JP2003249751A - Additive method multilayer printed wiring board manufacturing method - Google Patents
Additive method multilayer printed wiring board manufacturing methodInfo
- Publication number
- JP2003249751A JP2003249751A JP2002046035A JP2002046035A JP2003249751A JP 2003249751 A JP2003249751 A JP 2003249751A JP 2002046035 A JP2002046035 A JP 2002046035A JP 2002046035 A JP2002046035 A JP 2002046035A JP 2003249751 A JP2003249751 A JP 2003249751A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- printed wiring
- resin
- layer
- metal foil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
(57)【要約】 (修正有)
【課題】 アディティブ法にてメッキ銅接着力、弾性率
が高く、ソリ・ネジレが小さく、板厚精度が良好で、耐
熱性、信頼性等に優れたビルドアッププリント配線板の
製造方法を得る。
【解決手段】 層間絶縁層を形成する際に、内層板の両
側にプリプレグfを配置し、その外側に表面凹凸bを有
する金属箔aの片面にアディティブ用樹脂組成物cを付
着させた金属箔付きBステージ樹脂組成物シートをBス
テージ樹脂組成物層がプリプレグ側を向くように配置
し、加熱、加圧下に積層硬化処理して両面金属箔張板を
作製後、この両面の金属箔を除去し、粗化液にて表層を
粗化してからアディティブ法にて導体回路jを形成し、
これを順次繰り返してビルドアップして多層プリント配
線板を製造する。
(57) [Summary] (with correction) [Problem] Build with excellent adhesion, high elastic modulus, small warpage and twisting, good thickness accuracy, excellent heat resistance, reliability, etc. by the additive method. Obtain a method of manufacturing an up-printed wiring board. SOLUTION: When forming an interlayer insulating layer, a prepreg f is arranged on both sides of an inner layer plate, and a metal foil a having surface irregularities b is adhered to one side of a metal foil a on the outside thereof. The B-stage resin composition sheet with the B-stage resin composition layer is arranged so that the B-stage resin composition layer faces the prepreg side, and laminated and cured under heating and pressure to produce a double-sided metal foil clad board. Then, the metal foil on both sides is removed. Then, after roughening the surface layer with a roughening solution, a conductor circuit j is formed by an additive method,
This is sequentially repeated to build up a multilayer printed wiring board.
Description
【0001】[0001]
【産業上の利用分野】本発明は、アディティブ法による
多層プリント配線板の製造方法であり、特に耐熱性、銅
箔接着力、信頼性等に優れた高密度多層プリント配線板
に関し、得られた多層プリント配線板は、高密度の小型
プリント配線板として、半導体チップを搭載し、小型、
軽量の新規な半導体プラスチックパッケージ用等に主に
使用される。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer printed wiring board by an additive method, and particularly to a high density multilayer printed wiring board excellent in heat resistance, copper foil adhesive strength, reliability and the like. A multilayer printed wiring board is a high-density, small-sized printed wiring board on which semiconductor chips are mounted,
It is mainly used for new lightweight semiconductor plastic packages.
【0002】[0002]
【従来の技術】近年、ますます小型、薄型、軽量化する
電子機器において、ますます高密度の多層プリント配線
板が使用されるようになってきている。この多層プリン
ト配線板は、細密回路が形成されており、従来のエポキ
シ樹脂内に多量にゴムを添加した接着剤を用いたアディ
ティブ法多層プリント配線板は、信頼性、電気的特性、
耐熱性等が劣り、高密度プリント配線板として使用する
のに限度があった。又、内層板が薄い場合、この両側に
基材補強の無いアディティブ用接着フィルムを使用する
と、ビルドアップして多層にしたプリント配線板は曲げ
強度、引張り強度等の機械的強度、剛性率が劣り、反り
も発生し易く、アッセンブリ等の工程で不良の原因とな
っていた。2. Description of the Related Art In recent years, higher and higher density multilayer printed wiring boards have been used in electronic devices that are becoming smaller, thinner and lighter. This multilayer printed wiring board has a fine circuit formed, and the additive method multilayer printed wiring board using an adhesive agent in which a large amount of rubber is added to the conventional epoxy resin has high reliability, electrical characteristics,
Inferior in heat resistance, etc., there was a limit to use as a high density printed wiring board. Also, when the inner layer board is thin, if adhesive adhesive films without base material reinforcement are used on both sides, the build-up multilayer printed wiring board is inferior in mechanical strength such as bending strength and tensile strength and rigidity. Also, warpage is likely to occur, which is a cause of defects in the assembly process and the like.
【0003】[0003]
【発明が解決しようとする課題】本発明は、以上の問題
点を解決した、多層プリント配線板の剛性率が高く、銅
箔接着力、耐熱性等に優れ、信頼性にも優れた高密度多
層プリント配線板をアディティブ法にて製造する方法を
提供するものである。DISCLOSURE OF THE INVENTION The present invention has solved the above problems and has a high density of a multilayer printed wiring board having a high rigidity, excellent copper foil adhesion, heat resistance and the like, and excellent reliability. It is intended to provide a method for producing a multilayer printed wiring board by an additive method.
【0004】[0004]
【発明が解決するための手段】本発明は、基板上に導体
回路と層間樹脂絶縁層とを順次積層し、アディティブ法
によって多層プリント配線板を製造する方法であり、該
層間絶縁層を形成する際に、内層板の両側にプリプレグ
を配置し、その外側に表面凹凸を有する金属箔の凹凸を
有する片面にアディティブ用樹脂組成物を付着させた金
属箔付きBステージ樹脂組成物シートをBステージ樹脂
組成物層がプリプレグ側を向くように配置し、加熱、加
圧下に積層硬化処理して両面金属箔張板を作製後、この
両面の金属箔を除去し、粗化溶液にて表層を粗化してか
らアディティブ法にて銅メッキを付着し、樹脂組成物を
後硬化する。硬化処理した場合、樹脂が反応して粗化溶
液に難溶化していき、可溶性の成分との粗化溶液に対す
る溶解性の差から、表層を粗化した時に凹凸が生じる。
この硬化処理では樹脂は完全硬化していないために、こ
れをそのまま使用してプリント配線板にすると、銅メッ
キ接着力が低く、吸湿後に加熱したりすると膨れを生じ
たりして使用できない。そのため、セミアディティブ法
ではその後に全面銅メッキを付着させた後に、フルアデ
ィティブ法では導体回路形成前又は後に熱硬化し、プリ
ント配線板とする。これを順次繰り返してビルドアップ
して多層プリント配線板を製造することにより、銅接着
力、弾性率(剛)が高く、ソリ・ネジレが小さく、板厚
精度の良好なものが得られた。。The present invention is a method of sequentially laminating a conductor circuit and an interlayer resin insulation layer on a substrate and manufacturing a multilayer printed wiring board by an additive method, wherein the interlayer insulation layer is formed. At this time, a B-stage resin composition sheet with a metal foil, in which prepregs are arranged on both sides of the inner layer plate, and the resin composition for an additive is attached to one surface of the metal foil having surface irregularities on the outside thereof, the resin composition for additive is attached to the B-stage resin. Arranged so that the composition layer faces the prepreg side, after heating and laminating and curing treatment under pressure to produce a double-sided metal foil-clad plate, remove the metal foil on both sides, roughen the surface layer with a roughening solution. Then, copper plating is attached by an additive method, and the resin composition is post-cured. In the case of curing treatment, the resin reacts and becomes less soluble in the roughening solution, and due to the difference in solubility between the soluble component and the roughening solution, unevenness occurs when the surface layer is roughened.
Since the resin has not been completely cured by this curing treatment, if it is used as it is for a printed wiring board, the adhesive strength to copper plating is low, and if it is heated after absorbing moisture, it swells and cannot be used. Therefore, in the semi-additive method, after the entire surface is copper-plated, in the full-additive method, it is heat-cured before or after the conductor circuit is formed to obtain a printed wiring board. By sequentially repeating this and building up to manufacture a multilayer printed wiring board, a copper adhesive strength, a high elastic modulus (rigidity), a small warp / torsion, and a good board thickness accuracy were obtained. .
【0005】又、該アディティブ用樹脂組成物は、硬化
処理後に粗化溶液で粗化した際に粗化溶液に難溶性とな
る樹脂成分と可溶性の成分が配合されたものであり、硬
化処理後に難溶性となる樹脂成分として、(a)多官能性
シアン酸エステルモノマー、該シアン酸エステルプレポ
リマー100重量部に対し、(b)室温で液状のエポキシ樹脂
15〜500重量部を配合し、(c)熱硬化触媒を、(a+b)100重
量部に対し0.005〜10重量部配合した樹脂組成物を必須
成分とする硬化性樹脂組成物を使用することにより、耐
熱性、耐マイグレーション性等の信頼性に優れた多層プ
リント配線板を製造することができる。該硬化処理後に
も粗化溶液に可溶性の成分として、ブタジエン含有樹
脂、有機粉体、無機粉体の3成分のうち2成分以上を必
須成分とすることにより、粗化によるアンカー効果が増
し、銅メッキの接着力の大きいものが得られる。Further, the additive resin composition is a mixture of a resin component and a soluble component which are hardly soluble in the roughening solution when roughened with a roughening solution after the curing treatment. As a poorly soluble resin component, (a) a polyfunctional cyanate ester monomer, and 100 parts by weight of the cyanate ester prepolymer, (b) an epoxy resin which is liquid at room temperature
15 to 500 parts by weight of (c) thermosetting catalyst, (a + b) using a curable resin composition containing 0.005 to 10 parts by weight of 100 parts by weight of the resin composition as an essential component This makes it possible to manufacture a multilayer printed wiring board having excellent reliability such as heat resistance and migration resistance. By making two or more components out of the three components of the butadiene-containing resin, the organic powder, and the inorganic powder as essential components soluble in the roughening solution even after the curing treatment, the anchoring effect due to the roughening increases, and copper It is possible to obtain a plate having a large adhesive force.
【0006】
[発明の詳細な説明]本発明の製造方法において使用す
る、アディティブ用金属箔付きBステージ樹脂組成物シ
ートの樹脂組成物層は、特に限定はなく、一般に公知の
ものが使用される。この樹脂層には、硬化処理した場合
に粗化溶液に可溶性の成分、粗化溶液に難溶性となる樹
脂成分が含まれており、可溶性成分が難溶性となる樹脂
成分中に均一に分散したものである。ここで、本発明で
使用する「可溶性」、「難溶性」の意味は、硬化処理後
に同一の粗化溶液で同一時間浸漬した場合に、相対的に
溶解速度の速いものを「可溶性」、遅いものを「難溶
性」と表現している。DETAILED DESCRIPTION OF THE INVENTION The resin composition layer of the B-stage resin composition sheet with a metal foil for additive used in the production method of the present invention is not particularly limited, and a generally known one is used. . This resin layer contains a component soluble in the roughening solution when cured, and a resin component hardly soluble in the roughening solution, and the soluble component was uniformly dispersed in the resin component poorly soluble. It is a thing. Here, the meanings of "soluble" and "poorly soluble" used in the present invention are "soluble" and "slow" for those having a relatively high dissolution rate when immersed in the same roughening solution for the same time after the curing treatment. Things are described as "poorly soluble".
【0007】本発明の可溶性樹脂は、一般に公知のもの
が挙げられる。この樹脂は溶剤に可溶性のもの、液状の
ものであり、難溶性樹脂中に配合される。これらは特に
限定はないが、具体的にはポリブタジエンゴム、アクリ
ロニトリルーブタジエンゴム、これらのエポキシ化物、
マレイン化物、イミド化物、カルボキシル基含有物、イ
ミド化物、(メタ)アクリル化物、スチレンーブタジエ
ンゴム等、公知のものが挙げられる。特に分子内にブタ
ジエン骨格が入ったものが、粗化液への熔解性、電気的
特性等の点から好適に使用される。又、無官能のものよ
り官能基を含むものが、後硬化処理で他の未反応の樹脂
の官能基と反応して架橋し、特性が向上するので好まし
い。Examples of the soluble resin of the present invention include generally known ones. This resin is soluble in a solvent or liquid, and is mixed in a sparingly soluble resin. These are not particularly limited, but specifically, polybutadiene rubber, acrylonitrile-butadiene rubber, epoxidized products of these,
Known compounds such as maleates, imides, carboxyl group-containing substances, imides, (meth) acrylates, and styrene-butadiene rubbers can be used. In particular, those having a butadiene skeleton in the molecule are preferably used from the viewpoint of solubility in a roughening solution, electrical characteristics, and the like. Further, those containing a functional group rather than non-functional ones are preferable, because they react with the functional groups of other unreacted resins in the post-curing treatment to be crosslinked and the characteristics are improved.
【0008】本発明の可溶性樹脂粉体としては特に限定
はないが、熱硬化性樹脂、熱可塑性樹脂等の粉体が挙げ
られ、粗化溶液に浸漬した場合、硬化処理した難溶性樹
脂よりも溶解性が速いものであれば特に限定はない。形
状は、球状、破砕された無定形状のもの、針状等があ
り、組み合わせて使用可能である。球状、破砕したもの
が好適に使用され、粒径は特に限定はないが、好ましく
は平均粒径0.1〜10μm、更に好ましくは平均粒径0.2〜5
μmである。粒子径は大きいもの、小さいものを組み合
わせて使用するのが好ましい。この場合、金属箔上に塗
布した樹脂層厚みより最大径が小さいものを使用する。
例えば塗布樹脂層を金属箔の凸から7μmの厚みにする場
合、粒子の最大径は7μm以下、好ましくは6μm以下とし
て、塗布後に粒子が樹脂表面より出ないようにする。こ
の場合は平均粒径は6μm未満である。The soluble resin powder of the present invention is not particularly limited, but powders of thermosetting resin, thermoplastic resin and the like can be mentioned, and when immersed in a roughening solution, it is more difficult than the hardened resin which has been hardened. There is no particular limitation as long as it has a high solubility. There are spherical shapes, crushed amorphous shapes, needle shapes, and the like, which can be used in combination. Spherical, crushed is preferably used, the particle size is not particularly limited, preferably an average particle size 0.1 ~ 10 (mu) m, more preferably an average particle size 0.2 ~ 5
μm. It is preferable to use a combination of large and small particles. In this case, one having a maximum diameter smaller than the thickness of the resin layer applied on the metal foil is used.
For example, when the coating resin layer has a thickness of 7 μm from the convex of the metal foil, the maximum particle diameter is 7 μm or less, preferably 6 μm or less so that the particles do not come out of the resin surface after coating. In this case, the average particle size is less than 6 μm.
【0009】具体例としては、エポキシ樹脂、ポリイミ
ド樹脂、ポリフェニレンエーテル樹脂、ポリオレフィン
樹脂、シリコン樹脂、フェノール樹脂、アクリルゴム、
ポリスチレン、MBSゴム、SBR、ABS等の粉体、これらの
多重構造(コアーシェル)ゴム粉体等が挙げられる。こ
れらは1種或いは2種以上が適宜選択して配合される。Specific examples include epoxy resin, polyimide resin, polyphenylene ether resin, polyolefin resin, silicone resin, phenol resin, acrylic rubber,
Examples thereof include powders of polystyrene, MBS rubber, SBR, ABS and the like, and rubber powders of these multiple structures (core shell). These may be used alone or in combination of two or more.
【0010】本発明の可溶性無機粉体としては、特に限
定はないが、例えばアルミナ、水酸化アルミニウム等の
アルミニウム化合物;炭酸カルシウム等のカルシウム化
合物類;マグネシア等のマグネシウム化合物類;シリ
カ、ゼオライト等のシリカ化合物類等が挙げられ、1種
或いは2種以上が組み合わせて使用される。The soluble inorganic powder of the present invention is not particularly limited, but examples thereof include aluminum compounds such as alumina and aluminum hydroxide; calcium compounds such as calcium carbonate; magnesium compounds such as magnesia; silica, zeolite and the like. Examples thereof include silica compounds, and one kind or a combination of two or more kinds is used.
【0011】本発明の難溶性樹脂としては、熱硬化性樹
脂、感光性樹脂等公知のものが1種或いは2種以上組み
合わせて使用され、特に限定はないが、具体的には、エ
ポキシ樹脂、ポリイミド樹脂、多官能性シアン酸エステ
ル樹脂、マレイミド樹脂、2重結合付加ポリフェニレン
エーテル樹脂、ポリオレフィン樹脂、エポキシアクリレ
ート、不飽和基含有ポリカルボン酸樹脂、多官能(メ
タ)アクリレート等が挙げられる。更にこれらの公知の
臭素化物、リン含有化合物も使用される。この中で、耐
マイグレーション性、耐熱性等、吸湿後の耐熱性等の点
から多官能性シアン酸エステル樹脂が好ましい。特に、
好適には(a)多官能性シアン酸エステル化合物、該シア
ン酸エステルプレポリマー 100重量部に対し、(b)室温
で液状のエポキシ樹脂を15〜500重量部配合し、(c)熱硬
化触媒をこの(a+b)成分100重量部に対し0.005〜10重量
部配合した樹脂組成物を必須成分とした熱硬化性樹脂組
成物を用いる。As the hardly soluble resin of the present invention, known resins such as thermosetting resins and photosensitive resins may be used alone or in combination of two or more, and are not particularly limited, but specifically, epoxy resin, Examples thereof include polyimide resins, polyfunctional cyanate ester resins, maleimide resins, double bond-added polyphenylene ether resins, polyolefin resins, epoxy acrylates, unsaturated group-containing polycarboxylic acid resins, and polyfunctional (meth) acrylates. Further, these known bromides and phosphorus-containing compounds are also used. Among these, polyfunctional cyanate ester resins are preferable from the viewpoints of migration resistance, heat resistance, heat resistance after moisture absorption, and the like. In particular,
Suitably (a) a polyfunctional cyanate ester compound, with respect to 100 parts by weight of the cyanate ester prepolymer, (b) 15 to 500 parts by weight of a liquid epoxy resin is blended at room temperature, (c) a thermosetting catalyst A thermosetting resin composition containing as an essential component a resin composition prepared by mixing 0.005 to 10 parts by weight with respect to 100 parts by weight of the component (a + b) is used.
【0012】本発明で好適に使用される(a)多官能性シ
アン酸エステル化合物とは、分子内に2個以上のシアナ
ト基を有する化合物である。具体的に例示すると、1,3-
又は1,4-ジシアナトベンゼン、1,3,5-トリシアナトベン
ゼン、1,3-、1,4-、1,6-、1,8-、2,6-又は2,7-ジシアナ
トナフタレン、1,3,6-トリシアナトナフタレン、4,4-ジ
シアナトビフェニル、ビス(4-ジシアナトフェニル)メタ
ン、2,2-ビス(4-シアナトフェニル)プロパン、2,2-ビス
(3,5-ジブロモー4-シアナトフェニル)プロパン、ビス(4
-シアナトフェニル)エーテル、ビス(4-シアナトフェニ
ル)チオエーテル、ビス(4-シアナトフェニル)スルホ
ン、トリス(4-シアナトフェニル)ホスファイト、トリス
(4-シアナトフェニル)ホスフェート、およびノボラック
とハロゲン化シアンとの反応により得られるシアネート
類等である。The polyfunctional cyanate ester compound (a) preferably used in the present invention is a compound having two or more cyanato groups in the molecule. To give a concrete example, 1,3-
Or 1,4-dicyanatobenzene, 1,3,5-tricyanatobenzene, 1,3-, 1,4-, 1,6-, 1,8-, 2,6- or 2,7-dicyanato Naphthalene, 1,3,6-tricyanatonaphthalene, 4,4-dicyanatobiphenyl, bis (4-dicyanatophenyl) methane, 2,2-bis (4-cyanatophenyl) propane, 2,2-bis
(3,5-dibromo-4-cyanatophenyl) propane, bis (4
-Cyanatophenyl) ether, bis (4-cyanatophenyl) thioether, bis (4-cyanatophenyl) sulfone, tris (4-cyanatophenyl) phosphite, tris
Examples thereof include (4-cyanatophenyl) phosphate, and cyanates obtained by reacting novolac with cyanogen halide.
【0013】これらのほかに特公昭41-1928、同43-1846
8、同44-4791、同45-11712、同46-41112、同47-26853及
び特開昭51-63149等に記載の多官能性シアン酸エステル
化合物類も用いら得る。また、これら多官能性シアン酸
エステル化合物のシアナト基の三量化によって形成され
るトリアジン環を有する分子量400〜6,000 のプレポリ
マーが使用される。このプレポリマーは、上記の多官能
性シアン酸エステルモノマーを、例えば鉱酸、ルイス酸
等の酸類;ナトリウムアルコラート等、第三級アミン類
等の塩基;炭酸ナトリウム等の塩類等を触媒として重合
させることにより得られる。このプレポリマー中には一
部未反応のモノマーも含まれており、モノマーとプレポ
リマーとの混合物の形態をしており、このような原料は
本発明の用途に好適に使用される。一般には可溶な有機
溶剤に溶解させて使用する。以上の化合物の公知の臭素
付加物も使用される。又、室温で液状の公知の上記化合
物も使用できる。In addition to these, Japanese Examined Patent Publications 41-1928 and 43-1846
8, polyfunctional cyanate ester compounds described in JP-A-51-63149 and JP-A-44-4791, JP-A-45-11712, JP-A-46-41112 and JP-A-47-26853 can also be used. Further, a prepolymer having a molecular weight of 400 to 6,000 and having a triazine ring formed by trimerizing the cyanato group of these polyfunctional cyanate ester compounds is used. This prepolymer is obtained by polymerizing the above-mentioned polyfunctional cyanate ester monomer using, for example, acids such as mineral acid and Lewis acid; bases such as sodium alcoholate and tertiary amines; salts such as sodium carbonate as a catalyst. It is obtained by The prepolymer also contains some unreacted monomer and is in the form of a mixture of the monomer and the prepolymer. Such a raw material is suitably used for the purpose of the present invention. Generally, it is used by dissolving it in a soluble organic solvent. Known bromine adducts of the above compounds are also used. Also, the above-mentioned known compounds which are liquid at room temperature can be used.
【0014】本発明の(b)成分である室温で液状のエポ
キシ樹脂としては、一般に公知のものが使用可能であ
る。具体的には、ビスフェノールA型エポキシ樹脂、ビ
スフェノールF型エポキシ樹脂、フェノールノボラック
型エポキシ樹脂、脂環式エポキシ樹脂、ポリエーテルポ
リオールのジグリシジル化物、酸無水物のエポキシ化
物、脂環式エポキシ樹脂等が単独或いは2種以上組み合
わせて使用される。使用量は、多官能性シアン酸エステ
ル化合物、該シアン酸エステルプレポリマー 100重量部
に対し、15〜500重量部、好ましくは20〜300重量部であ
る。As the epoxy resin which is liquid at room temperature, which is the component (b) of the present invention, generally known epoxy resins can be used. Specifically, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, alicyclic epoxy resin, diglycidylated product of polyether polyol, epoxidized acid anhydride, alicyclic epoxy resin, etc. Used alone or in combination of two or more. The amount used is 15 to 500 parts by weight, preferably 20 to 300 parts by weight, based on 100 parts by weight of the polyfunctional cyanate ester compound and the cyanate ester prepolymer.
【0015】これらの液状エポキシ化合物以外に、公知
の固形の上記エポキシ樹脂、更にはクレゾールノボラッ
ク型エポキシ樹脂、ビフェニル型エポキシ樹脂、ナフタ
レン型エポキシ樹脂等が難溶性樹脂として単独或いは2
種以上組み合わせて使用される。In addition to these liquid epoxy compounds, known solid epoxy resins as described above, and cresol novolac type epoxy resins, biphenyl type epoxy resins, naphthalene type epoxy resins, etc., may be used alone or as a poorly soluble resin.
Used in combination of two or more species.
【0016】本発明の熱硬化性樹脂組成物には、組成物
本来の特性が損なわれない範囲で、所望に応じて上記以
外の種々の添加物を配合することができる。これらの添
加物としては、各種樹脂類、公知の無機、有機の充填
剤、染料、顔料、増粘剤、滑剤、消泡剤、分散剤、レベ
リング剤、光増感剤、難燃剤、光沢剤、重合禁止剤、チ
キソ性付与剤等の各種添加剤が、所望に応じて適宜組み
合わせて用いられる。必要により、反応基を有する化合
物は公知の硬化剤、触媒が適宜配合される。The thermosetting resin composition of the present invention may contain various additives other than those mentioned above, if desired, within a range in which the original properties of the composition are not impaired. Examples of these additives include various resins, known inorganic and organic fillers, dyes, pigments, thickeners, lubricants, defoamers, dispersants, leveling agents, photosensitizers, flame retardants, and brighteners. Various additives such as a polymerization inhibitor, a thixotropic agent, and the like are used in an appropriate combination as desired. If necessary, a known curing agent and a catalyst may be appropriately added to the compound having a reactive group.
【0017】本発明の熱硬化性樹脂組成物は、それ自体
は加熱により硬化するが硬化速度が遅く、作業性、経済
性等に劣るため使用した熱硬化性樹脂に対して公知の熱
硬化触媒を用い得る。使用量は、熱硬化性樹脂(a+b)100
重量部に対し、0.005〜10重量部、好ましくは0.01〜5重
量部である。The thermosetting resin composition of the present invention itself is cured by heating, but the curing speed is slow and the workability and economy are poor. Therefore, the known thermosetting catalyst for the thermosetting resin used. Can be used. The amount used is 100% thermosetting resin (a + b)
It is 0.005 to 10 parts by weight, preferably 0.01 to 5 parts by weight, based on parts by weight.
【0018】本発明の樹脂組成物中に均一分散している
可溶性樹脂、有機粉体、無機粉体の配合量は、特に限定
はないが、好適には全体の3〜50重量%、更に好適には5
〜35重量%を使用する.。これらの成分は1種類でも良
いが、好適には3成分のうち2成分以上を使用する。又、
同一粒径よりは異なる粒径のものを用いることにより、
凹凸の形状がより複雑となってアンカー効果が増し、銅
メッキ接着力に優れたものが得られる。The amount of the soluble resin, the organic powder, and the inorganic powder uniformly dispersed in the resin composition of the present invention is not particularly limited, but is preferably 3 to 50% by weight, and further preferably For 5
Use ~ 35% by weight ... These components may be of one type, but preferably two or more of the three components are used. or,
By using different particle sizes than the same,
The shape of the unevenness becomes more complicated, the anchor effect increases, and the one having excellent copper plating adhesive strength is obtained.
【0019】本発明の各成分を均一に混練する方法は、
一般に公知の方法が使用され得る。例えば、各成分を配
合後、三本ロールにて、室温或いは加熱下に混練する
か、ボールミル、ライカイ機等、一般に公知のものが使
用される。また、溶剤を添加して加工法に合う粘度とし
て使用する。The method of uniformly kneading each component of the present invention is
Generally known methods can be used. For example, after the respective components are blended, they are kneaded with a triple roll at room temperature or under heating, or generally known ones such as a ball mill and a liquor machine are used. In addition, a solvent is added to obtain a viscosity suitable for the processing method.
【0020】また、プリプレグは公知の方法で作製され
る。樹脂も上記の公知の熱硬化性樹脂組成物が使用され
る。基材としては、有機、無機繊維布基材を使用する。
種類については特に限定はないが、有機繊維布として
は、好適には液晶ポリエステル繊維、ポリベンザゾール
繊維、全芳香族ポリアミド繊維などの不織布、織布が使
用される。不織布とする場合、繊維同士をつなぐために
バインダーを付着させるか、パルプと繊維を混抄し、30
0℃位の温度でパルプを加熱溶融させてバインダー代わ
りに使用した特開平11-255908の不織布等が使用でき
る。バインダーの量は特に限定しないが、不織布の強度
を維持するためには、好適には3〜8重量%付着させ
る。無機繊維布としては、一般の断面が円形状、扁平の
公知のガラス繊維織布、不織布、更にはセラミック繊維
織布、不織布を用いる。The prepreg is produced by a known method. As the resin, the above-mentioned known thermosetting resin composition is used. As the base material, an organic or inorganic fiber cloth base material is used.
Although the type is not particularly limited, liquid crystal polyester fibers, polybenzazole fibers, wholly aromatic polyamide fibers, and other non-woven fabrics and woven fabrics are preferably used as the organic fiber fabrics. When using a non-woven fabric, attach a binder to connect the fibers or mix pulp and fibers,
The non-woven fabric of JP-A-11-255908, which is used as a binder by heating and melting pulp at a temperature of about 0 ° C., can be used. Although the amount of the binder is not particularly limited, it is preferably 3 to 8% by weight in order to maintain the strength of the nonwoven fabric. As the inorganic fiber cloth, a known glass fiber woven cloth or non-woven cloth having a general circular cross section and a flat cross section, and further a ceramic fiber woven cloth or non-woven cloth are used.
【0021】又、ポリアミドフィルム、液晶ポリエステ
ルフィルム、全芳香族ポリアミドフィルム等の公知の耐
熱フィルムも基材として好適に使用し得る。フイルムの
表面は接着力を上げるために公知の表面処理、例えばプ
ラズマ処理、コロナ処理、薬液処理等を施したものが好
適に使用される。Known heat-resistant films such as polyamide film, liquid crystal polyester film and wholly aromatic polyamide film can also be preferably used as the substrate. The surface of the film is preferably subjected to a known surface treatment such as plasma treatment, corona treatment, chemical treatment in order to increase the adhesive strength.
【0022】プリプレグを作製する方法は特に限定はな
く、公知の方法が使用できる。例えば、基材に含浸、乾
燥するか、或いは基材の両面に樹脂層を配置して加熱圧
着等で一体化してプリプレグを作製する方法等が挙げら
れる。使用する樹脂組成物は、上記金属箔張Bステージ
樹脂組成物シートの樹脂と同じでも良いが、好適には酸
或いは酸化剤に難溶性の樹脂を使用する。こうすること
により、酸或いは酸化剤で処理した場合に、表層の可溶
性の樹脂が溶解し、プリプレグの基材に付着した樹脂は
殆ど溶解されないために、基材繊維が露出せず、その後
の無電解銅メッキでのメッキ付着が基材まで到達しない
ために、耐マイグレーション性等の信頼性に優れたもの
が得られる。The method for producing the prepreg is not particularly limited, and known methods can be used. For example, a method of impregnating a base material and drying it, or a method of arranging resin layers on both surfaces of the base material and integrating them by thermocompression bonding to prepare a prepreg can be mentioned. The resin composition used may be the same as the resin of the metal foil-clad B-stage resin composition sheet, but preferably a resin that is hardly soluble in an acid or an oxidizing agent is used. By doing so, when treated with an acid or an oxidizing agent, the soluble resin in the surface layer is dissolved, and the resin adhering to the base material of the prepreg is hardly dissolved. Since the adhesion of the plating by electrolytic copper plating does not reach the base material, it is possible to obtain a product having excellent reliability such as migration resistance.
【0023】本発明で使用する表面に凹凸のある金属箔
は特に限定はなく、具体的にはアルミニウム箔、銅箔、
ニッケル箔等が挙げられる。樹脂を付着させる面の凹凸
は特に限定はないが、好適には平均粗度Rzが1〜7μm、
更に好ましくは平均粗度2〜5μmである。これは粗化前
に凹凸が大きいと、粗化時間が短く、且つ水分の浸透も
少ないために、メッキした銅層の加熱による膨れ軽減等
が図れる。粗度が大き過ぎると、その後の粗化による深
さが深くなり過ぎ、銅メッキが困難となり、ばらつきが
生じ易い。金属箔の厚みは特に限定はないが、その後に
エッチング等して除去するために薄い方が良く、好まし
くは9〜20μmを使用する。もちろん表面平滑な銅箔も使
用は可能である。There are no particular restrictions on the metal foil used in the present invention having irregularities on the surface, and specifically, aluminum foil, copper foil,
Examples include nickel foil. The unevenness of the surface to which the resin is attached is not particularly limited, but preferably the average roughness Rz is 1 to 7 μm,
More preferably, the average roughness is 2 to 5 μm. This is because if the irregularities are large before roughening, the roughening time is short, and the penetration of water is small, so that blistering of the plated copper layer due to heating can be reduced. If the roughness is too large, the depth due to the subsequent roughening becomes too deep, copper plating becomes difficult, and variations easily occur. The thickness of the metal foil is not particularly limited, but it is preferably thin so that it can be removed by etching or the like thereafter, and preferably 9 to 20 μm is used. Of course, a copper foil with a smooth surface can also be used.
【0024】金属箔にBステージ樹脂組成物層を付着さ
せる場合、方法は公知の方法が使用できる。例えば、金
属箔上に直接ロールで塗布、乾燥してBステージ化する
か、離型フィルムに塗布、乾燥してBステージ化した後
に樹脂組成物側に金属箔を配置して、加熱、加圧ロール
等で圧着し、一体化した金属箔付きBステージ樹脂組成
物シートとする。この場合樹脂組成物中に少量の溶剤が
残存しても良い。使用する際は離型フィルムを剥離す
る。樹脂組成物の厚みは特に限定はないが、好適には金
属箔の凸部の先端から3〜100μm、好適には4〜50μm、
更に好ましくは5〜20μmである。この厚みは一緒に使用
するプリプレグのガラス繊維から表層までの樹脂層厚み
により適宜選択し、メッキした銅の接着力が確保できる
凹凸を付けるために粗化溶液で粗化した時に、凹部がガ
ラスクロスに到達しないようにする。When the B-stage resin composition layer is attached to the metal foil, a known method can be used. For example, by directly applying a roll on a metal foil, drying to B-stage, or applying to a release film, drying and B-stage after placing the metal foil on the resin composition side, heating, pressurization A B-stage resin composition sheet with a metal foil integrated by pressure bonding with a roll or the like is formed. In this case, a small amount of solvent may remain in the resin composition. When used, the release film is peeled off. The thickness of the resin composition is not particularly limited, but is preferably 3 to 100 μm from the tip of the convex portion of the metal foil, preferably 4 to 50 μm,
More preferably, it is 5 to 20 μm. This thickness is appropriately selected depending on the thickness of the resin layer from the glass fiber of the prepreg used to the surface layer, and when roughened with a roughening solution to form irregularities that can secure the adhesive strength of the plated copper, the concave portion has a glass cloth. Try not to reach.
【0025】本発明の多層化の場合、導体回路を形成し
た内層板の導体に公知の表面処理を施した後、又は両面
粗化箔を使用した内層用回路板の表裏にプリプレグ及び
金属箔付きBステージ樹脂組成物シートを配置し、公知
の方法にて加熱、加圧、好適には真空下に積層成形す
る。積層後にエッチング等で金属箔を除去する。In the case of the multi-layering of the present invention, after the conductor of the inner layer board on which the conductor circuit is formed is subjected to a known surface treatment, or on the front and back of the inner layer circuit board using the double-sided roughening foil, the prepreg and the metal foil are attached. A B-stage resin composition sheet is placed, and laminated and molded by a known method under heating, pressure, and preferably under vacuum. After lamination, the metal foil is removed by etching or the like.
【0026】本発明の積層硬化処理する際の積層成形条
件は、特に限定はないが、粗化溶液での粗化が適正にで
きる条件を、使用した樹脂組成によって適宜選択する。
一般には温度60〜250℃、圧力2〜50kgf/cm2 、時間は0.
5〜3時間である。又、真空下に積層成形するのが好まし
い。装置は真空ラミネータプレス、一般の多段プレス
等、公知のものが使用できる。There are no particular restrictions on the lamination molding conditions for carrying out the lamination hardening treatment of the present invention, but the conditions under which roughening with a roughening solution can be appropriately performed are appropriately selected depending on the resin composition used.
Generally, the temperature is 60 to 250 ° C, the pressure is 2 to 50 kgf / cm 2 , and the time is 0.
5 to 3 hours. Further, it is preferable to carry out lamination molding under vacuum. A known device such as a vacuum laminator press or a general multi-stage press can be used as the device.
【0027】構成として、普通のプリプレグを用いて積
層して多層板としたものに導体回路を形成し、導体を必
要により化学処理後、上記プリプレグと金属箔付きBス
テージ樹脂組成物シートを配置して積層成形して多層板
とするような表層の1層だけをこの構成で作製すること
も可能である。又、適宜これらの積層方法を組み合わせ
ることも可能である。As a constitution, a conductor circuit is formed on a multilayer board obtained by laminating using ordinary prepreg, and after chemically treating the conductor, the prepreg and the B-stage resin composition sheet with a metal foil are arranged. It is also possible to fabricate only one surface layer, which is laminated and molded into a multilayer board, with this configuration. It is also possible to appropriately combine these laminating methods.
【0028】本発明で得られた金属箔張板の表層の金属
を除去後、公知の方法にて樹脂の粗化を行う。使用する
酸としては硫酸、塩酸、硝酸、燐酸、蟻酸等が挙げら
れ、酸化剤としては過マンガン酸ナトリウム、過マンガ
ン酸カリウム、クロム酸、クロム硫酸等が挙げられる
が、これに限定されるものではない。この処理前は必要
により公知の膨潤液を使用し、処理後は中和液で中和す
る。この粗化処理で形成する粗化面の平均粗度は、金属
箔の凹凸とは別に平均粗度Rz 0.1〜10μm、好適には0.2
〜5μmとする。金属箔の凹凸と粗化による凹凸を合わせ
た粗度は一般には平均粗度Rzが3〜15μm、好適にはRzは
5〜12μmとするように樹脂組成、可溶性成分粒径等を適
宜選択して使用する。After removing the metal on the surface layer of the metal foil-clad sheet obtained by the present invention, the resin is roughened by a known method. Examples of the acid used include sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, formic acid and the like, and examples of the oxidizing agent include sodium permanganate, potassium permanganate, chromic acid and chromic sulfuric acid, but are not limited thereto. is not. If necessary, a known swelling solution is used before this treatment, and after the treatment, it is neutralized with a neutralizing solution. The average roughness of the roughened surface formed by this roughening treatment, average roughness Rz 0.1 ~ 10 μm, preferably 0.2 apart from the unevenness of the metal foil.
~ 5 μm. The roughness of the unevenness of the metal foil and the roughness due to roughening is generally an average roughness Rz of 3 to 15 μm, preferably Rz is
The resin composition, the particle size of the soluble component, etc. are appropriately selected and used so as to be 5 to 12 μm.
【0029】その後は、公知のセミアディティブ法、フ
ルアディティブ法等にて無電解メッキ、厚付け無電解メ
ッキ、蒸着、スパッタリング等を行い、更に一般的には
電気メッキを行って導体を厚付けする。更にそれぞれ公
知の方法で回路を形成し、プリント配線板とする。必要
によりスルーホール、ブラインドビア孔をあけ、デスミ
ア処理後に同一工程を順次繰り返してビルドアップにて
多層化する。After that, electroless plating, thickening electroless plating, vapor deposition, sputtering, etc. are performed by a known semi-additive method, full-additive method or the like, and more generally, electroplating is performed to thicken the conductor. . Further, circuits are formed by known methods to obtain printed wiring boards. If necessary, through holes and blind via holes are opened, and after desmearing, the same steps are sequentially repeated to build up multiple layers.
【0030】もちろん銅箔付きBステージ樹脂組成物シ
ートを使って積層し、サブトラクティブ法でプリント配
線板を製造することも可能である。Of course, it is also possible to laminate using a B-stage resin composition sheet with copper foil and manufacture a printed wiring board by the subtractive method.
【0031】[0031]
【実施例】以下に実施例、比較例で本発明を具体的に説
明する。尚、特に断らない限り、『部』は重量部を表
す。
実施例1
2,2-ビス(4-シアナトフェニル)プロパンモノマーを400
部150℃に熔融させ、撹拌しながら4時間反応させ、平均
分子量1,900のプレポリマーを得た。これをメチルエチ
ルケトンに溶解し、ワニスAとした。これに室温で液状
のエポキシ樹脂として、ビスフェノールA型エポキシ樹
脂(商品名:エピコート828、ジャパンエポキシレジン<
株>製)50部、ビスフェノールF型エポキシ樹脂(商品
名:EXA830LVP、大日本インキ化学工業<株>製)100部、
ノボラック型エポキシ樹脂(商品名:DEN438、ダウケミカ
ル<株>製)50部、室温で固形のエポキシ樹脂として、
ビスフェノールA型エポキシ樹脂(商品名:エピコート
1001、ジャパンエポキシレジン<株>製)300部、クレ
ゾールノボラック型エポキシ樹脂(商品名:ESCN220F、
住友化学工業<株>製)100部を配合し、熱硬化触媒として
アセチルアセトン鉄0.3部をメチルエチルケトンに溶解
して加えた。これに液状のエポキシ化ポリブタジエン樹
脂(商品名:E-1000-8.0、日本石油化学<株>製)100
部、エポキシ基変性アクリルゴム粉体(商品名:スタフ
ィロイドIM203、平均粒径0.3μm、MAX.粒径0.5μm、
ガンツ化成<株>製)50部を加え、良く攪拌混合して均
一なワニスBにした。The present invention will be specifically described below with reference to Examples and Comparative Examples. Unless otherwise specified, “part” means part by weight. Example 1 400 of 2,2-bis (4-cyanatophenyl) propane monomer
Part was melted at 150 ° C. and reacted for 4 hours with stirring to obtain a prepolymer having an average molecular weight of 1,900. This was dissolved in methyl ethyl ketone to obtain varnish A. A bisphenol A type epoxy resin (trade name: Epicoat 828, Japan Epoxy Resin <
Co., Ltd.) 50 parts, bisphenol F type epoxy resin (trade name: EXA830LVP, Dainippon Ink and Chemicals Co., Ltd.) 100 parts,
50 parts of novolac type epoxy resin (trade name: DEN438, manufactured by Dow Chemical Co., Ltd.), as a solid epoxy resin at room temperature,
Bisphenol A type epoxy resin (trade name: Epicoat
1001, 300 parts of Japan Epoxy Resin Co., Ltd., cresol novolac type epoxy resin (trade name: ESCN220F,
100 parts of Sumitomo Chemical Co., Ltd.) was blended, and 0.3 parts of iron acetylacetone as a thermosetting catalyst was dissolved in methyl ethyl ketone and added. Liquid epoxidized polybutadiene resin (trade name: E-1000-8.0, manufactured by Nippon Petrochemical Co., Ltd.) 100
Part, epoxy group-modified acrylic rubber powder (trade name: Staphyloid IM203, average particle size 0.3 μm, MAX. Particle size 0.5 μm,
50 parts of Ganz Kasei Co., Ltd.) was added and mixed well by stirring to form a uniform varnish B.
【0032】このワニスBを連続して厚さ18μmの銅箔マ
ット面(凹凸3.6〜6.1μm、平均粗度Rz:4.5μm)に塗
布、乾燥してMax.凸部先端から5.1μmの高さのBステー
ジ樹脂組成物層(170℃でのゲル化時間43秒)付きシー
トCを作製した。This varnish B was continuously applied to a 18 μm thick copper foil matte surface (unevenness 3.6 to 6.1 μm, average roughness Rz: 4.5 μm), dried, and the height of Max. A sheet C having a B-stage resin composition layer (gelling time at 170 ° C., 43 seconds) of Example 3 was prepared.
【0033】一方、内層板として絶縁層厚さ0.2mm、12
μm両面銅箔のBTレジン銅張積層板(商品名:CCL-HL83
0、三菱ガス化学<株>製 )に回路を形成し、黒色酸化銅
処理を銅箔に施した板の両面に、厚さ60μmのBTレジン
プリプレグ(商品名:GHPL-830、三菱ガス化学<株>製)
を各1枚配置し、その両外側に上記銅箔付きBステージ
樹脂組成物シートを、樹脂層がプリプレグ側を向くよう
に配置し、プレス装置に仕込んだ後、室温から170℃ま
で25分で温度を上げ、圧力は最初から15kgf/cm2とし、
真空度は0.5Torrで170℃で30分保持した後、冷却して取
り出し、4層の多層板Dを得た。この表面の銅箔をエッチ
ング除去後、炭酸ガスレーザー出力12mJで1ショット照
射して孔径100μmのブラインドビア孔をあけた。過マン
ガン酸カリウム系デスミア溶液(日本マクダーミッド<
株>)で膨潤、デスミア(溶解)、中和して、樹脂表面
からの凹を3.3〜5.0μm(平均粗度Rz:4.1μm)、表層か
らの凹凸合計で6.8〜11.0μm(平均粗度Rz:8.7μm)とし
た。この際に一緒に積層したプリプレグのガラスクロス
には凹部は到達しなかった。同時にブラインドビア孔底
部に残存している樹脂層を溶解除去した。次に、この粗
化表面に無電解銅メッキ0.5μm、電気銅メッキを25μm
付着させ、加熱炉に入れて100℃から徐々に温度を30分
で150℃まで上げ、更に徐々に温度を上げて200℃で60分
加熱硬化した。これを用いてセミアディティブ法にて銅
導体回路を形成し、更に導体回路表面黒色酸化銅処理し
て同一工程を繰り返し、6層の多層プリント配線板を作
製した。この特性を測定した結果を表1に示す。On the other hand, as the inner layer plate, the insulating layer thickness is 0.2 mm, 12
BT resin copper clad laminate with μm double-sided copper foil (Product name: CCL-HL83
0, Mitsubishi Gas Chemical Co., Ltd.), a circuit was formed and black copper oxide treatment was applied to the copper foil on both sides of a BT resin prepreg (trade name: GHPL-830, Mitsubishi Gas Chemical (Stock> product)
1 sheet each, and the B-stage resin composition sheet with the copper foil is placed on both outsides thereof so that the resin layer faces the prepreg side, and after being placed in a press machine, it takes 25 minutes from room temperature to 170 ° C. Raise the temperature and pressure from the beginning to 15 kgf / cm 2 ,
The vacuum was maintained at 170 ° C. for 30 minutes at a vacuum of 0.5 Torr, then cooled and taken out to obtain a four-layered multilayer plate D. After removing the copper foil on this surface by etching, one shot was irradiated with a carbon dioxide gas laser output of 12 mJ to form a blind via hole having a hole diameter of 100 μm. Potassium permanganate-based desmear solution (Japan McDermid
Strain>), desmear (dissolve), and neutralize to 3.3-5.0 μm concaves from the resin surface (average roughness Rz: 4.1 μm), and 6.8 to 11.0 μm total average irregularities from the surface layer (average roughness) Rz: 8.7 μm). At this time, the concave portion did not reach the glass cloth of the prepreg laminated together. At the same time, the resin layer remaining at the bottom of the blind via hole was dissolved and removed. Next, electroless copper plating 0.5μm, electrolytic copper plating 25μm on this roughened surface
The mixture was attached, placed in a heating furnace, and the temperature was gradually raised from 100 ° C. to 150 ° C. in 30 minutes, and further gradually raised to 200 ° C. for 60 minutes for heat curing. Using this, a copper conductor circuit was formed by the semi-additive method, the conductor circuit surface was further treated with black copper oxide, and the same process was repeated to fabricate a 6-layer multilayer printed wiring board. The results of measuring this property are shown in Table 1.
【0034】実施例2
ビスフェノールA型エポキシ樹脂(商品名:エピコ−ト1
001、油化シェルエポキシ<株>製)500部、フェノールノ
ボラック型エポキシ樹脂(商品名:DEN438、ダウケミカ
ル<株>製造)500部、イミダゾール系硬化剤(商品名:2
E4MZ、四国化成<株>製)30部、カルボキシル基変性アク
リル多層構造粉体(商品名:スタフィロイドIM-301、平
均粒子径0.2μm、Max.粒径0.9μm)50部、微粉砕シリカ
(平均粒子径2.4μm、Nax.粒径5.0μm)40部、及びアク
リロニトリルーブタジエンゴム(商品名:ニポール103
1、日本ゼオン<株>製)30部をメチルエチルケトンに溶解
した溶液を加え、3本ロールにて良く分散した。これを
厚さ20μmで表面凹凸が1.3〜5.5μm(平均粗度Rz:4.0μ
m)のアルミニウム箔(商品名:20CF1、日本蓄電器工業<
株>製)の片面に連続的に塗布、乾燥して凸部先端から
6.0μmの樹脂層を形成したアルミニウム箔付きBステー
ジ樹脂組成物シートE(170℃でのゲル化時間51秒)を作
製した。Example 2 Bisphenol A type epoxy resin (trade name: Epicort 1
001, Yuka Shell Epoxy Co., Ltd.) 500 parts, phenol novolac type epoxy resin (trade name: DEN438, Dow Chemical Co., Ltd.) 500 parts, imidazole curing agent (trade name: 2)
E4MZ, Shikoku Kasei Co., Ltd.) 30 parts, carboxyl group-modified acrylic multi-layer structure powder (trade name: Staphyloid IM-301, average particle size 0.2 μm, Max. Particle size 0.9 μm) 50 parts, finely pulverized silica ( Average particle size 2.4 μm, Nax. Particle size 5.0 μm) 40 parts, and acrylonitrile-butadiene rubber (trade name: Nipol 103
1. A solution prepared by dissolving 30 parts of Nippon Zeon Co., Ltd. in methyl ethyl ketone was added and well dispersed by a three-roll mill. This has a thickness of 20 μm and surface irregularities of 1.3 to 5.5 μm (average roughness Rz: 4.0 μm
m) aluminum foil (trade name: 20CF1, Japan Condenser Industry <
Co., Ltd.) on one side continuously, dry and then from the tip of the protrusion
A B-stage resin composition sheet E with an aluminum foil having a resin layer of 6.0 μm (gelling time at 170 ° C., 51 seconds) was prepared.
【0035】一方、厚さ0.2mm、12μm両面銅箔のエポキ
シ系銅張積層板(商品名:CCL-EL170、三菱ガス化学<株
>製)回路を形成し、導体に黒色酸化銅処理後に、この
両面に厚さ60μmのエポキシプリプレグ(商品名:GEPL-
170、三菱ガス化学<株>製)を各1枚配置し、その外側
に上記アルミニウム箔付きBステージ樹脂組成物付きシ
ートEを置き、プレス装置に仕込んだ後、170℃まで25分
で温度を上げ、圧力は最初から15kgf/cm2とし、真空度
0.5Torr2にて温度170℃で30分保持した後、冷却して取
り出し、4層多層板Fを得た。この表面のアルミニウム箔
を10%塩酸溶液で溶解除去後、炭酸ガスレーザー出力12m
Jで1ショット照射して孔径100μmのブラインドビア孔を
あけた。On the other hand, an epoxy-based copper clad laminate of 0.2 mm thick and 12 μm double-sided copper foil (trade name: CCL-EL170, Mitsubishi Gas Chemical Co., Ltd.
>) Circuit, and the conductor is treated with black copper oxide, and then 60 μm thick epoxy prepreg (product name: GEPL-
170, manufactured by Mitsubishi Gas Chemical Co., Inc.) is placed on each side, and the above-mentioned sheet E with the B-stage resin composition with aluminum foil is placed on the outside thereof, and after being placed in a press machine, the temperature is raised to 170 ° C in 25 minutes Raise the pressure from the beginning to 15 kgf / cm 2, and set the degree of vacuum.
After holding at a temperature of 170 ° C. for 30 minutes at 0.5 Torr 2, it was cooled and taken out to obtain a four-layer multilayer plate F. The aluminum foil on this surface was dissolved and removed with a 10% hydrochloric acid solution, and the carbon dioxide gas laser output was 12 m.
Blind via holes with a diameter of 100 μm were made by irradiating one shot with J.
【0036】クロム酸系粗化溶液で粗化して、樹脂表面
からの凹を3.6〜5.1μm(平均粗度Rz:4.0μm)とした。表
層からの凹凸合計で4.7〜10.1μm(平均粗度Rz:8.1μm)
とした。この際に一緒に積層したプリプレグのガラスク
ロスには凹部は到達しなかった。同時にブラインドビア
孔底部に残存している樹脂層を溶解除去した。After roughening with a chromic acid-based roughening solution, the recesses from the resin surface were adjusted to 3.6 to 5.1 μm (average roughness Rz: 4.0 μm). 4.7 to 10.1 μm (total roughness Rz: 8.1 μm) in total from the surface irregularities
And At this time, the concave portion did not reach the glass cloth of the prepreg laminated together. At the same time, the resin layer remaining at the bottom of the blind via hole was dissolved and removed.
【0037】次に、この粗化表面に無電解銅メッキ層を
0.7μm、電解銅メッキを25μm付着させ、加熱炉に入れ
て150℃で30分、更に温度を上げて170℃で60分加熱硬化
した。これを用いてセミアディティブ法にて導体回路を
形成し、更に導体回路を黒色酸化銅処理を行い、同様に
加工して6層の多層プリント配線板を作製した。この特
性を測定した結果を表1に示す。Next, an electroless copper plating layer is formed on the roughened surface.
0.7 μm and 25 μm of electrolytic copper plating were adhered, put in a heating furnace and heated and cured at 150 ° C. for 30 minutes and 170 ° C. for 60 minutes. Using this, a conductor circuit was formed by a semi-additive method, the conductor circuit was further treated with black copper oxide, and processed in the same manner to produce a 6-layer multilayer printed wiring board. The results of measuring this property are shown in Table 1.
【0038】比較例1、2
実施例1,2で銅箔及びアルミニウム箔の凹凸部に付着
するBステージの樹脂層の厚さを、凸部先端から65μm
付着させて金属箔付きBステージ樹脂組成物シートを作
製し、実施例1、2においてプリプレグを使用せず、こ
の金属箔付きBステージ樹脂組成物シートのみを使用し
て同様に積層硬化処理成形し、粗化処理を同様に行っ
て、実施例1,2と同様に表層からの凹凸合計で5〜11
μm(平均粗度Rz:8〜9μm)とし、同様に6層の多層プリ
ント配線板とした。この評価結果を表1に示す。Comparative Examples 1 and 2 In Examples 1 and 2, the thickness of the resin layer of the B stage attached to the uneven portions of the copper foil and the aluminum foil was 65 μm from the tip of the convex portion.
A B-stage resin composition sheet with a metal foil was prepared by adhering, and a prepreg was not used in Examples 1 and 2 and a B-stage resin composition sheet with a metal foil alone was used and laminated and cured similarly. In the same manner as in Examples 1 and 2, the roughening treatment was performed in the same manner, and the total unevenness from the surface layer was 5 to 11
μm (average roughness Rz: 8 to 9 μm), and similarly a multilayer printed wiring board having 6 layers. The evaluation results are shown in Table 1.
【0039】比較例3
実施例1において、ワニスBを厚さ50μmのガラスクロ
スに含浸、乾燥して厚さ65μm、ゲル化時間(170℃)が
55秒のプリプレグGを製造した。このプリプレグを各1
枚内層板の両側に配置し、その外側に18μmの銅箔を置
き、同様に積層硬化処理成形して4層の多層板を作製し
た。この表層の銅箔をエッチング除去後に、ブラインド
ビア孔を形成し、同様に粗化処理を行って、表層からの
凹凸合計を5〜11μmとし、無電解銅メッキ後に同様に回
路形成、導体黒色酸化銅処理、プリプレグG配置、18μ
mの銅箔配置、同様に積層してから表層の銅箔除去、ブ
ラインドビア孔形成、、デスミア処理、無電解銅メッ
キ、電解銅メッキ、回路形成を行って6層の多層プリン
ト配線板を作製した。銅メッキ断面を観察すると、ガラ
スクロスに粗化の凹が到達し、銅メッキが付着している
箇所多数があった。この評価結果を表1に示す。Comparative Example 3 In Example 1, a glass cloth having a thickness of 50 μm was impregnated with varnish B and dried to have a thickness of 65 μm and a gelling time (170 ° C.).
55 seconds of prepreg G was manufactured. 1 each for this prepreg
It was arranged on both sides of the inner layer plate, and a copper foil of 18 μm was placed on the outer side of the inner layer plate, and similarly laminated and cured to form a four-layer multilayer plate. After removing the copper foil on the surface layer by etching, blind via holes are formed, and roughening treatment is performed in the same manner to make the total irregularities from the surface layer 5 to 11 μm. Copper treatment, prepreg G arrangement, 18μ
6 layers of multilayer printed wiring board is prepared by arranging m copper foil, similarly removing the copper foil on the surface layer, forming blind via holes, desmearing, electroless copper plating, electrolytic copper plating and circuit formation. did. When the copper-plated cross section was observed, a roughening recess reached the glass cloth and there were many places where the copper plating was attached. The evaluation results are shown in Table 1.
【0040】比較例4
実施例2において、カルボキシル基変性アクリル多層構
造粉体、微粉砕シリカ、及びアクリロニトリルーブタジ
エンゴムを用いないでワニスを調整し、これを同様に凹
凸が形成されたアルミニウム箔上に厚さ65μmとなるよ
うに塗布、乾燥して、ゲル化時間(170℃)が80秒の樹脂
層を形成したアルミニウム箔付きBステージ樹脂組成物
シートHを作製した。このアルミニウム箔付きBステー
ジ樹脂組成物シートHを内層板の両側に各1枚配置し、
同様に積層硬化処理成形して4層の多層板を作製し、表
層のアルミニウム箔を10%の塩酸で溶解除去後に、同様
にCO2レーザーでブラインドビア孔を形成し、実施例2
と同じ条件で粗化処理を行い、無電解銅メッキ及び電解
銅メッキ後に導体回路形成、導体黒色酸化銅処理、アル
ミニウム箔付きBステージ樹脂組成物シートH配置、積
層成形を行い、その後同様に加工して6層プリント配線
板とした。この評価結果を表1に示す。Comparative Example 4 A varnish was prepared in the same manner as in Example 2 except that the carboxyl group-modified acrylic multilayered structure powder, finely pulverized silica, and acrylonitrile-butadiene rubber were not used. Was coated and dried to a thickness of 65 μm, and a B-stage resin composition sheet H with an aluminum foil having a resin layer having a gelation time (170 ° C.) of 80 seconds was prepared. One B-stage resin composition sheet H with an aluminum foil is arranged on each side of the inner layer plate,
Similarly, a multilayer curing treatment was performed to form a four-layer multi-layer plate, the aluminum foil on the surface layer was dissolved and removed with 10% hydrochloric acid, and then blind via holes were similarly formed with a CO2 laser.
Roughening treatment under the same conditions as above, followed by electroless copper plating and electrolytic copper plating, followed by conductor circuit formation, conductor black copper oxide treatment, B-stage resin composition sheet H placement with aluminum foil, and lamination molding, and then similar processing Then, a 6-layer printed wiring board was obtained. The evaluation results are shown in Table 1.
【0041】 (表1) 項目 実施例 比較例 1 2 1 2 3 4 銅接着力 (kgf/cm) 1.24 1.37 1.23 1.37 1.16 0.46 半田耐熱性 異常なし 異常なし 異常なし 一部膨れ 一部膨れ 多数膨れ ガラス転移温度 DMA (℃) 196 153 197 153 196 168 弾性率25℃ (kgf/mm2) 1910 1783 1002 976 2001 860 ソリ・ネジレ(mm) 1.6 1.9 4.7 5.3 1.5 5.4 厚みバラツキ (μm) 10.5 11.0 19.0 20.3 10.4 22.7 ブラインドビア孔・ヒートサイクル試験 抵抗値変化率(%) 1.5 2.1 2.0 2.9 1.8 >10 クラック発生 200サイクル 0/1000 0/1000 0/1000 0/1000 0/1000 210/1000 400サイクル 0/1000 55/1000 0/1000 72/1000 67/1000 970/1000 耐マイグレーション性 (Ω) 常態 5x1012 3x1012 5x1012 6x1012 4x1012 5x1012 200hrs. 6x1011 7x109 3x1010 6x108 2x109 1x109 500hrs. 8x1010 < 108 7x1010 <108 <108 <108 (Table 1) Item Example Comparative Example 1 2 1 2 3 4 Copper adhesion (kgf / cm) 1.24 1.37 1.23 1.37 1.16 0.46 Soldering heat resistance No abnormality No abnormality No abnormality Partial swelling Partial swelling Glass Transition temperature DMA (° C) 196 153 197 153 196 168 Elastic modulus 25 ° C (kgf / mm 2 ) 1910 1783 1002 976 2001 860 Warp / twist (mm) 1.6 1.9 4.7 5.3 1.5 5.4 Thickness variation (μm) 10.5 11.0 19.0 20.3 10.4 22.7 Blind via hole / heat cycle test Resistance change rate (%) 1.5 2.1 2.0 2.9 1.8> 10 Crack generation 200 cycles 0/1000 0/1000 0/1000 0/1000 0/1000 210/1000 400 cycles 0/1000 55 / 1000 0/1000 72/1000 67/1000 970/1000 migration resistance (Omega) normal 5x10 12 3x10 12 5x10 12 6x10 12 4x10 12 5x10 12 200hrs. 6x10 11 7x10 9 3x10 10 6x10 8 2x10 9 1x10 9 500hrs. 8x10 10 <10 8 7x10 10 <10 8 <10 8 <10 8
【0042】<測定方法>
1)銅接着力: JIS C6481に準じて測定した。
2)半田耐熱性: 6層のプリント配線板をプレッシャクッ
カー試験処理(PCT:121℃・203kPa・4hrs.)後に260℃の
半田中に30sec.浸漬してから異常の有無を観察した。
3)ガラス転移温度: 各ワニスを銅箔上に塗布、乾燥を重
ねて厚さ0.8mmとし、その後、この樹脂組成物面に銅箔
を置いて各積層硬化条件で硬化させてから、表層の銅箔
をエッチングし、DMA法にて測定した。尚、比較例3
はプリプレグを14枚使用して積層成形して厚さをほぼ0.
8mmとしたものを使用した。
4)弾性率: 2)で測定したDMAのチャートの25℃での弾性
率を示した。
5)ソリ、ネジレ: 250x250mmで作製した6層のプリント配
線板を用い、定盤上に置き、ソリ、ネジレの最大値を測
定した。
6)厚みバラツキ: 5)の250x250mmの6層のプリント配線板
の片面の積層した層の厚みのバラツキを厚み測定器で測
定し、(最大値−最小値)で表した。
7)ブラインドビア孔・ヒートサイクル試験による抵抗
値変化及びクラック:各6層プリント配線板の表層から2
層目に形成したブラインドビア孔(孔径100μm、ランド
180μmを2層目と3層目を交互に1000孔つなぎ、-65℃/
30分←→150℃/30分を1サイクルとして200サイクル繰り
返し、抵抗値の変化の最大値を測定した。又、200、400
サイクルでの孔断面を観察し、樹脂クラックの発生を見
た。分子に発生数、分母に試験数を示した。
8)耐マイグレーション性:各実施例、比較例の4層板の
表層にライン/スペース=50/50μmの回路を形成し、
各実施例、比較例の構成と同様に積層して6層板とした
後、表層の金属箔を溶解除去し、この試験片を85℃・85
%RHにて50VDC印加して端子間の絶縁抵抗値を測定した。<Measurement Method> 1) Copper Adhesion Strength: Measured according to JIS C6481. 2) Solder heat resistance: A 6-layer printed wiring board was subjected to a pressure cooker test treatment (PCT: 121 ° C, 203kPa, 4hrs.), Immersed in solder at 260 ° C for 30 seconds, and then observed for abnormalities. 3) Glass transition temperature: each varnish is applied on a copper foil and dried to obtain a thickness of 0.8 mm, and then the copper foil is placed on this resin composition surface and cured under each lamination curing condition, and then the surface layer The copper foil was etched and measured by the DMA method. Comparative Example 3
Is made by laminating 14 prepregs and the thickness is almost 0.
The one with 8 mm was used. 4) Elastic Modulus: The elastic modulus at 25 ° C of the DMA chart measured in 2) is shown. 5) Warp and twist: Using a 6-layer printed wiring board manufactured with a size of 250x250 mm, it was placed on a surface plate and the maximum values of warp and twist were measured. 6) Thickness variation: The thickness variation of the layer laminated on one side of the 6x250x250 mm printed wiring board of 5) was measured with a thickness measuring instrument and expressed as (maximum value-minimum value). 7) Blind via hole, resistance value change and crack by heat cycle test: 2 from the surface layer of each 6-layer printed wiring board
Blind via hole formed in the second layer (hole diameter 100 μm, land
Connect 180 μm to the second layer and the third layer alternately for 1000 holes at -65 ℃ /
200 cycles were repeated with 30 minutes ← → 150 ° C / 30 minutes as one cycle, and the maximum change in resistance was measured. Also, 200, 400
Occurrence of resin cracks was observed by observing the hole cross section in the cycle. The number of occurrences is shown in the numerator, and the number of tests is shown in the denominator. 8) Migration resistance: A circuit of line / space = 50/50 μm is formed on the surface layer of each of the four-layer boards of Examples and Comparative Examples,
After laminating in the same manner as in each of the examples and comparative examples to form a 6-layer plate, the surface metal foil was dissolved and removed, and the test piece was subjected to 85 ° C / 85 ° C.
50% DC was applied at% RH and the insulation resistance between the terminals was measured.
【0043】[0043]
【発明の効果】基板上に導体回路と層間樹脂絶縁層とを
順次積層し、アディティブ法によって多層プリント配線
板を製造する方法であり、該層間絶縁層を形成する際
に、内層板の両側にプリプレグを配置し、その外側に表
面凹凸を有する金属箔の片面にアディティブ用樹脂組成
物を付着させた金属箔付きBステージ樹脂組成物シート
をBステージ樹脂組成物層がプリプレグ側を向くように
配置し、加熱、加圧下に積層硬化処理して両面金属箔張
板を作製後、この両面の金属箔を除去し、粗化溶液にて
表層を粗化してからアディティブ法にて銅メッキを付着
し、後硬化し、回路形成する工程を繰り返してビルドア
ップして多層プリント配線板を製造することにより、弾
性率(剛)が高く、ソリ・ネジレが小さく、板厚精度の
良好なものが得られた。EFFECT OF THE INVENTION A method of manufacturing a multilayer printed wiring board by an additive method by sequentially laminating a conductor circuit and an interlayer resin insulation layer on a substrate, and forming the interlayer insulation layer on both sides of the inner layer board. A B-stage resin composition sheet with a metal foil, in which a prepreg is placed and a resin composition for additive is attached to one side of a metal foil having surface irregularities on the outside, is placed such that the B-stage resin composition layer faces the prepreg side. Then, after laminating and curing under heat and pressure to produce a double-sided metal foil-clad plate, the metal foils on both sides are removed, the surface layer is roughened with a roughening solution, and then copper plating is attached by an additive method. By repeating the steps of post-curing and circuit formation and building up to manufacture a multilayer printed wiring board, it is possible to obtain a product with high elastic modulus (rigidity), small warpage and twist, and good board thickness accuracy. .
【0044】又、該アディティブ用樹脂組成物は、硬化
処理後に粗化液で粗化した際に粗化液に難溶性となる樹
脂成分と可溶性の成分が配合されたものであり、硬化処
理後に難溶性となる樹脂成分として、(a)多官能性シア
ン酸エステルモノマー、該シアン酸エステルプレポリマ
ー100重量部に対し、(b)室温で液状のエポキシ樹脂15〜
500重量部を配合し、(c)熱硬化触媒を、(a+b)100重量部
に対し0.005〜10重量部配合した樹脂組成物を必須成分
とする硬化性樹脂組成物を使用することにより、耐熱
性、耐マイグレーション性等の信頼性に優れた多層プリ
ント配線板を得ることができた。該硬化処理後にも粗化
溶液に可溶性の成分として、ブタジエン含有樹脂、有機
粉体、無機粉体の3成分のうち2成分以上を必須成分と
することにより、粗化によるアンカー効果が増し、銅メ
ッキの接着力の大きいものが得られた。Further, the resin composition for additive is a mixture of a resin component and a soluble component which are hardly soluble in the roughening liquid after roughening with the roughening liquid after the curing treatment. As a poorly soluble resin component, (a) a polyfunctional cyanate ester monomer, 100 parts by weight of the cyanate ester prepolymer, (b) an epoxy resin 15-liquid at room temperature
By blending 500 parts by weight, (c) thermosetting catalyst, (a + b) by using a curable resin composition containing 0.005 to 10 parts by weight per 100 parts by weight of a resin composition as an essential component It was possible to obtain a multilayer printed wiring board excellent in reliability such as heat resistance and migration resistance. By making two or more components out of the three components of the butadiene-containing resin, the organic powder, and the inorganic powder as essential components soluble in the roughening solution even after the curing treatment, the anchoring effect due to the roughening increases, and copper A product having a large adhesion of plating was obtained.
【図1】実施例1のプリント配線板の製造工程。
(1) カバーフィルムが樹脂側に付いた銅箔付きBステ
ージ樹脂組成物シート
(2) 積層成形時の構成
(3) 表層の銅箔をエッチング除去後の粗化
(4) 粗化された樹脂表面FIG. 1 is a manufacturing process of a printed wiring board of Example 1. (1) B-stage resin composition sheet with a copper foil having a cover film on the resin side (2) Configuration during lamination molding (3) Roughening after etching and removing the copper foil on the surface layer (4) Roughened resin surface
【図2】比較例3のプリント配線板の製造工程。 (1) 積層成形時の構成 (2) 表層の銅箔をエッチング除去後の粗化 (3) ガラス繊維まで 粗化された樹脂表面FIG. 2 is a process of manufacturing a printed wiring board of Comparative Example 3. (1) Configuration during laminated molding (2) Roughening after removing the copper foil on the surface layer by etching (3) Resin surface roughened to glass fiber
a 銅箔 b 銅箔の凹凸部 c Bステージ樹脂組成物層 d 樹脂粉体 e 離型フィルム f プリプレグ g ガラス繊維糸 h ガラス繊維断面 i ガラスクロスとBステージ樹脂層間の樹脂 j 内層板導体回路 k 内層板絶縁層 l 粗化された表面樹脂層 m 銅箔をエッチング除去後の表面凹凸 n 粗化によりガラスクロスに到達した箇所 a Copper foil b Copper foil irregularities c B stage resin composition layer d Resin powder e Release film f prepreg g Fiberglass yarn h Glass fiber cross section Resin between glass cloth and B-stage resin layer j Inner layer board conductor circuit k Inner layer board insulation layer l Roughened surface resin layer m Surface irregularities after removing copper foil by etching n Location that reached the glass cloth due to roughening
【手続補正書】[Procedure amendment]
【提出日】平成14年2月26日(2002.2.2
6)[Submission date] February 26, 2002 (2002.2.2)
6)
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】0006[Correction target item name] 0006
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【0006】[0006]
【発明の実施の形態】本発明の製造方法において使用す
る、アディティブ用金属箔付きBステージ樹脂組成物シ
ートの樹脂組成物層は、特に限定はなく、一般に公知の
ものが使用される。この樹脂層には、硬化処理した場合
に粗化溶液に可溶性の成分、粗化溶液に難溶性となる樹
脂成分が含まれており、可溶性成分が難溶性となる樹脂
成分中に均一に分散したものである。ここで、本発明で
使用する「可溶性」、「難溶性」の意味は、硬化処理後
に同一の粗化溶液で同一時間浸漬した場合に、相対的に
溶解速度の速いものを「可溶性」、遅いものを「難溶
性」と表現している。BEST MODE FOR CARRYING OUT THE INVENTION The resin composition layer of the B-stage resin composition sheet with metal foil for additive used in the production method of the present invention is not particularly limited, and a generally known resin composition layer is used. This resin layer contains a component soluble in the roughening solution when cured, and a resin component hardly soluble in the roughening solution, and the soluble component was uniformly dispersed in the resin component poorly soluble. It is a thing. Here, the meanings of "soluble" and "poorly soluble" used in the present invention are "soluble" and "slow" for those having a relatively high dissolution rate when immersed in the same roughening solution for the same time after the curing treatment. Things are described as "poorly soluble".
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08L 63/00 C08L 63/00 Z 79/00 79/00 H05K 3/38 H05K 3/38 A Fターム(参考) 4J002 BB00W BB00X BC03W BG04W BH02X BN15W BN16W CC03W CD00W CD00X CD20X CH07W CH07X CM02X CM04W CM04X CP03W DE077 DE147 DE237 DJ007 DJ017 ER006 FD017 GQ00 5E343 AA13 AA16 AA17 AA36 AA38 BB15 BB24 BB71 DD32 DD75 DD80 EE42 ER32 GG04 5E346 AA01 AA12 AA15 AA32 AA38 BB01 CC02 CC08 CC09 CC32 CC58 DD02 DD33 EE31 EE35 EE38 FF03 FF04 GG02 GG17 GG22 GG27 GG28 HH07 HH11 HH18 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) C08L 63/00 C08L 63/00 Z 79/00 79/00 H05K 3/38 H05K 3/38 AF term ( (Reference) 4J002 BB00W BB00X BC03W BG04W BH02X BN15W BN16W CC03W CD00W CD00X CD20X CH07W CH07X CM02X CM04W CM04X CP03W DE077 DE147 DE237 DJ007 DJ017 AA BB AA32A25ADD32A25ADD32A25ADD16A32A27ABB16A32A21ABB16A32A21ABB32A24A5 CC02 CC08 CC09 CC32 CC58 DD02 DD33 EE31 EE35 EE38 FF03 FF04 GG02 GG17 GG22 GG27 GG28 HH07 HH11 HH18
Claims (5)
順次積層し、アディティブ法によって多層プリント配線
板を製造する方法であり、該層間絶縁層を形成する際
に、内層板の両側にプリプレグを配置し、その外側に表
面凹凸を有する金属箔の片面にアディティブ用樹脂組成
物を付着させた金属箔付きBステージ樹脂組成物シート
をBステージ樹脂組成物層がプリプレグ側を向くように
配置し、加熱、加圧下に積層硬化処理して両面金属箔張
板を作製後、この両面の金属箔を除去し、粗化液にて表
層を粗化してからアディティブ法にて導体回路を形成
し、これを順次繰り返してビルドアップして多層プリン
ト配線板を製造することを特徴とするアディティブ法多
層プリント配線板の製造方法。1. A method for manufacturing a multilayer printed wiring board by an additive method, in which a conductor circuit and an interlayer resin insulation layer are sequentially laminated on a substrate, and both sides of an inner layer board are formed when the interlayer insulation layer is formed. A B-stage resin composition sheet with a metal foil, in which a prepreg is placed and a resin composition for additive is attached to one side of a metal foil having surface irregularities on the outside, is placed such that the B-stage resin composition layer faces the prepreg side. Then, after laminating and curing under heat and pressure to produce a double-sided metal foil-clad plate, the metal foils on both sides are removed, and the surface layer is roughened with a roughening solution, and then a conductor circuit is formed by the additive method. A manufacturing method of an additive method multilayer printed wiring board, characterized in that the multilayer printed wiring board is manufactured by sequentially repeating the above steps to build up.
理後に粗化溶液で粗化した際に粗化溶液に難溶性となる
樹脂成分と可溶性の成分が配合されたものであり、該難
溶性となる樹脂成分として、(a)多官能性シアン酸エス
テルモノマー、該シアン酸エステルプレポリマー100重
量部に対し、(b)室温で液状のエポキシ樹脂15〜500重量
部を配合し、(c)熱硬化触媒を、(a+b)100重量部に対し
0.005〜10重量部配合した樹脂組成物を必須成分とする
請求項1記載のアディティブ法多層プリント配線板の製
造方法。2. The resin composition for additive is a mixture of a resin component and a soluble component which are hardly soluble in a roughening solution when roughened with a roughening solution after curing treatment. As a resin component to be, (a) polyfunctional cyanate ester monomer, with respect to 100 parts by weight of the cyanate ester prepolymer, (b) compounding 15 to 500 parts by weight of a liquid epoxy resin at room temperature, (c) Thermosetting catalyst for 100 parts by weight of (a + b)
The method for producing an additive-type multilayer printed wiring board according to claim 1, wherein a resin composition mixed in an amount of 0.005 to 10 parts by weight is an essential component.
分として、ブタジエン含有樹脂、有機粉体、無機粉体の
3成分のうち2成分以上を必須成分として使用する請求
項1又は2記載のアディティブ法多層プリント配線板の
製造方法。3. The method according to claim 1, wherein two or more components out of three components of a butadiene-containing resin, an organic powder and an inorganic powder are used as essential components as components soluble in the roughening solution after the curing treatment. Additive method for manufacturing multilayer printed wiring boards.
トのBステージ樹脂組成物層の厚みが金属箔凸部先端か
ら5〜20μmである請求項1、2又は3記載のアディティ
ブ法多層プリント配線板の製造方法。4. The additive-type multilayer printed wiring according to claim 1, 2 or 3, wherein the thickness of the B-stage resin composition layer of the B-stage resin composition sheet with metal foil is 5 to 20 μm from the tip of the convex portion of the metal foil. Method of manufacturing a plate.
着させた後、加熱して後硬化させることを特徴とする請
求項1、2、3又は4記載のアディティブ法多層プリン
ト配線板の製造方法。5. The additive-type multilayer printed wiring according to claim 1, wherein the surface layer is roughened with a roughening solution, copper plating is adhered, and then post-cured by heating. Method of manufacturing a plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002046035A JP2003249751A (en) | 2002-02-22 | 2002-02-22 | Additive method multilayer printed wiring board manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002046035A JP2003249751A (en) | 2002-02-22 | 2002-02-22 | Additive method multilayer printed wiring board manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003249751A true JP2003249751A (en) | 2003-09-05 |
Family
ID=28659605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002046035A Pending JP2003249751A (en) | 2002-02-22 | 2002-02-22 | Additive method multilayer printed wiring board manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003249751A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005333006A (en) * | 2004-05-20 | 2005-12-02 | Nec Toppan Circuit Solutions Inc | Printed wiring board and semiconductor device |
| JP2006016574A (en) * | 2004-07-05 | 2006-01-19 | Hitachi Chem Co Ltd | Resin composition for printed wiring board, and varnish, prepreg and metal-clad laminate using the same |
| EP1640150A1 (en) | 2004-09-14 | 2006-03-29 | Mitsubishi Gas Chemical Company, Inc. | Polyimide/metal film laminates and process for the production of printed wiring board using the laminate |
| JP2006328214A (en) * | 2005-05-26 | 2006-12-07 | Tamura Kaken Co Ltd | Thermosetting resin composition, resin film and product with film |
| JP2011040727A (en) * | 2009-07-14 | 2011-02-24 | Ajinomoto Co Inc | Adhesive film with copper foil |
| WO2012121164A1 (en) | 2011-03-07 | 2012-09-13 | 三菱瓦斯化学株式会社 | Resin composition for printed circuit board |
| JP2014012809A (en) * | 2012-07-04 | 2014-01-23 | Uniplus Electronics Co Ltd | Resin having high heat resistance, low rigidity, flame resistance and its resin composition |
| US9351397B2 (en) | 2012-01-31 | 2016-05-24 | Mitsubishi Gas Chemical Company, Inc. | Resin composition for printed wiring board material, and prepreg, resin sheet, metal foil clad laminate, and printed wiring board using same |
| CN109548306A (en) * | 2018-11-30 | 2019-03-29 | 广东骏亚电子科技股份有限公司 | Welding resistance pre-treating technology |
| CN113950204A (en) * | 2020-07-16 | 2022-01-18 | 深南电路股份有限公司 | Manufacturing method of prefabricated circuit board and prefabricated circuit board |
| WO2025169861A1 (en) * | 2024-02-08 | 2025-08-14 | 三菱瓦斯化学株式会社 | Multilayer body and production method for printed wiring board |
-
2002
- 2002-02-22 JP JP2002046035A patent/JP2003249751A/en active Pending
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005333006A (en) * | 2004-05-20 | 2005-12-02 | Nec Toppan Circuit Solutions Inc | Printed wiring board and semiconductor device |
| JP2006016574A (en) * | 2004-07-05 | 2006-01-19 | Hitachi Chem Co Ltd | Resin composition for printed wiring board, and varnish, prepreg and metal-clad laminate using the same |
| EP1640150A1 (en) | 2004-09-14 | 2006-03-29 | Mitsubishi Gas Chemical Company, Inc. | Polyimide/metal film laminates and process for the production of printed wiring board using the laminate |
| JP2006328214A (en) * | 2005-05-26 | 2006-12-07 | Tamura Kaken Co Ltd | Thermosetting resin composition, resin film and product with film |
| JP2011040727A (en) * | 2009-07-14 | 2011-02-24 | Ajinomoto Co Inc | Adhesive film with copper foil |
| WO2012121164A1 (en) | 2011-03-07 | 2012-09-13 | 三菱瓦斯化学株式会社 | Resin composition for printed circuit board |
| EP2942190A1 (en) | 2011-03-07 | 2015-11-11 | Mitsubishi Gas Chemical Company, Inc. | Resin composition for printed-wiring board |
| US9351397B2 (en) | 2012-01-31 | 2016-05-24 | Mitsubishi Gas Chemical Company, Inc. | Resin composition for printed wiring board material, and prepreg, resin sheet, metal foil clad laminate, and printed wiring board using same |
| JP2014012809A (en) * | 2012-07-04 | 2014-01-23 | Uniplus Electronics Co Ltd | Resin having high heat resistance, low rigidity, flame resistance and its resin composition |
| CN109548306A (en) * | 2018-11-30 | 2019-03-29 | 广东骏亚电子科技股份有限公司 | Welding resistance pre-treating technology |
| CN109548306B (en) * | 2018-11-30 | 2020-01-07 | 广东骏亚电子科技股份有限公司 | Solder resist pretreatment process |
| CN113950204A (en) * | 2020-07-16 | 2022-01-18 | 深南电路股份有限公司 | Manufacturing method of prefabricated circuit board and prefabricated circuit board |
| CN113950204B (en) * | 2020-07-16 | 2024-04-12 | 深南电路股份有限公司 | Manufacturing method of prefabricated circuit board and prefabricated circuit board |
| WO2025169861A1 (en) * | 2024-02-08 | 2025-08-14 | 三菱瓦斯化学株式会社 | Multilayer body and production method for printed wiring board |
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