JP2004074081A - Hydrothermal reaction treatment method and apparatus - Google Patents

Abstract

Provided is a hydrothermal treatment apparatus capable of recovering a discharge pressure and a flow rate of a high-pressure pump without disassembling and cleaning a check valve of the high-pressure pump.
An object storage tank for storing an object to be processed, a supply pipe for supplying the object to be processed from the object storage tank into a reaction vessel, and a supply pipe disposed in the middle of the supply pipe. A reciprocating high-pressure pump 5 having heads 6A to 6C provided with check valves 9A to 9C and 10A to 10C before and after the chambers 8A to 8C, and disposed on the inflow side of each of the heads 6A to 6C. Three-way valves 11A to 11C for selecting whether to supply an object to be treated or water to the heads 6A to 6C, and are connected to the three-way valves 11A to 11C to recover the discharge pressure and flow rate of the high-pressure pump 5. A water supply pipe 12 for supplying water, a water supply pressurizing pump 13 provided for the water supply pipe 12, and a supply pipe 3 provided downstream of the high-pressure pump 5, for supplying the supply from the high-pressure pump 5 to the reaction vessel 51. Select whether to supply to the inside or to the discharge pipe 18 That the three-way valve 17, composed of a back pressure valve 19 disposed in the discharge pipe 18.
[Selection] Figure 2

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to water suitable for treating a high-viscosity organic slurry to be treated, such as sewage sludge, night soil, septic tank sludge, and crushed resin, by a hydrothermal oxidation reaction in a supercritical state or subcritical state of water. The present invention relates to a thermal reaction processing method and apparatus.
[0002]
[Prior art]
Hydrothermal treatments that decompose waste, generate energy, or produce chemical substances by treating and oxidizing and hydrolyzing the material to be treated have been studied for many years, Has been used.
In particular, in recent years, in a supercritical state of 374 ° C. or more and 22 MPa (220 atm) or more, or, for example, 374 ° C. or more, 2.5 MPa (25 atm) or more and less than 22 MPa, or 374 ° C. or less, 22 MPa or more, or less than 374 ° C. In a subcritical state, which is a high-temperature and high-pressure state close to the critical point even when the pressure is less than 22 MPa, an oxidation reaction including combustion occurs by reacting an object to be treated with water containing an oxidizing agent, Attention has been paid to a hydrothermal reaction treatment that almost completely decomposes organic substances in a product in a short time.
[0003]
When the object to be treated is oxidatively decomposed by the hydrothermal reaction treatment as described above, the object to be treated, the oxidizing agent, and water are heated, pressurized, supplied into the reaction vessel, and reacted.
Then, as a result of the hydrothermal reaction, the organic matter is oxidatively decomposed to obtain a high-temperature and high-pressure fluid composed of water and carbon dioxide, and a reaction product composed of a dried or slurry-like solid such as ash and salts.
[0004]
[Problems to be solved by the invention]
As described above, when a high-viscosity organic slurry to be treated, such as sewage sludge, night soil, septic tank sludge, and crushed resin, is supplied into the reaction vessel with a high-pressure pump, the discharge pressure and flow rate of the high-pressure pump are obtained. During this period, the high-viscosity organic slurry workpiece can be supplied into the reaction vessel by a high-pressure pump.
However, the movement of the check valves on the inflow side and the outflow side constituting the high-pressure pump is deteriorated due to the viscous resistance of the organic slurry processing object, and the leakage causes the discharge pressure and the flow rate of the high-pressure pump to stop. There are cases.
In such a case, it is necessary to disassemble and clean the check valve of the high-pressure pump to recover the discharge pressure and the flow rate of the high-pressure pump.
[0005]
SUMMARY OF THE INVENTION The present invention has been made to solve the above-described inconvenience, and a hydrothermal reaction capable of restoring a discharge pressure and a flow rate of a high-pressure pump without disassembling and cleaning a check valve of the high-pressure pump. A processing method and apparatus are provided.
[0006]
[Means for Solving the Problems]
First, the invention according to claim 1 is a reciprocating high-pressure pump having a plurality of heads each provided with a check valve so as to flow in one direction before and after the chamber, and the supercritical state or the subcritical state of water is obtained. In the hydrothermal reaction processing method for processing the high-viscosity organic slurry workpiece by supplying a high-viscosity organic slurry workpiece and causing a hydrothermal oxidation reaction into the reaction vessel, When the high-pressure pump cannot supply a high-viscosity organic slurry workpiece due to the discharge pressure and flow rate of the pump not being output, supply pressurized water instead of the high-viscosity organic slurry workpiece for each head. The cleaning is performed to recover the discharge pressure and the flow rate of the high-pressure pump.
The invention according to claim 2 is a reciprocating high-pressure pump having a plurality of heads each provided with a check valve so as to flow in one direction before and after the chamber. In the hydrothermal reaction processing method for processing the high-viscosity organic slurry workpiece by supplying a high-viscosity organic slurry workpiece and causing a hydrothermal oxidation reaction into the reaction vessel, When the discharge pressure and the flow rate of the pump are not sufficient to supply the high-viscosity organic slurry to be processed by the high-pressure pump, the high-pressure water is supplied to the outlet side of the high-pressure pump. It is characterized by restoring pressure and flow rate.
In the hydrothermal reaction processing method according to claim 1 or 2, the supply material in the supply pipe when the discharge pressure and the flow rate of the high-pressure pump are recovered is changed to a high-viscosity organic slurry workpiece. Is desirably supplied to a storage tank for storing the object.
Next, according to a fourth aspect of the present invention, a high-viscosity organic slurry workpiece is supplied to a reaction vessel in a supercritical state or a subcritical state of water by a workpiece supply mechanism, and hydrothermal treatment is performed. In the hydrothermal reaction processing apparatus for processing the high-viscosity organic slurry to-be-processed object by causing an oxidation reaction, the processing object supply mechanism may be configured to store the high-viscosity organic slurry to-be-processed object. A tank, a supply pipe for supplying the high-viscosity organic slurry workpiece from the workpiece storage tank into the reaction vessel, and disposed in the middle of the supply pipe so as to flow in one direction before and after the chamber. And a reciprocating high-pressure pump having a plurality of heads each provided with a check valve, and a high-viscosity organic slurry workpiece to be processed is provided on the inflow side of each head of the high-pressure pump to each head. Or water supply An inflow-side switching valve, a water pipe connected to the plurality of inflow-side switching valves, and supplying water for restoring the discharge pressure and the flow rate of the high-pressure pump; and a water supply pressurization disposed in the water supply pipe. A pump and an outlet-side switching valve that is provided in the supply pipe downstream of the high-pressure pump and selects whether to supply the supply from the high-pressure pump into the reaction vessel or to supply to the discharge pipe; And a back pressure valve provided in the discharge pipe.
According to a fifth aspect of the present invention, a high-viscosity organic slurry workpiece is supplied to a reaction vessel in a supercritical state or a subcritical state of water by a workpiece supply mechanism, and the hydrothermal oxidation is performed. In the hydrothermal reaction processing apparatus for processing the high-viscosity organic slurry workpiece by reacting, the workpiece supply mechanism may be configured to store the high-viscosity organic slurry workpiece. A supply pipe for supplying a high-viscosity organic slurry workpiece from the workpiece storage tank into the reaction vessel; and a supply pipe provided in the middle of the supply pipe so as to flow in one direction before and after the chamber. A reciprocating high-pressure pump having a plurality of heads with check valves, a water supply pipe connected to the supply pipe downstream of the high-pressure pump, and a water supply high-pressure pump disposed in the water supply pipe; The above water supply downstream of this water pipe An outlet-side switching valve disposed in the pipe, for selecting whether to supply the supply in the supply pipe to the reaction vessel or to the discharge pipe; and a back-pressure valve disposed in the discharge pipe. It is characterized by having done.
According to a sixth aspect of the present invention, in the hydrothermal reaction apparatus according to the fifth aspect, the workpiece supply mechanism includes an on-off valve for the water supply pipe between the supply pipe and the high-pressure water supply pump. It is characterized by having.
In the above-described hydrothermal reaction apparatus according to any one of claims 4 to 6, the workpiece supply mechanism is disposed in the discharge pipe downstream of the back pressure valve, and is supplied from the back pressure valve. It is desirable to have a switching valve for selecting whether to supply the material as it is to the discharge pipe or to supply it to the processing object storage tank via a circulation pipe.
The high-viscosity organic slurry material to be treated according to the present invention is a material having a viscosity of 1000 mPa · s or more.
[0007]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a block diagram showing a schematic configuration of a hydrothermal reaction apparatus according to the present invention, and FIG. 2 is a block diagram showing a first embodiment of a workpiece supply mechanism shown in FIG.
[0008]
In FIG. 1, reference numeral 1 denotes a supply of a high-viscosity organic slurry workpiece (hereinafter, simply referred to as a workpiece) such as sewage sludge, night soil, septic tank sludge, and crushed resin into a reaction vessel 51 described below. 3 shows a workpiece supply mechanism for supplying the workpiece through a pipe 3.
As shown in FIG. 2, the workpiece supply mechanism 1 supplies a workpiece storage tank 2 for storing a workpiece and a workpiece in the workpiece storage tank 2 to a reaction vessel 51. A supply pipe 3, a low-pressure pump 4 arranged in the middle of the supply pipe 3 for pushing an object to be processed into a high-pressure pump 5 described later, and a supply branch pipe 3 a of the supply pipe 3 downstream of the low-pressure pump 4. , 3b, 3c, the check valves 9A, 9B, 9C, 9B, 9C, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D, 9D A reciprocating high-pressure pump 5 having a plurality of heads 6A, 6B, 6C provided with 10A, 10B, 10C, and each head 6A is disposed on the inflow side of each of the heads 6A, 6B, 6C of the high-pressure pump 5. , 6B, 6C or water supply A plurality of three-way valves 11A, 11B, and 11C as inflow-side switching valves for selecting whether or not, and downstream ends of water supply branch pipes 12a, 12b, and 12c are connected to the plurality of three-way valves 11A, 11B, and 11C. A water supply pipe 12 for supplying water for restoring the discharge pressure and flow rate of No. 5, a water supply pressurizing pump 13 provided in the water supply pipe 12 for supplying water pressurized to, for example, 0.3 MPa or more, The three-way valve 17 is disposed in the supply pipe 3 downstream of the pump 5 and serves as an outflow-side switching valve for selecting whether to supply the supply from the high-pressure pump 5 into the reaction vessel 51 or the discharge pipe 18. A back pressure valve 19 disposed on the discharge pipe 18 and providing a back pressure of, for example, 22 MPa or more; a bypass valve 20 disposed on the discharge pipe 18 in parallel with the back pressure valve 19; a back pressure valve 19; Than 20 It is disposed in the discharge pipe 18 of the flow, and selects whether to supply the supply from the back pressure valve 19 or the bypass valve 20 to the discharge pipe 18 as it is or to supply the supply to the processing object storage tank 2 via the circulation pipe 22. And a three-way valve 21 as a switching valve.
[0009]
In addition, even if the high-pressure pump 5 drives the pistons 7A to 7C of the heads 6A to 6C with a phase difference of 120 degrees by a single drive mechanism, the pistons 7A to 7C are separately driven. The actuator may be driven with a phase difference of 120 degrees, that is, the strokes of the pistons 7A to 7C may be separately set to 0% or 100%.
[0010]
In FIG. 1, reference numeral 31 denotes a reaction aid storage tank for storing a reaction aid such as kerosene, and 32 denotes a reaction aid in the reaction aid storage tank 31 in a supply pipe 3 downstream of the three-way valve 17 in FIG. A supply pipe 33 for supplying to the supply pipe 33 is a high-pressure pump disposed in the middle of the supply pipe 32. The high-pressure pump 33 supplies the reaction auxiliary agent into the supply pipe 3 at a high pressure of, for example, 22 MPa or more. is there.
34 is a water tank for storing water, 35 is a supply pipe for supplying the water in the water tank 34 into the supply pipe 3 downstream of the supply pipe 32, and 36 is a high-pressure pump arranged in the middle of the supply pipe 35, The high-pressure pump 36 supplies water into the supply pipe 3 at a high pressure of, for example, 22 MPa or more.
[0011]
Reference numeral 37 denotes a supply pipe for supplying the water in the water tank 34 as quench water into the reaction vessel 51, and reference numeral 38 denotes a high-pressure pump provided in the middle of the supply pipe 37. The high-pressure pump 38 supplies water at, for example, 22 MPa or more. Is supplied into the reaction vessel 51 at a high pressure.
Reference numeral 39 denotes an air compressor, which supplies air as an oxidizing agent at a high pressure of, for example, 22 MPa or more into the supply pipe 3 downstream of the three-way valve 17 in FIG. Is to be supplied via
Reference numeral 41 denotes a preheater disposed in the supply pipe 40, which preheats air from the air compressor 39 to a predetermined temperature.
[0012]
Reference numeral 51 denotes a vertical reaction vessel having a cylindrical shape, which is not shown, but provided with a nozzle for ejecting an object to be processed supplied from the supply pipe 3 at the center of the upper lid, and A quench water supply hole through which quench water is supplied from the supply pipe 37, and an outlet through which the processing fluid is discharged are provided.
Although not shown, a scraper is provided in the reaction vessel 51 to scrape salt or the like attached to the inside.
[0013]
Reference numeral 61 denotes a discharge pipe connected to the discharge port of the reaction vessel 51, and 62 denotes a cooler provided in the middle of the discharge pipe 61. The cooler 62 is a processing fluid discharged from the discharge port of the reaction vessel 51. Is to cool.
Reference numeral 63 denotes a solid separator disposed in the discharge pipe 61 downstream of the cooler 62, which separates solids from the processing fluid and discharges the solids outside the system.
Reference numeral 64 denotes a gas-liquid separator connected to the downstream end of the discharge pipe 61, which separates the processing fluid from which solids have been removed by the solid separator 63 into a gas and a liquid.
65 is a gas discharge pipe connected to the ceiling of the gas-liquid separator 64, 66 is a pressure reducing valve disposed on the gas discharge pipe 65, and the pressure reducing valve 66 is used for separating the gas separated by the gas-liquid separator 64. It is released under reduced pressure.
Reference numeral 67 denotes a liquid discharge pipe connected to the bottom of the gas-liquid separator 64, and reference numeral 68 denotes a pressure reducing valve disposed on the liquid discharge pipe 67. The pressure reducing valve 68 depressurizes the liquid separated by the gas-liquid separator 64. And release it.
[0014]
Next, the hydrothermal reaction process will be described.
First, the high-pressure pumps 33, 36, and 38 and the air compressor 39 are operated to supply a reaction assistant and the like to the inside of the reaction vessel 51 to cause a hydrothermal oxidation reaction, thereby raising the inside of the reaction vessel 51 to a predetermined temperature.
Then, when the temperature in the reaction container 51 rises to a predetermined temperature, the object in the object storage tank 2 is supplied into the reaction container 51, and the object is subjected to a hydrothermal oxidation reaction to be processed.
[0015]
If the hydrothermal reaction treatment is performed continuously as described above, the salt may precipitate and accumulate inside the reaction vessel 51, thereby narrowing the reaction region. Therefore, the salt may be continuously (eg, 1 rpm) or intermittent. Then, the scraper is rotated to scrape off the deposited salt and move to the lower part of the reaction vessel 51.
The solid containing the salt thus scraped off is discharged from the outlet of the reaction vessel 51 to the discharge pipe 61 together with the processing fluid containing the quench water.
[0016]
Then, the processing fluid is cooled by the cooler 62, the solid is separated and removed by the solid separator 63, and then supplied to the gas-liquid separator 64.
The solid separated and removed by the solid separator 63 is discharged from the solid separator 63 to the outside of the system by a predetermined operation, for example, after the treatment of the object to be processed is completed.
Further, the processing fluid supplied to the gas-liquid separator 64 is separated into a gas and a liquid, and the separated gas is depressurized by the pressure reducing valve 66 and then released to the atmosphere via the gas discharge pipe 65 to be separated. After the pressure of the liquid is reduced by the pressure reducing valve 68, the liquid is discharged to a predetermined processing mechanism or the like via the liquid discharge pipe 67.
[0017]
The operation of the high-pressure pump 5 for supplying the processing object into the reaction vessel 51 as described above will be described in more detail.
Each of the pistons 7A to 7C is driven by a hydraulic pressure or a crank with a phase difference of 120 degrees.
First, when the pistons 7A to 7C move to the suction side on the left side in FIG. 2 in the chambers 8A to 8C, the check valves 9A to 9C are opened and the check valves 10A to 10C are closed, so that the chambers 8A to 8C are closed. An object to be processed is sucked and flows into the inside.
When the pistons 7A to 7C move to the right discharge side in FIG. 2 in the chambers 8A to 8C, the check valves 9A to 9C are closed and the check valves 10A to 10C are opened, so that the chambers 8A to 8C are opened. An object to be processed is discharged and flows out.
[0018]
Therefore, the three-way valves 11A to 11C are switched to a state of flowing from the supply branch pipes 3a to 3c to the supply branch pipes 3a to 3c, the three-way valve 17 is switched to a state of flowing from the supply pipe 3 to the discharge pipe 18, and the bypass valve 20 is closed. When the three-way valve 21 is switched to a state of flowing from the discharge pipe 18 to the circulation pipe 22 and the two pumps 4 and 5 are started, the processing target in the processing target storage tank 2 is the low-pressure pump 4, the three-way valves 11A to 11C, The high-pressure pump 5 is returned to the processing object storage tank 2 via the heads 6A to 6C, the three-way valve 17, the back pressure valve 19, and the three-way valve 21.
[0019]
When the workpiece is circulated in this manner, the discharge pressure of the high-pressure pump 5 can be increased to, for example, 22 MPa or more by the operation of the back pressure valve 19.
When the object to be treated is supplied into the reaction vessel 51 in a state where the discharge pressure of the high-pressure pump 5 is sufficiently increased, the three-way valve 17 is switched to a state of flowing from the supply pipe 3 to the supply pipe 3. The object to be processed in a pressurized state can be supplied into the reaction vessel 51.
[0020]
In the state where the object to be treated is being supplied into the reaction vessel 51 by the high-pressure pump 5 in this manner, the viscous resistance or the foreign matter of the object to be treated is caught by the valve, so that the check valve 9A constituting the high-pressure pump 5 is formed. When the movements of the high pressure pump 5 to 9C and 10A to 10C are deteriorated and the leak occurs, the discharge pressure and the flow rate of the high pressure pump 5 may not be able to be obtained.
When the discharge pressure and the flow rate of the high-pressure pump 5 do not come out in this way, the operating sound of the check valves 9A to 9C and 10A to 10C moving to open and close the flow path is stopped, and the high-pressure pump 5 It can be confirmed that the discharge pressure and the flow rate of no longer appear.
Although not shown, by disposing a flow meter in the supply pipe 3 between the high-pressure pump 5 and the three-way valve 17, the discharge pressure and the flow rate of the high-pressure pump 5 cannot be obtained from the flow rate of the flow meter. You can confirm that.
[0021]
Next, a recovery operation when the discharge pressure and the flow rate of the high-pressure pump 5 are stopped will be described.
First, the first method will be described.
The first method is a method of supplying pressurized water to each of the heads 6A to 6C for cleaning, which will be described in detail below.
First, the operation of each part is stopped, and the hydrothermal reaction process is stopped.
Then, the three-way valve 11A is switched to a state of flowing from the water supply branch pipe 12a to the supply branch pipe 3a, the three-way valve 17 is switched to a state of flowing from the supply pipe 3 to the discharge pipe 18, and the bypass valve 20 is bypassed to bypass the back pressure valve 19. After opening and switching the three-way valve 21 to a state of flowing from the discharge pipe 18 to the discharge pipe 18, the water supply pressurizing pump 13 is started to supply pressurized water to the head 6A for a predetermined time required for cleaning, for example, 5 minutes, and The processing object is washed away to wash the head 6A.
At this time, the check valves 9A and 10A can be washed with the force of the pressurized water without operating the high-pressure pump 5.
[0022]
When 5 minutes have passed since the pressurized water was supplied to the head 6A in this way, the three-way valve 11A was switched to a state of flowing from the supply branch pipe 3a to the supply branch pipe 3a, and the three-way valve 11B was supplied from the water supply branch pipe 12b. By switching to the state of flowing to the branch pipe 3b, pressurized water is supplied to the head 6B for only 5 minutes, and the object to be processed is washed away with the pressurized water to wash the head 6B.
When five minutes have elapsed since the pressurized water was supplied to the head 6B, the three-way valve 11B was switched to a state of flowing from the supply branch pipe 3b to the supply branch pipe 3b, and the three-way valve 11C was switched from the water supply branch pipe 12c to the supply branch pipe. By switching to the state of flowing to 3c, pressurized water is supplied to the head 6C for only 5 minutes, and the processing object is washed away with the pressurized water to wash the head 6C.
[0023]
Next, the second method will be described.
The second method is a method in which pressurized water is supplied to each of the heads 6A to 6C for cleaning similarly to the first method, but the pistons 7A to 7C are simultaneously operated. It will be described in detail.
Each of the pistons 7A to 7C can have a stroke of 0% or 100% separately.
[0024]
First, the operation of each part is stopped, and the hydrothermal reaction process is stopped.
Then, the three-way valve 11A is switched to a state of flowing from the water supply branch pipe 12a to the supply branch pipe 3a, the three-way valve 17 is switched to a state of flowing from the supply pipe 3 to the discharge pipe 18, and the three-way valve 21 is switched from the discharge pipe 18 to the discharge pipe 18. After switching to the flowing state, the water supply pressurizing pump 13 is started to supply pressurized water to the head 6A for a predetermined time required for cleaning, for example, 5 minutes, and the piston 7A of the head 6A is driven at a stroke of 100% to drive the head. Wash 6A.
At this time, since the pistons 7B and 7C have a stroke of 0%, the pistons 7B and 7C are not discharged from the chambers 8B and 8C.
[0025]
When 5 minutes have elapsed since the pressurized water was supplied to the head 6A in this manner, the piston 7A was stopped, the three-way valve 11A was switched to a state of flowing from the supply branch pipe 3a to the supply branch pipe 3a, and the three-way valve 11B was switched to the state. The state is switched to the state of flowing from the water supply branch pipe 12b to the supply branch pipe 3b, and pressurized water is supplied to the head 6B for only 5 minutes, and the piston 7B of the head 6B is driven at a stroke of 100% to clean the head 6B.
At this time, since the pistons 7A and 7C have a stroke of 0%, the pistons 7A and 7C are not discharged from the chambers 8A and 8C.
[0026]
When 5 minutes have elapsed since the pressurized water was supplied to the head 6B, the piston 7B was stopped, the three-way valve 11B was switched to a state of flowing from the supply branch pipe 3b to the supply branch pipe 3b, and the three-way valve 11C was branched. The state is switched to the state of flowing from the pipe 12c to the supply branch pipe 3c, and pressurized water is supplied to the head 6C for only 5 minutes, and the piston 7C of the head 6C is driven at a stroke of 100% to clean the head 6C.
At this time, since the pistons 7A and 7B have a stroke of 0%, the pistons 7A and 7B are not discharged from the chambers 8A and 8B.
[0027]
During the period of sequentially cleaning the heads 6A to 6C of the high-pressure pump 5 in this manner, the cleaning water containing the object to be processed is supplied to a processing mechanism (not shown) through the discharge pipe 18 and a predetermined amount is supplied. Discharge after processing.
However, the three-way valve 21 may be made to flow from the discharge pipe 18 to the circulation pipe 22, and the cleaning water mixed with the processing object may be supplied to the processing object storage tank 2.
[0028]
As described above, according to the first embodiment of the present invention, the heads 6A to 6C of the high-pressure pump 5 are washed by supplying pressurized water and washing away the processing object, so that the check valves 9A to 9C, The discharge pressure and flow rate of the high-pressure pump 5 can be recovered without disassembling and cleaning 10A to 10C.
Then, by supplying the cleaning water mixed with the processing object to the processing object storage tank 2, the processing object can be all subjected to a hydrothermal oxidation reaction to be processed.
[0029]
FIG. 3 is a block diagram showing a second embodiment of the workpiece supply mechanism shown in FIG. 1. The same or corresponding parts as those in FIG.
In FIG. 3, reference numeral 14 denotes a water supply pipe connected to the supply pipe 3 between the high-pressure pump 5 and the three-way valve 17, reference numeral 15 denotes a high-pressure water supply pump disposed in the water supply pipe 14, Water is supplied into the supply pipe 3 at a high pressure of, for example, 22 MPa or more.
Reference numeral 16 denotes an on-off valve provided in the water supply pipe 14 downstream of the water supply high-pressure pump 15.
Although the high-pressure pump 5 is illustrated in a simplified manner, as shown in FIG. 2, the high-pressure pump 5 has a plurality of heads including pistons 7A to 7C, chambers 8A to 8C, and check valves 9A to 9C and 10A to 10C. 6A to 6C.
[0030]
Next, a description will be given of a third method of recovery when the discharge pressure and the flow rate of the high-pressure pump 5 no longer appear.
This third method is a method of applying back pressure to the discharge side of the high-pressure pump 3 by the water supply high-pressure pump 15, which will be described in detail below.
First, the pumps other than the pumps 4 and 5 are stopped, and the hydrothermal reaction process is stopped.
Then, the three-way valve 17 is switched to a state of flowing from the supply pipe 3 to the discharge pipe 18 and the three-way valve 21 is switched to a state of flowing from the discharge pipe 18 to the discharge pipe 18. Is opened to apply back pressure to the high-pressure pump 5.
[0031]
When a back pressure is applied in a state where both pumps 4 and 5 are operated as described above, the check valves 10A to 10C surely close the flow paths, and the pistons 7A to 7C are moved in the suction side in the chambers 8A to 8C. Then, the check valves 9A to 9C are opened, and the workpiece is sucked and flows into each of the chambers 8A to 8C.
When the pistons 7A to 7C move toward the discharge side in the chambers 8A to 8C, the check valves 9A to 9C close and the check valves 10A to 10C overcome the back pressure and open, so that the chambers 8A to 8C An object to be processed is discharged and flows out.
[0032]
The pumps 4, 5, and 15 are operated as described above, and a flow meter disposed in the supply pipe 3 (not shown) is monitored. If the flow rate reaches the set flow rate, or the check valves 9A to 9C, 10A to 10C It can be confirmed that the discharge pressure and the flow rate of the high-pressure pump 5 have been recovered from the operation sound of the valve body moving to open and close the flow path.
Then, during a period in which the discharge pressure and the flow rate of the high-pressure pump 5 are being recovered, the cleaning water containing the object to be processed is supplied to a processing mechanism (not shown) through the discharge pipe 18 to perform predetermined processing. To be discharged from
However, the three-way valve 21 may be made to flow from the discharge pipe 18 to the circulation pipe 22, and the cleaning water mixed with the processing object may be supplied to the processing object storage tank 2.
[0033]
As described above, according to the second embodiment of the present invention, since the back pressure is applied to the high-pressure pump 5 to recover the discharge pressure and the flow rate of the high-pressure pump 5, the check valves 9A to 9C and 10A to 10C are disassembled. Thus, the discharge pressure and the flow rate of the high-pressure pump 5 can be recovered without cleaning.
Since the on-off valve 16 is provided downstream of the high-pressure water pump 15, the high-pressure water pump 15 is not exposed to the object to be processed, and the discharge pressure and the flow rate of the high-pressure pump 5 can be efficiently recovered.
Further, by supplying the cleaning water mixed with the processing target to the processing target storage tank 2, the entire processing target can be processed.
[0034]
In the above-described embodiment, when the discharge pressure and the flow rate of the high-pressure pump 5 are restored, the hydrothermal reaction process is stopped. However, the auxiliary fuel other than the object to be processed is supplied into the reaction vessel 51 to perform the hydrothermal oxidation reaction. When the discharge pressure and the flow rate of the high-pressure pump 5 are recovered, the object to be treated may be supplied into the reaction vessel 51 to restart the hydrothermal reaction of the object to be treated.
When the discharge pressure and the flow rate of the high-pressure pump 5 are recovered while the hydrothermal oxidation reaction in the reaction vessel 51 is continued as described above, as shown by dotted lines in FIGS. By operating the on-off valve 23 disposed in the supply pipe 3 between the two, the discharge pressure and the flow rate of the high-pressure pump 5 can be recovered while maintaining the supercritical state or the subcritical state in the reaction vessel 51.
[0035]
In addition, depending on the type of the object to be treated, the cleaning water mixed with the object to be treated is supplied into the reaction vessel 51, so that the discharge pressure and the flow rate of the high-pressure pump 5 are restored, and the hydrothermal reaction of the object to be treated is performed. Can continue.
In this case, the water supply pressurizing pump 13 in the first embodiment (first and second methods) may have a low pressure of, for example, about 0.4 MPa, and the water supply high pressure pump 15 in the second embodiment (third method) For example, water must be pressurized to a high pressure of 22 MPa or more.
Although the high-pressure pump 5 including three heads 6A to 6C has been illustrated, the number of heads may be three or less, or three or more.
[0036]
【The invention's effect】
As described above, according to the present invention, cleaning is performed by supplying pressurized water to each head of the high-pressure pump to wash out the object to be processed, so that the discharge of the high-pressure pump can be performed without disassembling and cleaning the check valve. Pressure and flow can be restored.
In addition, since the back pressure is applied to the high pressure pump to recover the discharge pressure and flow rate of the high pressure pump, the discharge pressure and flow rate of the high pressure pump can be recovered without disassembling and cleaning the check valve.
Further, since the on-off valve is provided downstream of the high-pressure pump for supplying back pressure to the high-pressure pump, the high-pressure water pump is not exposed to the object to be processed, and the discharge pressure and the flow rate of the high-pressure pump can be efficiently recovered.
Further, since the cleaning water mixed with the object is supplied to the object storage tank, the entire object can be hydrothermally oxidized and treated.
[Brief description of the drawings]
FIG. 1 is a block diagram showing a schematic configuration of a hydrothermal reaction apparatus of the present invention.
FIG. 2 is a block diagram showing a first embodiment of the workpiece supply mechanism shown in FIG. 1;
FIG. 3 is a block diagram showing a second embodiment of the workpiece supply mechanism shown in FIG. 1;
[Explanation of symbols]
1 Workpiece supply mechanism
2 Treatment object storage tank
3,32,35,37,40 Supply pipe
3a to 3c supply branch pipe
4 Low pressure pump
5,33,36,38 High pressure pump
6A-6C head
7A-7C piston
8A-8C chamber
9A-9C, 10A-10C Check valve
11A-11C, 17, 21 Three-way valve
12,14 water pipe
12a-12c Water supply branch pipe
13 Water pressure pump
15 High-pressure pump for water supply
16,23 On-off valve
18 Discharge pipe
19 Back pressure valve
20 Bypass valve
22 Circulation tube
31 Reaction aid storage tank
34 aquarium
39 air compressor
41 Preheater
51 Reaction vessel
61 Discharge pipe
62 cooler
63 solid separator
64 gas-liquid separator
65 Gas exhaust pipe
66,68 Pressure reducing valve
67 Liquid discharge pipe

Claims (7)

A reciprocating high-pressure pump having a plurality of heads equipped with check valves to flow in one direction before and after the chamber, into a reaction vessel in a supercritical or subcritical state of water. A hydrothermal reaction method for treating the high-viscosity organic slurry workpiece by supplying an organic slurry workpiece and causing a hydrothermal oxidation reaction.
When the high-pressure pump cannot supply the high-viscosity organic slurry to be processed by the high-pressure pump because the discharge pressure and the flow rate of the high-pressure pump do not come out, pressurized water is used instead of the high-viscosity organic slurry to be processed for each head. Supplying and washing to recover the discharge pressure and flow rate of the high-pressure pump,
A hydrothermal treatment method characterized by the above-mentioned. A reciprocating high-pressure pump having a plurality of heads equipped with check valves to flow in one direction before and after the chamber, into a reaction vessel in a supercritical or subcritical state of water. A hydrothermal reaction method for treating the high-viscosity organic slurry workpiece by supplying an organic slurry workpiece and causing a hydrothermal oxidation reaction.
When the discharge pressure and the flow rate of the high-pressure pump cannot be obtained and the high-viscosity organic slurry workpiece cannot be supplied by the high-pressure pump, the high-pressure pump is supplied by supplying high-pressure water to an outlet side of the high-pressure pump. To recover the discharge pressure and flow rate of
A hydrothermal treatment method characterized by the above-mentioned. In claim 1 or claim 2,
The supply in the supply pipe when the discharge pressure and the flow rate of the high-pressure pump are being recovered is supplied to a processing object storage tank that stores a high-viscosity organic slurry processing object.
A hydrothermal treatment method characterized by the above-mentioned. The high-viscosity organic slurry to be processed is supplied to the reaction vessel in a supercritical state or a subcritical state of water by a processing object supply mechanism and subjected to a hydrothermal oxidation reaction. In the hydrothermal reaction processing apparatus for processing the slurries to be processed,
The workpiece supply mechanism,
An object storage tank for storing a high-viscosity organic slurry object,
A supply pipe for supplying a high-viscosity organic slurry workpiece from the workpiece storage tank into the reaction vessel;
A reciprocating high-pressure pump having a plurality of heads provided with check valves so as to flow in one direction before and after the chamber, which is disposed in the middle of the supply pipe;
A plurality of inflow-side switching valves disposed on the inflow side of each head of the high-pressure pump, for selecting whether to supply a high-viscosity organic slurry workpiece to each head or to supply water,
A water pipe connected to the plurality of inflow-side switching valves and supplying water for recovering the discharge pressure and the flow rate of the high-pressure pump;
A water supply pressurizing pump arranged in the water supply pipe,
An outlet-side switching valve disposed on the supply pipe downstream of the high-pressure pump, for selecting whether to supply the supply from the high-pressure pump into the reaction vessel or to supply to the discharge pipe,
A back pressure valve disposed on the discharge pipe,
A hydrothermal treatment apparatus characterized by the above-mentioned. The high-viscosity organic slurry to be processed is supplied to the reaction vessel in a supercritical state or a subcritical state of water by a processing object supply mechanism and subjected to a hydrothermal oxidation reaction. In the hydrothermal reaction processing apparatus for processing the slurries to be processed,
The workpiece supply mechanism,
An object storage tank for storing a high-viscosity organic slurry object,
A supply pipe for supplying a high-viscosity organic slurry workpiece from the workpiece storage tank into the reaction vessel;
A reciprocating high-pressure pump having a plurality of heads provided with check valves so as to flow in one direction before and after the chamber, which is disposed in the middle of the supply pipe;
A water pipe connected to the supply pipe downstream of the high-pressure pump,
A high-pressure water pump installed in the water pipe,
An outflow-side switching valve disposed in the supply pipe downstream of the water supply pipe, for selecting whether to supply the supply in the supply pipe into the reaction vessel or supply the supply to the discharge pipe,
A back pressure valve disposed on the discharge pipe,
A hydrothermal treatment apparatus characterized by the above-mentioned. The hydrothermal reaction apparatus according to claim 5,
The workpiece supply mechanism, the water pipe between the supply pipe and the high-pressure water pump, has an open / close valve,
A hydrothermal treatment apparatus characterized by the above-mentioned. In the hydrothermal reaction apparatus according to any one of claims 4 to 6,
The workpiece supply mechanism is disposed in the discharge pipe downstream of the back pressure valve, and supplies the supply from the back pressure valve to the discharge pipe as it is, or stores the workpiece through a circulation pipe. Having a switching valve to select whether to supply to the tank,
A hydrothermal treatment apparatus characterized by the above-mentioned.

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