for manufacturing the liquid crystal display device, and an electronic apparatus using the liquid crystal display device.

  Conventionally, there is a liquid crystal display device or the like as a display device of an electronic device such as a personal computer or a mobile phone, and a liquid crystal display device such as a reflective transflective type using natural light or a backlight as a light source of the liquid crystal display device.

  Further, for example, in a reflective transflective liquid crystal display device, reflection on the display screen may occur, and in order to prevent this, an uneven reflecting surface for scattering external light has been provided, The uneven reflective surface is not necessarily formed at random, which is insufficient for display quality of a reflective transflective liquid crystal display device.

In view of this, a method has been proposed for improving the display quality of a liquid crystal display device by forming the uneven reflecting surface in a more random and easy manner (see, for example, Patent Document 1).
Japanese Patent Laying-Open No. 2003-75987 (paragraphs [0007] to [0037], FIG. 13).

  However, it has become possible to improve the display quality of the liquid crystal display device by making the shape of the uneven reflecting surface more random by the above method, but on the other hand, the optical path length in the liquid crystal panel and the transmissive display in the reflective display There is a problem of uneven color reproducibility on display caused by differences in optical path lengths in liquid crystal panels, and deterioration in display quality, and the structure and manufacturing process of color filter layers and overcoat layers that improve the optical path length difference Though conceivable, there was a problem that the manufacturing process at that time was complicated and the cost was high.

  The present invention is made in view of the above-described problems, and prevents deterioration in display quality such as uneven color caused by a difference in optical path length between a reflective display and a transmissive display with a simple structure, and a manufacturing process. It is an object of the present invention to provide a liquid crystal display device capable of reducing the amount of liquid crystal, a method for manufacturing the liquid crystal display device, and an electronic apparatus using the liquid crystal display device.

  In order to achieve the above object, a method of manufacturing a liquid crystal display device according to a main aspect of the present invention includes a plurality of pixels, a transmission region that transmits light provided in the pixels, and a reflection region that reflects light. In a method for manufacturing a liquid crystal display device, comprising: a pair of substrates that hold liquid crystal in between and facing each other; and a reflective film formed on any one of the pair of substrates. Forming a colored first photosensitive material on the reflective region and the transmissive region, and projecting the formed first photosensitive material to the liquid crystal side in the transmissive region. Thus, the step of exposing using the first halftone mask so that the thickness in the transmissive region is thicker than the thickness in the reflective region, developing the exposed first photosensitive material, and coloring Forming a layer. The features.

  Here, the “transmission region” refers to, for example, an opening formed in the reflective film, and the “halftone mask” refers to a mask for exposure. For example, light from an exposure light source is incident on the mask. This refers to a region having different amounts of transmission (shielding). The “first photosensitive material” refers to a photosensitive resin in which a photosensitive coloring material is dispersed, for example.

  In the present invention, the first halftone mask is formed so that the film thickness of the first photosensitive material protrudes toward the liquid crystal in the transmissive region so that the thickness in the transmissive region is larger than the thickness in the reflective region. For example, the first photosensitive material in the transmissive region can be irradiated with more light than the first photosensitive material in the reflective region, while the first photosensitive material in the reflective region can be irradiated. The material can be irradiated with a necessary amount of light.

  Thereby, a colored layer having a thickness smaller than that of the transmissive region is formed in the reflective region in a single coating, exposing and developing step, which conventionally required two coating, exposing and developing steps, In the transmissive region, a colored layer that is thicker than the reflective region and protrudes toward the liquid crystal side can be formed, and the number of manufacturing steps can be reduced.

  In addition, the colored layer protrudes toward the liquid crystal in the transmissive region, and the thickness in the transmissive region is greater than the thickness in the reflective region, so the color reproducibility of reflected light and transmitted light with the same colorant. Can be the same.

  According to one aspect of the present invention, the step of forming the second photosensitive material on one of the pair of substrates, and the thickness in the reflective region is greater than the thickness in the transmissive region. In order to do so, a step of exposing the formed second photosensitive material using a second halftone mask so as to protrude toward the liquid crystal in the reflective region, and the exposed second photosensitive material And a step of forming a multi-gap layer. Thus, for example, the second photosensitive material in the reflective region can be irradiated with more light than the second photosensitive material in the transmissive region, while the amount necessary for the second photosensitive material in the transmissive region is also necessary. Therefore, the transmissive area in the conventional coating, exposure and development process is thinner than the reflection area in the transmission, exposure and development processes. A thin multi-gap layer can be formed, and a multi-gap layer that is thicker than the transmissive region and protrudes toward the liquid crystal can be formed in the reflective region. Further, the manufacturing process can be reduced and the cost can be reduced. Here, the “multi-gap layer” refers to a layer formed such that the thickness of the liquid crystal layer in the transmissive region is larger than the thickness of the liquid crystal layer in the reflective region.

  According to an aspect of the present invention, the transmissive region is a region where the reflective film is not provided, and in the step of forming the first photosensitive material, the first photosensitive material is used as the reflective film. Forming the second photosensitive material on the colored layer in the step of depositing the second photosensitive material on the top and in the region where the reflective film is not provided, To do. As a result, the difference between the optical path length of the liquid crystal layer in the reflective region and the optical path length of the liquid crystal layer due to the protrusion of the colored layer in the transmissive region can be eliminated by the difference in thickness of the multi-gap layer. Thus, it is possible to prevent deterioration in display quality such as color unevenness caused by a difference in optical path length between the reflection type display and the transmission type display, and to reduce the number of manufacturing processes.

  According to an embodiment of the present invention, the first photosensitive material and the second photosensitive material are negative materials, respectively, and the first halftone mask has an area corresponding to the reflective area as the transmissive area. The second halftone mask is formed so that the area corresponding to the transmissive area is larger than the area corresponding to the reflective area. It is characterized by being. As a result, the first halftone mask, which conventionally required two coating, exposure and development steps, is thicker than the transmissive region in the reflection region in one coating, exposure and development step. A thin colored layer is formed, and the transmissive region is thicker than the reflective region and can be projected to the liquid crystal side to form a colored layer, thus preventing uneven color while reducing the number of manufacturing steps. It becomes possible to plan.

  Similarly, the formation of the multi-gap layer, which previously required two coating, exposure and development steps, is thinner in the transmission region than the reflection region in one coating, exposure and development step. A multi-gap layer is formed, and the reflective region is thicker than the transmissive region and can be projected to the liquid crystal side, thereby preventing uneven color while reducing the number of manufacturing steps. .

  According to an embodiment of the present invention, the first photosensitive material and the second photosensitive material are positive materials, respectively, and the first halftone mask has an area corresponding to the transmissive area as the reflective area. The second halftone mask is formed such that the area corresponding to the reflective area is larger than the area corresponding to the transmissive area. It is characterized by being. As a result, the first halftone mask, which conventionally required two coating, exposure and development steps, is thicker than the transmissive region in the reflection region in one coating, exposure and development step. A thin colored layer is formed, and the transmissive region is thicker than the reflective region and can be projected to the liquid crystal side to form a colored layer, thereby preventing uneven color while reducing the number of manufacturing steps. It becomes possible.

  Similarly, the formation of the multi-gap layer, which previously required two coating, exposure and development steps, is thinner in the transmission region than the reflection region in one coating, exposure and development step. A multi-gap layer is formed, and the reflective region is thicker than the transmissive region and can be projected to the liquid crystal side, thereby preventing uneven color while reducing the number of manufacturing steps. .

  According to an aspect of the present invention, the first photosensitive material and the second photosensitive material are a negative material and a positive material, respectively, and the first halftone mask has an area corresponding to the reflective area in the area. The second halftone mask is formed in the same shape as the first halftone mask. The second halftone mask is formed to have a larger light shielding amount than the region corresponding to the transmission region. Thereby, it is possible to use a halftone mask having the same shape for the formation of the colored layer and the formation of the multi-gap layer, and the manufacturing cost can be further reduced. Here, “the same shape as the first halftone mask” means that the first halftone mask itself is included.

  According to an embodiment of the present invention, the first photosensitive material and the second photosensitive material are a positive material and a negative material, respectively, and the first halftone mask has an area corresponding to the transmission area. The second halftone mask is formed in the same shape as the first halftone mask. The second halftone mask is formed to have a larger light shielding amount than the region corresponding to the reflection region. Thereby, it is possible to use a halftone mask having the same shape for the formation of the colored layer and the formation of the multi-gap layer, and the manufacturing cost can be further reduced. Moreover, it can respond by the diversity of the photosensitive material. Here, “the same shape as the first halftone mask” means that the first halftone mask itself is included.

  According to one aspect of the present invention, the exposure amount of the light source for exposure is adjusted in at least one of the exposure steps using the first halftone mask and the second halftone mask. To do. Thus, for example, even in a halftone mask having a complete exposure area for exposing a positive material, a thin colored layer or a multi-gap is also formed in the complete exposure area by adjusting the exposure amount of the light source for the exposure. A layer can be formed.

  A manufacturing method of a liquid crystal display device according to another aspect of the present invention includes a plurality of pixels, a transmissive region that transmits light and a reflective region that reflects light, and a liquid crystal held between the pixels. In the method of manufacturing a liquid crystal display device including a pair of substrates facing each other and a reflective film formed on any one of the pair of substrates, the reflective region is formed on any one of the pair of substrates. And forming a colored first photosensitive material in the transmissive region, and projecting toward the liquid crystal side in the transmissive region so that the thickness in the transmissive region is larger than the thickness in the reflective region. As described above, the method includes a step of multiply exposing the formed first photosensitive material using a plurality of types of masks, and a step of developing the exposed first photosensitive material to form a colored layer. The plurality of types of masks are formed in the transmission region. The mask formed so that the amount of light shielding differs between the corresponding region and the region corresponding to the other region, and the light shielding between the region corresponding to the transmission region and the reflection region, and the region corresponding to the other region And a mask formed to have a different amount.

  The present invention uses a plurality of types of masks to form the first photosensitive material so that the thickness in the transmissive region is larger than the thickness in the reflective region by projecting toward the liquid crystal in the transmissive region. Since multiple exposures were required, a colored layer with a smaller thickness was formed in the reflective area than in the transmissive area in a single application and development process that previously required two application and development processes. In addition, the transmissive region is thicker than the reflective region, and a colored layer can be formed by projecting toward the liquid crystal side, thereby making it possible to prevent uneven color while reducing the number of manufacturing steps.

  Similarly, if a multi-gap layer is formed, the transmissive region has a thickness that is larger than that of the reflective region in a single coating and developing step, which previously required two coating and developing steps. A thin multi-gap layer can be formed, and the reflective region can be thicker than the transmissive region and can be projected to the liquid crystal side to prevent uneven color while reducing the number of manufacturing steps. It becomes possible.

  A liquid crystal display device according to another aspect of the present invention is a liquid crystal display device including a plurality of pixels, which transmits light provided between the pair of substrates that hold the liquid crystal in between and are opposed to each other, and the pixels. A reflective region that reflects light; a reflective region that reflects light; a reflective film provided in the reflective region in any one of the pair of substrates; and the reflective region in any one of the pair of substrates. And a colored layer formed in the transmissive region so as to protrude toward the liquid crystal side in the transmissive region so that a thickness in the transmissive region is larger than a thickness in the reflective region, and on the colored layer. A multi-layer formed on the liquid crystal side, which is provided in the reflective region and the transmissive region, and protrudes toward the liquid crystal side in the reflective region so that the thickness in the reflective region is larger than the thickness in the transmissive region. Gad Characterized in that it comprises a layer.

  In the present invention, since the colored layer is formed in the reflective region and the transmissive region so as to protrude toward the liquid crystal side in the transmissive region so that the thickness in the transmissive region is larger than the thickness in the reflective region, the reflected light is reflected by the same color material. And the color reproducibility of transmitted light can be made the same.

  In addition, since the multi-gap layer disposed on the colored layer protrudes to the liquid crystal side in the reflective region, the thickness in the reflective region is formed to be thicker than the thickness in the transmissive region. The difference between the optical path length of the liquid crystal in the region and the optical path length of the liquid crystal due to the protrusion of the colored layer in the transmissive region can be eliminated by the difference in the thickness of the multi-gap layer. It is possible to prevent deterioration in display quality such as color unevenness caused by a difference in optical path length from the transmissive display, and to reduce the number of manufacturing processes.

  An electronic apparatus according to another aspect of the present invention includes the above-described liquid crystal display device.

  The present invention includes a liquid crystal display device that has a simple structure and can prevent deterioration in display quality such as color unevenness caused by an optical path length difference between a reflective display and a transmissive display, and can reduce the number of manufacturing processes. Therefore, the reliability of the performance of the electronic device can be easily increased.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description of the embodiments, as an example of a liquid crystal display device, an active matrix type liquid crystal display device using TFD (thin film diode), which is a reflective transflective type and a two-terminal type switching element, and the liquid crystal display device are used. The electronic device used will be described but is not limited to this. Moreover, in the following drawings, in order to make each structure easy to understand, the actual structure and the scale and number of each structure are different.

  (First embodiment)

  1 is a schematic perspective view of a liquid crystal panel constituting a liquid crystal display device according to a first embodiment of the present invention, FIG. 2 is a schematic plan view of a liquid crystal panel on the counter substrate side, and FIG. 3 is a line AA in FIG. And is a schematic sectional view taken along line BB.

  (Configuration of liquid crystal display device)

  As shown in FIGS. 1 and 3, for example, the liquid crystal display device 1 includes a liquid crystal panel 2, an illumination device 3 that emits light to the liquid crystal panel 2, a circuit board (not shown) connected to the liquid crystal panel 2, and other incidentals. Mechanisms are attached as necessary.

  As shown in FIGS. 1, 2 and 3, the liquid crystal panel 2 includes a color filter substrate 4 and a counter substrate 5 which are a pair of substrates facing each other, and the color filter substrate 4 and the counter substrate 5 are made of a sealing material (not shown). And a liquid crystal layer 6 which is, for example, a STN (Super Twisted Nematic) type liquid crystal and is sealed in a gap between both substrates.

  Here, the color filter substrate 4 includes a first substrate 7 which is a transparent liquid crystal display device substrate formed of a glass plate or a synthetic resin plate, and the counter substrate 5 faces the color filter substrate 4. A second substrate 8 which is a substrate for a transparent liquid crystal display device formed from a glass plate or a synthetic resin plate is used as a body. Further, a phase difference plate 9 and a polarizing plate 10 are arranged on the opposite side of the first substrate 7 from the liquid crystal layer 6, and similarly, a phase difference plate 11 and a polarizing plate 12 are arranged on the opposite side of the second substrate 8 from the liquid crystal layer 6. Is arranged.

  As shown in FIGS. 1 and 3, the color filter substrate 4 has a base layer 13 formed on the surface of the first substrate 7 on the liquid crystal layer side, and the surface of the base layer 13 has an opening which is a light transmission region described later. A reflection film 14 having a portion and a light shielding layer 15 for shielding light are formed. Further, a colored layer 16 is formed in a region delimited by the light shielding layer 15 on the liquid crystal layer side of the reflective film 14 including the opening. As a result, the colored layer 16 is directly laminated on the base layer 13 in the opening.

  Further, the color filter substrate 4 is formed with a multi-gap layer 17 covering the surfaces of the colored layer 16 and the light shielding layer 15, and further, ITO (indium tin oxide) or the like is formed on the liquid crystal layer side of the multi-gap layer 17. A scanning electrode 18 made of a transparent conductor is formed. An alignment film 19 made of, for example, polyimide resin is formed on the liquid crystal layer side of the scanning electrode 18.

  The underlayer 13 is made of a resin material, and fine irregularities are formed on the surface thereof. Thereby, the transmitted light or the like can be scattered, and the problem that it is difficult to see the image of the displayed screen can be solved.

  Further, the reflective film 14 is a single metal film such as aluminum or silver, and fine irregularities are reflected on the surface of the reflective film 14 due to the irregularities on the surface of the underlayer 13. Thereby, the reflected light reflected by the reflective film 14 can also be scattered, and the problem of being difficult to see due to reflection on the displayed screen can be solved.

  For example, as shown in FIGS. 2 and 3, the reflective film 14 has a substantially rectangular opening 20 in which the base layer 13 is not covered by the reflective film 14 at the substantial center of each color sub-pixel constituting one pixel. Are formed, and the region of the opening 20 becomes a transmission region C. As shown in FIGS. 2 and 3, a reflection region D for reflecting light incident from the outside is formed by the reflection film 14 around the opening 20. Thereby, light incident from the first substrate 7 such as a backlight described later can be transmitted from the transmission region C to the liquid crystal layer 6 and external light can be reflected by the reflection region D.

  In addition, the opening part 20 is not restricted to this example, For example, it does not need to be a circular hole or a plurality, and also the approximate center. Thereby, the best display quality can be provided by various liquid crystal display devices 1. Furthermore, even if it is not an open shape, it may be a region where no reflective film is provided.

  The colored layer 16 is formed so as to cover the transmissive region C and the reflective region D around the transmissive region by applying a negative photosensitive resin containing a coloring material such as a pigment or a dye, for example. The primary color filter is composed of any one of three colors such as R (red) 16R, G (green) 16G, and B (blue) 16B.

  Further, for example, as shown in FIG. 3, the colored layer 16 has a colored layer surface in a transmissive region C that transmits light protrudes from the colored layer surface in the reflective region D to the liquid crystal layer side, and has a thickness E in the transmissive region C. Is thicker than the thickness F in the reflection region D (E> F), and the optical path length in the transmission region C and the optical path length in the reflection region D can be made substantially the same.

  1 and 2 adopt a stripe arrangement as the arrangement pattern of the colored layer 16, but is not limited to this, and may be, for example, an oblique mosaic arrangement, a pen tile arrangement, a digital arrangement, or the like.

  The light shielding layer 15 is for shielding the boundary region between the sub-pixels 25, and intersects the boundary region in the longitudinal direction of the scanning electrode 18 of the first substrate 7 (X direction in FIG. 2). For example, as shown in FIG. 3, the colored layer 16B is arranged in the lowermost layer, and the colored layer 16R and the colored layer 16G are arranged in that order. And so on.

  Further, for example, as shown in FIGS. 1 and 3, the multi-gap layer 17 has a thickness G in the reflection region D larger than a thickness H in the transmission region C (G> H). The surface is formed so as to protrude from the surface of the multi-gap layer in the transmission region C to the liquid crystal layer side. Thus, the liquid crystal layer 6 forms a multi-gap structure in which the thickness of the liquid crystal layer 6 in the transmissive region C is larger than the thickness of the liquid crystal layer 6 in the reflective region D. The optical path length difference from the region D can be corrected.

  The scanning electrodes 18 are formed in a strip shape extending in a predetermined direction (X direction in FIGS. 2 and 3), and a plurality of scanning electrodes 18 are formed in a stripe shape in parallel with each other. Further, the alignment film 19 is an organic thin film such as polyimide, and is subjected to a rubbing process to define the alignment state of the liquid crystal layer 6.

  Next, for example, as shown in FIGS. 1, 2, and 3, the counter substrate 5 includes a plurality of pixel electrodes 21 arranged in a matrix on the surface of the second substrate 8 on the liquid crystal layer side, and boundaries between the pixel electrodes 21. A plurality of data lines 22 extending in a band shape in a direction intersecting the above-described scanning electrode 18 (Y direction in FIG. 2) in the region, and the pixel electrode 21 and the TFD 23 electrically connected to the data line 22 are arranged. An alignment film 24 is formed on the liquid crystal layer side.

  Here, the pixel electrode 21 is formed of, for example, a transparent conductor such as ITO, and a region specified by the scanning electrode 18 and the pixel electrode 21 is a sub-pixel 25.

  Further, the TFD 23 is formed on the base layer 26 formed on the surface of the second substrate 8 as shown in FIG. 3, for example, and is formed on the surface of the first metal film 27 and the first metal film 27. And the second metal film 29 formed on the insulating film 28.

  The first metal film 27 is formed of, for example, a Ta single film or a Ta alloy film having a thickness of about 100 to 500 nm, and is electrically connected to the data line 22.

  The insulating film 28 is formed of tantalum oxide having a thickness of about 10 to 35 nm, for example. The second metal film 29 is formed with a thickness of about 50 to 300 nm by a metal film such as chromium (Cr), and is electrically connected to the pixel electrode 21.

  Further, the alignment film 24 is an organic thin film similar to the alignment film 19 of the first substrate 7 and is subjected to a rubbing process.

  Next, the illumination device 3 includes, for example, a light source (not shown), a light guide plate 30, two prism sheets 31, 32, a diffusion sheet 33, a reflection sheet 34, and the like as shown in FIG.

  Here, for example, an LED (Light Emitting Diode) is used as the light source, the light guide plate 30 irradiates the entire diffusion sheet 33 with light emitted from the light source, and the prism sheets 31 and 32 are provided from the light guide plate 30. The brightness of the emitted light is improved.

  Further, the reflection sheet 34 returns light emitted from the side surface opposite to the first substrate 7 of the light guide plate 30 to the light guide plate 30 so that the light can be used effectively.

  (Manufacturing method of liquid crystal display device)

  Next, a manufacturing method of the liquid crystal display device 1 will be described focusing on the colored layer and the multi-gap layer.

  4 is a flowchart of a manufacturing process of a liquid crystal display device, FIG. 5 is a schematic plan view of a halftone mask, FIG. 6 is a schematic sectional view for explaining a manufacturing process of a colored layer, and FIG. 7 is a manufacturing process of a multi-gap layer. FIG. 8 is a schematic cross-sectional view for explaining the above and FIG. 8 is an explanatory diagram of a manufacturing process when a positive photosensitive material is used. For convenience of explanation, the irregularities on the surface of the underlayer and the reflective film are omitted in FIGS. 6, 7, and 8.

  First, as shown in FIG. 4, a resin material is uniformly applied on the first substrate 7 by spin coating or the like, and the underlying layer 13 having irregularities is formed by using a photoresist or the like (ST101).

  Then, a thin film of aluminum or the like is formed on the underlayer 13 by a vapor deposition method, a sputtering method, or the like, and this is patterned by using a photolithography method. Thus, for example, as shown in FIG. 2 and FIG. A rectangular opening 20 that is a transmissive region C is provided at approximately the center of 25, and a reflective film 14 having a reflective region D around it is formed as shown in FIG. 6A (ST102).

  Further, a negative photosensitive resin 35 in which a photosensitive coloring material, for example, a blue first photosensitive material of the three colors is dispersed on the formed reflection film 14 is spin coated or the like as shown in FIG. ) (ST103).

  Further, as shown in FIG. 5 (a), exposure is performed as shown in FIG. 6 (c) from the first halftone mask 36 matched with the stripe arrangement of the sub-pixels 25, and further development is performed. ), A blue colored layer 16B having a different thickness is formed between the transmissive region C and the reflective region D (ST104). A colored layer 16 </ b> B that is thinner than the reflective region D is also formed on the portion that becomes the light shielding layer 15. By repeating these steps ST103 and ST104 in the same manner as the red colored layer 16R and the green colored layer 16G, the three colored layers 16 finally become a transmissive region C and a reflective region D, respectively, as shown in FIG. As shown in FIG. 3, the thickness of the transmissive region C is formed so as to protrude from the surface of the reflective region D. Further, the light shielding layer 15 is also provided with a three-color colored layer so that light can be shielded.

  Here, as shown in FIG. 5A, the first halftone mask 36 is formed with a halftone mask of each color in the vertical direction (Y-axis direction in the drawing), and an area corresponding to one sub-pixel 25 thereof. In this case, a complete exposure region I having a substantially rectangular light shielding amount of, for example, approximately 0% and a half exposure region J having a light shielding amount of about half that amount are formed in the vicinity thereof. Moreover, since the color layer portions of other colors are adjacent to the halftone mask of that color, a complete light shielding region K having a light shielding amount of about 100% is formed.

  As a result, the photosensitive resin 35 in the transmission region C receives more light than the photosensitive resin 35 in the reflection region D as shown in FIG. As shown in (d), the reflective region D becomes thinner, and the surface on the transmissive region C eventually protrudes from the reflective region D.

  Next, as shown in FIG. 6E by the third ST104, the three-color colored layer 16 and the light shielding layer 15 are formed on the negative photosensitive resin as the second photosensitive material. 37 is applied by spin coating or the like as shown in FIG. 7A (ST105).

  As shown in FIG. 5B, exposure and development are performed as shown in FIG. 7B from above the second halftone mask 38 in accordance with the stripe arrangement of the sub-pixels 25, for example, FIG. As shown, the multi-gap layer 17 having different thicknesses is formed in the transmissive region C and the reflective region D (ST106).

  Here, as shown in FIG. 5B, the second halftone mask 38 is formed with a halftone mask in the vertical direction (Y-axis direction in the drawing) and the horizontal direction (X-axis direction in the drawing). In an area corresponding to one sub-pixel 25, a half-exposure area L having a substantially rectangular light shielding amount, for example, about half, and a full-exposure area M having a light shielding amount of approximately 0% are formed in the vicinity thereof. Yes. Note that, unlike the first halftone mask 36, a complete light shielding region having a light shielding amount of about 100% is not formed in a region corresponding to the sub-pixel 25.

  As a result, as shown in FIG. 7B, the photosensitive resin 37 in the reflection region D receives more light than the photosensitive resin 37 in the transmission region C, so that the negative photosensitive resin 37 is developed after development. As shown in FIG. 7C, the transmission region C becomes thinner, and the surface of the reflection region D eventually protrudes from the surface of the transmission region C.

  Further, ITO or the like, which is a material of the scan electrode 18, is deposited on the multi-gap layer 17 protruding on the reflection region D formed in ST106 by sputtering, and patterned by photolithography, and then FIG. As shown in FIGS. 2 and 3, the scanning electrodes 18 are formed in stripes with a predetermined width in the X-axis direction. Further, the alignment film 19 is formed on the scan electrode 18, and a rubbing process is performed to complete the manufacture on the first substrate side (ST107).

  Next, the TFD 23, the data line 22, and the pixel electrode 21 are formed on the second substrate 8 (ST108).

  Here, the TFD 23 is formed by depositing Ta oxide or the like on the second substrate 8 with a uniform thickness to form the base layer 26, and depositing Ta or the like on the second substrate 8 with a uniform thickness by sputtering. The data line 22 and the first metal film 27 are simultaneously formed by photolithography. At this time, the data line 22 and the first metal film 27 are connected by a bridge.

  Further, tantalum oxide or the like, which is an insulating film, is formed on the first metal film 27 with a uniform thickness to form an insulating film 28, and Cr is further formed thereon with a uniform thickness by a sputtering method. A second metal film 29 is formed using a photolithography method.

  Further, after removing the underlying layer 26 in the region where the pixel electrode 21 is to be formed, ITO is deposited to a uniform thickness by sputtering or the like, and a predetermined shape corresponding to the size of one subpixel is obtained by photolithography or the like. The pixel electrode 21 is formed so as to partially overlap the second metal film 29. Through the series of processes, the TFD 23 and the pixel electrode 21 are formed (ST108). Further, the alignment film 24 is formed thereon, and a rubbing process is performed to complete the manufacture of the second substrate side (ST109).

  Next, a gap material (not shown) is sprayed on the alignment film 24 on the second substrate side by dry spraying or the like, and the above-described first substrate 7 and second substrate 8 are bonded together via a sealing material (ST110). ). Thereafter, liquid crystal is injected from the opening of the sealing material (ST111), and the opening of the sealing material is sealed with a sealing material such as an ultraviolet curable resin. Further, the retardation plates 9 and 11 and the polarizing plates 10 and 12 are attached to the outer surfaces of the first substrate 7 and the second substrate 8 by a method such as sticking (ST112).

  Finally, necessary wiring, illumination device 3, case body, and the like are attached, and liquid crystal display device 1 is completed (ST113).

  Above, description of the manufacturing method of the liquid crystal display device 1 is complete | finished.

  In the above description, the negative photosensitive resin 35 is used for forming the colored layer 16 and the negative photosensitive resin 37 is used for forming the multi-gap layer 17. However, the present invention is not limited to this. The positive photosensitive resin 39 may be used for forming the colored layer 16, and the positive photosensitive resin 40 may be used for forming the multi-gap layer 17.

  In this case, as shown in FIG. 8A, the first halftone mask 41 used for forming the colored layer 16 is different from the first halftone mask 36 described above, and in the region corresponding to one sub-pixel 25, it is substantially centered. In addition, a half-exposure region J in which the light shielding amount of the substantially rectangular light is, for example, about half, and a complete exposure region I in which the light shielding amount of light is approximately 0% are formed around the half exposure region J. Moreover, since the color layer portions of other colors are adjacent to the halftone mask of that color, a complete light shielding region K having a light shielding amount of about 100% is formed.

  As a result, as shown in FIG. 8A, the photosensitive resin 39 in the reflective region D receives more light than the photosensitive resin 39 in the transmissive region C, so that the positive type photosensitive resin 39 is developed. As shown in FIG. 6D later, the reflective region D becomes thinner, and eventually the surface of the transmissive region C protrudes from the reflective region D. In this case, in the complete exposure area I, the colored layer 16 may not be formed in the reflection area D with a normal exposure amount. Therefore, it is necessary to adjust the exposure amount to about half (for example, about 150 mJ).

  Further, as shown in FIG. 8B, the second halftone mask 42 used for forming the multi-gap layer 17 is different from the second halftone mask 38 described above, and in the region corresponding to the one sub-pixel 25, the second halftone mask 42 is substantially the same. A completely exposed region M having a light shielding amount of, for example, approximately 0%, which is a substantially rectangular light shielding amount, and a half exposure region L, which is about half of the surroundings, are formed at the center. Note that, unlike the first halftone mask 36, a complete light shielding region having a light shielding amount of about 100% is not formed in a region corresponding to the sub-pixel 25.

  As a result, the photosensitive resin 40 in the transmission region C receives more light than the photosensitive resin 40 in the reflection region D, as shown in FIG. As shown in FIG. 7C, the transmission region C becomes thinner, and the surface of the reflection region D eventually protrudes from the surface of the transmission region C. In this case, since there is a possibility that the multi-gap layer 17 cannot be formed in the reflection region D with the normal exposure amount in the complete exposure region M, it is necessary to adjust the exposure amount to about half (for example, about 150 mJ).

  (Operation of liquid crystal display)

  Next, the operation of the liquid crystal display device 1 configured as described above will be briefly described focusing on the progress of light.

  First, a scan signal is supplied to the scan electrode 18 formed on the first substrate 7, while a data signal is supplied from the data line 22 to a predetermined pixel electrode 21 via the TFD 23 formed on the second substrate 8. Only the liquid crystal held in the region where the predetermined scanning electrode 18 and the predetermined pixel electrode 21 face each other can be driven.

  Therefore, for example, external light that has passed through the second substrate 8 and the pixel electrode 21 and entered the liquid crystal layer 6 is modulated by the liquid crystal layer 6 for each sub-pixel 25 and further passes through the multi-gap layer 17 having a thickness G. Then, it is colored by the colored layer 16 having a thickness F and reflected by the reflective film 14 in the reflective region D. Thereafter, the light passes through the colored layer 16 and the multi-gap layer 17 again, passes through the pixel electrode 21 and the second substrate 8, and is emitted from the display screen.

  On the other hand, the light emitted from the illumination device 3 passes through the first substrate 7 and the opening 20 that is the reflective film 14 in the transmission region C, and the colored layer 16 having the thickness E and the multi-gap layer 17 having the thickness H. Is incident on the liquid crystal layer 6 and then light-modulated for each sub-pixel 25 by the liquid crystal layer 6, passes through the pixel electrode 21 and the second substrate 8, and is emitted from the display screen.

  Here, the difference in optical path length due to passing through the colored layer 16 only once in the transmissive region C but twice in the reflective region D is based on the thickness F (1 μm) in the reflective region D. The thickness E can be corrected by increasing the thickness E (2 μm).

  Further, even in the liquid crystal layer 6, the optical path length difference due to passing once in the transmissive region C but twice in the reflective region D is the thickness H (0.8 μm) in the transmissive region C of the multi-gap layer 17. ) To a thickness G (4.3 μm) in the reflective region D, and protrudes toward the liquid crystal layer 6 to make correction.

  Above, description of operation | movement of the liquid crystal display device 1 is complete | finished.

  As described above, according to this embodiment, the photosensitive resin 35 for forming the colored layer, which is the first photosensitive material, is formed so as to protrude toward the liquid crystal side in the transmission region C, so that the thickness in the transmission region C is increased. Since the exposure is performed using the first halftone mask 36 so that the thickness becomes larger than the thickness in the reflective region D, for example, the photosensitive resin 35 in the transmissive region C includes the photosensitive resin in the reflective region D. While more light than 35 can be irradiated, the photosensitive resin 35 in the reflection region D can also be irradiated with a necessary amount of light.

  As a result, the colored layer 16 having a thickness smaller than that of the transmissive region C is formed in the reflective region D in a single coating, exposing and developing step, which conventionally required two coating, exposing and developing steps. In the transmissive region C, the colored layer 16 which is thicker than the reflective region D and protrudes toward the liquid crystal side can be formed, and the number of manufacturing steps can be reduced.

  Further, since the colored layer 16 is projected to the liquid crystal side in the transmissive region C and formed so that the thickness in the transmissive region C is thicker than the thickness in the reflective region D, the reflected light and the transmitted light are made of the same color material. The liquid crystal display device 1 having the same color reproducibility can be provided.

  Further, the multi-gap layer 17 disposed on the colored layer 16 is projected to the liquid crystal side in the reflective region D, and is formed so that the thickness in the reflective region D is thicker than the thickness in the transmissive region C. Therefore, the difference between the optical path length of the liquid crystal layer 6 in the reflection region D and the optical path length of the liquid crystal layer 6 due to the protrusion of the colored layer 16 in the transmission region C is eliminated by the difference in thickness of the multi-gap layer 17. In addition, it is possible to prevent deterioration in display quality such as color unevenness caused by a difference in optical path length between the reflective display and the transmissive display with a simple structure, and to reduce the number of manufacturing processes.

  Further, in order to make the thickness in the reflective region D thicker than the thickness in the transmissive region C, the photosensitive resin 37 formed so as to protrude to the liquid crystal side in the reflective region D is used with the second halftone mask 38. For example, the photosensitive resin 37 in the reflective region D can be irradiated with more light than the photosensitive resin 37 in the transmissive region C, while the photosensitive resin 37 in the transmissive region C can be irradiated. Also, a necessary amount of light can be irradiated. As a result, the multi-gap layer 17 having a thickness smaller than that of the reflective region D in the transmissive region C in a single coating, exposing and developing step, which conventionally required two coating, exposing and developing steps. The multi-gap layer 17 that is thicker than the transmissive region C and protrudes toward the liquid crystal side can be formed in the reflective region D. Further, the manufacturing process can be reduced and the cost can be reduced.

  (Modification 1)

  Next, Modification 1 of the liquid crystal display device 1 according to the present invention will be described. In the first modification, the second halftone mask 38 used for forming the multi-gap layer 17 in the method for manufacturing the liquid crystal display device has the same shape as the first halftone mask 36 used for forming the colored layer 16. Therefore, since this is different from the first embodiment, this point will be mainly described. In addition, about the component which is common in the component of 1st Embodiment, the code | symbol same as the component of 1st Embodiment is attached | subjected, and the description is abbreviate | omitted.

  9 is a flowchart when the same halftone mask is used, FIG. 10 is a schematic cross-sectional view for explaining the manufacturing process of the multi-gap layer, and FIG. 11 is a description of the manufacturing process when the combination of negative and positive is reversed. FIG. For convenience of explanation, the irregularities on the surface of the base layer and the reflective film are omitted in FIGS. 9, 10, and 11.

  (Configuration of liquid crystal display device)

  Since the configuration of the liquid crystal display device is the same as that of the liquid crystal display device 1 of the first embodiment, the description thereof is omitted.

  (Manufacturing method of liquid crystal display device)

  As ST101 to ST104 and ST107 to ST113 are the same as the manufacturing method of the first embodiment as shown in FIG. 9, the description thereof is omitted, and application and exposure of the photosensitive resin 37 for the multi-gap layer 17 are performed. Development will be mainly described.

  As a result of the third ST104, as shown in FIG. 6E, the three-color colored layer 16 and the light shielding layer 15 are formed, and the positive photosensitive resin 40, which is the second photosensitive material, is spinned thereon. Application is performed as shown in FIG. 7A by a coating method or the like (ST201).

  Then, exposure is performed as shown in FIG. 10 from above the first halftone mask 36 (or a mask having the same shape as the halftone mask 36) matched to the stripe arrangement of the sub-pixels 25 as shown in FIG. . At this time, since the first halftone mask 36 of one color can be exposed simultaneously only in the vertical direction by separating the other two colors, the multiple exposures in which exposure is performed with the first halftone masks of the other two colors are performed in the vertical direction. In addition, the exposure process can be performed over the entire surface in the same manner as the halftone mask is formed in the lateral direction.

  By further developing, for example, as shown in FIG. 7C, a multi-gap layer 17 having a different thickness is formed in the transmissive region C and the reflective region D (ST202).

  Here, as shown in FIG. 5A, the first halftone mask 36 is formed with a plurality of halftone masks in the vertical direction (Y-axis direction in the drawing) with the other two colors separated. In a region corresponding to one sub-pixel 25, a substantially rectangular light shielding amount is approximately 0%, for example, in a substantially central portion, and a half exposure region J having a light shielding amount of about half that amount around it. Is formed. In addition, on both sides of the halftone mask, a complete light shielding region K having a light shielding amount of about 100% is formed.

  As a result, as shown in FIG. 10, the photosensitive resin 40 in the transmission region C receives more light than the photosensitive resin 40 in the reflection region D. As shown in c), the reflection region D becomes thicker, and the surface of the reflection region D eventually protrudes from the transmission region C.

  The following steps are the same as ST107 and subsequent steps in the manufacturing method of the first embodiment. Finally, necessary wiring, lighting device 3, case body, and the like are attached, and liquid crystal display device 1 is completed (ST113).

  Above, description of the manufacturing method of the modification 1 of the liquid crystal display device 1 is complete | finished.

  In the above description, the negative photosensitive resin 35 is used for forming the colored layer 16, and the positive photosensitive resin 40 is used for forming the multi-gap layer 17. However, the present invention is not limited to this. The positive photosensitive resin 39 may be used for forming the layer 16, and the negative photosensitive resin 37 may be used for forming the multi-gap layer 17.

  In this case, as shown in FIG. 11A, the first halftone mask 41 used for forming the colored layer 16 is different from the first halftone mask 36 described above, and in the region corresponding to one sub-pixel 25, it is substantially at the center. In addition, a half-exposure region J in which the light shielding amount of the substantially rectangular light is, for example, about half the light shielding amount, and a complete exposure region I of approximately 0% are formed in the periphery thereof. In addition, since both sides of the halftone mask of that color are portions of colored layers of other colors, a complete light shielding region K having a light shielding amount of approximately 100% is formed.

  As a result, as shown in FIG. 11A, the photosensitive resin 39 in the reflection region D receives more light than the photosensitive resin 39 in the transmission region C, so that the positive type photosensitive resin 39 is developed. As shown in FIG. 6D later, the reflective region D becomes thinner, and eventually the surface of the transmissive region C protrudes from the reflective region D. In this case, in the complete exposure area I, the colored layer 16 may not be formed in the reflection area D with a normal exposure amount. Therefore, it is necessary to adjust the exposure amount to about half (for example, about 150 mJ).

  In addition, as shown in FIG. 11B, the first halftone mask 41 of one color used for forming the multi-gap layer 17 can simultaneously expose a plurality of other two colors only in the vertical direction while leaving the other two colors. The exposure process can be performed over the entire surface in the same manner that the halftone mask is formed in the vertical direction and the horizontal direction by performing multiple exposure in which each of the first halftone masks is exposed.

  By further developing, for example, as shown in FIG. 7C, a multi-gap layer 17 having a different thickness is formed in the transmissive region C and the reflective region D, and the surface of the reflective region D is eventually the transmissive region. It will protrude from the surface at C.

  (Operation of liquid crystal display)

  Next, since the operation of the modification 1 of the liquid crystal display device 1 configured as described above is the same as the operation of the liquid crystal display device 1 of the first embodiment, the description thereof is omitted.

  As described above, according to the first modification, a halftone mask having the same shape can be used for the formation of the colored layer 16 and the formation of the multi-gap layer 17, and the manufacturing cost can be further reduced.

  (Second Embodiment)

  Next, a second embodiment of the liquid crystal display device according to the present invention will be described. In the present embodiment, the point that the multi-gap layer is formed on the counter substrate side is different from that of the first embodiment. In addition, about the component which is common in the component of 1st Embodiment, the code | symbol same as the component of 1st Embodiment is attached | subjected, and the description is abbreviate | omitted.

  FIG. 12 is a partial schematic cross-sectional view of a liquid crystal panel constituting a liquid crystal display device 101 according to the second embodiment of the present invention.

  (Configuration of liquid crystal display device)

  The liquid crystal display device 101 includes, for example, a liquid crystal panel 102, a lighting device 3 that emits light to the liquid crystal panel 102, a circuit board (not shown) connected to the liquid crystal panel 102, and other incidental mechanisms as necessary. .

  As shown in FIG. 12, the liquid crystal panel 102 has a color filter substrate 104 and a counter substrate 105, which are opposite to each other, and the color filter substrate 104 and the counter substrate 105 bonded together with a sealant (not shown). For example, the liquid crystal layer 6 is a super twisted nematic (STN) type liquid crystal sealed in the gap.

  Here, the color filter substrate 104 includes a first substrate 7 which is a transparent liquid crystal display device substrate formed of a glass plate or a synthetic resin plate, and the counter substrate 105 faces the color filter substrate 104. A second substrate 8 which is a substrate for a transparent liquid crystal display device formed from a glass plate or a synthetic resin plate is used as a body. Further, a phase difference plate 9 and a polarizing plate 10 are arranged on the opposite side of the first substrate 7 from the liquid crystal layer 6, and similarly, a phase difference plate 11 and a polarizing plate 12 are arranged on the opposite side of the second substrate 8 from the liquid crystal layer 6. Is arranged.

  As shown in FIG. 12, the color filter substrate 104 has a base layer 13 formed on the surface of the first substrate 7 on the liquid crystal layer side, and the surface of the base layer 13 has a reflection portion having an opening as a light transmission region. A film 14 and a light shielding layer 15 for shielding light are formed. Further, a colored layer 16 is formed in a region delimited by the light shielding layer 15 on the liquid crystal layer side of the reflective film 14 including the opening. As a result, the colored layer 16 is directly laminated on the base layer 13 in the opening.

  Further, the color filter substrate 104 has a scanning electrode 118 made of a transparent conductor such as ITO (indium tin oxide) formed on the colored layer 16 on the liquid crystal layer side. An alignment film 119 made of, for example, a polyimide resin is formed on the liquid crystal layer side of the scanning electrode 118.

  Next, for example, as shown in FIG. 12, the counter substrate 105 includes a multi-gap layer 117 on the surface of the second substrate 8 on the liquid crystal layer side, a plurality of pixel electrodes 121 arranged in a matrix stacked thereon, In the boundary region of the pixel electrode 121, a plurality of data lines 22 extending in a strip shape in the direction intersecting with the scanning electrode 118 (the Y direction in FIG. 2), and the TFD 23 electrically connected to the pixel electrode 121 and the data line 22 And an alignment film 124 is formed on the liquid crystal layer side.

  Here, for example, as shown in FIG. 12, the multi-gap layer 117 has a thickness N in the reflection region D larger than a thickness O in the transmission region C (N> O), and the multi-gap layer surface in the reflection region D Are formed so as to protrude from the surface of the multi-gap layer in the transmission region C toward the liquid crystal layer. Thus, the liquid crystal layer 6 forms a multi-gap structure in which the thickness of the liquid crystal layer 6 in the transmissive region C is larger than the thickness of the liquid crystal layer 6 in the reflective region D. Differences in the optical path length from the area D can be corrected.

  The pixel electrode 121 is formed of a transparent conductor such as ITO, and a region specified by the scanning electrode 118 and the pixel electrode 121 becomes the sub-pixel 25.

  Further, the alignment film 124 is an organic thin film similar to the alignment film 119 of the first substrate 7 and is subjected to a rubbing process.

  (Manufacturing method of liquid crystal display device)

  Next, since the manufacturing method of the liquid crystal display device 101 is different from the first embodiment in that a multi-gap layer is formed on a second substrate, the multi-gap layer will be mainly described.

  FIG. 13 is a flowchart of the manufacturing process of the liquid crystal display device, and FIG. 14 is a schematic cross-sectional view for explaining the manufacturing process of the multi-gap layer. For convenience of explanation, in FIG. 14, irregularities on the surface of the underlayer and the reflective film are omitted.

  First, a resin material is uniformly applied on the first substrate 7 by spin coating or the like, and the underlying layer 13 having irregularities is formed by a photoresist or the like (ST101). Hereafter, since it is the same as that of 1st Embodiment until ST104, description is abbreviate | omitted.

  Then, at the third ST104, as shown in FIG. 6 (e), the three colored layers 16 and the light shielding layer 15 are formed thereon, and ITO or the like, which is the material of the scanning electrode 118, is applied by sputtering. Then, patterning is performed by a photolithography method to form scanning electrodes 118 in a stripe shape with a predetermined width in the X-axis direction as shown in FIG. Further, an alignment film 119 is formed on the scan electrode 118, and a rubbing process is performed to complete the manufacture on the first substrate side (ST301).

  Next, the TFD 23 and the data line 22 are formed on the second substrate 8 (ST302), and a negative photosensitive resin 37, which is a second photosensitive material including a region where the pixel electrode 121 is to be formed, is spinned thereon. Application is performed as shown in FIG. 14A by a coating method or the like (ST303).

  Then, as shown in FIG. 5B, the second halftone mask 38 matched with the stripe arrangement of the sub-pixels 25 is exposed and further developed as shown in FIG. As shown in c), multi-gap layers 117 having different thicknesses are formed in the transmissive region C and the reflective region D (ST304). Although not shown in FIG. 14, a through-hole is formed in the multi-gap layer 117 so as to electrically connect the pixel electrode 121 and the second metal film 29.

  In addition, ITO is formed in a uniform thickness on the multi-gap layer 117 formed in ST304 by sputtering or the like, and further a pixel electrode 121 having a predetermined shape corresponding to the size of one sub-pixel by photolithography or the like. Is partially connected to the second metal film 29. Further, an alignment film 124 is formed thereon, and a rubbing process is performed to complete the manufacture on the second substrate side (ST305).

  Since ST110 is the same as in the first embodiment from ST110 to ST113 in which the last necessary wiring, illumination device 3, case body, and the like are attached and liquid crystal display device 101 is completed, description thereof is omitted.

  Above, description of the manufacturing method of the liquid crystal display device 101 is complete | finished.

  In the above description, the negative photosensitive resin 35 is used for forming the colored layer 16, and the negative photosensitive resin 37 is used for forming the multi-gap layer 117. However, the present invention is not limited to this. As in the first embodiment, the positive photosensitive resin 39 may be used for forming the colored layer 16 and the positive photosensitive resin 40 may be used for forming the multi-gap layer 117.

  In this case, the first halftone mask 41 used for forming the colored layer 16 is different from the first halftone mask 36 described above, and in a region corresponding to one sub-pixel 25, the light shielding amount of a substantially rectangular light at the substantially center. For example, a half exposure region J having a light shielding amount of about half and a completely exposed region I of approximately 0% are formed around it. In addition, since both sides of the halftone mask of that color are portions of colored layers of other colors, a complete light shielding region K having a light shielding amount of approximately 100% is formed.

  As a result, the photosensitive resin 39 in the reflective region D receives more light than the photosensitive resin 39 in the transmissive region C, so that the positive photosensitive resin 39 is thinner in the reflective region D after development. As a result, the surface of the transmission region C eventually protrudes from the surface of the reflection region D. In this case, in the complete exposure region I, the colored layer 16 may not be formed on the reflection region D with a normal exposure amount, so the exposure amount needs to be adjusted to about half (for example, about 150 mJ).

  Also, the second halftone mask 42 used for forming the multi-gap layer 117 is different from the second halftone mask 38 described above, and in the region corresponding to one of the sub-pixels 25, a substantially rectangular light is shielded at the substantially center. A completely exposed region M having a light shielding amount of, for example, approximately 0%, and a half-exposed region L that is approximately half are formed around it. Note that, unlike the first halftone mask 36, a complete light shielding region having a light shielding amount of about 100% is not formed in a region corresponding to the sub-pixel 25.

  As a result, the photosensitive resin 40 in the transmission region C receives more light than the photosensitive resin 40 in the reflection region D, so that the positive photosensitive resin 40 becomes thinner in the transmission region C after development. Eventually, the surface of the reflection region D protrudes from the surface of the transmission region C. In this case, since there is a possibility that the multi-gap layer 117 cannot be formed in the transmission region C with the normal exposure amount in the complete exposure region M, it is necessary to adjust the exposure amount to about half (for example, about 150 mJ).

  (Operation of liquid crystal display)

  Next, the operation of the liquid crystal display device 101 configured as described above will be briefly described focusing on the progress of light.

  First, a scan signal is supplied to the scan electrode 118 formed on the first substrate 7, while a data signal is supplied from the data line 22 to a predetermined pixel electrode 121 via the TFD 23 formed on the second substrate 8. Only the liquid crystal held in the region where the predetermined scanning electrode 118 and the predetermined pixel electrode 121 face each other can be driven.

  Therefore, for example, external light that has passed through the second substrate 8, the multi-gap layer 117 having a thickness N, and the pixel electrode 121 and entered the liquid crystal layer 6 is optically modulated by the liquid crystal layer 6 for each sub-pixel 25, and further thickened. It is colored by the colored layer 16 of thickness F and reflected by the reflective film 14 in the reflective region D. Thereafter, the light passes through the colored layer 16, the liquid crystal layer 6, and the pixel electrode 121 again, passes through the multi-gap layer 117 and the second substrate 8, and is emitted from the display screen.

  On the other hand, the light emitted from the illumination device 3 passes through the first substrate 7 and the opening 20 of the transmission region C, passes through the colored layer 16 having a thickness E, and enters the liquid crystal layer 6, and then the liquid crystal. The light is modulated for each sub-pixel 25 by the layer 6, and is emitted from the display screen through the pixel electrode 121, the multi-gap layer 117 having a thickness of O, and the second substrate 8.

  Here, the difference in optical path length due to passing through the colored layer 16 only once on the transmission region C but twice on the reflection region D is transmitted from the thickness F (1 μm) in the reflection region D. It is possible to correct by increasing the thickness E (2 μm) in the region C.

  In addition, the liquid crystal layer 6 passes only once on the transmission region C but twice on the reflection region D, and the difference in optical path length due to the passage twice on the reflection region D is the thickness O (of the multi-gap layer 117 in the transmission region C. From 0.8 μm) to the thickness N (4.3 μm) in the reflection region D, the thickness can be made to protrude toward the liquid crystal layer 6 to be corrected.

  Above, description of operation | movement of the liquid crystal display device 1 is complete | finished.

  As described above, according to the present embodiment, the colored layer 16 is protruded toward the liquid crystal side in the transmission region C, and the thickness in the transmission region C is larger than the thickness in the reflection region D. The liquid crystal display device 101 in which the color material has the same color reproducibility between the reflected light and the transmitted light can be provided.

  Further, the multi-gap layer 117 disposed on the second substrate 8 is projected to the liquid crystal side in the reflective region D, and is formed so that the thickness in the reflective region D is thicker than the thickness in the transmissive region C. Therefore, the difference between the optical path length of the liquid crystal layer 6 in the reflection region D and the optical path length of the liquid crystal layer 6 due to the protrusion of the colored layer 16 in the transmission region C is eliminated by the difference in thickness of the multi-gap layer 117. In addition, it is possible to prevent a reduction in display quality such as color unevenness caused by a difference in optical path length between the reflective display and the transmissive display with a simple structure, and to reduce the number of manufacturing processes.

  Further, in order to make the thickness in the reflective region D thicker than the thickness in the transmissive region C, the photosensitive resin 37 formed so as to protrude to the liquid crystal side in the reflective region D is used with the second halftone mask 38. For example, the photosensitive resin 37 in the reflective region D can be irradiated with more light than the photosensitive resin 37 in the transmissive region C, while the photosensitive resin 37 in the transmissive region C can be irradiated. Also, a necessary amount of light can be irradiated. As a result, a multi-gap layer 117 having a thickness smaller than that of the reflective region D in the transmissive region C in a single coating, exposing and developing step, which conventionally required two coating, exposing and developing steps. The multi-gap layer 117 that is thicker than the transmissive region C and protrudes toward the liquid crystal side can be formed in the reflective region D. In addition, the manufacturing process can be reduced and the cost can be reduced, and various liquid crystal display devices can be supported.

  (Third Embodiment / Electronic Device)

  Next, an electronic apparatus according to the third embodiment of the present invention including the liquid crystal display devices 1 and 101 described above will be described. In addition, about the component which is common in the component of 1st Embodiment and the modification 1, the code | symbol same as the component of 1st Embodiment and the modification 1 is attached | subjected, and the description is abbreviate | omitted.

  FIG. 15: is a schematic block diagram which shows the whole structure of the display control system of the electronic device which concerns on the 3rd Embodiment of this invention.

  The electronic device 300 includes, for example, a liquid crystal panel 2 and a display control circuit 390 as shown in FIG. 15 as a display control system. The display control circuit 390 includes a display information output source 391, a display information processing circuit 392, a power supply circuit 393, and the like. A timing generator 394 and the like are included.

  Further, the liquid crystal panel 2 has a drive circuit 361 for driving the display area S.

  The display information output source 391 includes a memory such as a ROM (Read Only Memory) or a RAM (Random Access Memory), a storage unit such as a magnetic recording disk or an optical recording disk, and a tuning circuit that tunes and outputs a digital image signal. It has. Further, the display information output source 391 is configured to supply display information to the display information processing circuit 392 in the form of a predetermined format image signal or the like based on various clock signals generated by the timing generator 394.

  The display information processing circuit 392 includes various well-known circuits such as a serial-parallel conversion circuit, an amplification / inversion circuit, a rotation circuit, a gamma correction circuit, and a clamp circuit, and executes processing of input display information to display the image. Information is supplied to the drive circuit 361 together with the clock signal CLK. The power supply circuit 393 supplies a predetermined voltage to each component described above.

  As described above, according to the present embodiment, the colored layer 16 is protruded toward the liquid crystal side in the transmission region C, and the thickness in the transmission region C is larger than the thickness in the reflection region D. It is possible to provide the electronic device 300 including the liquid crystal display device 1 in which the color material has the same color reproducibility between the reflected light and the transmitted light.

  Further, the multi-gap layer 17 disposed on the colored layer 16 is projected to the liquid crystal side in the reflective region D, and is formed so that the thickness in the reflective region D is thicker than the thickness in the transmissive region C. Therefore, the difference between the optical path length of the liquid crystal layer 6 in the reflection region D and the optical path length of the liquid crystal layer 6 due to the protrusion of the colored layer 16 in the transmission region C is eliminated by the difference in thickness of the multi-gap layer 17. In addition, it is possible to provide an electronic device that has a simple structure and prevents deterioration in display quality such as color unevenness caused by a difference in optical path length between the reflective display and the transmissive display, and has fewer manufacturing processes.

  In particular, recent electronic devices are required to exhibit a low-cost and high-quality display function, and it can be said that the present invention that provides a high display quality at a low cost is significant.

  Specific electronic equipment includes touch panels, projectors, liquid crystal televisions, viewfinder type, monitor direct view type video tape recorders, car navigation systems, pagers, electronic notebooks that are equipped with liquid crystal display devices in addition to mobile phones and personal computers. Calculators, word processors, workstations, videophones, POS terminals and the like. And it cannot be overemphasized that the liquid crystal display devices 1 and 101 which were mentioned above are applicable as a display part of these various electronic devices, for example.

  Note that the electro-optical device and the electronic apparatus of the present invention are not limited to the above-described examples, and it is needless to say that various modifications can be made without departing from the gist of the present invention.

  Although the present invention has been described above with the preferred embodiment, the present invention is not limited to any of the above-described embodiments, and can be implemented with appropriate modifications within the scope of the technical idea of the present invention. In addition, the embodiments and modifications can be combined as appropriate within the scope of the technical idea of the present invention.

  For example, in the above-described embodiments and modifications, the thin film diode element active matrix type liquid crystal display device has been described. However, the present invention is not limited to this. For example, the thin film transistor element active matrix type and passive matrix type liquid crystal display devices may be used. Good. As a result, even for a wide variety of liquid crystal display devices, the display quality can be improved while reducing the manufacturing cost with a simple structure.

  In the second embodiment described above, the coloring layer 16 and the multi-gap layer 117 are exposed using different halftone masks. However, the present invention is not limited to this, and the first embodiment is not limited thereto. As in the first modification, the colored layer 16 and the multi-gap layer 117 may be exposed with the same halftone mask, for example, the first halftone mask 36.

  In this case, for example, the negative photosensitive resin 35 may be used for forming the colored layer 16, the positive photosensitive resin 40 may be used for forming the multi-gap layer 117, and the positive photosensitive resin 40 may be used for forming the colored layer 16. A negative photosensitive resin 37 may be used to form the multi-gap layer 117 using a negative photosensitive resin 39.

  When the positive photosensitive resin 39 is used for forming the colored layer 16 and the negative photosensitive resin 37 is used for forming the multi-gap layer 117, the colored layer 16 (multi-gap layer 117) is used. In the region corresponding to one sub-pixel 25, the first halftone mask 41 is substantially in the middle of the half-exposure region J in which the light shielding amount of the substantially rectangular light is, for example, about half the light shielding amount, and in the vicinity thereof. A completely exposed area I of 0% is formed. Moreover, since the color layer portions of other colors are adjacent to the halftone mask of that color, a complete light shielding region K having a light shielding amount of about 100% is formed.

  As a result, the manufacturing cost can be further reduced, and the first photosensitive material and the second photosensitive material are exposed with the same shape mask, so that the position adjustment is accurate and easy.

  Further, the colored layer and the multi-gap layer may be formed by multiple exposure in which exposure is performed using a plurality of types of masks having different light-shielding regions and development. In this case, a colored layer or a multi-gap layer can be formed in a single coating and developing step, which conventionally required two coating and developing steps.

1 is a schematic perspective view of a liquid crystal panel according to a first embodiment. It is a schematic plan view by the side of the opposing board | substrate of the liquid crystal panel which concerns on 1st Embodiment. It is a schematic sectional drawing of the AA line and BB line in FIG. It is a flowchart figure of the manufacturing process of the liquid crystal display device which concerns on 1st Embodiment. It is a schematic plan view of the halftone mask according to the first embodiment. It is a schematic sectional drawing for demonstrating the manufacturing process of the colored layer which concerns on 1st Embodiment. It is a schematic sectional drawing for demonstrating the manufacturing process of a multi gap layer. It is a schematic sectional drawing for demonstrating the manufacturing process at the time of using a positive photosensitive material. 10 is a flowchart of a method for manufacturing a liquid crystal display device according to Modification 1. FIG. 10 is a schematic cross-sectional view of a manufacturing process of a multi-gap layer according to Modification 1. FIG. It is a schematic sectional drawing of a manufacturing process at the time of reversing the combination of negative and positive. It is a partial schematic sectional drawing of the liquid crystal panel which concerns on 2nd Embodiment. It is a flowchart figure of the manufacturing process of the liquid crystal display device which concerns on 2nd Embodiment. It is a schematic sectional drawing of the manufacturing process of the multi gap layer which concerns on 2nd Embodiment. It is a schematic block diagram of the display control system of the electronic device which concerns on 3rd Embodiment.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1,101 Liquid crystal display device, 2,102 Liquid crystal panel, 3 Illumination device, 4,104 Color filter substrate, 5,105 Opposite substrate, 6 Liquid crystal layer, 7 First substrate, 8 Second substrate, 9,11 Phase difference plate 10, 12 Polarizing plate, 13, 26 Underlayer, 14 Reflective film, 15 Light shielding layer, 16 Colored layer, 17, 117 Multi-gap layer, 18, 118 Scan electrode, 19, 24, 119, 124 Alignment film, 20 Opening, 21, 121 pixel electrode, 22 data line, 23 TFD, 25 subpixel, 27 first metal film, 28 insulating film, 29 second metal film, 30 light guide plate, 31, 32 prism sheet, 33 diffusion sheet, 34 reflective sheet, 35, 37, 39, 40 photosensitive resin, 36, 41 first halftone mask, 38, 4 2 Second halftone mask, 300 electronic device, 361 drive circuit, 390 display control circuit

Claims (11)

A plurality of pixels, a transmissive region that transmits light provided in the pixel, a reflective region that reflects light, a pair of substrates that hold liquid crystal in between and face each other, and one of the pair of substrates In a method for manufacturing a liquid crystal display device comprising a reflective film formed on a substrate,
Forming a colored first photosensitive material on the reflective region and the transmissive region on any one of the pair of substrates;
The first halftone mask is formed so that the thickness of the first photosensitive material thus formed is projected to the liquid crystal side in the transmissive region so that the thickness in the transmissive region is larger than the thickness in the reflective region. Exposing with
And a step of developing the exposed first photosensitive material to form a colored layer. Depositing a second photosensitive material on one of the pair of substrates;
In order to make the thickness in the reflective region thicker than the thickness in the transmissive region, the second photosensitive material thus formed is projected to the liquid crystal side in the reflective region using a second halftone mask. Using and exposing,
The method of manufacturing a liquid crystal display device according to claim 1, further comprising: developing the exposed second photosensitive material to form a multi-gap layer. The transmission region is a region where the reflective film is not provided,
In the step of depositing the first photosensitive material, the first photosensitive material is deposited on the reflective film and in a region where the reflective film is not provided,
The method for manufacturing a liquid crystal display device according to claim 2, wherein in the step of forming the second photosensitive material, the second photosensitive material is formed on the colored layer. The first photosensitive material and the second photosensitive material are negative materials, respectively.
The first halftone mask is formed such that a region corresponding to the reflective region has a larger light shielding amount than a region corresponding to the transmissive region,
The said 2nd halftone mask is formed so that the area | region corresponding to the said transmissive area | region may become larger in the light-shielding amount than the area | region corresponding to the said reflective area | region. A method for manufacturing a liquid crystal display device. The first photosensitive material and the second photosensitive material are positive materials, respectively.
The first halftone mask is formed such that a region corresponding to the transmissive region has a larger light shielding amount than a region corresponding to the reflective region,
The said 2nd halftone mask is formed so that the area | region corresponding to the said reflection area may become larger in the amount of light shielding than the area | region corresponding to the said transmissive area | region. A method for manufacturing a liquid crystal display device. The first photosensitive material and the second photosensitive material are a negative material and a positive material, respectively.
The first halftone mask is formed such that a region corresponding to the reflective region has a larger light shielding amount than a region corresponding to the transmissive region,
The method for manufacturing a liquid crystal display device according to claim 2, wherein the second halftone mask has the same shape as the first halftone mask. The first photosensitive material and the second photosensitive material are a positive material and a negative material, respectively.
The first halftone mask is formed such that a region corresponding to the transmissive region has a larger light shielding amount than a region corresponding to the reflective region,
4. The method of manufacturing a liquid crystal display device according to claim 2, wherein the second halftone mask has the same shape as the first halftone mask. 5.   8. The exposure amount of the light source for exposure is adjusted in at least one of the exposure steps of the exposure step using the first halftone mask and the second halftone mask. The manufacturing method of the liquid crystal display device as described in any one. A plurality of pixels, a transmissive region that transmits light provided in the pixel and a reflective region that reflects light, a pair of substrates that hold liquid crystal in between and face each other, and one of the pair of substrates In a method for manufacturing a liquid crystal display device comprising a reflective film formed on a substrate,
Forming a colored first photosensitive material on the reflective region and the transmissive region on any one of the pair of substrates;
A plurality of types of masks are used to form the first photosensitive material so that the thickness in the transmissive region is larger than the thickness in the reflective region by projecting toward the liquid crystal in the transmissive region. Multiple exposure process,
Developing the exposed first photosensitive material to form a colored layer,
The plurality of types of masks include a mask formed so that a light shielding amount is different between a region corresponding to the transmissive region and a region corresponding to another region, and a region corresponding to the transmissive region and the reflective region. A method for manufacturing a liquid crystal display device, comprising: a mask formed to have a different light shielding amount in a region corresponding to another region. In a liquid crystal display device having a plurality of pixels,
A pair of substrates holding the liquid crystal in between and facing each other;
A transmissive region that transmits light and a reflective region that reflects light provided in the pixel;
In any one of the pair of substrates, a reflective film provided in the reflective region;
One of the pair of substrates is provided in the reflective region and the transmissive region, and the liquid crystal side in the transmissive region is thicker than the thickness in the reflective region. A colored layer formed so as to protrude from
Provided in the reflective region and the transmissive region on the liquid crystal side on the colored layer, and protrudes toward the liquid crystal side in the reflective region so that the thickness in the reflective region is larger than the thickness in the transmissive region. And a multi-gap layer formed in the same manner.   An electronic apparatus comprising the liquid crystal display device according to claim 10.

Images