JP2004087798A - Substrate processing equipment - Google Patents

Abstract

A substrate processing apparatus capable of uniformly applying a chemical solution is provided.
A main body of a substrate processing apparatus, a stage for holding a substrate, a bridge structure, linear motors for moving the bridge structure in the X-axis direction, and positions of the bridge structure. Linear encoders 52 and 53 for detection and a pair of running rails 31 a are provided on both sides of the holding surface 30 of the stage 3. The cross-linking structure 4 is provided with a nozzle support 40 to which a slit nozzle for discharging a resist solution is attached, and lift mechanisms 43 and 44 for raising and lowering the nozzle support 40 in the Z-axis direction. When the slit nozzle discharges the resist liquid onto the substrate, the control system 6 controls the linear motors 50 and 51 in synchronization with each other based on the detection results from the linear encoders 52 and 53, thereby controlling the slit nozzle. Perform position control.
[Selection diagram] Fig. 1

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a position control technique of a processing tool for performing a predetermined process on a substrate in a substrate processing apparatus.
[0002]
[Prior art]
When applying a chemical solution to a substrate, scan coating, in which the substrate is held at a predetermined position on a holding table and a chemical solution is applied to a predetermined position on the substrate by scanning with a slit nozzle that discharges the chemical solution, has become a general trend. It is in. In particular, when a substrate to be processed is large or a rectangular substrate, it is difficult to apply a uniform chemical solution by spin coating, and therefore, application by scan coating is used.
[0003]
The scanning by the slit nozzle in the scan coating is performed by moving two movable tables rigidly connected to both ends of the slit nozzle in respective moving directions by different drive motors.
[0004]
Conventionally, when such scanning is performed, a technique has been known in which, in order to apply a chemical solution to a predetermined position on a substrate, position control is performed on one moving table, and only torque control is performed on the other moving table. According to such a technique, since the slit nozzle and the moving table are rigidly connected to each other, it is possible to move the slit nozzle to a predetermined position by controlling the position based on any of those configurations. it can.
[0005]
[Problems to be solved by the invention]
Here, since a certain amount of chemical solution is discharged from the slit nozzle, the liquid is applied thicker if the moving speed of the slit nozzle is slow, and thinner if the moving speed of the slit nozzle is fast. That is, in scanning in scan coating, it is important to move the slit nozzle at a constant speed in order to uniformly apply the chemical solution.
[0006]
However, if position control is performed on only one of the drive motors of the two rigidly coupled moving tables, a feed error is likely to occur in the left and right moving tables, and the feed error may cause a linear guide to be twisted or a change in frictional force. This causes a problem that the feed speed of the slit nozzle cannot be kept constant, and the chemical solution cannot be applied uniformly.
[0007]
In order to prevent such "torsion", an elastic support or a structure capable of changing the angle is used, but in that case, the holding accuracy of the slit nozzle is reduced or the mechanism is complicated. There was a problem. In addition, there is a problem that the left and right feed unevenness occurs in the elastic support.
[0008]
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to provide a substrate processing apparatus capable of preventing a slit nozzle feeding error and uniformly applying a chemical solution.
[0009]
[Means for Solving the Problems]
In order to solve the above problems, the invention according to claim 1 includes a holding table for holding a substrate, a cross-linking structure in which a predetermined processing tool is attached in a substantially horizontal direction, and is bridged along the surface of the holding table. A moving means for moving the cross-linked structure in a direction along the surface of the substrate held by the holding table, and a control means for controlling the moving means, while moving the cross-linked structure in the direction, In a substrate processing apparatus that performs a predetermined process on the surface of the substrate by scanning the surface of the substrate with the processing tool, the moving unit may include a plurality of units separately arranged on both sides of the holding table. It has a moving means, and the control means moves both ends of the bridge structure by controlling the position of each of the plurality of unit moving means.
[0010]
Further, the invention according to claim 2 is the substrate processing apparatus according to claim 1, wherein each of the unit moving means is attached to the holding table and extends along a moving direction of the bridge structure; A linear motor that extends from the bridge structure and generates a driving force for moving the bridge structure by electromagnetic interaction with a mover that faces the stator in a non-contact manner; and a scale unit attached to the holding table. A linear encoder that detects a position of the bridge structure by detecting a positional relationship between a detection end extending from the bridge structure and facing the scale portion, and the stator of the linear motor and the linear encoder The scale section of the linear encoder is arranged in parallel on a side surface of the holding table.
[0011]
According to a third aspect of the present invention, in the substrate processing apparatus according to the second aspect of the present invention, the detection end of the linear encoder is disposed on a side farther from the holding table as compared with the stator of the linear motor. Have been.
[0012]
According to a fourth aspect of the present invention, in the substrate processing apparatus according to the second or third aspect, the stator of the linear motor and the scale section of the linear encoder are provided on both side surfaces of the holding table. , Each linear encoder is an absolute type.
[0013]
According to a fifth aspect of the present invention, in the substrate processing apparatus according to any one of the first to fourth aspects, guide means for guiding movement of the bridge structure by the moving means is attached to a surface of the holding table. Have been.
[0014]
According to a sixth aspect of the present invention, in the substrate processing apparatus according to the fifth aspect of the present invention, the guide unit includes a direction defining unit that defines a moving direction of the bridge structure by the moving unit; And a supporting means for supporting the cross-linking structure while being in contact therewith, wherein the supporting means has a plurality of balls for contacting the direction defining means.
[0015]
According to a seventh aspect of the present invention, in the substrate processing apparatus according to the sixth aspect, the supporting means further includes a spacer located between the plurality of balls.
[0016]
According to an eighth aspect of the present invention, in the substrate processing apparatus according to any one of the first to seventh aspects, an aggregate made of carbon fiber is used for the bridge structure.
[0017]
Further, according to a ninth aspect of the present invention, in the substrate processing apparatus according to any one of the first to eighth aspects, the processing tool is a slit nozzle for discharging a predetermined processing liquid, and the scanning is performed on the substrate by the scanning. A layer of the treatment liquid is formed on the surface.
[0018]
According to a tenth aspect of the present invention, in the substrate processing apparatus according to the ninth aspect, the substrate is a rectangular substrate for a flat panel display, and the processing liquid is a resist liquid or a coating liquid for forming an organic flattening film. Liquid.
[0019]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
[0020]
<1. Embodiment>
<1.1 Description of Configuration>
FIG. 1 is a perspective view schematically showing a substrate processing apparatus 1 according to an embodiment of the present invention. FIG. 2 is a plan view of the main body 2 of the substrate processing apparatus 1 as viewed from above. 3 and 4 are a front view and a side view of the main body 2, respectively.
[0021]
The substrate processing apparatus 1 is roughly divided into a main body 2 and a control system 6, and uses a square glass substrate for manufacturing a screen panel of a liquid crystal display device as a substrate to be processed 90, and an electrode layer formed on the surface of the substrate 90. In a process of selectively etching the substrate 90, the coating apparatus is configured to apply a resist liquid to the surface of the substrate 90. Therefore, in this embodiment, the slit nozzle 41 discharges the resist liquid. In addition, the substrate processing apparatus 1 can be modified and used as an apparatus for applying a processing liquid (chemical liquid) to various substrates for flat panel displays as well as glass substrates for liquid crystal displays.
[0022]
The main body 2 includes a stage 3 that functions as a holding table for mounting and holding the substrate to be processed 90 and also functions as a base for the attached mechanisms. The stage 3 is made of an integral stone having a rectangular parallelepiped shape, and its upper surface (holding surface 30) and side surfaces are processed into flat surfaces.
[0023]
The upper surface of the stage 3 is a horizontal surface, and serves as a holding surface 30 for the substrate 90. A large number of vacuum suction ports are formed on the holding surface 30 in a distributed manner. The substrate 90 is held at a predetermined horizontal position by sucking the substrate 90 while the substrate processing apparatus 1 processes the substrate 90.
[0024]
A pair of running rails 31a extending in a substantially horizontal direction are fixed to both ends of the holding surface 30 across a holding area of the substrate 90 (a region where the substrate 90 is held). The running rail 31a guides the movement of the bridging structure 4 together with the support blocks 31b fixed to both ends of the bridging structure 4 (the moving direction is defined in a predetermined direction), and holds the bridging structure 4 above the holding surface 30 To support.
[0025]
5 to 7 are views showing the configuration of the support block 31b. The support block 31b is rigidly connected to the bridge structure 4, and has a shape in which the lower ends of both side portions protrude downward from the central portion (reverse concave shape) as shown in FIG. 31a is arranged so as to sandwich it from both sides.
[0026]
Thereby, the movement in the Y-axis direction is restricted, so that the moving direction of the bridge structure 4 can be defined in the X-axis direction along the traveling rail 31a.
[0027]
Further, as shown in FIGS. 6 and 7, the support block 31b has a ring-shaped cavity 312 provided therein, and has a structure in which a plurality of balls 310 and spacers 311 are alternately included. An opening is provided in the center bottom surface of the support block 31b, and the ball 310 is exposed from the opening. Then, the exposed ball 310 comes into contact with the upper surface of the traveling rail 31a, thereby supporting the bridge structure 4 above the stage 3. Although not shown in FIGS. 5 to 7, such a structure is also provided on the support block 31b in a portion in contact with the side surface of the traveling rail 31a.
[0028]
As a result, gas such as air is not ejected as compared with the case where a mechanism (a non-contact type direct guide mechanism) that moves the traveling rail and the support block without contacting each other by ejecting air or the like is used. Therefore, the amount of dust scattered on the substrate can be reduced.
[0029]
Further, since the support block 31b has the spacers 311 inside, the mutual friction between the balls 310 can be reduced, and the balls 310 can be moved uniformly in the cavity 312, so that the amount of dust generation is further reduced. And the speed fluctuation of the crosslinked structure 4 can be prevented. As the traveling rail 31a and the support block 31b having such a structure, for example, an LM guide (Linear Motion Guide: registered trademark of THK Co., Ltd. of Shinagawa-ku, Tokyo) can be used.
[0030]
Above the stage 3, there is provided a bridge structure 4 that extends substantially horizontally from both sides of the stage 3. The cross-linking structure 4 mainly includes a nozzle support portion 40 made of carbon fiber resin as an aggregate, and elevating mechanisms 43 and 44 supporting both ends thereof.
[0031]
As described above, by using the aggregate made of carbon fiber resin for the nozzle support portion 40 which is a part of the cross-linking structure 4, it is possible to reduce the weight while maintaining the strength required for the cross-linking structure 4, The driving force required to move the bridge structure 4 can be reduced, and a motor having a small driving force can be used as a motor for moving the bridge structure 4.
[0032]
As shown in FIG. 3, a slit nozzle 41 and a gap sensor 42 are attached to the nozzle support 40.
[0033]
A discharge mechanism (not shown) including a pipe for supplying a chemical solution to the slit nozzle 41 and a resist pump is connected to the slit nozzle 41 extending in the horizontal Y direction. The slit nozzle 41 is supplied with a resist by a resist pump, and scans the surface of the substrate 90 to discharge the resist to a predetermined region on the surface of the substrate 90 (hereinafter, referred to as a “resist coated region”).
[0034]
The gap sensor 42 is attached to the nozzle supporting portion 40 so as to be in the vicinity of the slit nozzle 41, and detects a difference in height (gap) between a lower entity (for example, the surface of the substrate 90 and the surface of the resist film). It measures and transmits the measurement result to the control system 6.
[0035]
Thus, by attaching the slit nozzle 41 and the gap sensor 42 to the nozzle support part 40, the relative positional relationship between them is fixed. Therefore, the control system 6 can detect the distance between the surface of the substrate 90 and the slit nozzle 41 based on the measurement result of the gap sensor 42. In addition, although the substrate processing apparatus 1 according to the present embodiment includes two gap sensors 42, the number of gap sensors 42 is not limited to this, and may further include many gap sensors 42. .
[0036]
The lifting mechanisms 43 and 44 are separated on both sides of the slit nozzle 41, and are connected to the slit nozzle 41 by the nozzle support 40. The elevating mechanisms 43 and 44 are used to move the slit nozzle 41 up and down in translation, and also to adjust the attitude of the slit nozzle 41 in the YZ plane.
[0037]
8 and 9 are diagrams showing details of the elevating mechanism 44. FIG. The lifting mechanism 44 includes an AC servomotor 440, a ball screw 441, and a rotary encoder 442. The elevating mechanism 44 includes a coupling member (not shown), and the components such as the AC servomotor 440 and the rotary encoder 442 are attached to the coupling member and supported at a predetermined position. The lifting mechanism 43 has substantially the same configuration as the lifting mechanism 44.
[0038]
The AC servomotor 440 is a motor capable of controlling a rotation angle and a rotation direction based on a control signal from the control system 6, and generates an ascending and descending driving force of the bridge structure 4.
[0039]
The ball screw 441 has an upper end connected to the AC servomotor 440, and is rotatable about a central axis P. At the end of the nozzle support portion 40, a mounting hole having a female screw structure is provided, and the ball screw 441 is screwed into the mounting hole. That is, the ball screw 441 receives the rotational driving force from the AC servomotor 440 and rotates to raise and lower the nozzle support 40 (slit nozzle 41) in the Z-axis direction.
[0040]
The rotary encoder 442 is provided above the AC servomotor 440, detects the rotation angle of the AC servomotor 440, and transmits the detection result to the control system 6. Note that the amount of movement of the nozzle supporter 40 moved up and down by the elevating mechanism 44 is determined by the rotation angle of the ball screw 441 (the rotation angle of the AC servomotor 440). Therefore, the control system 6 can control the position of the nozzle support portion 40 (the positions of the slit nozzle 41 and the gap sensor 42) by controlling the rotation angle.
[0041]
A pair of AC coreless linear motors (hereinafter simply abbreviated as “linear motors”) 50 and 51 are separately arranged along both side edges of the stage 3 at both ends of the bridge structure 4. It is fixed.
[0042]
FIGS. 10 and 11 are views showing a linear motor 50 for moving the bridge structure 4 in the horizontal direction, and an absolute type linear encoder 52 for detecting the position of the bridge structure 4. The linear motor 51 and the linear encoder 53 provided on the opposite side of the bridge structure 4 have substantially the same configuration.
[0043]
The linear motor 50 includes a stator (stator) 50a and a mover 50b, and generates a driving force for moving the bridge structure 4 in the X-axis direction by electromagnetic interaction between the stator 50a and the mover 50b. It is a motor. The amount and direction of movement by the linear motor 50 can be controlled by a control signal from the control system 6.
[0044]
The stator 50 a is fixed to the side surface on the stage 3 side so as to extend along the moving direction of the bridge structure 4, and is horizontally arranged at a position lower than the holding surface 30. The mover 50b is fixed to the bridge structure 4 side and faces the stator 50a in a non-contact manner.
[0045]
As described above, by using the linear motors 50 and 51 to move the bridge structure 4, the amount of generated dust such as oil scattered in the apparatus can be reduced as compared with the case where the stepping motor and the ball screw are used. it can. Further, since the structures of the linear motors 50 and 51 are relatively simple, the structure of the substrate processing apparatus 1 can be simplified.
[0046]
The linear encoder 52 includes a scale section 52a and a detector 52b, detects a relative positional relationship between the scale section 52a and the detector 52b, and transmits the relative positional relationship to the control system 6. This means that the position in the X-axis direction of the side where the detector 52b is fixed (the side where the linear motor 50 is fixed) among the two end portions of the bridge structure 4 is detected. Therefore, the control system 6 can detect the position of the linear motor 50 based on the detection result from the linear encoder 52, and can control the linear motor 50 based on the detection result.
[0047]
As described above, by detecting the position of the bridge structure 4 using the absolute type linear encoders 52 and 53, the position of the bridge structure 4 can be detected with high accuracy. 51 can be controlled with high accuracy.
[0048]
The scale portion 52a is fixed to the side surface on the stage 3 side and is horizontally arranged at a position lower than the holding surface 30. The stator 50 a of the linear motor 50 is arranged substantially parallel to the stator 50 a of the linear motor 50, and the scale 50 a of the linear encoder 52 is arranged near the side of the stage 3. The detector 52b is provided on the bridge structure 4 side facing the scale portion 52a.
[0049]
Accordingly, since the position can be detected and controlled at both ends where the position error of the bridge structure 4 becomes the largest, the position of the bridge structure 4 can be controlled as compared with the case where the linear encoders 52 and 53 having the same resolution are provided at other positions. The position error of the structure 4 can be reduced.
[0050]
The control system 6 includes an arithmetic unit 60 that processes various data according to a program, and a storage unit 61 that stores the program and various data. Further, on the front surface, there are provided an operation unit 62 for an operator to input necessary instructions to the substrate processing apparatus 1 and a display unit 63 for displaying various data.
[0051]
The control system 6 is connected to each mechanism attached to the main body 2 by a cable (not shown), and based on signals from the operation unit 62 and various sensors, the stage 3, the bridge structure 4, the lifting mechanisms 43 and 44, and The components such as the linear motors 50 and 51 are controlled.
[0052]
Specifically, the storage unit 61 corresponds to a RAM for temporarily storing data, a read-only ROM, a magnetic disk device, and the like, and includes a storage medium such as a portable magneto-optical disk and a memory card, and Such a reading device may be used. The operation unit 62 includes buttons and switches (including a keyboard, a mouse, and the like), but may have a function of the display unit 63 such as a touch panel display. The display unit 63 corresponds to a liquid crystal display or various lamps.
[0053]
<1.2 Description of operation>
Next, the operation of the substrate processing apparatus 1 will be described. In the substrate processing apparatus 1, the resist coating process is started by transporting the substrate 90 to a predetermined position by an operator or a transport mechanism (not shown). The instruction to start the processing may be input by the operator operating the operation unit 62 at the time when the transfer of the substrate 90 is completed.
[0054]
First, the stage 3 sucks and holds the substrate 90 at a predetermined position on the holding surface 30. Subsequently, the elevating mechanisms 43 and 44 move the gap sensor 42 attached to the nozzle support 40 to a predetermined altitude (hereinafter, referred to as “measurement altitude”). At this time, the control system 6 supplies a control signal to each of the lifting and lowering mechanisms 43 and 44 based on the detection result of each of the rotary encoders 442 provided in each of the lifting and lowering mechanisms 43 and 44, thereby controlling the gap sensor 42. Control the position.
[0055]
When the gap sensor 42 is set at the measurement altitude, the linear motors 50 and 51 move the bridge structure 4 in the X direction, thereby moving the gap sensor 42 above the resist application area. Here, the resist application area is an area on the surface of the substrate 90 where the resist liquid is to be applied, and is usually an area obtained by removing an area having a predetermined width along an edge from the entire area of the substrate 90. is there. At this time, the control system 6 controls the horizontal position of the gap sensor 42 by giving control signals to the respective linear motors 50 and 51 based on the detection results of the linear encoders 52 and 53.
[0056]
Next, the gap sensor 42 starts measuring the gap between the slit nozzle 41 and the surface of the substrate 90 in the resist coating area on the surface of the substrate 90. When the measurement is started, the linear motors 50 and 51 further move the bridge structure 4 in the X direction, so that the gap sensor 42 scans the resist application area, and transmits the measurement result during the scanning to the control system 6. At this time, the control system 6 stores the measurement result of the gap sensor 42 in the storage unit 61 in association with the horizontal position detected by the linear encoders 52 and 53.
[0057]
When the bridge structure 4 passes above the substrate 90 in the X direction and the scanning by the gap sensor 42 ends, the control system 6 stops the bridge structure 4 at that position, and based on the measurement result from the gap sensor 42, The attitude of the slit nozzle 41 in the YZ plane is an appropriate attitude (an attitude in which the interval between the slit nozzle 41 and the resist application area is an appropriate interval for applying the resist; hereinafter, referred to as an “appropriate attitude”). Is calculated, and a control signal is given to each of the elevating mechanisms 43 and 44 based on the calculation result. Based on the control signal, the respective lifting / lowering mechanisms 43 and 44 move the nozzle support 40 in the Z-axis direction, and adjust the slit nozzle 41 to an appropriate posture. Further, the linear motors 50 and 51 move the bridge structure 4 in the −X direction, and move the slit nozzle 41 to the discharge start position. Here, the ejection start position is a position at which the slit nozzle 41 substantially follows one side of the resist application region.
[0058]
When the slit nozzle 41 moves to the discharge start position, the control system 6 supplies a control signal to the linear motors 50 and 51 and a registration pump (not shown). On the basis of the control signal, the linear motors 50 and 51 move the bridge structure 4 in the −X direction, so that the slit nozzle 41 scans the surface of the substrate 90. By driving, the resist is sent to the slit nozzle 41, and the slit nozzle 41 discharges the resist to the resist application area. Thus, a resist layer is formed on the surface of the substrate 90.
[0059]
While the slit nozzle 41 scans the surface of the substrate 90 while discharging the resist, the linear encoders 52 and 53 may, as needed, move the elevation mechanism 43 at the position of the bridge structure 4 in the X direction, specifically, at both ends of the bridge structure 4. , 44 are detected and transmitted to the control system 6. The control system 6 moves both ends of the bridge structure 4 by controlling the respective linear motors 50 and 51 based on the detection results obtained from the respective linear encoders 52 and 53 (to shift the position in the X-axis direction). Move so that it does not occur).
[0060]
As described above, since the position control is performed by individually detecting the position of each of the linear motors 50 and 51, as a result, highly accurate synchronized driving can be performed without positional displacement in the X-axis direction. Therefore, compared to the case where only one of the linear motors is controlled in position, the feed error of the bridge structure 4 is reduced, so that the moving speed of the slit nozzle 41 can be kept constant, and the structure has high rigidity. Even if both ends of the cross-linked structure 4 are run on the respective running rails 31a, twisting and the like are unlikely to occur, and the resist can be uniformly applied by the slit nozzle 41.
[0061]
When the slit nozzle 41 moves to the discharge end position, the control system 6 supplies a control signal to the linear motors 50 and 51 and the resist pump. When the resist pump is stopped based on the control signal, the discharge of the resist from the slit nozzle 41 is stopped, and the elevating mechanisms 43 and 44 move the gap sensor 42 to the measurement altitude.
[0062]
Further, when the linear motors 50 and 51 move the bridge structure 4 in the X direction, the gap sensor 42 scans the resist application area, measures the gap between the resist film formed on the substrate 90 and the control system 6. introduce. The control system 6 compares the value of the gap (distance to the surface of the substrate 90) measured before the application of the resist with the value of the gap (distance to the surface of the resist film) measured after the application of the resist. The thickness of the resist film on 90 is calculated, and the calculation result is displayed on the display unit 63.
[0063]
When the inspection of the resist film is completed, the stage 3 stops the suction of the substrate 90, and the operator or the transport mechanism picks up the substrate 90 from the holding surface 30 and transports it to the next processing step.
[0064]
As described above, in the substrate processing apparatus 1, during the movement operation of the bridge structure 4, the linear motors 50 and 51 are synchronously controlled based on the detection results from the linear encoders 52 and 53, so that the slit nozzle 41 The feed error can be reduced. Therefore, the substrate processing apparatus 1 can perform the coating by the slit nozzle 41 at a constant speed, and thus can perform the uniform coating on the substrate.
[0065]
Further, by using the absolute type linear encoders 52, 53 to detect the position of the bridge structure 4, the linear motors 50, 51 can be controlled based on the position information detected with high accuracy. Further, by using the aggregate made of carbon fiber resin for the cross-linking structure 4, the linear motors 50 and 51 having a small driving force can be used, thereby simplifying the apparatus and reducing the amount of dust generated from oil and the like. be able to.
[0066]
<2. Modification>
Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments, and various modifications are possible.
[0067]
For example, the linear encoder may be of an increment type. In that case, the device can be further simplified.
[0068]
In the above embodiment, the substrate is placed on a horizontal holding surface and held in a horizontal position. For example, the substrate is held and processed in a vertical position, or the substrate is held in an inclined position. The present invention can also be applied to those that do.
[0069]
【The invention's effect】
According to the first to tenth aspects of the present invention, the control means can control the position of the processing tool with high precision by controlling the position of each of the plurality of unit moving means. Processing can be performed.
[0070]
According to the second aspect of the present invention, since each of the unit moving means has a linear motor and a linear encoder, the amount of dust generated by oil and the like scattered in the apparatus is reduced, and the apparatus is simplified. Can be. In addition, since the position of the crosslinked structure can be detected with higher accuracy, it is possible to reduce the unevenness in feeding the crosslinked structure.
[0071]
According to the third aspect of the present invention, since the detection end of the linear encoder is arranged farther from the holding table than the stator of the linear motor, the position of the linear encoder is increased at both ends of the bridge structure where the error increases. Detection can be performed, and the position of the crosslinked structure can be detected with high accuracy.
[0072]
According to the fourth aspect of the present invention, since each linear encoder is of an absolute type, the position of the bridge structure can be detected with higher accuracy than that of the increment type.
[0073]
According to the fifth aspect of the present invention, since the guide means for guiding the movement of the bridge structure by the moving means is attached to the surface of the holding table, the moving direction of the bridge structure can be defined.
[0074]
According to the sixth aspect of the present invention, since the supporting means for supporting the cross-linking structure is provided while being in contact with the direction defining means, the amount of dust scattered on the substrate is reduced because gas such as air is not ejected. Can be.
[0075]
According to the seventh aspect of the present invention, since the supporting means further includes a spacer located between the plurality of balls, mutual friction between the balls in the supporting means is reduced, and the balls are uniformly distributed in the guide. Therefore, the amount of dust can be further reduced, and the crosslinked structure can be stably moved.
[0076]
In the invention according to claim 8, since the aggregate made of carbon fiber is used for the bridge structure, it is possible to reduce the weight while maintaining the strength of the bridge structure, and to move the bridge structure. Since the required driving force can be reduced, a motor having a small driving force can be used.
[Brief description of the drawings]
FIG. 1 is a perspective view schematically showing a substrate processing apparatus according to an embodiment of the present invention.
FIG. 2 is a plan view of a main body of the substrate processing apparatus as viewed from above.
FIG. 3 is a front view of the main body.
FIG. 4 is a side view of the main body.
FIG. 5 is a view of the support block as viewed from below.
6 is a view showing the structure of the support block as viewed from the line VI-VI shown in FIG.
FIG. 7 is a view showing the structure of the support block as viewed from the line VII-VII shown in FIG. 5;
FIG. 8 is a diagram showing details of a lifting mechanism.
FIG. 9 is a diagram showing details of a lifting mechanism.
FIG. 10 is an enlarged view showing a linear motor and a linear encoder from the front.
FIG. 11 is an enlarged view of a linear motor and a linear encoder from a side.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Main body 3 Stage 30 Holding surface 310 Ball 311 Spacer 31a Running rail 31b Support block 4 Bridge structure 40 Nozzle support part 41 Slit nozzle 50, 51 Linear motor 50a Stator 50b Moving element 52, 53 Linear encoder 52a Scale part 52b Detector 6 Control system 90 Substrate

Claims (10)

A holding table for holding the substrate,
A predetermined processing tool is attached in a substantially horizontal direction, a bridge structure that is stretched along the surface of the holding table,
Moving means for moving the crosslinked structure in a direction along the surface of the substrate held by the holding table,
Control means for controlling the moving means,
With
In the substrate processing apparatus that performs a predetermined process on the surface of the substrate by scanning the surface of the substrate with the processing tool while moving the bridge structure in the direction,
The moving means has a plurality of unit moving means separately arranged on both sides of the holding table,
A substrate processing apparatus, wherein the control means moves both ends of the bridge structure by controlling the position of each of the plurality of unit moving means. The substrate processing apparatus according to claim 1,
Each of the unit moving means,
The bridge structure is moved by electromagnetic interaction between a stator attached to the holding table and extending along the moving direction of the bridge structure and a mover extending from the bridge structure and facing the stator in a non-contact manner. A linear motor for generating a driving force for causing
A linear encoder that detects a position of the bridge structure by detecting a positional relationship between a scale unit attached to the holding table and a detection end extending from the bridge structure and facing the scale unit,
Has,
The substrate processing apparatus, wherein the stator of the linear motor and the scale portion of the linear encoder are arranged in parallel on a side surface of the holding table. The substrate processing apparatus according to claim 2,
A substrate processing apparatus, wherein the detection end of the linear encoder is arranged on a side farther from the holding table than the stator of the linear motor. The substrate processing apparatus according to claim 2, wherein
On both sides of the holding table, the stator of the linear motor and the scale unit of the linear encoder are provided,
A substrate processing apparatus, wherein each linear encoder is an absolute type. The substrate processing apparatus according to any one of claims 1 to 4,
Guide means for guiding the movement of the bridge structure by the moving means is attached to the surface of the holding table. The substrate processing apparatus according to claim 5,
The guiding means,
Direction defining means for defining a moving direction of the bridge structure by the moving means,
Supporting means for supporting the crosslinked structure while being in contact with the direction defining means,
Has,
A substrate processing apparatus, wherein the supporting means has a plurality of balls for contacting the direction defining means. The substrate processing apparatus according to claim 6,
The substrate processing apparatus according to claim 1, wherein the support unit further includes a spacer located between the plurality of balls. The substrate processing apparatus according to any one of claims 1 to 7,
A substrate processing apparatus, wherein an aggregate made of carbon fiber is used for the bridge structure. The substrate processing apparatus according to any one of claims 1 to 8,
The processing tool is a slit nozzle that discharges a predetermined processing liquid,
The substrate processing apparatus, wherein the scanning forms a layer of the processing liquid on the surface of the substrate. The substrate processing apparatus according to claim 9,
A substrate processing apparatus, wherein the substrate is a rectangular substrate for a flat panel display, and the processing liquid is a resist liquid or a coating liquid for forming an organic planarization film.

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